TW202404707A - Supporting jig and cleaning method for tank - Google Patents

Abstract

An object of the present invention is to provide a supporting jig and a cleaning method. The cleaning method of the present invention includes preparing a supporting jig including a plurality of bases and at least one auxiliary member, and placing a tank transversely on these bases and the auxiliary member, thereby bringing the bases and the auxiliary member into close contact with at least a part of the outer peripheral surface of the tank along the circumferential direction of the tank, and then injecting a cleaning liquid into the tank, and rotating the tank about the axis of the tank to clean the inside of the tank with the cleaning fluid. Therefore, the cleaning liquid is stirred and impurities are removed from the inside of the tank by cooperation of the transverse placement of the tank and the rotation of the tank, and with the design of the auxiliary member, a function of reinforcing strength is provided so that stresses born by the outer periphery of the tank loaded with the cleaning liquid is effectively dispersed.

Description

Cleaning methods for supporting fixtures and bucket objects

The present invention relates to a fixture, in particular to a support fixture that can be used to clean bucket objects, and a cleaning method using the aforementioned support fixture.

In general semiconductor manufacturing processes, a large amount of chemical liquids are often used. The purity of chemical solutions is extremely important to avoid impurities remaining on semiconductor devices.

In the past, chemical liquids were produced in chemical factories and then injected into vat objects and then transported to the semiconductor factory, or injected into vat objects installed in the semiconductor factory to perform semiconductor manufacturing processes in the semiconductor factory. Homework. Therefore, before injecting the chemical liquid into the tank object, the tank object needs to be cleaned first to ensure that no impurities remain inside the tank object. This prevents the chemical liquid from being mixed with impurities and maintains the purity of the chemical liquid.

[Problem to be solved by the invention]

However, the conventional way of cleaning the bucket object is to first set the bucket object upright, and then spray the inside of the bucket object to clean it. However, this cleaning method of the bucket object not only cannot clean the inside of the bucket object evenly, but the force of the spray is extremely weak, making it difficult to remove dirt on the inner wall of the bucket object. Therefore, after the chemical liquid is injected into the tank object, impurities remaining inside the tank object may be mixed into the chemical liquid, resulting in a deterioration in the purity of the chemical liquid.

In addition, in the industry, there is also a method of immersing the tub objects in cleaning fluid to clean the tub items. For example, as shown in Figure 1, the cleaning fluid 6 is injected into the standing bucket object 7 to almost the maximum capacity (more than 90% full), and is soaked for a long time to dissolve and remove the impurities in the bucket object 7. , and then remove the cleaning fluid 6.

However, in the conventional method of immersing the cleaning fluid, the cleaning fluid 6 needs to be filled to almost the maximum capacity, so a large amount of the cleaning fluid 6 is consumed, and the immersion requires a long time, which greatly increases the cost of the cleaning operation and The cleaning time is increased, thereby reducing the economic benefits of the cleaning operation.

Furthermore, in the conventional method of immersing the cleaning fluid, due to safety considerations, the cleaning fluid 6 will not be injected until the top space inside the tub object 7, so the top space inside the tub object 7 cannot be cleaned. Therefore, after the chemical liquid is injected into the tank object 7, the impurities remaining in the top space inside the tank object 7 will be mixed into the chemical liquid, causing the purity of the chemical liquid to deteriorate, thereby affecting the manufacturing process of semiconductors. Yield is adversely affected.

On the other hand, in the past, there was also a method of placing the bucket object horizontally to clean the bucket object. For example, the bucket object is placed in a horizontal position in an annular support frame, and the entire outer peripheral surface of the bucket object is supported by the annular support frame. The cleaning fluid is then injected into the bucket object, and then the annular support frame is used to support the bucket object. The support frame is shaken to dissolve and remove impurities in the tank objects, and finally the cleaning fluid is removed. However, in the conventional horizontal cleaning method, the annular support frame needs to be assembled first, which is time-consuming and labor-intensive and difficult to reduce costs. In addition, the stress exerted on the tub object is easily distributed unevenly due to the supporting force exerted by the annular support frame on the tub object, resulting in deformation of the tub object.

Therefore, how to overcome the various problems of the above-mentioned conventional technologies has become an urgent issue to be solved. [Means to solve the problem]

In view of the various shortcomings of the above-mentioned conventional technology, the present invention provides a support fixture, which is used to support a horizontal cylindrical bucket object and rotate the bucket object. The support fixture includes: a plurality of bases The seat is configured to slidably abut against the outer peripheral surface of the bucket object in the circumferential direction; and at least one auxiliary component is provided on at least one of the plurality of bases and is configured to Relative to the outer circumferential surface of the barrel, the object is slidably abutted against the outer circumferential surface in the circumferential direction; the plurality of bases and the auxiliary component are configured to support the transverse barrel with the plurality of bases and the auxiliary component trough object and allow the trough object to rotate.

In the aforementioned support fixture, the auxiliary component includes a plurality of bearing groups, and the bearing groups are slidably abutted against the outer circumferential surface of the bucket object in the circumferential direction relative to the outer circumferential surface. For example, each of the load-bearing groups includes at least one roller for an auxiliary member rotatably disposed on the base, and the roller for the auxiliary member is in contact with the outer peripheral surface of the bucket object.

In the aforementioned support fixture, a plurality of the bases are provided with the auxiliary components, and among the bases provided with the auxiliary components, the number of the auxiliary components configured on any two bases is different. .

In the aforementioned support fixture, the auxiliary component is detachably provided on at least one of the plurality of bases.

In the aforementioned support fixture, the auxiliary component is disposed adjacent to the base in the axial direction of the bucket object.

In the aforementioned support fixture, the plurality of bases are arranged along the axial direction of the bucket object and are arranged at intervals in the axial direction of the bucket object.

In the aforementioned support fixture, each base includes a base body and a plurality of action members arranged along the outer circumferential direction of the barrel object and provided on the base body, and the action members are relative to the barrel. The outer circumferential surface of the groove object is slidably abutted against the outer circumferential surface in the circumferential direction. For example, each of the action components includes a support frame provided on the base body and a plurality of base rollers rotatably provided on the support frame. The plurality of base rollers are in contact with the barrel. The outer surface of the slot object. Furthermore, a protective tape is attached to the surface of the base roller. Alternatively, the base is provided with a base roller control device that controls the rotation speed of the base roller.

In the aforementioned support fixture, a protective tape is attached to the surface of the roller for the auxiliary member. Alternatively, the auxiliary member is provided with an auxiliary member roller control device that controls the rotation speed of the auxiliary member roller.

The present invention provides a cleaning method for bucket objects, which includes: providing the aforementioned support fixture; placing a cylindrical bucket object transversely on the base and the auxiliary component, so that the base and the auxiliary component The steps of the components being slidably abutted against the outer circumferential surface of the bucket object in the circumferential direction; the step of adding cleaning fluid into the bucket object; and the step of placing it horizontally on the support fixture and adding The step of rotating the bucket object with the cleaning fluid around the axis of the bucket object so that the cleaning fluid cleans the interior of the bucket object.

In the aforementioned cleaning method, in the cleaning step, the bucket object is shaken back and forth. [Efficacy of the invention]

It can be seen from the above that in the cleaning method of the support fixture of the present invention, mainly through the design of the auxiliary component, the bucket object can be directly placed horizontally on the support fixture, so there is no need to first horizontally place the bucket object It is placed in a conventional annular support frame. Therefore, compared with the conventional horizontal cleaning method, the cleaning method of the present invention can save the time and cost of assembling the conventional annular support frame. It not only saves time and effort, but also reduces costs, and the auxiliary The position of the component can be adjusted arbitrarily so that the auxiliary component can be configured for the areas of the tub object that are more susceptible to deformation, thereby effectively overcoming the problem of deformation of the tub object during cleaning.

Furthermore, by placing the bucket object horizontally and rotating the bucket object, the cleaning liquid can stir and corrode the nano-impurities inside the bucket object. Therefore, compared with the conventional spray cleaning method, this cleaning solution The cleaning method invented can evenly clean all areas inside the bucket object, and the rotation force of the bucket object is extremely strong, so that the dirt on the inner wall of the bucket object can be easily removed. Thereby, when the tank object is loaded with the chemical liquid required for the semiconductor wafer process, there will be no nano-impurities mixed into the chemical liquid in the tank object, and the purity of the chemical liquid will be maintained at a high level, thereby maintaining a high purity. It can ensure the yield of the semiconductor wafer process.

On the other hand, the cleaning method of the present invention combines the horizontal positioning of the bucket object and the rotation of the bucket object, so that the bucket object only needs to be filled with half-full cleaning fluid to perform cleaning operations, thus significantly reducing the cost of cleaning. The usage amount of the cleaning liquid does not require a long-term immersion step. Therefore, compared with the conventional immersion cleaning method, the cleaning method of the present invention can significantly reduce the cost of the cleaning operation and shorten the cleaning time, thus meeting the economic requirements of the cleaning operation. benefit.

In addition, the cleaning method of the present invention uses the cooperation of horizontally placing the bucket object and rotating the bucket object, so that the bucket object only needs to be loaded with half full of cleaning fluid to perform the cleaning operation, thereby ensuring the efficiency of the cleaning operation. safety. Moreover, since all areas inside the bucket object can be cleaned, compared with the conventional immersion cleaning method, after the cleaning operation is performed using the cleaning method of the present invention, no nanometers will remain in all areas inside the bucket object. Impurities, therefore when the tank object is loaded with chemical liquid required for the semiconductor wafer process, there will be no nano-impurities mixed into the chemical liquid in the tank object, so that the purity of the chemical liquid remains high. Therefore, the yield rate of the semiconductor wafer process can be improved.

In addition, the support fixture of the present invention is provided with an auxiliary member designed based on the needs of the cleaning method of the present invention, and the auxiliary member provides a strength assisting function so that the outer peripheral surface of the tank object loaded with cleaning fluid The stress endured can be effectively dispersed, so the support fixture of the present invention can firmly support the bucket object loaded with cleaning fluid, so that the bucket object will not deform.

The following describes the implementation of the present invention through specific embodiments. Those familiar with the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.

It should be noted that the structures, proportions, sizes, etc. shown in the drawings attached to this specification are only for ease of understanding and reading, and are not used to limit the conditions for the implementation of the present invention in conjunction with the content disclosed in the specification. Any structural modifications, changes in proportions, or adjustments in size are still within the scope of the present invention as long as they do not affect the effects that the present invention can produce and the purposes that can be achieved. At the same time, terms such as "above", "one", "two" and "three" described in this specification are only used for easy understanding and reading, and are not used to limit the scope of the present invention. The changes or adjustments shall also fall within the scope of the present invention as long as the technical content is not substantially changed.

2 to 9 are views showing the supporting fixture of the present invention. As shown in Figure 2, the support fixture 1 of the present invention is used to support a horizontal cylindrical bucket object 9 and rotate the bucket object 9, and includes: a plurality of bases 2 and at least one auxiliary component 3.

In one embodiment, the tank object 9 is a tank for chemical storage, which has a generally cylindrical tank body 90 and a foot 91 for supporting the tank body 90 . The tank object 9 is composed of a metal container structure with a diameter R of 3400 mm and a total height H of 5346 mm, as shown in Figure 11, and its total weight is about 5 tons. It should be noted here that the bucket object 9 can adopt various specifications and is not limited to the above specifications.

The base 2 is disposed relative to the outer peripheral surface S of the tub object 9 to slidably abut against the outer peripheral surface S in the circumferential direction W.

In this embodiment, the plurality of bases 2 are along the axis direction of the bucket object 9 (that is, the direction of the axis L of the bucket object 9, which is also the direction of the axis X of the XYZ coordinate axis as shown in Figure 2 ) are arranged and arranged at intervals in the axial direction of the barrel object 9 .

Furthermore, each base 2 adopts an aligning roller base, which includes a base body 20 and a plurality of action members 21 arranged along the circumferential direction W of the bucket object 9 and provided on the base body 20. And the action member 21 is slidably abutted against the outer peripheral surface S of the tub object 9 in the circumferential direction W.

The action member 21 includes a support frame 211 provided on the base body 20 and a plurality of base rollers 210 rotatably provided on the support frame 211. The plurality of base rollers 210 are It is in contact with the outer peripheral surface S of the bucket object 9 . Preferably, a protective tape 212 is attached to the surface of the base roller 210, such as a soft rubber pad surface of vinyl. For example, the protective tape 212 is made of polyethylene (PE), and its specifications are as shown in Table 1. [Table 1] Project unit specified value Measurement method thickness ㎜ 0.08±0.005 AFERA5006 Width ㎜ Customized specifications ±0.2 Peel strength Cn/㎝ 120 AFERA4001 Breaking strength portrait ＞1.2daN/㎝ AFERA5004 Horizontal ＞0.9daN/㎝ Breaking strength portrait ＞200% AFERA5004 Horizontal ＞400%

In this embodiment, the support frame 211 is fixed on the base body 20 , and the base is connected to the support frame 211 by the rotation axis of the roller 210 . For example, a single support frame 211 is provided with two base rollers 210 .

Furthermore, the support frame 211 can be fixed on the base body 20 by an adjustment member 23, wherein the adjustment member 23 has a ladder structure 23a (as shown in Figure 4), so that the support frame 211 can be fixed therein. There are steps 231, 232, and 233, so the height position of the support frame 211 can be changed as needed to adjust the position of the base rollers 210 on the outer peripheral surface S of the barrel object 9. In this way, the action members 21 can be arranged at the appropriate position required according to the size of the diameter R of the bucket object 9 or according to the area on the outer peripheral surface S of the bucket object 9 that is more easily deformed. . It should be understood that the adjusting member 23 can adopt various forms and is not limited to the above.

In addition, the action member 21 is symmetrically arranged on the base body 20 with a line extending in a direction orthogonal to the longitudinal direction of the base body 20 (the direction of the axis X) located at the center of the base body 20 as a center line. On the base body 20, the base rollers 210 can stably rotate the bucket object 9.

In addition, the base 2 is provided with at least one stopper structure 22. As shown in Figure 5, in the stopper structure 22, the operating panel 220 and the friction pad 222 linking the operating panel 220 are provided on the stopper structure 22 through the bracket 221. on the support frame 211. The operating panel 220 can be rotated manually to adjust the distance and tightness between the friction pad 222 and the base roller 210. Therefore, the friction between the two can be increased or decreased according to the needs to stop the base. The rotation of the seat roller 210.

The auxiliary component 3 is provided on at least one of the plurality of bases 2 (on the side base 2 as shown in Figure 2), and is arranged to face S relative to the outer peripheral surface S of the bucket object 9. The circumferential direction W is in slidable contact with the outer peripheral surface S.

In this embodiment, the auxiliary member 3 is detachably provided on at least one of the plurality of bases 2 to facilitate adjusting the position of the auxiliary member 3 in contact with the outer peripheral surface S of the bucket object 9 at any time. , and the auxiliary member 3 is arranged to be adjacent to the base 2 in the axial direction of the bucket object 9, so as to facilitate the purpose of assisting the base 2 in supporting the bucket object 9.

Furthermore, the auxiliary component 3 includes a plurality (such as two) bearing groups 3a. As shown in Figure 6, the bearing groups 3a are slidable in the circumferential direction W relative to the outer peripheral surface S of the bucket object 9. It is in contact with the outer peripheral surface S.

The bearing group 3a includes at least one auxiliary member roller 30 rotatably disposed on the base 2, and the auxiliary member roller 30 is in contact with the outer peripheral surface S of the bucket object 9. Preferably, the roller 30 for the auxiliary component and the corresponding roller 210 for the base are installed on the same axis, and a protective tape 300, such as a soft vinyl tape, is attached to the surface of the roller 30 for the auxiliary component. Rubber surface. For example, the protective tape 300 is made of polyethylene (Polyethylene, PE for short), and its specifications are as shown in Table 2. [Table 2] Project unit specified value Measurement method thickness ㎜ 0.08±0.005 AFERA5006 Width ㎜ Customized specifications ±0.2 Peel strength Cn/㎝ 120 AFERA4001 Breaking strength portrait ＞1.2daN/㎝ AFERA5004 Horizontal ＞0.9daN/㎝ Breaking strength portrait ＞200% AFERA5004 Horizontal ＞400%

In this embodiment, the bearing group 3a includes a plurality (such as two) rollers 30 for auxiliary components, and the plurality of rollers 30 for auxiliary components are connected by a fixed bracket 31. For example, the structure of the bearing group 3a is substantially the same as the structure of the action member 21. Preferably, the bearing group 3a is arranged left and right symmetrically with a line located at the center of the base body 20 and extending in a direction orthogonal to the longitudinal direction of the base body 20 (the direction of the axis X) as the center line. On the base 2, the auxiliary components use rollers 30 to stably rotate the bucket object 9.

In addition, the auxiliary component 3 is provided with at least one stopper structure 32 . As shown in FIG. 7 , in the stop structure 32 , the operating panel 320 and the friction pad 322 linking the operating panel 320 are installed on the fixed frame 31 through the bracket 321 . The distance and tightness between the friction pad 322 and the auxiliary member roller 30 can be adjusted by manually rotating the operating panel 320, so that the friction between the two can be increased or decreased according to needs to stop the auxiliary process. Rotation of roller 30 for components.

In addition, the support fixture 1 can be configured with the number of auxiliary members 3 as required. As shown in FIG. 8 , the auxiliary members 3 are provided on a plurality of (eg, two) bases 2a, 2b. For example, among the bases 2a and 2b provided with the auxiliary components 3, the number of the auxiliary components 3 configured on any two of the bases 2a and 2b is different, as shown in the support fixture 1a in Figure 8 , the middle base 2b has two of the auxiliary members 3, and the side base 2a has one of the auxiliary members 3.

On the other hand, the support fixture 1 can be provided with a base roller control for controlling the rotation speed of the base roller 210 on the base 2, 2a, 2b, 2c (only the base 2c in Figure 8). Device 4. The rotation speed of the base roller 210 is controlled by the base roller control device 4, thereby allowing the bucket object 9 to rotate at a predetermined value as shown in Table 3 below, for example. [table 3] Project specified value Speed 0.1rpm~0.3rpm angle 0°~360° Number of round trips 5~20 times

The roller control device 4 for the base includes a motor 40, a plurality of transmission reducers 41 driven by the motor 40, and a plurality of sprocket driving structures 42 linked by the transmission reducers 41, as shown in Figure 9. Show.

In this embodiment, the motor 40 can be equipped with a motor reducer 43, and the single sprocket driving structure 42 can synchronously rotate the two base rollers 210, and can link the plurality of transmissions through a transmission shaft 44. The plurality of transmission reducers 41 are used to synchronously drive the plurality of sprocket driving structures 42 to synchronously rotate the plurality of base rollers 210 on the action member 21 .

Furthermore, the roller control device 4 for the base can be configured on at least one of the bases 2, 2a, 2b, and 2c as required. For example, it can be configured on a machine without the auxiliary device as shown in Figures 2 and 8. Base 2, 2c of component 3. Thereby, when using the support fixture 1, 1a, the base roller control device 4 only needs to operate the disposed base 2, 2c to rotate the bucket object 9. As a result, the bucket object 9 will slide on the base 2, 2a, 2b provided with the auxiliary member 3, thereby allowing the plurality of bases 2, 2a, 2b provided with the auxiliary member 3 to be used. The roller 210 rotates.

Therefore, the base rollers 210 of the bases 2, 2c that are directly linked to the base roller control device 4 can be regarded as the driving wheel set, and the bases 2, 2a, 2b that slide and rotate in conjunction with the bucket object 9 The base roller 210 and the linked auxiliary member roller 30 of the auxiliary member 3 are regarded as a passive wheel set.

Furthermore, it should be understood that the support fixture 1 can also be provided with an auxiliary member roller control device (mechanism system of the auxiliary member roller control device) on the auxiliary member 3 for controlling the rotation speed of the auxiliary member roller 30. It is the same as the roller control device 4 for the base, so its drawing is omitted). The rotation speed of the auxiliary member roller 30 is controlled by the auxiliary member roller control device, so that the bucket object 9 can rotate at a predetermined value as shown in Table 4 below, for example. [Table 4] Project specified value Speed 0.1rpm~0.3rpm angle 0°~360° Number of round trips 5~20 times

For example, the base roller control device 4 provided on the base 2c in the support jig 1a shown in FIG. 9 can be replaced with an auxiliary member roller control device, and the auxiliary member roller control device can be provided on the base. On the auxiliary member 3 on the seat 2a. At this time, since the auxiliary component roller 30 and the corresponding base roller 210 are installed on the same shaft, the two base rollers 210 and the two auxiliary rollers can be rotated synchronously by a single sprocket driving structure 42 Roller 30 for components. At this time, the base roller 210 on the base 2a directly driven by the auxiliary member roller control device and the auxiliary member roller 30 of the auxiliary member 3 linked with it can be regarded as the driving wheel set, and the other bases 2b , the roller 210 for the base of 2c and the roller 30 for the auxiliary member 3 linked with it are regarded as a passive wheel set.

When using the support fixture 1, 1a, the plurality of bases 2, 2a, 2b, 2c and the auxiliary component 3 are used to support the horizontal bucket object 9, and then the base is supported by rollers 210 and auxiliary components. The member roller 30 rotates to allow the bucket object 9 to rotate. Therefore, if the auxiliary member roller 30 is added to increase the number of bearing rollers, the force exerted by the single row base roller 210 will be changed to The force of multiple rows of rollers (the rollers 30 for auxiliary components and the rollers 210 for the base) increases the area of the stress-bearing surface of the outer circumferential surface S of the bucket object 9, thereby dispersing the higher pressure at a single point into More points for lower pressure. That is to say, the weight of the bucket object 9 is distributed among multiple rows of rollers to reduce the pressure exerted by the bucket object 9 on the bases 2, 2a, 2b, 2c. Therefore, the support fixture 1, 1a of the present invention can be used effectively. It is applied to the cleaning operation of the bucket object 9.

Here, please refer to FIGS. 2 to 9 . The present invention further provides a cleaning method for cleaning the bucket object 9 . The specific steps of the cleaning method used in this cleaning operation are as follows.

In this embodiment, the support fixture 1a shown in Figure 8 is used, and based on the use method of the support fixture 1a, the placing surfaces of the bases 2a, 2b, 2c (such as the environmental surface of the ground, etc.) ) is defined as the datum plane, and the transverse direction of the bucket object 9 is defined as the front-to-back direction (that is, the axis direction of the bucket object 9. For example, the direction of the axis X of the XYZ coordinate system shown in Figure 10), and the The direction orthogonal to the front-to-back direction in the datum plane is defined as the left-right direction (for example, the direction of the axis Y of the XYZ coordinate system shown in Figure 10), and the upright direction of the bucket object 9 before being laid horizontally is defined as Up and down direction (for example, the direction of axis Z of the XYZ coordinate system shown in Figure 10).

In the cleaning method of the present invention, first, as shown in Figure 10, a cylindrical bucket object 9 is tilted to be placed horizontally on the base 2a, 2b, 2c and the auxiliary member 3, so that the base 2a , 2b, 2c and the auxiliary member 3 are all slidably abutted against the outer peripheral surface S of the tub object 9 in the circumferential direction W.

Next, as shown in FIG. 11 , the cleaning liquid 8 is injected into the tank body 90 from the delivery port 92 of the tank object 9 . The cleaning liquid 8 will not be injected into the maximum capacity of the tank body 90 of the bucket object 9 , but only needs to be injected up to approximately half of the maximum capacity. For example, the delivery port 92 is connected to a delivery pipe 920 extending into the tank 90 to inject the cleaning liquid 8 into the tank 90 and detect the tank 90 through the liquid level measuring device 95 The volume of cleaning fluid inside is 8.

In this embodiment, the cleaning solution 8 contains 31% hydrogen peroxide, and its density is 1.11g/㎝ ³ . The cleaning fluid 8 is at most half of the maximum capacity of the tank 90 (its weight is about 20 tons), so when the tank object 9 contacts the base rollers 210 and the auxiliary member rollers 30 and rotates , the cleaning liquid 8 in the tank 90 can be stirred.

In addition, as for other sequences, before dumping the bucket object 9 , the cleaning liquid 8 can be first put into the tank body 90 , and then the bucket object 9 can be poured to lie horizontally on the base 2a, 2b , 2c and the auxiliary component 3.

After that, the bucket object 9 placed horizontally on the support fixture 1a and filled with the cleaning liquid 8 is rotated with the axis L of the bucket object 9 as the center, so that the cleaning liquid 8 cleans the bucket object 9 inside.

In this embodiment, the motor 40 drives the base roller 210 and the auxiliary member roller 30 to rotate, so as to rotate the bucket object 9 . Thereby, the bucket object 9 injected with the cleaning liquid 8 will rotate with the direction of the axis L of the bucket object 9 as the rotation axis, thereby stirring the cleaning liquid 8 in the tank 90 . In this way, the inside of the tank 90 is cleaned by the stirred cleaning liquid 8 .

Furthermore, since the positions of the bases 2a, 2b, and 2c can be adjusted arbitrarily, and the auxiliary member 3 can be arbitrarily configured, the rollers 210 for the base and the rollers 30 for the auxiliary member can avoid the barrel object 9 Accessory 93 above the outer peripheral surface S (for example, the liquid level measuring device 95 is located at its required position). Furthermore, as for the rotation mode of the bucket object 9, the rotation direction F as shown in Figure 12 can rock back and forth in both the counterclockwise and clockwise directions, or it can also swing in the counterclockwise or clockwise direction. Rotates 360 degrees in the clockwise direction. For example, the bucket object 9 can be made to swing 180 degrees counterclockwise and 180 degrees clockwise with the rotation axis as the center in Figure 12, or to avoid the outer circumferential surface S of the bucket object 9. In the case of the accessory 93, it swings substantially 360 degrees in both the counterclockwise and clockwise directions in Figure 12. Thereby, during the cleaning process, the bucket object 9 can rock back and forth, that is, swing back and forth in the counterclockwise direction and clockwise direction. It should be understood that the rotatable angle of the bucket object 9 is determined by fitting the fitting 93 on the outer peripheral surface S of the bucket object 9. Therefore, if the fitting 93 on the outer peripheral surface S of the bucket object 9 is changed, The position can be changed to change the rotatable angle of the bucket object 9.

After the cleaning operation is completed, the cleaning fluid 8 is drawn out of the tank 90 from the transport port 92 of the tank object 9 through the delivery pipe 920, so that the cleaning fluid 8 is transported to a predetermined location outside the tank object 9. , such as waste liquid collection place.

Therefore, in the cleaning method of the present invention, mainly through the configuration of the auxiliary component 3, the bucket object 9 can be directly placed horizontally on the support fixture 1, 1a, so there is no need to first move the bucket object 9 horizontally. It is placed in a conventional annular support frame. Therefore, compared with the conventional horizontal cleaning method with an annular support frame, the cleaning method of the present invention has the following advantages:

First, improve efficiency and save time and effort to reduce cleaning costs. The present invention saves the time and expense of assembling the conventional annular support frame and simplifies the construction project. Therefore, it is no longer necessary to expend manpower in disassembling and assembling fixtures, thereby eliminating the use of large machinery such as crane operations.

Second, by reducing the weight of the support fixtures 1, 1a, the strength requirements for the ground where the cleaning operation is performed can be reduced by about 20% to avoid cracks or even subsidence of the ground at the place where the cleaning operation is performed.

Third, security is improved. After the supporting fixture 1, 1a used is positioned for the first time at the site of the cleaning operation, the bucket object 9 can be directly moved in the up and down directions (for example, the axis Z of the XYZ coordinate system shown in Figure 2 direction), the operator does not need to perform dangerous picking and placing operations from around the support fixture 1, 1a (in the front, rear, left, and right directions).

Fourth, increase the rotation angle of the support fixture 1,1a. The used support fixture 1, 1a does not require the use of a conventional annular support frame, so the rotation angle can be increased, for example, to more than 270°, and the bucket object 9 can even be rotated 360°.

Furthermore, the support fixture 1, 1a of the present invention is composed of the base 2, 2a, 2b, 2c and the auxiliary member 3 to disperse the stress borne by the outer peripheral surface S of the barrel object 9 when it rotates. . Since the position of the auxiliary member 3 can be adjusted arbitrarily, the auxiliary member 3 can be configured for the areas of the tub object 9 that are more susceptible to deformation, thereby effectively overcoming the problem of deformation of the tub object 9 during cleaning. In particular, each row of four rollers is used to support the weight of the bucket object 9, so that the stress borne by the outer circumferential surface S on the roller side of the bucket object 9 filled with the cleaning fluid 8 can be more effectively dispersed. Therefore, the supporting fixture 1, 1a can firmly support the tub object 9 filled with the cleaning liquid 8, so that the tub object 9 will not be deformed.

Therefore, the present invention makes the cleaning liquid 8 stir and remove impurities inside the barrel object 9 by placing the bucket object 9 horizontally and rotating the bucket object 9 . Therefore, compared with the conventional spray cleaning method, the rotation angle of the bucket object 9 in the cleaning method of the present invention (even 360° rotation) can effectively and evenly clean all areas inside the tank body 90 of the bucket object 9 . In addition, the rotation force of the bucket object 9 is strong, so that the cleaning liquid 8 inside the bucket is vigorously stirred, so that the dirt on the inner wall of the tank body 90 of the bucket object 9 can be easily removed. In this way, after the chemical liquid required for the semiconductor process is injected into the tank body 90 of the barrel object 9, various impurities will not be mixed into the chemical liquid in the tank body 90 of the barrel object 9, so the chemical liquid can be Maintain high purity and ensure the yield of the semiconductor process.

Furthermore, compared with the conventional immersion cleaning method, the cleaning method of the present invention combines the horizontal positioning of the bucket object 9 and the rotation of the bucket object 9, so that the tank body 90 of the bucket object 9 only needs to be filled with the maximum amount of water. The cleaning operation can be carried out with half the capacity of the cleaning fluid 8, thus greatly reducing the usage of the cleaning fluid 8 and eliminating the need for long-term soaking steps. Therefore, the cleaning method of the present invention can significantly reduce the cost of cleaning operations and shorten the cleaning time, thereby improving the economic benefits of cleaning operations.

In addition, compared with the conventional immersion cleaning method, the cleaning method of the present invention relies on the cooperation of horizontally placing the bucket object 9 and rotating the bucket object 9, so that the tank body 90 of the bucket object 9 only needs to be filled with the maximum capacity. The cleaning operation can be carried out with half of the cleaning fluid 8, thus improving the safety of the cleaning operation.

In addition, the support fixtures 1, 1a of the cleaning method of the present invention mainly strengthen the deformation resistance of the bucket object 9 when it is laid horizontally and rotated (that is, the support fixture 1 is provided with auxiliary members 3 as needed). The strength auxiliary function provided) allows the stress (such as rotational centrifugal force) borne by the outer circumferential surface S of the tank object 9 filled with the cleaning fluid 8 to be effectively dispersed without the problem of stress concentration. Therefore, the support fixture 1, 1a can firmly support the tank object 9 (total weight is about 25 tons) injected with the cleaning fluid 8, so that the tank object 9 (whether the cleaning fluid 8 is injected or not injected) Cleaning fluid 8) will not deform.

As mentioned above, the support fixture 1, 1a and the cleaning method of the present invention are based on the arrangement of the auxiliary member 3. Therefore, the cleaning operation with high cleaning effect can be realized without using the conventional annular support frame, and the cleaning time can be shortened. , to shorten the start-up time of the semiconductor process (preparation time of the production line), for example, and is conducive to the technological development of the semiconductor process.

Furthermore, in the horizontal rotation cleaning process of the present invention, since there is no limitation of the conventional annular support frame, it can be rotated greatly to meet the cleanliness requirements of high-precision processes such as semiconductor manufacturing.

The above embodiments are used to illustrate the principles and effects of the present invention, but are not intended to limit the present invention. Anyone skilled in the art can make modifications to the above embodiments without departing from the spirit and scope of the invention. Therefore, the scope of rights protection of the present invention should be as listed in the patent application scope described below.

1,1a: Support fixture 2,2a,2b,2c: base 3: Auxiliary components 4:Roller control device for base 6,8:Cleaning fluid 7,9:Bucket trough object 20:Base body 21:Action components 22,32: Stop structure 23:Adjustment parts 3a: Bearing group 30: Rollers for auxiliary components 31:fixed frame 40: Motor 41:Transmission reducer 42: Sprocket drive structure 43: Reducer for motor 44: Drive shaft 90: Tank body 91: Foot base 92:Transport port 93:Accessories 95: Liquid level measuring device 210:Roller for base 211: Support frame 212,300:Protective tape 220,320: Operation panel 221,321: Bracket 222,322: Friction pad 23a:Ladder structure 231,232,233: steps 920:Conveyor pipe F: rotation direction H: height L: axis R: diameter S: outer surface W: circumferential direction X,Y,Z: axis

Figure 1 is a schematic diagram showing a conventional cleaning method for bucket objects. Figure 2 is a schematic perspective view of the support fixture and the bucket object separated according to the present invention. Figure 3 is a three-dimensional schematic view of the base of the supporting fixture of the present invention. Figure 4 is a partially enlarged plan view of the base of the support fixture of the present invention. Figure 5 is a schematic plan view of the base of the supporting fixture of the present invention. Figure 6 is a schematic three-dimensional view of the auxiliary component of the support fixture of the present invention. Figure 7 is a schematic plan view of the auxiliary component of the support fixture of the present invention. Figure 8 is a schematic perspective view of another embodiment of the support fixture of the present invention. Figure 9 is a schematic three-dimensional view from another perspective of another embodiment of the support fixture of the present invention. Figure 10 is a schematic three-dimensional view showing the cleaning method of the present invention. Figure 11 is a schematic diagram showing the interior of the barrel object carried by the support fixture of the present invention. FIG. 12 is a schematic view from the side of the support jig set of the present invention carrying bucket objects.

1: Support fixture

2: base

3: Auxiliary components

4:Roller control device for base

9:Bucket trough object

90: Tank body

91: Foot base

92:Transport port

93:Accessories

95: Liquid level measuring device

L: axis

S: outer surface

W: circumferential direction

X,Y,Z: axis

Claims (15)

A support fixture is used to support a horizontal cylindrical barrel object and rotate the barrel object. The support fixture includes: A plurality of bases are disposed relative to the outer circumferential surface of the bucket object to slidably abut against the outer circumferential surface in the circumferential direction; and At least one auxiliary component is provided on at least one of the plurality of bases and is configured to slidably abut against the outer peripheral surface relative to the outer peripheral surface of the bucket object in the circumferential direction; The plurality of bases and the auxiliary component are configured to support the horizontal bucket object and allow the bucket object to rotate. The support fixture according to claim 1, wherein the auxiliary component includes a plurality of bearing groups, and the bearing groups are slidably abutted against the outer circumferential surface of the bucket object in the circumferential direction relative to the outer circumferential surface. The support fixture according to claim 2, wherein each of the load-bearing groups includes at least one roller for an auxiliary member rotatably provided on the base, and the roller for the auxiliary member is in contact with the bucket object. Peripheral surface. The support fixture according to claim 3, wherein a protective tape is attached to the surface of the roller of the auxiliary member. The support fixture according to claim 3, wherein the auxiliary member is provided with an auxiliary member roller control device for controlling the rotation speed of the auxiliary member roller. The support fixture as described in claim 1, wherein a plurality of the bases are provided with the auxiliary component, and among the bases provided with the auxiliary component, any two of the bases are equipped with the auxiliary component The number of components is different. The support fixture according to any one of claims 1 to 3 and 6, wherein the auxiliary component is detachably provided on at least one of the plurality of bases. The support fixture according to any one of claims 1 to 3 and 6, wherein the auxiliary component is arranged to be adjacent to the base in the axial direction of the bucket object. The support fixture as described in any one of claims 1 to 3 and 6, wherein the plurality of bases are arranged along the axial direction of the bucket object and are spaced apart in the axial direction of the bucket object. And setting. The support fixture as described in any one of claims 1 to 3 and 6, wherein each base includes a base body and a base body arranged along the circumferential direction of the bucket object and provided on the base body. A plurality of action members are provided, and the action members are slidably abutted against the outer circumferential surface relative to the outer circumferential surface of the bucket object in the circumferential direction. The support fixture as claimed in claim 10, wherein each of the action members includes a support frame provided on the base body and a plurality of base rollers rotatably provided on the support frame, and the plurality of rollers for the base are rotatably provided on the support frame. A base with a roller system is in contact with the outer peripheral surface of the barrel object. The support fixture according to claim 11, wherein a protective tape is attached to the surface of the base roller. The support fixture according to claim 11, wherein the base is provided with a base roller control device for controlling the rotation speed of the base roller. A method for cleaning bucket objects, which includes: Steps for providing a supporting fixture as described in any one of claims 1 to 13; A cylindrical bucket object is placed transversely on the base and the auxiliary component, so that the base and the auxiliary component are slidably abutted against the outer peripheral surface of the bucket object in the circumferential direction. steps; The step of adding cleaning fluid to the bucket object; and The step of rotating the bucket object that is placed horizontally on the support fixture and filled with the cleaning fluid with the axis of the bucket object as the center, so that the cleaning fluid can clean the inside of the bucket object. The cleaning method as described in claim 14, wherein in the cleaning step, the bucket object is rocked back and forth.