TWI787595B - Laser processing apparatus, laser processing method and error adjusting method - Google Patents

Laser processing apparatus, laser processing method and error adjusting method Download PDF

Info

Publication number
TWI787595B
TWI787595B TW109109927A TW109109927A TWI787595B TW I787595 B TWI787595 B TW I787595B TW 109109927 A TW109109927 A TW 109109927A TW 109109927 A TW109109927 A TW 109109927A TW I787595 B TWI787595 B TW I787595B
Authority
TW
Taiwan
Prior art keywords
aforementioned
processing
control device
processing platform
laser processing
Prior art date
Application number
TW109109927A
Other languages
Chinese (zh)
Other versions
TW202037438A (en
Inventor
竹内昌裕
Original Assignee
日商三菱電機股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商三菱電機股份有限公司 filed Critical 日商三菱電機股份有限公司
Publication of TW202037438A publication Critical patent/TW202037438A/en
Application granted granted Critical
Publication of TWI787595B publication Critical patent/TWI787595B/en

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/082Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Lasers (AREA)

Abstract

A laser processing apparatus (100) includes a control device (10), and repeats the process of interlocking a camera (7A) and a processing table (2A) to thereby measuring four or more reference marks to calculate a correction coefficient when the correction coefficient is to be calculated, wherein the control device (10) calculates a positioning error and the correction coefficient of the processing table (2A) based on the measurement positions of four or more reference marks, calculates a driving correction amount based on the measurement position of an alignment mark of a processed workpiece (3A) which has been corrected with the correction coefficient, and controls laser processing of the processing workpiece (3A) while driving a galvano scanner (5A) by using the drive correction amount.

Description

雷射加工裝置、雷射加工方法及誤差調整方法Laser processing device, laser processing method, and error adjustment method

本發明係關於一種進行載置於加工平台(table)上之加工工件之雷射加工的雷射加工裝置、雷射加工方法及誤差調整方法。The present invention relates to a laser processing device, a laser processing method and an error adjustment method for performing laser processing of a processed workpiece placed on a processing table.

雷射加工裝置係藉由使載置有加工工件的加工平台移動,而對於加工工件上的各種位置進行雷射加工。由於在此雷射加工裝置中加工平台會有定位誤差,因此雷射加工裝置必須根據定位誤差而修正雷射光的照射位置。The laser processing device performs laser processing on various positions on the workpiece by moving the processing platform on which the workpiece is placed. Since the processing platform in the laser processing device has a positioning error, the laser processing device must correct the irradiation position of the laser light according to the positioning error.

專利文獻1所記載的雷射加工裝置,係藉由可通過檢流計掃描儀(galvano scanner)觀察加工對象面的攝像機,檢測形成於檢流計掃描儀上之玻璃尺(glass scale)之尺度標記(scale mark)的位置,且從尺度標記的位置與檢測結果,而求出用以修正檢流計掃描儀之驅動量的修正值。 [先前技術文獻] [專利文獻]The laser processing device described in Patent Document 1 detects the scale of a glass scale formed on the galvano scanner by using a camera that can observe the surface of the processing object through the galvano scanner. The position of the scale mark, and the correction value for correcting the driving amount of the galvanometer scanner is obtained from the position of the scale mark and the detection result. [Prior Art Literature] [Patent Document]

專利文獻1:日本特開2008-264789號公報Patent Document 1: Japanese Patent Laid-Open No. 2008-264789

[發明所欲解決之課題][Problem to be Solved by the Invention]

然而,在上述專利文獻1的技術中,由於檢流計掃描儀未與攝像機連動,因此會有只能夠在可藉由檢流計掃描儀的移動而拍攝加工對象之圖像的範圍內進行修正,對於較檢流計掃描區域更廣範圍之加工平台上的加工對象區域則無法進行修正的問題。However, in the technology of the above-mentioned Patent Document 1, since the galvanometer scanner is not linked with the camera, correction can only be performed within the range where the image of the processing object can be captured by the movement of the galvanometer scanner. , the problem that it cannot be corrected for the processing object area on the processing platform with a wider range than the galvanometer scanning area.

本發明係有鑑於上述問題而研創者,其目的在獲得一種可將較檢流計掃描區域更廣範圍之加工平台上的加工對象區域予以精確度良好地加工的雷射加工裝置。 [用以解決問題的手段]The present invention was developed in view of the above problems, and its object is to obtain a laser processing device capable of processing a processing target area on a processing platform with a wider range than the galvanometer scanning area with good accuracy. [means used to solve a problem]

為了解決上述的問題以達成目的,本發明的雷射加工裝置係具備:加工平台,係載置加工對象物;檢流鏡(galvano mirror),係對於加工對象物照射雷射光進行掃描;及檢流計掃描儀,係驅動檢流鏡。本發明之雷射加工裝置係具備測量裝置,該測量裝置係於在矩形區域內已配置有四處以上之基準標記的基準板載置於加工平台上時測量四處以上的基準標記,而於加工對象物載置於加工平台上時則測量設於加工對象物之加工面上之對準標記(alignment mark)的位置。本發明之雷射加工裝置係具備控制裝置,該控制裝置係根據四處以上之基準標記的測量位置而算出加工平台的定位誤差及修正定位誤差的修正係數,且使用修正係數而修正對準標記的測量位置,而且根據所修正之對準標記的測量位置,算出用以修正定位誤差之檢流計掃描儀的驅動修正量,並且一面使用驅動修正量驅動檢流計掃描儀一面控制加工對象物的雷射加工。在本發明的雷射加工裝置中,在要算出修正係數之際,係重複進行使測量裝置與加工平台連動從而測量四處以上之基準標記的處理,而控制裝置係以涵蓋加工平台的整個區域之方式算出修正係數。 [發明之功效]In order to solve the above-mentioned problems and achieve the purpose, the laser processing device of the present invention is equipped with: a processing platform on which the object to be processed is placed; a galvano mirror (galvano mirror) that scans the object by irradiating laser light; The current meter scanner is driven by the galvano mirror. The laser processing device of the present invention is equipped with a measuring device that measures four or more fiducial marks when a reference plate with four or more fiducial marks arranged in a rectangular area is placed on a processing platform, and the processing object When the object is placed on the processing platform, the position of the alignment mark (alignment mark) provided on the processing surface of the object to be processed is measured. The laser processing device of the present invention is equipped with a control device. The control device calculates the positioning error of the processing platform and the correction coefficient for correcting the positioning error based on the measurement positions of more than four reference marks, and uses the correction coefficient to correct the alignment mark. Measure the position, and calculate the driving correction amount of the galvanometer scanner used to correct the positioning error based on the measured position of the corrected alignment mark, and control the object to be processed while driving the galvanometer scanner using the driving correction amount Laser processing. In the laser processing device of the present invention, when the correction coefficient is to be calculated, the process of making the measuring device interlock with the processing platform to measure more than four reference marks is repeatedly performed, and the control device is set to cover the entire area of the processing platform. to calculate the correction factor. [Efficacy of Invention]

本發明的雷射加工裝置,係可達成將較檢流計掃描區域更廣範圍之加工平台上之加工對象區域予以精確度良好地加工的效果。The laser processing device of the present invention can achieve the effect of processing the processing target area on the processing platform with a wider range than the scanning area of the galvanometer with good accuracy.

以下根據圖式詳細說明本發明之實施型態之雷射加工裝置、雷射加工方法、及誤差調整方法。另外,本發明不限定於此實施型態。The laser processing device, laser processing method, and error adjustment method of the embodiment of the present invention will be described in detail below based on the drawings. In addition, the present invention is not limited to this implementation form.

實施型態 第1圖係顯示實施型態之雷射加工裝置之構成的圖。雷射加工裝置100係修正用以載置屬於加工對象物之加工工件3A、3B之加工平台2A、2B的定位誤差,同時對於加工工件3A、3B進行雷射開孔加工的裝置。藉由雷射加工裝置100所進行之加工平台2A、2B的位置修正,係對於使檢流計掃描儀5A、5B、及加工平台2A、2B連動以進行加工乙事具有功效。implementation type Fig. 1 is a diagram showing the configuration of a laser processing device of an embodiment. The laser processing device 100 is a device that corrects the positioning error of the processing platforms 2A, 2B on which the processing workpieces 3A, 3B belonging to the processing object are placed, and performs laser drilling processing on the processing workpieces 3A, 3B. The position correction of the processing platforms 2A, 2B performed by the laser processing device 100 is effective in making the galvanometer scanners 5A, 5B and the processing platforms 2A, 2B linked to perform processing.

雷射加工裝置100係將用以測量定位誤差的基準板載置於加工平台2A、2B上,以測量配置於基準板上之基準標記的位置。基準板係在載置於加工平台2A、2B的狀態下供測量基準標記之位置的板。雷射加工裝置100係根據基準標記之實際的位置、與基準標記之測量位置的差分,而算出加工平台2A、2B的定位誤差,且算出用以修正定位誤差的修正係數。基準標記之實際的位置,係基準標記之設計上的位置(設計值),基準標記的測量位置,係在基準板被載置於加工平台2A、2B的狀態下所測量之基準標記的位置。In the laser processing device 100 , the reference plate used for measuring the positioning error is placed on the processing platforms 2A and 2B to measure the position of the reference mark arranged on the reference plate. The reference plate is a plate for measuring the position of the reference mark in a state placed on the processing platforms 2A and 2B. The laser processing device 100 calculates the positioning error of the processing platforms 2A and 2B based on the difference between the actual position of the reference mark and the measured position of the reference mark, and calculates a correction coefficient for correcting the positioning error. The actual position of the fiducial mark is the designed position (design value) of the fiducial mark, and the measured position of the fiducial mark is the position of the fiducial mark measured when the fiducial plate is placed on the processing platforms 2A, 2B.

雷射加工裝置100係重複進行使攝像機7A、7B與加工平台2A、2B連動從而測量基準標記的處理,以涵蓋加工平台2A、2B的整個區域之方式而算出修正係數。修正係數係在要修正加工平台2A、2B的位置時所使用。雷射加工裝置100係藉由以修正係數來修正配置於加工平台2A、2B上之加工工件3A、3B之對準標記的位置,以修正加工平台2A、2B的位置。對準標記係在加工工件3A、3B被載置於加工平台2A、2B的狀態下供測量位置的標記,其在要修正加工工件3A、3B的位置時所使用。關於對準標記的詳細內容將於後陳述。The laser processing apparatus 100 repeats the process of measuring the reference marks by interlocking the cameras 7A and 7B with the processing platforms 2A and 2B, and calculates the correction coefficient so as to cover the entire area of the processing platforms 2A and 2B. The correction coefficient is used when correcting the positions of the processing platforms 2A and 2B. The laser processing apparatus 100 corrects the positions of the processing platforms 2A and 2B by correcting the positions of the alignment marks of the processing workpieces 3A and 3B arranged on the processing platforms 2A and 2B with correction coefficients. The alignment marks are marks for measuring the positions of the workpieces 3A, 3B placed on the processing platforms 2A, 2B, and are used when the positions of the workpieces 3A, 3B are to be corrected. Details about the alignment marks will be described later.

雷射加工裝置100係具備:加工機構20,係對於屬於被加工物的加工工件3A、3B進行雷射加工處理;及控制裝置10,係控制加工機構20。控制裝置10係依配置有基準標記的每一測量區域使用最小平方近似等而算出修正係數。控制裝置10係作成顯示修正係數與測量區域之對應關係的校準表(calibration table)。校準表係用以修正加工平台2A、2B之定位誤差的表。控制裝置10係在控制雷射加工時,根據校準表,依每一測量區域抽出修正係數,且將所抽出的修正係數應用於各測量區域而修正要照射雷射光1A、1B的位置。The laser processing apparatus 100 includes: a processing mechanism 20 for performing laser processing on processing workpieces 3A and 3B which are workpieces; and a control device 10 for controlling the processing mechanism 20 . The control device 10 calculates a correction coefficient using the least square approximation or the like for each measurement area where the reference mark is arranged. The control device 10 creates a calibration table showing the correspondence between the correction coefficient and the measurement area. The calibration table is a table used to correct the positioning errors of the processing platforms 2A and 2B. When controlling laser processing, the control device 10 extracts correction coefficients for each measurement area according to the calibration table, and applies the extracted correction coefficients to each measurement area to correct the positions where the laser beams 1A and 1B are to be irradiated.

加工機構20係將從雷射振盪器(未圖示)所輸出的雷射光(雷射光束)在光程上分離為雷射光1A、1B,而將加工平台2A、2B上的加工工件3A、3B予以同時進行雷射加工。The processing mechanism 20 separates the laser light (laser beam) output from the laser oscillator (not shown) into laser light 1A, 1B on the optical path, and processes the workpieces 3A, 1B on the processing platforms 2A, 2B. 3B is laser processed at the same time.

加工機構20係具備:第一加工部,係將雷射光1A照射至加工工件3A;及第二加工部,係將雷射光1B照射至加工工件3B。第一加工部係具有:檢流計掃描儀5A、檢流鏡4A、攝像機7A、fθ透鏡6A、及加工平台2A;第二加工部係具有:檢流計掃描儀5B、檢流鏡4B、攝像機7B、fθ透鏡6B、及加工平台2B。The processing mechanism 20 is equipped with: the 1st processing part which irradiates the laser beam 1A to the processing workpiece 3A; and the 2nd processing part which irradiates the laser beam 1B to the processing workpiece 3B. The first processing department has: galvanometer scanner 5A, galvanometer mirror 4A, camera 7A, fθ lens 6A, and processing platform 2A; the second processing department has: galvanometer scanner 5B, galvanometer mirror 4B, Camera 7B, fθ lens 6B, and processing platform 2B.

此外,加工機構20係具備驅動加工平台2A、2B的驅動平台21。加工平台2A、2B係可移動於水平面之XY平面內的XY加工平台。加工平台2A、2B係藉由分別朝X軸方向及Y軸方向移動,而使加工工件3A、3B在XY平面內移動,藉此調節雷射光1A、1B照射至加工工件3A、3B上的位置。Moreover, the processing mechanism 20 is equipped with the driving platform 21 which drives the processing platforms 2A, 2B. The processing platforms 2A and 2B are XY processing platforms that can move in the XY plane of the horizontal plane. The processing platforms 2A, 2B move the workpieces 3A, 3B in the XY plane by moving in the X-axis direction and the Y-axis direction respectively, thereby adjusting the position where the laser light 1A, 1B irradiates the workpieces 3A, 3B .

加工平台2A係藉由吸附加工工件3A而將加工工件3A固定於加工平台2A上,加工平台2B係藉由吸附加工工件3B而將加工工件3B固定於加工平台2B上。如此,加工機構20係構成為在驅動平台21上安裝有二個加工平台2A、2B,而可同時地將二個加工工件3A、3B進行加工。The processing platform 2A fixes the processing workpiece 3A on the processing platform 2A by adsorbing the processing workpiece 3A, and the processing platform 2B fixes the processing workpiece 3B on the processing platform 2B by adsorbing the processing workpiece 3B. In this way, the machining mechanism 20 is configured such that the two machining platforms 2A, 2B are mounted on the driving platform 21, and the two machining workpieces 3A, 3B can be machined simultaneously.

加工平台2A、2B雖均載置於驅動平台21上,但加工平台2A之定位誤差與加工平台2B之定位誤差的誤差量有所不同。因此,控制裝置10係分別算出對於加工平台2A的修正係數、及對於加工平台2B的修正係數。Although the processing platforms 2A and 2B are both mounted on the drive platform 21 , the positioning error of the processing platform 2A is different from the positioning error of the processing platform 2B. Therefore, the control device 10 calculates the correction coefficient for the machining platform 2A and the correction coefficient for the machining platform 2B, respectively.

另外,加工機構20係可為無須將雷射光分離,而以一束雷射光將一個加工工件進行雷射加工的加工機構。亦即,加工機構20係可為具有第一加工部及第二加工部之一方的加工機構。第一加工部與第二加工部係以相同的構成執行相同的動作,因此以下針對第一加工部的構成及動作進行說明。In addition, the processing mechanism 20 may be a processing mechanism that performs laser processing on a workpiece with one beam of laser light without separating the laser light. That is, the processing mechanism 20 may be a processing mechanism having one of the first processing part and the second processing part. The first processing unit and the second processing unit perform the same operation with the same configuration, so the configuration and operation of the first processing unit will be described below.

檢流計掃描儀5A係將雷射光1A的照射位置高速地定位於加工工件3A上的加工目標位置。檢流計掃描儀5A係具備:檢流鏡4A;驅動檢流鏡4A的伺服馬達(servo motor)(未圖示);及進行伺服馬達之驅動控制的驅動控制裝置(未圖示)。在檢流計掃描儀5A中,係由驅動控制裝置驅動檢流鏡4A,且由檢流鏡4A藉由來自雷射振盪器的雷射光1A來掃描加工工件3A。The galvanometer scanner 5A positions the irradiation position of the laser beam 1A at a machining target position on the machining workpiece 3A at high speed. The galvanometer scanner 5A includes: a galvano mirror 4A; a servo motor (not shown) that drives the galvano mirror 4A; and a drive control device (not shown) that controls the drive of the servo motor. In the galvanometer scanner 5A, the drive control device drives the galvano mirror 4A, and the galvano mirror 4A scans the workpiece 3A with the laser light 1A from the laser oscillator.

在檢流計掃描儀5A中,係由驅動控制裝置使例如檢流鏡4A在特定之振盪角的範圍內旋轉。檢流計掃描儀5A係從控制裝置10接受指令,而使雷射光1A的照射位置移動,以使雷射光1A照射至掃描區域內之目標的加工位置。如此,在檢流計掃描儀5A中,係由驅動控制裝置驅動檢流鏡4A,以使雷射光1A照射至加工工件3A之加工面內之各個掃描區域內的特定位置。掃描區域係藉由檢流鏡4A進行掃描的區域。掃描區域係對應於檢流計掃描儀5A之可驅動的區域。檢流計掃描儀5A係重複進行在雷射光1A照射之後,使雷射光1A的照射位置移動至下一個目標位置並停止的動作。In the galvanometer scanner 5A, for example, the galvano mirror 4A is rotated within a range of a specific oscillation angle by a drive control device. The galvanometer scanner 5A receives an instruction from the control device 10 to move the irradiation position of the laser beam 1A so that the laser beam 1A is irradiated to the processing position of the target within the scanning area. Thus, in the galvanometer scanner 5A, the drive control device drives the galvano mirror 4A so that the laser light 1A is irradiated to a specific position in each scanning area within the processing surface of the workpiece 3A. The scanning area is an area scanned by the galvano mirror 4A. The scanning area corresponds to the drivable area of the galvanometer scanner 5A. The galvanometer scanner 5A repeats the operation of moving the irradiation position of the laser beam 1A to the next target position and then stopping after the irradiation of the laser beam 1A.

第一加工部係具有:二個檢流計掃描儀5A;及二個檢流鏡4A。在第一加工部中,係藉由使一方之檢流計掃描儀5A的檢流鏡4A旋轉,而使雷射光1A對於加工工件3A的照射位置朝X軸方向移動。此外,在第一加工部中,係藉由使另一方之檢流計掃描儀5A的檢流鏡4A旋轉,而使雷射光1A對於加工工件3A的照射位置朝Y軸方向移動。一方之檢流鏡4A所反射的雷射光1A,係被傳送至另一方的檢流鏡4A,且被另一方的檢流鏡4A所反射。另一方之檢流鏡4A所反射的雷射光1A,係被照射至加工工件3A。The first processing department has: two galvanometer scanners 5A; and two galvanometer mirrors 4A. In the first processing section, the irradiation position of the laser beam 1A on the workpiece 3A is moved in the X-axis direction by rotating the galvano mirror 4A of the one galvanometer scanner 5A. In addition, in the first processing section, the irradiation position of the laser beam 1A on the workpiece 3A is moved in the Y-axis direction by rotating the galvano mirror 4A of the other galvanometer scanner 5A. The laser light 1A reflected by one galvanometer mirror 4A is transmitted to the other galvanometer mirror 4A, and is reflected by the other galvanometer mirror 4A. The laser light 1A reflected by the other galvanometer mirror 4A is irradiated to the workpiece 3A.

fθ透鏡6A係使雷射光1A聚光於被載置於加工平台2A的加工工件3A上。屬於測量裝置的攝像機7A,係觀察加工平台2A的表面上,且測量各種標記的位置。攝像機7A係在要算出修正係數之際,檢測已配置於加工平台2A上之基準板之基準標記的位置(座標)。攝像機7A係當加工工件3A已被載置於加工平台2A上時,檢測已配置於加工工件3A之對準標記的位置(座標)。The fθ lens 6A condenses the laser light 1A on the workpiece 3A placed on the processing platform 2A. The camera 7A belonging to the measuring device observes the surface of the processing platform 2A and measures the positions of various marks. The camera 7A detects the position (coordinates) of the reference mark on the reference plate arranged on the processing table 2A when calculating the correction coefficient. The camera 7A detects the position (coordinate) of the alignment mark arranged on the processing workpiece 3A when the processing workpiece 3A is placed on the processing table 2A.

對準標記係用以修正加工工件3A之位置的標記。被載置於加工平台2A的加工工件3A,會有因為翹曲、伸縮等而產生了位置偏移的情形。雷射加工裝置100係檢測對準標記的位置,且根據對準標記的位置及修正係數,而修正加工工件3A內的座標。The alignment mark is a mark for correcting the position of the workpiece 3A. The processing workpiece 3A placed on the processing table 2A may be displaced due to warping, expansion and contraction, and the like. The laser processing device 100 detects the position of the alignment mark, and corrects the coordinates in the workpiece 3A according to the position of the alignment mark and the correction coefficient.

攝像機7A係將屬於基準標記之檢測結果之基準標記的位置、及屬於對準標記之檢測結果之對準標記的位置傳送至控制裝置10。The camera 7A transmits the position of the fiducial mark which is the detection result of the fiducial mark and the position of the alignment mark which is the detection result of the alignment mark to the control device 10 .

在雷射加工裝置100中,係由來自雷射振盪器的雷射光1A,通過依每一軸安裝的檢流鏡4A、及fθ透鏡6A而照射至加工工件3A的掃描區域內。In the laser processing device 100 , the laser light 1A from the laser oscillator is irradiated into the scanning area of the workpiece 3A through the galvanometer mirror 4A and the fθ lens 6A installed for each axis.

由於加工工件3A的面積相對於掃描區域的面積較大,因此雷射加工裝置100係使加工平台2A從掃描區域移動至下一個掃描區域,且藉由檢流計掃描儀5A使掃描區域內之雷射光1A的照射位置移動。亦即,雷射加工裝置100係藉由加工平台2A使雷射光1A的照射位置在掃描區域間移動,且藉由檢流計掃描儀5A使雷射光1A的照射位置在掃描區域內移動。雷射加工裝置100係藉由在各掃描區域照射雷射光1A,而將加工工件3A的整個加工區域進行雷射加工。亦即,雷射加工裝置100係形成為重複進行使加工平台2A移動至各掃描區域的處理、及在各掃描區域照射雷射光1A的處理,而將加工工件3A之所有區域進行加工的構成。Since the area of the workpiece 3A is larger than the area of the scanning area, the laser processing device 100 moves the processing platform 2A from the scanning area to the next scanning area, and uses the galvanometer scanner 5A to move the scanning area within the scanning area. The irradiation position of the laser beam 1A moves. That is, the laser processing apparatus 100 moves the irradiation position of the laser beam 1A between scanning areas by the processing platform 2A, and moves the irradiation position of the laser beam 1A within the scanning area by the galvanometer scanner 5A. The laser processing apparatus 100 performs laser processing on the entire processing area of the workpiece 3A by irradiating the laser light 1A on each scanning area. That is, the laser processing apparatus 100 is configured to process all regions of the workpiece 3A by repeating the processing of moving the processing table 2A to each scanning area and the processing of irradiating the laser beam 1A on each scanning area.

控制裝置10係控制加工機構20的電腦。控制裝置10係控制加工平台2A、雷射振盪器、檢流計掃描儀5A、5B等的驅動。實施型態之控制裝置10,係根據從加工機構20所傳送的資訊而算出校準表,且使用校準表而修正加工平台2A的定位誤差。控制裝置10係使用儲存於校準表中的修正係數而修正加工工件3A的位置,且根據所修正的位置而修正檢流計掃描儀5A的驅動量。控制裝置10係藉由修正檢流計掃描儀5A的驅動量而修正檢流鏡4A的位置,藉此修正雷射光1A的照射位置。The control device 10 is a computer that controls the processing mechanism 20 . The control device 10 controls the driving of the processing platform 2A, the laser oscillator, the galvanometer scanners 5A, 5B, and the like. The control device 10 of the embodiment calculates a calibration table based on the information transmitted from the processing mechanism 20, and uses the calibration table to correct the positioning error of the processing platform 2A. The control device 10 corrects the position of the workpiece 3A using the correction coefficient stored in the calibration table, and corrects the driving amount of the galvanometer scanner 5A based on the corrected position. The control device 10 corrects the position of the galvano mirror 4A by correcting the driving amount of the galvanometer scanner 5A, thereby correcting the irradiation position of the laser light 1A.

在此說明控制裝置10的構成。第2圖係顯示實施型態之雷射加工裝置所具備之控制裝置之構成的圖。控制裝置10係具備:輸入部11、修正係數算出部12、記憶部13、修正量算出部14、及控制部15。Here, the configuration of the control device 10 will be described. Fig. 2 is a diagram showing the configuration of the control device included in the laser processing device of the embodiment. The control device 10 includes an input unit 11 , a correction coefficient calculation unit 12 , a storage unit 13 , a correction amount calculation unit 14 , and a control unit 15 .

輸入部11係接受從加工機構20之攝像機7A傳送而來之基準標記的位置而輸入於控制部15。以下,將從攝像機7A傳送而來之基準標記的位置稱為測量位置。輸入部11係接受從加工機構20之攝像機7A傳送而來之對準標記的位置而輸入於修正量算出部14。The input unit 11 receives the position of the reference mark transmitted from the camera 7A of the processing mechanism 20 and inputs it to the control unit 15 . Hereinafter, the position of the fiducial mark transmitted from the camera 7A is referred to as a measurement position. The input unit 11 receives the position of the alignment mark transmitted from the camera 7A of the processing mechanism 20 and inputs it to the correction amount calculation unit 14 .

修正係數算出部12係從記憶部13讀取顯示已配置於基準板之各測量區域中之基準標記之實際的位置與測量區域之對應關係的資訊。此外,修正係數算出部12係從記憶部13讀取顯示基準標記之測量位置與測量區域之對應關係的資訊。The correction coefficient calculation unit 12 reads from the memory unit 13 information indicating the correspondence relationship between the actual position of the reference mark arranged in each measurement area of the reference plate and the measurement area. In addition, the correction coefficient calculation unit 12 reads information indicating the correspondence relationship between the measurement position of the reference mark and the measurement area from the storage unit 13 .

基準板之測量區域的位置,係對應於加工平台2A的位置。基準標記之實際的位置係設計值。以下,將基準標記之實際的位置稱為實際位置,且將顯示實際位置與測量區域之對應關係的資訊稱為實際位置資訊。此外,將顯示測量位置與測量區域之對應關係的資訊稱為測量位置資訊。The position of the measurement area of the reference plate corresponds to the position of the processing platform 2A. The actual position of the reference mark is the design value. Hereinafter, the actual position of the fiducial mark is called the actual position, and the information showing the correspondence between the actual position and the measurement area is called the actual position information. In addition, the information showing the correspondence between the measurement position and the measurement area is referred to as measurement position information.

修正係數算出部12係根據實際位置資訊及測量位置資訊,而算出實際位置與測量位置的差分。修正係數算出部12係根據實際位置與測量位置的差分,而算出用以修正測量區域之位置的修正係數。修正係數算出部12係依每一測量區域而算出修正係數,且將顯示修正係數與測量區域之對應關係的資訊傳送至記憶部13。以下,將顯示修正係數與測量區域之對應關係的資訊稱為修正係數資訊。The correction factor calculation unit 12 calculates the difference between the actual position and the measured position based on the actual position information and the measured position information. The correction coefficient calculating unit 12 calculates a correction coefficient for correcting the position of the measurement region based on the difference between the actual position and the measured position. The correction coefficient calculation unit 12 calculates the correction coefficient for each measurement area, and sends information showing the correspondence between the correction coefficient and the measurement area to the memory unit 13 . Hereinafter, the information showing the correspondence between the correction coefficient and the measurement area is referred to as correction coefficient information.

記憶部13係記憶有實際位置資訊。此外,記憶部13係記憶從控制部15傳送而來的測量位置資訊。此外,記憶部13係記憶從修正係數算出部12傳送而來的修正係數資訊。The memory unit 13 stores actual location information. In addition, the storage unit 13 stores the measurement position information transmitted from the control unit 15 . In addition, the storage unit 13 stores the correction coefficient information transmitted from the correction coefficient calculation unit 12 .

修正量算出部14係從記憶部13讀取修正係數資訊。修正量算出部14係使用修正係數資訊而修正對準標記的位置(座標)。具體而言,修正量算出部14係特定對應對準標記之位置的測量區域,且從修正係數資訊抽出經特定後之測量區域所對應的修正係數。修正量算出部14係使用所抽出的修正係數而修正對準標記的位置。使用修正係數所修正之對準標記的位置,即為經考慮過加工平台2A的位置誤差及加工工件3A之位置偏移等的正確的對準標記的位置。因此,修正量算出部14係根據所修正之對準標記的位置,而算出顯示加工平台2A之位置與用以修正檢流計掃描儀5A之驅動量之驅動修正量(以下稱為電流修正量)之對應關係的算式。此算式係藉由代入加工平台2A上的X座標及Y座標,而可求出加工平台2A上之座標所對應之電流修正量的算式。加工平台2A的座標(X座標及Y座標)係檢流計掃描儀5A所進行之掃描區域的中心座標。The correction amount calculation unit 14 reads correction coefficient information from the storage unit 13 . The correction amount calculation unit 14 corrects the position (coordinates) of the alignment mark using the correction coefficient information. Specifically, the correction amount calculation unit 14 specifies the measurement area corresponding to the position of the alignment mark, and extracts the correction coefficient corresponding to the specified measurement area from the correction coefficient information. The correction amount calculation unit 14 corrects the position of the alignment mark using the extracted correction coefficient. The position of the alignment mark corrected by the correction coefficient is the correct position of the alignment mark after taking into account the position error of the processing platform 2A and the positional deviation of the workpiece 3A. Therefore, the correction amount calculation unit 14 calculates the drive correction amount (hereinafter referred to as the current correction amount) for correcting the drive amount of the galvanometer scanner 5A and the position of the processing table 2A based on the corrected position of the alignment mark. ) The formula of the corresponding relationship. This formula is a formula for obtaining the current correction amount corresponding to the coordinates on the processing platform 2A by substituting the X coordinate and the Y coordinate on the processing platform 2A. The coordinates (X coordinate and Y coordinate) of the processing platform 2A are the center coordinates of the scanning area performed by the galvanometer scanner 5A.

修正量算出部14係根據經由加工程式所規定之加工平台2A的位置,而算出與此位置對應的電流修正量。修正量算出部14係將所算出的電流修正量傳送至控制部15。The correction amount calculation unit 14 calculates the current correction amount corresponding to the position of the machining table 2A specified by the machining formula. The correction amount calculation unit 14 sends the calculated current correction amount to the control unit 15 .

控制部15係控制加工機構20。控制部15係將驅動指示傳送至檢流計掃描儀5A、加工平台2A等。控制部15係在修正係數資訊被算出時使加工平台2A移動,藉此使攝像機7A的攝像位置移動至已配置於測量區域之基準標記的位置。攝像機7A的攝像位置,係掃描區域的中心位置。控制部15係產生經將攝像機7A之攝像位置所對應的測量區域、與從輸入部11傳送而來的實際位置建立對應關係後的測量位置資訊。從輸入部11傳送而來的實際位置,係在攝像機7A之攝像位置所對應之測量區域所測量到的實際位置。控制部15係將測量位置資訊傳送至記憶部13。The control unit 15 controls the machining mechanism 20 . The control unit 15 transmits a driving instruction to the galvanometer scanner 5A, the processing platform 2A, and the like. The control unit 15 moves the processing table 2A when the correction coefficient information is calculated, thereby moving the imaging position of the camera 7A to the position of the reference mark arranged in the measurement area. The imaging position of the camera 7A is the center position of the scanning area. The control unit 15 generates measurement position information after establishing a correspondence relationship between the measurement area corresponding to the imaging position of the camera 7A and the actual position transmitted from the input unit 11 . The actual position transmitted from the input unit 11 is the actual position measured in the measurement area corresponding to the imaging position of the camera 7A. The control unit 15 transmits the measured position information to the memory unit 13 .

此外,控制部15係在要驅動檢流計掃描儀5A時依屬於加工平台2A之位置的每一平台位置,使用電流修正量而修正檢流計掃描儀5A的驅動量。控制部15係將經修正檢流計掃描儀5A之驅動量後的驅動指示傳送至加工機構20。藉此,檢流鏡4A的振盪角即被修正,因此雷射光1A的照射位置被修正。In addition, the control unit 15 corrects the drive amount of the galvanometer scanner 5A using the current correction amount for each stage position belonging to the position of the processing stage 2A when the galvanometer scanner 5A is to be driven. The control unit 15 transmits the driving instruction after the driving amount of the galvanometer scanner 5A is corrected to the processing mechanism 20 . Accordingly, the oscillation angle of the galvanometer mirror 4A is corrected, and thus the irradiation position of the laser beam 1A is corrected.

如此,實施型態之控制裝置10,係使用基準標記的測量位置而算出用以修正加工平台2A之定位誤差的電流修正量,且使用電流修正量而驅動檢流計掃描儀5A。In this way, the control device 10 of the embodiment calculates the current correction amount for correcting the positioning error of the machining platform 2A using the measurement position of the reference mark, and drives the galvanometer scanner 5A using the current correction amount.

接著說明雷射加工裝置100所進行之修正係數的算出處理程序。第3圖係顯示實施型態之雷射加工裝置所進行之修正係數之算出處理程序的流程圖。第4圖係用以說明在實施型態之雷射加工裝置中所使用之基準板之測量區域的圖。第5圖係用以說明實施型態之雷射加工裝置所測量之基準標記的圖。Next, the calculation procedure of the correction coefficient performed by the laser processing apparatus 100 will be described. Fig. 3 is a flow chart showing the calculation processing procedure of the correction coefficient performed by the laser processing device of the embodiment. Fig. 4 is a diagram for explaining the measurement area of the reference plate used in the laser processing device of the embodiment. Fig. 5 is a diagram for explaining reference marks measured by the laser processing device of the embodiment.

雷射加工裝置100係在要算出修正係數之際,在設加工平台2A之位置修正為無效的狀態下測量基準標記M的位置,且根據所測量的位置而算出修正係數。此係由於若設位置修正為有效時,即無法測量出基準標記M的位置偏移之故。因此,雷射加工裝置100的控制裝置10,係當加工平台2A的位置修正已為有效的情形下,要設加工平台2A的位置修正為無效(步驟S1)。亦即,雷射加工裝置100係當修正檢流計掃描儀5A之驅動量的設定為有效的情形下,要設修正檢流計掃描儀5A之驅動量的設定為無效。When calculating the correction coefficient, the laser processing apparatus 100 measures the position of the reference mark M with the position correction of the processing table 2A disabled, and calculates the correction coefficient from the measured position. This is because the positional deviation of the reference mark M cannot be measured when the position correction is enabled. Therefore, the control device 10 of the laser processing device 100 sets the position correction of the processing platform 2A to be invalid when the position correction of the processing platform 2A is already valid (step S1 ). That is, in the laser processing apparatus 100, when the setting of the driving amount of the corrected galvanometer scanner 5A is valid, the setting of the corrected driving amount of the galvanometer scanner 5A is disabled.

加工平台2A係供載置成為用以作成校準表之基準的基準板8。基準板8係具有等間隔地列印於基準板8之上面的複數個基準標記M。基準標記M係呈格子狀地配置於可將加工平台2A之整面覆蓋的區域上。另外,基準標記M亦可藉由列印以外的方法而配置於基準板8的上面。此外,基準標記M亦可以格子狀以外的形狀來配置。基準板8係基準標記M之配置精確度良好的石英玻璃板等。在雷射加工裝置100中,係將基準板8設為加工平台2A的主尺度(master scale),亦即基準尺度。The processing table 2A is for mounting the reference plate 8 used as a reference for preparing a calibration table. The reference plate 8 has a plurality of reference marks M printed on the reference plate 8 at equal intervals. The reference marks M are arranged in a grid pattern in an area that can cover the entire surface of the processing platform 2A. In addition, the reference mark M may be arranged on the upper surface of the reference plate 8 by methods other than printing. In addition, the reference mark M may be arranged in a shape other than the grid shape. The reference plate 8 is a quartz glass plate or the like in which the arrangement accuracy of the reference mark M is good. In the laser processing apparatus 100, the reference plate 8 is set as the main scale (master scale) of the processing platform 2A, that is, the reference scale.

如第4圖所示,在基準板8中,係全面地設有測量區域30n、測量區域30(n+1)的複數個測量區域。在此之n係自然數。設定於基準板8的各測量區域,係具有相同的形狀及大小,因此以下將就測量區域30n進行說明。測量區域30n係矩形區域,四個頂點各自配置有基準標記M。在第5圖中,係以基準標記P1至P4圖示測量區域30n中的四個基準標記M。基準板8上的測量區域中,區域數愈多,亦即各測量區域愈狹窄,就愈可進行正確的位置偏移修正。As shown in FIG. 4 , in the reference plate 8 , a plurality of measurement regions including a measurement region 30n and a measurement region 30 (n+1) are provided on the entire surface. Here n is a natural number. The measurement regions set on the reference plate 8 have the same shape and size, so the measurement region 30n will be described below. The measurement area 30n is a rectangular area, and a reference mark M is arranged at each of the four vertices. In Fig. 5, four reference marks M in the measurement region 30n are illustrated by reference marks P1 to P4. Among the measurement areas on the reference plate 8 , the more areas there are, that is, the narrower each measurement area is, the more accurate positional offset correction can be performed.

基準板8係例如使用X軸方向為800mm、Y軸方向為600mm的板狀構件而形成。此外,檢流計掃描儀5A之可操作區域所對應之掃描區域之例,係30mm×30mm。The reference plate 8 is formed using, for example, a plate-shaped member with a length of 800 mm in the X-axis direction and 600 mm in the Y-axis direction. In addition, an example of the scanning area corresponding to the operable area of the galvanometer scanner 5A is 30 mm×30 mm.

在基準板8中,係由彼此鄰接的測量區域共有二個基準標記M(屬於二個基準標記M間之線段區域的一個邊)。例如,鄰接於測量區域30n的測量區域30(n+1)、與測量區域30n,係共有二個基準標記M。具體而言,基準標記P3、P4係配置於測量區域30n之右邊的基準標記,而且為配置於測量區域30(n+1)之左邊的基準標記。同樣地,測量區域30n的下邊,係被其他測量區域所共有。如此,由鄰接的測量區域共有一個邊,藉此在基準板8中,呈格子狀地設定有測量區域。In the reference plate 8, there are two reference marks M (one side belonging to the line segment area between the two reference marks M) in common by the measurement areas adjacent to each other. For example, the measurement region 30(n+1) adjacent to the measurement region 30n and the measurement region 30n share two reference marks M. Specifically, the fiducial marks P3 and P4 are fiducial marks arranged on the right side of the measurement area 30n, and are fiducial marks arranged on the left side of the measurement area 30(n+1). Similarly, the lower side of the measurement area 30n is shared by other measurement areas. In this way, the adjacent measurement areas share one side, whereby the measurement areas are set in a grid pattern on the reference plate 8 .

雷射加工裝置100係以直至m=1至4為止之方式重複進行:使攝像機7A的攝像位置移動至測量區域30n之基準標記Pm上的處理、測量基準標記Pm之位置的處理、及保存測量資料的處理。具體而言,控制部15係使加工平台2A移動至攝像機7A的攝像位置會成為測量區域30n之基準標記P1上的平台位置。攝像機7A的攝像位置,係攝像機7A所拍攝之基準板8上的位置。亦即,雷射加工裝置100係藉由使載置有基準板8的加工平台2A在平行於加工平台2A之平台面的面內移動,而使攝像機7A的攝像位置移動至測量區域30n的基準標記P1上(步驟S2)。The laser processing device 100 repeats until m=1 to 4: the process of moving the imaging position of the camera 7A to the reference mark Pm of the measurement area 30n, the process of measuring the position of the reference mark Pm, and saving the measured Processing of data. Specifically, the control unit 15 moves the processing table 2A to a table position on the reference mark P1 of the measurement area 30n where the imaging position of the camera 7A becomes. The imaging position of the camera 7A is the position on the reference plate 8 captured by the camera 7A. That is, the laser processing apparatus 100 moves the imaging position of the camera 7A to the reference point of the measurement area 30n by moving the processing table 2A on which the reference plate 8 is placed in a plane parallel to the table surface of the processing table 2A. Mark P1 on (step S2).

雷射加工裝置100係藉由攝像機7A來測量基準標記P1的位置(步驟S3)。在第5圖中,係以測量位置Q1圖示了屬於基準標記P1之測量結果的測量位置。雷射加工裝置100係將測量位置Q1傳送至控制裝置10。藉此,雷射加工裝置100係保存測量資訊(步驟S4)。具體而言,雷射加工裝置100係將測量區域30n、與基準標記P1的測量位置Q1建立對應關係後藉由記憶部13予以保存。The laser processing apparatus 100 measures the position of the fiducial mark P1 by the camera 7A (step S3). In FIG. 5 , the measurement position of the measurement result belonging to the reference mark P1 is illustrated as the measurement position Q1 . The laser processing device 100 transmits the measurement position Q1 to the control device 10 . Thereby, the laser processing device 100 saves the measurement information (step S4). Specifically, the laser processing device 100 establishes a correspondence relationship between the measurement area 30 n and the measurement position Q1 of the reference mark P1 , and stores them in the memory unit 13 .

雷射加工裝置100係判定是否已從基準標記P1至基準標記P4都測量了位置(步驟S5)。當還未測量位置至基準標記P4時(步驟S5:No(否)),雷射加工裝置100係重複步驟S2至步驟S5的處理。亦即,雷射加工裝置100係重複步驟S2至步驟S5的處理直到測量基準標記P4的位置為止(直到m=4為止)。The laser processing apparatus 100 determines whether the positions from the reference mark P1 to the reference mark P4 have been measured (step S5). When the position has not yet been measured to the reference mark P4 (step S5: No), the laser processing apparatus 100 repeats the processing of steps S2 to S5. That is, the laser processing apparatus 100 repeats the process of step S2 to step S5 until the position of the reference mark P4 is measured (until m=4).

亦即,雷射加工裝置100係使加工平台2A移動至基準標記P2的位置(步驟S2),且測量基準標記P2的位置(步驟S3),及將測量區域30n與屬於基準標記P2之測量結果的測量位置Q2建立對應關係後藉由記憶部13予以保存(步驟S4)。That is, the laser processing device 100 moves the processing platform 2A to the position of the fiducial mark P2 (step S2), measures the position of the fiducial mark P2 (step S3), and compares the measurement area 30n with the measurement result belonging to the fiducial mark P2 The corresponding relationship between the measurement positions Q2 is established and stored by the memory unit 13 (step S4).

同樣地,雷射加工裝置100係使加工平台2A移動至基準標記P3的位置(步驟S2),且測量基準標記P3的位置(步驟S3),及將測量區域30n與屬於基準標記P3之測量結果的測量位置Q3建立對應關係後藉由記憶部13予以保存(步驟S4)。Similarly, the laser processing device 100 moves the processing platform 2A to the position of the fiducial mark P3 (step S2), measures the position of the fiducial mark P3 (step S3), and compares the measurement area 30n with the measurement result belonging to the fiducial mark P3 The corresponding relationship between the measurement positions Q3 is established and saved by the memory unit 13 (step S4).

同樣地,雷射加工裝置100係使加工平台2A移動至基準標記P4的位置(步驟S2),且測量基準標記P4的位置(步驟S3),及將測量區域30n與屬於基準標記P4之測量結果的測量位置Q4建立對應關係後藉由記憶部13予以保存(步驟S4)。如此,加工平台2A係藉由移動使基準標記依序移動至要藉由攝像機7A進行的測量位置。測量區域30n與測量位置Q1至Q4經建立對應關係後的資訊即為測量位置資訊。Similarly, the laser processing device 100 moves the processing platform 2A to the position of the fiducial mark P4 (step S2), measures the position of the fiducial mark P4 (step S3), and compares the measurement area 30n with the measurement result belonging to the fiducial mark P4 The corresponding relationship between the measurement positions Q4 is established and saved by the memory unit 13 (step S4). In this way, the processing platform 2A moves the fiducial marks sequentially to the measurement position to be performed by the camera 7A by moving. The information corresponding to the measurement area 30n and the measurement locations Q1 to Q4 is the measurement location information.

當測量位置至基準標記P4時(步驟S5:Yes(是)),修正係數算出部12係從記憶部13讀取實際位置資訊及測量位置資訊,且根據實際位置偏移及測量位置資訊,而算出實際位置與測量位置的差分。修正係數算出部12係根據實際位置與測量位置的差分,而算出每一測量區域的修正係數,且藉由記憶部13予以保存(步驟S6)。此時,修正係數算出部12係使用基準標記P1至P4的四個實際位置、與屬於測量位置的四個測量位置Q1至Q4,藉由最小平方近似來算出修正係數。具體而言,修正係數算出部12係將最小平方近似應用於四個實際位置與四個測量位置Q1至Q4的差分而算出修正係數。此外,修正係數算出部12亦可除算出修正係數外,還藉由進行平行四邊形修正或梯形修正,以算出對於測量區域30n內之平台位置的修正係數。When the measurement position reaches the reference mark P4 (step S5: Yes), the correction coefficient calculation unit 12 reads the actual position information and the measurement position information from the memory unit 13, and according to the actual position deviation and the measurement position information, Calculate the difference between the actual position and the measured position. The correction coefficient calculation unit 12 calculates a correction coefficient for each measurement area based on the difference between the actual position and the measurement position, and stores it in the memory unit 13 (step S6). At this time, the correction coefficient calculation unit 12 calculates a correction coefficient by least square approximation using the four actual positions of the reference marks P1 to P4 and the four measurement positions Q1 to Q4 belonging to the measurement positions. Specifically, the correction coefficient calculation unit 12 calculates a correction coefficient by applying the least square approximation to the differences between the four actual positions and the four measurement positions Q1 to Q4 . In addition, the correction coefficient calculation unit 12 may calculate the correction coefficient for the platform position within the measurement area 30n by performing parallelogram correction or trapezoidal correction in addition to the correction coefficient.

另外,攝像機7A不限定於在測量區域30n內測量四處之基準標記P1至P4之位置的情形,亦可在五處以上測量基準標記的位置。亦即,在測量區域30n內,可配置有四處以上(至少四處)的基準標記。此時,攝像機7A係測量測量區域30n內之四處以上的基準標記,修正係數算出部12係使用四處以上之基準標記的測量位置資訊而算出修正係數。在此,之所以設定為測量四處以上之基準標記的位置,係因為若得知四處以上之基準標記的位置,就可容易且正確地算出X軸方向及Y軸方向的修正係數之故。In addition, the camera 7A is not limited to measuring the positions of the fiducial marks P1 to P4 at four places within the measurement area 30n, and may measure the positions of the fiducial marks at five or more places. That is, four or more (at least four) reference marks may be arranged in the measurement area 30n. At this time, the camera 7A measures four or more reference marks in the measurement area 30n, and the correction coefficient calculation unit 12 calculates a correction coefficient using the measurement position information of the four or more reference marks. Here, the reason for measuring the positions of four or more reference marks is that the correction coefficients in the X-axis direction and the Y-axis direction can be easily and accurately calculated if the positions of the four or more reference marks are known.

控制部15係判定是否已對於所有的測量區域算出了修正係數(步驟S7)。當有未算出修正係數的測量區域時(步驟S7:No),雷射加工裝置100係依據來自控制部15的指示,對於未算出修正係數的測量區域,執行步驟S2至步驟S6的處理。雷射加工裝置100係對於各測量區域執行步驟S2至步驟S6的處理,直到對於所有的測量區域算出修正係數為止。當已再無未算出修正係數的測量區域時(步驟S7:Yes),雷射加工裝置100結束修正係數的算出處理。The control unit 15 determines whether correction coefficients have been calculated for all the measurement areas (step S7). When there is a measurement area for which no correction coefficient has been calculated (step S7: No), the laser processing apparatus 100 executes the processes of step S2 to step S6 for the measurement area for which no correction coefficient has been calculated according to an instruction from the control unit 15 . The laser processing apparatus 100 executes the process of step S2 to step S6 for each measurement area until a correction coefficient is calculated for all the measurement areas. When there is no more measurement area for which the correction coefficient has not been calculated (step S7: Yes), the laser processing apparatus 100 ends the calculation process of the correction coefficient.

修正係數算出部12係使用對於所算出之所有測量區域的修正係數,而作成顯示修正係數與測量區域之對應關係的校準表。修正係數算出部12係在藉由平行四邊形修正或梯形修正而算出在各測量區域內的修正係數的情形下,對於測量區域30n內之基準標記間的平台位置亦能夠以高的精確度作成校準表。The correction coefficient calculation unit 12 uses the correction coefficients for all the calculated measurement areas to create a calibration table showing the correspondence between the correction coefficients and the measurement areas. The correction coefficient calculation unit 12 can perform calibration with high accuracy for the platform position between the reference marks in the measurement area 30n when calculating the correction coefficient in each measurement area by parallelogram correction or trapezoidal correction. surface.

第6圖係用以說明實施型態之雷射加工裝置所取得之基準標記之實際位置與測量位置之關係的圖。在第6圖中,係顯示了配置於基準板8之基準標記M的實際位置AP、與測量位置MQ的對應關係。另外,在第6圖中,係將實際位置AP與測量位置MQ的差分放大1000倍進行圖示。實際位置AP係配置於基準板8的整面,雷射加工裝置100係對於各實際位置AP進行測量位置MQ的測量。重疊於實際位置AP上的測量位置MQ,即為對應實際位置AP的測量位置MQ。另外,當以位於基準板8之全區域中之左上位置的基準點BP為基準將基準板8固定於加工平台2A時,愈遠離基準點BP的位置,基準位置與實際位置之間的差分(誤差)就愈大。Fig. 6 is a diagram for explaining the relationship between the actual position and the measured position of the reference mark obtained by the laser processing device of the embodiment. In FIG. 6, the correspondence relationship between the actual position AP of the reference mark M arranged on the reference plate 8 and the measurement position MQ is shown. In addition, in FIG. 6 , the difference between the actual position AP and the measured position MQ is magnified 1000 times and illustrated. The actual positions AP are arranged on the entire surface of the reference plate 8, and the laser processing apparatus 100 measures the measurement positions MQ for each actual position AP. The measured position MQ superimposed on the actual position AP is the measured position MQ corresponding to the actual position AP. In addition, when the reference plate 8 is fixed on the processing platform 2A with the reference point BP located at the upper left position in the entire area of the reference plate 8 as a reference, the farther the position is from the reference point BP, the difference between the reference position and the actual position ( error) becomes larger.

雷射加工裝置100係在算出修正係數資訊之後算出電流修正量,且使用電流修正量而執行加工工件3A的雷射加工。在此,說明雷射加工裝置100所進行之電流修正量的算出處理程序。The laser processing apparatus 100 calculates the current correction amount after calculating the correction coefficient information, and executes the laser processing of the workpiece 3A using the current correction amount. Here, the calculation processing procedure of the current correction amount performed by the laser processing apparatus 100 will be described.

第7圖係顯示實施型態之雷射加工裝置所進行之電流修正量之算出處理程序的流程圖。雷射加工裝置100係在基準板8從加工平台2A拆下,加工工件3A被載置於加工平台2A的狀態下,開始加工工件3A的加工。Fig. 7 is a flow chart showing the calculation processing procedure of the current correction amount performed by the laser processing device of the embodiment. The laser processing apparatus 100 starts processing the workpiece 3A in a state where the reference plate 8 is removed from the processing platform 2A and the workpiece 3A is placed on the processing platform 2A.

雷射加工裝置100係設加工平台2A的位置修正為有效(步驟S11)。雷射加工裝置100係使攝像機7A的攝像位置移動至加工工件3A之對準標記的位置(步驟S12)。亦即,雷射加工裝置100係藉由使加工平台2A移動而使攝像機7A的攝像位置移動至對應對準標記的平台位置。攝像機7A係測量對準標記的位置(步驟S13)。The laser processing apparatus 100 sets the position correction of the processing platform 2A to be valid (step S11). The laser processing apparatus 100 moves the imaging position of the camera 7A to the position of the alignment mark of the processing workpiece 3A (step S12). That is, the laser processing apparatus 100 moves the imaging position of the camera 7A to the stage position corresponding to the alignment mark by moving the processing stage 2A. The camera 7A measures the position of the alignment mark (step S13).

第8圖係用以說明實施型態之雷射加工裝置所使用之對準標記的圖。在第8圖中,係顯示了從上面側觀看被載置於加工平台2A之加工工件3A時的加工工件3A。在加工工件3A之四個頂點的位置或頂點的位置附近,係分別配置有對準標記9。Fig. 8 is a diagram for explaining alignment marks used in the laser processing device of the embodiment. Fig. 8 shows the workpiece 3A when the workpiece 3A placed on the processing platform 2A is viewed from the upper side. Alignment marks 9 are respectively arranged at the positions of the four vertices of the workpiece 3A or near the positions of the vertices.

攝像機7A係將屬於對準標記9之測量結果之對準標記9的位置傳送至控制裝置10。控制裝置10的修正量算出部14,係根據對準標記9的位置及修正係數資訊而算出對準修正量,且應用於對準標記9之位置的修正(步驟S14)。對準修正量係用以修正對準標記9之位置的修正量。The camera 7A transmits the position of the alignment mark 9 , which is a measurement result of the alignment mark 9 , to the control device 10 . The correction amount calculation unit 14 of the control device 10 calculates the alignment correction amount based on the position of the alignment mark 9 and the correction coefficient information, and applies it to the correction of the position of the alignment mark 9 (step S14 ). The alignment correction amount is a correction amount for correcting the position of the alignment mark 9 .

控制部15係判定是否已對於所有對準標記9算出了對準修正量(步驟S15)。當有未算出對準修正量的對準標記9時(步驟S15:No),雷射加工裝置100係依據來自控制部15的指示,對於未算出對準修正量的對準標記9,執行步驟S12至步驟S14的處理。雷射加工裝置100係對於各測量區域執行步驟S12至步驟S14的處理,直至對於所有的對準標記9算出對準修正量為止。當已再無未算出對準修正量的對準標記9時(步驟S15:Yes),修正量算出部14即根據所算出的複數個對準修正量,而算出各平台位置之雷射加工時的電流修正量(步驟S16)。The control unit 15 determines whether or not the alignment correction amounts have been calculated for all the alignment marks 9 (step S15). When there is an alignment mark 9 for which the alignment correction amount has not been calculated (step S15: No), the laser processing apparatus 100 executes the step S12 to the processing of step S14. The laser processing apparatus 100 executes the processing of step S12 to step S14 for each measurement area until the alignment correction amount is calculated for all the alignment marks 9 . When there is no alignment mark 9 for which the alignment correction amount has not been calculated (step S15: Yes), the correction amount calculation unit 14 calculates the laser processing time of each platform position based on the calculated alignment correction amounts. The current correction amount (step S16).

如此,控制裝置10係根據基準標記的測量位置MQ而算出各測量區域中之加工平台2A的定位誤差,且根據定位誤差而算出要修正定位誤差的修正係數,及使用修正係數而修正對準標記9的位置,且根據所修正之對準標記9的位置而算出電流修正量。In this way, the control device 10 calculates the positioning error of the machining platform 2A in each measurement area based on the measurement position MQ of the reference mark, calculates a correction coefficient for correcting the positioning error based on the positioning error, and corrects the alignment mark using the correction coefficient. 9, and calculate the current correction amount according to the corrected position of the alignment mark 9.

修正量算出部14係依每一平台位置而算出電流修正量,控制部15係依每一平台位置使用電流修正量而修正檢流計掃描儀5A的驅動量,同時執行雷射加工。藉此,由於檢流鏡4A的振盪角依每一平台位置被修正,因此雷射光1A的照射位置依每一平台位置被修正。此雷射光1A之照射位置的修正,係對應於加工平台2A之定位誤差的修正,因此雷射加工裝置100係可在依每一平台位置修正加工平台2A之定位誤差後的狀態下,執行加工工件3A的雷射加工。The correction amount calculation unit 14 calculates the current correction amount for each stage position, and the control unit 15 executes laser processing while correcting the drive amount of the galvanometer scanner 5A using the current correction amount for each stage position. Thereby, since the oscillation angle of the galvanometer mirror 4A is corrected for each stage position, the irradiation position of the laser light 1A is corrected for each stage position. The correction of the irradiation position of the laser light 1A corresponds to the correction of the positioning error of the processing platform 2A, so the laser processing device 100 can perform processing in the state where the positioning error of the processing platform 2A is corrected according to each platform position. Laser processing of workpiece 3A.

依據本實施型態,加工平台2A的定位精確度,從13.33μm被改善為6.46μm。亦即,相對於未修正加工平台2A之定位誤差的情形的定位誤差為13.33μm,雷射加工裝置100使用基準板8而修正加工平台2A之定位誤差的情形的定位誤差已成為6.46μm。According to this embodiment, the positioning accuracy of the processing platform 2A is improved from 13.33 μm to 6.46 μm. That is, the positioning error of the laser processing apparatus 100 using the reference plate 8 and correcting the positioning error of the processing table 2A is 6.46 μm compared to the positioning error of 13.33 μm when the positioning error of the processing table 2A is not corrected.

此外,依據本實施型態,加工平台2B的定位精確度,從11.65μm被改善為7.62μm。亦即,相對於未修正加工平台2B之定位誤差的情形的定位誤差為11.65μm,雷射加工裝置100使用基準板8而修正加工平台2B之定位誤差的情形的定位誤差已成為7.62μm。In addition, according to this embodiment, the positioning accuracy of the processing platform 2B is improved from 11.65 μm to 7.62 μm. That is, compared to 11.65 μm when the positioning error of the processing platform 2B is not corrected, the positioning error of the laser processing apparatus 100 using the reference plate 8 and correcting the positioning error of the processing platform 2B is 7.62 μm.

在加工平台2A中,存在有取決於加工平台2A本身之加工精確度的垂直度或平直度。因此,在使加工平台2A移動之際,不僅會產生每一移動軸的一維偏移,還會產生二維偏移(旋轉偏移)。在本實施型態中,係由於對於測量區域30n,使用基準標記P1至P4的四個實際位置、及四個測量位置Q1至Q4,藉由最小平方近似而算出修正係數,因此可修正加工平台2A之移動的二維偏移。In the processing platform 2A, there is verticality or straightness depending on the processing accuracy of the processing platform 2A itself. Therefore, when the machining table 2A is moved, not only a one-dimensional shift for each moving axis but also a two-dimensional shift (rotational shift) occurs. In this embodiment, for the measurement area 30n, using the four actual positions of the reference marks P1 to P4 and the four measurement positions Q1 to Q4, the correction coefficient is calculated by the least square approximation, so the processing platform can be corrected Two-dimensional offset of the movement of 2A.

此外,在本實施型態中,由於在不驅動檢流計掃描儀5A下使加工平台2A移動,而作成了用以修正加工平台2A之定位誤差的校準表。因此,能夠藉由表的一次作成即獲得可使基準標記M之實際位置AP中之加工平台2A的定位誤差接近零的修正係數。因此,可削減校準表的作成時間,並且可提升定位誤差的修正精確度,因此可效率良好地實現高精確度的雷射加工。In addition, in this embodiment, since the processing table 2A is moved without driving the galvanometer scanner 5A, a calibration table for correcting the positioning error of the processing table 2A is created. Therefore, a correction coefficient capable of bringing the positioning error of the processing table 2A in the actual position AP of the reference mark M close to zero can be obtained by creating the table once. Therefore, the preparation time of the calibration table can be reduced, and the accuracy of correction of positioning errors can be improved, so that high-precision laser processing can be realized efficiently.

此外,由於藉由進行平行四邊形修正或梯形修正,對於測量區域30n內的平台位置亦可獲得修正係數,因此對於基準標記M間亦可以高精確度修正加工平台2A的定位誤差。In addition, by performing parallelogram correction or trapezoidal correction, correction coefficients can also be obtained for the stage position in the measurement area 30n, so the positioning error of the processing stage 2A can be corrected between the reference marks M with high accuracy.

在此說明控制裝置10的硬體構成。第9圖係顯示實施型態之控制裝置之硬體構成例的圖。控制裝置10係可藉由第9圖所示的處理器(processor)301、記憶體302、及介面(interface)電路303來實現。處理器301、記憶體302、及介面電路303係可藉由匯流排(bus)而彼此進行資料的傳送接收。處理器301之例係CPU(Central Processing Unit,亦稱中央處理裝置、處理裝置、演算裝置、微處理器(micro processor)、微電腦(micro computer)、處理器、DSP(Digital Signal Processor,數位處理器))或系統LSI(Large Scale Integration,大型積體電路)。記憶體302之例係RAM(Random Access Memory,隨機存取記憶體)或ROM(Read Only Memory,唯讀記憶體)。Here, the hardware configuration of the control device 10 will be described. Fig. 9 is a diagram showing an example of the hardware configuration of the control device of the embodiment. The control device 10 can be realized by a processor 301 , a memory 302 , and an interface circuit 303 shown in FIG. 9 . The processor 301, the memory 302, and the interface circuit 303 can transmit and receive data with each other through a bus. The example of processor 301 is CPU (Central Processing Unit, also known as central processing device, processing device, calculation device, microprocessor (micro processor), microcomputer (micro computer), processor, DSP (Digital Signal Processor, digital processor) )) or system LSI (Large Scale Integration, large integrated circuit). An example of the memory 302 is RAM (Random Access Memory, random access memory) or ROM (Read Only Memory, read-only memory).

控制裝置10係藉由由處理器301讀取並執行記憶體302中所記憶之用以執行控制裝置10之動作的程式來實現。此外,此程式亦可稱為是使電腦執行控制裝置10的程序或方法者。記憶體302亦被使用於由處理器301執行各種處理時的暫時記憶體。The control device 10 is realized by the processor 301 reading and executing the program stored in the memory 302 for executing the actions of the control device 10 . In addition, this program can also be called a program or a method for causing a computer to execute the control device 10 . The memory 302 is also used as a temporary memory when the processor 301 executes various processes.

處理器301所執行的程式,亦可為具有可由電腦所執行之包含用以進行資料處理之複數個命令之可由電腦讀取而且為非暫態(non-transitory)記錄媒體的電腦程式產品。處理器301所執行的程式,係使電腦執行由複數個命令進行資料處理。The program executed by the processor 301 can also be a computer program product that can be read by a computer and is a non-transitory recording medium that can be executed by a computer and includes a plurality of commands for data processing. The program executed by the processor 301 is to make the computer execute a plurality of commands for data processing.

此外,亦可藉由專用的硬體來實現控制裝置10。此外,關於控制裝置10的功能,可設為一部份藉由專用的硬體來實現,一部份藉由軟體或韌體(firmware)來實現。In addition, the control device 10 can also be realized by dedicated hardware. In addition, the functions of the control device 10 may be partially implemented by dedicated hardware and partially implemented by software or firmware.

另外,在本實施型態中,雖已說明了加工機構20將雷射光分離為二個雷射光1A、1B,且藉由二個加工平台2A、2B同時地進行二個加工工件3A、3B之雷射加工的情形,但加工機構20的構成不限定於此構成。加工機構20亦可為藉由一個加工平台將複數個加工工件進行加工的構成,亦可為將複數個加工平台安裝於複數個驅動系統而將複數個加工工件進行加工的構成。In addition, in this embodiment, although it has been described that the processing mechanism 20 separates the laser light into two laser beams 1A, 1B, and the two processing workpieces 3A, 3B are simultaneously processed by the two processing platforms 2A, 2B. In the case of laser processing, the configuration of the processing mechanism 20 is not limited to this configuration. The machining mechanism 20 may also be configured to process a plurality of workpieces with one machining platform, or may be configured to process a plurality of workpieces by installing a plurality of machining platforms on a plurality of drive systems.

如此,依據實施型態,由於根據四處以上之基準標記的測量位置而算出加工平台2A的定位誤差,且重複進行使攝像機7A與加工平台2A連動從而測量基準標記的處理,且以涵蓋加工平台2A的整個區域之方式而算出定位誤差,因此可對於檢流計掃描儀5A所可對應的範圍(可藉由檢流計掃描儀5A的移動而拍攝加工對象之圖像的範圍),亦即較檢流計掃描區域更大的加工對象區域,算出對於定位誤差的電流修正量。因此,可將較檢流計掃描儀5A可對應的範圍更大的加工對象區域予以精確度良好地加工。此外,由於根據四處以上之基準標記M的測量位置MQ而算出加工平台2A的定位誤差,且根據定位誤差而算出電流修正量,因此可在短時間內算出對應於加工平台2A之定位誤差之精確度高的電流修正量。因此,可在短時間內實現精確度高的加工。In this way, according to the embodiment, the positioning error of the processing platform 2A is calculated based on the measurement positions of more than four fiducial marks, and the process of making the camera 7A and the processing platform 2A linked to measure the fiducial marks is repeated to cover the processing platform 2A. The positioning error can be calculated in the manner of the entire area of the galvanometer scanner, so the range that the galvanometer scanner 5A can correspond to (the range where the image of the processing object can be captured by the movement of the galvanometer scanner 5A), that is, can be compared The galvanometer scans the larger processing object area, and calculates the current correction amount for the positioning error. Therefore, it is possible to precisely process a processing target area larger than the range that the galvanometer scanner 5A can handle. In addition, since the positioning error of the machining platform 2A is calculated based on the measurement positions MQ of the four or more reference marks M, and the current correction amount is calculated according to the positioning error, the accuracy corresponding to the positioning error of the machining platform 2A can be calculated in a short time. High current correction amount. Therefore, high-precision machining can be realized in a short time.

以上實施型態所示的構成,係顯示本發明之內容的一例,亦可與其他公知的技術組合,在不脫離本發明之要旨的範圍內,亦可省略、變更構成的一部分。The configuration shown in the above embodiments is an example showing the content of the present invention, and may be combined with other known techniques, and a part of the configuration may be omitted or changed without departing from the gist of the present invention.

1A、1B:雷射光 2A、2B:加工平台 3A、3B:加工工件 4A、4B:檢流鏡 5A、5B:檢流計掃描儀 6A、6B:fθ透鏡 7A、7B:攝像機 8:基準板 9:對準標記 10:控制裝置 11:輸入部 12:修正係數算出部 13:記憶部 14:修正量算出部 15:控制部 20:加工機構 21:驅動平台 30n、30(n+1):測量區域 100:雷射加工裝置 301:處理器 302:記憶體 303:介面電路 AP:實際位置 BP:基準點 M、P1至P4:基準標記 MQ、Q1至Q4:測量位置1A, 1B: laser light 2A, 2B: processing platform 3A, 3B: machining workpiece 4A, 4B: Galvano mirror 5A, 5B: Galvanometer Scanner 6A, 6B: fθ lens 7A, 7B: camera 8: Reference plate 9: Alignment marks 10: Control device 11: Input part 12: Correction coefficient calculation part 13: Memory Department 14: Correction amount calculation part 15: Control Department 20: Processing mechanism 21: Drive platform 30n, 30(n+1): measurement area 100:Laser processing device 301: Processor 302: memory 303: interface circuit AP: actual location BP: benchmark point M, P1 to P4: Fiducial marks MQ, Q1 to Q4: Measuring positions

第1圖係顯示實施型態之雷射加工裝置之構成的圖。 第2圖係顯示實施型態之雷射加工裝置所具備之控制裝置之構成的圖。 第3圖係顯示藉由實施型態之雷射加工裝置所進行之修正係數之算出處理程序的流程圖。 第4圖係用以說明在實施型態之雷射加工裝置中所使用之基準板之測量區域的圖。 第5圖係用以說明實施型態之雷射加工裝置所測量之基準標記的圖。 第6圖係用以說明實施型態之雷射加工裝置所取得之基準標記之實際位置與測量位置之關係的圖。 第7圖係顯示藉由實施型態之雷射加工裝置所進行之電流修正量之算出處理程序的流程圖。 第8圖係用以說明實施型態之雷射加工裝置所使用之對準標記的圖。 第9圖係顯示實施型態之控制裝置之硬體構成例的圖。Fig. 1 is a diagram showing the configuration of a laser processing device of an embodiment. Fig. 2 is a diagram showing the configuration of the control device included in the laser processing device of the embodiment. Fig. 3 is a flow chart showing the calculation processing procedure of the correction coefficient performed by the laser processing device of the embodiment. Fig. 4 is a diagram for explaining the measurement area of the reference plate used in the laser processing device of the embodiment. Fig. 5 is a diagram for explaining reference marks measured by the laser processing device of the embodiment. Fig. 6 is a diagram for explaining the relationship between the actual position and the measured position of the reference mark obtained by the laser processing device of the embodiment. FIG. 7 is a flow chart showing the calculation processing procedure of the current correction amount performed by the laser processing device of the embodiment. Fig. 8 is a diagram for explaining alignment marks used in the laser processing device of the embodiment. Fig. 9 is a diagram showing an example of the hardware configuration of the control device of the embodiment.

10:控制裝置 10: Control device

11:輸入部 11: Input part

12:修正係數算出部 12: Correction coefficient calculation part

13:記憶部 13: Memory Department

14:修正量算出部 14: Correction amount calculation part

15:控制部 15: Control Department

20:加工機構 20: Processing mechanism

Claims (7)

一種雷射加工裝置,係具備:加工平台,係載置加工對象物;檢流鏡,係對於前述加工對象物照射雷射光而進行掃描;檢流計掃描儀,係驅動前述檢流鏡;測量裝置,係於在矩形區域內配置有四處以上之基準標記的基準板載置於前述加工平台上時測量前述四處以上的基準標記,而於前述加工對象物載置於前述加工平台上時則測量設於前述加工對象物之加工面上之對準標記的位置;及控制裝置,係根據前述四處以上之基準標記的測量位置而算出前述加工平台的定位誤差及修正前述定位誤差的修正係數,且使用前述修正係數而修正前述對準標記的測量位置,而且根據所修正之前述對準標記的測量位置,算出用以修正前述定位誤差之前述檢流計掃描儀的驅動修正量,並且一面使用前述驅動修正量驅動前述檢流計掃描儀一面控制前述加工對象物的雷射加工;於前述基準板,複數個前述基準標記係於能夠覆蓋前述加工平台的整面之區域,以等間隔配置成格子狀;前述矩形區域係於前述基準板的全面設有複數個;在要算出前述修正係數時係重複進行使前述測量裝置與前述加工平台連動從而測量前述四處以上之基準標記的處理,且由前述控制裝置以涵蓋前述加工平台的整個區域之方式算出前述修正係數。 A laser processing device is provided with: a processing platform, on which an object to be processed is placed; a galvanometer, which scans the object by irradiating laser light on the object to be processed; a galvanometer scanner, which drives the above-mentioned galvano mirror; A device for measuring the above-mentioned four or more fiducial marks when a reference plate with four or more fiducial marks arranged in a rectangular area is placed on the aforementioned processing platform, and measuring when the aforementioned processing object is placed on the aforementioned processing platform The position of the alignment mark provided on the processing surface of the aforementioned object to be processed; and the control device, which calculates the positioning error of the aforementioned processing platform and the correction coefficient for correcting the aforementioned positioning error based on the measurement positions of the aforementioned four or more reference marks, and The measurement position of the alignment mark is corrected using the correction coefficient, and the driving correction amount of the galvanometer scanner for correcting the positioning error is calculated based on the corrected measurement position of the alignment mark, and while using the aforementioned Drive the correction amount to drive the galvanometer scanner to control the laser processing of the object to be processed; on the reference plate, a plurality of the reference marks are arranged in a grid at equal intervals in an area that can cover the entire surface of the processing platform shape; the aforementioned rectangular area is provided with plural numbers on the entire surface of the aforementioned reference plate; when the aforementioned correction coefficient is to be calculated, the process of making the aforementioned measuring device and the aforementioned processing platform linked to measure the aforementioned four or more benchmark marks is repeated, and by the aforementioned The control device calculates the correction coefficient so as to cover the entire area of the processing platform. 如申請專利範圍第1項所述之雷射加工裝置,其中,前述控制裝置係使用前述定位誤差中之前述對準標記之位置所對應之矩形區域的定位誤差而算出前述驅動修正量。 The laser processing device as described in claim 1 of the patent claims, wherein the control device calculates the driving correction amount by using the positioning error of the rectangular area corresponding to the position of the alignment mark among the positioning errors. 如申請專利範圍第1項或第2項所述之雷射加工裝置,其中,前述控制裝置係將最小平方近似應用於前述基準標記之實際位置與前述測量位置的差分,而算出前述矩形區域的前述定位誤差。 The laser processing device as described in item 1 or item 2 of the scope of patent application, wherein the aforementioned control device applies the least square approximation to the difference between the actual position of the aforementioned reference mark and the aforementioned measured position, and calculates the area of the aforementioned rectangular area. The aforementioned positioning error. 如申請專利範圍第3項所述之雷射加工裝置,其中,前述控制裝置係藉由平行四邊形修正或梯形修正,而算出前述矩形區域內的定位誤差。 The laser processing device as described in claim 3 of the patent application, wherein the aforementioned control device calculates the positioning error in the aforementioned rectangular area through parallelogram correction or trapezoidal correction. 如申請專利範圍第1項所述之雷射加工裝置,其中,前述矩形區域係與相鄰的矩形區域鄰接且共有所鄰接的邊。 In the laser processing device described in claim 1 of the patent application, wherein, the aforementioned rectangular area is adjacent to an adjacent rectangular area and shares the adjacent sides. 一種雷射加工方法,係包含下列步驟:載置步驟,係對於雷射加工裝置,將在矩形區域內配置有四處以上之基準標記的基準板載置於加工平台上的步驟,該雷射加工裝置係具備有:前述加工平台,係載置加工對象物;檢流鏡,係對於前述加工對象物照射雷射光而進行掃描;檢流計掃描儀,係驅動前述檢流鏡;測量裝置,係觀察前述加工平台的面上;及控制裝置,係控制前述加工對象物的雷射加工;第一測量步驟,係由前述測量裝置測量前述四處以上的基準標記;第一算出步驟,係由前述控制裝置根據前述四處以上之前述基準標記的測量位置,而算出前述加工平台的定位誤差及要修正前述定位誤差的修正係數;第二測量步驟,係在前述加工對象物被載置於前述加工平台的狀態下,由前述測量裝置測量被設於前述加工對象物之加工面上之對準標記的位置; 修正步驟,係由前述控制裝置使用前述修正係數而修正前述對準標記的測量位置;第二算出步驟,係由前述控制裝置根據所修正之前述對準標記的測量位置,而算出用以修正前述定位誤差之前述檢流計掃描儀的驅動修正量;及控制步驟,係由前述控制裝置一面使用前述驅動修正量而驅動前述檢流計掃描儀,一面控制前述加工對象物的雷射加工;於前述基準板,複數個前述基準標記係於能夠覆蓋前述加工平台的整面之區域,以等間隔配置成格子狀;前述矩形區域係於前述基準板的全面設有複數個;在要算出前述修正係數時係重複進行使前述測量裝置與前述加工平台連動從而測量前述基準標記的處理,且由前述控制裝置以涵蓋前述加工平台的整個區域之方式算出前述修正係數。 A laser processing method comprising the following steps: a placing step, for a laser processing device, a step of placing a reference plate with four or more reference marks arranged in a rectangular area on a processing platform, the laser processing The device is equipped with: the aforementioned processing platform, which places the object to be processed; the galvanometer, which scans the object by irradiating laser light on the object to be processed; the galvanometer scanner, which drives the aforementioned galvanometer; the measuring device, which Observe the surface of the aforementioned processing platform; and the control device is to control the laser processing of the aforementioned processing object; the first measurement step is to measure the aforementioned four or more reference marks by the aforementioned measuring device; the first calculation step is to use the aforementioned control device The device calculates the positioning error of the processing platform and the correction coefficient to correct the positioning error according to the measurement positions of the above-mentioned four or more above-mentioned reference marks; the second measurement step is when the object to be processed is placed on the processing platform In this state, the position of the alignment mark set on the processing surface of the object to be processed is measured by the measuring device; The correcting step is to correct the measurement position of the aforementioned alignment mark by the aforementioned control device using the aforementioned correction coefficient; The driving correction amount of the aforementioned galvanometer scanner for the positioning error; and the control step is that the aforementioned control device uses the aforementioned driving correction amount to drive the aforementioned galvanometer scanner while controlling the laser processing of the aforementioned processing object; For the aforementioned reference plate, a plurality of the aforementioned reference marks are arranged in a grid at equal intervals in an area that can cover the entire surface of the aforementioned processing platform; the aforementioned rectangular area is provided with plural numbers on the entire surface of the aforementioned reference plate; when the aforementioned correction is to be calculated For the coefficient, the process of measuring the reference mark by interlocking the measuring device with the processing platform is repeated, and the correction coefficient is calculated by the control device so as to cover the entire area of the processing platform. 一種誤差調整方法,係包含下列步驟:載置步驟,係對於雷射加工裝置,將在矩形區域內配置有四處以上之基準標記的基準板載置於加工平台上的步驟,該雷射加工裝置係具備有:前述加工平台,係載置加工對象物;檢流鏡,係對於前述加工對象物照射雷射光而進行掃描;檢流計掃描儀,係驅動前述檢流鏡;測量裝置,係觀察前述加工平台的面上;及控制裝置,係控制前述加工對象物的雷射加工;第一測量步驟,係由前述測量裝置測量前述四處以上的基準標記;第一算出步驟,係由前述控制裝置根據前述四處以上之前述基準標記的測量位置,而算出前述加工平台的定位誤差及要修正前述定位誤差的修正係數; 第二測量步驟,係在前述加工對象物被載置於前述加工平台的狀態下,由前述測量裝置測量被設於前述加工對象物之加工面上之對準標記的位置;修正步驟,係由前述控制裝置使用前述修正係數而修正前述對準標記的測量位置;第二算出步驟,係由前述控制裝置根據所修正之前述對準標記的測量位置,而算出用以修正前述定位誤差之前述檢流計掃描儀的驅動修正量;及控制步驟,係由前述控制裝置一面使用前述驅動修正量而驅動前述檢流計掃描儀,一面控制前述加工對象物的雷射加工;於前述基準板,複數個前述基準標記係於能夠覆蓋前述加工平台的整面之區域,以等間隔配置成格子狀;前述矩形區域係於前述基準板的全面設有複數個;在要算出前述修正係數時係重複進行使前述測量裝置與前述加工平台連動從而測量前述基準標記的處理,且由前述控制裝置以涵蓋前述加工平台的整個區域之方式算出前述修正係數;前述控制裝置係在控制前述加工對象物之雷射加工時,以前述修正係數修正前述定位誤差。 An error adjustment method comprising the following steps: a placing step, for a laser processing device, a step of placing a reference plate with four or more reference marks arranged in a rectangular area on a processing platform, the laser processing device The system includes: the aforementioned processing platform, which places the object to be processed; the galvanometer, which scans the object by irradiating laser light; the galvanometer scanner, which drives the aforementioned galvanometer; the measuring device, which observes The surface of the aforementioned processing platform; and the control device is to control the laser processing of the aforementioned processing object; the first measurement step is to measure the aforementioned four or more reference marks by the aforementioned measuring device; the first calculation step is to use the aforementioned control device Calculate the positioning error of the aforementioned processing platform and the correction coefficient to correct the aforementioned positioning error according to the measurement positions of the aforementioned reference marks at more than four locations; The second measurement step is to measure the position of the alignment mark provided on the processing surface of the aforementioned object to be processed by the aforementioned measuring device under the condition that the aforementioned object to be processed is placed on the aforementioned processing platform; the correction step is to The aforementioned control device uses the aforementioned correction coefficient to correct the measured position of the aforementioned alignment mark; the second calculation step is to calculate the aforementioned detection position for correcting the aforementioned positioning error by the aforementioned control device based on the corrected measured position of the aforementioned alignment mark. The driving correction amount of the galvanometer scanner; and the control step, the aforementioned control device uses the aforementioned driving correction amount to drive the aforementioned galvanometer scanner while controlling the laser processing of the aforementioned object to be processed; on the aforementioned reference plate, a plurality of The above-mentioned reference marks are arranged in a grid at equal intervals in an area that can cover the entire surface of the aforementioned processing platform; the aforementioned rectangular area is provided with multiples on the entire surface of the aforementioned reference plate; when the aforementioned correction coefficient is to be calculated, it is repeated. The process of measuring the reference mark by linking the measuring device with the processing platform, and calculating the correction coefficient by the control device covering the entire area of the processing platform; the control device is controlling the laser of the object to be processed During processing, the aforementioned positioning error is corrected with the aforementioned correction coefficient.
TW109109927A 2019-04-01 2020-03-25 Laser processing apparatus, laser processing method and error adjusting method TWI787595B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
WOPCT/JP2019/014493 2019-04-01
PCT/JP2019/014493 WO2020202440A1 (en) 2019-04-01 2019-04-01 Laser processing device, laser processing method, and error adjustment method

Publications (2)

Publication Number Publication Date
TW202037438A TW202037438A (en) 2020-10-16
TWI787595B true TWI787595B (en) 2022-12-21

Family

ID=69166784

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109109927A TWI787595B (en) 2019-04-01 2020-03-25 Laser processing apparatus, laser processing method and error adjusting method

Country Status (3)

Country Link
JP (1) JP6632781B1 (en)
TW (1) TWI787595B (en)
WO (1) WO2020202440A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111299975B (en) * 2020-03-17 2021-11-12 孙晓杰 Method for improving machining efficiency of complex casting by using robot
CN113500313A (en) * 2021-06-23 2021-10-15 济南森峰科技有限公司 Laser high-speed dislocation punching method with dynamic Z-axis movement
CN114260560B (en) * 2021-12-16 2024-03-26 北京金橙子科技股份有限公司 A3-format scanner-based regional scanning large-format galvanometer correction system

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009220128A (en) * 2008-03-13 2009-10-01 Disco Abrasive Syst Ltd Workpiece machining method and workpiece machining apparatus
TW201024012A (en) * 2008-10-21 2010-07-01 Mitsubishi Electric Corp Laser processing apparatus
JP2015112630A (en) * 2013-12-12 2015-06-22 Ntn株式会社 Laser processing apparatus and laser processing method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58224088A (en) * 1982-06-22 1983-12-26 Nec Corp Laser processing device
JPH04253585A (en) * 1991-01-31 1992-09-09 Nec Corp Laser beam machining apparatus
JP2007237199A (en) * 2006-03-06 2007-09-20 Sumitomo Heavy Ind Ltd Laser beam machining apparatus and method
JP2018176233A (en) * 2017-04-17 2018-11-15 ローランドディー.ジー.株式会社 Laser beam machining method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009220128A (en) * 2008-03-13 2009-10-01 Disco Abrasive Syst Ltd Workpiece machining method and workpiece machining apparatus
TW201024012A (en) * 2008-10-21 2010-07-01 Mitsubishi Electric Corp Laser processing apparatus
JP2015112630A (en) * 2013-12-12 2015-06-22 Ntn株式会社 Laser processing apparatus and laser processing method

Also Published As

Publication number Publication date
JP6632781B1 (en) 2020-01-22
TW202037438A (en) 2020-10-16
WO2020202440A1 (en) 2020-10-08
JPWO2020202440A1 (en) 2021-04-30

Similar Documents

Publication Publication Date Title
TWI787595B (en) Laser processing apparatus, laser processing method and error adjusting method
EP2769800B1 (en) Laser processing machine
JP5288987B2 (en) Laser processing equipment
TWI577483B (en) Laser processing machine, laser processing machine workpiece skew correction method
KR102127109B1 (en) Substrate measuring device and laser processing system
JP5383920B2 (en) Laser processing apparatus and substrate position detection method
KR20200002916A (en) Laser processing equipment
JP2001330430A (en) Method and apparatus for measurement of flatness
JP2004243383A (en) Laser beam machine, and laser beam machining method
JP2012133122A (en) Proximity exposing device and gap measuring method therefor
TW201940272A (en) Laser marking apparatus
JP2013026383A (en) Alignment device, alignment method, and drawing device
JP2000329521A (en) Pattern measuring method and aligning method
JP2587292B2 (en) Projection exposure equipment
JPH08330219A (en) Scanning-type exposure device
JP2003039562A (en) Method for controlling deflection of laser beam in optical shaping system
JP7137363B2 (en) Exposure method, exposure apparatus, article manufacturing method and measurement method
WO2022190706A1 (en) Exposure method, and exposure device
JP4184983B2 (en) Alignment method
JP2567811B2 (en) Scanning exposure device
JPH11132762A (en) Measuring method of difference in flatness of long mirror of scanning type exposing device
JPH06120312A (en) Alignment method
TW201910937A (en) Exposure device
JP5752970B2 (en) Pattern drawing apparatus and pattern drawing method
JPH0410208B2 (en)