TWI801031B - 帶電粒子系統、使用帶電粒子之多射束處理樣品之方法 - Google Patents
帶電粒子系統、使用帶電粒子之多射束處理樣品之方法 Download PDFInfo
- Publication number
- TWI801031B TWI801031B TW110146486A TW110146486A TWI801031B TW I801031 B TWI801031 B TW I801031B TW 110146486 A TW110146486 A TW 110146486A TW 110146486 A TW110146486 A TW 110146486A TW I801031 B TWI801031 B TW I801031B
- Authority
- TW
- Taiwan
- Prior art keywords
- sample
- processing
- particle system
- charged
- charged particle
- Prior art date
Links
- 239000002245 particle Substances 0.000 title 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
- H01J37/3023—Programme control
- H01J37/3026—Patterning strategy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
- H01J2237/0451—Diaphragms with fixed aperture
- H01J2237/0453—Diaphragms with fixed aperture multiple apertures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
- H01J2237/2811—Large objects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31761—Patterning strategy
- H01J2237/31766—Continuous moving of wafer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Recrystallisation Techniques (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20213733.7 | 2020-12-14 | ||
EP20213733 | 2020-12-14 | ||
EP21171877.0A EP4086933A1 (en) | 2021-05-03 | 2021-05-03 | Charged particle system, method of processing a sample using a multi-beam of charged particles |
EP21171877.0 | 2021-05-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202240638A TW202240638A (zh) | 2022-10-16 |
TWI801031B true TWI801031B (zh) | 2023-05-01 |
Family
ID=78822626
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW110146486A TWI801031B (zh) | 2020-12-14 | 2021-12-13 | 帶電粒子系統、使用帶電粒子之多射束處理樣品之方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20230326715A1 (zh) |
EP (1) | EP4260357A1 (zh) |
JP (1) | JP2023553103A (zh) |
KR (1) | KR20230118106A (zh) |
IL (1) | IL303577A (zh) |
TW (1) | TWI801031B (zh) |
WO (1) | WO2022128392A1 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024013042A1 (en) | 2022-07-15 | 2024-01-18 | Asml Netherlands B.V. | Charged particle-optical apparatus |
EP4354485A1 (en) | 2022-10-13 | 2024-04-17 | ASML Netherlands B.V. | Charged particle-optical apparatus |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201248673A (en) * | 2011-05-16 | 2012-12-01 | Canon Kk | Drawing apparatus and method of manufacturing article |
US20160071696A1 (en) * | 2013-05-03 | 2016-03-10 | Mapper Lithography Ip B.V. | Beam grid layout |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2503587A3 (en) | 2003-03-10 | 2017-08-23 | Mapper Lithography Ip B.V. | Apparatus for generating a plurality of beamlets |
NL1036912C2 (en) | 2009-04-29 | 2010-11-01 | Mapper Lithography Ip Bv | Charged particle optical system comprising an electrostatic deflector. |
TWI562183B (en) | 2010-11-13 | 2016-12-11 | Mapper Lithography Ip Bv | Aperture array element, charged particle beam generator and charged particle lithography system |
NL2007604C2 (en) | 2011-10-14 | 2013-05-01 | Mapper Lithography Ip Bv | Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams. |
NL2006868C2 (en) | 2011-05-30 | 2012-12-03 | Mapper Lithography Ip Bv | Charged particle multi-beamlet apparatus. |
US10347460B2 (en) * | 2017-03-01 | 2019-07-09 | Dongfang Jingyuan Electron Limited | Patterned substrate imaging using multiple electron beams |
JP6966255B2 (ja) * | 2017-08-10 | 2021-11-10 | 株式会社ニューフレアテクノロジー | 画像取得装置の光学系調整方法 |
KR102582089B1 (ko) * | 2018-06-12 | 2023-09-22 | 에이에스엠엘 네델란즈 비.브이. | 다중 빔 검사 장치를 사용하여 샘플을 스캐닝하기 위한 시스템 및 방법 |
-
2021
- 2021-11-25 EP EP21820214.1A patent/EP4260357A1/en active Pending
- 2021-11-25 IL IL303577A patent/IL303577A/en unknown
- 2021-11-25 JP JP2023534900A patent/JP2023553103A/ja active Pending
- 2021-11-25 KR KR1020237019837A patent/KR20230118106A/ko unknown
- 2021-11-25 WO PCT/EP2021/083024 patent/WO2022128392A1/en active Application Filing
- 2021-12-13 TW TW110146486A patent/TWI801031B/zh active
-
2023
- 2023-06-13 US US18/209,445 patent/US20230326715A1/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201248673A (en) * | 2011-05-16 | 2012-12-01 | Canon Kk | Drawing apparatus and method of manufacturing article |
US20160071696A1 (en) * | 2013-05-03 | 2016-03-10 | Mapper Lithography Ip B.V. | Beam grid layout |
Also Published As
Publication number | Publication date |
---|---|
EP4260357A1 (en) | 2023-10-18 |
US20230326715A1 (en) | 2023-10-12 |
WO2022128392A1 (en) | 2022-06-23 |
KR20230118106A (ko) | 2023-08-10 |
JP2023553103A (ja) | 2023-12-20 |
TW202240638A (zh) | 2022-10-16 |
IL303577A (en) | 2023-08-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI801031B (zh) | 帶電粒子系統、使用帶電粒子之多射束處理樣品之方法 | |
WO2019166331A3 (en) | Charged particle multi-beam system and method | |
EP3966307A4 (en) | SYSTEM AND METHOD FOR THE AUTOMATED PROCESSING OF INDIVIDUAL CELLS | |
EP3922666A4 (en) | GROUP OF HYDROPHOBIC ALGINIC ACID PARTICLES AND METHOD FOR PRODUCING IT | |
EP3948209A4 (en) | AIRBORNE PARTICLE TRACKING SYSTEM AND METHOD | |
EP4208778A4 (en) | SYSTEM AND METHOD FOR ROBOTIC HORIZONTAL SORTING | |
EP3994569A4 (en) | METHOD AND SYSTEM FOR OPTIMIZING THE AGGLOMERATION OF ORES | |
EP3834402A4 (en) | METHOD AND SYSTEM FOR CLOUD APPLICATION AND SERVICE INTEGRATION USING PATTERN-BASED RECOGNITION | |
EP4101550A4 (en) | SEPARATION PROCESS FOR VALUABLE RESOURCES | |
EP3995611A4 (en) | HIGH THROUGHPUT METHOD FOR BUILDING AND SCREENING A LIBRARY OF COMPOUNDS AND REACTION DEVICE | |
EP4121532A4 (en) | SYSTEMS AND METHODS FOR HIGH-THROUGHPUT CRISPR SYSTEM DIAGNOSTIC | |
EP4159837A4 (en) | METHOD AND SYSTEM FOR SEPARATING TARGET PARTICLES | |
EP3977823A4 (en) | SYSTEM AND METHOD FOR GENERATION AND ACCELERATION OF MAGNETIZABLE PLASMA | |
TWI799829B (zh) | 孔徑總成、束操縱器單元、操縱帶電粒子束之方法、及帶電粒子投影裝置 | |
EP4098619A4 (en) | ELECTROMAGNETIC WAVE ABSORBING PARTICLES, ELECTROMAGNETIC WAVE ABSORBING PARTICLE DISPERSION AND PROCESS FOR PRODUCTION OF ELECTROMAGNETIC WAVE ABSORBING PARTICLES | |
EP4147230A4 (en) | SYSTEM AND METHOD FOR DATA AUGMENTATION FOR MULTIMICROPHONE SIGNAL PROCESSING | |
EP4105340A4 (en) | ANALYTICAL METHOD, ANALYTICAL SYSTEM AND INTERFACE FOR ANALYSIS | |
EP4032938A4 (en) | PARTICLES AND METHOD FOR PRODUCING PARTICLES | |
TWI799794B (zh) | 帶電粒子評估工具及檢測方法 | |
EP3948923A4 (en) | SYSTEM AND METHOD FOR LEARNING-GUIDED ELECTRONIC MICROSCOPY | |
EP3884264A4 (en) | ION BEAM DESTRUCTURING SYSTEM AND METHOD, TOPOLOGICALLY ENHANCED DESTRUCTURED SAMPLE PRODUCED THEREIN, AND RELATED METHODS AND IMAGING SYSTEMS | |
EP3760314B8 (en) | Solid particle separator, method of separating solid particles from a fluid by said separator and method of discharging solid particles from said separator | |
EP4045165A4 (en) | PARTICLE SEPARATION BY DENSITY | |
TWI851460B (zh) | 帶電粒子評估工具及檢測方法 | |
EP4177353A4 (en) | SYSTEM AND METHOD FOR BIOPARTICLE ANALYSIS |