TWI767408B - Connection structure for use in plasma processing apparatus and plasma processing apparatus - Google Patents

Connection structure for use in plasma processing apparatus and plasma processing apparatus Download PDF

Info

Publication number
TWI767408B
TWI767408B TW109139651A TW109139651A TWI767408B TW I767408 B TWI767408 B TW I767408B TW 109139651 A TW109139651 A TW 109139651A TW 109139651 A TW109139651 A TW 109139651A TW I767408 B TWI767408 B TW I767408B
Authority
TW
Taiwan
Prior art keywords
screw
shower head
plasma processing
mounting hole
component
Prior art date
Application number
TW109139651A
Other languages
Chinese (zh)
Other versions
TW202127539A (en
Inventor
楊金全
Original Assignee
大陸商中微半導體設備(上海)股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大陸商中微半導體設備(上海)股份有限公司 filed Critical 大陸商中微半導體設備(上海)股份有限公司
Publication of TW202127539A publication Critical patent/TW202127539A/en
Application granted granted Critical
Publication of TWI767408B publication Critical patent/TWI767408B/en

Links

Images

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16BDEVICES FOR FASTENING OR SECURING CONSTRUCTIONAL ELEMENTS OR MACHINE PARTS TOGETHER, e.g. NAILS, BOLTS, CIRCLIPS, CLAMPS, CLIPS OR WEDGES; JOINTS OR JOINTING
    • F16B5/00Joining sheets or plates, e.g. panels, to one another or to strips or bars parallel to them
    • F16B5/02Joining sheets or plates, e.g. panels, to one another or to strips or bars parallel to them by means of fastening members using screw-thread
    • F16B5/0208Joining sheets or plates, e.g. panels, to one another or to strips or bars parallel to them by means of fastening members using screw-thread using panel fasteners, i.e. permanent attachments allowing for quick assembly
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16BDEVICES FOR FASTENING OR SECURING CONSTRUCTIONAL ELEMENTS OR MACHINE PARTS TOGETHER, e.g. NAILS, BOLTS, CIRCLIPS, CLAMPS, CLIPS OR WEDGES; JOINTS OR JOINTING
    • F16B11/00Connecting constructional elements or machine parts by sticking or pressing them together, e.g. cold pressure welding
    • F16B11/006Connecting constructional elements or machine parts by sticking or pressing them together, e.g. cold pressure welding by gluing
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16BDEVICES FOR FASTENING OR SECURING CONSTRUCTIONAL ELEMENTS OR MACHINE PARTS TOGETHER, e.g. NAILS, BOLTS, CIRCLIPS, CLAMPS, CLIPS OR WEDGES; JOINTS OR JOINTING
    • F16B37/00Nuts or like thread-engaging members
    • F16B37/04Devices for fastening nuts to surfaces, e.g. sheets, plates
    • F16B37/048Non-releasable devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32458Vessel
    • H01J37/32477Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

本發明涉及一種用於等離子體處理裝置中的連接結構和等離子體處理裝置。所述連接結構包含第一部件、和具有安裝孔的第二部件;第一連接件位於安裝孔內,與第二部件可拆卸連接;抗腐蝕粘結層位於第一連接件與第一部件之間,實現第一部件與第二部件的可靠連接。本發明使用上述連接結構,連接氣體噴淋頭、安裝基板,使氣體噴淋頭和安裝基板的介面緊密貼合,增加氣體噴淋頭可被消耗的厚度,延長其使用壽命。本發明的等離子體處理裝置,使用上述的氣體噴淋頭,和/或使用上述連接結構來連接該等離子體處理裝置中的各種相鄰部件。The present invention relates to a connection structure used in a plasma processing apparatus and a plasma processing apparatus. The connecting structure includes a first part and a second part with an installation hole; the first connection part is located in the installation hole and is detachably connected with the second part; the anti-corrosion adhesive layer is located between the first connection part and the first part. between the first part and the second part to achieve reliable connection. The present invention uses the above-mentioned connection structure to connect the gas shower head and the mounting substrate, so that the interface between the gas shower head and the mounting substrate is closely attached, thereby increasing the thickness of the gas shower head that can be consumed and prolonging its service life. The plasma processing apparatus of the present invention uses the above-mentioned gas shower head, and/or uses the above-mentioned connecting structure to connect various adjacent components in the plasma processing apparatus.

Description

用於等離子體處理裝置中的連接結構和等離子體處理裝置Connection structure for use in plasma processing apparatus and plasma processing apparatus

本發明涉及半導體製造的技術領域,特別涉及一種用於等離子體處理裝置中的連接結構和等離子體處理裝置。The present invention relates to the technical field of semiconductor manufacturing, and in particular, to a connection structure used in a plasma processing apparatus and a plasma processing apparatus.

等離子體處理裝置用於對基片進行蝕刻、沉積等製程處理。例如在一種電容耦合式的等離子體處理裝置中,包含一反應腔,該反應腔內設置有用於承載基片的基座(對應下電極)、用於引入反應氣體、輔助氣體等至反應腔內的氣體噴淋頭(對應上電極),上下電極之間作為製程區,且上下電極中的任意一個施加有高頻射頻功率,將製程區內的反應氣體解離為等離子體,到達基片上表面的等離子體對基片實施相應的製程處理;等離子體處理裝置在反應腔下部的合適位置設有排氣區域,排氣區域與外部的排氣泵相連接,將處理過程中用過的反應氣體及副產品氣體等抽出反應腔。氣體噴淋頭周圍還設置有一上部接地環,可以對氣體噴淋頭進行支撐,或用於加大氣體噴淋頭橫向面積以改善等離子體處理的均勻性。The plasma processing device is used to perform etching, deposition and other process processing on the substrate. For example, in a capacitively coupled plasma processing device, a reaction chamber is included, and a base (corresponding to a lower electrode) for carrying a substrate is arranged in the reaction chamber, and a reaction gas, auxiliary gas, etc. are introduced into the reaction chamber. The gas shower head (corresponding to the upper electrode), the upper and lower electrodes are used as the process area, and any one of the upper and lower electrodes is applied with high-frequency radio frequency power to dissociate the reactive gas in the process area into plasma, reaching the upper surface of the substrate. The plasma performs corresponding process treatment on the substrate; the plasma treatment device is provided with an exhaust area at a suitable position in the lower part of the reaction chamber, and the exhaust area is connected with an external exhaust pump, and the reaction gas used in the treatment process and By-product gases, etc. are drawn out of the reaction chamber. An upper grounding ring is also arranged around the gas shower head, which can support the gas shower head or be used to increase the lateral area of the gas shower head to improve the uniformity of the plasma treatment.

如圖1所示,氣體噴淋頭11’是具有一定厚度的圓盤形元件,其與圓盤型的安裝基板12’層疊佈置,氣體經過兩板上開設的相連通的通氣孔13’輸送到反應腔內。其中,安裝基板12’典型地由鋁合金製成,能夠對其下方的氣體噴淋頭11’進行支撐;氣體噴淋頭11’典型地是由單晶矽製成,作為上電極。As shown in FIG. 1 , the gas shower head 11 ′ is a disc-shaped element with a certain thickness, which is stacked and arranged with the disc-shaped mounting substrate 12 ′, and the gas is transported through the communicating vent holes 13 ′ opened on the two plates. into the reaction chamber. Wherein, the mounting substrate 12' is typically made of aluminum alloy, which can support the gas shower head 11' below it; the gas shower head 11' is typically made of single crystal silicon, serving as an upper electrode.

目前,氣體噴淋頭11’、安裝基板12’的連接方式,是在氣體噴淋頭11’的頂面分佈地形成多個凹孔14’,在其中固定設置有第一連接件15’(如螺母);安裝基板12’的對應位置,開設有臺階孔16’,對設置在其中的第二連接件17’進行限位;第二連接件17’下端通過臺階孔16’後穿入到凹孔14’內與相適配的第一連接件15’進行連接,使安裝基板12’得以與氣體噴淋頭11’固定連接,並使安裝基板12’的底面與氣體噴淋頭11’的頂面緊密接觸。At present, the connection method of the gas shower head 11' and the mounting substrate 12' is to form a plurality of concave holes 14' distributed on the top surface of the gas shower head 11', and a first connecting member 15' ( A step hole 16' is opened at the corresponding position of the mounting base plate 12' to limit the position of the second connecting piece 17'; the lower end of the second connecting piece 17' passes through the stepped hole 16' and penetrates into the The concave hole 14' is connected with the first connecting piece 15', so that the mounting substrate 12' can be fixedly connected with the gas shower head 11', and the bottom surface of the mounting substrate 12' is connected to the gas shower head 11'. the top surface is in close contact.

此外,氣體噴淋頭11’的厚度(或氣體噴淋頭11’與安裝基板12’組合後的厚度),需處在指定範圍內,以配合諸如氣體輸送的速率、溫控的效果等技術要求,從而保證處理效率及成品品質。然而,氣體噴淋頭11’底面暴露於製程區,容易受到用於蝕刻製程的氣體及等離子體的影響,而使該氣體噴淋頭11’產生材料損耗。凹孔14’的開設使得氣體噴淋頭11’可以消耗的厚度d很少,消耗稍多就可能導致氣體噴淋頭11’整體厚度不足以處在指定範圍,或者導致凹孔14’底部穿透而使第一連接件15’被蝕刻進而影響到連接的可靠性,從而減少了氣體噴淋頭11’的使用壽命;更換新的氣體噴淋頭11’,將極大地浪費成本、人力,影響生產效率。In addition, the thickness of the gas shower head 11' (or the thickness of the combination of the gas shower head 11' and the mounting substrate 12') needs to be within a specified range to match technologies such as the rate of gas delivery and the effect of temperature control. requirements, so as to ensure processing efficiency and finished product quality. However, the bottom surface of the gas shower head 11' is exposed to the process area, and is easily affected by the gas and plasma used in the etching process, which causes the material loss of the gas shower head 11'. The opening of the concave hole 14' makes the thickness d that the gas shower head 11' consumes very small, and a little more consumption may cause the overall thickness of the gas shower head 11' to be insufficient in the specified range, or cause the bottom of the concave hole 14' to penetrate. The first connection piece 15' is etched and thus affects the reliability of the connection, thereby reducing the service life of the gas shower head 11'; replacing the gas shower head 11' with a new one will greatly waste cost and manpower. affect production efficiency.

本發明提供一種用於等離子體處理裝置中的連接結構和等離子體處理裝置,該連接結構可以實現相鄰部件的緊固連接,不必為設置連接件而減少部件本身的厚度,有效延長了部件的使用壽命。The present invention provides a connection structure used in a plasma processing device and a plasma processing device. The connection structure can realize the fast connection of adjacent components without reducing the thickness of the components themselves for the purpose of arranging connectors, thereby effectively prolonging the life of the components. service life.

本發明的一個技術方案是提供一種用於等離子體處理裝置中的連接結構,其包括: 第一部件; 第二部件,其具有安裝孔; 第一連接件,位於所述安裝孔內,與所述第二部件之間可拆卸連接; 抗腐蝕粘結層,用於使所述第一連接件與第一部件結合在一起。A technical solution of the present invention is to provide a connection structure for use in a plasma processing device, comprising: the first part; a second part having mounting holes; a first connector, located in the mounting hole, and detachably connected to the second component; An anti-corrosion adhesive layer for bonding the first connector and the first component together.

較佳地,所述第二部件包括相對的第一表面和第二表面,且所述第一表面朝向第一部件,所述第一連接件從第二部件的第一表面進入安裝孔,在第二部件的第二表面穿出或不穿出。Preferably, the second part comprises an opposite first surface and a second surface, and the first surface faces the first part, the first connector enters the mounting hole from the first surface of the second part, and The second surface of the second member may or may not be pierced.

較佳地,所述安裝孔貫穿第二部件的第一表面和第二表面。Preferably, the mounting holes penetrate through the first surface and the second surface of the second component.

較佳地,所述第一連接件是第一螺栓或第一螺釘,其螺桿的外表面與安裝孔的內表面相適配;所述螺桿在安裝孔內與所述第二部件相連接。Preferably, the first connecting piece is a first bolt or a first screw, and the outer surface of the screw rod matches the inner surface of the mounting hole; the screw rod is connected with the second component in the mounting hole.

較佳地,還包含與第一連接件相適配的第二連接件; 所述第二連接件是第一螺母;所述第一連接件是第一螺栓或第一螺釘,其螺桿的外表面與所述第一螺母的螺孔的內表面相適配; 所述螺桿進入安裝孔與設置在安裝孔內的第一螺母連接;或者,所述螺桿穿過安裝孔與位於第二部件的第二表面的第一螺母連接。Preferably, it also includes a second connector adapted to the first connector; The second connecting piece is a first nut; the first connecting piece is a first bolt or a first screw, the outer surface of the screw rod is matched with the inner surface of the screw hole of the first nut; The screw rod enters the mounting hole and is connected with the first nut disposed in the mounting hole; or, the screw rod passes through the mounting hole and is connected with the first nut located on the second surface of the second component.

較佳地,還包含與第一連接件相適配的第二連接件; 所述第一連接件是第二螺母,所述第一連接件包括相對的第一端面和第二端面,所述第一端面與抗腐蝕粘結層貼合,所述第二端面開設有向第一端面延伸的螺孔; 所述第二連接件是第二螺栓或第二螺釘,其螺桿的外表面與第二螺母的螺孔的內表面相適配;所述第二螺栓或第二螺釘的一端通過螺桿與第二螺母連接,另一端位於第二部件的第二表面或設置在安裝孔內。Preferably, it also includes a second connector adapted to the first connector; The first connecting piece is a second nut, the first connecting piece includes a first end face and a second end face opposite to each other, the first end face is attached to the anti-corrosion adhesive layer, and the second end face is provided with a direction. a screw hole extending from the first end face; The second connecting piece is a second bolt or a second screw, and the outer surface of the screw rod is matched with the inner surface of the screw hole of the second nut; one end of the second bolt or second screw is connected to the second screw through the screw rod. The nut is connected, and the other end is located on the second surface of the second component or arranged in the mounting hole.

較佳地,第一部件、第一連接件及抗腐蝕粘結層不轉動,而第二連接件獨立可轉動,或者第二連接件與第二部件連接成可共同轉動的整體; 或者,第一部件與第一連接件及抗腐蝕粘結層連接成可共同轉動的一個整體,而第二連接件是一個獨立轉動的零件,或者第二連接件與第二部件連接成可共同轉動的另一個整體。Preferably, the first part, the first connecting part and the anti-corrosion adhesive layer do not rotate, and the second connecting part is independently rotatable, or the second connecting part and the second part are connected to form a co-rotatable whole; Alternatively, the first part is connected with the first connector and the corrosion-resistant adhesive layer as a co-rotatable integral body, and the second connector is an independently rotatable part, or the second connector is connected with the second part as a common rotatable part Another whole that turns.

較佳地,所述抗腐蝕粘結層的材料包括Kalrez材料。Preferably, the material of the anti-corrosion adhesive layer includes Kalrez material.

本發明還提供一種等離子體處理裝置,包括: 反應腔; 氣體噴淋頭,位於所述反應腔內頂部; 安裝基板,位於所述氣體噴淋頭上,其內具有安裝孔; 第一連接件,位於所述安裝孔內,與所述安裝基板可拆卸連接;以及 抗腐蝕粘結層,使所述氣體噴淋頭與第一連接件連接在一起。The present invention also provides a plasma processing device, comprising: reaction chamber; a gas shower head, located at the top of the reaction chamber; an installation base plate, which is located on the gas shower head and has installation holes therein; a first connector, located in the mounting hole, and detachably connected to the mounting substrate; and An anti-corrosion adhesive layer connects the gas shower head and the first connecting piece together.

本發明另外提供一種等離子體處理裝置,其包括: 反應腔; 氣體噴淋頭,位於所述反應腔內頂部; 上接地環,包圍所述氣體噴淋頭上; 安裝過渡板,位於所述上接地環上,其內具有安裝孔; 第一連接件,位於所述安裝孔內,與所述安裝過渡基板可拆卸連接;以及 抗腐蝕粘結層,使所述上接地環與第一連接件連接在一起。The present invention additionally provides a plasma processing device, comprising: reaction chamber; a gas shower head, located at the top of the reaction chamber; an upper grounding ring surrounding the gas shower head; an installation transition plate, which is located on the upper grounding ring and has installation holes therein; a first connector, located in the installation hole, and detachably connected to the installation transition substrate; and An anti-corrosion adhesive layer connects the upper ground ring with the first connector.

與習知技術相比,本發明所述用於等離子體處理裝置中的連接結構和等離子體處理裝置,其優點在於: 本發明用抗腐蝕粘結層,將第一連接件與氣體噴淋頭粘接在一起,使氣體噴淋頭與第一連接件整合為一體;第一連接件和與之適配的第二連接件,採用螺栓(螺釘)與螺母的組合,結構簡單,連接可靠。與在氣體噴淋頭上開設凹坑來設置連接件的習知技術相比,本發明中不再需要為凹坑預留位置,因而在設置連接件時氣體噴淋頭本身的厚度可以基本不變,有效地增加了該氣體噴淋頭可以被損耗的厚度,從而延長了其使用壽命。本發明可以將類似的連接結構應用在等離子體處理裝置及其他各種設備上。Compared with the prior art, the connection structure and the plasma processing device used in the plasma processing device of the present invention have the following advantages: The invention uses the anti-corrosion adhesive layer to bond the first connecting piece and the gas shower head together, so that the gas shower head and the first connecting piece are integrated into one; The connecting piece adopts the combination of bolt (screw) and nut, with simple structure and reliable connection. Compared with the prior art of setting up connecting pieces by opening pits on the gas shower head, in the present invention, it is no longer necessary to reserve positions for the pits, so the thickness of the gas shower head itself can be basically unchanged when the connecting pieces are arranged. , which effectively increases the thickness of the gas shower head that can be worn, thereby prolonging its service life. The present invention can apply a similar connection structure to plasma processing apparatuses and other various equipments.

以下結合附圖,對本發明的多個實施例進行說明。Hereinafter, various embodiments of the present invention will be described with reference to the accompanying drawings.

本發明提供一種用於等離子體處理裝置中的連接結構,包含第一部件、第二部件,和對兩部件進行連接的連接件;第一部件和第二部件具有相對的介面;所述連接件包含第一連接件,其通過抗腐蝕粘結層,粘接在第一部件的介面上。第二部件開設有安裝孔,第一連接件在安裝孔內與第二部件之間可拆卸連接,使第一部件與第二部件緊固連接。The present invention provides a connecting structure used in a plasma processing device, comprising a first component, a second component, and a connecting piece for connecting the two components; the first component and the second component have opposite interfaces; the connecting piece A first connector is included, which is bonded to the interface of the first component through an anti-corrosion adhesive layer. The second part is provided with an installation hole, and the first connecting piece is detachably connected with the second part in the installation hole, so that the first part and the second part are fastened.

本發明對用作抗腐蝕粘結層的材料不作限制。將上述連接結構用在等離子體處理裝置時,除了粘接作用外,所述抗腐蝕粘結層還需要可以抵抗刻蝕氣體腐蝕:常用氣體有C4 F6 、C4 F8 、CH2 F2 、H2 、O2 、CHF3 、CF4 、CO2 、CO;另外,長期使用溫度需大於150度。The present invention is not limited to the material used as the anti-corrosion adhesive layer. When the above connecting structure is used in a plasma processing device, in addition to the adhesive function, the anti-corrosion adhesive layer also needs to be resistant to etching gas corrosion: common gases include C 4 F 6 , C 4 F 8 , CH 2 F 2 , H 2 , O 2 , CHF 3 , CF 4 , CO 2 , CO; in addition, the long-term use temperature needs to be greater than 150 degrees.

示例的抗腐蝕粘結層使用Kalrez材料製成,Kalrez材料為全氟醚橡膠(FFKM)。所述 Kalrez材料是一種彈性材料,相比其他彈性體在苛刻工作環境中耐受更久、密封效率更高,同時具有良好的高溫穩定性(327℃),其目前在半導體製造製程中經常作為密封件使用,具有微粒產生少,析出物低、嚴苛等離子環境中耐降解的特點。本發明以上述Kalrez材料用作抗腐蝕粘結層,將第一連接件可靠地粘接到第一部件,無需額外的粘接劑。An example corrosion resistant bond coat is made using Kalrez material, which is perfluoroether rubber (FFKM). The Kalrez material is an elastic material, which can last longer in harsh working environments, has higher sealing efficiency, and has good high temperature stability (327°C) compared to other elastomers. The use of seals has the characteristics of less particle generation, low precipitates, and resistance to degradation in harsh plasma environments. The present invention utilizes the above Kalrez material as a corrosion-resistant adhesive layer to reliably bond the first connector to the first component without the need for additional adhesive.

本發明還提供一種等離子體處理裝置使用了上述連接結構。圖2所示的等離子體處理裝置,包含一反應腔60,該反應腔60內設置有用於承載基片40的基座50(對應下電極),所述氣體噴淋頭11(對應上電極)與基座50之間形成製程區,上下電極中的任意一個施加有高頻射頻功率時,製程區內的反應氣體解離為等離子體,到達基片40上表面對基片40實施蝕刻或薄膜沉積等製程處理;等離子體處理裝置在反應腔60下部的合適位置設有排氣區域,排氣區域與外部的排氣泵相連接,將處理過程中用過的反應氣體及副產品氣體等抽出反應腔60。氣體噴淋頭11周圍還設置有一上部接地環20,可以對氣體噴淋頭11進行支撐,或用於加大氣體噴淋頭11橫向面積以改善等離子體處理的均勻性。The present invention also provides a plasma processing apparatus using the above connection structure. The plasma processing apparatus shown in FIG. 2 includes a reaction chamber 60 . The reaction chamber 60 is provided with a base 50 (corresponding to the lower electrode) for carrying the substrate 40 , and the gas shower head 11 (corresponding to the upper electrode) A process area is formed between the base 50 and the upper and lower electrodes. When high-frequency radio frequency power is applied to any one of the upper and lower electrodes, the reactive gas in the process area is dissociated into plasma and reaches the upper surface of the substrate 40 to perform etching or film deposition on the substrate 40. The plasma treatment device is provided with an exhaust area at a suitable position in the lower part of the reaction chamber 60, and the exhaust area is connected with an external exhaust pump, and the reaction gas and by-product gas used in the treatment process are drawn out of the reaction chamber. 60. An upper grounding ring 20 is also arranged around the gas shower head 11 , which can support the gas shower head 11 or be used to increase the lateral area of the gas shower head 11 to improve the uniformity of plasma processing.

氣體噴淋頭11是具有一定厚度的圓盤形元件,其與圓盤型的安裝基板12層疊佈置。其中,安裝基板12例如由鋁合金製成,能夠對其下方的氣體噴淋頭11進行支撐;氣體噴淋頭11例如由單晶矽製成,作為上電極。The gas shower head 11 is a disc-shaped element having a certain thickness, which is arranged in a stacked manner with a disc-shaped mounting substrate 12 . The mounting substrate 12 is made of, for example, aluminum alloy, and can support the gas shower head 11 below it; the gas shower head 11 is made of, for example, monocrystalline silicon, serving as an upper electrode.

參見圖3或圖6所示,氣體噴淋頭11和安裝基板12各自分佈設置有大量的通氣孔,在本例中均為通孔:安裝基板12的第二通氣孔121從安裝基板12的頂面貫穿到底面,連通氣體噴淋頭11的第一通氣孔111,將氣體輸送到氣體噴淋頭11;氣體噴淋頭11的第一通氣孔111從氣體噴淋頭11的頂面貫穿到底面,進一步將氣體噴射到反應腔內。第一通氣孔111、第二通氣孔121各自的形狀和孔徑等可以根據應用情況自由設計。由於氣體噴淋頭11和安裝基板12的製造方法及其結構,在習知技術中已有成熟的技術支援,為簡明起見,在此不再贅述。Referring to FIG. 3 or FIG. 6 , the gas shower head 11 and the mounting substrate 12 are respectively provided with a large number of ventilation holes, which are all through holes in this example: the second ventilation holes 121 of the mounting The top surface penetrates through the bottom surface and communicates with the first vent hole 111 of the gas shower head 11 to deliver the gas to the gas shower head 11 ; the first vent hole 111 of the gas shower head 11 penetrates from the top surface of the gas shower head 11 To the bottom, further gas is injected into the reaction chamber. The respective shapes and diameters of the first ventilation holes 111 and the second ventilation holes 121 can be freely designed according to the application. Since the manufacturing methods and structures of the gas shower head 11 and the mounting substrate 12 have been well-developed in the prior art, for the sake of brevity, they will not be repeated here.

氣體噴淋頭11使用本發明上述的連接結構時,氣體噴淋頭11對應於第一部件,安裝基板12對應於第二部件,氣體噴淋頭11頂面和安裝基板12底面為相對的介面,氣體噴淋頭11頂面(避開第一通氣孔111的位置)通過抗腐蝕粘結層2,分佈地粘接有多個第一連接件,用於對層疊的氣體噴淋頭11和安裝基板12進行連接。When the gas shower head 11 uses the connection structure of the present invention, the gas shower head 11 corresponds to the first component, the mounting substrate 12 corresponds to the second component, and the top surface of the gas shower head 11 and the bottom surface of the mounting substrate 12 are opposite interfaces , the top surface of the gas shower head 11 (avoiding the position of the first vent hole 111 ) is distributed and bonded with a plurality of first connecting pieces through the anti-corrosion adhesive layer 2 for connecting the stacked gas shower head 11 and the The mounting board 12 is connected.

如圖3~圖5所示的一個實施例中,所述第一連接件是第一螺栓3,氣體噴淋頭11與這些第一螺栓3整合為一體。每個第一螺栓3的頭部端面通過相應的一個抗腐蝕粘結層2(可選Kalrez材料)粘接至氣體噴淋頭11頂面,第一螺栓3的螺桿垂直於氣體噴淋頭11頂面向上佈置。In one embodiment shown in FIGS. 3 to 5 , the first connecting member is first bolts 3 , and the gas shower head 11 is integrated with these first bolts 3 . The head end face of each first bolt 3 is bonded to the top surface of the gas shower head 11 through a corresponding anti-corrosion adhesive layer 2 (optional Kalrez material), and the screw of the first bolt 3 is perpendicular to the gas shower head 11 Lay the top side up.

本實施例的氣體噴淋頭11與安裝基板12連接時,氣體噴淋頭11頂面與安裝基板12底面相對;安裝基板12(避開第一通氣孔111的位置)開設有從安裝基板12頂面貫穿到安裝基板12底面的複數個安裝孔,其與氣體噴淋頭11頂面的複數個第一螺栓3一一對應。第一螺母4作為第二連接件,與穿過安裝孔的第一螺栓3相適配,第一螺栓3的螺桿的外螺紋與第一螺母4的內螺紋相嚙合;第一螺栓3與第一螺母4連接後,氣體噴淋頭11和安裝基板12得以緊固地連接。When the gas shower head 11 of this embodiment is connected to the mounting substrate 12 , the top surface of the gas shower head 11 is opposite to the bottom surface of the mounting substrate 12 ; The top surface penetrates to a plurality of mounting holes on the bottom surface of the mounting substrate 12 , which correspond to the plurality of first bolts 3 on the top surface of the gas shower head 11 one-to-one. The first nut 4 is used as the second connecting piece, which is matched with the first bolt 3 passing through the installation hole. The outer thread of the screw rod of the first bolt 3 is engaged with the inner thread of the first nut 4; After a nut 4 is connected, the gas shower head 11 and the mounting base 12 are firmly connected.

示例的每個安裝孔包含上段122、中段123、下段124等三段,大致呈工字型:中段123的口徑小於上段122的口徑、下段124的口徑;各段具體的形狀、口徑、高度等參數可以根據應用情況設計,以滿足與第一螺栓3連接時的情況:Each mounting hole in the example includes three sections including an upper section 122, a middle section 123, and a lower section 124, which are roughly I-shaped: the diameter of the middle section 123 is smaller than the diameter of the upper section 122 and the diameter of the lower section 124; the specific shape, diameter, height, etc. of each section The parameters can be designed according to the application to meet the situation when connecting with the first bolt 3:

其中,第一螺栓3的螺桿從安裝孔的下段124穿入中段123,並使螺桿的端部進入上段122;中段123的內表面可以是光滑的。作為第二連接件的第一螺母4可以嵌入在安裝孔的上段122,並可以在外部工具對第一螺母4的扳擰結構作用下,使第一螺母4能夠在安裝孔的上段122旋轉,從而在第一螺栓3的螺桿端部穿過中段123到達上段122時對該螺桿擰緊,實現氣體噴淋頭11與安裝基板12的緊固連接。安裝孔下段124足以容納第一螺栓3的頭部及抗腐蝕粘結層2嵌入其中,從而在氣體噴淋頭11與安裝基板12連接時,氣體噴淋頭11頂面和安裝基板12底面可以緊密地貼合,使兩板之間有更好的導熱和/或導電效果。The screw rod of the first bolt 3 penetrates into the middle section 123 from the lower section 124 of the mounting hole, and the end of the screw rod enters the upper section 122; the inner surface of the middle section 123 may be smooth. The first nut 4 as the second connecting piece can be embedded in the upper section 122 of the installation hole, and can rotate the first nut 4 on the upper section 122 of the installation hole under the action of the wrenching structure of the first nut 4 by an external tool, Therefore, when the end of the screw rod of the first bolt 3 passes through the middle section 123 and reaches the upper section 122 , the screw rod is tightened, so as to realize the fast connection between the gas shower head 11 and the mounting base plate 12 . The lower section 124 of the mounting hole is sufficient to accommodate the head of the first bolt 3 and the anti-corrosion adhesive layer 2 to be embedded therein, so that when the gas shower head 11 is connected to the mounting substrate 12, the top surface of the gas shower head 11 and the bottom surface of the mounting substrate 12 can be installed. Closely fit for better thermal and/or electrical conductivity between the two boards.

如圖6~圖8所示的另一個實施例中,所述第一連接件是第二螺母5,氣體噴淋頭11與這些第二螺母5整合為一體。每個第二螺母5的主體第一端面通過相應的一個抗腐蝕粘結層2(可選Kalrez材料)粘接至氣體噴淋頭11頂面,第二螺母5主體垂直於氣體噴淋頭11頂面向上佈置,從第二螺母5主體的第二端面向下延伸,開設有帶內螺紋的螺孔;示例的螺孔沒有貫穿到第一端面。In another embodiment shown in FIGS. 6 to 8 , the first connecting member is a second nut 5 , and the gas shower head 11 is integrated with these second nuts 5 . The first end face of the main body of each second nut 5 is bonded to the top surface of the gas shower head 11 through a corresponding anti-corrosion adhesive layer 2 (optional Kalrez material), and the main body of the second nut 5 is perpendicular to the gas shower head 11 The top surface is arranged upward, extends downward from the second end surface of the main body of the second nut 5, and is provided with a screw hole with an internal thread; the example screw hole does not penetrate to the first end surface.

本實施例的氣體噴淋頭11與安裝基板12連接時,氣體噴淋頭11頂面與安裝基板12底面相對;安裝基板12(較佳避開第一通氣孔111的位置)開設有從安裝基板12頂面貫穿到安裝基板12底面的複數個安裝孔,其與氣體噴淋頭11頂面的複數個第二螺母5一一對應;與第二螺母5相適配的第二螺栓6作為第二連接件穿入安裝孔,第二螺栓6的螺桿的外螺紋與第二螺母5的內螺紋相嚙合;第二螺母5與第二螺栓6連接時,氣體噴淋頭11和安裝基板12得以緊固地連接。When the gas shower head 11 in this embodiment is connected to the mounting substrate 12, the top surface of the gas shower head 11 is opposite to the bottom surface of the mounting substrate 12; The top surface of the base plate 12 penetrates through a plurality of installation holes on the bottom surface of the installation base plate 12, which are in one-to-one correspondence with the plurality of second nuts 5 on the top surface of the gas shower head 11; the second bolts 6 matched with the second nuts 5 serve as The second connecting piece is inserted into the mounting hole, and the external thread of the screw rod of the second bolt 6 is engaged with the internal thread of the second nut 5; when the second nut 5 is connected with the second bolt 6, the gas shower head 11 and the mounting base plate 12 be securely connected.

示例的每個安裝孔包含上中下三段,大致呈工字型:中段123的口徑小於上段122的口徑、下段124的口徑;各段具體的形狀、口徑、高度等參數可以根據應用情況設計,以滿足與第二螺栓6連接時的情況:Each mounting hole in the example consists of upper, middle and lower sections, which are roughly I-shaped: the diameter of the middle section 123 is smaller than the diameter of the upper section 122 and the diameter of the lower section 124; the specific shape, diameter, height and other parameters of each section can be designed according to the application. , to meet the situation when connecting with the second bolt 6:

其中,第二螺栓6的螺桿從安裝孔的上段122穿入中段123,並使螺桿的端部進入下段124;中段123的內表面可以是光滑的。第二螺栓6的頭部可以嵌入在安裝孔的上段122,並可以在外部工具對頭部的扳擰結構作用下,使第二螺栓6能夠在安裝孔內旋轉,從而在該第二螺栓6的螺桿端部穿過中段123到達下段124時對該螺桿擰緊,使第二螺栓6與第二螺母5連接,實現氣體噴淋頭11與安裝基板12的緊固連接。安裝孔下段124足以容納第二螺母5及抗腐蝕粘結層2嵌入其中,從而在氣體噴淋頭11與安裝基板12連接時,氣體噴淋頭11頂面和安裝基板12底面可以緊密地貼合,使兩板之間有更好的導熱和/或導電效果。The screw rod of the second bolt 6 penetrates into the middle section 123 from the upper section 122 of the mounting hole, and the end of the screw rod enters the lower section 124; the inner surface of the middle section 123 may be smooth. The head of the second bolt 6 can be embedded in the upper section 122 of the installation hole, and the second bolt 6 can be rotated in the installation hole under the action of the wrenching structure of the external tool on the head, so that the second bolt 6 can be rotated in the installation hole. When the end of the screw rod passes through the middle section 123 and reaches the lower section 124, tighten the screw rod, so that the second bolt 6 is connected with the second nut 5, so as to realize the fast connection between the gas shower head 11 and the installation base plate 12. The lower section 124 of the mounting hole is sufficient to accommodate the second nut 5 and the anti-corrosion adhesive layer 2 embedded therein, so that when the gas shower head 11 is connected to the mounting substrate 12, the top surface of the gas shower head 11 and the bottom surface of the mounting substrate 12 can be closely attached to each other. together, so that there is a better thermal and/or electrical conduction effect between the two plates.

與在氣體噴淋頭11上開設凹坑來設置連接件的習知技術相比,本發明上述兩個實施例中,不再需要為凹坑預留位置,因而在設置連接件時氣體噴淋頭11與安裝基板12本身的厚度可以基本不變,這相當於氣體噴淋頭11在製程中可以被損耗的厚度得以增加(擴大為該氣體噴淋頭11的整體厚度),有效地延長了其使用壽命。Compared with the prior art in which a cavity is formed on the gas shower head 11 to set the connecting piece, in the above two embodiments of the present invention, it is no longer necessary to reserve a position for the cavity, so the gas spraying is performed when the connecting piece is set. The thickness of the head 11 and the mounting substrate 12 itself can be basically unchanged, which is equivalent to an increase in the thickness of the gas shower head 11 that can be lost during the manufacturing process (expanded to the overall thickness of the gas shower head 11 ), effectively extending the its service life.

為了控制氣體噴淋頭11的使用壽命,初始時,所述氣體噴淋頭11具有第一厚度,安裝基板12具有第二厚度,連接後氣體噴淋頭11的頂面與安裝基板12的底面緊密貼合;每實施複數次製程處理後,獲取氣體噴淋頭11(或其與安裝基板12的組合)當前的實際厚度,將其與對氣體噴淋頭11(或對所述組合)規定的厚度範圍進行比較;若氣體噴淋頭11(或所述組合)當前的實際厚度不處在厚度範圍內的,則更換新的氣體噴淋頭11;若氣體噴淋頭11(或所述組合)當前的實際厚度處在規定的厚度範圍內的,則氣體噴淋頭11可以繼續使用。In order to control the service life of the gas shower head 11 , initially, the gas shower head 11 has a first thickness, and the mounting substrate 12 has a second thickness. After the connection, the top surface of the gas shower head 11 and the bottom surface of the mounting substrate 12 are connected. Closely fit; after performing multiple processes, obtain the current actual thickness of the gas shower head 11 (or its combination with the mounting substrate 12 ), and specify it with the gas shower head 11 (or the combination) If the actual thickness of the gas shower head 11 (or the combination) is not within the thickness range, replace the gas shower head 11 with a new one; if the gas shower head 11 (or the said combination) combination) if the current actual thickness is within the specified thickness range, the gas shower head 11 can continue to be used.

本發明基於抗腐蝕粘結層2實現的連接結構,不限於氣體噴淋頭11與安裝基板12的連接,還可以適用於等離子體處理裝置內的其他部件:The connection structure of the present invention based on the anti-corrosion adhesive layer 2 is not limited to the connection between the gas shower head 11 and the mounting substrate 12, and can also be applied to other components in the plasma processing device:

例如,圖2中氣體噴淋頭11周邊環繞設置的上部接地環20,與位於該上部接地環20上方的安裝過渡板21層疊佈置;上部接地環20例如由矽或者碳化矽製成,作為上部接地電極,其可以是整片的,也可以是由複數個環段組成的一個圓環;安裝過渡板21例如由鋁合金製成,用於對上部接地環20進行支撐及提供接地路徑等。則,基於本發明的連接結構,將上部接地環20對應第一部件,安裝過渡板21對應第二部件,安裝過渡板21的底面和上部接地環20的頂面是相對的介面,上部接地環20的介面通過抗腐蝕粘結層豎立有複數個第一連接件(如第一螺栓或第二螺母),通過與相適配的第二連接件(位於第二部件安裝孔第二端的第一螺母,或從第二部件安裝孔第二端穿入到第一端的第二螺栓)連接,實現上部接地環20與安裝過渡板21的緊固連接。For example, in FIG. 2 , the upper ground ring 20 surrounding the gas shower head 11 is arranged in layers with the mounting transition plate 21 above the upper ground ring 20 ; the upper ground ring 20 is made of silicon or silicon carbide, for example, as the upper The ground electrode can be a single piece or a ring composed of a plurality of ring segments; the installation transition plate 21 is made of aluminum alloy, for example, to support the upper ground ring 20 and provide a ground path. Then, based on the connection structure of the present invention, the upper ground ring 20 corresponds to the first part, the installation transition plate 21 corresponds to the second part, the bottom surface of the installation transition plate 21 and the top surface of the upper ground ring 20 are opposite interfaces, and the upper ground ring The interface of 20 is erected with a plurality of first connectors (such as first bolts or second nuts) through the anti-corrosion adhesive layer, and through the matching second connectors (the first connector located at the second end of the second component mounting hole) A nut, or a second bolt penetrating from the second end of the second component mounting hole to the first end) is connected to realize the fast connection between the upper grounding ring 20 and the mounting transition plate 21 .

本發明上述的連接結構,還可以適用於等離子體處理裝置的基座、基座周邊的下部接地結構、等離子約束系統的絕緣結構等設備中各種層疊的部件。並且,也不限於上下層疊的部件,通過調整第一部件、第二部件相對介面的方向,及第一連接件的佈置方向等,可以將本發明上述的連接結構,適用於連接各種左右鄰接的部件。The above-mentioned connection structure of the present invention can also be applied to various stacked components in equipment such as the susceptor of the plasma processing apparatus, the lower grounding structure around the susceptor, and the insulating structure of the plasma confinement system. In addition, it is not limited to the components stacked up and down. By adjusting the direction of the first component and the second component relative to the interface, and the arrangement direction of the first connector, the above-mentioned connection structure of the present invention can be applied to connect various left and right adjacent components. part.

以下提供本發明所述連接結構的一些實施例及其變形示例,適用於各種第一部件與第二部件的連接:Some embodiments of the connection structure of the present invention and its modification examples are provided below, which are suitable for the connection of various first components and second components:

一個實施例中,第一連接件是第一螺栓,其頭部所在一端的端面,通過抗腐蝕粘結層2粘接在第一部件的介面,使第一螺栓與第一部件整合為一體。第一螺栓的螺桿垂直於該第一部件的介面,該螺桿上至少有一段圓周面帶有外螺紋。第二部件形成有安裝孔,可供第一螺栓的另一端進入。In one embodiment, the first connector is a first bolt, and the end face of one end where the head is located is bonded to the interface of the first component through the anti-corrosion adhesive layer 2, so that the first bolt and the first component are integrated into one. The threaded rod of the first bolt is perpendicular to the interface of the first component, and at least one section of the circumferential surface of the threaded rod is provided with an external thread. The second part is formed with a mounting hole into which the other end of the first bolt can enter.

一些示例中,第一螺栓已與第一部件整合為一體,在較難對該螺栓單獨進行旋轉及擰緊的情況下,配置與第一螺栓相適配的第一螺母作為第二連接件,可以較簡單地實現第一部件與第二部件的連接。In some examples, the first bolt has been integrated with the first component, and in the case that it is difficult to rotate and tighten the bolt alone, configuring the first nut adapted to the first bolt as the second connecting piece can The connection of the first part to the second part is relatively simple.

所述安裝孔是通孔時,第一螺母可以在通孔第二端的第二部件表面與貫穿第二部件到達該表面的第一螺栓的螺桿進行連接;或者,第一螺母可以從通孔的第一端或第二端嵌入到第二部件的安裝孔內,則第一螺栓可以不必貫穿整個第二部件而是在安裝孔內與第一螺母連接。又或者,安裝孔不是通孔時,第一螺母從安裝孔的第一端整個嵌入到安裝孔內,則第一螺栓也可以在安裝孔內與第一螺母連接。When the mounting hole is a through hole, the first nut can be connected at the surface of the second component at the second end of the through hole with the screw rod of the first bolt that penetrates the second component to reach the surface; If the first end or the second end is embedded in the mounting hole of the second component, the first bolt may not need to penetrate the entire second component but be connected with the first nut in the mounting hole. Alternatively, when the mounting hole is not a through hole, and the first nut is completely embedded into the mounting hole from the first end of the mounting hole, the first bolt may also be connected to the first nut in the mounting hole.

一些示例中,第一螺母是可以獨立轉動的零件,其不與第二部件固定連接。此時,該第一螺母需要具有扳擰結構,以便通過工具對其進行旋轉擰緊。第一螺母能夠轉動的情況下,第一螺栓的頭部可以設置也可以不設置扳擰結構。In some examples, the first nut is an independently rotatable part that is not fixedly connected to the second part. At this time, the first nut needs to have a wrenching structure, so that it can be rotated and tightened by a tool. When the first nut can be rotated, the head of the first bolt may or may not be provided with a wrenching structure.

扳擰結構可以是形成在連接件表面的,如設置為適合工具對其施力的外形結構,如使用外表面為六角、十二角、方形等結構或具有滾花的螺母;或者,扳擰結構是裝配到連接件表面,並在擰緊連接件後可以取下的。The wrenching structure can be formed on the surface of the connector, such as a shape structure that is suitable for the tool to exert force on it, such as using a hexagonal, dodecagonal, square and other structure or a nut with knurling on the outer surface; or, the wrench The structure is fitted to the surface of the connector and can be removed after tightening the connector.

另一些示例中,第二部件是方便與第一螺母一同旋轉的,則可以預先將第一螺母與第二部件固定連接,再通過旋轉第二部件帶動第一螺母旋轉,進而將第一螺母擰緊到第一部件處的第一螺栓上實施連接。此時,第一螺母上可以設置也可以不設置扳擰結構。第一螺母與第二部件的連接可以通過任何方式,可以類似地使用另一抗腐蝕粘結層粘接,但不限於此。In other examples, the second part is convenient to rotate together with the first nut, the first nut and the second part can be fixedly connected in advance, and then the second part is rotated to drive the first nut to rotate, and then the first nut can be tightened The connection is made to the first bolt at the first part. At this time, the first nut may or may not be provided with a wrenching structure. The connection of the first nut and the second component may be in any manner, and may similarly be bonded using another anti-corrosion adhesive layer, but is not limited thereto.

配置有第一螺母時,第二部件的安裝孔可以沒有內螺紋,第一螺栓穿入或穿過安裝孔與第一螺母連接。某些示例中,配置第一螺母,與第二部件的安裝孔設置為帶內螺紋的螺孔也可以一同實施。When the first nut is provided, the mounting hole of the second component may have no internal thread, and the first bolt penetrates or passes through the mounting hole to be connected with the first nut. In some examples, the configuration of the first nut and the setting of the mounting hole of the second component as a screw hole with an internal thread can also be implemented together.

或者,在其他示例中,假設第一部件是方便與第一螺栓一同旋轉的,則可以不另外配置第一螺母,而將第二部件的安裝孔製成為帶有內螺紋的螺孔(通孔或非通孔均可),使得第一螺栓的外螺紋與之相嚙合,在第一螺栓旋入第二部件的安裝孔時實現連接。Or, in other examples, assuming that the first part is easy to rotate together with the first bolt, the first nut may not be additionally configured, and the mounting hole of the second part may be made as a screw hole with an internal thread (through hole or non-through holes), so that the external thread of the first bolt engages with it, and the connection is achieved when the first bolt is screwed into the mounting hole of the second component.

上述任意一項示例中,都可以使用第一螺釘替換第一螺栓作為第一連接件,旋入相適配的安裝孔與第二部件連接,或者旋入(或穿入或穿過)安裝孔與相適配的第一螺母連接。此外,某些示例中第二部件可以不預先開設安裝孔,而第二部件自身的材料允許第一螺釘擰入時在第二部件內形成安裝孔並同時完成連接(安裝孔的內螺紋與第一螺釘的外螺紋相嚙合)。In any of the above examples, the first screw can be used to replace the first bolt as the first connecting piece, screwed into a suitable mounting hole to connect with the second component, or screwed into (or penetrated or passed through) the mounting hole Connect with the matching first nut. In addition, in some examples, the second component may not have a mounting hole in advance, and the material of the second component itself allows the first screw to form a mounting hole in the second component and complete the connection at the same time (the inner thread of the mounting hole and the first screw are screwed in). the external thread of a screw).

本發明所述連接結構的另一個實施例中,第一連接件是第二螺母,第二螺母主體的第一端面通過抗腐蝕粘結層粘接在第一部件的介面,使第二螺母與第一部件整合為一體;從第二螺母主體的第二端面開設有帶內螺紋的螺孔;該螺孔從第二端面向第一端面延伸,示例的螺孔沒有貫穿到第一端面。In another embodiment of the connecting structure of the present invention, the first connecting piece is a second nut, and the first end face of the second nut body is bonded to the interface of the first component through an anti-corrosion adhesive layer, so that the second nut is connected to the interface of the first component. The first component is integrated into one body; a screw hole with an internal thread is opened from the second end face of the second nut body; the screw hole extends from the second end face to the first end face, and the example screw hole does not penetrate to the first end face.

設置與第二螺母相適配的第二螺栓作為第二連接件,第二部件形成有供第二螺栓穿入(或旋入或穿過)的安裝孔,使第二螺栓的外螺紋與第二螺母的內螺紋相嚙合,從而對第一部件和第二部件進行緊固連接。A second bolt that matches the second nut is set as the second connecting piece, and the second part is formed with a mounting hole for the second bolt to penetrate (or screw in or pass through), so that the external thread of the second bolt is connected with the first bolt. The inner threads of the two nuts are engaged, so as to fasten the connection between the first part and the second part.

一些示例中,第二部件的安裝孔可以是通孔(有內螺紋或沒有內螺紋均可),第二螺栓的螺桿穿過通孔,在安裝孔的第一端與第二螺母連接;第二螺栓頭部所在的一端,可以嵌在安裝孔內或留在第二部件的第二表面。In some examples, the mounting hole of the second component may be a through hole (with or without internal thread), the screw rod of the second bolt passes through the through hole, and is connected with the second nut at the first end of the mounting hole; The end where the heads of the two bolts are located can be embedded in the mounting holes or left on the second surface of the second part.

安裝孔也可以不是通孔,第二螺栓頭部所在的一端嵌入在第二部件的安裝孔內,使其螺桿端部暴露在安裝孔的第一端,進而與第二螺母連接;或者,連接第一、第二部件時,第二螺母本身還嵌入到第二部件的安裝孔第一端內,則第二螺栓的螺桿端部無需從安裝孔第一端穿出也可以與第二螺母進行連接。The mounting hole may also not be a through hole, and the end of the second bolt head is embedded in the mounting hole of the second component, so that the end of the screw rod is exposed at the first end of the mounting hole, and then connected with the second nut; When the first and second components are used, the second nut itself is also embedded in the first end of the mounting hole of the second component, so the end of the screw rod of the second bolt does not need to pass through the first end of the mounting hole and can also be connected with the second nut. connect.

第二螺栓需要單獨旋轉時,其頭部或其他部位,可以設置便於工具對其旋轉擰緊的扳擰結構;或者,第二螺栓嵌入安裝孔內或第二螺栓與第二部件可以一同旋轉的情況下,也可以不對第二螺栓設置扳擰結構。第二螺母的外表面可以設置也可以不設置扳擰結構;第一部件可以是能被外力轉動並帶動第二螺母旋轉的結構;或者,第一部件和第二螺母都不轉動,而依靠第二螺栓的轉動(或隨第二部件轉動的第二螺栓)來實施連接。When the second bolt needs to be rotated independently, the head or other parts can be provided with a wrench structure that is convenient for the tool to rotate and tighten it; or, the second bolt is embedded in the mounting hole or the second bolt and the second component can rotate together The second bolt may also not be provided with a wrenching structure. The outer surface of the second nut may or may not be provided with a wrench structure; the first part may be a structure that can be rotated by an external force and drive the second nut to rotate; The rotation of the two bolts (or the second bolt that rotates with the second part) implements the connection.

上述的諸多示例,都可以用第二螺釘替換第二螺栓作為第二連接件,與相適配的第二螺母實施連接。某些示例中第二部件可以不預先開設安裝孔,而第二部件自身的材料允許第二螺釘擰入時在第二部件內形成安裝孔,並同時完成與第二部件的連接(安裝孔的內螺紋與第二螺釘的外螺紋相嚙合)。In the above-mentioned many examples, the second bolt can be replaced by the second screw as the second connecting member, and the connection can be performed with the matching second nut. In some examples, the second component may not have a mounting hole in advance, and the material of the second component itself allows a mounting hole to be formed in the second component when the second screw is screwed in, and the connection with the second component is completed at the same time. The internal thread engages the external thread of the second screw).

第二部件的安裝孔第一端位於第二部件的介面,第二部件的介面與第一部件的介面相對;若第二部件的安裝孔第一端,足以容納第一連接件及抗腐蝕粘結層一同嵌入的,則通過連接件連接第一、第二部件後,可以使第一部件的介面與第二部件的介面緊密地貼合。某些示例中,也可以通過限定第一連接件插入第二部件的深度,適當地在第一部件和第二部件的相對介面之間形成間隔及調整間隔距離。此外,某些示例中,可以不通過螺紋嚙合,而依靠兩連接件之間的緊配合,或在兩連接件的接觸面之間使用其他方式實現可靠連接。The first end of the mounting hole of the second component is located at the interface of the second component, and the interface of the second component is opposite to the interface of the first component; if the first end of the mounting hole of the second component is sufficient to accommodate the first connector and the anti-corrosion adhesive If the junction layers are embedded together, after connecting the first and second components through the connecting piece, the interface of the first component and the interface of the second component can be closely attached. In some examples, it is also possible to appropriately form an interval and adjust the interval distance between the opposing interfaces of the first component and the second component by limiting the depth at which the first connector is inserted into the second component. In addition, in some examples, the reliable connection can be achieved by relying on a tight fit between the two connecting pieces instead of threaded engagement, or using other means between the contact surfaces of the two connecting pieces.

儘管本發明的內容已經通過上述較佳實施例作了詳細介紹,但應當認識到上述的描述不應被認為是對本發明的限制。在所屬技術領域中具有通常知識者在閱讀了上述內容後,對於本發明的多種修改和替代都將是顯而易見的。因此,本發明的保護範圍應由所附的申請專利範圍來限定。Although the content of the present invention has been described in detail by way of the above preferred embodiments, it should be appreciated that the above description should not be construed as limiting the present invention. Various modifications and substitutions to the present invention will be apparent to those of ordinary skill in the art upon reading the foregoing disclosure. Therefore, the protection scope of the present invention should be defined by the appended claims.

11,11’:氣體噴淋頭 111:第一通氣孔 12,12’:安裝基板 121:第二通氣孔 122:上段 123:中段 124:下段 13’:通氣孔 14’:凹孔 15’:第一連接件 16’:臺階孔 17’:第二連接件 2:抗腐蝕粘結層 20:上部接地環 21:安裝過渡板 3:第一螺栓 4:第一螺母 40:基片 5:第二螺母 50:基座 6:第二螺栓 60:反應腔11,11': Gas sprinkler 111: First vent 12,12': Mounting base plate 121: Second vent hole 122: upper paragraph 123: middle section 124: next paragraph 13': Vent hole 14': Recessed hole 15': The first connector 16': Step hole 17': Second connector 2: Anti-corrosion adhesive layer 20: Upper ground ring 21: Install the transition plate 3: The first bolt 4: The first nut 40: Substrate 5: Second nut 50: Pedestal 6: Second bolt 60: reaction chamber

圖1是習知的氣體噴淋頭與安裝基板連接的示意圖; 圖2是等離子體處理裝置的示意圖; 圖3是本發明的氣體噴淋頭與安裝基板連接的第一實施例,示出了氣體噴淋頭與安裝基板在其中一組連接件處連接時的側剖視圖; 圖4是第一實施例的氣體噴淋頭與多個第一連接件連接的立體圖; 圖5是圖4中沿A-A1線的側剖視圖; 圖6是本發明的氣體噴淋頭與安裝基板連接的第二實施例,示出了氣體噴淋頭與安裝基板在其中一組連接件處連接時的側剖視圖; 圖7是第二實施例的氣體噴淋頭與多個第一連接件連接的立體圖; 圖8是圖7中沿A-A1線的側剖視圖。FIG. 1 is a schematic diagram of the connection between a conventional gas shower head and a mounting substrate; Fig. 2 is the schematic diagram of plasma processing apparatus; 3 is a first embodiment of the connection between the gas shower head and the mounting substrate of the present invention, showing a side cross-sectional view when the gas shower head and the mounting substrate are connected at one set of connectors; 4 is a perspective view of the gas shower head connected to a plurality of first connectors according to the first embodiment; Figure 5 is a side sectional view along line A-A1 in Figure 4; FIG. 6 is a second embodiment of the connection between the gas shower head and the mounting substrate of the present invention, showing a side cross-sectional view when the gas shower head and the mounting substrate are connected at one set of connectors; 7 is a perspective view of a gas shower head connected to a plurality of first connectors according to the second embodiment; FIG. 8 is a side cross-sectional view taken along line A-A1 in FIG. 7 .

11:氣體噴淋頭 11: Gas shower head

111:第一通氣孔 111: First vent

3:第一螺栓 3: The first bolt

Claims (10)

一種用於等離子體處理裝置中的連接結構,其中,包括: 一第一部件; 一第二部件,其具有一安裝孔; 一第一連接件,位於該安裝孔內,與該第二部件之間可拆卸連接;以及 一抗腐蝕粘結層,用於使該第一連接件與該第一部件結合在一起。A connection structure used in a plasma processing device, comprising: a first part; a second part having a mounting hole; A first connecting piece, located in the mounting hole, is detachably connected with the second component; and A corrosion-resistant adhesive layer for bonding the first connector to the first component. 如請求項1所述的用於等離子體處理裝置中的連接結構,其中, 該第二部件包括相對的一第一表面和一第二表面,且該第一表面朝向該第一部件,該第一連接件從該第二部件的該第一表面進入該安裝孔,在該第二部件的該第二表面穿出或不穿出。The connection structure for use in a plasma processing apparatus according to claim 1, wherein, The second component includes a first surface and a second surface opposite to each other, and the first surface faces the first component, the first connecting piece enters the mounting hole from the first surface of the second component, and the first connecting member enters the mounting hole from the first surface of the second component The second surface of the second component is or is not pierced. 如請求項2所述的用於等離子體處理裝置中的連接結構,其中, 該安裝孔貫穿該第二部件的該第一表面和該第二表面。The connection structure for use in a plasma processing apparatus according to claim 2, wherein, The mounting hole penetrates the first surface and the second surface of the second component. 如請求項1至3中任意一項所述的用於等離子體處理裝置中的連接結構,其中, 該第一連接件是一第一螺栓或一第一螺釘,其螺桿的外表面與該安裝孔的內表面相適配;該第一螺栓或該第一螺釘的螺桿在該安裝孔內與該第二部件相連接。The connection structure for use in a plasma processing apparatus according to any one of claims 1 to 3, wherein, The first connecting piece is a first bolt or a first screw, the outer surface of the screw rod is matched with the inner surface of the installation hole; the first bolt or the screw rod of the first screw is in the installation hole with the The second part is connected. 如請求項2所述的用於等離子體處理裝置中的連接結構,其中, 還包含與該第一連接件相適配的一第二連接件; 該第二連接件是一第一螺母;該第一連接件是該第一螺栓或該第一螺釘,其螺桿的外表面與該第一螺母的螺孔的內表面相適配; 該第一螺栓或該第一螺釘的螺桿進入該安裝孔與設置在該安裝孔內的該第一螺母連接;或者,該第一螺栓或該第一螺釘的螺桿穿過該安裝孔與位於該第二部件的該第二表面的該第一螺母連接。The connection structure for use in a plasma processing apparatus according to claim 2, wherein, Also includes a second connector adapted to the first connector; The second connecting piece is a first nut; the first connecting piece is the first bolt or the first screw, the outer surface of the screw rod is matched with the inner surface of the screw hole of the first nut; The first bolt or the screw rod of the first screw enters the mounting hole and is connected to the first nut disposed in the mounting hole; or, the first bolt or the screw rod of the first screw passes through the mounting hole and is located in the mounting hole The first nut of the second surface of the second part is connected. 如請求項2所述的用於等離子體處理裝置中的連接結構,其中, 還包含與該第一連接件相適配的一第二連接件; 該第一連接件是一第二螺母,該第一連接件包括相對的一第一端面和一第二端面,該第一端面與該抗腐蝕粘結層貼合,該第二端面開設有向該第一端面延伸的螺孔; 該第二連接件是一第二螺栓或一第二螺釘,其螺桿的外表面與該第二螺母的螺孔的內表面相適配;該第二螺栓或該第二螺釘的一端通過螺桿與該第二螺母連接,另一端位於該第二部件的該第二表面或設置在該安裝孔內。The connection structure for use in a plasma processing apparatus according to claim 2, wherein, Also includes a second connector adapted to the first connector; The first connector is a second nut, the first connector includes a first end face and a second end face opposite to each other, the first end face is attached to the anti-corrosion adhesive layer, and the second end face is provided with a direction a screw hole extending from the first end face; The second connecting piece is a second bolt or a second screw, the outer surface of the screw is matched with the inner surface of the screw hole of the second nut; one end of the second bolt or the second screw is connected to the screw through the screw The second nut is connected, and the other end is located on the second surface of the second component or arranged in the mounting hole. 如請求項5或6所述的用於等離子體處理裝置中的連接結構,其中, 該第一部件、該第一連接件及該抗腐蝕粘結層不轉動,而該第二連接件獨立可轉動,或者該第二連接件與該第二部件連接成可共同轉動的整體; 或者,該第一部件與該第一連接件及該抗腐蝕粘結層連接成可共同轉動的一個整體,而該第二連接件是一個獨立轉動的零件,或者該第二連接件與該第二部件連接成可共同轉動的另一個整體。The connection structure for use in a plasma processing apparatus according to claim 5 or 6, wherein, The first part, the first connecting part and the anti-corrosion adhesive layer do not rotate, and the second connecting part is independently rotatable, or the second connecting part and the second part are connected to form a co-rotatable whole; Alternatively, the first component is connected with the first connector and the anti-corrosion adhesive layer to form a co-rotatable integral body, and the second connector is an independently rotatable part, or the second connector and the first connector are The two parts are connected to form another unit that can rotate together. 如請求項1所述的用於等離子體處理裝置中的連接結構,其中, 該抗腐蝕粘結層的材料包括Kalrez材料。The connection structure for use in a plasma processing apparatus according to claim 1, wherein, The material of the anti-corrosion adhesive layer includes Kalrez material. 一種等離子體處理裝置,其中,包括: 一反應腔; 一氣體噴淋頭,位於該反應腔內頂部; 一安裝基板,位於該氣體噴淋頭上,其內具有一安裝孔; 一第一連接件,位於該安裝孔內,與該安裝基板可拆卸連接;以及 一抗腐蝕粘結層,使該氣體噴淋頭與該第一連接件連接在一起。A plasma processing device, comprising: a reaction chamber; a gas shower head, located at the top of the reaction chamber; a mounting base plate, located on the gas shower head, with a mounting hole therein; a first connector located in the mounting hole and detachably connected to the mounting substrate; and An anti-corrosion adhesive layer connects the gas shower head and the first connecting piece together. 一種等離子體處理裝置,其中,包括: 一反應腔; 一氣體噴淋頭,位於該反應腔內頂部; 一上接地環,包圍該氣體噴淋頭上; 一安裝過渡板,位於該上接地環上,其內具有一安裝孔; 一第一連接件,位於該安裝孔內,與該安裝過渡板可拆卸連接;以及 一抗腐蝕粘結層,使該上接地環與該第一連接件連接在一起。A plasma processing device, comprising: a reaction chamber; a gas shower head, located at the top of the reaction chamber; A grounding ring surrounds the gas sprinkler; an installation transition plate, which is located on the upper grounding ring and has an installation hole therein; a first connecting piece located in the mounting hole and detachably connected to the mounting transition plate; and A corrosion-resistant adhesive layer connects the upper ground ring with the first connector.
TW109139651A 2019-12-05 2020-11-13 Connection structure for use in plasma processing apparatus and plasma processing apparatus TWI767408B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201911235570.8 2019-12-05
CN201911235570.8A CN112922935B (en) 2019-12-05 2019-12-05 Connection structure and plasma processing apparatus

Publications (2)

Publication Number Publication Date
TW202127539A TW202127539A (en) 2021-07-16
TWI767408B true TWI767408B (en) 2022-06-11

Family

ID=76161019

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109139651A TWI767408B (en) 2019-12-05 2020-11-13 Connection structure for use in plasma processing apparatus and plasma processing apparatus

Country Status (2)

Country Link
CN (1) CN112922935B (en)
TW (1) TWI767408B (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM370177U (en) * 2009-07-03 2009-12-01 Advanced Micro Fab Equip Inc Internal element and gas nozzle component for plasma processing chamber
TW201145385A (en) * 2010-02-04 2011-12-16 Tokyo Electron Ltd Gas shower structure and substrate processing apparatus
TW201218270A (en) * 2010-09-03 2012-05-01 Lam Res Corp Showerhead electrode
TW201709322A (en) * 2011-03-04 2017-03-01 諾菲勒斯系統公司 Hybrid ceramic showerhead
TW201936266A (en) * 2014-05-16 2019-09-16 美商應用材料股份有限公司 Showerhead assembly and processing chamber

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4433930A (en) * 1982-07-30 1984-02-28 Rexnord Inc. Stud assembly for thin walled panels
WO2006129643A1 (en) * 2005-05-31 2006-12-07 Tokyo Electron Limited Plasma treatment apparatus and plasma treatment method
JP2007273637A (en) * 2006-03-30 2007-10-18 Tokyo Electron Ltd Microwave plasma treatment apparatus and its manufacturing method, and plasma treatment method
CN101296553B (en) * 2008-06-25 2011-01-12 北京北方微电子基地设备工艺研究中心有限责任公司 Plasma processing apparatus
CN102753727A (en) * 2010-03-31 2012-10-24 东京毅力科创株式会社 Plasma processing device and plasma processing method
JP2013199210A (en) * 2012-03-26 2013-10-03 Nippon Marine Enterprises Ltd Structure and method for mounting wooden deck, the wooden deck, and ship
CN103903946B (en) * 2012-12-26 2017-11-17 中微半导体设备(上海)有限公司 A kind of gas spray for plasma reactor
US9878810B2 (en) * 2015-01-02 2018-01-30 The Boeing Company Self-contained stud adhesive bonding apparatus and method of use
JP6593004B2 (en) * 2015-07-22 2019-10-23 東京エレクトロン株式会社 Plasma processing equipment
JP6804392B2 (en) * 2017-06-05 2020-12-23 東京エレクトロン株式会社 Plasma processing equipment and gas shower head

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM370177U (en) * 2009-07-03 2009-12-01 Advanced Micro Fab Equip Inc Internal element and gas nozzle component for plasma processing chamber
TW201145385A (en) * 2010-02-04 2011-12-16 Tokyo Electron Ltd Gas shower structure and substrate processing apparatus
TW201218270A (en) * 2010-09-03 2012-05-01 Lam Res Corp Showerhead electrode
TW201709322A (en) * 2011-03-04 2017-03-01 諾菲勒斯系統公司 Hybrid ceramic showerhead
TW201936266A (en) * 2014-05-16 2019-09-16 美商應用材料股份有限公司 Showerhead assembly and processing chamber

Also Published As

Publication number Publication date
TW202127539A (en) 2021-07-16
CN112922935A (en) 2021-06-08
CN112922935B (en) 2023-06-30

Similar Documents

Publication Publication Date Title
US11742225B2 (en) Electrostatic puck assembly with metal bonded backing plate
KR100399566B1 (en) Electrode clamping assemblies and assemblies and how to use them
KR101438242B1 (en) Apparatus for an optimized plasma chamber grounded electrode assembly
US20190341289A1 (en) Multi-zone gasket for substrate support assembly
US9822449B2 (en) Showerhead support structures
KR20090069826A (en) System for treatmenting substrate
JP2004524677A5 (en)
KR101136940B1 (en) Double Nut For Coupling Electrode
TW200423210A (en) Plasma processing device and method
TWI767408B (en) Connection structure for use in plasma processing apparatus and plasma processing apparatus
WO2011018912A1 (en) Plasma cvd apparatus, plasma electrode, and method for manufacturing semiconductor film
TWI752386B (en) Plasma processor installation structure and corresponding plasma processor
KR20060114244A (en) Cathode electrode geometry for plasma etching device
KR101093747B1 (en) Upper electrode assembly for plasma etching
KR100894424B1 (en) A gas separation-type showerhead applied dual frequency
TWI505754B (en) Plasma processing device
TW202029843A (en) Ground connection structure of gas spray head in plasma processing device, plasma processing device, and conductive connecting structure accomplish anti-loosening for screw bolts to ensure well contact in ground path so that radio frequency circuit to have low impedance
KR200496470Y1 (en) Cost-saving combined silicon electrode
KR20030077803A (en) Gas distribution plate in semiconductor manufacturing apparatus
TW201843763A (en) Boltless substrate support assembly
JP2001077031A (en) Plasma treatment device
KR20110071302A (en) Substrate processing apparatus and covering member therefor
KR20240045703A (en) Fixed anti-loop fastening structure
TW202318540A (en) Method for fastening of 12-inch silicon electrode used in semiconductor etching process equipment
KR20050040155A (en) Chemical vapor deposition apparatus