TWI781528B - Wiring board and method of manufacturing the same - Google Patents

Wiring board and method of manufacturing the same Download PDF

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TWI781528B
TWI781528B TW110103860A TW110103860A TWI781528B TW I781528 B TWI781528 B TW I781528B TW 110103860 A TW110103860 A TW 110103860A TW 110103860 A TW110103860 A TW 110103860A TW I781528 B TWI781528 B TW I781528B
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sintered body
resin
substrate
resin substrate
metal
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TW202232516A (en
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小池淳一
知海 黃
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日商材料概念股份有限公司
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Abstract

本發明提供一種新穎配線基板,其兼具由樹脂基板帶來之柔軟性及由金屬配線帶來之高導電性,且金屬配線與絕緣性樹脂基板之間之密接性較高,並且本發明提供一種於不使用光微影步驟之情況下製造此種配線基板之方法。 本發明之配線基板係具有樹脂基板及金屬配線者,且上述金屬配線包含金屬粒子之燒結體,上述燒結體具有複數個空隙,上述空隙具備朝向上述樹脂基板之開口部,上述樹脂基板之一部分自上述開口部進入至上述空隙中。 The present invention provides a novel wiring substrate, which has both the flexibility brought by the resin substrate and the high conductivity brought by the metal wiring, and the adhesion between the metal wiring and the insulating resin substrate is high, and the present invention provides A method of manufacturing such a wiring board without using a photolithography step. The wiring board of the present invention has a resin substrate and metal wiring, and the metal wiring includes a sintered body of metal particles, the sintered body has a plurality of voids, the voids have openings facing the resin substrate, and a part of the resin substrate is formed from The opening part enters into the gap.

Description

配線基板及其製造方法Wiring substrate and manufacturing method thereof

本發明係關於一種配線基板及其製造方法。The present invention relates to a wiring substrate and its manufacturing method.

撓性配線基板係將具有可撓性之有機物絕緣膜製成基板者,係於該絕緣膜上形成有金屬配線者。A flexible wiring board is a substrate made of a flexible organic insulating film, and metal wiring is formed on the insulating film.

作為於基板上形成金屬配線之方法,可例舉:減成法、半加成法及加成法此3種。As a method of forming metal wiring on a board|substrate, three types, the subtractive method, the semi-additive method, and the additive method, are mentioned.

具體而言,於減成法中,將金屬箔貼於基板,藉由光微影步驟形成配線。又,於半加成法中,將成為晶種層之薄膜藉由濺鍍法等附著於基板上後,進行電鍍而形成配線(例如,參照專利文獻1、2)。然而,由於減成法及半加成法均需要光微影步驟,故而步驟數較多。除此以外,需要廢液處理等,成本較高且對環境之負擔較大。Specifically, in the subtractive method, a metal foil is attached to a substrate, and wiring is formed through a photolithography step. Also, in the semi-additive method, a thin film serving as a seed layer is deposited on a substrate by sputtering or the like, and then electroplated to form wiring (for example, refer to Patent Documents 1 and 2). However, since both the subtractive method and the semi-additive method require photolithography steps, the number of steps is relatively large. In addition, waste liquid treatment and the like are required, and the cost is high and the burden on the environment is large.

另一方面,加成法係藉由噴墨或網版印刷於基板上直接刻寫金屬配線而形成金屬配線之方法,具有不需要光微影步驟之優點。然而,若僅於基板上直接形成金屬配線,則由於金屬配線與基板之密接強度較弱,從而存在金屬配線容易剝離之問題。因此,為了提高金屬配線與基板之密接強度,已知有如下方法,即,於基板上預先形成Ni-Cr合金薄膜作為密接層,其後形成金屬配線(例如,參照非專利文獻1)。然而,於此種方法中,為了將作為密接層之Ni-Cr合金薄膜蝕刻成為配線形狀,需要光微影步驟。因此,於形成密接層之方法中,亦與減成法及半加成法相同地存在如下課題:步驟數較多,且需要廢液處理,因此成本較高且環境負擔較大。 [先前技術文獻] [專利文獻] On the other hand, the additive method is a method of forming metal wirings by directly writing metal wirings on the substrate by inkjet or screen printing, which has the advantage of not requiring photolithography steps. However, if the metal wiring is only directly formed on the substrate, there is a problem that the metal wiring is easy to peel off because the adhesion strength between the metal wiring and the substrate is weak. Therefore, in order to increase the adhesion strength between metal wiring and the substrate, a method is known in which a Ni-Cr alloy thin film is previously formed on the substrate as an adhesion layer, and then the metal wiring is formed (see, for example, Non-Patent Document 1). However, in this method, a photolithography step is required in order to etch the Ni-Cr alloy thin film as the adhesion layer into the wiring shape. Therefore, in the method of forming the adhesive layer, there are the same problems as the subtractive method and the semi-additive method: the number of steps is large, and waste liquid treatment is required, so the cost is high and the environmental burden is large. [Prior Art Literature] [Patent Document]

[專利文獻1]日本專利特開昭62-72200號公報 [專利文獻2]日本專利特開平5-136547號公報 [非專利文獻] [Patent Document 1] Japanese Patent Laid-Open No. 62-72200 [Patent Document 2] Japanese Patent Laid-Open No. 5-136547 [Non-patent literature]

[非專利文獻1]Y.Cao,J.Tian,and X.Hu,This Solid Films,Vol.365(1),pp.49-52(2000)[Non-Patent Document 1] Y.Cao, J.Tian, and X.Hu, This Solid Films, Vol.365(1), pp.49-52(2000)

[發明所欲解決之問題][Problem to be solved by the invention]

本發明係鑒於如上所示之實際情況而成者,其目的在於提供一種配線基板,其兼具由樹脂基板帶來之柔軟性及由金屬配線帶來之高導電性,且金屬配線與絕緣性樹脂基板之間之密接性較高,並且提供一種於不使用光微影步驟之情況下製造此種配線基板之方法。 [解決問題之技術手段] The present invention is made in view of the above-mentioned actual situation, and its object is to provide a wiring board that has both the flexibility brought by the resin substrate and the high conductivity brought by the metal wiring, and the metal wiring and the insulation The adhesiveness between resin substrates is high, and a method of manufacturing such a wiring substrate without using photolithography steps is provided. [Technical means to solve the problem]

本發明人等為了解決上述課題,反覆銳意研究。其結果發現:藉由具備如下構造可獲得具有目標功能之配線基板,上述構造係於具備樹脂基板及金屬粒子燒結體之配線基板中,燒結體具有複數個空隙,樹脂基板之一部分自該空隙之開口部進入;並且發現此種配線基板可藉由形成金屬粒子之燒結體與樹脂基板而製造;從而完成本發明。具體而言,本發明提供以下之實施方式。The inventors of the present invention have intensively studied in order to solve the above-mentioned problems. As a result, it was found that a wiring board having the intended function can be obtained by having a structure in which, in a wiring board comprising a resin substrate and a sintered body of metal particles, the sintered body has a plurality of voids, and a part of the resin substrate emerges from the voids. and found that such a wiring board can be manufactured by forming a sintered body of metal particles and a resin substrate; thereby completing the present invention. Specifically, the present invention provides the following embodiments.

(1)一種配線基板,其係具有樹脂基板及金屬配線者,且 上述金屬配線包含金屬粒子之燒結體,上述燒結體具有複數個空隙,上述空隙具備朝向上述樹脂基板之開口部,上述樹脂基板之一部分自上述開口部進入至上述空隙中。 (1) A wiring board having a resin substrate and metal wiring, and The metal wiring includes a sintered body of metal particles, the sintered body has a plurality of voids, the voids have openings facing the resin substrate, and a part of the resin substrate enters the voids through the openings.

(2)如上述(1)所記載之配線基板,其中上述金屬粒子包含選自由銅、銀及鎳所組成之群中之1種以上。(2) The wiring board as described in said (1) whose said metal particle contains 1 or more types selected from the group which consists of copper, silver, and nickel.

(3)如上述(1)或(2)所記載之配線基板,其中上述空隙之比率為1體積%以上30體積%以下。(3) The wiring board as described in said (1) or (2) whose ratio of the said void is 1 volume % or more and 30 volume % or less.

(4)如上述(1)至(3)中任一項所記載之配線基板,其中上述空隙之一部分連結,自上述開口部進入之上述樹脂基板之一部分連結。(4) The wiring board described in any one of (1) to (3) above, wherein a part of the void is connected to a part of the resin substrate entering from the opening.

(5)如上述(1)至(4)中任一項所記載之配線基板,其中於上述燒結體中,在位於與上述樹脂基板相接之交界面為相反側的表面形成有樹脂表面層。(5) The wiring board described in any one of the above (1) to (4), wherein in the above-mentioned sintered body, a resin surface layer is formed on the surface opposite to the interface with the above-mentioned resin substrate. .

(6)一種配線基板之製造方法,其係製造具有樹脂基板及包含金屬粒子燒結體之金屬配線的配線基板之方法,其包括:燒結體形成步驟,係於燒結用構件上形成上述燒結體;塗佈步驟,係於上述燒結用構件上,於上述燒結體之表面及上述燒結體之周圍塗佈包含樹脂成分之溶液;硬化步驟,係使上述樹脂成分硬化而形成樹脂基板;及剝離步驟,係自上述燒結用構件剝離上述燒結體及上述樹脂基板。(6) A method of manufacturing a wiring board, which is a method of manufacturing a wiring board having a resin substrate and metal wiring including a sintered body of metal particles, comprising: a sintered body forming step of forming the above-mentioned sintered body on a member for sintering; The coating step is to apply a solution containing a resin component on the surface of the above-mentioned sintered body and the periphery of the above-mentioned sintered body on the above-mentioned sintering member; the curing step is to harden the above-mentioned resin component to form a resin substrate; and the peeling step, The above-mentioned sintered body and the above-mentioned resin substrate are separated from the above-mentioned member for sintering.

(7)如上述(6)所記載之配線基板之製造方法,其中上述溶液包含樹脂之前驅物物質或樹脂之聚合性單體。(7) The method for producing a wiring board as described in (6) above, wherein the solution contains a resin precursor material or a polymerizable monomer of the resin.

(8)一種配線基板之製造方法,其係製造具有樹脂基板及包含金屬粒子燒結體之金屬配線的配線基板之方法,其包括:準備樹脂基板之步驟;及燒結體形成步驟,係於上述樹脂基板上形成上述燒結體。(8) A method of manufacturing a wiring board, which is a method of manufacturing a wiring board having a resin substrate and metal wiring including a sintered body of metal particles, comprising: a step of preparing a resin substrate; and a step of forming a sintered body, bonded to the above resin The above-mentioned sintered body is formed on the substrate.

(9)如上述(8)所記載之配線基板之製造方法,其包括於上述樹脂基板上塗佈包含樹脂成分之溶液,使上述樹脂成分硬化而形成界面樹脂層之步驟;且上述燒結體形成步驟包括於上述界面樹脂層上形成上述燒結體。(9) The method of manufacturing a wiring board as described in the above (8), which includes the steps of applying a solution containing a resin component on the above-mentioned resin substrate, and curing the above-mentioned resin component to form an interface resin layer; and the above-mentioned sintered body is formed The step includes forming the above-mentioned sintered body on the above-mentioned interface resin layer.

(10)如(9)所記載之配線基板之製造方法,其中上述溶液包含樹脂之前驅物物質或樹脂之聚合性單體。 [發明之效果] (10) The method for producing a wiring board according to (9), wherein the solution contains a resin precursor material or a polymerizable monomer of the resin. [Effect of Invention]

根據本發明,可提供一種配線基板,其兼具由樹脂基板帶來之柔軟性及由金屬配線帶來之高導電性,且提高了金屬配線與絕緣性樹脂基板之間之密接性。又,根據本發明之配線基板之製造方法,可於不使用光微影步驟之情況下製造此種配線基板。According to the present invention, it is possible to provide a wiring board having both the flexibility provided by the resin substrate and the high conductivity provided by the metal wiring, and the adhesion between the metal wiring and the insulating resin substrate is improved. Also, according to the method of manufacturing a wiring board of the present invention, such a wiring board can be manufactured without using a photolithography step.

以下,針對本發明之具體實施方式,詳細地進行說明。本發明並不以下之實施方式任何限定,可於本發明之目的之範圍內加以適當變更而實施。Hereinafter, specific embodiments of the present invention will be described in detail. The present invention is not limited by the following embodiments, and can be implemented with appropriate changes within the scope of the purpose of the present invention.

1.配線基板 以下,針對本實施方式之配線基板,使用圖1詳細地進行說明。圖1係本實施方式之配線基板中具備燒結體之部分之縱截面圖。 1. Wiring substrate Hereinafter, the wiring board of this embodiment is demonstrated in detail using FIG. 1. FIG. FIG. 1 is a vertical cross-sectional view of a portion including a sintered body in a wiring board according to the present embodiment.

本實施方式之配線基板1係具有樹脂基板2及金屬配線者,且上述金屬配線包含金屬粒子之燒結體3。並且,燒結體3具有複數個空隙4a、4b、4c、4d。於本說明書中,亦存在將空隙4a、4b、4c、4d彙總記載為空隙4之情形。空隙4於其至少一部分具備朝向樹脂基板2之開口部41a、41b、41c、41d,樹脂基板2之一部分21a、21b、21c自開口部41a、41b、41c進入至空隙4中。如圖1所示,樹脂基板之一部分21a、21b、21c彎曲地進入至空隙4a、4b、4c中。藉由具有此種形態而增加絕緣性樹脂基板與燒結體之接觸部。進而,於燒結體與樹脂基板剝離之情形時,需要使進入至空隙內之樹脂變形,因此可抑制燒結體與樹脂基板之剝離。因此,藉由具備本實施方式之構造,可提高燒結體與樹脂基板之間之密接性。The wiring board 1 of the present embodiment has a resin substrate 2 and metal wiring, and the metal wiring includes a sintered body 3 of metal particles. In addition, the sintered body 3 has a plurality of voids 4a, 4b, 4c, and 4d. In this specification, the voids 4a, 4b, 4c, and 4d may be collectively described as voids 4 in some cases. At least a part of the cavity 4 has openings 41a, 41b, 41c, 41d facing the resin substrate 2, and a part 21a, 21b, 21c of the resin substrate 2 enters the cavity 4 through the openings 41a, 41b, 41c. As shown in FIG. 1, one part 21a, 21b, 21c of the resin substrate bends into the gap 4a, 4b, 4c. By having such a form, the number of contact portions between the insulating resin substrate and the sintered body is increased. Furthermore, when the sintered body and the resin substrate are peeled off, it is necessary to deform the resin entering the void, so that the peeling of the sintered body and the resin substrate can be suppressed. Therefore, by providing the structure of this embodiment, the adhesiveness between a sintered body and a resin substrate can be improved.

又,自開口部41a、41b進入之樹脂基板2之一部分21a、21b較佳為其兩者彼此於空隙4中連結。藉由具備此種連結構造而增加燒結體與樹脂基板之接觸部分。進而,於燒結體與樹脂基板剝離之情形時,需要切斷空隙中相連結之樹脂基板,因此可抑制燒結體與樹脂基板之剝離。因此,藉由具備本實施方式之構造,可提高燒結體與樹脂基板之間之密接性。In addition, it is preferable that the parts 21a, 21b of the resin substrate 2 that enter from the openings 41a, 41b are connected to each other in the gap 4 . By having such a connection structure, the contact portion between the sintered body and the resin substrate is increased. Furthermore, when the sintered body and the resin substrate are separated, it is necessary to cut the resin substrate connected in the gap, so that the separation of the sintered body and the resin substrate can be suppressed. Therefore, by providing the structure of this embodiment, the adhesiveness between a sintered body and a resin substrate can be improved.

本實施方式之配線基板亦包括於樹脂基板與燒結體之間介置有界面樹脂層之形態。The wiring board of this embodiment also includes the form in which the interface resin layer was interposed between the resin substrate and the sintered body.

[空隙率] 又,燒結體之空隙之比率較佳為合計1體積%以上30體積%以下。於本說明書中,將該空隙之比率稱為「空隙率」。藉由使空隙率為1體積%以上,而具有可使樹脂基板之一部分進入至空隙中之開口部。,具備朝向樹脂基板之開口部之空隙之比率增加,樹脂基板之一部分變得容易進入至空隙中,其結果,可提高樹脂基板與燒結體之間之密接性。因此,空隙率較佳為1體積%以上,進而較佳為7體積%以上、10體積%以上。 [porosity] In addition, the ratio of voids in the sintered body is preferably from 1 volume % to 30 volume % in total. In this specification, the ratio of this void is called "porosity". By setting the porosity to 1% by volume or more, there is an opening that allows a part of the resin substrate to enter the void. The ratio of the voids having openings facing the resin substrate increases, and a part of the resin substrate easily enters the voids. As a result, the adhesiveness between the resin substrate and the sintered body can be improved. Therefore, the porosity is preferably at least 1% by volume, more preferably at least 7% by volume, and more than 10% by volume.

另一方面,若空隙率超過30體積%,則有燒結體斷裂之虞,有導致燒結體之導電性降低之虞。要想提高燒結體之抗斷裂性及導電性,空隙率較佳為30體積%以下,進而較佳為27體積%以下、25體積%以下。On the other hand, if the porosity exceeds 30% by volume, there is a possibility that the sintered body may be broken and the electrical conductivity of the sintered body may be lowered. In order to improve the fracture resistance and electrical conductivity of the sintered body, the porosity is preferably 30% by volume or less, more preferably 27% by volume or less, and 25% by volume or less.

本實施方式之空隙之比率即「空隙率」可如下所示地計算。即,藉由掃描式電子顯微鏡觀察燒結體之截面,獲得以該截面之外周為邊界之內部面積作為「總截面積」,且獲得分佈於該內部之空隙之面積作為「空隙面積」。然後,對10個截面的藉由以下所示之式(1)所得出之數值求平均值所得之數值為空隙率。 空隙率(%)=(空隙面積/總截面積)×100  ・・・式(1) The ratio of the voids in this embodiment, that is, the "void ratio" can be calculated as follows. That is, the cross-section of the sintered body was observed with a scanning electron microscope, the internal area bounded by the outer periphery of the cross-section was obtained as the "total cross-sectional area", and the area of voids distributed in the interior was obtained as the "void area". Then, the value obtained by averaging the values obtained by the formula (1) shown below for 10 cross-sections was the porosity. Porosity (%) = (void area/total cross-sectional area) × 100 ・・・Formula (1)

又,本實施方式之空隙率係於如下之條件下算出:於掃描式電子顯微鏡之觀察圖像中,選擇不包含燒結體端部(燒結體表面及與樹脂基板之界面)之區域,所選擇之區域之圖像面積為燒結體總截面積之1/3至2/3之範圍。In addition, the porosity of the present embodiment is calculated under the following conditions: In the observation image of the scanning electron microscope, a region not including the end of the sintered body (the surface of the sintered body and the interface with the resin substrate) is selected, and the selected The image area of the region is in the range of 1/3 to 2/3 of the total cross-sectional area of the sintered body.

[樹脂基板] 樹脂基板2係主要包含樹脂之基板,於該樹脂基板2上形成金屬粒子之燒結體3用以構成配線基板1。 [Resin substrate] The resin substrate 2 is a substrate mainly composed of resin, and the sintered body 3 of metal particles is formed on the resin substrate 2 to constitute the wiring substrate 1 .

構成樹脂基板之樹脂並無特別限定。可使用聚醯亞胺、液晶性聚合物、氟樹脂、聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等具有可撓性之樹脂。The resin constituting the resin substrate is not particularly limited. Flexible resins such as polyimide, liquid crystal polymer, fluororesin, polyethylene terephthalate, and polyethylene naphthalate can be used.

樹脂基板除了樹脂以外,可根據配線基板之用途而含有抗氧化劑、阻燃劑、包含無機物粒子之填料等。The resin substrate may contain an antioxidant, a flame retardant, a filler containing inorganic particles, etc., in addition to the resin, depending on the application of the wiring substrate.

樹脂基板之厚度並無特別限定。例如,若樹脂基板之厚度為5 μm以上,則可防止基板因彎曲或拉伸變形而斷裂。因此,較佳為5 μm以上,進而較佳為10 μm以上、或15 μm以上。另一方面,若樹脂基板之厚度過大,則由樹脂材料帶來之可撓性降低。因此,樹脂基板之厚度較佳為100 μm以下,進而較佳為75 μm以下、或50 μm以下。The thickness of the resin substrate is not particularly limited. For example, if the thickness of the resin substrate is 5 μm or more, the substrate can be prevented from breaking due to bending or tensile deformation. Therefore, it is preferably 5 μm or more, and more preferably 10 μm or more, or 15 μm or more. On the other hand, if the thickness of the resin substrate is too large, the flexibility provided by the resin material decreases. Therefore, the thickness of the resin substrate is preferably 100 μm or less, more preferably 75 μm or less, or 50 μm or less.

又,本實施方式之樹脂基板包括於與燒結體接觸之交界面設置有界面樹脂層之形態。Moreover, the resin substrate of this embodiment includes the form in which the interface resin layer was provided in the interface contacting with a sintered compact.

[燒結體] 本實施方式之配線基板中之燒結體包含金屬粒子,上述金屬粒子包含選自由銅、銀及鎳所組成之群中之1種以上,且上述燒結體於配線基板中發揮作為導電路徑之金屬配線的作用。 [sintered body] The sintered body in the wiring board of this embodiment contains metal particles, the metal particles include one or more selected from the group consisting of copper, silver, and nickel, and the sintered body functions as a metal wiring as a conductive path in the wiring board role.

藉由使用銅作為燒結體中之金屬粒子,能夠以較低成本提供顯示較低電阻之金屬配線。又,藉由使用銀作為該金屬粒子,即便於高溫燒結時,配線亦不會氧化。進而,藉由使用鎳作為該金屬粒子,能夠抑制高電流密度之負荷狀態下所發生之電遷移不良。By using copper as the metal particles in the sintered body, metal wiring showing lower resistance can be provided at lower cost. In addition, by using silver as the metal particles, the wiring is not oxidized even during high-temperature sintering. Furthermore, by using nickel as the metal particles, it is possible to suppress poor electromigration that occurs under a load state with a high current density.

金屬粒子亦可包含選自由銅、銀及鎳所組成之群中之複數種金屬粒子。於該情形時,燒結體之一部分或全部亦可合金化。The metal particles may also include a plurality of metal particles selected from the group consisting of copper, silver and nickel. In this case, part or all of the sintered body may be alloyed.

於在燒結體內部存在空隙之情形時,存在機械強度較低之部分。作為此種部分,例如可例舉:金屬粒子彼此燒結之部位被形成得較細的被稱為「頸部」之部位。藉由選擇具有可撓性之樹脂基板用於配線基板中,當在可用作撓性電路之此種用途中隨著變形而造成配線基板發生變形時,力集中於頸部而容易發生局部破壞。When there are voids inside the sintered body, there are parts with low mechanical strength. As such a portion, for example, a portion called a "neck" in which metal particles are sintered is formed thinner. By selecting a flexible resin substrate for the wiring substrate, when the wiring substrate is deformed along with the deformation in such an application that can be used as a flexible circuit, the force is concentrated on the neck and local damage is likely to occur .

因此,於燒結體具有多孔質構造之情形時,較佳為於多孔質構造之間隙包含具有導電性之金屬元素,尤佳為包含與構成燒結體之金屬元素相同之金屬元素之鍍覆。該金屬元素較佳為選自由銅、銀、錫、及鎳所組成之群中之1種以上。藉由此種金屬鍍覆之存在,可使於變形時集中於頸部之力分散,提高針對彎曲或伸縮等變形之耐久性。進而,由於藉由具有導電性之金屬元素填充空隙,故而燒結體之電阻率降低。Therefore, when the sintered body has a porous structure, it is preferable to include a conductive metal element in the gaps of the porous structure, and it is particularly preferable to include plating including the same metal element as the metal element constituting the sintered body. The metal element is preferably one or more selected from the group consisting of copper, silver, tin, and nickel. The existence of this metal plating can disperse the force concentrated on the neck during deformation, and improve the durability against deformation such as bending or stretching. Furthermore, since the voids are filled with a conductive metal element, the resistivity of the sintered body decreases.

再者,根據構成燒結體之金屬元素之種類、或放置配線基板之環境,燒結體中之金屬元素會不可避免地氧化。因此,在燒結體中,在保證導電性的前提下,亦可例如以原子數換算計最大20%以下之金屬原子發生氧化。又,燒結體亦可包含相對於燒結體(100質量%)為30質量%左右之除銅、銀、錫、及鎳以外之各種添加物或不可避免之雜質。不可避免之雜質中亦包括氧化物中之氧元素。Furthermore, depending on the kind of metal elements constituting the sintered body or the environment in which the wiring board is placed, the metal elements in the sintered body are inevitably oxidized. Therefore, in the sintered body, on the premise of ensuring the electrical conductivity, for example, a maximum of 20% or less of the metal atoms may be oxidized in terms of the number of atoms. In addition, the sintered body may contain various additives or unavoidable impurities other than copper, silver, tin, and nickel in an amount of about 30% by mass relative to the sintered body (100% by mass). Inevitable impurities also include oxygen in oxides.

[樹脂表面層] 本實施方式之配線基板較佳為於燒結體中,在位於與樹脂基板相接之交界面為相反側的表面包含樹脂表面層之形態。於本說明書中,將形成於燒結體表面的樹脂層稱為「樹脂表面層」。於燒結體中,以一定以上之空隙率分佈有複數個空隙。因此,於在燒結用構件上製造本實施方式之配線基板之過程中,樹脂基板之樹脂通過燒結體內相連結之空隙,潤濕擴散至燒結體與燒結用構件之界面。其結果,在位於與樹脂基板相接之交界面為相反側的燒結體之表面形成樹脂表面層。包含此種樹脂表面層之配線基板於大氣中於加熱之環境下使用之情形時,燒結體表面被樹脂表面層覆蓋,因此可抑制表面之氧化,就顯示良好之耐久性之方面而言較佳。 [resin surface layer] In the wiring board of the present embodiment, it is preferable that the sintered body includes a resin surface layer on the surface opposite to the interface with the resin substrate. In this specification, the resin layer formed on the surface of the sintered body is referred to as "resin surface layer". In the sintered body, a plurality of voids are distributed with a void ratio above a certain level. Therefore, in the process of manufacturing the wiring board of this embodiment on the sintering member, the resin of the resin substrate wets and diffuses to the interface between the sintered body and the sintering member through the voids connected in the sintered body. As a result, a resin surface layer is formed on the surface of the sintered body opposite to the interface with the resin substrate. When a wiring board including such a resin surface layer is used in a heated environment in the air, the surface of the sintered body is covered with the resin surface layer, so oxidation of the surface can be suppressed, and it is preferable in terms of exhibiting good durability .

2.配線基板之製造方法 (1)製造方法之實施方式例1 本實施方式之配線基板之製造方法係製造具有樹脂基板及包含金屬粒子燒結體之金屬配線的配線基板之方法,其包括:燒結體形成步驟,於燒結用構件上形成上述燒結體;塗佈步驟,於上述燒結用構件上,於上述燒結體之表面及上述燒結體之周圍塗佈包含樹脂成分之溶液;樹脂層形成步驟,使上述樹脂成分硬化而形成樹脂層;及剝離步驟,自上述燒結用構件剝離上述燒結體及上述樹脂層。 2. Manufacturing method of wiring board (1) Embodiment example 1 of the manufacturing method The method of manufacturing a wiring board according to this embodiment is a method of manufacturing a wiring board having a resin substrate and metal wiring including a sintered metal particle, and includes: a sintered body forming step of forming the above-mentioned sintered body on a member for sintering; and a coating step , on the above-mentioned member for sintering, coating a solution containing a resin component on the surface of the above-mentioned sintered body and the periphery of the above-mentioned sintered body; a resin layer forming step of hardening the above-mentioned resin component to form a resin layer; and a peeling step of forming a resin layer from the above-mentioned sintered The above-mentioned sintered body and the above-mentioned resin layer were peeled off with a member.

(2)製造方法之實施方式例2 作為製造本實施方式之配線基板之其他方法,亦可為包括如下步驟之製造具有樹脂基板及包含金屬粒子燒結體之金屬配線的配線基板之方法:準備樹脂基板之步驟;於上述樹脂基板上塗佈包含樹脂成分之溶液之步驟;硬化步驟,使上述樹脂成分硬化而形成樹脂界面層;及燒結步驟,於上述樹脂界面層上形成上述燒結體。 (2) Embodiment example 2 of the manufacturing method As another method of manufacturing the wiring board of this embodiment, there may also be a method of manufacturing a wiring board having a resin substrate and metal wiring including a metal particle sintered body including the steps of: preparing a resin substrate; A step of cloth containing a solution of a resin component; a hardening step of hardening the above resin component to form a resin interface layer; and a sintering step of forming the above sintered body on the above resin interface layer.

準備預先製作為膜形狀或板形狀等之樹脂基板,於該樹脂基板上塗佈含金屬糊料,經由乾燥、焙燒步驟,可製作金屬粒子之燒結體。此時,含金屬糊料之焙燒溫度係能夠防止由樹脂基板由於熱導致變質的溫度,例如,若為聚醯亞胺基板,則需要大致450℃以下。Prepare a resin substrate prefabricated into a film shape or a plate shape, apply a metal-containing paste on the resin substrate, and go through drying and firing steps to produce a sintered body of metal particles. At this time, the firing temperature of the metal-containing paste is a temperature at which the thermal deterioration of the resin substrate can be prevented. For example, in the case of a polyimide substrate, it needs to be approximately 450° C. or lower.

又,亦可為如下製造方法:其包括於上述樹脂基板上塗佈包含樹脂成分之溶液,使上述樹脂成分硬化而形成界面樹脂層之步驟,且上述燒結步驟包括於上述界面樹脂層上形成上述燒結體。為了提高樹脂基板與燒結體之密接性,於樹脂基板上塗佈樹脂前驅物或樹脂溶液,經由特定之熱處理步驟而形成界面樹脂層。其後,亦可於該界面樹脂層上塗佈含金屬糊料,經由乾燥及焙燒步驟而製作金屬粒子之燒結體。作為樹脂前驅物,例如可使用聚醯胺酸。作為樹脂溶液,例如可使用聚醯亞胺清漆。In addition, it may be a production method including the step of applying a solution containing a resin component on the above-mentioned resin substrate, curing the above-mentioned resin component to form an interface resin layer, and the above-mentioned sintering step includes forming the above-mentioned interface resin layer on the above-mentioned interface resin layer. Sintered body. In order to improve the adhesion between the resin substrate and the sintered body, the resin precursor or resin solution is coated on the resin substrate, and the interface resin layer is formed through specific heat treatment steps. Thereafter, a metal-containing paste can also be coated on the interface resin layer, and a sintered body of metal particles can be produced through drying and firing steps. As a resin precursor, for example, polyamic acid can be used. As the resin solution, for example, polyimide varnish can be used.

而且,根據如上述「(1)製造方法之實施方式例1」及「(2)製造方法之實施方式例2」之配線基板之製造方法,可獲得具有上述「1.配線基板」所記載之特徵之配線基板。即,可獲得一種配線基板,其係具有樹脂基板及金屬配線者,且上述金屬配線包含金屬粒子之燒結體,上述燒結體具有複數個空隙,上述空隙具備朝向上述樹脂基板之開口部,上述樹脂基板之一部分自上述開口部進入至上述空隙中。Furthermore, according to the manufacturing method of the wiring board as described in the above "(1) Embodiment 1 of the manufacturing method" and "(2) Embodiment 2 of the manufacturing method", it is possible to obtain the Features of the wiring board. That is, there can be obtained a wiring board having a resin substrate and metal wiring, wherein the metal wiring includes a sintered body of metal particles, the sintered body has a plurality of voids, the voids have openings facing the resin substrate, and the resin A part of the substrate enters the gap from the opening.

以下,使用圖2,對本實施方式之配線基板之製造方法進行說明。圖2係用於說明該製造方法之模式圖。以下,基於上述「製造方法之實施方式例1」進行說明。本發明之製造方法並不限定於實施方式例1。藉由上述「製造方法之實施方式例2」亦可提供具有本發明之特徵的配線基板。Hereinafter, the manufacturing method of the wiring board of this embodiment is demonstrated using FIG. 2. FIG. FIG. 2 is a schematic diagram for explaining the manufacturing method. Hereinafter, it demonstrates based on said "Example 1 of Embodiment of a manufacturing method". The production method of the present invention is not limited to Embodiment Example 1. A wiring board having the characteristics of the present invention can also be provided by the above-mentioned "Example 2 of embodiment of the manufacturing method".

[燒結體形成步驟] 將本實施方式之燒結體形成步驟示於圖2之(a)及(b)。燒結體形成步驟係於燒結用構件5上形成金屬粒子之燒結體6之步驟。作為該金屬粒子,較佳為包含選自由銅、銀及鎳所組成之群中之1種以上。 [Sintered Body Formation Step] The steps of forming the sintered body of this embodiment are shown in (a) and (b) of FIG. 2 . The sintered body forming step is a step of forming the sintered body 6 of metal particles on the member 5 for sintering. As the metal particles, it is preferable to contain one or more types selected from the group consisting of copper, silver, and nickel.

再者,以下,對於燒結用構件5上形成燒結體6之方法之一例進行說明。本發明之製造方法並不限定於以下之具體例。只要不妨礙本發明之效果,可採用公知或非公知之任意例。In addition, an example of the method of forming the sintered body 6 on the member 5 for sintering is demonstrated below. The production method of the present invention is not limited to the following specific examples. As long as the effects of the present invention are not hindered, any known or unknown examples may be employed.

(燒結用構件) 燒結用構件較佳為選擇如下者:塗佈於該燒結用構件上之包含金屬粒子之含金屬糊料、其乾燥物、及其燒結所形成之燒結體以某程度接著,並且於其後之步驟中不易剝離者。 (Sintering components) The member for sintering is preferably selected from the following: the metal-containing paste containing metal particles coated on the member for sintering, its dried product, and the sintered body formed by sintering thereof are adhered to a certain extent, and thereafter Those who are not easy to peel off in the steps.

燒結用構件之素材或種類較佳為於高溫下燒結含金屬糊料時不與金屬反應之材料。例如,可使用包含無機材料之無機基板,可使用碳化物基板、氮化物基板及氧化物基板中之任一者。具體而言,作為無機材料,可例舉:碳化矽(SiC)、氮化矽(Si 3N 4)、氮化硼(BN)、矽酸玻璃(SiO 2)、氧化鎂(MgO)、氧化鋁(Al 2O 3)、富鋁紅柱石(Al 2O 3+SiO 2)、矽(Si)等。進而,可使用鉬、鎢等可成型為片狀且不會與糊料中之金屬反應之金屬。基於自燒結用構件剝離包含燒結體及樹脂基板之配線基板時之剝離性良好之方面,較佳為氧化鎂(MgO)或矽酸玻璃(SiO 2)素材。 The material or type of the member for sintering is preferably a material that does not react with the metal when the metal-containing paste is sintered at high temperature. For example, an inorganic substrate including an inorganic material may be used, and any one of a carbide substrate, a nitride substrate, and an oxide substrate may be used. Specifically, examples of inorganic materials include silicon carbide (SiC), silicon nitride (Si 3 N 4 ), boron nitride (BN), silicate glass (SiO 2 ), magnesium oxide (MgO), oxide Aluminum (Al 2 O 3 ), mullite (Al 2 O 3 +SiO 2 ), silicon (Si), etc. Furthermore, metals such as molybdenum and tungsten, which can be formed into a sheet shape and do not react with the metal in the paste, can be used. Magnesium oxide (MgO) or silicic acid glass (SiO 2 ) material is preferable in terms of good peelability when peeling the wiring board including the sintered body and the resin substrate from the member for sintering.

又,亦可使用石墨基板作為燒結用構件。於將石墨基板用於燒結用構件之情形時,存在石墨粒子附著於配線基板中之樹脂層上之情形,根據配線基板之用途而定,而有樹脂層之功能(例如電絕緣性)受到損害之情形。於此種情形時,亦可藉由碳化物、氮化物、氧化物等絕緣體覆蓋燒結用構件之表面而使用。In addition, a graphite substrate can also be used as a member for sintering. In the case of using a graphite substrate as a member for sintering, graphite particles may adhere to the resin layer in the wiring substrate, depending on the use of the wiring substrate, and the function of the resin layer (such as electrical insulation) is impaired situation. In this case, the surface of the member for sintering can also be used by covering the surface of the member for sintering with an insulator such as carbide, nitride, or oxide.

如該例所示,關於燒結用構件,亦可考慮與含金屬糊料、其乾燥物及燒結體之密接性、或所獲得之配線基板之用途,而修飾或覆蓋燒結用構件之表面。再者,修飾或覆蓋可為有機及無機中之任一種。As shown in this example, regarding the member for sintering, the surface of the member for sintering may be modified or covered in consideration of the adhesiveness with the metal-containing paste, its dried product, and the sintered body, or the use of the obtained wiring board. Furthermore, the modification or covering can be either organic or inorganic.

燒結用構件表面之平均粗糙度(Ra)較佳為25 μm以下。藉由使該平均粗糙度(Ra)為25 μm以下,可保證形成於燒結用構件表面的樹脂層之表面的平滑性,防止發生對於樹脂層之拉伸變形或彎曲變形而斷裂之起點。The average roughness (Ra) of the surface of the member for sintering is preferably 25 μm or less. By setting the average roughness (Ra) to 25 μm or less, the surface smoothness of the resin layer formed on the surface of the sintering member can be ensured, and the origin of fracture due to tensile deformation or bending deformation of the resin layer can be prevented.

(含金屬糊料) 含金屬糊料係用於形成包含選自由銅、銀或鎳所組成之群中之1種以上的金屬之燒結體者。具體而言,含金屬糊料例如至少包含金屬粒子或金屬氧化物粒子、黏合劑樹脂及溶劑。 (with metal paste) The metal-containing paste is used to form a sintered body containing one or more metals selected from the group consisting of copper, silver, and nickel. Specifically, the metal-containing paste includes at least metal particles or metal oxide particles, a binder resin, and a solvent, for example.

(金屬粒子或金屬氧化物粒子) 金屬粒子亦可包含除銅、銀或鎳以外之金屬元素。至於除銅、銀及鎳以外之金屬元素之含量,不論其狀態為何,以金屬換算計,相對於金屬燒結體中所含之所有金屬元素較佳為30質量%以下,亦可為20質量%以下。 (metal particles or metal oxide particles) Metal particles may also contain metal elements other than copper, silver or nickel. As for the content of metal elements other than copper, silver, and nickel, regardless of their state, in terms of metal conversion, it is preferably 30% by mass or less, or 20% by mass, relative to all the metal elements contained in the metal sintered body the following.

作為含金屬糊料中之玻璃料等玻璃成分之含量,並無特別限定。不論其狀態為何,以金屬換算計,相對於含金屬糊料中所含之所有金屬元素較佳為5質量%以下,進而較佳為1質量%以下0.5質量%以下、或0.1質量%以下。若含金屬糊料中之玻璃成分之含量超過5質量%,則於藉由含金屬糊料形成燒結體之燒結步驟中,該玻璃成分與燒結用構件過度反應。因此,當自燒結用構件剝下樹脂層時,有燒結體殘留於燒結用構件表面之虞,故而欠佳。又,藉由使玻璃成分之含量為0.5質量%以下、或0.1質量%以下,可抑制燒結體之電阻率之增加。The content of glass components such as glass frit in the metal-containing paste is not particularly limited. Regardless of the state, in terms of metal, it is preferably at most 5% by mass, more preferably at most 1% by mass, at most 0.5% by mass, or at most 0.1% by mass relative to all the metal elements contained in the metal-containing paste. If the content of the glass component in the metal-containing paste exceeds 5% by mass, the glass component excessively reacts with the member for sintering in the sintering step of forming the sintered body from the metal-containing paste. Therefore, when the resin layer is peeled off from the member for sintering, a sintered body may remain on the surface of the member for sintering, which is not preferable. Moreover, by making content of a glass component into 0.5 mass % or less, or 0.1 mass % or less, the increase of the resistivity of a sintered compact can be suppressed.

金屬粒子或金屬氧化物粒子之平均粒徑(D 50)並無特別限定。該平均粒徑(D 50)較佳為0.1 μm以上20 μm以下。藉由使該平均粒徑(D 50)為0.1 μm以上,可防止受到燒結用構件5之表面凹凸之影響而產生斷線部,使作為配線之功能受到損害,或可防止開口之空隙亦成為與粒徑同等小之尺寸而難以使樹脂基板之一部分進入。藉由使該平均粒徑(D 50)為20 μm以下,可形成空隙之彎曲部。再者,本實施方式之金屬粒子或金屬氧化物粒子之平均粒徑(D 50)係指50體積%粒徑,係指藉由雷射繞射法所測得之粒徑。 The average particle diameter (D 50 ) of the metal particles or metal oxide particles is not particularly limited. The average particle diameter (D 50 ) is preferably not less than 0.1 μm and not more than 20 μm. By setting the average particle diameter (D 50 ) to 0.1 μm or more, it is possible to prevent disconnection from being generated due to the influence of the unevenness of the surface of the member 5 for sintering, thereby impairing the function as wiring, or preventing voids in openings from being damaged. The size is as small as the particle size, so it is difficult for a part of the resin substrate to enter. By setting the average particle diameter (D 50 ) to 20 μm or less, curved portions of voids can be formed. Furthermore, the average particle diameter (D 50 ) of the metal particles or metal oxide particles in this embodiment refers to the 50% volume particle diameter, and refers to the particle diameter measured by the laser diffraction method.

作為金屬粒子或金屬氧化物粒子之含量,並無特別限定。例如,相對於含金屬糊料100質量%,較佳為80質量%以上95質量%以下。There is no particular limitation on the content of metal particles or metal oxide particles. For example, it is preferably at least 80% by mass and at most 95% by mass relative to 100% by mass of the metal-containing paste.

(黏合劑樹脂) 含金屬糊料中所調配之黏合劑樹脂只要為可藉由燒結而分解之樹脂材料,則並無特別限定。例如可例舉:甲基纖維素、乙基纖維素、羧甲基纖維素等纖維素樹脂,丙烯酸樹脂、丁醛樹脂、醇酸樹脂、環氧樹脂、酚樹脂等。較佳為有與氧或一氧化碳反應而容易自糊料中消失之傾向的纖維素系樹脂。於纖維素系樹脂中,較佳為乙基纖維素。 (Binder resin) The binder resin compounded in the metal-containing paste is not particularly limited as long as it is a resin material that can be decomposed by sintering. For example, cellulose resins such as methylcellulose, ethylcellulose, and carboxymethylcellulose, acrylic resins, butyral resins, alkyd resins, epoxy resins, and phenol resins may be mentioned. Preferably, it is a cellulose-based resin that tends to disappear from the paste by reacting with oxygen or carbon monoxide. Among cellulose-based resins, ethyl cellulose is preferred.

黏合劑樹脂之含量並無特別限定。例如,相對於含金屬糊料100質量%,較佳為0.1質量%以上5質量%以下。若黏合劑樹脂殘留於燒結體中,則使電阻率增加。於在大氣下進行燒結之情形時,黏合劑樹脂與大氣中之氧反應而燃燒,藉此可減少殘留於燒結體中之黏合劑樹脂之量,減少燒結體之電阻率。因此,黏合劑樹脂之含量較佳為5質量%以下。,藉由使黏合劑樹脂之含量為5質量%以下,可抑制黏合劑樹脂成分殘留於燒結體中,可忽視對燒結體之電阻率造成之影響。另一方面,藉由使含金屬糊料中之黏合劑樹脂為0.1質量%以上,可提高含金屬糊料之黏度,提高糊料之塗佈性或印刷性。因此,黏合劑樹脂之含量較佳為0.1質量%以上。The content of the binder resin is not particularly limited. For example, it is preferably at least 0.1% by mass and at most 5% by mass relative to 100% by mass of the metal-containing paste. If the binder resin remains in the sintered body, the resistivity will increase. In the case of sintering in the atmosphere, the binder resin reacts with oxygen in the atmosphere and burns, thereby reducing the amount of binder resin remaining in the sintered body and reducing the resistivity of the sintered body. Therefore, the content of the binder resin is preferably 5% by mass or less. , by making the content of the binder resin 5% by mass or less, the binder resin component can be suppressed from remaining in the sintered body, and the influence on the electrical resistivity of the sintered body can be ignored. On the other hand, by making the binder resin in the metal-containing paste 0.1% by mass or more, the viscosity of the metal-containing paste can be increased, and the coatability or printability of the paste can be improved. Therefore, the content of the binder resin is preferably at least 0.1% by mass.

(溶劑) 含金屬糊料中所含有之溶劑只要具有適當之沸點、蒸氣壓、黏性,則無特別限定。例如可例舉:烴系溶劑、氯化烴系溶劑、環狀醚系溶劑、醯胺系溶劑、亞碸系溶劑、酮系溶劑、醇系化合物、多元醇之酯系溶劑、多元醇之醚系溶劑、萜烯系溶劑及該等之混合物。該等中,較佳為沸點為200℃左右之TEXANOL、丁基卡必醇、丁基卡必醇乙酸酯、松油醇等。 (solvent) The solvent contained in the metal-containing paste is not particularly limited as long as it has an appropriate boiling point, vapor pressure, and viscosity. For example, hydrocarbon-based solvents, chlorinated hydrocarbon-based solvents, cyclic ether-based solvents, amide-based solvents, ethylene-based solvents, ketone-based solvents, alcohol-based compounds, polyol ester solvents, and polyol ethers solvents, terpene-based solvents, and mixtures thereof. Among them, TEXANOL, butyl carbitol, butyl carbitol acetate, terpineol and the like having a boiling point of about 200° C. are preferable.

含金屬糊料中所含有之溶劑之含量並無特別限定。例如,相對於含金屬糊料100質量%,較佳為2質量%以上25質量%以下。藉由使溶劑之含量為25質量%以下,可抑制含金屬糊料之黏度,且可抑制其擴大至所需之印刷形狀之外。另一方面,藉由使溶劑之含量為2質量%以上,可提高含金屬糊料之印刷性。The content of the solvent contained in the metal-containing paste is not particularly limited. For example, it is preferably not less than 2% by mass and not more than 25% by mass relative to 100% by mass of the metal-containing paste. By making the content of the solvent 25% by mass or less, the viscosity of the metal-containing paste can be suppressed, and expansion beyond the desired printed shape can be suppressed. On the other hand, the printability of a metal-containing paste can be improved by making content of a solvent into 2 mass % or more.

本實施方式中之「有機媒劑」係指將黏合劑樹脂、溶劑及其他視需要而添加之有機物全部加以混合而成之液體。作為有機媒劑,通常可使用將黏合劑樹脂與溶劑加以混合而製備者。進而,亦可於有機媒劑中混合金屬鹽及多元醇。The "organic vehicle" in this embodiment refers to a liquid obtained by mixing all binder resins, solvents, and other organic substances added as necessary. As an organic vehicle, the thing prepared by mixing a binder resin and a solvent normally can be used. Furthermore, a metal salt and a polyhydric alcohol can also be mixed with an organic vehicle.

含金屬糊料之製造方法並無特別限定。例如,可將上述黏合劑樹脂與溶劑加以混合,進而添加金屬粒子,使用行星式混合機等裝置進行混練。亦可視需要使用三輥研磨機,提高金屬粒子之分散性。The method for producing the metal-containing paste is not particularly limited. For example, the above-mentioned binder resin and a solvent may be mixed, and metal particles may be added thereto, followed by kneading using a device such as a planetary mixer. You can also use a three-roll mill as needed to improve the dispersion of metal particles.

於燒結用構件上塗佈或印刷含金屬糊料,以成為配線或電極等之特定形狀之方式而形成。具體而言,塗佈或印刷之方法可例舉:網版印刷、分注器印刷、凹版印刷、膠版印刷、噴墨印刷等。Metal-containing paste is applied or printed on the sintering member to form a specific shape such as wiring or electrodes. Specifically, the method of coating or printing may, for example, be screen printing, dispenser printing, gravure printing, offset printing, or inkjet printing.

(燒結) 於燒結用構件上塗佈或印刷含金屬糊料後,將燒結用構件於600℃以上800℃以下之溫度下進行加熱而獲得燒結體。 (sintering) After coating or printing the metal-containing paste on the sintering member, the sintering member is heated at a temperature of 600° C. to 800° C. to obtain a sintered body.

燒結可於氮氣氣氛下、或還原氣氛下以一個階段進行,亦可於氧化氣氛下進行加熱後於還原氣氛下進行加熱分二個階段進行。再者,於分二個階段進行加熱之情形時,二個階段該兩者之加熱溫度設為600℃以上800℃以下之溫度。The sintering can be carried out in one stage under a nitrogen atmosphere or a reducing atmosphere, or can be carried out in two stages after heating under an oxidizing atmosphere and then heating under a reducing atmosphere. In addition, when heating is performed in two stages, the heating temperatures of the two stages are set to a temperature of 600° C. or more and 800° C. or less.

以下,針對分二個階段進行加熱之情形時之氣體氣氛進行說明。Hereinafter, the gas atmosphere in the case of heating in two stages will be described.

氧化氣氛中之氧化性氣體例如可使用氧或大氣等。又,可將除氧化性氣體以外之氣體與氧化性氣體加以混合而使用。除氧化性氣體以外之氣體可使用惰性氣體(例如氮氣或氬氣)。As the oxidizing gas in the oxidizing atmosphere, for example, oxygen or air can be used. Moreover, the gas other than an oxidizing gas can be mixed and used with an oxidizing gas. As a gas other than an oxidizing gas, an inert gas (such as nitrogen or argon) can be used.

氧化氣氛中之氧之濃度並無特別限定。若以氧分壓表示,則較佳為50 Pa以上,進而較佳為60 Pa以上或70 Pa以上。於氣氛之壓力為大氣壓(10 5Pa)之情形時,若將該等氧分壓換算成體積比之濃度,則較佳為500 ppm以上,進而較佳為600 ppm以上、或700 ppm以上。 The concentration of oxygen in the oxidizing atmosphere is not particularly limited. In terms of oxygen partial pressure, it is preferably 50 Pa or more, and more preferably 60 Pa or more or 70 Pa or more. When the pressure of the atmosphere is atmospheric pressure (10 5 Pa), the oxygen partial pressure is converted into a volume ratio concentration, and the concentration is preferably 500 ppm or more, more preferably 600 ppm or more, or 700 ppm or more.

藉由使氧濃度為500 ppm以上,可充分燃燒含金屬糊料中之黏合劑樹脂而將其消除。另一方面,若氧化性氣體之濃度超過8000 ppm,則有僅於含金屬糊料之表面附近快速發生反應之虞。為了充分燒結至燒結體內部,氧氣濃度較佳為8000 ppm以下。By making the oxygen concentration 500 ppm or more, the binder resin in the metal-containing paste can be fully burned and eliminated. On the other hand, if the concentration of the oxidizing gas exceeds 8000 ppm, there is a possibility that the reaction will rapidly occur only near the surface of the metal-containing paste. In order to fully sinter into the inside of the sintered body, the oxygen concentration is preferably 8000 ppm or less.

作為還原性氣體,可使用氫氣、一氧化碳、甲酸、氨等。又,作為除還原性氣體以外之氣體,可使用惰性氣體,例如氮氣或氬氣。As the reducing gas, hydrogen, carbon monoxide, formic acid, ammonia, or the like can be used. Also, as the gas other than the reducing gas, an inert gas such as nitrogen or argon can be used.

還原性氣體之濃度並無特別限定。於還原氣氛之壓力為大氣壓(10 5Pa)之情形時,還原性氣體之濃度較佳為以體積比計為0.5%以上,進而較佳為1%以上、或2%以上。若以體積比計未達0.5%,則無法充分進行燒結體中之銅、銀或鎳等金屬之氧化物之還原,而殘存有金屬氧化物,因此焙燒後之金屬配線有呈現較高電阻率之虞。 The concentration of the reducing gas is not particularly limited. When the pressure of the reducing atmosphere is atmospheric pressure (10 5 Pa), the concentration of the reducing gas is preferably 0.5% or more by volume, more preferably 1% or more, or 2% or more. If the volume ratio is less than 0.5%, the reduction of metal oxides such as copper, silver, or nickel in the sintered body cannot be sufficiently reduced, and metal oxides remain, so the metal wiring after firing has a high resistivity. risk.

於使用包含金屬粒子之糊料之情形時,亦可於氮氣氣氛下進行燒結。或者,於使用包含金屬氧化物粒子之糊料之情形時,亦可於還原氣氛下進行燒結。於任一情形時,燒結溫度均較佳為600℃以上850℃以下。In the case of using a paste containing metal particles, sintering may also be performed under a nitrogen atmosphere. Alternatively, when using a paste containing metal oxide particles, sintering may be performed under a reducing atmosphere. In any case, the sintering temperature is preferably not less than 600°C and not more than 850°C.

[塗佈步驟] 將本實施方式之塗佈步驟示於圖2之(c)。塗佈步驟係於燒結用構件5上,於燒結體6之表面及燒結體6之周圍塗佈包含樹脂成分之溶液7的步驟。 [Coating procedure] The coating step of this embodiment is shown in (c) of FIG. 2 . The coating step is a step of coating the solution 7 containing the resin component on the surface of the sintered body 6 and the periphery of the sintered body 6 on the member 5 for sintering.

本實施方式之塗佈步驟之樹脂成分可使用樹脂之前驅物物質或樹脂之聚合性單體。可使用藉由去除溶劑之乾燥處理或進一步之處理而硬化之樹脂或其前驅物物質。The resin component in the coating step of this embodiment can use a resin precursor material or a polymerizable monomer of the resin. A resin hardened by a drying process to remove a solvent or a further process or a precursor material thereof may be used.

作為聚合性單體,只要為藉由聚合或進一步之處理而硬化之樹脂之單體,則無特別限定。例如可例舉:聚醯亞胺、液晶性聚合物、氟樹脂、聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等具有可撓性之樹脂之單體。The polymerizable monomer is not particularly limited as long as it is a monomer of a resin cured by polymerization or further treatment. Examples thereof include monomers of flexible resins such as polyimide, liquid crystal polymer, fluororesin, polyethylene terephthalate, and polyethylene naphthalate.

又,所謂樹脂之「前驅物物質」係指藉由實施任意處理而硬化,從而獲得具有可撓性之樹脂的物質。作為前驅物物質,例如可例舉:使用聚醯亞胺作為樹脂之情形時之聚醯胺酸。該聚醯胺酸係藉由實施醯亞胺化處理而變成聚醯亞胺之物質,可稱為聚醯亞胺之前驅物物質。再者,本實施方式之前驅物物質亦包括於聚合後實施任意處理而硬化的單體。In addition, the "precursor substance" of the resin refers to a substance that is hardened by any treatment to obtain a flexible resin. As a precursor material, the polyamic acid in the case of using polyimide as resin is mentioned, for example. The polyamic acid is a substance that becomes a polyimide by imidization treatment, and can be called a polyimide precursor substance. Furthermore, the precursor substance of this embodiment also includes monomers that are cured by any treatment after polymerization.

溶劑並無特別限定。可考慮樹脂成分之溶解度或與塗佈方法對應之黏度等而適當地選擇。例如,於聚醯亞胺樹脂之情形時,可將N-甲基吡咯啶酮作為溶劑。The solvent is not particularly limited. It can be appropriately selected in consideration of the solubility of the resin component, the viscosity corresponding to the coating method, and the like. For example, in the case of polyimide resin, N-methylpyrrolidone can be used as a solvent.

包含樹脂成分之溶液之黏度並無特別限定。例如,較佳為0.5 Pa・s以上,更佳為2 Pa・s以上。另一方面,較佳為50 Pa・s以下,更佳為25 Pa・s以下。藉由使溶液之黏度為0.5 Pa・s以上、50 Pa・s,可使樹脂基板之一部分進入至燒結體之空隙。進而,藉由使溶液之黏度為2 Pa・s以上、25 Pa・s以下,可使進入至燒結體之空隙之樹脂基板之一部分彼此連結,從而獲得較高之密接強度及較高之斷裂伸長率。The viscosity of the solution containing the resin component is not particularly limited. For example, it is preferably at least 0.5 Pa·s, more preferably at least 2 Pa·s. On the other hand, it is preferably at most 50 Pa·s, more preferably at most 25 Pa·s. By setting the viscosity of the solution to 0.5 Pa·s or more and 50 Pa·s, a part of the resin substrate can enter the void of the sintered body. Furthermore, by setting the viscosity of the solution to 2 Pa·s or more and 25 Pa·s or less, parts of the resin substrates entering the voids of the sintered body can be connected to each other, thereby obtaining high adhesion strength and high elongation at break Rate.

作為塗佈之方法,並無特別限定。例如可使用狹縫式塗佈機、棒式塗佈機、旋轉塗佈機等。The coating method is not particularly limited. For example, a slit coater, a bar coater, a spin coater, etc. can be used.

如上所示,於將包含樹脂成分之溶液塗佈於燒結用構件上之後,使之乾燥。乾燥方法並無特別限定,例如,可於常溫下、大氣壓下進行乾燥,亦可進行加熱及減壓之至少任一者。As described above, after coating the solution containing the resin component on the member for sintering, it is dried. The drying method is not particularly limited. For example, drying may be performed at normal temperature and atmospheric pressure, or at least any one of heating and reduced pressure may be performed.

乾燥後之樹脂成分含有層之厚度大致與樹脂基板之厚度相等。乾燥後之樹脂成分含有層之厚度並無特別限定。例如,較佳為5 μm以上,進而較佳為10 μm以上、或15 μm以上。另一方面,較佳為100 μm以下,進而較佳為75 μm以下、或50 μm以下。藉由使乾燥後之樹脂成分含有層之厚度為5 m以上,可防止基板因彎曲或拉伸變形而發生斷裂。另一方面,藉由使乾燥後之樹脂成分含有層之厚度為100 m以下,可賦予優異之可撓性。The thickness of the dried resin component-containing layer was approximately equal to the thickness of the resin substrate. The thickness of the resin component-containing layer after drying is not particularly limited. For example, it is preferably 5 μm or more, and more preferably 10 μm or more, or 15 μm or more. On the other hand, it is preferably 100 μm or less, further preferably 75 μm or less, or 50 μm or less. By setting the thickness of the resin component-containing layer after drying to 5 m or more, it is possible to prevent the substrate from being broken due to bending or tensile deformation. On the other hand, by setting the thickness of the resin component-containing layer after drying to 100 m or less, excellent flexibility can be imparted.

[硬化步驟] 將本實施方式之硬化步驟示於圖2(d)。硬化步驟係將所塗佈或印刷之含樹脂成分之溶液中所含之前驅物物質或聚合性單體等樹脂成分轉換成樹脂,形成該樹脂硬化之狀態之樹脂基板層8之步驟。 [hardening step] The hardening step of this embodiment is shown in FIG. 2( d ). The hardening step is a step of converting resin components such as precursor substances or polymerizable monomers contained in the coated or printed resin component-containing solution into resin to form the resin substrate layer 8 in a state where the resin is cured.

作為硬化方法,並無特別限定,可根據各個單體之化學物種而進行加熱,或者使用各種觸媒。例如,於使用聚醯胺酸作為前驅物物質,形成作為樹脂之聚醯胺之情形時,亦可經由利用加熱所進行之脫水反應。The curing method is not particularly limited, and heating may be performed or various catalysts may be used according to the chemical species of each monomer. For example, in the case of using polyamic acid as a precursor material to form polyamide as a resin, dehydration reaction by heating can also be used.

本實施方式之配線基板之製造方法係於硬化步驟中,使樹脂基板之樹脂通過燒結體內相連結之空隙,潤濕擴散至燒結體與燒結用構件之界面。其結果,在位於與樹脂基板相接之交界面為相反側的燒結體之表面形成樹脂表面層。In the manufacturing method of the wiring board of the present embodiment, in the hardening step, the resin of the resin substrate is wetted and diffused to the interface between the sintered body and the member for sintering through the gaps connected in the sintered body. As a result, a resin surface layer is formed on the surface of the sintered body opposite to the interface with the resin substrate.

[剝離步驟] 將本實施方式之剝離步驟示於圖2之(e)。剝離步驟係自燒結用構件5剝離燒結體6及樹脂層8之步驟。例如,藉由抓持住樹脂層8之端部,向剝離之方向拉動,可自燒結用構件5剝離燒結體6及樹脂層8。 [實施例] [Peel off procedure] The peeling step of the present embodiment is shown in (e) of FIG. 2 . The peeling step is a step of peeling the sintered body 6 and the resin layer 8 from the member 5 for sintering. For example, the sintered body 6 and the resin layer 8 can be peeled from the member 5 for sintering by grasping the end of the resin layer 8 and pulling it in a peeling direction. [Example]

以下例舉實施例,對於本發明進一步進行說明。本發明並不受該等實施例限定。Examples are given below to further describe the present invention. The present invention is not limited by these Examples.

[實施例1~4、比較例1~2] (試樣之製備) 使用氧化鎂板作為燒結用構件。藉由網版印刷法於該燒結用構件之表面印刷銅糊料。作為銅糊料,使用含有平均粒徑為1 μm之球狀粒子80質量%、及包含黏合劑樹脂與溶劑之混合體之媒劑20質量%者。所印刷之銅糊料於100℃之大氣中進行乾燥後,於氮氣氣氛下實施熱處理而進行燒結,其次冷卻至室溫。如表1所示,將熱處理溫度於600℃至850℃之範圍內適當地變化,且將熱處理時間於30分鐘至60分鐘之範圍內適當地變化而實施,藉此獲得實施例1~4及比較例1~2之不同空隙率之燒結體。所獲得之燒結體之銅配線之大概尺寸係線寬為200 μm,高度為13 μm,長度為6 cm。 [Examples 1-4, Comparative Examples 1-2] (Preparation of samples) A magnesium oxide plate was used as a member for sintering. Copper paste was printed on the surface of the member for sintering by screen printing. As the copper paste, one containing 80% by mass of spherical particles with an average particle diameter of 1 μm and 20% by mass of a vehicle containing a mixture of a binder resin and a solvent was used. The printed copper paste was dried in the air at 100° C., then heat-treated and sintered in a nitrogen atmosphere, and then cooled to room temperature. As shown in Table 1, the heat treatment temperature was appropriately changed in the range of 600°C to 850°C, and the heat treatment time was appropriately changed in the range of 30 minutes to 60 minutes, thereby obtaining Examples 1-4 and Sintered bodies with different porosity in Comparative Examples 1-2. The approximate dimensions of the copper wiring of the obtained sintered body were a line width of 200 μm, a height of 13 μm, and a length of 6 cm.

關於實施例1~4及比較例1~2之各試樣,於具有燒結體(銅配線)之燒結用構件之表面塗佈調整溶劑量而使黏度成為10 Pa・s之聚醯亞胺清漆(宇部興產股份有限公司之製品「UPIA」)。其次,於氮氣氣氛中,於280℃下實施10分鐘之熱處理,其後於350℃下實施30分鐘之熱處理,使聚醯亞胺清漆硬化,形成膜狀之聚醯亞胺樹脂基板。該樹脂基板之厚度於與燒結體接觸之中心部為25 μm,於端部為31 μm。冷卻至室溫後,自燒結用構件剝離包含銅燒結體與聚醯亞胺樹脂基板之積層體。其後,對於所獲得之積層體,使用用於獲得平坦截面之截面拋光儀(日本電子股份有限公司製造之IB-19530CP)實施離子束加工處理。For each sample of Examples 1 to 4 and Comparative Examples 1 to 2, polyimide varnish was coated on the surface of the member for sintering having the sintered body (copper wiring) with the amount of solvent adjusted so that the viscosity became 10 Pa·s ("UPIA", a product of Ube Industries, Ltd.). Next, heat treatment was carried out at 280° C. for 10 minutes in a nitrogen atmosphere, and then heat treatment was carried out at 350° C. for 30 minutes to harden the polyimide varnish and form a film-like polyimide resin substrate. The thickness of the resin substrate was 25 μm at the center portion in contact with the sintered body and 31 μm at the end portions. After cooling to room temperature, the laminate including the copper sintered body and the polyimide resin substrate was peeled off from the sintering member. Thereafter, the obtained laminate was subjected to ion beam processing using a cross section polisher (IB-19530CP manufactured by JEOL Ltd.) for obtaining a flat cross section.

(截面觀察) 所獲得之包含銅燒結體及聚醯亞胺樹脂基板之積層體之大小為約20 mm×約15 mm。於形成有銅配線之長度方向上,於其中心附近垂直地切斷,獲得截面觀察用樣品。使用場發射型之掃描電子顯微鏡(以下,簡稱為「SEM」),觀察積層體之截面組織。將觀察實施例2之試樣所得之截面組織示於圖3A。銅燒結體11之上側為與燒結用構件相接之部分。可確認,銅燒結體整體埋設於樹脂基板12內。切出僅包含於圖3A中以虛線表示之框所包圍之銅配線區域的圖像部分(圖3B)。然後,使用圖像解析軟體(Image J)進行二值化,獲得如圖3C所示之黑白圖像。藉由Image J計算圖3C之黑色部分之面積比率,求出空隙率(%)。 (cross-sectional observation) The size of the obtained laminate including the copper sintered body and the polyimide resin substrate was about 20 mm×about 15 mm. In the longitudinal direction where the copper wiring was formed, it was cut vertically near the center to obtain a sample for cross-sectional observation. The cross-sectional structure of the laminate was observed using a field emission type scanning electron microscope (hereinafter referred to as "SEM"). The cross-sectional structure obtained by observing the sample of Example 2 is shown in FIG. 3A. The upper side of the copper sintered body 11 is a part in contact with the member for sintering. It can be confirmed that the entire copper sintered body is embedded in the resin substrate 12 . A portion of the image including only the copper wiring area surrounded by the frame indicated by the dotted line in FIG. 3A was cut out ( FIG. 3B ). Then, use image analysis software (Image J) to perform binarization to obtain a black and white image as shown in Figure 3C. The area ratio of the black part in Figure 3C was calculated by Image J to obtain the porosity (%).

當計算空隙率時,於試樣之截面組織中任意選定10個部位,求出各自之空隙率,將其平均值作為本實施例中之燒結體之空隙率。When calculating the porosity, randomly select 10 parts in the cross-sectional structure of the sample, obtain their respective porosities, and use the average value as the porosity of the sintered body in this example.

圖4係將圖3A之銅燒結體11與樹脂基板12之交界面附近放大而示出之圖。圖4之交界面16所顯示之虛線係沿著銅燒結體之截面之外周緣畫線而成者,表示銅燒結體與樹脂基板之交界。位於該交界線之更內側且不存在銅燒結部分之區域相當於銅燒結體之空隙。又,目視觀察該SEM圖像,於樹脂存在於該交界面16之更內側之情形時,判定為樹脂進入至空隙中之狀態。例如,於存在於圖4之交界面16附近之空隙13及空隙14之內部,具備朝向樹脂基板12之開口部9、10,樹脂基板之樹脂之一部分進入至空隙13、14之中。進而,空隙13與空隙14於銅燒結體之內部中連結,進入至各個空隙中之樹脂15亦連結。FIG. 4 is an enlarged view showing the vicinity of the interface between copper sintered body 11 and resin substrate 12 in FIG. 3A . The dotted line shown in the interface 16 of FIG. 4 is drawn along the outer periphery of the cross-section of the copper sintered body, and represents the interface between the copper sintered body and the resin substrate. The region located further inside the boundary line and having no copper sintered portion corresponds to the void of the copper sintered body. In addition, when the SEM image was visually observed, when the resin was present on the inner side of the interface 16, it was determined that the resin had entered the void. For example, openings 9 and 10 facing the resin substrate 12 are provided inside the voids 13 and 14 that exist near the interface 16 in FIG. Furthermore, the void 13 and the void 14 are connected in the inside of a copper sintered body, and the resin 15 which penetrated into each void is also connected.

於本說明書中,於樹脂基板之樹脂之一部分進入至銅燒結體之空隙中之狀態之情形時,可以說該配線基板具有「樹脂進入」。又,於進入至燒結體中之複數個空隙中的樹脂彼此連結之情形時,可以說該配線基板具有「樹脂之連續性」。In this specification, when a part of the resin of the resin substrate enters the void of the copper sintered body, it can be said that the wiring substrate has "resin entry". In addition, when the resins in the plurality of voids in the sintered body are connected to each other, it can be said that the wiring board has "continuity of the resin".

(電阻率之測定) 使用探針間隔為1 mm之直流四探針法測定實施例2之試樣之電阻率。 (Determination of resistivity) The resistivity of the sample in Example 2 was measured by the DC four-probe method with a probe interval of 1 mm.

(密接性之評價) 製作用於評價密接性之樣品。於氧化鎂基板上之10 mm見方之區域塗佈銅糊料後,進行焙燒而獲得平板狀之銅燒結體。其後,塗佈黏度為15 Pa・s之聚醯亞胺清漆,進行熱處理,冷卻至室溫後,自燒結用構件剝離。使用所獲得之銅燒結體與樹脂基板積層而成之樣品,依照ASTM D 3359-79進行膠帶試驗,測定自樹脂基板剝離之銅燒結體之剝離部之面積而求出面積率(%),評價銅燒結體與樹脂基板之密接性。密接性如下所示,根據剝離部之面積率(%)以0至5這6個等級進行評價。再者,5為最高之密接強度,0為最低之密接強度。 5:0 4:超過0%且未達5% 3:5%以上且未達15% 2:15%以上且未達35% 135%以上且未達65% 0:65%以上 (Evaluation of adhesion) Prepare samples for evaluating adhesion. Copper paste was coated on a 10 mm square area on the magnesium oxide substrate, and then fired to obtain a flat copper sintered body. Thereafter, a polyimide varnish with a viscosity of 15 Pa·s was applied, heat-treated, cooled to room temperature, and peeled off from the sintering member. Using the sample obtained by laminating the copper sintered body and the resin substrate, a tape test was performed in accordance with ASTM D 3359-79, and the area of the peeled part of the copper sintered body peeled off from the resin substrate was measured to obtain the area ratio (%), and evaluated Adhesion between copper sintered body and resin substrate. Adhesiveness was evaluated on 6 scales of 0 to 5 from the area ratio (%) of the peeled part as shown below. Furthermore, 5 is the highest adhesion strength, and 0 is the lowest adhesion strength. 5:0 4: More than 0% and less than 5% 3: More than 5% and less than 15% 2: More than 15% and less than 35% More than 135% and less than 65% 0: more than 65%

(斷裂伸長率之測定) 又,於銅燒結體之長度方向上進行拉伸試驗,測定電阻隨著伸長應變增加之變化。其結果,於伸長應變為18%之時間點,電阻相對於初始值增加40%。若進一步增加伸長應變,則電阻急遽增加,確認銅燒結體斷裂。於本實施例中,將觀測到電阻急遽增加時之伸長應變(%)作為「斷裂伸長率」。 (Determination of elongation at break) In addition, a tensile test was performed in the longitudinal direction of the copper sintered body to measure the change in electrical resistance as the elongation strain increases. As a result, the electrical resistance increased by 40% from the initial value when the elongation strain became 18%. When the elongation strain was further increased, the electrical resistance increased rapidly, and it was confirmed that the copper sintered body was broken. In this example, the elongation strain (%) at which a sharp increase in electrical resistance was observed was taken as the "elongation at break".

將以上之評價結果示於表1。理想之結果係電阻率為4 μΩ・cm以下,密接性評價為3以上,斷裂伸長率為8%以上。更理想之結果係電阻率為3 μΩ・cm以下,密接性評價為5,斷裂伸長率為13%以上。Table 1 shows the above evaluation results. The ideal result is that the electrical resistivity is 4 μΩ·cm or less, the adhesion evaluation is 3 or more, and the elongation at break is 8% or more. A more ideal result is that the resistivity is below 3 μΩ·cm, the adhesion evaluation is 5, and the elongation at break is above 13%.

[表1]    熱處理溫度 [℃] 熱處理時間 [分鐘] 空隙率 [%] 樹脂之進入 樹脂之連續性 電阻率 [μΩ・cm] 密接性評價 斷裂伸長率 [%] 實施例1 850 30 3 1.9 3 12 實施例2 800 30 12 2.2 5 18 實施例3 700 30 24 2.9 5 15 實施例4 650 30 28 3.4 4 10 比較例1 850 60 1 1.8 2 5 比較例2 600 30 33 4 3 4 [Table 1] Heat treatment temperature [°C] Heat treatment time [minutes] Porosity[%] entry of resin Resin Continuity Resistivity [μΩ・cm] Adhesion Evaluation Elongation at break[%] Example 1 850 30 3 have none 1.9 3 12 Example 2 800 30 12 have have 2.2 5 18 Example 3 700 30 twenty four have have 2.9 5 15 Example 4 650 30 28 have have 3.4 4 10 Comparative example 1 850 60 1 none none 1.8 2 5 Comparative example 2 600 30 33 have have 4 3 4

[實施例5~8、比較例3~4] 於實施例5~8、比較例3~4中,於650℃下進行30分鐘之焙燒,獲得空隙率為28%之銅燒結體,且使聚醯亞胺清漆之黏度於0.6至63Pa・s之範圍內發生變化,除此以外,以與實施例2相同之條件製作試樣。再者,聚醯亞胺清漆之黏度可藉由調整清漆中所含之N-甲基吡咯啶酮(NMP)之含量(以相對於清漆之質量%進行表述)而使其變化。對於所獲得之試樣,對樹脂進入至空隙內、空隙內之樹脂之連續性、密接性及斷裂伸長率進行評價。將其結果示於表2。理想之結果係密接性評價為3以上,斷裂伸長率為8%以上。更理想之結果係密接性評價為5,斷裂伸長率為13%以上。 [Examples 5-8, Comparative Examples 3-4] In Examples 5-8 and Comparative Examples 3-4, sintered copper was obtained at 650°C for 30 minutes to obtain a copper sintered body with a porosity of 28%, and the viscosity of the polyimide varnish was set at 0.6 to 63 Pa·s Samples were produced under the same conditions as in Example 2, except that the range was changed. Furthermore, the viscosity of the polyimide varnish can be changed by adjusting the content of N-methylpyrrolidone (NMP) contained in the varnish (expressed in % relative to the mass of the varnish). For the obtained sample, the resin penetrated into the void, and the continuity, adhesiveness, and elongation at break of the resin in the void were evaluated. The results are shown in Table 2. The ideal result is that the adhesion evaluation is 3 or more, and the elongation at break is 8% or more. A more ideal result is that the adhesion evaluation is 5, and the elongation at break is more than 13%.

[表2]    NMP濃度 [質量%] 黏度 [Pa・s] 樹脂之進入 樹脂之連續性 密接性評價 斷裂伸長率 [%] 實施例5 80 0.6 3 11 實施例6 75 3 5 16 實施例7 67 24 5 14 實施例8 50 47 3 12 比較例3 85 0.3 2 7 比較例4 40 63 2 6 [Table 2] NMP concentration [mass%] Viscosity [Pa・s] entry of resin Resin Continuity Adhesion Evaluation Elongation at break[%] Example 5 80 0.6 have none 3 11 Example 6 75 3 have have 5 16 Example 7 67 twenty four have have 5 14 Example 8 50 47 have none 3 12 Comparative example 3 85 0.3 none none 2 7 Comparative example 4 40 63 none none 2 6

(耐久性之評價) [實施例9] 以與實施例2相同之方法製作複數個銅燒結體之樣品,藉由SEM觀察銅燒結體之截面組織。圖5係將位於銅燒結體11與樹脂基板接觸之交界面16之相反側的表面附近放大而示出之圖。於燒結體之表面形成有樹脂表面層17,該樹脂表面層17之厚度約為0.8 μm。將該等樣品於大氣中、於200℃、250℃及300℃下實施10分鐘之加熱處理,進行冷卻後,目測觀察銅燒結體之表面。於加熱處理之前後,於銅燒結體之表面未觀察到變色,表面氧化得到抑制。於該方面而言,可確認本發明之配線基板對於使用環境具有良好之耐久性。 (Evaluation of Durability) [Example 9] A plurality of samples of the copper sintered body were produced in the same manner as in Example 2, and the cross-sectional structure of the copper sintered body was observed by SEM. FIG. 5 is an enlarged view showing the vicinity of the surface located on the opposite side of the interface 16 between the copper sintered body 11 and the resin substrate. A resin surface layer 17 is formed on the surface of the sintered body, and the thickness of the resin surface layer 17 is about 0.8 μm. These samples were heat-processed for 10 minutes at 200 degreeC, 250 degreeC, and 300 degreeC in air|atmosphere, and after cooling, the surface of the copper sintered body was visually observed. Before and after heat treatment, discoloration was not observed on the surface of the copper sintered body, and surface oxidation was suppressed. In this respect, it was confirmed that the wiring board of the present invention has good durability against the use environment.

於實施例9之銅燒結體中,以與實施例2相同程度之空隙率分佈有複數個空隙。因此,可推測當對聚醯亞胺清漆進行加熱而使之硬化時,樹脂基板之樹脂經由銅燒結體內之連結之空隙潤濕擴散至銅燒結體與燒結用構件之界面,藉此形成燒結體之樹脂表面層。In the copper sintered body of Example 9, a plurality of voids are distributed with the same porosity as that of Example 2. Therefore, it can be speculated that when the polyimide varnish is heated and hardened, the resin of the resin substrate wets and diffuses to the interface between the copper sintered body and the member for sintering through the connection gap in the copper sintered body, thereby forming a sintered body The resin surface layer.

[比較例5] 以與比較例1相同之方法製作複數個銅燒結體之樣品,以與實施例9相同之順序,藉由SEM觀察銅燒結體之表面附近之截面組織,進而實施加熱處理,目測觀察銅燒結體之表面。其結果,於銅燒結體之表面未觀察到樹脂表面層。進而,關於在200℃、250℃及300℃之各溫度下進行了加熱處理之銅燒結體,其表面均變成黑灰色,表面被氧化。 [Comparative Example 5] A plurality of samples of the copper sintered body were produced in the same manner as in Comparative Example 1, and in the same order as in Example 9, the cross-sectional structure near the surface of the copper sintered body was observed by SEM, and then heat treatment was performed, and the copper sintered body was visually observed the surface. As a result, no resin surface layer was observed on the surface of the copper sintered body. Furthermore, the surface of the copper sintered body heat-processed at each temperature of 200 degreeC, 250 degreeC, and 300 degreeC was dark gray, and the surface was oxidized.

由於比較例5之銅燒結體比實施例9更多地進行了燒結處理,故而與比較例1同樣,空隙之分佈比率較小。因此,可推測於該銅燒結體中不存在樹脂基板之樹脂可通過之程度的相連結之空隙,並沒有形成樹脂表面層。Since the copper sintered body of Comparative Example 5 was more sintered than that of Example 9, the distribution ratio of the voids was small as in Comparative Example 1. Therefore, it is presumed that in this copper sintered body, there are no interconnected voids to the extent that the resin of the resin substrate can pass, and no resin surface layer is formed.

1:配線基板 2:樹脂基板 3:燒結體 4:空隙 4a:空隙 4b:空隙 4c:空隙 4d:空隙 5:燒結用構件 6:燒結體 7:溶液 8:樹脂基板層 9:開口部 10:開口部 11:銅燒結體 12:樹脂基板 13:空隙 14:空隙 15:樹脂 16:交界面(虛線) 17:樹脂表面層 21a:樹脂基板之一部分 21b:樹脂基板之一部分 21c:樹脂基板之一部分 41a:開口部 41b:開口部 41c:開口部 41d:開口部 1: Wiring board 2: Resin substrate 3: Sintered body 4: Gap 4a: Void 4b: Void 4c: Void 4d: Void 5: Components for sintering 6: Sintered body 7: Solution 8: Resin substrate layer 9: Opening 10: Opening 11: copper sintered body 12: Resin substrate 13: Gap 14: Gap 15: Resin 16: Interface (dotted line) 17: Resin surface layer 21a: Part of the resin substrate 21b: Part of the resin substrate 21c: Part of the resin substrate 41a: opening 41b: opening 41c: opening 41d: opening

圖1係表示本實施方式之配線基板之截面之模式圖。 圖2係用於說明本實施方式之配線基板之製造方法之模式圖,(a)及(b)係表示燒結體形成步驟之圖,(c)係表示樹脂之塗佈步驟之圖,(d)係表示樹脂之硬化步驟之圖,(e)係表示剝離步驟之圖。 圖3A係表示實施例2之試樣中的樹脂基板及燒結體之截面之掃描式電子顯微鏡照片之圖。 圖3B係將圖3A中之燒結體之截面組織放大之圖。 圖3C係表示針對圖3B進行了二值化處理之組織之圖。 圖4係表示實施例2之試樣中的樹脂基板與燒結體之交界附近之截面之圖。 圖5係表示實施例2之試樣中之燒結體之樹脂表面層之圖。 FIG. 1 is a schematic diagram showing a cross section of a wiring board according to this embodiment. 2 is a schematic diagram for explaining the manufacturing method of the wiring board of this embodiment, (a) and (b) are diagrams showing steps of forming a sintered body, (c) is a diagram showing a resin coating step, (d ) is a diagram showing the hardening step of the resin, and (e) is a diagram showing the peeling step. 3A is a diagram showing a scanning electron micrograph of a cross-section of a resin substrate and a sintered body in a sample of Example 2. FIG. Fig. 3B is an enlarged view of the cross-sectional structure of the sintered body in Fig. 3A. FIG. 3C is a diagram showing a structure subjected to binarization processing with respect to FIG. 3B . FIG. 4 is a view showing a cross section near the boundary between the resin substrate and the sintered body in the sample of Example 2. FIG. FIG. 5 is a view showing a resin surface layer of a sintered body in a sample of Example 2. FIG.

1:配線基板 2:樹脂基板 3:燒結體 4a:空隙 4b:空隙 4c:空隙 4d:空隙 21a:樹脂基板之一部分 21b:樹脂基板之一部分 21c:樹脂基板之一部分 41a:開口部 41b:開口部 41c:開口部 41d:開口部 1: Wiring board 2: Resin substrate 3: Sintered body 4a: Void 4b: Void 4c: Void 4d: Void 21a: Part of the resin substrate 21b: Part of the resin substrate 21c: Part of the resin substrate 41a: opening 41b: opening 41c: opening 41d: opening

Claims (10)

一種配線基板,其係具有樹脂基板及金屬配線者,且上述金屬配線包含金屬粒子之燒結體,上述燒結體具有複數個空隙,上述空隙具備朝向上述樹脂基板之開口部,上述樹脂基板之一部分自上述開口部進入至上述空隙中,上述燒結體中,樹脂表面層覆蓋位於與上述樹脂基板相接之交界面為相反側的表面。 A wiring substrate having a resin substrate and metal wiring, wherein the metal wiring includes a sintered body of metal particles, the sintered body has a plurality of voids, the voids have openings facing the resin substrate, and a part of the resin substrate is formed from The opening enters into the void, and in the sintered body, the resin surface layer covers the surface on the opposite side to the interface with the resin substrate. 如請求項1之配線基板,其中上述金屬粒子包含選自由銅、銀及鎳所組成之群中之1種以上。 The wiring board according to claim 1, wherein the metal particles include one or more selected from the group consisting of copper, silver, and nickel. 如請求項1或2之配線基板,其中上述空隙之比率為1體積%以上30體積%以下。 The wiring board according to claim 1 or 2, wherein the ratio of the voids is 1% by volume or more and 30% by volume or less. 如請求項1或2之配線基板,其中上述空隙之一部分連結,自上述開口部進入之上述樹脂基板之一部分連結。 The wiring board according to claim 1 or 2, wherein a part of the above-mentioned gap is connected, and a part of the above-mentioned resin substrate entering from the above-mentioned opening is connected. 如請求項1或2之配線基板,其中上述燒結體之上述空隙包含具有導電性之金屬元素。 The wiring board according to claim 1 or 2, wherein the voids of the sintered body contain a metal element having conductivity. 一種配線基板之製造方法,其係製造如請求項1至5中任一項之配線 基板之方法,該配線基板具有樹脂基板及包含金屬粒子燒結體之金屬配線,其包括:燒結體形成步驟,係於燒結用構件上形成上述燒結體;塗佈步驟,係於上述燒結用構件上,於上述燒結體之表面及上述燒結體之周圍塗佈包含樹脂成分之溶液;硬化步驟,係使上述樹脂成分硬化而形成樹脂基板;及剝離步驟,係自上述燒結用構件剝離上述燒結體及上述樹脂基板。 A method of manufacturing a wiring substrate, which is to manufacture the wiring according to any one of claims 1 to 5 A method for a substrate, the wiring substrate having a resin substrate and metal wiring including a sintered body of metal particles, comprising: a sintered body forming step of forming the sintered body on a member for sintering; a coating step of forming the sintered body on the member for sintering , coating a solution containing a resin component on the surface of the above-mentioned sintered body and the periphery of the above-mentioned sintered body; a hardening step of curing the above-mentioned resin component to form a resin substrate; and a peeling step of peeling the above-mentioned sintered body and The aforementioned resin substrate. 如請求項6之配線基板之製造方法,其中上述溶液包含樹脂之前驅物物質或樹脂之聚合性單體。 The method of manufacturing a wiring board according to claim 6, wherein the solution contains a resin precursor material or a polymerizable monomer of the resin. 一種配線基板之製造方法,其係製造如請求項1至5中任一項之配線基板之方法,該配線基板具有樹脂基板及包含金屬粒子燒結體之金屬配線,其包括:準備樹脂基板之步驟;及燒結體形成步驟,係於上述樹脂基板形成上述燒結體。 A method of manufacturing a wiring board, which is a method of manufacturing a wiring board according to any one of claims 1 to 5, the wiring board having a resin substrate and metal wiring including a sintered metal particle, comprising: a step of preparing the resin substrate and a sintered body forming step, forming the above-mentioned sintered body on the above-mentioned resin substrate. 如請求項8之配線基板之製造方法,其包括於上述樹脂基板上塗佈包含樹脂成分之溶液,使上述樹脂成分硬化而形成界面樹脂層之步驟,且上述燒結體形成步驟包括於上述界面樹脂層上形成上述燒結體。 The method of manufacturing a wiring board according to Claim 8, which includes the steps of applying a solution containing a resin component on the above-mentioned resin substrate, curing the above-mentioned resin component to form an interface resin layer, and the above-mentioned step of forming the sintered body is included in the above-mentioned interface resin. The above-mentioned sintered body is formed on the layer. 如請求項9之配線基板之製造方法,其中上述溶液包含樹脂之前驅物物質或樹脂之聚合性單體。 The method of manufacturing a wiring board according to claim 9, wherein the solution contains a resin precursor material or a polymerizable monomer of the resin.
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Citations (4)

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Publication number Priority date Publication date Assignee Title
CN1697588A (en) * 2004-05-11 2005-11-16 株式会社理光 A pattern form object and a manufacturing method thereof
JP2016110690A (en) * 2014-12-01 2016-06-20 大日本印刷株式会社 Conductive substrate
TW201640521A (en) * 2014-12-22 2016-11-16 阿格法及維爾特公司 A metallic nanoparticle dispersion
TWI645973B (en) * 2017-12-15 2019-01-01 律勝科技股份有限公司 Polyimide thinned flexible substrate and manufacturing method thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1697588A (en) * 2004-05-11 2005-11-16 株式会社理光 A pattern form object and a manufacturing method thereof
JP2016110690A (en) * 2014-12-01 2016-06-20 大日本印刷株式会社 Conductive substrate
TW201640521A (en) * 2014-12-22 2016-11-16 阿格法及維爾特公司 A metallic nanoparticle dispersion
TWI645973B (en) * 2017-12-15 2019-01-01 律勝科技股份有限公司 Polyimide thinned flexible substrate and manufacturing method thereof

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