TWI757907B - A cluster real-time online process and analysis transmission system in a vacuum environment - Google Patents

Abstract

A cluster type real-time online process and analysis transmission system in a vacuum environment, comprising cluster type vacuum equipment, having various sub-vacuum chambers and including several process processing chambers, sample preparation chambers and sample analysis chambers; and a mechanical transmission module, There is a substrate transfer robot arm and a processing chamber capable of transferring samples. Various sub-vacuum chamber systems surround the mechanical transfer module. Some of the process processing chambers and the sample analysis chamber are equipped with optical components for real-time measurement. , the sample can be transferred by the substrate transfer robot and introduced into the standby state of the wafers in the respective process chambers for alignment, so that the sample can be picked up and placed in a single vacuum environment through the mechanical transfer module It can perform PVD, CVD, plasma surface treatment and real-time analysis in various sub-vacuum chambers. At the same time, it can perform real-time inspection of material properties in some sub-vacuum chambers, so that material surface treatment, component coating process and inspection and analysis can be performed in a single Completed in a vacuum environment, it can reduce the probability of sample contamination in multi-stage processes, and can perform real-time detection, thereby effectively improving yield and reducing costs.

Description

A cluster real-time online process and analysis transmission system in a vacuum environment

The present invention relates to a cluster real-time online manufacturing process and analysis in a vacuum environment The transfer system, especially refers to a mechanical transfer module of a cluster vacuum equipment used for manufacturing semiconductor devices to perform sample transfer and real-time analysis in vacuum, especially refers to a single low-pollution process and analysis in vacuum.

In order to carry out a multi-stage process in the current material process, a single process cavity is often used. Therefore, the sample is often exposed to the atmosphere during transfer. However, it is easy to cause oxidation or impurity adsorption on the surface of the sample to form an oxide layer. Especially in advanced manufacturing processes, this will increase the leakage current of the device, thereby reducing the chip performance. Therefore, ordinary users cannot meet the needs of users in actual use.

The main purpose of the present invention is to overcome the above-mentioned problems encountered in the prior art and to improve For a cluster vacuum equipment to transfer the sample substrate to the sub-vacuum chambers of each process in a single vacuum environment for material surface treatment, component coating process and detection analysis, it can reduce the contamination of the sample in the multi-stage process It is one of the cluster real-time online process and analysis transmission systems in a vacuum environment that can effectively improve yield and reduce costs.

In order to achieve the above purpose, the present invention is a cluster type real-time online manufacturing in a vacuum environment. The process and analysis transmission system includes: a cluster vacuum equipment with various sub-vacuum chambers, including several process chambers, a sample preparation chamber, and a sample analysis chamber, wherein the several process chambers are respectively Plasma surface treatment chamber, vacuum PVD process chamber, and CVD process treatment and real-time analysis chamber; and a mechanical transfer module, which is provided with a substrate transfer robot arm capable of transferring samples and a processing chamber, various sub-vacuum chambers The system surrounds the mechanical transfer module, and some of the process chambers and the sample analysis chamber are equipped with optical components for real-time measurement, so that samples can be transferred to the respective processes by the substrate transfer robotic arm. The stand-by state of the wafer in the processing chamber is used to perform alignment, so that the sample can be picked up and placed in a single vacuum environment through the mechanical transfer module to various sub-vacuum chambers for PVD, CVD, plasma surface treatment and real-time analysis. At the same time, it can perform real-time detection of material properties in some sub-vacuum chambers, so that material surface treatment, component coating process and detection and analysis can be completed in a single vacuum environment.

In the above embodiments of the present invention, the substrate transfer robot includes a sample carrier, A multi-axis transfer rod and a positioning detector, when the sample is placed on the sample carrier, the sample carrier can be transferred to the sample analysis chamber by the multi-axis transfer rod, and the positioning detector can pass through the positioning detector. The detector can place the sample on the measurement path.

In the above-mentioned embodiment of the present invention, the optical component includes a single-wavelength light source for measurement, a light Microscope sets, spectrometers and vacuum process equipment.

Please refer to "Figure 1", which is the cluster vacuum equipment transmission device of the present invention. intention. As shown in the figure: the present invention is a clustered real-time online process and analysis transmission in a vacuum environment The system 100 is composed of a cluster vacuum equipment 1 and a mechanical transmission module 2 .

The cluster vacuum equipment 1 mentioned above has various sub-vacuum chambers, including a A product preparation room 11, a sample analysis room 12 and several process processing rooms are respectively a plasma surface processing room 13, a vacuum PVD process processing room 14, and a CVD process processing and real-time analysis room 15.

The mechanical transfer module 2 is provided with a substrate transfer robot arm capable of transferring samples 21 and a processing chamber 22, various sub-vacuum chamber systems surround the mechanical transmission module 2, and some of the process processing chambers and the sample analysis chamber 12 are equipped with optical components 3 for real-time measurement, which can make the sample Alignment is performed by the standby state of the wafers transferred by the substrate transfer robot 21 and introduced into the respective process chambers, so that the sample can be picked up and placed in a single vacuum environment through the mechanical transfer module 2 to various types of wafers. The sub-vacuum chamber can perform PVD, CVD, plasma surface treatment and real-time analysis, etc. At the same time, it can perform real-time detection of material properties in some sub-vacuum chambers, so that material surface treatment, component coating process and detection analysis can be performed in a single vacuum environment. After completion, the present invention will effectively solve the environmental pollution (such as oxidation or carbon adsorption, etc.) caused by the conversion process in the traditional process, and can be widely used in vacuum-related processes such as optoelectronics and semiconductors. In this way, a brand-new real-time online process and analysis transmission system 100 in a vacuum environment is constructed by the above disclosed structure.

In an embodiment, the substrate transfer robot 21 includes a sample carrier. When the sample is placed on the sample carrier, the sample carrier can be transferred to the sample analysis chamber 12 by the multi-axis transfer rod, through the The positioning detector can place the sample on the measurement path.

In one embodiment, the present invention focuses on clustered 2D material process equipment real-time The detection and development is based on the real-time spectral measurement of two-dimensional materials through self-designed optical components 3. Component 3 includes a single-wavelength light source 31 for measurement, an optical mirror set 32, a spectrometer 33 and a vacuum process equipment 34, and is combined with the sub-vacuum chambers of other processes to form a cluster vacuum equipment 1, through real-time analysis to solve the problem of two-dimensional material growth. uncertainty, thereby improving yield and reducing cost.

In order to solve the problems of impurity pollution and rapid detection due to the transmission process, the present invention adopts A mechanical transfer module is established in the cluster vacuum equipment. After the multi-stage material process is performed in the cluster vacuum chamber, the sample is transferred through the mechanical transfer module in a single vacuum environment, and can be transferred to the analysis chamber in vacuum. Carry out structural and optoelectronic characteristic analysis, so that material surface treatment, component coating process and detection analysis can be completed in a single vacuum environment, which can effectively reduce the probability of environmental pollution of samples during process and analysis, and avoid the possibility of environmental pollution in the atmospheric environment. The transmission process is polluted or a natural oxide layer is formed, so that the material properties with low pollution can be obtained and the process data can be fed back in real time to achieve the purpose of advanced process development.

Therefore, the present invention has the following characteristics: 1. The present invention relates to sample transfer and real-time analysis in vacuum of a mechanical transfer module of a cluster vacuum apparatus for manufacturing semiconductor devices. 2. The cluster vacuum apparatus of the inventive concept can be formed from multiple types of batch chambers. Specifically, the remaining chambers other than the equipped front-end module can transfer substrates under vacuum in order to block external contaminants. 3. Adopt a single low-pollution process and analysis in vacuum. 4. It can be applied to the advanced process of optoelectronic semiconductor.

To sum up, the present invention is a clustered real-time online manufacturing process and analysis in a vacuum environment. The analysis and transfer system can effectively improve the shortcomings of the conventional ones. The cluster vacuum equipment transfers the sample substrate to the sub-vacuum chamber of each process in a single vacuum environment with a mechanical transfer module for material surface treatment, component coating process and inspection and analysis. , which can reduce the probability of the sample being contaminated in the multi-stage process, and can perform real-time detection, thereby effectively improving the yield and reducing the cost, so that the production of the present invention can be more advanced, more practical, and more in line with the needs of users. If the requirements for an invention patent application have been met, a patent application can be filed in accordance with the law.

However, the above are only preferred embodiments of the present invention, and should not be limited to this The scope of implementation of the present invention; therefore, any simple equivalent changes and modifications made according to the scope of the patent application of the present invention and the contents of the description of the invention should still fall within the scope of the patent of the present invention.

100: System 1: Cluster vacuum equipment 11: Sample preparation room 12: Sample analysis room 13: Plasma surface treatment room 14: Vacuum PVD process chamber 15: CVD process processing and instant analysis room 2: Mechanical transmission module 21: Substrate transfer robotic arm 22: Processing room 3: Optical components 31: Single wavelength light source 32: Optical lens group 33: Spectrometer 34: Vacuum process equipment

Figure 1 is a schematic diagram of the structure of a clustered real-time online process and analysis transmission system in a vacuum environment of the present invention.

100: System

1: Cluster vacuum equipment

11: Sample preparation room

12: Sample Analysis Room

13: Plasma Surface Treatment Chamber

14: Vacuum PVD process chamber

15: CVD process processing and real-time analysis room

2: Mechanical transmission module

21: Substrate transfer robot

22: Processing Room

3: Optical components

31: Single wavelength light source

32: Optical lens group

33: Spectrometer

34: Vacuum process equipment

Claims (3)

A clustered real-time online process and analysis transmission system in a vacuum environment, comprising: A cluster vacuum equipment has various sub-vacuum chambers, including several process chambers, a sample preparation chamber, and a sample analysis chamber, wherein the several process chambers are plasma surface treatment chambers and vacuum PVD process chambers respectively. processing chambers, and CVD process processing and real-time analysis chambers; and A mechanical transfer module is provided with a substrate transfer robot capable of transferring samples and a processing chamber. Various sub-vacuum chamber systems surround the mechanical transfer module, and some of the processing chambers are matched with the sample analysis chamber. There is an optical component for real-time measurement, which can make the sample transfer by the substrate transfer robot and guide the wafer into the standby state of the respective process chambers to perform alignment, so that the mechanical transfer module can be used for alignment. Take and place the sample in a single vacuum environment to various sub-vacuum chambers for PVD, CVD, plasma surface treatment and real-time analysis. The component coating process and inspection analysis are completed in a single vacuum environment. A cluster type real-time online process and analysis transfer system in a vacuum environment according to the first item of the scope of the patent application, wherein the substrate transfer robot includes a sample carrier, a multi-axis transfer rod and a positioning detection When the sample is placed on the sample carrier, the sample carrier can be transferred to the sample analysis chamber by the multi-axis transmission rod, and the sample can be placed in the measurement chamber through the positioning detector. on the path. A cluster type real-time online manufacturing process and analysis transmission system in a vacuum environment according to the first item of the scope of the patent application, wherein the optical component includes a single-wavelength light source for measurement, an optical lens group, a spectrometer and a vacuum process equipment.

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