TWI799738B - 附設薄膜之晶圓的膜厚分布之測定方法 - Google Patents

附設薄膜之晶圓的膜厚分布之測定方法 Download PDF

Info

Publication number
TWI799738B
TWI799738B TW109133561A TW109133561A TWI799738B TW I799738 B TWI799738 B TW I799738B TW 109133561 A TW109133561 A TW 109133561A TW 109133561 A TW109133561 A TW 109133561A TW I799738 B TWI799738 B TW I799738B
Authority
TW
Taiwan
Prior art keywords
wafer
film thickness
thin films
thickness distribution
measuring film
Prior art date
Application number
TW109133561A
Other languages
English (en)
Other versions
TW202129224A (zh
Inventor
桑原登
凱文 奎因奎特
飛利浦 格斯塔多
Original Assignee
日商信越半導體股份有限公司
法商統一半導體Ｓａｓ公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商信越半導體股份有限公司, 法商統一半導體Ｓａｓ公司 filed Critical 日商信越半導體股份有限公司
Publication of TW202129224A publication Critical patent/TW202129224A/zh
Application granted granted Critical
Publication of TWI799738B publication Critical patent/TWI799738B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G01B11/0633—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection using one or more discrete wavelengths
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0052—Optical details of the image generation
    • G02B21/006—Optical details of the image generation focusing arrangements; selection of the plane to be imaged
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
    • G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
TW109133561A 2019-10-03 2020-09-28 附設薄膜之晶圓的膜厚分布之測定方法 TWI799738B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019182831A JP7160779B2 (ja) 2019-10-03 2019-10-03 薄膜付ウェーハの膜厚分布の測定方法
JP2019-182831 2019-10-03

Publications (2)

Publication Number Publication Date
TW202129224A TW202129224A (zh) 2021-08-01
TWI799738B true TWI799738B (zh) 2023-04-21

Family

ID=75338000

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109133561A TWI799738B (zh) 2019-10-03 2020-09-28 附設薄膜之晶圓的膜厚分布之測定方法

Country Status (7)

Country Link
US (1) US11965730B2 (zh)
EP (1) EP4040106A4 (zh)
JP (1) JP7160779B2 (zh)
KR (1) KR102679254B1 (zh)
CN (1) CN114450778A (zh)
TW (1) TWI799738B (zh)
WO (1) WO2021065499A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116124017B (zh) * 2023-01-06 2024-03-22 深圳市埃芯半导体科技有限公司 薄膜膜厚的测量方法、装置、电子设备及存储介质

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5555472A (en) * 1993-12-22 1996-09-10 Integrated Process Equipment Corp. Method and apparatus for measuring film thickness in multilayer thin film stack by comparison to a reference library of theoretical signatures
JP2016114506A (ja) * 2014-12-16 2016-06-23 信越半導体株式会社 薄膜付ウェーハの評価方法
TW201736799A (zh) * 2016-01-14 2017-10-16 Shin-Etsu Handotai Co Ltd 帶薄膜晶圓的膜厚度分布檢測方法
JP2019113492A (ja) * 2017-12-26 2019-07-11 レーザーテック株式会社 段差測定方法及び段差測定装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006184303A (ja) * 2004-12-24 2006-07-13 Olympus Corp 画像検査装置
FI119259B (fi) * 2006-10-18 2008-09-15 Valtion Teknillinen Pinnan ja paksuuden määrittäminen
JP5365581B2 (ja) 2010-05-28 2013-12-11 信越半導体株式会社 薄膜付ウェーハの評価方法
FR2998047B1 (fr) 2012-11-12 2015-10-02 Soitec Silicon On Insulator Procede de mesure des variations d'epaisseur d'une couche d'une structure semi-conductrice multicouche
JP6404172B2 (ja) * 2015-04-08 2018-10-10 株式会社荏原製作所 膜厚測定方法、膜厚測定装置、研磨方法、および研磨装置
JP6750793B2 (ja) * 2016-04-26 2020-09-02 レーザーテック株式会社 膜厚測定装置及び膜厚測定方法
DE102017116745A1 (de) * 2017-07-25 2019-01-31 Carl Zeiss Microscopy Gmbh Konfokalmikroskop zur Schichtdickenmessung und Mikroskopieverfahren zur Schichtdickenmessung

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5555472A (en) * 1993-12-22 1996-09-10 Integrated Process Equipment Corp. Method and apparatus for measuring film thickness in multilayer thin film stack by comparison to a reference library of theoretical signatures
JP2016114506A (ja) * 2014-12-16 2016-06-23 信越半導体株式会社 薄膜付ウェーハの評価方法
TW201736799A (zh) * 2016-01-14 2017-10-16 Shin-Etsu Handotai Co Ltd 帶薄膜晶圓的膜厚度分布檢測方法
JP2019113492A (ja) * 2017-12-26 2019-07-11 レーザーテック株式会社 段差測定方法及び段差測定装置

Also Published As

Publication number Publication date
WO2021065499A1 (ja) 2021-04-08
JP2021060208A (ja) 2021-04-15
TW202129224A (zh) 2021-08-01
EP4040106A4 (en) 2023-11-15
CN114450778A (zh) 2022-05-06
EP4040106A1 (en) 2022-08-10
KR20220054654A (ko) 2022-05-03
KR102679254B1 (ko) 2024-06-27
JP7160779B2 (ja) 2022-10-25
US20220341728A1 (en) 2022-10-27
US11965730B2 (en) 2024-04-23

Similar Documents

Publication Publication Date Title
EP3551964A4 (en) SYSTEM AND METHOD FOR MEASURING THE SUBSTRATE AND LAYER THICKNESS DISTRIBUTION
EP3931535A4 (en) DEVICE AND METHOD FOR INSPECTING A FILM ON A SUBSTRATE
EP3988894A4 (en) APPARATUS AND METHOD FOR MEASURING THE THICKNESS OF A BASIC UNIT
EP3798608A4 (en) NORMAL INCIDENCE ELLIPSOMETER AND METHOD OF MEASUREMENT OF OPTICAL PROPERTIES OF A SAMPLE USING THE SAME
EP3844319A4 (en) HIGH TEMPERATURE ATOMIC LAYER DEPOSITION COMPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS
EP3862400A4 (en) AGRICULTURAL COATING COMPOSITION, AGRICULTURAL COATING FILM, SUBSTRATE WITH AGRICULTURAL COATING FILM AND METHOD OF MANUFACTURE THEREOF
EP3750522A4 (en) COMPOSITION FOR FORMING A COATING FILM
EP3802913A4 (en) COMPOSITIONS AND METHODS OF USE THEREOF FOR DEPOSITION OF SILICON-CONTAINING FILM
EP3767225A4 (en) METHOD AND SYSTEM FOR MEASURING THE THICKNESS OF A SHEET SHEET COATING
EP3988616A4 (en) THIN FILM OF POLYTETRAFLUOROETHYLENE AND METHOD FOR MAKING IT
TWI799738B (zh) 附設薄膜之晶圓的膜厚分布之測定方法
EP3947769A4 (en) ORGANOAMINODISILAZANS FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS
EP4066948A4 (en) COATING COMPOSITION AND METHOD FOR FORMING COATING FILM
KR102185623B9 (ko) 박막증착장치 및 박막증착방법
EP3904078A4 (en) ANTI-REFLECTIVE FILM AND METHOD OF MANUFACTURE THEREOF
EP3844318A4 (en) METHODS FOR MAKING FILMS CONTAINING SILICON AND NITROGEN
EP3872237A4 (en) APPARATUS AND METHOD FOR PRODUCTION OF METAL MEMBRANE RESIN FILM
EP3778171A4 (en) METHOD OF MANUFACTURING THIN-LAYER STRIP PARTS FROM RESIN
EP3969633A4 (en) METHOD FOR THIN FILM DEPOSITION IN TRENCHES
EP3997729A4 (en) SILICON COMPOUNDS AND METHODS OF DEPOSITIONING FILMS USING THEM
EP4082675A4 (en) COATING COMPOSITION AND METHOD FOR FORMING MULTILAYER COATING FILM
EP4100556A4 (en) METHOD AND DEVICE FOR ADJUSTING THE LAYER PROPERTIES DURING THIN FILM DEPOSITION
EP4067365A4 (en) COMPOUND, THIN FILM FORMING RAW MATERIAL, AND THIN FILM PRODUCTION METHOD
EP3719170A4 (en) Process for the production of an amorphous thin film
TWI799585B (zh) 塗覆裝置及塗覆膜的製造方法