TWI757859B - Method of forming package structure - Google Patents
Method of forming package structure Download PDFInfo
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- TWI757859B TWI757859B TW109130277A TW109130277A TWI757859B TW I757859 B TWI757859 B TW I757859B TW 109130277 A TW109130277 A TW 109130277A TW 109130277 A TW109130277 A TW 109130277A TW I757859 B TWI757859 B TW I757859B
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- package structure
- lead frame
- laser
- packaging material
- plastic packaging
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- 238000000034 method Methods 0.000 title claims abstract description 79
- 238000005530 etching Methods 0.000 claims abstract description 159
- 239000005022 packaging material Substances 0.000 claims description 158
- 238000009713 electroplating Methods 0.000 claims description 51
- 238000000465 moulding Methods 0.000 claims description 43
- QWVYNEUUYROOSZ-UHFFFAOYSA-N trioxido(oxo)vanadium;yttrium(3+) Chemical compound [Y+3].[O-][V]([O-])([O-])=O QWVYNEUUYROOSZ-UHFFFAOYSA-N 0.000 claims description 2
- 238000007747 plating Methods 0.000 abstract description 20
- 239000000463 material Substances 0.000 abstract description 6
- 230000002349 favourable effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 164
- 230000000694 effects Effects 0.000 description 17
- 230000009286 beneficial effect Effects 0.000 description 12
- 238000005538 encapsulation Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/561—Batch processing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49541—Geometry of the lead-frame
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49541—Geometry of the lead-frame
- H01L23/49548—Cross section geometry
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49541—Geometry of the lead-frame
- H01L23/49548—Cross section geometry
- H01L23/49551—Cross section geometry characterised by bent parts
- H01L23/49555—Cross section geometry characterised by bent parts the bent parts being the outer leads
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Geometry (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Laser Beam Processing (AREA)
Abstract
Description
本揭示內容係關於一種封裝結構的形成方法。The present disclosure relates to a method of forming a package structure.
以往來說,四方平面無引腳封裝(Quad Flat No Leads, QFN)因其引腳側面的可銲接面積較少,故將四方平面無引腳封裝設置於電路板時具有較不佳的銲接效果。In the past, the Quad Flat No Leads (QFN) package has less solderable area on the side of the pins, so it has a poor soldering effect when the Quad Flat No Leads package is installed on the circuit board. .
現今已發展一種四方平面無引腳封裝的引腳內縮底部一部分的結構,藉此提升引腳側面可銲接的面積。一般來說,會以刀切、蝕刻或雷射的製程以達到上述的結構。然而,如此的結構會造成引腳底部設置於電路板的面積變小,進而產生設置於電路板的壽命下降的問題。Nowadays, a structure in which the leads of the quad flat leadless package are retracted to a part of the bottom portion has been developed, thereby increasing the solderable area on the side of the lead. Generally, the above structures are achieved by knife cutting, etching or laser processes. However, such a structure will reduce the area of the bottom of the lead on the circuit board, which will lead to the problem of shortening the life of the lead on the circuit board.
本揭示內容提供一種封裝結構的形成方法,藉由蝕刻切割道與雷射光束移除切割道的塑膠封裝材料以得到可提升側面可銲接性和維持設置於電路板壽命的封裝結構。The present disclosure provides a method for forming a package structure. The plastic packaging material of the scribe line is removed by etching a scribe line and a laser beam to obtain a package structure that can improve the side solderability and maintain the life of the circuit board.
依據本揭示內容一實施方式提供一種封裝結構的形成方法,包含一蝕刻步驟、一雷射步驟、一電鍍步驟及一切割步驟。蝕刻步驟中,對一導線架的複數切割道進行蝕刻。雷射步驟中,以一雷射光束移除覆蓋切割道上的一塑膠封裝材料。電鍍步驟中,複數電鍍面設置於導線架上塑膠封裝材料未覆蓋的複數區域。切割步驟中,切割導線架的切割道以形成一封裝結構。According to an embodiment of the present disclosure, a method for forming a package structure is provided, which includes an etching step, a laser step, a plating step, and a dicing step. In the etching step, a plurality of scribe lines of a lead frame are etched. In the laser step, a laser beam is used to remove a plastic packaging material covering the scribe line. In the electroplating step, a plurality of electroplating surfaces are arranged on a plurality of areas on the lead frame that are not covered by the plastic packaging material. In the cutting step, the cutting lines of the lead frame are cut to form a package structure.
依據前段所述實施方式的封裝結構的形成方法,可更包含一模壓步驟,其中塑膠封裝材料於雷射步驟前覆蓋於導線架。The method for forming the package structure according to the embodiment described in the preceding paragraph may further include a molding step, wherein the plastic packaging material covers the lead frame before the laser step.
依據前段所述實施方式的封裝結構的形成方法,其中蝕刻步驟中的一蝕刻深度可小於或等於導線架的一厚度的一半。According to the method for forming the package structure in the embodiment described in the preceding paragraph, an etching depth in the etching step may be less than or equal to half of a thickness of the lead frame.
依據前段所述實施方式的封裝結構的形成方法,其中雷射步驟中,雷射光束可移除導線架的切割道的一上表面的一部分。According to the method for forming the package structure in the embodiment described in the preceding paragraph, in the laser step, the laser beam can remove a part of an upper surface of the scribe line of the lead frame.
依據前段所述實施方式的封裝結構的形成方法,其中切割步驟中,導線架的切割道可由一刀具切割。According to the method for forming the package structure according to the embodiment described in the preceding paragraph, in the cutting step, the cutting track of the lead frame can be cut by a knife.
依據前段所述實施方式的封裝結構的形成方法,其中刀具的切割寬度可小於或等於蝕刻步驟的蝕刻寬度。According to the method for forming the package structure according to the embodiment described in the preceding paragraph, the cutting width of the cutter can be smaller than or equal to the etching width of the etching step.
依據前段所述實施方式的封裝結構的形成方法,其中雷射步驟的雷射光束可為二極體泵浦摻釹釩酸釔,其輸出功率可為10瓦至40瓦,其波長可為355奈米、532奈米或1064奈米,其脈衝形式可為連續波,且脈衝頻率可為60千赫茲至200千赫茲。According to the method for forming the package structure in the embodiment described in the preceding paragraph, the laser beam of the laser step may be diode-pumped neodymium-doped yttrium vanadate, the output power may be 10 watts to 40 watts, and the wavelength may be 355 watts. Nanometer, 532nm or 1064nm, the pulse form can be continuous wave, and the pulse frequency can be 60 kHz to 200 kHz.
依據前段所述實施方式的封裝結構的形成方法,其中雷射步驟可包含一第一雷射步驟與一第二雷射步驟,且第二雷射步驟於第一雷射步驟後進行。According to the method for forming the package structure in the embodiment described in the preceding paragraph, the laser step may include a first laser step and a second laser step, and the second laser step is performed after the first laser step.
依據前段所述實施方式的封裝結構的形成方法,其中第一雷射步驟可為雷射光束移除覆蓋切割道的上表面的塑膠封裝材料。According to the method for forming the package structure in the embodiment described in the preceding paragraph, the first laser step can be a laser beam to remove the plastic packaging material covering the upper surface of the scribe line.
依據前段所述實施方式的封裝結構的形成方法,其中第二雷射步驟可為雷射光束移除覆蓋切割道的一下表面的塑膠封裝材料。According to the method for forming the package structure in the embodiment described in the preceding paragraph, the second laser step can remove the plastic packaging material covering the lower surface of the scribe line by the laser beam.
請參照第1圖,第1圖繪示依照本發明第一實施方式中封裝結構的形成方法S100的流程示意圖。由第1圖可知,封裝結構的形成方法S100包含一蝕刻步驟S101、一模壓步驟S102、一雷射步驟、一電鍍步驟S105及一切割步驟S106,其中雷射步驟可包含一第一雷射步驟S103與一第二雷射步驟S104,且第二雷射步驟S104於第一雷射步驟S103後進行。Please refer to FIG. 1. FIG. 1 is a schematic flowchart of a method S100 for forming a package structure according to the first embodiment of the present invention. As can be seen from FIG. 1, the method S100 for forming the package structure includes an etching step S101, a molding step S102, a laser step, a plating step S105 and a cutting step S106, wherein the laser step may include a first laser step S103 and a second laser step S104, and the second laser step S104 is performed after the first laser step S103.
請參照第2圖與第3圖,第2圖繪示第1圖第一實施方式中蝕刻步驟S101的示意圖,第3圖繪示第2圖第一實施方式中導線架110沿剖線3-3'的剖面示意圖。由第2圖與第3圖可知,蝕刻步驟S101中對導線架110的複數切割道111進行蝕刻。第一實施方式中,對導線架110的切割道111的下表面進行蝕刻形成一蝕刻槽112,且蝕刻深度可等於導線架110的厚度的一半,但並不以此為限。Please refer to FIG. 2 and FIG. 3. FIG. 2 shows a schematic diagram of the etching step S101 in the first embodiment in FIG. 1, and FIG. 3 shows the
請參照第4圖與第5圖,第4圖繪示第1圖第一實施方式中模壓步驟S102的示意圖,第5圖繪示第4圖第一實施方式中導線架110沿剖線5-5'的剖面示意圖。由第4圖與第5圖可知,塑膠封裝材料120於雷射步驟前覆蓋於導線架110。Please refer to FIGS. 4 and 5. FIG. 4 shows a schematic diagram of the molding step S102 in the first embodiment in FIG. 1, and FIG. 5 shows the
請參照第6圖與第7圖,第6圖繪示第1圖第一實施方式中第一雷射步驟S103的示意圖,第7圖繪示第6圖第一實施方式中導線架110沿剖線7-7'的剖面示意圖。由第6圖與第7圖可知,雷射步驟係以一雷射光束L移除覆蓋切割道111上的塑膠封裝材料120。具體來說,第一實施方式中,第一雷射步驟S103係雷射光束L移除覆蓋切割道111的一上表面的塑膠封裝材料120,且塑膠封裝材料120僅部分被移除。值得一提的是,因雷射光束L照射於切割道111的上表面以移除塑膠封裝材料120,而設置於蝕刻槽112的塑膠封裝材料120不會被雷射光束L照射到,故設置於蝕刻槽112的塑膠封裝材料120則保留於其中。Please refer to FIG. 6 and FIG. 7, FIG. 6 is a schematic diagram of the first laser step S103 in the first embodiment in FIG. 1, and FIG. 7 is a cross-section of the
請參照第8圖與第9圖,第8圖繪示第1圖第一實施方式中第二雷射步驟S104的示意圖,第9圖繪示第8圖第一實施方式中導線架110沿剖線9-9'的剖面示意圖。由第8圖與第9圖可知,第二雷射步驟S104為雷射光束L移除覆蓋切割道111的下表面的塑膠封裝材料120,且塑膠封裝材料120僅部分被移除。Please refer to FIGS. 8 and 9. FIG. 8 is a schematic diagram of the second laser step S104 in the first embodiment in FIG. 1, and FIG. 9 is a cross-section of the
請參照下表一,表一為第一實施方式中第一雷射步驟S103與第二雷射步驟S104所使用的雷射光束L的參數,但並不以表一中的參數為限。
進一步來說,透過第一雷射步驟S103與第二雷射步驟S104可選擇移除的對象(如部分塑膠封裝材料120)與其深度。藉此,可有效控制移除的範圍。具體而言,第一雷射步驟S103與第二雷射步驟S104皆可由一道或多道雷射光束L所組成。舉例來說,多道雷射光束L可先由較小波長(如355奈米)的雷射光束L進行粗加工達到快速的移除效果,接著再以較大波長(如532奈米或1064奈米)的雷射光束L進行細加工以達到較為精細的移除效果,但並不以此為限。Further, through the first laser step S103 and the second laser step S104, the object to be removed (eg, part of the plastic packaging material 120) and its depth can be selected. Thereby, the range of removal can be effectively controlled. Specifically, both the first laser step S103 and the second laser step S104 may be composed of one or more laser beams L. For example, the multiple laser beams L can be rough processed by the laser beam L with a smaller wavelength (such as 355 nm) to achieve a rapid removal effect, and then the laser beam L with a larger wavelength (such as 532 nm or 1064 nm) can be used for rough processing. The laser beam L of the nanometer) is finely processed to achieve a relatively fine removal effect, but it is not limited thereto.
請參照第10圖與第11圖,第10圖繪示第1圖第一實施方式中電鍍步驟S105的示意圖,第11圖繪示第10圖第一實施方式中導線架110沿剖線11-11'的剖面示意圖。由第10圖與第11圖可知,複數電鍍面130設置於導線架110上塑膠封裝材料120未覆蓋的複數區域。Please refer to FIG. 10 and FIG. 11. FIG. 10 shows a schematic diagram of the electroplating step S105 in the first embodiment in FIG. 1, and FIG. 11 shows the
請參照第12圖、第13圖及第14圖,第12圖繪示第1圖第一實施方式中切割步驟S106的示意圖,第13圖繪示第12圖第一實施方式中封裝結構100沿剖線13-13'的剖面示意圖,第14圖繪示第12圖第一實施方式中封裝結構100沿剖線14-14'的剖面示意圖。由第12圖至第14圖可知,切割步驟S106係切割導線架110的切割道111以形成封裝結構100。詳細來說,導線架110的切割道111由一刀具切割,而刀具的切割寬度小於蝕刻步驟S101的蝕刻寬度(即蝕刻槽112的寬度),故形成梯狀引腳113,且電鍍面130設置於梯狀引腳113的外周。再者,因蝕刻步驟S101已使切割道111的厚度變薄,因此當切割步驟S106時可降低毛邊(burr)的產生。Please refer to FIG. 12 , FIG. 13 and FIG. 14 . FIG. 12 is a schematic diagram of the cutting step S106 in the first embodiment in FIG. 1 , and FIG. 13 is a schematic diagram of the
請參照第15圖與第16圖,第15圖繪示第1圖第一實施方式中封裝結構100的側面示意圖,第16圖繪示第1圖第一實施方式中封裝結構100的部分示意圖。由第15圖與第16圖可知,封裝結構100包含複數梯狀引腳113,梯狀引腳113突出於塑膠封裝材料120的邊緣,各個梯狀引腳113包含五電鍍面130,且靠近封裝結構100下表面的梯狀引腳113未超出且貼齊塑膠封裝材料120的邊緣。Please refer to FIGS. 15 and 16. FIG. 15 is a schematic side view of the
因此,透過第一實施方式的封裝結構的形成方法S100,不僅可提高封裝結構100的側面可銲接面積,同時可不用更換封裝外型圖(Package Outline Drawing, POD)的樣式,減少重新繪製封裝外型圖的程序。因此,可提升梯狀引腳113與電路板的連接強度,以維持並增加設置於電路板的壽命,進一步提升板級(board level)的可靠度。Therefore, the method S100 for forming the package structure of the first embodiment can not only increase the side solderable area of the
請參照第17圖,第17圖繪示依照本發明第二實施方式中封裝結構的形成方法S200的流程示意圖。由第17圖可知,封裝結構的形成方法S200包含一蝕刻步驟S201、一模壓步驟S202、一雷射步驟S203、一電鍍步驟S204及一切割步驟S205。Please refer to FIG. 17. FIG. 17 is a schematic flowchart of a method S200 for forming a package structure according to the second embodiment of the present invention. As can be seen from FIG. 17 , the method S200 for forming the package structure includes an etching step S201 , a molding step S202 , a laser step S203 , a plating step S204 and a cutting step S205 .
請參照第18圖與第19圖,第18圖繪示第17圖第二實施方式中蝕刻步驟S201的示意圖,第19圖繪示第18圖第二實施方式中導線架210沿剖線19-19'的剖面示意圖。由第18圖與第19圖可知,蝕刻步驟S201中對導線架210的複數切割道211進行蝕刻。第二實施方式中,對導線架210的切割道211的下表面進行蝕刻形成一蝕刻槽212,且蝕刻深度可等於導線架210的厚度的一半,但並不以此為限。Please refer to FIG. 18 and FIG. 19. FIG. 18 shows a schematic diagram of the etching step S201 in the second embodiment in FIG. 17, and FIG. 19 shows the
請參照第20圖與第21圖,第20圖繪示第17圖第二實施方式中模壓步驟S202的示意圖,第21圖繪示第20圖第二實施方式中導線架210沿剖線21-21'的剖面示意圖。由第20圖與第21圖可知,塑膠封裝材料220於雷射步驟S203前覆蓋於導線架210。Please refer to FIG. 20 and FIG. 21. FIG. 20 shows a schematic diagram of the molding step S202 in the second embodiment in FIG. 17, and FIG. 21 shows the
請參照第22圖與第23圖,第22圖繪示第17圖第二實施方式中雷射步驟S203的示意圖,第23圖繪示第22圖第二實施方式中導線架210沿剖線23-23'的剖面示意圖。由第22圖與第23圖可知,雷射步驟S203係以一雷射光束L移除覆蓋切割道211上的塑膠封裝材料220。具體來說,雷射步驟S203係雷射光束L移除覆蓋切割道211的一上表面的塑膠封裝材料220,且雷射光束L移除導線架210的切割道211的上表面的一部分,其中塑膠封裝材料220僅部分被移除。值得一提的是,因雷射光束L照射於切割道211的上表面以移除塑膠封裝材料220與切割道211的上表面的一部分,而設置於蝕刻槽212的塑膠封裝材料220不會被雷射光束L照射到,故設置於蝕刻槽212的塑膠封裝材料220則保留於其中。Please refer to FIGS. 22 and 23. FIG. 22 shows a schematic diagram of the laser step S203 in the second embodiment in FIG. 17, and FIG. 23 shows the
請參照下表二,表二為第二實施方式中雷射步驟S203所使用的雷射光束L的參數,但並不以表二中的參數為限。
進一步來說,透過雷射步驟S203可選擇移除的對象(如部分塑膠封裝材料220與部分導線架210)與其深度,且雷射步驟S203不限於一道,亦可為二道以上,其取決於雷射光束L的能量與參數。藉此,可有效控制移除的範圍。具體而言,雷射步驟S203可由一道或多道雷射光束L所組成。舉例來說,多道雷射光束L可先由較小波長(如355奈米)的雷射光束L進行粗加工達到快速的移除效果,接著再以較大波長(如532奈米或1064奈米)的雷射光束L進行細加工以達到較為精細的移除效果,但並不以此為限。Further, the objects to be removed (such as part of the
請參照第24圖與第25圖,第24圖繪示第17圖第二實施方式中電鍍步驟S204的示意圖,第25圖繪示第24圖第二實施方式中導線架210沿剖線25-25'的剖面示意圖。由第24圖與第25圖可知,複數電鍍面230設置於導線架210上塑膠封裝材料220未覆蓋的複數區域。Please refer to FIGS. 24 and 25. FIG. 24 shows a schematic diagram of the electroplating step S204 in the second embodiment in FIG. 17, and FIG. 25 shows the
請參照第26圖、第27圖及第28圖,第26圖繪示第17圖第二實施方式中切割步驟S205的示意圖,第27圖繪示第26圖第二實施方式中封裝結構200沿剖線27-27'的剖面示意圖,第28圖繪示第26圖第二實施方式中封裝結構200沿剖線28-28'的剖面示意圖。由第26圖至第28圖可知,切割步驟S205係切割導線架210的切割道211以形成封裝結構200。詳細來說,導線架210的切割道211由一刀具切割,而刀具的切割寬度等於蝕刻步驟S201的蝕刻寬度(即蝕刻槽212的寬度),故形成梯狀引腳213,且電鍍面230設置於梯狀引腳213的外周。再者,因蝕刻步驟S201已使切割道211的厚度變薄,因此當切割步驟S205時可降低毛邊的產生。Please refer to FIG. 26 , FIG. 27 and FIG. 28 . FIG. 26 is a schematic diagram of the cutting step S205 in the second embodiment in FIG. 17 , and FIG. 27 is a schematic diagram of the
請參照第29圖與第30圖,第29圖繪示第17圖第二實施方式中封裝結構200的側面示意圖,第30圖繪示第17圖第二實施方式中封裝結構200的部分示意圖。由第29圖與第30圖可知,封裝結構200包含複數梯狀引腳213,梯狀引腳213突出於塑膠封裝材料220的邊緣,各個梯狀引腳213包含五電鍍面230,且靠近封裝結構200下表面的梯狀引腳213突出塑膠封裝材料220的邊緣。Please refer to FIGS. 29 and 30. FIG. 29 is a schematic side view of the
因此,透過第二實施方式的封裝結構的形成方法S200,有利於提高封裝結構200的側面可銲接面積。因此,可提升梯狀引腳213與電路板的連接強度,以維持並增加設置於電路板的壽命,進一步提升板級的可靠度。Therefore, through the method S200 for forming the package structure of the second embodiment, it is beneficial to improve the side solderable area of the
請參照第31圖,第31圖繪示依照本發明第三實施方式中封裝結構的形成方法S300的流程示意圖。由第31圖可知,封裝結構的形成方法S300包含一蝕刻步驟S301、一模壓步驟S302、一雷射步驟S303、一電鍍步驟S304及一切割步驟S305。Please refer to FIG. 31 . FIG. 31 is a schematic flowchart of a method S300 for forming a package structure according to the third embodiment of the present invention. As can be seen from FIG. 31 , the method S300 for forming the package structure includes an etching step S301 , a molding step S302 , a laser step S303 , a plating step S304 and a cutting step S305 .
請參照第32圖與第33圖,第32圖繪示第31圖第三實施方式中蝕刻步驟S301的示意圖,第33圖繪示第32圖第三實施方式中導線架310沿剖線33-33'的剖面示意圖。由第32圖與第33圖可知,蝕刻步驟S301中對導線架310的複數切割道311進行蝕刻。第三實施方式中,對導線架310的切割道311的下表面進行蝕刻形成一蝕刻槽312,且蝕刻深度可小於導線架310的厚度的一半,但並不以此為限。進一步來說,切割道311可具有複數凹陷部314,凹陷部314的凹陷深度可為導線架310的厚度的一半,各凹陷部314的寬度可大於各蝕刻槽312的寬度,且各凹陷部314位於切割道311的中央。Please refer to FIGS. 32 and 33. FIG. 32 shows a schematic diagram of the etching step S301 in the third embodiment in FIG. 31, and FIG. 33 shows the
請參照第34圖與第35圖,第34圖繪示第31圖第三實施方式中模壓步驟S302的示意圖,第35圖繪示第34圖第三實施方式中導線架310沿剖線35-35'的剖面示意圖。由第34圖與第35圖可知,塑膠封裝材料320於雷射步驟S303前覆蓋於導線架310。值得一提的是,塑膠封裝材料320並無填入凹陷部314內。Please refer to FIGS. 34 and 35. FIG. 34 shows a schematic diagram of the molding step S302 in the third embodiment in FIG. 31, and FIG. 35 shows the
請參照第36圖與第37圖,第36圖繪示第31圖第三實施方式中雷射步驟S303的示意圖,第37圖繪示第36圖第三實施方式中導線架310沿剖線37-37'的剖面示意圖。由第36圖與第37圖可知,雷射步驟S303係以一雷射光束L移除覆蓋切割道311上的塑膠封裝材料320。具體來說,雷射步驟S303係雷射光束L移除覆蓋切割道311的一上表面的塑膠封裝材料320,且雷射光束L移除導線架310的切割道311的上表面的一部分,其中塑膠封裝材料320僅部分被移除。Please refer to FIGS. 36 and 37. FIG. 36 shows a schematic diagram of the laser step S303 in the third embodiment in FIG. 31, and FIG. 37 shows the
請參照下表三,表三為第三實施方式中雷射步驟S303所使用的雷射光束L的參數,但並不以表三中的參數為限。
進一步來說,透過雷射步驟S303可選擇移除的對象(如部分塑膠封裝材料320與部分導線架310)與其深度,且雷射步驟S303不限於一道,亦可為二道以上,其取決於雷射光束L的能量與參數。藉此,可有效控制移除的範圍。具體而言,雷射步驟S303可由一道或多道雷射光束L所組成。舉例來說,多道雷射光束L可先由較小波長(如355奈米)的雷射光束L進行粗加工達到快速的移除效果,接著再以較大波長(如532奈米或1064奈米)的雷射光束L進行細加工以達到較為精細的移除效果,但並不以此為限。Further, the objects to be removed (such as part of the
請參照第38圖與第39圖,第38圖繪示第31圖第三實施方式中電鍍步驟S304的示意圖,第39圖繪示第38圖第三實施方式中導線架310沿剖線39-39'的剖面示意圖。由第38圖與第39圖可知,複數電鍍面330設置於導線架310上塑膠封裝材料320未覆蓋的複數區域。Please refer to FIGS. 38 and 39. FIG. 38 shows a schematic diagram of the electroplating step S304 in the third embodiment in FIG. 31, and FIG. 39 shows the
請參照第40圖、第41圖及第42圖,第40圖繪示第31圖第三實施方式中切割步驟S305的示意圖,第41圖繪示第40圖第三實施方式中封裝結構300沿剖線41-41'的剖面示意圖,第42圖繪示第40圖第三實施方式中封裝結構300沿剖線42-42'的剖面示意圖。由第40圖至第42圖可知,切割步驟S305係切割導線架310的切割道311以形成封裝結構300。詳細來說,導線架310的切割道311由一刀具切割,而刀具的切割寬度等於蝕刻步驟S301的蝕刻寬度(即蝕刻槽312的寬度),故形成梯狀引腳313,且電鍍面330設置於梯狀引腳313的外周。再者,因蝕刻步驟S301已使切割道311的厚度變薄,因此當切割步驟S305時可降低毛邊的產生。Please refer to FIG. 40 , FIG. 41 and FIG. 42 , FIG. 40 is a schematic diagram of the cutting step S305 in the third embodiment in FIG. 31 , and FIG. 41 is a schematic diagram of the
請參照第43圖與第44圖,第43圖繪示第31圖第三實施方式中封裝結構300的側面示意圖,第44圖繪示第31圖第三實施方式中封裝結構300的部分示意圖。由第43圖與第44圖可知,封裝結構300包含複數梯狀引腳313,梯狀引腳313突出於塑膠封裝材料320的邊緣,各個梯狀引腳313包含八電鍍面330,且靠近封裝結構300下表面的梯狀引腳313突出塑膠封裝材料320的邊緣。Please refer to FIGS. 43 and 44 . FIG. 43 is a schematic side view of the
因此,透過第三實施方式的封裝結構的形成方法S300,有利於提高封裝結構300的側面可銲接面積。因此,可提升梯狀引腳313與電路板的連接強度,以維持並增加設置於電路板的壽命,進一步提升板級的可靠度。Therefore, through the method S300 for forming the package structure of the third embodiment, it is beneficial to increase the side solderable area of the
請參照第45圖,第45圖繪示依照本發明第四實施方式中封裝結構的形成方法S400的流程示意圖。由第45圖可知,封裝結構的形成方法S400包含一蝕刻步驟S401、一模壓步驟S402、一雷射步驟S403、一電鍍步驟S404及一切割步驟S405。Please refer to FIG. 45. FIG. 45 is a schematic flowchart of a method S400 for forming a package structure according to the fourth embodiment of the present invention. As can be seen from FIG. 45 , the method S400 for forming the package structure includes an etching step S401 , a molding step S402 , a laser step S403 , a plating step S404 and a cutting step S405 .
請參照第46圖與第47圖,第46圖繪示第45圖第四實施方式中蝕刻步驟S401的示意圖,第47圖繪示第46圖第四實施方式中導線架410沿剖線47-47'的剖面示意圖。由第46圖與第47圖可知,蝕刻步驟S401中對導線架410的複數切割道411進行蝕刻。第四實施方式中,對導線架410的切割道411的上表面進行蝕刻形成一蝕刻槽412,且蝕刻深度可等於導線架410的厚度的一半,但並不以此為限。Please refer to FIGS. 46 and 47. FIG. 46 shows a schematic diagram of the etching step S401 in the fourth embodiment in FIG. 45, and FIG. 47 shows the
請參照第48圖與第49圖,第48圖繪示第45圖第四實施方式中模壓步驟S402的示意圖,第49圖繪示第48圖第四實施方式中導線架410沿剖線49-49'的剖面示意圖。由第48圖與第49圖可知,塑膠封裝材料420於雷射步驟S403前覆蓋於導線架410。Please refer to FIGS. 48 and 49. FIG. 48 shows a schematic diagram of the molding step S402 in the fourth embodiment in FIG. 45, and FIG. 49 shows the
請參照第50圖與第51圖,第50圖繪示第45圖第四實施方式中雷射步驟S403的示意圖,第51圖繪示第50圖第四實施方式中導線架410沿剖線51-51'的剖面示意圖。由第50圖與第51圖可知,雷射步驟S403係以一雷射光束L移除覆蓋切割道411上的塑膠封裝材料420。具體來說,雷射步驟S403係雷射光束L移除覆蓋切割道411的一上表面的塑膠封裝材料420,且塑膠封裝材料420僅部分被移除。Please refer to FIGS. 50 and 51. FIG. 50 shows a schematic diagram of the laser step S403 in the fourth embodiment in FIG. 45, and FIG. 51 shows the
請參照下表四,表四為第四實施方式中雷射步驟S403所使用的雷射光束L的參數,但並不以表四中的參數為限。
進一步來說,透過雷射步驟S403可選擇移除的對象(如部分塑膠封裝材料420)與其深度。藉此,可有效控制移除的範圍。具體而言,雷射步驟S403可由一道或多道雷射光束L所組成。舉例來說,多道雷射光束L可先由較小波長(如355奈米)的雷射光束L進行粗加工,接著再以較大波長(如532奈米或1064奈米)的雷射光束L進行細加工以達到較為精細的移除效果,但並不以此為限。Further, the object to be removed (eg, part of the plastic packaging material 420 ) and its depth can be selected through the laser step S403 . Thereby, the range of removal can be effectively controlled. Specifically, the laser step S403 may consist of one or more laser beams L. For example, the multiple laser beams L can be rough processed by the laser beam L with a smaller wavelength (eg, 355 nm) first, and then the laser beam L with a larger wavelength (eg, 532 nm or 1064 nm) can be used for rough processing. The light beam L is finely processed to achieve a finer removal effect, but is not limited thereto.
請參照第52圖與第53圖,第52圖繪示第45圖第四實施方式中電鍍步驟S404的示意圖,第53圖繪示第52圖第四實施方式中導線架410沿剖線53-53'的剖面示意圖。由第52圖與第53圖可知,複數電鍍面430設置於導線架410上塑膠封裝材料420未覆蓋的複數區域。Please refer to FIGS. 52 and 53. FIG. 52 shows a schematic diagram of the electroplating step S404 in the fourth embodiment in FIG. 45, and FIG. 53 shows the
請參照第54圖、第55圖及第56圖,第54圖繪示第45圖第四實施方式中切割步驟S405的示意圖,第55圖繪示第54圖第四實施方式中封裝結構400沿剖線55-55'的剖面示意圖,第56圖繪示第54圖第四實施方式中封裝結構400沿剖線56-56'的剖面示意圖。由第54圖至第56圖可知,切割步驟S405係切割導線架410的切割道411以形成封裝結構400。詳細來說,導線架410的切割道411由一刀具切割,而刀具的切割寬度等於蝕刻步驟S401的蝕刻寬度(即蝕刻槽412的寬度),故形成梯狀引腳413,且電鍍面430設置於梯狀引腳413的外周。再者,因蝕刻步驟S401已使切割道411的厚度變薄,因此當切割步驟S405時可降低毛邊的產生。Please refer to FIG. 54 , FIG. 55 and FIG. 56 , FIG. 54 is a schematic diagram of the cutting step S405 in the fourth embodiment in FIG. 45 , and FIG. 55 is a schematic diagram of the
請參照第57圖與第58圖,第57圖繪示第45圖第四實施方式中封裝結構400的側面示意圖,第58圖繪示第45圖第四實施方式中封裝結構400的部分示意圖。由第57圖與第58圖可知,封裝結構400包含複數梯狀引腳413,梯狀引腳413突出於塑膠封裝材料420的邊緣,各個梯狀引腳413包含六電鍍面430,且靠近封裝結構400下表面的梯狀引腳413突出塑膠封裝材料420的邊緣。Please refer to FIGS. 57 and 58. FIG. 57 is a schematic side view of the
因此,透過第四實施方式的封裝結構的形成方法S400,有利於提高封裝結構400的側面可銲接面積。因此,可提升梯狀引腳413與電路板的連接強度,以維持並增加設置於電路板的壽命,進一步提升板級的可靠度。Therefore, through the method S400 for forming the package structure of the fourth embodiment, it is beneficial to increase the side solderable area of the
請參照第59圖,第59圖繪示依照本發明第五實施方式中封裝結構的形成方法S500的流程示意圖。由第59圖可知,封裝結構的形成方法S500包含一蝕刻步驟S501、一模壓步驟S502、一雷射步驟S503、一電鍍步驟S504及一切割步驟S505。Please refer to FIG. 59. FIG. 59 is a schematic flowchart of a method S500 for forming a package structure according to the fifth embodiment of the present invention. As can be seen from FIG. 59 , the method S500 for forming the package structure includes an etching step S501 , a molding step S502 , a laser step S503 , a plating step S504 and a cutting step S505 .
請參照第60圖與第61圖,第60圖繪示第59圖第五實施方式中蝕刻步驟S501的示意圖,第61圖繪示第60圖第五實施方式中導線架510沿剖線61-61'的剖面示意圖。由第60圖與第61圖可知,蝕刻步驟S501中對導線架510的複數切割道511進行蝕刻。第五實施方式中,對導線架510的切割道511的上表面進行蝕刻形成一蝕刻槽512,且蝕刻深度可等於導線架510的厚度的一半,但並不以此為限。Please refer to FIGS. 60 and 61. FIG. 60 shows a schematic diagram of the etching step S501 in the fifth embodiment in FIG. 59, and FIG. 61 shows the
請參照第62圖與第63圖,第62圖繪示第59圖第五實施方式中模壓步驟S502的示意圖,第63圖繪示第62圖第五實施方式中導線架510沿剖線63-63'的剖面示意圖。由第62圖與第63圖可知,塑膠封裝材料520於雷射步驟S503前覆蓋於導線架510。Please refer to FIGS. 62 and 63. FIG. 62 shows a schematic diagram of the molding step S502 in the fifth embodiment in FIG. 59, and FIG. 63 shows the
請參照第64圖與第65圖,第64圖繪示第59圖第五實施方式中雷射步驟S503的示意圖,第65圖繪示第64圖第五實施方式中導線架510沿剖線65-65'的剖面示意圖。由第64圖與第65圖可知,雷射步驟S503係雷射光束L移除覆蓋切割道511的一上表面的塑膠封裝材料520,且雷射光束L移除導線架510的切割道511的上表面的一部分,其中塑膠封裝材料520僅部分被移除。Please refer to FIGS. 64 and 65. FIG. 64 shows a schematic diagram of the laser step S503 in the fifth embodiment in FIG. 59, and FIG. 65 shows the
請參照下表五,表五為第五實施方式中雷射步驟S503所使用的雷射光束L的參數,但並不以表五中的參數為限。
進一步來說,透過雷射步驟S503可選擇移除的對象(如部分塑膠封裝材料520與部分導線架510)與其深度,且雷射步驟S503不限於一道,亦可為二道以上,其取決於雷射光束L的能量與參數。藉此,可有效控制移除的範圍。具體而言,雷射步驟S503可由一道或多道雷射光束L所組成。舉例來說,多道雷射光束L可先由較小波長(如355奈米)的雷射光束L進行粗加工,接著再以較大波長(如532奈米或1064奈米)的雷射光束L進行細加工以達到較為精細的移除效果,但並不以此為限。Further, the objects to be removed (such as part of the
請參照第66圖與第67圖,第66圖繪示第59圖第五實施方式中電鍍步驟S504的示意圖,第67圖繪示第66圖第五實施方式中導線架510沿剖線67-67'的剖面示意圖。由第66圖與第67圖可知,複數電鍍面530設置於導線架510上塑膠封裝材料520未覆蓋的複數區域。Please refer to FIGS. 66 and 67. FIG. 66 shows a schematic diagram of the electroplating step S504 in the fifth embodiment in FIG. 59, and FIG. 67 shows the
請參照第68圖、第69圖及第70圖,第68圖繪示第59圖第五實施方式中切割步驟S505的示意圖,第69圖繪示第68圖第五實施方式中封裝結構500沿剖線69-69'的剖面示意圖,第70圖繪示第68圖第五實施方式中封裝結構500沿剖線70-70'的剖面示意圖。由第68圖至第70圖可知,切割步驟S505係切割導線架510的切割道511以形成封裝結構500。詳細來說,導線架510的切割道511由一刀具切割,而刀具的切割寬度等於蝕刻步驟S501的蝕刻寬度(即蝕刻槽512的寬度),故形成梯狀引腳513,且電鍍面530設置於梯狀引腳513的外周。再者,因蝕刻步驟S501已使切割道511的厚度變薄,因此當切割步驟S505時可降低毛邊的產生。Please refer to FIG. 68 , FIG. 69 and FIG. 70 . FIG. 68 shows a schematic diagram of the cutting step S505 in the fifth embodiment in FIG. 59 , and FIG. 69 shows the
請參照第71圖與第72圖,第71圖繪示第59圖第五實施方式中封裝結構500的側面示意圖,第72圖繪示第59圖第五實施方式中封裝結構500的部分示意圖。由第71圖與第72圖可知,封裝結構500包含複數梯狀引腳513,梯狀引腳513突出於塑膠封裝材料520的邊緣,各個梯狀引腳513包含七電鍍面530,且靠近封裝結構500下表面的梯狀引腳513突出塑膠封裝材料520的邊緣。Please refer to FIGS. 71 and 72. FIG. 71 is a schematic side view of the
因此,透過第五實施方式的封裝結構的形成方法S500,有利於提高封裝結構500的側面可銲接面積。因此,可提升梯狀引腳513與電路板的連接強度,以維持並增加設置於電路板的壽命,進一步提升板級的可靠度。Therefore, through the method S500 for forming the package structure of the fifth embodiment, it is beneficial to increase the side solderable area of the
請參照第73圖,第73圖繪示依照本發明第六實施方式中封裝結構的形成方法S600的流程示意圖。由第73圖可知,封裝結構的形成方法S600包含一蝕刻步驟S601、一模壓步驟S602、一雷射步驟S603、一電鍍步驟S604及一切割步驟S605。Please refer to FIG. 73 , which is a schematic flowchart of a method S600 for forming a package structure according to a sixth embodiment of the present invention. As can be seen from FIG. 73 , the method S600 for forming the package structure includes an etching step S601 , a molding step S602 , a laser step S603 , a plating step S604 and a cutting step S605 .
請參照第74圖與第75圖,第74圖繪示第73圖第六實施方式中蝕刻步驟S601的示意圖,第75圖繪示第74圖第六實施方式中導線架610沿剖線75-75'的剖面示意圖。由第74圖與第75圖可知,蝕刻步驟S601中對導線架610的複數切割道611進行蝕刻。第六實施方式中,對導線架610的切割道611的上表面進行蝕刻形成一蝕刻槽612,且蝕刻深度可小於導線架610的厚度的一半,但並不以此為限。進一步來說,切割道611可具有複數凹陷部614,凹陷部614的凹陷深度可小於導線架610的厚度的一半,各凹陷部614的寬度可大於各蝕刻槽612的寬度,且各凹陷部614位於切割道611的中央。Please refer to FIGS. 74 and 75. FIG. 74 shows a schematic diagram of the etching step S601 in the sixth embodiment in FIG. 73, and FIG. 75 shows the
請參照第76圖與第77圖,第76圖繪示第73圖第六實施方式中模壓步驟S602的示意圖,第77圖繪示第76圖第六實施方式中導線架610沿剖線77-77'的剖面示意圖。由第76圖與第77圖可知,塑膠封裝材料620於雷射步驟S603前覆蓋於導線架610。值得一提的是,塑膠封裝材料620並無填入凹陷部614內。Please refer to FIGS. 76 and 77. FIG. 76 shows a schematic diagram of the molding step S602 in the sixth embodiment in FIG. 73, and FIG. 77 shows the
請參照第78圖與第79圖,第78圖繪示第73圖第六實施方式中雷射步驟S603的示意圖,第79圖繪示第78圖第六實施方式中導線架610沿剖線79-79'的剖面示意圖。由第78圖與第79圖可知,雷射步驟S603係雷射光束L移除覆蓋切割道611的一上表面的塑膠封裝材料620,且雷射光束L移除導線架610的切割道611的上表面的一部分,其中塑膠封裝材料620僅部分被移除。Please refer to FIGS. 78 and 79. FIG. 78 shows a schematic diagram of the laser step S603 in the sixth embodiment in FIG. 73, and FIG. 79 shows the
請參照下表六,表六為第六實施方式中雷射步驟S603所使用的雷射光束L的參數,但並不以表六中的參數為限。
進一步來說,透過雷射步驟S603可選擇移除的對象(如部分塑膠封裝材料620與部分導線架610)與其深度,且雷射步驟S603不限於一道,亦可為二道以上,其取決於雷射光束L的能量與參數。藉此,可有效控制移除的範圍。具體而言,雷射步驟S603可由一道或多道雷射光束L所組成。舉例來說,多道雷射光束L可先由較小波長(如355奈米)的雷射光束L進行粗加工,接著再以較大波長(如532奈米或1064奈米)的雷射光束L進行細加工以達到較為精細的移除效果,但並不以此為限。Further, the objects to be removed (such as part of the
請參照第80圖與第81圖,第80圖繪示第73圖第六實施方式中電鍍步驟S604的示意圖,第81圖繪示第80圖第六實施方式中導線架610沿剖線81-81'的剖面示意圖。由第80圖與第81圖可知,複數電鍍面630設置於導線架610上塑膠封裝材料620未覆蓋的複數區域。Please refer to FIGS. 80 and 81. FIG. 80 shows a schematic diagram of the electroplating step S604 in the sixth embodiment in FIG. 73, and FIG. 81 shows the
請參照第82圖、第83圖及第84圖,第82圖繪示第73圖第六實施方式中切割步驟S605的示意圖,第83圖繪示第82圖第六實施方式中封裝結構600沿剖線83-83'的剖面示意圖,第84圖繪示第82圖第六實施方式中封裝結構600沿剖線84-84'的剖面示意圖。由第82圖至第84圖可知,切割步驟S605係切割導線架610的切割道611以形成封裝結構600。詳細來說,導線架610的切割道611由一刀具切割,而刀具的切割寬度等於蝕刻步驟S601的蝕刻寬度(即蝕刻槽612的寬度),故形成梯狀引腳613,且電鍍面630設置於梯狀引腳613的外周。再者,因蝕刻步驟S601已使切割道611的厚度變薄,因此當切割步驟S605時可降低毛邊的產生。Please refer to FIG. 82 , FIG. 83 and FIG. 84 . FIG. 82 shows a schematic diagram of the cutting step S605 in the sixth embodiment in FIG. 73 , and FIG. 83 shows the
請參照第85圖與第86圖,第85圖繪示第73圖第六實施方式中封裝結構600的側面示意圖,第86圖繪示第73圖第六實施方式中封裝結構600的部分示意圖。由第85圖與第86圖可知,封裝結構600包含複數梯狀引腳613,梯狀引腳613突出於塑膠封裝材料620的邊緣,各個梯狀引腳613包含十電鍍面630,且靠近封裝結構600下表面的梯狀引腳613突出塑膠封裝材料620的邊緣。Please refer to FIGS. 85 and 86 . FIG. 85 is a schematic side view of the
因此,透過第六實施方式的封裝結構的形成方法S600,有利於提高封裝結構600的側面可銲接面積。因此,可提升梯狀引腳613與電路板的連接強度,以維持並增加設置於電路板的壽命,進一步提升板級的可靠度。Therefore, through the method S600 for forming the package structure of the sixth embodiment, it is beneficial to increase the side solderable area of the
請參照第87圖,第87圖繪示依照本發明第七實施方式中封裝結構的形成方法S700的流程示意圖。由第87圖可知,封裝結構的形成方法S700包含一蝕刻步驟S701、一模壓步驟S702、一雷射步驟S703、一電鍍步驟S704及一切割步驟S705。Please refer to FIG. 87. FIG. 87 is a schematic flowchart of a method S700 for forming a package structure according to a seventh embodiment of the present invention. As can be seen from FIG. 87 , the method S700 for forming the package structure includes an etching step S701 , a molding step S702 , a laser step S703 , a plating step S704 and a cutting step S705 .
請參照第88圖與第89圖,第88圖繪示第87圖第七實施方式中蝕刻步驟S701的示意圖,第89圖繪示第88圖第七實施方式中導線架710沿剖線89-89'的剖面示意圖。由第88圖與第89圖可知,蝕刻步驟S701中對導線架710的複數切割道711進行蝕刻。第七實施方式中,對導線架710的切割道711的上表面進行蝕刻形成一蝕刻槽712,且蝕刻深度可等於導線架710的厚度的一半,但並不以此為限。進一步來說,切割道711可具有複數凹陷部714,凹陷部714的凹陷深度可小於導線架710的厚度的一半,各凹陷部714的寬度可小於各蝕刻槽712的寬度,且凹陷部714位於切割道711的二側。具體而言,凹陷部714的寬度為L0,導線架710的厚度為d,其可滿足下列條件:0.5 d ≤ L0,但並不以此為限。Please refer to FIGS. 88 and 89. FIG. 88 shows a schematic diagram of the etching step S701 in the seventh embodiment in FIG. 87, and FIG. 89 shows the
請參照第90圖與第91圖,第90圖繪示第87圖第七實施方式中模壓步驟S702的示意圖,第91圖繪示第90圖第七實施方式中導線架710沿剖線91-91'的剖面示意圖。由第90圖與第91圖可知,塑膠封裝材料720於雷射步驟S703前覆蓋於導線架710。Please refer to FIGS. 90 and 91. FIG. 90 shows a schematic diagram of the molding step S702 in the seventh embodiment in FIG. 87, and FIG. 91 shows the
請參照第92圖與第93圖,第92圖繪示第87圖第七實施方式中雷射步驟S703的示意圖,第93圖繪示第92圖第七實施方式中導線架710沿剖線93-93'的剖面示意圖。由第92圖與第93圖可知,雷射步驟S703係雷射光束L移除覆蓋切割道711的一上表面的塑膠封裝材料720,其中塑膠封裝材料720僅部分被移除。值得一提的是,因雷射光束L照射於切割道711的上表面以移除塑膠封裝材料720,而設置於凹陷部714的塑膠封裝材料720不會被雷射光束L照射到,故設置於凹陷部714的塑膠封裝材料720則保留於其中。Please refer to FIGS. 92 and 93. FIG. 92 shows a schematic diagram of the laser step S703 in the seventh embodiment in FIG. 87, and FIG. 93 shows the
請參照下表七,表七為第七實施方式中雷射步驟S703所使用的雷射光束L的參數,但並不以表七中的參數為限。
進一步來說,透過雷射步驟S703可選擇移除的對象(如部分塑膠封裝材料720)與其深度,且雷射步驟S703不限於一道,亦可為二道以上,其取決於雷射光束L的能量與參數。藉此,可有效控制移除的範圍。具體而言,雷射步驟S703可由一道或多道雷射光束L所組成。舉例來說,多道雷射光束L可先由較小波長(如355奈米)的雷射光束L進行粗加工,接著再以較大波長(如532奈米或1064奈米)的雷射光束L進行細加工以達到較為精細的移除效果,但並不以此為限。Further, the object to be removed (eg part of the plastic packaging material 720 ) and its depth can be selected through the laser step S703 , and the laser step S703 is not limited to one, but can also be more than two, depending on the laser beam L. energy and parameters. Thereby, the range of removal can be effectively controlled. Specifically, the laser step S703 may consist of one or more laser beams L. For example, the multiple laser beams L can be rough processed by the laser beam L with a smaller wavelength (eg, 355 nm) first, and then the laser beam L with a larger wavelength (eg, 532 nm or 1064 nm) can be used for rough processing. The light beam L is finely processed to achieve a finer removal effect, but is not limited thereto.
請參照第94圖與第95圖,第94圖繪示第87圖第七實施方式中電鍍步驟S704的示意圖,第95圖繪示第94圖第七實施方式中導線架710沿剖線95-95'的剖面示意圖。由第94圖與第95圖可知,複數電鍍面730設置於導線架710上塑膠封裝材料720未覆蓋的複數區域。Please refer to FIGS. 94 and 95. FIG. 94 shows a schematic diagram of the electroplating step S704 in the seventh embodiment in FIG. 87, and FIG. 95 shows the
請參照第96圖、第97圖及第98圖,第96圖繪示第87圖第七實施方式中切割步驟S705的示意圖,第97圖繪示第96圖第七實施方式中封裝結構700沿剖線97-97'的剖面示意圖,第98圖繪示第96圖第七實施方式中封裝結構700沿剖線98-98'的剖面示意圖。由第96圖至第98圖可知,切割步驟S705係切割導線架710的切割道711以形成封裝結構700。詳細來說,導線架710的切割道711由一刀具切割,而刀具的切割寬度小於蝕刻步驟S701的蝕刻寬度(即蝕刻槽712的寬度),故形成突出引腳713,且電鍍面730設置於突出引腳713的外周。再者,因蝕刻步驟S701已使切割道711的厚度變薄,因此當切割步驟S705時可降低毛邊的產生。Please refer to FIG. 96 , FIG. 97 and FIG. 98 . FIG. 96 shows a schematic diagram of the cutting step S705 in the seventh embodiment in FIG. 87 , and FIG. 97 shows the
請參照第99圖與第100圖,第99圖繪示第87圖第七實施方式中封裝結構700的側面示意圖,第100圖繪示第87圖第七實施方式中封裝結構700的部分示意圖。由第99圖與第100圖可知,封裝結構700包含複數突出引腳713,突出引腳713突出於塑膠封裝材料720的邊緣,各個突出引腳713包含七電鍍面730,且靠近封裝結構700下表面的突出引腳713突出塑膠封裝材料720的邊緣。Please refer to FIGS. 99 and 100. FIG. 99 is a schematic side view of the
因此,透過第七實施方式的封裝結構的形成方法S700,有利於提高封裝結構700的側面可銲接面積。並且,由第97圖可知,因突出引腳713突出於塑膠封裝材料720與塑膠封裝材料720所覆蓋的部分呈現類似鷗翼型(gull-wing shape),故突出引腳713更具有機械強度。因此,可提升突出引腳713與電路板的連接強度,以維持並增加設置於電路板的壽命,進一步提升板級的可靠度。Therefore, through the method S700 for forming the package structure of the seventh embodiment, it is beneficial to increase the side solderable area of the
請參照第101圖,第101圖繪示依照本發明第八實施方式中封裝結構的形成方法S800的流程示意圖。由第101圖可知,封裝結構的形成方法S800包含一蝕刻步驟S801、一模壓步驟S802、一雷射步驟S803、一電鍍步驟S804及一切割步驟S805。Please refer to FIG. 101 . FIG. 101 is a schematic flowchart of a method S800 for forming a package structure according to an eighth embodiment of the present invention. As can be seen from FIG. 101 , the method S800 for forming the package structure includes an etching step S801 , a molding step S802 , a laser step S803 , a plating step S804 and a cutting step S805 .
請參照第102圖與第103圖,第102圖繪示第101圖第八實施方式中蝕刻步驟S801的示意圖,第103圖繪示第102圖第八實施方式中導線架810沿剖線103-103'的剖面示意圖。由第102圖與第103圖可知,蝕刻步驟S801中對導線架810的複數切割道811進行蝕刻。第八實施方式中,對導線架810的切割道811的上表面進行蝕刻形成一蝕刻槽812,且蝕刻深度可等於導線架810的厚度的一半,但並不以此為限。進一步來說,切割道811可具有複數凹陷部814,凹陷部814的凹陷深度可小於導線架810的厚度的一半,各凹陷部814的寬度可小於各蝕刻槽812的寬度,且凹陷部814位於切割道811的二側。Please refer to FIG. 102 and FIG. 103. FIG. 102 shows a schematic diagram of the etching step S801 in the eighth embodiment in FIG. 101, and FIG. 103 shows the
請參照第104圖與第105圖,第104圖繪示第101圖第八實施方式中模壓步驟S802的示意圖,第105圖繪示第104圖第八實施方式中導線架810沿剖線105-105'的剖面示意圖。由第104圖與第105圖可知,塑膠封裝材料820於雷射步驟S803前覆蓋於導線架810。Please refer to FIGS. 104 and 105. FIG. 104 shows a schematic diagram of the molding step S802 in the eighth embodiment in FIG. 101, and FIG. 105 shows the
請參照第106圖與第107圖,第106圖繪示第101圖第八實施方式中雷射步驟S803的示意圖,第107圖繪示第106圖第八實施方式中導線架810沿剖線107-107'的剖面示意圖。由第106圖與第107圖可知,雷射步驟S803係雷射光束L移除覆蓋切割道811的一上表面的塑膠封裝材料820,其中塑膠封裝材料820僅部分被移除。值得一提的是,因雷射光束L照射於切割道811的上表面以移除塑膠封裝材料820,而設置於凹陷部814的塑膠封裝材料820不會被雷射光束L照射到,故設置於凹陷部814的塑膠封裝材料820則保留於其中。Please refer to FIG. 106 and FIG. 107 , FIG. 106 is a schematic diagram of the laser step S803 in the eighth embodiment in FIG. 101 , and FIG. 107 is the
請參照下表八,表八為第八實施方式中雷射步驟S803所使用的雷射光束L的參數,但並不以表八中的參數為限。
進一步來說,透過雷射步驟S803可選擇移除的對象(如部分塑膠封裝材料820)與其深度,且雷射步驟S803不限於一道,亦可為二道以上,其取決於雷射光束L的能量與參數。藉此,可有效控制移除的範圍。具體而言,雷射步驟S803可由一道或多道雷射光束L所組成。舉例來說,多道雷射光束L可先由較小波長(如355奈米)的雷射光束L進行粗加工,接著再以較大波長(如532奈米或1064奈米)的雷射光束L進行細加工以達到較為精細的移除效果,但並不以此為限。Further, the object to be removed (eg part of the plastic packaging material 820 ) and its depth can be selected through the laser step S803 , and the laser step S803 is not limited to one, but can also be more than two, which depends on the laser beam L. energy and parameters. Thereby, the range of removal can be effectively controlled. Specifically, the laser step S803 may consist of one or more laser beams L. For example, the multiple laser beams L can be rough processed by the laser beam L with a smaller wavelength (eg, 355 nm) first, and then the laser beam L with a larger wavelength (eg, 532 nm or 1064 nm) can be used for rough processing. The light beam L is finely processed to achieve a finer removal effect, but is not limited thereto.
請參照第108圖與第109圖,第108圖繪示第101圖第八實施方式中電鍍步驟S804的示意圖,第109圖繪示第108圖第八實施方式中導線架810沿剖線109-109'的剖面示意圖。由第108圖與第109圖可知,複數電鍍面830設置於導線架810上塑膠封裝材料820未覆蓋的複數區域。Please refer to FIGS. 108 and 109. FIG. 108 shows a schematic diagram of the electroplating step S804 in the eighth embodiment in FIG. 101, and FIG. 109 shows the
請參照第110圖、第111圖及第112圖,第110圖繪示第101圖第八實施方式中切割步驟S805的示意圖,第111圖繪示第110圖第八實施方式中封裝結構800沿剖線111-111'的剖面示意圖,第112圖繪示第110圖第八實施方式中封裝結構800沿剖線112-112'的剖面示意圖。由第110圖至第112圖可知,切割步驟S805係切割導線架810的切割道811以形成封裝結構800。詳細來說,導線架810的切割道811由一刀具切割,而刀具的切割寬度小於蝕刻步驟S801的蝕刻寬度(即蝕刻槽812的寬度),故形成梯狀引腳813,且電鍍面830設置於梯狀引腳813的外周。再者,因蝕刻步驟S801已使切割道811的厚度變薄,因此當切割步驟S805時可降低毛邊的產生。Please refer to FIG. 110 , FIG. 111 and FIG. 112 . FIG. 110 is a schematic diagram of the cutting step S805 in the eighth embodiment shown in FIG. 101 , and FIG. 111 is a schematic diagram of the
請參照第113圖與第114圖,第113圖繪示第101圖第八實施方式中封裝結構800的側面示意圖,第114圖繪示第101圖第八實施方式中封裝結構800的部分示意圖。由第113圖與第114圖可知,封裝結構800包含複數梯狀引腳813,梯狀引腳813突出於塑膠封裝材料820的邊緣,各個梯狀引腳813包含六電鍍面830,且靠近封裝結構800下表面的梯狀引腳813突出塑膠封裝材料820的邊緣。Please refer to FIGS. 113 and 114 . FIG. 113 is a schematic side view of the
因此,透過第八實施方式的封裝結構的形成方法S800,有利於提高封裝結構800的側面可銲接面積。並且,由第111圖可知,因梯狀引腳813突出於塑膠封裝材料820與塑膠封裝材料820所覆蓋的部分呈現類似鷗翼型,故梯狀引腳813更具有機械強度。因此,可提升梯狀引腳813與電路板的連接強度,以維持並增加設置於電路板的壽命,進一步提升板級的可靠度。Therefore, through the method S800 for forming the package structure of the eighth embodiment, it is beneficial to increase the side solderable area of the
請參照第115圖,第115圖繪示依照本發明第九實施方式中封裝結構的形成方法S900的流程示意圖。由第115圖可知,封裝結構的形成方法S900包含一蝕刻步驟S901、一模壓步驟S902、一雷射步驟、一電鍍步驟S905及一切割步驟S906,其中雷射步驟可包含一第一雷射步驟S903與一第二雷射步驟S904,且第二雷射步驟S904於第一雷射步驟S903後進行。Please refer to FIG. 115 . FIG. 115 is a schematic flowchart of a method S900 for forming a package structure according to the ninth embodiment of the present invention. As can be seen from FIG. 115, the method S900 for forming the package structure includes an etching step S901, a molding step S902, a laser step, a plating step S905 and a cutting step S906, wherein the laser step may include a first laser step S903 and a second laser step S904, and the second laser step S904 is performed after the first laser step S903.
請參照第116圖與第117圖,第116圖繪示第115圖第九實施方式中蝕刻步驟S901的示意圖,第117圖繪示第116圖第九實施方式中導線架910沿剖線117-117'的剖面示意圖。由第116圖與第117圖可知,蝕刻步驟S901中對導線架910的複數切割道911進行蝕刻。第九實施方式中,對導線架910的切割道911的上表面進行蝕刻形成一蝕刻槽912,且蝕刻深度可等於導線架910的厚度的一半,但並不以此為限。進一步來說,切割道911可具有複數凹陷部914,凹陷部914的凹陷深度可小於導線架910的厚度的一半,各凹陷部914的寬度可等於各蝕刻槽912的寬度,且凹陷部914位於切割道911的二側。具體而言,凹陷部914的寬度為L0,導線架910的厚度為d,其可滿足下列條件:0.5 d ≤ L0,但並不以此為限。Please refer to FIGS. 116 and 117. FIG. 116 is a schematic diagram of the etching step S901 in the ninth embodiment shown in FIG. 115, and FIG. 117 is a schematic diagram of the
請參照第118圖與第119圖,第118圖繪示第115圖第九實施方式中模壓步驟S902的示意圖,第119圖繪示第118圖第九實施方式中導線架910沿剖線119-119'的剖面示意圖。由第118圖與第119圖可知,塑膠封裝材料920於雷射步驟前覆蓋於導線架910。Please refer to FIG. 118 and FIG. 119. FIG. 118 is a schematic diagram of the molding step S902 in the ninth embodiment shown in FIG. 115, and FIG. 119 shows the
請參照第120圖與第121圖,第120圖繪示第115圖第九實施方式中第一雷射步驟S903的示意圖,第121圖繪示第120圖第九實施方式中導線架910沿剖線121-121'的剖面示意圖。由第120圖與第121圖可知,雷射步驟係以一雷射光束L移除覆蓋切割道911上的塑膠封裝材料920。具體來說,第九實施方式中,第一雷射步驟S903係雷射光束L移除覆蓋切割道911的一上表面的塑膠封裝材料920,且塑膠封裝材料920僅部分被移除。值得一提的是,因雷射光束L照射於切割道911的上表面以移除塑膠封裝材料920,而設置於凹陷部914的塑膠封裝材料920不會被雷射光束L照射到,故設置於凹陷部914的塑膠封裝材料920則保留於其中。Please refer to FIG. 120 and FIG. 121 , FIG. 120 is a schematic diagram of the first laser step S903 in the ninth embodiment in FIG. 115 , and FIG. 121 is a cross-section of the
請參照第122圖與第123圖,第122圖繪示第115圖第九實施方式中第二雷射步驟S904的示意圖,第123圖繪示第122圖第九實施方式中導線架910沿剖線123-123'的剖面示意圖。由第122圖與第123圖可知,第二雷射步驟S904為雷射光束L移除覆蓋切割道911的下表面的塑膠封裝材料920,且塑膠封裝材料920僅部分被移除。Please refer to FIGS. 122 and 123. FIG. 122 is a schematic diagram of the second laser step S904 in the ninth embodiment shown in FIG. 115, and FIG. 123 is a cross-section of the
請參照下表九,表九為第九實施方式中第一雷射步驟S903與第二雷射步驟S904所使用的雷射光束L的參數,但並不以表九中的參數為限。
進一步來說,透過第一雷射步驟S903與第二雷射步驟S904可選擇移除的對象(如部分塑膠封裝材料920)與其深度。藉此,可有效控制移除的範圍。具體而言,第一雷射步驟S903與第二雷射步驟S904皆可由一道或多道雷射光束L所組成。舉例來說,多道雷射光束L可先由較小波長(如355奈米)的雷射光束L進行粗加工,接著再以較大波長(如532奈米或1064奈米)的雷射光束L進行細加工以達到較為精細的移除效果,但並不以此為限。Further, through the first laser step S903 and the second laser step S904, the object to be removed (eg, part of the plastic packaging material 920) and its depth can be selected. Thereby, the range of removal can be effectively controlled. Specifically, both the first laser step S903 and the second laser step S904 may be composed of one or more laser beams L. For example, the multiple laser beams L can be rough processed by the laser beam L with a smaller wavelength (eg, 355 nm) first, and then the laser beam L with a larger wavelength (eg, 532 nm or 1064 nm) can be used for rough processing. The light beam L is finely processed to achieve a finer removal effect, but is not limited thereto.
請參照第124圖與第125圖,第124圖繪示第115圖第九實施方式中電鍍步驟S905的示意圖,第125圖繪示第124圖第九實施方式中導線架910沿剖線125-125'的剖面示意圖。由第124圖與第125圖可知,複數電鍍面930設置於導線架910上塑膠封裝材料920未覆蓋的複數區域。Please refer to FIG. 124 and FIG. 125. FIG. 124 shows a schematic diagram of the electroplating step S905 in the ninth embodiment in FIG. 115, and FIG. 125 shows the
請參照第126圖、第127圖及第128圖,第126圖繪示第115圖第九實施方式中切割步驟S906的示意圖,第127圖繪示第126圖第九實施方式中封裝結構900沿剖線127-127'的剖面示意圖,第128圖繪示第126圖第九實施方式中封裝結構900沿剖線128-128'的剖面示意圖。由第126圖至第128圖可知,切割步驟S906係切割導線架910的切割道911以形成封裝結構900。詳細來說,導線架910的切割道911由一刀具切割,而刀具的切割寬度小於蝕刻步驟S901的蝕刻寬度(即蝕刻槽912的寬度),故形成突出引腳913,且電鍍面930設置於突出引腳913的外周。再者,因蝕刻步驟S901已使切割道911的厚度變薄,因此當切割步驟S906時可降低毛邊的產生。Please refer to FIG. 126 , FIG. 127 and FIG. 128 . FIG. 126 is a schematic diagram of the cutting step S906 in the ninth embodiment shown in FIG. 115 , and FIG. 127 is a schematic diagram of the
請參照第129圖與第130圖,第129圖繪示第115圖第九實施方式中封裝結構900的側面示意圖,第130圖繪示第115圖第九實施方式中封裝結構900的部分示意圖。由第129圖與第130圖可知,封裝結構900包含複數突出引腳913,突出引腳913突出於塑膠封裝材料920的邊緣,各個突出引腳913包含九電鍍面930,且靠近封裝結構900下表面的突出引腳913突出塑膠封裝材料920的邊緣。Please refer to FIGS. 129 and 130. FIG. 129 is a schematic side view of the
因此,透過第九實施方式的封裝結構的形成方法S900,有利於提高封裝結構900的側面可銲接面積。並且,由第127圖可知,因突出引腳913突出於塑膠封裝材料920與塑膠封裝材料920所覆蓋的部分呈現類似鷗翼型,故突出引腳913更具有機械強度。因此,可提升突出引腳913與電路板的連接強度,以維持並增加設置於電路板的壽命,進一步提升板級的可靠度。Therefore, through the method S900 for forming the package structure of the ninth embodiment, it is beneficial to increase the side solderable area of the
請參照第131圖,第131圖繪示依照本發明第十實施方式中封裝結構的形成方法S1000的流程示意圖。由第131圖可知,封裝結構的形成方法S1000包含一蝕刻步驟S1001、一模壓步驟S1002、一雷射步驟、一電鍍步驟S1005及一切割步驟S1006,其中雷射步驟可包含一第一雷射步驟S1003與一第二雷射步驟S1004,且第二雷射步驟S1004於第一雷射步驟S1003後進行。Please refer to FIG. 131 . FIG. 131 is a schematic flowchart of a method S1000 for forming a package structure according to the tenth embodiment of the present invention. As can be seen from FIG. 131 , the method S1000 for forming the package structure includes an etching step S1001, a molding step S1002, a laser step, a plating step S1005 and a cutting step S1006, wherein the laser step may include a first laser step S1003 and a second laser step S1004, and the second laser step S1004 is performed after the first laser step S1003.
請參照第132圖與第133圖,第132圖繪示第131圖第十實施方式中蝕刻步驟S1001的示意圖,第133圖繪示第132圖第十實施方式中導線架1010沿剖線133-133'的剖面示意圖。由第132圖與第133圖可知,蝕刻步驟S1001中對導線架1010的複數切割道1011進行蝕刻。第十實施方式中,對導線架1010的切割道1011的上表面進行蝕刻形成一蝕刻槽1012,且蝕刻深度可等於導線架1010的厚度的一半,但並不以此為限。進一步來說,切割道1011可具有複數凹陷部1014,凹陷部1014的凹陷深度可小於導線架1010的厚度的一半,各凹陷部1014的寬度可等於各蝕刻槽1012的寬度,且凹陷部1014位於切割道1011的二側。Please refer to FIG. 132 and FIG. 133. FIG. 132 shows a schematic diagram of the etching step S1001 in FIG. 131 in the tenth embodiment, and FIG. 133 shows the
請參照第134圖與第135圖,第134圖繪示第131圖第十實施方式中模壓步驟S1002的示意圖,第135圖繪示第134圖第十實施方式中導線架1010沿剖線135-135'的剖面示意圖。由第134圖與第135圖可知,塑膠封裝材料1020於雷射步驟前覆蓋於導線架1010。Please refer to FIGS. 134 and 135. FIG. 134 shows a schematic diagram of the molding step S1002 in the tenth embodiment in FIG. 131, and FIG. 135 shows the
請參照第136圖與第137圖,第136圖繪示第131圖第十實施方式中第一雷射步驟S1003的示意圖,第137圖繪示第136圖第十實施方式中導線架1010沿剖線137-137'的剖面示意圖。由第136圖與第137圖可知,雷射步驟係以一雷射光束L移除覆蓋切割道1011上的塑膠封裝材料1020。具體來說,第十實施方式中,第一雷射步驟S1003係雷射光束L移除覆蓋切割道1011的一上表面的塑膠封裝材料1020,且塑膠封裝材料1020僅部分被移除。值得一提的是,因雷射光束L照射於切割道1011的上表面以移除塑膠封裝材料1020,而設置於凹陷部1014的塑膠封裝材料1020不會被雷射光束L照射到,故設置於凹陷部1014的塑膠封裝材料1020則保留於其中。Please refer to FIGS. 136 and 137. FIG. 136 is a schematic diagram of the first laser step S1003 in the tenth embodiment shown in FIG. 131, and FIG. 137 is a cross-section of the
請參照第138圖與第139圖,第138圖繪示第131圖第十實施方式中第二雷射步驟S1004的示意圖,第139圖繪示第138圖第十實施方式中導線架1010沿剖線139-139'的剖面示意圖。由第138圖與第139圖可知,第二雷射步驟S1004為雷射光束L移除覆蓋切割道1011的下表面的塑膠封裝材料1020,且塑膠封裝材料1020僅部分被移除。Please refer to FIGS. 138 and 139. FIG. 138 is a schematic diagram of the second laser step S1004 in FIG. 131 in the tenth embodiment, and FIG. 139 is a cross-section of the
請參照下表十,表十為第十實施方式中第一雷射步驟S1003與第二雷射步驟S1004所使用的雷射光束L的參數,但並不以表十中的參數為限。
進一步來說,透過第一雷射步驟S1003與第二雷射步驟S1004可選擇移除的對象(如部分塑膠封裝材料1020)與其深度。藉此,可有效控制移除的範圍。具體而言,第一雷射步驟S1003與第二雷射步驟S1004皆可由一道或多道雷射光束L所組成。舉例來說,多道雷射光束L可先由較小波長(如355奈米)的雷射光束L進行粗加工,接著再以較大波長(如532奈米或1064奈米)的雷射光束L進行細加工以達到較為精細的移除效果,但並不以此為限。Further, through the first laser step S1003 and the second laser step S1004, the object to be removed (eg, part of the plastic packaging material 1020) and its depth can be selected. Thereby, the range of removal can be effectively controlled. Specifically, both the first laser step S1003 and the second laser step S1004 may be composed of one or more laser beams L. For example, the multiple laser beams L can be rough processed by the laser beam L with a smaller wavelength (eg, 355 nm) first, and then the laser beam L with a larger wavelength (eg, 532 nm or 1064 nm) can be used for rough processing. The light beam L is finely processed to achieve a finer removal effect, but is not limited thereto.
請參照第140圖與第141圖,第140圖繪示第131圖第十實施方式中電鍍步驟S1005的示意圖,第141圖繪示第140圖第十實施方式中導線架1010沿剖線141-141'的剖面示意圖。由第140圖與第141圖可知,複數電鍍面1030設置於導線架1010上塑膠封裝材料1020未覆蓋的複數區域。Please refer to FIG. 140 and FIG. 141. FIG. 140 is a schematic diagram of the electroplating step S1005 in the tenth embodiment shown in FIG. 131, and FIG. 141 is a schematic diagram of the
請參照第142圖、第143圖及第144圖,第142圖繪示第131圖第十實施方式中切割步驟S1006的示意圖,第143圖繪示第142圖第十實施方式中封裝結構1000沿剖線143-143'的剖面示意圖,第144圖繪示第142圖第十實施方式中封裝結構1000沿剖線144-144'的剖面示意圖。由第142圖至第144圖可知,切割步驟S1006係切割導線架1010的切割道1011以形成封裝結構1000。詳細來說,導線架1010的切割道1011由一刀具切割,而刀具的切割寬度小於蝕刻槽1012的寬度(即蝕刻槽1012的寬度),故形成突出引腳1013,且電鍍面1030設置於突出引腳1013的外周。再者,因蝕刻步驟S1001已使切割道1011的厚度變薄,因此當切割步驟S1006時可降低毛邊的產生。Please refer to FIG. 142 , FIG. 143 and FIG. 144 . FIG. 142 is a schematic diagram of the cutting step S1006 in the tenth embodiment shown in FIG. 131 , and FIG. 143 is a schematic diagram of the
請參照第145圖與第146圖,第145圖繪示第131圖第十實施方式中封裝結構1000的側面示意圖,第146圖繪示第131圖第十實施方式中封裝結構1000的部分示意圖。由第145圖與第146圖可知,封裝結構1000包含複數突出引腳1013,突出引腳1013突出於塑膠封裝材料1020的邊緣,各個突出引腳1013包含八電鍍面1030,且靠近封裝結構1000下表面的突出引腳1013突出塑膠封裝材料1020的邊緣。Please refer to FIGS. 145 and 146 . FIG. 145 is a schematic side view of the
因此,透過第十實施方式的封裝結構的形成方法S1000,有利於提高封裝結構1000的側面可銲接面積。並且,由第143圖可知,因突出引腳1013突出於塑膠封裝材料1020與塑膠封裝材料1020所覆蓋的部分呈現類似鷗翼型,故突出引腳1013更具有機械強度。因此,可提升突出引腳1013與電路板的連接強度,以維持並增加設置於電路板的壽命,進一步提升板級的可靠度。Therefore, through the method S1000 for forming the package structure of the tenth embodiment, it is beneficial to increase the side solderable area of the
請參照第147圖,第147圖繪示依照本發明第十一實施方式中封裝結構的形成方法S1100的流程示意圖。由第147圖可知,封裝結構的形成方法S1100包含一蝕刻步驟S1101、一模壓步驟S1102、一雷射步驟、一電鍍步驟S1105及一切割步驟S1106,其中雷射步驟可包含一第一雷射步驟S1103與一第二雷射步驟S1104,且第二雷射步驟S1104於第一雷射步驟S1103後進行。Please refer to FIG. 147 . FIG. 147 is a schematic flowchart of a method S1100 for forming a package structure according to an eleventh embodiment of the present invention. As can be seen from FIG. 147, the method S1100 for forming the package structure includes an etching step S1101, a molding step S1102, a laser step, a plating step S1105 and a cutting step S1106, wherein the laser step may include a first laser step S1103 and a second laser step S1104, and the second laser step S1104 is performed after the first laser step S1103.
請參照第148圖與第149圖,第148圖繪示第147圖第十一實施方式中蝕刻步驟S1101的示意圖,第149圖繪示第148圖第十一實施方式中導線架1110沿剖線149-149'的剖面示意圖。由第148圖與第149圖可知,蝕刻步驟S1101中對導線架1110的複數切割道1111進行蝕刻。第十一實施方式中,對導線架1110的切割道1111的下表面進行蝕刻形成二蝕刻槽1112,且蝕刻深度可小於導線架1110的厚度的一半,但並不以此為限。Please refer to FIG. 148 and FIG. 149. FIG. 148 is a schematic diagram of the etching step S1101 in FIG. 147 in the eleventh embodiment, and FIG. 149 shows the
請參照第150圖與第151圖,第150圖繪示第147圖第十一實施方式中模壓步驟S1102的示意圖,第151圖繪示第150圖第十一實施方式中導線架1110沿剖線151-151'的剖面示意圖。由第150圖與第151圖可知,塑膠封裝材料1120於雷射步驟前覆蓋於導線架1110。Please refer to FIG. 150 and FIG. 151. FIG. 150 is a schematic diagram of the molding step S1102 in the eleventh embodiment shown in FIG. 147, and FIG. 151 is a section line of the
請參照第152圖與第153圖,第152圖繪示第147圖第十一實施方式中第一雷射步驟S1103的示意圖,第153圖繪示第152圖第十一實施方式中導線架1110沿剖線153-153'的剖面示意圖。由第152圖與第153圖可知,雷射步驟係以一雷射光束L移除覆蓋切割道1111上的塑膠封裝材料1120。具體來說,第十一實施方式中,第一雷射步驟S1103係雷射光束L移除覆蓋切割道1111的一上表面的塑膠封裝材料1120,且塑膠封裝材料1120僅部分被移除。值得一提的是,因雷射光束L照射於切割道1111的上表面以移除塑膠封裝材料1120,而設置於蝕刻槽1112的塑膠封裝材料1120不會被雷射光束L照射到,故設置於蝕刻槽1112的塑膠封裝材料1120則保留於其中。Please refer to FIG. 152 and FIG. 153 , FIG. 152 is a schematic diagram of the first laser step S1103 in FIG. 147 in the eleventh embodiment, and FIG. 153 is the
請參照第154圖與第155圖,第154圖繪示第147圖第十一實施方式中第二雷射步驟S1104的示意圖,第155圖繪示第154圖第十一實施方式中導線架1110沿剖線155-155'的剖面示意圖。由第154圖與第155圖可知,第二雷射步驟S1104為雷射光束L移除覆蓋切割道1111的下表面的塑膠封裝材料1120,且塑膠封裝材料1120僅部分被移除。Please refer to FIG. 154 and FIG. 155. FIG. 154 is a schematic diagram of the second laser step S1104 in FIG. 147 in the eleventh embodiment, and FIG. 155 is the
請參照下表十一,表十一為第十一實施方式中第一雷射步驟S1103與第二雷射步驟S1104所使用的雷射光束L的參數,但並不以表十一中的參數為限。
進一步來說,透過第一雷射步驟S1103與第二雷射步驟S1104可選擇移除的對象(如部分塑膠封裝材料1120)與其深度。藉此,可有效控制移除的範圍。具體而言,第一雷射步驟S1103與第二雷射步驟S1104皆可由一道或多道雷射光束L所組成。舉例來說,多道雷射光束L可先由較小波長(如355奈米)的雷射光束L進行粗加工,接著再以較大波長(如532奈米或1064奈米)的雷射光束L進行細加工以達到較為精細的移除效果,但並不以此為限。Further, through the first laser step S1103 and the second laser step S1104, the object to be removed (eg, part of the plastic packaging material 1120) and its depth can be selected. Thereby, the range of removal can be effectively controlled. Specifically, both the first laser step S1103 and the second laser step S1104 may be composed of one or more laser beams L. For example, the multiple laser beams L can be rough processed by the laser beam L with a smaller wavelength (eg, 355 nm) first, and then the laser beam L with a larger wavelength (eg, 532 nm or 1064 nm) can be used for rough processing. The light beam L is finely processed to achieve a finer removal effect, but is not limited thereto.
請參照第156圖與第157圖,第156圖繪示第147圖第十一實施方式中電鍍步驟S1105的示意圖,第157圖繪示第156圖第十一實施方式中導線架1110沿剖線157-157'的剖面示意圖。由第156圖與第157圖可知,複數電鍍面1130設置於導線架1110上塑膠封裝材料1120未覆蓋的複數區域。Please refer to FIG. 156 and FIG. 157. FIG. 156 is a schematic diagram of the electroplating step S1105 in the eleventh embodiment in FIG. 147, and FIG. 157 is the
請參照第158圖、第159圖及第160圖,第158圖繪示第147圖第十一實施方式中切割步驟S1106的示意圖,第159圖繪示第158圖第十一實施方式中封裝結構1100沿剖線159-159'的剖面示意圖,第160圖繪示第158圖第十一實施方式中封裝結構1100沿剖線160-160'的剖面示意圖。由第158圖至第160圖可知,切割步驟S1106係切割導線架1110的切割道1111以形成封裝結構1100。詳細來說,導線架1110的切割道1111由一刀具切割,故形成突出引腳1113,且電鍍面1130設置於突出引腳1113的外周。再者,突出引腳1113的寬度較寬,因此當切割步驟S1106時可降低毛邊的產生。Please refer to FIG. 158 , FIG. 159 and FIG. 160 . FIG. 158 is a schematic diagram of the cutting step S1106 in the eleventh embodiment shown in FIG. 147 , and FIG. 159 is a schematic diagram of the package structure in FIG. 158 in the eleventh embodiment. 1100 is a schematic cross-sectional view along the line 159-159', and FIG. 160 is a schematic cross-sectional view of the
請參照第161圖與第162圖,第161圖繪示第147圖第十一實施方式中封裝結構1100的側面示意圖,第162圖繪示第147圖第十一實施方式中封裝結構1100的部分示意圖。由第161圖與第162圖可知,封裝結構1100包含複數突出引腳1113,突出引腳1113突出於塑膠封裝材料1120的邊緣,各個突出引腳1113包含六電鍍面1130,且靠近封裝結構1100下表面的突出引腳1113突出塑膠封裝材料1120的邊緣。Please refer to FIGS. 161 and 162. FIG. 161 is a schematic side view of the
因此,透過第十一實施方式的封裝結構的形成方法S1100,有利於提高封裝結構1100的側面可銲接面積。並且,由第159圖可知,因突出引腳1113突出於塑膠封裝材料1120與塑膠封裝材料1120所覆蓋的部分呈現類似鷗翼型,故突出引腳1113更具有機械強度。因此,可提升突出引腳1113與電路板的連接強度,以維持並增加設置於電路板的壽命,進一步提升板級的可靠度。Therefore, through the method S1100 for forming the package structure of the eleventh embodiment, it is beneficial to increase the side solderable area of the
請參照第163圖,第163圖繪示依照本發明第十二實施方式中封裝結構的形成方法S1200的流程示意圖。由第163圖可知,封裝結構的形成方法S1200包含一蝕刻步驟S1201、一模壓步驟S1202、一雷射步驟S1203、一電鍍步驟S1204及一切割步驟S1205。Please refer to FIG. 163 , which is a schematic flowchart of a method S1200 for forming a package structure according to a twelfth embodiment of the present invention. As can be seen from FIG. 163 , the method S1200 for forming the package structure includes an etching step S1201 , a molding step S1202 , a laser step S1203 , an electroplating step S1204 and a cutting step S1205 .
請參照第164圖與第165圖,第164圖繪示第163圖第十二實施方式中蝕刻步驟S1201的示意圖,第165圖繪示第164圖第十二實施方式中導線架1210沿剖線165-165'的剖面示意圖。由第164圖與第165圖可知,蝕刻步驟S1201中對導線架1210的複數切割道1211進行蝕刻。第十二實施方式中,對導線架1210的切割道1211的下表面進行蝕刻形成二蝕刻槽1212,且蝕刻深度可小於導線架1210的厚度的一半,但並不以此為限。Please refer to FIG. 164 and FIG. 165. FIG. 164 is a schematic diagram of the etching step S1201 in the twelfth embodiment in FIG. 163, and FIG. 165 is the
請參照第166圖與第167圖,第166圖繪示第163圖第十二實施方式中模壓步驟S1202的示意圖,第167圖繪示第166圖第十二實施方式中導線架1210沿剖線167-167'的剖面示意圖。由第166圖與第167圖可知,塑膠封裝材料1220於雷射步驟S1203前覆蓋於導線架1210。Please refer to FIG. 166 and FIG. 167 , FIG. 166 is a schematic diagram of the molding step S1202 in the twelfth embodiment in FIG. 163 , and FIG. 167 is the
請參照第168圖與第169圖,第168圖繪示第163圖第十二實施方式中雷射步驟S1203的示意圖,第169圖繪示第168圖第十二實施方式中導線架1210沿剖線169-169'的剖面示意圖。由第168圖與第169圖可知,雷射步驟S1203係雷射光束L移除覆蓋切割道1211的一上表面的塑膠封裝材料1220,其中塑膠封裝材料1220僅部分被移除。值得一提的是,因雷射光束L照射於切割道1211的上表面以移除塑膠封裝材料1220,而設置於蝕刻槽1212的塑膠封裝材料1220不會被雷射光束L照射到,故設置於蝕刻槽1212的塑膠封裝材料1220則保留於其中。Please refer to FIGS. 168 and 169. FIG. 168 is a schematic diagram of the laser step S1203 in FIG. 163 in the twelfth embodiment, and FIG. 169 is a cross-section of the
請參照下表十二,表十二為第十二實施方式中雷射步驟S1203所使用的雷射光束L的參數,但並不以表十二中的參數為限。
進一步來說,透過雷射步驟S1203可選擇移除的對象(如部分塑膠封裝材料1220)與其深度,且雷射步驟S1203不限於一道,亦可為二道以上,其取決於雷射光束L的能量與參數。藉此,可有效控制移除的範圍。具體而言,雷射步驟S1203可由一道或多道雷射光束L所組成。舉例來說,多道雷射光束L可先由較小波長(如355奈米)的雷射光束L進行粗加工,接著再以較大波長(如532奈米或1064奈米)的雷射光束L進行細加工以達到較為精細的移除效果,但並不以此為限。Further, through the laser step S1203, the object to be removed (such as part of the plastic packaging material 1220) and its depth can be selected, and the laser step S1203 is not limited to one, but can also be more than two, which depends on the laser beam L. energy and parameters. Thereby, the range of removal can be effectively controlled. Specifically, the laser step S1203 may consist of one or more laser beams L. For example, the multiple laser beams L can be rough processed by the laser beam L with a smaller wavelength (eg, 355 nm) first, and then the laser beam L with a larger wavelength (eg, 532 nm or 1064 nm) can be used for rough processing. The light beam L is finely processed to achieve a finer removal effect, but is not limited thereto.
請參照第170圖與第171圖,第170圖繪示第163圖第十二實施方式中電鍍步驟S1204的示意圖,第171圖繪示第170圖第十二實施方式中導線架1210沿剖線171-171'的剖面示意圖。由第170圖與第171圖可知,複數電鍍面1230設置於導線架1210上塑膠封裝材料1220未覆蓋的複數區域。Please refer to FIG. 170 and FIG. 171 , FIG. 170 is a schematic diagram of the electroplating step S1204 in the twelfth embodiment in FIG. 163 , and FIG. 171 is the
請參照第172圖、第173圖及第174圖,第172圖繪示第163圖第十二實施方式中切割步驟S1205的示意圖,第173圖繪示第172圖第十二實施方式中封裝結構1200沿剖線173-173'的剖面示意圖,第174圖繪示第172圖第十二實施方式中封裝結構1200沿剖線174-174'的剖面示意圖。由第172圖至第174圖可知,切割步驟S1205係切割導線架1210的切割道1211以形成封裝結構1200。詳細來說,導線架1210的切割道1211由一刀具切割,故形成突出引腳1213,且電鍍面1230設置於突出引腳1213的外周。再者,突出引腳1213的寬度較寬,因此當切割步驟S1205時可降低毛邊的產生。Please refer to FIG. 172 , FIG. 173 , and FIG. 174 , FIG. 172 is a schematic diagram of the cutting step S1205 in the twelfth embodiment in FIG. 163 , and FIG. 173 is the package structure in FIG. 172 in the twelfth embodiment. 1200 is a schematic cross-sectional view along the line 173-173', and FIG. 174 is a schematic cross-sectional view of the
請參照第175圖與第176圖,第175圖繪示第163圖第十二實施方式中封裝結構1200的側面示意圖,第176圖繪示第163圖第十二實施方式中封裝結構1200的部分示意圖。由第175圖與第176圖可知,封裝結構1200包含複數突出引腳1213,突出引腳1213突出於塑膠封裝材料1220的邊緣,各個突出引腳1213包含四電鍍面1230,且靠近封裝結構1200下表面的突出引腳1213突出塑膠封裝材料1220的邊緣。Please refer to FIGS. 175 and 176. FIG. 175 is a schematic side view of the
因此,透過第十二實施方式的封裝結構的形成方法S1200,有利於提高封裝結構1200的側面可銲接面積。並且,由第173圖可知,因突出引腳1213突出於塑膠封裝材料1220與塑膠封裝材料1220所覆蓋的部分呈現類似鷗翼型,故突出引腳1213更具有機械強度。因此,可提升突出引腳1213與電路板的連接強度,以維持並增加設置於電路板的壽命,進一步提升板級的可靠度。Therefore, through the method S1200 for forming the package structure of the twelfth embodiment, it is beneficial to increase the side solderable area of the
請參照第177圖,第177圖繪示依照本發明第十三實施方式中封裝結構的形成方法S1300的流程示意圖。由第177圖可知,封裝結構的形成方法S1300包含一蝕刻步驟S1301、一模壓步驟S1302、一雷射步驟S1303、一電鍍步驟S1304及一切割步驟S1305。Please refer to FIG. 177 . FIG. 177 is a schematic flowchart of a method S1300 for forming a package structure according to the thirteenth embodiment of the present invention. As can be seen from FIG. 177 , the method S1300 for forming the package structure includes an etching step S1301 , a molding step S1302 , a laser step S1303 , a plating step S1304 and a cutting step S1305 .
請參照第178圖與第179圖,第178圖繪示第177圖第十三實施方式中蝕刻步驟S1301的示意圖,第179圖繪示第178圖第十三實施方式中導線架1310沿剖線179-179'的剖面示意圖。由第178圖與第179圖可知,蝕刻步驟S1301中對導線架1310的複數切割道1311進行蝕刻。第十三實施方式中,對導線架1310的切割道1311的下表面進行蝕刻形成二蝕刻槽1312,且蝕刻深度可小於導線架1310的厚度的一半,但並不以此為限。進一步來說,切割道1311可具有複數凹陷部1314,凹陷部1314的凹陷深度可小於導線架1310的厚度的一半,各凹陷部1314的寬度可大於各蝕刻槽1312的寬度,且各凹陷部1314位於切割道1311的中央。Please refer to FIGS. 178 and 179. FIG. 178 shows a schematic diagram of the etching step S1301 in the thirteenth embodiment in FIG. 177, and FIG. 179 shows the
請參照第180圖與第181圖,第180圖繪示第177圖第十三實施方式中模壓步驟S1302的示意圖,第181圖繪示第180圖第十三實施方式中導線架1310沿剖線181-181'的剖面示意圖。由第180圖與第181圖可知,塑膠封裝材料1320於雷射步驟S1303前覆蓋於導線架1310。值得一提的是,塑膠封裝材料1320並無填入凹陷部1314內。Please refer to Fig. 180 and Fig. 181. Fig. 180 shows a schematic diagram of the molding step S1302 in Fig. 177 in the thirteenth embodiment, and Fig. 181 shows the
請參照第182圖與第183圖,第182圖繪示第177圖第十三實施方式中雷射步驟S1303的示意圖,第183圖繪示第182圖第十三實施方式中導線架1310沿剖線183-183'的剖面示意圖。由第182圖與第183圖可知,雷射步驟S1303係雷射光束L移除覆蓋切割道1311的一上表面的塑膠封裝材料1320,其中塑膠封裝材料1320僅部分被移除。值得一提的是,因雷射光束L照射於切割道1311的上表面以移除塑膠封裝材料1320,而設置於蝕刻槽1312的塑膠封裝材料1320不會被雷射光束L照射到,故設置於蝕刻槽1312的塑膠封裝材料1320則保留於其中。Please refer to FIG. 182 and FIG. 183. FIG. 182 is a schematic diagram of the laser step S1303 in FIG. 177 in the thirteenth embodiment, and FIG. 183 is a cross-section of the
請參照下表十三,表十三為第十三實施方式中雷射步驟S1303所使用的雷射光束L的參數,但並不以表十三中的參數為限。
進一步來說,透過雷射步驟S1303可選擇移除的對象(如部分塑膠封裝材料1320)與其深度,且雷射步驟S1303不限於一道,亦可為二道以上,其取決於雷射光束L的能量與參數。藉此,可有效控制移除的範圍。具體而言,雷射步驟S1303可由一道或多道雷射光束L所組成。舉例來說,多道雷射光束L可先由較小波長(如355奈米)的雷射光束L進行粗加工,接著再以較大波長(如532奈米或1064奈米)的雷射光束L進行細加工以達到較為精細的移除效果,但並不以此為限。Further, the object to be removed (such as part of the plastic packaging material 1320 ) and its depth can be selected through the laser step S1303 , and the laser step S1303 is not limited to one, but can also be more than two, which depends on the laser beam L energy and parameters. Thereby, the range of removal can be effectively controlled. Specifically, the laser step S1303 may consist of one or more laser beams L. For example, the multiple laser beams L can be rough processed by the laser beam L with a smaller wavelength (eg, 355 nm) first, and then the laser beam with a larger wavelength (eg, 532 nm or 1064 nm) can be used for rough processing. The light beam L is finely processed to achieve a finer removal effect, but is not limited thereto.
請參照第184圖與第185圖,第184圖繪示第177圖第十三實施方式中電鍍步驟S1304的示意圖,第185圖繪示第184圖第十三實施方式中導線架1310沿剖線185-185'的剖面示意圖。由第184圖與第185圖可知,複數電鍍面1330設置於導線架1310上塑膠封裝材料1320未覆蓋的複數區域。Please refer to FIG. 184 and FIG. 185. FIG. 184 shows a schematic diagram of the electroplating step S1304 in FIG. 177 in the thirteenth embodiment, and FIG. 185 shows the
請參照第186圖、第187圖及第188圖,第186圖繪示第177圖第十三實施方式中切割步驟S1305的示意圖,第187圖繪示第186圖第十三實施方式中封裝結構1300沿剖線187-187'的剖面示意圖,第188圖繪示第186圖第十三實施方式中封裝結構1300沿剖線188-188'的剖面示意圖。由第186圖至第188圖可知,切割步驟S1305係切割導線架1310的切割道1311以形成封裝結構1300。詳細來說,導線架1310的切割道1311由一刀具切割,故形成突出引腳1313,且電鍍面1330設置於突出引腳1313的外周。再者,突出引腳1313的寬度較寬,因此當切割步驟S1305時可降低毛邊的產生。Please refer to FIG. 186 , FIG. 187 , and FIG. 188 . FIG. 186 shows the schematic diagram of the cutting step S1305 in the thirteenth embodiment in FIG. 177 , and FIG. 187 shows the package structure in FIG. 186 in the thirteenth embodiment. 1300 is a schematic cross-sectional view along the line 187-187', and FIG. 188 is a schematic cross-sectional view of the
請參照第189圖與第190圖,第189圖繪示第177圖第十三實施方式中封裝結構1300的側面示意圖,第190圖繪示第177圖第十三實施方式中封裝結構1300的部分示意圖。由第189圖與第190圖可知,封裝結構1300包含複數突出引腳1313,突出引腳1313突出於塑膠封裝材料1320的邊緣,各個突出引腳1313包含八電鍍面1330,且靠近封裝結構1300下表面的突出引腳1313突出塑膠封裝材料1320的邊緣。Please refer to FIGS. 189 and 190. FIG. 189 is a schematic side view of the
因此,透過第十三實施方式的封裝結構的形成方法S1300,有利於提高封裝結構1300的側面可銲接面積。並且,由第187圖可知,因突出引腳1313突出於塑膠封裝材料1320與塑膠封裝材料1320所覆蓋的部分呈現類似鷗翼型,故突出引腳1313更具有機械強度。因此,可提升突出引腳1313與電路板的連接強度,以維持並增加設置於電路板的壽命,進一步提升板級的可靠度。Therefore, through the method S1300 for forming the package structure of the thirteenth embodiment, it is beneficial to increase the side solderable area of the
綜上所述,透過本發明的封裝結構的形成方法可形成具有梯狀引腳或突出引腳的封裝結構,其結構不僅可提升可銲接性,亦可增加設置於電路板的連接強度以提升板級的可靠度。To sum up, through the method for forming a package structure of the present invention, a package structure with ladder-shaped pins or protruding pins can be formed, and the structure can not only improve the solderability, but also increase the connection strength provided on the circuit board to improve the board-level reliability.
雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, The protection scope of the present invention shall be determined by the scope of the appended patent application.
S100,S200,S300,S400,S500,S600,S700,S800,S900,S1000,S1100,S1200,S1300:封裝結構的形成方法 S101,S201,S301,S401,S501,S601,S701,S801,S901,S1001,S1101,S1201,S1301:蝕刻步驟 S102,S202,S302,S402,S502,S602,S702,S802,S902,S1002,S1102,S1202,S1302:模壓步驟 S103,S903,S1003,S1103:第一雷射步驟 S104,S904,S1004,S1104:第二雷射步驟 S105,S204,S304,S404,S504,S604,S704,S804,S905,S1005,S1105,S1204,S1304:電鍍步驟 S106,S205,S305,S405,S505,S605,S705,S805,S906,S1006,S1106,S1205,S1305:切割步驟 S203,S303,S403,S503,S603,S703,S803,S1203,S1303:雷射步驟 100,200,300,400,500,600,700,800,900,1000,1100,1200,1300:封裝結構 110,210,310,410,510,610,710,810,910,1010,1110,1210,1310:導線架 111,211,311,411,511,611,711,811,911,1011,1111,1211,1311:切割道 112,212,312,412,512,612,712,812,912,1012,1112,1212,1312:蝕刻槽 113,213,313,413,513,613,813:梯狀引腳 713,913,1013,1113,1213,1313:突出引腳 120,220,320,420,520,620,720,820,920,1020,1120,1220,1320:塑膠封裝材料 130,230,330,430,530,630,730,830,930,1030,1130,1230,1330:電鍍面 314,614,714,814,914,1014,1314:凹陷部 L:雷射光束 L0:凹陷部的寬度 d:導線架的厚度S100, S200, S300, S400, S500, S600, S700, S800, S900, S1000, S1100, S1200, S1300: Forming Method of Package Structure S101, S201, S301, S401, S501, S601, S701, S801, S901, S1001, S1101, S1201, S1301: etching steps S102, S202, S302, S402, S502, S602, S702, S802, S902, S1002, S1102, S1202, S1302: Molding step S103, S903, S1003, S1103: The first laser step S104, S904, S1004, S1104: Second laser step S105, S204, S304, S404, S504, S604, S704, S804, S905, S1005, S1105, S1204, S1304: Electroplating steps S106, S205, S305, S405, S505, S605, S705, S805, S906, S1006, S1106, S1205, S1305: cutting steps S203, S303, S403, S503, S603, S703, S803, S1203, S1303: Laser step 100, 200, 300, 400, 500, 600, 700, 800, 900, 1000, 1100, 1200, 1300: Package structure 110,210,310,410,510,610,710,810,910,1010,1110,1210,1310: Lead Frame 111, 211, 311, 411, 511, 611, 711, 811, 911, 1011, 1111, 1211, 1311: Cutting Road 112, 212, 312, 412, 512, 612, 712, 812, 912, 1012, 1112, 1212, 1312: Etching grooves 113, 213, 313, 413, 513, 613, 813: Ladder pins 713, 913, 1013, 1113, 1213, 1313: Protruding pins 120, 220, 320, 420, 520, 620, 720, 820, 920, 1020, 1120, 1220, 1320: plastic packaging materials 130, 230, 330, 430, 530, 630, 730, 830, 930, 1030, 1130, 1230, 1330: Electroplating surface 314,614,714,814,914,1014,1314: Recess L: laser beam L0: The width of the recessed portion d: thickness of lead frame
第1圖繪示依照本發明第一實施方式中封裝結構的形成方法的流程示意圖; 第2圖繪示第1圖第一實施方式中蝕刻步驟的示意圖; 第3圖繪示第2圖第一實施方式中導線架沿剖線3-3'的剖面示意圖; 第4圖繪示第1圖第一實施方式中模壓步驟的示意圖; 第5圖繪示第4圖第一實施方式中導線架沿剖線5-5'的剖面示意圖; 第6圖繪示第1圖第一實施方式中第一雷射步驟的示意圖; 第7圖繪示第6圖第一實施方式中導線架沿剖線7-7'的剖面示意圖; 第8圖繪示第1圖第一實施方式中第二雷射步驟的示意圖; 第9圖繪示第8圖第一實施方式中導線架沿剖線9-9'的剖面示意圖; 第10圖繪示第1圖第一實施方式中電鍍步驟的示意圖; 第11圖繪示第10圖第一實施方式中導線架沿剖線11-11'的剖面示意圖; 第12圖繪示第1圖第一實施方式中切割步驟的示意圖; 第13圖繪示第12圖第一實施方式中封裝結構沿剖線13-13'的剖面示意圖; 第14圖繪示第12圖第一實施方式中封裝結構沿剖線14-14'的剖面示意圖; 第15圖繪示第1圖第一實施方式中封裝結構的側面示意圖; 第16圖繪示第1圖第一實施方式中封裝結構的部分示意圖; 第17圖繪示依照本發明第二實施方式中封裝結構的形成方法的流程示意圖; 第18圖繪示第17圖第二實施方式中蝕刻步驟的示意圖; 第19圖繪示第18圖第二實施方式中導線架沿剖線19-19'的剖面示意圖; 第20圖繪示第17圖第二實施方式中模壓步驟的示意圖; 第21圖繪示第20圖第二實施方式中導線架沿剖線21-21'的剖面示意圖; 第22圖繪示第17圖第二實施方式中雷射步驟的示意圖; 第23圖繪示第22圖第二實施方式中導線架沿剖線23-23'的剖面示意圖; 第24圖繪示第17圖第二實施方式中電鍍步驟的示意圖; 第25圖繪示第24圖第二實施方式中導線架沿剖線25-25'的剖面示意圖; 第26圖繪示第17圖第二實施方式中切割步驟的示意圖; 第27圖繪示第26圖第二實施方式中封裝結構沿剖線27-27'的剖面示意圖; 第28圖繪示第26圖第二實施方式中封裝結構沿剖線28-28'的剖面示意圖; 第29圖繪示第17圖第二實施方式中封裝結構的側面示意圖; 第30圖繪示第17圖第二實施方式中封裝結構的部分示意圖; 第31圖繪示依照本發明第三實施方式中封裝結構的形成方法的流程示意圖; 第32圖繪示第31圖第三實施方式中蝕刻步驟的示意圖; 第33圖繪示第32圖第三實施方式中導線架沿剖線33-33'的剖面示意圖; 第34圖繪示第31圖第三實施方式中模壓步驟的示意圖; 第35圖繪示第34圖第三實施方式中導線架沿剖線35-35'的剖面示意圖; 第36圖繪示第31圖第三實施方式中雷射步驟的示意圖; 第37圖繪示第36圖第三實施方式中導線架沿剖線37-37'的剖面示意圖; 第38圖繪示第31圖第三實施方式中電鍍步驟的示意圖; 第39圖繪示第38圖第三實施方式中導線架沿剖線39-39'的剖面示意圖; 第40圖繪示第31圖第三實施方式中切割步驟的示意圖; 第41圖繪示第40圖第三實施方式中封裝結構沿剖線41-41'的剖面示意圖; 第42圖繪示第40圖第三實施方式中封裝結構沿剖線42-42'的剖面示意圖; 第43圖繪示第31圖第三實施方式中封裝結構的側面示意圖; 第44圖繪示第31圖第三實施方式中封裝結構的部分示意圖; 第45圖繪示依照本發明第四實施方式中封裝結構的形成方法的流程示意圖; 第46圖繪示第45圖第四實施方式中蝕刻步驟的示意圖; 第47圖繪示第46圖第四實施方式中導線架沿剖線47-47'的剖面示意圖; 第48圖繪示第45圖第四實施方式中模壓步驟的示意圖; 第49圖繪示第48圖第四實施方式中導線架沿剖線49-49'的剖面示意圖; 第50圖繪示第45圖第四實施方式中雷射步驟的示意圖; 第51圖繪示第50圖第四實施方式中導線架沿剖線51-51'的剖面示意圖; 第52圖繪示第45圖第四實施方式中電鍍步驟的示意圖; 第53圖繪示第52圖第四實施方式中導線架沿剖線53-53'的剖面示意圖; 第54圖繪示第45圖第四實施方式中切割步驟的示意圖; 第55圖繪示第54圖第四實施方式中封裝結構沿剖線55-55'的剖面示意圖; 第56圖繪示第54圖第四實施方式中封裝結構沿剖線56-56'的剖面示意圖; 第57圖繪示第45圖第四實施方式中封裝結構的側面示意圖; 第58圖繪示第45圖第四實施方式中封裝結構的部分示意圖; 第59圖繪示依照本發明第五實施方式中封裝結構的形成方法的流程示意圖; 第60圖繪示第59圖第五實施方式中蝕刻步驟的示意圖; 第61圖繪示第60圖第五實施方式中導線架沿剖線61-61'的剖面示意圖; 第62圖繪示第59圖第五實施方式中模壓步驟的示意圖; 第63圖繪示第62圖第五實施方式中導線架沿剖線63-63'的剖面示意圖; 第64圖繪示第59圖第五實施方式中雷射步驟的示意圖; 第65圖繪示第64圖第五實施方式中導線架沿剖線65-65'的剖面示意圖; 第66圖繪示第59圖第五實施方式中電鍍步驟的示意圖; 第67圖繪示第66圖第五實施方式中導線架沿剖線67-67'的剖面示意圖; 第68圖繪示第59圖第五實施方式中切割步驟的示意圖; 第69圖繪示第68圖第五實施方式中封裝結構沿剖線69-69'的剖面示意圖; 第70圖繪示第68圖第五實施方式中封裝結構沿剖線70-70'的剖面示意圖; 第71圖繪示第59圖第五實施方式中封裝結構的側面示意圖; 第72圖繪示第59圖第五實施方式中封裝結構的部分示意圖; 第73圖繪示依照本發明第六實施方式中封裝結構的形成方法的流程示意圖; 第74圖繪示第73圖第六實施方式中蝕刻步驟的示意圖; 第75圖繪示第74圖第六實施方式中導線架沿剖線75-75'的剖面示意圖; 第76圖繪示第73圖第六實施方式中模壓步驟的示意圖; 第77圖繪示第76圖第六實施方式中導線架沿剖線77-77'的剖面示意圖; 第78圖繪示第73圖第六實施方式中雷射步驟的示意圖; 第79圖繪示第78圖第六實施方式中導線架沿剖線79-79'的剖面示意圖; 第80圖繪示第73圖第六實施方式中電鍍步驟的示意圖; 第81圖繪示第80圖第六實施方式中導線架沿剖線81-81'的剖面示意圖; 第82圖繪示第73圖第六實施方式中切割步驟的示意圖; 第83圖繪示第82圖第六實施方式中封裝結構沿剖線83-83'的剖面示意圖; 第84圖繪示第82圖第六實施方式中封裝結構沿剖線84-84'的剖面示意圖; 第85圖繪示第73圖第六實施方式中封裝結構的側面示意圖; 第86圖繪示第73圖第六實施方式中封裝結構的部分示意圖; 第87圖繪示依照本發明第七實施方式中封裝結構的形成方法的流程示意圖; 第88圖繪示第87圖第七實施方式中蝕刻步驟的示意圖; 第89圖繪示第88圖第七實施方式中導線架沿剖線89-89'的剖面示意圖; 第90圖繪示第87圖第七實施方式中模壓步驟的示意圖; 第91圖繪示第90圖第七實施方式中導線架沿剖線91-91'的剖面示意圖; 第92圖繪示第87圖第七實施方式中雷射步驟的示意圖; 第93圖繪示第92圖第七實施方式中導線架沿剖線93-93'的剖面示意圖; 第94圖繪示第87圖第七實施方式中電鍍步驟的示意圖; 第95圖繪示第94圖第七實施方式中導線架沿剖線95-95'的剖面示意圖; 第96圖繪示第87圖第七實施方式中切割步驟的示意圖; 第97圖繪示第96圖第七實施方式中封裝結構沿剖線97-97'的剖面示意圖; 第98圖繪示第96圖第七實施方式中封裝結構沿剖線98-98'的剖面示意圖; 第99圖繪示第87圖第七實施方式中封裝結構的側面示意圖; 第100圖繪示第87圖第七實施方式中封裝結構的部分示意圖; 第101圖繪示依照本發明第八實施方式中封裝結構的形成方法的流程示意圖; 第102圖繪示第101圖第八實施方式中蝕刻步驟的示意圖; 第103圖繪示第102圖第八實施方式中導線架沿剖線103-103'的剖面示意圖; 第104圖繪示第101圖第八實施方式中模壓步驟的示意圖; 第105圖繪示第104圖第八實施方式中導線架沿剖線105-105'的剖面示意圖; 第106圖繪示第101圖第八實施方式中雷射步驟的示意圖; 第107圖繪示第106圖第八實施方式中導線架沿剖線107-107'的剖面示意圖; 第108圖繪示第101圖第八實施方式中電鍍步驟的示意圖; 第109圖繪示第108圖第八實施方式中導線架沿剖線109-109'的剖面示意圖; 第110圖繪示第101圖第八實施方式中切割步驟的示意圖; 第111圖繪示第110圖第八實施方式中封裝結構沿剖線111-111'的剖面示意圖; 第112圖繪示第110圖第八實施方式中封裝結構沿剖線112-112'的剖面示意圖; 第113圖繪示第101圖第八實施方式中封裝結構的側面示意圖; 第114圖繪示第101圖第八實施方式中封裝結構的部分示意圖; 第115圖繪示依照本發明第九實施方式中封裝結構的形成方法的流程示意圖; 第116圖繪示第115圖第九實施方式中蝕刻步驟的示意圖; 第117圖繪示第116圖第九實施方式中導線架沿剖線117-117'的剖面示意圖; 第118圖繪示第115圖第九實施方式中模壓步驟的示意圖; 第119圖繪示第118圖第九實施方式中導線架沿剖線119-119'的剖面示意圖; 第120圖繪示第115圖第九實施方式中第一雷射步驟的示意圖; 第121圖繪示第120圖第九實施方式中導線架沿剖線121-121'的剖面示意圖; 第122圖繪示第115圖第九實施方式中第二雷射步驟的示意圖; 第123圖繪示第122圖第九實施方式中導線架沿剖線123-123'的剖面示意圖; 第124圖繪示第115圖第九實施方式中電鍍步驟的示意圖; 第125圖繪示第124圖第九實施方式中導線架沿剖線125-125'的剖面示意圖; 第126圖繪示第115圖第九實施方式中切割步驟的示意圖; 第127圖繪示第126圖第九實施方式中封裝結構沿剖線127-127'的剖面示意圖; 第128圖繪示第126圖第九實施方式中封裝結構沿剖線128-128'的剖面示意圖; 第129圖繪示第115圖第九實施方式中封裝結構的側面示意圖; 第130圖繪示第115圖第九實施方式中封裝結構的部分示意圖; 第131圖繪示依照本發明第十實施方式中封裝結構的形成方法的流程示意圖; 第132圖繪示第131圖第十實施方式中蝕刻步驟的示意圖; 第133圖繪示第132圖第十實施方式中導線架沿剖線133-133'的剖面示意圖; 第134圖繪示第131圖第十實施方式中模壓步驟的示意圖; 第135圖繪示第134圖第十實施方式中導線架沿剖線135-135'的剖面示意圖; 第136圖繪示第131圖第十實施方式中第一雷射步驟的示意圖; 第137圖繪示第136圖第十實施方式中導線架沿剖線137-137'的剖面示意圖; 第138圖繪示第131圖第十實施方式中第二雷射步驟的示意圖; 第139圖繪示第138圖第十實施方式中導線架沿剖線139-139'的剖面示意圖; 第140圖繪示第131圖第十實施方式中電鍍步驟的示意圖; 第141圖繪示第140圖第十實施方式中導線架沿剖線141-141'的剖面示意圖; 第142圖繪示第131圖第十實施方式中切割步驟的示意圖; 第143圖繪示第142圖第十實施方式中封裝結構沿剖線143-143'的剖面示意圖; 第144圖繪示第142圖第十實施方式中封裝結構沿剖線144-144'的剖面示意圖; 第145圖繪示第131圖第十實施方式中封裝結構的側面示意圖; 第146圖繪示第131圖第十實施方式中封裝結構的部分示意圖; 第147圖繪示依照本發明第十一實施方式中封裝結構的形成方法的流程示意圖; 第148圖繪示第147圖第十一實施方式中蝕刻步驟的示意圖; 第149圖繪示第148圖第十一實施方式中導線架沿剖線149-149'的剖面示意圖; 第150圖繪示第147圖第十一實施方式中模壓步驟的示意圖; 第151圖繪示第150圖第十一實施方式中導線架沿剖線151-151'的剖面示意圖; 第152圖繪示第147圖第十一實施方式中第一雷射步驟的示意圖; 第153圖繪示第152圖第十一實施方式中導線架沿剖線153-153'的剖面示意圖; 第154圖繪示第147圖第十一實施方式中第二雷射步驟的示意圖; 第155圖繪示第154圖第十一實施方式中導線架沿剖線155-155'的剖面示意圖; 第156圖繪示第147圖第十一實施方式中電鍍步驟的示意圖; 第157圖繪示第156圖第十一實施方式中導線架沿剖線157-157'的剖面示意圖; 第158圖繪示第147圖第十一實施方式中切割步驟的示意圖; 第159圖繪示第158圖第十一實施方式中封裝結構沿剖線159-159'的剖面示意圖; 第160圖繪示第158圖第十一實施方式中封裝結構沿剖線160-160'的剖面示意圖; 第161圖繪示第147圖第十一實施方式中封裝結構的側面示意圖; 第162圖繪示第147圖第十一實施方式中封裝結構的部分示意圖; 第163圖繪示依照本發明第十二實施方式中封裝結構的形成方法的流程示意圖; 第164圖繪示第163圖第十二實施方式中蝕刻步驟的示意圖; 第165圖繪示第164圖第十二實施方式中導線架沿剖線165-165'的剖面示意圖; 第166圖繪示第163圖第十二實施方式中模壓步驟的示意圖; 第167圖繪示第166圖第十二實施方式中導線架沿剖線167-167'的剖面示意圖; 第168圖繪示第163圖第十二實施方式中雷射步驟的示意圖; 第169圖繪示第168圖第十二實施方式中導線架沿剖線169-169'的剖面示意圖; 第170圖繪示第163圖第十二實施方式中電鍍步驟的示意圖; 第171圖繪示第170圖第十二實施方式中導線架沿剖線171-171'的剖面示意圖; 第172圖繪示第163圖第十二實施方式中切割步驟的示意圖; 第173圖繪示第172圖第十二實施方式中封裝結構沿剖線173-173'的剖面示意圖; 第174圖繪示第172圖第十二實施方式中封裝結構沿剖線174-174'的剖面示意圖; 第175圖繪示第163圖第十二實施方式中封裝結構的側面示意圖; 第176圖繪示第163圖第十二實施方式中封裝結構的部分示意圖; 第177圖繪示依照本發明第十三實施方式中封裝結構的形成方法的流程示意圖; 第178圖繪示第177圖第十三實施方式中蝕刻步驟的示意圖; 第179圖繪示第178圖第十三實施方式中導線架沿剖線179-179'的剖面示意圖; 第180圖繪示第177圖第十三實施方式中模壓步驟的示意圖; 第181圖繪示第180圖第十三實施方式中導線架沿剖線181-181'的剖面示意圖; 第182圖繪示第177圖第十三實施方式中雷射步驟的示意圖; 第183圖繪示第182圖第十三實施方式中導線架沿剖線183-183'的剖面示意圖; 第184圖繪示第177圖第十三實施方式中電鍍步驟的示意圖; 第185圖繪示第184圖第十三實施方式中導線架沿剖線185-185'的剖面示意圖; 第186圖繪示第177圖第十三實施方式中切割步驟的示意圖; 第187圖繪示第186圖第十三實施方式中封裝結構沿剖線187-187'的剖面示意圖; 第188圖繪示第186圖第十三實施方式中封裝結構沿剖線188-188'的剖面示意圖; 第189圖繪示第177圖第十三實施方式中封裝結構的側面示意圖;以及 第190圖繪示第177圖第十三實施方式中封裝結構的部分示意圖。FIG. 1 is a schematic flowchart of a method for forming a package structure according to a first embodiment of the present invention; FIG. 2 is a schematic diagram illustrating the etching step in the first embodiment of FIG. 1; Fig. 3 is a schematic cross-sectional view of the lead frame along the section line 3-3' in the first embodiment of Fig. 2; FIG. 4 is a schematic diagram of the molding step in the first embodiment of FIG. 1; Fig. 5 is a schematic cross-sectional view of the lead frame along the section line 5-5' in the first embodiment of Fig. 4; FIG. 6 is a schematic diagram of the first laser step in the first embodiment of FIG. 1; FIG. 7 is a schematic cross-sectional view of the lead frame along the section line 7-7' in the first embodiment of FIG. 6; FIG. 8 is a schematic diagram of the second laser step in the first embodiment of FIG. 1; Fig. 9 is a schematic cross-sectional view of the lead frame along the section line 9-9' in the first embodiment of Fig. 8; FIG. 10 is a schematic diagram illustrating the electroplating step in the first embodiment of FIG. 1; FIG. 11 is a schematic cross-sectional view of the lead frame along the section line 11-11' in the first embodiment of FIG. 10; FIG. 12 is a schematic diagram illustrating the cutting step in the first embodiment of FIG. 1; FIG. 13 is a schematic cross-sectional view of the package structure in the first embodiment shown in FIG. 12 along the section line 13-13'; FIG. 14 is a schematic cross-sectional view of the package structure in the first embodiment shown in FIG. 12 along the section line 14-14'; FIG. 15 is a schematic side view of the package structure in the first embodiment of FIG. 1; FIG. 16 is a partial schematic diagram of the package structure in the first embodiment of FIG. 1; FIG. 17 is a schematic flowchart of a method for forming a package structure according to a second embodiment of the present invention; FIG. 18 is a schematic diagram illustrating the etching step in the second embodiment of FIG. 17; Fig. 19 is a schematic cross-sectional view of the lead frame along the section line 19-19' in the second embodiment of Fig. 18; Fig. 20 is a schematic diagram of the molding step in the second embodiment of Fig. 17; FIG. 21 is a schematic cross-sectional view of the lead frame along the section line 21-21' in the second embodiment of FIG. 20; FIG. 22 is a schematic diagram of the laser step in the second embodiment of FIG. 17; FIG. 23 is a schematic cross-sectional view of the lead frame along the section line 23-23' in the second embodiment of FIG. 22; FIG. 24 is a schematic diagram illustrating the electroplating step in the second embodiment of FIG. 17; FIG. 25 is a schematic cross-sectional view of the lead frame along the section line 25-25' in the second embodiment of FIG. 24; FIG. 26 is a schematic diagram illustrating the cutting step in the second embodiment of FIG. 17; FIG. 27 is a schematic cross-sectional view of the package structure in the second embodiment of FIG. 26 along the section line 27-27'; FIG. 28 is a schematic cross-sectional view of the package structure in the second embodiment of FIG. 26 along the section line 28-28'; FIG. 29 is a schematic side view of the package structure in the second embodiment of FIG. 17; FIG. 30 is a partial schematic diagram of the package structure in the second embodiment of FIG. 17; FIG. 31 is a schematic flowchart of a method for forming a package structure according to a third embodiment of the present invention; FIG. 32 is a schematic diagram illustrating the etching step in the third embodiment of FIG. 31; FIG. 33 is a schematic cross-sectional view of the lead frame along the section line 33-33' in the third embodiment of FIG. 32; Fig. 34 is a schematic diagram of the molding step in the third embodiment of Fig. 31; FIG. 35 is a schematic cross-sectional view of the lead frame along the section line 35-35' in the third embodiment of FIG. 34; FIG. 36 is a schematic diagram of the laser step in the third embodiment of FIG. 31; Fig. 37 is a schematic cross-sectional view of the lead frame along the section line 37-37' in the third embodiment of Fig. 36; FIG. 38 is a schematic diagram illustrating the electroplating step in the third embodiment of FIG. 31; Fig. 39 is a schematic cross-sectional view of the lead frame along the section line 39-39' in the third embodiment of Fig. 38; Fig. 40 is a schematic diagram showing the cutting step in the third embodiment of Fig. 31; FIG. 41 is a schematic cross-sectional view of the package structure in the third embodiment in FIG. 40 along the section line 41-41'; FIG. 42 is a schematic cross-sectional view of the package structure in the third embodiment of FIG. 40 along the section line 42-42'; FIG. 43 is a schematic side view of the package structure in the third embodiment of FIG. 31; FIG. 44 is a partial schematic diagram of the package structure in the third embodiment of FIG. 31; FIG. 45 is a schematic flowchart of a method for forming a package structure according to a fourth embodiment of the present invention; FIG. 46 is a schematic diagram illustrating the etching step in the fourth embodiment of FIG. 45; FIG. 47 is a schematic cross-sectional view of the lead frame along the section line 47-47' in the fourth embodiment of FIG. 46; Fig. 48 is a schematic diagram of the molding step in the fourth embodiment of Fig. 45; Fig. 49 is a schematic cross-sectional view of the lead frame along the section line 49-49' in the fourth embodiment of Fig. 48; FIG. 50 is a schematic diagram of a laser step in the fourth embodiment of FIG. 45; FIG. 51 is a schematic cross-sectional view of the lead frame along the section line 51-51' in the fourth embodiment of FIG. 50; FIG. 52 is a schematic diagram illustrating the electroplating step in the fourth embodiment of FIG. 45; FIG. 53 is a schematic cross-sectional view of the lead frame along the section line 53-53' in the fourth embodiment of FIG. 52; Fig. 54 is a schematic diagram of the cutting step in the fourth embodiment of Fig. 45; FIG. 55 is a schematic cross-sectional view of the package structure in the fourth embodiment of FIG. 54 along the section line 55-55'; FIG. 56 is a schematic cross-sectional view of the package structure in the fourth embodiment of FIG. 54 along the section line 56-56'; FIG. 57 is a schematic side view of the package structure in the fourth embodiment of FIG. 45; FIG. 58 is a partial schematic diagram of the package structure in the fourth embodiment of FIG. 45; FIG. 59 is a schematic flowchart of a method for forming a package structure according to a fifth embodiment of the present invention; FIG. 60 is a schematic diagram illustrating the etching step in the fifth embodiment of FIG. 59; FIG. 61 is a schematic cross-sectional view of the lead frame along the section line 61-61' in the fifth embodiment of FIG. 60; Fig. 62 is a schematic diagram of the molding step in the fifth embodiment of Fig. 59; FIG. 63 is a schematic cross-sectional view of the lead frame along the section line 63-63' in the fifth embodiment of FIG. 62; FIG. 64 is a schematic diagram of a laser step in the fifth embodiment of FIG. 59; FIG. 65 is a schematic cross-sectional view of the lead frame along the line 65-65' in the fifth embodiment of FIG. 64; FIG. 66 is a schematic diagram illustrating the electroplating step in the fifth embodiment of FIG. 59; FIG. 67 is a schematic cross-sectional view of the lead frame along the section line 67-67' in the fifth embodiment of FIG. 66; Fig. 68 is a schematic diagram of the cutting step in the fifth embodiment of Fig. 59; FIG. 69 is a schematic cross-sectional view of the package structure in the fifth embodiment shown in FIG. 68 along the section line 69-69'; FIG. 70 is a schematic cross-sectional view of the package structure in the fifth embodiment shown in FIG. 68 along the section line 70-70'; FIG. 71 is a schematic side view of the package structure in the fifth embodiment of FIG. 59; FIG. 72 is a partial schematic diagram of the package structure in the fifth embodiment of FIG. 59; FIG. 73 is a schematic flowchart of a method for forming a package structure according to a sixth embodiment of the present invention; FIG. 74 is a schematic diagram illustrating the etching step in the sixth embodiment of FIG. 73; FIG. 75 is a schematic cross-sectional view of the lead frame along the section line 75-75' in the sixth embodiment of FIG. 74; Fig. 76 is a schematic diagram of the molding step in the sixth embodiment of Fig. 73; FIG. 77 is a schematic cross-sectional view of the lead frame along the section line 77-77' in the sixth embodiment of FIG. 76; FIG. 78 is a schematic diagram illustrating a laser step in the sixth embodiment of FIG. 73; FIG. 79 is a schematic cross-sectional view of the lead frame along the section line 79-79' in the sixth embodiment of FIG. 78; Fig. 80 is a schematic diagram illustrating the electroplating step in the sixth embodiment of Fig. 73; FIG. 81 is a schematic cross-sectional view of the lead frame along the section line 81-81' in the sixth embodiment of FIG. 80; Fig. 82 is a schematic diagram of the cutting step in the sixth embodiment of Fig. 73; FIG. 83 is a schematic cross-sectional view of the package structure in the sixth embodiment shown in FIG. 82 along the section line 83-83'; FIG. 84 is a schematic cross-sectional view of the package structure in the sixth embodiment shown in FIG. 82 along the section line 84-84'; FIG. 85 is a schematic side view of the package structure in the sixth embodiment of FIG. 73; FIG. 86 is a partial schematic diagram of the package structure in the sixth embodiment of FIG. 73; FIG. 87 is a schematic flowchart of a method for forming a package structure according to a seventh embodiment of the present invention; FIG. 88 is a schematic diagram illustrating the etching step in the seventh embodiment of FIG. 87; Fig. 89 is a schematic cross-sectional view of the lead frame along the line 89-89' in the seventh embodiment of Fig. 88; Fig. 90 is a schematic diagram showing the molding step in the seventh embodiment of Fig. 87; FIG. 91 is a schematic cross-sectional view of the lead frame along the section line 91-91' in the seventh embodiment of FIG. 90; FIG. 92 is a schematic diagram of a laser step in the seventh embodiment of FIG. 87; Fig. 93 is a schematic cross-sectional view of the lead frame along the section line 93-93' in the seventh embodiment of Fig. 92; FIG. 94 is a schematic diagram illustrating the electroplating step in the seventh embodiment of FIG. 87; FIG. 95 is a schematic cross-sectional view of the lead frame along the section line 95-95' in the seventh embodiment of FIG. 94; Fig. 96 is a schematic diagram of the cutting step in the seventh embodiment of Fig. 87; FIG. 97 is a schematic cross-sectional view of the package structure in the seventh embodiment shown in FIG. 96 along the section line 97-97'; FIG. 98 is a schematic cross-sectional view of the package structure in the seventh embodiment shown in FIG. 96 along the section line 98-98'; FIG. 99 is a schematic side view of the package structure in the seventh embodiment shown in FIG. 87; FIG. 100 is a partial schematic diagram of the package structure in the seventh embodiment shown in FIG. 87; FIG. 101 is a schematic flowchart of a method for forming a package structure according to an eighth embodiment of the present invention; FIG. 102 is a schematic diagram illustrating the etching step in the eighth embodiment of FIG. 101; FIG. 103 is a schematic cross-sectional view of the lead frame along the section line 103-103' in the eighth embodiment of FIG. 102; Fig. 104 is a schematic diagram of the molding step in the eighth embodiment of Fig. 101; FIG. 105 is a schematic cross-sectional view of the lead frame along the section line 105-105' in the eighth embodiment of FIG. 104; FIG. 106 is a schematic diagram of the laser step in the eighth embodiment of FIG. 101; FIG. 107 is a schematic cross-sectional view of the lead frame along the section line 107-107' in the eighth embodiment of FIG. 106; Fig. 108 is a schematic diagram illustrating the electroplating step in the eighth embodiment of Fig. 101; FIG. 109 is a schematic cross-sectional view of the lead frame along the section line 109-109' in the eighth embodiment of FIG. 108; FIG. 110 is a schematic diagram of the cutting step in the eighth embodiment of FIG. 101; FIG. 111 is a schematic cross-sectional view of the package structure in the eighth embodiment shown in FIG. 110 along the section line 111-111'; FIG. 112 is a schematic cross-sectional view of the package structure in the eighth embodiment shown in FIG. 110 along the section line 112-112'; FIG. 113 is a schematic side view of the package structure in the eighth embodiment of FIG. 101; FIG. 114 is a partial schematic diagram of the package structure in the eighth embodiment of FIG. 101; FIG. 115 is a schematic flowchart of a method for forming a package structure according to a ninth embodiment of the present invention; FIG. 116 is a schematic diagram of the etching step in the ninth embodiment of FIG. 115; FIG. 117 is a schematic cross-sectional view of the lead frame along the line 117-117' in the ninth embodiment of FIG. 116; Fig. 118 is a schematic diagram of the molding step in the ninth embodiment of Fig. 115; FIG. 119 is a schematic cross-sectional view of the lead frame along the line 119-119' in the ninth embodiment of FIG. 118; Fig. 120 is a schematic diagram of the first laser step in the ninth embodiment of Fig. 115; FIG. 121 is a schematic cross-sectional view of the lead frame along the line 121-121' in the ninth embodiment of FIG. 120; FIG. 122 is a schematic diagram of the second laser step in the ninth embodiment of FIG. 115; FIG. 123 is a schematic cross-sectional view of the lead frame along the line 123-123' in the ninth embodiment of FIG. 122; FIG. 124 is a schematic diagram illustrating the electroplating step in the ninth embodiment of FIG. 115; FIG. 125 is a schematic cross-sectional view of the lead frame along the line 125-125' in the ninth embodiment of FIG. 124; Fig. 126 is a schematic diagram of the cutting step in the ninth embodiment of Fig. 115; FIG. 127 is a schematic cross-sectional view of the package structure in the ninth embodiment shown in FIG. 126 along the section line 127-127'; FIG. 128 is a schematic cross-sectional view of the package structure in the ninth embodiment shown in FIG. 126 along the section line 128-128'; FIG. 129 is a schematic side view of the package structure in the ninth embodiment of FIG. 115; FIG. 130 is a partial schematic diagram of the package structure in the ninth embodiment of FIG. 115; FIG. 131 is a schematic flowchart of a method for forming a package structure according to a tenth embodiment of the present invention; FIG. 132 is a schematic diagram illustrating the etching step in the tenth embodiment of FIG. 131; FIG. 133 is a schematic cross-sectional view of the lead frame in the tenth embodiment of FIG. 132 along the section line 133-133'; Fig. 134 is a schematic diagram of the molding step in the tenth embodiment of Fig. 131; FIG. 135 is a schematic cross-sectional view of the lead frame in the tenth embodiment of FIG. 134 along the section line 135-135'; FIG. 136 is a schematic diagram of the first laser step in the tenth embodiment of FIG. 131 ; FIG. 137 is a schematic cross-sectional view of the lead frame in the tenth embodiment of FIG. 136 along the section line 137-137'; FIG. 138 is a schematic diagram of the second laser step in the tenth embodiment of FIG. 131; FIG. 139 is a schematic cross-sectional view of the lead frame along the section line 139-139' in the tenth embodiment of FIG. 138; FIG. 140 is a schematic diagram of the electroplating step in the tenth embodiment of FIG. 131; FIG. 141 is a schematic cross-sectional view of the lead frame along the section line 141-141' in the tenth embodiment of FIG. 140; Fig. 142 is a schematic diagram of the cutting step in the tenth embodiment of Fig. 131; FIG. 143 is a schematic cross-sectional view of the package structure in the tenth embodiment in FIG. 142 along the section line 143-143'; FIG. 144 is a schematic cross-sectional view of the package structure in the tenth embodiment shown in FIG. 142 along the section line 144-144'; FIG. 145 is a schematic side view of the package structure in the tenth embodiment of FIG. 131; FIG. 146 is a partial schematic diagram of the package structure in the tenth embodiment of FIG. 131; FIG. 147 is a schematic flowchart of a method for forming a package structure according to an eleventh embodiment of the present invention; FIG. 148 is a schematic diagram of the etching step in the eleventh embodiment of FIG. 147; FIG. 149 is a schematic cross-sectional view of the lead frame along the section line 149-149' in the eleventh embodiment of FIG. 148; Fig. 150 is a schematic diagram of the molding step in the eleventh embodiment of Fig. 147; FIG. 151 is a schematic cross-sectional view of the lead frame along the section line 151-151' in the eleventh embodiment of FIG. 150; FIG. 152 is a schematic diagram of the first laser step in the eleventh embodiment of FIG. 147; FIG. 153 is a schematic cross-sectional view of the lead frame along the section line 153-153' in the eleventh embodiment of FIG. 152; FIG. 154 is a schematic diagram of the second laser step in the eleventh embodiment of FIG. 147; FIG. 155 is a schematic cross-sectional view of the lead frame along the line 155-155' in the eleventh embodiment of FIG. 154; FIG. 156 is a schematic diagram illustrating the electroplating step in the eleventh embodiment of FIG. 147; FIG. 157 is a schematic cross-sectional view of the lead frame along the line 157-157' in the eleventh embodiment of FIG. 156; Fig. 158 is a schematic diagram illustrating the cutting step in the eleventh embodiment of Fig. 147; FIG. 159 is a schematic cross-sectional view of the package structure in the eleventh embodiment shown in FIG. 158 along the section line 159-159'; FIG. 160 is a schematic cross-sectional view of the package structure in the eleventh embodiment shown in FIG. 158 along the section line 160-160'; FIG. 161 is a schematic side view of the package structure in the eleventh embodiment of FIG. 147; FIG. 162 is a partial schematic diagram of the package structure in the eleventh embodiment of FIG. 147; FIG. 163 is a schematic flowchart of a method for forming a package structure according to a twelfth embodiment of the present invention; FIG. 164 is a schematic diagram of the etching step in the twelfth embodiment of FIG. 163; FIG. 165 is a schematic cross-sectional view of the lead frame in the twelfth embodiment of FIG. 164 along the section line 165-165'; Fig. 166 is a schematic diagram of the molding step in the twelfth embodiment of Fig. 163; FIG. 167 is a schematic cross-sectional view of the lead frame in the twelfth embodiment of FIG. 166 along the section line 167-167'; FIG. 168 is a schematic diagram of the laser step in the twelfth embodiment of FIG. 163; Fig. 169 is a schematic cross-sectional view of the lead frame in the twelfth embodiment of Fig. 168 along the section line 169-169'; Fig. 170 is a schematic diagram of the electroplating step in the twelfth embodiment of Fig. 163; FIG. 171 is a schematic cross-sectional view of the lead frame in the twelfth embodiment of FIG. 170 along the section line 171-171'; Fig. 172 is a schematic diagram illustrating the cutting step in the twelfth embodiment of Fig. 163; FIG. 173 is a schematic cross-sectional view of the package structure in the twelfth embodiment of FIG. 172 along the section line 173-173'; FIG. 174 is a schematic cross-sectional view of the package structure in the twelfth embodiment shown in FIG. 172 along the section line 174-174'; FIG. 175 is a schematic side view of the package structure in the twelfth embodiment of FIG. 163; FIG. 176 is a partial schematic diagram of the package structure in the twelfth embodiment of FIG. 163; FIG. 177 is a schematic flowchart of a method for forming a package structure according to a thirteenth embodiment of the present invention; FIG. 178 is a schematic diagram of the etching step in the thirteenth embodiment of FIG. 177; Fig. 179 is a schematic cross-sectional view of the lead frame in the thirteenth embodiment of Fig. 178 along the section line 179-179'; Fig. 180 is a schematic diagram of a molding step in the thirteenth embodiment of Fig. 177; Fig. 181 is a schematic cross-sectional view of the lead frame in the thirteenth embodiment of Fig. 180 along the section line 181-181'; FIG. 182 is a schematic diagram of a laser step in the thirteenth embodiment of FIG. 177; Fig. 183 is a schematic cross-sectional view of the lead frame in the thirteenth embodiment of Fig. 182 along the section line 183-183'; Fig. 184 is a schematic diagram showing the electroplating step in the thirteenth embodiment of Fig. 177; FIG. 185 is a schematic cross-sectional view of the lead frame in the thirteenth embodiment of FIG. 184 along the section line 185-185'; Fig. 186 is a schematic diagram of the cutting step in the thirteenth embodiment of Fig. 177; FIG. 187 is a schematic cross-sectional view of the package structure in the thirteenth embodiment shown in FIG. 186 along the section line 187-187'; FIG. 188 is a schematic cross-sectional view of the package structure in the thirteenth embodiment shown in FIG. 186 along the section line 188-188'; FIG. 189 is a schematic side view of the package structure in the thirteenth embodiment of FIG. 177; and FIG. 190 is a partial schematic diagram of the package structure in the thirteenth embodiment of FIG. 177 .
S100:封裝結構的形成方法S100: Forming method of package structure
S101:蝕刻步驟S101: etching step
S102:模壓步驟S102: Molding step
S103:第一雷射步驟S103: The first laser step
S104:第二雷射步驟S104: the second laser step
S105:電鍍步驟S105: Electroplating step
S106:切割步驟S106: Cutting step
Claims (9)
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US17/109,264 US11612965B2 (en) | 2020-03-27 | 2020-12-02 | Method of forming package structure |
US18/163,338 US11951571B2 (en) | 2020-03-27 | 2023-02-02 | Method of forming package structure |
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US202063000545P | 2020-03-27 | 2020-03-27 | |
US63/000,545 | 2020-03-27 |
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CN103021879A (en) * | 2012-12-28 | 2013-04-03 | 日月光半导体(昆山)有限公司 | Leadless semiconductor package, method for manufacturing the same, and lead frame strip |
TW201712826A (en) * | 2015-07-10 | 2017-04-01 | 創研騰智權信託有限公司 | Universal surface-mount semiconductor package |
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JP3012816B2 (en) * | 1996-10-22 | 2000-02-28 | 松下電子工業株式会社 | Resin-sealed semiconductor device and method of manufacturing the same |
JP2006179760A (en) * | 2004-12-24 | 2006-07-06 | Yamaha Corp | Semiconductor package and lead frame used therefor |
JP2010062365A (en) * | 2008-09-04 | 2010-03-18 | Hitachi Ltd | Semiconductor device and method of manufacturing the same |
US8017447B1 (en) * | 2010-08-03 | 2011-09-13 | Linear Technology Corporation | Laser process for side plating of terminals |
CN102446882B (en) * | 2011-12-30 | 2013-12-04 | 北京工业大学 | Semiconductor PiP (package in package) system structure and manufacturing method thereof |
CN102522394A (en) * | 2011-12-30 | 2012-06-27 | 北京工业大学 | On-chip chip package and production method thereof |
JP3174860U (en) * | 2012-01-30 | 2012-04-12 | ▲せき▼格股▲ふん▼有限公司 | 3D lead frame structure |
US8883614B1 (en) * | 2013-05-22 | 2014-11-11 | Applied Materials, Inc. | Wafer dicing with wide kerf by laser scribing and plasma etching hybrid approach |
US20170294367A1 (en) * | 2016-04-07 | 2017-10-12 | Microchip Technology Incorporated | Flat No-Leads Package With Improved Contact Pins |
CN206040633U (en) * | 2016-09-12 | 2017-03-22 | 长华科技股份有限公司 | Encapsulation lead frame in advance takes shape |
JP2018139263A (en) * | 2017-02-24 | 2018-09-06 | 株式会社東芝 | Semiconductor package and manufacturing method of the same |
US11127661B2 (en) * | 2018-06-13 | 2021-09-21 | Tongfu Microelectronics Co., Ltd. | Semiconductor chip package method and semiconductor chip package device |
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CN103021879A (en) * | 2012-12-28 | 2013-04-03 | 日月光半导体(昆山)有限公司 | Leadless semiconductor package, method for manufacturing the same, and lead frame strip |
TW201712826A (en) * | 2015-07-10 | 2017-04-01 | 創研騰智權信託有限公司 | Universal surface-mount semiconductor package |
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