TWI764121B - A method for activating a surface of a non-conductive or carbon-fibres containing substrate for metallization - Google Patents

A method for activating a surface of a non-conductive or carbon-fibres containing substrate for metallization

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TWI764121B
TWI764121B TW109111142A TW109111142A TWI764121B TW I764121 B TWI764121 B TW I764121B TW 109111142 A TW109111142 A TW 109111142A TW 109111142 A TW109111142 A TW 109111142A TW I764121 B TWI764121 B TW I764121B
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activation
species
metal particles
transition metal
present
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TW109111142A
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TW202041712A (en
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喬瑟夫 蓋達
路茲 史坦佩
莉娜 伊萬諾娃
湯瑪士 湯瑪士
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德商德國艾托特克公司
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1851Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
    • C23C18/1886Multistep pretreatment
    • C23C18/1893Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073Multistep pretreatment
    • C23C18/2086Multistep pretreatment with use of organic or inorganic compounds other than metals, first

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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

The present invention relates to a method for activating a surface of a non-conductive or carbon-fibres containing substrate for metallization, the method comprising the steps (a) providing said substrate, (b) providing an aqueous, palladium-free activation composition comprising (i) a first species of dissolved transition metal ions and additionally metal particles thereof, (ii) one or more than one complexing agent, (iii) permanently or temporarily one or more than one reducing agent, (iv) optionally one or more than one second species of dissolved metal ions being different from the first species, wherein - at least of the first species, the dissolved transition metal ions and the metal particles thereof are present in a reversible equilibrium, with the proviso that - the metal particles are formed from the dissolved transition metal ions through a continuous or semi-continuous reduction through the one or more than one reducing agent, - the dissolved transition metal ions are formed from the metal particles through continuous or semi-continuous oxidation of said particles, and - the dissolved transition metal ions and the metal particles thereof, respectively, are repeatedly involved in said reduction and said oxidation such that no precipitating agglomerates of said metal particles are formed, (c) contacting the substrate with said activation composition such that a transition metal or a transition metal alloy is deposited on the surface of said substrate and an activated surface for metallization is obtained.

Description

活化用於金屬化之非傳導或含碳纖維之基材表面的方法Method for activating the surface of a non-conductive or carbon fiber-containing substrate for metallization

本發明係關於活化用於後續金屬化之通常非傳導或含碳纖維之基材表面。The present invention is concerned with activating normally non-conductive or carbon fiber-containing substrate surfaces for subsequent metallization.

特別地,本發明係關於活化用於金屬化之非傳導或含碳纖維之基材表面的方法,金屬化非傳導或含碳纖維之基材之經活化表面的方法,製備用於活化用於金屬化之非傳導或含碳纖維之基材表面之水性無鈀之活化組合物的方法,及用於活化用於金屬化之非傳導或含碳纖維之基材表面之水性無鈀之活化組合物。In particular, the present invention relates to a method of activating the surface of a non-conductive or carbon fiber-containing substrate for metallization, a method of metallizing the activated surface of a non-conductive or carbon fiber-containing substrate, preparation for activation for metallization A method for activating an aqueous palladium-free activation composition on the surface of a non-conductive or carbon fiber-containing substrate, and an aqueous palladium-free activation composition for activating a non-conductive or carbon fiber-containing substrate surface for metallization.

通常此類基材之金屬化在商業中受高度關注。在日常生活的許多態樣中,此類基材係經金屬結構或金屬層覆蓋,以用於裝飾或功能應用。例如,通常使用非傳導塑料基材來製造具有光澤鉻層之衛生物品。此外,在汽車工業中使用大量經鉻覆蓋之塑料基材。Often the metallization of such substrates is of high commercial interest. In many aspects of everyday life, such substrates are covered with metallic structures or layers for decorative or functional applications. For example, non-conductive plastic substrates are commonly used to make sanitary articles with glossy chrome layers. In addition, a large number of chrome-coated plastic substrates are used in the automotive industry.

除此類裝飾物品之外,功能金屬化在例如製造印刷電路板中係必需的。在此類板中,通常地,將非傳導之含樹脂層壓板用作通常包含銅線電路之基底材料。In addition to such decorative items, functional metallization is necessary, for example, in the manufacture of printed circuit boards. In such boards, generally, a non-conductive resin-containing laminate is used as the base material for the circuit, which usually contains copper wires.

含碳纖維之基材在例如電力至天然氣、電力至燃料及電力至化學品應用及電池中作為催化活性表面之潛力不斷增加。Carbon fiber-containing substrates have increasing potential as catalytically active surfaces in, for example, power-to-natural gas, power-to-fuel, and power-to-chemical applications and batteries.

所有此等應用均需要通常多步驟製備非傳導或含碳纖維之基材以使其可接受後續金屬化。All of these applications require the usual multi-step preparation of non-conductive or carbon fiber-containing substrates to make them acceptable for subsequent metallization.

在第一步驟中,通常進行非傳導或含碳纖維之基材表面之清潔,例如,以去除油脂或雜質。In the first step, cleaning of the surface of the non-conductive or carbon fiber-containing substrate is usually carried out, eg, to remove grease or impurities.

在第二步驟中,通常進行該表面之預處理或調理以使該表面可接受隨後活化。例如,此種預處理在一些情況下包括蝕刻以產生孔並擴大表面。In the second step, a pretreatment or conditioning of the surface is typically performed to render the surface acceptable for subsequent activation. For example, such pretreatment in some cases includes etching to create pores and enlarge the surface.

在第三步驟中,進行重要活化。在此種活化中,通常地,將極薄種子或活化層沉積/錨固在非傳導或含碳纖維之基材表面上,充當後續第一金屬化層之起點。結果,獲得用於金屬化之活化表面。種子層或活化層通常充當介於該非傳導或含碳纖維之基材表面與一或多個隨後金屬化層之間的介體。通常地,該種子/活化層係藉由例如藉由膠體活化組合物在該表面上沉積金屬奈米粒子而形成。In the third step, significant activation is performed. In such activation, typically a very thin seed or activation layer is deposited/anchored on the non-conductive or carbon fiber-containing substrate surface, serving as the starting point for the subsequent first metallization layer. As a result, an activated surface for metallization is obtained. A seed layer or activation layer typically acts as an intermediary between the non-conductive or carbon fiber-containing substrate surface and one or more subsequent metallization layers. Typically, the seed/activation layer is formed by depositing metal nanoparticles on the surface, eg, by a colloidal activation composition.

在第四步驟中,通常地,該第一金屬化層最通常藉由無電電鍍沉積於種子/活化層上。在一些情況下,該無電電鍍包括浸沒式電鍍,亦即藉助於交換反應且在不存在還原劑下在種子/活化層上沉積更貴的金屬。在其他情況下,其包括藉由自動催化沉積進行金屬或金屬合金之沉積,此意指藉助於還原劑促進之沉積。In a fourth step, the first metallization layer is typically deposited on the seed/activation layer, most typically by electroless plating. In some cases, the electroless plating includes immersion plating, ie, depositing a more noble metal on the seed/activation layer by means of an exchange reaction and in the absence of a reducing agent. In other cases, it includes the deposition of metals or metal alloys by autocatalytic deposition, which means deposition facilitated by means of reducing agents.

在第五步驟中,通常再次藉由自動催化沉積或藉由電解沉積在第一金屬化層上沉積第二金屬化層。In a fifth step, a second metallization layer is deposited on the first metallization layer, usually again by autocatalytic deposition or by electrolytic deposition.

基本上,熟練技術者非常熟悉此一系列步驟。通常地,在常見膠體活化組合物中,使用貴金屬奈米粒子,極經常使用鈀奈米粒子。然而,貴金屬一般而言係昂貴的且廢水處理是高度關注的問題以便回收殘留貴金屬。或者,更便宜的金屬離子亦越來越多地用於各別活化組合物中。Basically, the skilled person is very familiar with this series of steps. Typically, in common colloidal activation compositions, precious metal nanoparticles, and very often palladium nanoparticles, are used. However, precious metals are generally expensive and wastewater treatment is a high concern in order to recover residual precious metals. Alternatively, cheaper metal ions are also increasingly used in individual activation compositions.

另一常見缺點係此類活化組合物自然會經歷衰變或分解之形式。通常地,奈米粒子聚結並且形成不溶性、沉澱聚結物,使得該組合物大程度上不可操作。因此,通常期望在已藉由還原各別金屬離子形成奈米粒子之後使其等穩定。針對此目的,通常使用穩定劑化合物,改變顆粒之電荷分佈,限制顆粒尺寸,及/或防止顆粒氧化。在許多情況下,聚合物及/或抗氧化劑及/或金屬離子(例如錫離子)係用於此等目的。Another common disadvantage is that such activating compositions naturally undergo a form of decay or decomposition. Typically, the nanoparticles coalesce and form insoluble, precipitated agglomerates, rendering the composition largely inoperable. Therefore, it is generally desirable to stabilize the nanoparticles after they have been formed by reduction of the respective metal ions. For this purpose, stabilizer compounds are often used to alter the charge distribution of the particles, limit particle size, and/or prevent particle oxidation. In many cases, polymers and/or antioxidants and/or metal ions (eg, tin ions) are used for these purposes.

例如,CN 107460459 A係關於利用穩定劑及還原劑分別防止奈米粒子之聚結及氧化之簡單奈米銅活化液體。For example, CN 107460459 A relates to a simple nano-copper activated liquid using stabilizers and reducing agents to prevent nanoparticle agglomeration and oxidation, respectively.

US 4,278,712揭示一種用於活化弱活性膠態分散液的方法,該方法可用於在無電電鍍之前製備非導體。該方法係基於藉由用適宜氣體及/或化學試劑處理來受控式氧化另外弱活性膠體,此使得能夠進行該受控式氧化。然而,必須存在至少一種膠體穩定劑。以此方式,不能維持可逆平衡。US 4,278,712 discloses a method for activating weakly reactive colloidal dispersions which can be used to prepare non-conductors prior to electroless plating. The method is based on the controlled oxidation of otherwise weakly reactive colloids by treatment with suitable gases and/or chemical agents, which enables the controlled oxidation. However, at least one colloidal stabilizer must be present. In this way, a reversible equilibrium cannot be maintained.

如本技術中所述的此等方法通常具有以下缺點:其等遲早對聚結及沉澱敏感,此主要係因為穩定劑化合物不能隨時間充分穩定顆粒。因此,產品使用壽命極強烈地取決於生產日期、交貨時間及穩定品質。Such methods as described in the present technology generally suffer from the disadvantage that they are susceptible to coalescence and precipitation sooner or later, mainly because the stabilizer compound does not sufficiently stabilize the particles over time. Therefore, product service life is strongly dependent on production date, delivery time and stable quality.

此外,似乎此類穩定劑化合物經常降低奈米粒子有效活化各別表面之能力。看來,添加劑一方面(至少在一定程度上)避免聚結,但另一方面阻止此等顆粒快速且強烈地吸附在表面上。本發明之目標 Furthermore, it appears that such stabilizer compounds often reduce the ability of the nanoparticles to effectively activate the respective surfaces. It appears that the additives on the one hand (at least to a certain extent) avoid agglomeration, but on the other hand prevent such particles from being quickly and strongly adsorbed on the surface. Object of the present invention

因此,本發明之目標係提供活化用於金屬化之非傳導或含碳纖維之基材表面的方法及各別活化組合物,該方法一方面簡單且高度有效,及另一方面特定言之對聚結及沉澱不敏感以確保長使用壽命。此外,此種方法及各別組合物應係低價的。It is therefore an object of the present invention to provide a method for activating the surface of a non-conductive or carbon fiber-containing substrate for metallization, and a respective activation composition, which method on the one hand is simple and highly effective, and on the other hand is particularly effective for polymerizing Insensitive to junction and precipitation to ensure long service life. Furthermore, such methods and respective compositions should be inexpensive.

本發明之另一目標係提供具有經減輕之環境負擔(例如,具有不太複雜的廢水處理及降低之化學品有效濃度)之各別方法。Another object of the present invention is to provide a respective method with a reduced burden on the environment (eg, with less complex wastewater treatment and reduced effective concentrations of chemicals).

此外,本發明之目標係提供延長使用壽命(特別是對於所使用的活化組合物而言)之各別方法。Furthermore, the object of the present invention is to provide a respective method of prolonging the service life, especially for the activating composition used.

以上所提及的目標係藉由活化用於金屬化之非傳導或含碳纖維之基材表面的方法來解決,該方法包括以下步驟: (a)    提供該基材, (b)    提供水性無鈀之活化組合物,其包含 (i)    第一物種之經溶解之過渡金屬離子及另外其金屬顆粒, (ii)   一種或超過一種錯合劑, (iii)  永久或暫時地,一種或超過一種還原劑, (iv)   視需要,不同於第一物種之一種或超過一種第二物種之經溶解之金屬離子, 其中 -  至少該等第一物種,經溶解之過渡金屬離子及其金屬顆粒係以可逆平衡方式存在,其限制條件為 -  該等金屬顆粒係自經溶解之過渡金屬離子藉由一種或超過一種還原劑之連續或半連續還原形成, -  該等經溶解之過渡金屬離子係自金屬顆粒藉由該等顆粒之連續或半連續氧化形成,及 -  該等經溶解之過渡金屬離子及其金屬顆粒分別重複地參與該還原及該氧化,使得不形成該等金屬顆粒之沉澱聚結物, (c)    使基材與該活化組合物接觸,使得過渡金屬或過渡金屬合金沉積在該基材之表面上並獲得用於金屬化之活化表面。The above-mentioned objectives are solved by a method of activating the surface of a non-conductive or carbon fiber-containing substrate for metallization, the method comprising the following steps: (a) providing the substrate, (b) providing an aqueous palladium-free activation composition comprising (i) dissolved transition metal ions of the first species and further metal particles thereof, (ii) one or more than one complexing agent, (iii) permanently or temporarily, one or more than one reducing agent, (iv) a dissolved metal ion other than one of the first species or more than one second species, as required, in - At least these first species, the dissolved transition metal ions and their metal particles exist in a reversible equilibrium, with the restriction that - the metal particles are formed from the continuous or semi-continuous reduction of dissolved transition metal ions by one or more than one reducing agent, - the dissolved transition metal ions are formed from metal particles by continuous or semi-continuous oxidation of the particles, and - the dissolved transition metal ions and their metal particles participate repeatedly in the reduction and the oxidation, respectively, so that precipitation agglomerates of the metal particles are not formed, (c) contacting a substrate with the activation composition such that a transition metal or transition metal alloy is deposited on the surface of the substrate and an activated surface for metallization is obtained.

吾人實驗已證實在本發明中,甚至不需要所形成顆粒之復雜穩定化/抗氧化,即可達成極簡單且有效之活化。與常見活化組合物相反,證明完全不需要所形成顆粒之穩定化/抗氧化。此意指在本發明中,顆粒不係以儘可能長時間地維持其等而是在經溶解之過渡金屬離子與其各別顆粒之間建立平衡為目標而形成,從而允許顆粒有意/有目的地一次又一次地藉由氧化再形成其各別離子。通常地,在常見活化組合物中,氧化被認為係有害的且因此被最小化及/或被抑制。與此相反,在本發明中,氧化被有利地利用,為必需的,且被認為係具有極大效益。證明的是,與通常想法相反,不必長時間維持顆粒於各別活化組合物中。Our experiments have demonstrated that in the present invention, a very simple and effective activation can be achieved even without complex stabilization/antioxidation of the particles formed. In contrast to common activation compositions, stabilization/antioxidation of the particles formed proved to be completely unnecessary. This means that in the present invention the particles are not formed with the goal of maintaining their identity for as long as possible but rather to establish an equilibrium between the dissolved transition metal ions and their respective particles, allowing the particles to be intentional/purposeful Its individual ions are formed again and again by oxidation. Typically, in common activation compositions, oxidation is considered detrimental and is therefore minimized and/or inhibited. In contrast, in the present invention, oxidation is advantageously utilized, is necessary, and is considered to be of great benefit. It turns out that, contrary to common belief, it is not necessary to maintain the particles in the respective activation composition for a long period of time.

此帶來許多優點。例如,以極簡單的方式,藉由簡單地添加所需還原劑,各別活化組合物係在需要其的地方容易地設立/活化。此意指產品交貨時間與產品/方法之使用壽命無關。This brings many advantages. For example, in a very simple manner, by simply adding the desired reducing agent, the respective activation composition is easily set up/activated where it is needed. This means that the product delivery time is independent of the product/method lifetime.

本發明仰賴於以下事實:一次又一次地原位形成顆粒,此使得任何穩定化或穩定劑化合物均被淘汰。為此,經溶解之過渡金屬離子及其金屬顆粒係以可逆平衡方式存在。結果,由於形成具有相對短使用壽命之周圍無穩定劑化合物殼之新製顆粒,因此可達成極有效且強力之活化。隨後,其等藉由氧化回成其離子形式。在添加其他還原劑後,再次(亦即原位)形成新製顆粒。The present invention relies on the fact that the particles are formed in situ again and again, which makes any stabilizing or stabilizer compounds eliminated. To this end, the dissolved transition metal ions and their metal particles exist in a reversible equilibrium. As a result, very effective and robust activation can be achieved due to the formation of freshly prepared particles with a surrounding shell of stabilizer-free compound having a relatively short lifetime. Subsequently, they are returned to their ionic form by oxidation. After the addition of other reducing agents, fresh granules are formed again (ie in situ).

在本發明(用於活化)之方法中,過渡金屬或過渡金屬合金沉積在該基材之表面上且獲得用於隨後金屬化之活化表面。此意指由於沉積,第一物種之經溶解之金屬離子之濃度隨時間降低。然而,藉由簡單添加該物種之離子可容易達成第一物種之補充。因此,補充係極容易且簡單的。此外,此顯著增加各別活化組合物及其相關方法之使用壽命。In the method of the present invention (for activation), a transition metal or transition metal alloy is deposited on the surface of the substrate and an activated surface is obtained for subsequent metallization. This means that the concentration of dissolved metal ions of the first species decreases with time due to deposition. However, replenishment of the first species can be easily achieved by simply adding ions of that species. Therefore, replenishment is extremely easy and simple. Furthermore, this significantly increases the useful life of the respective activation composition and its associated methods.

此外,各別方法及活化組合物不一定需要昂貴貴金屬但可利用低價過渡金屬來進行。Furthermore, the respective methods and activation compositions do not necessarily require expensive precious metals but can be performed with low priced transition metals.

在本發明之上下文中,「連續」、「連續地(continuously)」及「連續地(continually)」分別地表示在例如進行本發明之各別方法或態樣的同時各別動作之不斷持續進行而不明顯地中斷該動作。In the context of the present invention, "continuously," "continuously," and "continually," respectively, mean the continuous continuation of the respective action while, for example, performing the respective method or aspect of the present invention. without significantly interrupting the action.

在本發明之上下文中,「半連續」、「半連續地(semi-continuously)」及「半連續地(semi-continually)」分別地表示在例如進行本發明之各別方法或態樣的同時各別動作經一種或超過一種甚至明顯中斷該動作之進行。在一些情況下,中斷時間比進行該動作期間的時間長。其甚至僅包括臨時及短暫動作。In the context of the present invention, "semi-continuously," "semi-continuously," and "semi-continuously," respectively, mean, for example, while carrying out the respective method or aspect of the present invention. One or more than one action of each action even significantly interrupts the progress of the action. In some cases, the interruption time is longer than the time during which the action is being performed. It even only includes temporary and brief actions.

在本發明之上下文中,「物種」(例如第一物種或第二物種)表示化學元素。因此,「第一物種之經溶解之過渡金屬離子」表示週期表的3至12族之過渡金屬元素(例如銅)之經溶解之金屬離子。In the context of the present invention, a "species" (eg, a first species or a second species) denotes a chemical element. Thus, "dissolved transition metal ion of the first species" refers to a dissolved metal ion of a transition metal element of Groups 3 to 12 of the periodic table (eg, copper).

在本發明之上下文中,「第一物種之經溶解之過渡金屬離子及另外其金屬顆粒」表示該第一物種之經溶解之金屬離子及另外該第一物種之金屬顆粒,例如在水性無鈀之活化組合物中。基材: In the context of the present invention, "dissolved transition metal ions of the first species and further metal particles thereof" means dissolved metal ions of the first species and further metal particles of the first species, eg in aqueous palladium-free in the activation composition. Substrate:

在本發明(用於活化)之方法之步驟(a)中,提供非傳導或含碳纖維之基材與表面。此基材固有地不能成功地金屬化及因此需要活化。In step (a) of the method of the present invention (for activation), a non-conductive or carbon fiber-containing substrate and surface are provided. This substrate inherently cannot be successfully metallized and therefore requires activation.

在本發明之上下文中,活化意指改性非傳導或含碳纖維之基材表面,改性方式為使得其在各別活化步驟之後包含過渡金屬或過渡金屬合金,具有足夠用於後續金屬化之黏著性。此外,所沉積之過渡金屬及過渡金屬合金分別充分黏著至表面,使得後續金屬化層(i)可沉積於其上且(ii)一起亦充分黏著至非傳導或含碳纖維之基材表面。Activation, in the context of the present invention, means modifying the surface of a non-conducting or carbon fiber-containing substrate in such a way that it comprises a transition metal or transition metal alloy after the respective activation step, with sufficient strength for subsequent metallization stickiness. In addition, the deposited transition metals and transition metal alloys, respectively, adhere sufficiently to the surface that subsequent metallization layers (i) can be deposited thereon and (ii) together also adhere sufficiently to the surface of the non-conductive or carbon fiber-containing substrate.

較佳係一種本發明(用於活化)之方法,其中該非傳導基材包括(較佳係選自由以下組成之群):塑料、含樹脂之層壓板、玻璃、陶瓷、半導體及其混合物。Preferably is a method of the present invention (for activation) wherein the non-conductive substrate comprises (preferably selected from the group consisting of) plastics, resin-containing laminates, glass, ceramics, semiconductors and mixtures thereof.

較佳之塑料包括(較佳係)熱塑性塑料,更佳包括(較佳係)聚丙烯酸酯、聚醯胺、聚醯亞胺、聚酯、聚碳酸酯、聚伸烷基、聚伸苯基、聚苯乙烯、聚乙烯基或其混合物。Preferred plastics include (preferred series) thermoplastics, more preferably (preferred series) polyacrylates, polyamides, polyimides, polyesters, polycarbonates, polyalkylenes, polyphenylenes, polystyrene, polyvinyl or mixtures thereof.

較佳之聚丙烯酸酯包括聚(甲基丙烯酸甲酯)(PMMA)。Preferred polyacrylates include poly(methyl methacrylate) (PMMA).

較佳之聚醯亞胺包括聚醚醯亞胺(PEI)。Preferred polyimides include polyetherimides (PEI).

較佳之聚酯包括聚乳酸(PLA)。Preferred polyesters include polylactic acid (PLA).

較佳之聚碳酸酯包括用雙酚A獲得的聚碳酸酯(PC)。Preferred polycarbonates include polycarbonates (PC) obtained with bisphenol A.

較佳之聚伸烷基包括聚乙烯(PE)、聚丙烯(PP)、聚四氟乙烯(PTFE)、聚甲醛(POM)或其混合物。Preferred polyalkylenes include polyethylene (PE), polypropylene (PP), polytetrafluoroethylene (PTFE), polyoxymethylene (POM) or mixtures thereof.

較佳之聚伸苯基包括聚(苯醚) (PPO)、聚(苯醚) (PPE)或其混合物。Preferred polyphenylenes include poly(phenylene ether) (PPO), poly(phenylene ether) (PPE) or mixtures thereof.

較佳之聚苯乙烯包括聚苯乙烯(PS)、丙烯腈丁二烯苯乙烯(ABS)、苯乙烯/丁二烯橡膠(SBR)、苯乙烯-丙烯腈(SAN)。Preferred polystyrenes include polystyrene (PS), acrylonitrile butadiene styrene (ABS), styrene/butadiene rubber (SBR), styrene-acrylonitrile (SAN).

較佳之聚乙烯基包括聚氯乙烯(PVC)、聚(乙烯-乙酸乙烯酯) (PEVA)、聚偏二氟乙烯(PVDF)或其混合物。Preferred polyvinyl groups include polyvinyl chloride (PVC), poly(ethylene-vinyl acetate) (PEVA), polyvinylidene fluoride (PVDF), or mixtures thereof.

較佳之含樹脂層壓板包括(較佳係)纖維增強型含樹脂層壓板,最佳係玻璃纖維增強型層壓板。Preferred resin-containing laminates include (preferably) fiber-reinforced resin-containing laminates, most preferably glass fiber-reinforced laminates.

極佳地,含樹脂層壓板包含環氧樹脂、乙烯基酯、聚酯、醯胺、醯亞胺、苯酚、伸烷基、碸或其混合物之一種或超過一種聚合物(最佳係環氧樹脂、醯亞胺或其混合物)作為樹脂。Desirably, the resin-containing laminate comprises one or more than one polymer (preferably epoxy resin) resin, imide or mixture thereof) as resin.

極佳之含樹脂層壓板包含(較佳係) FR4。An excellent resin-containing laminate comprises (preferably) FR4.

較佳之玻璃包含(較佳係)石英玻璃、鈉鈣玻璃、浮法玻璃、氟化物玻璃、鋁矽酸鹽玻璃、磷酸鹽玻璃、硼酸鹽玻璃、硼矽酸鹽玻璃、硫族化物(chalcogenide)玻璃、氧化鋁玻璃或其混合物。Preferred glasses include (preferably) quartz glass, soda lime glass, float glass, fluoride glass, aluminosilicate glass, phosphate glass, borate glass, borosilicate glass, chalcogenide glass, alumina glass or mixtures thereof.

較佳之陶瓷包含(較佳係)玻璃陶瓷、氧化鋁陶瓷或其混合物。Preferred ceramics include (preferably) glass ceramics, alumina ceramics, or mixtures thereof.

較佳之半導體包含(較佳係)矽基半導體,更佳係包含二氧化矽及/或矽之矽基半導體。Preferred semiconductors include (preferably) silicon-based semiconductors, more preferably silicon-based semiconductors including silicon dioxide and/or silicon.

極佳之半導體係晶圓。Excellent semiconductor wafers.

較佳係本發明(用於活化)之方法,其中含碳纖維之基材包含(較佳係)碳纖維複合物及/或碳纖維長絲之配置結構。Preferably, the method of the present invention (for activation), wherein the carbon fiber-containing substrate comprises (preferably) an arrangement of carbon fiber composites and/or carbon fiber filaments.

較佳之碳纖維複合材料包含(較佳係)碳纖維增強聚合物及/或含碳纖維之織物,更佳係碳纖維增強聚合物及/或編織含碳纖維之織物。Preferred carbon fiber composites comprise (preferably) carbon fiber reinforced polymers and/or carbon fiber-containing fabrics, more preferably carbon fiber reinforced polymers and/or woven carbon fiber-containing fabrics.

碳纖維長絲之較佳配置結構包含(較佳係)由碳纖維製成之織物,最佳係由碳纖維製成之編織織物。Preferred arrangements of carbon fiber filaments include (preferably) fabrics made of carbon fibers, most preferably woven fabrics made of carbon fibers.

特佳之含碳纖維之基材係含碳纖維之氈。預處理: A particularly preferred carbon fiber-containing substrate is a carbon fiber-containing felt. Preprocessing:

在一些情況下,非傳導或含碳纖維之基材表面之預處理係較佳。因此,較佳係本發明(用於活化)之方法,該方法包括在步驟(c)之前對基材進行預處理步驟: (a-1) 用包含含氮化合物之預處理溶液處理該基材。In some cases, pretreatment of the non-conductive or carbon fiber-containing substrate surface is preferred. Therefore, a method of the present invention (for activation) is preferred, which method comprises, prior to step (c), the step of pre-treating the substrate: (a-1) The substrate is treated with a pretreatment solution containing a nitrogen-containing compound.

較佳係本發明(用於活化)之方法,其中該預處理溶液具有鹼性pH,較佳係在9.0至14.0之範圍內,更佳在10.0至13.5之範圍內,甚至更佳在10.5至13.0之範圍內,最佳在11.0至12.5之範圍內之pH。Preferably the method of the present invention (for activation), wherein the pretreatment solution has an alkaline pH, preferably in the range of 9.0 to 14.0, more preferably in the range of 10.0 to 13.5, even more preferably in the range of 10.5 to In the range of 13.0, the optimum pH is in the range of 11.0 to 12.5.

較佳係本發明(用於活化)之方法,其中該預處理溶液中該含氮化合物為聚合物,較佳係水溶性聚合物。Preferably, the method of the present invention (for activation), wherein the nitrogen-containing compound in the pretreatment solution is a polymer, preferably a water-soluble polymer.

更佳係本發明(用於活化)之方法,其中該預處理溶液中該含氮化合物係包含吡咯啶部分之聚合物。Even more preferred is the method of the present invention (for activation) wherein the nitrogen-containing compound in the pretreatment solution is a polymer comprising a pyrrolidine moiety.

較佳地,該聚合物係陽離子。Preferably, the polymer is cationic.

較佳地,含氮化合物係由碳原子、氮原子及氫原子組成。Preferably, the nitrogen-containing compound is composed of carbon atoms, nitrogen atoms and hydrogen atoms.

較佳係本發明(用於活化)之方法,其中該預處理溶液中該含氮化合物包含四級氮原子。Preferably, the method of the present invention (for activation), wherein the nitrogen-containing compound in the pretreatment solution contains quaternary nitrogen atoms.

最佳係本發明(用於活化)之方法,其中該含氮化合物包含(較佳係)聚四級銨6。Most preferred is the method of the present invention (for activation) wherein the nitrogen-containing compound comprises (preferably) polyquaternary ammonium 6.

較佳係本發明(用於活化)之方法,其中步驟(a-1)期間的預處理溶液之溫度係在20℃至90℃之範圍內,較佳在25℃至80℃之範圍內,更佳在30℃至70℃之範圍內,最佳在40℃至60℃之範圍內。Preferably the method of the present invention (for activation), wherein the temperature of the pretreatment solution during step (a-1) is in the range of 20°C to 90°C, preferably in the range of 25°C to 80°C, More preferably in the range of 30°C to 70°C, most preferably in the range of 40°C to 60°C.

較佳係本發明(用於活化)之方法,其中步驟(a-1)係進行1分鐘至10分鐘,較佳進行2分鐘至8分鐘,更佳進行3分鐘至6分鐘,最佳進行3.5分鐘至5分鐘。水性無鈀之活化組合物: It is preferably the method of the present invention (for activation), wherein step (a-1) is performed for 1 minute to 10 minutes, preferably 2 minutes to 8 minutes, more preferably 3 minutes to 6 minutes, and optimally performed for 3.5 minutes. minutes to 5 minutes. Aqueous palladium-free activation composition:

在本發明(用於活化)之方法之步驟(b)中,提供水性無鈀之活化組合物。In step (b) of the method of the present invention (for activation), an aqueous palladium-free activation composition is provided.

用於本發明(用於活化)之方法中之水性組合物係水性組合物,此意指水係主要組分。因此,基於水性組合物之總重量計,組合物之超過50重量%係水,較佳至少70重量%,甚至更佳至少90重量%,最佳95重量%或更多。僅在罕見情況下,較佳地,該組合物包含一種或超過一種可與水混溶之溶劑(除水以外)。然而,最佳(出於生態原因)係其中水為唯一溶劑之方法及因此,最佳地,該組合物實質上不含或根本不包含有機溶劑。The aqueous composition used in the method of the present invention (for activation) is an aqueous composition, which means an aqueous main component. Thus, based on the total weight of the aqueous composition, more than 50% by weight of the composition is water, preferably at least 70% by weight, even more preferably at least 90% by weight, and most preferably 95% by weight or more. Only in rare instances, preferably, the composition comprises one or more than one water-miscible solvent (other than water). However, optimal (for ecological reasons) is a method in which water is the only solvent and therefore, optimally, the composition contains substantially no or no organic solvent at all.

在本發明之上下文中,術語「實質上不含或不包含」標的(例如化合物、化學品、材料等)獨立地表示該標的係根本不存在(「不包含」)或係在不影響本發明之預期目的下僅以很少的量且不干擾的量(範圍)存在(「實質上不含」)。例如,可無意地添加或利用此種標的,例如,作為不可避免的雜質。「實質上不含或不包含」較佳表示0 (零) ppm至5 ppm (基於例如活化組合物之總重量計),較佳係0 ppm至3 ppm,更佳係0 ppm至1.5 ppm,甚至更佳係0 ppm至1 ppm,最佳係0 ppm至0.5 ppm,甚至最佳係0 ppm至0.1 ppm。該原理同樣適用於其他標的,例如相對於在本發明(用於活化)之方法之步驟(c)中獲得的過渡金屬或過渡金屬合金之總重量。In the context of the present invention, the term "substantially free of or not comprising" a subject matter (eg, compound, chemical, material, etc.) independently means that the subject matter is not present at all ("does not contain") or is not present in the present invention It is present ("substantially free") in only minor and non-interfering amounts (ranges) for its intended purpose. For example, such targets may be unintentionally added or utilized, eg, as unavoidable impurities. "Substantially free or free" preferably means 0 (zero) ppm to 5 ppm (based on, for example, the total weight of the activating composition), preferably 0 ppm to 3 ppm, more preferably 0 ppm to 1.5 ppm, Even better is 0 ppm to 1 ppm, best is 0 ppm to 0.5 ppm, even best is 0 ppm to 0.1 ppm. The same principle applies to other targets, eg relative to the total weight of the transition metal or transition metal alloy obtained in step (c) of the method of the invention (for activation).

該活化組合物具有酸性pH、中性pH或鹼性pH,較佳係酸性或中性pH,最佳係酸性pH。The activation composition has an acidic pH, a neutral pH or an alkaline pH, preferably an acidic or neutral pH, and most preferably an acidic pH.

較佳係本發明(用於活化)之方法,其中該活化組合物之pH係在≥2.0至≤13.0之範圍內,較佳在≥3.0至≤12.0之範圍內,更佳在≥4.0至≤11.0之範圍內,最佳在≥4.5至≤10.0之範圍內。Preferably the method of the present invention (for activation), wherein the pH of the activation composition is in the range of ≥ 2.0 to ≤ 13.0, preferably in the range of ≥ 3.0 to ≤ 12.0, more preferably in the range of ≥ 4.0 to ≤ Within the range of 11.0, the best is within the range of ≥4.5 to ≤10.0.

在一些情況下,較佳係本發明(用於活化)之方法,其中該活化組合物之pH係在≥3.0至≤6.5之範圍內,較佳在≥4.0至≤6.0之範圍內。較佳地,此適用之限制條件為該一種或超過一種還原劑包含硼氫化物。In some cases, the method of the present invention (for activation) is preferred, wherein the pH of the activation composition is in the range of > 3.0 to < 6.5, preferably > 4.0 to < 6.0. Preferably, this applies with the limitation that the one or more than one reducing agent comprises a borohydride.

該活化組合物中之pH通常係(i)至(iv)之存在的結果。若需要調整pH,其係藉由典型方法進行。較佳之酸係無機酸及有機酸。較佳之無機酸係硫酸。較佳之有機酸係一種或超過一種錯合劑之酸形式。較佳之鹼性化合物係鹼性氫氧化物(較佳係NaOH)、鹼性碳酸鹽(較佳係碳酸鈉)及氨。The pH in the activation composition is generally the result of the presence of (i) to (iv). If pH adjustment is required, this is done by typical methods. Preferred acids are inorganic acids and organic acids. The preferred inorganic acid is sulfuric acid. Preferred organic acids are the acid forms of one or more than one complexing agent. Preferred alkaline compounds are alkaline hydroxides (preferably NaOH), alkaline carbonates (preferably sodium carbonate) and ammonia.

在本發明之上下文中,pH係在20℃之溫度下測定,亦即,所定義的pH係參考20℃。因此,僅為了pH測定起見,該活化組合物之溫度為20℃。此並不意指該活化組合物本身受限於20℃之特定溫度。關於該活化組合物之較佳溫度,參見下文。In the context of the present invention, pH is determined at a temperature of 20°C, ie pH as defined refers to 20°C. Therefore, for pH determination purposes only, the temperature of the activation composition was 20°C. This does not mean that the activation composition itself is limited to a specific temperature of 20°C. See below for preferred temperatures for the activation composition.

若pH明顯低於2或高於13,則獲得幾乎不充分之活化。若pH過於酸性,則通常地,酸敏感性還原劑分解過快。相反地,若pH過於鹼性,則鹼敏感性還原劑分解過快。If the pH is significantly lower than 2 or higher than 13, little sufficient activation is obtained. If the pH is too acidic, the acid-sensitive reducing agent typically decomposes too quickly. Conversely, if the pH is too basic, the alkali-sensitive reducing agent decomposes too quickly.

用於本發明(用於活化)之方法中之水性組合物係無鈀的。因此,該活化組合物實質上不含或不包含鈀離子。此意指既不存在包含鈀之化合物,亦不存在鈀原子/顆粒或鈀離子。有利地,本發明係含鈀之活化方法之極佳替代方案,就活化而言具有相同或至少幾乎相同的結果。The aqueous compositions used in the method of the present invention (for activation) are palladium-free. Thus, the activation composition is substantially free or free of palladium ions. This means that neither palladium containing compounds nor palladium atoms/particles or palladium ions are present. Advantageously, the present invention is an excellent alternative to palladium-containing activation methods, with the same or at least nearly the same results in terms of activation.

較佳地,在活化組合物中亦不需要其他貴金屬或至少昂貴/稀有金屬。因此,較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含鉑離子、金離子、銀離子、銠離子、釕離子及銥離子,較佳係實質上不含或不包含鉑、金、銀、銠、釕及銥。Preferably, other precious metals or at least expensive/rare metals are also not required in the activation composition. Therefore, preferably the method of the present invention (for activation), wherein the activation composition is substantially free or free of platinum ions, gold ions, silver ions, rhodium ions, ruthenium ions and iridium ions, preferably substantially Contains no or no platinum, gold, silver, rhodium, ruthenium and iridium.

用於本發明(用於活化)之方法中之水性組合物包含(i)第一物種經溶解之過渡金屬離子及其另外金屬顆粒。The aqueous composition used in the method of the present invention (for activation) comprises (i) dissolved transition metal ions of the first species and additional metal particles thereof.

較佳係活化組合物,其中該等金屬顆粒係奈米粒子。較佳地,該等金屬顆粒包含一種或超過一種元素金屬(Me0 ),較佳係(基本上)由一種或超過一種元素金屬(Me0 )組成。Preferred are activation compositions wherein the metal particles are nanoparticles. Preferably, the metal particles comprise one or more than one elemental metal ( Me0 ), preferably consist (substantially) of one or more than one elemental metal ( Me0 ).

甚至更佳係活化組合物,其中該第一物種之金屬顆粒之粒徑係在0.1 nm至500 nm之範圍內,較佳在0.5 nm至200 nm之範圍內,更佳在1.0 nm至100 nm之範圍內,最佳在3 nm至50 nm之範圍內,甚至最佳在5 nm至15 nm之範圍內。Even better is an activation composition, wherein the particle size of the metal particles of the first species is in the range of 0.1 nm to 500 nm, preferably in the range of 0.5 nm to 200 nm, more preferably in the range of 1.0 nm to 100 nm , preferably in the range of 3 nm to 50 nm, and even optimally in the range of 5 nm to 15 nm.

更佳係本發明(用於活化)之方法,其中該活化組合物中該第一物種之金屬顆粒係膠體金屬顆粒。More preferably is the method of the present invention (for activation) wherein the metal particles of the first species in the activation composition are colloidal metal particles.

因此,較佳係本發明(用於活化)之方法,其中該活化組合物係膠體,較佳係膠體懸浮液。然而,取決於由主要第一物種之經溶解之離子引起的著色效應,該活化組合物仍然係澄清但著色之溶液。Therefore, the method of the present invention (for activation) is preferred, wherein the activation composition is a colloid, preferably a colloidal suspension. However, depending on the coloring effect caused by the dissolved ions of the predominant first species, the activation composition is still a clear but colored solution.

在該活化組合物中,第一物種之該經溶解之過渡金屬離子及其該等金屬顆粒一起形成第一物種之金屬之總量。較佳係本發明(用於活化)之方法,其中該活化組合物中該第一物種之金屬離子及其金屬顆粒形成在0.05 g/L至30.0 g/L之範圍內,較佳在0.07 g/L至18.0 g/L之範圍內,更佳在0.09 g/L至12.0 g/L之範圍內,甚至更佳在0.11 g/L至8.0 g/L之範圍內,最佳在0.15 g/L至6.0 g/L之範圍內,甚至最佳在0.2 g/L至3.0 g/L之範圍內之總濃度(基於活化組合物之總體積及基於離子、非顆粒形式)。此意指為測定該總濃度,第一物種之過渡金屬顆粒被認為/計算為經溶解之金屬離子。In the activation composition, the dissolved transition metal ions of the first species and the metal particles together form the total amount of metals of the first species. Preferably the method of the present invention (for activation), wherein the metal ions of the first species and their metal particles in the activation composition are formed in the range of 0.05 g/L to 30.0 g/L, preferably 0.07 g /L to 18.0 g/L, more preferably 0.09 g/L to 12.0 g/L, even more preferably 0.11 g/L to 8.0 g/L, most preferably 0.15 g/L Total concentrations in the range of L to 6.0 g/L, even optimally in the range of 0.2 g/L to 3.0 g/L (based on the total volume of the activation composition and based on the ionic, non-particulate form). This means that to determine the total concentration, the transition metal particles of the first species are considered/calculated as dissolved metal ions.

儘管本發明(用於活化)之方法可基本上用比較高濃度之第一物種進行,但令人意外地證明的是,極低濃度已經足以獲得極有效且極佳之結果(參見實例)。就廢水處理而言,此係特別有利的,且因此係成本友好及生態友好的。Although the method of the present invention (for activation) can be substantially carried out with relatively high concentrations of the first species, surprisingly, very low concentrations have been shown to be sufficient to obtain very effective and excellent results (see Examples). This is particularly advantageous in terms of wastewater treatment and is therefore cost- and eco-friendly.

較佳係本發明(用於活化)之方法,其中該第一物種係銅或鈷,較佳係銅。與常用的鈀相比,銅及鈷係具有成本效益之金屬,但在非傳導或含碳纖維之基材表面上達成足夠活化。前述濃度最佳適用於銅及鈷,最佳適用於銅。Preferably the method of the present invention (for activation) is wherein the first species is copper or cobalt, preferably copper. Copper and cobalt are cost-effective metals compared to commonly used palladium, but achieve sufficient activation on non-conductive or carbon fiber-containing substrate surfaces. The aforementioned concentrations are most suitable for copper and cobalt, and most suitable for copper.

較佳係本發明(用於活化)之方法,其中該經溶解之銅離子源係選自由硫酸銅、氯化銅、硝酸銅、氟硼酸銅、乙酸銅、檸檬酸銅、苯基磺酸銅、銅對甲苯磺酸鹽及烷基磺酸銅組成之群。較佳之烷基磺酸銅係甲磺酸銅。最佳之銅源係硫酸銅,最佳係CuSO4 * 5 H2 O。Preferably the method of the present invention (for activation) wherein the source of dissolved copper ions is selected from the group consisting of copper sulfate, copper chloride, copper nitrate, copper fluoroborate, copper acetate, copper citrate, copper phenylsulfonate , copper p-toluenesulfonate and copper alkyl sulfonate group. The preferred copper alkyl sulfonate is copper methanesulfonate. The best copper source is copper sulfate, and the best one is CuSO 4 * 5 H 2 O.

視需要,該水性無鈀之活化組合物包含(iv)一種或超過一種不同於第一物種之第二物種之經溶解之金屬離子。較佳地,該第二物種實質上不含或不包含鹼金屬。Optionally, the aqueous palladium-free activation composition comprises (iv) one or more than one dissolved metal ion of a second species different from the first species. Preferably, the second species is substantially free or free of alkali metals.

較佳係本發明(用於活化)之方法,其中該一種或超過一種第二物種係選自由過渡金屬及鎂,較佳鎳、鈷、鐵及鎂,較佳鎳及鈷,更佳鎳組成之群。對於第二物種之經溶解之金屬離子,各別過渡合金較佳係在本發明(用於活化)之方法之步驟(c)中沉積。Preferably the method of the present invention (for activation) wherein the one or more than one second species is selected from the group consisting of transition metals and magnesium, preferably nickel, cobalt, iron and magnesium, preferably nickel and cobalt, more preferably nickel group. For the dissolved metal ions of the second species, the respective transition alloy is preferably deposited in step (c) of the method of the present invention (for activation).

較佳係本發明(用於活化)之方法,其中該一種或超過一種第二物種實質上不含或不包含錫。Preferably the method of the present invention (for activation) is wherein the one or more than one second species is substantially free or free of tin.

除第一物種及可選之第二物種之外,該水性無鈀之活化組合物包含(ii)一種或超過一種錯合劑。較佳地,該一種或超過一種錯合劑適合與至少該第一物種之經溶解之過渡金屬離子形成錯合物。In addition to the first species and optionally the second species, the aqueous palladium-free activation composition comprises (ii) one or more than one complexing agent. Preferably, the one or more than one complexing agent is adapted to form a complex with at least the dissolved transition metal ion of the first species.

較佳係本發明(用於活化)之方法,其中該一種或超過一種錯合劑包括或為有機錯合劑,較佳係羧酸及/或其鹽,更佳係二-或三羧酸及/或其鹽,甚至更佳係三羧酸及/或其鹽,最佳係羥基三羧酸及/或其鹽,甚至最佳係檸檬酸、其結構異構體及/或鹽。較佳之結構異構體係異檸檬酸及其鹽。最佳地,該一種或超過一種以上所定義的錯合劑(包括較佳變異體)係活化組合物中的唯一錯合劑。Preferably the method of the present invention (for activation), wherein the one or more than one complexing agent comprises or is an organic complexing agent, preferably a carboxylic acid and/or its salt, more preferably a di- or tricarboxylic acid and/ Or its salt, even more preferably tricarboxylic acid and/or its salt, most preferably hydroxytricarboxylic acid and/or its salt, even most preferably citric acid, its structural isomer and/or its salt. The preferred structural isomer system is isocitrate and its salts. Optimally, the one or more than one complexing agent as defined above, including preferred variants, is the only complexing agent in the activating composition.

較佳係本發明(用於活化)之方法,其中該活化組合物中 -  基於活化組合物之總體積及基於離子、非特定形式計,一起構成總濃度之第一物種之金屬離子及其金屬顆粒,及 -  一種或超過一種錯合劑於總濃度中 係以在1.0: 0.2至1.0:100.0之範圍內,較佳在1.0: 0.5至1.0:50.0之範圍內,更佳在1.0:0.85至1.0:25.0之範圍內,甚至更佳在1.0:0.95至1.0:15.0之範圍內,又甚至更佳在1.0:1.0至1.0:10.0之範圍內,最佳在1.0:1.1至1.0:5.0之範圍內之莫耳比存在。若一種或超過一種錯合劑包含三羧酸及/或其鹽,更佳羥基三羧酸及/或其鹽,最佳檸檬酸、其結構異構體及/或鹽,則此極佳地適用。Preferably the method of the present invention (for activation), wherein in the activation composition - based on the total volume of the activation composition and based on the ionic, unspecified form, the metal ions of the first species and their metal particles together constituting the total concentration, and - one or more than one complexing agent in the total concentration It is in the range of 1.0:0.2 to 1.0:100.0, preferably in the range of 1.0:0.5 to 1.0:50.0, more preferably in the range of 1.0:0.85 to 1.0:25.0, even more preferably in the range of 1.0:0.95 to Molar ratios exist in the range of 1.0:15.0, and even better in the range of 1.0:1.0 to 1.0:10.0, most preferably in the range of 1.0:1.1 to 1.0:5.0. This applies particularly well if one or more than one complexing agent comprises tricarboxylic acids and/or salts thereof, more preferably hydroxytricarboxylic acids and/or salts thereof, most preferably citric acid, structural isomers and/or salts thereof .

較佳係本發明(用於活化)之方法,其中該活化組合物中該一種或超過一種錯合劑係以在0.01 mol/L至0.5 mol/L之範圍內(基於活化組合物之總體積),較佳在0.015 mol/L至0.35 mol/L之範圍內,更佳在0.02 mol/L至0.3 mol/L之範圍內,最佳在0.023 mol/L至0.275 mol/L之範圍內之總量存在。Preferably the method of the present invention (for activation), wherein the one or more than one complexing agent in the activation composition is in the range of 0.01 mol/L to 0.5 mol/L (based on the total volume of the activation composition) , preferably in the range of 0.015 mol/L to 0.35 mol/L, more preferably in the range of 0.02 mol/L to 0.3 mol/L, and most preferably in the range of 0.023 mol/L to 0.275 mol/L quantity exists.

除第一物種、可選之第二物種及一種或超過一種錯合劑外,水性無鈀之活化組合物永久或暫時地包含(iii)一種或超過一種還原劑。該一種或超過一種還原劑對於自至少該第一物種之經溶解之過渡金屬離子形成金屬顆粒係必需的。為此,該等經溶解之過渡金屬離子係經化學還原(連續或半連續)以形成該等顆粒。因此,取決於活化組合物中一種或超過一種還原劑之存在(其係永久或暫時的),該等顆粒分別連續地或半連續地形成。然而,當存在一種或超過一種還原劑時,通常將形成該等顆粒直至該還原劑被用完或存在不足為止。較佳係本發明(用於活化)之方法,其中氧化影響該等顆粒且與還原持續競爭。通常地,一旦該一種或超過一種還原劑被用完就開始氧化,此在本發明之上下文中係明確希望的。In addition to the first species, the optional second species, and one or more than one complexing agent, the aqueous palladium-free activation composition permanently or temporarily comprises (iii) one or more than one reducing agent. The one or more reducing agents are necessary for the formation of metal particles from dissolved transition metal ions of at least the first species. To this end, the dissolved transition metal ions are chemically reduced (continuously or semi-continuously) to form the particles. Thus, the particles are formed continuously or semi-continuously, respectively, depending on the presence of one or more than one reducing agent (either permanently or temporarily) in the activating composition. However, when one or more than one reducing agent is present, the particles will generally be formed until the reducing agent is used up or deficient. Preferred are methods of the present invention (for activation) wherein oxidation affects the particles and continuously competes with reduction. Typically, oxidation begins as soon as the one or more reducing agents have been used up, which is expressly desired in the context of the present invention.

若在本發明(用於活化)之方法中,在一個或超過一個第一步驟(c)之後,該方法被中斷一段比較長的時間,則該氧化另外係極相關的。為防止在該段時間期間沉澱聚結物,在活化組合物中進行該氧化直至不再存在顆粒而僅存在經溶解之過渡金屬離子。較佳地,藉由添加氧化劑,更佳過氧化物,最佳過氧化氫,來促進氧化。在恢復操作後,藉由連續或半連續地添加一種或超過一種還原劑以再形成顆粒來形成顆粒。之後,恢復本發明(用於活化)之方法。If, in the process of the invention (for activation), after one or more than one first step (c), the process is interrupted for a relatively long period of time, the oxidation is additionally highly relevant. To prevent the precipitation of agglomerates during this period of time, the oxidation is carried out in the activation composition until no more particles are present but only dissolved transition metal ions. Preferably, oxidation is promoted by adding an oxidizing agent, more preferably a peroxide, most preferably hydrogen peroxide. After resumption of operation, the particles are formed by continuously or semi-continuously adding one or more than one reducing agent to reformulate the particles. Afterwards, the method of the present invention (for activation) is resumed.

因此,較佳地,該一種或超過一種還原劑適合於還原至少該第一物種之經溶解之過渡金屬離子。Thus, preferably, the one or more than one reducing agent is suitable for reducing at least the dissolved transition metal ions of the first species.

在一些情況下,較佳係本發明(用於活化)之方法,其中該一種或超過一種還原劑包含一個或超過一個氫原子,使得在還原該過渡金屬離子後旋即釋放氫,該等過渡金屬離子至少部分地被吸附在該經活化之表面上。In some cases, the method of the present invention (for activation) is preferred, wherein the one or more reducing agents comprise one or more than one hydrogen atom such that hydrogen is released immediately upon reduction of the transition metal ion, the transition metal Ions are at least partially adsorbed on the activated surface.

較佳係本發明(用於活化)之方法,其中該一種或超過一種還原劑包括含硼之還原劑,較佳係硼氫化物。較佳之硼氫化物包括無機硼氫化物及/或有機硼氫化物。較佳之有機硼氫化物包括烷基胺基硼烷,最佳係二甲基胺基硼烷。較佳之無機硼氫化物包括鹼性硼氫化物,最佳係硼氫化鈉。在本發明(用於活化)之方法中,最佳係鹼性硼氫化物,較佳係硼氫化鈉。此允許在本發明(用於活化)之方法之步驟(c)中之弱酸性pH及溫度在適當範圍(較佳15℃至30℃)內。此等係極佳室溫條件。因此,不需要另外及成本密集之加熱。此外,產生氫。Preferably the method of the present invention (for activation), wherein the one or more than one reducing agent comprises a boron-containing reducing agent, preferably a borohydride. Preferred borohydrides include inorganic borohydrides and/or organic borohydrides. Preferred organoborohydrides include alkylaminoboranes, most preferably dimethylaminoborane. Preferred inorganic borohydrides include basic borohydrides, most preferably sodium borohydride. In the method of the present invention (for activation), the most preferred is an alkaline borohydride, preferably sodium borohydride. This allows the weakly acidic pH and temperature in step (c) of the method of the present invention (for activation) to be within an appropriate range (preferably 15°C to 30°C). These are excellent room temperature conditions. Therefore, no additional and cost-intensive heating is required. In addition, hydrogen is produced.

較佳地,含硼之還原劑,較佳硼氫化物,更佳鹼性硼氫化物及/或烷基胺基硼烷,最佳硼氫化鈉及/或二甲基胺基硼烷係活化組合物中的唯一還原劑。Preferably, boron-containing reducing agent, preferably borohydride, more preferably basic borohydride and/or alkylaminoborane, preferably sodium borohydride and/or dimethylaminoborane-based activation The only reducing agent in the composition.

由於在活化組合物中使用硼氫化物作為一種或超過一種還原劑中之一者,通常形成硼酸及/或其鹽。As a result of the use of borohydride as one of the one or more than one reducing agents in the activation composition, boric acid and/or its salts are typically formed.

在一些情況下,較佳係本發明(用於活化)之方法,其中該一種或超過一種還原劑包括醛(較佳係甲醛)、乙醛酸、乙醛酸之鹽或其混合物,最佳作為唯一還原劑。在此種情況下,避免形成硼酸。In some cases, preferably the method of the present invention (for activation), wherein the one or more than one reducing agent comprises an aldehyde (preferably formaldehyde), glyoxylic acid, a salt of glyoxylic acid or mixtures thereof, most preferably as the only reducing agent. In this case, the formation of boric acid is avoided.

在一些情況下,較佳係本發明(用於活化)之方法,其中該一種或超過一種還原劑包括肼,最佳作為唯一還原劑。此外,在此種情況下,避免形成硼酸。In some cases, the method of the present invention (for activation) is preferred, wherein the one or more than one reducing agent includes hydrazine, most preferably as the sole reducing agent. Furthermore, in this case, the formation of boric acid is avoided.

較佳係本發明(用於活化)之方法,其中該活化組合物包含總濃度在 0.2 mmol/L至500.0 mmol/L (基於活化組合物之總體積)之範圍內,較佳在0.4 mmol/L至350.0 mmol/L之範圍內,更佳在0.6 mmol/L至250.0 mmol/L之範圍內,甚至更佳在0.8 mmol/L至150.0 mmol/L之範圍內,最佳在1.0 mmol/L至80.0 mmol/L之範圍內之一種或超過一種還原劑。特佳之總濃度係在0.9 mmol/L至50.0 mmol/L之範圍內,極佳在1.0 mmol/L至30.0 mmol/L之範圍內,最佳在1.1 mmol/L至10.0 mmol/L之範圍內。最佳地,此適用於前述較佳,更佳等之還原劑;最佳適用於硼氫化物。Preferably the method of the present invention (for activation), wherein the activation composition comprises a total concentration in the range of 0.2 mmol/L to 500.0 mmol/L (based on the total volume of the activation composition), preferably 0.4 mmol/L L to 350.0 mmol/L, more preferably 0.6 mmol/L to 250.0 mmol/L, even more preferably 0.8 mmol/L to 150.0 mmol/L, most preferably 1.0 mmol/L One or more than one reducing agent in the range to 80.0 mmol/L. The optimal total concentration is in the range of 0.9 mmol/L to 50.0 mmol/L, the best is in the range of 1.0 mmol/L to 30.0 mmol/L, the best is in the range of 1.1 mmol/L to 10.0 mmol/L . Optimally, this applies to the aforementioned preferred, better, etc. reducing agents; optimally applies to borohydrides.

一般而言,較佳係本發明(用於活化)之方法,其中該活化組合物中 -  基於活化組合物之總體積及基於離子、非特定形式計,一起構成總濃度之第一物種之金屬離子及其金屬顆粒,及 -  一種或超過一種還原劑(若經半連續添加,在添加時)於總濃度中 係以大於0.5,較佳1或更大,更佳2或更大,甚至更佳3或更大,最佳3.5或更大之莫耳比存在。極佳係在1至20範圍內之莫耳比。因此,在活化組合物中,該一種或超過一種還原劑較佳以某種總濃度(永久地或暫時地)存在,使得第一物種之經溶解之過渡金屬離子未定量地經還原成各別顆粒。此外,較佳係本發明(用於活化)之方法,其中該活化組合物主要不展現還原性環境以防止金屬顆粒之氧化。相反地,如已經提及,氧化係所需及所期的。因此,較佳係本發明(用於活化)之方法,其中該活化組合物主要係保持在氧化條件下以允許金屬顆粒氧化。In general, preferred is the method of the present invention (for activation) wherein the activation composition is - based on the total volume of the activation composition and based on the ionic, unspecified form, the metal ions of the first species and their metal particles together constituting the total concentration, and - one or more than one reducing agent (if added semi-continuously, at the time of addition) in the total concentration It exists in a molar ratio of more than 0.5, preferably 1 or more, more preferably 2 or more, even more preferably 3 or more, and most preferably 3.5 or more. Excellent is a molar ratio in the range of 1 to 20. Thus, in the activation composition, the one or more reducing agents are preferably present in some total concentration (permanently or temporarily) such that the dissolved transition metal ions of the first species are not quantitatively reduced to the respective particles. Furthermore, preferred is the method of the present invention (for activation) wherein the activation composition does not primarily exhibit a reducing environment to prevent oxidation of the metal particles. Rather, as already mentioned, oxidation is required and desired. Therefore, the method of the present invention (for activation) is preferred wherein the activation composition is primarily maintained under oxidizing conditions to allow oxidation of the metal particles.

特佳係本發明(用於活化)之方法,其中該活化組合物中 -  基於活化組合物之總體積及基於離子、非特定形式之一起構成總濃度之第一物種之金屬離子及其金屬顆粒,及 -  總濃度中之一種或超過一種還原劑(若經半連續添加,在添加時) 係以在0.3 to 60.0之範圍內,較佳在0.5至30.0之範圍內,更佳在1.0至20.0之範圍內,甚至更佳在1.5至10.0之範圍內,最佳在1.8至3.0之範圍內之莫耳比存在。Particularly preferred is the method of the present invention (for activation), wherein in the activation composition - based on the total volume of the activating composition and on the basis of the ionic, non-specific forms of the metal ions of the first species and their metal particles which together constitute the total concentration, and - One or more than one reducing agent in total concentration (if added semi-continuously, at the time of addition) It is in the range of 0.3 to 60.0, preferably in the range of 0.5 to 30.0, more preferably in the range of 1.0 to 20.0, even more preferably in the range of 1.5 to 10.0, most preferably in the range of 1.8 to 3.0 Morbi exists.

在一些情況下,較佳係本發明(用於活化)之方法,其中該一種或超過一種還原劑係永久地存在於水性無鈀之活化組合物中。因此,較佳係將一種或超過一種還原劑連續地添加至活化組合物,較佳藉由使包含該一種或超過一種還原劑之各別液體永久流動。在該方法中,在進行本發明(用於活化)之方法之步驟(c)期間,氧化及還原隨時間同時發生。結果,金屬顆粒以比較恆定之濃度存在。In some cases, the method of the present invention (for activation) is preferred, wherein the one or more reducing agents are permanently present in the aqueous palladium-free activation composition. Thus, it is preferred to continuously add one or more than one reducing agent to the activation composition, preferably by permanently flowing the respective liquids comprising the one or more than one reducing agent. In this process, oxidation and reduction occur simultaneously over time during step (c) of the process of the present invention (for activation). As a result, the metal particles are present in a relatively constant concentration.

或者,較佳係本發明(用於活化)之方法,其中該一種或超過一種還原劑係暫時地存在於水性無鈀之活化組合物中。因此,較佳地,半連續地添加一種或超過一種還原劑;例如以連續部分方式,每個部分之間有時間中斷。此意指當添加一種或超過一種還原劑時,形成新製顆粒。然而,在中斷期間,氧化產生經溶解之過渡金屬離子係極重要的。因此,金屬顆粒係以基本上可變濃度存在。然而,根據時間中斷長度並確保中斷不會過長,此種方法完全足以成功活化甚至複數個非傳導或含碳纖維之基材之表面。因此,該方法係特佳的。Alternatively, and preferably, the method of the present invention (for activation), wherein the one or more than one reducing agent is temporarily present in the aqueous palladium-free activation composition. Thus, preferably, the one or more than one reducing agent is added semi-continuously; for example in successive portions, with time interruptions between each portion. This means that fresh granules are formed when one or more than one reducing agent is added. During the interruption, however, it is extremely important that the oxidation produces dissolved transition metal ions. Thus, the metal particles are present in substantially variable concentrations. However, depending on the length of time interruption and ensuring that the interruption is not too long, this method is quite sufficient to successfully activate even the surfaces of multiple non-conductive or carbon fiber-containing substrates. Therefore, this method is particularly preferred.

然而,在任何一種情況下,較佳係本發明(用於活化)之方法,其中該一種或超過一種還原劑係以使得平衡保持可逆之方式存在。因此,可逆平衡不僅係副反應或非所欲之副反應。In either case, however, the method of the present invention (for activation) is preferred wherein the one or more reducing agents are present in such a way that the equilibrium remains reversible. Therefore, reversible equilibrium is not only a side reaction or an undesired side reaction.

在氧化後,由於可逆平衡,該活化組合物中該經溶解之過渡金屬離子之總濃度基本上增加,其中該等金屬顆粒之總量減少。為更佳之製程控制,較佳監測該可逆平衡。因此,較佳係本發明(用於活化)之方法,其中該可逆平衡係藉由UV/VIS檢查監測。較佳地,該等經溶解之過渡金屬離子係在在700 nm至800 nm範圍內,較佳在710 nm至780 nm範圍內,更佳在720 nm至760 nm範圍內,最佳在730 nm至750 nm範圍內之波長下進行監測。亦較佳地,該等金屬顆粒係在在400 nm至600 nm範圍內,較佳在450 nm至550 nm範圍內之波長下進行監測。此允許確定何時添加該一種或超過一種還原劑中之一者以形成(較佳再形成)該等金屬顆粒以增加其總量。After oxidation, due to reversible equilibrium, the total concentration of the dissolved transition metal ions in the activation composition substantially increases, wherein the total amount of metal particles decreases. For better process control, the reversible equilibrium is preferably monitored. Therefore, the method of the present invention (for activation) is preferred, wherein the reversible equilibrium is monitored by UV/VIS inspection. Preferably, the dissolved transition metal ions are in the range of 700 nm to 800 nm, preferably in the range of 710 nm to 780 nm, more preferably in the range of 720 nm to 760 nm, most preferably in the range of 730 nm Monitor at wavelengths in the 750 nm range. Also preferably, the metal particles are monitored at wavelengths in the range of 400 nm to 600 nm, preferably in the range of 450 nm to 550 nm. This allows determining when to add the one or more than one of the reducing agents to form (preferably reformulate) the metal particles to increase their total amount.

因此,較佳係本發明(用於活化)之方法,其中該一種或超過一種還原劑係連續或半連續地添加至該活化組合物,使得分別自第一物種之經溶解之過渡金屬離子連續或半連續地形成其他金屬顆粒,較佳在進行該一個或超過一個步驟(c)後添加。Thus, preferably the method of the present invention (for activation) wherein the one or more than one reducing agent is continuously or semi-continuously added to the activation composition such that the dissolved transition metal ions from the first species, respectively, is continuous Or other metal particles are formed semi-continuously, preferably added after performing the one or more than one step (c).

較佳係本發明(用於活化)之方法,其中該第一物種之金屬顆粒係藉由在進行一個或超過一個步驟(c)之後及/或期間之該還原原位連續或半連續地形成於活化組合物中。此較佳定義為,在本發明(用於活化)之方法中,步驟(c)係進行超過一次,較佳地,重複進行包括步驟(c)之方法。極佳地,在本發明(用於活化)之方法之一個、超過一個或每個步驟(c)之後,藉由該還原新形成金屬顆粒。此係可能的,因為允許並期望該氧化,從而較佳連續但至少半連續地導致新製的經溶解之過渡金屬離子準備用於再還原。此與常用方法相反,其中在進行活化之前形成(並穩定)金屬顆粒,此舉之後通常藉由顆粒穩定化來儘可能長地持續直至各別活化組合物不穩定且不可操作。Preferably the method of the present invention (for activation), wherein the metal particles of the first species are continuously or semi-continuously formed in situ by the reduction after and/or during one or more than one step (c) in the activation composition. This is preferably defined as, in the method of the present invention (for activation), step (c) is performed more than once, preferably the method comprising step (c) is performed repeatedly. Preferably, after one, more than one or each step (c) of the method of the invention (for activation), the metal particles are newly formed by this reduction. This is possible because the oxidation is allowed and desired, preferably continuously, but at least semi-continuously, resulting in freshly prepared dissolved transition metal ions ready for re-reduction. This is in contrast to conventional methods, where metal particles are formed (and stabilized) before activation is performed, which is followed by stabilization of the particles for as long as possible until the respective activation composition is unstable and inoperable.

如在全文中所提及,在本發明之上下文中,較佳必需至少半連續地添加還原劑。通常,用於該還原之還原劑與經溶解之過渡金屬離子反應並產生還原劑降解產物,較佳係硼酸及/或其鹽。通常,此類降解產物累積在活化組合物中,此在本發明之上下文中不係較佳的。因此,較佳係本發明(用於活化)之方法,其中該方法係藉由滲出及進料進行。在此種方法中,一定體積之活化組合物經去除(例如藉由抽出;從而亦去除降解產物)並以使得活化組合物中之必需組分具有足夠恆定之濃度之方式改由置換體積替代(例如,藉助於補充)。此意指置換體積通常不包含硼酸及/或其鹽,較佳不包含還原劑降解產物。此亦有益於使pH穩定至基本上恆定之pH。As mentioned throughout, in the context of the present invention it is preferably necessary to add the reducing agent at least semi-continuously. Typically, the reducing agent used for this reduction reacts with the dissolved transition metal ions and produces a reducing agent degradation product, preferably boric acid and/or its salts. Often, such degradation products accumulate in the activation composition, which is not preferred in the context of the present invention. Therefore, the method of the present invention (for activation) is preferred, wherein the method is carried out by bleed and feed. In this method, a volume of the activation composition is removed (eg, by extraction; thereby also removing degradation products) and replaced by a displacement volume in such a way that the necessary components in the activation composition have a sufficiently constant concentration ( For example, by means of supplements). This means that the displacement volume generally contains no boric acid and/or its salts, preferably no reducing agent degradation products. It is also beneficial to stabilize the pH to a substantially constant pH.

較佳係本發明(用於活化)之方法,其中該活化組合物包含總濃度為5 g/L或更小(基於活化組合物之總體積計),較佳3 g/L或更小,更佳2 g/L或更小,最佳1.2 g/L或更小之硼酸及/或其鹽。此較佳在以下限制條件下適用:(1)一種或超過一種還原劑包括硼氫化物及(2)步驟(c)係進行超過一次。Preferably the method of the present invention (for activation), wherein the activation composition comprises a total concentration of 5 g/L or less (based on the total volume of the activation composition), preferably 3 g/L or less, More preferably 2 g/L or less, most preferably 1.2 g/L or less of boric acid and/or its salts. This preferably applies with the following limitations: (1) one or more than one reducing agent includes a borohydride and (2) step (c) is performed more than once.

較佳係本發明(用於活化)之方法,其中在進行步驟(c)之大部分時間內,可逆平衡主要不偏離至金屬顆粒。Preferred is the method of the present invention (for activation) wherein the reversible equilibrium is not largely deviated to the metal particles during most of the time step (c) is carried out.

較佳係本發明(用於活化)之方法,其中在步驟(c)期間及/或之後,大多數該等金屬顆粒經受該氧化。大多數較佳表示超過50%之顆粒。Preferred is the method of the present invention (for activation) wherein during and/or after step (c) a majority of the metal particles undergo the oxidation. Most preferably represent more than 50% particles.

較佳地,該一種或超過一種還原劑實質上不含或不包含次磷酸鹽離子,較佳實質上不含或不包含含磷之還原劑。吾人實驗已顯示,在一些情況下,利用此種還原劑之活化過於弱或甚至不完全。Preferably, the one or more than one reducing agent is substantially free or free of hypophosphite ions, preferably substantially free or free of phosphorus-containing reducing agents. Our experiments have shown that, in some cases, activation with such reducing agents is too weak or even incomplete.

如以上已經概述,該活化組合物並不另外需要穩定化合物。因此,較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含防止金屬顆粒氧化之化合物及/或係實質上不含或不包含使金屬顆粒穩定之穩定劑化合物。較佳地,該活化組合物係實質上不含或不包含藉由防止金屬顆粒之聚結來使金屬顆粒穩定之穩定劑化合物。在本發明之上下文中,該一種或超過一種還原劑(暫時地或永久地存在於活化組合物中)及參與氧化之化合物(較佳環境空氣及/或氧氣(亦即,最佳分子氧))不被認為係此種化合物。而是需要一種或超過一種還原劑以便形成金屬顆粒,此包括再形成顆粒。此意指該活化組合物除該一種或超過一種還原劑及參與氧化之化合物之外實質上不含或不包含穩定劑化合物及/或防止金屬顆粒氧化之化合物。因此,較佳係本發明(用於活化)之方法,其中該一種或超過一種還原劑不以防止氧化之總量存在,較佳地不以防止在進行一個或超過一個步驟(c)之後或期間氧化之總量存在。如所概述,需要氧化,最佳藉由環境空氣之氧化,以再形成經溶解之過渡金屬離子,使得不形成該等金屬顆粒之沉澱聚結物。As already outlined above, the activation composition does not additionally require a stabilizing compound. Therefore, preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or free of compounds that prevent oxidation of metal particles and/or is substantially free or free of compounds that stabilize metal particles stabilizer compound. Preferably, the activation composition is substantially free or free of stabilizer compounds that stabilize the metal particles by preventing agglomeration of the metal particles. In the context of the present invention, the one or more than one reducing agent (temporarily or permanently present in the activation composition) and the compounds involved in oxidation (preferably ambient air and/or oxygen (ie, optimal molecular oxygen) ) are not considered to be such compounds. Rather, one or more than one reducing agent is required in order to form the metal particles, which includes reforming the particles. This means that the activating composition is substantially free or free of stabilizer compounds and/or compounds that prevent oxidation of the metal particles other than the one or more reducing agents and compounds involved in oxidation. Therefore, it is preferred that the method of the present invention (for activation), wherein the one or more than one reducing agent is not present in an amount to prevent oxidation, preferably not to prevent after one or more than one step (c) or The total amount of oxidation is present during the period. As outlined, oxidation, preferably by oxidation of ambient air, is required to reform the dissolved transition metal ions so that precipitation agglomerates of the metal particles are not formed.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含完全或部分包封金屬顆粒或完全或部分吸附至顆粒之表面上之化合物。據信,一些穩定劑化合物係基於此種功能。在本發明之上下文中,此是不期望的。Preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or does not contain compounds that fully or partially encapsulate metal particles or that are fully or partially adsorbed to the surface of the particles. It is believed that some stabilizer compounds are based on this function. In the context of the present invention, this is not desired.

一般而言,較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含防止平衡可逆之化合物及/或係實質上不含或不包含為使平衡完全朝著金屬顆粒偏離的化合物。同樣地,出於以上所概述原因,該一種或超過一種還原劑不被認為係此種化合物。In general, preferred are methods of the present invention (for activation) wherein the activation composition is substantially free or free of compounds that prevent reversibility of equilibrium and/or is substantially free or free to complete equilibrium Compounds that deviate towards metal particles. Likewise, the one or more reducing agents are not considered to be such compounds for the reasons outlined above.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含錫離子,較佳係實質上不含或不包含錫離子、鉛離子、鍺離子、鎵離子、銻離子、鉍離子及鋁離子,更佳係實質上不含或不包含元素週期表III、IV及V主族之金屬離子。在本發明之上下文中,「III主族之金屬離子」不包括各別含硼離子。特別地,非常熟知錫離子可防止例如各別無鈀之銅-錫活化組合物中之銅顆粒氧化,從而防止平衡為可逆。此種錫離子通常形成還原性環境,此在本發明之上下文中絕非所期。Preferably the method of the present invention (for activation) wherein the activation composition is substantially free or free of tin ions, preferably substantially free or free of tin ions, lead ions, germanium ions, gallium ions , antimony ions, bismuth ions and aluminum ions, and more preferably substantially free or free of metal ions of main groups III, IV and V of the periodic table of elements. In the context of the present invention, "metal ions of main group III" do not include the respective boron-containing ions. In particular, tin ions are well known to prevent oxidation of copper particles, such as in copper-tin activation compositions without palladium, respectively, thereby preventing the equilibrium from being reversible. Such tin ions generally form a reducing environment, which is by no means contemplated in the context of the present invention.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含聚乙烯吡咯啶酮,較佳係實質上不含或不包含聚乙烯基化合物,更佳係實質上不含或不包含包含乙烯基部分之有機聚合物,最佳係實質上不含或不包含經溶解之有機聚合物。Preferably the method of the present invention (for activation), wherein the activation composition is substantially free or free of polyvinylpyrrolidone, preferably substantially free or free of polyvinyl compounds, more preferably Substantially free or free of organic polymers containing vinyl moieties, most preferably substantially free or free of dissolved organic polymers.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含蛋白質、瓊脂、阿拉伯膠(gum Arabic)、糖及多元醇。Preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or free of proteins, agar, gum Arabic, sugars and polyols.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含甘油。Preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or free of glycerol.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含明膠。Preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or free of gelatin.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含硫脲,較佳係實質上不含或不包含具有二價硫之含硫化合物,更佳係實質上不含或不包含硫之氧化數為+5或以下之含硫化合物。Preferably the method of the present invention (for activation), wherein the activation composition is substantially free or free of thiourea, preferably substantially free or free of sulfur-containing compounds with divalent sulfur, more preferably A sulfur-containing compound with an oxidation number of +5 or less that is substantially free or free of sulfur.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含包含芳族環及磺酸基之化合物(包括其鹽),較佳係實質上不含或不包含磺酸或其鹽。Preferably, the method of the present invention (for activation), wherein the activation composition is substantially free or free of compounds containing aromatic rings and sulfonic acid groups (including salts thereof), preferably substantially free or Does not contain sulfonic acid or its salts.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含稱為Orzan-S之化合物。Preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or free of a compound known as Orzan-S.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含脲。Preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or free of urea.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含分散劑。Preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or free of dispersants.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含聚乙烯亞胺,較佳係實質上不含或不包含聚伸烷基亞胺,最佳係實質上不含或不包含包含亞胺部分之有機聚合物。Preferably the method of the present invention (for activation), wherein the activation composition is substantially free or free of polyethyleneimine, preferably substantially free or free of polyalkyleneimine, most preferably are substantially free or free of organic polymers containing imine moieties.

特定言之,如上所提及的聚合物通常用作穩定劑化合物以使金屬顆粒穩定。然而,在本發明之上下文中,聚合物非必需的。此外,據信若沒有此種分子在顆粒周圍形成殼,則該等金屬顆粒明顯更有效/更具活性。In particular, polymers as mentioned above are often used as stabilizer compounds to stabilize metal particles. However, in the context of the present invention, polymers are not necessary. Furthermore, it is believed that without such molecules forming a shell around the particles, the metal particles are significantly more effective/active.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含十二烷基硫酸鈉,較佳係實質上不含或不包含具有8至20個碳原子之烷基硫酸鹽,更佳係實質上不含或不包含烷基硫酸鹽,最佳係實質上不含或不包含表面活性劑。Preferably the method of the present invention (for activation) wherein the activation composition is substantially free or free of sodium dodecyl sulfate, preferably substantially free or free of having 8 to 20 carbon atoms The alkyl sulfates are more preferably substantially free or free of alkyl sulfates, and most preferably substantially free or free of surfactants.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含氫醌、焦棓酚(pyrogallol)及/或間苯二酚,較佳係實質上不含或不包含羥基苯。在許多情況下,此種羥基苯通常用作抗氧化劑,從而防止平衡為可逆,此在活化組合物中係不需要的。Preferably the method of the present invention (for activation) wherein the activation composition is substantially free or free of hydroquinone, pyrogallol and/or resorcinol, preferably substantially free or without hydroxybenzene. In many cases, such hydroxybenzenes are commonly used as antioxidants, preventing the equilibrium from being reversible, which is not desired in an activating composition.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含醌。Preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or free of quinones.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含脂肪醇。Preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or free of fatty alcohols.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含烷二醇,較佳係實質上不含或不包含二醇。Preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or free of alkanediols, preferably substantially free or free of glycols.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含錳離子。Preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or free of manganese ions.

較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含鋅離子。Preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or free of zinc ions.

因此且特定言之,儘管活化組合物不包含穩定化合物及/或防止金屬顆粒氧化之化合物,但較佳係本發明(用於活化)之方法,其中該活化組合物係實質上不含或不包含該等金屬顆粒之沉澱聚結物。達成此係因為沒有抑制(亦即沒有避免)氧化,而是至少該第一物種之經溶解之過渡金屬離子及其金屬顆粒分別重複參與該還原及該氧化。Thus and in particular, although the activation composition does not include stabilizing compounds and/or compounds that prevent oxidation of the metal particles, preferably the method of the present invention (for activation) is wherein the activation composition is substantially free or free of Precipitated agglomerates comprising these metal particles. This is achieved because the oxidation is not inhibited (ie not avoided), but at least the dissolved transition metal ions of the first species and their metal particles are repeatedly involved in the reduction and the oxidation, respectively.

較佳係本發明(用於活化)之方法,其中「重複參與」明確地包括至少超過一次,較佳超過兩次,甚至更佳超過三次,最佳超過四次,甚至最佳活化組合物之整個使用壽命內。Preferably the method of the present invention (for activation), wherein "repetitive participation" specifically includes at least more than once, preferably more than two times, even more preferably more than three times, most preferably more than four times, and even optimally the activation of the composition. throughout the service life.

吾人實驗已顯示,特定言之,其係防止聚結之氧化。該等金屬顆粒經氧化回至其離子/溶解形式。此意指沒有足夠的時間使顆粒形成更高聚集物且甚至形成聚結物。儘管每種適宜氧化劑均係基本上可適用的,但證明環境空氣係極佳選擇。其足夠強且無處不在。較佳係本發明(用於活化)之方法,其中藉由該氧化,較佳藉由環境空氣及/或氧氣之氧化,防止形成該等金屬顆粒之沉澱聚結物。較佳係本發明(用於活化)之方法,其中該等經溶解之過渡金屬離子係自金屬顆粒藉由環境空氣及/或氧氣之氧化而形成。在兩種情況下,較佳之氧化劑係分子氧。最佳係本發明(用於活化)之方法,其中大多數經溶解之過渡金屬離子係自大多數金屬顆粒藉由環境空氣及/或氧氣之氧化而形成。Our experiments have shown, in particular, that it prevents the oxidation of coalescence. The metal particles are oxidized back to their ionic/dissolved form. This means that there is not enough time for the particles to form higher aggregates and even agglomerates. While basically every suitable oxidant is suitable, ambient air has proven to be an excellent choice. It's strong enough and ubiquitous. Preferred is the method of the present invention (for activation) wherein by the oxidation, preferably by oxidation of ambient air and/or oxygen, the formation of precipitation agglomerates of the metal particles is prevented. Preferred is the method of the present invention (for activation) wherein the dissolved transition metal ions are formed from metal particles by oxidation of ambient air and/or oxygen. In both cases, the preferred oxidant is molecular oxygen. Best is the method of the present invention (for activation) wherein most of the dissolved transition metal ions are formed from the oxidation of most metal particles by ambient air and/or oxygen.

在一些情況下,較佳係本發明(用於活化)之方法,其中該連續或半連續氧化係藉由非分子氧之氧化劑,更佳藉由過氧化物,最佳係過氧化氫另外或單獨地達成。特定言之,除環境空氣之外,此較佳促進顆粒之氧化,若此係需要的,例如,若活化組合物必須進行滅活並儲存更長時間。In some cases, the method of the present invention (for activation) is preferred, wherein the continuous or semi-continuous oxidation is by an oxidizing agent that is not molecular oxygen, more preferably by peroxide, most preferably hydrogen peroxide, additionally or achieved individually. In particular, in addition to ambient air, this preferably promotes oxidation of the particles if this is desired, eg, if the activating composition must be inactivated and stored for longer periods of time.

為充分促進活化組合物中之氧化,較佳係本發明(用於活化)之方法,其中該活化組合物較佳藉由搖動、攪拌及/或泵送而連續或半連續地循環。此較佳係確保氧化均等地分佈在整個活化組合物中。換言之,此確保金屬顆粒與氧化劑均等地接觸,此促進氧化。To adequately promote oxidation in an activation composition, the method of the present invention (for activation) is preferred, wherein the activation composition is preferably circulated continuously or semi-continuously by shaking, stirring and/or pumping. This preference ensures that the oxidation is evenly distributed throughout the activation composition. In other words, this ensures that the metal particles are in equal contact with the oxidizing agent, which promotes oxidation.

極最佳係(用於活化)用於金屬化之非傳導或含碳纖維之基材表面的方法,該方法包括以下步驟 (a)    提供該基材, (b)    提供水性無鈀之活化組合物,其包含 (i)    第一物種之經溶解之過渡金屬離子及其另外膠體金屬顆粒,其中該第一物種係銅, (ii)   一種或超過一種錯合劑,其包含羥基三羧酸及/或其鹽,較佳檸檬酸、其結構異構體及/或鹽, (iii)  永久或暫時地,一種或超過一種含硼還原劑,較佳係硼氫化物, (iv)  視需要,不同於第一物種之一種或超過一種第二物種之經溶解之金屬離子,其中第二物種較佳係鎳, 其中 -  該活化組合物係膠體懸浮液,及 -  至少該等第一物種,經溶解之過渡金屬離子及其金屬顆粒係以可逆平衡方式存在,其限制條件為 -   該等金屬顆粒係自經溶解之過渡金屬離子藉由一種或超過一種還原劑之連續或半連續還原形成, -   該等經溶解之過渡金屬離子係自金屬顆粒藉由周圍空氣之氧化而連續或半連續地氧化形成, -   該等經溶解之過渡金屬離子及其金屬顆粒分別重複地參與該還原及該氧化,使得不形成該等金屬顆粒之沉澱聚結物,及 (c)    使基材與該活化組合物接觸,使得過渡金屬或過渡金屬合金沉積在該基材之表面上且獲得用於金屬化之活化表面,其中該等金屬顆粒係在進行一個或超過一個步驟(c)之後及/或期間藉由該還原在活化組合物中連續地或半連續地原位形成。The very best system (for activation) method for metallization of non-conductive or carbon fiber-containing substrate surfaces, the method comprising the following steps (a) providing the substrate, (b) providing an aqueous palladium-free activation composition comprising (i) dissolved transition metal ions of a first species and other colloidal metal particles thereof, wherein the first species is copper, (ii) one or more than one complexing agent comprising hydroxytricarboxylic acids and/or salts thereof, preferably citric acid, structural isomers and/or salts thereof, (iii) permanently or temporarily, one or more than one boron-containing reducing agent, preferably a borohydride, (iv) dissolved metal ions different from one of the first species or more than one second species, preferably nickel, as desired, in - the activating composition is a colloidal suspension, and - At least these first species, the dissolved transition metal ions and their metal particles exist in a reversible equilibrium, with the restriction that - the metal particles are formed from the continuous or semi-continuous reduction of dissolved transition metal ions by one or more than one reducing agent, - these dissolved transition metal ions are formed from the continuous or semi-continuous oxidation of metal particles by oxidation of the surrounding air, - the dissolved transition metal ions and their metal particles participate repeatedly in the reduction and the oxidation, respectively, so that precipitation agglomerates of the metal particles are not formed, and (c) contacting a substrate with the activation composition such that a transition metal or transition metal alloy is deposited on the surface of the substrate and an activated surface for metallization is obtained, wherein the metal particles are subjected to one or more than one The reduction is continuously or semi-continuously formed in situ in the activation composition after and/or during step (c).

本發明亦關於一種製備用於活化用於金屬化之非傳導或含碳纖維之基材表面的水性無鈀之活化組合物(較佳係如用於本發明(用於活化)之方法中之活化組合物)之方法,該方法包括以下步驟 (1)    提供水性起始溶液,其包含 -   第一物種之經溶解之過渡金屬離子, -   一種或超過一種錯合劑,及 -   視需要,不同於第一物種之一種或超過一種第二物種之經溶解之金屬離子, (2)    連續或半連續地添加一種或超過一種還原劑至起始溶液,使得溶液中分別連續或半連續地形成至少第一物種之經溶解之過渡金屬離子之金屬顆粒, 其限制條件係該等金屬顆粒係連續或半連續地氧化以形成第一物種之經溶解之過渡金屬離子。The present invention also relates to a preparation of an aqueous palladium-free activation composition for activating the surface of a non-conductive or carbon fiber-containing substrate for metallization (preferably activation as used in the method of the present invention (for activation) composition) method, the method comprises the following steps (1) Provide an aqueous starting solution containing - the dissolved transition metal ion of the first species, - one or more than one complexing agent, and - as required, a dissolved metal ion other than one of the first species or more than one second species, (2) continuously or semi-continuously adding one or more than one reducing agent to the starting solution such that metal particles of dissolved transition metal ions of at least the first species are formed in the solution continuously or semi-continuously, respectively, The limitation is that the metal particles are continuously or semi-continuously oxidized to form dissolved transition metal ions of the first species.

關於本發明(用於活化)之方法之前述較佳地同樣適用於本發明之用於製備水性無鈀之活化組合物之方法,最佳地,如前述所定義係較佳的。The foregoing about the method of the present invention (for activation) preferably applies equally to the method of the present invention for the preparation of an aqueous palladium-free activation composition, most preferably, as defined above.

本發明亦關於在可逆平衡中之第一物種之經溶解之過渡金屬離子之連續或半連續還原組合第一物種之金屬顆粒連續或半連續氧化以在水性無鈀之活化組合物中連續或半連續地原位形成金屬顆粒之用途。The present invention also relates to continuous or semi-continuous reduction of dissolved transition metal ions of the first species in reversible equilibrium combining continuous or semi-continuous oxidation of metal particles of the first species for continuous or semi-continuous oxidation in aqueous palladium-free activation compositions Use for continuous in-situ formation of metal particles.

關於本發明(用於活化)之方法之前述較佳地同樣適用於本發明之用途,最佳地,如上文所定義係較佳的。The foregoing with respect to the method of the present invention (for activation) preferably applies equally to the use of the present invention, most preferably, as defined above.

本發明亦關於一種活化用於金屬化之非傳導或含碳纖維之基材表面的水性無鈀之活化組合物,該組合物包含 (i)    第一物種之經溶解之過渡金屬離子及另外其金屬顆粒, (ii)   一種或超過一種錯合劑, (iii)  永久或暫時地,一種或超過一種還原劑, (iv)   視需要,不同於第一物種之一種或超過一種第二物種之經溶解之金屬離子, 其中 -  至少該等第一物種,經溶解之過渡金屬離子及其金屬顆粒係以可逆平衡方式存在,其限制條件為 -   該等金屬顆粒係自經溶解之過渡金屬離子藉由一種或超過一種還原劑之連續或半連續還原形成, -   該等經溶解之過渡金屬離子之藉由該等顆粒之連續或半連續氧化自金屬顆粒形成,及 -   該等經溶解之過渡金屬離子及其金屬顆粒分別重複地參與該還原及該氧化,使得不形成該等金屬顆粒之沉澱聚結物。The present invention also relates to an aqueous palladium-free activation composition for activating the surface of a non-conductive or carbon fiber-containing substrate for metallization, the composition comprising (i) dissolved transition metal ions of the first species and further metal particles thereof, (ii) one or more than one complexing agent, (iii) permanently or temporarily, one or more than one reducing agent, (iv) dissolved metal ions other than one of the first species or more than one second species, as required, in - At least these first species, the dissolved transition metal ions and their metal particles exist in a reversible equilibrium, with the restriction that - the metal particles are formed from the continuous or semi-continuous reduction of dissolved transition metal ions by one or more than one reducing agent, - the formation of the dissolved transition metal ions from the metal particles by continuous or semi-continuous oxidation of the particles, and - The dissolved transition metal ions and their metal particles repeatedly participate in the reduction and the oxidation, respectively, so that precipitation agglomerates of the metal particles are not formed.

關於本發明(用於活化)之方法之前述較佳地同樣適用於本發明之水性無鈀之活化組合物,最佳地,如上文所定義係較佳的。The foregoing with regard to the method of the present invention (for activation) preferably applies equally to the aqueous palladium-free activation composition of the present invention, most preferably, as defined above.

較佳地,本發明之活化組合物係在10℃至90℃之範圍內,較佳在14℃至75℃之範圍內,更佳16℃至65℃之範圍內,最佳18℃至45℃之範圍內,甚至最佳20℃至32℃之範圍內之溫度下獲得及/或具有該溫度。特定言之,較佳係18℃至45℃之範圍內,較佳20℃至32℃之範圍內之溫度,其限制條件係一種或超過一種還原劑為硼氫化物,較佳係硼氫化鈉。特定言之,此亦較佳地適用於本發明(用於製備該活化組合物)之方法及本發明(用於活化)之方法。Preferably, the activation composition of the present invention is in the range of 10°C to 90°C, preferably in the range of 14°C to 75°C, more preferably in the range of 16°C to 65°C, most preferably in the range of 18°C to 45°C. This temperature can be obtained and/or possessed at a temperature in the range of °C, even optimally in the range of 20°C to 32°C. Specifically, the temperature is preferably in the range of 18°C to 45°C, preferably in the range of 20°C to 32°C, and the limitation is that one or more than one reducing agent is borohydride, preferably sodium borohydride. . In particular, this also preferably applies to the method of the present invention (for preparing the activation composition) and the method of the present invention (for activation).

更佳地,本發明之活化組合物不係在高於110℃,較佳高於100°C,更佳高於95°C之溫度下獲得及/或不具有該溫度。最佳地,本發明之活化組合物不係在高於110℃之溫度下獲得。此同樣較佳地適用於本發明(用於製備該活化組合物)之方法及本發明(用於活化)之方法。活化: More preferably, the activation composition of the present invention is not obtained at and/or does not have a temperature above 110°C, preferably above 100°C, more preferably above 95°C. Optimally, the activation compositions of the present invention are not obtained at temperatures above 110°C. The same preferably applies to the method of the present invention (for preparing the activation composition) and the method of the present invention (for activation). activation:

在本發明(用於活化)之方法之步驟(c)中,使基材與水性無鈀之活化組合物接觸以便藉由沉積金屬或金屬合金,亦即沉積晶種或活化層而獲得用於金屬化之活化表面。In step (c) of the method of the present invention (for activation), the substrate is brought into contact with an aqueous palladium-free activation composition in order to obtain by depositing a metal or metal alloy, ie depositing a seed or an activation layer, for Metallized activated surface.

較佳係本發明(用於活化)之方法,其中在步驟(c)中,該接觸係在在10℃至90℃之範圍內,較佳在14℃至75℃之範圍內,更佳在16℃至65℃之範圍內,最佳在18℃至45℃之範圍內,甚至最佳在20℃至32℃之範圍內之溫度下進行。特定言之,較佳係步驟(c)中,在18℃至45℃之範圍內,較佳在20℃至32℃之範圍內之溫度,且其中藉由一種或超過一種還原劑之該還原係硼氫化物,較佳係硼氫化鈉。Preferably the method of the present invention (for activation), wherein in step (c) the contact is in the range of 10°C to 90°C, preferably in the range of 14°C to 75°C, more preferably in the range of 10°C to 90°C It is carried out at a temperature in the range of 16°C to 65°C, preferably in the range of 18°C to 45°C, and even optimally in the range of 20°C to 32°C. In particular, preferably in step (c), a temperature in the range of 18°C to 45°C, preferably in the range of 20°C to 32°C, and wherein the reduction by one or more than one reducing agent It is borohydride, preferably sodium borohydride.

較佳係本發明(用於活化)之方法,其中在步驟(c)中,該接觸係進行在1分鐘至10分鐘之範圍內,較佳進行2分鐘至8分鐘,更佳進行3分鐘至6分鐘,最佳進行3.5分鐘至5分鐘的時間。Preferably, the method of the present invention (for activation), wherein in step (c), the contacting is carried out in the range of 1 minute to 10 minutes, preferably 2 minutes to 8 minutes, more preferably 3 minutes to 10 minutes. 6 minutes, preferably 3.5 minutes to 5 minutes.

較佳係本發明(用於活化)之方法,其中在步驟(c)之後進行沖洗步驟。在此種情況下,獲得用於金屬化之經沖洗之活化表面。較佳地,沖洗係用水進行。Preferred is the method of the present invention (for activation) wherein step (c) is followed by a rinsing step. In this case, a rinsed activated surface for metallization is obtained. Preferably, rinsing is performed with water.

較佳係本發明(用於活化)之方法,其中該方法係進行10天或更長,而無需在一個步驟中更換大部分活化組合物(亦即,超過50體積%之組合物),較佳50天或更長,更佳200天或更長,甚至更佳1年或更長,最佳2年或更長,甚至最佳5年或更長。金屬化: Preferably the method of the present invention (for activation), wherein the method is carried out for 10 days or more without replacing most of the activation composition (i.e., more than 50% by volume of the composition) in one step, compared to Preferably 50 days or longer, better 200 days or longer, even better 1 year or longer, best 2 years or longer, even better 5 years or longer. Metalization:

本發明另外關於一種金屬化非傳導或含碳纖維之基材之活化表面的方法,該方法包括步驟 (A)   提供藉由本發明(用於活化)之方法獲得的具有用於金屬化之活化表面之非傳導或含碳纖維之基材,較佳地,如在全文中所定義係較佳的, (B)   藉由使活化表面與第一金屬化溶液接觸來金屬化該活化表面使得第一金屬化層沉積在該活化表面上。The present invention further relates to a method of metallizing the activated surface of a non-conductive or carbon fiber-containing substrate, the method comprising the steps of (A) providing a non-conductive or carbon fiber-containing substrate with an activated surface for metallization obtained by the method of the present invention (for activation), preferably, preferably as defined in the text, (B) metallizing the activated surface by contacting the activated surface with a first metallization solution such that a first metallization layer is deposited on the activated surface.

在本發明(用於金屬化)之方法之步驟(A)中,提供如藉由本發明(用於活化)之方法獲得的具有活化表面之非傳導或含碳纖維之基材;關於詳細內容,參見上文。關於本發明(用於活化)之方法之前述較佳適用於本發明用於金屬化之方法,最佳地,如所述係較佳的。In step (A) of the method of the invention (for metallization), a non-conductive or carbon fiber-containing substrate with an activated surface as obtained by the method of the invention (for activation) is provided; for details, see above. The foregoing with respect to the method of the present invention (for activation) preferably applies to the method of the present invention for metallization, most preferably, as described.

較佳係本發明(用於金屬化)之方法,其中在步驟(B)中,該第一金屬化層係沉積在本發明(用於活化)之方法之步驟(c)中獲得的過渡金屬或過渡金屬合金上之不同層。Preferably the method of the present invention (for metallization), wherein in step (B) the first metallization layer is deposited on the transition metal obtained in step (c) of the method of the present invention (for activation) or different layers on transition metal alloys.

較佳係本發明(用於金屬化)之方法,其中在步驟(B)中,該第一金屬化溶液係基本上不含或不包含金屬離子與其顆粒之間的可逆平衡;更佳係基本上不含或不包含金屬/金屬合金顆粒,最佳係基本上不含或不包含任何顆粒。Preferably the method of the present invention (for metallization), wherein in step (B), the first metallization solution is substantially free or free of reversible equilibrium between metal ions and their particles; more preferably substantially is free or free of metal/metal alloy particles, and most preferably is substantially free or free of any particles.

較佳係本發明(用於金屬化)之方法,其中在步驟(B)中,該第一金屬化溶液包含還原劑或不包含還原劑。Preferably the method of the present invention (for metallization), wherein in step (B) the first metallization solution contains or does not contain a reducing agent.

較佳係本發明(用於金屬化)之方法,其中步驟(B)係在在10℃至95℃之範圍內,較佳在15℃至85℃之範圍內,更佳在20℃至65℃之範圍內,甚至更佳在25℃至55℃之範圍內,最佳在30℃至45℃之範圍內之溫度下進行。Preferably the method of the present invention (for metallization), wherein step (B) is in the range of 10°C to 95°C, preferably 15°C to 85°C, more preferably 20°C to 65°C °C, even better in the range of 25°C to 55°C, most preferably at a temperature in the range of 30°C to 45°C.

較佳係本發明(用於金屬化)之方法,其中步驟(B)係進行30秒至180分鐘,較佳45秒至120分鐘,更佳1分鐘至60分鐘,最佳1.5分鐘至45分鐘。Preferably the method of the present invention (for metallization), wherein step (B) is carried out for 30 seconds to 180 minutes, preferably 45 seconds to 120 minutes, more preferably 1 minute to 60 minutes, and most preferably 1.5 minutes to 45 minutes .

較佳係本發明(用於金屬化)之方法,其中在步驟(B)中,該第一金屬化溶液不包含還原劑且係浸漬式金屬化溶液,較佳包含選自由鈀離子、鉑離子、銀離子、金離子及汞離子組成之群之一種或超過一種物種之離子,更佳包含鈀離子,最佳包含總濃度在0.05 mg/L至20 mg/L之範圍內之鈀離子。It is preferably the method of the present invention (for metallization), wherein in step (B), the first metallization solution does not contain a reducing agent and is an immersion metallization solution, preferably containing palladium ions, platinum ions One or more than one species of ions of the group consisting of , silver ions, gold ions and mercury ions, preferably palladium ions, and preferably palladium ions with a total concentration in the range of 0.05 mg/L to 20 mg/L.

更佳係本發明(用於金屬化)之方法,其中在步驟(B)中,該第一金屬化溶液係酸性鈀浸漬式金屬化溶液。More preferably, the method of the present invention (for metallization), wherein in step (B), the first metallization solution is an acidic palladium impregnated metallization solution.

較佳係本發明(用於金屬化)之方法,其中在步驟(B)中,該第一金屬化溶液係浸漬式金屬化溶液,其包含總濃度在0.09 mg/L至10.0 mg/L之範圍內(基於金屬化溶液之總體積),較佳在0.1 mg/L至5.0 mg/L之範圍內,更佳在0.12 mg/L至3.0 mg/L之範圍內,甚至更佳在0.15 mg/L至2.0 mg/L之範圍內,最佳在0.2 mg/L至1 mg/L之範圍內,甚至最佳在0.22 mg/L至0.75 mg/L之範圍內之鈀離子。若金屬化溶液為酸性,則此特別適用。與本發明(用於活化)之方法組合,與習知先前技術金屬化溶液相比,此種金屬化溶液驚人地需要明顯低濃度之鈀離子,但在本發明之上下文中,而不損害金屬化結果/品質。Preferably, the method of the present invention (for metallization), wherein in step (B), the first metallization solution is an immersion metallization solution containing a total concentration of 0.09 mg/L to 10.0 mg/L range (based on the total volume of metallization solution), preferably in the range of 0.1 mg/L to 5.0 mg/L, more preferably in the range of 0.12 mg/L to 3.0 mg/L, even better in the range of 0.15 mg /L to 2.0 mg/L, preferably in the range of 0.2 mg/L to 1 mg/L, and even optimally in the range of 0.22 mg/L to 0.75 mg/L of palladium ions. This is especially true if the metallization solution is acidic. In combination with the method of the present invention (for activation), such metallization solutions require surprisingly low concentrations of palladium ions compared to known prior art metallization solutions, but in the context of the present invention, without damaging the metal results/quality.

或者,較佳係本發明(用於金屬化)之方法,其中在步驟(B)中,該第一金屬化溶液包含還原劑且係自催化型金屬化溶液,較佳包含一種或超過一種物種之過渡金屬離子,更佳包含銅離子及/或鎳離子。Alternatively, preferably the method of the present invention (for metallization), wherein in step (B) the first metallization solution contains a reducing agent and is an autocatalytic metallization solution, preferably containing one or more than one species The transition metal ions preferably include copper ions and/or nickel ions.

然而,不管何類型,該第一金屬化溶液為,較佳地其為不含顆粒之澄清溶液。Regardless of the type, however, the first metallization solution is, preferably, a clear solution free of particles.

較佳係本發明(用於金屬化)之方法,其包括以下步驟 (A)   提供藉由本發明(用於活化)之方法獲得的具有用於金屬化之活化表面之非傳導或含碳纖維之基材,較佳地,如在全文中所定義係較佳的, (B)   藉由使活化表面與第一金屬化溶液接觸來金屬化該活化表面,該第一金屬化溶液係包含銅離子及還原劑之自動催化型金屬化溶液使得包含銅或銅合金之第一金屬化層沉積在活化表面上。Preferably the method of the present invention (for metallization) comprises the following steps (A) providing a non-conductive or carbon fiber-containing substrate with an activated surface for metallization obtained by the method of the present invention (for activation), preferably, preferably as defined in the text, (B) metallizing the activated surface by contacting the activated surface with a first metallization solution, the first metallization solution being an autocatalytic metallization solution comprising copper ions and a reducing agent such that a first metallization solution comprising copper or a copper alloy A metallization layer is deposited on the activated surface.

或者,較佳係本發明(用於金屬化)之方法,其包括以下步驟 (A)   提供藉由本發明(用於活化)之方法獲得的具有用於金屬化之活化表面之非傳導或含碳纖維之基材,較佳地,如在全文中所定義係較佳的, (B)   藉由使活化表面與第一金屬化溶液接觸來金屬化該活化表面,該第一金屬化溶液係包含鈀離子之浸漬式金屬化溶液(較佳如前文所述)使得包含鈀之第一金屬化層至少部分地沉積在活化表面上,及於隨後 (C)   藉由使第一金屬化層與第二金屬化溶液接觸來金屬化該第一金屬化層使得該第二金屬化層沉積在該第一金屬化層上。Alternatively, preferably the method of the present invention (for metallization) comprises the following steps (A) providing a non-conductive or carbon fiber-containing substrate with an activated surface for metallization obtained by the method of the present invention (for activation), preferably, preferably as defined in the text, (B) metallizing the activated surface by contacting the activated surface with a first metallization solution, the first metallization solution being an impregnated metallization solution containing palladium ions (preferably as previously described) such that the palladium containing solution a first metallization layer is at least partially deposited on the activated surface, and subsequently (C) metallizing the first metallization layer by contacting the first metallization layer with a second metallization solution such that the second metallization layer is deposited on the first metallization layer.

較佳係本發明(用於金屬化)之方法,其中在步驟(C)中,該第二金屬化溶液包含還原劑,較佳包含還原劑及鎳離子。Preferably, the method of the present invention (for metallization), wherein in step (C), the second metallization solution contains a reducing agent, preferably a reducing agent and nickel ions.

因此,較佳係本發明(用於金屬化)之方法,其中在步驟(C)中,該第二金屬化層包含鎳;較佳係鎳或鎳合金層。Therefore, preferably the method of the present invention (for metallization), wherein in step (C), the second metallization layer comprises nickel; preferably a nickel or nickel alloy layer.

然而,在其他情況下,較佳係本發明(用於金屬化)之方法,其中在步驟(C)中,該第二金屬化溶液包含還原劑,較佳包含還原劑及銅離子。However, in other cases, the method of the present invention (for metallization) is preferred, wherein in step (C) the second metallization solution comprises a reducing agent, preferably a reducing agent and copper ions.

因此,較佳係本發明(用於金屬化)之方法,其中在步驟(C)中,該第二金屬化層包含銅;較佳係銅或銅合金層。Therefore, preferably the method of the present invention (for metallization), wherein in step (C), the second metallization layer comprises copper; preferably a copper or copper alloy layer.

在其他情況下,較佳係本發明(用於金屬化)之方法,其中在步驟(C)中,該第二金屬化溶液包含還原劑,較佳包含還原劑及鈷離子。In other cases, the method of the present invention (for metallization) is preferred, wherein in step (C), the second metallization solution contains a reducing agent, preferably a reducing agent and cobalt ions.

因此,較佳係本發明(用於金屬化)之方法,其中在步驟(C)中,該第二金屬化層包含鈷;較佳係鈷或鈷合金層。Therefore, preferably the method of the present invention (for metallization), wherein in step (C), the second metallization layer comprises cobalt; preferably a layer of cobalt or a cobalt alloy.

較佳係本發明(用於金屬化)之方法,其中在步驟(C)中,該第二金屬化層在8秒至30秒內,較佳在10秒至25秒內,最佳在12秒至20秒內開始沉積。若該第二金屬化層包含鎳,則此最佳地適用。因此,吾人實驗已顯示,包含鈀之第一金屬化層用作鎳或鎳合金之第二金屬化層之增強劑。Preferably the method of the present invention (for metallization), wherein in step (C), the second metallization layer is within 8 seconds to 30 seconds, preferably within 10 seconds to 25 seconds, most preferably within 12 seconds Deposition begins within seconds to 20 seconds. This works best if the second metallization layer contains nickel. Thus, our experiments have shown that the first metallization layer comprising palladium acts as a reinforcing agent for the second metallization layer of nickel or nickel alloys.

藉由以下非限制性實例更詳細地描述本發明。 實例提供基材: The present invention is described in more detail by the following non-limiting examples. Examples provide substrates:

在所有實驗中,使用FR4(基材1,含樹脂之層壓板,5 x 5 cm之測試面板)或ABS(基材2,塑料,3 cm直徑之測試面板)之基材。預處理: In all experiments, substrates of FR4 (Substrate 1, resin-containing laminate, 5 x 5 cm test panel) or ABS (Substrate 2, plastic, 3 cm diameter test panel) were used. Preprocessing:

若沒有另外規定,則在約50℃之溫度下,至少用包含含氮化合物(特別是聚四級銨6)之預處理溶液處理每個基材4分鐘。隨後,用水沖洗經預處理之基材。活化組合物及活化: Unless otherwise specified, each substrate was treated with a pretreatment solution comprising a nitrogen-containing compound, particularly polyquaternary ammonium 6, for at least 4 minutes at a temperature of about 50°C. Subsequently, the pretreated substrate was rinsed with water. Activating composition and activation:

使基材與活化組合物(根據本發明之組合物,以下縮寫為AC,及比較活化組合物,以下縮寫為cAC)接觸進行一段足以獲得用於後續金屬化之活化表面之時間(接觸時間)。The substrate is contacted with the activation composition (the composition according to the invention, hereinafter abbreviated AC, and the comparative activation composition, hereinafter abbreviated cAC) for a period of time sufficient to obtain an activated surface for subsequent metallization (contact time) .

根據本發明之活化組合物包含檸檬酸作為錯合劑。該第一物種係銅。每種活化組合物之總起始體積為約0.5 L。The activation composition according to the present invention contains citric acid as a complexing agent. The first species is copper. The total starting volume of each activation composition was about 0.5 L.

下表中概述各別活化組合物之特定及個別參數以及結果。根據本發明之每種活化組合物不包含(亦即,完全不含)鈀,故意防止銅顆粒氧化之化合物及穩定銅顆粒並防止聚結之穩定劑化合物。事實上,該等活化組合物基本上由本文提及的成分及其反應產物組成。Specific and individual parameters and results for the respective activation compositions are summarized in the table below. Each activation composition according to the present invention contains no (ie, is completely free of) palladium, a compound that intentionally prevents oxidation of the copper particles and a stabilizer compound that stabilizes the copper particles and prevents agglomeration. In fact, these activating compositions consist essentially of the ingredients mentioned herein and their reaction products.

第一組實例: 表1:第一組實例之特定及個別參數;濃度及莫耳比係初始,亦即在第一步驟(c)之前    AC#1 AC#2 AC#3 Cu2+ [mol/L] 0.02 0.02 0.02 Cu2+ [g/L] 1.27 1.27 1.27 Ni2+ [mol/L] -- 0.005 -- Ni2+ [g/L] -- 0.29 -- 檸檬酸[mol/L] 0.025 0.03 0.05 檸檬酸[g/L] 4.8 5.8 9.6 NaBH4 * [mL]/[mmol/L] 25/2.6 25/2.6 25/2.6 莫耳比 Cu2+ :NaBH4 7.6 7.6 7.6 莫耳比 Cu2+ :檸檬酸 0.80 0.67 0.40 pH 4.8 4.8 4.8 T [℃] 22 22 22 接觸時間[s] 240 240 240 基材1 FR4 FR4 FR4 基材2 ABS ABS ABS 活化 背光測試[D] 8至9 9 7至8       * NaBH4 溶液,其中c = 2 g/L且包含NaOHFirst set of examples: Table 1 : Specific and individual parameters of the first set of examples; concentration and molar ratio are initial, ie before first step (c) AC#1 AC#2 AC#3 Cu 2+ [mol/L] 0.02 0.02 0.02 Cu 2+ [g/L] 1.27 1.27 1.27 Ni 2+ [mol/L] -- 0.005 -- Ni 2+ [g/L] -- 0.29 -- Citric acid [mol/L] 0.025 0.03 0.05 Citric acid [g/L] 4.8 5.8 9.6 NaBH 4 * [mL]/[mmol/L] 25/2.6 25/2.6 25/2.6 Molbi Cu 2+ : NaBH 4 7.6 7.6 7.6 Molar ratio Cu 2+ : citric acid 0.80 0.67 0.40 pH 4.8 4.8 4.8 T [°C] twenty two twenty two twenty two Contact time [s] 240 240 240 Substrate 1 FR4 FR4 FR4 Substrate 2 ABS ABS ABS activation Yes Yes Yes Backlight Test [D] 8 to 9 9 7 to 8 *NaBH solution with c = 2 g/L and containing NaOH

關於該第一組實例,在第一步驟中,提供起始水性溶液,其包含經溶解之銅離子、檸檬酸及視需要可選之經溶解之鎳離子。該溶液係透明的且具有典型藍色/淡藍色。With regard to this first set of examples, in a first step, a starting aqueous solution is provided comprising dissolved copper ions, citric acid, and optionally dissolved nickel ions. The solution was clear and had a typical blue/light blue color.

在攪拌下以中等速度添加初始量之NaBH4 (參見表1)後,暫時地存在含硼還原劑且一部分經溶解之銅離子立即被還原從而形成銅奈米粒子。通常,在該初始還原中,並非所有銅離子均被還原。在還原期間,形成氫氣。當氣體形成結束時,還原基本上完成。顆粒形成(粒徑約10 nm)後,起始溶液變成膠體活化組合物。顏色為深棕色,未觀察到沉澱聚結物。連續攪拌組合物並與環境空氣連續接觸。因此,完全沒有防止所形成顆粒之氧化,特別是在還原完成之後。進一步攪拌各別活化組合物且準備待用於第一活化同時銅顆粒仍暴露於氧化。After the initial amount of NaBH4 (see Table 1 ) was added at moderate speed with stirring, the boron-containing reducing agent was temporarily present and a portion of the dissolved copper ions were immediately reduced to form copper nanoparticles. Typically, in this initial reduction, not all copper ions are reduced. During reduction, hydrogen gas is formed. When gas formation ends, reduction is substantially complete. After particle formation (approximately 10 nm in size), the starting solution became a colloidal activation composition. The color was dark brown and no precipitated agglomerates were observed. The composition was continuously agitated and continuously contacted with ambient air. Consequently, oxidation of the formed particles is not prevented at all, especially after reduction is complete. The respective activation compositions were further agitated and ready to be used for the first activation while the copper particles were still exposed to oxidation.

隨後,第一次進行本發明(用於活化)之方法之步驟(c)。對於每種基材,將藉由沖洗無法洗除的黏著良好之銅及銅合金各別沉積在各別基材之表面上。在每種情況下,活化均係極佳的,且足以用於隨後金屬化。Subsequently, step (c) of the method of the invention (for activation) is carried out for the first time. For each substrate, well-adhered copper and copper alloys that could not be removed by rinsing were deposited on the surface of the respective substrate. In each case, the activation was excellent and sufficient for subsequent metallization.

隨後,在攪拌下儲存AC#1至AC#3 2天(初始+2)。觀察到開始變色,亦即從深棕色至淺棕色,伴隨著淡藍色之增加。此指示由於可逆平衡,銅顆粒之總量減少及經溶解之銅離子之總濃度增加。然而,成功利用AC#1至AC#3重複活化並獲得具有極相似背光結果之第二組基材(FR4及ABS) (關於背光測試之其他資訊,參見下文)。Subsequently, AC#1 to AC#3 were stored under stirring for 2 days (initial +2). An onset of discoloration was observed, ie from dark brown to light brown, with an increase in bluishness. This indicates that the total amount of copper particles decreases and the total concentration of dissolved copper ions increases due to reversible equilibrium. However, repeated activation with AC#1 to AC#3 was successful and achieved a second set of substrates (FR4 and ABS) with very similar backlight results (see below for additional information on backlight testing).

在活化第二組基材之後,亦即在初始+2之後,添加5 ml NaBH4 溶液(c = 2 g/L)至AC#1至AC#3之各者以再形成銅顆粒。在添加NaBH4 之前,自樣品AC#1及AC#2分離少量作為對照(cAC#1及cAC#2)。未添加NaBH4 至cAC#1及cAC#2且不施加攪拌,使得在其中幾乎防止連續或半連續氧化。在添加該量之NaBH4 至AC#1至AC#3之後,成功活化具有極相似背光結果之第三組基材(FR4及ABS)。After activation of the second set of substrates, ie after initial +2, 5 ml of NaBH4 solution (c = 2 g/L) were added to each of AC#1 to AC#3 to reformulate copper particles. A small amount was isolated from samples AC#1 and AC#2 as controls (cAC#1 and cAC# 2 ) prior to the addition of NaBH4. No NaBH 4 was added to cAC#1 and cAC#2 and no stirring was applied, so that continuous or semi-continuous oxidation was almost prevented therein. After adding this amount of NaBH 4 to AC#1 to AC#3, a third set of substrates (FR4 and ABS) with very similar backlight results were successfully activated.

三天後(初始+3),再次成功活化具有極相似背光結果之第四組基材(FR4及ABS)。隨後,添加2.5 ml NaBH4 溶液(c = 2 g/L)至每種組合物AC#1至AC#3,及再次以極相似背光結果成功活化第五組基材(FR4及ABS)。4天後(初始+4),利用各別第六組及第七組基材重複此程序。After three days (initial +3), a fourth group of substrates (FR4 and ABS) with very similar backlight results were successfully activated again. Subsequently, 2.5 ml of NaBH 4 solution (c = 2 g/L) was added to each of the compositions AC#1 to AC#3, and the fifth set of substrates (FR4 and ABS) were successfully activated again with very similar backlight results. After 4 days (initial +4), this procedure was repeated with the sixth and seventh sets of substrates, respectively.

九天後(初始+9),添加10 ml NaBH4 溶液(c = 2 g/L)至每種組合物AC#1至AC#3及再次成功活化第八組基材(FR4及ABS)。After nine days (initial +9), 10 ml of NaBH4 solution (c = 2 g/L) was added to each composition AC#1 to AC#3 and the eighth group of substrates (FR4 and ABS) were successfully activated again.

添加NaBH4 後,pH最終略微增加高至6且沒有手動再調整。After the addition of NaBH 4 , the pH eventually increased slightly up to 6 without manual readjustment.

關於對照樣品,cAC#1在5天後(初始+5天)顯示淡藍色/淡綠色且沉澱聚結物。初始+5後,cAC#2呈現藍色,且係不含顆粒之溶液。基本上,此種活化組合物可儲存並在添加另一部分還原劑之後恢復使用。然而,在該條件下,利用其無法獲得活化。Regarding the control sample, cAC#1 showed light blue/light green and precipitated agglomerates after 5 days (initial + 5 days). After initial +5, cAC#2 appeared blue and was a particle free solution. Basically, such an activating composition can be stored and returned to use after adding another portion of the reducing agent. However, under this condition, activation could not be obtained with it.

作為最終結果,AC#1至AC#3不另外需要任何抗氧化化合物及/或特定穩定劑化合物以防止聚結。相反地,該等活化組合物藉由維持可逆平衡,特別是藉由甚至主要維持氧化環境而隨時間保持活性。As a final result, AC#1 to AC#3 do not additionally require any antioxidant compounds and/or specific stabilizer compounds to prevent coalescence. Rather, these activating compositions remain active over time by maintaining a reversible equilibrium, particularly by maintaining even primarily an oxidative environment.

進行利用AC#3之測試,其包含5.2 mmol/L硼氫化鈉而不是2.6 mmol/L,結果又極佳。A test with AC#3, which contained 5.2 mmol/L sodium borohydride instead of 2.6 mmol/L, was again excellent.

背光測試(基材表面上之金屬覆蓋率): 使用工業標準背光測試評估覆蓋率,在該測試中將各別基材切開,以便在強光源下觀察時允許不完全覆蓋之區域偵測為亮點(比較US 2008/0038450 A1及WO 2013/050332)。覆蓋之品質係由在習知光學顯微鏡下觀察到的光量測定。結果以D1至D10之量級給出,其中D1(很小,不完全覆蓋)意指最差結果及D10(完全,強覆蓋)意指最佳結果。Backlight test (metal coverage on substrate surface): Coverage was assessed using an industry standard backlight test in which individual substrates were slit to allow areas of incomplete coverage to be detected as bright spots when viewed under strong light sources (compare US 2008/0038450 A1 and WO 2013/050332) . The quality of the covering is determined by the amount of light observed under a conventional optical microscope. Results are given on the order of D1 to D10, where D1 (little, incomplete coverage) means the worst result and D10 (complete, strong coverage) means the best result.

第二組實例: 在第二組實例中,測試活化及後續金屬化。為此,表2中匯總所使用之特定及個別參數。如以上針對第一組實例所概述的之一般參數同樣適用。 表2:第二組實例之特定及個別參數;濃度及莫耳比係初始的,亦即在第一步驟(c)之前    AC#4 AC#5 AC#6 AC#7 Cu2+ [mol/L] 0.010 0.010 0.005 0.010 Cu2+ [g/L] 0.65 0.65 0.30 0.65 Ni2+ [mol/L] -- 0.005 0.010 0.0005 Ni2+ [g/L] -- 0.30 0.60 0.03 檸檬酸[mol/L] 0.025 0.030 0.030 0.025 檸檬酸[g/L] 4.8 5.78 5.78 4.8 NaBH4 * [mL]/[mmol/L] 50/5.28 50/5.28 50/5.28 50/5.28 莫耳比 Cu2+ :NaBH4 1.9 1.9 0.9 1.9 莫耳比 Cu2+ :檸檬酸 0.40 0.33 0.17 0.40 pH 5.2 5.2 5.2 5.2 T [℃] 22 22 22 22 接觸時間[s] 240 240 240 240 基材1 FR4 FR4 FR4 FR4 活化 第一金屬化層 Cu Cu Cu Cu 第一金屬化層 未測試 Ni Ni Ni * NaBH4 溶液,其中c = 2 g/L且包含NaOH The second set of examples: In a second set of examples, activation and subsequent metallization were tested. For this purpose, the specific and individual parameters used are summarized in Table 2. The same general parameters as outlined above for the first set of examples apply. Table 2: Specific and individual parameters of the second set of examples; concentrations and molar ratios were initial, ie before the first step (c) AC#4 AC#5 AC#6 AC#7 Cu 2+ [mol/L] 0.010 0.010 0.005 0.010 Cu 2+ [g/L] 0.65 0.65 0.30 0.65 Ni 2+ [mol/L] -- 0.005 0.010 0.0005 Ni 2+ [g/L] -- 0.30 0.60 0.03 Citric acid [mol/L] 0.025 0.030 0.030 0.025 Citric acid [g/L] 4.8 5.78 5.78 4.8 NaBH 4 * [mL]/[mmol/L] 50/5.28 50/5.28 50/5.28 50/5.28 Molbi Cu 2+ : NaBH 4 1.9 1.9 0.9 1.9 Molar ratio Cu 2+ : citric acid 0.40 0.33 0.17 0.40 pH 5.2 5.2 5.2 5.2 T [°C] twenty two twenty two twenty two twenty two Contact time [s] 240 240 240 240 Substrate 1 FR4 FR4 FR4 FR4 activation Yes Yes Yes Yes first metallization layer Cu Cu Cu Cu first metallization layer Not tested Ni Ni Ni *NaBH4 solution with c = 2 g/L and containing NaOH

關於第二組實例,在製備活化組合物之後,進行根據本發明(用於活化)之方法之步驟(c)之接觸。Regarding the second set of examples, the contacting according to step (c) of the method of the invention (for activation) is carried out after the preparation of the activation composition.

隨後,在第一方法中,用第一金屬化溶液進行本發明(用於金屬化)之方法以獲得第一金屬化層。該第一金屬化溶液係無電自動催化鍍銅浴,其包含銅離子(約2 g/L Cu2+ )及作為還原劑之醛,其中金屬化參數如下:pH 11,35℃,20分鐘。活化後,獲得覆蓋整個活化表面之附著良好之第一金屬化銅層(未觀察到跳鍍)。Subsequently, in a first method, the method of the invention (for metallization) is carried out with a first metallization solution to obtain a first metallization layer. The first metallization solution was an electroless autocatalytic copper plating bath containing copper ions (about 2 g/L Cu 2+ ) and aldehyde as a reducing agent, wherein the metallization parameters were as follows: pH 11, 35°C, 20 minutes. After activation, a well-adhered first metallized copper layer covering the entire activated surface was obtained (no jump plating was observed).

在AC#4至AC#7之各者中,藉由有意不防止藉由環境空氣之氧化來維持可逆平衡。此外,若需要,半連續地添加NaBH4 溶液以再形成顆粒。沒有觀察到沉澱聚結物。In each of AC#4 to AC#7, the reversible equilibrium was maintained by intentionally not preventing oxidation by ambient air. In addition, if necessary, the NaBH4 solution was added semi - continuously to reformulate the particles. No precipitated agglomerates were observed.

在第二方法中,分別使利用AC#5至AC#7活化之FR4樣品經受本發明(用於金屬化)之方法,利用包含鎳而不是銅之第一金屬化溶液沉積鎳磷層;金屬化參數:85℃持續超過5分鐘,pH約5.0。在活化之後,沉積鎳磷層作為第一金屬化層係直接可行的。In a second method, FR4 samples activated with AC#5 to AC#7, respectively, were subjected to the method of the present invention (for metallization), using a first metallization solution containing nickel instead of copper to deposit a nickel-phosphorus layer; the metal Chemical parameters: 85°C for more than 5 minutes, pH about 5.0. After activation, it is directly feasible to deposit a nickel phosphorous layer as the first metallization layer.

通常,在製備活化組合物(例如AC#4)之後,硼酸係以低於0.2 g/L之總濃度存在。為研究硼酸之效應,另外,AC#4以有意添加硼酸使得總濃度為1 g/L (AC#4-1)及10 g/L (AC#4-10)之另外修改進行使用。在每種情況下,pH均增加至約5.5。然而,在活化及金屬化方面未觀察到差異。Typically, boric acid is present at a total concentration of less than 0.2 g/L after preparation of the activation composition (eg, AC#4). To study the effect of boric acid, in addition, AC#4 was used with additional modifications with intentional addition of boric acid to total concentrations of 1 g/L (AC#4-1) and 10 g/L (AC#4-10). In each case the pH was increased to about 5.5. However, no differences were observed in activation and metallization.

第三組實例: 在第三組實例中,改用二甲基胺基硼烷(DMAB)替代NaBH4 重複AC#4。結果,獲得AC#8。表3中概述其他特定及個別參數。 表3:第三組實例之特定及個別參數;濃度及莫耳比係初始的,亦即在第一步驟(c)之前    AC#8 Cu2+ [mol/L] 0.010 Cu2+ [g/L] 0.65 Ni2+ [mol/L] -- Ni2+ [g/L] -- 檸檬酸[mol/L] 0.025 檸檬酸[g/L] 4.8 DMAB* [mL]/[mmol/L] 8/27.2 莫耳比 Cu2+ :DMAB 0.37 莫耳比 Cu2+ :檸檬酸 0.40 pH 4.0 T [℃] 60 接觸時間[min] 30 基材1 FR4 活化 銅金屬化 * DMAB溶液,其中c = 100 g/LThe third group of examples: In the third set of examples, NaBH was replaced by dimethylaminoborane (DMAB)4 Repeat AC#4. As a result, AC#8 was obtained. Other specific and individual parameters are summarized in Table 3. Table 3: Specific and individual parameters of the third set of examples; concentrations and molar ratios were initial, ie before the first step (c) AC#8 Cu 2+ [mol/L] 0.010 Cu 2+ [g/L] 0.65 Ni 2+ [mol/L] -- Ni 2+ [g/L] -- Citric acid [mol/L] 0.025 Citric acid [g/L] 4.8 DMAB* [mL]/[mmol/L] 8/27.2 Molbi Cu 2+ : DMAB 0.37 Molar ratio Cu 2+ : citric acid 0.40 pH 4.0 T [°C] 60 Contact time [min] 30 Substrate 1 FR4 activation Yes copper metallization Yes * DMAB solution, where c = 100 g/L

在有預處理或無預處理下進行利用AC#8之活化,均同樣成功。然而,與利用硼氫化鈉之實例相比,需要更高溫度來獲得足夠活化。Activation with AC#8 was performed with or without pretreatment with equal success. However, higher temperatures are required to obtain sufficient activation compared to the example using sodium borohydride.

同樣在AC#8中,藉由有意不防止藉由環境空氣之氧化來維持可逆平衡。此外,若需要,半連續地添加DMAB溶液以再形成顆粒。沒有觀察到沉澱聚結物。Also in AC#8, the reversible equilibrium is maintained by intentionally not preventing oxidation by ambient air. In addition, the DMAB solution was added semi-continuously to reformulate the particles, if desired. No precipitated agglomerates were observed.

第四組實例: 在第四組實例中,其他參數如表4中所概述進行改變。 表4:第四組實例之特定及個別參數;濃度及莫耳比係初始的,亦即在第一步驟(c)之前    AC#9 AC#10 AC#11 AC#12 AC#13 Cu2+ [mol/L] 0.005 0.010 0.020 0.041 0.610 Cu2+ [g/L] 0.325 6.50 1.30 2.60 3.90 檸檬酸[mol/L] 0.025 0.250 0.050 0.100 0.150 檸檬酸[g/L] 4.8 48.0 9.6 19.2 28.8 NaBH4 * [mL]/[mmol/L] 50/5.28             NaBH4 ** [mL]/[mmol/L]       50/10.6       NaBH4 *** [mL]/[mmol/L]          50/21.1    NaBH4 # [mL]/[mmol/L]             50/31.7 NaBH4 ## [mL]/[mmol/L]    50/52.8          莫耳比 Cu2+ :NaBH4 0.95 0.19 1.89 1.94 19.23 莫耳比 Cu2+ :檸檬酸 0.20 0.04 0.40 0.41 4.07 pH 5.95 4.62 4.9 5.2 4.8 T [℃] 22 22 22 22 22 接觸時間[s] 240 240 240 240 240 基材1 FR4 FR4 FR4 FR4 FR4 活化 Cu金屬化 背光測試[D] 未測試 10 10 9至10 10 * NaBH4 溶液,c = 2 g/L且包含NaOH, ** NaBH4 溶液,c = 4 g/L且包含NaOH, *** NaBH4 溶液,c = 8 g/L且包含NaOH,# NaBH4 溶液,c = 12 g/L且包含NaOH,## NaBH4 溶液,c = 20 g/L且包含NaOHThe fourth group of examples: In the fourth set of examples, other parameters were changed as outlined in Table 4. Table 4: Specific and individual parameters of the fourth group of examples; concentrations and molar ratios were initial, ie before the first step (c) AC#9 AC#10 AC#11 AC#12 AC#13 Cu 2+ [mol/L] 0.005 0.010 0.020 0.041 0.610 Cu 2+ [g/L] 0.325 6.50 1.30 2.60 3.90 Citric acid [mol/L] 0.025 0.250 0.050 0.100 0.150 Citric acid [g/L] 4.8 48.0 9.6 19.2 28.8 NaBH 4 * [mL]/[mmol/L] 50/5.28 NaBH 4 ** [mL]/[mmol/L] 50/10.6 NaBH 4 *** [mL]/[mmol/L] 50/21.1 NaBH 4 # [mL]/[mmol/L] 50/31.7 NaBH 4 ## [mL]/[mmol/L] 50/52.8 Molbi Cu 2+ : NaBH 4 0.95 0.19 1.89 1.94 19.23 Molar ratio Cu 2+ : citric acid 0.20 0.04 0.40 0.41 4.07 pH 5.95 4.62 4.9 5.2 4.8 T [°C] twenty two twenty two twenty two twenty two twenty two Contact time [s] 240 240 240 240 240 Substrate 1 FR4 FR4 FR4 FR4 FR4 activation Yes Yes Yes Yes Yes Cu metallization Yes Yes Yes Yes Yes Backlight Test [D] Not tested 10 10 9 to 10 10 *NaBH4 Solution, c = 2 g/L and contains NaOH, **NaBH4 solution, c = 4 g/L and contains NaOH, ***NaBH4 Solution, c = 8 g/L and contains NaOH,# NaBH4 Solution, c = 12 g/L and contains NaOH,## NaBH4 Solution, c = 20 g/L and contains NaOH

同樣在AC#9至AC#13中,藉由有意不防止藉由環境空氣之氧化來維持可逆平衡且若需要則半連續地添加還原劑以再形成顆粒。沒有觀察到沉澱聚結物。獲得FR4之極佳活化,且背光測試結果極佳。Also in AC#9 to AC#13, a reversible equilibrium was maintained by intentionally not preventing oxidation by ambient air and if necessary a reducing agent was added semi-continuously to reformulate the particles. No precipitated agglomerates were observed. Excellent activation of FR4 was obtained, and backlight test results were excellent.

第五組實例: 在第五組實例(詳細內容未顯示)中,利用根據本發明之包含0.005 mol/L Cu2+ 、0.05 mol/L檸檬酸及1.3 mmol/L硼氫化鈉之活化組合物在FR4及ABS上測試活化。同樣,獲得具有極佳背光測試結果之完全活化之FR4及ABS。Fifth group of examples: In the fifth group of examples (details not shown), the activation composition according to the present invention comprising 0.005 mol/L Cu 2+ , 0.05 mol/L citric acid and 1.3 mmol/L sodium borohydride was used Activation was tested on FR4 and ABS. Again, fully activated FR4 and ABS were obtained with excellent backlight test results.

第六組實例: 在第六組實例(詳細內容未顯示)中,利用如以上在第一組及第二組實例中概述的根據本發明之活化組合物在包含碳纖維之毛氈(4.6 mm厚;約450 g/m2 面積重量,BET表面積0.4 m2 /g)上測試活化。同樣地,在每種情況下均獲得完全鎳活化之毛氈。此外,該等活化表面在電解形成氫氣及氧氣時展現顯著催化活性。Sixth set of examples: In a sixth set of examples (details not shown), carbon fiber-containing felts (4.6 mm thick; Activation was tested on approximately 450 g/m 2 areal weight, BET surface area 0.4 m 2 /g). Likewise, fully nickel-activated felts were obtained in each case. Furthermore, these activated surfaces exhibit significant catalytic activity in electrolysis to form hydrogen and oxygen.

Claims (15)

一種活化用於金屬化之非傳導或含碳纖維之基材表面的方法,該方法包括以下步驟:(a)提供該基材,(b)提供水性無鈀之活化組合物,其包含(i)第一物種之經溶解之過渡金屬離子及其金屬顆粒,(ii)一種或超過一種錯合劑,(iii)永久或暫時地,一種或超過一種還原劑,(iv)視需要,不同於第一物種之一種或超過一種第二物種之經溶解之金屬離子,其中- 至少該第一物種,經溶解之過渡金屬離子及其金屬顆粒係以可逆平衡方式存在,其限制條件為- 該金屬顆粒係自該經溶解之過渡金屬離子藉由該一種或超過一種還原劑之連續或半連續還原形成,- 該經溶解之過渡金屬離子係自金屬顆粒藉由該顆粒之連續或半連續氧化形成,及- 該經溶解之過渡金屬離子及其金屬顆粒分別重複地參與該還原及該氧化,使得不形成該金屬顆粒之沉澱聚結物,(c)使該基材與該活化組合物接觸,使得過渡金屬或過渡金屬合金沉積在該基材之表面上並獲得用於金屬化之活化表面。 A method of activating the surface of a non-conductive or carbon fiber-containing substrate for metallization, the method comprising the steps of: (a) providing the substrate, (b) providing an aqueous palladium-free activation composition comprising (i) Dissolved transition metal ions and metal particles thereof of the first species, (ii) one or more than one complexing agent, (iii) one or more than one reducing agent, permanently or temporarily, (iv) optionally different from the first Dissolved metal ions of one species or more than one second species, wherein- at least the first species, the dissolved transition metal ions and their metal particles are present in reversible equilibrium, with the proviso that- the metal particles are Formed from the dissolved transition metal ions by continuous or semi-continuous reduction of the one or more than one reducing agent, - the dissolved transition metal ions are formed from metal particles by continuous or semi-continuous oxidation of the particles, and - the dissolved transition metal ions and their metal particles are repeatedly involved in the reduction and the oxidation, respectively, so that precipitation agglomerates of the metal particles are not formed, (c) contacting the substrate with the activating composition such that the transition A metal or transition metal alloy is deposited on the surface of the substrate and an activated surface for metallization is obtained. 如請求項1之方法,其中在步驟(c)期間及/或之後,大多數該金屬顆粒係經受該氧化。 The method of claim 1, wherein during and/or after step (c), a majority of the metal particles are subjected to the oxidation. 如請求項1或2之方法,其中該第一物種係銅或鈷。 The method of claim 1 or 2, wherein the first species is copper or cobalt. 如請求項1或2之方法,其中該活化組合物中該第一物種之該金屬顆粒係膠體金屬顆粒。 The method of claim 1 or 2, wherein the metal particles of the first species in the activation composition are colloidal metal particles. 如請求項1或2之方法,其中該第一物種之其他金屬顆粒係藉由在進行一個或超過一個步驟(c)之後及/或期間之該還原原位連續或半連續地形成於該活化組合物中。 The method of claim 1 or 2, wherein the other metal particles of the first species are continuously or semi-continuously formed in situ on the activation by the reduction after and/or during one or more than one step (c) is performed in the composition. 如請求項1或2之方法,其中該一種或超過一種還原劑包括含硼還原劑。 The method of claim 1 or 2, wherein the one or more than one reducing agent comprises a boron-containing reducing agent. 如請求項1或2之方法,其中該活化組合物係實質上不含或不包含錫離子。 The method of claim 1 or 2, wherein the activation composition is substantially free or free of tin ions. 如請求項1或2之方法,其中該活化組合物係實質上不含或不包含防止該金屬顆粒之氧化之化合物及/或係實質上不含或不包含使該金屬顆粒穩定之穩定劑化合物。 The method of claim 1 or 2, wherein the activation composition is substantially free or free of compounds that prevent oxidation of the metal particles and/or is substantially free or free of stabilizer compounds that stabilize the metal particles . 如請求項1或2之方法,其中該一種或超過一種還原劑係連續或半連 續地添加至該活化組合物,使得分別自該第一物種之該經溶解之過渡金屬離子連續或半連續地形成其他金屬顆粒。 The method of claim 1 or 2, wherein the one or more than one reducing agent is continuous or semi-continuous Continuously added to the activation composition such that the dissolved transition metal ions from the first species, respectively, form other metal particles continuously or semi-continuously. 如請求項1或2之方法,其中該經溶解之過渡金屬離子係自該金屬顆粒藉由環境空氣及/或氧氣之氧化而形成。 The method of claim 1 or 2, wherein the dissolved transition metal ions are formed from the metal particles by oxidation of ambient air and/or oxygen. 如請求項1或2之方法,該方法包括在步驟(c)之前對該基材之預處理步驟:(a-1)用包含含氮化合物之預處理溶液處理該基材。 The method of claim 1 or 2, comprising a pretreatment step of the substrate prior to step (c): (a-1) treating the substrate with a pretreatment solution comprising a nitrogen-containing compound. 一種金屬化非傳導或含碳纖維之基材之活化表面之方法,該方法包括以下步驟:(A)提供藉由如請求項1至11中任一項之用於活化之方法獲得的具有用於金屬化之該活化表面的該非傳導或含碳纖維之基材,(B)藉由使該活化表面與第一金屬化溶液接觸,使得第一金屬化層沉積在該活化表面上來金屬化該活化表面。 A method of metallizing the activated surface of a non-conducting or carbon fiber-containing substrate, the method comprising the steps of: (A) providing a method for activation obtained by the method for activation as claimed in any one of claims 1 to 11 with Metallizing the non-conductive or carbon fiber-containing substrate of the activated surface, (B) metallizing the activated surface by contacting the activated surface with a first metallization solution such that a first metallization layer is deposited on the activated surface . 一種製備用於活化用於金屬化之非傳導或含碳纖維之基材表面之水性無鈀之活化組合物的方法,該方法包括以下步驟:(1)提供水性起始溶液,其包含- 第一物種之經溶解之過渡金屬離子,- 一種或超過一種錯合劑,及- 視需要,不同於該第一物種之一種或超過一種第二物種之經溶 解之金屬離子,(2)連續或半連續地添加一種或超過一種還原劑至該起始溶液,使得該溶液中分別連續或半連續地形成至少該第一物種之經溶解之過渡金屬離子之金屬顆粒,其限制條件係該金屬顆粒係連續或半連續地氧化以形成該第一物種之經溶解之過渡金屬離子。 A method of preparing an aqueous palladium-free activation composition for activating the surface of a non-conductive or carbon fiber-containing substrate for metallization, the method comprising the steps of: (1) providing an aqueous starting solution comprising - a first Solubilized transition metal ions of species, - one or more than one complexing agent, and - as desired, one or more than one solubilized second species different from the first species dissolved metal ions, (2) continuously or semi-continuously adding one or more than one reducing agent to the starting solution such that at least one of the dissolved transition metal ions of the first species is continuously or semi-continuously formed in the solution, respectively A metal particle, provided that the metal particle is continuously or semi-continuously oxidized to form dissolved transition metal ions of the first species. 一種第一物種之經溶解之過渡金屬離子之連續或半連續還原與該第一物種之金屬顆粒連續或半連續氧化以可逆平衡組合以在水性無鈀之活化組合物中連續或半連續地原位形成金屬顆粒之用途。 Continuous or semi-continuous reduction of dissolved transition metal ions of a first species is combined with continuous or semi-continuous oxidation of metal particles of the first species in reversible equilibrium to continuously or semi-continuously in an aqueous palladium-free activation composition. The purpose of forming metal particles in situ. 一種用於活化用於金屬化之非傳導或含碳纖維之基材表面之水性無鈀之活化組合物,該組合物包含(i)第一物種之經溶解之過渡金屬離子及其金屬顆粒,(ii)一種或超過一種錯合劑,(iii)永久或暫時地,一種或超過一種還原劑,(iv)視需要,不同於該第一物種之一種或超過一種第二物種之經溶解之金屬離子,其中- 至少該第一物種,該經溶解之過渡金屬離子及其金屬顆粒係以可逆平衡方式存在,其限制條件為- 該金屬顆粒係自該經溶解之過渡金屬離子藉由該一種或超過一種還原劑之連續或半連續還原形成, - 該經溶解之過渡金屬離子係自該金屬顆粒藉由該顆粒之連續或半連續氧化形成,及- 該經溶解之過渡金屬離子及其金屬顆粒分別重複地參與該還原及該氧化,使得不形成該金屬顆粒之沉澱聚結物。 An aqueous palladium-free activation composition for activating the surface of a non-conductive or carbon fiber-containing substrate for metallization, the composition comprising (i) dissolved transition metal ions of a first species and metal particles thereof, ( ii) one or more than one complexing agent, (iii) one or more than one reducing agent, permanently or temporarily, (iv) one or more than one reducing agent, as desired, a dissolved metal ion other than one of the first species or more than one second species , wherein - at least the first species, the dissolved transition metal ions and their metal particles are present in reversible equilibrium, with the limitation that - the metal particles are derived from the dissolved transition metal ions by the one or more The continuous or semi-continuous reduction of a reducing agent forms, - the dissolved transition metal ions are formed from the metal particles by continuous or semi-continuous oxidation of the particles, and - the dissolved transition metal ions and their metal particles repeatedly participate in the reduction and the oxidation, respectively, so that no Precipitated agglomerates of the metal particles are formed.
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