TWI801031B - 帶電粒子系統、使用帶電粒子之多射束處理樣品之方法 - Google Patents

帶電粒子系統、使用帶電粒子之多射束處理樣品之方法 Download PDF

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Publication number
TWI801031B
TWI801031B TW110146486A TW110146486A TWI801031B TW I801031 B TWI801031 B TW I801031B TW 110146486 A TW110146486 A TW 110146486A TW 110146486 A TW110146486 A TW 110146486A TW I801031 B TWI801031 B TW I801031B
Authority
TW
Taiwan
Prior art keywords
sample
processing
particle system
charged
charged particle
Prior art date
Application number
TW110146486A
Other languages
English (en)
Other versions
TW202240638A (zh
Inventor
瑪寇 傑 加寇 威蘭德
Original Assignee
荷蘭商Ａｓｍｌ荷蘭公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP21171877.0A external-priority patent/EP4086933A1/en
Application filed by 荷蘭商Ａｓｍｌ荷蘭公司 filed Critical 荷蘭商Ａｓｍｌ荷蘭公司
Publication of TW202240638A publication Critical patent/TW202240638A/zh
Application granted granted Critical
Publication of TWI801031B publication Critical patent/TWI801031B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H01J37/3026—Patterning strategy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H01J2237/0453—Diaphragms with fixed aperture multiple apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
    • H01J2237/2811—Large objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31766—Continuous moving of wafer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Recrystallisation Techniques (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
TW110146486A 2020-12-14 2021-12-13 帶電粒子系統、使用帶電粒子之多射束處理樣品之方法 TWI801031B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP20213733.7 2020-12-14
EP20213733 2020-12-14
EP21171877.0A EP4086933A1 (en) 2021-05-03 2021-05-03 Charged particle system, method of processing a sample using a multi-beam of charged particles
EP21171877.0 2021-05-03

Publications (2)

Publication Number Publication Date
TW202240638A TW202240638A (zh) 2022-10-16
TWI801031B true TWI801031B (zh) 2023-05-01

Family

ID=78822626

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110146486A TWI801031B (zh) 2020-12-14 2021-12-13 帶電粒子系統、使用帶電粒子之多射束處理樣品之方法

Country Status (7)

Country Link
US (1) US20230326715A1 (zh)
EP (1) EP4260357A1 (zh)
JP (1) JP2023553103A (zh)
KR (1) KR20230118106A (zh)
IL (1) IL303577A (zh)
TW (1) TWI801031B (zh)
WO (1) WO2022128392A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024013042A1 (en) 2022-07-15 2024-01-18 Asml Netherlands B.V. Charged particle-optical apparatus
EP4354485A1 (en) 2022-10-13 2024-04-17 ASML Netherlands B.V. Charged particle-optical apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201248673A (en) * 2011-05-16 2012-12-01 Canon Kk Drawing apparatus and method of manufacturing article
US20160071696A1 (en) * 2013-05-03 2016-03-10 Mapper Lithography Ip B.V. Beam grid layout

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2503587A3 (en) 2003-03-10 2017-08-23 Mapper Lithography Ip B.V. Apparatus for generating a plurality of beamlets
NL1036912C2 (en) 2009-04-29 2010-11-01 Mapper Lithography Ip Bv Charged particle optical system comprising an electrostatic deflector.
TWI562183B (en) 2010-11-13 2016-12-11 Mapper Lithography Ip Bv Aperture array element, charged particle beam generator and charged particle lithography system
NL2007604C2 (en) 2011-10-14 2013-05-01 Mapper Lithography Ip Bv Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams.
NL2006868C2 (en) 2011-05-30 2012-12-03 Mapper Lithography Ip Bv Charged particle multi-beamlet apparatus.
US10347460B2 (en) * 2017-03-01 2019-07-09 Dongfang Jingyuan Electron Limited Patterned substrate imaging using multiple electron beams
JP6966255B2 (ja) * 2017-08-10 2021-11-10 株式会社ニューフレアテクノロジー 画像取得装置の光学系調整方法
KR102582089B1 (ko) * 2018-06-12 2023-09-22 에이에스엠엘 네델란즈 비.브이. 다중 빔 검사 장치를 사용하여 샘플을 스캐닝하기 위한 시스템 및 방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201248673A (en) * 2011-05-16 2012-12-01 Canon Kk Drawing apparatus and method of manufacturing article
US20160071696A1 (en) * 2013-05-03 2016-03-10 Mapper Lithography Ip B.V. Beam grid layout

Also Published As

Publication number Publication date
EP4260357A1 (en) 2023-10-18
US20230326715A1 (en) 2023-10-12
WO2022128392A1 (en) 2022-06-23
KR20230118106A (ko) 2023-08-10
JP2023553103A (ja) 2023-12-20
TW202240638A (zh) 2022-10-16
IL303577A (en) 2023-08-01

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