TWI801012B - Inspection method and inspection platform for lithography - Google Patents

Inspection method and inspection platform for lithography Download PDF

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Publication number
TWI801012B
TWI801012B TW110144747A TW110144747A TWI801012B TW I801012 B TWI801012 B TW I801012B TW 110144747 A TW110144747 A TW 110144747A TW 110144747 A TW110144747 A TW 110144747A TW I801012 B TWI801012 B TW I801012B
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TW
Taiwan
Prior art keywords
inspection
lithography
platform
inspection method
inspection platform
Prior art date
Application number
TW110144747A
Other languages
Chinese (zh)
Other versions
TW202318096A (en
Inventor
陳政憲
廖淑君
徐紹維
傅尉恩
鍾宗穎
莊宜蓁
Original Assignee
財團法人工業技術研究院
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Application filed by 財團法人工業技術研究院 filed Critical 財團法人工業技術研究院
Priority to US17/676,534 priority Critical patent/US20230131662A1/en
Priority to KR1020220034931A priority patent/KR20230059690A/en
Application granted granted Critical
Publication of TWI801012B publication Critical patent/TWI801012B/en
Publication of TW202318096A publication Critical patent/TW202318096A/en

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TW110144747A 2021-10-26 2021-12-01 Inspection method and inspection platform for lithography TWI801012B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US17/676,534 US20230131662A1 (en) 2021-10-26 2022-02-21 Inspection method and inspection platform for lithography
KR1020220034931A KR20230059690A (en) 2021-10-26 2022-03-21 Inspection method and inspection platform for lithography

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202163272085P 2021-10-26 2021-10-26
US63/272,085 2021-10-26

Publications (2)

Publication Number Publication Date
TWI801012B true TWI801012B (en) 2023-05-01
TW202318096A TW202318096A (en) 2023-05-01

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Application Number Title Priority Date Filing Date
TW110144747A TWI801012B (en) 2021-10-26 2021-12-01 Inspection method and inspection platform for lithography

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TW (1) TWI801012B (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6737207B2 (en) * 2000-04-25 2004-05-18 Nikon Corporation Method for evaluating lithography system and method for adjusting substrate-processing apparatus
CN101114128A (en) * 2006-07-20 2008-01-30 奇梦达股份公司 System and method for measuring power of lithographic system
TWM375866U (en) * 2009-04-17 2010-03-11 Kun Shan University Of Technology Automatic measurement system of planar illumination intensity
TWI440842B (en) * 2010-11-15 2014-06-11 Nat Univ Kaohsiung Detection method and device for in situ monitoring resistance of photosensitive or hydrocarbon-containing thin-film materials upon extreme ultraviolet (euv) irradiation using actinic euv light source
TWI621928B (en) * 2015-10-09 2018-04-21 Ａｓｍｌ荷蘭公司 Method and system for determining a parameter related to a target, method for manufacturing devices, and non-transitory computer program product
TW202102949A (en) * 2019-07-01 2021-01-16 日商佳能股份有限公司 Detection apparatus, exposure apparatus, and article manufacturing method
TWI732058B (en) * 2016-11-15 2021-07-01 荷蘭商Ａｓｍｌ荷蘭公司 Radiation analysis systems, and related methods and computer readable medium

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6737207B2 (en) * 2000-04-25 2004-05-18 Nikon Corporation Method for evaluating lithography system and method for adjusting substrate-processing apparatus
CN101114128A (en) * 2006-07-20 2008-01-30 奇梦达股份公司 System and method for measuring power of lithographic system
TWM375866U (en) * 2009-04-17 2010-03-11 Kun Shan University Of Technology Automatic measurement system of planar illumination intensity
TWI440842B (en) * 2010-11-15 2014-06-11 Nat Univ Kaohsiung Detection method and device for in situ monitoring resistance of photosensitive or hydrocarbon-containing thin-film materials upon extreme ultraviolet (euv) irradiation using actinic euv light source
TWI621928B (en) * 2015-10-09 2018-04-21 Ａｓｍｌ荷蘭公司 Method and system for determining a parameter related to a target, method for manufacturing devices, and non-transitory computer program product
TWI732058B (en) * 2016-11-15 2021-07-01 荷蘭商Ａｓｍｌ荷蘭公司 Radiation analysis systems, and related methods and computer readable medium
TW202102949A (en) * 2019-07-01 2021-01-16 日商佳能股份有限公司 Detection apparatus, exposure apparatus, and article manufacturing method

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Publication number Publication date
TW202318096A (en) 2023-05-01

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