TWI794382B - Stacked body for polarizing plate, polarizing plate, display device, and manufacturing method of polarizing plate - Google Patents
Stacked body for polarizing plate, polarizing plate, display device, and manufacturing method of polarizing plate Download PDFInfo
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- TWI794382B TWI794382B TW107147077A TW107147077A TWI794382B TW I794382 B TWI794382 B TW I794382B TW 107147077 A TW107147077 A TW 107147077A TW 107147077 A TW107147077 A TW 107147077A TW I794382 B TWI794382 B TW I794382B
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- polarizing plate
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- stacked body
- base film
- display device
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Images
Classifications
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- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
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- B29C55/00—Shaping by stretching, e.g. drawing through a die; Apparatus therefor
- B29C55/02—Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets
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- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
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- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
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- G—PHYSICS
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- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
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Abstract
一種偏光板用堆疊體,其係包含未延伸之聚乙烯醇樹脂薄膜與基材薄膜的堆疊體,前述聚乙烯醇樹脂薄膜的面內方向之相位差Re1為50 nm以下,且厚度T為45 μm以下,前述基材薄膜係由樹脂而成之薄膜,前述樹脂之在特定量測條件下所量測之熔流速率為1 g/10分鐘以上,且拉伸彈性模數E為50 MPa以上且1200 MPa以下,前述基材薄膜的延伸物之面內方向的相位差Re2為0 nm以上且20 nm以下。A stacked body for polarizing plates, which is a stacked body comprising an unstretched polyvinyl alcohol resin film and a base film, wherein the retardation Re1 in the in-plane direction of the aforementioned polyvinyl alcohol resin film is 50 nm or less, and the thickness T is 45 Below μm, the above-mentioned base film is a film made of resin, the melt flow rate of the above-mentioned resin measured under specific measurement conditions is 1 g/10 minutes or more, and the tensile elastic modulus E is 50 MPa or more And 1200 MPa or less, the retardation Re2 in the in-plane direction of the extension of the said base film is 0 nm or more and 20 nm or less.
Description
本發明係關於偏光板用堆疊體、偏光板、顯示裝置,以及偏光板的製造方法。The present invention relates to a stacked body for polarizing plates, a polarizing plate, a display device, and a method for manufacturing the polarizing plate.
作為液晶顯示裝置及有機電致發光(EL)顯示裝置等顯示裝置,以往以來便要求顯示面積大、重量輕且厚度薄者。因此,構成顯示裝置的面板亦自以往便要求較薄者。Display devices such as liquid crystal display devices and organic electroluminescent (EL) display devices have conventionally been required to have a large display area, light weight, and thin thickness. Therefore, panels constituting display devices have also been required to be thinner in the past.
在顯示裝置上,一般使用具備偏光件及保護偏光件之保護薄膜的偏光板。為了構成厚度薄的顯示裝置,偏光板亦要求較薄者。尤其,由於偏光件在顯示裝置的使用環境中有時會收縮,故在薄且面積大之顯示裝置中,此種收縮所致之彎曲可能成為問題。因此,藉由採用厚度10 μm以下般的薄偏光件,除了可期待偏光件厚度的減少本身所致之顯示裝置厚度的減少以外,還可期待如前所述之彎曲之發生的減少。In a display device, a polarizing plate provided with a polarizer and a protective film for protecting the polarizer is generally used. In order to form a thin display device, the polarizing plate is also required to be thinner. In particular, since the polarizer sometimes shrinks in the use environment of the display device, in a thin and large-area display device, bending caused by such shrinkage may become a problem. Therefore, by using a thin polarizer with a thickness of 10 μm or less, in addition to the reduction in the thickness of the display device due to the reduction in the thickness of the polarizer itself, the reduction in the occurrence of warping as described above can also be expected.
不過,在欲藉由以往的製造方法,製造此種厚度薄的聚乙烯醇之偏光件的情況下,偏光件的熔斷會頻繁發生。作為製造此種「防止偏光件之熔斷,且包含薄偏光件」之偏光板的方法,已提案有數種方法。However, when such a thin polyvinyl alcohol polarizer is to be manufactured by the conventional manufacturing method, melting of the polarizer frequently occurs. Several methods have been proposed as a method of manufacturing such a polarizing plate that "prevents melting of the polarizer and includes a thin polarizer".
例如在專利文獻1中,已提案將包含聚乙烯醇系樹脂之水溶液塗布於非晶質酯系熱塑性樹脂基材,藉此製造聚乙烯醇系樹脂層而做成堆疊體,並在對該堆疊體進行延伸處理後,使二色性物質定向而做成著色堆疊體,再對該著色堆疊體進行延伸處理而獲得光學薄膜的方法。For example, in Patent Document 1, it has been proposed to apply an aqueous solution containing a polyvinyl alcohol-based resin to an amorphous ester-based thermoplastic resin substrate, thereby manufacturing a polyvinyl alcohol-based resin layer to form a stack, and then After the body is stretched, the dichroic material is oriented to make a colored stack, and then the colored stack is stretched to obtain an optical film.
『專利文獻』 《專利文獻1》:日本專利第4691205號公報(對應公報:美國專利第8314987號說明書)"Patent Documents" "Patent Document 1": Japanese Patent No. 4691205 (corresponding publication: US Patent No. 8314987 specification)
在藉由專利文獻1所記載之方法製造薄偏光板的情況下,有時會因以高延伸倍率延伸堆疊體,而在延伸處理後的基材薄膜產生相位差。在此種情況下,由於難以將基材薄膜直接作為偏光板保護薄膜使用,而變得要剝離並廢棄,故會產生浪費的材料。再者,可能會增加另外準備用以保護偏光板的保護薄膜並貼附至偏光板的工作。In the case of manufacturing a thin polarizing plate by the method described in Patent Document 1, retardation may occur in the base film after the stretching process due to stretching the stacked body at a high stretching ratio. In such a case, since it is difficult to use the base film as it is as a polarizing plate protective film, it must be peeled off and discarded, resulting in wasteful material. Furthermore, the work of additionally preparing a protective film for protecting the polarizing plate and affixing it to the polarizing plate may be added.
因此,本發明之目的在於提供「即便將基材薄膜作為保護薄膜仍可使用,且即便厚度薄仍可有效率製造」的偏光板用堆疊體、具備前述堆疊體的偏光板及顯示裝置,以及前述偏光板的製造方法。Therefore, an object of the present invention is to provide a stacked body for polarizing plates that "can be used even if the base film is used as a protective film, and can be efficiently produced even if it is thin", a polarizing plate and a display device including the stacked body, and The manufacturing method of the aforementioned polarizing plate.
為解決上述問題而進行研究的結果,本發明人發現,藉由使用面內相位差與厚度為指定範圍內的聚乙烯醇樹脂薄膜,以及由具有能在低溫下以高倍率延伸之柔軟性的樹脂而成的基材薄膜,得解決上述問題,進而完成本發明。As a result of studies conducted to solve the above-mentioned problems, the present inventors have found that by using a polyvinyl alcohol resin film having an in-plane phase difference and a thickness within a specified range, and having flexibility capable of stretching at a low temperature at a high magnification The substrate film made of resin must solve the above-mentioned problems, and further complete the present invention.
因此,根據本發明,可提供下述〔1〕~〔15〕。Therefore, according to the present invention, the following [1] to [15] can be provided.
〔1〕一種偏光板用堆疊體,其係包含未延伸之聚乙烯醇樹脂薄膜與基材薄膜的偏光板用堆疊體,其中 前述聚乙烯醇樹脂薄膜的面內方向之相位差Re1為50 nm以下,且厚度T為45 μm以下, 前述基材薄膜係由樹脂而成之薄膜, 前述樹脂的熔流速率為1 g/10分鐘以上,前述熔流速率為在190℃、荷重2.16 kg下所量測之值, 前述樹脂的拉伸彈性模數E為50 MPa以上且1200 MPa以下, 前述基材薄膜的延伸物之面內方向的相位差Re2為0 nm以上且20 nm以下,前述相位差Re2係於在50℃~120℃之溫度條件下將前述偏光板用堆疊體自由端單軸延伸至6.0倍,而將前述基材薄膜做成前述延伸物時,前述延伸物所具有的相位差。[1] A stacked body for polarizing plates, which is a stacked body for polarizing plates comprising an unstretched polyvinyl alcohol resin film and a base film, wherein The retardation Re1 in the in-plane direction of the above-mentioned polyvinyl alcohol resin film is 50 nm or less, and the thickness T is 45 μm or less, The aforementioned base film is a film made of resin, The melt flow rate of the aforementioned resin is above 1 g/10 minutes, and the aforementioned melt flow rate is a value measured at 190°C under a load of 2.16 kg, The tensile modulus E of the aforementioned resin is 50 MPa or more and 1200 MPa or less, The retardation Re2 in the in-plane direction of the extension of the base film is not less than 0 nm and not more than 20 nm, and the retardation Re2 is obtained by placing the free end of the polarizing plate stack at a temperature of 50°C to 120°C. When the axis is extended to 6.0 times, and the above-mentioned base film is made into the above-mentioned extension, the retardation of the above-mentioned extension has.
〔2〕如〔1〕所記載之偏光板用堆疊體,其中 前述樹脂係環烯烴系樹脂, 前述環烯烴系樹脂包含環烯烴系聚合物, 前述環烯烴系聚合物係將嵌段共聚物[D]氫化後的嵌段共聚物氫化物,所述嵌段共聚物[D]係由: 以源自芳族乙烯化合物之重複單元[I]作為主成分的聚合物嵌段[A],與 以源自芳族乙烯化合物之重複單元[I]及源自鏈狀共軛二烯化合物之重複單元[II]作為主成分的聚合物嵌段[B],或以源自鏈狀共軛二烯化合物之重複單元[II]作為主成分的聚合物嵌段[C]而成。[2] The stacked body for polarizing plates according to [1], wherein The aforementioned resin is a cycloolefin resin, The aforementioned cycloolefin-based resin includes a cycloolefin-based polymer, The aforementioned cycloolefin-based polymer is a hydrogenated block copolymer obtained by hydrogenating the block copolymer [D], and the block copolymer [D] is composed of: A polymer block [A] mainly composed of a repeating unit [I] derived from an aromatic vinyl compound, and Polymer block [B] mainly composed of repeating unit [I] derived from aromatic vinyl compound and repeating unit [II] derived from chain conjugated diene compound, or polymer block [B] derived from chain conjugated diene compound The repeating unit [II] of an alkene compound is formed as a polymer block [C] of the main component.
〔3〕一種偏光板用堆疊體,其係包含未延伸之聚乙烯醇樹脂薄膜與基材薄膜的偏光板用堆疊體,其中 前述聚乙烯醇樹脂薄膜的面內方向之相位差Re1為50 nm以下,且厚度T為45 μm以下, 前述基材薄膜係由樹脂而成之薄膜, 前述樹脂係環烯烴系樹脂, 前述環烯烴系樹脂包含環烯烴系聚合物, 前述環烯烴系聚合物係將嵌段共聚物[D]氫化後的嵌段共聚物氫化物,所述嵌段共聚物[D]係由: 以源自芳族乙烯化合物之重複單元[I]作為主成分的聚合物嵌段[A],與 以源自芳族乙烯化合物之重複單元[I]及源自鏈狀共軛二烯化合物之重複單元[II]作為主成分的聚合物嵌段[B],或以源自鏈狀共軛二烯化合物之重複單元[II]作為主成分的聚合物嵌段[C]而成, 前述基材薄膜的延伸物之面內方向的相位差Re2為0 nm以上且20 nm以下,前述相位差Re2係於在50℃~120℃之溫度條件下將前述偏光板用堆疊體自由端單軸延伸至6.0倍,而將前述基材薄膜做成前述延伸物時,前述延伸物所具有的相位差。[3] A stacked body for polarizing plates, which is a stacked body for polarizing plates comprising an unstretched polyvinyl alcohol resin film and a base film, wherein The retardation Re1 in the in-plane direction of the above-mentioned polyvinyl alcohol resin film is 50 nm or less, and the thickness T is 45 μm or less, The aforementioned base film is a film made of resin, The aforementioned resin is a cycloolefin resin, The aforementioned cycloolefin-based resin includes a cycloolefin-based polymer, The aforementioned cycloolefin-based polymer is a hydrogenated block copolymer obtained by hydrogenating the block copolymer [D], and the block copolymer [D] is composed of: A polymer block [A] mainly composed of a repeating unit [I] derived from an aromatic vinyl compound, and Polymer block [B] mainly composed of repeating unit [I] derived from aromatic vinyl compound and repeating unit [II] derived from chain conjugated diene compound, or polymer block [B] derived from chain conjugated diene compound The repeating unit [II] of the olefinic compound is used as the polymer block [C] of the main component, The retardation Re2 in the in-plane direction of the extension of the base film is not less than 0 nm and not more than 20 nm, and the retardation Re2 is obtained by placing the free end of the polarizing plate stack at a temperature of 50°C to 120°C. When the axis is extended to 6.0 times, and the above-mentioned base film is made into the above-mentioned extension, the retardation of the above-mentioned extension has.
〔4〕如〔2〕或〔3〕所記載之偏光板用堆疊體,其中前述環烯烴系樹脂含有塑化劑、軟化劑或此等二者。[4] The polarizing plate stack according to [2] or [3], wherein the cycloolefin-based resin contains a plasticizer, a softener, or both.
〔5〕如〔4〕所記載之偏光板用堆疊體,其中前述塑化劑、前述軟化劑或此兩者係選自酯系塑化劑及脂族烴聚合物之一種以上。[5] The stacked body for polarizing plates according to [4], wherein the plasticizer, the softener, or both are one or more selected from ester-based plasticizers and aliphatic hydrocarbon polymers.
〔6〕如〔1〕~〔5〕之任一項所記載之偏光板用堆疊體,其中前述樹脂含有有機金屬化合物。[6] The laminate for polarizing plates according to any one of [1] to [5], wherein the resin contains an organometallic compound.
〔7〕如〔1〕~〔6〕之任一項所記載之偏光板用堆疊體,其中前述基材薄膜中介接合劑層而堆疊於前述聚乙烯醇樹脂薄膜。[7] The laminate for polarizing plates according to any one of [1] to [6], wherein the base film is stacked on the polyvinyl alcohol resin film through an adhesive layer.
〔8〕一種偏光板,其係將如〔1〕~〔7〕之任一項所記載之偏光板用堆疊體單軸延伸。[8] A polarizing plate obtained by uniaxially stretching the stacked body for polarizing plates according to any one of [1] to [7].
〔9〕如〔8〕所記載之偏光板,其中在前述偏光板之聚乙烯醇樹脂薄膜未堆疊前述基材薄膜的面上,具有保護薄膜或黏合劑。[9] The polarizing plate according to [8], wherein a protective film or an adhesive is provided on a surface of the polyvinyl alcohol resin film of the polarizing plate on which the base film is not stacked.
〔10〕如〔9〕所記載之偏光板,其中保護薄膜係由選自環烯烴樹脂、丙烯酸樹脂、聚對酞酸乙二酯樹脂及三乙醯纖維素樹脂之一種以上的樹脂而成。[10] The polarizing plate according to [9], wherein the protective film is made of one or more resins selected from cycloolefin resins, acrylic resins, polyethylene terephthalate resins, and triacetylcellulose resins.
〔11〕一種顯示裝置,其具有2片基板、位於其間的液晶層,以及 如〔8〕~〔10〕之任一項所記載之偏光板,所述偏光板配置於前述2片基板中之至少一基板的外側。[11] A display device having two substrates, a liquid crystal layer located therebetween, and The polarizing plate according to any one of [8] to [10], wherein the polarizing plate is disposed outside at least one of the two substrates.
〔12〕一種顯示裝置,其具有2片基板、位於其間的發光層,以及 如〔8〕~〔10〕之任一項所記載之偏光板,所述偏光板配置於前述2片基板中之一基板的外側。[12] A display device having two substrates, a light emitting layer therebetween, and The polarizing plate according to any one of [8] to [10], wherein the polarizing plate is disposed outside one of the two substrates.
〔13〕如〔11〕所記載之顯示裝置,其中前述偏光板之聚乙烯醇樹脂薄膜與前述液晶層之間,設置有該偏光板之基材薄膜。[13] The display device according to [11], wherein a base film of the polarizing plate is provided between the polyvinyl alcohol resin film of the polarizing plate and the liquid crystal layer.
〔14〕如〔12〕所記載之顯示裝置,其中前述偏光板之聚乙烯醇樹脂薄膜與前述發光層之間,設置有該偏光板之基材薄膜。[14] The display device according to [12], wherein a base film of the polarizing plate is provided between the polyvinyl alcohol resin film of the polarizing plate and the light-emitting layer.
〔15〕一種偏光板的製造方法,其包含將如〔1〕~〔7〕之任一項所記載之偏光板用堆疊體單軸延伸的工序。[15] A method for producing a polarizing plate, comprising the step of uniaxially stretching the stacked body for polarizing plates according to any one of [1] to [7].
根據本發明,可提供「即便將基材薄膜作為保護薄膜仍可使用,且即便厚度薄仍可有效率製造」的偏光板用堆疊體、使用前述堆疊體的偏光板及顯示裝置,以及使用前述堆疊體之偏光板的製造方法。According to the present invention, it is possible to provide a stacked body for polarizing plates that "can be used even if the base film is used as a protective film, and can be efficiently manufactured even if it is thin", a polarizing plate and a display device using the stacked body, and a polarizing plate using the aforementioned stacked body. The manufacturing method of the polarizing plate of the stacked body.
以下揭示實施型態及示例物以詳細說明本發明。惟本發明並非受以下所說明之實施型態及示例物所限定者,在不脫離本發明之申請專利範圍及其均等範圍的範圍,亦可任意變更而實施。Embodiments and examples are disclosed below to describe the present invention in detail. However, the present invention is not limited by the implementation forms and examples described below, and can be implemented with arbitrary changes without departing from the patent scope of the present invention and its equivalent scope.
在本申請中,所謂「長條狀」之薄膜,係指相對於薄膜之幅寬,具有5倍以上之長度者,以具有10倍或其以上之長度為佳,具體而言係指具有可收捲成輥狀儲存或搬運之程度的長度者。相對於薄膜之幅寬的長度之比例的上限並不特別受限,但得定為例如:100,000倍以下。In this application, the so-called "strip-shaped" film refers to a film with a length of 5 times or more, preferably 10 times or more, with respect to the width of the film. Rolled into rolls with a length sufficient for storage or transportation. The upper limit of the ratio of the length to the width of the film is not particularly limited, but may be set at, for example, 100,000 times or less.
在本申請中,薄膜之面內方向的相位差Re及厚度方向的相位差Rth,係依循式Re=(nx-ny)×d及Rth={[(nx+ny)/2]-nz}×d而算出。並且薄膜的Nz係數係由[(nx-nz)/(nx-ny)]所表示之值,亦得表示為[(Rth/Re)+0.5]。於此,nx係薄膜之面內之慢軸方向的折射率(面內的最大折射率),ny係垂直於薄膜之面內之慢軸之面內方向的折射率,nz係薄膜之厚度方向的折射率,d係薄膜的厚度(nm)。量測波長,除非另有註記,否則設成係為可見光區域的代表性波長550 nm。In this application, the retardation Re in the in-plane direction of the film and the retardation Rth in the thickness direction follow the formula Re=(nx-ny)×d and Rth={[(nx+ny)/2]-nz}×d And figured out. And the Nz coefficient of the thin film is a value represented by [(nx-nz)/(nx-ny)], which can also be expressed as [(Rth/Re)+0.5]. Here, nx is the refractive index in the direction of the slow axis in the plane of the film (the maximum refractive index in the plane), ny is the refractive index in the direction perpendicular to the slow axis in the plane of the film, and nz is the thickness direction of the film The refractive index, the thickness (nm) of the d-series film. The measurement wavelength, unless otherwise noted, is set to be a representative wavelength of 550 nm in the visible light region.
[實施型態1:偏光板用堆疊體及偏光板][Example 1: Stacked body for polarizing plates and polarizing plates]
以下參照圖1~圖4,同時說明係為本發明之一實施型態之實施型態1的偏光板用堆疊體,以及使用該堆疊體所製造的偏光板及其製造方法。The stacked body for polarizing plates according to Embodiment 1 which is one embodiment of the present invention, the polarizing plate manufactured using the stacked body, and its manufacturing method will be described below with reference to FIGS. 1 to 4 .
[1.偏光板用堆疊體][1. Stacked body for polarizing plates]
本發明之偏光板用堆疊體(以下亦僅稱作「堆疊體」)包含未延伸之聚乙烯醇樹脂薄膜與基材薄膜。圖1係繪示本發明相關之實施型態1之堆疊體10的剖面示意圖之一例。如圖1所示,本實施型態之堆疊體10包含未延伸之聚乙烯醇樹脂薄膜11與設置於聚乙烯醇樹脂薄膜11之上的基材薄膜12。在圖1中,13係接合聚乙烯醇樹脂薄膜11與基材薄膜12的接合劑。本發明之堆疊體10係為用以製造偏光件(偏光板)的材料。The stacked body for polarizing plates of the present invention (hereinafter also simply referred to as "stacked body") includes an unstretched polyvinyl alcohol resin film and a base film. FIG. 1 is an example of a schematic cross-sectional view of a
[聚乙烯醇樹脂薄膜][Polyvinyl alcohol resin film]
在本發明中,聚乙烯醇樹脂薄膜係面內方向之相位差Re1為50 nm以下,且厚度T為45 μm以下的薄膜。聚乙烯醇樹脂薄膜係由聚乙烯醇樹脂(以下有時將「聚乙烯醇」簡稱為「PVA」。)而成的未延伸之薄膜。在本申請中,所謂「未延伸之薄膜」,係指未供予延伸處理者。In the present invention, the polyvinyl alcohol resin film is a film having a retardation Re1 in the in-plane direction of 50 nm or less and a thickness T of 45 μm or less. Polyvinyl alcohol resin film is an unstretched film made of polyvinyl alcohol resin (hereinafter, "polyvinyl alcohol" is sometimes abbreviated as "PVA"). In this application, the so-called "unstretched film" refers to one that has not been subjected to stretching treatment.
在本發明中,作為PVA樹脂薄膜(聚乙烯醇樹脂薄膜)並不一定受限,但就取得性等而言,以使用藉由將聚合乙酸乙烯酯而獲得之聚乙酸乙烯酯皂化而製造者為佳。PVA樹脂所包含之PVA,就延伸性或可獲得之偏光件的偏光性能等優異的觀點而言,聚合度以位於500~8000之範圍為佳,皂化度以90莫耳%以上為佳。於此所謂聚合度,係遵循JIS K6726-1994之記載而量測到的平均聚合度,所謂皂化度,係遵循JIS K6726-1994之記載而量測到的值。聚合度之較佳範圍為1000~6000,以1500~4000為更佳。皂化度之較佳範圍為95莫耳%以上,以99莫耳%以上為更佳。PVA亦可為乙酸乙烯酯與能共聚合之其他單體的共聚合物或接枝聚合物。In the present invention, the PVA resin film (polyvinyl alcohol resin film) is not necessarily limited, but in terms of availability, etc., it can be produced by using polyvinyl acetate obtained by polymerizing vinyl acetate to saponify better. The PVA contained in the PVA resin preferably has a degree of polymerization in the range of 500 to 8000, and a degree of saponification of 90 mol% or more, from the viewpoint of excellent extensibility and the polarizing performance of an obtainable polarizer. Here, the degree of polymerization is an average degree of polymerization measured in accordance with the description of JIS K6726-1994, and the degree of saponification is a value measured in accordance with the description of JIS K6726-1994. The preferred range of the degree of polymerization is 1000-6000, more preferably 1500-4000. The preferred range of saponification degree is above 95 mole%, more preferably above 99 mole%. PVA can also be a copolymer or graft polymer of vinyl acetate and other copolymerizable monomers.
在本發明中,PVA樹脂薄膜的製法並不特別受限,可藉由眾所周知的方法等任意方法製造。作為製法之例,可舉出:以將PVA溶解於溶劑之PVA溶液作為製膜原液使用之依流延製膜法、濕式製膜法(向不良溶劑中排出)、乾濕式製膜法、凝膠製膜法(先將PVA水溶液冷卻凝膠化後,抽離去除溶劑,獲得PVA樹脂薄膜的方法)及此等之組合的方法。作為製法之另一例,可舉出:以將含有溶劑的PVA熔融後之物作為製膜原液來進行的熔融擠製製膜法。此等之中,就可獲得透明性高且著色少的PVA之樹脂薄膜而言以流延製膜法及熔融擠製製膜法為佳,以熔融擠製製膜法為較佳。In this invention, the manufacturing method of a PVA resin film is not specifically limited, It can manufacture by arbitrary methods, such as a well-known method. Examples of production methods include: cast film production using a PVA solution in which PVA is dissolved in a solvent as a film production stock solution, wet film production (draining into a poor solvent), dry and wet film production , Gel film-making method (first cooling the PVA aqueous solution to gel, then extracting and removing the solvent to obtain a PVA resin film) and a combination of these methods. As another example of the production method, there may be mentioned a melt-extrusion film-forming method in which a melted PVA containing a solvent is used as a film-forming stock solution. Among them, the cast film-forming method and the melt-extrusion film-forming method are preferable, and the melt-extrusion film-forming method is more preferable because a resin film of PVA having high transparency and little coloring can be obtained.
在本發明中,PVA樹脂薄膜,為了改善機械物理性質或二次加工時之作業順暢性等,以相對於PVA含有甘油等多元醇等塑化劑0.01~30重量%為佳,並且為了改善操作性或薄膜外觀等,以相對於PVA含有陰離子系界面活性劑、非離子系界面活性劑等界面活性劑0.01~1重量%為佳。In the present invention, the PVA resin film preferably contains 0.01 to 30% by weight of plasticizers such as glycerin and other polyols relative to the PVA in order to improve mechanical physical properties or smooth operation during secondary processing, and in order to improve handling It is preferable to contain 0.01 to 1% by weight of surfactants, such as anionic surfactants and nonionic surfactants, relative to PVA, in terms of properties or film appearance.
PVA樹脂薄膜亦可視需要更包含抗氧化劑、紫外線吸收劑、滑劑、pH調整劑、無機物微粒子、著色劑、防腐劑、滅真菌劑、上述成分以外的其他高分子化合物、水分等任意成分。PVA樹脂薄膜可包含前述任意成分之1種或2種以上。The PVA resin film may further contain optional components such as antioxidants, ultraviolet absorbers, slip agents, pH adjusters, inorganic fine particles, colorants, preservatives, fungicides, other polymers other than the above-mentioned components, and water. The PVA resin film may contain one or two or more of the aforementioned arbitrary components.
PVA樹脂薄膜的厚度T為45 μm以下,以35 μm以下為佳,以25 μm以下為較佳,以20 μm以下為更佳,且以5 μm以上為佳,以10 μm以上為較佳,以15 μm以上為更佳。藉由PVA樹脂薄膜的厚度為前述範圍之上限值以下,可有效降低偏光板的收縮力,且藉由為前述範圍之下限值以上,可獲得具有充分高之偏光性能的偏光板。The thickness T of the PVA resin film is 45 μm or less, preferably 35 μm or less, more preferably 25 μm or less, more preferably 20 μm or less, and preferably 5 μm or more, preferably 10 μm or more, More than 15 μm is more preferable. When the thickness of the PVA resin film is not more than the upper limit of the above-mentioned range, the shrinkage force of the polarizing plate can be effectively reduced, and by being more than the lower limit of the above-mentioned range, a polarizing plate having sufficiently high polarizing performance can be obtained.
PVA樹脂薄膜之面內方向的相位差Re1為50 nm以下,以40 nm以下為佳,以30 nm以下為較佳,以20 nm以下為更佳,且以0 nm以上為佳,以3 nm以上為較佳。藉由PVA樹脂薄膜之面內方向的相位差Re1為上述範圍之上限值以下,可以充分之倍率延伸堆疊體,而可獲得高偏光性能的偏光板。The retardation Re1 in the in-plane direction of the PVA resin film is 50 nm or less, preferably 40 nm or less, more preferably 30 nm or less, more preferably 20 nm or less, and preferably 0 nm or more, and 3 nm or less The above is preferred. When the retardation Re1 in the in-plane direction of the PVA resin film is not more than the upper limit of the above-mentioned range, the stacked body can be stretched at a sufficient magnification, and a polarizing plate with high polarizing performance can be obtained.
PVA樹脂薄膜的形狀及尺寸,得適當調整成相應於期望之用途者。在製造效率上,PVA樹脂薄膜以長條狀的薄膜為佳。The shape and size of the PVA resin film may be appropriately adjusted to correspond to the intended use. In terms of manufacturing efficiency, the PVA resin film is preferably a strip-shaped film.
[基材薄膜][Substrate film]
基材薄膜係有別於PVA樹脂薄膜的層體,乃由樹脂而成之薄膜。在本發明中,形成基材薄膜的樹脂係具有能在低溫(例如50~120℃)下以高延伸倍率(例如6.0倍)延伸之柔軟性的樹脂。在本發明中,形成基材薄膜的樹脂係熔流速率為1 g/10分鐘以上,且拉伸彈性模數E為50 MPa以上且1200 MPa以下的樹脂(樹脂A),或者係包含指定之環烯烴系聚合物的環烯烴系樹脂(樹脂B)。The substrate film is a layer body different from the PVA resin film, and is a film made of resin. In the present invention, the resin forming the base film is a flexible resin that can be stretched at a high stretch ratio (eg, 6.0 times) at a low temperature (eg, 50 to 120° C.). In the present invention, the resin (resin A) that forms the base film has a melt flow rate of 1 g/10 min or more and a tensile modulus E of 50 MPa or more and 1200 MPa or less, or contains specified A cycloolefin-based resin (resin B) of a cycloolefin-based polymer.
[樹脂A][Resin A]
在本發明中,形成基材薄膜之樹脂A的熔流速率為1 g/10分鐘以上,以3 g/10分鐘以上為佳,以5 g/10分鐘以上為較佳,且以300 g/10分鐘以下為佳,以100 g/10分鐘以下為較佳。此處所述之熔流速率係在190℃、荷重2.16 kg下所量測到的值。以下亦僅將「在190℃、荷重2.16 kg下所量測到之熔流速率」稱作「MFR」。藉由使樹脂A的MFR為下限值以上,可在做成偏光板時壓低相位差,而藉由使MFR為上限值以下,可提高耐熱性。In the present invention, the melt flow rate of the resin A forming the base film is 1 g/10 minutes or more, preferably 3 g/10 minutes or more, preferably 5 g/10 minutes or more, and 300 g/10 minutes or more. It is better to be less than 10 minutes, and it is better to be less than 100 g/10 minutes. The melt flow rate mentioned here is the value measured at 190°C under a load of 2.16 kg. Hereinafter, only the "melt flow rate measured at 190°C under a load of 2.16 kg" is referred to as "MFR". By making MFR of resin A more than the lower limit, retardation can be suppressed at the time of making a polarizing plate, and heat resistance can be improved by making MFR below the upper limit.
樹脂A之MFR,得依循JIS-K-7210,使用熔流指數機(MELT INDEXER),在溫度190℃、荷重2.16 kg的條件下量測。The MFR of resin A must be measured in accordance with JIS-K-7210 using a melt flow indexer (MELT INDEXER) at a temperature of 190°C and a load of 2.16 kg.
在本發明中,形成基材薄膜之樹脂A的拉伸彈性模數E為50 MPa以上,以100 MPa以上為佳,以200 MPa以上為較佳,且為1200 MPa以下,以1000 MPa以下為佳,以800 MPa以下為較佳。藉由使樹脂A的拉伸彈性模數E為下限值以上,可在延伸堆疊體以做成偏光板時減小基材薄膜的相位差,藉由使之為上限值以下,可在延伸堆疊體時防止基材薄膜之斷裂的發生。In the present invention, the tensile elastic modulus E of the resin A forming the base film is 50 MPa or more, preferably 100 MPa or more, preferably 200 MPa or more, and is 1200 MPa or less, and 1000 MPa or less. Better, preferably below 800 MPa. By making the tensile modulus E of resin A equal to or greater than the lower limit, the retardation of the base film can be reduced when stretching the stacked body to form a polarizing plate, and by making it equal to or less than the upper limit, it is possible to The occurrence of breakage of the substrate film is prevented when the stack is stretched.
形成基材薄膜之樹脂A,只要係MFR為1 g/10分鐘以上,且拉伸彈性模數E為50 MPa以上且1200 MPa以下的樹脂,則並無特別限定,作為此種樹脂,就透明性及水蒸氣阻隔性優異這點而言,以包含環烯烴系聚合物的環烯烴系樹脂為佳。The resin A forming the base film is not particularly limited as long as it is a resin with an MFR of 1 g/10 min or more and a tensile modulus E of 50 MPa or more and 1200 MPa or less. Such a resin is transparent From the point of view of excellent performance and water vapor barrier properties, cycloolefin-based resins containing cycloolefin-based polymers are preferable.
作為前述環烯烴系聚合物,以將嵌段共聚物[D]氫化後的嵌段共聚物氫化物為佳,所述嵌段共聚物[D]係由:以源自芳族乙烯化合物之重複單元[I]作為主成分的聚合物嵌段[A],與以源自芳族乙烯化合物之重複單元[I]及源自鏈狀共軛二烯化合物之重複單元[II]作為主成分的聚合物嵌段[B]或以源自鏈狀共軛二烯化合物之重複單元[II]作為主成分的聚合物嵌段[C]而成。作為此種嵌段共聚物氫化物,可列舉:WO2000/32646號公報、WO2001/081957號、日本專利公開第2002-105151號公報、日本專利公開第2006-195242號公報、日本專利公開第2011-13378號公報、WO2015/002020號等所記載之聚合物。As the aforementioned cycloolefin-based polymer, a hydrogenated block copolymer obtained by hydrogenating a block copolymer [D] composed of a repeating compound derived from an aromatic vinyl compound is preferable. The polymer block [A] mainly composed of the unit [I], and the repeating unit [I] derived from an aromatic vinyl compound and the repeating unit [II] derived from a chain conjugated diene compound. The polymer block [B] or the polymer block [C] mainly consists of a repeating unit [II] derived from a chain-like conjugated diene compound. Examples of such hydrogenated block copolymers include: WO2000/32646, WO2001/081957, Japanese Patent Laid-Open No. 2002-105151, Japanese Patent Laid-Open No. 2006-195242, Japanese Patent Laid-Open No. 2011- Polymers described in Publication No. 13378, WO2015/002020, etc.
[樹脂B][resin B]
在本發明中,形成基材薄膜之樹脂B係包含環烯烴系聚合物的環烯烴系樹脂。樹脂B所包含之環烯烴系聚合物係將嵌段共聚物[D]氫化後的嵌段共聚物氫化物,所述嵌段共聚物[D]係由:以源自芳族乙烯化合物之重複單元[I]作為主成分的聚合物嵌段[A],與以源自芳族乙烯化合物之重複單元[I]及源自鏈狀共軛二烯化合物之重複單元[II]作為主成分的聚合物嵌段[B]或以源自鏈狀共軛二烯化合物之重複單元[II]作為主成分的聚合物嵌段[C]而成。作為此種嵌段共聚物氫化物,可使用與「可合適使用作為樹脂A的前揭嵌段共聚物氫化物」相同者。In the present invention, the resin B forming the base film is a cycloolefin-based resin containing a cycloolefin-based polymer. The cycloolefin-based polymer contained in the resin B is a hydrogenated block copolymer obtained by hydrogenating a block copolymer [D] composed of repeating compounds derived from aromatic vinyl compounds. The polymer block [A] mainly composed of the unit [I], and the repeating unit [I] derived from an aromatic vinyl compound and the repeating unit [II] derived from a chain conjugated diene compound. The polymer block [B] or the polymer block [C] mainly consists of a repeating unit [II] derived from a chain-like conjugated diene compound. As such a hydrogenated block copolymer, the same thing as "the hydrogenated block copolymer disclosed above can be suitably used as the resin A" can be used.
形成基材薄膜之樹脂B,亦可係MFR為1 g/10分鐘以上,且拉伸彈性模數E為50 MPa以上且1200 MPa以下的樹脂。The resin B forming the base film may be a resin having an MFR of 1 g/10 min or more and a tensile modulus E of 50 MPa or more and 1200 MPa or less.
[塑化劑及軟化劑][Plasticizer and softener]
在本發明中,形成基材薄膜之樹脂(樹脂A及樹脂B),以含有塑化劑及/或軟化劑(塑化劑及軟化劑之中之任一者或兩者)為佳。藉由含有塑化劑及/或軟化劑,可減小在延伸堆疊體而獲得偏光板時於基材薄膜產生的相位差。In the present invention, the resin (resin A and resin B) forming the base film preferably contains a plasticizer and/or a softener (either or both of the plasticizer and the softener). By containing a plasticizer and/or a softener, it is possible to reduce the retardation generated in the base film when stretching a stacked body to obtain a polarizing plate.
作為塑化劑及軟化劑,得使用可均勻溶解乃至於分散至形成基材薄膜之樹脂者。作為塑化劑及軟化劑之具體例,可列舉:由多元醇與一元羧酸而成之酯系塑化劑(以下稱作「多元醇酯系塑化劑」。)及由多元羧酸與一元醇而成之酯系塑化劑(以下稱作「多元羧酸酯系塑化劑」。)等酯系塑化劑,以及磷酸酯系塑化劑、醣酯系塑化劑及其他聚合物軟化劑。As plasticizers and softeners, resins that can be uniformly dissolved or even dispersed to form a base film can be used. Specific examples of plasticizers and softeners include ester-based plasticizers composed of polyhydric alcohols and monocarboxylic acids (hereinafter referred to as "polyol ester-based plasticizers"), and ester-based plasticizers composed of polyhydric carboxylic acids and monocarboxylic acids. Ester-based plasticizers made of monohydric alcohols (hereinafter referred to as "polycarboxylic acid ester-based plasticizers") and other ester-based plasticizers, as well as phosphate-based plasticizers, sugar-ester-based plasticizers, and other polymeric material softener.
作為在本發明中係為良佳使用之酯系塑化劑之原料的多元醇之例,並不特別受限,但以乙二醇、甘油、三羥甲基丙烷為佳。Examples of the polyhydric alcohol that is a raw material of the ester-based plasticizer favorably used in the present invention are not particularly limited, but ethylene glycol, glycerin, and trimethylolpropane are preferable.
作為多元醇酯系塑化劑之例,可列舉:乙二醇酯系塑化劑、甘油酯系塑化劑及其他多元醇酯系塑化劑。Examples of polyol ester plasticizers include ethylene glycol ester plasticizers, glycerin ester plasticizers, and other polyol ester plasticizers.
作為多元羧酸酯系塑化劑之例,可列舉:二羧酸酯系塑化劑及其他多元羧酸酯系塑化劑。As an example of a polybasic carboxylate plasticizer, a dicarboxylate plasticizer and other polybasic carboxylate plasticizers are mentioned.
作為磷酸酯系塑化劑之例,具體而言可列舉:磷酸三乙醯酯、磷酸三丁酯等磷酸烷酯;磷酸三環戊酯、磷酸環己酯等磷酸環烷酯;磷酸三苯酯、磷酸三甲苯酯等磷酸芳酯。Examples of phosphate-based plasticizers include: alkyl phosphates such as triacetyl phosphate and tributyl phosphate; cycloalkyl phosphates such as tricyclopentyl phosphate and cyclohexyl phosphate; triphenyl phosphate Phosphate esters, tricresyl phosphate and other aryl phosphate esters.
作為醣酯系塑化劑,具體而言可列舉以五乙酸葡萄糖酯、五丙酸葡萄糖酯、五丁酸葡萄糖酯、八乙酸蔗糖酯、八苯甲酸蔗糖酯等為佳,在此之內以八乙酸蔗糖酯為較佳。As the sugar ester-based plasticizer, specifically, glucose pentaacetate, glucose pentapropionate, glucose pentabutyrate, sucrose octaacetate, sucrose octabenzoate, etc. are preferred, among which Sucrose octaacetate is preferred.
作為聚合物軟化劑,具體而言可列舉:脂族烴聚合物、脂環烴系聚合物、聚丙烯酸乙酯、聚甲基丙烯酸甲酯、甲基丙烯酸甲酯與甲基丙烯酸-2-羥乙酯的共聚物、甲基丙烯酸甲酯與丙烯酸甲酯與甲基丙烯酸-2-羥乙酯的共聚物等丙烯酸系聚合物;聚乙烯基異丁基醚、聚-N-乙烯氫吡咯酮等乙烯系聚合物;聚苯乙烯、聚-4-羥苯乙烯等苯乙烯系聚合物;聚丁二酸丁二酯、聚對酞酸乙二酯、聚萘二甲酸乙二酯等聚酯;聚環氧乙烷、聚環氧丙烷等聚醚;聚醯胺、聚胺甲酸酯、聚脲等。Specific examples of polymer softeners include aliphatic hydrocarbon polymers, alicyclic hydrocarbon polymers, polyethyl acrylate, polymethyl methacrylate, methyl methacrylate, and 2-hydroxymethacrylate. Acrylic polymers such as copolymers of ethyl esters, copolymers of methyl methacrylate and methyl acrylate with 2-hydroxyethyl methacrylate; polyvinyl isobutyl ether, poly-N-vinylhydropyrrolidone Ethylene-based polymers such as polystyrene, poly-4-hydroxystyrene and other styrene-based polymers; polybutylene succinate, polyethylene terephthalate, polyethylene naphthalate and other polyesters ; Polyethylene oxide, polypropylene oxide and other polyethers; polyamide, polyurethane, polyurea, etc.
作為脂族烴聚合物之具體例,可列舉:聚異丁烯、聚丁烯、聚-4-甲基戊烯、聚-1-辛烯、乙烯―α-烯烴共聚物等之低分子量物及其氫化物;聚異戊二烯、聚異戊二烯―丁二烯共聚物等之低分子量物及其氫化物等。就易於均勻溶解乃至於分散至環烯烴樹脂的觀點而言,脂族烴系聚合物以數量平均分子量為300~5,000為佳。Specific examples of aliphatic hydrocarbon polymers include low molecular weight products such as polyisobutene, polybutene, poly-4-methylpentene, poly-1-octene, ethylene-α-olefin copolymers, and their Hydrides; low molecular weight substances of polyisoprene, polyisoprene-butadiene copolymer, etc., and their hydrogenates, etc. From the viewpoint of easy uniform dissolution and even dispersion in the cycloolefin resin, the number average molecular weight of the aliphatic hydrocarbon polymer is preferably 300-5,000.
此等聚合物軟化劑可為由1種重複單元而成之均聚物,亦可為具有多種重複結構物的共聚物。並且,亦可將上述聚合物合併2種以上使用。These polymer softeners may be homopolymers consisting of one type of repeating unit, or copolymers having multiple repeating structures. In addition, the above-mentioned polymers may be used in combination of two or more.
在本發明中,作為塑化劑及/或軟化劑,就與形成基材薄膜之樹脂的相容性尤為優異而言,以選自酯系塑化劑及脂族烴聚合物之一種以上為佳。In the present invention, as the plasticizer and/or softener, one or more selected from ester plasticizers and aliphatic hydrocarbon polymers are selected from the viewpoint of excellent compatibility with the resin forming the substrate film. good.
在基材薄膜中之塑化劑及/或軟化劑(以下亦稱作「塑化劑等」)的比例,相對於形成基材薄膜之樹脂100重量份,以0.2重量份以上為佳,以0.5重量份以上為較佳,以1.0重量份以上更為較佳,另一方面以50重量份以下為佳,以40重量份以下為較佳。藉由將塑化劑等之比例定為前述範圍內,即便歷經包含延伸處理之偏光板的製造工序,仍可將基材薄膜做成相位差之顯現性為足夠低者。The proportion of the plasticizer and/or softener (hereinafter also referred to as "plasticizer, etc.") in the base film is preferably 0.2 parts by weight or more, with respect to 100 parts by weight of the resin forming the base film, and at least It is preferably at least 0.5 parts by weight, more preferably at least 1.0 parts by weight, on the other hand, it is preferably at most 50 parts by weight, and more preferably at most 40 parts by weight. By setting the ratio of the plasticizer and the like within the above-mentioned range, the base film can be made to have sufficiently low phase difference development even through the production process of the polarizing plate including stretching.
[有機金屬化合物][Organometallic compound]
在本發明中,基材薄膜以含有有機金屬化合物為佳。藉由包含有機金屬化合物,可更有效抑制在以高延伸倍率延伸堆疊體(例如以延伸倍率6.0進行濕式延伸)的情形中基材薄膜之剝離的發生。In the present invention, the base film preferably contains an organometallic compound. By including the organometallic compound, it is possible to more effectively suppress the occurrence of peeling of the base film in the case of stretching the stack at a high stretching ratio (for example, wet stretching at a stretching ratio of 6.0).
有機金屬化合物係包含金屬與碳的化學鍵以及金屬與氧的化學鍵之至少一者的化合物,且係具有有機基的金屬化合物。作為有機金屬化合物,可列舉:有機矽化合物、有機鈦化合物、有機鋁化合物、有機鋯化合物等。此等之中,以有機矽化合物、有機鈦化合物及有機鋯化合物為佳,就與聚乙烯醇之反應性優異而言以有機矽化合物為較佳。有機金屬化合物亦可使用一種或組合二種以上使用。The organometallic compound is a compound containing at least one of a chemical bond between a metal and carbon and a chemical bond between a metal and oxygen, and is a metal compound having an organic group. Examples of organometallic compounds include organosilicon compounds, organotitanium compounds, organoaluminum compounds, and organozirconium compounds. Among them, organosilicon compounds, organotitanium compounds, and organozirconium compounds are preferable, and organosilicon compounds are more preferable because of excellent reactivity with polyvinyl alcohol. Organometallic compounds can also be used alone or in combination of two or more.
作為有機金屬化合物,可舉出例如:由下述式(1)所表示之有機矽化合物,但不受限於此。 R1 a Si(OR2 )3−a (1) (在式(1)中,R1 及R2 分別獨立,表示選自由氫原子、鹵素原子、碳原子數1~10的烴基、環氧基、胺基、巰基、異氰酸基及碳原子數1~10的有機基而成之群組之基,a表示0~3的整數。)Examples of organometallic compounds include organosilicon compounds represented by the following formula (1), but are not limited thereto. R 1 a Si(OR 2 ) 3−a (1) (In formula (1), R 1 and R 2 are independently selected from hydrogen atom, halogen atom, hydrocarbon group with 1 to 10 carbon atoms, epoxy group, amino group, mercapto group, isocyanate group and organic group with 1 to 10 carbon atoms, a represents an integer of 0 to 3.)
在式(1)中,若要舉出佳例作為R1 ,可列舉:環氧基、胺基、巰基、異氰酸基、乙烯基、芳基、丙烯醯基、碳原子數1~8的烷基、-CH2 OCn H2n + 1 (n代表1~4的整數。)等。In formula (1), if R 1 is to be cited as a preferable example, epoxy group, amine group, mercapto group, isocyanate group, vinyl group, aryl group, acryl group, carbon number 1 to 8 Alkyl group, -CH 2 OC n H 2n + 1 (n represents an integer from 1 to 4.), etc.
並且,在式(1)中,若要舉出佳例作為R2 ,可列舉:氫原子、乙烯基、芳基、丙烯醯基、碳原子數1~8的烷基、-CH2 OCn H2n + 1 (n代表1~4的整數。)等。In addition, in the formula (1), as R 2 , preferable examples include: a hydrogen atom, a vinyl group, an aryl group, an acryl group, an alkyl group having 1 to 8 carbon atoms, and -CH 2 OC n H 2n + 1 (n represents an integer from 1 to 4.) etc.
作為有機矽化合物之例,可列舉:3-環氧丙氧基丙基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷等環氧系有機矽化合物、3-胺基丙基三甲氧基矽烷、N-2-(胺基乙基)-3-胺基丙基三甲氧基矽烷等胺系有機矽化合物、三聚異氰酸(三甲氧基矽基丙基)酯等異氰酸酯系有機矽化合物、3-巰基丙基三甲氧基矽烷等巰系有機矽化合物、3-異氰酸丙酯基三乙氧基矽烷等異氰酸酯系有機矽化合物。Examples of organosilicon compounds include epoxy-based organosilicon compounds such as 3-glycidoxypropyltrimethoxysilane and 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-Aminopropyltrimethoxysilane, N-2-(Aminoethyl)-3-Aminopropyltrimethoxysilane and other amine organosilicon compounds, isocyanuric acid (trimethoxysilyl Isocyanate-based organosilicon compounds such as propyl) ester, mercapto-based organosilicon compounds such as 3-mercaptopropyltrimethoxysilane, and isocyanate-based organosilicon compounds such as 3-isocyanatopropyltriethoxysilane.
作為有機鈦化合物之例,可列舉:鈦酸四異丙酯等烷氧化鈦、乙醯丙酮鈦等鈦螯合物、異硬脂酸鈦等醯氧鈦。Examples of organic titanium compounds include titanium alkoxides such as tetraisopropyl titanate, titanium chelate compounds such as titanium acetylacetonate, and titanium acyl oxides such as titanium isostearate.
作為有機鋯化合物之例,可列舉:鋯酸正丙酯等烷氧化鋯、四乙醯丙酮鋯等鋯螯合物、硬脂酸鋯等醯氧鋯。Examples of organic zirconium compounds include zirconium alkoxides such as n-propyl zirconate, zirconium chelates such as zirconium tetraacetylacetonate, and zirconyl acyl oxides such as zirconium stearate.
作為有機鋁化合物之例,可列舉:二級丁基氧化鋁等烷氧化鋁、三乙醯丙酮鋁等鋁螯合物。Examples of the organoaluminum compound include aluminum alkoxides such as secondary butylalumina and aluminum chelates such as aluminum triacetylacetonate.
在基材薄膜中之有機金屬化合物的比例,相對於形成基材薄膜之樹脂100重量份,以0.005重量份以上為佳,以0.01重量份以上為較佳,以0.03重量份以上更為較佳,另一方面以1.0重量份以下為佳,以0.5重量份以下為較佳。藉由將有機金屬化合物的比例定為前述範圍內,可更有效抑制在以高倍率(例如延伸倍率6.0)濕式延伸堆疊體的情形中基材薄膜之剝離的發生。The ratio of the organometallic compound in the substrate film is preferably at least 0.005 parts by weight, preferably at least 0.01 parts by weight, and more preferably at least 0.03 parts by weight, relative to 100 parts by weight of the resin forming the substrate film. , On the other hand, it is preferably 1.0 parts by weight or less, more preferably 0.5 parts by weight or less. By setting the ratio of the organometallic compound within the aforementioned range, it is possible to more effectively suppress the occurrence of peeling of the base film in the case of wet stretching of the stacked body at a high magnification (for example, a stretching magnification of 6.0).
[任意成分][optional ingredient]
基材薄膜,於樹脂、塑化劑、有機金屬化合物等之外還得包含其他任意成分。作為任意成分之例,可列舉:抗氧化劑、紫外線吸收劑、光穩定劑等穩定劑;滑劑等樹脂改質劑;染料或顏料等著色劑;及抗靜電劑。此等摻合劑可單獨使用1種,或組合2種以上使用,其摻合量可在不損及本發明之目的的範圍適當選擇。The base film must contain other optional components in addition to resins, plasticizers, organometallic compounds, and the like. Examples of optional components include stabilizers such as antioxidants, ultraviolet absorbers, and light stabilizers; resin modifiers such as slip agents; colorants such as dyes and pigments; and antistatic agents. These admixtures can be used alone or in combination of two or more, and the blending amount can be appropriately selected within the range that does not impair the object of the present invention.
[基材薄膜的製造方法][Manufacturing method of substrate film]
基材薄膜得藉由將包含用以形成基材薄膜之成分(樹脂及視需求所添加之成分)的組成物(以下亦稱作「樹脂組成物」)透過任意成形方法成形為薄膜狀來製造。The base film can be produced by forming a composition (hereinafter also referred to as "resin composition") containing the components (resin and optional components) used to form the base film into a film form by any molding method .
作為將樹脂組成物成形為薄膜狀的方法之例,可列舉例如:澆鑄成形法、擠製成形法、充氣成形法等。Examples of the method of molding the resin composition into a film include casting molding, extrusion molding, inflation molding, and the like.
基材薄膜的厚度以1 μm以上為佳,以3 μm以上為較佳,且以50 μm以下為佳,以20 μm以下為較佳。藉由基材薄膜的厚度為前述範圍之下限值以上,可有效防止在偏光板化工序中之偏光件的熔斷,而藉由為前述範圍之上限值以下,可減小在延伸堆疊體而獲得偏光板時於基材薄膜產生的相位差。The thickness of the substrate film is preferably not less than 1 μm, more preferably not less than 3 μm, and preferably not more than 50 μm, more preferably not more than 20 μm. By making the thickness of the base film more than the lower limit of the aforementioned range, it is possible to effectively prevent the melting of the polarizer in the polarizing process, and by being less than the upper limit of the aforementioned range, it is possible to reduce the thickness of the stretched stack. And the phase difference produced in the substrate film when obtaining the polarizing plate.
[堆疊體的製造方法][Manufacturing method of stacked body]
圖2係繪示本實施型態相關之堆疊體的製造裝置200之一例的概略示意圖。製造裝置200具備捲出裝置201&202、貼合裝置205及收捲裝置203。FIG. 2 is a schematic diagram showing an example of a
如圖2所示,將自捲出裝置201捲出之PVA樹脂薄膜11運送至貼合裝置205,並於貼合裝置205塗布接合劑,再與自捲出裝置202捲出之基材薄膜12貼合,藉此可獲得堆疊體10。所製造之堆疊體10可由收捲裝置203收捲成輥的形狀,以供予進一步之工序。As shown in Figure 2, the
作為貼合PVA樹脂薄膜11與基材薄膜12的接合劑13,並無特別之限制,得使用例如:丙烯酸系接合劑、胺甲酸酯系接合劑、聚酯系接合劑、聚乙烯醇系接合劑、聚烯烴系接合劑、改質聚烯烴系接合劑、聚乙烯基烷基醚系接合劑、橡膠系接合劑、氯乙烯―乙酸乙烯酯系接合劑、SEBS(苯乙烯―乙烯―丁烯―苯乙烯共聚物)系接合劑、乙烯―苯乙烯共聚合物等乙烯系接合劑、乙烯―(甲基)丙烯酸甲酯共聚合物、乙烯―(甲基)丙烯酸乙酯共聚合物等丙烯酸酯系接合劑等。就可更有效抑制在以高倍率(例如延伸倍率6.0)濕式延伸堆疊體的情形中PVA樹脂薄膜11與基材薄膜12之剝離的發生而言,以使用接合劑為佳。The adhesive 13 for laminating the
對於「基材薄膜12將貼附至PVA樹脂薄膜的面」或「PVA樹脂薄膜將貼附至基材薄膜12的面」,亦可施以電暈處理、皂化處理、底塗處理、錨式塗布處理等易接合處理。Corona treatment, saponification treatment, primer treatment, anchor type Easy joining treatment such as coating treatment.
[堆疊體][stack]
在本發明中,Re2為0 nm以上且20 nm以下。Re2以0 nm以上為佳,且以10 nm以下為佳,以5 nm以下為較佳。藉由Re2為上限值以下,可減小在延伸堆疊體10而做成偏光板時於基材薄膜顯現的相位差。In the present invention, Re2 is not less than 0 nm and not more than 20 nm. Re2 is preferably above 0 nm, preferably below 10 nm, and preferably below 5 nm. When Re2 is below an upper limit, the retardation which appears in a base film when stretching the
Re2係於在50℃~120℃之溫度條件下將堆疊體10自由端單軸延伸至6.0倍,而將在堆疊體中之基材薄膜做成延伸物時,基材薄膜的延伸物所具有之面內方向的相位差。亦即,Re2並非在堆疊體中之基材薄膜本身的相位差,而係對堆疊體施加特定之延伸處理後,於基材薄膜之延伸物產生的相位差。Re2 means that the free end of the
用以獲得此種延伸物的延伸溫度,可為50℃~120℃之範圍內的任何溫度。因此,可設想用於獲得延伸物之延伸的多個操作條件。在延伸物會因此種多個操作條件之任一者而顯現0 nm以上且20 nm以下之相位差的情況下,堆疊體即滿足前述要件。The extension temperature used to obtain such an extension can be any temperature within the range of 50°C to 120°C. Thus, a number of operating conditions for obtaining extension of the extension can be envisioned. In the case where the extension exhibits a phase difference of not less than 0 nm and not more than 20 nm due to any one of such a plurality of operating conditions, the stacked body satisfies the aforementioned requirements.
惟以「延伸物會因所有得獲取之前述多個操作條件而顯現0 nm以上且20 nm以下之相位差」為佳。在此種情況下,於透過本發明之偏光板用堆疊體的偏光板之製造中,可獲得高延伸條件設定之自由度。However, it is preferable that "the extension will show a phase difference of more than 0 nm and less than 20 nm due to all the above-mentioned multiple operating conditions obtained." In this case, in the manufacture of the polarizing plate through the stacked body for polarizing plates of the present invention, a high degree of freedom in setting stretching conditions can be obtained.
一般而言,於該溫度範圍中,在延伸溫度較低的情況下,會有較大的相位差顯現。因此,只要「以50℃之延伸做成的延伸物之相位差」及「以120℃之延伸做成的延伸物之相位差」兩者為0 nm以上且20 nm以下之範圍內,即得判斷延伸物會因所有前述多個操作條件而顯現0 nm以上且20 nm以下之相位差。Generally speaking, in this temperature range, a larger phase difference will appear when the stretching temperature is lower. Therefore, as long as both the "retardation of the stretched product made by stretching at 50°C" and "the retardation of the stretched product made by stretching at 120°C" are within the range of 0 nm or more and 20 nm or less, that is It is judged that the extension will exhibit a phase difference of not less than 0 nm and not more than 20 nm due to all the aforementioned multiple operating conditions.
本發明之堆疊體10係用以製造偏光板的材料。堆疊體在進行過延伸處理及染色處理等指定之處理後,被做成偏光板。以下說明使用本實施型態之堆疊體10所製造的本發明之偏光板。The
[2.偏光板][2. Polarizing plate]
本發明之偏光板100係藉由將本實施型態之堆疊體10單軸延伸而獲得。圖3係繪示使用本實施型態相關之堆疊體10所製造之偏光板100的剖面示意圖。The
如圖3所示,在偏光板100中,於PVA樹脂薄膜111之其中一面(圖示之上側面)之上堆疊有基材薄膜112。圖3中,113為接合劑層。As shown in FIG. 3 , in the
[偏光板的製造方法][Manufacturing method of polarizing plate]
茲說明使用本發明之實施型態1相關之堆疊板之偏光板的製造方法。圖4係繪示使用本實施型態相關之堆疊體10來製造偏光板100的製造裝置300之一例的示意圖。A method of manufacturing a polarizing plate using the stacked plates according to Embodiment 1 of the present invention will now be described. FIG. 4 is a schematic diagram showing an example of a
如圖4所示,製造裝置300具備捲出裝置301&307、處理裝置302~305、乾燥裝置306&309、貼合裝置308及收捲裝置310。As shown in FIG. 4 , the
本發明之偏光板的製造方法包含將本發明之堆疊體單軸延伸的工序(延伸處理工序)。本發明之偏光板的製造方法,亦可包含將堆疊體染色的染色處理工序及/或將堆疊體乾燥的乾燥工序。在本實施型態中,將自捲出裝置301捲出之堆疊體10運送至處理裝置302~305,進行將堆疊體的PVA樹脂薄膜染色的染色處理(染色處理工序)、將堆疊體單軸延伸的延伸處理(延伸處理工序),以及指定之處理。進行「將進行過此等處理後之堆疊體於乾燥裝置306乾燥」的處理(乾燥工序),即可獲得偏光板100。以下詳細說明各工序。The manufacturing method of the polarizing plate of this invention includes the process (stretch process process) of uniaxially stretching the stacked body of this invention. The manufacturing method of the polarizing plate of this invention may also include the dyeing process of dyeing a stacked body, and/or the drying process of drying a stacked body. In this embodiment, the
[延伸處理工序][Extended processing process]
在本實施型態中,延伸處理工序係將堆疊體單軸延伸的工序。作為延伸堆疊體的方法並不特別受限,但以濕式延伸為佳。延伸工序可進行1次,亦可進行2次以上。In this embodiment, the stretching treatment step is a step of uniaxially stretching the stacked body. The method for stretching the stack is not particularly limited, but wet stretching is preferable. The stretching step may be performed once or twice or more.
堆疊體之延伸倍率以5.0以上為佳,以5.5以上為較佳,且以7.0以下為佳,以6.5以下為較佳。若將堆疊體之延伸倍率定為前述範圍之上限值以下,則即便歷經包含延伸處理之偏光板的製造工序,仍可降低基材薄膜之相位差的顯現,防止偏光板之斷裂的發生,若將延伸倍率定為前述範圍之下限值以上,則可獲得具有充分之偏光性能的偏光板。在進行2次以上堆疊體之延伸的情況下,以由各次的延伸倍率之積所代表的總延伸倍率盡可能成為前述範圍者為佳。The elongation ratio of the stacked body is preferably above 5.0, more preferably above 5.5, preferably below 7.0, preferably below 6.5. If the stretching ratio of the stacked body is set below the upper limit of the aforementioned range, even after the production process of the polarizing plate including stretching treatment, the appearance of the retardation of the base film can be reduced, and the occurrence of cracking of the polarizing plate can be prevented. A polarizing plate having sufficient polarizing performance can be obtained if the elongation ratio is set to be more than the lower limit of the aforementioned range. When stretching the stacked body two or more times, it is preferable that the total stretching ratio represented by the product of the stretching ratios of the respective times falls within the aforementioned range as much as possible.
堆疊體的延伸溫度,並無特別之限制,但以30℃以上為佳,以40℃以上為較佳,以50℃以上為尤佳,且以140℃以下為佳,以90℃以下為較佳,以70℃以下為尤佳。藉由延伸溫度為前述範圍之下限值以上可順利進行延伸,並且,藉由為前述範圍之上限值以下可透過延伸進行有效的定向。前述延伸溫度之範圍對乾式延伸及濕式延伸之任一種方法皆為佳,但尤以濕式延伸的情形為佳。The stretching temperature of the stack is not particularly limited, but it is preferably above 30°C, preferably above 40°C, especially above 50°C, preferably below 140°C, and preferably below 90°C. Best, preferably below 70°C. Stretching can be smoothly performed by the stretching temperature being not less than the lower limit value of the aforementioned range, and effective orientation by stretching can be performed by being not more than the upper limit value of the aforementioned range. The range of the above-mentioned stretching temperature is suitable for any method of dry stretching or wet stretching, but is especially preferable for wet stretching.
堆疊體的延伸處理進行以下任一者皆可:沿薄膜長邊方向進行延伸的縱向延伸處理、沿薄膜幅寬方向進行延伸的橫向延伸處理、沿既不平行亦不垂直於薄膜幅寬方向的斜向進行延伸的斜向延伸處理。堆疊體的延伸處理以自由端單軸延伸為佳,以縱向的自由端單軸延伸為較佳。The stretching treatment of the stack may be any of the following: longitudinal stretching treatment for stretching along the long side direction of the film, transverse stretching treatment for stretching along the width direction of the film, stretching treatment along the direction neither parallel nor perpendicular to the film width Diagonal stretch processing that stretches diagonally. The stretching process of the stack is preferably uniaxially stretched at the free end, and more preferably uniaxially stretched at the free end in the longitudinal direction.
[染色處理工序][Dyeing treatment process]
染色處理工序係將堆疊體之PVA樹脂薄膜染色的工序。於本實施型態,偏光板的製造方法包含將堆疊體之PVA樹脂薄膜染色的染色處理(工序),但在本發明中,染色處理係為任意,亦可不包含之。染色處理工序亦可在延伸處理之前進行。並且,PVA樹脂薄膜的染色亦可針對形成堆疊體前之PVA樹脂薄膜進行。The dyeing treatment step is a step of dyeing the PVA resin film of the laminate. In this embodiment, the manufacturing method of the polarizing plate includes a dyeing treatment (step) of dyeing the PVA resin film of the laminate, but in the present invention, the dyeing treatment is optional and may not be included. The dyeing treatment process can also be performed before the stretching treatment. In addition, the dyeing of the PVA resin film can also be performed on the PVA resin film before forming the laminated body.
作為將在染色處理工序中之PVA樹脂薄膜染色的物質,可舉出二色性物質,作為二色性物質可列舉:碘、有機染料等。使用此等二色性物質的染色方法係為任意。舉例而言,亦可藉由於包含二色性物質的染色溶液浸漬PVA樹脂薄膜之層體來進行染色。並且,在使用碘作為二色性物質的情況下,就提高染色效率的觀點而言,染色溶液亦可包含碘化鉀等碘化物。二色性物質並無特別限制,但在將偏光板使用於車載用之顯示裝置的情況下,作為二色性物質,以有機染料為佳。Examples of the substance that dyes the PVA resin film in the dyeing treatment step include dichroic substances, and examples of the dichroic substance include iodine, organic dyes, and the like. The dyeing method using these dichroic substances is arbitrary. For example, dyeing can also be performed by dipping a layer body of a PVA resin film with a dyeing solution containing a dichroic substance. Furthermore, when using iodine as a dichroic substance, the dyeing solution may contain iodides, such as potassium iodide, from a viewpoint of improving dyeing efficiency. The dichroic substance is not particularly limited, but when the polarizing plate is used in a vehicle-mounted display device, an organic dye is preferable as the dichroic substance.
[乾燥工序][Drying process]
乾燥工序係將歷經染色處理工序及延伸處理工序等處理工序之堆疊體乾燥的工序。在乾燥工序中,以將處理工序後之堆疊體,於溫度50℃~100℃之溫度的乾燥機中乾燥0.5分鐘~10分鐘為佳。前述堆疊體的乾燥溫度以60℃以上為較佳,且以90℃以下為較佳。藉由將乾燥溫度定為下限值以上可縮短乾燥時間,而藉由將乾燥溫度定為上限值以下,可防止PVA樹脂薄膜的破裂。前述堆疊體的乾燥時間以1分鐘以上為較佳,且以5分鐘以下為較佳。藉由將乾燥時間定為下限值以上,可使前述堆疊體充分乾燥,藉由定為上限值以下,可防止堆疊體中之PVA樹脂薄膜的破裂。The drying step is a step of drying the stacked body that has undergone treatment steps such as the dyeing treatment step and the stretching treatment step. In the drying step, it is preferable to dry the stack after the treatment step in a dryer at a temperature of 50° C. to 100° C. for 0.5 minutes to 10 minutes. The drying temperature of the aforementioned stacked body is preferably above 60°C, and preferably below 90°C. The drying time can be shortened by setting the drying temperature above the lower limit, and the breakage of the PVA resin film can be prevented by setting the drying temperature below the upper limit. The drying time of the stacked body is preferably more than 1 minute, and more preferably less than 5 minutes. By setting the drying time to be more than the lower limit, the above-mentioned stack can be sufficiently dried, and by setting the drying time to be below the upper limit, it is possible to prevent the cracking of the PVA resin film in the stack.
在僅由以往的PVA樹脂而成之薄膜的偏光件中,有時會於乾燥工序後發生破裂,但由於本實施型態之偏光板係使用包含PVA樹脂薄膜以及基材薄膜之堆疊體而製造,故即使歷經乾燥工序之後仍可抑制偏光件之破裂的發生。In conventional polarizers made of only PVA resin films, cracks may occur after the drying process. However, the polarizers of this embodiment are produced using a stack of PVA resin films and substrate films. , so cracking of the polarizer can be suppressed even after the drying process.
[在偏光板中之各層的特性][Characteristics of each layer in the polarizing plate]
在偏光板中之PVA樹脂薄膜的厚度,以20 μm以下為佳,以10 μm以下為較佳,且以3 μm以上為佳,以5 μm以上為較佳。藉由厚度為上限值以下,可減小偏光板的厚度,而藉由厚度為下限值以上,可獲得具有充分高之偏光性能的偏光板。The thickness of the PVA resin film in the polarizing plate is preferably below 20 μm, preferably below 10 μm, preferably above 3 μm, preferably above 5 μm. When the thickness is not more than the upper limit, the thickness of the polarizing plate can be reduced, and when the thickness is not less than the lower limit, a polarizing plate having sufficiently high polarization performance can be obtained.
在偏光板中之基材薄膜之面內方向的相位差,以20 nm以下為佳,以15 nm以下為較佳,以10 nm以下為更佳,且以0 nm以上為佳。藉由在偏光板中的基材薄膜之面內方向的相位差為上述範圍內,可抑制將偏光板裝設於液晶顯示裝置時的黑色偏移。The retardation in the in-plane direction of the substrate film in the polarizing plate is preferably 20 nm or less, more preferably 15 nm or less, more preferably 10 nm or less, and preferably 0 nm or more. When the phase difference in the in-plane direction of the base film in the polarizing plate is within the above-mentioned range, black shift can be suppressed when the polarizing plate is mounted on a liquid crystal display device.
[3.本實施型態的作用、效果][3. Functions and effects of this form of implementation]
在本實施型態中,由於係藉由將包含「面內方向之相位差Re1小且厚度小的PVA樹脂薄膜」與「由具有能在低溫下高倍率延伸之柔軟性的樹脂而成之基材薄膜」的堆疊體延伸來製造偏光板,故即使在於低溫下以高倍率延伸堆疊體的時候,仍可抑制PVA樹脂薄膜之熔斷的發生,且可抑制在延伸後的基材薄膜中之相位差的顯現。其結果,根據本實施型態,可不剝離基材薄膜並直接將之作為PVA樹脂薄膜之其中一面的保護薄膜來使用,且可減少浪費的材料,故可提供「即便將基材薄膜作為保護薄膜仍可使用,且即便厚度薄仍可有效率製造的偏光板」的製造方法。In this embodiment, since it is based on the combination of "a PVA resin film with a small retardation Re1 in the in-plane direction and a small thickness" and "a resin with flexibility that can be stretched at a low temperature at a high magnification" "PVA resin film" stack is stretched to produce a polarizing plate, so even when the stack is stretched at a high magnification at a low temperature, the occurrence of melting of the PVA resin film can be suppressed, and the phase in the stretched base film can be suppressed Poor appearance. As a result, according to this embodiment, it can be directly used as a protective film on one side of the PVA resin film without peeling off the base film, and wasteful materials can be reduced, so it is possible to provide "even if the base film is used as a protective film A method of manufacturing a polarizing plate that can still be used and can be efficiently manufactured even if it is thin.
[變形例1][Modification 1]
以下參照圖4及圖5,同時說明使用本發明之實施型態1相關之堆疊體10所製造的變形例1之偏光板120。Referring to FIG. 4 and FIG. 5 , the
圖5係繪示使用本發明之實施型態相關之堆疊體10所製造的變形例1之偏光板120的剖面示意圖。在此偏光板120中,如圖5所示,於PVA樹脂薄膜111之其中一面(圖示之上側面)之上堆疊有基材薄膜112,於PVA樹脂薄膜111之另一面側(圖示之下側面)堆疊有保護薄膜115。圖5中,113、114為接合劑層。用以將保護薄膜115貼合至PVA樹脂薄膜的接合劑,可使用與於PVA樹脂薄膜貼合基材薄膜的接合劑相同者。FIG. 5 is a schematic cross-sectional view of a
本例相關之偏光板120的製造方法,包含於實施型態1中所獲得之偏光板100之PVA樹脂薄膜111直接或中介接合劑貼合保護薄膜115的工序。The manufacturing method of the
具體而言,如圖4所示,將實施型態1之偏光板100運送至貼合裝置308,再於PVA樹脂薄膜111未堆疊基材薄膜112之側的面塗布接合劑114,與自捲出裝置307捲出的保護薄膜115貼合,藉此獲得具備保護薄膜115的偏光板120。所製造之偏光板120,可由收捲裝置310收捲做成輥的形狀以供予進一步之工序。Specifically, as shown in FIG. 4, the
在本例中,作為保護薄膜115,可使用由選自環烯烴樹脂、丙烯酸樹脂、聚對酞酸乙二酯樹脂及三乙醯纖維素樹脂之一種以上之樹脂而成的薄膜。In this example, as the
本例之偏光板由於與實施型態1之偏光板同樣係藉由將包含「面內方向之相位差Re1小且厚度小的PVA樹脂薄膜」與「由具有能在低溫下高倍率延伸之柔軟性的樹脂而成之基材薄膜」的堆疊體延伸來製造偏光板,故具有與實施型態1相同之作用效果。The polarizing plate of this example is the same as the polarizing plate of Embodiment 1 by including "a PVA resin film with a small retardation Re1 in the in-plane direction and a small thickness" and "a soft film capable of high-magnification stretching at low temperature." The stacked body of the "base film" made of a permanent resin is stretched to manufacture a polarizing plate, so it has the same function and effect as that of Embodiment 1.
並且,根據本例,PVA樹脂薄膜111之未堆疊基材薄膜112之側的面具備保護薄膜115,故亦起到防止於PVA樹脂薄膜111之表面留下傷痕等的效果。Moreover, according to this example, the surface of the
[變形例2][Modification 2]
以下參照圖6,同時說明使用本發明之實施型態1相關之堆疊體10所製造的變形例2之偏光板130。Hereinafter, referring to FIG. 6 , a
圖6係繪示使用本發明之實施型態1相關之堆疊體10所製造的變形例2之偏光板的剖面示意圖。FIG. 6 is a schematic cross-sectional view showing a polarizing plate of Modification 2 manufactured by using the stacked
圖6係繪示本例之偏光板130的剖面示意圖。在此偏光板130中,如圖6所示,於PVA樹脂薄膜111之其中一面(圖示之上側面)之上堆疊有基材薄膜112,於PVA樹脂薄膜111之另一面側(圖示之下側面)堆疊有黏合劑層116。FIG. 6 is a schematic cross-sectional view of the
本例相關之偏光板130的製造方法,包含於在實施型態1中所獲得之偏光板100的PVA樹脂薄膜111設置黏合劑層116的工序。The manufacturing method of the
作為形成黏合劑層116的黏合劑,得使用市售之各種黏合劑,例如:包含丙烯酸聚合物作為主成分之聚合物的黏合劑。As the adhesive for forming the
本例之偏光板130,舉例而言,可藉由自市售之具有黏合劑層的薄膜(例如藤森工業製「MASTACK系列」)轉印黏合劑層至實施型態1之偏光板100的PVA樹脂薄膜111未堆疊基材薄膜112之側的面,形成黏合劑層而獲得。The
本例之偏光板130亦與實施型態1之偏光板相同,係藉由將包含「面內方向之相位差Re1小且厚度小的PVA樹脂薄膜」與「由具有能在低溫下高倍率延伸之柔軟性的樹脂而成之基材薄膜」的堆疊體延伸來製造偏光板,故具有與實施型態1相同之作用效果。The
並且,根據本例,於PVA樹脂薄膜111未堆疊基材薄膜112之側的面具備黏合劑層116,故亦起到防止於PVA樹脂薄膜111之表面留下傷痕等的效果。Furthermore, according to this example, the
[實施型態2:偏光板用堆疊體及偏光板][Example 2: Stacked body for polarizing plates and polarizing plates]
以下參照圖7及圖8,同時說明本發明之一實施型態的實施型態2之堆疊體15(偏光板用堆疊體),以及使用該堆疊體15所製造之偏光板150及其製造方法。針對與實施型態1相同之結構及態樣標註相同之符號,並省略重複之說明。Referring to FIG. 7 and FIG. 8, a stacked body 15 (stacked body for polarizing plates) of Embodiment 2 of an embodiment of the present invention, and a
圖7係繪示本發明之實施型態2相關之堆疊體15的剖面示意圖,圖8係繪示使用本實施型態相關之堆疊體15所製造之偏光板150的剖面示意圖。7 is a schematic cross-sectional view of a
[堆疊體][stack]
本實施型態之堆疊體15,就基材薄膜12直接堆疊於PVA樹脂薄膜11這點上與實施型態1之堆疊體相異。The
作為將基材薄膜12直接堆疊至PVA樹脂薄膜11的方法,可列舉例如:熱熔合、超音波熔合、雷射熔合等方法。在本申請中,所謂「直接堆疊」於PVA樹脂薄膜之面的基材薄膜,包含分別製備PVA樹脂薄膜與基材薄膜,並以不中介其他層體而直接接觸的方式貼合此等的情形。As a method of directly stacking the
本實施型態之堆疊體15亦與實施型態1之堆疊體10相同,得作為用以製造偏光板的材料。The
[偏光板][Polarizer]
以下說明使用本實施型態之堆疊體15所製造之本發明的偏光板150。偏光板150可藉由將本實施型態之堆疊體10單軸延伸而獲得。The
如圖8所示,在偏光板150中,於PVA樹脂薄膜111之其中一面(圖示之上側面)之上直接堆疊有基材薄膜112。本實施型態之偏光板150,亦可藉由與實施型態1之偏光板100相同之方法來製造。As shown in FIG. 8 , in the
[本實施型態之效果][Effects of this form of implementation]
在本實施型態中亦與實施型態1之偏光板相同,係藉由將包含「面內方向之相位差Re1小且厚度小的PVA樹脂薄膜」與「由具有能在低溫下高倍率延伸之柔軟性的樹脂而成之基材薄膜」的堆疊體延伸來製造偏光板150,故具有與實施型態1相同之作用效果。In this embodiment, it is also the same as the polarizing plate of Embodiment 1, by including "a PVA resin film with a small retardation Re1 in the in-plane direction and a small thickness" and "a PVA resin film capable of high-magnification stretching at low temperature." The
並且,根據本實施型態,由於使用將基材薄膜12直接堆疊至PVA樹脂薄膜11的堆疊體,故斷裂抑制效果優異,且亦起到防止生產環境中之其他物質所致之環境汙染,或防止對產品之瑕玷(混入異物)的效果。And, according to this embodiment mode, since the stacked body of the
[變形例3][Modification 3]
以下參照圖9,同時說明使用本發明之實施型態2相關之堆疊體15所製造的變形例3之偏光板160。圖9係繪示使用本發明之實施型態2相關之堆疊體所製造的變形例3之偏光板160的剖面示意圖。Referring to FIG. 9 , a
在偏光板160中,如圖9所示,於PVA樹脂薄膜111之其中一面(圖示之上側面)之上堆疊有基材薄膜112,於PVA樹脂薄膜111之另一面側(圖示之下側面)中介接合劑層114而堆疊有保護薄膜115。將保護薄膜115貼合至PVA樹脂薄膜111的接合劑114,可使用與已在實施型態1中說明之於PVA樹脂薄膜貼合基材薄膜的接合劑相同者。In the
本例相關之偏光板160的製造方法,包含於實施型態2中所獲得之偏光板150之PVA樹脂薄膜111中介接合劑貼合保護薄膜115的工序。保護薄膜115及貼合保護薄膜的方法係與變形例1相同。The manufacturing method of the
本例之偏光板160亦與實施型態1之偏光板相同,係藉由將包含「面內方向之相位差Re1小且厚度小的PVA樹脂薄膜」與「由具有能在低溫下高倍率延伸之柔軟性的樹脂而成之基材薄膜」的堆疊體延伸來製造偏光板,故具有與實施型態1相同之作用效果。The
並且,根據本例,由於使用將基材薄膜12直接堆疊至PVA樹脂薄膜11的堆疊體15,故斷裂抑制效果優異,且亦起到防止生產環境中之其他物質所致之環境汙染,或防止對製品之瑕玷(混入異物)的效果。And, according to this example, since the
再者,根據本例,PVA樹脂薄膜111之未堆疊基材薄膜112之側的面具備保護薄膜115,故亦起到防止於PVA樹脂薄膜111之表面留下傷痕等的效果。Moreover, according to this example, the surface of the
[變形例4][Modification 4]
以下參照圖10,同時說明使用本發明之實施型態2相關之堆疊體15所製造的變形例4之偏光板170。圖10係繪示使用本發明之實施型態2相關之堆疊體所製造的變形例4之偏光板170的剖面示意圖。Referring to FIG. 10 , a
在偏光板170中,如圖10所示,於PVA樹脂薄膜111之其中一面(圖示之上側面)之上堆疊有基材薄膜112,於PVA樹脂薄膜111之另一面側(圖示之下側面)堆疊有黏合劑層116。In the
本例相關之偏光板170的製造方法,包含於在實施型態2中所獲得之偏光板150的PVA樹脂薄膜111設置黏合劑層116的工序。The manufacturing method of the
形成黏合劑層116的方法及用於黏合劑層116之形成的黏合劑,係與變形例2相同。The method of forming the
本例之偏光板170亦與實施型態1之偏光板相同,係藉由將包含「面內方向之相位差Re1小且厚度小的PVA樹脂薄膜」與「由具有能在低溫下高倍率延伸之柔軟性的樹脂而成之基材薄膜」的堆疊體延伸來製造偏光板,故具有與實施型態1相同之作用效果。The
並且,根據本例,由於使用將基材薄膜12直接堆疊至PVA樹脂薄膜11的堆疊體15,故斷裂抑制效果優異,且亦起到防止生產環境中之其他物質所致之環境汙染,或防止對產品之沾染(混入異物)的效果。And, according to this example, since the
再者,根據本例,於PVA樹脂薄膜111未堆疊基材薄膜112之側的面具備黏合劑層116,故亦起到防止於PVA樹脂薄膜111之表面留下傷痕等的效果。Furthermore, according to this example, the
[實施型態3:顯示裝置][Implementation type 3: Display device]
使用本發明之偏光板用堆疊體所製造之偏光板,得成為液晶顯示裝置的材料。The polarizing plate manufactured using the stacked body for polarizing plates of the present invention can be used as a material for a liquid crystal display device.
通常,液晶顯示裝置依序具備光源、光源側偏光板、液晶單元及觀看側偏光板,但透過本發明所獲得的偏光板,使用於光源側偏光板及觀看側偏光板之任一者皆可。Usually, a liquid crystal display device sequentially includes a light source, a light source-side polarizing plate, a liquid crystal cell, and a viewing-side polarizing plate, but the polarizing plate obtained through the present invention can be used for either the light source-side polarizing plate or the viewing-side polarizing plate. .
作為液晶單元之驅動方式,可列舉例如:平面切換(IPS)模式、垂直排列(VA)模式、多區域垂直排列(MVA)模式、連續焰火狀排列(CPA)模式、混合排列向列(HAN)模式、扭轉向列(TN)模式、超扭轉向列(STN)模式、光學補償雙折射(OCB)模式等。Examples of driving methods for liquid crystal cells include in-plane switching (IPS) mode, vertical alignment (VA) mode, multi-area vertical alignment (MVA) mode, continuous pyrotechnic alignment (CPA) mode, and hybrid alignment nematic (HAN) mode. mode, twisted nematic (TN) mode, super twisted nematic (STN) mode, optically compensated birefringence (OCB) mode, etc.
以下參照圖11,同時說明具備「使用本發明之堆疊體10所製造之偏光板100」的實施型態3相關之顯示裝置400。本實施型態之顯示裝置400,係藉由將實施型態1之偏光板100作為光源側偏光板及觀看側偏光板,並分別堆疊至液晶面板而製造。A
圖11係繪示本發明之實施型態3相關之顯示裝置400的剖面示意圖。顯示裝置400如圖11所示,具有2片基板410&420、位於其間的液晶層430,以及分別配置於2片基板410&420之外側的偏光板100&100。2片偏光板100係使用實施型態1之堆疊體10所製造的偏光板100。如圖11所示,2片偏光板100分別以偏光板之基材薄膜112配置於偏光板之PVA樹脂薄膜111與液晶層430之間的方式堆疊。FIG. 11 is a schematic cross-sectional view of a
根據本實施型態,可提供具備「即便將基材薄膜作為保護薄膜仍可使用,且即便厚度薄仍可有效率製造的偏光板」的顯示裝置。According to this embodiment, it is possible to provide a display device including "a polarizing plate that can be used even if the base film is used as a protective film, and that can be efficiently manufactured even if it is thin".
[實施型態4:顯示裝置][Implementation type 4: Display device]
茲參照圖12,同時說明具備本發明之偏光板的實施型態4相關之顯示裝置450。本實施型態之顯示裝置450,係藉由使用本發明之偏光板作為光源側偏光板及觀看側偏光板中之一偏光板,並將該偏光板堆疊至液晶面板而製造。Referring now to FIG. 12 , a
圖12係繪示本發明之實施型態4相關之顯示裝置450的剖面示意圖。顯示裝置450如圖12所示,具有2片基板410&420、位於其間的液晶層430,以及配置於「下側之基板410的外側之面(圖示之下側面)」的偏光板120。偏光板120為變形例1的偏光板。如圖12所示、偏光板120,係以偏光板之基材薄膜112配置於偏光板之PVA樹脂薄膜111與液晶層430之間的方式堆疊。FIG. 12 is a schematic cross-sectional view of a
根據本實施型態,可提供具備「即便將基材薄膜作為保護薄膜仍可使用,且即便厚度薄仍可有效率製造的本發明之偏光板」之顯示裝置的製造方法。According to this embodiment, it is possible to provide a method of manufacturing a display device including "the polarizing plate of the present invention that can be used even if the base film is used as a protective film, and can be efficiently manufactured even if it is thin".
[實施型態5:顯示裝置][Implementation Type 5: Display Device]
茲參照圖13,同時說明具備本發明之偏光板160的實施型態5相關之顯示裝置460。本實施型態之顯示裝置460,係藉由使用本發明之偏光板作為光源側偏光板及觀看側偏光板中之一偏光板,並將該偏光板堆疊至液晶面板而製造。Referring now to FIG. 13 , a
圖13係繪示本發明之實施型態5相關之顯示裝置460的剖面示意圖。顯示裝置460如圖13所示,具有2片基板410&420、位於其間的液晶層430,以及配置於「下側之基板410的外側之面(圖示之下側面)」的偏光板160。偏光板160為變形例3的偏光板。如圖13所示,偏光板160係以偏光板之基材薄膜112配置於偏光板之PVA樹脂薄膜111與液晶層430之間的方式堆疊。FIG. 13 is a schematic cross-sectional view of a
根據本實施型態,可提供具備「即便將基材薄膜作為保護薄膜仍可使用,且即便厚度薄仍可有效率製造的本發明之偏光板」之顯示裝置的製造方法。According to this embodiment, it is possible to provide a method of manufacturing a display device including "the polarizing plate of the present invention that can be used even if the base film is used as a protective film, and can be efficiently manufactured even if it is thin".
[實施型態6:顯示裝置][Implementation Type 6: Display Device]
使用本發明之偏光板用堆疊體所製造之偏光板得成為EL顯示裝置的材料。A polarizing plate manufactured using the polarizing plate stack of the present invention can be used as a material for an EL display device.
通常,有機EL顯示裝置,自光出射側依序具備基板、透明電極、發光層及金屬電極層,但藉由本發明之製造方法而獲得的偏光板可配置於基板的光出射側。Generally, an organic EL display device includes a substrate, a transparent electrode, a light-emitting layer, and a metal electrode layer sequentially from the light exit side, but the polarizer obtained by the manufacturing method of the present invention can be arranged on the light exit side of the substrate.
EL顯示裝置具有2片基板、位於其間的發光層,以及配置於2片基板中之一基板之外側的偏光板。該顯示裝置可藉由將本發明之偏光板堆疊至有機EL面板或無機EL面板來製造。The EL display device has two substrates, a light-emitting layer located therebetween, and a polarizing plate disposed outside one of the two substrates. The display device can be manufactured by stacking the polarizing plate of the present invention on an organic EL panel or an inorganic EL panel.
以下參照圖14,同時說明具備「使用本發明之偏光板用堆疊體所製造之偏光板」的實施型態6相關之顯示裝置500。本實施型態之顯示裝置500,係藉由將本發明之偏光板100堆疊至有機EL面板而製造。Hereinafter, a
圖14係繪示本發明之實施型態6相關之顯示裝置500的剖面示意圖。顯示裝置500具有2片基板510&520、位於其間的發光層530,以及配置於「下側之基板510的外側之面(圖示之下側面)」的偏光板100。偏光板100為實施型態1的偏光板。如圖14所示,偏光板100係以偏光板100之基材薄膜112配置於偏光板100之PVA樹脂薄膜111與發光層530之間的方式堆疊。FIG. 14 is a schematic cross-sectional view of a
根據本實施型態,可提供具備「即便將基材薄膜作為保護薄膜仍可使用,且即便厚度薄仍可有效率製造的本發明之偏光板」的顯示裝置。According to this embodiment, it is possible to provide a display device including "the polarizing plate of the present invention which can be used even if the base film is used as a protective film, and which can be efficiently manufactured even if it is thin".
[實施型態7:顯示裝置][Implementation Type 7: Display Device]
茲參照圖15,同時說明具備「使用本發明之堆疊體所製造之偏光板」的實施型態7相關之顯示裝置550。本實施型態之顯示裝置550,係藉由將本發明之偏光板120堆疊至有機EL面板而製造。Referring now to FIG. 15 , a
圖15係繪示本發明之實施型態7相關之顯示裝置550的剖面示意圖。顯示裝置550具有2片基板510&520、位於其間的發光層530,以及配置於「下側之基板510的外側之面(圖示之下側面)」的偏光板120。偏光板120為變形例1的偏光板。如圖15所示,偏光板120係以偏光板120之基材薄膜112配置於偏光板120之PVA樹脂薄膜111與發光層530之間的方式堆疊。FIG. 15 is a schematic cross-sectional view of a
根據本實施型態,可提供具備「即便將基材薄膜作為保護薄膜仍可使用,且即便厚度薄仍可有效率製造的本發明之偏光板」的顯示裝置。According to this embodiment, it is possible to provide a display device including "the polarizing plate of the present invention which can be used even if the base film is used as a protective film, and which can be efficiently manufactured even if it is thin".
[實施型態8:顯示裝置][Implementation Type 8: Display Device]
茲參照圖16,同時說明具備「使用本發明之堆疊體所製造之偏光板」的實施型態8相關之顯示裝置560。本實施型態之顯示裝置560,係藉由將本發明之偏光板160,堆疊至有機EL面板而製造。Referring now to FIG. 16 , a
圖16係繪示本發明之實施型態8相關之顯示裝置560的剖面示意圖。顯示裝置560具有2片基板510&520、位於其間的發光層530,以及配置於「下側之基板510的外側之面(圖示之下側面)」的偏光板160。偏光板160為變形例3的偏光板。如圖16所示,偏光板160,係以偏光板160之基材薄膜112配置於偏光板160之PVA樹脂薄膜111與發光層530之間的方式堆疊。FIG. 16 is a schematic cross-sectional view of a
根據本實施型態,可提供具備「即便將基材薄膜作為保護薄膜仍可使用,且即便厚度薄仍可有效率製造的本發明之偏光板」的顯示裝置。According to this embodiment, it is possible to provide a display device including "the polarizing plate of the present invention which can be used even if the base film is used as a protective film, and which can be efficiently manufactured even if it is thin".
[其他實施型態][Other Implementation Types]
(1)在實施型態3雖揭示了將實施型態1之偏光板分別使用於光源側偏光板及觀看側偏光板者,但可用別的偏光板來構成其中任一偏光板,亦可使用2片實施型態2之偏光板或變形例1~4之偏光板。(1) Although Embodiment 3 discloses that the polarizing plate of Embodiment 1 is used for the light source side polarizing plate and the viewing side polarizing plate respectively, other polarizing plates can be used to form any one of them, and it is also possible to use Two polarizing plates of Embodiment 2 or polarizing plates of Modifications 1 to 4.
(2)在實施型態4及5雖分別將變形例1之偏光板及變形例3之偏光板使用於光源側偏光板及觀看側偏光板中之一者,但亦可使用實施型態1、實施型態2、變形例2或變形例4之偏光板。(2) Although the polarizing plate of Modification 1 and the polarizing plate of Modification 3 are used in either of the light source side polarizing plate and the viewing side polarizing plate in Embodiments 4 and 5, Embodiment 1 can also be used . The polarizing plate of Embodiment 2, Modification 2 or Modification 4.
(3)在實施型態6~8雖揭示了於有機EL顯示裝置分別使用實施型態1之偏光板、變形例1之偏光板及變形例3之偏光板之例,但不受限於此。舉例而言,可使用實施型態2之偏光板、變形例2之偏光板或變形例4之偏光板,亦可於無機EL顯示裝置使用本發明之偏光板。(3) Embodiments 6 to 8 disclose examples in which the polarizing plate of Embodiment 1, the polarizing plate of Modification 1, and the polarizing plate of Modification 3 are respectively used in organic EL display devices, but they are not limited to this . For example, the polarizing plate of Embodiment 2, the polarizing plate of Modification 2, or the polarizing plate of Modification 4 can be used, and the polarizing plate of the present invention can also be used in an inorganic EL display device.
『實施例』"Example"
以下參照實施例及比較例,進一步詳細說明本發明,但本發明並非受下述實施例所限定者。下面關於成分之量比的「份」及「%」,除非另有註記,否則表示重量份。The present invention will be described in further detail below with reference to examples and comparative examples, but the present invention is not limited by the following examples. The following "parts" and "%" in the quantitative ratio of ingredients represent parts by weight unless otherwise noted.
[評價方法][Evaluation method]
[重量平均分子量(Mw)及分子量分布(Mw/Mn)][Weight average molecular weight (Mw) and molecular weight distribution (Mw/Mn)]
嵌段共聚物及嵌段共聚物氫化物的分子量,係在38℃量測作為將THF做成溶析液之GPC的標準聚苯乙烯換算值。使用TOSOH公司製之HLC8020GPC作為量測裝置。The molecular weights of block copolymers and block copolymer hydrogenated products are measured at 38° C. as standard polystyrene conversion values of GPC using THF as an eluent. HLC8020GPC manufactured by TOSOH was used as a measuring device.
[氫化率][Hydrogenation rate]
嵌段共聚物氫化物的氫化率係藉由1 H-NMR光譜或GPC分析算出。氫化率99%以下之區域係量測1 H-NMR光譜而算出,超過99%之區域係藉由GPC分析,自UV檢測器及RI檢測器之峰值面積的比率算出。The hydrogenation rate of the hydrogenated block copolymer was calculated by 1 H-NMR spectrum or GPC analysis. The area where the hydrogenation rate is less than 99% is calculated by measuring 1 H-NMR spectrum, and the area where the hydrogenation rate exceeds 99% is calculated from the ratio of the peak areas of the UV detector and the RI detector by GPC analysis.
[MFR(在190℃、荷重2.16 kg下所量測到之熔流速率)的量測][Measurement of MFR (melt flow rate measured at 190°C under a load of 2.16 kg)]
熔流速率係依循JIS K7210,使用擠製型塑性計(立山科學工業股份有限公司製,商品名「MELT INDEXER(L240)」)作為量測裝置,在溫度190℃、荷重2.16 kg之條件下量測。The melt flow rate is in accordance with JIS K7210, using an extrusion-type plastic meter (manufactured by Tateyama Scientific Industry Co., Ltd., trade name "MELT INDEXER (L240)") as a measuring device, measured under the conditions of a temperature of 190°C and a load of 2.16 kg Measurement.
[拉伸彈性模數的量測][Measurement of tensile modulus of elasticity]
拉伸彈性模數係依循JIS K7127,使用拉伸試驗機(Instron Japan Company, Ltd.製,商品名「電機式萬能材料試驗機(5564)」),並藉由下述方法量測。The tensile elastic modulus was measured in accordance with JIS K7127 using a tensile testing machine (manufactured by Instron Japan Company, Ltd., trade name "Electric Universal Testing Machine (5564)") by the following method.
將基材薄膜衝壓成JIS K7127所記載之試驗片類型1B的形狀,量測將此試驗片沿長邊方向拉伸並使之形變時的應力。應力的量測條件定為溫度23℃、濕度60±5%RH、夾頭間距115 mm、拉伸速度50 mm/min。應力的量測係進行5次。自所量測到的應力與對應於此應力之應變的量測數據,於試驗片之應變為0.6%~1.2%之範圍內選擇間隔0.2%的4項量測數據(亦即,應變為0.6%、0.8%、1.0%及1.2%時的量測數據),並使用最小平方法,自5次量測的4項量測數據(合計20項)算出拉伸彈性模數。The base film was punched into the shape of the test piece type 1B described in JIS K7127, and the stress when the test piece was stretched in the longitudinal direction and deformed was measured. The stress measurement conditions were set at a temperature of 23°C, a humidity of 60±5%RH, a chuck distance of 115 mm, and a tensile speed of 50 mm/min. The measurement of stress was carried out 5 times. From the measured stress and the measured data of the strain corresponding to this stress, select 4 items of measured data with an interval of 0.2% within the range of the strain of the test piece from 0.6% to 1.2% (that is, the strain is 0.6 %, 0.8%, 1.0% and 1.2% of the measurement data), and use the least square method to calculate the tensile elastic modulus from the 4 measurement data (20 items in total) of the 5 measurements.
[相位差的量測方法][Measurement method of phase difference]
聚乙烯醇樹脂薄膜之面內方向的相位差Re1、基材薄膜的延伸物之面內方向的相位差Re2、及偏光板中之基材薄膜之面內方向的相位差,係使用相位差計(OPTO SCIENCE Co., Ltd.製,商品名「Mueller matrix polarimeter(Axo Scan)」)量測。量測時,量測波長定為550 nm。The retardation Re1 in the in-plane direction of the polyvinyl alcohol resin film, the retardation Re2 in the in-plane direction of the extension of the substrate film, and the retardation in the in-plane direction of the substrate film in the polarizing plate are measured using a retardation meter (manufactured by OPTO SCIENCE Co., Ltd., trade name "Mueller matrix polarimeter (Axo Scan)") measurement. When measuring, the measurement wavelength is set at 550 nm.
只要「在50℃之溫度條件下將堆疊體自由端單軸延伸至6.0倍時所產生的基材薄膜之面內方向的相位差」及「在120℃之溫度條件下將堆疊體自由端單軸延伸至6.0倍時所產生的基材薄膜之面內方向的相位差」兩者為0 nm以上且20 nm以下的範圍內,則判斷「在50℃~120℃之溫度條件下將堆疊體自由端單軸延伸至6.0倍時所產生的基材薄膜之面內方向的相位差Re2」即為0 nm以上且20 nm以下。As long as "the phase difference in the in-plane direction of the substrate film produced when the free end of the stack is uniaxially stretched to 6.0 times at a temperature of 50°C" and "the free end of the stack is monoaxially stretched at a temperature of 120°C The retardation in the in-plane direction of the base film produced when the axis is extended to 6.0 times" is in the range of 0 nm or more and 20 nm or less, then it is judged that "the stacked body is stacked under the temperature condition of 50°C to 120°C When the free end is uniaxially stretched to 6.0 times, the retardation Re2" of the substrate film in the in-plane direction is not less than 0 nm and not more than 20 nm.
[厚度的量測方法][measurement method of thickness]
堆疊體所包含之各薄膜(聚乙烯醇樹脂薄膜與基材薄膜)的厚度、偏光板所包含之各薄膜的厚度,係使用厚度計(Mitutoyo Corporation公司製,商品名「ABS數位測厚計(547-401)」)量測5次,再將其平均值作為各薄膜的厚度。The thickness of each film (polyvinyl alcohol resin film and base film) contained in the stack and the thickness of each film contained in the polarizing plate were obtained by using a thickness gauge (manufactured by Mitutoyo Corporation, trade name "ABS Digital Thickness Gauge ( 547-401)") Measure 5 times, and take the average value as the thickness of each film.
[密合性的評價][evaluation of adhesiveness]
於各例之偏光板的製造中之至第二延伸處理為止的工序中,將聚乙烯醇樹脂薄膜與基材薄膜之間未發生剝離者定為A,將有發現一部分剝離者定為B,且將完全剝離者定為C。In the steps from the production of the polarizing plate of each example to the second stretching treatment, the case where no peeling occurred between the polyvinyl alcohol resin film and the base film was designated as A, and the case where a part of peeling was observed was designated as B, And the person who completely peeled off was designated as C.
[乾燥工序性的評價][Evaluation of Drying Processability]
於各例之偏光板的製造中之70℃、5分鐘的乾燥工序中,將於偏光件未產生裂紋者定為A,產生裂紋者定為C。In the drying process at 70°C for 5 minutes in the production of the polarizing plate of each example, the case where no cracks occurred in the polarizer was rated as A, and the case where cracks occurred was rated as C.
[黑色偏移][Black offset]
自液晶顯示裝置(LG Electronics Japan, Inc.製,商品名「IPS面板顯示器(23MP47)」)拆下液晶顯示面板,將配置於觀看側的偏光板剝離,再以基材薄膜成為面板側的方式貼合實施例及比較例中所製作的偏光板。並且,將單個無保護薄膜的偏光件貼合至實施例及比較例中所製作之偏光板旁,重組液晶顯示裝置。「實施例及比較例中所製作的偏光板、單個無保護薄膜的偏光件」之吸收軸,以與剝離前之偏光板的吸收軸呈同方向的方式貼合。The liquid crystal display panel was removed from the liquid crystal display device (manufactured by LG Electronics Japan, Inc., trade name "IPS panel display (23MP47)"), the polarizing plate placed on the viewing side was peeled off, and the base film was placed on the panel side The polarizing plates produced in Examples and Comparative Examples were bonded together. In addition, a single polarizer without a protective film was pasted next to the polarizers produced in Examples and Comparative Examples to reassemble the liquid crystal display device. The absorption axis of "the polarizing plates produced in Examples and Comparative Examples, and a single polarizer without a protective film" was bonded in the same direction as the absorption axis of the polarizing plate before peeling off.
在將配置於觀看側的偏光板之吸收軸的方向定為方位角0°,且將面板的垂直方向定為極角0°時,將面板設為黑色顯示狀態(亦即,於面板的整個顯示畫面顯示黑色的狀態),並自方位角45°、極角45°的方位目視,將與無保護薄膜之偏光件的情況色調變化為相同者判斷為A,將有些許色調變化者判斷為B,將變化大者判斷為C。When the direction of the absorption axis of the polarizing plate arranged on the viewing side is set as the azimuth angle of 0°, and the vertical direction of the panel is set as the polar angle of 0°, the panel is set to a black display state (that is, the entire surface of the panel The state where the display screen shows black), and visually inspected from the azimuth angle of 45° and the polar angle of 45°, the case where the color tone change is the same as that of the polarizer without protective film is judged as A, and the case with a slight color change is judged as B, judge the one with the largest change as C.
[實施例1][Example 1]
(1-1)聚合物X的製作(1-1) Production of Polymer X
參照日本專利公開第2002-105151號公報所記載之製造例,在第1階段使苯乙烯單體25份聚合後,在第2階段使苯乙烯單體30份及異戊二烯單體25份聚合,之後在第3階段使苯乙烯單體20份聚合而獲得嵌段共聚物[D1]後,將該嵌段共聚物氫化,合成嵌段共聚物氫化物[E1]。嵌段共聚物氫化物[E1]之Mw為84,500,Mw/Mn為1.20,主鏈及芳環的氫化率為幾乎100%。Referring to the production example described in Japanese Patent Publication No. 2002-105151, after polymerizing 25 parts of styrene monomer in the first stage, 30 parts of styrene monomer and 25 parts of isoprene monomer were polymerized in the second stage After polymerization, 20 parts of styrene monomers were polymerized in the third step to obtain a block copolymer [D1], and the block copolymer was hydrogenated to synthesize a hydrogenated block copolymer [E1]. The hydrogenated block copolymer [E1] has a Mw of 84,500, a Mw/Mn of 1.20, and a hydrogenation rate of the main chain and aromatic ring of almost 100%.
於嵌段共聚物氫化物[E1]100份中,熔融混煉肆{3-[3,5-二(三級丁基)-4-羥基苯基]丙酸}新戊四醇酯(松原產業公司製,產品名「Songnox1010」)0.1份作為抗氧化劑而摻合後,做成顆粒狀,獲得成形用的聚合物X。In 100 parts of hydrogenated block copolymer [E1], melt-knead 4{3-[3,5-bis(tertiary butyl)-4-hydroxyphenyl]propionic acid} neopentylthritol ester (Matsubara Sangyo Co., Ltd., product name "Songnox 1010") 0.1 part was blended as an antioxidant, and pelletized to obtain Polymer X for molding.
(1-2)基材薄膜的製造(1-2) Manufacture of base film
使(1-1)中所製造之聚合物X溶解於環己烷後,對於聚合物X的100重量份,添加40重量份的聚異丁烯(JX日鑛日石能源公司製「日石聚丁烯HV-300」,數量平均分子量1,400)及0.1重量份的有機矽化合物(3-胺基丙基三乙氧基矽烷,KBM903,信越化學公司製),製作澆鑄製膜用塗布液。After dissolving the polymer X produced in (1-1) in cyclohexane, 40 parts by weight of polyisobutylene (manufactured by JX Nippon Oil & Energy Co., Ltd. ene HV-300", number average molecular weight 1,400) and 0.1 parts by weight of an organosilicon compound (3-aminopropyltriethoxysilane, KBM903, manufactured by Shin-Etsu Chemical Co., Ltd.) to prepare a coating solution for casting and film formation.
將所獲得之製膜用塗布液,使用模塗機塗布至隔離膜(三菱化學公司製,「MRV38」)並乾燥之。藉此獲得寬650 mm、長500 m、厚10 μm之包含聚合物X的長條之基材薄膜。基材薄膜的MFR為10 g/10分鐘,拉伸彈性模數為600 MPa。The obtained coating liquid for film formation was applied to a separator (manufactured by Mitsubishi Chemical Corporation, "MRV38") using a die coater, and dried. Thereby, a strip substrate film comprising polymer X with a width of 650 mm, a length of 500 m, and a thickness of 10 μm was obtained. The MFR of the base film was 10 g/10 minutes, and the tensile elastic modulus was 600 MPa.
(1-3)堆疊體的製造(1-3) Manufacture of stacked body
將水100重量份、聚乙烯醇系接合劑(日本合成化學公司製「Z-200」)3重量份及交聯劑(日本合成化學公司製「SPM-01」)0.3重量份混合,獲得接合劑。將此接合劑塗布於在(1-2)中所製造之基材薄膜的其中一面,與未延伸之聚乙烯醇樹脂薄膜(平均聚合度約2400,皂化度99.9莫耳%,寬650 mm,厚20 μm,以下亦稱作「PVA20」)貼合。在此狀態下,使接合劑在70℃下加熱乾燥5分鐘,獲得堆疊體。Mix 100 parts by weight of water, 3 parts by weight of a polyvinyl alcohol-based adhesive ("Z-200" manufactured by Nippon Synthetic Chemicals Co., Ltd.), and 0.3 parts by weight of a crosslinking agent ("SPM-01" manufactured by Nippon Synthetic Chemicals Co., Ltd.) to obtain a joint. agent. Apply this adhesive to one side of the substrate film produced in (1-2), and the unstretched polyvinyl alcohol resin film (average degree of polymerization is about 2400, degree of saponification 99.9 mole%, width 650 mm, 20 μm thick, hereinafter also referred to as "PVA20") bonding. In this state, the bonding agent was heated and dried at 70° C. for 5 minutes to obtain a stacked body.
量測所獲得之堆疊體中之基材薄膜的厚度、聚乙烯醇樹脂薄膜的厚度及面內方向的相位差Re1,以及相位差Re2。結果記載於表1。將前述自由端單軸延伸之溫度條件設為50℃與120℃。The thickness of the base film, the thickness of the polyvinyl alcohol resin film, and the phase difference Re1 in the in-plane direction and the phase difference Re2 in the obtained stack were measured. The results are shown in Table 1. The temperature conditions for the aforementioned free-end uniaxial stretching were set at 50°C and 120°C.
(1-4)偏光板的製造(1-4) Manufacture of polarizing plate
將在(1-3)中所製造之堆疊體中介導輥沿長邊方向連續運送,同時進行下述操作。The following operations were carried out while continuously conveying the guide roller in the stack produced in (1-3) in the longitudinal direction.
對前述堆疊體進行浸漬於水的潤脹處理、浸漬於包含碘及碘化鉀之染色溶液的染色處理,以及將染色處理後之堆疊體延伸的第一延伸處理。隨後,對第一延伸處理後之堆疊體,進行在包含硼酸及碘化鉀之浴槽中延伸的第二延伸處理。以由第一延伸處理時的延伸倍率與第二延伸處理時的延伸倍率之積所表示的總延伸倍率呈6.0的方式設定。將第二延伸處理後之堆疊體於乾燥機中在70℃乾燥5分鐘(乾燥工序),獲得偏光板。Swelling treatment of immersing in water, dyeing treatment of immersing in a dyeing solution containing iodine and potassium iodide, and first stretching treatment of extending the dyed stack are performed on the aforementioned stack. Subsequently, the stack after the first stretching process was subjected to a second stretching process of stretching in a bath containing boric acid and potassium iodide. The total stretching ratio represented by the product of the stretching ratio in the first stretching treatment and the stretching ratio in the second stretching treatment was set so that it was 6.0. The stack after the second stretching treatment was dried in a dryer at 70° C. for 5 minutes (drying process) to obtain a polarizing plate.
在至第二延伸處理為止的工序中進行密合性的評價,在乾燥工序中進行乾燥工序性的評價,針對所獲得之偏光板進行黑色偏移的評價。評價結果揭示於表1。The evaluation of adhesiveness was performed in the process up to the 2nd stretching process, the evaluation of drying processability was performed in a drying process, and the evaluation of black shift was performed about the obtained polarizing plate. The evaluation results are disclosed in Table 1.
並且,量測所獲得之偏光板中之基材薄膜的厚度及相位差,以及聚乙烯醇樹脂薄膜的厚度。量測結果揭示於表1。And, the thickness and retardation of the base film in the obtained polarizing plate, and the thickness of the polyvinyl alcohol resin film were measured. The measurement results are disclosed in Table 1.
[實施例2][Example 2]
除了使用在實施例1之(1-2)中添加0.1重量份的有機鈦化合物(鈦酸四異丙酯,ORGATIX TA-8,Matsumoto Fine Chemical Co., Ltd.製)來取代0.1重量份的有機矽化合物而獲得之基材薄膜以外,比照實施例1製作堆疊體及偏光板,並比照實施例1進行評價。結果揭示於表1。Except that 0.1 parts by weight of organotitanium compound (tetraisopropyl titanate, ORGATIX TA-8, manufactured by Matsumoto Fine Chemical Co., Ltd.) was added in Example 1 (1-2) to replace 0.1 parts by weight of In addition to the substrate film obtained by using an organosilicon compound, a stacked body and a polarizing plate were produced by referring to Example 1, and evaluated by referring to Example 1. The results are disclosed in Table 1.
[實施例3][Example 3]
除了使用在實施例1之(1-2)中添加0.1重量份的有機鋯化合物(鋯酸正丙酯,ORGATIX ZA-45,Matsumoto Fine Chemical Co., Ltd.製)來取代0.1重量份的有機矽化合物而獲得之基材薄膜以外,比照實施例1製作堆疊體及偏光板,並比照實施例1進行評價。結果揭示於表1。Except that 0.1 parts by weight of organic zirconium compound (n-propyl zirconate, ORGATIX ZA-45, manufactured by Matsumoto Fine Chemical Co., Ltd.) was added in Example 1 (1-2) to replace 0.1 parts by weight of organic In addition to the base film obtained by using a silicon compound, a stacked body and a polarizing plate were produced and evaluated in accordance with Example 1. The results are disclosed in Table 1.
[實施例4][Example 4]
除了在實施例1之(1-2)中,於進行使用模塗機將製膜用塗布液塗布至隔離膜並乾燥的操作時,調整塗布量等而製造厚度為5 μm之長條的基材薄膜(寬度及長度與實施例1相同)以外,比照實施例1製作堆疊體及偏光板,並比照實施例1進行評價。結果揭示於表1。Except in (1-2) of Example 1, when performing the operation of applying the coating liquid for film formation to the separator using a die coater and drying it, adjusting the coating amount and the like to manufacture a long strip with a thickness of 5 μm Except for the material film (the width and length are the same as in Example 1), a stacked body and a polarizing plate were produced in comparison with Example 1, and evaluated in comparison with Example 1. The results are disclosed in Table 1.
[實施例5][Example 5]
除了在實施例1之(1-2)中,未使用聚異丁烯以外,比照實施例1製作堆疊體及偏光板,並比照實施例1進行評價。結果揭示於表2。在該實施例5中所使用之基材薄膜的MFR為3 g/10分鐘,拉伸彈性模數為800 MPa。Except that in (1-2) of Example 1, polyisobutylene was not used, a stacked body and a polarizing plate were manufactured in accordance with Example 1, and evaluated in comparison with Example 1. The results are disclosed in Table 2. The base film used in Example 5 had an MFR of 3 g/10 minutes and a tensile modulus of 800 MPa.
[實施例6][Example 6]
除了在實施例1之(1-2)中,未使用有機矽化合物,以及於進行使用模塗機將製膜用塗布液塗布至隔離膜並乾燥的操作時,調整塗布量等而製造厚度為5 μm之長條的基材薄膜(寬度及長度與實施例1相同)以外,比照實施例1製作堆疊體及偏光板,並比照實施例1進行評價。結果揭示於表2。Except in (1-2) of Example 1, no organosilicon compound was used, and when the film-forming coating liquid was applied to the separator using a die coater and dried, the coating amount was adjusted to produce a thickness of Except for the base film having a length of 5 μm (the width and length are the same as in Example 1), a stacked body and a polarizing plate were produced in accordance with Example 1, and evaluated in comparison with Example 1. The results are disclosed in Table 2.
[比較例1][Comparative example 1]
在實施例1之(1-4)中,僅使用未延伸之聚乙烯醇樹脂薄膜(PVA20)來取代在(1-3)中所製造之堆疊體,進行與(1-4)相同之操作的結果,在第一延伸處理及第二延伸處理中多次發生熔斷,在乾燥工序中多次發生斷裂,無法評價密合性及黑色偏移。In (1-4) of Example 1, only the unstretched polyvinyl alcohol resin film (PVA20) was used instead of the stack produced in (1-3), and the same operation as (1-4) was performed As a result, melting occurred many times in the first stretching process and the second stretching process, and fractures occurred many times in the drying process, and the adhesiveness and black shift could not be evaluated.
[比較例2][Comparative example 2]
除了在實施例1之(1-3)中使用彈性模數為2300 MPa之環烯烴系樹脂薄膜(Zeonor Film,日本瑞翁製,厚度13 μm,無法量測在溫度190℃、荷重2.16 kg下的MFR)來取代在(1-2)中所製造之基材薄膜以外,比照實施例1製造堆疊體。使用該堆疊體進行與實施例1之(1-4)相同之操作的結果,在第一延伸處理中發生斷裂而無法製作偏光板。Except that in Example 1 (1-3), a cycloolefin-based resin film with an elastic modulus of 2300 MPa (Zeonor Film, manufactured by Zeon, Japan, with a thickness of 13 μm cannot be measured at a temperature of 190°C and a load of 2.16 kg. MFR) to replace the base film produced in (1-2), a stacked body was produced in accordance with Example 1. As a result of performing the same operation as (1-4) of Example 1 using this stacked body, fracture occurred in the first stretching process and a polarizing plate could not be produced.
實施例及比較例的評價結果揭示於表1及表2。The evaluation results of Examples and Comparative Examples are shown in Table 1 and Table 2.
表中,所謂「COP」,意謂環烯烴系樹脂。In the table, "COP" means cycloolefin resin.
表中,所謂「Re2(50℃)」,意謂於在50℃之溫度條件下將堆疊體自由端單軸延伸至6.0倍時所產生的基材薄膜之面內方向的相位差,所謂「Re2(120℃)」,意謂於在120℃之溫度條件下將堆疊體自由端單軸延伸至6.0倍時所產生的基材薄膜之面內方向的相位差。In the table, "Re2 (50°C)" means the retardation in the in-plane direction of the base film produced when the free end of the stack is uniaxially stretched to 6.0 times at a temperature of 50°C. Re2 (120°C)" means the retardation in the in-plane direction of the base film produced when the free end of the stack is uniaxially stretched to 6.0 times at a temperature of 120°C.
表中,所謂「Re1」,意謂在堆疊體中之聚乙烯醇樹脂薄膜之面內方向的相位差。In the table, "Re1" means the retardation in the in-plane direction of the polyvinyl alcohol resin film in the stack.
『表1』
『表2』
由表1及表2的結果可知,根據本發明,可減小於歷經延伸堆疊體之工序後之基材薄膜顯現的相位差,可獲得密合性、乾燥工序性及光學物理性質優異的偏光板。由此可知,得提供「即便將基材薄膜作為保護薄膜仍可使用,且即便厚度薄仍可有效率製造」的偏光板用堆疊體、使用該堆疊體的偏光板及顯示裝置,以及偏光板的製造方法。From the results in Table 1 and Table 2, it can be seen that according to the present invention, the phase difference exhibited by the substrate film after the process of stretching the stack can be reduced, and polarized light with excellent adhesion, drying processability, and optical physical properties can be obtained. plate. From this, it can be seen that it is possible to provide a stacked body for polarizing plates that "can be used even if the base film is used as a protective film, and can be efficiently manufactured even if it is thin", a polarizing plate and a display device using the stacked body, and a polarizing plate manufacturing method.
10、15‧‧‧堆疊體(偏光板用堆疊體)
11‧‧‧聚乙烯醇樹脂薄膜(PVA樹脂薄膜)
12‧‧‧基材薄膜
13‧‧‧接合劑層
100、120、130、150、160、170‧‧‧偏光板
111‧‧‧聚乙烯醇樹脂薄膜(PVA樹脂薄膜)
112‧‧‧基材薄膜
113、114‧‧‧接合劑層
115‧‧‧保護薄膜
116‧‧‧黏合劑層
200‧‧‧製造裝置
201、202‧‧‧捲出裝置
203‧‧‧收捲裝置
205‧‧‧貼合裝置
300‧‧‧製造裝置
301、307‧‧‧捲出裝置
302~305‧‧‧處理裝置
306、309‧‧‧乾燥裝置
308‧‧‧貼合裝置
310‧‧‧收捲裝置
400、450、460‧‧‧顯示裝置(液晶顯示裝置)
410、420‧‧‧基板
430‧‧‧液晶層
500、550、560‧‧‧顯示裝置(有機EL顯示裝置)
510、520‧‧‧基板
530‧‧‧發光層
10. 15‧‧‧Stacks (stacks for polarizing plates)
11‧‧‧Polyvinyl alcohol resin film (PVA resin film)
12‧‧‧
〈圖1〉圖1係繪示本發明之實施型態1相關之偏光板用堆疊體的剖面示意圖。<FIG. 1> FIG. 1 is a schematic cross-sectional view of a stacked body for polarizing plates related to Embodiment 1 of the present invention.
〈圖2〉圖2係繪示實施型態1相關之偏光板用堆疊體的製造裝置之一例的示意圖。<FIG. 2> FIG. 2 is a schematic diagram showing an example of a manufacturing apparatus for a stacked body for polarizing plates related to Embodiment 1.
〈圖3〉圖3係繪示使用本發明之實施型態1相關之偏光板用堆疊體所製造之偏光板的剖面示意圖。<FIG. 3> FIG. 3 is a schematic cross-sectional view of a polarizing plate manufactured using the stacked body for polarizing plates related to Embodiment 1 of the present invention.
〈圖4〉圖4係繪示使用實施型態1相關之偏光板用堆疊體來製造偏光板的製造裝置之一例的示意圖。<FIG. 4> FIG. 4 is a schematic view showing an example of a manufacturing apparatus for manufacturing a polarizing plate using the polarizing plate stack according to Embodiment 1.
〈圖5〉圖5係繪示使用本發明之實施型態1相關之偏光板用堆疊體所製造的變形例1之偏光板的剖面示意圖。<FIG. 5> FIG. 5 is a schematic cross-sectional view showing a polarizing plate according to Modification 1 manufactured using the stacked body for polarizing plates according to Embodiment 1 of the present invention.
〈圖6〉圖6係繪示使用本發明之實施型態1相關之偏光板用堆疊體所製造的變形例2之偏光板的剖面示意圖。<FIG. 6> FIG. 6 is a schematic cross-sectional view showing a polarizing plate according to Modification 2 manufactured using the stacked body for polarizing plates according to Embodiment 1 of the present invention.
〈圖7〉圖7係繪示本發明之實施型態2相關之偏光板用堆疊體的剖面示意圖。<FIG. 7> FIG. 7 is a schematic cross-sectional view of a stacked body for polarizing plates related to Embodiment 2 of the present invention.
〈圖8〉圖8係繪示使用本發明之實施型態2相關之偏光板用堆疊體所製造之偏光板的剖面示意圖。<FIG. 8> FIG. 8 is a schematic cross-sectional view of a polarizing plate manufactured using the stacked body for polarizing plates related to Embodiment 2 of the present invention.
〈圖9〉圖9係繪示使用本發明之實施型態2相關之偏光板用堆疊體所製造的變形例3之偏光板的剖面示意圖。<FIG. 9> FIG. 9 is a schematic cross-sectional view showing a polarizing plate according to Modification 3 manufactured using the stacked body for polarizing plates according to Embodiment 2 of the present invention.
〈圖10〉圖10係繪示使用本發明之實施型態2相關之偏光板用堆疊體所製造的變形例4之偏光板的剖面示意圖。<FIG. 10> FIG. 10 is a schematic cross-sectional view showing a polarizing plate according to Modification 4 manufactured using the stacked body for polarizing plates related to Embodiment 2 of the present invention.
〈圖11〉圖11係繪示本發明之實施型態3相關之顯示裝置的剖面示意圖。<FIG. 11> FIG. 11 is a schematic cross-sectional view of a display device related to Embodiment 3 of the present invention.
〈圖12〉圖12係繪示本發明之實施型態4相關之顯示裝置的剖面示意圖。<FIG. 12> FIG. 12 is a schematic cross-sectional view of a display device related to Embodiment 4 of the present invention.
〈圖13〉圖13係繪示本發明之實施型態5相關之顯示裝置的剖面示意圖。<FIG. 13> FIG. 13 is a schematic cross-sectional view of a display device related to Embodiment 5 of the present invention.
〈圖14〉圖14係繪示本發明之實施型態6相關之顯示裝置的剖面示意圖。<FIG. 14> FIG. 14 is a schematic cross-sectional view of a display device related to Embodiment 6 of the present invention.
〈圖15〉圖15係繪示本發明之實施型態7相關之顯示裝置的剖面示意圖。<FIG. 15> FIG. 15 is a schematic cross-sectional view of a display device related to Embodiment 7 of the present invention.
〈圖16〉圖16係繪示本發明之實施型態8相關之顯示裝置的剖面示意圖。<FIG. 16> FIG. 16 is a schematic cross-sectional view of a display device related to Embodiment 8 of the present invention.
10‧‧‧堆疊體(偏光板用堆疊體) 10‧‧‧Stack (stack for polarizer)
11‧‧‧聚乙烯醇樹脂薄膜(PVA樹脂薄膜) 11‧‧‧Polyvinyl alcohol resin film (PVA resin film)
12‧‧‧基材薄膜 12‧‧‧Substrate film
13‧‧‧接合劑層 13‧‧‧Adhesive layer
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KR (1) | KR102716966B1 (en) |
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Citations (5)
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JP2004004755A (en) * | 2002-04-18 | 2004-01-08 | Nitto Denko Corp | Polarization plate having optical compensation function, and liquid crystal display device using it |
JP2007137042A (en) * | 2004-12-28 | 2007-06-07 | Nippon Synthetic Chem Ind Co Ltd:The | Polyvinyl alcohol-based film, polarizing film using same, and polarizing plate |
TW201348823A (en) * | 2012-05-16 | 2013-12-01 | Fujifilm Corp | Liquid crystal display |
CN104169754A (en) * | 2012-03-15 | 2014-11-26 | 日本瑞翁株式会社 | Organic el display device |
TW201739826A (en) * | 2016-01-29 | 2017-11-16 | Zeon Corp | Resin composition and use thereof |
Family Cites Families (5)
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TWI225551B (en) * | 2002-04-18 | 2004-12-21 | Nitto Denko Corp | Polarization plate having optical compensation function and liquid crystal display device using the same |
JP4640566B2 (en) * | 2003-09-30 | 2011-03-02 | ソニーケミカル&インフォメーションデバイス株式会社 | Polarizer |
JP2009098653A (en) * | 2007-09-27 | 2009-05-07 | Nitto Denko Corp | Polarizing plate, optical film and image display device |
JP5487759B2 (en) | 2009-06-30 | 2014-05-07 | 日本ゼオン株式会社 | Film and manufacturing method thereof |
JP2017097048A (en) * | 2015-11-19 | 2017-06-01 | 日本合成化学工業株式会社 | Laminate for polarizing plate and polarizing plate |
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- 2018-12-25 CN CN201880081323.4A patent/CN111480101B/en active Active
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JP2004004755A (en) * | 2002-04-18 | 2004-01-08 | Nitto Denko Corp | Polarization plate having optical compensation function, and liquid crystal display device using it |
JP2007137042A (en) * | 2004-12-28 | 2007-06-07 | Nippon Synthetic Chem Ind Co Ltd:The | Polyvinyl alcohol-based film, polarizing film using same, and polarizing plate |
CN104169754A (en) * | 2012-03-15 | 2014-11-26 | 日本瑞翁株式会社 | Organic el display device |
TW201348823A (en) * | 2012-05-16 | 2013-12-01 | Fujifilm Corp | Liquid crystal display |
TW201739826A (en) * | 2016-01-29 | 2017-11-16 | Zeon Corp | Resin composition and use thereof |
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KR102716966B1 (en) | 2024-10-14 |
KR20200104297A (en) | 2020-09-03 |
CN111480101A (en) | 2020-07-31 |
TW201930083A (en) | 2019-08-01 |
WO2019131684A1 (en) | 2019-07-04 |
JPWO2019131684A1 (en) | 2021-01-21 |
JP7294142B2 (en) | 2023-06-20 |
CN111480101B (en) | 2022-04-08 |
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