TWI788099B - Electronic package and package substrate thereof - Google Patents

Electronic package and package substrate thereof Download PDF

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Publication number
TWI788099B
TWI788099B TW110142398A TW110142398A TWI788099B TW I788099 B TWI788099 B TW I788099B TW 110142398 A TW110142398 A TW 110142398A TW 110142398 A TW110142398 A TW 110142398A TW I788099 B TWI788099 B TW I788099B
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Taiwan
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insulating
layer
packaging substrate
insulating layer
package
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TW110142398A
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Chinese (zh)
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TW202322295A (en
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陳敏堯
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大陸商芯愛科技(南京)有限公司
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Priority to TW110142398A priority Critical patent/TWI788099B/en
Priority to CN202210013291.2A priority patent/CN116130448A/en
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Publication of TWI788099B publication Critical patent/TWI788099B/en
Publication of TW202322295A publication Critical patent/TW202322295A/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49866Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
    • H01L23/49894Materials of the insulating layers or coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • H01L23/49816Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49822Multilayer substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49827Via connections through the substrates, e.g. pins going through the substrate, coaxial cables

Abstract

An electronic package is provided in which a first insulating layer is disposed on a chip side of a package substrate and a second insulating layer is disposed on an external side of the package substrate, wherein a coefficient of thermal expansion of the first insulating layer is larger than a coefficient of thermal expansion of the second insulating layer, so that stretch of the first insulating layer on the chip side can be used to adjust degree of warpage of the packaging substrate to reduce deformation of the packaging substrate.

Description

電子封裝件及其封裝基板 Electronic package and its packaging substrate

本發明係有關一種半導體封裝,尤指一種具嵌埋型線路(Embedded Trace)之封裝基板及其後續所製作成之電子封裝件。 The present invention relates to a semiconductor package, in particular to a package substrate with embedded traces and an electronic package made thereafter.

隨著電子產業的蓬勃發展,電子產品在型態上趨於輕薄短小,在功能上則朝高性能、高功能、高速化的研發方向。因此,為滿足半導體裝置之高積集度(Integration)及微型化(Miniaturization)需求,故於封裝製程中,常常採用具有高密度及細間距之線路的封裝基板。 With the vigorous development of the electronic industry, electronic products tend to be thinner and smaller in form, and are developing toward high-performance, high-function, and high-speed research and development in terms of function. Therefore, in order to meet the high integration and miniaturization requirements of semiconductor devices, packaging substrates with high-density and fine-pitch circuits are often used in the packaging process.

如圖1A所示,習知封裝基板1a係包含一具有複數導電柱100之核心層10、分別設於該核心層10相對兩側之複數介電層11、及設於各該介電層11上之線路層12,以藉由該複數導電柱100電性導通位於該核心層10相對兩側之該些線路層12。 As shown in FIG. 1A, a conventional packaging substrate 1a includes a core layer 10 having a plurality of conductive pillars 100, a plurality of dielectric layers 11 respectively disposed on opposite sides of the core layer 10, and a plurality of dielectric layers 11 disposed on each of the dielectric layers 11. The wiring layers 12 on the core layer 10 are electrically connected to the wiring layers 12 on opposite sides of the core layer 10 through the plurality of conductive pillars 100 .

然而,習知封裝基板1a係包含核心層10,因而難以符合輕薄短小之需求,故遂發展出無核心層(coreless)態樣之封裝基板1b,如圖1B所示,其包含複數層疊而成之介電層11、及設於各該介電層11上之線路層12。 However, the conventional packaging substrate 1a includes a core layer 10, so it is difficult to meet the requirements of lightness, thinness and shortness. Therefore, a packaging substrate 1b without a core layer (coreless) has been developed, as shown in FIG. 1B, which includes multiple stacked The dielectric layer 11, and the circuit layer 12 arranged on each of the dielectric layers 11.

惟,習知封裝基板1b中,各該介電層11的材質及厚度均相同,故於封裝過程中,該封裝基板1於溫度循環(temperature cycle)時,其容易因厚度過薄而發生翹曲(warpage),導致於後續接置半導體晶片或電路板時,會發生不沾錫(non-wetting)之問題,造成電性連接不佳之問題。 However, in the conventional packaging substrate 1b, the material and thickness of each of the dielectric layers 11 are the same, so during the packaging process, when the packaging substrate 1 is subjected to a temperature cycle (temperature cycle), it is easy to warp due to the thickness being too thin. Warpage will cause non-wetting problems in the subsequent placement of semiconductor chips or circuit boards, resulting in poor electrical connections.

另一方面,若增加該介電層11之厚度,雖可減緩翹曲的情況,但會增加該封裝基板1b之厚度,致使無法符合輕薄短小的需求。 On the other hand, if the thickness of the dielectric layer 11 is increased, although the warpage can be alleviated, the thickness of the packaging substrate 1b will be increased, so that it cannot meet the requirement of lightness, thinness and compactness.

因此,如何克服上述習知技術的種種問題,實已成目前亟欲解決的課題。 Therefore, how to overcome the various problems of the above-mentioned conventional technologies has become an urgent problem to be solved at present.

鑑於上述習知技術之種種缺失,本發明係提供一種封裝基板,係包括:一包含至少一第一絕緣層之第一絕緣部;一包含至少一第二絕緣層之第二絕緣部,係疊合於該第一絕緣部上以形成絕緣結構,且該絕緣結構係具有相對之置晶側與外接側,以令該第一絕緣層對應配置於該置晶側,而該第二絕緣層對應配置於該外接側,其中,該第一絕緣部之熱膨脹係數係大於該第二絕緣部之熱膨脹係數;以及線路層,係以嵌埋方式配置於該第一絕緣部與第二絕緣部中。 In view of the various deficiencies of the above-mentioned prior art, the present invention provides a packaging substrate, comprising: a first insulating portion comprising at least one first insulating layer; a second insulating portion comprising at least one second insulating layer, stacked combined on the first insulating part to form an insulating structure, and the insulating structure has opposite crystal placement side and external connection side, so that the first insulating layer is correspondingly disposed on the crystal placement side, and the second insulating layer is corresponding to It is disposed on the external side, wherein the thermal expansion coefficient of the first insulating portion is greater than that of the second insulating portion; and the circuit layer is embedded in the first insulating portion and the second insulating portion.

前述之封裝基板中,該第二絕緣部係具有複數該第二絕緣層。例如,複數該第二絕緣層之至少二者之熱膨脹係數係為相同或不相同。或者,複數該第二絕緣層之熱膨脹係數係朝向該外接側遞減或遞增。 In the aforementioned packaging substrate, the second insulating portion has a plurality of the second insulating layers. For example, the thermal expansion coefficients of at least two of the plurality of second insulating layers are the same or different. Alternatively, the thermal expansion coefficients of the plurality of second insulating layers decrease or increase towards the outer side.

前述之封裝基板中,形成該第一絕緣層之材質係為味之素增層膜。 In the aforementioned packaging substrate, the material forming the first insulating layer is an Ajinomoto build-up film.

前述之封裝基板中,形成該第二絕緣層之材質係為預浸材。 In the aforementioned packaging substrate, the material forming the second insulating layer is a prepreg material.

前述之封裝基板中,該第一絕緣層與第二絕緣層之厚度係相同或相異。 In the aforementioned packaging substrate, the thicknesses of the first insulating layer and the second insulating layer are the same or different.

前述之封裝基板中,復包括設於該第一及/或第二絕緣部上並外露部分該線路層之絕緣保護層。 The aforementioned packaging substrate further includes an insulating protective layer disposed on the first and/or second insulating portion and exposing part of the circuit layer.

本發明復提供一種電子封裝件,係包括:一前述之封裝基板;以及電子元件,係設於該置晶側上且電性連接該線路層。 The present invention further provides an electronic package, which includes: the above-mentioned package substrate; and electronic components, which are arranged on the die-mounting side and electrically connected to the circuit layer.

前述之電子封裝件中,該外接側上係配置有複數電性連接該線路層之導電元件。 In the aforementioned electronic package, a plurality of conductive elements electrically connected to the circuit layer are disposed on the external side.

由上可知,本發明之封裝基板,主要藉由該第一絕緣層之熱膨脹係數大於該第二絕緣層之熱膨脹係數,使位於該置晶側之第一絕緣層的伸縮量可用於調整該封裝基板的翹曲程度,故相較於習知技術,本發明之封裝基板無需增加該各絕緣層之厚度,即可減少該封裝基板翹曲之形變量,因而不僅能提高產品良率,且能符合輕薄短小的需求。 It can be seen from the above that the packaging substrate of the present invention mainly uses the thermal expansion coefficient of the first insulating layer to be greater than the thermal expansion coefficient of the second insulating layer, so that the expansion and contraction of the first insulating layer on the side where the chip is placed can be used to adjust the package. Therefore, compared with the prior art, the packaging substrate of the present invention does not need to increase the thickness of the insulating layers, and can reduce the warping deformation of the packaging substrate, thereby not only improving product yield, but also enabling Meet the needs of thin and light.

1a,1b,2,3:封裝基板 1a, 1b, 2, 3: package substrate

10:核心層 10: Core layer

100:導電柱 100: Conductive column

11:介電層 11: Dielectric layer

12,20:線路層 12,20: line layer

2a,3a:第一絕緣部 2a, 3a: first insulating part

2b:第二絕緣部 2b: Second insulating part

20a:置晶側 20a: crystal side

20b:外接側 20b: External side

201:導電跡線 201: Conductive trace

202:導電盲孔 202: Conductive blind hole

203:電性連接墊 203: Electrical connection pad

204:焊墊 204: welding pad

21:第一絕緣層 21: The first insulating layer

22,23,24,25:第二絕緣層 22,23,24,25: second insulating layer

26a:第一絕緣保護層 26a: the first insulation protection layer

26b:第二絕緣保護層 26b: the second insulation protection layer

30:半導體晶片 30: Semiconductor wafer

30a:作用面 30a: Action surface

30b:非作用面 30b: Non-active surface

300:電極墊 300: electrode pad

31:導電凸塊 31: Conductive bump

32:導電元件 32: Conductive element

t:厚度 t: thickness

圖1A係為習知封裝基板之剖面示意圖。 FIG. 1A is a schematic cross-sectional view of a conventional packaging substrate.

圖1B係為習知另一封裝基板之剖面示意圖。 FIG. 1B is a schematic cross-sectional view of another conventional packaging substrate.

圖2A係為本發明之封裝基板之剖視示意圖。 FIG. 2A is a schematic cross-sectional view of the packaging substrate of the present invention.

圖2B係為本發明之電子封裝件之剖視示意圖。 FIG. 2B is a schematic cross-sectional view of the electronic package of the present invention.

圖3係為本發明之封裝基板之另一實施例之剖視示意圖。 FIG. 3 is a schematic cross-sectional view of another embodiment of the packaging substrate of the present invention.

以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The implementation of the present invention is described below through specific specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「上」、「第一」、「第二」及「一」等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It should be noted that the structures, proportions, sizes, etc. shown in the drawings attached to this specification are only used to match the content disclosed in the specification, for the understanding and reading of those familiar with this technology, and are not used to limit the implementation of the present invention Therefore, it has no technical substantive meaning. Any modification of structure, change of proportional relationship or adjustment of size shall still fall within the scope of this invention without affecting the effect and purpose of the present invention. The technical content disclosed by the invention must be within the scope covered. At the same time, terms such as "above", "first", "second" and "one" quoted in this specification are only for the convenience of description and are not used to limit the scope of the present invention. The change or adjustment of the relative relationship shall also be regarded as the applicable scope of the present invention if there is no substantial change in the technical content.

圖2A係為本發明之封裝基板2的剖面示意圖。如圖2A所示,該封裝基板2係為無核心層(coreless)態樣,其包括:一第一絕緣部2a、一疊合於該第一絕緣部2a上之第二絕緣部2b、以及至少一線路層20,且該第一絕緣部2a係包含至少一第一絕緣層,該第二絕緣部2b係包含至少一第二絕緣層,在本實施態樣中,係具有一層第一絕緣層21及層疊排設之四層第二絕緣層22,23,24,25,以形成絕緣結構。 FIG. 2A is a schematic cross-sectional view of the packaging substrate 2 of the present invention. As shown in FIG. 2A , the packaging substrate 2 is a coreless form, which includes: a first insulating portion 2a, a second insulating portion 2b stacked on the first insulating portion 2a, and At least one circuit layer 20, and the first insulating portion 2a includes at least one first insulating layer, and the second insulating portion 2b includes at least one second insulating layer, in this embodiment, it has a layer of first insulating layer Layer 21 and four second insulating layers 22, 23, 24, 25 are stacked and arranged to form an insulating structure.

所述之第一絕緣部2a係作為該絕緣結構之置晶側20a,而該第二絕緣部2b係作為該絕緣結構之外接側20b,即該第一絕緣層21係對應配置於該置晶側20a,而該第二絕緣層22,23,24,25係對應配置於該外接側20b,其中,該第一絕緣部2a(或第一絕緣層21)之熱膨脹係數(如至少4ppm/℃)係大於該第二絕緣部2b(或該些第二絕緣層22,23,24,25)之熱膨脹係數(如至多2ppm/℃)。 The first insulating part 2a is used as the crystal side 20a of the insulating structure, and the second insulating part 2b is used as the outer side 20b of the insulating structure, that is, the first insulating layer 21 is correspondingly arranged on the chip. side 20a, and the second insulating layers 22, 23, 24, 25 are correspondingly arranged on the outer side 20b, wherein the thermal expansion coefficient of the first insulating part 2a (or the first insulating layer 21) (such as at least 4ppm/°C ) is greater than the coefficient of thermal expansion (eg, at most 2 ppm/° C.) of the second insulating portion 2 b (or the second insulating layers 22 , 23 , 24 , 25 ).

於本實施例中,該第二絕緣部2b係具有複數該第二絕緣層22,23,24,25,其熱膨脹係數可相同或相異,但均小於該第一絕緣部2a(或第一絕 緣層21)之熱膨脹係數。例如,該些第二絕緣層22,23,24,25之CTE可朝向該外接側20b遞減或遞增。 In this embodiment, the second insulating part 2b has a plurality of the second insulating layers 22, 23, 24, 25, and their thermal expansion coefficients may be the same or different, but they are all smaller than the first insulating part 2a (or the first absolutely Insulation layer 21) thermal expansion coefficient. For example, the CTEs of the second insulating layers 22 , 23 , 24 , 25 can decrease or increase towards the outer side 20 b.

再者,形成該第一絕緣層21之材質係為如味之素增層膜(Ajinomoto Build-up Film,簡稱ABF)或其它高CTE之介電材,且形成該第二絕緣層22,23,24,25之材質係為如預浸材(Prepreg,簡稱PP)或其它低CTE之介電材。 Furthermore, the material forming the first insulating layer 21 is Ajinomoto Build-up Film (ABF for short) or other high CTE dielectric materials, and the second insulating layers 22, 23 are formed ,24,25 are made of materials such as prepreg (PP for short) or other low CTE dielectric materials.

又,該封裝基板2可包括如防銲層之絕緣保護層,其設於該第一與第二絕緣部2a,2b上並外露該線路層20,以供該線路層20結合其它元件。例如,將第一絕緣保護層26a設於該第一絕緣層21上並外露該線路層20之部分表面,且將第二絕緣保護層26b設於該第二絕緣層25上並外露該線路層20之部分表面。 In addition, the package substrate 2 may include an insulating protection layer such as a solder resist layer, which is disposed on the first and second insulating portions 2a, 2b and exposes the circuit layer 20 for the circuit layer 20 to be combined with other components. For example, the first insulating protection layer 26a is arranged on the first insulating layer 21 and exposes part of the surface of the circuit layer 20, and the second insulating protection layer 26b is arranged on the second insulating layer 25 and exposes the circuit layer. Partial surface of 20.

另外,該第一絕緣層21與第二絕緣層22,23,24,25之厚度t可依需求調整,且各層絕緣層之厚度t可相同或相異,而其絕緣層之數量可為單數或偶數,並無特別限制。 In addition, the thickness t of the first insulating layer 21 and the second insulating layer 22, 23, 24, 25 can be adjusted according to requirements, and the thickness t of each insulating layer can be the same or different, and the number of insulating layers can be singular or an even number, and is not particularly limited.

所述之線路層20係以嵌埋方式配置於該第一絕緣層21與第二絕緣層22,23,24,25中,且包含複數導電跡線201與電性導通各層導電跡線201之導電盲孔202。換言之,各該導電跡線201與導電盲孔202未凸出包埋該二者之該第一絕緣層21與第二絕緣層22,23,24,25。 The circuit layer 20 is embedded in the first insulating layer 21 and the second insulating layer 22, 23, 24, 25, and includes a plurality of conductive traces 201 and conductive traces 201 electrically connected to each layer. Conductive blind vias 202 . In other words, each of the conductive traces 201 and the conductive blind vias 202 does not protrude from the first insulating layer 21 and the second insulating layer 22 , 23 , 24 , 25 that embed them.

於本實施例中,該線路層20係於對應該置晶側20a處配置有複數電性連接墊203,且於對應該外接側20b處配置有複數焊墊204,以令該些電性連接墊203外露於該第一絕緣保護層26a,且該些焊墊204外露於該第二絕緣保護層26b。 In this embodiment, the circuit layer 20 is provided with a plurality of electrical connection pads 203 corresponding to the die-mounting side 20a, and a plurality of welding pads 204 are disposed corresponding to the external connection side 20b, so that these electrical connections The pads 203 are exposed on the first insulating protection layer 26a, and the pads 204 are exposed on the second insulating protection layer 26b.

因此,本發明之封裝基板2係藉由該第一絕緣層21之熱膨脹係數大於該第二絕緣層22,23,24,25之熱膨脹係數,故於封裝過程中,該封裝基板2於溫度循環時,該第一絕緣層21與第二絕緣層22,23,24,25的伸縮量不同,藉以調整翹曲的方向而平衡該封裝基板2的翹曲程度(例如,該封裝基板2可減少圖1B所 示之翹曲變形量10%至60%),使該封裝基板2於溫度升降過程中大幅減緩翹曲程度。 Therefore, in the packaging substrate 2 of the present invention, the thermal expansion coefficient of the first insulating layer 21 is greater than the thermal expansion coefficient of the second insulating layer 22, 23, 24, 25, so in the packaging process, the packaging substrate 2 undergoes temperature cycling. , the expansion and contraction of the first insulating layer 21 and the second insulating layer 22, 23, 24, 25 are different, so as to adjust the warping direction and balance the warping degree of the packaging substrate 2 (for example, the packaging substrate 2 can be reduced Figure 1B 10% to 60% of the warping deformation shown), so that the packaging substrate 2 can greatly reduce the warping degree during the temperature rise and fall.

再者,由於該封裝基板2之翹曲程度大幅減緩,使得各該導電跡線201不會因翹曲而過於靠近,因而該線路層20有利於細間距/細線路之設計,故該導電盲孔202、電性連接墊203及焊墊204能依需求設計為細間距/細線路之規格,以滿足半導體晶片之高密度接點數之需求。 Furthermore, since the warping of the packaging substrate 2 is greatly reduced, the conductive traces 201 will not be too close due to warping, so the circuit layer 20 is conducive to the design of fine pitch/fine lines, so the conductive blind The holes 202, the electrical connection pads 203 and the welding pads 204 can be designed as fine-pitch/thin-line specifications according to requirements, so as to meet the requirements of high-density contacts of semiconductor chips.

又,由於該線路層20能符合細間距/細線路之需求,故於相同佈線數量下,該封裝基板2用於製作該線路層20之金屬材用量係少於習知封裝基板1b用於製作該線路層12之金屬材用量,因而能減少該封裝基板2之製作成本。 Also, since the circuit layer 20 can meet the requirements of fine pitch/fine circuit, under the same amount of wiring, the amount of metal material used to make the circuit layer 20 in the package substrate 2 is less than that used in the conventional package substrate 1b. The amount of metal material used in the circuit layer 12 can reduce the manufacturing cost of the packaging substrate 2 .

另外,由於CTE較大之介電材較為便宜,故於該置晶側20a處選擇CTE較大之介電材作為第一絕緣層21,亦能有效降低該封裝基板2之製作成本。 In addition, since the dielectric material with a larger CTE is relatively cheap, choosing a dielectric material with a larger CTE as the first insulating layer 21 at the die placement side 20 a can also effectively reduce the manufacturing cost of the packaging substrate 2 .

如圖2B所示,於後續應用中,該封裝基板2可於該複數電性連接墊203上接合至少一半導體晶片30,且於該些焊墊204上結合如焊球或其它金屬凸塊之導電元件32,以形成電子封裝件,且該電子封裝件藉由該些導電元件32接置於一電路板(圖略)上。 As shown in FIG. 2B , in subsequent applications, the package substrate 2 can be bonded to at least one semiconductor chip 30 on the plurality of electrical connection pads 203 , and bonded on the pads 204 such as solder balls or other metal bumps. The conductive elements 32 are used to form an electronic package, and the electronic package is connected to a circuit board (not shown) through the conductive elements 32 .

所述之電子元件30係為主動元件、被動元件或其組合,其中,該主動元件係例如半導體晶片,且該被動元件係例如電阻、電容及電感。 The electronic component 30 is an active component, a passive component or a combination thereof, wherein the active component is such as a semiconductor chip, and the passive component is such as a resistor, capacitor and inductor.

於本實施例中,該電子元件30係為半導體晶片,其具有相對之作用面30a與非作用面30b,該作用面30a上具有複數電極墊300,且該電子元件30以其電極墊300藉由複數導電凸塊31覆晶結合並電性連接該電性連接墊203,再以底膠(圖略)形成於該電子元件30與該置晶側20a之間以包覆該些導電凸塊31;或者,該電子元件30之電極墊300可藉由複數銲線(圖略)以打線方式電性連接該電性連接墊203。亦或,該電子元件30之電極墊300可在沒有第一絕緣保護層 26a的情況下直接接觸該電性連接墊203。然而,有關該電子元件30電性連接該線路層20之方式不限於上述。 In the present embodiment, the electronic component 30 is a semiconductor chip, which has an opposite active surface 30a and a non-active surface 30b. There are a plurality of electrode pads 300 on the active surface 30a, and the electronic component 30 is borrowed by its electrode pad 300. A plurality of conductive bumps 31 are flip-chip bonded and electrically connected to the electrical connection pad 203, and then a primer (not shown) is formed between the electronic component 30 and the chip side 20a to cover the conductive bumps 31; or, the electrode pad 300 of the electronic component 30 can be electrically connected to the electrical connection pad 203 by a plurality of bonding wires (not shown) in a wire bonding manner. Or, the electrode pad 300 of the electronic component 30 can be without the first insulating protective layer 26a directly contacts the electrical connection pad 203 . However, the manner in which the electronic component 30 is electrically connected to the circuit layer 20 is not limited to the above.

所述之導電元件32係電性連接該線路層20與該電路板。 The conductive element 32 is electrically connected to the circuit layer 20 and the circuit board.

圖3係為本發明之封裝基板3之另一實施例的剖面示意圖。如圖3所示,本實施例之封裝基板3係為無核心層(coreless)態樣,其第一絕緣部3a係包含複數層疊排設之第一絕緣層21。 FIG. 3 is a schematic cross-sectional view of another embodiment of the packaging substrate 3 of the present invention. As shown in FIG. 3 , the packaging substrate 3 of this embodiment is coreless, and its first insulating portion 3 a includes a plurality of stacked first insulating layers 21 .

因此,本發明之封裝基板3係藉由該第一絕緣部3a之熱膨脹係數大於該第二絕緣部2b之熱膨脹係數,故於封裝過程中,該封裝基板3於溫度循環時,該第一絕緣部3a與第二絕緣部2b的伸縮量不同,藉以調整翹曲的方向而平衡該封裝基板3的翹曲程度,使該封裝基板3於溫度升降過程中大幅減緩翹曲程度。 Therefore, the packaging substrate 3 of the present invention is due to the thermal expansion coefficient of the first insulating portion 3a being greater than the thermal expansion coefficient of the second insulating portion 2b, so in the packaging process, when the packaging substrate 3 is in a temperature cycle, the first insulating The expansion and contraction of the portion 3 a and the second insulating portion 2 b are different, so as to adjust the warping direction and balance the warping degree of the packaging substrate 3 , so that the warping degree of the packaging substrate 3 is greatly reduced during the temperature rise and fall process.

再者,由於該封裝基板3之翹曲程度大幅減緩,使得各該導電跡線201不會因翹曲而過於靠近,因而該線路層20有利於細間距/細線路之設計,以滿足半導體晶片之高密度接點數之需求。 Furthermore, since the warpage of the packaging substrate 3 is greatly reduced, the conductive traces 201 will not be too close to each other due to the warpage, so the circuit layer 20 is conducive to the design of fine pitches/fine lines to meet the needs of semiconductor chips. The demand for high-density contacts.

又,由於該線路層20能符合細間距/細線路之需求,故於相同佈線數量下,該封裝基板3用於製作該線路層20之金屬材用量係少於習知封裝基板1b用於製作該線路層12之金屬材用量,因而能減少該封裝基板3之製作成本。 Also, since the circuit layer 20 can meet the requirements of fine pitch/fine circuit, under the same amount of wiring, the amount of metal material used to make the circuit layer 20 in the package substrate 3 is less than that used in the conventional package substrate 1b. The amount of metal material used in the circuit layer 12 can reduce the manufacturing cost of the packaging substrate 3 .

另外,由於CTE較大之介電材較為便宜,故於該置晶側20a處選擇CTE較大之介電材作為第一絕緣部2a,亦能有效降低該封裝基板3之製作成本。 In addition, since the dielectric material with a larger CTE is relatively cheap, choosing a dielectric material with a larger CTE as the first insulating portion 2 a at the die placement side 20 a can also effectively reduce the manufacturing cost of the packaging substrate 3 .

應可理解地,有關該第一絕緣部之層數與第二絕緣部之層數可依需求配置,並無特別限制。 It should be understood that the number of layers of the first insulating portion and the number of layers of the second insulating portion can be configured according to requirements, and there is no special limitation.

綜上所述,本發明之封裝基板係藉由該第一絕緣部之熱膨脹係數大於該第二絕緣部之熱膨脹係數,使位於該置晶側之第一絕緣部的伸縮量能用於調整該封裝基板的翹曲程度,故相較於習知技術,本發明之封裝基板無需增加 該各絕緣層之厚度,即可減少該封裝基板翹曲之形變量,因而不僅能提高產品良率,且能符合輕薄短小的需求。 To sum up, the packaging substrate of the present invention uses the coefficient of thermal expansion of the first insulating portion to be greater than that of the second insulating portion, so that the amount of expansion and contraction of the first insulating portion on the side where the chip is placed can be used to adjust the The degree of warpage of the packaging substrate, so compared with the conventional technology, the packaging substrate of the present invention does not need to increase The thickness of each insulating layer can reduce the warping deformation of the package substrate, thereby not only improving the yield rate of products, but also meeting the requirements of lightness, thinness and shortness.

上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above-mentioned embodiments are used to illustrate the principles and effects of the present invention, but not to limit the present invention. Any person skilled in the art can modify the above-mentioned embodiments without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the rights of the present invention should be listed in the scope of the patent application described later.

2:封裝基板 2: Package substrate

2a:第一絕緣部 2a: the first insulating part

2b:第二絕緣部 2b: Second insulating part

20:線路層 20: Line layer

20a:置晶側 20a: crystal side

20b:外接側 20b: External side

201:導電跡線 201: Conductive trace

202:導電盲孔 202: Conductive blind hole

203:電性連接墊 203: Electrical connection pad

204:焊墊 204: welding pad

21:第一絕緣層 21: The first insulating layer

22,23,24,25:第二絕緣層 22,23,24,25: second insulating layer

26a:第一絕緣保護層 26a: the first insulation protection layer

26b:第二絕緣保護層 26b: the second insulation protection layer

t:厚度 t: thickness

Claims (8)

一種封裝基板,係包括:一包含至少一第一絕緣層之第一絕緣部;一包含複數第二絕緣層之第二絕緣部,係疊合於該第一絕緣部上以形成絕緣結構,且該絕緣結構係具有相對之置晶側與外接側,以令該第一絕緣層對應配置於該置晶側,而該第二絕緣層對應配置於該外接側,其中,該第一絕緣部之熱膨脹係數係大於該第二絕緣部之熱膨脹係數,且該複數第二絕緣層之熱膨脹係數係朝向該外接側遞減或遞增;以及線路層,係以嵌埋方式配置於該第一絕緣部與第二絕緣部中。 A packaging substrate, comprising: a first insulating portion comprising at least one first insulating layer; a second insulating portion comprising a plurality of second insulating layers, which is stacked on the first insulating portion to form an insulating structure, and The insulating structure has opposite crystal side and external side, so that the first insulating layer is correspondingly disposed on the crystal side, and the second insulating layer is correspondingly disposed on the external side, wherein the first insulating part The coefficient of thermal expansion is greater than that of the second insulating part, and the coefficient of thermal expansion of the plurality of second insulating layers decreases or increases toward the outer side; and the circuit layer is embedded in the first insulating part and the second insulating layer. In the second insulation part. 如請求項1所述之封裝基板,其中,複數該第二絕緣層之至少二者之熱膨脹係數係為相同或不相同。 The package substrate according to claim 1, wherein at least two of the plurality of second insulating layers have the same or different coefficients of thermal expansion. 如請求項1所述之封裝基板,其中,形成該第一絕緣層之材質係為味之素增層膜。 The packaging substrate according to claim 1, wherein the material forming the first insulating layer is an Ajinomoto build-up film. 如請求項1所述之封裝基板,其中,形成該第二絕緣層之材質係為預浸材。 The packaging substrate according to claim 1, wherein the material forming the second insulating layer is a prepreg material. 如請求項1所述之封裝基板,其中,該第一絕緣層與第二絕緣層之厚度係相同或相異。 The packaging substrate as claimed in claim 1, wherein the thicknesses of the first insulating layer and the second insulating layer are the same or different. 如請求項1所述之封裝基板,復包括設於該第一及/或第二絕緣部上並外露部分該線路層之絕緣保護層。 The packaging substrate as claimed in claim 1 further includes an insulating protective layer disposed on the first and/or second insulating portion and exposing part of the circuit layer. 一種電子封裝件,係包括:如請求項1所述之封裝基板;以及電子元件,係設於該置晶側上且電性連接該線路層。 An electronic package, comprising: the package substrate as claimed in Claim 1; and an electronic component disposed on the die side and electrically connected to the circuit layer. 如請求項7所述之電子封裝件,其中,該外接側上係配置有複數電性連接該線路層之導電元件。 The electronic package according to claim 7, wherein a plurality of conductive elements electrically connected to the circuit layer are disposed on the external side.
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