TWI755972B - Fluorine gas production method and fluorine gas production device - Google Patents
Fluorine gas production method and fluorine gas production device Download PDFInfo
- Publication number
- TWI755972B TWI755972B TW109144185A TW109144185A TWI755972B TW I755972 B TWI755972 B TW I755972B TW 109144185 A TW109144185 A TW 109144185A TW 109144185 A TW109144185 A TW 109144185A TW I755972 B TWI755972 B TW I755972B
- Authority
- TW
- Taiwan
- Prior art keywords
- fluid
- fluorine gas
- electrolytic cell
- mist
- electrolysis
- Prior art date
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/24—Halogens or compounds thereof
- C25B1/245—Fluorine; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/50—Processes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
- C25B11/065—Carbon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/02—Process control or regulation
- C25B15/023—Measuring, analysing or testing during electrolytic production
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/02—Process control or regulation
- C25B15/023—Measuring, analysing or testing during electrolytic production
- C25B15/025—Measuring, analysing or testing during electrolytic production of electrolyte parameters
- C25B15/029—Concentration
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
- C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
- C25B9/60—Constructional parts of cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/042—Electrodes formed of a single material
- C25B11/043—Carbon, e.g. diamond or graphene
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Abstract
提供可抑制霧氣所造成配管或閥之閉塞的氟氣之製造方法。經由具備在電解槽內,進行電解液之電解之電解工程、和於電解時,測定電解液中之水分濃度之水分濃度測定工程、和於電解液之電解時,將在電解槽之內部所產生之流體,藉由從電解槽之內部向外部之流道輸送之送氣工程之方法,製造氟氣。送氣工程中,對應水分濃度測定工程所測定之電解液中之水分濃度,切換流動流體之流道,水分濃度測定工程所測定之電解液中之水分濃度為預先設定之基準值以下之時,於從電解槽之內部向第1外部輸送流體之第1流道,輸送流體,較預先設定之基準值為大之時,於從電解槽之內部向第2外部輸送流體之第2流道,輸送流體,預先設定之基準值係0.1質量%以上0.8質量%以下之範圍內之數值。Provided is a method for producing fluorine gas capable of suppressing clogging of pipes and valves caused by mist. Through the electrolysis process that performs electrolysis of the electrolyte solution in the electrolytic cell, the moisture concentration measurement process that measures the moisture concentration in the electrolytic solution during electrolysis, and the electrolysis of the electrolytic solution, it will be generated inside the electrolytic cell. Fluorine gas is produced by the method of the gas supply process which is transported from the inside of the electrolytic cell to the external flow channel of the fluid. During the air supply process, switch the flow path of the flowing fluid according to the water concentration in the electrolyte measured by the water concentration measurement process, and when the water concentration in the electrolyte measured by the water concentration measurement process is below the preset reference value, at When the first flow channel that transports fluid from the inside of the electrolytic cell to the first outside, the fluid is transported, and when the fluid is larger than the preset reference value, the second flow channel that transports the fluid from the inside of the electrolytic cell to the second outside is transported. For the fluid, the preset reference value is a value within the range of 0.1% by mass to 0.8% by mass.
Description
本發明係關於氟氣之製造方法及氟氣製造裝置者。The present invention relates to a method for producing fluorine gas and an apparatus for producing fluorine gas.
氟氣係可經由電解含有氟化氫及金屬氟化物之電解液而合成(電解合成)。經由電解液之電解,伴隨氟氣亦產生霧氣(例如電解液之霧氣)之故,從電解槽送出之氟氣混伴有霧氣。混伴於氟氣之霧氣係成為粉體,有使得使用於氟氣之送氣之配管或閥閉塞之疑慮。為此,會有不得不中斷或停止製造氟氣之運轉之情形,造成電解法所成氟氣之製造之連續運轉之障礙。
為了抑制霧氣所造成配管或閥之閉塞,於專利文獻1,揭示有將混伴霧氣之氟氣或該氣體通過之配管,加熱至電解液之融點以上之技術。又,於專利文獻2中,揭示有具有粗糙處理霧氣之空間之氣體擴散部、和收容為了吸附霧氣之填充材的填充材收容部的氣體生成裝置。
[先前技術文獻]
[專利文獻]Fluorine gas can be synthesized (electrolytic synthesis) by electrolyzing an electrolyte solution containing hydrogen fluoride and metal fluoride. The fluorine gas sent from the electrolytic cell is mixed with the mist because the fluorine gas also generates mist (for example, the mist of the electrolyte solution) through the electrolysis of the electrolyte solution. The mist mixed with the fluorine gas becomes a powder, and there is a concern that the piping or valve used for the gas supply of the fluorine gas may be blocked. For this reason, the operation of producing fluorine gas may have to be interrupted or stopped, resulting in an obstacle to the continuous operation of the production of fluorine gas formed by electrolysis.
In order to suppress the clogging of pipes and valves due to mist,
[專利文獻1]日本特許公報第5584904號 [專利文獻2]日本特許公報第5919824號[Patent Document 1] Japanese Patent Publication No. 5584904 [Patent Document 2] Japanese Patent Publication No. 5919824
[發明欲解決之課題][The problem to be solved by the invention]
但是,更期望有更有效抑制霧氣所造成配管或閥之閉塞的技術。 本發明係提供可抑制霧氣所造成配管或閥之閉塞的氟氣之製造方法及氟氣製造裝置為課題。 [為解決課題之手段]However, a technique for more effectively suppressing blockage of pipes and valves due to mist has been desired. It is an object of the present invention to provide a method for producing a fluorine gas and an apparatus for producing a fluorine gas which can suppress the clogging of pipes and valves by mist. [Means for solving problems]
為解決前述課題,本發明之一形態係如以下之[1]~[5]。 [1] 電解含有氟化氫及金屬氟化物之電解液,製造氟氣之氟氣之製造方法中, 具備:在電解槽內,進行前述電解之電解工程、 和於前述電解時,測定前述電解液中之水分濃度之水分濃度測定工程、 和於前述電解液之電解時,將在於前述電解槽之內部所產生之流體,藉由從前述電解槽之內部向外部之流道輸送之送氣工程; 前述送氣工程中,對應前述水分濃度測定工程所測定之前述電解液中之水分濃度,切換流動前述流體之流道,前述水分濃度測定工程所測定之前述電解液中之水分濃度為預先設定之基準值以下之時,於從前述電解槽之內部向第1外部輸送前述流體之第1流道,輸送前述流體,較前述預先設定之基準值為大之時,於從前述電解槽之內部向第2外部輸送前述流體之第2流道,輸送前述流體, 前述預先設定之基準值係0.1質量%以上0.8質量%以下之範圍內之數值的氟氣之製造方法。In order to solve the aforementioned problems, one aspect of the present invention is as follows [1] to [5]. [1] In a method for producing fluorine gas by electrolyzing an electrolyte solution containing hydrogen fluoride and metal fluoride to produce fluorine gas, Equipped with: In the electrolytic cell, the electrolysis process of the aforementioned electrolysis is carried out, and the water concentration measurement process for measuring the water concentration in the electrolyte solution during the above electrolysis, And during the electrolysis of the aforementioned electrolyte, the fluid generated inside the aforementioned electrolytic cell is transported from the inside of the aforementioned electrolytic cell to the external flow channel through the air supply process; In the above-mentioned air supply process, the flow channel for flowing the fluid is switched according to the water concentration in the electrolyte solution measured by the water concentration measurement process, and the water concentration in the electrolyte solution measured by the water concentration measurement process is a preset reference. When the value is less than or equal to the above-mentioned preset reference value, the first flow channel that transports the fluid from the inside of the electrolytic cell to the first outside, and when the fluid is transported, is larger than the predetermined reference value, from the inside of the electrolytic cell to the first flow path. 2. The second flow channel for externally transporting the aforementioned fluid, which transports the aforementioned fluid, The aforementioned predetermined reference value is a method for producing a fluorine gas having a numerical value within a range of 0.1 mass % or more and 0.8 mass % or less.
[2] 前述金屬氟化物係選自鉀、銫、銣、及鋰之至少1種之金屬之氟化物之記載於[1]之氟氣之製造方法。 [3] 於前述電解使用之陽極係選自鑽石、類金剛石碳、非晶質碳、石墨、及玻璃碳之至少1種之碳材料所形成之碳質電極之記載於[1]或[2]之氟氣之製造方法。 [4] 具有前述電解槽係前述電解中所使用之陽極或陰極所產生之氣泡,在前述電解液中向鉛直方向上昇,可到達前述電解液之液面之構造之記載於[1]~[3]任一項之氟氣之製造方法。[2] The method for producing the fluorine gas described in [1] in which the metal fluoride is a fluoride of at least one metal selected from potassium, cesium, rubidium, and lithium. [3] The anode used in the aforementioned electrolysis is a carbonaceous electrode formed of at least one carbon material selected from diamond, diamond-like carbon, amorphous carbon, graphite, and glassy carbon. Described in [1] or [2] ] The production method of fluorine gas. [4] The bubbles generated by the anode or cathode used in the aforementioned electrolysis in the aforementioned electrolytic cell are described in [1]~[ 3] The production method of fluorine gas of any one.
[5]電解含有氟化氫及金屬氟化物之電解液,製造氟氣之氟氣製造裝置中, 具備:收容前述電解液,進行前述電解之電解槽、 和於前述電解時,測定前述電解槽內之電解液中之水分濃度之水分濃度測定部、 和於前述電解液之電解時,將在前述電解槽之內部所產生之流體,從前述電解槽之內部向外部輸送之流道; 前述流道係具有從前述電解槽之內部向第1外部輸送前述流體之第1流道,和從前述電解槽之內部向第2外部輸送前述流體之第2流道的同時,具有對應於以前述水分濃度測定部所測定之前述電解液中之水分濃度,將流動前述流體之流道,切換成前述第1流道或前述第2流道的流道切換部 前述流道切換部係以前述水分濃度測定部所測定之前述電解液中之水分濃度係預先設定之基準值以下之時,從前述電解槽之內部向前述第1流道,輸送前述流體,較前述預先設定之基準值為大之時,從前述電解槽之內部向前述第2流道,輸送前述流體, 前述預先設定之基準值係0.1質量%以上0.8質量%以下之範圍內之數值的氟氣製造裝置。 [發明效果][5] In a fluorine gas production device for electrolyzing an electrolyte solution containing hydrogen fluoride and metal fluoride to produce fluorine gas, Equipped with: an electrolytic cell for accommodating the above-mentioned electrolytic solution and performing the above-mentioned electrolysis, and a water concentration measuring unit for measuring the water concentration in the electrolyte solution in the electrolytic cell during the above electrolysis, And during the electrolysis of the aforementioned electrolyte, the fluid generated inside the aforementioned electrolytic cell is transported from the inside of the aforementioned electrolytic cell to the outside; The flow channel has a first flow channel for transporting the fluid from the inside of the electrolytic cell to the first outside, and a second flow channel for transporting the fluid from the inside of the electrolytic cell to the second outside. The water concentration in the electrolytic solution measured by the water concentration measuring section switches the flow channel through which the fluid flows to the first flow channel or the flow channel switching section of the second flow channel. When the water concentration in the electrolytic solution measured by the water concentration measuring part is below a preset reference value, the flow channel switching unit sends the fluid from the inside of the electrolytic cell to the first flow channel, and compares the flow. When the preset reference value is large, the fluid is transported from the inside of the electrolytic cell to the second flow passage, The above-mentioned preset reference value is a fluorine gas production apparatus with a numerical value within the range of 0.1 mass % or more and 0.8 mass % or less. [Inventive effect]
根據本發明時,電解含有氟化氫及金屬氟化物之電解液,製造氟氣之時,可抑制霧氣所造成配管或閥之閉塞。According to the present invention, when the electrolytic solution containing hydrogen fluoride and metal fluoride is electrolyzed to produce fluorine gas, it is possible to suppress the clogging of pipes and valves caused by mist.
對於本發明之一實施形態,說明如以下。然而,本實施形態係顯示實施形態之一例者,但本發明非限定於本實施形態。又,本實施形態中,可附加種種之變更或改良,而附加此等變更或改良之形態亦含於本發明中。 本發明人等係於氟氣之電解合成中,對於造成配管或閥之閉塞之霧氣,進行了深度之檢討。本發明之「霧氣」係指經由電解液之電解,在電解槽產生氟氣的同時所產生之液體之微粒子或固體之微粒子。具體而言,指電解液之微粒子、電解液之微粒子相變化之固體之微粒子、及、構成電解槽之構件(形成電解槽之金屬、電解槽用之密封墊、碳電極等)與氟氣反應所產生之固體之微粒子。An embodiment of the present invention will be described as follows. However, this embodiment shows an example of embodiment, but this invention is not limited to this embodiment. In addition, in this embodiment, various changes or improvements can be added, and the form which added these changes or improvements is also included in this invention. The inventors of the present invention conducted an in-depth examination of the mist that causes the blockage of pipes and valves in the electrolytic synthesis of fluorine gas. The "mist" in the present invention refers to the liquid microparticles or solid microparticles generated when the electrolytic cell generates fluorine gas through the electrolysis of the electrolyte. Specifically, it refers to the reaction between the microparticles of the electrolyte solution, the microparticles of the solid state of the phase change of the microparticles of the electrolyte solution, and the components constituting the electrolytic cell (metal forming the electrolytic cell, gaskets for the electrolytic cell, carbon electrodes, etc.) and fluorine gas. The fine particles of the solid produced.
本發明人等係於電解液之電解時,測定含於在電解槽之內部所產生之流體之霧氣之平均粒子徑之結果,確認到霧氣之平均粒子徑會歷時性變化。又,經深度檢討之結果,發現對於霧氣之平均粒子徑與電解時之電解液中之水分濃度有相關性,更且發現對於霧氣之平均粒子徑與輸送流體之配管或閥之閉塞之易於產生性之間有相關性。然後,發現對應於電解時之電解液中之水分濃度,改良輸送電解槽之內部所產生之流體的流道,而抑制配管或閥之閉塞,減低製造氟氣之運轉之中斷或停止之頻率,以至於完成本發明。對於本發明之一實施形態,說明如以下。The inventors of the present invention measured the average particle size of the mist contained in the fluid generated inside the electrolytic cell during electrolysis of the electrolyte solution, and confirmed that the average particle size of the mist changes over time. In addition, through the results of in-depth review, it was found that there is a correlation between the average particle size of the mist and the moisture concentration in the electrolyte during electrolysis, and it was found that the average particle size of the mist and the occlusion of the pipes or valves that transport the fluid are prone to occur. There is a correlation between sex. Then, it was found that according to the water concentration in the electrolyte during electrolysis, the flow path of the fluid generated inside the electrolytic cell was improved, and the blockage of pipes or valves was suppressed, and the frequency of interruption or stop of the operation of producing fluorine gas was reduced, so as to complete the present invention. An embodiment of the present invention will be described as follows.
本實施形態之氟氣之製造方法係電解含有氟化氫及金屬氟化物之電解液,製造氟氣之氟氣之製造方法中,具備在電解槽內,進行電解之電解工程、和於電解時,測定電解液中之水分濃度之水分濃度測定工程、和於電解液之電解時,將在於電解槽之內部所產生之流體,藉由從電解槽之內部向外部之流道輸送之送氣工程。The method for producing fluorine gas according to the present embodiment is a method for producing fluorine gas by electrolyzing an electrolyte solution containing hydrogen fluoride and metal fluoride to produce fluorine gas. The water concentration measurement process of the water concentration in the electrolytic solution, and the gas supply process that transfers the fluid generated inside the electrolytic cell through the flow channel from the inside of the electrolytic cell to the outside during the electrolysis of the electrolytic solution.
於送氣工程中,成為對應於以水分濃度測定工程所測定之電解液中之水分濃度,切換流動流體之流道。即,以水分濃度測定工程所測定之電解液中之水分濃度係預先設定之基準值以下之時,於從前述電解槽之內部向第1外部輸送流體之第1流道,輸送流體,較預先設定之基準值為大之時,於從電解槽之內部向第2外部輸送流體之第2流道,輸送流體。然後,預先設定之基準值係成為0.1質量%以上0.8質量%以下之範圍內之數值。In the air supply process, the flow path of the flowing fluid is switched according to the water concentration in the electrolyte solution measured by the water concentration measurement process. That is, when the water concentration in the electrolytic solution measured by the water concentration measurement process is below the preset reference value, the first flow path for transferring the fluid from the inside of the electrolytic cell to the first outside transfers the fluid more than the predetermined value. When the set reference value is large, the fluid is conveyed in the second flow passage that conveys the fluid from the inside of the electrolytic cell to the second outside. Then, the preset reference value is a numerical value within the range of 0.1 mass % or more and 0.8 mass % or less.
又,本實施形態之氟氣之製造裝置係電解含有氟化氫及金屬氟化物之電解液,製造氟氣之氟氣之製造裝置中,具備收容電解液,進行電解之電解槽、和於電解時,測定電解槽內之電解液中之水分濃度之水分濃度測定部、和於電解液之電解時,將在於電解槽之內部所產生之流體,從電解槽之內部向外部之輸送之流道。In addition, the fluorine gas manufacturing apparatus of the present embodiment electrolyzes an electrolytic solution containing hydrogen fluoride and metal fluoride to produce fluorine gas. Moisture concentration measuring part for measuring the water concentration in the electrolytic solution in the electrolytic cell, and a flow channel for transporting the fluid generated inside the electrolytic cell from the inside of the electrolytic cell to the outside during the electrolysis of the electrolytic solution.
上述流道係具有從電解槽之內部向第1外部輸送流體之第1流道,和從電解槽之內部向第2外部輸送流體之第2流道。又,此流道係具有對應於以水分濃度測定部所測定之電解液中之水分濃度,將流動流體之流道,切換成第1流道或第2流道的流道切換部。 流道切換部係以水分濃度測定部所測定之電解液中之水分濃度係預先設定之基準值以下之時,從電解槽之內部向第1流道,輸送流體,較預先設定之基準值為大之時,從電解槽之內部向第2流道,輸送流體。然後,預先設定之基準值係成為0.1質量%以上0.8質量%以下之範圍內之數值。The flow path includes a first flow path for conveying fluid from the inside of the electrolytic cell to the first outside, and a second flow path for conveying the fluid from the inside of the electrolytic cell to the second outside. In addition, the flow path has a flow path switching portion that switches the flow path of the flowing fluid to the first flow path or the second flow path according to the moisture concentration in the electrolyte solution measured by the moisture concentration measuring portion. When the water concentration in the electrolyte measured by the water concentration measuring part is below the preset reference value, the flow channel switching part sends the fluid from the inside of the electrolytic cell to the first flow channel, which is higher than the preset reference value. When it is large, the fluid is sent from the inside of the electrolytic cell to the second channel. Then, the preset reference value is a numerical value within the range of 0.1 mass % or more and 0.8 mass % or less.
本實施形態之氟氣之製造方法及氟氣製造裝置中,對應於電解時之電解液中之水分濃度,將流動流體之流道,切換成第1流道或第2流道之故,就結果而言,成為對應於霧氣之平均粒子徑,將流道切換成第1流道或第2流道,難以產生霧氣所造成之流道閉塞。為此,本實施形態之氟氣之製造方法及氟氣製造裝置係電解含有氟化氫及金屬氟化物之電解液,製造氟氣之時,可抑制霧氣所造成配管或閥之閉塞。因此,可減低製造氟氣運轉之中斷或停止之頻率,容易進行連續性運轉。為此,可經濟地製造氟氣。In the method for producing fluorine gas and the apparatus for producing fluorine gas according to the present embodiment, the flow path of the flowing fluid is switched to the first flow path or the second flow path according to the water concentration in the electrolyte during electrolysis. As a result, the flow path is switched to the first flow path or the second flow path according to the average particle diameter of the mist, and the flow path blockage due to the mist is less likely to occur. Therefore, the method for producing fluorine gas and the apparatus for producing fluorine gas according to the present embodiment electrolyze an electrolyte solution containing hydrogen fluoride and metal fluoride, and when producing fluorine gas, it is possible to suppress the clogging of pipes and valves caused by mist. Therefore, the frequency of interruption or stoppage of the fluorine gas production operation can be reduced, and continuous operation can be easily performed. For this reason, fluorine gas can be produced economically.
然而,於本實施形態之氟氣之製造方法及氟氣製造裝置中,電解液中之水分濃度之測定係針對配有陽極之陽極室內之電解液進行亦可,針對配有陰極之陰極室內之電解液進行亦可。又,電解液中之水分濃度之測定係可在電解中經常性進行亦可,間隔一定之間隔定期性進行亦可,不定期隨時進行亦可。更且,第1流道與第2流道係雖為各別之流道,第1外部與第2外部係可為各別處所,亦可為同一處所。However, in the method for producing fluorine gas and the apparatus for producing fluorine gas in the present embodiment, the measurement of the water concentration in the electrolyte may be performed for the electrolyte in the anode chamber equipped with the anode, and the measurement of the water concentration in the cathode chamber equipped with the cathode may be performed for the electrolyte solution in the anode chamber equipped with the anode. Electrolyte can also be carried out. In addition, the measurement of the water concentration in the electrolyte solution may be performed frequently during electrolysis, periodically at regular intervals, or at any time from time to time. Furthermore, although the first flow passage and the second flow passage are separate flow passages, the first exterior and the second exterior may be in separate locations or may be the same location.
在此,顯示本實施形態之氟氣之製造方法及氟氣製造裝置之一例。第1流道係經由從電解槽之內部,從流體除去霧氣之霧氣除去部,朝向從流體選取氟氣取出之氟氣選取部,輸送流體之流道。第2流道係不經由霧氣除去部,從電解槽之內部向氟氣選取部,輸送流體之流道。即,電解液中之水分濃度係預先設定之基準值以下之時,向備於第1流道之霧氣除去部,輸送流體,較預先設定之基準值為大之時,流體係不輸送至霧氣除去部。本例中,氟氣選取部則相當於第1外部及第2外部,第1外部與第2外部雖成為同一處所,但第1外部與第2外部可為各別之處所。Here, an example of a fluorine gas production method and a fluorine gas production apparatus according to the present embodiment are shown. The first flow channel is a flow channel for conveying the fluid through the mist removing part that removes the mist from the fluid from the inside of the electrolytic cell, and the fluorine gas extracting part that extracts the fluorine gas from the fluid. The second flow channel is a flow channel for conveying fluid from the inside of the electrolytic cell to the fluorine gas extraction section without passing through the mist removal section. That is, when the water concentration in the electrolyte solution is below the preset reference value, the fluid is sent to the mist removing part provided in the first flow path, and when it is larger than the preset reference value, the fluid system does not send the mist to the mist. Remove department. In this example, the fluorine gas extraction part corresponds to the first outer part and the second outer part. Although the first outer part and the second outer part are the same place, the first outer part and the second outer part may be different places.
然後,第2流道係具有抑制霧氣所造成第2流道之閉塞的閉塞抑制機構。閉塞抑制機構係只要可抑制霧氣所造成第2流道之閉塞者,則不特別加以限定,但例如可列舉下述者。即,可例示大口徑之配管、傾斜之配管、旋轉螺旋,氣流產生裝置,可組合此等加以使用亦可。 詳細而言,將第2流道之至少一部分,經由以較第1流道大口徑之配管加以構成,可抑制霧氣所造成第2流道之閉塞。又,將第2流道之至少一部分,經由以對於水平方向傾斜,且延伸在從上游側朝向下游側下降之方向之配管加以構成,可抑制霧氣所造成第2流道之閉塞。Then, the second flow path has a blockage suppressing mechanism for suppressing blockage of the second flow path due to mist. The blockage suppressing means is not particularly limited as long as it can suppress blockage of the second flow passage by mist, but for example, the following may be mentioned. That is, a large-diameter piping, an inclined piping, a rotary screw, and an air flow generating device can be exemplified, and these can be combined and used. Specifically, by configuring at least a part of the second flow passage through a pipe having a larger diameter than that of the first flow passage, the blockage of the second flow passage due to mist can be suppressed. In addition, by forming at least a part of the second flow passage through a pipe which is inclined with respect to the horizontal direction and extends in a direction descending from the upstream side to the downstream side, the blockage of the second flow passage by the mist can be suppressed.
更且,經由將堆積於第2流道之內部之霧氣,輸送至上游側或下游側之旋轉螺旋,設置於第2流道之內部,可抑制霧氣所造成第2流道之閉塞。更且,經由將流通為提昇流動第2流道內之流體之流速之氣流的氣流產生裝置,設置於第2流道,可抑制霧氣所造成第2流道之閉塞。然而,將與備於第1流道之霧氣除去部不同之霧氣除去部,做為閉塞抑制機構設於第2流道亦可。Furthermore, the mist accumulated in the second flow path can be prevented from being blocked by the rotary screw which transports the mist accumulated in the second flow path to the upstream side or the downstream side, and is installed inside the second flow path. Furthermore, by disposing an air flow generating device in the second flow passage that circulates an air flow that increases the flow velocity of the fluid flowing in the second flow passage, the occlusion of the second flow passage by mist can be suppressed. However, a mist removing portion different from the mist removing portion provided in the first flow passage may be provided in the second flow passage as the clogging suppressing means.
第1流道係經由霧氣除去部,從流體除去霧氣之故,難以產生霧氣所造成閉塞,第2流道係設置閉塞抑制機構之故,難以產生霧氣所造成閉塞。為此,本實施形態之氟氣之製造方法及氟氣製造裝置係電解含有氟化氫及金屬氟化物之電解液,製造氟氣之時,可抑制霧氣所造成配管或閥之閉塞。然而,雖即使不具備霧氣除去部或閉塞抑制機構,僅經由將流動流體之流道切換成其他之流道(第1流道或第2流道),可發揮抑制霧氣所造成配管或閥之閉塞的效果,但具備霧氣除去部或閉塞抑制機構者,在上述效果上為優異。Since the first flow channel removes the mist from the fluid through the mist removing part, the occlusion caused by the mist is less likely to occur, and the second flow channel is provided with the clogging suppressing mechanism, so that the occlusion caused by the mist is less likely to occur. Therefore, the method for producing fluorine gas and the apparatus for producing fluorine gas according to the present embodiment electrolyze an electrolyte solution containing hydrogen fluoride and metal fluoride, and when producing fluorine gas, it is possible to suppress the clogging of pipes and valves caused by mist. However, even if it does not have the mist removing part or the blockage suppressing mechanism, the function of suppressing the piping or valve caused by mist can be exerted only by switching the flow path of the flowing fluid to another flow path (the first flow path or the second flow path). The effect of blocking is excellent in the above-mentioned effect if the mist removing portion or blocking suppressing mechanism is provided.
以下,對於本實施形態之氟氣之製造方法及氟氣製造裝置,更詳細加以說明。 [電解槽] 電解槽之形態沒有特別加以限制,只要可電解含有氟化氫及金屬氟化物之電解液,產生氟氣,任何之電解槽皆可使用。 通常,電解槽之內部係經由間隔壁等之區隔構件,分割成配有陽極之陽極室與配有陰極之陰極室,不會讓陽極所產生之氟氣與陰極所產生之氫氣混合。Hereinafter, the method for producing fluorine gas and the apparatus for producing fluorine gas according to the present embodiment will be described in more detail. [electrolyzer] The form of the electrolytic cell is not particularly limited, and any electrolytic cell can be used as long as it can electrolyze an electrolyte solution containing hydrogen fluoride and metal fluoride to generate fluorine gas. Usually, the interior of the electrolytic cell is divided into an anode chamber equipped with an anode and a cathode chamber equipped with a cathode through a partition member such as a partition wall, so that the fluorine gas generated by the anode and the hydrogen gas generated by the cathode are not mixed.
做為陽極係例如可使用鑽石、類金剛石碳、非晶質碳、石墨、玻璃碳、不定形碳等之碳材料所形成之碳質電極。又,做為陽極,除了上述碳材料之外,例如可使用鎳、Monel(商標)等之金屬所形成之金屬電極。又,做為陰極,例如可使用鐵、銅、鎳、Monel(商標)等之金屬所形成之金屬電極。As the anode, for example, a carbonaceous electrode formed of a carbon material such as diamond, diamond-like carbon, amorphous carbon, graphite, glassy carbon, and amorphous carbon can be used. Moreover, as an anode, in addition to the above-mentioned carbon material, for example, a metal electrode formed of a metal such as nickel and Monel (trademark) can be used. Moreover, as a cathode, the metal electrode formed of metals, such as iron, copper, nickel, Monel (trademark), can be used, for example.
電解液係含有氟化氫及金屬氟化物,此金屬氟化物之種類雖不特別加以限定,以選自鉀、銫、銣、及鋰至少1種之金屬之氟化物為佳。於電解液含有銫或銣時,電解液之比重會變大之故,可抑制電解時之霧氣之產生量。The electrolyte solution contains hydrogen fluoride and metal fluoride. Although the type of the metal fluoride is not particularly limited, it is preferably a fluoride of at least one metal selected from potassium, cesium, rubidium, and lithium. When the electrolytic solution contains cesium or rubidium, the specific gravity of the electrolytic solution will increase, so that the amount of mist generated during electrolysis can be suppressed.
做為電解液,例如可使用氟化氫(HF)與氟化鉀(KF)之混合熔融鹽。氟化氫與氟化鉀之混合熔融鹽中之氟化氫與氟化鉀之莫爾比係例如可成為氟化氫:氟化鉀=1.5~2.5:1。氟化氫:氟化鉀=2:1時之KF・2HF為代表性之電解液,此混合熔融鹽之融點係約72℃。此電解液係具有腐蝕性之故,電解槽之內面等電解液之接觸部位係以鐵、鎳、Monel(商標)等之金屬加以形成為佳。As the electrolyte, for example, a mixed molten salt of hydrogen fluoride (HF) and potassium fluoride (KF) can be used. The molar ratio of hydrogen fluoride and potassium fluoride in the mixed molten salt of hydrogen fluoride and potassium fluoride can be, for example, hydrogen fluoride:potassium fluoride=1.5~2.5:1. Hydrogen fluoride: Potassium fluoride = 2:1 KF・2HF is the representative electrolyte, and the melting point of this mixed molten salt is about 72℃. Since the electrolyte is corrosive, it is preferable that the contact parts of the electrolyte such as the inner surface of the electrolytic cell are formed of metals such as iron, nickel, and Monel (trademark).
於電解液之電解時,於陽極與陰極施加直流電流,含氟氣之氣體在陽極產生,含氫氣之氣體在陰極產生。又,於電解液之氟化氫,有蒸氣壓之故,陽極及陰極所產生之氣體中,各別混伴有氟化氫。更且,於電解液之電解所進行之氟氣之製造中,經由電解所產生之氣體中,含有電解液之霧氣。因此,電解槽之氣相部分係經由電解所產生之氣體與氟化氫與電解液之霧氣所成。因此,從電解槽之內部向外部輸出者係經由電解所產生之氣體和氟化氫與電解液之霧氣所成,本發明中,將此稱之為「流體」。During the electrolysis of the electrolyte, a direct current is applied to the anode and the cathode, the gas containing fluorine gas is generated at the anode, and the gas containing hydrogen gas is generated at the cathode. In addition, the hydrogen fluoride in the electrolyte has a vapor pressure, so hydrogen fluoride is mixed with the gas generated by the anode and the cathode, respectively. Furthermore, in the production of fluorine gas by electrolysis of the electrolytic solution, the gas generated by the electrolysis contains the mist of the electrolytic solution. Therefore, the gas phase part of the electrolytic cell is formed by the gas generated by electrolysis and the mist of hydrogen fluoride and electrolyte. Therefore, what is outputted from the inside of the electrolytic cell to the outside is formed by the gas generated by electrolysis and the mist of hydrogen fluoride and electrolyte solution, which is called "fluid" in the present invention.
然而,經由電解之進行,電解液中之氟化氫被消耗之故,將氟化氫連續性或斷續性供給至電解槽加以補給之配管,連接至電解槽亦可。氟化氫之供給係可供給至電解槽之陰極室側,亦可供給至陽極室側。 於電解液之電解時,產生霧氣之主要理由係如以下所述。電解時之電解液之溫度係例如調整至80~100℃。KF・2HF之融點係71.7℃之故,調整至上述溫度之時,電解液係在液體狀態。電解槽之兩電極所產生之氣體之氣泡係在電解液中上昇,在電解液之液面撐破。此時,電解液之一部分則放出至氣相中。However, since the hydrogen fluoride in the electrolytic solution is consumed by the progress of the electrolysis, the piping for supplying hydrogen fluoride to the electrolytic tank continuously or intermittently for replenishment may be connected to the electrolytic tank. The supply of hydrogen fluoride may be supplied to the cathode chamber side of the electrolytic cell, or may be supplied to the anode chamber side. The main reasons for the generation of mist during electrolysis of the electrolyte solution are as follows. The temperature of the electrolyte solution at the time of electrolysis is adjusted to, for example, 80 to 100°C. The melting point of KF and 2HF is 71.7°C. When the temperature is adjusted to the above temperature, the electrolyte is in a liquid state. The gas bubbles generated by the two electrodes of the electrolytic cell rise up in the electrolyte and burst at the liquid level of the electrolyte. At this time, a part of the electrolyte solution is released into the gas phase.
氣相之溫度係較電解液之融點為低之故,在此放出之電解液係相變化成極微小之粉體之狀態。此粉體係應為氟化鉀與氟化氫之混合物KF・nHF。此粉體係乘著其他所產生之氣體之流動而成為霧氣,形成電解槽所產生之流體。如此霧氣係經由具有黏著性等之理由,僅是過濾器之設置等之通常對策,難以有效加以除去。Since the temperature of the gas phase is lower than the melting point of the electrolyte, the electrolyte released here is phase-changed into a state of extremely fine powder. The powder system should be KF·nHF, a mixture of potassium fluoride and hydrogen fluoride. This powder system rides on the flow of other generated gases to become mist, forming the fluid produced by the electrolytic cell. Such mist is difficult to effectively remove due to the reasons of stickiness and the like, and it is only a normal countermeasure such as the installation of a filter.
又,做為產生量雖為少量,會有由於與陽極之碳質電極與電解所產生之氟氣之反應,有機化合物之微粉末則做為霧氣產生之情形。詳細而言,對碳質電極之電流之供電部分係多會產生接觸阻抗,經由焦耳熱,會有成為較電解液之溫度為高之溫度之情形。為此,經由形成碳質電極之碳與氟氣之反應,煤狀之有機化合物CFx則有做為霧氣產生之情形。In addition, although the amount of generation is small, there may be cases where fine powder of organic compounds is generated as mist due to the reaction with the carbonaceous electrode of the anode and the fluorine gas generated by electrolysis. In detail, contact resistance is often generated in the power supply portion of the current to the carbonaceous electrode, and the temperature of the electrolyte may be higher than that of the electrolyte through Joule heat. For this reason, the coal-like organic compound CFx may be generated as a mist through the reaction between the carbon forming the carbonaceous electrode and the fluorine gas.
然而,電解槽係具有於電解中所使用之陽極或陰極所產生之氣泡,在電解液中向鉛直方向上昇,到達電解液之液面之構造為佳。當氣泡難以在電解液中鉛直方向上昇,具有對於鉛直方向向傾斜之方向上昇之構造時,複數之氣泡易於集合成大氣泡。其結果,大氣泡則到達電解液之液面撐破之故,霧氣之產生量易於變多。具有氣泡在電解液中向鉛直方向上昇時,可到達電解液之液面的構造時,小氣泡到達電解液之液面而撐破之故,霧氣之產生量易於變少。However, the electrolytic cell has a structure in which the air bubbles generated by the anode or cathode used in the electrolysis rise in the vertical direction in the electrolyte and reach the liquid level of the electrolyte. When it is difficult for the air bubbles to rise vertically in the electrolyte solution and has a structure in which it rises in an oblique direction with respect to the vertical direction, a plurality of air bubbles tend to aggregate into large air bubbles. As a result, since the large air bubbles reach the liquid level of the electrolyte solution and burst, the amount of mist generation tends to increase. When bubbles rise in the vertical direction in the electrolyte, they can reach the liquid level of the electrolyte, and the small air bubbles reach the liquid level of the electrolyte and burst, and the amount of mist generated tends to be reduced.
[平均粒子徑測定部] 本實施形態之氟氣製造裝置雖可具備測定含於流體之霧氣之平均粒子徑之平均粒子徑測定部,此平均粒子徑測定部係可以光散亂方式測定平均粒子徑之光散亂檢測器加以構成。光散亂檢測器係連續運轉氟氣製造裝置下,可測定流動於流道之流體中之霧氣之平均粒子徑之故,做為平均粒子徑測定部為佳。[Average particle diameter measurement section] Although the fluorine gas production apparatus of the present embodiment may include an average particle diameter measuring section for measuring the average particle diameter of mist contained in the fluid, the average particle diameter measuring section is an optical scattering detector capable of measuring the average particle diameter by optical scattering. be constituted. Since the light scattering detector can measure the average particle diameter of the mist in the fluid flowing in the flow channel under the continuous operation of the fluorine gas production device, it is preferable to be used as the average particle diameter measuring unit.
將光散亂檢測器之一例,參照圖1下加以說明。圖1之光散亂檢測器係於本實施形態之氟氣製造裝置(例如,後述之圖2及圖4~13之氟氣製造裝置)中,可做為平均粒子徑測定部使用之光散亂檢測器。即,將含有氟化氫及金屬氟化物之電解液,在氟氣製造裝置之電解槽之內部,進行電解,製造氟氣之時,測定含於在電解槽之內部所產生之流體之霧氣之平均粒子徑的光散亂檢測器。 將光散亂檢測器連接於氟氣製造裝置,將流體從電解槽之內部送至光散亂檢測器,測定霧氣之平均粒子徑亦可,或不連接光散亂檢測器與氟氣製造裝置,從電解槽之內部取出流體,導入光散亂檢測器,測定霧氣之平均粒子徑亦可。An example of the light scattering detector will be described below with reference to FIG. 1 . The light scattering detector shown in FIG. 1 is used in the fluorine gas production apparatus of the present embodiment (for example, the fluorine gas production apparatus shown in FIGS. 2 and 4 to 13 described later), and can be used as a light scattering detector used in the average particle diameter measuring section. clutter detector. That is, the electrolytic solution containing hydrogen fluoride and metal fluoride is electrolyzed inside the electrolytic cell of the fluorine gas production device, and when fluorine gas is produced, the average particle size of the mist contained in the fluid generated in the electrolytic cell is measured. light scattering detector. The optical dispersion detector is connected to the fluorine gas production device, and the fluid is sent from the inside of the electrolytic cell to the optical dispersion detector to measure the average particle size of the mist, or the optical dispersion detector and the fluorine gas production device are not connected. , Take out the fluid from the inside of the electrolytic cell and introduce it into a light scattering detector to measure the average particle size of the mist.
圖1之光散亂檢測器係具備收容流體F之試料室1、和將光散亂測定用光L,照射於試料室1中之流體F的光源2、和檢測光散亂測定用光L經由流體F中之霧氣M被散亂而產生之散亂光S的散亂光檢測部3、和設置於試料室1,與流體F接觸,透過光散亂測定用光L之透明窗4A、設置於試料室1,與流體F接觸,透過散亂光S之透明窗4B。透明窗4A、4B係以選自鑽石、氟化鈣(CaF2
)、氟化鉀(KF)、氟化銀(AgF)、氟化鋇(BaF2
)、及溴化鉀(KBr)之至少1種加以形成。The light scattering detector of FIG. 1 includes a
從光源2發出之光散亂測定用光L(例如雷射光)係透過收斂透鏡6及試料室1之透明窗4A,進入試料室1內,照射於收容於試料室1之流體F。此時,於流體F中,存在反射如霧氣M之光的物質時,光散亂測定用光L則反射而散亂。光散亂測定用光L經由霧氣M散亂所產生之散亂光S之一部分係透過試料室1之透明窗4B,從試料室1向外部取出,藉由聚光透鏡7及光圈8,進入散亂光檢測部3。此時,經由從散亂光S所得之資訊,可知霧氣M之平均粒子徑。然而,在此所得之平均粒子徑係個數之平均粒子徑。做為散亂光檢測部3,例如可使用PALAS公司製之氣溶膠譜儀welas(註冊商標)digital 2000。Light L (eg, laser light) emitted from the
透明窗4A、4B雖接觸於流體F,於流體F含有反應性高之氟氣之故,需以難以被氟氣腐蝕之材質形成透明窗4A、4B。做為形成透明窗4A、4B之材質係可列舉選自鑽石、氟化鈣、氟化鉀、氟化銀、氟化鋇、及溴化鉀之至少1種。透明窗4A、4B以上述材質形成之時,可抑制與流體F接觸所造成之劣化。Although the
又,可將上述之材質所成被膜,塗佈於石英等之玻璃之表面,做為透明窗4A、4B加以使用。與流體F接觸之部分以上述之材質所成被膜加以塗佈之故,可抑制成本下,抑制與流體F接觸所造成之劣化。透明窗4A、4B係可為將與流體F接觸之面,以上述之材質形成,將除此以外之部分,以石英等之通常之玻璃所形成之層積體。
光散亂檢測器中之透明窗4A、4B以外之部分之材質雖只要對於氟氣具有耐蝕性之材質,則不特別加以限定,但例如使用銅-鎳合金之Monel(商標)、HASTELLOY(商標)、不鏽鋼等之金屬材料為佳。In addition, a film made of the above-mentioned material can be applied to the surface of glass such as quartz, and used as the
[霧氣之平均粒子徑與電解液中之水分濃度] 本發明者等係將電解液之電解所成氟氣之製造時所產生之霧氣之平均粒子徑,使用光散亂檢測器加以測定。說明其結果之一例。將氟氣製造裝置之陽極交換成新的陽極,於電解槽內填充新的電解液後,開胎電解,電解開始後至一定期間,測定陽極所產生之流體中之霧氣之平均粒子徑。其結果,霧氣之平均粒子徑係0.5~2.0μm。之後,繼續電解,經過充分時間,電解則開始安定,此安定電解時之流體中之霧氣之平均粒子徑係約0.2μm。 如此,於電解開始後至安定電解時之期間,產生較大之粒子徑之霧氣。於含有電解開始後之大霧氣的流體,流入配管或閥內之時,霧氣則吸附於配管或閥之內面,易於產生配管或閥之閉塞。[Average particle size of mist and water concentration in electrolyte] The inventors of the present invention measured the average particle diameter of the mist generated during the production of fluorine gas formed by electrolysis of the electrolyte solution using a light scattering detector. An example of the result will be described. Replace the anode of the fluorine gas production device with a new anode, fill the electrolytic tank with new electrolyte, open the tire for electrolysis, and measure the average particle size of the mist in the fluid generated by the anode during a certain period of time after the start of electrolysis. As a result, the average particle diameter of the mist was 0.5 to 2.0 μm. After that, the electrolysis is continued, and after a sufficient time, the electrolysis begins to stabilize, and the average particle diameter of the mist in the fluid during stable electrolysis is about 0.2 μm. In this way, during the period from the start of electrolysis to the time of stable electrolysis, mist with a large particle size is generated. When the fluid containing the large mist after the start of electrolysis flows into the pipe or valve, the mist is adsorbed on the inner surface of the pipe or valve, and the blockage of the pipe or valve is easy to occur.
對此,於安定電解時,所產生之霧氣之粒子徑較小。如此小霧氣係在流體中難以產生沈降或堆積之故,可安定地在配管或閥流動。為此,於安定電解時,霧氣與在電極所產生之氣體所成流體係產生配管或閥之閉塞的可能性為低。然而,電解開始後至安定電解時之時間,係通常為25小時以上200小時以下。又,從電解開始後至安定電解時,每1000L電解液,需大略40kAh以上之通電。In this regard, during stable electrolysis, the particle size of the generated mist is small. Such a small mist is difficult to settle or accumulate in the fluid, and it can flow stably through pipes or valves. For this reason, during stable electrolysis, the possibility that the flow system of the mist and the gas generated in the electrode will block the piping or the valve is low. However, the time from the start of electrolysis to the time of stable electrolysis is usually 25 hours or more and 200 hours or less. Also, from the start of electrolysis to the time of stable electrolysis, approximately 40kAh or more of electricity is required per 1000L of electrolyte.
又,本發明人等係發現於霧氣之平均粒子徑與電解液中之水分濃度之間,有密切之關係。通常,電解液中之水分濃度係於電解開始時為大,顯示較1.0質量%為大之值。此時之霧氣之平均粒子徑係係較0.4μm為大。之後,伴隨繼續電解,電解液中之水分濃度則下降,成為0.3質量%以下時,霧氣之平均粒子徑係成為0.4μm以下。In addition, the present inventors discovered that there is a close relationship between the average particle size of the mist and the water concentration in the electrolyte solution. Usually, the water concentration in the electrolytic solution is large at the start of electrolysis, and shows a value larger than 1.0% by mass. The average particle diameter of the mist at this time is larger than 0.4 μm. Thereafter, as the electrolysis is continued, the water concentration in the electrolyte solution decreases, and when it becomes 0.3 mass % or less, the average particle diameter of the mist becomes 0.4 μm or less.
如此,霧氣之平均粒子徑與電解液中之水分濃度有相關性之故,可於電解時,代替霧氣之平均粒子徑,測定電解液中之水分濃度,將該測定結果,利用於流道之切換。即,在電解中之特定之時機,測定電解液中之水分濃度時,對應該測定結果,在上述特定之時機,適切切換流動電解所產生之流體的流道。In this way, since the average particle size of the mist has a correlation with the moisture concentration in the electrolyte, it is possible to replace the average particle size of the mist during electrolysis to measure the moisture concentration in the electrolyte, and use the measurement results in the flow path. switch. That is, when the water concentration in the electrolyte is measured at a specific timing during electrolysis, in accordance with the measurement result, the flow path of the fluid generated by electrolysis is appropriately switched at the above-mentioned specific timing.
電解液中之水分濃度之推演係關連於電流值之大小、通電量(電流值與電解時間之積)而減少。電流值愈大,水分濃度之減少雖會變快,將產生陽極之電壓急遽上昇之陽極效果之碳質電極,使用於陽極之時,可以陽極之電流密度較0.1 A/cm2 小之值進行電解。可在電流密度一定下,使水分濃度下降,亦可徐徐增加電流密度下,使水分濃度下降。The deduction of the water concentration in the electrolyte is related to the magnitude of the current value and the amount of energization (the product of the current value and the electrolysis time) and decreases. The larger the current value, the faster the reduction of the water concentration, which will produce a carbonaceous electrode with an anode effect that the voltage of the anode rises sharply. electrolysis. The water concentration can be decreased at a constant current density, or the water concentration can be decreased by increasing the current density gradually.
本發明人等係根據如此之見解,發明具有對應於電解時之電解液中之水分濃度,切換流動流體之流道之構造的上述氟氣之製造方法及氟氣製造裝置。本實施形態之氟氣製造裝置係具有第1流道與第2流道,使用流道切換部(例如切換閥),從2個流道中,選擇流體之搬送所使用之流道亦可。Based on these findings, the present inventors have invented the above-mentioned fluorine gas production method and fluorine gas production apparatus having a structure in which the flow passage of the flowing fluid is switched according to the water concentration in the electrolyte during electrolysis. The fluorine gas production apparatus of the present embodiment has a first flow channel and a second flow channel, and a flow channel for fluid transfer may be selected from the two flow channels by using a flow channel switching portion (eg, a switching valve).
或本實施形態之氟氣製造裝置係具有2個流道,和進行電解槽之移動及交換之移動交換機構,從2個流道中,選擇流體之搬送所使用之流道,於該流道之附近,經由移動電解槽加以連接,進行切換流道亦可。 如上所述,具有第1流道與第2流道之故,切斷一方之流道進行清潔期間,可開啟另一方之流道,繼續氟氣製造裝置之運轉。Alternatively, the fluorine gas production apparatus of the present embodiment has two flow channels, and a moving exchange mechanism for moving and exchanging the electrolytic cell. From the two flow channels, the flow channel used for the transfer of the fluid is selected, and the flow channel is located between the flow channels. Nearby, it is also possible to connect via a mobile electrolytic cell, and to switch the flow path. As described above, since the first flow channel and the second flow channel are provided, while the one flow channel is cut off for cleaning, the other flow channel can be opened to continue the operation of the fluorine gas production apparatus.
在本發明人等之檢討中,從電解開始後至安定電解時之期間係產生平均粒子徑較大之霧氣之故,此時於具有閉塞抑制機構之第2流道,輸送流體亦可。經過時間,到達安定電解時,產生平均粒子徑較小之霧氣之故,於此時,使於具有霧氣除去部之第1流道,輸送流體地,切換流道亦可。In the review by the present inventors, since the mist with a large average particle size is generated during the period from the start of electrolysis to the time of stable electrolysis, the fluid may be transported in the second flow passage having the occlusion suppressing mechanism at this time. As time elapses, and when stable electrolysis is reached, mist with a small average particle size is generated. At this time, the first flow channel having the mist removing portion can be used to transfer fluid, and the flow channel can be switched.
如此流道之切換雖對應於測定之電解液中之水分濃度而進行,可根據預先設定之基準值,進行流道之切換。對於陽極所產生之霧氣之平均粒子徑之適切基準值雖對每一裝置而有所不同,例如可為0.1μm以上1.0μm以下,較佳為0.2μm以上0.8μm以下,更佳為0.4μm。 因此,從霧氣之平均粒子徑與電解液中之水分濃度之相關性視之,對於電解液中之水分濃度之適切基準值係係0.1質量%以上0.8質量%以下,較佳為0.2質量%以上0.6質量%以下,更佳為0.3質量%。電解液中之水分濃度係較基準值為大之時,可於第2流道輸送流體,為基準值以下之時,可於第1流道,輸送流體。Although the switching of the flow channels is carried out according to the measured water concentration in the electrolyte, the switching of the flow channels can be carried out according to the preset reference value. A suitable reference value for the average particle diameter of the mist generated by the anode varies for each device, but may be, for example, 0.1 μm or more and 1.0 μm or less, preferably 0.2 μm or more and 0.8 μm or less, and more preferably 0.4 μm. Therefore, from the perspective of the correlation between the average particle size of the mist and the water concentration in the electrolyte solution, the appropriate reference value for the water concentration in the electrolyte solution is 0.1 mass % or more and 0.8 mass % or less, preferably 0.2 mass % or more 0.6 mass % or less, More preferably, it is 0.3 mass %. When the water concentration in the electrolyte is greater than the reference value, the fluid can be transported in the second flow channel, and when the water concentration is below the reference value, the fluid can be transported in the first flow channel.
電解液中之水分濃度係例如可經由卡爾費雪法加以測定。或,可將電解液加熱至例如250℃以上400℃以下,將產生之氣體中之水分之量,經由例如紅外線分光法測定,求得電解液中之水分濃度。在使用於卡爾費雪法之檢出液,固體狀之電解液幾乎不溶解之故,雖需要溶解固體狀之電解液之其他溶媒,但幾乎沒有對於固體狀之電解液具有大溶解度之溶媒。因此,難以溶解多量之固體狀之電解液,進行卡爾費雪分析之故,卡爾費雪法係適於水分含有量多之固體狀之電解液之分析。相較於此,加熱固體狀之電解液,測定產生氣體中之水分之量之方法雖較卡爾費雪法需較長之分析時間,但可精度佳地分析電解液中之水分濃度。The water concentration in the electrolyte solution can be measured, for example, by the Karl Fischer method. Alternatively, the electrolyte solution can be heated to, for example, 250° C. or higher and 400° C. or lower, and the amount of water in the generated gas can be measured by, for example, infrared spectroscopy to obtain the water concentration in the electrolyte solution. In the detection solution used in the Karl Fischer method, since the solid electrolyte is almost insoluble, although other solvents for dissolving the solid electrolyte are required, there are almost no solvents with high solubility for the solid electrolyte. Therefore, since it is difficult to dissolve a large amount of solid electrolyte and perform Karl Fischer analysis, the Karl Fischer method is suitable for the analysis of solid electrolyte with a large water content. In contrast, the method of heating a solid electrolyte to measure the amount of water in the generated gas requires a longer analysis time than the Karl Fischer method, but can accurately analyze the water concentration in the electrolyte.
然而,陰極所產生之流體(主成分為氫氣)中,例如每單位體積(1公升)含20~50μg(假設霧氣之比重係1.0 g/mL所算出)之粉體,此粉體之平均粒子徑係約0.1μm,具有±0.05μm之分布。However, the fluid produced by the cathode (the main component is hydrogen), for example, contains 20~50μg (calculated by assuming the specific gravity of the mist is 1.0 g/mL) per unit volume (1 liter) of powder, the average particle size of this powder The diameter is about 0.1 μm, with a distribution of ±0.05 μm.
於陰極所產生之流體中,經由電解液中之水分濃度,於產生之粉體之粒子徑分布上,沒有大的差異。含於陰極所產生之流體的霧氣係較含於陽極所產生之流體的霧氣,平均粒子徑較小之故,相較含於陽極所產生之流體的霧氣,難以產生配管或閥之閉塞。因此,含於陰極所產生之流體的霧氣係可使用適當之除去方法,從流體加以除去即可。In the fluid produced by the cathode, through the water concentration in the electrolyte, there is no big difference in the particle size distribution of the produced powder. The mist containing the fluid generated by the cathode has a smaller average particle size than the mist containing the fluid generated by the anode, and it is more difficult to cause blockage of pipes or valves than the mist containing the fluid generated by the anode. Therefore, the mist containing the fluid generated at the cathode can be removed from the fluid by using an appropriate removal method.
將本實施形態之氟氣製造裝置之一例,參照圖2之下,詳細加以說明。圖2之氟氣製造裝置雖為具備2座電解槽之例,電解槽可為1座,亦可為3座以上,例如可為10~15座。
圖2所示氟氣製造裝置係具備於內部收容電解液10,進行電解之電解槽11、11、和配置於電解槽11之內部,浸漬於電解液10之陽極13、和配置於電解槽11之內部,浸漬於電解液10的同時,對向於陽極13配置之陰極15。An example of the fluorine gas production apparatus of the present embodiment will be described in detail with reference to the lower part of FIG. 2 . Although the fluorine gas production apparatus of FIG. 2 is an example with two electrolytic cells, the number of electrolytic cells may be one, or three or more, for example, 10 to 15 cells.
The fluorine gas production apparatus shown in FIG. 2 includes
電解槽11之內部係從電解槽11之內部之天花板向垂直方向下方延伸,且經由該下端浸漬於電解液10之間隔壁17,分割成陽極室22與陰極室24。然後,於陽極室22內配置陽極13,於陰極室24內配置陰極15。惟,電解液10之液面上之空間係經由間隔壁17,分離成陽極室22內之空間與陰極室24內之空間,對於較電解液10中間隔壁17之下端上方側之部分,雖經由間隔壁17加以分離,對於較電解液10中間隔壁17之下端下方側之部分,未經由間隔壁17直接分離而連續。The inside of the
又,圖2所示氟氣製造裝置係具備於電解液10之電解時,測定電解槽11內之電解液10中之水分濃度的水分濃度測定部36、和於電解液10之電解時,測定含於在電解槽11之內部所產生之流體之霧氣之平均粒子徑的第1平均粒子徑測定部31、和從流體除去霧氣之第1霧氣除去部32、和從流體選取氟氣而取出之氟氣選取部(未圖示)、和將流體從電解槽11之內部輸送至氟氣選取部之流道。Further, the fluorine gas production apparatus shown in FIG. 2 is provided with a moisture
更且,此流道係具有經由第1霧氣除去部32,從電解槽11之內部向氟氣選取部輸送流體之第1流道,和不經由第1霧氣除去部32,從電解槽11之內部向氟氣選取部輸送流體之第2流道。又,此流道係具有對應於以水分濃度測定部36所測定之電解液10中之水分濃度,將流動流體之流道,切換成第1流道或第2流道的流道切換部。即,於從電解槽11延伸之流道之途中,設置流道切換部,經由流道切換部,可變更流動流體之流道。Furthermore, this flow channel has a first flow channel for conveying fluid from the inside of the
此流道切換部係以水分濃度測定部36所測定之電解液10中之水分濃度係預先設定之基準值以下之時,從電解槽11之內部向第1流道,輸送流體,較預先設定之基準值為大之時,從電解槽11之內部向第2流道,輸送流體。然後,第2流道係具有抑制第2流道之霧氣所造成之閉塞的閉塞抑制機構。This flow channel switching unit transfers the fluid from the inside of the
即,電解液10中之水分濃度為基準值以下之時,連結電解槽11與氟氣選取部,且於設置第1霧氣除去部32之第1流道,輸送流體,電解液10中之水分濃度為較基準值為大之時,連結電解槽11與氟氣選取部,且於設置閉塞抑制機構之第2流道,輸送流體。
做為水分濃度測定部36,例如可使用卡爾費雪水分測定裝置。That is, when the water concentration in the
做為第1霧氣除去部32,例如使用可將平均粒子徑0.4μm以下之霧氣,從流體除去之霧氣除去裝置。霧氣除去裝置之種類,即對於除去霧氣之方式,雖未特別加以限定,霧氣之平均粒子徑為小之故,例如可將電氣集塵裝置、文氏管洗淨器、過濾器做為霧氣除去裝置加以使用。As the first
上述霧氣除去裝置中,使用圖3所示霧氣除去裝置為佳。圖3所示霧氣除去裝置係將液體之氟化氫做為循環液使用之洗淨器式之霧氣除去裝置。圖3所示霧氣除去裝置係可將平均粒子徑0.4μm以下之霧氣,從流體有效率地加以除去。又,雖將液體之氟化氫做為循環液使用,為使氟氣中之氟化氫之濃度下降,冷卻循環液為佳之故,可經由冷卻溫度之控制,調整氟氣中之氟化氫之濃度。Among the above-mentioned mist removing apparatuses, it is preferable to use the mist removing apparatus shown in FIG. 3 . The mist removing device shown in FIG. 3 is a scrubber-type mist removing device using liquid hydrogen fluoride as a circulating liquid. The mist removing device shown in FIG. 3 can efficiently remove mist having an average particle diameter of 0.4 μm or less from the fluid. In addition, although the liquid hydrogen fluoride is used as the circulating liquid, in order to reduce the concentration of hydrogen fluoride in the fluorine gas, it is better to cool the circulating liquid, and the concentration of hydrogen fluoride in the fluorine gas can be adjusted by controlling the cooling temperature.
對於圖2所示氟氣製造裝置,更詳細加以說明。將電解槽11之陽極室22所產生之流體(有以下記為「陽極氣體」之情形),輸送至外部之第1配管41,則連通電解槽11與第4配管44,從2個電解槽11、11送出之陽極氣體,則經由第1配管41,輸送至第4配管44加以混合。然而,陽極氣體之主成分係氟氣,副成分係霧氣、氟化氫、四氟化碳、氧氣、水。The fluorine gas production apparatus shown in FIG. 2 will be described in more detail. The fluid generated in the
第4配管44係連接於第1霧氣除去部32,陽極氣體則經由第4配管44輸送至第1霧氣除去部32之故,陽極氣體中之霧氣及氟化氫則經由第1霧氣除去部32,從陽極氣體加以除去。除去霧氣及氟化氫之陽極氣體係經由連接於第1霧氣除去部32之第6配管46,從第1霧氣除去部32,送出至未圖示氟氣選取部。然後,經由氟氣選取部,從陽極氣體選取氟氣而取出。The
然而,於第1霧氣除去部32,連接第8配管48,循環液之液體之氟化氫則經由第8配管48,供給至第1霧氣除去部32。更且,於第1霧氣除去部32,連接第9配管49。第9配管49係藉由第3配管43,連接於電解槽11、11,在第1霧氣除去部32使用於霧氣之除去,含有霧氣之循環液(液體之氟化氫),則從第1霧氣除去部32回到電解槽11、11。However, an
對於電解槽11之陰極室24,並與陽極室22相同。即,將電解槽11之陰極室24產生之流體(有以下記為「陰極氣體」之情形),輸送至外部之第2配管42,則連通電解槽11與第5配管45,從2個電解槽11、11送出之陰極氣體,則經由第2配管42,輸送至第5配管45加以混合。然而,陰極氣體之主成分係氫氣,副成分係霧氣、氟化氫、水。For the
陰極氣體係含有細微霧氣與5~10體積%之氟化氫之故,直接排出大氣並不好。為此,第5配管45連接於第2霧氣除去部33,陰極氣體則經由第5配管45送至第2霧氣除去部33之故,陰極氣體中之霧氣及氟化氫則經由第2霧氣除去部33,從陰極氣體加以除去。除去霧氣及氟化氫之陰極氣體係經由連接於第2霧氣除去部33之第7配管47,從第2霧氣除去部33,排出到大氣。第2霧氣除去部33之種類,即對於除去霧氣之方式,雖未特別加以限定,可使用將鹼水溶液做為循環液使用之洗淨器式之霧氣除去裝置。Because the cathode gas system contains fine mist and 5~10% by volume of hydrogen fluoride, it is not good to directly discharge the atmosphere. Therefore, the
第1配管41、第2配管42、第4配管44、第5配管45之管徑或設置方向(意味配管延伸之方向,例如鉛直方向、水平方向)雖未特別加以限定,第1配管41及第2配管42係從電解槽11沿鉛直方向延伸設置,流動於第1配管41及第2配管42之流體之流速在標準狀態成為30 cm/sec以下,設定管徑為佳。如此,含於流體之霧氣以自重落下時,霧氣會沈降於電解槽11內之故,難以產生粉體所造成第1配管41及第2配管42之內部之閉塞。
又,第4配管44及第5配管45係沿水平方向延伸設置,流動於第4配管44及第5配管45之流體之流速成為第1配管41及第2配管42時之1倍~10倍程度快速地,設定管徑為佳。The diameter or installation direction (meaning the direction in which the pipes extend, such as the vertical direction and the horizontal direction) of the
更且,為將陽極氣體送至電解槽11之外部之第2旁路配管52則與第1配管41另外設置。即,第2旁路配管52係連通電解槽11與第1旁路配管51,從2個電解槽11、11送出之陽極氣體,則經由第2旁路配管52,送至第1旁路配管51加以混合。更且,經由第1旁路配管51,陽極氣體則送出至未圖示氟氣選取部。然後,經由氟氣選取部,從陽極氣體選取氟氣而取出。然而,連接於第1旁路配管51化氟氣選取部、和連接於第6配管46之氟氣選取部係可為相同者,亦可為不同者。Furthermore, the second bypass piping 52 for sending the anode gas to the outside of the
第2旁路配管52之管徑或設置方向雖未特別加以限定,第2配管52係從電解槽11沿鉛直方向延伸設置,流動於第2旁路配管52之流體之流速在標準狀態成為30 cm/sec以下,設定管徑為佳。Although the diameter or installation direction of the second bypass piping 52 is not particularly limited, the
又,第1旁路配管51係沿水平方向延伸設置。然後,第1旁路配管51係成為較第4配管44為大之口徑之管徑之配管,第1旁路配管51之管徑係大到難以產生粉體之堆積所造成第1旁路配管51之閉塞。第1旁路配管51係經由成為較第4配管44為大之口徑之管徑之配管,構成閉塞抑制機構。
第1旁路配管51之管徑係第4配管44之超過1.0倍3.2倍以下為佳,1.05倍以上1.5倍以下為更佳。即,第1旁路配管51之流道剖面積係第4配管44之10倍以下為佳。Moreover, the 1st bypass piping 51 is extended in the horizontal direction. Then, the
由以上之說明可知,經由第1配管41及第4配管44,構成上述之第1流道,經由第1旁路配管51及第2旁路配管52,構成上述之第2流道。然後,於構成第2流道之第1旁路配管51設置閉塞抑制機構。As can be seen from the above description, the above-mentioned first flow path is formed via the
接著,對於流道切換部加以說明。於第1配管41,各別設置第1配管閥61。然後,經由將第1配管閥61切換成開狀態或閉狀態,可控制從電解槽11至第1霧氣除去部32之陽極氣體之送氣與否。又,於第2旁路配管52,各別設置旁路閥62。然後,經由將旁路閥62切換成開狀態或閉狀態,可控制從電解槽11至第1旁路配管51之陽極氣體之送氣與否。Next, the flow path switching section will be described. Each of the
更且,於電解槽11,設置水分濃度測定部36,將電解槽11內之電解液10導入至水分濃度測定部36,可將電解液10中之水分濃度,於電解時加以測定。測定水分濃度之電解液10係可為陽極室22側之電解液10,亦可為陰極室24側之電解液10。Furthermore, the
更且,於電解槽11與第1霧氣除去部32之間,詳細而言,於第4配管44之中間部,且於較第1配管41之連結部下游側,設置第1平均粒子徑測定部31。然後,經由第1平均粒子徑測定部31,測定含於流動第4配管44之陽極氣體的霧氣之平均粒子徑。又,經由分析含於測定霧氣之平均粒子徑後之陽極氣體之氟氣與氮氣,可測定氟氣之製造之電流效率。Furthermore, between the
然後,於第1旁路配管51之中間部,且於較第2旁路配管52之連結部下游側,亦同樣設置第2平均粒子徑測定部34,經由第2平均粒子徑測定部34,測定含於流動第1旁路配管51之陽極氣體的霧氣之平均粒子徑。惟,圖2所氟氣製造裝置係可不具備第1平均粒子徑測定部31及第2平均粒子徑測定部34。Then, in the middle part of the
經由水分濃度測定部36,測定電解槽11內之電解液10中之水分濃度,其測定結果較預先設定之基準值為大之時,令旁路閥62成為開狀態,將陽極氣體從電解槽11送至第1旁路配管51之同時,令第1配管閥61成為閉狀態,使陽極氣體不送至第4配管44及第1霧氣除去部32。即,將陽極氣體送至第2流道。The moisture concentration in the
另一方面,測定結果較預先設定之基準值以下之時,令第1配管閥61成為開狀態,將陽極氣體送至第4配管44及第1霧氣除去部32之同時,令旁路閥62成為閉狀態,使陽極氣體不從電解槽11送至第1旁路配管51。即,將陽極氣體送至第1流道。
由以上之說明可知,經由第1配管閥61及旁路閥62,構成上述之流道切換部。On the other hand, when the measurement result is lower than the preset reference value, the
如上所述,對應於電解時之電解液10中之水分濃度,經由邊切換流道,邊進行氟氣製造裝置之運轉,抑制霧氣所造成配管或閥之閉塞下,邊圓滑地連續進行運轉。因此,根據圖2所示之氟氣製造裝置,可經濟地製造氟氣。As described above, according to the water concentration in the
例如,做為霧氣除去部,準備複數設置過濾器之配管,邊適切切換,邊交換過濾器,而實施電解亦無妨。
更且,將頻繁欲進行過濾器之交換之期間、和無需頻繁進行過濾器之交換之期間,可根據電解時之電解液10中之水分濃度之測定加以判斷。然後,根據上述判斷,適切調整流動流體配管之切換頻率時,可有效率持續進行氟氣製造裝置之運轉。For example, as the mist removal part, it is possible to prepare a plurality of pipes with filters installed, and to perform electrolysis while changing the filters appropriately.
Furthermore, the period during which the filter is to be exchanged frequently and the period during which the filter is not required to be exchanged frequently can be determined based on the measurement of the water concentration in the
接著,對於圖2所示氟氣製造裝置之變形例,加以說明。
[第1變形例]
對於第1變形例,參照圖4加以說明。相較於圖2所示氟氣製造裝置中,第2旁路配管52係連結電解槽11與第1旁路配管51,圖4所示第1變形例之氟氣製造裝置中,第2旁路配管52係連結第1配管41與第1旁路配管51。第1變形例之氟氣製造裝置之構成係除了上述部分以外,與圖2之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。Next, a modification of the fluorine gas production apparatus shown in FIG. 2 will be described.
[1st Variation]
The first modification will be described with reference to FIG. 4 . Compared with the fluorine gas production apparatus shown in FIG. 2, the second bypass piping 52 connects the
[第2變形例]
對於第2變形例,參照圖5加以說明。圖5所示第2變形例之氟氣製造裝置係具備1座電解槽11之例。第1平均粒子徑測定部31係非第4配管44,而設於第1配管41,且設於第1配管閥61之上游側。又,不具有第2旁路配管52,第1旁路配管51係不藉由第2旁路配管52,直接連接於電解槽11。[Second modification example]
The second modification will be described with reference to FIG. 5 . The fluorine gas production apparatus of the second modification shown in FIG. 5 is an example provided with one
然後,第1旁路配管51係較第4配管44大口徑之故,做為閉塞抑制機構而工作。更且,例如經由在於第1旁路配管51之下游側末端,設置霧氣蓄留用之空間,更增大閉塞抑制之效果。做為此霧氣蓄留用之空間,可列舉例如形成於令第1旁路配管51之下游側末端部分較設置方向中央部分為大之管徑(設置方向中央部分之例如4倍以上之管徑)而成之空間、或令第1旁路配管51之下游側末端部分形成為如容器之形狀而成之空間,經由霧氣蓄留用之空間,可抑制第1旁路配管51之閉塞。此係針對流路剖面積大所造成閉塞防止之效果、和利用氣體流動之線速度之下降所造成霧氣之重力落下之閉塞防止之效果。
更且,旁路閥62係設置於連接第1旁路配管51與未圖示氟氣選取部之第3旁路配管53。第2變形例之氟氣製造裝置之構成係除了上述部分以外,與圖2之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。Then, since the diameter of the
[第3變形例]
對於第3變形例,參照圖6加以說明。第3變形例之氟氣製造裝置中,第1平均粒子徑測定部31設於電解槽11,電解槽11之內部之陽極氣體則直接導入第1平均粒子徑測定部31,進行霧氣之平均粒子徑之測定。第3變形例之氟氣製造裝置係不具有第2平均粒子徑測定部34。第3變形例之氟氣製造裝置之構成係除了上述部分以外,與第2變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。[3rd Variation]
The third modification will be described with reference to FIG. 6 . In the fluorine gas production apparatus according to the third modification, the first average particle
[第4變形例]
對於第4變形例,參照圖7加以說明。第4變形例之氟氣製造裝置係對於圖5所示第2變形例,閉塞抑制機構為不同之例。第2變形例之氟氣製造裝置中,第1旁路配管51雖沿水平方向延伸而設置,但第4變形例之氟氣製造裝置中,第1旁路配管51係對於水平方向而言傾斜,且朝向從上游側向下游側下降之方向延伸。經由此傾斜,可抑制粉體堆積於第1旁路配管51之內部。此傾斜愈大,抑制粉體之堆積之作用愈大。[4th Variation]
The fourth modification will be described with reference to FIG. 7 . The fluorine gas production apparatus of the fourth modification is a different example from the second modification shown in FIG. 5 in which the blockage suppression mechanism is different. In the fluorine gas production apparatus according to the second modification, the
第1旁路配管51之傾斜角度係從水平面之俯角較90度為小之範圍,30度以上為佳,40度以上60度以下為更佳。如果,將產生第1旁路配管51之閉塞時,錘擊傾斜之第1旁路配管51時,第1旁路配管51之內部之堆積物會變得易於移動之故,可避免閉塞。
第4變形例之氟氣製造裝置之構成係除了上述部分以外,與第2變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。The inclination angle of the first bypass piping 51 is in a range smaller than 90 degrees from the depression angle from the horizontal plane, preferably 30 degrees or more, and more preferably 40 degrees or more and 60 degrees or less. If clogging of the
[第5變形例]
對於第5變形例,參照圖8加以說明。第5變形例之氟氣製造裝置係對於圖6所示第3變形例,閉塞抑制機構為不同之例。第3變形例之氟氣製造裝置中,第1旁路配管51雖沿水平方向延伸而設置,但第5變形例之氟氣製造裝置中,第1旁路配管51係對於水平方向而言傾斜,且朝向從上游側向下游側下降之方向延伸。經由此傾斜,可抑制粉體堆積於第1旁路配管51之內部。第1旁路配管51之較佳傾斜角度係與上述第4變形例之時相同。第5變形例之氟氣製造裝置之構成係除了上述部分以外,與第3變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。[5th Variation]
The fifth modification will be described with reference to FIG. 8 . The fluorine gas production apparatus of the fifth modification is a different example from the third modification shown in FIG. 6 in that the clogging suppression mechanism is different. In the fluorine gas production apparatus according to the third modification, the
[第6變形例]
對於第6變形例,參照圖9加以說明。第6變形例之氟氣製造裝置係對於圖5所示第2變形例,電解槽11之構造為不同之例。電解槽11係具有1個陽極13與2個陰極15、15,且經由包圍1個陽極13之筒狀之間隔壁17,分割成1個陽極室22與1個陰極室24。陽極室22係延伸至較電解槽11之上表面之上方而形成,第1旁路配管51係連接於電解槽11之陽極室22之上端部分。第6變形例之氟氣製造裝置之構成係除了上述部分以外,與第2變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。[Sixth modification example]
The sixth modification will be described with reference to FIG. 9 . The fluorine gas production apparatus of the sixth modification is an example in which the structure of the
[第7變形例]
對於第7變形例,參照圖10加以說明。第7變形例之氟氣製造裝置係對於圖9所示第6變形例,第1旁路配管51之構造為不同之例。即,第7變形例之氟氣製造裝置中,第1旁路配管51係與第4變形例及第5變形例相同,對於水平方向而言傾斜,且延伸在從上游側向下游側下降之方向。第1旁路配管51之較佳傾斜角度係與上述第4變形例之時相同。第7變形例之氟氣製造裝置之構成係除了上述部分以外,與第6變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。[Variation 7]
The seventh modification will be described with reference to FIG. 10 . The fluorine gas production apparatus of the seventh modification is an example in which the structure of the first bypass piping 51 is different from the sixth modification shown in FIG. 9 . That is, in the fluorine gas production apparatus according to the seventh modification, the
[第8變形例]
對於第8變形例,參照圖11加以說明。第8變形例之氟氣製造裝置係對於圖5所示第2變形例,閉塞抑制機構為不同之例。於第8變形例之氟氣製造裝置中,構成閉塞抑制機構之旋轉螺旋71則設置於第1旁路配管51之內部。此旋轉螺旋71係將該旋轉軸,對於第1旁路配管51之長度方向而言平行地加以設置。
然後,經由馬達72施轉旋轉螺旋71,將堆積於第1旁路配管51內部之霧氣,輸送至上游側或下游側。由此,可抑制粉體堆積於第1旁路配管51之內部。第8變形例之氟氣製造裝置之構成係除了上述部分以外,與第2變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。[8th Variation]
The eighth modified example will be described with reference to FIG. 11 . The fluorine gas production apparatus of the eighth modification is a different example from the second modification shown in FIG. 5 in which the blockage suppression mechanism is different. In the fluorine gas production apparatus of the eighth modification, the
[第9變形例]
對於第9變形例,參照圖12加以說明。第9變形例之氟氣製造裝置係對於圖5所示第2變形例,閉塞抑制機構為不同之例。於第9變形例之氟氣製造裝置中,構成閉塞抑制機構之氣流產生裝置73則設置於第1旁路配管51之內部。氣流產生裝置73係從第1旁路配管51之上游側朝向下游側,送入氣流(例如氮氣之氣流),上昇流動第1旁路配管51內之陽極氣體之流速。由此,可抑制粉體堆積於第1旁路配管51之內部。[Ninth Variation]
The ninth modification example will be described with reference to FIG. 12 . The fluorine gas production apparatus of the ninth modified example is a different example from the second modified example shown in FIG. 5 in which the blockage suppression mechanism is different. In the fluorine gas production apparatus of the ninth modified example, the
流動於此時之第1旁路配管51內之陽極氣體之較佳流速為1 m/sec以上10 m/sec以下。雖可使流速大於10 m/sec,但此時第1旁路配管51內之配管阻抗所造成壓力損失變大,電解槽11之陽極室22內之壓力則變高。陽極室22內之壓力與陰極室24內之壓力係幾乎相同程度者為佳,而陽極室22內之壓力與陰極室24內之壓力之差過大之時,陽極氣體則越過間隔壁17流入陰極室24,氟氣與氫氣產生反應,對於氟氣之產生會發生障礙。
第9變形例之氟氣製造裝置之構成係除了上述部分以外,與第2變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。The preferable flow velocity of the anode gas flowing in the
[第10變形例]
對於第10變形例,參照圖13加以說明。第10變形例之氟氣製造裝置中,第1平均粒子徑測定部31設於電解槽11,電解槽11之內部之陽極氣體則直接導入第1平均粒子徑測定部31,進行霧氣之平均粒子徑之測定。第10變形例之氟氣製造裝置係不具有第2平均粒子徑測定部34。第10變形例之氟氣製造裝置之構成係除了上述部分以外,與圖12所示第9變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。
[實施例][10th Variation]
The tenth modification will be described with reference to FIG. 13 . In the fluorine gas production apparatus of the tenth modification, the first average particle
以下,顯示實施例及比較例,將本發明更具體加以說明。 [參考例1] 電解電解液,製造氟氣。做為電解液,使用氟化氫434kg與氟化鉀630kg之混合熔融鹽(560L)。做為陽極,使用SGLCabon公司製之非晶質碳電極(橫30cm、縱45cm、厚度7cm),將16枚之陽極設置於電解槽。又,做為陰極使用Monel(商標)之穿孔板,設置電解槽。於1枚之陽極,對向2枚之陰極,1枚之陽極中,對向於陰極之部分之合計面積係1736cm2 。Hereinafter, an Example and a comparative example are shown, and this invention is demonstrated more concretely. [Reference Example 1] Electrolyte was electrolyzed to produce fluorine gas. As the electrolyte, a mixed molten salt (560 L) of 434 kg of hydrogen fluoride and 630 kg of potassium fluoride was used. As the anode, an amorphous carbon electrode (30 cm in width, 45 cm in length, and 7 cm in thickness) made by SGL Cabon was used, and 16 anodes were installed in the electrolytic cell. In addition, a perforated plate of Monel (trademark) was used as a cathode, and an electrolytic cell was installed. In one anode, the opposite two cathodes, and one anode, the total area of the part facing the cathode is 1736 cm 2 .
電解溫度係控制於85~95℃。首先,令電解液溫度為85℃,以電流密度0.036 A/cm2 ,施加1000A之直流電流,開始電解。此時,電解液中之水分濃度係1.0質量%。然而,水分濃度係可經由卡爾費雪分析法加以測定。 以上述條件開始電解,從電解開始後10小時之期間,觀測到在陽極室內之陽極之附近,有小的破裂聲。此破裂聲係應為所產生之氟氣與電解液中之水分反應而產生。The electrolysis temperature is controlled at 85~95℃. First, the temperature of the electrolyte solution was set to 85° C., and the direct current of 1000 A was applied at a current density of 0.036 A/cm 2 to start electrolysis. At this time, the water concentration in the electrolytic solution was 1.0% by mass. However, the moisture concentration can be determined by Karl Fisher analysis. Electrolysis was started under the above-mentioned conditions, and a small cracking sound was observed in the vicinity of the anode in the anode chamber during 10 hours from the start of electrolysis. This cracking sound should be generated by the reaction between the generated fluorine gas and the moisture in the electrolyte.
於此狀態下,將陽極所產生之流體,從電解槽之陽極室送出至外部而採取,分析含於流體之霧氣。其結果,陽極所產生之流體中,每1L含有5.0~9.0mg(假定霧氣之比重為1.0 g/mL加以算出。以下亦相同。)之粉體,此粉體之平均粒子徑為1.0~2.0μm。將此粉體以光學顯微鏡觀察之結果,主要觀察到穿過球之內部之形狀之粉體。又,此時之氟氣生成之電流效率係0~15%。In this state, the fluid generated by the anode is sent to the outside from the anode chamber of the electrolytic cell and collected, and the mist contained in the fluid is analyzed. As a result, the fluid produced by the anode contains 5.0 to 9.0 mg (calculated by assuming that the specific gravity of the mist is 1.0 g/mL. The same applies hereinafter) powder per 1 L, and the average particle diameter of the powder is 1.0 to 2.0 μm. As a result of observation of this powder with an optical microscope, the shape of the powder passing through the interior of the sphere was mainly observed. In addition, the current efficiency of fluorine gas generation at this time is 0 to 15%.
更且,通電量持續電解至30kAh時,在陽極室之內部產生破裂聲之頻率則減低。此時,電解液中之水分濃度係0.7質量%。又,於此狀態下,將陽極所產生之流體,從電解槽之陽極室送出至外部而採取,分析含於流體之霧氣。其結果,陽極所產生之流體中,每1L含有0.4~ 1.0mg之霧氣,此霧氣之平均粒子徑為0.5~0.7μm。更且,此時之氟氣生成之電流效率係15~55%。令從電解開始至此之電解階段為「階段(1)」。Moreover, the frequency of cracking sound generated inside the anode chamber is reduced when the energization amount continues to be electrolyzed to 30kAh. At this time, the water concentration in the electrolytic solution was 0.7% by mass. In this state, the fluid generated by the anode is sent out from the anode chamber of the electrolytic cell to the outside and collected, and the mist contained in the fluid is analyzed. As a result, the fluid produced by the anode contained 0.4-1.0 mg of mist per 1 L, and the average particle diameter of the mist was 0.5-0.7 μm. Moreover, the current efficiency of fluorine gas generation at this time is 15~55%. Let the electrolysis stage from the start of electrolysis to this point be "stage (1)".
更且,接續階段(1),繼續電解液之電解。結果,消耗掉氟化氫,電解液之水位下降之故,從氟化氫槽向電解槽適切補給氟化氫。補給之氟化氫中之水分濃度係500質量ppm以下。 更且,繼續電解,通電量達60kAh時,含於陽極所產生之流體之霧氣之平均粒子徑則成為0.36μm(即0.4μm以下)。此時,陽極室之內部則完全不產生破裂聲。又,此時之電解液中之水分濃度係0.2質量%(即0.3質量%以下)。更且,此時之氟氣生成之電流效率係65%。令從階段(1)之終止時點至此之電解階段為「階段(2)」。Furthermore, following stage (1), the electrolysis of the electrolyte is continued. As a result, hydrogen fluoride is consumed and the water level of the electrolytic solution drops, so that hydrogen fluoride is appropriately supplied from the hydrogen fluoride tank to the electrolytic tank. The water concentration in the supplied hydrogen fluoride is 500 mass ppm or less. Furthermore, when the electrolysis is continued, and the energization amount reaches 60kAh, the average particle size of the mist contained in the fluid generated by the anode becomes 0.36 μm (ie, 0.4 μm or less). At this time, no cracking sound is generated in the anode chamber at all. In addition, the water concentration in the electrolyte solution at this time was 0.2 mass % (that is, 0.3 mass % or less). Moreover, the current efficiency of fluorine gas generation at this time is 65%. Let the electrolysis stage from the termination time point of stage (1) to this be "stage (2)".
更且,將電流增加至3500A,將電流密度增加至0.126 A/cm2 ,接續階段(2),繼續電解液之電解。於此狀態下,將陽極所產生之流體,從電解槽之陽極室送出至外部而採取,分析含於流體之霧氣。其結果,陽極所產生之流體中,每1L含有0.03~0.06mg之粉體,此粉體之平均粒子徑為約0.2μm(0.15~0.25μm),粒子徑係具有約0.1~ 0.5μm之分布。於圖14,顯示此粉體之粒子徑分布之測定結果。更且,此時之氟氣生成之電流效率係94%。此時,電解液中之水分濃度係不足0.2質量%。令從階段(2)之終止時點至此之電解階段為「安定階段」。Furthermore, the current was increased to 3500 A, and the current density was increased to 0.126 A/cm 2 , and the step (2) was continued, and the electrolysis of the electrolyte was continued. In this state, the fluid generated by the anode is sent to the outside from the anode chamber of the electrolytic cell and collected, and the mist contained in the fluid is analyzed. As a result, the fluid produced by the anode contains 0.03-0.06 mg of powder per 1 L, the average particle diameter of the powder is about 0.2 μm (0.15-0.25 μm), and the particle diameter has a distribution of about 0.1-0.5 μm . Fig. 14 shows the measurement results of the particle size distribution of this powder. Moreover, the current efficiency of fluorine gas generation at this time is 94%. At this time, the water concentration in the electrolyte solution is less than 0.2 mass %. Let the electrolysis stage from the termination point of stage (2) to this point be the "stable stage".
將如上述所述進行之參考例1之電解之內容,完整顯示於表1。表1中,伴隨電流、電解經過時間、通電量、電解液中之水分濃度、陽極所產生之流體(表1中記為「陽極氣體」)含於1L中之霧氣之質量、霧氣之平均粒子徑、電流效率,亦顯示陽極所產生之流體(含有氟氣、氧氣、霧氣)之量、陽極所產生之霧氣之量、破裂聲之強度、及、陰極所生成之流體中之水分濃度(表1中記為「陰極氣體中之水分濃度」)。The content of the electrolysis of Reference Example 1 performed as described above is shown in Table 1 in its entirety. In Table 1, the accompanying current, the elapsed time of electrolysis, the amount of energization, the water concentration in the electrolyte, the fluid produced by the anode (referred to as "anode gas" in Table 1), the mass of the mist contained in 1L, and the average particle size of the mist It also shows the amount of fluid (containing fluorine, oxygen, mist) generated by the anode, the amount of mist generated by the anode, the intensity of the cracking sound, and the water concentration in the fluid generated by the cathode (Table 1). 1 is referred to as "water concentration in cathode gas").
又,將顯示霧氣之平均粒子徑與陽極所產生之霧氣之量之關係的圖表,示於圖15。從圖15之圖表,可知霧氣之平均粒子徑與陽極所產生之霧氣之量之間,有相關性。霧氣之產生量愈多,易於產生配管或閥之閉塞,產生較平均粒子徑0.4μm為大之霧氣時,霧氣之產生量則增加,更且經由重力之作用而沈澱之故,圖15之圖表所示之關係則可稱為表示霧氣之平均粒子徑與配管或閥之閉塞之易於產生度之相關性。 更且,將顯示霧氣之平均粒子徑與電解液中之水分濃度之關係之圖表,示於圖16。霧氣之平均粒子徑愈大,更易於產生配管或閥之閉塞之故,圖16之圖表所示之關係則可稱為表示電解液中之水分濃度與配管或閥之閉塞之易於產生度之相關性。In addition, a graph showing the relationship between the average particle size of the mist and the amount of the mist generated by the anode is shown in FIG. 15 . From the graph of FIG. 15, it can be seen that there is a correlation between the average particle size of the mist and the amount of mist generated by the anode. The larger the amount of mist generated, the easier it is to block pipes or valves. When mist larger than the average particle diameter of 0.4 μm is generated, the amount of mist generated increases, and it is precipitated by gravity. The graph in Figure 15 The relationship shown can be said to represent the correlation between the average particle size of the mist and the susceptibility to the occlusion of pipes or valves. Furthermore, a graph showing the relationship between the average particle size of the mist and the water concentration in the electrolyte is shown in FIG. 16 . The larger the average particle size of the mist is, the more likely it is to block the pipes or valves. The relationship shown in the graph in Fig. 16 can be called the correlation between the water concentration in the electrolyte and the easy generation of blockage of the pipes or valves. sex.
[實施例1] 將與參考例1相同之電解,使用圖2所示氟氣製造裝置進行。於階段(1)之電解中,將陽極所產生之流體,經由第2旁路配管、旁路閥、第1旁路配管加以流通。於階段(1)之電解終止後,暫時停止電解,進行氟氣製造裝置之內部之檢查。其結果,於第1旁路配管內,雖堆積有霧氣,但配管之口徑大之故,未產生配管之閉塞。[Example 1] The same electrolysis as in Reference Example 1 was performed using the fluorine gas production apparatus shown in FIG. 2 . In the electrolysis of the stage (1), the fluid generated by the anode is circulated through the second bypass pipe, the bypass valve, and the first bypass pipe. After the electrolysis of the stage (1) is terminated, the electrolysis is temporarily stopped, and the internal inspection of the fluorine gas production apparatus is carried out. As a result, although the mist was accumulated in the first bypass piping, the piping was not blocked due to the large diameter of the piping.
成為霧氣之平均粒子徑為0.4μm以下(電解液中之水分濃度係基準值之0.3質量%以下之0.2質量%)之段階(2)之電解之故,將陽極所產生之流體,經由第1配管、第1配管閥、第4配管、第1霧氣除去部加以流通。於第1配管、第1配管閥、第4配管未產生霧氣之堆積或閉塞,陽極所產生之流體係供給至第1霧氣除去部之故,於第1霧氣除去部,除去霧氣。第1霧氣除去部係噴霧液體之氟化氫,除去霧氣等之微粒子之洗淨器式之除去部,霧氣之去除率則為98%以上。Since the average particle diameter of the mist is 0.4 μm or less (the water concentration in the electrolyte is 0.3 mass % or less of the reference value and 0.2 mass %), the fluid generated by the anode is passed through the first stage (2). The piping, the 1st piping valve, the 4th piping, and the 1st mist removing part are circulated. The first piping, the first piping valve, and the fourth piping did not accumulate or block the mist, and the flow system generated by the anode was supplied to the first mist removing part, and the first mist removing part removed the mist. The first mist removing section is a scrubber-type removing section that sprays hydrogen fluoride in the liquid and removes fine particles such as mist, and the mist removal rate is 98% or more.
[比較例1] 於階段(1)之電解中,除了將陽極所產生之流體,經由第1配管、第1配管閥、第4配管、第1霧氣除去部加以流通之外,與實施例1進行相同電解。 階段(1)之電解中,安裝於電解槽之陽極側及陰極側之壓力計中之陽極側之壓力計之測量值則逐漸變高,與陰極側之壓力之差壓成為90 mmH2 O之故,停止電解。停止之理由係如以下所述。浸漬於電解槽內之間隔壁中之電解液之部分之鉛直方向長度(浸漬長度)有5cm之故,陽極側之壓力較陰極側之壓力高約100 mmH2 O時,陽極側之電解液之液面則較間隔壁之下端為低。其結果,氟氣則跨過間隔壁,與陰極側之氫氣混合,會產生氟氣與氫氣之劇烈反應之故,非常的危險。[Comparative Example 1] In the electrolysis of stage (1), the same procedure as in Example 1 was performed except that the fluid generated by the anode was circulated through the first piping, the first piping valve, the fourth piping, and the first mist removing part. The same electrolysis was performed. In the electrolysis of stage (1), the measured value of the pressure gauge on the anode side of the pressure gauges installed on the anode side and the cathode side of the electrolytic cell gradually increased, and the pressure difference with the pressure on the cathode side became 90 mmH 2 O. Therefore, stop electrolysis. The reasons for the suspension are as follows. Since the vertical length (impregnation length) of the part of the electrolyte immersed in the partition wall in the electrolytic cell is 5 cm, when the pressure on the anode side is about 100 mmH 2 O higher than the pressure on the cathode side, the amount of electrolyte on the anode side is about 100 mmH2O higher. The liquid level is lower than the lower end of the partition wall. As a result, the fluorine gas crosses the partition wall and mixes with the hydrogen gas on the cathode side, resulting in a violent reaction between the fluorine gas and the hydrogen gas, which is very dangerous.
系統內在氮氣等排氣之後,檢查第1配管、第1配管閥、第4配管之內部的結果,第1配管係延伸於鉛直方向之配管之故,沒有閉塞。於第1配管閥有少量之粉之附著,第1配管閥之下游側之配管,即第4配管之入口部分被粉所閉塞。第4配管也有粉之堆積,但沒有到閉塞配管之量。The inside of the first piping, the first piping valve, and the fourth piping was checked after the system was exhausted with nitrogen, etc. The first piping was a piping extending in the vertical direction, and there was no blockage. A small amount of powder adhered to the first piping valve, and the piping on the downstream side of the first piping valve, that is, the inlet portion of the fourth piping was blocked by the powder. The fourth piping also had powder accumulation, but not enough to block the piping.
1:試料室
2:光源
3:散亂光檢測部
4A,4B:透明窗
10:電解液
11:電解槽
13:陽極
15:陰極
22:陽極室
24:陰極室
31:第1平均粒子徑測定部
32:第1霧氣除去部
33:第2霧氣除去部
34:第2平均粒子徑測定部
36:水分濃度測定部
41:第1配管
42:第2配管
43:第3配管
44:第4配管
45:第5配管
46:第6配管
47:第7配管
48:第8配管
49:第9配管
51:第1旁路配管
52:第2旁路配管
61:第1配管閥
62:旁路閥
F:流體
L:光散亂測定用光
M:霧氣
S:散亂光1: Sample room
2: light source
3: Scattered
[圖1]關於本發明之一實施形態之氟氣製造裝置中,說明做為平均粒子徑測定部使用之光散亂檢測器之一例的模式圖。 [圖2]說明關於本發明之一實施形態之氟氣製造裝置之一例的概略圖。 [圖3]圖2之氟氣製造裝置中,說明做為霧氣除去部使用之霧氣除去裝置之一例的模式圖。 [圖4]說明圖2之氟氣製造裝置之第1變形例的概略圖。 [圖5]說明圖2之氟氣製造裝置之第2變形例的概略圖。 [圖6]說明圖2之氟氣製造裝置之第3變形例的概略圖。 [圖7]說明圖2之氟氣製造裝置之第4變形例的概略圖。 [圖8]說明圖2之氟氣製造裝置之第5變形例的概略圖。 [圖9]說明圖2之氟氣製造裝置之第6變形例的概略圖。 [圖10]說明圖2之氟氣製造裝置之第7變形例的概略圖。 [圖11]說明圖2之氟氣製造裝置之第8變形例的概略圖。 [圖12]說明圖2之氟氣製造裝置之第9變形例的概略圖。 [圖13]說明圖2之氟氣製造裝置之第10變形例的概略圖。 [圖14]於参考例1中,顯示含於陽極所產生之流體之霧氣之粒子徑分布的圖表。 [圖15]於参考例1中,顯示霧氣之平均粒子徑與陽極所產生之霧氣之量之相關性的圖表。 [圖16]於参考例1中,顯示霧氣之平均粒子徑與電解液中之水分濃度之關係的圖表。1 is a schematic diagram illustrating an example of a light scattering detector used as an average particle diameter measuring unit in a fluorine gas production apparatus according to an embodiment of the present invention. [ Fig. 2] Fig. 2 is a schematic diagram illustrating an example of a fluorine gas production apparatus according to an embodiment of the present invention. [ Fig. 3] Fig. 3 is a schematic diagram illustrating an example of a mist removal device used as a mist removal unit in the fluorine gas production apparatus of Fig. 2 . [ Fig. 4] Fig. 4 is a schematic diagram illustrating a first modification of the fluorine gas production apparatus of Fig. 2 . [ Fig. 5] Fig. 5 is a schematic diagram illustrating a second modification of the fluorine gas production apparatus of Fig. 2 . [ Fig. 6] Fig. 6 is a schematic diagram illustrating a third modification of the fluorine gas production apparatus of Fig. 2 . [ Fig. 7] Fig. 7 is a schematic diagram illustrating a fourth modification of the fluorine gas production apparatus of Fig. 2 . [ Fig. 8] Fig. 8 is a schematic diagram illustrating a fifth modification of the fluorine gas production apparatus of Fig. 2 . [ Fig. 9] Fig. 9 is a schematic diagram illustrating a sixth modification of the fluorine gas production apparatus of Fig. 2 . [ Fig. 10] Fig. 10 is a schematic diagram illustrating a seventh modification of the fluorine gas production apparatus of Fig. 2 . [ Fig. 11] Fig. 11 is a schematic diagram illustrating an eighth modification of the fluorine gas production apparatus of Fig. 2 . [ Fig. 12] Fig. 12 is a schematic diagram illustrating a ninth modification of the fluorine gas production apparatus of Fig. 2 . [ Fig. 13] Fig. 13 is a schematic diagram illustrating a tenth modification of the fluorine gas production apparatus of Fig. 2 . [ Fig. 14 ] In Reference Example 1, a graph showing the particle size distribution of the mist contained in the fluid generated by the anode. [ Fig. 15] In Reference Example 1, a graph showing the correlation between the average particle size of mist and the amount of mist generated by the anode. 16 is a graph showing the relationship between the average particle size of mist and the water concentration in the electrolyte solution in Reference Example 1. FIG.
10:電解液 10: Electrolyte
11:電解槽 11: Electrolyzer
13:陽極 13: Anode
15:陰極 15: Cathode
17:間隔壁 17: Partition Wall
22:陽極室 22: Anode chamber
24:陰極室 24: Cathode Chamber
31:第1平均粒子徑測定部 31: The first average particle diameter measuring section
32:第1霧氣除去部 32: 1st mist removal part
33:第2霧氣除去部 33: 2nd mist removal part
34:第2平均粒子徑測定部 34: Second Average Particle Diameter Measurement Section
36:水分濃度測定部 36: Moisture concentration measuring section
41:第1配管 41: 1st piping
42:第2配管 42: 2nd piping
43:第3配管 43: 3rd piping
44:第4配管 44: 4th piping
45:第5配管 45: 5th piping
46:第6配管 46: 6th piping
47:第7配管 47: 7th piping
48:第8配管 48: No. 8 piping
49:第9配管 49: 9th piping
51:第1旁路配管 51: 1st bypass piping
52:第2旁路配管 52: Second bypass piping
61:第1配管閥 61: 1st piping valve
62:旁路閥 62: Bypass valve
Claims (4)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019-238475 | 2019-12-27 | ||
JP2019238475 | 2019-12-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202136584A TW202136584A (en) | 2021-10-01 |
TWI755972B true TWI755972B (en) | 2022-02-21 |
Family
ID=76573932
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109144185A TWI755972B (en) | 2019-12-27 | 2020-12-15 | Fluorine gas production method and fluorine gas production device |
Country Status (7)
Country | Link |
---|---|
US (1) | US20220275523A1 (en) |
EP (1) | EP4083264A4 (en) |
JP (1) | JPWO2021131579A1 (en) |
KR (1) | KR20220065825A (en) |
CN (1) | CN113874553B (en) |
TW (1) | TWI755972B (en) |
WO (1) | WO2021131579A1 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102859040A (en) * | 2010-04-16 | 2013-01-02 | 中央硝子株式会社 | Fluorine gas generation device |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0718032B2 (en) * | 1988-12-27 | 1995-03-01 | 三井東圧化学株式会社 | Method for producing nitrogen trifluoride gas |
JP3905433B2 (en) * | 2002-07-11 | 2007-04-18 | レール・リキード−ソシエテ・アノニム・ア・ディレクトワール・エ・コンセイユ・ドゥ・スールベイランス・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | Fluorine gas generator |
JP4584549B2 (en) * | 2003-05-28 | 2010-11-24 | レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | Fluorine gas generator |
JP3893397B2 (en) * | 2005-03-14 | 2007-03-14 | ペルメレック電極株式会社 | Anode for electrolysis and method for electrolytic synthesis of fluorine-containing material using the anode for electrolysis |
JP2009191362A (en) * | 2008-01-18 | 2009-08-27 | Toyo Tanso Kk | Apparatus for molten salt electrolysis and method for producing fluorine gas |
JP5584904B2 (en) | 2008-03-11 | 2014-09-10 | 東洋炭素株式会社 | Fluorine gas generator |
JP2011084806A (en) * | 2009-06-29 | 2011-04-28 | Central Glass Co Ltd | Fluorine gas generation device |
JP2011038145A (en) * | 2009-08-10 | 2011-02-24 | Yokogawa Electric Corp | Electrolytic apparatus and electrolytic method |
WO2011045338A1 (en) * | 2009-10-16 | 2011-04-21 | Solvay Fluor Gmbh | High-purity fluorine gas, the production and use thereof, and a method for monitoring impurities in a fluorine gas |
JP5375673B2 (en) * | 2010-03-01 | 2013-12-25 | セントラル硝子株式会社 | Fluorine gas generator |
JP2011208276A (en) * | 2010-03-09 | 2011-10-20 | Central Glass Co Ltd | Apparatus for generating fluorine gas |
JP5919824B2 (en) | 2012-01-05 | 2016-05-18 | セントラル硝子株式会社 | Gas generator |
-
2020
- 2020-12-03 EP EP20905948.4A patent/EP4083264A4/en active Pending
- 2020-12-03 CN CN202080038149.2A patent/CN113874553B/en active Active
- 2020-12-03 JP JP2021567137A patent/JPWO2021131579A1/ja active Pending
- 2020-12-03 WO PCT/JP2020/045093 patent/WO2021131579A1/en unknown
- 2020-12-03 KR KR1020227012899A patent/KR20220065825A/en not_active Application Discontinuation
- 2020-12-03 US US17/613,867 patent/US20220275523A1/en active Pending
- 2020-12-15 TW TW109144185A patent/TWI755972B/en active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102859040A (en) * | 2010-04-16 | 2013-01-02 | 中央硝子株式会社 | Fluorine gas generation device |
Also Published As
Publication number | Publication date |
---|---|
CN113874553A (en) | 2021-12-31 |
KR20220065825A (en) | 2022-05-20 |
US20220275523A1 (en) | 2022-09-01 |
CN113874553B (en) | 2024-02-09 |
EP4083264A4 (en) | 2024-10-02 |
EP4083264A1 (en) | 2022-11-02 |
JPWO2021131579A1 (en) | 2021-07-01 |
TW202136584A (en) | 2021-10-01 |
WO2021131579A1 (en) | 2021-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI755971B (en) | Light Scattering Detector | |
TWI759030B (en) | Fluorine gas production method and fluorine gas production device | |
TWI755972B (en) | Fluorine gas production method and fluorine gas production device | |
TWI762107B (en) | Fluorine gas production method and fluorine gas production device | |
TWI762106B (en) | Fluorine gas production method and fluorine gas production device | |
TWI753718B (en) | Fluorine gas production method and fluorine gas production device | |
TWI759031B (en) | Fluorine gas production method and fluorine gas production device |