TWI796932B - Display apparatus - Google Patents

Abstract

A display apparatus includes a substrate, a first conductive pattern layer, a first insulating pattern layer, a second conductive pattern layer, a second insulating pattern layer, pixel structures and a light-absorbing pattern layer. The first conductive pattern layer is disposed on the substrate. The first insulating pattern layer is disposed on the first conductive pattern layer and has a first opening. The second conductive pattern layer is disposed on the first insulating pattern layer and has light-shielding conductive patterns arranged periodically. The second insulating pattern layer is disposed on the second conductive pattern layer and has a second opening overlapping the first opening. The light-absorbing pattern layer covers at least a first side wall defining the first opening and a second side wall defining the second opening and separates light-shielding conductive patterns of the second conductive pattern layer. The light-absorbing pattern layer has a light-transmitting opening overlapping the first opening and the second opening.

Description

display device

The present invention relates to a photoelectric device, in particular to a display device.

The transparent display device has a certain degree of see-through, and the user can see the background information behind it through the transparent display device, and at the same time, can see the display information displayed by the transparent display device. The transparent display device can be applied to various occasions, such as automatic vending machines, car windows, shop windows and the like.

In order to allow users to receive display information and background information at the same time, the transparent display device has a non-penetrating area and a penetrating area. The non-penetrating area is used for setting light-shielding components, such as electrodes, circuit traces and the like. The penetration area is used to allow the background light to pass through, so that the user can receive the background information behind. Most of the light-shielding members arranged in the non-penetrating area are periodically arranged, and the periodically arranged light-shielding members are easy to form multiple micro-openings in a regular arrangement. When the background beam passes through these micro-openings, significant diffraction will occur, resulting in background Image quality degrades. Therefore, how to reduce the diffraction phenomenon in the transparent display device and maintain a certain degree of see-through of the transparent display device is a major challenge at present.

The invention provides a display device with good see-through effect.

The display device of the present invention includes a substrate, a first conductive pattern layer, a first insulating pattern layer, a second conductive pattern layer, a second insulating pattern layer, a plurality of pixel structures and a light absorption pattern layer. The substrate has a first region and a second region outside the first region. The first conductive pattern layer is disposed on the first region of the base. The first insulating pattern layer is disposed on the first conductive pattern layer and has a first opening. The first insulating pattern layer has a first sidewall defining a first opening. The second conductive pattern layer is disposed on the first insulating pattern layer, located in the first region of the substrate, and has a plurality of light-shielding conductive patterns arranged periodically. The second insulating pattern layer is disposed on the second conductive pattern layer and has a second opening. The second opening overlaps the first opening, and the second insulating pattern layer has a second sidewall defining the second opening. A plurality of pixel structures are disposed on the second insulating pattern layer. The light absorbing pattern layer is disposed on the first area of the base. The light-absorbing pattern layer at least covers the first sidewall and the second sidewall and separates a plurality of light-shielding conductive patterns of the second conductive pattern layer. The light-absorbing pattern layer has a light-transmitting opening overlapping the first opening and the second opening. The light-transmitting opening of the light-absorbing pattern layer is located in the second area of the substrate.

In an embodiment of the present invention, the above-mentioned first conductive pattern layer has a plurality of light-shielding conductive patterns arranged periodically; in the top view of the display device, the plurality of light-shielding conductive patterns of the first conductive pattern layer and the second conductive pattern The multiple light-shielding conductive patterns of the layer are arranged alternately; the light-absorbing pattern layer further separates the multiple light-shielding conductive patterns of the first conductive pattern layer.

In an embodiment of the present invention, the above-mentioned light-absorbing pattern layer includes a sidewall portion, covering the first sidewall of the first insulating pattern layer and the second sidewall of the second insulating pattern layer, and separating a plurality of light-shielding portions of the first conductive pattern layer. The conductive pattern is separated from a plurality of light-shielding conductive patterns of the second conductive pattern layer. The sidewall portion includes a first sub-sidewall portion and a second sub-sidewall portion. In the top view of the display device, the edge of the first sub-sidewall portion is located outside the corresponding light-shielding conductive pattern of the first conductive pattern layer, and the edge of the first sub-sidewall portion is substantially parallel to the corresponding light-shielding conductive pattern of the first conductive pattern layer. The edges of the pattern. In the top view of the display device, the edge of the second sub-sidewall portion is located outside the corresponding light-shielding conductive pattern of the second conductive pattern layer, and the edge of the second sub-sidewall portion is substantially parallel to the corresponding light-shielding conductive pattern of the second conductive pattern layer. The edges of the pattern.

In an embodiment of the present invention, the above-mentioned light-absorbing pattern layer further includes a first top and a second top. The first top is disposed on the top surface of the second insulating pattern layer facing away from the substrate, connected to the first sub-sidewall portion, and overlapped with the corresponding light-shielding conductive pattern of the first conductive pattern layer. The second top is disposed on the top surface of the second insulating pattern layer facing away from the substrate, connected to the second sub-sidewall portion, and overlapped with the corresponding light-shielding conductive pattern of the second conductive pattern layer.

In an embodiment of the present invention, each pixel structure above includes an electrode and a light-emitting element electrically connected to the electrode, the electrode belongs to the third conductive pattern layer, and the third conductive pattern layer is disposed on the second insulating pattern layer, Moreover, multiple electrodes of multiple pixel structures are arranged periodically. The sidewall portion further includes a third sub-sidewall portion. In the top view of the display device, the edge of the third sub-sidewall portion is located outside the corresponding electrode of the third conductive pattern layer, and the edge of the third sub-sidewall portion is substantially parallel to the edge of the corresponding electrode of the third conductive pattern layer.

In an embodiment of the present invention, the above-mentioned light-absorbing pattern layer further includes a third top, disposed on the top surface of the second insulating pattern layer facing away from the substrate, connected to the third sub-sidewall portion, and partially overlapping the first Corresponding electrodes of the three conductive pattern layers.

In an embodiment of the present invention, the above-mentioned display device further includes a light-shielding pattern layer and a third insulating pattern layer. The light-shielding pattern layer is disposed on the first area of the substrate, between the first conductive pattern layer and the substrate, and shields the light-shielding conductive pattern of the first conductive pattern layer and the light-shielding conductive pattern of the second conductive pattern layer. The third insulating pattern layer is disposed on the light-shielding pattern layer and located between the first conductive pattern layer and the light-shielding pattern layer. The third insulating pattern layer has a third opening overlapping the first opening and a third sidewall defining the third opening, and the light absorbing pattern layer further covers the third sidewall.

In an embodiment of the present invention, the above-mentioned display device further includes an encapsulation layer covering the pixel structure and overlapping the first opening of the first insulating pattern layer, the second opening of the second insulating pattern layer, and the opening of the light-absorbing pattern layer. Transparent opening.

In an embodiment of the present invention, the above-mentioned display device further includes an encapsulation layer covering the pixel structure and filling the first opening of the first insulating pattern layer, the second opening of the second insulating pattern layer, and the opening of the light-absorbing pattern layer. In the transparent opening.

In an embodiment of the present invention, the above-mentioned first insulating pattern layer includes a first main part and a first auxiliary part. The first main part overlaps the light-shielding conductive pattern of the first conductive pattern layer. The first auxiliary part is located between the light-shielding conductive patterns of the first conductive pattern layer. The first sidewall defining the first opening of the first insulating pattern layer includes sidewalls of the first main part and sidewalls of the first auxiliary part which are opposite to and separated from each other, and the light absorbing pattern layer covers the first main part of the first insulating pattern layer. The sidewall of the part and the sidewall of the first auxiliary part of the first insulating pattern layer.

In an embodiment of the present invention, the above-mentioned first auxiliary portion of the first insulating pattern layer is located in the light-transmitting opening of the light-absorbing pattern layer.

In an embodiment of the present invention, the above-mentioned second insulating pattern layer includes a second main portion and a second auxiliary portion. The second main part overlaps the light-shielding conductive pattern of the first conductive pattern layer, and is disposed on the first main part of the first insulating pattern layer. The second auxiliary part is disposed on the first auxiliary part of the first insulating pattern layer. The second sidewall defining the second opening of the second insulating pattern layer includes sidewalls of the second main part and sidewalls of the second auxiliary part that are opposite and separated from each other, and the light-absorbing pattern layer further covers the second part of the second insulating pattern layer. The sidewall of the main part and the sidewall of the second auxiliary part of the second insulating pattern layer.

In an embodiment of the present invention, the above-mentioned second auxiliary portion of the second insulating pattern layer is located in the light-transmitting opening of the light-absorbing pattern layer.

Reference will now be made in detail to the exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and descriptions to refer to the same or like parts.

It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to physical and/or electrical connection. Furthermore, "electrically connected" or "coupled" may mean that other elements exist between two elements.

As used herein, "about," "approximately," or "substantially" includes stated values and averages within acceptable deviations from a particular value as determined by one of ordinary skill in the art, taking into account the measurements in question and the relative A specific amount of measurement-related error (ie, the limit of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, ±5%. Moreover, "about", "approximately" or "substantially" used herein may select a more acceptable deviation range or standard deviation according to optical properties, etching properties or other properties, and may not use one standard deviation to apply to all properties .

Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted to have meanings consistent with their meanings in the context of the relevant art and the present invention, and will not be interpreted as idealized or excessive formal meaning, unless expressly so defined herein.

1A to 1F are schematic top views of the manufacturing process of a display device 10 according to an embodiment of the present invention.

2A to 2F are schematic cross-sectional views of the manufacturing process of the display device 10 according to an embodiment of the present invention. 2A to 2F correspond to the section line I-I' in FIGS. 1A to 1F respectively.

3A to 3F are schematic cross-sectional views of the manufacturing process of the display device 10 according to an embodiment of the present invention. 3A to 3F correspond to the section line II-II' in FIGS. 1A to 1F respectively.

Referring to FIG. 1A , FIG. 2A and FIG. 3A , firstly, a substrate 110 is provided. The substrate 110 has a first region 110a and a second region 110b outside the first region 110a. The first area 110a is used to set the body of the light-shielding/light-absorbing member. The first region 110a can also be called a non-penetrating region. The second area 110b is used for setting the opening of the light-shielding/light-absorbing member and/or the light-transmitting member. The second region 110b can also be called a penetration region. In this embodiment, the material of the substrate 110 is glass, for example. However, the present invention is not limited thereto. In other embodiments, the material of the substrate 110 may also be quartz, organic polymer, or other transparent materials.

FIG. 4 is a schematic top view of the light-shielding pattern layer 120 according to an embodiment of the present invention.

Referring to FIG. 1A , FIG. 2A , FIG. 3A and FIG. 4 , next, a light-shielding pattern layer 120 is formed on the substrate 110 . The light-shielding pattern layer 120 is disposed on the first region 110 a of the substrate 110 . In this embodiment, the shading pattern layer 120 includes a plurality of first shading strips 122 arranged periodically and a plurality of second shading strips 124 arranged periodically, wherein the plurality of first shading strips 122 and the plurality of second shading strips 124 interleaved settings.

In this embodiment, the light-shielding pattern layer 120 may further include a plurality of light-shielding patterns 126 arranged periodically, wherein each light-shielding pattern 126 is disposed on at least one of the corresponding first light-shielding strips 122 and the corresponding one of the second light-shielding strips 124 next to one. For example, in this embodiment, each shading pattern 126 can be selectively disposed beside the intersection of a corresponding first shading strip 122 and a second shading strip 124, but the present invention is not limited thereto. . The light-shielding pattern layer 120 has a light-transmitting opening 120 a (marked in FIG. 4 ). The light-transmitting opening 120 a is defined by the solid edge of the light-shielding pattern layer 120 . For example, in this embodiment, the light-transmitting opening 120a can be formed by the edges of two adjacent first light-shielding strips 122, the edges of two adjacent second light-shielding strips 124, and the edges of two adjacent light-shielding patterns 126. Edge is defined, but the present invention is not limited thereto. In this embodiment, the material of the light-shielding pattern layer 120 is, for example, metal. However, the present invention is not limited thereto. In other embodiments, the material of the light-shielding pattern layer 120 may also be other light-shielding materials, and the material of the light-shielding pattern layer 120 is not necessarily a conductive material.

Referring to FIG. 1A, FIG. 2A and FIG. 3A, then, a third insulating material layer 130' is formed on the substrate 110. Referring to FIG. The third insulating material layer 130' is disposed on the first region 110a and the second region 110b of the substrate 110, and covers the light-shielding pattern layer 120. For example, in this embodiment, the material of the third insulating material layer 130' can be an inorganic material (for example: silicon oxide, silicon nitride, silicon oxynitride, or a stacked layer of at least two of the above materials), an organic material or a combination of the above.

FIG. 5 is a schematic top view of the first conductive pattern layer 140 according to an embodiment of the present invention.

Referring to FIG. 1A, FIG. 2A, FIG. 3A and FIG. 5, then, a first conductive pattern layer 140 is formed on the third insulating material layer 130'. The first conductive pattern layer 140 is disposed on the first region 110 a of the substrate 110 . The first conductive pattern layer 140 has a plurality of light-shielding conductive patterns 142 arranged periodically. Referring to FIG. 1A , FIG. 2A , FIG. 4 and FIG. 5 , in this embodiment, the plurality of first light-shielding strips 122 of the light-shielding pattern layer 120 respectively shield the plurality of light-shielding conductive patterns 142 of the first conductive pattern layer 140 . In this embodiment, the plurality of light-shielding conductive patterns 142 of the first conductive pattern layer 140 are, for example, a plurality of gate lines. However, the present invention is not limited thereto. In other embodiments, the plurality of light-shielding conductive patterns 142 of the first conductive pattern layer 140 may also be a plurality of data lines or other conductive elements. In this embodiment, the material of the first conductive pattern layer 140 is, for example, metal. However, the present invention is not limited thereto. In other embodiments, the material of the first conductive pattern layer 140 may also be other conductive materials capable of shielding light.

Referring to FIG. 1A, FIG. 2A and FIG. 3A, then, a first insulating material layer 150' is formed on the third insulating material layer 130'. The first insulating material layer 150' is disposed on the first region 110a and the second region 110b of the substrate 110, and covers the first conductive pattern layer 140. For example, in this embodiment, the material of the first insulating material layer 150' can be an inorganic material (for example: silicon oxide, silicon nitride, silicon oxynitride, or a stacked layer of at least two of the above materials), an organic material or a combination of the above.

FIG. 6 is a schematic top view of the second conductive pattern layer 160 according to an embodiment of the present invention.

Referring to FIG. 1A, FIG. 3A and FIG. 6, then, a second conductive pattern layer 160 is formed on the first insulating material layer 150'. The second conductive pattern layer 160 is disposed on the first region 110 a of the substrate 110 and has a plurality of light-shielding conductive patterns 162 arranged periodically. Referring to FIG. 1A , FIG. 3A , FIG. 4 and FIG. 6 , in this embodiment, the plurality of second light-shielding strips 124 of the light-shielding pattern layer 120 respectively shield the plurality of light-shielding conductive patterns 162 of the second conductive pattern layer 160 . For example, in this embodiment, the plurality of light-shielding conductive patterns 162 of the second conductive pattern layer 160 are a plurality of data lines. However, the present invention is not limited thereto. In other embodiments, the plurality of light-shielding conductive patterns 162 of the second conductive pattern layer 160 may also be a plurality of gate lines or other conductive elements. In this embodiment, the material of the second conductive pattern layer 160 is, for example, metal. However, the present invention is not limited thereto. In other embodiments, the material of the second conductive pattern layer 160 may also be other conductive materials capable of shielding light.

Referring to FIG. 1A, FIG. 2A and FIG. 3A, then, a second insulating material layer 170' is formed on the first insulating material layer 150' and the second conductive pattern layer 160. Referring to FIG. The second insulating material layer 170' is disposed on the first region 110a and the second region 110b of the substrate 110, and covers the second conductive pattern layer 160. For example, in this embodiment, the material of the second insulating material layer 170' can be an inorganic material (for example: silicon oxide, silicon nitride, silicon oxynitride, or a stacked layer of at least two of the above materials), an organic material or a combination of the above.

FIG. 7 is a schematic top view of the third conductive pattern layer 180 according to an embodiment of the present invention.

Referring to FIG. 1A, FIG. 2A, FIG. 3A and FIG. 7, then, a third conductive pattern layer 180 is formed on the second insulating material layer 170'. The third conductive pattern layer 180 is disposed on the first region 110 a of the substrate 110 and has a plurality of conductive patterns 182 arranged periodically. In this embodiment, the plurality of conductive patterns 182 of the third conductive pattern layer 180 can selectively shield light, and the plurality of light-shielding patterns 126 of the light-shielding pattern layer 120 can respectively shield the plurality of conductive patterns of the third conductive pattern layer 180 182. For example, in this embodiment, the plurality of conductive patterns 182 of the third conductive pattern layer 180 are a plurality of electrodes for electrically connecting with the light emitting device 200 (shown in FIG. 1D , FIG. 2D and FIG. 3D ). However, the present invention is not limited thereto. In other embodiments, the plurality of conductive patterns 182 of the third conductive pattern layer 180 may also be other conductive elements. In this embodiment, the material of the third conductive pattern layer 180 is, for example, metal. However, the present invention is not limited thereto. In other embodiments, the material of the third conductive pattern layer 180 may also be other conductive materials.

1A to 1B, 2A to 2B and 3A to 3B, then, pattern the first insulating material layer 150', the second insulating material layer 170' and the third insulating material layer 130' to form The first insulating pattern layer 150 , the second insulating pattern layer 170 and the third insulating pattern layer 130 . In this embodiment, the first insulating material layer 150 ′, the second insulating material layer 170 ′, and the third insulating material layer 130 ′ can be patterned selectively using laser drilling technology to form respectively The first insulating pattern layer 150 , the second insulating pattern layer 170 and the third insulating pattern layer 130 having the first opening 152 , the second opening 172 and the third opening 132 . However, the present invention is not limited thereto. In other embodiments, other techniques may also be used to form the first opening 152 , the second opening 172 and the third opening 132 .

Referring to FIG. 1B , FIG. 2B and FIG. 3B , the first insulating pattern layer 150 is disposed on the first conductive pattern layer 140 . The second conductive pattern layer 160 is disposed on the first insulating pattern layer 150 . The second insulating pattern layer 170 is disposed on the second conductive pattern layer 160 . The second opening 172 of the second insulating pattern layer 170 overlaps the first opening 152 of the first insulating pattern layer 150 . The third insulating pattern layer 130 is disposed on the light-shielding pattern layer 120 and located between the first conductive pattern layer 140 and the light-shielding pattern layer 120 . The third insulating pattern layer 130 has a third opening 132 overlapping the first opening 152 of the first insulating pattern layer 150 . The first insulating pattern layer 150 has a first sidewall 152s defining the first opening 152 . The second insulating pattern layer 170 has a second sidewall 172s defining the second opening 172 . The third insulating pattern layer 130 has a third sidewall 132s defining the third opening 132 . In this embodiment, the first sidewall 152s of the first insulating pattern layer 150 , the second sidewall 172s of the second insulating pattern layer 170 , and the third sidewall 132s of the third insulating pattern layer 130 are substantially aligned. That is to say, the first opening 152 of the first insulating pattern layer 150 , the second opening 172 of the second insulating pattern layer 170 and the third opening 132 of the third insulating pattern layer 130 are substantially overlapped.

Please refer to FIG. 1B. In this embodiment, in a plan view, the edges of the first opening 152, the second opening 172 and the third opening 132 are located on the body of the first conductive pattern layer 140, the second conductive pattern layer 160 and the entity of the third conductive pattern layer 180, and the edge of the first opening 152, the edge of the second opening 172, the third opening 132 and the entity of the first conductive pattern layer 140, the second The entities of the conductive pattern layer 160 and the entities of the third conductive pattern layer 180 maintain distances d1, d2, and d3.

Please refer to FIG. 1B, FIG. 2B and FIG. 3B. In this embodiment, the first insulating pattern layer 150, the second insulating pattern layer 170 and the third insulating pattern layer 130 cover the periodic arrangement of the first conductive pattern layer 140. A plurality of light-shielding conductive patterns 142, a plurality of light-shielding conductive patterns 162 periodically arranged in the second conductive pattern layer 160, and a plurality of first light-shielding strips 122 periodically arranged in the light-shielding pattern layer 120, a plurality of second light-shielding strips 124 and A plurality of light-shielding patterns 126, and the first opening 152 of the first insulating pattern layer 150, the second opening 172 of the second insulating pattern layer 170 and the third opening 132 of the third insulating pattern layer 130 expose 140, a plurality of light-shielding conductive patterns 142 periodically arranged, a plurality of light-shielding conductive patterns 162 periodically arranged in the second conductive pattern layer 160, a plurality of first light-shielding strips 122 periodically arranged in the light-shielding pattern layer 120, a plurality of The overlapping area of the second light-shielding strip 124 and the plurality of light-shielding patterns 126 .

Please refer to FIG. 1C, FIG. 2C and FIG. 3C, then, in this embodiment, at least the first sidewall 152s of the first insulating pattern layer 150 defining the first opening 152, the second insulating pattern layer defining the second opening 172 The light absorption pattern layer 190 is formed on the second sidewall 172s of 170 and the third sidewall 132s of the third insulating pattern layer 130 defining the third opening 132 .

Please refer to FIG. 2C and FIG. 3C. In this embodiment, the light absorption pattern layer 190 is disposed on the first region 110a of the substrate 110, the light absorption pattern layer 190 covers the first sidewall 152s, the second sidewall 172s and the third sidewall 132s, and The light-absorbing pattern layer 190 separates the periodically arranged multiple light-shielding conductive patterns 142 of the first conductive pattern layer 140, the periodically arranged multiple light-shielding conductive patterns 162 of the second conductive pattern layer 160, and the period of the third conductive pattern layer 180 A plurality of conductive patterns 182 in a permanent arrangement.

In detail, in this embodiment, the light absorbing patterned layer 190 includes a sidewall portion 192 covering the first sidewall 152s of the first insulating patterned layer 150, the second sidewall 172s of the second insulating patterned layer 170 and the third insulating patterned layer 130 The third side wall 132s. The sidewall portion 192 of the light-absorbing pattern layer 190 separates the periodically arranged light-shielding conductive patterns 142 of the first conductive pattern layer 140, the periodically arranged light-shielding conductive patterns 162 of the second conductive pattern layer 160, and the third conductive pattern. A plurality of conductive patterns 182 are periodically arranged in the layer 180 .

Please refer to FIG. 1C , more specifically, in this embodiment, the side wall portion 192 of the light absorption pattern layer 190 includes a first sub-side wall portion 192-1, a second sub-side wall portion 192-2 and a third sub-side wall portion 192- 3. In a plan view, the edge 192-1e of the first sub-sidewall portion 192-1 is located outside a corresponding light-shielding conductive pattern 142 of the first conductive pattern layer 140, and the edge 192-1e of the first sub-sidewall portion 192-1 is substantially An edge 142 e of a corresponding light-shielding conductive pattern 142 parallel to the first conductive pattern layer 140 . In a plan view, the edge 192-2e of the second sub-sidewall portion 192-2 is located outside a corresponding light-shielding conductive pattern 162 of the second conductive pattern layer 160, and the edge 192-2e of the second sub-sidewall portion 192-2 is substantially An edge 162 e of a corresponding light-shielding conductive pattern 162 parallel to the second conductive pattern layer 160 . In a plan view, the edge 192-3e of the third sub-sidewall portion 192-3 is located outside a corresponding conductive pattern 182 of the third conductive pattern layer 180, and the edge 192-3e of the third sub-sidewall portion 192-3 is substantially parallel An edge 182e of a corresponding conductive pattern 182 on the third conductive pattern layer 180 .

Referring to FIG. 1C , FIG. 2C and FIG. 3C , in this embodiment, the light absorbing pattern layer 190 may optionally further include a top 194 disposed on the top surface 170 a of the second insulating pattern layer 170 facing away from the substrate 110 . In this embodiment, the top 194 of the light absorption pattern layer 190 may include a first top 194-1 (marked in FIG. 1C ), a second top 194-2 (marked in FIG. 1C ) and a third top 194-3 (marked in FIG. 1C ). Figure 1C). The first top portion 194-1 is disposed on the top surface 170a of the second insulating pattern layer 170 facing away from the substrate 110, is connected to the first sub-sidewall portion 192-1, and overlaps a corresponding light-shielding portion of the first conductive pattern layer 140. conductive pattern 142 . The second top portion 194-2 is disposed on the top surface 170a of the second insulating pattern layer 170 facing away from the substrate 110, connected to the second sub-sidewall portion 192-2, and overlapping a corresponding light-shielding portion of the second conductive pattern layer 160. conductive pattern 162 . The third top portion 194-3 is disposed on the top surface 170a of the second insulating pattern layer 170 facing away from the substrate 110, is connected to the third sub-sidewall portion 192-3, and partially overlaps the corresponding portion of the third conductive pattern layer 180. A conductive pattern 182 .

In this embodiment, the light-absorbing pattern layer 190 has a light-transmitting opening 190 a overlapping the first opening 152 of the first insulating pattern layer 150 , the second opening 172 of the second insulating pattern layer 170 and the second opening 190 a of the third insulating pattern layer 130 . Three openings 132 . The light-transmitting opening 190 a of the light-absorbing pattern layer 190 is located in the second region 110 b of the substrate 110 . The light-transmitting opening 190 a of the light-absorbing pattern layer 190 defines a penetrating region (ie, the second region 110 b ).

Referring to FIG. 1C , in this embodiment, the light-transmitting opening 190 a of the light-absorbing pattern layer 190 may optionally be polygonal. In other words, in this embodiment, the edge of the light-transmitting opening 190 a of the light-absorbing pattern layer 190 has a plurality of corners. However, the present invention is not limited thereto. In other embodiments, the corners of the edges of the light-transmitting opening 190a of the light-absorbing pattern layer 190 may be rounded to reduce the diffraction effect of the background light beam passing through the light-transmitting opening 190a. In other embodiments, the light-transmitting opening 190a may also be in the shape of a circle, an ellipse or other shapes with arc-shaped edges.

Please refer to FIG. 1D, FIG. 2D and FIG. 3D. In this embodiment, then, a plurality of light-emitting elements 200 are arranged on the substrate 110, and the plurality of light-emitting elements 200 and the plurality of conductive patterns 182 of the third conductive pattern layer 180 electrical connection. Specifically, in this embodiment, the light-absorbing pattern layer 190 has an auxiliary opening 190b exposing at least a part of the conductive pattern 182; superior.

In this embodiment, the light emitting element 200 is, for example, a micro light emitting diode (μLED). However, the present invention is not limited thereto, and in other embodiments, the light emitting element 200 may also be other types of light emitting elements. For example, in another embodiment, the light emitting element 200 may also be an organic light emitting element including an organic electroluminescent layer. In addition, it should be noted that the present invention does not limit the display device 10 to include the light-emitting element 200; in another embodiment, the light-emitting element 200 can also be replaced by a non-self-luminous element (not shown), wherein Including non-self-luminous display medium layers (such as but not limited to: liquid crystal layer).

In this embodiment, each pixel structure SPX includes an electrode (ie, conductive pattern 182 ) and a light emitting element 200 electrically connected to the electrode, the electrode (ie, conductive pattern 182 ) belongs to the third conductive pattern layer 180 , and the second The three conductive pattern layers 180 are disposed on the second insulating pattern layer 170 . In this embodiment, in a plan view, the edge 190be of the auxiliary opening 190b of the light absorbing pattern layer 190 coincides with the edge 182e of the electrode (ie, the conductive pattern 182 ) corresponding to one pixel structure SPX. In this embodiment, the top 194 of the light-absorbing pattern layer 190 may cover the top surface 170a of the second insulating pattern layer 170, but not cover the top surface 182a of the electrode (ie, the conductive pattern 182), but the present invention is not limited thereto .

Referring to FIG. 1E , FIG. 2E and FIG. 3E , next, an encapsulation layer 210 is formed to cover a plurality of pixel structures SPX. The packaging layer 210 overlaps the first opening 152 of the first insulating pattern layer 150 , the second opening 172 of the second insulating pattern layer 170 and the light-transmitting opening 190 a of the light-absorbing pattern layer 190 . In this embodiment, the side wall portion 192 of the light absorbing pattern layer 190 does not completely fill the first opening 152 of the first insulating pattern layer 150, the second opening 172 of the second insulating pattern layer 170 and the second opening of the third insulating pattern layer 130. Three openings 132, and the encapsulation layer 210 can fill the first opening 152 of the first insulating pattern layer 150, the second opening 172 of the second insulating pattern layer 170, the third opening 132 of the third insulating pattern layer 130 and the light absorbing pattern layer 190 through the light opening 190a. For example, in this embodiment, the encapsulation layer 210 may be a thin film encapsulation material, die-bonding glue or other encapsulation materials.

Please refer to FIG. 1F , FIG. 2F and FIG. 3F . Next, in this embodiment, a light-transmitting protective plate 220 may be optionally formed on the encapsulation layer 210 . In this embodiment, the transparent protection plate 220 may optionally include an anti-reflection film (not shown), but the invention is not limited thereto. Here, the display device 10 of this embodiment is completed.

It should be noted that the display device 10 includes a light absorbing pattern layer 190 covering at least the first side wall 152s of the first insulating pattern layer 150 and the second side wall 172s of the second insulating pattern layer 170, and the light absorbing pattern layer 190 at least separates the second conductive A plurality of light-shielding conductive patterns 162 arranged periodically in the pattern layer 160 . The background light beam (not shown) from the rear of the display device 10 will be absorbed by the light-absorbing pattern layer 190 when passing through the plurality of light-shielding conductive patterns 162 arranged periodically in the second conductive pattern layer 160, and it is not easy to be caused by passing through the plurality of periodically arranged light-shielding conductive patterns 162. A light-shielding conductive pattern 162 is used to generate near-field diffraction inside the display device 10 . Thereby, the background image viewed through the display device 10 is clearer, and the see-through effect of the display device 10 is good.

FIG. 8 shows a diffraction spot formed by a coherent light beam passing through a display device 10 according to an embodiment of the present invention. FIG. 9 shows the diffraction spot formed by the coherent beam passing through a display device of a comparative example.

The display device of the comparative example is similar to the display device 10 of the embodiment, and the difference between the two is that the first insulating pattern layer, the second insulating pattern layer, and the third insulating pattern layer of the display device of the comparative example do not have the first opening, the second insulating pattern layer, and the second insulating pattern layer. The second opening and the third opening, and the display device of the comparative example does not include the light absorption pattern layer 190 of the display device 10 . Please refer to FIG. 8 and FIG. 9, and compare the diffraction spot formed after the coherent light beam passes through the display device 10 of the embodiment (as shown in FIG. 8 ) and the diffraction spot formed after passing through the display device of the comparative example (as shown in FIG. 9 As shown), it can be seen that the divergence degree of the diffraction spot formed after passing through the display device 10 of the embodiment is obviously slight. It can be proved that the display device 10 of the embodiment can effectively reduce the near-field diffraction effect between the film layers inside the display device 10 , thereby improving the clarity of the background image.

FIG. 10 shows reflection spectra of a display device 10 of an embodiment of the present invention and a display device of a comparative example. The display device of the comparative example corresponding to FIG. 10 is the display device of the aforementioned comparative example. For the differences between the display device of the comparative example and the display device of the embodiment, please refer to the foregoing description, which will not be repeated here. Please refer to FIG. 10 , comparing the reflection spectra of the display device 10 of the embodiment and the display device of the comparative example, it can be known that the reflectance of the display device 10 of the embodiment is obviously lower due to the light-absorbing pattern layer 190, and the lower reflectance has It helps to improve the visual effect of the display device 10 under strong light.

FIG. 11 shows transmission spectra of a display device 10 according to an embodiment of the present invention and a display device according to a comparative example. The display device of the comparative example corresponding to FIG. 11 is the display device of the aforementioned comparative example. For the differences between the display device 10 of the comparative example and the display device 10 of the embodiment, please refer to the foregoing description, which will not be repeated here. Please refer to FIG. 11 , comparing the transmission spectra of the display device 10 of the embodiment and the display device of the comparative example, it can be seen that the transmittance of the display device 10 of the embodiment is higher than that of the display device of the comparative example at most wavelengths of visible light penetration rate. That is to say, the transmittance of the display device 10 of the embodiment is relatively high, which helps to improve the see-through effect of the display device 10 . In addition, the transmittance of the display device of the comparative example is low at 380nm to 480nm, that is to say, the background light beam passing through the display device of the comparative example lacks the components of violet and blue light, while the background beam seen through the display device of the comparative example The image will be yellowish. In contrast to the display device 10 of the embodiment, the transmittance of the display device 10 of the embodiment is relatively consistent at each wavelength, which can effectively improve the problem of the yellowish background image.

It must be noted here that the following embodiments use the component numbers and part of the content of the previous embodiments, wherein the same numbers are used to denote the same or similar components, and descriptions of the same technical content are omitted. For the description of omitted parts, reference may be made to the aforementioned embodiments, and the following embodiments will not be repeated.

FIG. 12 is a schematic top view of a display device 10A according to another embodiment of the present invention. FIG. 13 is a schematic cross-sectional view of a display device 10A according to another embodiment of the present invention. Fig. 13 corresponds to section line III-III' of Fig. 12 . FIG. 14 is a schematic cross-sectional view of a display device 10A according to another embodiment of the present invention. Fig. 14 corresponds to section line IV-IV' of Fig. 12 .

The display device 10A of FIG. 12, FIG. 13 and FIG. 14 is similar to the display device 10 of FIG. 1F, FIG. 2F and FIG. The coverage of the pattern layer 190 is different.

Please refer to FIG. 12 , FIG. 13 and FIG. 14 , specifically, in this embodiment, the light-absorbing pattern layer 190 further covers at least a part of the top surface 182 a of the conductive pattern 182 of the third conductive pattern layer 180 . In detail, in this embodiment, the light-absorbing pattern layer 190 can cover the area of the top surface 182 a of the conductive pattern 182 not occupied by the light-emitting element 200 .

FIG. 15 is a schematic top view of a display device 10B according to another embodiment of the present invention. FIG. 16 is a schematic cross-sectional view of a display device 10B according to another embodiment of the present invention. Fig. 16 corresponds to the section line V-V' of Fig. 15 . FIG. 17 is a schematic cross-sectional view of a display device 10B according to another embodiment of the present invention. Fig. 17 corresponds to section line VI-VI' of Fig. 15 .

The display device 10B of FIG. 15, FIG. 16 and FIG. 17 is similar to the display device 10 of FIG. 1F, FIG. 2F and FIG. The coverage of the pattern layer 190 is different.

Please refer to FIG. 15, FIG. 16 and FIG. 17. Specifically, in this embodiment, the light absorbing pattern layer 190 covers the first side wall 152s of the first insulating pattern layer 150, the second side wall 172s and the second side wall 172s of the second insulating pattern layer 170. The third sidewall 132 s of the third insulating pattern layer 130 , but the light absorbing pattern layer 190 does not cover the top surface 170 a of the second insulating pattern layer 170 and the conductive pattern 182 of the third conductive pattern layer 180 .

18A to 18F are schematic cross-sectional views of the manufacturing process of a display device 10C according to another embodiment of the present invention. The manufacturing process of the display device 10C in FIGS. 18A to 18F is similar to the manufacturing process of the display device 10 in FIGS. 2A to 2F . The difference between the two lies in: the first insulating pattern layer 150 and the second insulating pattern layer 170 of the display device 10C. and the formation range of the first opening 152 , the second opening 172 and the third opening 132 of the third insulating pattern layer 130 and the first insulating pattern layer 150 , the second insulating pattern layer 170 and the third insulating pattern layer 130 of the display device 10 The formation ranges of the first opening 152 , the second opening 172 and the third opening 132 are different, and are illustrated below with reference to FIGS. 18A to 18F .

Please refer to FIG. 18A , firstly, a light-shielding pattern layer 120 , a third insulating material layer 130 ′, a first conductive pattern layer 140 , a first insulating material layer 150 ′, a second conductive pattern layer (not shown) are sequentially formed on a substrate 110 . shown), the second insulating material layer 170 ′ and the third conductive pattern layer 180 .

Please refer to FIG. 18B, then, pattern the first insulating material layer 150', the second insulating material layer 170' and the third insulating material layer 130' to form the first opening 152, the second opening 172 and the third opening respectively. 132 of the first insulating pattern layer 150 , the second insulating pattern layer 170 and the third insulating pattern layer 130 .

Different from the previous embodiments, in this embodiment, the first opening 152, the second opening 172 and the third opening 132 are not hollow openings, but the first opening 152, the second opening 172 and the third opening 132 are annular opening, and the ring-shaped first opening 152 , the second opening 172 and the third opening 132 are provided with part of the first insulating pattern layer 150 , part of the second insulating pattern layer 170 and part of the third insulating pattern layer 130 .

Referring to FIG. 18C , next, a plurality of light emitting elements 200 are disposed on the substrate 110 , and the plurality of light emitting elements 200 are electrically connected to the plurality of conductive patterns 182 of the third conductive pattern layer 180 . Each pixel structure SPX includes an electrode (ie, the conductive pattern 182 ) and a light emitting element 200 electrically connected to the electrode.

Please refer to FIG. 18D, then, at least the first sidewall 152s of the first insulating pattern layer 150 defining the first opening 152, the second sidewall 172s of the second insulating pattern layer 170 defining the second opening 172 and the third opening 132 are defined. The light absorbing pattern layer 190 is formed on the third sidewall 132s of the third insulating pattern layer 130 .

Different from the previous embodiments, in this embodiment, the first insulating pattern layer 150 includes a first main part 150-1 and a first auxiliary part 150-2, and the first main part 150-1 overlaps the first conductive pattern The light-shielding conductive pattern 142 of the layer 140, the first auxiliary part 150-2 is located between the light-shielding conductive patterns 142 of the first conductive pattern layer 140, and the first side walls 152s defining the first opening 152 of the first insulating pattern layer 150 include opposite to each other. The sidewall 150-1s of the first main part 150-1 and the sidewall 150-2s of the first auxiliary part 150-2 are separated from each other, and the light absorption pattern layer 190 covers the first main part 150-150 of the first insulating pattern layer 150- 1 sidewall 150-1s and the sidewall 150-2s of the first auxiliary part 150-2 of the first insulating pattern layer 150.

In this embodiment, the second insulating pattern layer 170 includes a second main portion 170-1 and a second auxiliary portion 170-2, the second main portion 170-1 overlaps the light-shielding conductive pattern 142 of the first conductive pattern layer 140 and It is disposed on the first main part 150-1 of the first insulating pattern layer 150, and the second auxiliary part 170-2 is disposed on the first auxiliary part 150-2 of the first insulating pattern layer 150, defining the second insulating pattern layer 170 The second side wall 172s of the second opening 172 includes the side wall 170-1s of the second main part 170-1 and the side wall 170-2s of the second auxiliary part 170-2, which are opposite to and separated from each other, and the light-absorbing pattern layer 190 is further Covering the sidewall 170 - 1s of the second main portion 170 - 1 of the second insulating pattern layer 170 and the sidewall 170 - 2s of the second auxiliary portion 170 - 2 of the second insulating pattern layer 170 .

In this embodiment, the third insulating pattern layer 130 includes a third main portion 130-1 and a third auxiliary portion 130-2, the third main portion 130-1 covers the body of the light-shielding pattern layer 120 and is disposed on the first insulating pattern Between the first main part 150-1 of the layer 150 and the substrate 110, the third auxiliary part 130-2 is disposed between the first auxiliary part 150-2 of the first insulating pattern layer 150 and the substrate 110, defining a third insulating pattern The third sidewall 132s of the third opening 132 of the layer 130 includes the sidewall 130-1s of the third main part 130-1 and the sidewall 130-2s of the third auxiliary part 130-2 which are opposite to and separated from each other, and the light-absorbing pattern layer 190 further covers the sidewall 130 - 1 s of the third main portion 130 - 1 of the third insulating pattern layer 130 and the sidewall 130 - 2 s of the third auxiliary portion 130 - 2 of the third insulating pattern layer 130 .

In short, in this embodiment, the light absorbing pattern layer 190 can fill the first opening 152 of the first insulating pattern layer 150 , the second opening 172 of the second insulating pattern layer 170 and the third opening of the third insulating pattern layer 130 . opening 132, and the first auxiliary part 150-2 of the first insulating pattern layer 150, the second auxiliary part 170-2 of the second insulating pattern layer 170, and the third auxiliary part 130-2 of the third insulating pattern layer 130 are located at the light absorbing In the light-transmitting opening 190 a of the pattern layer 190 . In this embodiment, the light-absorbing pattern layer 190 is formed by using an in jet printing process instead of using a yellow light process.

Referring to FIG. 18E , next, an encapsulation layer 210 is formed to cover a plurality of pixel structures SPX. Please refer to FIG. 18F , finally, a light-transmitting protective plate 220 is formed on the encapsulation layer 210 . Here, the display device 10C of this embodiment is completed.

10, 10A, 10B, 10C: display device

110: Substrate

110a: District 1

110b: Second area

120: shading pattern layer

120a: light-transmitting opening

122: The first shading strip

124: The second shading strip

126: Shading pattern

130: the third insulating pattern layer

130': The third insulating material layer

130-1: Third Major Department

130-2: Third Auxiliary Division

132: The third opening

132s: third side wall

140: the first conductive pattern layer

142, 162: Light-shielding conductive pattern

150: the first insulating pattern layer

150': the first insulating material layer

150-1: First Major Division

150-2: First Auxiliary Division

130-1s, 130-2s, 150-1s, 150-2s, 170-1s, 170-2s: side wall

152: First opening

152s: first side wall

160: the second conductive pattern layer

170: second insulating pattern layer

170': second layer of insulating material

170-1: Second Major Division

170-2: Second Auxiliary Division

170a, 182a: top surface

172: second opening

172s: second side wall

180: the third conductive pattern layer

182: Conductive pattern

190: light absorption pattern layer

190a: light-transmitting opening

190b: Auxiliary opening

192: side wall

192-1: The first sub-side wall part

192-2: second sub-side wall part

192-3: The third sub-side wall

142e, 162e, 182e, 190be, 192-1e, 192-2e, 192-3e: edge

194: top

194-1: First top

194-2: Second top

194-3: Third top

200: light emitting element

210: encapsulation layer

220: Light-transmitting protective board

d1, d2, d3: distance

SPX: Pixel Structure

I-I', II-II', III-III', IV-IV', V-V', VI-VI': broken line

1A to 1F are schematic top views of the manufacturing process of a display device 10 according to an embodiment of the present invention. 2A to 2F are schematic cross-sectional views of the manufacturing process of the display device 10 according to an embodiment of the present invention. 3A to 3F are schematic cross-sectional views of the manufacturing process of the display device 10 according to an embodiment of the present invention. FIG. 4 is a schematic top view of the light-shielding pattern layer 120 according to an embodiment of the present invention. FIG. 5 is a schematic top view of the first conductive pattern layer 140 according to an embodiment of the present invention. FIG. 6 is a schematic top view of the second conductive pattern layer 160 according to an embodiment of the present invention. FIG. 7 is a schematic top view of the third conductive pattern layer 180 according to an embodiment of the present invention. FIG. 8 shows a diffraction spot formed by a coherent light beam passing through a display device 10 according to an embodiment of the present invention. FIG. 9 shows the diffraction spot formed by the coherent beam passing through a display device of a comparative example. FIG. 10 shows reflection spectra of a display device 10 of an embodiment of the present invention and a display device of a comparative example. FIG. 11 shows transmission spectra of a display device 10 according to an embodiment of the present invention and a display device according to a comparative example. FIG. 12 is a schematic top view of a display device 10A according to another embodiment of the present invention. FIG. 13 is a schematic cross-sectional view of a display device 10A according to another embodiment of the present invention. FIG. 14 is a schematic cross-sectional view of a display device 10A according to another embodiment of the present invention. FIG. 15 is a schematic top view of a display device 10B according to another embodiment of the present invention. FIG. 16 is a schematic cross-sectional view of a display device 10B according to another embodiment of the present invention. FIG. 17 is a schematic cross-sectional view of a display device 10B according to another embodiment of the present invention. 18A to 18F are schematic cross-sectional views of the manufacturing process of a display device 10C according to another embodiment of the present invention.

10: Display device

110: Substrate

110a: District 1

110b: Second area

120: shading pattern layer

122: The first shading strip

126: Shading pattern

130: the third insulating pattern layer

132: The third opening

132s: third side wall

140: the first conductive pattern layer

142: Light-shielding conductive pattern

150: the first insulating pattern layer

152: First opening

152s: first side wall

170: second insulating pattern layer

170a, 182a: top surface

172: second opening

172s: second side wall

180: the third conductive pattern layer

182: Conductive pattern

190: light absorption pattern layer

190a: light-transmitting opening

190b: Auxiliary opening

192: side wall

194: top

200: light emitting element

210: encapsulation layer

220: Light-transmitting protective board

SPX: Pixel Structure

I-I': section line

Claims (13)

A display device, comprising: a substrate having a first region and a second region outside the first region; a first conductive pattern layer disposed on the first region of the substrate; a first insulating pattern layer , disposed on the first conductive pattern layer and having a first opening, wherein the first insulating pattern layer has a first sidewall defining the first opening; a second conductive pattern layer disposed on the first insulating pattern layer The pattern layer is located in the first region of the substrate and has a plurality of light-shielding conductive patterns arranged periodically; a second insulating pattern layer is arranged on the second conductive pattern layer and has a second opening, wherein The second opening overlaps the first opening, and the second insulating pattern layer has a second side wall defining the second opening; a plurality of pixel structures are arranged on the second insulating pattern layer; and a light absorption pattern layer, disposed on the first region of the substrate, wherein the light-absorbing pattern layer at least covers the first sidewall and the second sidewall and separates the light-shielding conductive patterns of the second conductive pattern layer, and the light-absorbing pattern layer has A light-transmitting opening overlapping the first opening and the second opening, and the light-transmitting opening of the light-absorbing pattern layer is located in the second region of the substrate. The display device as claimed in claim 1, wherein the first conductive pattern layer has a plurality of light-shielding conductive patterns arranged periodically; in the top view of the display device, the light-shielding conductive patterns of the first conductive pattern layer and the second conductive pattern layer The light-shielding conductive patterns of the first conductive pattern layer are arranged alternately; the light-absorbing pattern layer is further separated from the light-shielding conductive patterns of the first conductive pattern layer. The display device according to claim 2, wherein the light-absorbing pattern layer includes: a side wall portion covering the first side wall of the first insulating pattern layer and the second side wall of the second insulating pattern layer, separating the first side wall The light-shielding conductive patterns of a conductive pattern layer are separated from the light-shielding conductive patterns of the second conductive pattern layer, wherein the sidewall portion includes: a first sub-sidewall portion, wherein, in a top view of the display device, An edge of the first sub-sidewall part is located outside a corresponding light-shielding conductive pattern of the first conductive pattern layer, and the edge of the first sub-sidewall part is substantially parallel to the corresponding light-shielding conductive pattern of the first conductive pattern layer. an edge of the conductive pattern; and a second sub-sidewall portion, wherein, in the top view of the display device, an edge of the second sub-sidewall portion is located outside a corresponding light-shielding conductive pattern of the second conductive pattern layer, and The edge of the second sub-sidewall part is substantially parallel to an edge of the light-shielding conductive pattern corresponding to the second conductive pattern layer. The display device according to claim 3, wherein the light-absorbing pattern layer further includes: a first top portion, disposed on a top surface of the second insulating pattern layer facing away from the substrate, and connected to the first sub-sidewall portion , and overlap the corresponding light-shielding conductive pattern of the first conductive pattern layer; and A second top is disposed on the top surface of the second insulating pattern layer facing away from the substrate, connected to the second sub-sidewall portion, and overlapped with the corresponding light-shielding conductive pattern of the second conductive pattern layer. The display device according to claim 3, wherein each pixel structure includes an electrode and a light-emitting element electrically connected to the electrode, the electrode belongs to a third conductive pattern layer, and the third conductive pattern layer is arranged on the On the second insulating pattern layer, a plurality of electrodes of the pixel structures are arranged periodically, and the side wall portion further includes: a third sub-side wall portion, wherein, in the top view of the display device, the third sub-side wall An edge of the portion is located outside a corresponding electrode of the third conductive pattern layer, and the edge of the third sub-sidewall portion is substantially parallel to an edge of the corresponding electrode of the third conductive pattern layer. The display device according to claim 5, wherein the light-absorbing pattern layer further includes: a third top, disposed on a top surface of the second insulating pattern layer facing away from the substrate, and connected to the third sub-sidewall portion , and partially overlap the corresponding electrodes of the third conductive pattern layer. The display device according to claim 2, further comprising: a light-shielding pattern layer disposed on the first region of the substrate, between the first conductive pattern layer and the substrate, and shielding the first conductive pattern layer The light-shielding conductive patterns and the light-shielding conductive patterns of the second conductive pattern layer; and a third insulating pattern layer disposed on the light-shielding pattern layer and between the first conductive pattern layer and the light-shielding pattern layer , wherein the third insulating pattern layer has heavy A third opening stacked on the first opening and a third sidewall defining the third opening, and the light absorption pattern layer further covers the third sidewall. The display device according to claim 1, further comprising: an encapsulation layer covering the pixel structures and overlapping the first opening of the first insulating pattern layer and the second opening of the second insulating pattern layer and the light-transmitting opening of the light-absorbing pattern layer. The display device according to claim 1, further comprising: an encapsulation layer covering the pixel structures and filling the first opening of the first insulating pattern layer and the second opening of the second insulating pattern layer And in the light-transmitting opening of the light-absorbing pattern layer. The display device as claimed in claim 1, wherein the first insulating pattern layer comprises: a first main part overlapping the light-shielding conductive patterns of the first conductive pattern layer; and a first auxiliary part located on the first conductive pattern layer Between the light-shielding conductive patterns of a conductive pattern layer; wherein, the first sidewall defining the first opening of the first insulating pattern layer includes the sidewall of the first main part and the sidewall of the first main part that are opposite to each other and separated from each other. A side wall of the first auxiliary part, and the light absorption pattern layer covers the side wall of the first main part of the first insulating pattern layer and the side wall of the first auxiliary part of the first insulating pattern layer. The display device according to claim 10, wherein the first auxiliary portion of the first insulating pattern layer is located in the light-transmitting opening of the light-absorbing pattern layer. The display device according to claim 11, wherein the second insulating pattern layer comprises: a second main part overlapping the light-shielding conductive patterns of the first conductive pattern layer and disposed on the first insulating pattern layer on the first main portion; and a second auxiliary portion disposed on the first auxiliary portion of the first insulating pattern layer; wherein, the second sidewall defining the second opening of the second insulating pattern layer includes The side wall of the second main part and the side wall of the second auxiliary part are opposite and separated from each other, and the light absorption pattern layer further covers the side wall of the second main part and the first side wall of the second insulating pattern layer The sidewall of the second auxiliary portion of the second insulation pattern layer. The display device according to claim 12, wherein the second auxiliary portion of the second insulating pattern layer is located in the light-transmitting opening of the light-absorbing pattern layer.

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