TWI773003B - Material modification system - Google Patents
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Abstract
本發明的材料改質系統包括脈衝產生裝置及視覺對準裝置。脈衝產生裝置包括物鏡,且用以透過物鏡投射雷射光,以對物件的改質層進行改質作業。視覺對準裝置連接脈衝產生裝置,且包括照明單元、影像感測單元及對焦單元。照明單元用以對物件投射可見光束。影像感測單元包括視覺範圍,用以感測物件反射的可見光束,以產生視覺資訊,視覺資訊包括觀察距離,用以調整物鏡相對物件的高度。對焦單元包括雷射偵測範圍。雷射偵測範圍在視覺範圍內,對焦單元偵測雷射偵測範圍內物件的改質層的缺陷範圍的對焦資訊,對焦資訊包括聚焦距離。聚焦距離是物鏡被推動的距離,以讓雷射光聚焦在改質層。The material modification system of the present invention includes a pulse generating device and a visual alignment device. The pulse generating device includes an objective lens, and is used for projecting laser light through the objective lens, so as to modify the modified layer of the object. The visual alignment device is connected to the pulse generating device, and includes an illumination unit, an image sensing unit and a focusing unit. The lighting unit is used for projecting visible light beams on the object. The image sensing unit includes a visual range for sensing the visible light beam reflected by the object to generate visual information, and the visual information includes a viewing distance for adjusting the height of the objective lens relative to the object. The focusing unit includes a laser detection range. The laser detection range is within the visual range, and the focusing unit detects the focus information of the defect range of the modified layer of the object within the laser detection range, and the focus information includes the focus distance. The focusing distance is the distance the objective lens is pushed to focus the laser light on the modified layer.
Description
本發明與液晶面板缺陷維修設備有關,特別是指一種材料改質系統。 The present invention is related to liquid crystal panel defect repair equipment, and particularly refers to a material modification system.
液晶面板是經由一系列已知製程製造而成,為了確保液晶面板的品質及良率,通常製造完成後需經進行檢查,以確定液晶面板沒有存在缺陷,例如亮點或漏光,這類缺陷導致液晶面板無法呈現全部黑色,也就是光線可穿透液晶面板的彩色濾光片而向外顯現。 Liquid crystal panels are manufactured through a series of known processes. In order to ensure the quality and yield of the liquid crystal panel, it is usually necessary to inspect the liquid crystal panel after the manufacturing is completed to confirm that the liquid crystal panel does not have defects, such as bright spots or light leakage. The panel cannot display all black, that is, light can penetrate the color filter of the LCD panel and appear outward.
目前雷射對焦的方式通常是透過視覺影像方式對焦,也就是透過影像感測元件來感測亮點位置,並在確定亮點位置後以雷射進行改質作業,以讓彩色濾光片的其中一像素黑化。但在液晶面板的結構已知彩色濾光片是液晶面板內部的其中一層結構,而視覺影像僅是觀察液晶面板的表面影像,因此,透過影像感測元件雖然能知道亮點位置,且影像感測器的焦點並不是針對彩色濾光片,所以雷射不是直接針對彩色濾光片進行改質,而無法實現準確作業。 The current method of laser focusing is usually through visual image focusing, that is, the position of the bright spot is sensed through an image sensing element, and after the position of the bright spot is determined, the laser is used to modify the operation, so that one of the color filters Pixel blackening. However, in the structure of the liquid crystal panel, it is known that the color filter is one of the structures inside the liquid crystal panel, and the visual image is only to observe the surface image of the liquid crystal panel. The focus of the laser is not on the color filter, so the laser is not directly modified for the color filter, and it cannot achieve accurate operation.
有鑑於上述缺失,本發明的材料改質系統用以透過視覺觀察方式找出亮點位置後透過雷射對焦來讓調變後雷射光能準確對焦在改質層的缺陷範圍,進而讓缺陷範圍黑化。 In view of the above deficiencies, the material modification system of the present invention is used to find the position of the bright spot through visual observation, and then focus through the laser, so that the modulated laser light can be accurately focused on the defect area of the modified layer, thereby making the defect area black. change.
為了達成上述目的,本發明的材料改質系統包括脈衝產生裝置及視覺對準裝置。脈衝產生裝置包括物鏡,且用以透過物鏡投射雷射光,以對物件的改質層進行改質作業。視覺對準裝置連接脈衝產生裝置,且包括照明單元、影像感測單元及對焦單元。照明單元用以對物件投射可見光束。影像感測單元包括視覺範圍,用以感測物件反射的可見光束,以產生視覺資訊,視覺資訊包括觀察距離,用以調整物鏡相對物件的高度。對焦單元包括雷射偵測範圍。雷射偵測範圍在視覺範圍內,對焦單元偵測雷射偵測範圍內物件的改質層的缺陷範圍的對焦資訊,對焦資訊包括聚焦距離。聚焦距離是物鏡被推動的距離,以讓雷射光聚焦在改質層。 In order to achieve the above object, the material modification system of the present invention includes a pulse generating device and a visual alignment device. The pulse generating device includes an objective lens, and is used for projecting laser light through the objective lens, so as to modify the modified layer of the object. The visual alignment device is connected to the pulse generating device, and includes an illumination unit, an image sensing unit and a focusing unit. The lighting unit is used for projecting visible light beams on the object. The image sensing unit includes a visual range for sensing the visible light beam reflected by the object to generate visual information, and the visual information includes a viewing distance for adjusting the height of the objective lens relative to the object. The focusing unit includes a laser detection range. The laser detection range is within the visual range, and the focusing unit detects the focus information of the defect range of the modified layer of the object within the laser detection range, and the focus information includes the focus distance. The focusing distance is the distance the objective lens is pushed to focus the laser light on the modified layer.
如此,本發明的材料改質系統能透過對焦單元準確的對焦缺陷範圍,以使雷射光能準確地聚焦在缺陷範圍內,來達成均勻且有效率地改質缺陷範圍。 In this way, the material modification system of the present invention can accurately focus the defect range through the focusing unit, so that the laser light can be accurately focused in the defect range, so as to achieve uniform and efficient modification of the defect range.
有關本創作所提供的材料改質系統的詳細組成、步驟、構造、特點、運作或使用方式,將於後續的實施方式詳細說明中予以描述。然而,在本發明領域中具有通常知識者應能瞭解,該等詳細說明以及實施本發明所列舉的特定實施例,僅係用於說明本發明,並非用以限制本發明之專利申請範圍。 The detailed composition, steps, structure, characteristics, operation or usage of the material modification system provided by the present creation will be described in the detailed description of the subsequent implementation manner. However, those with ordinary knowledge in the field of the present invention should understand that these detailed descriptions and specific embodiments for implementing the present invention are only used to illustrate the present invention, and are not intended to limit the scope of the patent application of the present invention.
100:材料改質系統 100: Material modification system
10:脈衝產生裝置 10: Pulse generator
11:雷射源 11: Laser source
13:脈衝強度調整單元 13: Pulse intensity adjustment unit
15:脈衝調變單元 15: Pulse modulation unit
151:第一反射鏡 151: First reflector
153:脈衝柵控器 153: Pulse gate controller
155:第二反射鏡 155: Second reflector
157:訊號產生模組 157: Signal generation module
158:射頻驅動模組 158: RF driver module
159:調變輸出模組 159: Modulation output module
17:掃描單元 17: Scanning unit
18:中繼透鏡 18: Relay lens
19:脈衝輸出單元 19: Pulse output unit
191:耦合鏡 191: Coupling mirror
193:物鏡 193: Objective lens
195:Z軸調整模組 195:Z axis adjustment module
30:視覺對準裝置 30: Vision alignment device
31:傳遞單元 31: Delivery unit
33:照明單元 33: Lighting unit
35:影像感測單元 35: Image Sensing Unit
37:對焦單元 37: Focusing unit
371:發射模組 371: Launch Module
373:感測模組 373: Sensing Module
375:處理模組 375: Processing Mods
50:液晶面板 50: LCD panel
51:表面 51: Surface
53:改質層 53: Modified layer
700:對焦流程 700: Focus Process
701-709:步驟 701-709: Steps
91:視覺資訊 91: Visual Information
93:亮點 93: Highlights
95:缺陷範圍 95: Defect Range
TD:工作週期 T D : duty cycle
Tn:導通時間 Tn: On-time
To:關閉時間 To: closing time
S157:光柵調變訊號 S157: Grating modulation signal
Si:雷射光 Si: laser light
圖1是本發明的材料改質系統的組成示意圖。 FIG. 1 is a schematic diagram of the composition of the material modification system of the present invention.
圖2是圖1中對焦單元的組成示意圖。 FIG. 2 is a schematic diagram of the composition of the focusing unit in FIG. 1 .
圖3是圖1中脈衝調變單元的脈衝柵控器的組成示意圖。 FIG. 3 is a schematic diagram of the composition of the pulse gate controller of the pulse modulation unit in FIG. 1 .
圖4是圖1中雷射光、光柵調變訊號及調變後雷射光的時域訊號圖。 FIG. 4 is a time domain signal diagram of the laser light, the grating modulation signal and the modulated laser light in FIG. 1 .
圖5是圖1中對焦流程的步驟流程圖。 FIG. 5 is a flow chart of the steps of the focusing process in FIG. 1 .
圖6是圖5中步驟701-703找到液晶面板亮點位置的視覺範圍的示意圖。 FIG. 6 is a schematic diagram of the visual range for finding the position of the bright spot of the liquid crystal panel in steps 701-703 in FIG. 5 .
圖7是圖1中脈衝輸出單元、視覺對準裝置及液晶面板的示意圖。 FIG. 7 is a schematic diagram of the pulse output unit, the visual alignment device and the liquid crystal panel in FIG. 1 .
圖8是圖5中步驟709改質後的視覺範圍的示意圖。
FIG. 8 is a schematic diagram of the visual range after
以下,茲配合各圖式列舉對應之較佳實施例來對本發明的材料改質系統的組成構件、步驟、光路、連接及達成功效來作說明。然各圖式中材料改質系統的組成、光學元件、數量、構件、尺寸、外觀及步驟僅用來說明本發明的技術特徵,而非對本發明構成限制。 Hereinafter, the corresponding preferred embodiments are listed with the drawings to illustrate the components, steps, optical paths, connections and achieved effects of the material modification system of the present invention. However, the composition, optical elements, number, components, dimensions, appearance and steps of the material modification system in the drawings are only used to illustrate the technical features of the present invention, but not to limit the present invention.
如圖1所示,本發明的材料改質系統100包括脈衝產生裝置10及視覺對準裝置30。上述的改質是透過脈衝產生裝置10輸出的脈衝特性將原材料的特性改變的行為,本實施例中,物件以液晶面板50為例,改質對象是液晶面板50的彩色濾光片或其他光膜,以使部分材料黑化來遮蔽光線。
As shown in FIG. 1 , the
其中,上述裝置可以包括較實施例有更多或較少透鏡、反射鏡等光學元件,以改變光的傳遞,因此,隨後實施例是便於描述本發明,而非明示或暗示本發明光學元件的使用數量限制,故不能被理解成對本發明的限制。 Wherein, the above-mentioned device may include more or less optical elements such as lenses, mirrors, etc. than the embodiment, so as to change the transmission of light. Therefore, the following embodiments are for the convenience of describing the present invention, rather than expressing or implying the optical elements of the present invention. Quantitative limitations are used and therefore should not be construed as limiting the invention.
脈衝產生裝置10包括雷射源11、脈衝強度調整單元13、脈衝調變單元15、掃描單元17、中繼透鏡(relay lens)18及脈衝輸出單元19。雷射源11用以
輻射出近紅外線波長之雷射光,雷射光包括多個短脈衝(如圖4所示)。脈衝強度調整單元13用以調整多個短脈衝強度。脈衝調變單元15用以透過光柵調變訊號來調變雷射光,以調控雷射光的多個短脈衝輸出頻率及峰值功率。掃描單元17用以改變雷射光的反射角度。脈衝輸出單元19用以對液晶面板50的改質層的缺陷範圍投射調變後雷射光。其中,雷射源11輸出的雷射光依序通過脈衝強度調整單元13、脈衝調變單元15、掃描單元17、中繼透鏡18及脈衝輸出單元19。
The
短脈衝的時域脈衝寬度是飛秒量級,飛秒量級是以千億分之一秒的時間輸出大致相同的功率,以產生多光子吸收使液晶面板的彩色濾光片的缺陷像素瞬間改質成黑化,來阻斷背光源的光線透出,達到亮點暗化效果。 The time-domain pulse width of the short pulse is on the order of femtoseconds, and the femtosecond order is about the same power output in one hundred billionth of a second to generate multiphoton absorption to make the defective pixels of the color filter of the liquid crystal panel instantaneous. It is modified into blackening to block the light from the backlight source and achieve the effect of darkening the bright spots.
脈衝強度調整單元13包括偏極片,透過調整偏極片角度來改變雷射光偏極方向來達成調整雷射強度。偏極片的偏振方向與雷射光偏極方向平行時輸出功率最強,偏極片的偏振方向與雷射偏極傳遞方向垂直時輸出功率最弱。
The pulse
脈衝調變單元15包括第一反射鏡151、脈衝柵控器153及第二反射鏡155。第一反射鏡151用以反射脈衝強度調整單元13輸出的雷射光。脈衝柵控器153位在第一反射鏡151及第二反射鏡153之間,以接收第一反射鏡151反射的雷射光。第二反射鏡155用以反射脈衝柵控器153調變後雷射光至掃描單元17。
The
掃描單元17具有X-Y雷射振鏡,以改變雷射光偏轉角度。掃描單元17用以掃描液晶面板50的彩色濾光片的缺陷(像素)範圍,並規劃掃描路徑,以符合缺陷(像素)範圍。
The
中繼透鏡18接收掃描單元17輸出的雷射光,並傳遞雷射光至脈衝輸出單元19。中繼透鏡18用以收束掃描單元17輸出的雷射光,以使調變後雷射光能確實傳遞至脈衝輸出單元19。
The
脈衝輸出單元19接收中繼透鏡18輸出的調變後雷射光,且包括耦合鏡191、物鏡193及Z軸調整模組195。調變後雷射光依序通過耦合鏡191及物鏡193。耦合鏡191及物鏡193耦接Z軸調整模組195。Z軸調整模組195用以往上或往下移動耦合鏡191及物鏡193。
The
本實施例中,耦合鏡191及物鏡193之間的距離是固定不變,且,視覺對準裝置30設置在Z軸調整模組195上,因此,移動過程中,耦合鏡191、物鏡193及視覺對準裝置30都同步移動,其他實施例中,Z軸調整模組195也可以只移動物鏡193或耦合鏡191。
In this embodiment, the distance between the
視覺對準裝置30用以產生視覺影像及對焦,以讓雷射加工作業準確及可透過肉眼觀察改質過程。視覺對準裝置30包括傳遞單元31、照明單元33、影像感測單元35及對焦單元37。傳遞單元31用以傳遞光束,例如可見光或雷射光,以讓光束傳遞至目的地,例如耦合鏡191、影像感測單元35及對焦單元37。照明單元33用以產生可見光束,可見光束透過傳遞單元31及脈衝輸出單元19的耦合鏡191投射至液晶面板50。
The
影像感測單元35包括視覺範圍,用以感測液晶面板50反射的可見光束,以產生視覺資訊。視覺資訊包括觀察距離,觀察距離用以調整物鏡193相對液晶面板50的高度,可見光束的反射光透過脈衝輸出單元19的耦合鏡191及傳遞單元31傳給影像感測單元35。
The
對焦單元37包括雷射偵測範圍,雷射偵測範圍在視覺範圍內,對焦單元37在雷射偵測範圍內偵測液晶面板50的改質層的缺陷範圍的對焦資訊,對焦資訊包括聚焦距離,聚焦距離是物鏡193被推動的距離。
The focusing
如圖2所示,對焦單元37包括發射模組371、感測模組373及處理模組375。發射模組371用以產生對焦雷射。感測模組373用以感測由改質層的缺陷範圍反射的對焦雷射。本實施例中,感測模組373感測反射的對焦雷射的一半光束,另一半光束會被遮住,而不被感測,透過一半光束來識別是否完成聚(對)焦。處理模組375耦接發射模組371、感測模組373及Z軸調整模組195。處理模組375依據對焦雷射往返的時間計算聚焦距離,來控制Z軸調整模組195,以推動物鏡193上升或下降來讓雷射更為準確。
As shown in FIG. 2 , the focusing
如圖3及圖4所示,脈衝柵控器153例如聲光調變器(Acousto-Optic Mmodulator,AOM),且用以調變雷射光的工作週期TD。工作週期TD包括導通時間Tn及關閉時間To,在導通時間Tn內脈衝柵控器153允許雷射光對應時域的短脈衝輸出至第二反射鏡155,在關閉時間To內脈衝柵控器153不允許雷射光對應時域的短脈衝輸出至第二反射鏡155。本實施例中,雷射光對應時域是指時域訊號的雷射光與工作週期TD的時間重疊。
As shown in FIG. 3 and FIG. 4 , the
脈衝柵控器153包括訊號產生模組157、射頻驅動模組158及調變輸出模組159。訊號產生模組157耦接射頻驅動模組158,且用以輸出光柵調變訊號,如圖4的符號S157,調變是指週期或振幅可被改變。射頻驅動模組158接收及傳遞光柵調變訊號S157。調整輸出模組159接收光柵調變訊號S157及自第一反射鏡151輸入的雷射光Si,並依據光柵調變訊號S157的工作週期輸出調變後雷射光SO。如此,雷射改質的過程中可透過工作週期TD的關閉時間To來進行散熱,而減少熱累積,此外,工作週期TD的導通時間Tn內會間歇輸出多個短脈衝以均勻地修補彩色濾光片的像素範圍,以使其黑化來阻擋光線。
The
如圖5所示,本發明的材料改質系統的對焦流程700包括步驟701:偵測液晶面板的亮點,接著,步驟703:調整物鏡193與液晶面板的相對高度,透過Z軸調整模組195調整脈衝輸出單元19的物鏡193與液晶面板50相對的觀察距離,以清楚識別亮點位置的影像,再來,步驟705:對焦液晶面板50的改質層,對焦單元37偵測並對焦液晶面板50的改質層,以取得改質層與物鏡193相對的聚焦距離,然後,步驟707:調整物鏡193與液晶面板的改質層的相對高度,以使雷射光聚焦在改質層,依據聚焦距離透過Z軸調整模組195調整物鏡193與液晶面板50的改質層相對高度,最後,步驟709:輸出雷射光以對改質層進行改質。其中,步驟705-709中更精確地說是對焦或改質改質層的缺陷範圍,即特定像素範圍。
As shown in FIG. 5 , the focusing process 700 of the material modification system of the present invention includes step 701 : detecting the bright spot of the liquid crystal panel, and then step 703 : adjusting the relative height of the
液晶面板的背光源點亮後,在全黑的畫面中可以透過步驟701清楚識別液晶面板的表面是否存在亮點。步驟701中,偵測是透過影像感測單元偵測液晶面板反射回來的可見光束,反射的可見光束透過影像感測單元產生視覺資訊91,如圖6所示。矩形虛線框代表缺陷(像素)範圍95,亮點93在缺陷範圍95內。影像感測單元35具有視覺範圍90,視覺範圍90是可透過顯示器呈現的畫面,例如液晶面板的局部表面外觀。視覺資訊91與視覺範圍90有關。
After the backlight of the liquid crystal panel is turned on, it can be clearly identified whether there is a bright spot on the surface of the liquid crystal panel through
步驟703中,調整是透過Z軸調整模組195來調整。如圖7所示,為了清楚識別亮點93,可透過手動或自動調整Z軸調整模組195,以改變物鏡191與液晶面板50的表面51相對的觀察距離,進而找出清晰影像,如圖6所示,如此,顯示器能清晰地顯示亮點93及範圍。透過清晰影像以確認亮點93對應液晶面板50的彩色濾光片(改質層)的對應像素。
In
步驟705中,對焦是透過對焦單元37來進行,且對焦單元37以液晶面板50的改質層(即彩色濾光片)53的缺陷範圍進行對焦,這個步驟也是找出雷射光對焦在改質層53的缺陷範圍的相對高度,也就是物鏡193與缺陷範圍之間相對的聚焦距離。
In
本實施例中,對焦單元37用以透過對焦雷射偵測液晶面板50的改質層的對焦資訊,對焦資訊包括聚焦形狀及失焦形狀。對焦資訊位在視覺範圍內,可見光、雷射光及對焦雷射投射至物件50的加工位置是重疊的。聚焦形狀及失焦形狀與反射的對焦雷射的光束輪廓有關,光束輪廓構成的形狀例如圓形時,由於感測模組是感測一半光束,因此,失焦時,失焦形狀是不完整的圖案,例如半圓形,且光束輪廓是不清晰。聚焦時,聚焦形狀是完整的圖案,例如點,且光束輪廓大致是清晰的。其他實施例中,光束輪廓的形狀若是其他形狀,例如,正方形或其他形狀時,聚焦形狀可以是線、或點及線的組合。對焦單元37的處理模組375依據聚焦形狀決定聚焦距離。
In this embodiment, the focusing
步驟707中調整是透過Z軸調整模組195來調整。依據聚焦距離微調物鏡193與液晶面板50的改質層相對高度,以讓調變後雷射光大致聚焦在改質層,最後,步驟709輸出的雷射光就能正確地在改質層的缺陷範圍95(即對應像素範圍)上進行改質,以讓對應的像素黑化來達成遮蔽光線的效果,如圖8所示,缺陷範圍95已被改質成黑化,以遮蔽光背光源光線。
The adjustment in
如圖7所示,液晶面板50的彩色濾光片53是在表面51的下方,因此,透過步驟705及707可以更為準確地將雷射光對焦在改質層上,以更均勻地改質材料,並可避免相鄰材料剝落。
As shown in FIG. 7 , the
最後,再次強調,本創作於前揭實施例中所揭露的構成元件,僅為舉例說明,並非用來限制本案之範圍,其他等效元件的替代或變化,亦應為本案之申請專利範圍所涵蓋。 Finally, it is emphasized again that the constituent elements disclosed in the foregoing embodiments of the present creation are only for illustration and are not intended to limit the scope of this application. The substitution or variation of other equivalent elements shall also be covered by the scope of the patent application of this application. covered.
100 : 材料改質系統 10 : 脈衝產生裝置 11 : 雷射源 13 : 脈衝強度調整單元 15 : 脈衝調變單元 151 : 第一反射鏡 153 : 脈衝柵控器 155 : 第二反射鏡 17 : 掃描單元18 : 中繼透鏡 19 : 脈衝輸出單元 191 : 耦合鏡 193 : 物鏡 195 : Z軸調整模組 30 : 視覺對準裝置 31 : 傳遞單元 33 : 照明單元 35 : 影像感測單元 37 : 對焦單元 50 : 液晶面板 100 : Material modification system 10 : Pulse generator 11 : Laser source 13 : Pulse Intensity Adjustment Unit 15 : Pulse Modulation Unit 151 : First reflector 153 : Pulse Gate Controller 155 : Second reflector 17 : Scanning unit 18 : Relay lens 19 : Pulse output unit 191 : Coupling mirror 193 : Objectives 195 : Z-axis adjustment module 30 : Vision Alignment Device 31 : Transfer Unit 33 : Lighting unit 35 : Image Sensing Unit 37 : Focus Unit 50 : LCD panel
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Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004335717A (en) * | 2003-05-07 | 2004-11-25 | Canon Inc | Laser repairing apparatus |
TW200807062A (en) * | 2006-03-10 | 2008-02-01 | Samsung Electronics Co Ltd | Apparatus for reparing pixel of display device |
JP2011110591A (en) * | 2009-11-27 | 2011-06-09 | Pioneer Electronic Corp | Laser machining device |
TWI463210B (en) * | 2011-07-27 | 2014-12-01 | Mitsuboshi Diamond Ind Co Ltd | A focus position adjustment method, a focus position adjustment device, and a laser processing apparatus |
TW201538260A (en) * | 2014-03-14 | 2015-10-16 | Tokyo Seimitsu Co Ltd | Laser dicing apparatus and dicing method |
TW201808506A (en) * | 2016-03-10 | 2018-03-16 | 濱松赫德尼古斯股份有限公司 | Laser light radiation device and laser light radiation method |
JP6481842B1 (en) * | 2018-03-20 | 2019-03-13 | 株式会社東京精密 | Laser processing apparatus and laser processing method |
JP2019147191A (en) * | 2019-05-21 | 2019-09-05 | 株式会社東京精密 | Confirmation device and confirmation method for laser material processing region |
JP2020043337A (en) * | 2016-02-25 | 2020-03-19 | 株式会社東京精密 | Control device and control method |
TWM610420U (en) * | 2020-12-08 | 2021-04-11 | 東捷科技股份有限公司 | Material modification system |
-
2020
- 2020-12-08 TW TW109143236A patent/TWI773003B/en active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004335717A (en) * | 2003-05-07 | 2004-11-25 | Canon Inc | Laser repairing apparatus |
TW200807062A (en) * | 2006-03-10 | 2008-02-01 | Samsung Electronics Co Ltd | Apparatus for reparing pixel of display device |
JP2011110591A (en) * | 2009-11-27 | 2011-06-09 | Pioneer Electronic Corp | Laser machining device |
TWI463210B (en) * | 2011-07-27 | 2014-12-01 | Mitsuboshi Diamond Ind Co Ltd | A focus position adjustment method, a focus position adjustment device, and a laser processing apparatus |
TW201538260A (en) * | 2014-03-14 | 2015-10-16 | Tokyo Seimitsu Co Ltd | Laser dicing apparatus and dicing method |
JP2020043337A (en) * | 2016-02-25 | 2020-03-19 | 株式会社東京精密 | Control device and control method |
TW201808506A (en) * | 2016-03-10 | 2018-03-16 | 濱松赫德尼古斯股份有限公司 | Laser light radiation device and laser light radiation method |
JP6481842B1 (en) * | 2018-03-20 | 2019-03-13 | 株式会社東京精密 | Laser processing apparatus and laser processing method |
JP2019147191A (en) * | 2019-05-21 | 2019-09-05 | 株式会社東京精密 | Confirmation device and confirmation method for laser material processing region |
TWM610420U (en) * | 2020-12-08 | 2021-04-11 | 東捷科技股份有限公司 | Material modification system |
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