JPH1030188A - Catalyst liquid for electroless plating - Google Patents
Catalyst liquid for electroless platingInfo
- Publication number
- JPH1030188A JPH1030188A JP18574896A JP18574896A JPH1030188A JP H1030188 A JPH1030188 A JP H1030188A JP 18574896 A JP18574896 A JP 18574896A JP 18574896 A JP18574896 A JP 18574896A JP H1030188 A JPH1030188 A JP H1030188A
- Authority
- JP
- Japan
- Prior art keywords
- catalyst
- solution
- electroless plating
- silver
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、無電解めっき用触
媒液、及び該触媒液を用いた無電解めっき方法に関す
る。The present invention relates to a catalyst solution for electroless plating and a method for electroless plating using the catalyst solution.
【0002】[0002]
【従来の技術】プラスチックス、セラミックス、ガラス
等の非導電性物質は、無電解めっきに対する触媒活性が
なく、この上に直接無電解めっき皮膜を形成することは
できない。この様な触媒活性の無い物質に無電解めっき
を行う場合には、一般に、金属パラジウム等の触媒物質
を被めっき物に付着させた後、無電解めっきを行う方法
が行われている。2. Description of the Related Art Non-conductive substances such as plastics, ceramics, and glass have no catalytic activity for electroless plating, and an electroless plating film cannot be directly formed thereon. In the case of performing electroless plating on such a substance having no catalytic activity, a method is generally employed in which a catalytic substance such as metallic palladium is attached to an object to be plated, and then electroless plating is performed.
【0003】この様なめっき方法としては、例えば、米
国特許第2702253号公報に、被めっき物を強酸性
の塩化第1錫溶液に浸漬した後、水洗し、次いで強酸性
の塩化パラジウム溶液に浸漬することにより、被めっき
物表面に金属パラジウムを析出させ、その後無電解めっ
き液中に浸漬して、金属パラジウムを触媒として無電解
めっきをする方法が記載されている。又、米国特許第3
011920号公報には、被めっき物を強酸性のパラジ
ウム−錫コロイド液中に浸漬することによって被めっき
物表面に該コロイドを付与した後、酸またはアルカリで
処理して触媒活性を発現させ、次いで無電解めっきを行
う方法が記載されている。これらの方法は、いずれも触
媒金属として高価な貴金属であるパラジウムを大量に用
いるために処理液のコストが高く、また触媒を付与する
ために少なくとも二段階の処理が必要であり、工程が非
常に複雑になるという欠点がある。更に、いずれの方法
も錫化合物を用いるものであり、錫が無電解めっきに対
する触媒毒として作用するために、無電解めっきの前に
完全に錫を除去する必要があり、僅かでも残存すると、
めっき皮膜の未析出、被めっき部とめっき皮膜との密着
性低下などが生じるという問題点がある。As such a plating method, for example, as disclosed in US Pat. No. 2,702,253, an object to be plated is immersed in a strongly acidic stannous chloride solution, washed with water, and then immersed in a strongly acidic palladium chloride solution. In this method, metal palladium is deposited on the surface of the object to be plated, and then immersed in an electroless plating solution to perform electroless plating using the metal palladium as a catalyst. No. 3
No. 011920 discloses that the object to be plated is immersed in a strongly acidic palladium-tin colloid solution to impart the colloid to the surface of the object to be plated, and then treated with an acid or alkali to exhibit catalytic activity. A method for performing electroless plating is described. All of these methods use a large amount of palladium, which is an expensive noble metal as a catalyst metal, so that the cost of the treatment solution is high, and at least two-stage treatment is required to provide the catalyst, and the process is extremely difficult. There is a disadvantage that it becomes complicated. Furthermore, both methods use a tin compound, and since tin acts as a catalyst poison for electroless plating, it is necessary to completely remove tin before electroless plating.
There is a problem that non-precipitation of the plating film and a decrease in adhesion between the portion to be plated and the plating film occur.
【0004】パラジウム以外の金属を触媒として用いる
方法としては、特開平1−68478号に銀塩を触媒と
して用いる方法が記載されている。この方法は、銀塩と
界面活性剤を含有する水溶液に、銀塩に対して2〜4倍
モルという多量の還元剤を添加して銀ヒドロゾルを形成
し、これを被めっき物と接触させて、銀コロイドを付与
した後、無電解めっきを行う方法である。しかしなが
ら、この方法では還元剤の使用量が多いために生産コス
トが高く、又、形成される銀ヒドロゾルの安定性が悪
く、凝集沈殿が生じやすいという欠点がある。更に、銀
はパラジウムと比べて触媒活性が低く、しかも銀コロイ
ドは吸着性が弱いために、水洗工程や無電解めっき工程
で被めっき物から脱落して、不均一なめっき皮膜が形成
され易く、しかも銀コロイドの持ち込みにより、無電解
めっき液が分解して安定性が低下するという問題点もあ
る。As a method using a metal other than palladium as a catalyst, Japanese Patent Application Laid-Open No. 1-68478 discloses a method using a silver salt as a catalyst. In this method, a large amount of a reducing agent of 2 to 4 times the amount of a silver salt is added to an aqueous solution containing a silver salt and a surfactant to form a silver hydrosol, and this is brought into contact with an object to be plated. This is a method of performing electroless plating after applying silver colloid. However, this method has disadvantages that the production cost is high due to the large amount of the reducing agent used, the stability of the formed silver hydrosol is poor, and coagulation precipitation is likely to occur. Furthermore, silver has a lower catalytic activity than palladium, and silver colloid has a low adsorptivity, so it is likely to fall off from the object to be plated in a washing step or an electroless plating step, and an uneven plating film is easily formed. In addition, there is also a problem that when the colloidal silver is brought in, the electroless plating solution is decomposed to lower the stability.
【0005】特開平2−93076号公報は、ニッケ
ル、コバルト、銅等の金属イオンを含有する水溶液に還
元剤を添加し、更に分散剤、安定剤等を配合した金属微
粒子分散液を用いて、被めっき物に無電解めっき用触媒
を付与する方法を記載している。しかしながら、これら
の金属微粒子は、パラジウムと比べると触媒活性が劣
り、しかもイオン化傾向が高いので空気酸化を受けやす
く、酸化を防止するために安定剤として大量の還元剤を
配合する必要があり、生産コストが増大するという欠点
がある。更に、還元剤は水洗により洗い流され易く、還
元剤が流出すると金属微粒子が空気中で瞬時に酸化して
触媒活性を失うので、触媒液に浸漬した後、水洗を行う
こと無く、被めっき物を直接無電解めっき液に浸漬する
ことが必要であるが、この様な方法では、金属微粒子の
大量の持ち込みにより、無電解めっき液が汚染され、め
っき液の分解が生じ易いという問題点がある。Japanese Patent Application Laid-Open No. 2-93076 discloses a method of adding a reducing agent to an aqueous solution containing metal ions such as nickel, cobalt, and copper, and further using a metal fine particle dispersion in which a dispersant, a stabilizer and the like are further blended. It describes a method of applying a catalyst for electroless plating to an object to be plated. However, these metal fine particles have poor catalytic activity compared to palladium, and are susceptible to air oxidation due to their high tendency to ionize, and it is necessary to mix a large amount of a reducing agent as a stabilizer to prevent oxidation. There is a disadvantage that the cost increases. Furthermore, the reducing agent is easily washed away by washing, and when the reducing agent flows out, the metal fine particles are instantaneously oxidized in the air and lose catalytic activity. Although it is necessary to immerse directly in the electroless plating solution, such a method has a problem that the electroless plating solution is contaminated by a large amount of metal fine particles brought in, and the plating solution is easily decomposed.
【0006】[0006]
【発明が解決しようとする課題】本発明の主な目的は、
被めっき物に対する吸着性が良好であって優れた触媒活
性を有し、しかも安定性にも優れた低コストの無電解め
っき用触媒液を提供することである。SUMMARY OF THE INVENTION The main object of the present invention is to:
An object of the present invention is to provide a low-cost catalyst solution for electroless plating, which has good adsorbability to an object to be plated, has excellent catalytic activity, and is also excellent in stability.
【0007】[0007]
【課題を解決するための手段】本発明者は、上記した如
き課題を解決すべく鋭意研究を重ねた結果、触媒金属と
して、安価でしかも酸化し難い銀を用い、銀塩の水溶液
に陰イオン界面活性剤を配合するとともに、銀イオンに
対して0.1〜0.8倍モルという少量の還元剤を配合
した特定の配合の触媒液によれば、液の安定性が極めて
良好となり、しかも各種の被めっき物に対する触媒成分
の吸着性が良好となって優れた触媒活性を付与すること
が可能となることを見出した。更に、この様な触媒液
に、非常に少量のパラジウムイオンを存在させる場合に
は、触媒活性が著しく向上して、従来のパラジウム含有
触媒と比べて非常に低コストでありながら、これと同等
或いはそれ以上の触媒活性を付与し得る触媒液となるこ
とを見出し、ここに本発明を完成するに至った。Means for Solving the Problems As a result of intensive studies to solve the above-mentioned problems, the present inventors have used inexpensive and hardly oxidizable silver as a catalyst metal and added an anionic ion to an aqueous solution of silver salt. According to the catalyst liquid of a specific composition in which a surfactant is blended and a small amount of a reducing agent of 0.1 to 0.8 times mol with respect to silver ions, the stability of the solution becomes extremely good, and It has been found that the adsorptivity of the catalyst component to various kinds of objects to be plated is improved, and it is possible to impart excellent catalytic activity. Further, when a very small amount of palladium ion is present in such a catalyst solution, the catalytic activity is remarkably improved, and the cost is very low as compared with the conventional palladium-containing catalyst, but the same or equivalent. The inventors have found that a catalyst solution capable of imparting further catalytic activity can be obtained, and have completed the present invention.
【0008】即ち、本発明は、銀塩0.01〜100ミ
リモル/l、陰イオン界面活性剤0.01〜0.5重量
%、及び銀塩に対して0.1〜0.8倍モルの還元剤を
含有する水溶液からなることを特徴とする無電解めっき
用触媒液、並びに該触媒液に、更に、パラジウム塩を
0.01〜0.5ミリモル/l配合した無電解めっき用
触媒液を提供するものである。That is, according to the present invention, a silver salt is used in an amount of 0.01 to 100 mmol / l, an anionic surfactant is used in an amount of 0.01 to 0.5% by weight, and a silver salt is used in an amount of 0.1 to 0.8 times. A catalyst solution for electroless plating, comprising an aqueous solution containing a reducing agent, and a catalyst solution for electroless plating further comprising 0.01 to 0.5 mmol / l of a palladium salt added to the catalyst solution. Is provided.
【0009】更に、本発明は、上記触媒液に被めっき物
を浸漬した後、自己触媒型の無電解めっき液に浸漬する
ことを特徴とする無電解めっき方法も提供するものであ
る。Further, the present invention also provides an electroless plating method characterized by immersing an object to be plated in the above-mentioned catalyst solution and then immersing it in a self-catalytic electroless plating solution.
【0010】[0010]
【発明の実施の形態】本発明の触媒液は、銀塩、陰イオ
ン界面活性剤、及び少量の還元剤を含有する水溶液であ
る。DETAILED DESCRIPTION OF THE INVENTION The catalyst solution of the present invention is an aqueous solution containing a silver salt, an anionic surfactant and a small amount of a reducing agent.
【0011】銀塩としては、水溶性の銀化合物を用いる
ことができ、例えば、硝酸銀、シアン酸銀、過塩素酸
銀、亜硫酸銀などの無機銀塩、酢酸銀、クエン酸銀、サ
リチル酸銀、酒石酸銀などの有機銀塩等を用いることが
できる。As the silver salt, a water-soluble silver compound can be used, for example, inorganic silver salts such as silver nitrate, silver cyanate, silver perchlorate, silver sulfite, silver acetate, silver citrate, silver salicylate, and the like. Organic silver salts such as silver tartrate can be used.
【0012】銀塩の水溶液中の濃度は、0.01〜10
0ミリモル/l程度の範囲とし、好ましくは、0.5〜
50ミリモル/l程度の範囲とする。銀塩の濃度が低す
ぎると、生成する銀微粒子の量が極端に少なくなり、触
媒活性が不足して良好な無電解めっき皮膜を得ることが
できない。一方、銀塩の濃度が高すぎると、生成した銀
微粒子が凝集を起こし易くなって、触媒液が不安定とな
るので好ましくない。The concentration of the silver salt in the aqueous solution is from 0.01 to 10
The range is about 0 mmol / l, preferably 0.5 to
The range is about 50 mmol / l. If the concentration of the silver salt is too low, the amount of the generated silver fine particles becomes extremely small, and the catalytic activity becomes insufficient, so that a good electroless plating film cannot be obtained. On the other hand, if the concentration of the silver salt is too high, the generated silver fine particles are liable to agglomerate and the catalyst liquid becomes unstable, which is not preferable.
【0013】本発明の触媒液には、陰イオン系界面活性
剤を配合することが必要である。この様な特定の界面活
性剤を用い、しかも後述する様に銀塩に対して等モルを
下回る少量の還元剤を配合することによって、被めっき
物に対して触媒金属である銀の吸着性が良好となり、被
めっき物を均一に触媒活性化して良好な無電解めっき皮
膜を形成することが可能となる。陰イオン界面活性剤と
しては、例えば、ドデシル硫酸ナトリウム等のアルキル
硫酸塩、ドデシルベンゼンスルホン酸ナトリウム等のア
ルキルベンゼンスルホン酸塩、ポリオキシエチレン
(P.O.E)ラウリルエーテル硫酸ナトリウム等のポ
リオキシエチレンアルキルエーテル硫酸塩、スルホコハ
ク酸ラウリル2ナトリウム等のスルホコハク酸塩、ラウ
リルリン酸、ポリオキシエチレン(P.O.E)ステア
リルエーテルリン酸、ポリオキシエチレン(P.O.
E)アルキルフェニルエーテルリン酸等のリン酸エステ
ル型、タウリン誘導体、サルコシン誘導体等を用いるこ
とができる。これらの界面活性剤の内で、特にポリオキ
シエチレンラウリルエーテル硫酸ナトリウム、ポリオキ
シエチレンステアリルエーテルリン酸、ポリオキシエチ
レンアルキルフェニルエーテルリン酸等の分子内にポリ
オキシエチレン部分を有する陰イオン界面活性剤を用い
る場合には、吸着性が特に良好になり、特に優れた触媒
活性を付与できる。The catalyst liquid of the present invention needs to contain an anionic surfactant. By using such a specific surfactant and adding a small amount of a reducing agent less than equimolar to the silver salt as described later, the adsorptivity of silver as a catalytic metal to the object to be plated is improved. As a result, the object to be plated can be uniformly activated by a catalyst to form a good electroless plating film. Examples of the anionic surfactant include an alkyl sulfate such as sodium dodecyl sulfate, an alkylbenzene sulfonate such as sodium dodecyl benzene sulfonate, and a polyoxyethylene such as sodium polyoxyethylene (POE) lauryl ether sulfate. Alkyl ether sulfates, sulfosuccinates such as disodium lauryl sulfosuccinate, lauryl phosphoric acid, polyoxyethylene (POE) stearyl ether phosphoric acid, polyoxyethylene (PO.
E) Phosphate ester type such as alkyl phenyl ether phosphoric acid, taurine derivative, sarcosine derivative and the like can be used. Among these surfactants, anionic surfactants having a polyoxyethylene moiety in the molecule, such as sodium polyoxyethylene lauryl ether sulfate, polyoxyethylene stearyl ether phosphate, polyoxyethylene alkyl phenyl ether phosphate, etc. When is used, the adsorptivity becomes particularly good, and particularly excellent catalytic activity can be imparted.
【0014】陰イオン界面活性剤の配合量は、触媒液中
に0.01〜0.5重量%程度とし、好ましくは、0.
05〜0.1重量%程度とする。界面活性剤量が0.0
1重量%より少ない場合には銀微粒子の分散安定性が低
下して、銀微粒子が凝集沈殿を起こすことがあるので好
ましくない。一方、界面活性剤量が0.5重量%よりも
多くなると、銀微粒子分散液の状態に大きな影響はない
が不経済である。The compounding amount of the anionic surfactant is about 0.01 to 0.5% by weight in the catalyst solution, and preferably 0.1 to 0.5% by weight.
It is set to about 0.5 to 0.1% by weight. When the amount of surfactant is 0.0
When the amount is less than 1% by weight, the dispersion stability of the silver fine particles is reduced, and the silver fine particles may be aggregated and precipitated, which is not preferable. On the other hand, when the amount of the surfactant is more than 0.5% by weight, the state of the silver fine particle dispersion is not greatly affected but is uneconomical.
【0015】還元剤としては、水素化ホウ素ナトリウ
ム、水素化ホウ素カリウム等のアルカリ金属水素化ホウ
素化合物、ジメチルアミンボラン、ジエチルアミンボラ
ン等のホウ素系還元剤の他、次亜リン酸ナトリウム等の
リン系還元剤、ホルムアルヒド、グリオキシル酸等のア
ルデヒド化合物、アスコルビン酸、ヒドラジン等を用い
ることができる。Examples of the reducing agent include alkali metal borohydride compounds such as sodium borohydride and potassium borohydride, boron-based reducing agents such as dimethylamine borane and diethylamine borane, and phosphorus-based reducing agents such as sodium hypophosphite. Reducing agents, aldehyde compounds such as formaldehyde and glyoxylic acid, ascorbic acid, hydrazine and the like can be used.
【0016】還元剤の使用量は、銀塩に対して0.1〜
0.8倍モルの範囲とすることが必要である。本発明に
よれば、この様に銀塩に対して等モルを下回る少量の還
元剤を用いることによって、銀微粒子の安定性が良好と
なって凝集沈殿が生じ難くなり、しかも前記した陰イオ
ン界面活性剤の使用と相まって、銀の吸着性が良好とな
り、被めっき物に対して良好な触媒活性を付与すること
が可能となる。還元剤の使用量は、銀塩に対して0.1
〜0.5倍モル程度とすることがより好ましく、触媒液
の安定性、触媒活性等がより良好になる。The amount of the reducing agent used is 0.1 to
It is necessary to be in the range of 0.8 times mol. According to the present invention, by using such a small amount of the reducing agent less than equimolar to the silver salt, the stability of the silver fine particles is improved, and the aggregation and precipitation hardly occur. Combined with the use of the activator, the silver adsorbability becomes good, and it becomes possible to impart good catalytic activity to the plating object. The amount of the reducing agent used is 0.1
It is more preferably about 0.5 times mole, and the stability of the catalyst solution, the catalyst activity and the like become more favorable.
【0017】還元剤の使用量が上記範囲を下回ると、銀
塩の還元量が不足して、触媒液中にに生成する銀微粒子
の量が極端に少なくなり、良好な無電解めっき皮膜を得
ることができない。還元剤量が多すぎると、銀塩の還元
が進行しすぎて、銀微粒子の安定性が低下し、凝集沈殿
を生じることがあるので好ましくない。When the amount of the reducing agent used is below the above range, the amount of silver salt reduced becomes insufficient, and the amount of silver fine particles generated in the catalyst solution becomes extremely small, whereby a good electroless plating film is obtained. Can not do. If the amount of the reducing agent is too large, the reduction of the silver salt proceeds too much, the stability of the silver fine particles is reduced, and coagulation and precipitation may occur.
【0018】本発明の触媒液は、上記した銀塩、陰イオ
ン界面活性剤、及び還元剤を含有する水溶液であり、各
成分を配合した後、均一に攪拌することによって得るこ
とができるが、通常、銀塩及び陰イオン界面活性剤を含
有する水溶液に還元剤を添加して混合攪拌する方法によ
って調製することが好ましい。この様にして調製した触
媒液は、銀塩の一部が還元して銀微粒子となり、これが
水溶液中に安定に分散したものとなる。The catalyst solution of the present invention is an aqueous solution containing the above-mentioned silver salt, anionic surfactant and reducing agent, and can be obtained by blending the respective components and uniformly stirring. Usually, it is preferably prepared by a method of adding a reducing agent to an aqueous solution containing a silver salt and an anionic surfactant and mixing and stirring. In the catalyst solution thus prepared, a part of the silver salt is reduced to silver fine particles, which are stably dispersed in the aqueous solution.
【0019】本発明の触媒液には、更に、必要に応じ
て、パラジウム塩を少量配合することができる。パラジ
ウム塩を配合することによって、触媒活性が大きく向上
して、従来の金属パラジウムを触媒金属として大量に含
有する高価な触媒液と同等若しくはそれ以上の触媒活性
を有するものとなる。本発明の触媒液では、パラジウム
塩は、0.01ミリモル/l程度又はそれを若干上回る
程度という非常に少ない配合量で触媒活性を大きく向上
させることができるので、従来のパラジウムを含有する
触媒液におけるパラジウム含有量が、通常2ミリモル/
l程度であることと比較すると、極めて少ない配合量で
よく、パラジウムの使用によるコスト上昇は非常に小さ
い。パラジウム塩の配合量が多くなりすぎても触媒活性
に大きな悪影響はないが、コストの上昇を考慮すれば、
0.5ミリモル/l以下の配合量とすることが適当であ
る。従って、触媒活性の向上効果を発揮させるために
は、パラジウム塩の配合量は、0.01〜0.5ミリモ
ル/l程度とすることが適当であり、0.02〜0.2
ミリモル/l程度とすることが好ましい。The catalyst liquid of the present invention may further contain a small amount of a palladium salt, if necessary. By adding a palladium salt, the catalytic activity is greatly improved, and the catalytic activity is equal to or higher than that of a conventional expensive catalyst solution containing a large amount of metallic palladium as a catalytic metal. In the catalyst solution of the present invention, the palladium salt can greatly improve the catalytic activity with a very small amount of about 0.01 mmol / l or slightly more, so that the conventional palladium-containing catalyst solution can be used. Is usually 2 mmol / mol
Compared to being about l, an extremely small blending amount is sufficient, and the increase in cost due to the use of palladium is very small. Even if the amount of the palladium salt is too large, there is no significant adverse effect on the catalytic activity, but in view of an increase in cost,
It is appropriate that the amount is 0.5 mmol / l or less. Therefore, in order to exhibit the effect of improving the catalytic activity, it is appropriate that the amount of the palladium salt is about 0.01 to 0.5 mmol / l, and 0.02 to 0.2 mmol / l.
It is preferred to be about mmol / l.
【0020】パラジウム塩としては、水溶性パラジム塩
を用いることができ、その例として、塩化パラジウム、
硫酸パラジウム、硝酸パラジウム等の無機パラジウム
塩、テトラアンミンパラジウム塩化物、ジエチレンジア
ミンパラジウム塩化物等のパラジウム錯体等を挙げるこ
とができる。As the palladium salt, a water-soluble palladium salt can be used, for example, palladium chloride,
Examples include inorganic palladium salts such as palladium sulfate and palladium nitrate, and palladium complexes such as tetraamminepalladium chloride and diethylenediamine palladium chloride.
【0021】パラジウム塩を触媒液に配合する場合に
は、その添加方法は特に限定されず、銀塩及び陰イオン
界面活性剤と同時に水溶液中に配合しておいて、その後
還元剤を添加してもよく、或いは、既に、銀塩、陰イオ
ン界面活性剤及び還元剤を配合して銀微粒子が分散した
状態となった触媒液中にパラジウム塩を配合しても良
い。When the palladium salt is added to the catalyst solution, the method of addition is not particularly limited. The palladium salt is added to the aqueous solution simultaneously with the silver salt and the anionic surfactant, and then the reducing agent is added. Alternatively, a palladium salt may be added to a catalyst liquid in which silver particles, an anionic surfactant and a reducing agent are already added and silver fine particles are dispersed.
【0022】本発明の触媒液には、更に必要に応じて、
触媒液の性質に悪影響を与えない範囲で、他の金属塩、
有機化合物等を配合しても良い。In the catalyst solution of the present invention, if necessary,
Other metal salts, as long as they do not adversely affect the properties of the catalyst solution
An organic compound or the like may be blended.
【0023】本発明の無電解めっき用触媒液を用いて無
電解めっきを行うには、使用する被めっき物の種類の応
じて、常法に従って、脱脂処理、表面調整などを前処理
を行った後、本発明の触媒液により被めっき物に銀触媒
を付与し、その後、常法に従って無電解めっきを行えば
よい。In order to carry out electroless plating using the catalyst solution for electroless plating of the present invention, pretreatment such as degreasing and surface conditioning is carried out in accordance with a conventional method, depending on the type of the object to be plated. Thereafter, a silver catalyst is applied to the object to be plated with the catalyst solution of the present invention, and then, electroless plating may be performed according to a conventional method.
【0024】被めっき物に銀触媒を付与する方法として
は、一般に被めっき物に無電解めっき用触媒を付与する
際に行われている方法、例えば、被めっき物を触媒液に
浸漬する方法、触媒液を被めっき物に塗布した後乾燥す
る方法等を適用できるが、特に、触媒液に浸漬する方法
が好ましく、この方法によれば、被めっき物に対して簡
単な操作で銀触媒を均一に付着させることができる。触
媒液に浸漬する方法は、特に限定的では無く、通常、触
媒液の液温を0〜80℃程度、好ましくは15〜50℃
程度として、これに被めっき物を浸漬すればよい。液温
が低すぎる場合には、銀微粒子の凝集が生じやすく、一
方液温が高すぎても、やはり触媒液の安定性が低下して
凝集沈殿が生じ易くなるので好ましくない。浸漬時間に
ついては、長時間浸漬すると、銀微粒子の吸着量が増加
して無電解めっきの析出性が良好になるので、使用する
無電解めっき液の種類、被めっき物の種類などに応じ
て、適宜必要な浸漬時間を決めればよい。通常は、30
秒〜10分程度の範囲の浸漬時間とすればよい。触媒液
のpHについては、1〜7程度とすることが好ましく、
2〜5程度とすることがより好ましい。pHが低すぎる
と、界面活性剤の溶解度の低下によって、触媒液の安定
性が低下して凝集沈殿が生じやすくなり、一方、pHが
高すぎると、分散安定性が極端に良好になって、銀触媒
の吸着量が低下して無電解めっきの析出性が低下するの
で好ましくない。As a method of applying a silver catalyst to an object to be plated, a method generally used when applying an electroless plating catalyst to an object to be plated, for example, a method of immersing the object to be plated in a catalyst solution, A method of applying the catalyst solution to the object to be plated and then drying the applied solution can be applied. In particular, a method of immersing the object in the catalyst solution is preferred. Can be adhered to. The method of immersion in the catalyst solution is not particularly limited, and usually the temperature of the catalyst solution is about 0 to 80 ° C, preferably 15 to 50 ° C.
To this extent, the object to be plated may be immersed in this. If the liquid temperature is too low, the silver fine particles are likely to aggregate, while if the liquid temperature is too high, the stability of the catalyst solution is also lowered and aggregate precipitation tends to occur, which is not preferable. Regarding the immersion time, when immersed for a long time, the adsorption amount of the silver fine particles increases and the deposition property of the electroless plating becomes good, so depending on the type of the electroless plating solution to be used, the type of the object to be plated, etc. The necessary immersion time may be appropriately determined. Usually, 30
The immersion time may be in the range of about 10 to 10 minutes. The pH of the catalyst solution is preferably about 1 to 7,
More preferably, it is about 2 to 5. If the pH is too low, the solubility of the surfactant is reduced, and the stability of the catalyst solution is reduced, and aggregation and precipitation are easily caused.On the other hand, if the pH is too high, the dispersion stability becomes extremely good, It is not preferable because the adsorption amount of the silver catalyst decreases and the deposition property of the electroless plating decreases.
【0025】上記した方法によって、本発明の触媒液を
用いて被めっき物に銀触媒を付与した後、常法に従っ
て、水洗し、その後無電解めっきを行うことによって、
均一で良好な外観の無電解めっき皮膜を形成することが
できる。本発明の触媒液によれば、銀触媒の吸着力が強
く、しかも触媒金属である銀は酸化し難いので、水洗時
に触媒金属の脱落による触媒活性の低下や触媒金属の酸
化がほとんど生じることがない。又、無電解めっき液中
での触媒金属の脱離がないので、無電解めっき液の安定
性を阻害することもない。According to the above-described method, a silver catalyst is applied to the object to be plated using the catalyst solution of the present invention, followed by washing with water and then electroless plating according to a conventional method.
An electroless plating film having a uniform and good appearance can be formed. According to the catalyst solution of the present invention, since the silver catalyst has a strong adsorption power and silver, which is a catalyst metal, is hard to be oxidized. Absent. Further, since there is no desorption of the catalytic metal in the electroless plating solution, the stability of the electroless plating solution is not hindered.
【0026】無電解めっき液としては、公知の自己触媒
型の無電解めっき液をいずれも用いることができ、めっ
き液中に含まれる金属種、還元剤種、錯化剤種、水素イ
オン濃度等は特に限定されない。その具体例としては、
無電解銅めっき液、無電解ニッケル−リンめっき液、無
電解ニッケル−ホウ素めっき液、無電解パラジウムめっ
き液、無電解パラジウム−リンめっき液、無電解銀めっ
き液、無電解金めっき液等を例示できる。As the electroless plating solution, any of known electrocatalytic electroless plating solutions can be used. Metal species, reducing agent species, complexing agent species, hydrogen ion concentration, etc. contained in the plating solution can be used. Is not particularly limited. As a specific example,
Examples of electroless copper plating solution, electroless nickel-phosphorous plating solution, electroless nickel-boron plating solution, electroless palladium plating solution, electroless palladium-phosphorous plating solution, electroless silver plating solution, electroless gold plating solution, etc. it can.
【0027】本発明において適用可能な被めっき物は、
特に限定はなく、無電解めっき液に対して触媒活性を有
しない各種の材料を用いることが可能である。例えば、
プリント基板等の金属−非導電性物質複合材料、プラス
チック、セラミック、ガラス等の非導性物質、紙、布等
の織維状物質、金属、金属酸化物等を用いることができ
る。The object to be plated in the present invention is:
There is no particular limitation, and various materials having no catalytic activity for the electroless plating solution can be used. For example,
A metal-non-conductive material composite material such as a printed circuit board, a non-conductive material such as plastic, ceramic, and glass, a woven material such as paper and cloth, a metal, and a metal oxide can be used.
【0028】[0028]
【発明の効果】本発明の触媒液は、従来、触媒金属とし
て主に用いられているパラジウムと比べて、非常に安価
な金属である銀を用いるものであり、低コストの触媒液
である。そして、この触媒液は、極めて優れた安定性を
有するとともに、被めっき物に対する触媒金属の吸着性
が良好で触媒活性に優れたものである。よって、本発明
の触媒液を用いることによって、均一で良好な無電解め
っき皮膜を形成することが可能となる。また、触媒金属
の吸着性が良好であることから、無電解めっき液中での
脱離がほとんどなく、無電解めっき液の安定性を損なう
こともない。The catalyst solution of the present invention uses silver, which is a very inexpensive metal, as compared with palladium, which has been mainly used as a catalyst metal, and is a low-cost catalyst solution. The catalyst liquid has extremely excellent stability, and has good catalytic metal adsorption to the plating object and excellent catalytic activity. Therefore, by using the catalyst solution of the present invention, a uniform and good electroless plating film can be formed. In addition, since the catalyst metal has good adsorption properties, there is almost no desorption in the electroless plating solution, and the stability of the electroless plating solution is not impaired.
【0029】特に、パラジウム塩を少量配合した触媒液
では、上記した優れた特性を何ら損なうことなく、触媒
活性が向上し、従来の金属パラジウムを触媒金属として
大量に含有する高価な触媒液と同等若しくはそれ以上の
触媒活性を有するものとなる。In particular, a catalyst solution containing a small amount of a palladium salt has improved catalytic activity without impairing the above-mentioned excellent properties at all, and is equivalent to a conventional expensive catalyst solution containing a large amount of metal palladium as a catalyst metal. Or it will have more catalytic activity.
【0030】[0030]
【実施例】以下、実施例を挙げて本発明を更に詳細に説
明する。EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples.
【0031】実施例1 硝酸銀10ミリモルを純水800mlに溶解し、この溶
液中にドデシル硫酸ナトリウム100mgを含む水溶液
100mlを均一となるように攪拌しながら添加した。
次いで、この溶液に水素化ホウ素ナトリウム8ミリモル
を含む水溶液100mlを均一となるように激しく攪拌
しなから添加した。溶液の色が赤褐色に急変したところ
で、攪拌を終了した。その結果、均一で透明な銀微粒子
の分散液が1000ml得られた。この銀微粒子分散液
を触媒液1とする。Example 1 10 mmol of silver nitrate was dissolved in 800 ml of pure water, and 100 ml of an aqueous solution containing 100 mg of sodium dodecyl sulfate was added to this solution with stirring so as to be uniform.
Next, 100 ml of an aqueous solution containing 8 mmol of sodium borohydride was added to this solution with vigorous stirring so as to be uniform. When the color of the solution suddenly changed to reddish brown, the stirring was stopped. As a result, 1000 ml of a uniform and transparent dispersion of silver fine particles was obtained. This silver fine particle dispersion is referred to as catalyst liquid 1.
【0032】被めっき物としてエポキシ板(5×5c
m)を使用し、上記触媒液1を用いて、下記の工程で無
電解めっきを行った。各処理液の液量は500mlとし
た。各処理の間には、水洗を行った。As an object to be plated, an epoxy plate (5 × 5c)
m), and electroless plating was performed in the following steps using the above catalyst solution 1. The volume of each processing solution was 500 ml. Water washing was performed between each treatment.
【0033】めっき工程: 1.脱脂:市販の脱脂剤(商標:エースクリーンA−2
20、奥野製薬工業株式会社製)を用いて、60℃の処
理液中に3分間浸漬した。Plating process: Degreasing: A commercially available degreasing agent (trademark: A-screen A-2)
20, Okuno Pharmaceutical Co., Ltd.) for 3 minutes in a treatment liquid at 60 ° C.
【0034】2.表面調製:市販の表面調整剤(商標:
OPC−370コンディクリーンM、野製薬工業株式会
社製)を用いて、60℃の処理液中に3分間浸漬した。2. Surface preparation: Commercial surface conditioner (trademark:
It was immersed in a treatment solution at 60 ° C. for 3 minutes using OPC-370 Condiclean M, manufactured by Noh Pharmaceutical Co., Ltd.).
【0035】3.触媒付与:触媒液1をpH2.5とし
て、25℃の液中に3分間浸漬した。3. Catalyst application: The catalyst solution 1 was adjusted to pH 2.5 and immersed in a solution at 25 ° C. for 3 minutes.
【0036】4.無電解めっき:上記1〜3の処理を行
った被めっき物を三種類用意して、下記の三種類の無電
解めっきを行った。4. Electroless plating: Three types of plated objects subjected to the above processes 1 to 3 were prepared, and the following three types of electroless plating were performed.
【0037】(a)無電解ニッケル−リンめっき:市販
の無電解ニッケル−リンめっき液(商標:TMP化学ニ
ッケル、奥野製薬工業株式会社製)を用いて、pH9.
0のめっき液中に40℃で10分間浸漬した。(A) Electroless nickel-phosphorus plating: Using a commercially available electroless nickel-phosphorus plating solution (trade name: TMP Chemical Nickel, manufactured by Okuno Pharmaceutical Co., Ltd.), the pH is adjusted to 9.
0 was immersed in a plating solution at 40 ° C. for 10 minutes.
【0038】(b)無電解ニッケル−ホウ素めっき:市
販の無電解ニッケル−ホウ素めっき液(商標:トップケ
ミアロイ66、奥野製薬工業株式会社製)を用いて、p
H6.5のめっき液中に60℃で10分間浸漬した。(B) Electroless nickel-boron plating: Using a commercially available electroless nickel-boron plating solution (trade name: Top Chemalloy 66, manufactured by Okuno Pharmaceutical Co., Ltd.), p
It was immersed in a plating solution of H6.5 at 60 ° C. for 10 minutes.
【0039】(c)無電解銅めっき:市販の無電解銅め
っき液(商標:TMP化学銅#100、奥野製薬工業株
式会社製)を用いて、pH13.0のめっき液中に25
℃で10分間浸漬した。(C) Electroless copper plating: Using a commercially available electroless copper plating solution (trade name: TMP Chemical Copper # 100, manufactured by Okuno Pharmaceutical Co., Ltd.), 25% in a plating solution having a pH of 13.0.
C. for 10 minutes.
【0040】得られた各無電解めっき皮膜について、下
記の方法で皮膜被覆率及び被めっき物外観を調べた。結
果を下記表1に示す。With respect to each of the obtained electroless plating films, the film coverage and the appearance of the object to be plated were examined by the following methods. The results are shown in Table 1 below.
【0041】試験方法: 1.皮膜被覆率(%):被めっき物上にめっき皮膜が形
成された面積の割合を示す。Test method: Film coverage (%): Indicates the ratio of the area where the plating film was formed on the object to be plated.
【0042】2.被めっき物外観:目視によりめっき皮
膜の外観を調べた。2. Appearance of plating object: The appearance of the plating film was visually inspected.
【0043】又、めっき浴の安定性試験として、上記条
件と同様にして、めっき浴成分の金属塩、還元剤及びp
H調整剤を補給しながら、10分ごとに試験片を交換し
て無電解めっきを連続して行い、めっき浴中で被めっき
物以外に金属が析出してめっき浴の反応が急激に進行
し、めっき浴の安定性が損なわれて一定の外観と析出速
度でめっき皮膜が形成されなくなるまでのターン数を調
べた。尚、1ターンとは、無電解めっき開始時のめっき
浴中に含まれていた量に相当する金属イオンを補給した
期間である。As a plating bath stability test, a metal salt of a plating bath component, a reducing agent and p
While replenishing the H adjuster, the test piece was replaced every 10 minutes and electroless plating was continuously performed, and metal other than the object to be plated was precipitated in the plating bath, and the reaction of the plating bath rapidly progressed. Then, the number of turns until the plating film was not formed at a constant appearance and deposition rate with the stability of the plating bath being impaired was examined. One turn is a period in which metal ions corresponding to the amount contained in the plating bath at the start of the electroless plating are supplied.
【0044】実施例2 硫酸銀10ミリモルを純水800mlに溶解し、この溶
液中にポリオキシエチレン(P.O.E)ステアリルエ
ーテルリン酸500mgを含む水溶液l00mlを均一
となるように攪拌しながら添加した。次いで、この溶液
にジメチルアミンボラン5ミリモルを含む水溶液50m
lを均一となるように激しく攪拌しながら添加した。溶
液の色が赤褐色に急変したところで、硝酸パラジウムを
0.02ミリモル含む水溶液50mlを添加した。その
結果、均一で透明な銀微粒子分散液1000mlが得ら
れた。これを触媒液2とする。Example 2 10 mmol of silver sulfate was dissolved in 800 ml of pure water, and 100 ml of an aqueous solution containing 500 mg of polyoxyethylene (POE) stearyl ether phosphoric acid was stirred into this solution while stirring so as to be uniform. Was added. Subsequently, 50 ml of an aqueous solution containing 5 mmol of dimethylamine borane was added to this solution.
was added with vigorous stirring to make it uniform. When the color of the solution rapidly changed to reddish brown, 50 ml of an aqueous solution containing 0.02 mmol of palladium nitrate was added. As a result, 1000 ml of a uniform and transparent fine silver particle dispersion was obtained. This is referred to as catalyst liquid 2.
【0045】触媒液1に代えて、触媒液2を用いたこと
を除いて、実施例1と同様にして、無電解めっきを行
い、得られた無電解めっき皮膜について、皮膜被覆率及
び被めっき物外観を調べた。また、実施例1と同様にし
てめっき浴の安定性を調べた。結果を下記表1に示す。Electroless plating was performed in the same manner as in Example 1 except that the catalyst solution 2 was used instead of the catalyst solution 1, and the obtained electroless plating film was subjected to film coverage and plating. The object appearance was examined. Further, the stability of the plating bath was examined in the same manner as in Example 1. The results are shown in Table 1 below.
【0046】実施例3 過塩素酸銀10ミリモルを純水800mlに溶解し、こ
の溶液中にスルホコハク酸ラウリル2ナトリウム5gを
含む水溶液100mlを激しく攪拌しながら添加した
後、60℃に加熱し、ヒドラジン10ミリモルを含む水
溶液50mlを激しく攪拌しなから添加した。溶液の色
が赤褐色に急変したところで、テトラアンミンパラジウ
ム塩化物0.05ミリモルを含む水溶液50m1を添加
した。その結果、均一で透明な銀微粒子分散液1000
m1が得られた。この分散液を触媒液3とする。Example 3 10 mmol of silver perchlorate was dissolved in 800 ml of pure water, and 100 ml of an aqueous solution containing 5 g of disodium lauryl sulfosuccinate was added to this solution with vigorous stirring. 50 ml of an aqueous solution containing 10 mmol were added with vigorous stirring. When the color of the solution rapidly changed to reddish brown, 50 ml of an aqueous solution containing 0.05 mmol of tetraamminepalladium chloride was added. As a result, a uniform and transparent silver fine particle dispersion liquid 1000
m1 was obtained. This dispersion is referred to as “catalyst liquid 3”.
【0047】触媒液1に代えて、触媒液3を用いたこと
を除いて、実施例1と同様にして、無電解めっきを行
い、得られた無電解めっき皮膜について、皮膜被覆率及
び被めっき物外観を調べた。また、実施例1と同様にし
てめっき浴の安定性を調べた。結果を下記表1に示す。Electroless plating was carried out in the same manner as in Example 1 except that the catalyst solution 3 was used instead of the catalyst solution 1, and the resulting electroless plated film was subjected to film coverage and plating. The object appearance was examined. Further, the stability of the plating bath was examined in the same manner as in Example 1. The results are shown in Table 1 below.
【0048】比較例1 硝酸銀(I)0.5ミリモルを純水940mlに溶解し
た溶液を激しく攪拌しながら、この溶液に非イオン性界
面活性剤であるポリエチレングリコール−p−ノニルフ
ェニルエーテル100mgを含む水溶液10mlと、硝
酸銀に対して4倍モルに相当する2ミリモルの水素化ホ
ウ素ナトリウムを含む水溶液50mlを順次添加した。
その結果、溶液の色が黄褐色に急変し、pH9.6の均
一透明な銀ヒドロゾル1000mlが得られた。これを
比較触媒液1とする。COMPARATIVE EXAMPLE 1 While vigorously stirring a solution of 0.5 mmol of silver nitrate (I) in 940 ml of pure water, this solution contains 100 mg of polyethylene glycol-p-nonylphenyl ether which is a nonionic surfactant. 10 ml of an aqueous solution and 50 ml of an aqueous solution containing 2 mmol of sodium borohydride corresponding to 4 times the molar amount of silver nitrate were sequentially added.
As a result, the color of the solution rapidly changed to yellowish brown, and 1000 ml of a uniform transparent silver hydrosol having a pH of 9.6 was obtained. This is designated as Comparative Catalyst Liquid 1.
【0049】触媒液1に代えて、比較触媒液1をpH
9.6のままで用いたことを除いて、実施例1と同様に
して、無電解めっきを行い、得られた無電解めっき皮膜
について、皮膜被覆率及び被めっき物外観を調べた。ま
た、実施例1と同様にしてめっき浴の安定性を調べた。
結果を下記表1に示す。Instead of the catalyst liquid 1, the comparative catalyst liquid 1 was adjusted to pH
Electroless plating was carried out in the same manner as in Example 1, except that 9.6 was used as it was, and the obtained electroless plated film was examined for the film coverage and the appearance of the object to be plated. Further, the stability of the plating bath was examined in the same manner as in Example 1.
The results are shown in Table 1 below.
【0050】比較例2 濃塩酸(35%)150mlを750mlの純水で希釈
し、市販の無電解めっき用触媒であるパラジウム−錫コ
ロイド液(商標:キャタリストC、奥野製薬工業株式会
社製)60mlを加え、純水を添加して1000mlと
した。これを比較触媒液2とする。Comparative Example 2 150 ml of concentrated hydrochloric acid (35%) was diluted with 750 ml of pure water, and a commercially available palladium-tin colloid solution as a catalyst for electroless plating (trade name: Catalyst C, manufactured by Okuno Pharmaceutical Co., Ltd.) 60 ml was added, and pure water was added to make 1000 ml. This is designated as Comparative Catalyst Liquid 2.
【0051】触媒液1に代えて比較触媒液2を使用し、
実施例1のめっき方法において、触媒付与後、活性化処
理として、98%H2SO4を150g/l含有する水溶
液に60℃で5分間浸漬する処理を行ない、その後、無
電解めっきを行うことを除いて、実施例1と同様にし
て、無電解めっきを行い、得られた無電解めっき皮膜に
ついて、皮膜被覆率及び被めっき物外観を調べた。ま
た、実施例1と同様にしてめっき浴の安定性を調べた。
結果を下記表1に示す。A comparative catalyst solution 2 was used in place of the catalyst solution 1,
In the plating method of Example 1, after the catalyst is applied, a treatment of immersing in an aqueous solution containing 98% H 2 SO 4 at 150 g / l at 60 ° C. for 5 minutes as an activation treatment is performed, and then electroless plating is performed. Except for the above, electroless plating was performed in the same manner as in Example 1, and the obtained electroless plated film was examined for the film coverage and the appearance of the object to be plated. Further, the stability of the plating bath was examined in the same manner as in Example 1.
The results are shown in Table 1 below.
【0052】[0052]
【表1】 [Table 1]
【0053】以上の結果から明らかなように、触媒液1
〜3を用いた実施例1〜3では、被めっき物であるエポ
キシ板に良好な無電解めっき皮膜を形成することができ
た。特に触媒液2及び3を用いた実施例2及び3では、
非常に優れた触媒活性を付与でき、特に均一で良好な無
電解めっき皮膜を形成できた。尚、触媒液1は、触媒液
2及び3と比べると触媒活性が若干劣るものであるが、
従来の銀を触媒金属とする比較触媒液1と比較すると非
常に優れた触媒活性を有するものであり、皮膜被覆率に
おいて大きく優るものであった。又、触媒液1〜3は、
被めっき物に対する吸着性が良好であり、めっき液中で
の触媒金属の脱落により無電解めっき液の安定性を阻害
することがなかった。As is clear from the above results, the catalyst solution 1
In Examples 1 to 3 using Nos. 1 to 3, a good electroless plating film could be formed on the epoxy plate as the object to be plated. In particular, in Examples 2 and 3 using the catalyst solutions 2 and 3,
Very excellent catalytic activity could be imparted, and particularly a uniform and good electroless plating film could be formed. The catalyst liquid 1 has a slightly lower catalytic activity than the catalyst liquids 2 and 3,
Compared to the comparative catalyst liquid 1 using silver as a catalyst metal, the catalyst solution had a very excellent catalytic activity and was much superior in the film coverage. Also, the catalyst liquids 1 to 3,
The adsorptivity to the object to be plated was good, and the stability of the electroless plating solution was not hindered by the falling off of the catalytic metal in the plating solution.
【0054】比較例2については、無電解めっきによる
皮膜被覆率は良好であるが、無電解めっき浴の安定性を
阻害するものであった。又、その他の触媒液と比べて処
理工程が一工程多いために、処理が煩雑であった。In Comparative Example 2, although the film coverage by electroless plating was good, the stability of the electroless plating bath was impaired. In addition, since the number of processing steps is one more than that of other catalyst solutions, the processing is complicated.
【0055】触媒液安定性試験 実施例1〜3及び比較例1〜2で用いた触媒液1〜3及
び比較触媒液1〜2について、以下の方法で安定性試験
を行った。結果を下記表2に示す。 Catalyst Solution Stability Test Stability tests were performed on the catalyst solutions 1 to 3 and the comparative catalyst solutions 1 and 2 used in Examples 1 to 3 and Comparative Examples 1 and 2 by the following method. The results are shown in Table 2 below.
【0056】1.空気吹き込み試験:液温25℃、液量
500mlの各触媒液に1000ml/分で空気を導入
し、触媒液に凝集沈殿が生じるまでの時間を求めた。1. Air blowing test: Air was introduced at a rate of 1000 ml / min into each catalyst liquid having a liquid temperature of 25 ° C. and a liquid volume of 500 ml, and the time required for coagulation and precipitation to occur in the catalyst liquid was determined.
【0057】2.6価クロム添加試験:500mlの各
触媒液に、無水クロム酸を2モル/l含有する水溶液を
1mlずつ添加し、触媒液に凝集沈殿が生じるか、或い
は触媒液が透明になるまでの添加量を求めた。2. Hexavalent chromium addition test: To 500 ml of each catalyst solution, 1 ml of an aqueous solution containing 2 mol / l of chromic anhydride was added, and coagulation and precipitation occurred in the catalyst solution or the catalyst solution became transparent. The amount to be added was determined.
【0058】3.塩素イオン添加試験:500mlの各
触媒液に、塩素イオンを10g/l含有する水溶液を1
mlずつ添加し、触媒液に凝集沈殿が生じるまでの添加
量を求めた3. Chloride ion addition test: 500 ml of each catalyst solution contained one aqueous solution containing 10 g / l of chloride ions.
ml was added, and the amount added until coagulation and precipitation occurred in the catalyst solution was determined.
【0059】[0059]
【表2】 [Table 2]
【0060】以上の結果から明らかな様に、本発明の触
媒液である触媒液1〜3は、いずれも、公知の触媒液で
ある比較触媒液1及び2と比べて、非常に安定性が良好
である。As is clear from the above results, each of the catalyst solutions 1 to 3 as the catalyst solution of the present invention has much higher stability than the comparative catalyst solutions 1 and 2 as the known catalyst solutions. Good.
Claims (4)
オン界面活性剤0.01〜0.5重量%、及び銀塩に対
して0.1〜0.8倍モルの還元剤を含有する水溶液か
らなることを特徴とする無電解めっき用触媒液。1. A reducing agent comprising 0.01 to 100 mmol / l of a silver salt, 0.01 to 0.5% by weight of an anionic surfactant and 0.1 to 0.8 times mol of a silver salt. A catalyst solution for electroless plating, comprising an aqueous solution containing the catalyst.
溶液に、還元剤を添加し混合して得られた請求項1に記
載の無電解めっき用触媒液。2. The catalyst solution for electroless plating according to claim 1, which is obtained by adding and mixing a reducing agent to an aqueous solution containing a silver salt and an anionic surfactant.
リモル/l含有する請求項1又は2に記載の無電解めっ
き用触媒液。3. The catalyst solution for electroless plating according to claim 1, further comprising 0.01 to 0.5 mmol / l of a palladium salt.
媒液に被めっき物を浸漬した後、自己触媒型の無電解め
っき液に浸漬することを特徴とする無電解めっき方法。4. An electroless plating method comprising immersing an object to be plated in the catalyst solution according to claim 1 and then immersing the object in a self-catalytic electroless plating solution.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18574896A JPH1030188A (en) | 1996-07-16 | 1996-07-16 | Catalyst liquid for electroless plating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18574896A JPH1030188A (en) | 1996-07-16 | 1996-07-16 | Catalyst liquid for electroless plating |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH1030188A true JPH1030188A (en) | 1998-02-03 |
Family
ID=16176180
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18574896A Pending JPH1030188A (en) | 1996-07-16 | 1996-07-16 | Catalyst liquid for electroless plating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH1030188A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001081652A1 (en) * | 2000-04-25 | 2001-11-01 | Nikko Materials Co., Ltd. | Pretreating agent for metal plating |
JP2009102675A (en) * | 2007-10-22 | 2009-05-14 | Konica Minolta Holdings Inc | Plating method, plating solution and conductive pattern sheet |
KR20150058097A (en) | 2012-09-20 | 2015-05-28 | 디아이씨 가부시끼가이샤 | Electrically conductive material and method for producing same |
US12023653B2 (en) | 2022-02-22 | 2024-07-02 | Industrial Technology Research Institute | Silver-containing solution and method of forming silver catalyst layer in chemical plating |
-
1996
- 1996-07-16 JP JP18574896A patent/JPH1030188A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001081652A1 (en) * | 2000-04-25 | 2001-11-01 | Nikko Materials Co., Ltd. | Pretreating agent for metal plating |
US6780467B2 (en) | 2000-04-25 | 2004-08-24 | Nikko Materials Co., Ltd. | Plating pretreatment agent and metal plating method using the same |
JP2009102675A (en) * | 2007-10-22 | 2009-05-14 | Konica Minolta Holdings Inc | Plating method, plating solution and conductive pattern sheet |
KR20150058097A (en) | 2012-09-20 | 2015-05-28 | 디아이씨 가부시끼가이샤 | Electrically conductive material and method for producing same |
US12023653B2 (en) | 2022-02-22 | 2024-07-02 | Industrial Technology Research Institute | Silver-containing solution and method of forming silver catalyst layer in chemical plating |
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