TWI786426B - High frequency characteristic inspection apparatus and high frequency characteristic inspection method - Google Patents
High frequency characteristic inspection apparatus and high frequency characteristic inspection method Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2832—Specific tests of electronic circuits not provided for elsewhere
- G01R31/2834—Automated test systems [ATE]; using microprocessors or computers
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/04—Housings; Supporting members; Arrangements of terminals
- G01R1/0408—Test fixtures or contact fields; Connectors or connecting adaptors; Test clips; Test sockets
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/14—Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
Abstract
本發明之課題在於將檢查探針自動地連接於基板,並適當地檢查高頻特性。 本發明之高頻特性檢查裝置係檢查基板之高頻特性者,且具備:可移動之檢查治具,其具有用以自上述基板之主面側檢查上述基板之複數個檢查探針;攝像部,其拍攝上述基板之主面側;基板保持器,其保持上述基板,且至少能夠相對於上述基板之主面平行地移動;及控制部,其基於上述攝像部所拍攝之圖像,至少使上述基板保持器移動,而使上述檢查探針接觸上述基板;上述控制部使上述基板保持器相對於上述基板之主面平行地移動,於進行上述基板相對於上述檢查治具之定位後,使上述檢查治具與上述基板保持器相對地於上述主面之垂直方向移動,而使上述檢查探針接觸上述基板。The object of the present invention is to automatically connect inspection probes to a substrate and appropriately inspect high-frequency characteristics. The high-frequency characteristics inspection device of the present invention inspects the high-frequency characteristics of a substrate, and includes: a movable inspection jig having a plurality of inspection probes for inspecting the substrate from the main surface side of the substrate; an imaging unit , which photographs the main surface side of the above-mentioned substrate; a substrate holder, which holds the above-mentioned substrate and can move at least parallel to the main surface of the above-mentioned substrate; and a control unit, based on the image captured by the above-mentioned imaging unit, at least The substrate holder moves to make the inspection probes contact the substrate; the control unit moves the substrate holder parallel to the main surface of the substrate, and after positioning the substrate relative to the inspection jig, The inspection jig moves relative to the substrate holder in a vertical direction to the main surface, and the inspection probes are brought into contact with the substrate.
Description
本發明係關於一種高頻特性檢查裝置及高頻特性檢查方法。The invention relates to a high-frequency characteristic inspection device and a high-frequency characteristic inspection method.
於檢查基板之先前之檢查裝置中,存在進行電路圖案之導通、絕緣檢查者,但並未測定基板之高頻特性。又,作為測定基板之高頻特性之技術,已知有使用非接觸電磁感應探針構件簡易地進行檢查之技術(例如參照專利文獻1)。 [先前技術文獻] [專利文獻]In the previous inspection equipment for inspecting the substrate, there were those that inspected the continuity and insulation of the circuit pattern, but did not measure the high-frequency characteristics of the substrate. Also, as a technique for measuring high-frequency characteristics of a substrate, a technique of simply performing inspection using a non-contact electromagnetic induction probe member is known (for example, refer to Patent Document 1). [Prior technical literature] [Patent literature]
[專利文獻1]日本專利特開平11-44724號公報[Patent Document 1] Japanese Patent Laid-Open No. 11-44724
[發明所欲解決之問題][Problem to be solved by the invention]
然而,於上述先前技術中係使用非接觸電磁感應探針構件簡易地進行檢查,難以使檢查探針自動地連接於要進行檢查之基板並檢查高頻特性。However, in the above-mentioned prior art, the non-contact electromagnetic induction probe member is used for simple inspection, and it is difficult to automatically connect the inspection probe to the substrate to be inspected and inspect the high-frequency characteristics.
本發明係為了解決上述問題而完成者,其目的在於提供一種能夠使檢查探針自動地連接於基板並適當地檢查高頻特性之高頻特性檢查裝置、及高頻特性檢查方法。 [解決問題之技術手段]The present invention was made to solve the above-mentioned problems, and an object of the present invention is to provide a high-frequency characteristic inspection device and a high-frequency characteristic inspection method capable of automatically connecting inspection probes to a substrate and appropriately inspecting high-frequency characteristics. [Technical means to solve problems]
為了解決上述問題,本發明之一態樣係一種高頻特性檢查裝置,其係檢查基板之高頻特性者,且具備:可移動之檢查治具,其具有用以自上述基板之主面側檢查上述基板之複數個檢查探針;攝像部,其拍攝上述基板之主面側;基板保持器,其保持上述基板,且至少能夠相對於上述基板之主面平行地移動;及控制部,其基於上述攝像部所拍攝之圖像,至少使上述基板保持器移動,而使上述檢查探針接觸上述基板;上述控制部使上述基板保持器相對於上述基板之主面平行地移動,於進行上述基板相對於上述檢查治具之定位後,使上述檢查治具與上述基板保持器相對地於上述主面之垂直方向移動,而使上述檢查探針接觸上述基板。In order to solve the above-mentioned problems, an aspect of the present invention is a high-frequency characteristic inspection device, which inspects the high-frequency characteristics of the substrate, and includes: a movable inspection jig, which has a A plurality of inspection probes for inspecting the above-mentioned substrate; an imaging unit for imaging the main surface side of the above-mentioned substrate; a substrate holder for holding the above-mentioned substrate and capable of moving at least parallel to the main surface of the above-mentioned substrate; and a control unit for Based on the image captured by the imaging unit, at least the substrate holder is moved to bring the inspection probe into contact with the substrate; the control unit moves the substrate holder parallel to the main surface of the substrate to perform the above After the substrate is positioned relative to the inspection jig, the inspection jig and the substrate holder are moved in a direction perpendicular to the main surface relative to each other, so that the inspection probes are brought into contact with the substrate.
又,本發明之一態樣係一種高頻特性檢查方法,其係檢查基板之高頻特性之高頻特性檢查裝置的高頻特性檢查方法,該高頻特性檢查裝置具備:可移動之檢查治具,其具有用以自上述基板之主面側檢查上述基板之複數個檢查探針;攝像部,其拍攝上述基板之主面側;基板保持器,其保持上述基板,且至少能夠相對於上述基板之主面平行地移動;及控制部,其基於上述攝像部所拍攝之圖像,至少使上述基板保持器移動,而使上述檢查探針接觸上述基板;且上述控制部使上述基板保持器相對於上述基板之主面平行地移動,於進行上述基板相對於上述檢查治具之定位後,使上述檢查治具與上述基板保持器相對地於上述主面之垂直方向移動,而使上述檢查探針接觸上述基板。 [發明之效果]Also, an aspect of the present invention is a method for inspecting high-frequency characteristics, which is a method for inspecting high-frequency characteristics of a high-frequency characteristic inspection device for inspecting high-frequency characteristics of a substrate. The high-frequency characteristic inspection device includes: a movable inspection device A tool having a plurality of inspection probes for inspecting the above-mentioned substrate from the main surface side of the above-mentioned substrate; an imaging unit for taking pictures of the main surface side of the above-mentioned substrate; The principal surface of the substrate moves in parallel; and a control unit moves at least the substrate holder based on the image captured by the imaging unit so that the inspection probes contact the substrate; and the control unit moves the substrate holder Move in parallel with respect to the main surface of the above-mentioned substrate, after positioning the above-mentioned substrate relative to the above-mentioned inspection jig, move the above-mentioned inspection jig and the above-mentioned substrate holder relative to the vertical direction of the above-mentioned main surface, so that the above-mentioned inspection The probes contact the aforementioned substrate. [Effect of Invention]
根據本發明,能夠使檢查探針自動地連接於基板,並適當地檢查高頻特性。According to the present invention, it is possible to automatically connect inspection probes to a substrate and appropriately inspect high-frequency characteristics.
以下,參照圖式,對本發明之一實施形態之高頻特性檢查裝置、及高頻特性檢查方法進行說明。 圖1係表示本實施形態之高頻特性檢查裝置1之構成例之圖。又,圖2係表示本實施形態之高頻特性檢查裝置之一例之功能方塊圖。Hereinafter, a high-frequency characteristic inspection device and a high-frequency characteristic inspection method according to an embodiment of the present invention will be described with reference to the drawings. Fig. 1 is a diagram showing a configuration example of a high-frequency characteristic inspection device 1 according to this embodiment. In addition, FIG. 2 is a functional block diagram showing an example of the high-frequency characteristic inspection device of this embodiment.
如圖1及圖2所示,高頻特性檢查裝置1具備上表面檢查治具21、下表面檢查治具22、上表面相機31、下表面相機32、基板保持器40、上表面檢查治具驅動部41、下表面檢查治具驅動部42、基板保持器驅動部43、及控制PC(Control Personal Computer,控制個人電腦)50。高頻特性檢查裝置1係檢查基板PB之高頻特性之檢查裝置。 又,於高頻特性檢查裝置1連接有作為檢查基板PB之高頻特性之分析裝置的網路分析儀2。As shown in FIGS. 1 and 2 , the high-frequency characteristic inspection device 1 includes an upper
基板PB為檢查對象之印刷基板,於內部形成有電路圖案。又,於基板片材ST上形成有複數個基板PB。於基板片材ST所具有之各基板PB之表面形成有於檢查高頻特性時接觸(連接)檢查治具之電極、及作為單片之基板PB之定位標記之對準標記等基板圖案。The substrate PB is a printed circuit board to be inspected, and a circuit pattern is formed inside. In addition, a plurality of substrates PB are formed on the substrate sheet ST. On the surface of each substrate PB included in the substrate sheet ST, substrate patterns such as electrodes contacting (connected to) an inspection jig when inspecting high-frequency characteristics, and alignment marks serving as positioning marks for a single substrate PB are formed.
再者,於本實施形態中,將平行於基板PB之主面之方向例如設為X軸方向、Y軸方向、及θ方向,將垂直於基板PB之主面之方向(垂直方向)設為Z軸方向進行說明。再者,於以下說明中,存在將平行於基板PB之主面之方向稱為平行方向之情形。此處,θ方向係與基板PB之主面平行之面上之角度方向,表示以Z軸方向作為旋轉軸之旋轉角。又,於本實施形態中,將基板PB之上側之主面設為主面F1(第1主面之一例),將基板PB之下側之主面設為主面F2(第2主面之一例)進行說明。Furthermore, in this embodiment, let the directions parallel to the main surface of the substrate PB be, for example, the X-axis direction, the Y-axis direction, and the θ direction, and let the directions (vertical directions) perpendicular to the main surface of the substrate PB be The Z-axis direction will be described. In addition, in the following description, the direction parallel to the main surface of the board|substrate PB may be called a parallel direction. Here, the θ direction is an angular direction on a plane parallel to the principal surface of the substrate PB, and represents a rotation angle with the Z-axis direction as a rotation axis. Also, in this embodiment, the principal surface on the upper side of the substrate PB is defined as the principal surface F1 (an example of the first principal surface), and the principal surface on the lower side of the substrate PB is defined as the principal surface F2 (the second principal surface). An example) will be described.
基板保持器40構成為保持基板PB(基板片材ST)且至少能夠相對於基板PB之主面平行地移動。基板保持器40能夠藉由下述基板保持器驅動部43於X軸方向、Y軸方向、及θ方向上移動。The
上表面檢查治具21係用以自基板PB之上側之主面F1側檢查基板PB之檢查治具,具有複數個檢查探針11,且配置於基板PB之主面F1側。又,上表面檢查治具21藉由檢查纜線CB1與網路分析儀2連接。上表面檢查治具21構成為能夠於檢查纜線CB1之姿勢變化不會對高頻特性之檢查產生影響之範圍內且僅於基板PB之主面(例如主面F1)之垂直方向上移動。例如,上表面檢查治具21能夠藉由下述上表面檢查治具驅動部41於Z軸方向上移動。The upper
下表面檢查治具22係用以自基板PB之下側之主面F2側檢查基板PB之檢查治具,具有複數個檢查探針12,且配置於基板PB之主面F2側。又,下表面檢查治具22藉由檢查纜線CB2與網路分析儀2連接。下表面檢查治具22構成為能夠於檢查纜線CB2之姿勢變化不會對高頻特性之檢查產生影響之範圍內且僅平行於基板PB之主面(例如主面F2)地移動。例如,下表面檢查治具22能夠藉由下述下表面檢查治具驅動部42於X軸方向、Y軸方向、及θ方向上移動。The lower
再者,於本實施形態中,上表面檢查治具21所具有之檢查探針11及下表面檢查治具22所具有之檢查探針12於表示高頻特性檢查裝置1所具備之任意檢查探針之情形、或無需特別區分之情形時,設為檢查探針10進行說明。 又,上表面檢查治具21及下表面檢查治具22於表示高頻特性檢查裝置1所具備之任意檢查治具之情形、或無需特別區分之情形時,設為檢查治具20進行說明。Furthermore, in this embodiment, the
上表面相機31(攝像部之一例)配置於基板PB之主面F1側,拍攝基板PB之主面F1側(上表面側)。上表面相機31例如具備CCD(Charge Coupled Device,電荷耦合元件)感測器等攝像元件,拍攝基板PB之主面F1側之基板圖案,並將所拍攝之基板圖案(之圖像資料)輸出至控制PC50。The upper surface camera 31 (an example of an imaging unit) is arranged on the main surface F1 side of the substrate PB, and images the main surface F1 side (upper surface side) of the substrate PB. The
下表面相機32(攝像部之一例)配置於基板PB之主面F2側,拍攝基板PB之主面F2側(下表面側)。下表面相機32例如具備CCD感測器等攝像元件,拍攝基板PB之主面F2側之基板圖案,並將所拍攝之基板圖案(之圖像資料)輸出至控制PC50。The bottom surface camera 32 (an example of an imaging unit) is arranged on the main surface F2 side of the substrate PB, and images the main surface F2 side (lower surface side) of the substrate PB. The
再者,於本實施形態中,上表面相機31(第1攝像部之一例)及下表面相機32(第2攝像部之一例)於表示高頻特性檢查裝置1所具備之任意相機之情形、或無需特別區分之情形時,設為相機30進行說明。In addition, in the present embodiment, the upper surface camera 31 (an example of the first imaging unit) and the lower surface camera 32 (an example of the second imaging unit) represent arbitrary cameras included in the high-frequency characteristic inspection device 1, Or when there is no need to distinguish them, the
檢查纜線CB1(第1檢查纜線之一例)例如為同軸纜線,連接於網路分析儀2與上表面檢查治具21之間,並於網路分析儀2與檢查探針11之間傳輸用以檢查高頻特性之檢查信號。即,複數個檢查探針11藉由檢查纜線CB1與網路分析儀2連接,檢查纜線CB1為同軸纜線。The inspection cable CB1 (an example of the first inspection cable) is, for example, a coaxial cable, connected between the
檢查纜線CB2(第2檢查纜線之一例)例如為同軸纜線,連接於網路分析儀2與下表面檢查治具22之間,並於網路分析儀2與檢查探針12之間傳輸用以檢查高頻特性之檢查信號。即,複數個檢查探針12藉由檢查纜線CB2與網路分析儀2連接,檢查纜線CB2為同軸纜線。The inspection cable CB2 (an example of the second inspection cable) is, for example, a coaxial cable, connected between the
上表面檢查治具驅動部41係使上表面檢查治具21移動之驅動機構。上表面檢查治具驅動部41使上表面檢查治具21於基板PB之主面(例如主面F1)之垂直方向上移動。上表面檢查治具驅動部41藉由下述控制PC50之控制使上表面檢查治具21於Z軸方向上移動。The upper surface inspection
下表面檢查治具驅動部42係使下表面檢查治具22移動之驅動機構。下表面檢查治具驅動部42使下表面檢查治具22於與基板PB之主面(例如主面F2)平行之方向上移動。下表面檢查治具驅動部42藉由下述控制PC50之控制使下表面檢查治具22於X軸方向、Y軸方向、及θ方向上移動。The lower surface inspection
基板保持器驅動部43係使基板保持器40移動之驅動機構。基板保持器驅動部43使其於與基板PB之主面(例如主面F1)平行之方向上移動,並使其於基板PB之主面之垂直方向上移動。基板保持器驅動部43藉由下述控制PC50之控制,使基板保持器40於X軸方向、Y軸方向、Z軸方向、及θ方向上移動。The substrate
控制PC50係控制高頻特性檢查裝置1之控制部。控制PC50基於相機30所拍攝之圖像,至少使基板保持器40移動,從而使檢查探針10接觸基板PB。例如,控制PC50於使基板保持器40相對於基板PB之主面平行地移動,從而進行了基板PB相對於檢查治具20之定位後,使檢查治具20與基板保持器40相對地於主面之垂直方向上移動,從而使檢查探針10接觸基板PB。The control PC 50 is a control unit that controls the high-frequency characteristic inspection device 1 . The
具體而言,控制PC50基於上表面相機31及下表面相機32所拍攝之基板圖案,使基板保持器40平行地移動,從而進行基板PB相對於檢查治具20之定位。即,控制PC50控制基板保持器驅動部43,使基板保持器40例如於X軸方向、Y軸方向、及θ方向中之任一方向上移動、或於組合其等而成之方向上移動,從而進行基板PB相對於上表面檢查治具21之定位。 再者,控制PC50控制下表面檢查治具驅動部42,基於下表面相機32所拍攝之基板圖案使下表面檢查治具22平行(例如X軸方向、Y軸方向、及θ方向中之任一方向或組合其等而成之方向)地移動,從而進行基板PB相對於下表面檢查治具22之定位之微調整。Specifically, the
控制PC50於進行了基板PB相對於檢查治具20之定位後,使上表面檢查治具21及下表面檢查治具22與基板保持器40相對地於垂直方向上移動,從而使複數個檢查探針10接觸基板PB。控制PC50控制基板保持器驅動部43,例如使基板保持器40於垂直方向(Z軸方向)上移動,從而使下表面檢查治具22之複數個檢查探針10接觸基板PB。進而,控制PC50控制上表面檢查治具驅動部41,例如使上表面檢查治具21於垂直方向(Z軸方向)上移動,從而使上表面檢查治具21之複數個檢查探針10接觸基板PB。After positioning the substrate PB relative to the
如此,控制PC50使上表面檢查治具21及下表面檢查治具22與基板保持器40相對地於垂直方向上移動,從而執行基板PB之定位及檢查探針10之接觸。此處,參照圖3,對本實施形態中之上表面檢查治具21、下表面檢查治具22、及基板保持器40之移動方向之詳情進行說明。In this way, the
圖3係對本實施形態之檢查治具20及基板保持器40之移動動作之一例進行說明之圖。 如圖3所示,上表面檢查治具21藉由上表面檢查治具驅動部41之驅動,能夠於檢查纜線CB1之姿勢變化不會對高頻特性之檢查產生影響之範圍內且僅於Z軸方向上移動。再者,上表面檢查治具21成為無法於X軸方向、Y軸方向、及θ方向上移動之構成。此處,上表面檢查治具21之垂直方向(Z軸方向)上之移動量例如為50 mm(毫米)以下。上表面檢查治具21之垂直方向(Z軸方向)上之移動用於上表面檢查治具21之檢查探針11與基板PB之接觸。FIG. 3 is a diagram illustrating an example of movement of the
又,下表面檢查治具22藉由下表面檢查治具驅動部42之驅動,能夠於檢查纜線CB2之姿勢變化不會對高頻特性之檢查產生影響之範圍內於X軸方向、Y軸方向、及θ方向中之任一方向或其等所組合而成之方向上移動。再者,下表面檢查治具22為無法於Z軸方向上移動之構成。此處,下表面檢查治具22之平行方向(X軸方向及Y軸方向)之移動量小於基板保持器40之移動量,例如為5 mm以下,與基板PB之主面平行之面上之角度方向(θ方向)之移動量例如為3°(度)以下。下表面檢查治具22之平行方向(X軸方向、Y軸方向、及θ方向)之移動係用於下表面檢查治具22相對於基板PB之定位。In addition, the lower
又,基板保持器40藉由基板保持器驅動部43之驅動,能夠於平行方向(X軸方向、Y軸方向、及θ方向)、以及垂直方向(Z軸方向)移動。基板保持器40之平行方向(X軸方向、Y軸方向、及θ方向)之移動係用於基板PB相對於上表面檢查治具21及下表面檢查治具22之定位、以及基板片材ST上之檢查對象之基板PB之移動。又,基板保持器40之垂直方向(Z軸方向)上之移動係用於下表面檢查治具22之檢查探針12與基板PB之接觸。Further, the
如此,控制PC50使用能夠於特定方向移動之上表面檢查治具21、下表面檢查治具22、及基板保持器40,進行基板PB相對於上表面檢查治具21及下表面檢查治具22之定位、以及上表面檢查治具21及下表面檢查治具22之檢查探針12與基板PB之接觸。控制PC50於進行上表面檢查治具21及下表面檢查治具22之檢查探針10與基板PB之接觸時,使基板保持器40朝下方向移動,而使下表面檢查治具22之檢查探針12與基板PB接觸,進而,使上表面檢查治具21朝下方向移動,而使上表面檢查治具21之檢查探針11與基板PB接觸。In this way, the
控制PC50於使上表面檢查治具21及下表面檢查治具22之檢查探針10與基板PB接觸後,使用網路分析儀2執行基板PB之高頻特性檢查。After the
其次,參照圖式,對本實施形態之高頻特性檢查裝置1之動作進行說明。 圖4係表示本實施形態之高頻特性檢查裝置1之動作之一例的流程圖。於該圖中,表示了藉由高頻特性檢查裝置1之控制PC50自基板PB之兩面側進行基板PB之高頻特性檢查的動作。Next, the operation of the high-frequency characteristic inspection device 1 of this embodiment will be described with reference to the drawings. FIG. 4 is a flow chart showing an example of the operation of the high-frequency characteristic inspection device 1 of this embodiment. In this figure, the operation|movement which performs the high-frequency characteristic inspection of the board|substrate PB from both surface sides of the board|substrate PB by the control PC50 of the high-frequency characteristic inspection apparatus 1 is shown.
如圖4所示,高頻特性檢查裝置1之控制PC50首先使基板保持器40移動至檢查之開始位置(步驟S101)。控制PC50控制基板保持器驅動部43,使其以上表面檢查治具21及下表面檢查治具22來到基板保持器40所保持的基板片材ST所具有之複數個基板PB中之檢查開始位置之基板PB之方式移動。再者,將基板片材ST之尺寸、基板PB之尺寸、及基板片材ST內之基板PB之數量等設定資訊記憶於控制PC50所具備之記憶部(未圖示)中。As shown in FIG. 4 , the
其次,控制PC50藉由上表面相機31開始拍攝基板PB之上表面,並藉由下表面相機32開始拍攝基板PB之下表面(步驟S102)。控制PC50使上表面相機31之拍攝動作開始,定期地獲取所拍攝之基板PB之上表面側(主面F1側)之基板圖案之圖像。又,控制PC50使下表面相機32之拍攝動作開始,並定期地獲取所拍攝之基板PB之下表面側(主面F2側)之基板圖案之圖像。此處,基板圖案中例如包含對準標記或配線圖案。Next, the
其次,控制PC50基於上表面相機31及下表面相機32之拍攝圖像,使基板保持器40於X軸方向、Y軸方向、及θ方向上移動,從而決定上表面檢查治具21之檢查位置(步驟S103)。控制PC50基於上表面相機31及下表面相機32所拍攝之基板圖案之圖像,控制基板保持器驅動部43,決定上表面檢查治具21之檢查位置。Next, the
其次,控制PC50基於下表面相機32之拍攝圖像及於上述步驟S103中決定之上表面檢查治具21之檢查位置之資訊,使下表面檢查治具22於X軸方向、Y軸方向、及θ方向上移動,從而決定下表面檢查治具22之檢查位置(步驟S104)。控制PC50基於下表面相機32所拍攝之基板圖案之圖像及於上述步驟S103中決定之上表面檢查治具21之檢查位置之資訊,控制下表面檢查治具驅動部42,決定下表面檢查治具22之檢查位置。此處,控制PC50於檢查纜線CB2之姿勢變化不會對高頻特性之檢查產生影響之範圍內使下表面檢查治具22之檢查位置移動。Next, the
其次,控制PC50使基板保持器40於Z軸方向上移動,從而使下表面檢查治具22之檢查探針12接觸基板PB(步驟S105)。控制PC50控制基板保持器驅動部43,使基板保持器40向Z軸方向之下方向移動,從而使下表面檢查治具22之檢查探針12接觸基板PB。Next, the
其次,控制PC50使上表面檢查治具21於Z軸方向上移動,從而使上表面檢查治具21之檢查探針11接觸基板PB(步驟S106)。控制PC50控制上表面檢查治具驅動部41,使上表面檢查治具21向Z軸方向之下方向移動,從而使上表面檢查治具21之檢查探針11接觸基板PB。Next, the
其次,控制PC50藉由網路分析儀2檢查基板PB之高頻特性(步驟S107)。網路分析儀2例如測定基板PB之高頻電路之路徑之通過功率、及反射功率之頻率特性例如作為基板PB之高頻特性,並判定合格與否。Next, the
其次,控制PC50使上表面檢查治具21及基板保持器40於Z軸方向上移動,從而解除檢查探針10之接觸(步驟S108)。控制PC50控制上表面檢查治具驅動部41,使上表面檢查治具21向Z軸方向之上方向移動,從而解除上表面檢查治具21之檢查探針11之接觸(電性連接)。又,控制PC50控制基板保持器驅動部43,使基板保持器40向Z軸方向之上方向移動,從而解除下表面檢查治具22之檢查探針12之接觸(電性連接)。Next, the
其次,控制PC50判定是否存在下一個檢查位置(步驟S109)。控制PC50基於上述未圖示之記憶部所記憶之設定資訊(例如基板PB內之複數個檢查位置資訊等)與當前之檢查位置,判定於當前之基板PB內是否存在下一個檢查位置。控制PC50於存在下一個檢查位置之情形(步驟S109:是(YES))時使處理進展至步驟S103,並重複步驟S103至步驟S109之處理。又,控制PC50於不存在下一個檢查位置之情形(步驟S109:否(NO))時,使處理進展至步驟S110。Next, the control PC50 judges whether the next inspection position exists (step S109). The
於步驟S110中,控制PC50判定是否存在下一個要檢查之基板PB。控制PC50基於上述未圖示之記憶部所記憶之設定資訊(例如基板片材ST之尺寸、基板PB之尺寸、及基板片材ST內之基板PB之數量等)與當前之檢查位置,確認於基板片材ST所具有之複數個基板PB中是否存在下一個要檢查之基板PB。控制PC50於存在下一個要檢查之基板PB之情形(步驟S110:是)時,使處理進展至步驟S111。又,控制PC50於不存在下一個要檢查之基板PB之情形(步驟S110:否)時,結束處理。In step S110 , the
於步驟S111中,控制PC50使基板保持器40移動至下一個要檢查之基板PB之位置。控制PC50控制基板保持器驅動部43,使其移動至基板片材ST所具有之複數個基板PB中之下一個檢查對象之基板PB之位置。於步驟S111之處理後,控制PC50使處理進展至步驟S102,於移動後之下一個要檢查之基板PB重複步驟S102至步驟S110之處理。In step S111, the control PC50 moves the board|
其次,參照圖5,對僅於基板PB之上表面側檢查高頻特性之情形之本實施形態之高頻特性檢查裝置1之動作之變化例進行說明。 圖5係表示本實施形態之高頻特性檢查裝置1之動作之另一例的流程圖。於該圖中,表示了藉由高頻特性檢查裝置1之控制PC50自基板PB之上表面側(主面F1側)進行基板PB之高頻特性檢查的動作。Next, referring to FIG. 5 , a variation example of the operation of the high-frequency characteristic inspection device 1 of the present embodiment in the case where the high-frequency characteristics are inspected only on the upper surface side of the substrate PB will be described. FIG. 5 is a flow chart showing another example of the operation of the high-frequency characteristic inspection device 1 of this embodiment. In this figure, the operation|movement which performs the high-frequency characteristic inspection of the board|substrate PB from the upper surface side (principal surface F1 side) of the board|substrate PB by the control PC50 of the high-frequency characteristic inspection apparatus 1 is shown.
於圖5中,因步驟S201之處理與上述圖4所示之步驟S101之處理相同,故此處省略其說明。In FIG. 5, since the processing of step S201 is the same as the processing of step S101 shown in FIG. 4, the description thereof is omitted here.
於步驟S202中,控制PC50藉由上表面相機31開始拍攝基板PB之上表面。控制PC50使上表面相機31之拍攝動作開始,從而定期地獲取所拍攝之基板PB之上表面側(主面F1側)之基板圖案之圖像。In step S202 , the
其次,控制PC50基於上表面相機31之拍攝圖像,使基板保持器40於X軸方向、Y軸方向、及θ方向上移動,從而決定上表面檢查治具21之檢查位置(步驟S203)。控制PC50基於上表面相機31所拍攝之基板圖案之圖像,控制基板保持器驅動部43,從而決定上表面檢查治具21之檢查位置。Next, the
其次,控制PC50使上表面檢查治具21於Z軸方向上移動,從而使上表面檢查治具21之檢查探針11接觸基板PB(步驟S204)。控制PC50控制上表面檢查治具驅動部41,使上表面檢查治具21向Z軸方向之下方向移動,從而使上表面檢查治具21之檢查探針11接觸基板PB。Next, the
其次,控制PC50藉由網路分析儀2檢查基板PB之高頻特性(步驟S205)。Next, the
其次,控制PC50使上表面檢查治具21於Z軸方向上移動,從而解除檢查探針10之接觸(步驟S206)。控制PC50控制上表面檢查治具驅動部41,使上表面檢查治具21向Z軸方向之上方向移動,從而解除上表面檢查治具21之檢查探針11之接觸(電性連接)。Next, the
繼而,步驟S207至步驟S209之處理由於與上述圖4所示之步驟S109至步驟S111之處理相同,故此處省略其說明。再者,於步驟S207中,控制PC50於存在下一個檢查位置之情形(步驟S207:是)時,使處理進展至步驟S203,並重複步驟S203至步驟S207之處理。又,於步驟S208中,控制PC50於基板片材ST所具有之複數個基板PB中存在下一個要檢查之基板PB之情形(步驟S208:是)時,使處理進展至步驟S209。又,於步驟S209之處理後,控制PC50使處理進展至步驟S202,於移動後之下一個要檢查之基板PB重複步驟S202至步驟S208之處理。Next, since the processing from step S207 to step S209 is the same as the processing from step S109 to step S111 shown in FIG. 4 above, description thereof will be omitted here. Furthermore, in step S207, when the next inspection position exists (step S207: YES), control PC50 advances a process to step S203, and repeats the process of step S203 to step S207. Moreover, in step S208, when the board|substrate PB to be inspected next exists among the some board|substrate PB which board|substrate sheet ST has (step S208: Yes), control PC50 advances a process to step S209. Also, after the processing of step S209, the
如以上所說明般,本實施形態之高頻特性檢查裝置1係檢查基板PB之高頻特性之高頻特性檢查裝置,且具備檢查治具20、相機30(攝像部)、基板保持器40、及控制PC50(控制部)。檢查治具20具有用以自基板PB之主面側檢查基板PB之複數個檢查探針10,能夠於檢查纜線(CB1、CB2)之姿勢變化不會對高頻特性之檢查賦予影響之範圍內移動。相機30拍攝基板PB之主面側(例如主面F1側)。基板保持器40保持基板PB,並至少能夠相對於基板PB之主面平行地(例如沿X軸方向、Y軸方向、θ方向)移動。控制PC50基於相機30所拍攝之圖像,至少使基板保持器40移動,而使檢查探針10接觸基板PB。控制PC50使基板保持器40相對於基板PB之主面平行地移動,於進行基板PB相對於檢查治具20之定位後,使檢查治具20與基板保持器40相對地於主面之垂直方向(例如Z軸方向)移動,而使檢查探針10接觸基板PB。As described above, the high-frequency characteristic inspection device 1 of this embodiment is a high-frequency characteristic inspection device for inspecting the high-frequency characteristics of the substrate PB, and includes an
藉此,本實施形態之高頻特性檢查裝置1使基板保持器40與主面平行地移動而進行基板PB之定位,使檢查治具20於垂直方向移動而使檢查探針10接觸基板PB,因此,能夠於檢查高頻特性時減少檢查纜線(CB1、CB2)之姿勢變化。因此,本實施形態之高頻特性檢查裝置1能夠以檢查纜線(CB1、CB2)之姿勢變化不賦予影響之方式將檢查探針10自動地連接於基板PB,而能夠適當地檢查高頻特性。Thereby, the high-frequency characteristic inspection apparatus 1 of the present embodiment moves the
再者,於高頻特性之檢查中,存在若檢查纜線之姿勢變化等測定環境變化、則高頻特性之測定結果有所變化之情形。因此,於高頻特性之檢查中,較理想為盡量不使檢查纜線(CB1、CB2)之姿勢變化等測定環境變化。本實施形態之高頻特性檢查裝置1能夠減少檢查纜線(CB1、CB2)之姿勢變化,因此能夠確保高頻特性之測定結果之再現性,並能夠適當地檢查高頻特性。Furthermore, in the inspection of high-frequency characteristics, if the measurement environment changes, such as a change in the posture of the inspection cable, the measurement results of high-frequency characteristics may change. Therefore, in the inspection of high-frequency characteristics, it is desirable to minimize changes in the measurement environment such as changes in the posture of the inspection cables (CB1, CB2). The high-frequency characteristic inspection device 1 of this embodiment can reduce the posture change of the inspection cables (CB1, CB2), so that the reproducibility of the measurement results of the high-frequency characteristics can be ensured, and the high-frequency characteristics can be appropriately inspected.
又,於本實施形態中,檢查治具20包含配置於基板PB之第1主面側(主面F1側)之第1檢查治具(上表面檢查治具21)、及配置於與第1主面側(主面F1側)相反側之第2主面側(主面F2側)之第2檢查治具(下表面檢查治具22)。相機30包含拍攝第1主面側(主面F1側)之基板圖案之第1攝像部(上表面相機31)、及拍攝主面F2側(第2主面側)之基板圖案之第2攝像部(下表面相機32)。控制PC50基於第1攝像部(上表面相機31)及第2攝像部(下表面相機32)所拍攝之基板圖案,使基板保持器40與主面平行地移動,而進行基板PB相對於檢查治具20之定位。控制PC50使第1檢查治具(上表面檢查治具21)及第2檢查治具(下表面檢查治具22)與基板保持器40相對地於垂直方向移動,而使複數個檢查探針10接觸基板PB。此處,第1主面為基板PB之上側之主面F1,第2主面為基板PB之下側之主面F2。Also, in this embodiment, the
藉此,本實施形態之高頻特性檢查裝置1能夠自第1主面側(主面F1側)與第2主面側(主面F2側)兩者之面適當地檢查高頻特性,而能夠對電路圖案不同之各種基板PB適當地檢查高頻特性。Thus, the high-frequency characteristic inspection device 1 of the present embodiment can appropriately inspect the high-frequency characteristics from both the first main surface side (main surface F1 side) and the second main surface side (main surface F2 side), and High-frequency characteristics can be appropriately inspected for various substrates PB having different circuit patterns.
又,於本實施形態中,下表面檢查治具22能夠平行於主面F2(例如沿X軸方向、Y軸方向、及θ方向)移動。控制PC50基於下表面相機32所拍攝之基板圖案,使下表面檢查治具22平行於主面F2(例如沿X軸方向、Y軸方向、及θ方向)移動,從而進行下表面檢查治具22相對於基板PB之定位。控制PC50使基板保持器40於垂直方向(例如Z軸方向)上移動,從而使下表面檢查治具22之複數個檢查探針10接觸基板PB。控制PC50使上表面檢查治具21於垂直方向(例如Z軸方向)上移動,從而使上表面檢查治具21之複數個檢查探針10接觸基板PB。In addition, in the present embodiment, the lower
藉此,本實施形態之高頻特性檢查裝置1藉由使下表面檢查治具22平行於主面F2(例如沿X軸方向、Y軸方向、及θ方向)移動,能夠提高下表面檢查治具22相對於基板PB之定位之精度。又,本實施形態之高頻特性檢查裝置1例如亦能夠於使上表面檢查治具21除了能夠於主面之垂直方向上移動以外亦能夠平行於主面移動,並使下表面檢查治具22固定之情形時進行檢查,但於此情形時上表面檢查治具21之移動方向變多,故而檢查纜線CB1之姿勢變化亦增大。因此,如本實施形態般使下表面檢查治具22代替上表面檢查治具21分擔平行於主面之方向之移動,藉此即便於存在上下表面之檢查治具20之情形時,亦能夠適當地減少檢查纜線(CB1、CB2)之姿勢變化。Thus, the high-frequency characteristic inspection device 1 of the present embodiment can improve the bottom surface inspection process by moving the bottom
又,於本實施形態中,上表面檢查治具21之垂直方向上之移動量為50 mm以下。又,下表面檢查治具22之平行之方向上之移動量為5 mm以下,平行於基板PB之主面之面上之角度方向之移動量為3°以下。 藉此,本實施形態之高頻特性檢查裝置1即便於存在上下表面之檢查治具20之情形時,亦能夠適當地減少檢查纜線(CB1、CB2)之姿勢變化。In addition, in this embodiment, the movement amount in the vertical direction of the upper
又,於本實施形態中,複數個檢查探針10藉由檢查纜線(CB1、CB2)與檢查基板PB之高頻特性之網路分析儀2連接,檢查纜線(CB1、CB2)為同軸纜線。 藉此,本實施形態之高頻特性檢查裝置1能夠藉由同軸纜線之屏蔽效應進一步適當地檢查高頻特性。Also, in this embodiment, a plurality of inspection probes 10 are connected to the
又,本實施形態之高頻特性檢查方法係檢查基板PB之高頻特性之高頻特性檢查裝置1之高頻特性檢查方法,控制PC50於使基板保持器40相對於基板PB之主面平行地移動,從而進行了基板PB相對於檢查治具20之定位後,使檢查治具20與基板保持器40相對地於主面之垂直方向上移動,從而使檢查探針10接觸基板PB。 藉此,本實施形態之高頻特性檢查方法可發揮與上述高頻特性檢查裝置1相同之效果,能夠使檢查探針10自動地連接於基板PB,並適當地檢查高頻特性。Also, the high-frequency characteristic inspection method of this embodiment is a high-frequency characteristic inspection method of the high-frequency characteristic inspection device 1 for inspecting the high-frequency characteristics of the substrate PB, and the
再者,本發明並不限定於上述實施形態,可於不脫離本發明之主旨之範圍內進行變更。In addition, this invention is not limited to the said embodiment, It can change in the range which does not deviate from the summary of this invention.
例如,於上述實施形態中,對使用網路分析儀2作為檢查基板PB之高頻特性之分析裝置之一例之例進行了說明,但並不限定於此,只要為檢查高頻特性之分析裝置,則亦可為其他裝置。 又,於上述實施形態中,對將外接之網路分析儀2連接於高頻特性檢查裝置1之例進行了說明,但高頻特性檢查裝置1亦可具備網路分析儀2之功能。For example, in the above-mentioned embodiment, an example of using the
又,於上述實施形態中,對第1主面為基板PB之上側之主面F1,第2主面為基板PB之下側之主面F2之例進行了說明,但並不限定於此。例如,第2主面亦可為基板PB之上側之主面F1,第1主面亦可為基板PB之下側之主面F2。In addition, in the above-mentioned embodiment, an example was described in which the first main surface is the main surface F1 on the upper side of the substrate PB, and the second main surface is the main surface F2 on the lower side of the substrate PB, but the present invention is not limited thereto. For example, the second main surface may be the main surface F1 on the upper side of the substrate PB, and the first main surface may be the main surface F2 on the lower side of the substrate PB.
於此情形時,上表面檢查治具21能夠平行於主面F1(例如沿X軸方向、Y軸方向、及θ方向)移動,控制PC50可基於上表面相機31所拍攝之基板圖案,使上表面檢查治具21平行於主面F1(例如沿X軸方向、Y軸方向、及θ方向)移動,從而進行上表面檢查治具21相對於基板PB之定位。又,控制PC50亦可使基板保持器40於垂直方向(例如Z軸方向)上移動,從而使上表面檢查治具21之複數個檢查探針10接觸基板PB,並使下表面檢查治具22於垂直方向(例如Z軸方向)上移動,從而使下表面檢查治具22之複數個檢查探針10接觸基板PB。In this case, the upper
又,於上述實施形態中,對具備控制PC50作為控制部之一例之例進行了說明,但並不限定於此,例如,亦可為組入式控制單元或控制板等。又,高頻特性檢查裝置1亦可不含控制PC50,而是於外部配備。Moreover, in the said embodiment, although the example which provided control PC50 as an example of a control part was demonstrated, it is not limited to this, For example, a built-in type control unit, a control panel, etc. may be sufficient. In addition, the high-frequency characteristic inspection device 1 may not include the
又,於上述實施形態中,對高頻特性檢查裝置1具備上表面檢查治具21及上表面相機31、以及下表面檢查治具22及下表面相機32之兩者之例進行了說明,但並不限定於此,亦可具備任一者。In addition, in the above-mentioned embodiment, the example in which the high-frequency characteristic inspection device 1 is provided with both the upper
又,於上述實施形態中,對基板保持器40保持具有複數個基板PB之片狀基板片材ST之例進行了說明,但並不限定於此,亦可保持單片之基板PB。又,基板保持器40亦可保持成為捲筒狀態之基板片材ST。In addition, in the above-mentioned embodiment, the example in which the
再者,上述高頻特性檢查裝置1所具備之各構成於內部具有電腦系統。並且,亦可將用以實現上述高頻特性檢查裝置1所具備之各構成之功能之程式記錄於電腦可讀取之記錄媒體,使電腦系統讀入並執行該記錄媒體中所記錄之程式,藉此進行上述高頻特性檢查裝置1所具備之各構成中之處理。此處,所謂「使電腦系統讀入並執行記錄媒體中所記錄之程式」,包括將程式安裝於電腦系統。此處所述之「電腦系統」,包含OS(Operating System,操作系統)或周邊設備等硬體。 又,「電腦系統」亦可包括經由包含網際網路或WAN(Wide Area Network,廣域網路)、LAN(Local Area Network,區域網路)、專用線路等通訊線路之網路連接之複數個電腦裝置。又,所謂「電腦可讀取之記錄媒體」係指軟碟、光磁碟、ROM(Read Only Memory,唯讀記憶體)、CD-ROM(Compact Disc-Read Only Memory,唯讀光碟)等可攜式媒體、內置於電腦系統之硬碟等記憶裝置。如此,記憶有程式之記錄媒體亦可為CD-ROM等非暫態之記錄媒體。In addition, each structure included in the high-frequency characteristic inspection apparatus 1 mentioned above has a computer system inside. In addition, the program for realizing the functions of the components of the above-mentioned high-frequency characteristic inspection device 1 may be recorded in a computer-readable recording medium, so that the computer system can read and execute the program recorded in the recording medium, Thereby, the processing in each structure included in the above-mentioned high-frequency characteristic inspection device 1 is performed. Here, "causing the computer system to read and execute the program recorded in the recording medium" includes installing the program in the computer system. The "computer system" mentioned here includes OS (Operating System, operating system) and hardware such as peripheral devices. In addition, a "computer system" may also include multiple computer devices connected via a network including the Internet, WAN (Wide Area Network, wide area network), LAN (Local Area Network, local area network), dedicated lines, etc. . Also, the so-called "computer-readable recording medium" refers to floppy disks, optical disks, ROM (Read Only Memory, read-only memory), CD-ROM (Compact Disc-Read Only Memory, CD-ROM), etc. Memory devices such as portable media and hard drives built into computer systems. In this way, the program-memorized recording medium may also be a non-transitory recording medium such as CD-ROM.
又,為了傳送該程式,記錄媒體中亦包含能夠自傳送伺服器進行存取且設置於內部或外部之記錄媒體。再者,將程式分割成複數個,並分別於不同之時點下載後於高頻特性檢查裝置1所具備之各構成中進行合體之構成、或傳送各個經分割之程式之傳送伺服器亦可不同。進而,所謂「電腦可讀取之記錄媒體」,亦包含如經由網路發送程式之情形時之伺服器或成為用戶端之電腦系統內部之揮發性記憶體(RAM)般將程式保持一定時間者。又,上述程式亦可為用以實現上述功能之一部分者。進而,亦可為能夠藉由與已記錄於電腦系統中之程式之組合實現上述功能者、即所謂差異檔案(差分程式)。Moreover, in order to distribute this program, the recording medium which can be accessed from a distribution server and which is installed internally or externally is also included in the recording medium. In addition, the configuration of dividing the program into a plurality of components and downloading them at different points in time and combining them with the components of the high-frequency characteristic inspection device 1, or the delivery server for transmitting each divided program may also be different. . Furthermore, the so-called "computer-readable recording medium" also includes those that retain the program for a certain period of time, such as the server in the case of sending the program through the network, or the volatile memory (RAM) inside the computer system that becomes the client. . In addition, the above-mentioned program may also be used to realize part of the above-mentioned functions. Furthermore, it may be a so-called difference file (difference program) which can realize the above-mentioned function by combining with a program already recorded in the computer system.
又,亦可以LSI(Large Scale Integration,大型積體電路)等積體電路之形式實現上述功能之一部分或全部。上述各功能可單獨地處理器化,亦可集成一部分或全部而處理器化。又,積體電路化之方法並不限定於LSI,亦可藉由專用電路、或通用處理器實現。又,於因半導體技術之進步而出現了替代LSI之積體電路化之技術之情形時,亦可使用藉由該技術所製成之積體電路。In addition, a part or all of the above-mentioned functions may also be implemented in the form of an integrated circuit such as LSI (Large Scale Integration, large scale integrated circuit). Each of the above-mentioned functions may be processed individually, or a part or all of them may be integrated and processed. In addition, the method of forming an integrated circuit is not limited to LSI, and it can also be realized by a dedicated circuit or a general-purpose processor. Also, when an integrated circuit technology that replaces LSI appears due to progress in semiconductor technology, an integrated circuit produced by this technology can also be used.
1:高頻特性檢查裝置2:網路分析儀10,11,12:檢查探針20:檢查治具21:上表面檢查治具22:下表面檢查治具30:相機31:上表面相機32:下表面相機40:基板保持器41:上表面檢查治具驅動部42:下表面檢查治具驅動部43:基板保持器驅動部50:控制PCCB1,CB2:檢查纜線F1:主面F2:主面PB:基板ST:基板片材1: High-frequency characteristic inspection device 2:
圖1係表示本實施形態之高頻特性檢查裝置之構成例之圖。 圖2係表示本實施形態之高頻特性檢查裝置之一例之功能方塊圖。 圖3係對本實施形態之檢查治具及基板保持器之移動動作之一例進行說明之圖。 圖4係表示本實施形態之高頻特性檢查裝置之動作之一例的流程圖。 圖5係表示本實施形態之高頻特性檢查裝置之動作之另一例的流程圖。FIG. 1 is a diagram showing a configuration example of a high-frequency characteristic inspection device according to this embodiment. Fig. 2 is a functional block diagram showing an example of the high-frequency characteristic inspection device of this embodiment. Fig. 3 is a diagram for explaining an example of the moving operation of the inspection jig and the substrate holder of the present embodiment. Fig. 4 is a flowchart showing an example of the operation of the high-frequency characteristic inspection device of this embodiment. Fig. 5 is a flow chart showing another example of the operation of the high-frequency characteristic inspection device of this embodiment.
1:高頻特性檢查裝置 1: High-frequency characteristic inspection device
2:網路分析儀 2: Network Analyzer
10,11,12:檢查探針 10,11,12: Check the probes
20:檢查治具 20: Check the jig
21:上表面檢查治具 21: Upper surface inspection fixture
22:下表面檢查治具 22: Bottom surface inspection fixture
30:相機 30: camera
31:上表面相機 31: Upper surface camera
32:下表面相機 32: Lower surface camera
40:基板保持器 40: Substrate holder
50:控制PC 50:Control PC
CB1,CB2:檢查纜線 CB1, CB2: Check the cables
F1:主面 F1: main surface
F2:主面 F2: main surface
PB:基板 PB: Substrate
ST:基板片材 ST: substrate sheet
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JP7303543B2 (en) | 2023-07-05 |
TW202109068A (en) | 2021-03-01 |
KR102545501B1 (en) | 2023-06-21 |
JP2021038926A (en) | 2021-03-11 |
CN112444728A (en) | 2021-03-05 |
KR20210027096A (en) | 2021-03-10 |
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