TWI800235B - 原子層沉積系統 - Google Patents
原子層沉積系統 Download PDFInfo
- Publication number
- TWI800235B TWI800235B TW111102973A TW111102973A TWI800235B TW I800235 B TWI800235 B TW I800235B TW 111102973 A TW111102973 A TW 111102973A TW 111102973 A TW111102973 A TW 111102973A TW I800235 B TWI800235 B TW I800235B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer deposition
- atomic layer
- deposition system
- atomic
- layer
- Prior art date
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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TW111102973A TWI800235B (zh) | 2022-01-24 | 2022-01-24 | 原子層沉積系統 |
Applications Claiming Priority (1)
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TW111102973A TWI800235B (zh) | 2022-01-24 | 2022-01-24 | 原子層沉積系統 |
Publications (2)
Publication Number | Publication Date |
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TWI800235B true TWI800235B (zh) | 2023-04-21 |
TW202330983A TW202330983A (zh) | 2023-08-01 |
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Family Applications (1)
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TW111102973A TWI800235B (zh) | 2022-01-24 | 2022-01-24 | 原子層沉積系統 |
Country Status (1)
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TW (1) | TWI800235B (zh) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030183171A1 (en) * | 1999-03-11 | 2003-10-02 | Ofer Sneh | Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition |
TW201546315A (zh) * | 2014-03-18 | 2015-12-16 | Tokyo Electron Ltd | 成膜裝置 |
TW201840895A (zh) * | 2016-12-21 | 2018-11-16 | 日商東京威力科創股份有限公司 | 氣體處理裝置及氣體處理方法 |
TW202020216A (zh) * | 2018-08-10 | 2020-06-01 | 日商東京威力科創股份有限公司 | 氣體處理裝置及氣體處理方法 |
TW202202655A (zh) * | 2020-07-10 | 2022-01-16 | 天虹科技股份有限公司 | 可減少前驅物沉積的原子層沉積設備與製程方法 |
-
2022
- 2022-01-24 TW TW111102973A patent/TWI800235B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030183171A1 (en) * | 1999-03-11 | 2003-10-02 | Ofer Sneh | Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition |
TW201546315A (zh) * | 2014-03-18 | 2015-12-16 | Tokyo Electron Ltd | 成膜裝置 |
TW201840895A (zh) * | 2016-12-21 | 2018-11-16 | 日商東京威力科創股份有限公司 | 氣體處理裝置及氣體處理方法 |
TW202020216A (zh) * | 2018-08-10 | 2020-06-01 | 日商東京威力科創股份有限公司 | 氣體處理裝置及氣體處理方法 |
TW202202655A (zh) * | 2020-07-10 | 2022-01-16 | 天虹科技股份有限公司 | 可減少前驅物沉積的原子層沉積設備與製程方法 |
Also Published As
Publication number | Publication date |
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TW202330983A (zh) | 2023-08-01 |
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