TWI761298B - Electrodeposited copper foil for printed wiring board and copper clad laminate using the same - Google Patents

Electrodeposited copper foil for printed wiring board and copper clad laminate using the same Download PDF

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TWI761298B
TWI761298B TW110142417A TW110142417A TWI761298B TW I761298 B TWI761298 B TW I761298B TW 110142417 A TW110142417 A TW 110142417A TW 110142417 A TW110142417 A TW 110142417A TW I761298 B TWI761298 B TW I761298B
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copper foil
electrolytic copper
printed wiring
glossy surface
wiring board
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TW202210639A (en
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左近薰
赤嶺尚志
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日商福田金屬箔粉工業股份有限公司
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/04Wires; Strips; Foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0355Metal foils
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Laminated Bodies (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

本發明公開了一種印刷配線板用電解銅箔及使用該電解銅箔的覆銅層壓板,所述印刷配線板用電解銅箔將在鼓狀旋轉陰極表面連續析出而製造的電解銅箔的光澤面作為與絕緣性樹脂基材的黏接面,所述光澤面的TD方向上的入射角60°的鏡面光澤度為220以下,且所述光澤面的TD方向和MD方向上的入射角60°的鏡面光澤度之和為350以上。本發明旨在提供一種熱處理後的延伸率高、具備耐折性,並且粗糙面側的異常突起少的電解銅箔,在該電解銅箔製成覆銅層壓板的情況下,可適用於霧度值(HAZE值)低的撓性印刷配線板。 The invention discloses an electrolytic copper foil for a printed wiring board and a copper-clad laminate using the electrolytic copper foil. The glossy surface serves as the adhesive surface with the insulating resin substrate, the specular glossiness of the glossy surface at an incident angle of 60° in the TD direction is 220 or less, and the glossy surface has an incidence angle of 60° in the TD direction and the MD direction. The sum of the specular gloss of ° is 350 or more. The present invention aims to provide an electrolytic copper foil with high elongation after heat treatment, folding resistance, and less abnormal protrusions on the rough surface side, which can be applied to fogging when the electrolytic copper foil is used as a copper clad laminate. A flexible printed wiring board with a low degree value (HAZE value).

Description

印刷配線板用電解銅箔及使用該電解銅箔的覆銅層壓板 Electrodeposited copper foil for printed wiring board and copper clad laminate using the same

發明領域 Field of Invention

本發明涉及一種用於印刷配線板的電解銅箔,特別是涉及一種可以適用於撓性印刷配線板的電解銅箔。 The present invention relates to an electrolytic copper foil for a printed wiring board, in particular to an electrolytic copper foil that can be applied to a flexible printed wiring board.

發明背景 Background of the Invention

近年來的電子設備的小型輕量化、高功能化顯著,為對應這些要求,廣泛應用可向電子設備內的極小的間隙配置、或可立體配置的撓性印刷配線板,另外,撓性印刷配線板上的電子零件的高密度化也正在進展。 In recent years, electronic equipment has become significantly smaller, lighter, and more functional. In response to these requirements, flexible printed wiring boards that can be placed in an extremely small gap in the electronic equipment or can be placed three-dimensionally are widely used. In addition, flexible printed wiring Densification of electronic parts on the board is also progressing.

作為在撓性印刷配線板上高密度地安裝電子零件的方法之一,可舉出使用各向異性導電膜的方法。該方法是將各向異性導電膜插入印刷電路板和撓性印刷配線板之間,通過用加熱、加壓的方法進行壓裝,得到相對於上下方向的導通的方法。 As one of the methods of mounting electronic components in a high density on a flexible printed wiring board, the method of using an anisotropic conductive film is mentioned. In this method, an anisotropic conductive film is inserted between a printed wiring board and a flexible printed wiring board, and is press-fitted by a method of heating and pressing to obtain conduction in the vertical direction.

為得到上下間的導通,需要將印刷電路板和印刷配線板的位置正確地對位,因此,在印刷電路板和撓性印刷配線板上分別標記定位用標識,一邊用CCD照相機識別這些標識一邊進行對位。 In order to obtain conduction between the upper and lower sides, it is necessary to align the positions of the printed circuit board and the printed wiring board correctly. Therefore, marks for positioning are marked on the printed circuit board and the flexible printed wiring board respectively, and the marks are identified with a CCD camera. Align.

使用CCD照相機的對位是從電路背面進行拍攝, 因此,蝕刻除去銅箔後露出來的絕緣性樹脂基材(以下稱作“樹脂基材”)的透明度低,當模糊時,不能識別標識,不能進行正確的對位。 The alignment using the CCD camera is taken from the back of the circuit, Therefore, the transparency of the insulating resin base material (hereinafter referred to as "resin base material") exposed by etching and removing the copper foil is low, and when it is blurred, the mark cannot be recognized, and accurate positioning cannot be performed.

因此,可以說,露出的樹脂基材的霧度(以下稱作“HAZE”值)最好盡可能低,且為了正確地進行對位,需要HAZE值為80%以下。 Therefore, it can be said that the haze (hereinafter referred to as "HAZE" value) of the exposed resin substrate is preferably as low as possible, and the HAZE value needs to be 80% or less for accurate alignment.

HAZE值受樹脂基材表面的凹凸形狀影響。如果表面的凹凸形狀大,則反射的光散射,透明度降低,所以HAZE值變高。 The HAZE value is affected by the uneven shape of the surface of the resin substrate. When the unevenness of the surface is large, the reflected light is scattered and the transparency is lowered, so that the HAZE value is increased.

樹脂基材表面的凹凸形狀是將銅箔與樹脂基材的黏接面原封不動地複印而成的複製品,因此,如果銅箔的黏接面的凹凸形狀大,則作為複製品的樹脂基材表面的凹凸形狀也大,HAZE值變高。因此,要降低HAZE值,需要減小銅箔黏接面的粗糙度,減小凹凸形狀。另外,如果凹凸形狀小,則鏡面光澤度變高,因此,提高鏡面光澤度也成為降低HAZE值的主要因素。 The concavo-convex shape on the surface of the resin base material is a replica made by copying the adhesive surface of the copper foil and the resin base material as it is. The uneven shape of the surface of the material is also large, and the HAZE value is high. Therefore, in order to reduce the HAZE value, it is necessary to reduce the roughness of the copper foil bonding surface and reduce the uneven shape. In addition, if the concavo-convex shape is small, the specular gloss becomes high, and therefore, increasing the specular gloss is also a major factor for reducing the HAZE value.

使用鼓狀旋轉陰極的電解銅箔,在鼓狀旋轉陰極的周面開始電沉積的面(以下稱作“光澤面”)和電沉積結束面(以下稱作“粗糙面”)形狀不同。 Electrodeposited copper foil using a drum-shaped rotary cathode has a different shape on the peripheral surface of the drum-shaped rotary cathode where electrodeposition starts (hereinafter referred to as "glossy surface") and the electrodeposition finish surface (hereinafter referred to as "rough surface").

粗糙面及光澤面均可以用作與樹脂基材的黏接面,但在使用粗糙面的情況下,為降低HAZE值,需要降低粗糙度。 Both the rough surface and the glossy surface can be used as the bonding surface to the resin substrate, but when the rough surface is used, it is necessary to reduce the roughness in order to reduce the HAZE value.

另外,不論使用粗糙面、光澤面的哪一種面的情況,均需要提高鏡面光澤度。 In addition, it is necessary to improve the specular gloss regardless of whether a rough surface or a glossy surface is used.

在使用鼓狀旋轉陰極製造的電解銅箔中,為了降低粗糙面的粗糙度或提高鏡面光澤度,通常是在電解液中添加各種添加劑,作為添加劑,適宜選定各種水溶性高分子物質、各種表面活性劑、各種有機硫化合物等添加劑。 In order to reduce the roughness of the rough surface or improve the specular gloss of the electrolytic copper foil produced by using the drum-shaped rotating cathode, various additives are usually added to the electrolyte. As the additives, various water-soluble polymer substances, various surface Active agents, various organic sulfur compounds and other additives.

但是,公知的是,當使用作為用於降低粗糙度、或提高鏡面光澤度的添加劑不可缺少的各種有機離子化合物或被稱作整平劑的含氮化合物時,電解銅箔的柔軟性、耐折性會降低。因此,當為了降低HAZE值而添加添加劑進行製造時,有可能不能確保用於撓性印刷配線板的柔軟性、耐折性。 However, it is known that when various organic ionic compounds or nitrogen-containing compounds called levelers, which are indispensable as additives for reducing roughness or improving specular gloss, are used, the flexibility and durability of electrolytic copper foil are improved. Foldability will decrease. Therefore, when an additive is added in order to lower the HAZE value and it is manufactured, there exists a possibility that the flexibility and folding endurance for a flexible printed wiring board cannot be ensured.

在使用鼓狀旋轉陰極製造的電解銅箔中,如果將光澤面作為樹脂基材的黏接面,則即使不添加對柔軟性、耐折性有影響的添加劑,也可以通過鼓狀旋轉陰極表面的拋光來降低光澤面的粗糙度,並且提高鏡面光澤度。 In the electrolytic copper foil produced by using the drum-shaped rotating cathode, if the glossy surface is used as the adhesive surface of the resin substrate, even if no additives that affect the flexibility and folding resistance are added, the surface of the drum-shaped rotating cathode can pass through. polishing to reduce the roughness of the glossy surface and improve the specular gloss.

但是,由於鼓狀旋轉陰極表面的拋光條痕成為電解時產生銅的核的起點,所以如果使拋光條痕變細,則不能充分產生銅的核,而粗糙面側產生大量異常析出(以下稱作“異常突起”)。 However, since the polishing streak on the surface of the drum-shaped rotating cathode serves as the starting point for the generation of copper nuclei during electrolysis, if the polishing streak is made thinner, the copper nucleation cannot be sufficiently generated, and a large amount of abnormal precipitation occurs on the rough surface side (hereinafter referred to as referred to as "abnormal protrusions").

當粗糙面側存在大量異常突起時,會產生以下問題,即:在捲取電解銅箔時產生折痕,因此有時引起外觀不良,有時在粗糙化處理或賦予耐熱性、耐藥品性及防銹力的各種表面處理工序中機械的移動性變差。 When a large number of abnormal protrusions are present on the rough surface side, creases are generated when the electrolytic copper foil is wound up, which may cause poor appearance, and may cause problems in roughening treatment or imparting heat resistance, chemical resistance and chemical resistance. The mobility of the machine in various surface treatment steps of rust-proof power is deteriorated.

另外,會產生以下問題,即:在形成撓性印刷配線板時,在撓性印刷配線板和為了進行表面保護而黏貼的 覆蓋層之間進入氣泡等。 In addition, when forming a flexible printed wiring board, there arises a problem that the flexible printed wiring board and the surface-protected surface are attached. Air bubbles etc. enter between the covering layers.

因此,期望開發一種電解銅箔,其與樹脂基材的黏接面為低粗糙度,鏡面光澤度高,且具備柔軟性、耐折性,另外粗糙面側的異常突起少,外觀及作業效率優異,在製成覆銅層壓板的情況下,可以適當地用於蝕刻後露出的樹脂基材的HAZE值低的撓性印刷配線板。 Therefore, it is desired to develop an electrolytic copper foil which has low roughness on the bonding surface with the resin substrate, high specular gloss, flexibility and folding resistance, and less abnormal protrusions on the rough surface side, appearance and work efficiency It is excellent, and when used as a copper-clad laminate, it can be suitably used for a flexible printed wiring board having a low HAZE value of a resin base material exposed after etching.

現有技術文獻 prior art literature

專利文獻 Patent Literature

專利文獻1:日本特開2008-118163 Patent Document 1: Japanese Patent Laid-Open No. 2008-118163

專利文獻1中公開了一種用於撓性印刷配線板的電解銅箔,其與絕緣層的黏接面為光澤面,該光澤面的入射角60°下的鏡面光澤度為250以上,且露出的絕緣層的光透射率高。 Patent Document 1 discloses an electrolytic copper foil for a flexible printed wiring board, wherein the adhesive surface with the insulating layer is a glossy surface, the glossiness of the glossy surface at an incident angle of 60° is 250 or more, and the exposed surface is exposed. The light transmittance of the insulating layer is high.

但是,不足之處是,在專利文獻1中公開的電解銅箔中,為了避免光澤面的鏡面光澤度降低,使用以盡可能不產生拋光條痕的方式進行了拋光的鼓狀旋轉陰極進行析出,因此,存在電解時的銅的核產生不充分,粗糙面側產生大量異常突起的問題。 However, the disadvantage is that, in the electrolytic copper foil disclosed in Patent Document 1, in order to avoid a drop in the specular gloss of the glossy surface, the precipitation is carried out using a drum-shaped rotating cathode that has been polished so as not to generate polishing streaks as much as possible. Therefore, there is a problem that the nucleation of copper during electrolysis is insufficient, and a large number of abnormal protrusions are generated on the rough surface side.

發明概要 Summary of Invention

本發明人等將解決上述諸問題點作為技術課題,反復進行了摸索性的大量試製和實驗,結果得到如下令人注目的見解,達成了上述技術性課題。本發明克服了現有 技術中的不足,提供了一種電解銅箔。如果使用鼓狀旋轉陰極製成光澤面的所述鼓寬度方向(以下稱作“TD方向”)上之入射角60°的鏡面光澤度為220以下,且所述光澤面的TD方向和沿著鼓周面的長度方向(以下稱作“MD方向”)的入射角60°的鏡面光澤度之和為350以上的電解銅箔,則即使不添加添加劑,也可以成為低粗糙度且鏡面光澤度高的光澤面,粗糙面側的異常突起非常少的電解銅箔,另外,如果製成覆銅層壓板,則蝕刻除去後的露出的樹脂基材的HAZE值變低。 The inventors of the present invention made the solution of the above-mentioned problems as a technical problem, and as a result of repeated exploratory trial production and experiments, the following remarkable findings were obtained, and the above-mentioned technical problem was achieved. The present invention overcomes the existing For the deficiencies in the technology, an electrolytic copper foil is provided. If the specular glossiness at an incident angle of 60° in the drum width direction (hereinafter referred to as "TD direction") of the glossy surface is 220 or less using a drum-shaped rotating cathode, and the TD direction of the glossy surface and along the Electrodeposited copper foil with a sum of specular gloss at an incident angle of 60° in the longitudinal direction of the drum peripheral surface (hereinafter referred to as "MD direction") of 350 or more can have low roughness and specular gloss even without adding additives A high glossy surface, an electrolytic copper foil with very few abnormal protrusions on the rough surface side, and a copper clad laminate, the HAZE value of the exposed resin base material after etching removal becomes low.

為解決上述技術問題,本發明是通過以下技術方案實現的。 In order to solve the above technical problems, the present invention is achieved through the following technical solutions.

本發明提供一種印刷配線板用電解銅箔,將在鼓狀旋轉陰極表面連續析出而製造的電解銅箔的光澤面作為與絕緣性樹脂基材的黏接面,其中,所述光澤面之TD方向上的入射角60°的鏡面光澤度為220以下,且所述光澤面的TD方向和MD方向上的入射角60°的鏡面光澤度之和為350以上(第一方面)。 The present invention provides an electrolytic copper foil for a printed wiring board, wherein the glossy surface of the electrolytic copper foil produced by continuous precipitation on the surface of a drum-shaped rotating cathode is used as a bonding surface with an insulating resin substrate, wherein the TD of the glossy surface is The specular gloss at an incident angle of 60° in the direction is 220 or less, and the sum of the specular gloss at an incident angle of 60° in the TD and MD directions of the glossy surface is 350 or more (first aspect).

另外,本發明還可以:根據第一方面所述的印刷配線板用電解銅箔,其中,所述電解銅箔光澤面的表面粗糙度Rzjis94為1.5μm以下(第二方面)。 In addition, the present invention may include the electrolytic copper foil for a printed wiring board according to the first aspect, wherein the surface roughness Rzjis94 of the glossy surface of the electrolytic copper foil is 1.5 μm or less (second aspect).

另外,本發明提供了一種處理銅箔,在第一或第二方面的印刷配線板用電解銅箔光澤面設置1或2以上的處理層(第三方面)。 Further, the present invention provides a treated copper foil in which 1 or 2 or more treated layers are provided on the glossy surface of the electrolytic copper foil for a printed wiring board of the first or second aspect (third aspect).

另外,本發明提供了一種覆銅層壓板,將第一~ 第三方面中任一項所述的銅箔黏在絕緣性樹脂基材上而形成(第四方面)。 In addition, the present invention provides a copper clad laminate, which combines the first to The copper foil according to any one of the third aspects is formed by being attached to an insulating resin substrate (a fourth aspect).

另外,本發明還可以:根據第四或第五方面所述的覆銅層壓板,其中,HAZE值為80%以下。 In addition, the present invention may further include: the copper clad laminate according to the fourth or fifth aspect, wherein the HAZE value is 80% or less.

另外,本發明提供一種印刷配線板,其使用第四或第五方面所述的覆銅層壓板形成。 Further, the present invention provides a printed wiring board formed using the copper clad laminate according to the fourth or fifth aspect.

與現有技術相比,本發明的有益效果是:根據本發明,由於使用拋光成低粗糙度的鼓狀旋轉陰極,且電解銅箔光澤面側之TD方向上的入射角60°的鏡面光澤度為220以下,且TD方向和MD方向上的入射角60°的鏡面光澤度之和為350以上,所以可以抑制粗糙面側的異常突起的產生,抑制在析出的銅箔的捲取時產生的侵蝕,因此,成為外觀優異的電解銅箔,在製成覆銅層壓板的情況下,HAZE值為80%以下。 Compared with the prior art, the beneficial effects of the present invention are: according to the present invention, due to the use of a drum-shaped rotating cathode polished to a low roughness, and the specular glossiness of the incident angle in the TD direction of the glossy surface side of the electrolytic copper foil is 60° It is 220 or less, and the sum of the specular glossiness at an incident angle of 60° in the TD direction and the MD direction is 350 or more, so the occurrence of abnormal protrusions on the rough surface side can be suppressed, and the generation of the deposited copper foil can be suppressed. Erosion, therefore, it becomes an electrolytic copper foil excellent in appearance, and when used as a copper-clad laminate, the HAZE value is 80% or less.

另外,即使電解液不使用對柔軟性、耐折性有影響的添加劑,也能夠成為低粗糙度且具有鏡面光澤度高的光澤面的電解銅箔,因此,成為可以維持熱處理後的延伸率或耐折率較高,可以適當地應用於撓性印刷配線板的電解銅箔。 In addition, even if additives that affect flexibility and folding endurance are not used in the electrolyte solution, it is possible to obtain an electrolytic copper foil with low roughness and a glossy surface with high specular gloss, so that the elongation after heat treatment can be maintained or It has a high bending resistance and can be suitably applied to the electrolytic copper foil of a flexible printed wiring board.

另外,由於粗糙面側的異常突起非常少,所以各種表面處理工序中的機械的移動性良好,另外,在進行與保護片等的黏貼時,氣泡難以進入,因此,成為作業效率優異的電解銅箔。 In addition, since there are very few abnormal protrusions on the rough surface side, mechanical mobility in various surface treatment steps is good, and air bubbles are difficult to enter when bonding with a protective sheet, etc., so it is an electrolytic copper with excellent work efficiency. foil.

圖1是表示本發明的實施例及比較例的粗糙面側3μm以上的異常突起的圖。 FIG. 1 is a view showing abnormal protrusions of 3 μm or more on the rough surface side of Examples and Comparative Examples of the present invention.

具體實施方式 Detailed ways

下面參照附圖與具體實施方式對本發明作進一步詳細說明。本發明的電解銅箔通過將鼓狀旋轉陰極浸漬於硫酸-硫酸銅水溶液中,使用不溶性陽極使銅在鼓狀旋轉陰極上析出,連續地剝離並捲取的方法進行製造。 The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. The electrolytic copper foil of the present invention is produced by immersing a drum-shaped rotating cathode in an aqueous sulfuric acid-copper sulfate solution, precipitating copper on the drum-shaped rotating cathode using an insoluble anode, and continuously peeling and winding it up.

鼓狀旋轉陰極沒有特別限定,但優選使用鈦製鼓狀旋轉陰極。 The drum-shaped rotating cathode is not particularly limited, but a titanium-made drum-shaped rotating cathode is preferably used.

鼓狀旋轉陰極的拋光優選使用在尼龍無紡布等上均勻地黏接含浸了氧化鋁、碳化矽等拋光磨粒的圓筒型拋光輪。 For the polishing of the drum-shaped rotating cathode, it is preferable to use a cylindrical polishing wheel impregnated with polishing abrasive grains such as alumina and silicon carbide uniformly bonded to a nylon non-woven fabric or the like.

圓筒型拋光輪可以適當地使用1200號、1500號(吳砂輪股份有限公司(Kure Grinding Wheel Co.,Ltd.)製)。 As the cylindrical buffing wheel, No. 1200 and No. 1500 (manufactured by Kure Grinding Wheel Co., Ltd.) can be appropriately used.

在進行拋光時,一邊使旋轉陰極旋轉,一邊使圓筒型拋光輪旋轉,使鼓狀旋轉陰極達到所希望的粗糙度。 During polishing, while rotating the rotating cathode, the cylindrical buffing wheel is rotated so that the drum-shaped rotating cathode has a desired roughness.

為使入射角60°下的鏡面光澤度在TD方向為220以下,且在TD方向與MD方向之和為350以上,優選旋轉陰極的旋轉速度為60~200mm/sec.,圓筒型拋光輪的轉速為250~600圈/min.,振幅為20~25mm。 In order to make the specular gloss under the incident angle of 60° be 220 or less in the TD direction, and the sum of the TD direction and the MD direction is 350 or more, the rotation speed of the rotating cathode is preferably 60~200mm/sec. The rotational speed is 250~600 revolutions/min., and the amplitude is 20~25mm.

在本發明中,為了使鼓狀旋轉陰極表面的粗糙度達到電解銅箔與樹脂基材的黏接面的粗糙度,優選將鼓狀 旋轉陰極的粗糙度Rzjis94設定為1.5μm以下,更優選1.3μm以下。 In the present invention, in order to make the surface roughness of the drum-shaped rotating cathode equal to the roughness of the bonding surface of the electrolytic copper foil and the resin base material, it is preferable that the drum-shaped rotating cathode be The roughness Rzjis94 of the rotating cathode is set to 1.5 μm or less, more preferably 1.3 μm or less.

如果電解銅箔的Rzjis94大於1.5μm,則通過蝕刻而露出的樹脂基材的HAZE值有可能超過80%。 When the Rzjis94 of the electrolytic copper foil is larger than 1.5 μm, the HAZE value of the resin base material exposed by etching may exceed 80%.

優選電解條件為:電流密度30~60A/dm2、液溫35~45℃。 The preferred electrolysis conditions are: current density of 30-60 A/dm 2 and liquid temperature of 35-45°C.

不溶性陽極沒有特別限定,但可以適當地使用由鉑族元素或其氧化物元素包覆的鈦板。 The insoluble anode is not particularly limited, but a titanium plate coated with a platinum group element or an oxide element thereof can be appropriately used.

在電解液中,只要是不會使電解銅箔的熱處理後的延伸率及耐折率降低的添加物就可以添加,作為可添加的添加物,可以例示氯、水溶性高分子等。 In the electrolytic solution, any additives may be added as long as they do not reduce the elongation and bending resistance after the heat treatment of the electrolytic copper foil. Examples of additives that can be added include chlorine, water-soluble polymers, and the like.

電解銅箔的厚度優選9μm~18μm。因為如果比18μm厚,則不能用於撓性印刷板,如果比9μm薄,則容易產生針孔,因此均不優選。 The thickness of the electrolytic copper foil is preferably 9 μm to 18 μm. If it is thicker than 18 μm, it cannot be used for a flexible printed board, and if it is thinner than 9 μm, pinholes are likely to be generated, so both are not preferable.

在本發明的電解銅箔上,在不影響製作覆銅層壓板時的HAZE值的範圍內,根據需要可以設置各種處理層。 On the electrolytic copper foil of the present invention, various treatment layers can be provided as necessary within a range that does not affect the HAZE value at the time of producing a copper-clad laminate.

實施例 Example

以下示出本發明的實施例,但本發明不限於此。 Examples of the present invention are shown below, but the present invention is not limited thereto.

<實施例1> <Example 1>

使用鈦製的鼓狀旋轉陰極,且使用以碳化矽為磨粒的1500號(吳砂輪股份有限公司製,以下相同)的圓筒型拋光輪進行精拋光,使該陰極的表面粗糙度Rzjis94成為1.5μm以下。 A drum-shaped rotating cathode made of titanium was used, and a cylindrical polishing wheel of No. 1500 (manufactured by Kure Grinding Wheel Co., Ltd., the same below) using silicon carbide as abrasive grains was used for fine polishing, so that the surface roughness of the cathode was Rzjis94. 1.5μm or less.

之後,按照表1的條件製造厚度12μm的電解銅箔。 Then, according to the conditions of Table 1, the electrolytic copper foil of thickness 12 micrometers was manufactured.

〔表1〕

Figure 110142417-A0101-12-0009-1
〔Table 1〕
Figure 110142417-A0101-12-0009-1

<實施例2及3> <Examples 2 and 3>

鈦製的鼓狀旋轉陰極使用以碳化矽為磨粒的1200號的圓筒型拋光輪進行精拋光,使該陰極的表面粗糙度Rzjis94成為1.5μm以下。 The titanium drum-shaped rotating cathode was finely polished using a 1200-size cylindrical polishing wheel using silicon carbide as abrasive grains so that the surface roughness Rzjis94 of the cathode was 1.5 μm or less.

之後,按照表1的條件製造厚度12μm的電解銅箔。 Then, according to the conditions of Table 1, the electrolytic copper foil of thickness 12 micrometers was manufactured.

<比較例1> <Comparative Example 1>

鈦製的鼓狀旋轉陰極使用以碳化矽為磨粒的2000號的圓筒型拋光輪進行精拋光,使該陰極的表面粗糙度Rzjis94成為1.5μm以下。 The titanium drum-shaped rotating cathode was finely polished using a 2000-size cylindrical polishing wheel using silicon carbide as abrasive grains so that the surface roughness Rzjis94 of the cathode was 1.5 μm or less.

之後,按照表1的條件製造厚度12μm的電解銅箔。 Then, according to the conditions of Table 1, the electrolytic copper foil of thickness 12 micrometers was manufactured.

<比較例2> <Comparative Example 2>

鈦製的鼓狀旋轉陰極使用以碳化矽為磨粒的1200號的圓筒型拋光輪實施拋光,再使用2000號的片狀拋光墊實施拋光,且進行精拋光,使該陰極的表面粗糙度Rzjis94成為1.5μm以下。 The titanium drum-shaped rotating cathode is polished with a 1200-gauge cylindrical polishing wheel using silicon carbide as abrasive grains, and then polished with a 2000-gauge sheet polishing pad, and finely polished to make the surface roughness of the cathode. Rzjis94 becomes 1.5 μm or less.

之後,按照表1的條件製造厚度12μm的電解銅箔。 Then, according to the conditions of Table 1, the electrolytic copper foil of thickness 12 micrometers was manufactured.

<比較例3> <Comparative Example 3>

鈦製的鼓狀旋轉陰極使用以碳化矽為磨粒的1000號 的圓筒型拋光輪進行精拋光,使該陰極的表面粗糙度Rzjis94成為1.5μm以下。 Titanium drum-shaped rotating cathode uses 1000 No. 1000 silicon carbide abrasive particles The cylindrical buffing wheel was finely polished so that the surface roughness Rzjis94 of the cathode was 1.5 μm or less.

之後,按照表1的條件製造厚度12μm的電解銅箔。 Then, according to the conditions of Table 1, the electrolytic copper foil of thickness 12 micrometers was manufactured.

<比較例4> <Comparative Example 4>

鈦製的鼓狀旋轉陰極使用以碳化矽為磨粒的1500號的圓筒型拋光輪進行精拋光,使該陰極的表面粗糙度Rzjis94大於1.5μm。 The drum-shaped rotating cathode made of titanium was finely polished with a cylindrical polishing wheel of No. 1500 with silicon carbide as abrasive grains, so that the surface roughness Rzjis94 of the cathode was greater than 1.5 μm.

之後,按照表1的條件製造厚度12μm的電解銅箔。 Then, according to the conditions of Table 1, the electrolytic copper foil of thickness 12 micrometers was manufactured.

<比較例5> <Comparative Example 5>

使用比較例4中使用的鈦製鼓狀旋轉陰極,在五水硫酸銅280g/L、硫酸80g/L的電解液中,添加聚乙二醇(分子量為20,000)20mg/L、聚乙烯亞胺衍生物(商品名:Epomin<註冊商標>PP-061:重量平均分子量1200:日本觸媒股份有限公司製)20.0mg/L、3-巰基-1-丙烷磺酸鈉6.0μmol/L、氯離子20mg/L,在電流密度40A/dm2、液溫40℃下進行電解,製造厚度12μm的電解銅箔。 Using the titanium drum-shaped rotating cathode used in Comparative Example 4, to the electrolyte solution of 280 g/L of copper sulfate pentahydrate and 80 g/L of sulfuric acid, 20 mg/L of polyethylene glycol (molecular weight: 20,000) and polyethylene imine were added. Derivative (trade name: Epomin <registered trademark> PP-061: weight average molecular weight 1200: manufactured by Nippon Shokubai Co., Ltd.) 20.0 mg/L, sodium 3-mercapto-1-propanesulfonate 6.0 μmol/L, chloride ion 20 mg/L, electrolysis was performed at a current density of 40 A/dm 2 and a liquid temperature of 40° C. to produce an electrolytic copper foil with a thickness of 12 μm.

製造的各電解銅箔通過以下的方法進行測定。 Each produced electrolytic copper foil was measured by the following method.

〔粗糙度〕 [Roughness]

基於JISB0601,使用Surfcorder SE1700α(小阪研究所股份有限公司製)測定實施例1~3及比較例1~4中得到的各電解銅箔的光澤面和比較例5中得到的電解銅箔之粗糙面的表面粗糙度Rzjis94。 Based on JISB0601, the glossy surface of each electrolytic copper foil obtained in Examples 1 to 3 and Comparative Examples 1 to 4 and the rough surface of the electrolytic copper foil obtained in Comparative Example 5 were measured using Surfcorder SE1700α (manufactured by Kosaka Laboratory Co., Ltd.). The surface roughness Rzjis94.

〔鏡面光澤度〕 [Specular gloss]

對於實施例1~3及比較例1~4中得到的各電解銅箔 的光澤面和比較例5中得到的電解銅箔的粗糙面的鏡面光澤度,基於JISZ8741,使用光澤計GM-268(柯尼卡美能達股份有限公司製),在TD方向和MD方向這兩個方向測定入射角60°的鏡面光澤度(Gs(60°))。 For each of the electrolytic copper foils obtained in Examples 1 to 3 and Comparative Examples 1 to 4 The specular glossiness of the glossy surface and the rough surface of the electrolytic copper foil obtained in Comparative Example 5 was based on JISZ8741, using a gloss meter GM-268 (manufactured by Konica Minolta Co., Ltd.), in both the TD direction and the MD direction. Specular gloss (Gs(60°)) at an incident angle of 60° was measured in each direction.

〔熱處理後的延伸率〕 [Elongation after heat treatment]

將實施例1~3及比較例1~5中得到的各電解銅箔在200度下保持10分鐘後,基於IPC-TM-650,使用IM20型拉伸試驗機(INTESCO Co.,Ltd.製)測定25℃下的延伸率。 After holding each of the electrolytic copper foils obtained in Examples 1 to 3 and Comparative Examples 1 to 5 at 200 degrees for 10 minutes, an IM20 type tensile tester (manufactured by INTESCO Co., Ltd.) was used based on IPC-TM-650. ) to measure the elongation at 25°C.

〔彎折次數〕 [Number of bends]

從實施例1~3及比較例1~5中得到的各電解銅箔分別切出寬度方向1/2inch、長度方向2cm的試驗片,在200℃下保持10分鐘後,以將粗糙面側作為內側並使其與長度方向垂直的方式對折,在折彎部放上負荷2kg保持10秒鐘,將折彎的試驗片打開並放上負荷將其展平後,再次進行折彎,測定直至試驗片完全斷裂的次數。 From each of the electrolytic copper foils obtained in Examples 1 to 3 and Comparative Examples 1 to 5, test pieces of 1/2 inch in the width direction and 2 cm in the longitudinal direction were cut out and held at 200° C. for 10 minutes, and the rough surface side was used as the The inside is folded in half so that it is perpendicular to the longitudinal direction, and a load of 2 kg is placed on the folded part and held for 10 seconds. The number of times the sheet breaks completely.

〔HAZE值〕 [HAZE value]

將實施例1~3及比較例1~5中得到的各電解銅箔作為陰極,將銅板作為陽極,將五水硫酸銅40g/L、乙二胺四乙酸四鈉100g/L的電解液調製成pH 5.5後,在液溫35℃、電流密度2A/dm2、25秒的電解條件下實施粗糙化處理。 Each electrolytic copper foil obtained in Examples 1 to 3 and Comparative Examples 1 to 5 was used as a cathode, and a copper plate was used as an anode, and an electrolyte solution of 40 g/L of copper sulfate pentahydrate and 100 g/L of tetrasodium EDTA was prepared. After reaching pH 5.5, roughening treatment was performed under the electrolytic conditions of liquid temperature 35° C., current density 2 A/dm 2 , and 25 seconds.

此外,實施例1~3及比較例1~4在光澤面側實施粗糙化處理,比較例5在粗糙面側實施粗糙化處理。 In addition, Examples 1 to 3 and Comparative Examples 1 to 4 were subjected to roughening treatment on the glossy surface side, and Comparative Example 5 was subjected to roughening treatment on the rough surface side.

實施粗糙化處理後,進行5秒鐘水洗。接著,將 該電解銅箔作為陰極,將鉑作為陽極,將重鉻酸鈉二水合物10g/L的電解液調製成pH 4.5,在液溫32℃、電流密度0.5A/dm2下電解2秒鐘,進行鉻酸鹽光澤處理。實施鉻酸鹽光澤處理是為了防止電解銅箔氧化。 After roughening treatment, washing with water was performed for 5 seconds. Next, using the electrolytic copper foil as a cathode and platinum as an anode, an electrolyte solution of 10 g/L of sodium dichromate dihydrate was adjusted to pH 4.5, and electrolyzed at a liquid temperature of 32° C. and a current density of 0.5 A/dm 2 for 2 seconds for a chromated gloss finish. The chromate gloss treatment is carried out to prevent oxidation of the electrolytic copper foil.

此外,各種表面處理對HAZE值沒有影響。 In addition, various surface treatments had no effect on the HAZE value.

將進行了鉻酸鹽光澤處理的電解銅箔進行5秒鐘水洗後,自然乾燥,得到表面處理銅箔。使用得到的表面處理銅箔和聚醯亞胺PIXEO BP<註冊商標>(鐘淵化學公司(Kaneka Corporation)製)成形雙面兩層覆銅層壓板,將雙面的電解銅箔蝕刻後,使用HAZE METER NDH7000(日本電色工業股份有限公司製),基於JIS K 7136測定HAZE值。 After washing with water for 5 seconds, the electrolytic copper foil subjected to the chromate gloss treatment was naturally dried to obtain a surface-treated copper foil. Using the obtained surface-treated copper foil and polyimide PIXEO BP <registered trademark> (manufactured by Kaneka Corporation), a double-sided two-layer copper-clad laminate was formed, and the double-sided electrolytic copper foil was etched, and then used HAZE METER NDH7000 (manufactured by Nippon Denshoku Kogyo Co., Ltd.), the HAZE value was measured based on JIS K 7136.

表2中示出各測定結果。 Table 2 shows each measurement result.

〔表2〕

Figure 110142417-A0101-12-0012-2
〔Table 2〕
Figure 110142417-A0101-12-0012-2

〔粗糙面側突起數〕 [Number of protrusions on the rough side]

利用彩色3D雷射顯微鏡VK-9700(基恩士股份有限公司(Keyence Corporation)製)測定電解銅箔粗糙面的高度。將在211.692μm×282.348μm的範圍得到的高度圖像進行2 值化處理,用3.0μm~0.5μm刻度設定閾值,並對各自大小的突起數進行計數。樣品數為3。 The height of the rough surface of the electrolytic copper foil was measured with a color 3D laser microscope VK-9700 (manufactured by Keyence Corporation). The height image obtained in the range of 211.692 μm × 282.348 μm For the quantification process, a threshold value was set in a scale of 3.0 μm to 0.5 μm, and the number of protrusions of each size was counted. The number of samples is 3.

表3示出各例的突起數。另外,圖1示出實施例1及比較例1的2值化處理後的圖。 Table 3 shows the number of protrusions in each example. In addition, FIG. 1 shows the figures after the binarization processing of Example 1 and Comparative Example 1. As shown in FIG.

〔表3〕

Figure 110142417-A0101-12-0013-3
〔table 3〕
Figure 110142417-A0101-12-0013-3

根據表2及表3可確認:本發明的電解銅箔熱處理後的延伸率高,耐折率高,具有柔軟性,另外,粗糙面側的異常突起非常少,且在製成覆銅層壓板的情況下,蝕刻後露出的樹脂基材的HAZE值為80%以下。 From Table 2 and Table 3, it was confirmed that the electrolytic copper foil of the present invention has high elongation after heat treatment, high bending resistance, flexibility, and very few abnormal protrusions on the rough surface side, and can be used as a copper clad laminate. In the case of , the HAZE value of the resin substrate exposed after etching is 80% or less.

產業上的可利用性 Industrial Availability

本發明的電解銅箔熱處理後的延伸率及耐折率高,具有柔軟性,而且是粗糙面側的異常突起非常少的電解銅箔,在製成覆銅層壓板的情況下,蝕刻後露出的樹脂基材的HAZE值低,因此,是可以適當地用於撓性印刷配線板的電解銅箔。 The electrolytic copper foil of the present invention has high elongation and bending resistance after heat treatment, has flexibility, and is an electrolytic copper foil with very few abnormal protrusions on the rough surface side. The HAZE value of the resin base material is low, so it is an electrolytic copper foil that can be suitably used for flexible printed wiring boards.

因此,本發明是產業上的可利用性高的發明。 Therefore, the present invention is an invention with high industrial applicability.

Claims (8)

一種印刷配線板用電解銅箔之處理銅箔,係在鼓狀旋轉陰極表面連續析出而製造的印刷配線板用電解銅箔其光澤面上設置1或2以上的處理層者;其中,前述處理層至少包含粗糙化處理層;前述光澤面之TD方向上之入射角60°的鏡面光澤度為220以下,且前述光澤面之TD方向和MD方向上之入射角60°的鏡面光澤度之和為350以上;設有前述處理層之光澤面係與絕緣性樹脂基材的黏接面。 A treated copper foil of electrolytic copper foil for printed wiring boards, wherein one or more treated layers are provided on the glossy surface of electrolytic copper foil for printed wiring boards produced by continuous precipitation on the surface of a drum-shaped rotating cathode; wherein the aforementioned treatment The layer contains at least a roughening treatment layer; the specular gloss of the aforementioned glossy surface with an incident angle of 60° in the TD direction is 220 or less, and the sum of the specular gloss of the aforementioned glossy surface with an incidence angle of 60° in the TD and MD directions 350 or more; the glossy surface provided with the above-mentioned treatment layer is the bonding surface with the insulating resin substrate. 如請求項1之印刷配線板用電解銅箔之處理銅箔,其中,厚度9μm以上且18μm以下之前述印刷配線板用電解銅箔在200℃下加熱10分鐘後的延伸率為21.6%以上。 The treated copper foil of the electrolytic copper foil for a printed wiring board according to claim 1, wherein the electrolytic copper foil for a printed wiring board having a thickness of 9 μm or more and 18 μm or less has an elongation of 21.6% or more after heating at 200° C. for 10 minutes. 如請求項1之印刷配線板用電解銅箔之處理銅箔,其中,前述印刷配線板用電解銅箔粗糙面不存在6.0μm以上的突起。 The processed copper foil of the electrolytic copper foil for printed wiring boards according to claim 1, wherein the rough surface of the electrolytic copper foil for printed wiring boards has no protrusions of 6.0 μm or more. 如請求項1所述之印刷配線板用電解銅箔之處理銅箔,其中,前述光澤面的表面粗糙度RzJIS94為1.5μm以下。 The treated copper foil of the electrolytic copper foil for printed wiring boards according to claim 1, wherein the surface roughness Rz JIS94 of the glossy surface is 1.5 μm or less. 一種覆銅層壓板,其係在請求項1之印刷配線板用電解銅箔之設有前述處理層之光澤面上黏貼絕緣性樹脂基材而形成。 A copper-clad laminate formed by adhering an insulating resin base material to the glossy surface of the electrolytic copper foil for a printed wiring board of claim 1 on which the treatment layer is provided. 一種覆銅層壓板,其係將電解銅箔與絕緣性樹脂基材黏貼而成者,前述電解銅箔係在鼓狀旋轉陰極表面連續析出而製造;前述電解銅箔的光澤面之TD方向上之入射 角60°的鏡面光澤度為220以下,且前述光澤面之TD方向和MD方向上之入射角60°的鏡面光澤度之和為350以上;該覆銅層壓板係在前述光澤面上黏貼前述絕緣性樹脂基材而成。 A copper clad laminate, which is formed by pasting an electrolytic copper foil and an insulating resin base material, the electrolytic copper foil is produced by continuous precipitation on the surface of a drum-shaped rotating cathode; the TD direction of the glossy surface of the electrolytic copper foil is the incident The specular gloss at an angle of 60° is less than 220, and the sum of the specular gloss at an incident angle of 60° in the TD direction and the MD direction of the aforementioned glossy surface is more than 350; the copper clad laminate is attached to the aforementioned glossy surface. Made of insulating resin base. 如請求項6所述之覆銅層壓板,其中,霧度值(HAZE值)為80%以下。 The copper clad laminate according to claim 6, wherein the haze value (HAZE value) is 80% or less. 一種印刷配線板,其係使用請求項6所述之覆銅層壓板來形成。 A printed wiring board formed using the copper clad laminate described in claim 6.
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Publication number Priority date Publication date Assignee Title
JP7169149B2 (en) * 2017-10-20 2022-11-10 住友化学株式会社 Separator for non-aqueous electrolyte secondary battery
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200641186A (en) * 2005-03-31 2006-12-01 Mitsui Mining & Smelting Co Electrolytic copper foil and process for producing electrolytic copper foil, surface treated elctrolytic copper foil using said electrolytic copper foil, and copper-clad laminate plate and printed wiring board using said surface treated electrolytic
CN1788111B (en) * 2003-05-14 2010-10-06 福田金属箔粉工业株式会社 Low surface roughness electrolytic copper foil and process for producing the same
TW201410923A (en) * 2012-08-17 2014-03-16 Jx Nippon Mining & Metals Corp Electrolytic copper foil

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4789438A (en) * 1987-06-23 1988-12-06 Olin Corporation Cathode surface treatment for electroforming metallic foil or strip
JP2990676B2 (en) * 1987-06-23 1999-12-13 グールド エレクトロニクス インコーポレイテッド Cathode surface treatment for electroforming metal foil or strip
JP3434072B2 (en) * 1995-03-09 2003-08-04 福田金属箔粉工業株式会社 Manufacturing method of electrolytic copper foil
JP4295800B2 (en) * 2002-05-13 2009-07-15 三井金属鉱業株式会社 Electrolytic copper foil
WO2003096776A1 (en) * 2002-05-13 2003-11-20 Mitsui Mining & Smelting Co.,Ltd. Flexible printed wiring board for chip-on-film
TWI298988B (en) * 2002-07-19 2008-07-11 Ube Industries Copper-clad laminate
JP2004098659A (en) * 2002-07-19 2004-04-02 Ube Ind Ltd Copper-clad laminate and its manufacturing process
JP4065004B2 (en) * 2005-03-31 2008-03-19 三井金属鉱業株式会社 Electrolytic copper foil, surface-treated electrolytic copper foil obtained using the electrolytic copper foil, copper-clad laminate and printed wiring board using the surface-treated electrolytic copper foil
TWI539033B (en) * 2013-01-07 2016-06-21 Chang Chun Petrochemical Co Electrolytic copper foil and its preparation method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1788111B (en) * 2003-05-14 2010-10-06 福田金属箔粉工业株式会社 Low surface roughness electrolytic copper foil and process for producing the same
TW200641186A (en) * 2005-03-31 2006-12-01 Mitsui Mining & Smelting Co Electrolytic copper foil and process for producing electrolytic copper foil, surface treated elctrolytic copper foil using said electrolytic copper foil, and copper-clad laminate plate and printed wiring board using said surface treated electrolytic
TW201410923A (en) * 2012-08-17 2014-03-16 Jx Nippon Mining & Metals Corp Electrolytic copper foil

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