TWI786544B - Support jig, support jig set, and cleaning method for tank - Google Patents

Abstract

An objective of the present invention is to provide a support jig and a cleaning method. The cleaning method according to the present invention includes providing a support jig having an annular structure, disposing a tank with a lateral placement in the annular structure so that the annular structure closely contacts with at least a part of the outer peripheral surface of the tank along the circumferential direction of the tank, injecting a cleaning liquid into the tank, and then rotating the tank about the axis of the annular structure to thereby clean the inside of the tank with the cleaning liquid. Therefore, by combination of the lateral placement of the tank and the rotation of the tank, the cleaning liquid can agitate and remove impurities inside the tank. Further, the support jig having the annular structure can provide a strength reinforcing function, whereby the stress applied to the outer peripheral surface of the tank into which the cleaning liquid is injected can be effectively dispersed.

Description

Cleaning method for supporting jigs, supporting jig groups and tank objects

The present invention relates to a jig, in particular to a support jig and cleaning method that can be used to clean a tank.

In the general semiconductor manufacturing process, a large amount of chemical liquid is often used, so the purity of the chemical liquid is extremely important to avoid impurities remaining on the semiconductor device.

In the past, the chemical solution was produced in the chemical factory, injected into the tank and then transported to the semiconductor factory, or injected into the tank installed in the semiconductor factory, so as to carry out the related operations of the semiconductor process in the semiconductor factory. Therefore, before injecting the chemical liquid into the tank, the tank needs to be cleaned to ensure that no impurities remain inside the tank. In this way, the chemical liquid will not be mixed with impurities to maintain the purity of the chemical liquid.

However, the conventional way of cleaning the tank, as shown in Figure 1A, is to set up the tank object 9' first, keep it upright, and then use the spray method (the mist spray liquid 8' as shown in Figure 1A) Carry out cleaning of the inside of the tank object 9'. But this tank cleaning method can not evenly clean the tank object 9 ' inside, and the power of the spray is extremely weak and difficult to remove the dirt on the tank object 9 ' inner wall surface. Therefore, after the chemical liquid is injected into the tank object 9', the impurities remaining in the tank object 9' may be mixed into the chemical liquid, which will cause the purity of the chemical liquid to deteriorate.

On the other hand, in the industry, there is also a method of immersing the tank object 9' in a cleaning solution to clean the tank object 9'. For example, as shown in Figure 1B, the cleaning solution 8" is injected into the standing tank object 9' to almost the maximum capacity (more than 90% full), and then soaked for a long time to dissolve and remove the tank object 9'. After removing the impurities, remove the cleaning solution 8".

However, in the conventional method of immersing the cleaning solution, it is necessary to fill the cleaning solution 8" to almost the maximum capacity, thus consuming a large amount of cleaning solution 8", and it needs to be soaked for a long time, so the cost of the cleaning operation is greatly increased Cost and increased cleaning time, thus reducing the economic benefits of cleaning operations.

Furthermore, in the known method of immersing the cleaning solution, based on safety considerations, the cleaning solution 8" will not be injected into the top space inside the tank object 9', so the top space inside the tank object 9' cannot be cleaned. Therefore, after the chemical liquid is injected into the tank object 9', the impurities remaining in the head space inside the tank object 9' will be mixed into the chemical liquid, resulting in poor purity of the chemical liquid, thereby affecting the The yield rate of semiconductor manufacturing.

Therefore, how to overcome the various problems of the above-mentioned conventional technologies has become an urgent problem to be solved at present.

In view of the various deficiencies of the above-mentioned prior art, the present invention provides a support jig for supporting a cylindrical tank object. The support jig includes: a curved main body having a first end opposite to a second end two ends, so that a space is formed between the first end and the second end; On the interval, wherein, the curved main system is in close contact with the outside of the tub object along the circumferential direction of the tub object At least a part of the peripheral surface, the curved main body and the connecting piece form a ring structure, whereby the bucket object is placed horizontally in the ring structure.

In the aforementioned supporting jig, the curved main system includes a plurality of connected supporting parts. For example, the plurality of supporting parts are connected in a detachable manner.

In the supporting jig, the supporting part can be a rod or a sheet. In addition, the support portion may be arc-shaped.

In the aforementioned support jig, the connecting piece may be in the shape of a horseshoe.

In the aforementioned support fixture, the connector can be connected to the first end and the second end of the curved main body by a threaded member.

The aforementioned support fixture may further include a base for placing the curved main body. For example, the base may be in slidable contact with the outer peripheral surface of the curved body in a circumferential direction, so as to allow the tub object to rotate when the tub object is placed horizontally in the ring structure.

The present invention further provides a set of supporting jigs, which includes a plurality of the above-mentioned supporting jigs, and the plurality of supporting jigs are respectively arranged at different positions in the axial direction of the bucket object.

The present invention also provides a cleaning method, which includes: the step of providing a supporting jig, and the supporting jig includes: a curved main body with a first end and a second end opposite to each other, so that the first end and the second end A space is formed between the two ends; and a connecting piece is configured to connect the first end and the second end of the curved main body to the space in such a way that the width of the space can be adjusted, wherein the support jig constitutes In order to make the curved main body closely contact at least a part of the outer peripheral surface of the tub object along the circumferential direction of the tub object, and form a ring structure by the curved main body and the connecting piece, whereby the barrel The tank object is placed horizontally in the ring structure; the supporting jig is set on a cylindrical tank object, so that the ring structure of the support jig is in close contact with the tank object along the circumferential direction. At least a part of the outer peripheral surface of the barrel object divide, and place the tank object horizontally in the annular structure; inject the cleaning liquid into the tank object; and make the tank object provided with the supporting jig and injected with the cleaning liquid go around The axis of the annular structure is rotated, whereby the cleaning liquid is used to clean the interior of the tank object.

In the aforementioned cleaning method, in the cleaning step, the tub object can be reciprocated. For example, the connecting piece can be used as a rotation stop, so that the tub object can reciprocate based on the rotation stop.

In the aforementioned cleaning method, it may include the step of placing the curved main body of the supporting jig set on the tank object on a base, wherein the base is facing the outer peripheral surface of the curved main body Orientation slidably contacts to allow the tub object to rotate.

In the aforementioned cleaning method, the tub object can be actuated by manpower to make the tub object rotate relative to the base. In addition, the force for rotating the tub object can also be provided by the base.

It can be seen from the above that in the cleaning method of the present invention, the cleaning liquid can be stirred to remove the impurities inside the tank object mainly through the coordination of horizontally placing the tank object and rotating the tank object. Therefore, compared with the conventional spray cleaning method, the cleaning method of the present invention can uniformly clean all areas inside the tank object. In addition, the rotating force of the tank object is extremely strong, so the cleaning liquid in the tank will be violently stirred, and the dirt on the inner wall surface of the tank object can be easily removed. In this way, after the tank object is injected with the chemical liquid required for the semiconductor process, the chemical liquid in the tank object has excellent purity because no impurities are mixed in, thereby ensuring the yield rate of the semiconductor process.

Furthermore, the cleaning method of the present invention cooperates with placing the tank object horizontally and rotating the tank object, so that the tank object only needs to inject half of the cleaning liquid of the maximum capacity to carry out the cleaning operation, thus greatly Reduce the amount of cleaning solution used, and do not need to perform a long-term soaking step, so compared with the conventional Known as the immersion cleaning method, the cleaning method of the present invention can greatly reduce the cost of cleaning operations and shorten the cleaning time, thereby improving the economic benefits of cleaning operations.

In addition, the cleaning method of the present invention cooperates with placing the tank object horizontally and rotating the tank object, so that the tank object only needs to inject half of the cleaning liquid of the maximum capacity to carry out the cleaning operation, so it can not only achieve The safety of the cleaning operation, and it can clean all the areas inside the tank. Therefore, compared with the conventional immersion cleaning method, the cleaning method of the present invention does not leave impurities in all areas inside the tank object after the cleaning operation, and after the tank object is injected with the chemical liquid required for the semiconductor process , the chemical solution in the tank object has excellent purity because no impurities are mixed in, thereby ensuring the yield rate of the semiconductor manufacturing process.

In addition, the supporting jig of the present invention is designed as a ring structure, so that the stress on the outer peripheral surface of the tank object injected with cleaning liquid is effectively dispersed, so the supporting jig can firmly support the cleaning liquid loaded with it. Liquid bucket object, so that the bucket object will not be deformed.

1: support jig

1a: ring structure

2: Support fixture group

8,8": cleaning fluid

8': mist spray

9: Barrel object

9': bucket object

10: curved body

10a: first end

10b: second end

11:Connector

12:Fixer

20: base

20a: seat body

20b: Action component

20c: Adjustment parts

21,21': threaded member

22: Bracket

90: tank body

91: foot seat

92: Delivery port

100,100': board seat

100a, 100b, 110b: perforation

101: The first support part

102: the second support part

103: The third supporting part

110a, 110a': opening

111: frame body

112,113: feet

200: Roller

201: support frame

202: Ladder structure

202a, 202b, 202c: steps

920: delivery pipe

α: Center angle

β: Symmetry angle

A: Track area

B: fixed area

C1: Perimeter

C2: inner peripheral surface

d: spacing

F: direction of rotation

G: Interval

H: height

L: axis

O: center of circle

R: Diameter

S: Peripheral surface

t: width

W: week direction

X, Y, Z: Arrow direction

FIG. 1A is a schematic diagram showing a conventional method for cleaning a tub.

Fig. 1B is a schematic diagram showing another way of cleaning the tank in the prior art.

Fig. 2 is a three-dimensional exploded schematic view of the supporting jig of the present invention.

Fig. 3 is a schematic plan view of the supporting jig of the present invention.

FIG. 4 is a partially enlarged schematic diagram of FIG. 3 .

Fig. 5 is a schematic plan view of the connector of the supporting jig of the present invention.

Fig. 6 is a schematic perspective view showing that the supporting jig set of the present invention carries the tank object.

Fig. 7 is a schematic diagram showing the left side view of the supporting jig set carrying the tank object of the present invention.

FIG. 8 is a partially enlarged schematic diagram of FIG. 7 .

Fig. 9 is a schematic diagram showing the front view of the supporting jig set of the present invention for carrying bucket objects.

Fig. 10 is a schematic view showing the interior of the tub object of the present invention.

The implementation of the present invention will be described below by means of specific examples.

It should be noted that the structures, proportions, sizes, etc. shown in the drawings attached to this specification are only used to match the content disclosed in the specification, for the understanding and reading of those with ordinary knowledge in the technical field of the invention, and are not used to Limiting conditions on which the present invention can be implemented. Therefore, it has no technical substantive meaning, and any modification of structure, change of proportional relationship or adjustment of size shall still fall within the scope of the present invention without affecting the effect and purpose of the present invention. The disclosed technical content must be within the scope covered. At the same time, terms such as "above", "first", "second" and "third" quoted in this specification are only for the convenience of description and are not used to limit the scope of the present invention. The change or adjustment of the relative relationship shall also be regarded as the applicable scope of the present invention if there is no substantial change in the technical content.

2 to 5 are diagrams showing the supporting jig of the present invention. As shown in FIG. 2 , the support fixture 1 includes: a curved main body 10 and a connecting piece 11 .

In this embodiment, the support jig 1 is used to support a cylindrical tank object 9 (as shown in FIG. 6 ). For example, the tank object 9 is a tank for storing chemicals, as shown in FIG. The bucket object 9 of The specification adopts the metal container structure that the diameter R of tank body 90 is 3400mm and the total height H is 5346mm, and its total weight is about 5 tons. It should be noted here that there are many kinds of bucket objects 9 and are not limited to the above-mentioned specifications.

The curved main body 10 has a first end 10a and a second end 10b opposite to each other, so that a gap G is formed between the first end 10a and the second end 10b.

In this embodiment, the curved body 10 includes a first support portion 101 , a second support portion 102 and a third support portion 103 , and these support portions are connected. For example, the first support part 101 , the second support part 102 and the third support part 103 are connected in a detachable manner.

In one of the detachable ways, as shown in Figure 2, at least one board seat 100 with a plurality of perforations 100a is arranged on the end side of the first support part 101, the second support part 102 and the third support part 103 , so that the positions of the board seats 100 of the adjacent two supporting parts are aligned and superimposed on each other, and then pass through the perforations 100a of the board seats 100 that are superimposed on each other with screws (the drawings are omitted), and screw caps (the drawings are omitted) Formula) to fix the end side of the screw, so that the screw and the nut are used to connect and fix the superimposed plate bases 100 to each other, so as to fix the two adjacent supporting parts. Preferably, the through hole 100a is a screw hole. Specifically, opposite ends of the first supporting portion 101 are respectively connected to the second supporting portion 102 and the third supporting portion 103 in a screw connection manner.

Furthermore, the curved body 10 is in close contact with at least a part of the outer peripheral surface S (as shown in FIG. 6 ) of the tub object 9 along the circumferential direction W (as shown in FIG. 6 ) of the tub object 9 . For example, as shown in Figure 2, the curved main body 10 is defined on its outer peripheral surface C1 along its circumferential direction with a track area A located in the middle section and two fixed areas B respectively located on both sides of the track area A, therefore, The track area A can be used for external force to rotate the curved body 10 , and the fixing area B can be used for strengthening and fixing the tub object 9 .

In addition, the inner peripheral surface C2 of the curved main body 10 is a soft rubber pad surface such as black rubber, so as to facilitate close contact with the outer peripheral surface S of the tub object 9 .

The connecting piece 11 is arranged on the gap G by connecting the first end 10a and the second end 10b of the curved main body 10 so that the width t of the gap G can be adjusted (refer to FIG. 3 ). Wherein, the curved main body 10 and the connecting piece 11 form an annular structure 1a (refer to FIG. 3 ), and the bucket object 9 is disposed in the annular structure 1a in a horizontal manner.

In this embodiment, the connecting member 11 is horseshoe-shaped when viewed from the front, as shown in FIG. 5 , which defines a frame body 111 and feet 112 , 113 formed on opposite sides of the frame body 111 . For example, the frame body 111 is fin-shaped or rib-shaped, and at least one opening 110a is formed on the fin or rib, and the two legs 112, 113 can also be formed with at least one opening 110a' as required, and on the A plurality of through-holes 110b such as screw holes are formed on the side surfaces of the two-legged seats 112,113.

Furthermore, as shown in FIG. 2 , the connector 11 is connected to the first end 10 a and the second end 10 b of the curved main body 10 by a plurality of threaded members 21 (refer to FIG. 6 ). For example, the first end 10a and the second end 10b of the curved main body 10 are respectively equipped with a board seat 100' having a plurality of through holes 100b such as screw holes, so that the sides of the two legs 112, 113 are aligned and superimposed. The board seat 100' at the first end 10a and the board seat 100' at the second end 10b, and then use the threaded member 21 to engage the through holes 100b, 110b correspondingly, so that the threaded member 21 connects and fixes the feet The seats 112 , 113 and the board seats 100 ′ are used to fix the connecting member 11 and the curved main body 10 . Specifically, the two legs 112 , 113 of the connecting member 11 are connected to the second supporting portion 102 and the third supporting portion 103 in a screwed manner, respectively.

For example, as shown in FIG. 3, the annular structure 1a is formed as a substantially circular ring, and the first supporting portion 101 is formed at an angle of 170 degrees (as shown in FIG. 3 based on the annular structure 1a). The arc section of the center angle α) obtained from the center O of the circle. In addition, the second support portion 102 and the third support portion 103 present an arc-shaped section corresponding to the angle requirement according to the structure and strength of the connection piece 11, so the connection piece 11 can be selected according to its material properties or the threaded member 21 The tightness of the twist lock adjusts the width t of the gap G. Therefore, the connector 11. The second support portion 102 and the third support portion 103 form an arc section at an angle of 190 degrees. For example, the second support portion 102 and the third support portion 103 are each an arc section with the same arc (such as The symmetry angle β) of 80 degrees obtained based on the center O of the ring structure 1a shown in FIG. 3 .

Preferably, a bracket (figure omitted) can be disposed between the feet 112, 113 of the connector 11 and the second support portion 102 and/or the third support portion 103, so that these feet 112, 113 and The second supporting portion 102 and/or the third supporting portion 103 are spaced apart (as shown in FIG. Plus the distance between the sides of the two legs 112, 113 of the connector 11). It should be understood that the threaded member 21 will connect and fix the feet 112, 113, the bracket and the plate bases 100'.

In addition, the configuration of the openings 110a, 110a' is also beneficial to the stress distribution of the connector 11, so as to avoid the problem that the connector 11 is broken due to stress concentration. Therefore, during the process of adjusting the width t of the gap G, the structure of the connecting member 11 can be protected from damage.

In another embodiment, please refer to FIG. 6 to FIG. 9 , the support fixture 1 further includes at least one base 20 for placing the curved main body 10 . For example, the base 20 is in slidable contact with the outer peripheral surface C1 of the curved main body 10 in the circumferential direction, so that when the tub object 9 is placed horizontally in the curved main body 10, the tub object 9 to rotate. Specifically, the base 20 is slidably in contact with the track area A of the curved main body 10 , as shown in FIG. 7 , for external force to rotate the curved main body 10 .

The base 20 includes a base 20a and a plurality of active components 20b arranged on the base 20a, as shown in FIG. 6 . For example, the single action component 20b is configured to arrange two rollers 200 side by side on the base body 20a through a support frame 201, as shown in FIG. 9 . Wherein, the support frame 201 is fixed on the seat body 20a, and the rotation shafts of the two rollers 200 are connected to the support frame 201, so that the two rollers 200 contact the track area A of the curved main body 10 (refer to FIG. 7).

Furthermore, the active components 20b are symmetrically arranged on the track area A of the outer peripheral surface C1 of the first supporting portion 101, as shown in FIG. 9, so that the rollers 200 can rotate the curved main body 10 stably. Preferably, as shown in FIG. 7, the base body 20a can fix the support frames 201 by a plurality of adjustment pieces 20c, wherein the adjustment pieces 20c have a stepped structure 202, as shown in FIG. 8, so that the The support frame 201 is fixed on one of the steps 202a, 202b, 202c, so that the height position of the support frame 201 can be changed according to the needs, so as to adjust the track area of the rollers 200 on the outer peripheral surface C1 of the first support part 101 Position on A. In this way, the active components 20b can be adjusted to proper positions according to the curvature of the curved main body 10 .

In another embodiment, as shown in FIGS. 6 to 9 , a plurality of (for example, three) supporting jigs 1 can be combined into a supporting jig set 2 . In addition, the supporting fixtures 1 are respectively arranged at different positions in the direction of the axis L of the tub object 9 . For example, the support fixtures 1 are arranged at intervals along the direction of the axis L of the tub object 9 . It should be understood that these supporting jigs 1 can also be closely arranged in the form of a long cylindrical supporting jig group, or a single long cylindrical supporting jig can be made according to requirements to replace the long cylindrical supporting jigs. Cylindrical support jig set.

The supporting jig set 2 includes a plurality of brackets 22 to connect adjacent supporting jigs 1 . For example, the opposite ends of the bracket 22 have a plurality of fixing holes (unmarked component numbers), and the support tool 1 is arranged with a plurality of fixing holes on the fixing area B of the outer peripheral surface C1 of the curved main body 10. The fixing part 12 (referring to Fig. 2) of the fixing hole (not marked with the component symbol), so that the opposite ends of the bracket 22 are respectively aligned and superimposed on the fixing part 12 of the adjacent supporting fixture 1, and then the threaded member 21 ′ correspondingly engages the fixing holes, so that the threaded member 21 ′ connects and fixes the fixing pieces 12 and the brackets 22 to fix the adjacent support jig 1 . Specifically, the brackets 22 are respectively connected to the adjacent first support portion 101 , the adjacent second support portion 102 and/or the adjacent third support portion 103 in a screw connection manner.

Furthermore, the arrangement position of the fixing member 12 can be adjusted according to requirements, so as to adjust the structural strength of the supporting jig set 2 . For example, based on the annular structure 1 a shown in FIG. 3 , the fixing member 12 can be symmetrically or uniformly arranged on the fixing area B of the outer peripheral surface C1 of the curved main body 10 . For example, it can be arranged at four positions at an angle of 90 degrees relative to the center O shown in FIG. 3 . Wherein, the first supporting part 101 is provided with the fixing parts 12 at two places, and the second supporting part 102 and the third supporting part 103 are respectively provided with the fixing parts 12 at one place. Preferably, as shown in FIG. 9 , the four feet 91 of the tub object 9 respectively correspond to the positions of the fixing parts 12 .

It should be understood that the type of the supporting fixture 1 can be selected according to the needs, for example, the curved main body 10 can be changed into one, two or more than four arc-shaped sections, or the shape of the connecting piece 11 can be changed, etc. It is not limited to the above.

When using the supporting jig 1, the bucket object 9 is arranged horizontally in the annular structure 1a and closely connected to the inner peripheral surface C2 of the curved main body 10, and then pushed by an external force. The curved main body 10 is used to make the support jig 1 rotate while contacting the rollers 200 , as shown in FIG. 6 . Thereby, the supporting jig 1 can be applied to the cleaning operation of the tank object 9 .

Therefore, please refer to FIG. 2 to FIG. 10 together. The present invention further provides a cleaning method for the cleaning operation of the tank object 9 . The specific steps of the cleaning method adopted in the cleaning operation are as follows.

In this embodiment, based on the usage of the support fixture 1, the placement surface of the base 20 is defined as a reference plane (such as the environmental surface of the ground, etc.), and the horizontal orientation of the bucket object 9 Defined as the front-to-back direction (that is, the direction of the axis L of the bucket object 9. For example, the arrow direction X shown in Figure 6), and another coordinate axis of the reference plane is defined as the left-right direction (for example, the arrow shown in Figure 6 direction Y), and The upright direction of the bucket object 9 before it is placed horizontally is defined as the up-down direction (the direction perpendicular to the reference plane. For example, the arrow direction Z shown in FIG. 6 ).

Firstly, the first supporting part 101 is disposed on the base 20 , and then the bucket object 9 is tilted to be placed on the first supporting part 101 horizontally. Next, the second support portion 102 is connected to the third support portion 103 and fixed to the first support portion 101, and then the second support portion 102 and the third support portion 103 are connected and fixed by the connecting piece 11, to form the ring structure 1a. Thereby, as shown in FIG. 6, the annular structure 1a is made to closely contact at least a part of the outer peripheral surface S of the tub object 9 along the circumferential direction W of the tub object 9, thereby constituting the tub supporting jig 1. And, the tub object 9 is horizontally fixed in the tub supporting jig set 2 .

Next, as shown in FIG. 10 , the cleaning solution 8 is injected into the tank body 90 from the delivery port 92 of the tank object 9 . Wherein, the cleaning liquid 8 will not be injected into the maximum capacity of the tank body 90 of the tank object 9, but only be injected into approximately half of the maximum capacity. For example, the delivery port 92 is connected to a delivery pipe 920 extending into the tank body 90 to inject the cleaning solution 8 into the tank body 90 .

In this embodiment, the cleaning solution 8 contains 31% hydrogen peroxide, and its density is 1.11 g/cm ³ . The cleaning solution 8 is at most half of the maximum capacity of the tank body 90 (its weight is about 20 tons), so when the support fixture 1 contacts the rollers 200 and rotates, the cleaning solution in the tank body 90 8 can be stirred.

In addition, as far as other procedures are concerned, the cleaning solution 8 can be put into the tank body 90 before the bucket object 9 is poured, and then the bucket object 9 is poured to be placed horizontally on the first supporting part 101 superior.

Afterwards, the curved main body 10 is pushed by external force such as manpower or electric force. Thereby, the tank object provided with the support jig 1 (or the support jig group 2) and injected with the cleaning solution 8 Part 9 can rotate with the direction of the axis L of the bucket object 9 as a rotating shaft, and stir the cleaning liquid 8 in the tank body 90 . In this way, the inside of the tank body 90 is cleaned by the stirred cleaning solution 8 .

In this embodiment, since the connecting piece 11 cannot slide over the roller 200 of the base 20, the rotation of the bucket object 9 is to the left (counterclockwise) or rightward with the connecting piece 11 as the starting point. The direction (clockwise) swings, the rotation direction F shown in Figure 9, and cannot rotate a circle. For example, the rotation angle of the bucket object 9 can be based on the rotating shaft to swing to the left by about 130 degrees or to the right by about 130 degrees, or to swing 260 degrees from the lower left to the lower right or from the lower right to the lower left horn. Therefore, during the cleaning process, the tub object 9 can perform reciprocating rotation, that is, swing back and forth in the counterclockwise direction and clockwise direction. It should be understood that the rotation angle of the tub object 9 is determined in conjunction with the size of the connector 11 and the base 20, so adjusting the size of the connector 11 and the base 20 can change the tub The rotation angle of object 9.

After the cleaning operation is completed, the cleaning solution 8 is drawn out of the tank body 90 from the delivery port 92 of the tank object 9 through the delivery pipe 920, so as to deliver the cleaning solution 8 to a predetermined place outside the tank object 9 , such as the waste liquid collection place (the diagram is omitted).

Therefore, in the cleaning method of the present invention, the cleaning liquid 8 can be agitated to remove the impurities inside the tub object 9 mainly by horizontally placing the tub object 9 and rotating the tub object 9 . Therefore, compared with the conventional spray cleaning method, the rotation angle of the tub object 9 in the cleaning method of the present invention can effectively and evenly clean all areas inside the tank body 90 of the tub object 9 . In addition, the rotating force of the tank object 9 is strong, so that the cleaning liquid 8 inside the tank is vigorously stirred, thereby the dirt on the inner wall surface of the tank body 90 of the tank object 9 can be easily removed. In this way, after the chemical liquid required for the semiconductor manufacturing process is injected into the tank body 90 of the tank object 9, various impurities will not be mixed into the chemical liquid in the tank body 90 of the tank object 9, so the purity is high, and It can ensure the yield rate of the semiconductor manufacturing process.

Furthermore, compared with the conventional immersion cleaning method, the cleaning method of the present invention only needs to inject the tank body 90 of the tank object 9 into the maximum The cleaning solution 8 with half the capacity can be used for cleaning operation, so the consumption of the cleaning solution 8 can be greatly reduced, and the step of long-term immersion is unnecessary. Therefore, the cleaning method of the present invention can greatly reduce the cost of cleaning operations and shorten the cleaning time, thereby improving the economic benefits of cleaning operations.

Also, compared to the conventional immersion cleaning method, the cleaning method of the present invention only needs to inject the maximum capacity into the tank body 90 of the tank object 9 by horizontally placing the tank object 9 and rotating the tank object 9. One-half of the cleaning liquid 8 can carry out the cleaning operation, thereby not only meeting the safety of the cleaning operation, but also cleaning all areas inside the tank body 90 of the tank object 9. Therefore, after the cleaning operation is carried out by the cleaning method of the present invention, no impurities will remain in all areas inside the tank body 90 of the tank object 9, and the chemicals required for the semiconductor manufacturing process will be injected into the tank body 90 of the tank object 9 After liquid, there will be no various impurities mixed into the chemical liquid in the tank body 90 of the tank object 9, so the purity is high, and high yield can be ensured in the semiconductor manufacturing process.

In addition, based on the requirements of the cleaning method of the present invention, the supporting jig 1 (or the supporting jig group 2) of the present invention is mainly composed of an annular structure 1a to strengthen the tank object 9 when it is placed horizontally and rotated. The deformation resistance (that is, the strength auxiliary function provided by the support jig 1 or the support jig group 2) makes the stress (such as rotational centrifugal force) on the outer peripheral surface S of the tank object 9 injected with the cleaning liquid 8 ) can be effectively dispersed without the problem of stress concentration. Therefore, the support jig 1 (or the support jig group 2) can firmly support the tank object 9 (total weight of about 25 tons) that has been injected with the cleaning solution 8, so that the tank object 9 (whether it is injected with Cleaning liquid 8 or not injected with cleaning liquid 8) will not be deformed.

Moreover, the supporting jig 1 (or the supporting jig set 2 ) of the present invention is formed by the base 20 to disperse the stress on the outer peripheral surface S of the tub object 9 during rotation. Especially with four The roller 200 supports the weight of the tub object 9 , so the stress on the outer peripheral surface S on the side of the roller 200 of the tub object 9 injected with the cleaning fluid 8 can be more effectively distributed. Therefore, the supporting jig 1 (or the supporting jig set 2 ) can stably support the tub object 9 filled with the cleaning solution 8 so that the tub object 9 will not be deformed.

As mentioned above, the support jig and cleaning method of the present invention are formed by supporting the horizontal tank object and rotating the tank object by the ring structure support jig, so as to realize the cleaning operation with high cleaning effect, and can use By shortening the cleaning time, for example, the start-up time of the semiconductor manufacturing process (production line preparation time) is shortened, so it is beneficial to the technological development of the semiconductor manufacturing process.

Furthermore, in the horizontal rotation cleaning process of the present invention, because the cleaning liquid is only injected into half of the maximum capacity of the tank object at most, it is not only possible to reduce the cost of the cleaning liquid, but also the discharge of the cleaning operation Cleaning liquid (that is, waste liquid) will also be reduced, which can greatly reduce the cost of waste liquid treatment.

The above-mentioned embodiments are only used to illustrate the principles and effects of the present invention. Those skilled in the technical field of the present invention can make various modifications or changes to the above-mentioned embodiments within the scope of not departing from the gist of the present invention. Therefore, the present invention is not limited to the described embodiments, but should be interpreted in the widest range according to the technical thinking defined in the scope of the patent application.

1: support jig

1a: ring structure

2: Support fixture group

9: Barrel object

20: base

20a: seat body

20b: Action component

20c: Adjustment parts

21,21': threaded member

22: Bracket

92: Delivery port

L: axis

S: Peripheral surface

W: week direction

X, Y, Z: Arrow direction

Claims (10)

A supporting jig is used to support a cylindrical tank object, and the supporting jig includes: a curved main body, which has a first end and a second end opposite to each other, so that the first end and the second end A space is formed between the ends; and a connecting piece is arranged on the space by connecting the first end and the second end of the curved main body in a manner that the width of the space can be adjusted, wherein the curved main body is along the The circumferential direction of the bucket object is in close contact with at least a part of the outer peripheral surface of the bucket object, and the curved main body and the connecting piece form a ring structure, whereby the bucket object is placed horizontally on the ring in structure. The supporting jig as claimed in claim 1, wherein the curved main body includes a plurality of connected supporting parts. The supporting jig according to Claim 2, wherein the plurality of supporting parts are connected in a detachable manner. The supporting jig according to any one of Claims 1 to 3, wherein the connecting piece is in the shape of a horseshoe. The supporting jig according to any one of claims 1 to 3, wherein the connector is connected to the first end and the second end of the curved main body by a threaded member. The supporting jig as described in claim 1 further includes a base for placing the curved main body. The supporting jig according to claim 6, wherein the base is in slidable contact with the outer peripheral surface of the curved main body in the circumferential direction, so that when the bucket object is placed horizontally in the ring structure, Allows the bucket object to rotate. A set of supporting jigs, comprising a plurality of supporting jigs as described in any one of Claims 1 to 7, the plurality of supporting jigs are used to be respectively arranged at different positions in the axial direction of the bucket object . A cleaning method for tank objects, which includes: the step of providing a supporting jig, and the supporting jig includes: a curved main body, which has a first end and a second end opposite to each other, so that the first end and the second end A space is formed between the two ends; and a connecting piece is configured to connect the first end and the second end of the curved main body to the space in such a way that the width of the space can be adjusted, wherein the support jig constitutes In order to make the curved main body closely contact with at least a part of the outer peripheral surface of the tub object along the circumferential direction of the cylindrical tub object, and form a ring structure by the curved main body and the connecting piece, thereby, Place the tank object horizontally in the ring structure; set the supporting jig on the cylindrical tank object so that the ring structure of the support jig is in close contact along the circumferential direction of the tank object a step of placing the tank object horizontally in the annular structure on at least a part of the outer peripheral surface of the tank object; a step of injecting cleaning liquid into the tank object; and setting the supporting jig and The tank object injected with the cleaning liquid is rotated around the axis of the ring structure, thereby making the cleaning liquid clean the inside of the tank object. The cleaning method of the tub object according to claim 9, wherein, in the cleaning step, the tub object is reciprocated.

Images