TWI761564B - Manufacturing method of electromagnet assembly - Google Patents

Manufacturing method of electromagnet assembly Download PDF

Info

Publication number
TWI761564B
TWI761564B TW107126396A TW107126396A TWI761564B TW I761564 B TWI761564 B TW I761564B TW 107126396 A TW107126396 A TW 107126396A TW 107126396 A TW107126396 A TW 107126396A TW I761564 B TWI761564 B TW I761564B
Authority
TW
Taiwan
Prior art keywords
electromagnet assembly
thermally conductive
coil
frame
producing
Prior art date
Application number
TW107126396A
Other languages
Chinese (zh)
Other versions
TW201910542A (en
Inventor
金正健
蘇秉鎬
卞東範
全瑛奎
高武昔
Original Assignee
南韓商Ulvac 韓國股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 南韓商Ulvac 韓國股份有限公司 filed Critical 南韓商Ulvac 韓國股份有限公司
Publication of TW201910542A publication Critical patent/TW201910542A/en
Application granted granted Critical
Publication of TWI761564B publication Critical patent/TWI761564B/en

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/0302Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity characterised by unspecified or heterogeneous hardness or specially adapted for magnetic hardness transitions
    • H01F1/0311Compounds
    • H01F1/0313Oxidic compounds
    • H01F1/0315Ferrites
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/28Coils; Windings; Conductive connections
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/28Coils; Windings; Conductive connections
    • H01F27/2876Cooling
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/28Coils; Windings; Conductive connections
    • H01F27/30Fastening or clamping coils, windings, or parts thereof together; Fastening or mounting coils or windings on core, casing, or other support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00Magnets
    • H01F7/06Electromagnets; Actuators including electromagnets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00Magnets
    • H01F7/06Electromagnets; Actuators including electromagnets
    • H01F7/08Electromagnets; Actuators including electromagnets with armatures
    • H01F7/121Guiding or setting position of armatures, e.g. retaining armatures in their end position
    • H01F7/122Guiding or setting position of armatures, e.g. retaining armatures in their end position by permanent magnets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00Magnets
    • H01F7/06Electromagnets; Actuators including electromagnets
    • H01F2007/062Details of terminals or connectors for electromagnets

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

提供一種電磁鐵組件的製備方法,可包括以下步驟:製備包含突出部和包圍所述突出部的週邊部的框架;在所述突出部的外周配置線圈來包掩所述突出部;在常溫和常壓下加熱具固體狀態的熱傳導物質使其變為液體狀態;將所述液體狀態的熱傳導物質填充至所述突出部和所述週邊部之間的空間;以及在所述填充的步驟之後,將永久磁鐵配置在所述線圈的中央。Provided is a method for preparing an electromagnet assembly, which may include the following steps: preparing a frame including a protruding part and a peripheral part surrounding the protruding part; disposing a coil on the outer periphery of the protruding part to cover the protruding part; heating a thermally conductive substance in a solid state under normal pressure to change it into a liquid state; filling the thermally conductive substance in a liquid state into a space between the protruding portion and the peripheral portion; and after the step of filling, A permanent magnet is arranged in the center of the coil.

Description

電磁鐵組件的製備方法Preparation method of electromagnet assembly

以下說明涉及一種電磁鐵組件的製備方法,例如涉及一種用於磁控管濺射裝置的電磁鐵組件的製備方法。The following description relates to a method of manufacturing an electromagnet assembly, for example, to a method of manufacturing an electromagnet assembly used in a magnetron sputtering device.

濺射裝置是例如在製備半導體、FPD(LCD, OLED等)或是太陽能電池時在基板上蒸鍍薄膜的裝置。此外,濺射裝置在卷式(roll to roll)裝置也可被使用。The sputtering device is, for example, a device that vapor-deposits a thin film on a substrate when manufacturing semiconductors, FPDs (LCD, OLED, etc.) or solar cells. In addition, the sputtering device can also be used in a roll to roll device.

濺射裝置中的一個磁控管濺射(Magnetron sputtering)裝置為了在大面積的基板上蒸鍍薄膜可以使用內聯或集群系統。內聯及集群系統,在裝載室和卸載室之間配置有多個處理室,且被裝載至裝載室的基板通過多個處理室,同時執行連續的製程。該內聯及集群系統中濺射裝置被配置在至少一個處理室內,且磁鐵單元以一定的間距被設置。One of the sputtering units, a magnetron sputtering unit, can use inline or cluster systems for evaporating thin films on large-area substrates. In an inline and cluster system, a plurality of processing chambers are arranged between the loading chamber and the unloading chamber, and the substrates loaded into the loading chamber pass through the plurality of processing chambers, and perform continuous processes at the same time. In the inline and cluster system, the sputtering device is arranged in at least one processing chamber, and the magnet units are arranged at a certain interval.

但是由於磁鐵單元,存在固定的磁場,因此物件表面的侵蝕根據電場和磁場的等離子密度被決定。特別是,磁鐵單元的邊緣,即長度方向的至少一端相鄰的區域中被施加接地電位,因此基板邊緣的等離子密度相比其他區域較大,由此,物件的邊緣相比其他區域濺射速度更快。因此,基板上蒸鍍的薄膜的厚度分佈不均勻,發生膜質分佈下降的問題,由於等離子密度差異,物件的特定部分被過度侵蝕,發生物件效率被減少的問題。However, due to the magnet unit, there is a fixed magnetic field, so the erosion of the object surface is determined according to the plasma density of the electric and magnetic fields. In particular, the edge of the magnet unit, that is, the region adjacent to at least one end in the longitudinal direction, is applied with ground potential, so the plasma density at the edge of the substrate is higher than that in other regions, and thus the edge of the object is sputtered faster than other regions. faster. Therefore, the thickness distribution of the vapor-deposited film on the substrate is not uniform, and the film quality distribution is reduced. Due to the difference in plasma density, certain parts of the object are excessively eroded, and the efficiency of the object is reduced.

為了解決上述問題,一種方法是利用邊緣的厚度比中央部的厚度更厚的對象。為了製備該物件,需要利用將平面物件的中央部研磨使厚度變薄等附加製程,必須加工平面物件。但是,由於加工該平面物件,會發生材料損失、附加的製程費用問題。此外,加工物件的過程中還會發生物件被損壞等問題。To solve the above problem, one approach is to use an object whose edge is thicker than the central portion. In order to manufacture the object, additional processes such as grinding the central portion of the flat object to reduce the thickness are required, and the flat object must be processed. However, due to the processing of the flat object, material loss and additional process costs will occur. In addition, problems such as the object being damaged may also occur in the process of processing the object.

作為解決問題的其他方法,還包括:利用分流(shunt)等來調節物件表面的磁場強度的方法,利用距離調節手段來調節磁鐵和物件之間的距離的方法,或是在磁鐵的邊緣位置添加Z電機的方法等。但是,這些方法都需要增加製造費用,手工操作地來調節磁場強度,並且磁場強度不能被局部地調節,具有需要多次反復操作,且操作時間較長的問題。As other methods to solve the problem, it also includes: using shunt to adjust the magnetic field strength on the surface of the object, using distance adjustment means to adjust the distance between the magnet and the object, or adding a method to the edge of the magnet The method of the Z motor, etc. However, these methods all need to increase the manufacturing cost, manually adjust the magnetic field strength, and the magnetic field strength cannot be adjusted locally, and have problems that repeated operations are required many times, and the operation time is long.

作為又另一個方法,利用永久磁鐵和經捲曲在其上的導線被形成的線圈,來提供能夠局部調節磁場的結構。在這種情況下,為了產生較強的磁場,需捲繞許多導線來增加通過線圈的電流量,從而增加磁場,但是該方法在產品尺寸被限制的領域中具有較難使用的問題。此外,雖然可以使用增加通過線圈的電流來增加磁場的方法,但是具有需要解決由較多的電流量而產生的熱的問題。例如,由於較高的熱,會發生永久磁鐵的磁性減少,或安裝有永久磁鐵的鐵板彎曲等問題。為了解決這些問題,可以利用水、油、或空氣等流體作為致冷劑,但是水具有在高電流電磁鐵中會發生感電的危險性,且油具有會使真空環境中運作的裝置被污染的問題,且空氣具有熱容量較小較難將熱充分去除的問題。此外,雖然可以利用熱電元件或熱管等散熱結構體來去除熱,但是在這種情況下,具有結構變得更複雜,整個裝置的體積和製造費用被增加的問題,此外,由於形狀不均勻的線圈和散熱結構體之間大部分形成線接觸或點接觸,因此具有不能克服接觸面積局限性的問題As yet another method, a coil formed of permanent magnets and wires crimped thereon is used to provide a structure capable of locally adjusting the magnetic field. In this case, in order to generate a strong magnetic field, many wires need to be wound to increase the amount of current passing through the coil, thereby increasing the magnetic field, but this method has a problem of being difficult to use in a field where the product size is limited. In addition, although a method of increasing the magnetic field by increasing the current through the coil can be used, there is a problem that the heat generated by the larger amount of current needs to be solved. For example, due to high heat, the magnetism of the permanent magnets is reduced, or the iron plate on which the permanent magnets are mounted is bent. To solve these problems, fluids such as water, oil, or air can be used as refrigerants, but water has the risk of inducting electric current in high-current electromagnets, and oil has the risk of contaminating devices operating in a vacuum environment. problem, and the air has the problem that the heat capacity is small and it is difficult to remove the heat sufficiently. In addition, although heat can be removed by using a heat dissipation structure such as a thermoelectric element or a heat pipe, in this case, the structure becomes more complicated, and the volume and manufacturing cost of the entire device are increased. Line contact or point contact is mostly formed between the coil and the heat dissipation structure, so there is a problem that the limitation of the contact area cannot be overcome

上述的背景技術是發明者在匯出本發明的過程中被保有或獲取,不能被視為是本發明申請前被公開於一般公眾的已知技術。The above-mentioned background art is kept or acquired by the inventor in the process of exporting the present invention, and cannot be regarded as the known art disclosed to the general public before the application of the present invention.

技術課題technical issues

一個實施例的目的在於提供一種電磁鐵組件的製備方法,來有效地將熱放出,同時具有高磁力。An object of one embodiment is to provide a method of manufacturing an electromagnet assembly to efficiently release heat while having high magnetic force.

一個實施例的目的在於提供一種用於磁控管濺射裝置的電磁鐵組件的製備方法,來局部地調節磁場。An object of one embodiment is to provide a method of fabricating an electromagnet assembly for a magnetron sputtering device to locally adjust the magnetic field.

技術方案Technical solutions

根據一個實施例,電磁鐵組件的製備方法可包括以下步驟:製備包含突出部和包圍所述突出部的週邊部的框架;在所述突出部的外周配置線圈來包掩所述突出部;在常溫和常壓下加熱具固體狀態的熱傳導物質使其變為液體狀態;將所述液體狀態的熱傳導物質填充至所述突出部和所述週邊部之間的空間;以及在所述填充的步驟之後,將永久磁鐵配置在所述線圈的中央。According to one embodiment, a method of manufacturing an electromagnet assembly may include the steps of: preparing a frame including a protruding portion and a peripheral portion surrounding the protruding portion; disposing a coil on the outer periphery of the protruding portion to cover the protruding portion; heating a thermally conductive substance in a solid state under normal temperature and normal pressure to change it into a liquid state; filling the thermally conductive substance in a liquid state into a space between the protruding portion and the peripheral portion; and in the step of filling After that, a permanent magnet is arranged at the center of the coil.

其中所述電磁鐵組件的製備方法可進一步包括以下步驟:在所述填充的步驟之後以及配置所述永久磁鐵的步驟之前,使所述液體狀態的熱傳導物質冷卻成為固體狀態,從而生成熱傳導介質。The method for preparing the electromagnet assembly may further include the following steps: after the step of filling and before the step of arranging the permanent magnets, cooling the heat-conducting substance in a liquid state into a solid state, thereby generating a heat-conducting medium.

其中所述熱傳導介質佔據的體積可以是所述永久磁鐵和所述週邊部之間的空間的1/2以下。The volume occupied by the thermally conductive medium may be 1/2 or less of the space between the permanent magnet and the peripheral portion.

所述熱傳導物質可以是熔點可以是100度(℃)至400度的低熔點金屬。The thermally conductive substance may be a low melting point metal whose melting point may be 100 degrees (° C.) to 400 degrees.

所述熱傳導物質可由銦、鉛、以及塑膠系熱傳導介質中的任何一個以上組成。The thermally conductive material may be composed of any one or more of indium, lead, and plastic-based thermally conductive media.

其中所述週邊部可由非磁性散熱材料製成。The peripheral portion can be made of non-magnetic heat dissipation material.

其中所述永久磁鐵可由釹和鐵素中的任何一個以上材質形成。The permanent magnets can be formed of any one or more of neodymium and ferrite.

其中所述電磁鐵組件的製備方法可進一步包括以下步驟:在所述填充的步驟之前或所述填充的步驟同時,將所述框架加熱。Wherein the preparation method of the electromagnet assembly may further include the following step: before the filling step or at the same time as the filling step, heating the frame.

配置所述線圈的步驟可包括:將預先配置的線圈插入至所述突出部的外周的步驟。The step of configuring the coil may include the step of inserting a preconfigured coil to the outer periphery of the protrusion.

所述突出部的內部可形成有收容所述永久磁鐵的永久磁鐵收容空間。A permanent magnet accommodating space for accommodating the permanent magnet may be formed inside the protruding portion.

所述框架可通過使用鋁或銅材質一體形成。The frame may be integrally formed by using aluminum or copper material.

所述框架可包括:含有所述週邊部的週邊框架;和包含所述突出部並能夠從所述週邊框架分離的塑型框架。The frame may include: a peripheral frame including the peripheral portion; and a plastic frame including the protrusion and separable from the peripheral frame.

製備所述框架的步驟可包括:將所述塑型框架結合至所述週邊框架的步驟,且所述電磁鐵組件的製備方法可進一步包括以下步驟:在所述填充的步驟之後以及配置所述永久磁鐵的步驟之前,將所述塑型框架從所述週邊框架中去除。The step of preparing the frame may include the step of bonding the molding frame to the peripheral frame, and the method of preparing the electromagnet assembly may further include the step of configuring the The molding frame is removed from the perimeter frame prior to the step of permanent magnets.

所述電磁鐵組件可包括致冷劑流路,引導致冷劑來吸收所述線圈中產生的熱並排出至外部。The electromagnet assembly may include a refrigerant flow path that induces the refrigerant to absorb heat generated in the coil and discharge it to the outside.

根據一個實施例,電磁鐵組件的製備方法可包括以下步驟:製備包含突出部和包圍所述突出部的週邊部的框架;在所述突出部的外周配置線圈來包掩所述突出部;在常溫和常壓下以200度(℃)以下的溫度加熱具固體狀態的熱傳導物質使其變為液體狀態;將所述液體狀態的熱傳導物質填充至所述突出部和所述週邊部之間的空間;以及將鐵素材質的永久磁鐵配置在所述線圈的中央。According to one embodiment, a method of manufacturing an electromagnet assembly may include the steps of: preparing a frame including a protruding portion and a peripheral portion surrounding the protruding portion; disposing a coil on the outer periphery of the protruding portion to cover the protruding portion; Under normal temperature and normal pressure, heat the thermally conductive substance in a solid state at a temperature below 200 degrees (°C) to change it into a liquid state; fill the thermally conductive substance in a liquid state into the space between the protruding portion and the peripheral portion. space; and a permanent magnet made of ferrous material is arranged in the center of the coil.

根據一個實施例,用於磁控管濺射裝置的電磁鐵組件的製備方法可包括以下步驟:製備包含多個突出部和包圍所述多個突出部的週邊部的框架;在所述多個突出部分別配置多個線圈;在常溫和常壓下加熱具固體狀態的熱傳導物質使其變為液體狀態;將所述液體狀態的熱傳導物質填充至所述多個突出部和所述週邊部之間的空間;以及在所述填充的步驟之後,將多個永久磁鐵分別配置在所述多個線圈的各中央。According to one embodiment, a method of manufacturing an electromagnet assembly for a magnetron sputtering device may include the steps of: preparing a frame including a plurality of protrusions and a peripheral portion surrounding the plurality of protrusions; The protrusions are respectively equipped with a plurality of coils; the heat conduction material in a solid state is heated under normal temperature and pressure to change it into a liquid state; the heat conduction material in the liquid state is filled between the plurality of protrusions and the peripheral part. and after the step of filling, disposing a plurality of permanent magnets at the centers of the plurality of coils, respectively.

分別配置所述多個永久磁鐵的步驟可包括:使所述多個永久磁鐵中至少一部分相鄰的兩個永久磁鐵極性相反地被配置的步驟。The step of arranging the plurality of permanent magnets, respectively, may include the step of arranging two adjacent permanent magnets in at least a part of the plurality of permanent magnets with opposite polarities.

所述用於磁控管濺射裝置的電磁鐵組件可包括:導體,被安裝有所述相鄰的兩個永久磁鐵使所述相鄰的兩個永久磁鐵之間有效地形成磁力線。The electromagnet assembly for a magnetron sputtering device may include: a conductor installed with the two adjacent permanent magnets to effectively form magnetic lines of force between the two adjacent permanent magnets.

所述多個永久磁鐵中位於兩側週邊部的永久磁鐵的尺寸可以比位於中央的永久磁鐵的尺寸小。Among the plurality of permanent magnets, the size of the permanent magnets located at the peripheral portions on both sides may be smaller than the size of the permanent magnets located at the center.

所述多個線圈中位於兩側週邊部的線圈的卷數可以比位於中央的線圈的卷數少。Among the plurality of coils, the number of turns of the coils located at the peripheral portions on both sides may be smaller than the number of turns of the coils located at the center.

技術效果technical effect

根據一個實施例,在形成冷卻手段的過程中由於不將熱施加至永久磁鐵,因此可以防止永久磁力被減少的問題,同時可以有效地冷卻電磁鐵。According to one embodiment, since heat is not applied to the permanent magnet in the process of forming the cooling means, the problem that the permanent magnetic force is reduced can be prevented while the electromagnet can be effectively cooled.

根據一個實施例,用於磁控管濺射裝置的電磁鐵的各部分中發生的磁場具有不同的強度,因此可以防止物件的局部過度侵蝕,且有效地延長物件的使用壽命,從而可以減少濺射裝置的維修費用。According to one embodiment, the magnetic fields generated in each part of the electromagnet for the magnetron sputtering device have different strengths, so that local excessive erosion of the object can be prevented, and the service life of the object can be effectively prolonged, so that the sputtering can be reduced maintenance costs of the launcher.

以下,參照示例性附圖對實施例進行詳細說明。各附圖的結構要素中添加有參照符號,應注意,對於相同的結構要素就算在其他附圖中被示出也盡可能使用相同的參照符號。此外,在說明實施例時,相關的已知技術或性能的具體說明被判斷使實施例的說明模糊不清時,省略該詳細說明。Hereinafter, the embodiments will be described in detail with reference to the exemplary drawings. Reference numerals are added to the constituent elements in each drawing, and it should be noted that the same reference numerals are used as much as possible even if the same constituent elements are shown in other drawings. In addition, in the description of the embodiment, when the specific description of the related known technology or performance is judged to obscure the description of the embodiment, the detailed description is omitted.

此外,在說明實施例的結構要素時,可使用第一,第二,A, B, (a), (b)等用語。該用語僅為了將該結構要素與其他結構要素區分開。該用語並不限制相應結構要素的本質,或是次序或順序等。當一些結構要素被記載與其他結構要素「連結」,「結合」或「接入」時,該結構要素可以是直接與其他結構要素連接或接入,也可以理解為各結構要素之間「連結」,「結合」或「接入」有其他結構要素。In addition, when describing the structural elements of the embodiment, terms such as first, second, A, B, (a), (b) may be used. This term is only used to distinguish this structural element from other structural elements. The terms do not limit the nature of the corresponding structural elements, or the order or sequence, or the like. When some structural elements are described as "connected", "combined" or "connected" with other structural elements, the structural elements can be directly connected or connected with other structural elements, or can be understood as "connection" between structural elements ", "join" or "access" have other structural elements.

任何一個實施例中包含的結構要素以及包含共同功能的結構要素在其他實施例中也使用相同的名稱進行說明。在沒有相反的記載的情況下,任何一個實施例中記載的說明在其他實施例中也可被適用,且重複的範圍內省略具體的說明。Structural elements included in any one embodiment and structural elements having a common function are also described using the same names in other embodiments. In the case where there is no contrary description, the descriptions described in any one embodiment can also be applied in other embodiments, and specific descriptions are omitted within the overlapping range.

圖1是根據一個實施例的磁控管濺射裝置的概念圖。FIG. 1 is a conceptual diagram of a magnetron sputtering apparatus according to one embodiment.

參照圖1,根據一個實施例的磁控管濺射裝置1,可以使用一種技術,將氣體注入真空狀態的室內生成等離子,並使其與需蒸鍍離子化氣體粒子的含有物件物質的物件T衝突,然後將經衝突濺射的粒子蒸鍍在基板等目標O上。磁控管濺射裝置1可在相對較低的溫度下製備薄膜,且經磁場被加速的離子被緻密地蒸鍍在基板上,具有蒸鍍速度較快的優點。Referring to FIG. 1 , according to a magnetron sputtering apparatus 1 of an embodiment, a technique can be used to inject gas into a vacuum chamber to generate plasma, and make it with the object T containing the object substance to be evaporated ionized gas particles collision, and then the collision sputtered particles are evaporated on a target O such as a substrate. The magnetron sputtering device 1 can prepare a thin film at a relatively low temperature, and ions accelerated by a magnetic field are densely vapor-deposited on the substrate, which has the advantage of a faster evaporation rate.

磁控管濺射裝置1可包括由於在物件T上形成磁力線的電磁鐵組件11。電磁鐵組件11可相對於目標O配置在物件T的後方。即,目標O可位於物件T的前方(以圖1為基準位於右側),且電磁鐵組件11可位於物件T的後方(以圖1為基準位於左側)。The magnetron sputtering apparatus 1 may include an electromagnet assembly 11 due to the formation of magnetic lines of force on the object T. The electromagnet assembly 11 may be disposed behind the object T with respect to the target O. That is, the target O may be located in front of the object T (on the right side based on FIG. 1 ), and the electromagnet assembly 11 may be located behind the object T (on the left side based on FIG. 1 ).

電磁鐵組件11可包括:磁場生成單元M,用於生成磁場;以及致冷劑流入線L_in和致冷劑流出線L_out,用來引導致冷劑,吸收磁場生成單元M中產生的熱並排放到外部。對於電磁鐵組件11以下通過示例進行說明。同時,以下說明的電磁鐵組件11並不僅限用於磁控管濺射裝置的電磁鐵組件。The electromagnet assembly 11 may include: a magnetic field generating unit M for generating a magnetic field; and a refrigerant inflow line L_in and a refrigerant outflow line L_out for introducing the refrigerant, absorbing heat generated in the magnetic field generating unit M and discharging it to the outside. The electromagnet assembly 11 will be described below by way of example. Meanwhile, the electromagnet assembly 11 described below is not limited to the electromagnet assembly used in the magnetron sputtering apparatus.

圖2是根據一個實施例的電磁鐵組件的立體圖,且圖3是根據一個實施例的電磁鐵組件的分解立體圖。2 is a perspective view of an electromagnet assembly according to one embodiment, and FIG. 3 is an exploded perspective view of the electromagnet assembly according to one embodiment.

參照圖2或圖3,根據一個實施例的電磁鐵組件21可包括磁場生成單元M、散熱體213、熱傳導介質214和冷卻板215。Referring to FIG. 2 or FIG. 3 , the electromagnet assembly 21 according to one embodiment may include a magnetic field generating unit M, a heat sink 213 , a heat conduction medium 214 and a cooling plate 215 .

磁場生成單元M可包括線圈212,被配置為將永久磁鐵211和永久磁鐵211的周圍包掩。為了便於說明,在此省略對於將電源施加至線圈212的外部電源。根據如上所述的結構,可以通過改變線圈212的卷數,或是控制施加至線圈212的電流或電壓的大小,來調節磁場生成單元M中生成的磁場大小。此外,通過永久磁鐵211,無須為了產生特定值的磁場而使施加至線圈212的電流或電壓過度地增加,因此可以節約能源。換句話說,線圈212中施加的電流或電壓的水準被降低,從而可以減少經線圈212產生的熱,結果是用於使線圈212中產生的熱排放到外部的冷卻手段的冷卻量被減少,因此可簡化設備,節約了冷卻所消耗的能源,從而可以提高電磁鐵組件21的能源效率。The magnetic field generating unit M may include a coil 212 configured to cover the permanent magnet 211 and the periphery of the permanent magnet 211 . For convenience of explanation, the external power supply for applying power to the coil 212 is omitted here. According to the structure as described above, the magnitude of the magnetic field generated in the magnetic field generating unit M can be adjusted by changing the number of turns of the coil 212 or controlling the magnitude of the current or voltage applied to the coil 212 . In addition, since the permanent magnet 211 does not need to excessively increase the current or voltage applied to the coil 212 in order to generate a magnetic field of a specific value, it is possible to save energy. In other words, the level of current or voltage applied in the coil 212 is lowered, so that the heat generated through the coil 212 can be reduced, and as a result, the cooling amount of the cooling means for discharging the heat generated in the coil 212 to the outside is reduced, Therefore, the equipment can be simplified, the energy consumed for cooling can be saved, and the energy efficiency of the electromagnet assembly 21 can be improved.

例如,永久磁鐵211可由釹(Nd)或鐵素(ferrite)形成。For example, the permanent magnet 211 may be formed of neodymium (Nd) or ferrite.

此外,永久磁鐵在高溫環境中被操作時具有磁性減少的問題。特別是釹磁鐵的情況下,在通常銷售的磁鐵中具有非常優秀的磁性特徵,可有效地產生較強的磁場,但由於對於熱具缺陷,在約80度以上的溫度中可能會發生永久地磁性被減少的問題,因此需要設計成使線圈212中產生的熱可充分地被排放。參照圖4、圖9和圖10,根據後述的電磁鐵組件21的製備方法則可以解除上述問題。In addition, permanent magnets have a problem of reduced magnetism when they are operated in a high temperature environment. In the case of neodymium magnets in particular, they have very excellent magnetic characteristics among commonly sold magnets and can effectively generate a strong magnetic field, but due to defects in thermal tools, permanent magnetization may occur at temperatures above about 80 degrees Celsius. The problem of reduced magnetism, therefore, needs to be designed so that the heat generated in the coil 212 can be sufficiently discharged. Referring to FIGS. 4 , 9 and 10 , the above-mentioned problems can be solved according to the method of manufacturing the electromagnet assembly 21 to be described later.

此外,永久磁鐵211並不是必須由釹或鐵素形成,也可以利用其他物質被形成。此外,永久磁鐵211,例如可以由釹或鐵素中任何一個以上的材質形成。In addition, the permanent magnet 211 does not necessarily have to be formed of neodymium or ferrite, and may be formed of other materials. In addition, the permanent magnet 211 may be formed of, for example, any one or more of neodymium and ferrite.

例如,線圈212,可以是由絕緣物質被塗層的導線形成,從而可以防止流過線圈212的電流通過熱傳導介質214被傳達至外部。For example, the coil 212 may be formed of a wire coated with an insulating substance, so that the current flowing through the coil 212 can be prevented from being transmitted to the outside through the thermally conductive medium 214 .

散熱體213作為將磁場生成單元M中產生的熱排放到外部的結構物,可支撐磁場生成單元M的至少一側。例如,散熱體213可包括:線筒2132(bobbin),包圍線筒2132的週邊部2131,和配置在週邊部2131和線筒2132之間用於收容線圈212的線圈收容空間2133,以及配置線上筒2132的內部用於收容永久磁鐵211的永久磁鐵收容空間2134。例如,週邊部2131可由熱傳導性較高的非磁性散熱材料,如鋁或銅等形成。例如,包含週邊部2131和線筒2132的散熱體213可一體成型。The heat sink 213 can support at least one side of the magnetic field generating unit M as a structure for radiating heat generated in the magnetic field generating unit M to the outside. For example, the heat sink 213 may include a bobbin 2132, a peripheral portion 2131 surrounding the bobbin 2132, a coil accommodating space 2133 disposed between the peripheral portion 2131 and the bobbin 2132 for accommodating the coil 212, and the bobbin The interior of the barrel 2132 is used for a permanent magnet accommodating space 2134 for accommodating the permanent magnet 211 . For example, the peripheral portion 2131 may be formed of a non-magnetic heat-dissipating material with high thermal conductivity, such as aluminum or copper. For example, the heat sink 213 including the peripheral portion 2131 and the wire barrel 2132 may be integrally formed.

此外,如參照圖4和圖5後述的,散熱體213和線筒2132也可以分別稱為「框架」和「突出部」。In addition, as described later with reference to FIGS. 4 and 5 , the heat sink 213 and the bobbin 2132 may be referred to as a “frame” and a “protrusion”, respectively.

此外,如參照圖6至圖10後述的,如果在塑型框架316中包含突出部來執行臨時線筒功能時,在散熱體213中可以省略線筒2132。In addition, as described later with reference to FIGS. 6 to 10 , if a protrusion is included in the molding frame 316 to perform a temporary bobbin function, the bobbin 2132 may be omitted in the heat sink 213 .

熱傳導介質214可填入線圈212和週邊部2131之間的間隙空間。由於將導線多次反復地捲曲,因此製備的線圈212在製作特徵上,雖然可以將線圈212的形狀準確地與預先製備的線圈收容空間2133相匹配,但是事實上,與預先製備的線圈212的形狀相匹配來形成線圈收容空間2133非常困難。此外,線圈212的模樣不均勻,因此較難準確地使線圈212和週邊部2131準確地面接觸,且兩者之間多數部分中形成有線接觸或點接觸,因此線圈212和週邊部2131之間形成有相隔開的間隙空間。熱傳導介質214由熱傳導性較高的物質形成,可以填入該間隙空間,將線圈212中放出的熱有效地傳遞至週邊部2131等,從而被排放到外部。例如,作為形成熱傳導介質214的熱傳導物質,可使用熔點為100度至400度的低熔點的金屬。例如,熱傳導物質可以由銦(In)、鉛(Pb)以及塑膠系熱傳導介質中的任何一個以上形成。The thermally conductive medium 214 may fill the gap space between the coil 212 and the peripheral portion 2131 . Since the wire is repeatedly crimped for many times, the prepared coil 212 can accurately match the shape of the coil 212 with the pre-prepared coil accommodating space 2133 in terms of the manufacturing characteristics, but in fact, it is consistent with the pre-prepared coil 212. It is very difficult to form the coil accommodating space 2133 by matching the shape. In addition, the shape of the coil 212 is not uniform, so it is difficult to accurately make contact between the coil 212 and the peripheral portion 2131 on the ground, and a wire contact or point contact is formed in most parts between the two, so the coil 212 and the peripheral portion 2131 are formed between There are gap spaces separated from each other. The thermally conductive medium 214 is formed of a material with high thermal conductivity, can fill the gap space, and can efficiently transmit the heat emitted from the coil 212 to the peripheral portion 2131 and the like, and is discharged to the outside. For example, as the thermally conductive material forming the thermally conductive medium 214, a low-melting metal having a melting point of 100 to 400 degrees can be used. For example, the thermally conductive material may be formed of any one or more of indium (In), lead (Pb), and a plastic-based thermally conductive medium.

可以在線圈212被插入至線圈收容空間2133的狀態下,將液體狀態的熱傳導物質填入至線圈收容空間2133,並且使其冷卻從而來形成熱傳導介質214。The thermally conductive medium 214 may be formed by filling the coil accommodating space 2133 with a thermally conductive material in a liquid state with the coil 212 inserted into the coil accommodating space 2133 and cooling it.

熱傳導介質214所佔據的體積可以是,例如永久磁鐵211和週邊部2131之間的空間的1/2以下。熱傳導介質214所佔據的體積可以是,例如線圈收容空間2133的1/2以下。根據該結構,可以減少熱傳導性較好且較貴的熱傳導物質的使用量,因此可以減少熱傳導介質214的製造時間和製造費用。例如,由相對便宜的鋁等材質形成的週邊部2131作為主要的散熱手段,並使用相比鋁價格貴100倍左右的銦來形成熱傳導介質214作為輔助散熱手段,從而可以較大地減少整個電磁鐵組件21的製造時間和製造成本。The volume occupied by the thermally conductive medium 214 may be, for example, 1/2 or less of the space between the permanent magnet 211 and the peripheral portion 2131 . The volume occupied by the thermally conductive medium 214 may be, for example, less than 1/2 of the coil accommodating space 2133 . According to this structure, the usage-amount of the thermally-conductive material with high thermal conductivity and expensive can be reduced, and therefore the manufacturing time and manufacturing cost of the thermally-conductive medium 214 can be reduced. For example, the peripheral portion 2131 formed of relatively cheap aluminum and other materials is used as the main heat dissipation means, and indium, which is about 100 times more expensive than aluminum, is used to form the heat conduction medium 214 as the auxiliary heat dissipation means, so that the entire electromagnet can be greatly reduced. Manufacturing time and manufacturing cost of assembly 21 .

冷卻板215可配置在散熱體213的一面。冷卻板215可以包括致冷劑流路2151,分別與致冷劑流入線L_in和致冷劑流出線L_out貫通來引導致冷劑。流過致冷劑流路2151的致冷劑可吸收線圈212中產生的從線圈212通過熱傳導介質214或週邊部2131等被傳遞的熱,從而排放到外部。此外,冷卻板215和散熱體213可一體成型。The cooling plate 215 may be arranged on one side of the heat sink 213 . The cooling plate 215 may include a refrigerant flow path 2151 penetrating the refrigerant inflow line L_in and the refrigerant outflow line L_out, respectively, to induce the refrigerant. The refrigerant flowing through the refrigerant flow path 2151 absorbs heat generated in the coil 212 and is transferred from the coil 212 through the heat transfer medium 214 or the peripheral portion 2131 and the like, and is discharged to the outside. In addition, the cooling plate 215 and the heat sink 213 may be integrally formed.

此外,用於磁控管濺射裝置的電磁鐵組件21的散熱體213可包括多個線筒2132,以及包圍多個線筒2132的週邊部2131。同樣,磁場生成部M可包括:多個線筒2132中分別被配置的多個線圈212,以及多個線圈212的中央分別被配置的多個永久磁鐵211。In addition, the heat sink 213 of the electromagnet assembly 21 for the magnetron sputtering device may include a plurality of wire barrels 2132 , and a peripheral portion 2131 surrounding the plurality of wire barrels 2132 . Similarly, the magnetic field generation unit M may include a plurality of coils 212 respectively arranged in the plurality of bobbins 2132, and a plurality of permanent magnets 211 arranged at the centers of the plurality of coils 212, respectively.

例如,在圖1和圖2示出的多個永久磁鐵211中,至少一部分相鄰的兩個永久磁鐵211可極性相反地被配置。此外,用於磁控管濺射裝置的電磁鐵組件21可包括導體,被安裝有相鄰的兩個永久磁鐵211。所述導體可在相鄰的兩個永久磁鐵211之間有效地形成磁力線,起到橋接(bridge)作用,因此可以提高磁場生成部M的效率。所述導體,例如可以是配置在散熱體213的底面或是配置在散熱體213下部的冷卻板215,或是附加配置在散熱體213和冷卻板215之間的其他導體。也就是說,散熱體213的下部或冷卻板215的上部可形成有傳導性物質。For example, among the plurality of permanent magnets 211 shown in FIGS. 1 and 2 , at least a part of two permanent magnets 211 adjacent to each other may be arranged with opposite polarities. In addition, the electromagnet assembly 21 for the magnetron sputtering apparatus may include a conductor installed with adjacent two permanent magnets 211 . The conductors can effectively form magnetic lines of force between the two adjacent permanent magnets 211 to function as a bridge, so that the efficiency of the magnetic field generating portion M can be improved. The conductors may be, for example, the cooling plate 215 disposed on the bottom surface of the heat sink 213 , the cooling plate 215 disposed at the lower portion of the heat sink 213 , or other conductors additionally disposed between the heat sink 213 and the cooling plate 215 . That is, the lower part of the heat sink 213 or the upper part of the cooling plate 215 may be formed with the conductive substance.

磁控管濺射裝置1(參照圖1)中,考慮到物件T的週邊部分具有較快損耗的傾向,磁場生成部M中位於週邊的部分的磁場大小,與位於中央位置的部分的磁場大小相比可較小地形成。例如,多個永久磁鐵211中位於兩側週邊部的永久磁鐵211的大小,與位於中央的永久磁鐵211的大小相比可較小。作為其他示例,在多個線圈212中,位於兩側週邊部的線圈212的卷數,與位於中央的線圈212的卷數相比可較少。通過上述結構,物件T的整個區域被均勻地損耗,因此物件T的壽命週期被增加,從而可以更有效地減少磁控管濺射裝置1的維修費用。In the magnetron sputtering apparatus 1 (refer to FIG. 1 ), considering that the peripheral portion of the object T tends to be rapidly worn out, the magnetic field magnitude of the peripheral portion of the magnetic field generating portion M is different from the magnetic field magnitude of the central portion of the magnetic field generator M. Comparatively, it can be formed smaller. For example, among the plurality of permanent magnets 211, the size of the permanent magnets 211 located in the peripheral portions on both sides may be smaller than the size of the permanent magnets 211 located in the center. As another example, among the plurality of coils 212, the number of turns of the coils 212 located in the peripheral portions on both sides may be smaller than the number of turns of the coils 212 located at the center. With the above structure, the entire area of the object T is uniformly worn, and thus the life cycle of the object T is increased, so that the maintenance cost of the magnetron sputtering apparatus 1 can be more effectively reduced.

圖4是示出根據一個實施例的電磁鐵組件的製備方法的流程圖。FIG. 4 is a flowchart illustrating a method of manufacturing an electromagnet assembly according to one embodiment.

參照圖2至圖4,根據一個實施例的電磁鐵組件21的製備方法可以包括:在步驟S110中製備框架;在步驟S120中配置多個線圈;在步驟S130中加熱框架;在步驟S140中加熱熱傳導物質;在步驟S150中填充熱傳導物質;在步驟S160中進行冷卻以及在步驟S170中配置永久磁鐵。此外,除非另有說明,電磁鐵組件21的製備方法中,各步驟的執行順序並不受限制,可以省略一部分步驟。2 to 4 , a method for preparing the electromagnet assembly 21 according to one embodiment may include: preparing a frame in step S110; configuring a plurality of coils in step S120; heating the frame in step S130; heating in step S140 Thermally conductive substance; filling with thermally conductive substance in step S150 ; cooling in step S160 and disposing of permanent magnets in step S170 . In addition, unless otherwise specified, in the method for preparing the electromagnet assembly 21, the execution order of each step is not limited, and some steps may be omitted.

步驟S110作為製備含有突出部2132和週邊部2131的框架213的步驟,其中框架213可以是通過使用鋁或銅等材質被一體成型。在此,框架213和突出部2132可分別理解為圖2和圖3中說明的散熱體213和線筒2132。Step S110 is a step of preparing the frame 213 including the protruding portion 2132 and the peripheral portion 2131, wherein the frame 213 may be integrally formed by using materials such as aluminum or copper. Here, the frame 213 and the protruding portion 2132 may be understood as the heat sink 213 and the wire barrel 2132 illustrated in FIGS. 2 and 3 , respectively.

步驟S120作為用於在突出部2132的外周配置包掩突出部2132的線圈212的步驟,例如,可以包括在突出部2132的外周捲曲導線從而形成線圈的步驟。作為其他示例,也可以包括將預先配置的線圈212插入至突出部2132的外周的步驟。Step S120 may include, as a step of arranging the coil 212 covering the protrusion 2132 on the outer periphery of the protrusion 2132, for example, a step of crimping a wire on the outer periphery of the protrusion 2132 to form a coil. As another example, the step of inserting the pre-configured coil 212 to the outer periphery of the protrusion 2132 may also be included.

步驟S130作為加熱框架213的步驟,可在步驟S150之前或與步驟S150同時執行。例如,框架213可在150度的溫度下被加熱。根據這種方法,在執行步驟S150的過程中,熱傳導物質可充分地流入突出部2132和週邊部2131之間沒有線圈212的間隙空間中,可以確保熱傳導物質的流動性。因此,步驟S160過程中生成的熱傳導介質214的熱傳導效率可被提高。Step S130, as a step of heating the frame 213, can be performed before or simultaneously with step S150. For example, the frame 213 may be heated at a temperature of 150 degrees. According to this method, in the process of performing step S150, the thermally conductive material can sufficiently flow into the gap space between the protruding portion 2132 and the peripheral portion 2131 without the coil 212, and the fluidity of the thermally conductive material can be ensured. Therefore, the heat conduction efficiency of the heat conduction medium 214 generated during the step S160 may be improved.

步驟S140作為在常溫和常壓下加熱具固體狀態的熱傳導物質使其變為液體狀態的步驟,可在步驟S150之前被執行。例如,可利用低熔點金屬作為熱傳導物質,在這種情況下,步驟S140的執行時間和執行所需的能源被減少。Step S140 is a step of heating the thermally conductive substance in a solid state to change it into a liquid state at normal temperature and normal pressure, and may be performed before step S150. For example, a low-melting-point metal may be used as the heat-conducting substance, and in this case, the execution time of step S140 and the energy required for execution are reduced.

步驟S150是將步驟S140中生成的液體狀態的熱傳導物質填充至框架213中突出部2132和週邊部2131之間的空間。通過步驟S150,線圈212和週邊部2131之間的熱傳導效率被提高。The step S150 is to fill the space between the protruding portion 2132 and the peripheral portion 2131 in the frame 213 with the thermally conductive substance in the liquid state generated in the step S140 . Through step S150, the heat conduction efficiency between the coil 212 and the peripheral portion 2131 is improved.

步驟S170作為在線圈212的中央配置永久磁鐵211的步驟,可在步驟S150後被執行。根據這種方法,由於加熱狀態的高溫下的熱傳導物質中所排放的熱,可以防止永久磁鐵211的磁性被減少的問題。Step S170 may be executed after step S150 as a step of arranging the permanent magnet 211 in the center of the coil 212 . According to this method, the problem that the magnetic properties of the permanent magnets 211 are reduced due to the heat emitted from the thermally conductive material at a high temperature in a heated state can be prevented.

步驟S160作為將通過步驟S150被填入框架213的液體狀態的熱傳導物質冷卻成為固體狀態的步驟,例如,可以在步驟S170之前被執行。通過該過程,可以更有效地防止永久磁鐵211的磁性被減少的問題。Step S160 may be performed before step S170, for example, as a step of cooling the heat-conductive substance in a liquid state filled in the frame 213 in step S150 into a solid state. Through this process, the problem that the magnetism of the permanent magnet 211 is reduced can be more effectively prevented.

以下通過表1,將根據圖2至圖4中示出的製備方法的實施例的電磁鐵組件21的性能檢測結果和根據其他比較例的電磁鐵組件的性能檢測結果進行比較。首先根據其他比較例的結構和檢測方法進行說明。為了便於理解,使用實施例的附圖符號來進行說明,說明被省略的結構可被視為與實施例的結構實質相同。Table 1 below compares the performance test results of the electromagnet assembly 21 according to the embodiment of the manufacturing method shown in FIGS. 2 to 4 with the performance test results of the electromagnet assemblies according to other comparative examples. First, the structures and detection methods of other comparative examples will be described. For ease of understanding, the description is made using the reference symbols of the embodiment, and the structure whose description is omitted may be regarded as substantially the same as the structure of the embodiment.

第1比較例至第3比較例,以及根據實施例的電磁鐵組件21以相同大小、個數及模樣的永久磁鐵211和線圈212被製備,並使用釹(Nd)材質的磁鐵來作為永久磁鐵211。各示例都在磁場生成部M的下側安裝有冷卻板215,其利用水作為致冷劑,性能被檢測。各示例的具體條件和檢測方法如下被示出。The first to third comparative examples, and the electromagnet assembly 21 according to the embodiment are prepared with permanent magnets 211 and coils 212 of the same size, number, and pattern, and use neodymium (Nd) magnets as the permanent magnets 211. In each example, a cooling plate 215 is attached to the lower side of the magnetic field generating portion M, and the performance is detected using water as a refrigerant. Specific conditions and detection methods for each example are shown below.

<第1比較例><First Comparative Example>

根據第1比較例的電磁鐵組件不具備散熱體213和熱傳導介質214,且磁場生成部M具有通過環氧塑型液被固定至冷卻板215的結構。檢測的溫度為環氧塑型結構物的表面溫度而不是線圈212的溫度,因此可預測實際線圈212的溫度比檢測的溫度更高。The electromagnet assembly according to the first comparative example does not include the heat sink 213 and the thermally conductive medium 214 , and the magnetic field generating portion M has a structure in which the cooling plate 215 is fixed by the epoxy molding liquid. The detected temperature is the surface temperature of the epoxy molding structure rather than the temperature of the coil 212, so the actual temperature of the coil 212 can be predicted to be higher than the detected temperature.

<第2比較例><Second comparative example>

根據第2比較例的電磁鐵組件的熱傳導介質214不是液體狀態而是填充氧化鎂(MgO)粉末,磁場生成部M具有通過環氧塑型液被固定至冷卻板215的結構。檢測的溫度為環氧塑型結構物的表面溫度而不是線圈212的溫度,因此可預測實際線圈212的溫度比檢測的溫度更高。In the electromagnet assembly according to the second comparative example, the thermally conductive medium 214 is not liquid but filled with magnesium oxide (MgO) powder, and the magnetic field generating portion M has a structure fixed to the cooling plate 215 by epoxy molding liquid. The detected temperature is the surface temperature of the epoxy molding structure rather than the temperature of the coil 212, so the actual temperature of the coil 212 can be predicted to be higher than the detected temperature.

<第3比較例><The third comparative example>

根據第3比較例的電磁鐵組件不使用熱傳導介質214,且線圈212和週邊部2131之間的間隙空間中使空氣強制流動,因此除了冷卻板215以外具備附加的冷卻手段。檢測的溫度為線圈212的表面溫度。The electromagnet assembly according to the third comparative example does not use the thermally conductive medium 214 , and air is forced to flow in the gap space between the coil 212 and the peripheral portion 2131 , and therefore includes additional cooling means in addition to the cooling plate 215 . The detected temperature is the surface temperature of the coil 212 .

<實施例><Example>

根據實施例的電磁鐵組件21為圖2中示出的結構,根據圖4的製備方法被製造,並使用銦(In)作為熱傳導介質214。檢測的溫度為線圈212的表面溫度。The electromagnet assembly 21 according to the embodiment has the structure shown in FIG. 2 , is manufactured according to the manufacturing method of FIG. 4 , and uses indium (In) as the thermally conductive medium 214 . The detected temperature is the surface temperature of the coil 212 .

[表1]

Figure 107126396-A0304-0001
[Table 1]
Figure 107126396-A0304-0001

如上述表1所示,根據實施例的電磁鐵組件21與第1比較例和第2比較例的電磁鐵組件相比,可確認磁性下降及溫度變化明顯較小。As shown in Table 1 above, it was confirmed that the electromagnet assembly 21 according to the example had significantly smaller decrease in magnetism and temperature change than the electromagnet assemblies of the first comparative example and the second comparative example.

進一步在與具附加的冷卻手段的第3比較例相比較時,有相似地具有更好的冷卻性能,可確認對於磁場生成部M的磁場減少的影響較小。Furthermore, when compared with the 3rd comparative example provided with the additional cooling means, the cooling performance was similarly higher, and it was confirmed that the influence on the reduction of the magnetic field of the magnetic field generating part M was small.

圖5是示出根據一個實施例的電磁鐵組件的製備方法的流程圖。FIG. 5 is a flowchart illustrating a method of manufacturing an electromagnet assembly according to one embodiment.

參照圖2、圖3和圖5,根據一個實施例的電磁鐵組件21的製備方法可包括:在步驟S210中準備框架,在步驟S220中配置線圈,在步驟S230中加熱框架,在步驟S240中加熱熱傳導物質,在步驟S250中填充熱傳導物質S250,以及在步驟S260中進行冷卻,在步驟S270中配置永久磁鐵。此外,除非另外說明,電磁鐵組件21的製備方法中,各步驟的執行順序並不受限制,可以省略一部分步驟。2 , 3 and 5 , a method for manufacturing an electromagnet assembly 21 according to an embodiment may include: preparing a frame in step S210 , configuring a coil in step S220 , heating the frame in step S230 , and in step S240 The thermally conductive material is heated, filled with the thermally conductive material S250 in step S250, and cooled in step S260, and a permanent magnet is arranged in step S270. In addition, unless otherwise specified, in the method for manufacturing the electromagnet assembly 21, the execution order of each step is not limited, and some steps may be omitted.

在圖4中,與說明的實施例不同,永久磁鐵配置的步驟S270可以在步驟 S210之後及步驟S230之前被執行。這種情況下,在執行步驟S230和步驟S250的過程中,為了減少永久磁鐵211的磁性下降,永久磁鐵211可使用在相對較高溫度約200度下對磁性下降影響較小的鐵素材質的永久磁鐵211。In FIG. 4, unlike the illustrated embodiment, step S270 of permanent magnet configuration may be performed after step S210 and before step S230. In this case, in the process of performing steps S230 and S250, in order to reduce the magnetic drop of the permanent magnet 211, the permanent magnet 211 can be made of a ferrite material which has less influence on the magnetic drop at a relatively high temperature of about 200 degrees. Permanent magnet 211 .

此外,在步驟S240中,熱傳導物質以200度以下的溫度被加熱,可以減少鐵素材質的永久磁鐵211的磁性下降問題。在步驟S240中加熱的熱傳導物質可以是熔點為200度以下的低熔點金屬。例如,熱傳導物質可由銦(In)、鉛(Pb)和塑膠系熱傳導介質中的任何一個以上形成。In addition, in step S240, the thermally conductive material is heated at a temperature of 200 degrees or lower, which can reduce the problem of magnetic degradation of the permanent magnet 211 made of ferrous material. The thermally conductive substance heated in step S240 may be a low melting point metal with a melting point of 200 degrees or less. For example, the thermally conductive substance may be formed of any one or more of indium (In), lead (Pb), and a plastic-based thermally conductive medium.

圖6至圖8是示出根據一個實施例的電磁鐵組件的製備方法的視圖,且圖9至圖10是示出根據一個實施例的電磁鐵組件的製備方法的流程圖。6 to 8 are views illustrating a method of manufacturing an electromagnet assembly according to one embodiment, and FIGS. 9 to 10 are flowcharts illustrating a method of manufacturing an electromagnet assembly according to one embodiment.

參照圖6至圖10,根據一個實施例的電磁鐵組件31的製備方法可包括:在步驟S310中準備框架,在步驟S320中配置線圈,在步驟S330中加熱框架,在步驟S340中加熱熱傳導物質,在步驟S350中填充熱傳導物質S250,以及在步驟S360中進行冷卻,在步驟S380中去除塑型框架,在步驟S390中結合支撐框架,以及在步驟S370中配置永久磁鐵。此外,除非另外說明,電磁鐵組件31的製備方法中,各步驟的執行順序並不受限制,可以省略一部分步驟。6 to 10 , a method for manufacturing the electromagnet assembly 31 according to one embodiment may include: preparing a frame in step S310 , configuring a coil in step S320 , heating the frame in step S330 , and heating a thermally conductive substance in step S340 , filling the thermally conductive material S250 in step S350, and cooling in step S360, removing the molding frame in step S380, combining the support frame in step S390, and disposing the permanent magnet in step S370. In addition, unless otherwise specified, in the method for manufacturing the electromagnet assembly 31, the execution order of each step is not limited, and some steps may be omitted.

步驟S310是製備框架313a, 316的步驟,該框架包括突出部3162和為了包圍突出部3162被突出形成的週邊部3131。步驟S310如圖10所示,可以包括:製備週邊框架313a的步驟S312,製備塑型框架316的步驟S314,和將塑型框架316結合至週邊框架313a的步驟S316。Step S310 is a step of preparing the frames 313a, 316 including the protrusions 3162 and the peripheral portion 3131 protrudingly formed to surround the protrusions 3162. As shown in FIG. 10 , step S310 may include: step S312 of preparing peripheral frame 313a, step S314 of preparing molding frame 316, and step S316 of bonding molding frame 316 to peripheral frame 313a.

框架313a, 316可包括互相可分離的週邊框架313a和塑型框架316,且週邊部3131和突出部3162可分別配置在週邊框架313a和塑型框架316。The frames 313a, 316 may include a peripheral frame 313a and a molding frame 316 that are separable from each other, and the peripheral portion 3131 and the protruding portion 3162 may be disposed on the peripheral frame 313a and the molding frame 316, respectively.

週邊框架313a可包括週邊部3131和上下方向貫通形成的收容空間3135。週邊框架313a可與步驟S390中結合的支撐框架313b(參照圖8)一起構成電磁鐵組件31的散熱體313。The peripheral frame 313a may include a peripheral portion 3131 and a accommodating space 3135 formed through the up-down direction. The peripheral frame 313 a may form the heat sink 313 of the electromagnet assembly 31 together with the support frame 313 b (refer to FIG. 8 ) combined in step S390 .

塑型框架316作為步驟S310至步驟S360臨時使用的輔助結構物,可結合至週邊框架313a或與其分離,可包括:用於包掩收容空間3135下側的覆蓋板3161和插入空間3135的突出部3162。突出部3162可作為使線圈312臨時捲曲的線筒。As an auxiliary structure temporarily used in steps S310 to S360, the molding frame 316 can be combined with or separated from the peripheral frame 313a, and can include: a cover plate 3161 for covering the lower side of the receiving space 3135 and a protrusion for inserting the space 3135 3162. The protrusion 3162 may serve as a bobbin for temporarily crimping the coil 312 .

通過步驟S316,可如圖7所示,在週邊部3131和突出部3162之間配置有可收容線圈312的線圈收容空間3133。Through step S316 , as shown in FIG. 7 , a coil accommodating space 3133 capable of accommodating the coil 312 can be arranged between the peripheral portion 3131 and the protruding portion 3162 .

步驟S320作為在突出部3162的外周配置線圈312來包圍突出部3162的步驟,可以將線圈312配置在通過步驟S316形成的線圈收容空間3133中。步驟S320可以在步驟S316之後被執行,但與此不同,也可以在步驟S314和步驟S316之間被執行,當然也可以與步驟S316同時執行。例如,在突出部3162的外周捲曲導線來形成線圈312時,將步驟S320放在步驟S314和步驟S316之間執行的話在操作空間方面可能更有利。Step S320 is a step of arranging the coil 312 on the outer periphery of the protruding portion 3162 to surround the protruding portion 3162, and the coil 312 may be arranged in the coil accommodating space 3133 formed in the step S316. Step S320 may be executed after step S316, but, unlike this, may be executed between steps S314 and S316, and of course may be executed simultaneously with step S316. For example, when the coil 312 is formed by crimping a wire on the outer periphery of the protrusion 3162, it may be more advantageous in terms of operation space to perform step S320 between steps S314 and S316.

步驟S380作為將塑型框架316從週邊框架313a分離的步驟,通過步驟S360熱傳導物質為固體狀態,因此可以在熱傳導介質314被形成後執行。通過步驟S360,週邊框架313a和線圈312經熱傳導介質314被互相固定,且通過S380,突出部3162被空缺的線圈312的中央形成間隙空間。所述間隙空間可被視為永久磁鐵收容空間3134。Step S380 is a step of separating the molding frame 316 from the peripheral frame 313a, and the thermally conductive material is in a solid state by step S360, so it can be performed after the thermally conductive medium 314 is formed. In step S360, the peripheral frame 313a and the coil 312 are fixed to each other via the thermally conductive medium 314, and in step S380, a gap space is formed in the center of the coil 312 where the protrusion 3162 is vacated. The clearance space can be regarded as a permanent magnet receiving space 3134 .

步驟S390作為將支撐框架313b結合至週邊框架313a的步驟,可以在步驟S380之後被執行。支撐框架313b可與週邊框架313a一起形成散熱體313。支撐框架313b覆蓋永久磁鐵收容空間3134的下側,可用來支撐通過步驟S370配置的永久磁鐵311。例如,支撐框架313b由導體形成,從而相鄰的兩個永久磁鐵311之間有效地形成磁力線,起到橋接(bridge)的作用。例如,支撐框架313b的下側可配置如圖3所示的冷卻板215。此外,支撐框架313b和冷卻板215可以一體成型。Step S390, as a step of bonding the support frame 313b to the peripheral frame 313a, may be performed after step S380. The support frame 313b may form the heat sink 313 together with the peripheral frame 313a. The support frame 313b covers the lower side of the permanent magnet accommodating space 3134, and can be used to support the permanent magnet 311 configured in step S370. For example, the support frame 313b is formed of a conductor, so that magnetic lines of force are effectively formed between the two adjacent permanent magnets 311, thereby serving as a bridge. For example, the lower side of the support frame 313b may be configured with a cooling plate 215 as shown in FIG. 3 . In addition, the support frame 313b and the cooling plate 215 may be integrally formed.

根據如上所述的方法,可以放置被加熱的熱傳導物質的熱使永久磁鐵311的磁性減少的問題。此外,與利用一個模型(mold)一次性製備散熱體的方式相比,相對來說,模型的形狀更簡單,在製備製程中更具優勢。此外,如圖所示,在散熱體313中線筒被省略,因此製備的電磁鐵組件31的空間效率被提高,結構更緊湊。According to the method as described above, the problem that the magnetism of the permanent magnet 311 is reduced by the heat of the heated thermally conductive material can be eliminated. In addition, compared with the method of using a mold to prepare the heat sink at one time, the shape of the mold is relatively simple, which is more advantageous in the manufacturing process. In addition, as shown in the figure, the bobbin is omitted in the heat sink 313, so that the space efficiency of the prepared electromagnet assembly 31 is improved, and the structure is more compact.

如上所述,雖然參照附圖及實施例進行了說明,但本發明並不局限於在此所述的實施例,本發明所屬技術領域中的普通技術人員可通過上述記載進行多種變形和修改。例如,說明的技術可通過與說明的方法不同的順序被執行,和/或說明的構成要素可通過與說明的方法不同的形態被結合或組合。通過其他結構要素或均等物被替換或置換也可獲得適當的效果。As described above, although the description has been made with reference to the drawings and the embodiments, the present invention is not limited to the embodiments described herein, and those skilled in the art to which the present invention pertains can make various modifications and modifications through the above description. For example, the illustrated techniques may be performed in a different order than the illustrated methods, and/or the illustrated elements may be combined or combined in different forms than the illustrated methods. Appropriate effects may also be obtained by substituting or substituting other structural elements or equivalents.

1‧‧‧磁控管濺射裝置11‧‧‧電磁鐵組件21‧‧‧電磁鐵組件31‧‧‧電磁鐵組件211‧‧‧永久磁鐵212‧‧‧線圈213‧‧‧框架\散熱體214‧‧‧熱傳導介質215‧‧‧冷卻板311‧‧‧永久磁鐵312‧‧‧線圈313‧‧‧散熱體313a‧‧‧週邊框架\框架313b‧‧‧支撐框架314‧‧‧熱傳導介質316‧‧‧塑型框架\框架2131‧‧‧週邊部2132‧‧‧突出部\線筒2133‧‧‧線圈收容空間2134‧‧‧永久磁鐵收容空間2151‧‧‧致冷劑流路3131‧‧‧週邊部3133‧‧‧線圈收容空間3134‧‧‧永久磁鐵收容空間3135‧‧‧收容空間3161‧‧‧覆蓋板3162‧‧‧突出部L_in‧‧‧致冷劑流入線L_out‧‧‧致冷劑流出線M‧‧‧磁場生成單元O‧‧‧目標S110、S120、S130、S140、S150、S160、S170‧‧‧步驟S210、S220、S230、S240、S250、S260、S270‧‧‧步驟S310、S312、S314、S316、S320、S330、S340、S350、S360、S370、S380、S390‧‧‧步驟T‧‧‧物件1‧‧‧Magnetron Sputtering Device 11‧‧‧Electromagnet Assembly 21‧‧‧Electromagnet Assembly 31‧‧‧Electromagnet Assembly 211‧‧‧Permanent Magnet 212‧‧‧Coil 213‧‧‧Frame\ Heat Sink 214‧‧‧Thermal conduction medium 215‧‧‧Cooling plate 311‧‧‧Permanent magnet 312‧‧‧Coil 313‧‧‧radiator 313a‧‧‧Peripheral frame\frame 313b‧‧‧Support frame 314‧‧‧Thermal conduction medium 316 ‧‧‧Plastic frame\Frame 2131‧‧‧Peripheral part 2132‧‧‧Protruding part\Spool 2133‧‧‧Coil storage space 2134‧‧‧Permanent magnet storage space 2151‧‧‧Refrigerant flow path 3131‧‧ ‧Peripheral portion 3133‧‧‧Coil accommodating space 3134‧‧‧Permanent magnet accommodating space 3135‧‧‧Accommodating space 3161‧‧‧Cover plate 3162‧‧‧Protrusion L_in‧‧‧Refrigerant inflow line L_out‧‧‧ Refrigerant Outflow Line M‧‧‧Magnetic Field Generation Unit O‧‧‧Target S110, S120, S130, S140, S150, S160, S170‧‧‧Steps S210, S220, S230, S240, S250, S260, S270‧‧‧Steps S310, S312, S314, S316, S320, S330, S340, S350, S360, S370, S380, S390‧‧‧Step T‧‧‧Object

圖1是根據一個實施例的磁控管濺射裝置的概念圖。 圖2是根據一個實施例的電磁鐵組件的立體圖。 圖3是根據一個實施例的電磁鐵組件的分解立體圖。 圖4是示出根據一個實施例的電磁鐵組件的製備方法的流程圖。 圖5是示出根據一個實施例的電磁鐵組件的製備方法的流程圖。 圖6至圖8是示出根據一個實施例的電磁鐵組件的製備方法的視圖。 圖9至圖10是示出根據一個實施例的電磁鐵組件的製備方法的流程圖。FIG. 1 is a conceptual diagram of a magnetron sputtering apparatus according to one embodiment. 2 is a perspective view of an electromagnet assembly according to one embodiment. 3 is an exploded perspective view of an electromagnet assembly according to one embodiment. FIG. 4 is a flowchart illustrating a method of manufacturing an electromagnet assembly according to one embodiment. FIG. 5 is a flowchart illustrating a method of manufacturing an electromagnet assembly according to one embodiment. 6 to 8 are views illustrating a method of manufacturing an electromagnet assembly according to one embodiment. 9 to 10 are flowcharts illustrating a method of manufacturing an electromagnet assembly according to one embodiment.

21‧‧‧電磁鐵組件 21‧‧‧Electromagnetic components

211‧‧‧永久磁鐵 211‧‧‧Permanent Magnets

212‧‧‧線圈 212‧‧‧Coil

213‧‧‧散熱體 213‧‧‧ Heat sink

214‧‧‧熱傳導介質 214‧‧‧Heat transfer medium

215‧‧‧冷卻板 215‧‧‧Cooling plate

2131‧‧‧週邊部 2131‧‧‧Peripheral Department

2132‧‧‧線筒 2132‧‧‧Spool

L_in‧‧‧致冷劑流入線 L_in‧‧‧refrigerant inflow line

L_out‧‧‧致冷劑流出線 L_out‧‧‧Refrigerant outflow line

M‧‧‧磁場生成單元 M‧‧‧magnetic field generating unit

Claims (20)

一種電磁鐵組件的製備方法,包括以下步驟:製備包含突出部和包圍所述突出部的週邊部的框架;在所述突出部的外周配置線圈來包掩所述突出部;在常溫和常壓下加熱具固體狀態的熱傳導物質使其變為液體狀態;將液體狀態的所述熱傳導物質填充至所述突出部和所述週邊部之間的空間;將液體狀態的所述熱傳導物質冷卻至固體狀態,從而生成用於將所述線圈與所述週邊部彼此固定的熱傳導介質;以及在所述填充的步驟之後,將永久磁鐵配置在所述線圈的中央。 A preparation method of an electromagnet assembly, comprising the steps of: preparing a frame including a protruding part and a peripheral part surrounding the protruding part; disposing a coil on the outer periphery of the protruding part to cover the protruding part; heating the thermally conductive substance in a solid state to change it into a liquid state; filling the space between the protrusion and the peripheral portion with the thermally conductive substance in a liquid state; cooling the thermally conductive substance in a liquid state to a solid state state, thereby generating a thermally conductive medium for fixing the coil and the peripheral portion to each other; and after the filling step, arranging a permanent magnet in the center of the coil. 如申請專利範圍第1項所述的電磁鐵組件的製備方法,其中所述生成熱傳導介質的步驟在所述填充的步驟之後以及所述配置所述永久磁鐵的步驟之前執行。 The method for producing an electromagnet assembly according to claim 1, wherein the step of generating a thermally conductive medium is performed after the step of filling and before the step of arranging the permanent magnet. 如申請專利範圍第2項所述的電磁鐵組件的製備方法,其中所述熱傳導介質佔據的體積為所述永久磁鐵和所述週邊部之間的空間的1/2以下。 The method for producing an electromagnet assembly according to claim 2, wherein the volume occupied by the thermally conductive medium is less than 1/2 of the space between the permanent magnet and the peripheral portion. 如申請專利範圍第1項所述的電磁鐵組件的製備方法,其中所述熱傳導物質是熔點為100℃至400℃的低熔點金屬。 The method for producing an electromagnet assembly according to claim 1, wherein the thermally conductive material is a low melting point metal with a melting point of 100°C to 400°C. 如申請專利範圍第1項所述的電磁鐵組件的製備方法,其中所述熱傳導物質由銦、鉛、以及塑膠系熱傳導介質中的任何一個以上組成。 The method for preparing an electromagnet assembly according to the claim 1, wherein the thermally conductive material is composed of any one or more of indium, lead, and a plastic-based thermally conductive medium. 如申請專利範圍第1項所述的電磁鐵組件的製備方法,其中所述週邊部由非磁性散熱材料製成。 The method for producing an electromagnet assembly according to claim 1, wherein the peripheral portion is made of a non-magnetic heat-dissipating material. 如申請專利範圍第1項所述的電磁鐵組件的製備方法,其中所述永久磁鐵由釹和鐵素中的任何一個以上材質形成。 The method for producing an electromagnet assembly according to claim 1, wherein the permanent magnet is formed of any one or more of neodymium and ferrite. 如申請專利範圍第1項所述的電磁鐵組件的製備方法,其中所述電磁鐵組件的製備方法進一步包括以下步驟:在所述填充的步驟之前或所述填充的步驟同時,將所述框架加熱。 The method for preparing an electromagnet assembly according to claim 1, wherein the method for preparing an electromagnet assembly further comprises the following steps: before or at the same time as the step of filling, the frame is heating. 如申請專利範圍第1項所述的電磁鐵組件的製備方法,其中所述配置所述線圈的步驟包括:將預先配置的所述線圈插入至所述突出部的所述外周的步驟。 The method for producing an electromagnet assembly according to claim 1, wherein the step of arranging the coil includes the step of inserting the pre-arranged coil into the outer periphery of the protruding portion. 如申請專利範圍第1項所述的電磁鐵組件的製備方法,其中所述突出部的內部形成有收容所述永久磁鐵的永久磁鐵收容空間。 The method for producing an electromagnet assembly according to claim 1, wherein a permanent magnet accommodating space for accommodating the permanent magnet is formed inside the protruding portion. 如申請專利範圍第10項所述的電磁鐵組件的製備方法,其中所述框架通過使用鋁或銅材質被一體形成。 The method for producing an electromagnet assembly according to claim 10, wherein the frame is integrally formed by using aluminum or copper material. 如申請專利範圍第1項所述的電磁鐵組件的製備方法,其中所述框架包括: 含有所述週邊部的週邊框架;和包含所述突出部並能夠從所述週邊框架分離的塑型框架。 The method for preparing an electromagnet assembly as claimed in item 1 of the patent application scope, wherein the frame comprises: a perimeter frame containing the perimeter portion; and a molding frame containing the protrusion and separable from the perimeter frame. 如申請專利範圍第12項所述的電磁鐵組件的製備方法,其中製備所述框架的步驟包括:將所述塑型框架結合至所述週邊框架的步驟,且所述電磁鐵組件的製備方法進一步包括以下步驟:在所述填充的步驟之後以及所述配置所述永久磁鐵的步驟之前,將所述塑型框架從所述週邊框架中去除。 The method for producing an electromagnet assembly as claimed in claim 12, wherein the step of producing the frame includes the step of bonding the plastic frame to the peripheral frame, and the method for producing the electromagnet assembly It further includes the step of removing the shaped frame from the perimeter frame after the step of filling and before the step of disposing the permanent magnets. 如申請專利範圍第1項所述的電磁鐵組件的製備方法,其中所述電磁鐵組件包括致冷劑流路,引導致冷劑來吸收所述線圈中產生的熱並排出至外部。 The method for producing an electromagnet assembly according to claim 1, wherein the electromagnet assembly includes a refrigerant flow path, and the refrigerant is induced to absorb heat generated in the coil and discharge it to the outside. 一種電磁鐵組件的製備方法,包括以下步驟:製備包含突出部和包圍所述突出部的週邊部的框架;在所述突出部的外周配置線圈來包掩所述突出部;在常溫和常壓下以200℃以下的溫度加熱具固體狀態的熱傳導物質使其變為液體狀態;將液體狀態的所述熱傳導物質填充至所述突出部和所述週邊部之間的空間;將液體狀態的所述熱傳導物質冷卻至固體狀態,從而生成用於將所述線圈與所述週邊部彼此固定的熱傳導介質;以及將鐵素材質的永久磁鐵配置在所述線圈的中央。 A preparation method of an electromagnet assembly, comprising the steps of: preparing a frame including a protruding part and a peripheral part surrounding the protruding part; disposing a coil on the outer periphery of the protruding part to cover the protruding part; Heat the thermally conductive material in a solid state at a temperature below 200°C to change it into a liquid state; fill the space between the protruding portion and the peripheral portion with the thermally conductive material in a liquid state; The thermally conductive material is cooled to a solid state to generate a thermally conductive medium for fixing the coil and the peripheral portion to each other, and a permanent magnet made of ferrite is arranged in the center of the coil. 一種用於磁控管濺射裝置的電磁鐵組件的製備方法,包括以下步驟:製備包含多個突出部和包圍所述多個突出部的週邊部的框架;在所述多個突出部分別配置多個線圈;在常溫和常壓下加熱具固體狀態的熱傳導物質使其變為液體狀態;將液體狀態的所述熱傳導物質填充至所述多個突出部和所述週邊部之間的空間;將液體狀態的所述熱傳導物質冷卻至固體狀態,從而生成用於將所述多個線圈與所述週邊部彼此固定的熱傳導介質;以及在所述填充的步驟之後,將多個永久磁鐵分別配置在所述多個線圈的各中央。 A method for preparing an electromagnet assembly for a magnetron sputtering device, comprising the steps of: preparing a frame including a plurality of protruding parts and a peripheral part surrounding the plurality of protruding parts; disposing the plurality of protruding parts respectively a plurality of coils; heating a thermally conductive substance in a solid state under normal temperature and normal pressure to change it into a liquid state; filling the thermally conductive substance in a liquid state into the space between the plurality of protrusions and the peripheral portion; cooling the thermally conductive material in a liquid state to a solid state to generate a thermally conductive medium for fixing the plurality of coils and the peripheral portion to each other; and after the step of filling, disposing a plurality of permanent magnets respectively at each center of the plurality of coils. 如申請專利範圍第16項所述的電磁鐵組件的製備方法,其中所述分別配置所述多個永久磁鐵的步驟包括:使所述多個永久磁鐵中至少一部分相鄰的兩個永久磁鐵極性相反地被配置的步驟。 The method for preparing an electromagnet assembly as claimed in claim 16, wherein the step of disposing the plurality of permanent magnets respectively comprises: making at least a part of the plurality of permanent magnets adjacent to two permanent magnets in polarities Conversely configured steps. 如申請專利範圍第17項所述的電磁鐵組件的製備方法,其中所述電磁鐵組件包括:導體,被安裝有所述相鄰的兩個永久磁鐵使所述相鄰的兩個永久磁鐵之間形成磁力線。 The method for preparing an electromagnet assembly as claimed in claim 17, wherein the electromagnet assembly comprises: a conductor on which the two adjacent permanent magnets are installed so that the two adjacent permanent magnets are connected to each other. magnetic lines of force are formed between them. 如申請專利範圍第16項所述的電磁鐵組件的製備方法,其中所述多個永久磁鐵中位於兩側週邊部的永久磁鐵的尺寸比位於中央的永久磁鐵的尺寸小。 The method for producing an electromagnet assembly according to claim 16, wherein among the plurality of permanent magnets, the size of the permanent magnets located at the peripheral portions on both sides is smaller than the size of the permanent magnets located at the center. 如申請專利範圍第16項所述的電磁鐵組件的製備方法,其中所述多個線圈中位於兩側週邊部的線圈的卷數比位於中央的線圈的卷數少。The method for producing an electromagnet assembly according to claim 16, wherein among the plurality of coils, the number of turns of the coils located at the peripheral portions on both sides is smaller than that of the coils located at the center.
TW107126396A 2017-08-02 2018-07-31 Manufacturing method of electromagnet assembly TWI761564B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2017-0098187 2017-08-02
KR1020170098187A KR101965266B1 (en) 2017-08-02 2017-08-02 Manufacturing method of electromagnet assembly
??10-2017-0098187 2017-08-02

Publications (2)

Publication Number Publication Date
TW201910542A TW201910542A (en) 2019-03-16
TWI761564B true TWI761564B (en) 2022-04-21

Family

ID=65233926

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107126396A TWI761564B (en) 2017-08-02 2018-07-31 Manufacturing method of electromagnet assembly

Country Status (5)

Country Link
JP (1) JP7173973B2 (en)
KR (1) KR101965266B1 (en)
CN (1) CN110100291B (en)
TW (1) TWI761564B (en)
WO (1) WO2019027133A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102447684B1 (en) * 2019-06-27 2022-09-27 주식회사 노바텍 Circuit board on which single magnet part is installed and method of installing single magnet using surface mount technology device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11172431A (en) * 1997-12-10 1999-06-29 Sony Corp Magnetron sputter film formation and device therefor
US20030011254A1 (en) * 2001-07-10 2003-01-16 Canon Kabushiki Kaisha Electromagnetic actuator and exposure apparatus including the same
TW200428453A (en) * 2003-05-23 2004-12-16 Applied Films Gmbh & Co Kg Magnetron-sputter-cathode

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4324631A (en) * 1979-07-23 1982-04-13 Spin Physics, Inc. Magnetron sputtering of magnetic materials
JPS6088410A (en) * 1983-10-19 1985-05-18 Sanmei Denki Kk Coil assembly of electromagnet and manufacture thereof
JPS60189915A (en) * 1984-03-12 1985-09-27 Fuji Elelctrochem Co Ltd Manufacture of inductor element
JP3064642B2 (en) * 1992-03-12 2000-07-12 三菱電機株式会社 Manufacturing method of coil body
US6501357B2 (en) * 2000-03-16 2002-12-31 Quizix, Inc. Permanent magnet actuator mechanism
TWI245482B (en) * 2000-11-21 2005-12-11 Yaskawa Electric Corp Linear motor
KR20020078618A (en) * 2001-04-06 2002-10-19 이정중 Inductively Coupled Plasma Assisted Sputtering System with Multiple Coils And Method Thereby
KR100422487B1 (en) 2001-12-10 2004-03-11 에이엔 에스 주식회사 Evaporation Apparatus for Manufacturing Organic Electro-Luminescent Display Device using Electromagnet and Evaporation Method using the same
JP5142652B2 (en) * 2007-01-31 2013-02-13 富士通コンポーネント株式会社 Polarized electromagnetic relay and coil assembly
CH698904A2 (en) * 2008-05-27 2009-11-30 Alexander Stoev Water-cooled reactor.
US8461955B2 (en) * 2010-06-22 2013-06-11 Toyota Jidosha Kabushiki Kaisha Reactor and reactor manufacturing method
US9580797B2 (en) 2011-01-24 2017-02-28 Hitachi Metals, Ltd. Magnetic-field-generating apparatus for magnetron sputtering
CN102420091B (en) * 2011-11-24 2014-07-30 中国科学院电工研究所 Composite magnetic control sputtering cathode
CN103779043B (en) * 2012-10-25 2017-09-26 台达电子企业管理(上海)有限公司 Great-power electromagnetic component
JP5980695B2 (en) * 2013-01-18 2016-08-31 株式会社鷺宮製作所 Mold coil, solenoid valve using mold coil, and method for manufacturing mold coil
CN104078203A (en) * 2014-06-06 2014-10-01 上海瑞奇电气设备股份有限公司 Energy-saving and emission-reduction intelligent underground transformer
US20160042854A1 (en) * 2014-08-08 2016-02-11 Hamilton Sundstrand Corporation Heat transfer in magnetic assemblies
JP2017044486A (en) * 2015-08-24 2017-03-02 アイシン精機株式会社 Current sensor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11172431A (en) * 1997-12-10 1999-06-29 Sony Corp Magnetron sputter film formation and device therefor
US20030011254A1 (en) * 2001-07-10 2003-01-16 Canon Kabushiki Kaisha Electromagnetic actuator and exposure apparatus including the same
TW200428453A (en) * 2003-05-23 2004-12-16 Applied Films Gmbh & Co Kg Magnetron-sputter-cathode

Also Published As

Publication number Publication date
CN110100291B (en) 2022-08-30
JP2020530938A (en) 2020-10-29
KR20190014404A (en) 2019-02-12
JP7173973B2 (en) 2022-11-16
KR101965266B1 (en) 2019-04-03
WO2019027133A1 (en) 2019-02-07
TW201910542A (en) 2019-03-16
CN110100291A (en) 2019-08-06

Similar Documents

Publication Publication Date Title
US20200251315A1 (en) Placing table and substrate processing apparatus
TW301839B (en)
EP0046154B1 (en) Apparatus for coating substrates by high-rate cathodic sputtering, as well as sputtering cathode for such apparatus
CN106282948A (en) A kind of film plating process and coating system and the preparation method of rare-earth magnet
US20110220494A1 (en) Methods and apparatus for magnetron metallization for semiconductor fabrication
JP2007250860A (en) Plasma processor and electrode assembly therefor
TWI761564B (en) Manufacturing method of electromagnet assembly
TW202121577A (en) Stage and method for controlling temperature of substrate
JP6480445B2 (en) Encapsulated magnetron
CN110382732A (en) High-throughput vacuum deposition source and system
JP4762187B2 (en) Magnetron sputtering apparatus and method for manufacturing semiconductor device
CN111383885B (en) Substrate mounting table capable of improving temperature control precision and plasma processing equipment
JP2004259829A (en) Plasma treatment device
JP2021523984A (en) Electromagnet in the physical vapor deposition chamber
KR200419108Y1 (en) A Cooling apparatus of ferro-magnetic core for plasma generator
JPH11106914A (en) Counter magnetron composite sputtering device
KR102677883B1 (en) Magnetron with improved target cooling configuration
JP2012516054A (en) Heat chuck with no condensation
JP4698055B2 (en) High frequency magnetron sputtering equipment
KR101385590B1 (en) Apparatus to sputter
US9303312B2 (en) Film deposition apparatus with low plasma damage and low processing temperature
US20190172691A1 (en) Heating carrier device for use on sputtering cathode assembly
JP2008071904A (en) Permanent magnet and manufacturing method of permanent magnet
CN219260171U (en) Magnetron sputtering target cooling system
JP2016136552A (en) Plasma processing apparatus