TWI801081B - Device, method and film thickness measuring device for detecting changes in reflected light - Google Patents

Device, method and film thickness measuring device for detecting changes in reflected light Download PDF

Info

Publication number
TWI801081B
TWI801081B TW111100537A TW111100537A TWI801081B TW I801081 B TWI801081 B TW I801081B TW 111100537 A TW111100537 A TW 111100537A TW 111100537 A TW111100537 A TW 111100537A TW I801081 B TWI801081 B TW I801081B
Authority
TW
Taiwan
Prior art keywords
film thickness
reflected light
thickness measuring
detecting changes
measuring device
Prior art date
Application number
TW111100537A
Other languages
Chinese (zh)
Other versions
TW202235814A (en
Inventor
王奇
李仲禹
王政
Original Assignee
大陸商上海精測半導體技術有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大陸商上海精測半導體技術有限公司 filed Critical 大陸商上海精測半導體技術有限公司
Publication of TW202235814A publication Critical patent/TW202235814A/en
Application granted granted Critical
Publication of TWI801081B publication Critical patent/TWI801081B/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/1702—Systems in which incident light is modified in accordance with the properties of the material investigated with opto-acoustic detection, e.g. for gases or analysing solids
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
TW111100537A 2021-03-04 2022-01-06 Device, method and film thickness measuring device for detecting changes in reflected light TWI801081B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202110241306.6A CN113048895B (en) 2021-03-04 2021-03-04 Apparatus and method for detecting change of reflected light, and film thickness measuring apparatus
CN202110241306.6 2021-03-04

Publications (2)

Publication Number Publication Date
TW202235814A TW202235814A (en) 2022-09-16
TWI801081B true TWI801081B (en) 2023-05-01

Family

ID=76510234

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111100537A TWI801081B (en) 2021-03-04 2022-01-06 Device, method and film thickness measuring device for detecting changes in reflected light

Country Status (3)

Country Link
KR (1) KR20220125160A (en)
CN (1) CN113048895B (en)
TW (1) TWI801081B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114279346B (en) * 2021-12-18 2024-04-16 上海精测半导体技术有限公司 Optical measurement device, optical measurement method, and photoacoustic film thickness measurement system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201303258A (en) * 2011-06-27 2013-01-16 Kla Tencor Corp Illumination control

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2600114B2 (en) * 1994-11-28 1997-04-16 工業技術院長 Measurement method by accurate ellipse approximation resistant to noise
US8368897B2 (en) * 2008-08-22 2013-02-05 Ciencia, Inc. Versatile surface plasmon resonance analyzer with an integral surface plasmon resonance enhanced fluorescence mode
WO2013168457A1 (en) * 2012-05-07 2013-11-14 株式会社ニコン Surface position measurement device, surface position measurement method, exposure device, and device production method
CN102679894B (en) * 2012-06-11 2014-07-09 北京理工大学 Method for measuring central thickness of reflecting type differential confocal lens
WO2018007126A1 (en) * 2016-07-07 2018-01-11 Asml Netherlands B.V. Method and apparatus for calculating electromagnetic scattering properties of finite periodic structures
JP6550101B2 (en) * 2017-07-13 2019-07-24 Ｊｆｅテクノリサーチ株式会社 Film thickness measuring method and film thickness measuring apparatus
EP3441773B1 (en) * 2017-08-11 2022-11-23 Anton Paar GmbH Characterizing a height profile of a sample by side view imaging
CN109520973A (en) * 2018-11-13 2019-03-26 北京理工大学 Postposition is divided pupil laser differential confocal microscopic detection method and device
CN111551129B (en) * 2020-06-11 2021-12-07 中国科学院长春光学精密机械与物理研究所 Medium-low-order surface shape detection device and system of large-caliber plane mirror and storage medium

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201303258A (en) * 2011-06-27 2013-01-16 Kla Tencor Corp Illumination control

Also Published As

Publication number Publication date
TW202235814A (en) 2022-09-16
CN113048895B (en) 2022-08-16
KR20220125160A (en) 2022-09-14
CN113048895A (en) 2021-06-29

Similar Documents

Publication Publication Date Title
DK3526542T3 (en) TERAHERTZ MEASURING DEVICE FOR DETERMINING A LAYER THICKNESS OF A TEST OBJECT AND CORRESPONDING MEASUREMENT METHOD
SG157349A1 (en) Lithographic apparatus and device manufacturing method
DK3566225T3 (en) METHOD AND DEVICE FOR DETECTING COST IN THE BACKGROUND
SG10201908064UA (en) Defect Detection Structure Of A Semiconductor Die, Semiconductor Device Including The Same And Method Of Detecting Defects In Semiconductor Die
FR2897434B1 (en) METHOD AND DEVICE FOR PERMEATION MEASUREMENT
WO2012068055A3 (en) Capacitance detection in a droplet actuator
BRPI1006595A2 (en) test strip and method for detecting the presence of an analyte in a sample
TWI801081B (en) Device, method and film thickness measuring device for detecting changes in reflected light
NL2003179A1 (en) Lithographic apparatus and device manufacturing method and scatterometry method and measurement system used therein.
BRPI0812226A2 (en) device and method for non-destructive testing of objects
JP2014085123A5 (en)
ATE482403T1 (en) METHOD FOR DETERMINING AN ASYMMETRIC SIGNAL DELAY OF A SIGNAL PATH WITHIN AN INTEGRATED CIRCUIT
EP4067843A4 (en) Film thickness measuring device and film thickness measuring method
TWI800761B (en) Alignment device, alignment method, film forming device, and film forming method
ATE452826T1 (en) METHOD AND DEVICE FOR DETECTING THE PRESENCE OF AN OPHTHALMIC LENS IN A PACKAGING
PL3759465T3 (en) Methods and systems for calibrating and using a camera for detecting an analyte in a sample
EP3304055A4 (en) Optical device for detecting an internal flaw of a transparent substrate and method for the same
GB201814619D0 (en) A method for detecting defects in thin film layers
WO2008084607A1 (en) Method for measuring immunochromato test piece
CL2016000551A1 (en) Method and apparatus for detecting a magnetic signal on paper money.
DE112022003148A5 (en) OPTICAL MEASURING DEVICE AND METHOD
ES1289362Y (en) RAPID ANTIGEN DETECTION TEST DEVICE
WO2014108528A3 (en) Polarization measuring device, lithography apparatus, measuring arrangement, and method for polarization measurement
DK2579970T3 (en) DEVICE AND PROCEDURE CALCULATED FOR MEASURING THE PROPERTIES OF A COMPLEX ENVIRONMENT BY ANALYSIS OF THE DEVELOPMENT IN REFLECTED AND / OR TRANSMITTED LIGHT
EP4137776A4 (en) Measuring device, exposure device, and measurement method