TW202136584A - Fluorine gas production method and fluorine gas production apparatus - Google Patents

Fluorine gas production method and fluorine gas production apparatus Download PDF

Info

Publication number
TW202136584A
TW202136584A TW109144185A TW109144185A TW202136584A TW 202136584 A TW202136584 A TW 202136584A TW 109144185 A TW109144185 A TW 109144185A TW 109144185 A TW109144185 A TW 109144185A TW 202136584 A TW202136584 A TW 202136584A
Authority
TW
Taiwan
Prior art keywords
fluid
fluorine gas
electrolyte
electrolysis
aforementioned
Prior art date
Application number
TW109144185A
Other languages
Chinese (zh)
Other versions
TWI755972B (en
Inventor
小黒慎也
福地陽介
小林浩
Original Assignee
日商昭和電工股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商昭和電工股份有限公司 filed Critical 日商昭和電工股份有限公司
Publication of TW202136584A publication Critical patent/TW202136584A/en
Application granted granted Critical
Publication of TWI755972B publication Critical patent/TWI755972B/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00Operating or servicing cells
    • C25B15/08Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/01Products
    • C25B1/24Halogens or compounds thereof
    • C25B1/245Fluorine; Compounds thereof
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/50Processes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/055Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
    • C25B11/057Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
    • C25B11/065Carbon
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00Operating or servicing cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00Operating or servicing cells
    • C25B15/02Process control or regulation
    • C25B15/023Measuring, analysing or testing during electrolytic production
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00Operating or servicing cells
    • C25B15/02Process control or regulation
    • C25B15/023Measuring, analysing or testing during electrolytic production
    • C25B15/025Measuring, analysing or testing during electrolytic production of electrolyte parameters
    • C25B15/029Concentration
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/60Constructional parts of cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/042Electrodes formed of a single material
    • C25B11/043Carbon, e.g. diamond or graphene

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)

Abstract

Provided is a fluorine gas production method whereby it becomes possible to prevent the clogging of a pipe or a valve by mists. A fluorine gas is produced by a method comprising: an electrolysis step of carrying out the electrolysis of an electrolyte solution in an electrolysis tank; a water concentration measurement step of measuring the water concentration in the electrolyte solution at a time point of the electrolysis; and a gas feeding step of feeding a fluid generated in the electrolysis tank upon the electrolysis of the electrolyte solution from the inside of the electrolysis tank to the outside of the electrolysis tank through a flow passage. In the gas feeding step, a flow passage through which the fluid is to be flown is switched to another one depending on the water concentration in the electrolyte solution which is measured in the water concentration measurement step, in such a manner that the fluid is fed to a first flow passage through which the fluid can be fed from the inside of the electrolysis tank to a first outside zone when the water concentration in the electrolyte solution which is measured in the water concentration measurement step is equal to or less than a preset reference value, while the fluid is fed to a second flow passage through which the fluid can be fed from the inside of the electrolysis tank to a second outside zone when the water concentration is larger than the preset reference value. The preset reference value is a numerical value falling within the range of 0.1 to 0.8% by mass inclusive.

Description

氟氣之製造方法及氟氣製造裝置Fluorine gas production method and fluorine gas production device

本發明係關於氟氣之製造方法及氟氣製造裝置者。The present invention relates to a fluorine gas production method and a fluorine gas production device.

氟氣係可經由電解含有氟化氫及金屬氟化物之電解液而合成(電解合成)。經由電解液之電解,伴隨氟氣亦產生霧氣(例如電解液之霧氣)之故,從電解槽送出之氟氣混伴有霧氣。混伴於氟氣之霧氣係成為粉體,有使得使用於氟氣之送氣之配管或閥閉塞之疑慮。為此,會有不得不中斷或停止製造氟氣之運轉之情形,造成電解法所成氟氣之製造之連續運轉之障礙。 為了抑制霧氣所造成配管或閥之閉塞,於專利文獻1,揭示有將混伴霧氣之氟氣或該氣體通過之配管,加熱至電解液之融點以上之技術。又,於專利文獻2中,揭示有具有粗糙處理霧氣之空間之氣體擴散部、和收容為了吸附霧氣之填充材的填充材收容部的氣體生成裝置。 [先前技術文獻] [專利文獻]The fluorine gas system can be synthesized by electrolyzing an electrolyte containing hydrogen fluoride and metal fluoride (electrolytic synthesis). Through the electrolysis of the electrolyte, the fluorine gas also produces mist (for example, the mist of the electrolyte), so the fluorine gas sent from the electrolytic cell is mixed with the mist. The mist mixed with the fluorine gas becomes a powder, and there is a concern that the piping or valve used for the fluorine gas supply will be blocked. For this reason, it may be necessary to interrupt or stop the operation of producing fluorine gas, which will hinder the continuous operation of the production of fluorine gas produced by the electrolysis method. In order to suppress the clogging of pipes or valves caused by the mist, Patent Document 1 discloses a technique of heating the fluorine gas mixed with the mist or the pipe through which the gas passes to a temperature above the melting point of the electrolyte. In addition, Patent Document 2 discloses a gas generating device having a gas diffuser having a space for roughening mist and a filling material accommodating part accommodating a filling material for absorbing the mist. [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本特許公報第5584904號 [專利文獻2]日本特許公報第5919824號[Patent Document 1] Japanese Patent Publication No. 5584904 [Patent Document 2] Japanese Patent Publication No. 5919824

[發明欲解決之課題][The problem to be solved by the invention]

但是,更期望有更有效抑制霧氣所造成配管或閥之閉塞的技術。 本發明係提供可抑制霧氣所造成配管或閥之閉塞的氟氣之製造方法及氟氣製造裝置為課題。 [為解決課題之手段]However, it is more desirable to have a technology that more effectively suppresses the clogging of pipes or valves caused by mist. The subject of the present invention is to provide a fluorine gas manufacturing method and a fluorine gas manufacturing device that can suppress the clogging of pipes or valves caused by mist. [Means to solve the problem]

為解決前述課題,本發明之一形態係如以下之[1]~[5]。 [1] 電解含有氟化氫及金屬氟化物之電解液,製造氟氣之氟氣之製造方法中, 具備:在電解槽內,進行前述電解之電解工程、 和於前述電解時,測定前述電解液中之水分濃度之水分濃度測定工程、 和於前述電解液之電解時,將在於前述電解槽之內部所產生之流體,藉由從前述電解槽之內部向外部之流道輸送之送氣工程; 前述送氣工程中,對應前述水分濃度測定工程所測定之前述電解液中之水分濃度,切換流動前述流體之流道,前述水分濃度測定工程所測定之前述電解液中之水分濃度為預先設定之基準值以下之時,於從前述電解槽之內部向第1外部輸送前述流體之第1流道,輸送前述流體,較前述預先設定之基準值為大之時,於從前述電解槽之內部向第2外部輸送前述流體之第2流道,輸送前述流體, 前述預先設定之基準值係0.1質量%以上0.8質量%以下之範圍內之數值的氟氣之製造方法。In order to solve the aforementioned problems, one aspect of the present invention is as follows [1] to [5]. [1] In the method of producing fluorine gas by electrolyzing an electrolyte containing hydrogen fluoride and metal fluoride to produce fluorine gas, Possess: In the electrolytic cell, carry out the electrolysis process of the aforementioned electrolysis, And during the aforementioned electrolysis, the water concentration measurement process to measure the water concentration in the aforementioned electrolyte, And during the electrolysis of the aforementioned electrolyte, the fluid generated inside the aforementioned electrolytic cell is transported from the inside of the aforementioned electrolytic cell to the outside flow channel through the gas supply process; In the aforementioned gas supply project, corresponding to the water concentration in the electrolyte measured by the aforementioned water concentration measurement project, the flow channel through which the fluid flows is switched, and the water concentration in the aforementioned electrolyte measured by the aforementioned water concentration measurement project is a preset reference When the value is less than or equal to the value below, in the first flow path that transports the fluid from the inside of the electrolytic cell to the first outside, and when the fluid is transported, the fluid is transported from the inside of the electrolytic cell to the first 2 The second flow channel for externally transporting the aforementioned fluid, transporting the aforementioned fluid, The aforementioned preset reference value is a method for producing fluorine gas with a value in the range of 0.1% by mass to 0.8% by mass.

[2] 前述金屬氟化物係選自鉀、銫、銣、及鋰之至少1種之金屬之氟化物之記載於[1]之氟氣之製造方法。 [3] 於前述電解使用之陽極係選自鑽石、類金剛石碳、非晶質碳、石墨、及玻璃碳之至少1種之碳材料所形成之碳質電極之記載於[1]或[2]之氟氣之製造方法。 [4] 具有前述電解槽係前述電解中所使用之陽極或陰極所產生之氣泡,在前述電解液中向鉛直方向上昇,可到達前述電解液之液面之構造之記載於[1]~[3]任一項之氟氣之製造方法。[2] The aforementioned metal fluoride is a fluoride of at least one metal selected from potassium, cesium, rubidium, and lithium. The method for producing fluorine gas described in [1]. [3] The anode used in the foregoing electrolysis is a carbon electrode formed of at least one carbon material selected from diamond, diamond-like carbon, amorphous carbon, graphite, and glassy carbon, as described in [1] or [2 ] The manufacturing method of fluorine gas. [4] The structure that the bubble generated by the anode or cathode used in the electrolysis in the electrolysis cell rises in the vertical direction in the electrolytic solution and can reach the liquid surface of the electrolytic solution is described in [1]~[ 3] Any one of the manufacturing methods of fluorine gas.

[5]電解含有氟化氫及金屬氟化物之電解液,製造氟氣之氟氣製造裝置中, 具備:收容前述電解液,進行前述電解之電解槽、 和於前述電解時,測定前述電解槽內之電解液中之水分濃度之水分濃度測定部、 和於前述電解液之電解時,將在前述電解槽之內部所產生之流體,從前述電解槽之內部向外部輸送之流道; 前述流道係具有從前述電解槽之內部向第1外部輸送前述流體之第1流道,和從前述電解槽之內部向第2外部輸送前述流體之第2流道的同時,具有對應於以前述水分濃度測定部所測定之前述電解液中之水分濃度,將流動前述流體之流道,切換成前述第1流道或前述第2流道的流道切換部 前述流道切換部係以前述水分濃度測定部所測定之前述電解液中之水分濃度係預先設定之基準值以下之時,從前述電解槽之內部向前述第1流道,輸送前述流體,較前述預先設定之基準值為大之時,從前述電解槽之內部向前述第2流道,輸送前述流體, 前述預先設定之基準值係0.1質量%以上0.8質量%以下之範圍內之數值的氟氣製造裝置。 [發明效果][5] In a fluorine gas production device that electrolyzes an electrolyte containing hydrogen fluoride and metal fluoride to produce fluorine gas, Equipped with: an electrolytic cell for accommodating the aforementioned electrolyte and performing the aforementioned electrolysis, And during the aforementioned electrolysis, the water concentration measuring part that measures the water concentration in the electrolyte in the aforementioned electrolytic cell, And during the electrolysis of the foregoing electrolyte, the fluid generated in the interior of the foregoing electrolytic tank is transported from the interior of the foregoing electrolytic tank to the outside; The flow channel has a first flow channel that transports the fluid from the inside of the electrolytic cell to the first outside, and a second flow channel that transports the fluid from the inside of the electrolytic cell to the second outside, and has a corresponding The water concentration in the electrolyte measured by the water concentration measuring unit switches the flow path through which the fluid flows to the first flow path or the second flow path. The flow path switching unit transports the fluid from the inside of the electrolytic cell to the first flow path when the water concentration in the electrolyte measured by the water concentration measurement unit is below a preset reference value. When the predetermined reference value is large, the fluid is fed from the inside of the electrolytic cell to the second flow path, The aforementioned preset reference value is a fluorine gas production device with a value in the range of 0.1% by mass to 0.8% by mass. [Effects of the invention]

根據本發明時,電解含有氟化氫及金屬氟化物之電解液,製造氟氣之時,可抑制霧氣所造成配管或閥之閉塞。According to the present invention, the electrolytic solution containing hydrogen fluoride and metal fluoride is electrolyzed, and when fluorine gas is produced, the clogging of pipes or valves caused by mist can be suppressed.

對於本發明之一實施形態,說明如以下。然而,本實施形態係顯示實施形態之一例者,但本發明非限定於本實施形態。又,本實施形態中,可附加種種之變更或改良,而附加此等變更或改良之形態亦含於本發明中。 本發明人等係於氟氣之電解合成中,對於造成配管或閥之閉塞之霧氣,進行了深度之檢討。本發明之「霧氣」係指經由電解液之電解,在電解槽產生氟氣的同時所產生之液體之微粒子或固體之微粒子。具體而言,指電解液之微粒子、電解液之微粒子相變化之固體之微粒子、及、構成電解槽之構件(形成電解槽之金屬、電解槽用之密封墊、碳電極等)與氟氣反應所產生之固體之微粒子。The description of one embodiment of the present invention is as follows. However, this embodiment shows an example of the embodiment, but the present invention is not limited to this embodiment. In addition, in this embodiment, various changes or improvements can be added, and the form adding these changes or improvements is also included in this invention. In the electrolytic synthesis of fluorine gas, the inventors conducted an in-depth review of the mist that caused the blockage of pipes or valves. The "mist" in the present invention refers to liquid particles or solid particles produced when fluorine gas is generated in the electrolytic cell through the electrolysis of the electrolyte. Specifically, it refers to the reaction of the particles of the electrolyte, the particles of the solid in which the particles of the electrolyte phase change, and the components that constitute the electrolytic cell (the metal forming the electrolytic cell, the gasket for the electrolytic cell, the carbon electrode, etc.) react with the fluorine gas The resulting solid particles.

本發明人等係於電解液之電解時,測定含於在電解槽之內部所產生之流體之霧氣之平均粒子徑之結果,確認到霧氣之平均粒子徑會歷時性變化。又,經深度檢討之結果,發現對於霧氣之平均粒子徑與電解時之電解液中之水分濃度有相關性,更且發現對於霧氣之平均粒子徑與輸送流體之配管或閥之閉塞之易於產生性之間有相關性。然後,發現對應於電解時之電解液中之水分濃度,改良輸送電解槽之內部所產生之流體的流道,而抑制配管或閥之閉塞,減低製造氟氣之運轉之中斷或停止之頻率,以至於完成本發明。對於本發明之一實施形態,說明如以下。The inventors of the present invention measured the average particle diameter of the mist contained in the fluid generated inside the electrolytic cell during the electrolysis of the electrolyte, and confirmed that the average particle diameter of the mist changes over time. In addition, after in-depth review, it is found that the average particle diameter of the mist is related to the water concentration in the electrolyte during electrolysis, and it is also found that the average particle diameter of the mist and the occlusion of the pipe or valve of the conveying fluid are easy to occur. There is a correlation between sex. Then, it was discovered that it corresponds to the concentration of water in the electrolyte during electrolysis, improved the flow channel for conveying the fluid generated inside the electrolytic cell, suppressed the blockage of the pipe or valve, and reduced the frequency of interruption or stop of the operation of producing fluorine gas. So as to complete the present invention. The description of one embodiment of the present invention is as follows.

本實施形態之氟氣之製造方法係電解含有氟化氫及金屬氟化物之電解液,製造氟氣之氟氣之製造方法中,具備在電解槽內,進行電解之電解工程、和於電解時,測定電解液中之水分濃度之水分濃度測定工程、和於電解液之電解時,將在於電解槽之內部所產生之流體,藉由從電解槽之內部向外部之流道輸送之送氣工程。The method for producing fluorine gas in this embodiment is to electrolyze an electrolyte containing hydrogen fluoride and metal fluoride. The method for producing fluorine gas for producing fluorine gas includes an electrolysis process for electrolysis in an electrolytic cell, and measurement during electrolysis. The water concentration measurement process of the water concentration in the electrolyte, and the fluid generated inside the electrolytic cell during the electrolysis of the electrolyte, is a gas supply process that transports the fluid generated inside the electrolytic cell from the inside of the electrolytic cell to the outside of the flow channel.

於送氣工程中,成為對應於以水分濃度測定工程所測定之電解液中之水分濃度,切換流動流體之流道。即,以水分濃度測定工程所測定之電解液中之水分濃度係預先設定之基準值以下之時,於從前述電解槽之內部向第1外部輸送流體之第1流道,輸送流體,較預先設定之基準值為大之時,於從電解槽之內部向第2外部輸送流體之第2流道,輸送流體。然後,預先設定之基準值係成為0.1質量%以上0.8質量%以下之範圍內之數值。In the gas supply process, it becomes the channel of the flowing fluid that corresponds to the water concentration in the electrolyte measured by the water concentration measurement process. That is, when the water concentration in the electrolyte measured by the water concentration measurement process is less than the preset reference value, the first flow channel that transports the fluid from the inside of the electrolytic cell to the first outside will transport the fluid more than before. When the set reference value is large, the fluid is transported in the second flow path that transports fluid from the inside of the electrolytic cell to the second outside. Then, the preset reference value is a value within the range of 0.1% by mass to 0.8% by mass.

又,本實施形態之氟氣之製造裝置係電解含有氟化氫及金屬氟化物之電解液,製造氟氣之氟氣之製造裝置中,具備收容電解液,進行電解之電解槽、和於電解時,測定電解槽內之電解液中之水分濃度之水分濃度測定部、和於電解液之電解時,將在於電解槽之內部所產生之流體,從電解槽之內部向外部之輸送之流道。In addition, the fluorine gas production device of this embodiment electrolyzes an electrolyte containing hydrogen fluoride and metal fluoride. The fluorine gas production device for producing fluorine gas is equipped with an electrolytic cell that contains the electrolyte and performs electrolysis, and during electrolysis, The water concentration measuring section for measuring the water concentration in the electrolyte in the electrolytic cell and the flow channel that transports the fluid generated inside the electrolytic cell from the inside of the electrolytic cell to the outside during the electrolysis of the electrolyte.

上述流道係具有從電解槽之內部向第1外部輸送流體之第1流道,和從電解槽之內部向第2外部輸送流體之第2流道。又,此流道係具有對應於以水分濃度測定部所測定之電解液中之水分濃度,將流動流體之流道,切換成第1流道或第2流道的流道切換部。 流道切換部係以水分濃度測定部所測定之電解液中之水分濃度係預先設定之基準值以下之時,從電解槽之內部向第1流道,輸送流體,較預先設定之基準值為大之時,從電解槽之內部向第2流道,輸送流體。然後,預先設定之基準值係成為0.1質量%以上0.8質量%以下之範圍內之數值。The flow channel has a first flow channel that transports fluid from the inside of the electrolytic cell to the first outside, and a second flow channel that transports fluid from the inside of the electrolytic cell to the second outside. In addition, this flow channel has a flow channel switching section that switches the flow channel of the flowing fluid to the first flow channel or the second flow channel in accordance with the moisture concentration in the electrolyte measured by the moisture concentration measurement section. The flow channel switching section is to transport fluid from the inside of the electrolytic cell to the first flow channel when the moisture concentration in the electrolyte measured by the moisture concentration measurement section is below the preset reference value, which is lower than the preset reference value When it is large, the fluid is sent from the inside of the electrolytic cell to the second flow channel. Then, the preset reference value is a value within the range of 0.1% by mass to 0.8% by mass.

本實施形態之氟氣之製造方法及氟氣製造裝置中,對應於電解時之電解液中之水分濃度,將流動流體之流道,切換成第1流道或第2流道之故,就結果而言,成為對應於霧氣之平均粒子徑,將流道切換成第1流道或第2流道,難以產生霧氣所造成之流道閉塞。為此,本實施形態之氟氣之製造方法及氟氣製造裝置係電解含有氟化氫及金屬氟化物之電解液,製造氟氣之時,可抑制霧氣所造成配管或閥之閉塞。因此,可減低製造氟氣運轉之中斷或停止之頻率,容易進行連續性運轉。為此,可經濟地製造氟氣。In the fluorine gas production method and fluorine gas production apparatus of this embodiment, the flow channel of the flowing fluid is switched to the first flow channel or the second flow channel according to the water concentration in the electrolyte during electrolysis. As a result, the average particle diameter corresponding to the mist is obtained, and the flow channel is switched to the first flow channel or the second flow channel, and it is difficult to generate the flow channel blockage caused by the mist. For this reason, the fluorine gas production method and the fluorine gas production device of this embodiment electrolyze an electrolyte containing hydrogen fluoride and metal fluoride, and when producing fluorine gas, it is possible to suppress the clogging of pipes or valves caused by mist. Therefore, the frequency of interruption or stop of the fluorine gas production operation can be reduced, and continuous operation can be easily performed. For this reason, fluorine gas can be produced economically.

然而,於本實施形態之氟氣之製造方法及氟氣製造裝置中,電解液中之水分濃度之測定係針對配有陽極之陽極室內之電解液進行亦可,針對配有陰極之陰極室內之電解液進行亦可。又,電解液中之水分濃度之測定係可在電解中經常性進行亦可,間隔一定之間隔定期性進行亦可,不定期隨時進行亦可。更且,第1流道與第2流道係雖為各別之流道,第1外部與第2外部係可為各別處所,亦可為同一處所。However, in the fluorine gas production method and fluorine gas production apparatus of this embodiment, the measurement of the water concentration in the electrolyte may be performed on the electrolyte in the anode chamber with anode, and it may be performed on the cathode chamber with cathode. Electrolyte can also be carried out. In addition, the measurement of the water concentration in the electrolyte may be carried out frequently during electrolysis, may be carried out regularly at regular intervals, or may be carried out at any time from time to time. Furthermore, although the first flow channel and the second flow channel are separate flow channels, the first outer and second outer systems may be separate locations or the same location.

在此,顯示本實施形態之氟氣之製造方法及氟氣製造裝置之一例。第1流道係經由從電解槽之內部,從流體除去霧氣之霧氣除去部,朝向從流體選取氟氣取出之氟氣選取部,輸送流體之流道。第2流道係不經由霧氣除去部,從電解槽之內部向氟氣選取部,輸送流體之流道。即,電解液中之水分濃度係預先設定之基準值以下之時,向備於第1流道之霧氣除去部,輸送流體,較預先設定之基準值為大之時,流體係不輸送至霧氣除去部。本例中,氟氣選取部則相當於第1外部及第2外部,第1外部與第2外部雖成為同一處所,但第1外部與第2外部可為各別之處所。Here, an example of the fluorine gas production method and fluorine gas production apparatus of this embodiment is shown. The first flow path is a flow path for conveying fluid through the mist removal part that removes mist from the fluid from the inside of the electrolytic cell to the fluorine gas extraction part where the fluorine gas is extracted from the fluid. The second flow path is a flow path that conveys fluid from the inside of the electrolytic cell to the fluorine gas extraction part without passing through the mist removal part. That is, when the moisture concentration in the electrolyte is below the preset reference value, the fluid is sent to the mist removal part provided in the first flow channel, and when the fluid system is larger than the preset reference value, the flow system will not be sent to the mist. Remove the department. In this example, the fluorine gas extraction part corresponds to the first exterior and the second exterior. Although the first exterior and the second exterior are the same place, the first exterior and the second exterior may be separate locations.

然後,第2流道係具有抑制霧氣所造成第2流道之閉塞的閉塞抑制機構。閉塞抑制機構係只要可抑制霧氣所造成第2流道之閉塞者,則不特別加以限定,但例如可列舉下述者。即,可例示大口徑之配管、傾斜之配管、旋轉螺旋,氣流產生裝置,可組合此等加以使用亦可。 詳細而言,將第2流道之至少一部分,經由以較第1流道大口徑之配管加以構成,可抑制霧氣所造成第2流道之閉塞。又,將第2流道之至少一部分,經由以對於水平方向傾斜,且延伸在從上游側朝向下游側下降之方向之配管加以構成,可抑制霧氣所造成第2流道之閉塞。Then, the second flow path has an occlusion suppression mechanism that suppresses the occlusion of the second flow path caused by mist. The occlusion suppression mechanism is not particularly limited as long as it can suppress the occlusion of the second flow path caused by mist, but for example, the following may be mentioned. That is, large-diameter pipes, inclined pipes, rotating spirals, and air flow generators can be exemplified, and these can be used in combination. In detail, at least a part of the second flow channel is configured by a pipe having a larger diameter than the first flow channel, so that the blockage of the second flow channel caused by mist can be suppressed. In addition, at least a part of the second flow path is formed by piping that is inclined to the horizontal direction and extends in a direction descending from the upstream side to the downstream side, so that the obstruction of the second flow path due to mist can be suppressed.

更且,經由將堆積於第2流道之內部之霧氣,輸送至上游側或下游側之旋轉螺旋,設置於第2流道之內部,可抑制霧氣所造成第2流道之閉塞。更且,經由將流通為提昇流動第2流道內之流體之流速之氣流的氣流產生裝置,設置於第2流道,可抑制霧氣所造成第2流道之閉塞。然而,將與備於第1流道之霧氣除去部不同之霧氣除去部,做為閉塞抑制機構設於第2流道亦可。Moreover, the mist accumulated in the second flow channel is transported to the upstream or downstream side of the rotating spiral, which is arranged inside the second flow channel, and the blockage of the second flow channel caused by the mist can be suppressed. Furthermore, the airflow generating device that circulates the airflow that increases the flow velocity of the fluid flowing in the second flow channel is installed in the second flow channel, so that the blockage of the second flow channel caused by the mist can be suppressed. However, a mist removal part different from the mist removal part provided in the first flow path may be provided as the occlusion suppression mechanism in the second flow path.

第1流道係經由霧氣除去部,從流體除去霧氣之故,難以產生霧氣所造成閉塞,第2流道係設置閉塞抑制機構之故,難以產生霧氣所造成閉塞。為此,本實施形態之氟氣之製造方法及氟氣製造裝置係電解含有氟化氫及金屬氟化物之電解液,製造氟氣之時,可抑制霧氣所造成配管或閥之閉塞。然而,雖即使不具備霧氣除去部或閉塞抑制機構,僅經由將流動流體之流道切換成其他之流道(第1流道或第2流道),可發揮抑制霧氣所造成配管或閥之閉塞的效果,但具備霧氣除去部或閉塞抑制機構者,在上述效果上為優異。Since the first flow channel removes mist from the fluid through the mist removal part, it is difficult to generate occlusion due to mist, and the second flow channel is provided with an occlusion suppression mechanism, so it is difficult to generate occlusion due to mist. For this reason, the fluorine gas production method and the fluorine gas production device of this embodiment electrolyze an electrolyte containing hydrogen fluoride and metal fluoride, and when producing fluorine gas, it is possible to suppress the clogging of pipes or valves caused by mist. However, even if there is no mist removal unit or occlusion suppression mechanism, only by switching the flow path of the flowing fluid to another flow path (the first flow path or the second flow path), it can play a role in suppressing the piping or valve caused by the mist. The occlusion effect is excellent in the above-mentioned effect if it is equipped with a mist removal part or an occlusion suppression mechanism.

以下,對於本實施形態之氟氣之製造方法及氟氣製造裝置,更詳細加以說明。 [電解槽] 電解槽之形態沒有特別加以限制,只要可電解含有氟化氫及金屬氟化物之電解液,產生氟氣,任何之電解槽皆可使用。 通常,電解槽之內部係經由間隔壁等之區隔構件,分割成配有陽極之陽極室與配有陰極之陰極室,不會讓陽極所產生之氟氣與陰極所產生之氫氣混合。Hereinafter, the fluorine gas production method and the fluorine gas production apparatus of this embodiment will be described in more detail. [Electrolyzer] The shape of the electrolytic cell is not particularly limited, as long as the electrolytic solution containing hydrogen fluoride and metal fluoride can be electrolyzed to generate fluorine gas, any electrolytic cell can be used. Usually, the inside of the electrolytic cell is divided into an anode chamber with an anode and a cathode chamber with a cathode by partition members such as partition walls, so that the fluorine gas produced by the anode and the hydrogen gas produced by the cathode will not be mixed.

做為陽極係例如可使用鑽石、類金剛石碳、非晶質碳、石墨、玻璃碳、不定形碳等之碳材料所形成之碳質電極。又,做為陽極,除了上述碳材料之外,例如可使用鎳、Monel(商標)等之金屬所形成之金屬電極。又,做為陰極,例如可使用鐵、銅、鎳、Monel(商標)等之金屬所形成之金屬電極。As the anode system, for example, carbon electrodes formed of carbon materials such as diamond, diamond-like carbon, amorphous carbon, graphite, glassy carbon, and amorphous carbon can be used. In addition, as the anode, in addition to the above-mentioned carbon material, for example, a metal electrode formed of a metal such as nickel or Monel (trademark) can be used. In addition, as the cathode, for example, a metal electrode formed of metal such as iron, copper, nickel, Monel (trademark), etc. can be used.

電解液係含有氟化氫及金屬氟化物,此金屬氟化物之種類雖不特別加以限定,以選自鉀、銫、銣、及鋰至少1種之金屬之氟化物為佳。於電解液含有銫或銣時,電解液之比重會變大之故,可抑制電解時之霧氣之產生量。The electrolyte contains hydrogen fluoride and metal fluoride. Although the type of the metal fluoride is not particularly limited, it is preferably a fluoride of at least one metal selected from potassium, cesium, rubidium, and lithium. When the electrolyte contains cesium or rubidium, the specific gravity of the electrolyte will increase, which can suppress the amount of mist generated during electrolysis.

做為電解液,例如可使用氟化氫(HF)與氟化鉀(KF)之混合熔融鹽。氟化氫與氟化鉀之混合熔融鹽中之氟化氫與氟化鉀之莫爾比係例如可成為氟化氫:氟化鉀=1.5~2.5:1。氟化氫:氟化鉀=2:1時之KF・2HF為代表性之電解液,此混合熔融鹽之融點係約72℃。此電解液係具有腐蝕性之故,電解槽之內面等電解液之接觸部位係以鐵、鎳、Monel(商標)等之金屬加以形成為佳。As the electrolyte, for example, a mixed molten salt of hydrogen fluoride (HF) and potassium fluoride (KF) can be used. The molar ratio of hydrogen fluoride and potassium fluoride in the mixed molten salt of hydrogen fluoride and potassium fluoride can be, for example, hydrogen fluoride: potassium fluoride=1.5~2.5:1. Hydrogen fluoride: potassium fluoride = 2:1 when KF・2HF is a representative electrolyte. The melting point of this mixed molten salt is about 72°C. Since this electrolyte is corrosive, the contact parts of the electrolyte such as the inner surface of the electrolytic cell are preferably formed of iron, nickel, Monel (trademark) and other metals.

於電解液之電解時,於陽極與陰極施加直流電流,含氟氣之氣體在陽極產生,含氫氣之氣體在陰極產生。又,於電解液之氟化氫,有蒸氣壓之故,陽極及陰極所產生之氣體中,各別混伴有氟化氫。更且,於電解液之電解所進行之氟氣之製造中,經由電解所產生之氣體中,含有電解液之霧氣。因此,電解槽之氣相部分係經由電解所產生之氣體與氟化氫與電解液之霧氣所成。因此,從電解槽之內部向外部輸出者係經由電解所產生之氣體和氟化氫與電解液之霧氣所成,本發明中,將此稱之為「流體」。During the electrolysis of the electrolyte, a direct current is applied to the anode and the cathode, the fluorine-containing gas is generated at the anode, and the hydrogen-containing gas is generated at the cathode. In addition, the hydrogen fluoride in the electrolyte has vapor pressure, and hydrogen fluoride is mixed in the gas generated by the anode and cathode respectively. Furthermore, in the production of fluorine gas by the electrolysis of the electrolyte, the gas generated by the electrolysis contains the mist of the electrolyte. Therefore, the gas phase of the electrolytic cell is formed by the gas produced by electrolysis and the mist of hydrogen fluoride and electrolyte. Therefore, the output from the inside of the electrolytic cell to the outside is formed by the gas generated by the electrolysis and the mist of hydrogen fluoride and the electrolyte. In the present invention, this is referred to as "fluid".

然而,經由電解之進行,電解液中之氟化氫被消耗之故,將氟化氫連續性或斷續性供給至電解槽加以補給之配管,連接至電解槽亦可。氟化氫之供給係可供給至電解槽之陰極室側,亦可供給至陽極室側。 於電解液之電解時,產生霧氣之主要理由係如以下所述。電解時之電解液之溫度係例如調整至80~100℃。KF・2HF之融點係71.7℃之故,調整至上述溫度之時,電解液係在液體狀態。電解槽之兩電極所產生之氣體之氣泡係在電解液中上昇,在電解液之液面撐破。此時,電解液之一部分則放出至氣相中。However, as the hydrogen fluoride in the electrolyte is consumed through the progress of electrolysis, the piping for supplying hydrogen fluoride to the electrolytic cell continuously or intermittently may be connected to the electrolytic cell. The supply of hydrogen fluoride can be supplied to the cathode chamber side of the electrolytic cell, and can also be supplied to the anode chamber side. During the electrolysis of the electrolyte, the main reasons for the generation of mist are as follows. The temperature of the electrolyte during electrolysis is adjusted to, for example, 80-100°C. Because the melting point of KF・2HF is 71.7℃, when the temperature is adjusted to the above temperature, the electrolyte is in a liquid state. The gas bubbles generated by the two electrodes of the electrolytic cell rise in the electrolyte and break on the surface of the electrolyte. At this time, a part of the electrolyte is released into the gas phase.

氣相之溫度係較電解液之融點為低之故,在此放出之電解液係相變化成極微小之粉體之狀態。此粉體係應為氟化鉀與氟化氫之混合物KF・nHF。此粉體係乘著其他所產生之氣體之流動而成為霧氣,形成電解槽所產生之流體。如此霧氣係經由具有黏著性等之理由,僅是過濾器之設置等之通常對策,難以有效加以除去。Because the temperature of the gas phase is lower than the melting point of the electrolyte, the electrolyte released here changes into a very tiny powder state. The powder system should be KF·nHF, a mixture of potassium fluoride and hydrogen fluoride. This powder system takes the flow of other generated gases to become mist, forming the fluid produced by the electrolytic cell. Such fog system is difficult to effectively remove because of its adhesiveness, etc., only the usual countermeasures such as the installation of the filter.

又,做為產生量雖為少量,會有由於與陽極之碳質電極與電解所產生之氟氣之反應,有機化合物之微粉末則做為霧氣產生之情形。詳細而言,對碳質電極之電流之供電部分係多會產生接觸阻抗,經由焦耳熱,會有成為較電解液之溫度為高之溫度之情形。為此,經由形成碳質電極之碳與氟氣之反應,煤狀之有機化合物CFx則有做為霧氣產生之情形。In addition, although the amount of production is small, there may be cases where the fine powder of the organic compound is produced as a mist due to the reaction with the carbonaceous electrode of the anode and the fluorine gas generated by the electrolysis. In detail, the power supply part of the current to the carbon electrode often generates contact resistance, and through Joule heating, it may become a temperature higher than the temperature of the electrolyte. For this reason, the coal-like organic compound CFx may be generated as a mist through the reaction of carbon and fluorine gas, which forms the carbon electrode.

然而,電解槽係具有於電解中所使用之陽極或陰極所產生之氣泡,在電解液中向鉛直方向上昇,到達電解液之液面之構造為佳。當氣泡難以在電解液中鉛直方向上昇,具有對於鉛直方向向傾斜之方向上昇之構造時,複數之氣泡易於集合成大氣泡。其結果,大氣泡則到達電解液之液面撐破之故,霧氣之產生量易於變多。具有氣泡在電解液中向鉛直方向上昇時,可到達電解液之液面的構造時,小氣泡到達電解液之液面而撐破之故,霧氣之產生量易於變少。However, the electrolytic cell has a structure where the bubbles generated by the anode or cathode used in the electrolysis rise in the vertical direction in the electrolyte and reach the liquid surface of the electrolyte. When the bubbles are difficult to rise in the vertical direction in the electrolyte and have a structure that rises in an oblique direction with respect to the vertical direction, plural bubbles tend to gather into large bubbles. As a result, the large bubbles reach the liquid surface of the electrolyte and break up, and the amount of mist generated tends to increase. When the bubbles rise in the vertical direction in the electrolyte, they can reach the surface of the electrolyte. When small bubbles reach the surface of the electrolyte and break, the amount of mist is likely to be reduced.

[平均粒子徑測定部] 本實施形態之氟氣製造裝置雖可具備測定含於流體之霧氣之平均粒子徑之平均粒子徑測定部,此平均粒子徑測定部係可以光散亂方式測定平均粒子徑之光散亂檢測器加以構成。光散亂檢測器係連續運轉氟氣製造裝置下,可測定流動於流道之流體中之霧氣之平均粒子徑之故,做為平均粒子徑測定部為佳。[Average particle diameter measurement department] Although the fluorine gas production device of this embodiment may be equipped with an average particle diameter measuring unit that measures the average particle diameter of the mist contained in the fluid, this average particle diameter measuring unit is a light scattering detector that can measure the average particle diameter by the light scattering method To be constituted. The light scattering detector can measure the average particle diameter of the mist in the fluid flowing in the flow channel under the continuous operation of the fluorine gas production device, so it is better to be the average particle diameter measuring part.

將光散亂檢測器之一例,參照圖1下加以說明。圖1之光散亂檢測器係於本實施形態之氟氣製造裝置(例如,後述之圖2及圖4~13之氟氣製造裝置)中,可做為平均粒子徑測定部使用之光散亂檢測器。即,將含有氟化氫及金屬氟化物之電解液,在氟氣製造裝置之電解槽之內部,進行電解,製造氟氣之時,測定含於在電解槽之內部所產生之流體之霧氣之平均粒子徑的光散亂檢測器。 將光散亂檢測器連接於氟氣製造裝置,將流體從電解槽之內部送至光散亂檢測器,測定霧氣之平均粒子徑亦可,或不連接光散亂檢測器與氟氣製造裝置,從電解槽之內部取出流體,導入光散亂檢測器,測定霧氣之平均粒子徑亦可。An example of the light scattering detector will be described below with reference to FIG. 1. The light scattering detector of Fig. 1 is used in the fluorine gas production device of this embodiment (for example, the fluorine gas production device of Fig. 2 and Figs. 4 to 13 described later), and can be used as the light scattering part for measuring the average particle diameter. Chaos detector. That is, the electrolyte containing hydrogen fluoride and metal fluoride is electrolyzed inside the electrolytic cell of the fluorine gas production device to produce fluorine gas, and the average particle size of the mist contained in the fluid generated inside the electrolytic cell is measured. The trail of light scatters the detector. Connect the light scatter detector to the fluorine gas production device, and send the fluid from the inside of the electrolytic cell to the light scatter detector to measure the average particle diameter of the mist, or not connect the light scatter detector and the fluorine gas production device , Take out the fluid from the inside of the electrolytic cell and introduce it into the light scatter detector to measure the average particle diameter of the mist.

圖1之光散亂檢測器係具備收容流體F之試料室1、和將光散亂測定用光L,照射於試料室1中之流體F的光源2、和檢測光散亂測定用光L經由流體F中之霧氣M被散亂而產生之散亂光S的散亂光檢測部3、和設置於試料室1,與流體F接觸,透過光散亂測定用光L之透明窗4A、設置於試料室1,與流體F接觸,透過散亂光S之透明窗4B。透明窗4A、4B係以選自鑽石、氟化鈣(CaF2 )、氟化鉀(KF)、氟化銀(AgF)、氟化鋇(BaF2 )、及溴化鉀(KBr)之至少1種加以形成。The light scatter detector in Fig. 1 is provided with a sample chamber 1 containing fluid F, a light source 2 for irradiating the fluid F in the sample chamber 1 with light L for light scatter measurement, and light L for detecting light scatter measurement The scattered light detector 3 for the scattered light S generated by the mist M in the fluid F being scattered, and the transparent window 4A, which is provided in the sample chamber 1 and is in contact with the fluid F and transmits the scattered light L for measuring light. The transparent window 4B is set in the sample chamber 1 in contact with the fluid F and transmits the scattered light S. The transparent windows 4A and 4B are selected from at least diamond, calcium fluoride (CaF 2 ), potassium fluoride (KF), silver fluoride (AgF), barium fluoride (BaF 2 ), and potassium bromide (KBr) 1 kind to be formed.

從光源2發出之光散亂測定用光L(例如雷射光)係透過收斂透鏡6及試料室1之透明窗4A,進入試料室1內,照射於收容於試料室1之流體F。此時,於流體F中,存在反射如霧氣M之光的物質時,光散亂測定用光L則反射而散亂。光散亂測定用光L經由霧氣M散亂所產生之散亂光S之一部分係透過試料室1之透明窗4B,從試料室1向外部取出,藉由聚光透鏡7及光圈8,進入散亂光檢測部3。此時,經由從散亂光S所得之資訊,可知霧氣M之平均粒子徑。然而,在此所得之平均粒子徑係個數之平均粒子徑。做為散亂光檢測部3,例如可使用PALAS公司製之氣溶膠譜儀welas(註冊商標)digital 2000。The scattered light measuring light L (such as laser light) emitted from the light source 2 enters the sample chamber 1 through the convergent lens 6 and the transparent window 4A of the sample chamber 1 and irradiates the fluid F contained in the sample chamber 1. At this time, when there is a substance that reflects light like mist M in the fluid F, the light L for light scattering measurement is reflected and scattered. A part of the scattered light S generated by the light L for light scattering measurement scattered through the mist M passes through the transparent window 4B of the sample chamber 1, and is taken out from the sample chamber 1 to the outside, and enters through the condenser lens 7 and the aperture 8. Scattered light detection section 3. At this time, based on the information obtained from the scattered light S, the average particle diameter of the mist M can be known. However, the average particle diameter obtained here is the average particle diameter of the number. As the scattered light detection unit 3, for example, an aerosol spectrometer welas (registered trademark) digital 2000 manufactured by PALAS Corporation can be used.

透明窗4A、4B雖接觸於流體F,於流體F含有反應性高之氟氣之故,需以難以被氟氣腐蝕之材質形成透明窗4A、4B。做為形成透明窗4A、4B之材質係可列舉選自鑽石、氟化鈣、氟化鉀、氟化銀、氟化鋇、及溴化鉀之至少1種。透明窗4A、4B以上述材質形成之時,可抑制與流體F接觸所造成之劣化。Although the transparent windows 4A and 4B are in contact with the fluid F, since the fluid F contains highly reactive fluorine gas, it is necessary to form the transparent windows 4A and 4B with a material that is difficult to be corroded by the fluorine gas. As the material for forming the transparent windows 4A, 4B, at least one selected from diamond, calcium fluoride, potassium fluoride, silver fluoride, barium fluoride, and potassium bromide can be cited. When the transparent windows 4A and 4B are formed of the above-mentioned material, deterioration caused by contact with the fluid F can be suppressed.

又,可將上述之材質所成被膜,塗佈於石英等之玻璃之表面,做為透明窗4A、4B加以使用。與流體F接觸之部分以上述之材質所成被膜加以塗佈之故,可抑制成本下,抑制與流體F接觸所造成之劣化。透明窗4A、4B係可為將與流體F接觸之面,以上述之材質形成,將除此以外之部分,以石英等之通常之玻璃所形成之層積體。 光散亂檢測器中之透明窗4A、4B以外之部分之材質雖只要對於氟氣具有耐蝕性之材質,則不特別加以限定,但例如使用銅-鎳合金之Monel(商標)、HASTELLOY(商標)、不鏽鋼等之金屬材料為佳。In addition, a film made of the above-mentioned materials can be coated on the surface of glass such as quartz and used as the transparent windows 4A, 4B. The part in contact with the fluid F is coated with a film made of the above-mentioned material, so that the deterioration caused by contact with the fluid F can be suppressed at a cost. The transparent windows 4A, 4B may be a laminated body in which the surface in contact with the fluid F is formed of the above-mentioned material, and the other parts are formed of ordinary glass such as quartz. The materials of the parts other than the transparent windows 4A and 4B in the light scattering detector are not particularly limited as long as they have corrosion resistance to fluorine gas. For example, copper-nickel alloy Monel (trademark) and HASTELLOY (trademark) are used. ), stainless steel and other metal materials are preferred.

[霧氣之平均粒子徑與電解液中之水分濃度] 本發明者等係將電解液之電解所成氟氣之製造時所產生之霧氣之平均粒子徑,使用光散亂檢測器加以測定。說明其結果之一例。將氟氣製造裝置之陽極交換成新的陽極,於電解槽內填充新的電解液後,開胎電解,電解開始後至一定期間,測定陽極所產生之流體中之霧氣之平均粒子徑。其結果,霧氣之平均粒子徑係0.5~2.0μm。之後,繼續電解,經過充分時間,電解則開始安定,此安定電解時之流體中之霧氣之平均粒子徑係約0.2μm。 如此,於電解開始後至安定電解時之期間,產生較大之粒子徑之霧氣。於含有電解開始後之大霧氣的流體,流入配管或閥內之時,霧氣則吸附於配管或閥之內面,易於產生配管或閥之閉塞。[Average particle diameter of mist and water concentration in electrolyte] The inventors of the present invention measured the average particle diameter of the mist generated during the production of the fluorine gas generated by the electrolysis of the electrolyte using a light scattering detector. Explain an example of the result. Replace the anode of the fluorine gas production device with a new anode, fill the electrolytic cell with new electrolyte, open the tire, and measure the average particle diameter of the mist in the fluid generated by the anode until a certain period of time after the start of the electrolysis. As a result, the average particle diameter of the mist is 0.5 to 2.0 μm. After that, the electrolysis is continued. After a sufficient time, the electrolysis begins to stabilize. The average particle diameter of the mist in the fluid during the stable electrolysis is about 0.2μm. In this way, during the period from the start of electrolysis to the time of stable electrolysis, mist with a larger particle diameter is generated. When the fluid containing a large mist after the start of electrolysis flows into the piping or valve, the mist is adsorbed on the inner surface of the piping or valve, which is likely to cause blockage of the piping or valve.

對此,於安定電解時,所產生之霧氣之粒子徑較小。如此小霧氣係在流體中難以產生沈降或堆積之故,可安定地在配管或閥流動。為此,於安定電解時,霧氣與在電極所產生之氣體所成流體係產生配管或閥之閉塞的可能性為低。然而,電解開始後至安定電解時之時間,係通常為25小時以上200小時以下。又,從電解開始後至安定電解時,每1000L電解液,需大略40kAh以上之通電。In this regard, during stable electrolysis, the particle diameter of the mist produced is small. Since such a small mist system is difficult to settle or accumulate in the fluid, it can flow stably through piping or valves. For this reason, during stable electrolysis, the possibility of piping or valve clogging in the flow system of mist and gas generated at the electrode is low. However, the time from the start of electrolysis to the time of stable electrolysis is usually 25 hours or more and 200 hours or less. Also, from the start of electrolysis to the time of stable electrolysis, approximately 40kAh or more of electricity is required per 1000L of electrolyte.

又,本發明人等係發現於霧氣之平均粒子徑與電解液中之水分濃度之間,有密切之關係。通常,電解液中之水分濃度係於電解開始時為大,顯示較1.0質量%為大之值。此時之霧氣之平均粒子徑係係較0.4μm為大。之後,伴隨繼續電解,電解液中之水分濃度則下降,成為0.3質量%以下時,霧氣之平均粒子徑係成為0.4μm以下。In addition, the inventors discovered that there is a close relationship between the average particle diameter of the mist and the water concentration in the electrolyte. Generally, the water concentration in the electrolyte is large at the beginning of electrolysis, and shows a value larger than 1.0% by mass. The average particle diameter of the mist at this time is larger than 0.4μm. After that, as the electrolysis continues, the water concentration in the electrolyte decreases, and when it becomes 0.3% by mass or less, the average particle diameter of the mist becomes 0.4 μm or less.

如此,霧氣之平均粒子徑與電解液中之水分濃度有相關性之故,可於電解時,代替霧氣之平均粒子徑,測定電解液中之水分濃度,將該測定結果,利用於流道之切換。即,在電解中之特定之時機,測定電解液中之水分濃度時,對應該測定結果,在上述特定之時機,適切切換流動電解所產生之流體的流道。In this way, the average particle diameter of the mist has a correlation with the water concentration in the electrolyte. It can be used to measure the water concentration in the electrolyte instead of the average particle diameter of the mist during electrolysis, and use the measurement result in the flow channel. Switch. That is, at a specific timing during electrolysis, when measuring the concentration of water in the electrolyte, corresponding to the measurement result, the flow path of the fluid generated by the flowing electrolysis is appropriately switched at the specific timing.

電解液中之水分濃度之推演係關連於電流值之大小、通電量(電流值與電解時間之積)而減少。電流值愈大,水分濃度之減少雖會變快,將產生陽極之電壓急遽上昇之陽極效果之碳質電極,使用於陽極之時,可以陽極之電流密度較0.1 A/cm2 小之值進行電解。可在電流密度一定下,使水分濃度下降,亦可徐徐增加電流密度下,使水分濃度下降。The deduction of the water concentration in the electrolyte is related to the size of the current value and the amount of energization (the product of the current value and the electrolysis time) and decreases. The higher the current value, the faster the reduction of the water concentration will be, which will produce a carbonaceous electrode with the anode effect that the voltage of the anode rises sharply. When used in the anode, the current density of the anode can be performed at a value smaller than 0.1 A/cm 2 electrolysis. The water concentration can be decreased under a certain current density, or the water concentration can be decreased by slowly increasing the current density.

本發明人等係根據如此之見解,發明具有對應於電解時之電解液中之水分濃度,切換流動流體之流道之構造的上述氟氣之製造方法及氟氣製造裝置。本實施形態之氟氣製造裝置係具有第1流道與第2流道,使用流道切換部(例如切換閥),從2個流道中,選擇流體之搬送所使用之流道亦可。Based on such findings, the inventors invented the above-mentioned fluorine gas production method and fluorine gas production apparatus having a structure for switching the flow channel of the flowing fluid in accordance with the water concentration in the electrolyte during electrolysis. The fluorine gas production apparatus of the present embodiment has a first flow channel and a second flow channel, and a flow channel switching unit (for example, a switching valve) is used, and the flow channel used for conveying fluid may be selected from the two flow channels.

或本實施形態之氟氣製造裝置係具有2個流道,和進行電解槽之移動及交換之移動交換機構,從2個流道中,選擇流體之搬送所使用之流道,於該流道之附近,經由移動電解槽加以連接,進行切換流道亦可。 如上所述,具有第1流道與第2流道之故,切斷一方之流道進行清潔期間,可開啟另一方之流道,繼續氟氣製造裝置之運轉。Or the fluorine gas production device of this embodiment has two flow channels, and a movement exchange mechanism for moving and exchanging the electrolytic cell. From the two flow channels, select the flow channel used for the fluid transportation, and the flow channel Nearby, it can be connected via a mobile electrolytic cell, and the flow channel can also be switched. As mentioned above, with the first flow channel and the second flow channel, while the one flow channel is cut off for cleaning, the other flow channel can be opened to continue the operation of the fluorine gas production device.

在本發明人等之檢討中,從電解開始後至安定電解時之期間係產生平均粒子徑較大之霧氣之故,此時於具有閉塞抑制機構之第2流道,輸送流體亦可。經過時間,到達安定電解時,產生平均粒子徑較小之霧氣之故,於此時,使於具有霧氣除去部之第1流道,輸送流體地,切換流道亦可。In the review conducted by the inventors, a mist with a relatively large average particle diameter was generated during the period from the start of electrolysis to the time of stable electrolysis. In this case, the second flow channel with the occlusion suppression mechanism may be used to transport fluid. When the time has elapsed, when the stable electrolysis is reached, a mist with a smaller average particle diameter is generated. At this time, the first flow channel with the mist removal part may be switched to the place where the fluid is transported.

如此流道之切換雖對應於測定之電解液中之水分濃度而進行,可根據預先設定之基準值,進行流道之切換。對於陽極所產生之霧氣之平均粒子徑之適切基準值雖對每一裝置而有所不同,例如可為0.1μm以上1.0μm以下,較佳為0.2μm以上0.8μm以下,更佳為0.4μm。 因此,從霧氣之平均粒子徑與電解液中之水分濃度之相關性視之,對於電解液中之水分濃度之適切基準值係係0.1質量%以上0.8質量%以下,較佳為0.2質量%以上0.6質量%以下,更佳為0.3質量%。電解液中之水分濃度係較基準值為大之時,可於第2流道輸送流體,為基準值以下之時,可於第1流道,輸送流體。Although the switching of the flow channel corresponds to the measured water concentration in the electrolyte, the switching of the flow channel can be performed according to a preset reference value. The appropriate reference value for the average particle diameter of the mist generated by the anode is different for each device, for example, it may be 0.1 μm or more and 1.0 μm or less, preferably 0.2 μm or more and 0.8 μm or less, and more preferably 0.4 μm. Therefore, from the perspective of the correlation between the average particle diameter of the mist and the water concentration in the electrolyte, the appropriate reference value for the water concentration in the electrolyte is 0.1% by mass or more and 0.8% by mass or less, preferably 0.2% by mass or more. 0.6% by mass or less, more preferably 0.3% by mass. When the water concentration in the electrolyte is greater than the reference value, the fluid can be transported in the second flow channel, and when it is below the reference value, the fluid can be transported in the first flow channel.

電解液中之水分濃度係例如可經由卡爾費雪法加以測定。或,可將電解液加熱至例如250℃以上400℃以下,將產生之氣體中之水分之量,經由例如紅外線分光法測定,求得電解液中之水分濃度。在使用於卡爾費雪法之檢出液,固體狀之電解液幾乎不溶解之故,雖需要溶解固體狀之電解液之其他溶媒,但幾乎沒有對於固體狀之電解液具有大溶解度之溶媒。因此,難以溶解多量之固體狀之電解液,進行卡爾費雪分析之故,卡爾費雪法係適於水分含有量多之固體狀之電解液之分析。相較於此,加熱固體狀之電解液,測定產生氣體中之水分之量之方法雖較卡爾費雪法需較長之分析時間,但可精度佳地分析電解液中之水分濃度。The water concentration in the electrolyte can be measured, for example, by the Karl Fischer method. Alternatively, the electrolyte can be heated to, for example, 250°C or more and 400°C or less, and the amount of moisture in the generated gas can be measured by, for example, infrared spectroscopy to obtain the moisture concentration in the electrolyte. In the detection solution used in the Karl Fischer method, the solid electrolyte is almost insoluble. Although other solvents for dissolving the solid electrolyte are needed, there are almost no solvents with high solubility for the solid electrolyte. Therefore, it is difficult to dissolve a large amount of solid electrolyte and perform Karl Fischer analysis. Therefore, the Karl Fischer method is suitable for the analysis of solid electrolytes with high water content. In contrast, the method of heating the solid electrolyte to measure the amount of moisture in the generated gas requires a longer analysis time than the Karl Fischer method, but it can analyze the moisture concentration in the electrolyte with better accuracy.

然而,陰極所產生之流體(主成分為氫氣)中,例如每單位體積(1公升)含20~50μg(假設霧氣之比重係1.0 g/mL所算出)之粉體,此粉體之平均粒子徑係約0.1μm,具有±0.05μm之分布。However, in the fluid produced by the cathode (the main component is hydrogen), for example, powder containing 20-50μg per unit volume (1 liter) (calculated assuming the specific gravity of the mist is 1.0 g/mL), the average particle size of this powder The diameter is about 0.1μm, with a distribution of ±0.05μm.

於陰極所產生之流體中,經由電解液中之水分濃度,於產生之粉體之粒子徑分布上,沒有大的差異。含於陰極所產生之流體的霧氣係較含於陽極所產生之流體的霧氣,平均粒子徑較小之故,相較含於陽極所產生之流體的霧氣,難以產生配管或閥之閉塞。因此,含於陰極所產生之流體的霧氣係可使用適當之除去方法,從流體加以除去即可。In the fluid produced by the cathode, there is no big difference in the particle size distribution of the powder produced through the concentration of water in the electrolyte. The mist contained in the fluid generated by the cathode has a smaller average particle diameter than the mist contained in the fluid generated by the anode. Therefore, compared with the mist contained in the fluid generated by the anode, it is difficult to cause piping or valve blockage. Therefore, the mist system contained in the fluid generated by the cathode can be removed from the fluid using an appropriate removal method.

將本實施形態之氟氣製造裝置之一例,參照圖2之下,詳細加以說明。圖2之氟氣製造裝置雖為具備2座電解槽之例,電解槽可為1座,亦可為3座以上,例如可為10~15座。 圖2所示氟氣製造裝置係具備於內部收容電解液10,進行電解之電解槽11、11、和配置於電解槽11之內部,浸漬於電解液10之陽極13、和配置於電解槽11之內部,浸漬於電解液10的同時,對向於陽極13配置之陰極15。An example of the fluorine gas production apparatus of this embodiment will be described in detail with reference to FIG. 2 below. Although the fluorine gas production device in Fig. 2 is an example with two electrolytic cells, the electrolytic cell may be one or more than three, for example, 10-15. The fluorine gas production device shown in FIG. 2 is equipped with electrolytic cells 11 and 11 that contain an electrolyte 10 inside and perform electrolysis, and an anode 13 that is immersed in the electrolytic solution 10, and an anode 13 that is arranged in the electrolytic cell 11 The inside is immersed in the electrolyte 10 and at the same time the cathode 15 is arranged facing the anode 13.

電解槽11之內部係從電解槽11之內部之天花板向垂直方向下方延伸,且經由該下端浸漬於電解液10之間隔壁17,分割成陽極室22與陰極室24。然後,於陽極室22內配置陽極13,於陰極室24內配置陰極15。惟,電解液10之液面上之空間係經由間隔壁17,分離成陽極室22內之空間與陰極室24內之空間,對於較電解液10中間隔壁17之下端上方側之部分,雖經由間隔壁17加以分離,對於較電解液10中間隔壁17之下端下方側之部分,未經由間隔壁17直接分離而連續。The inside of the electrolytic cell 11 extends vertically downward from the ceiling of the inside of the electrolytic cell 11, and is immersed in the partition wall 17 of the electrolytic solution 10 through the lower end, and is divided into an anode chamber 22 and a cathode chamber 24. Then, the anode 13 is arranged in the anode chamber 22 and the cathode 15 is arranged in the cathode chamber 24. However, the space on the liquid surface of the electrolyte 10 is separated into the space in the anode chamber 22 and the space in the cathode chamber 24 by the partition wall 17, and the part above the lower end of the partition wall 17 in the electrolyte 10 is separated by The partition wall 17 is separated, and the portion below the lower end of the partition wall 17 in the electrolyte 10 is continuous without being directly separated by the partition wall 17.

又,圖2所示氟氣製造裝置係具備於電解液10之電解時,測定電解槽11內之電解液10中之水分濃度的水分濃度測定部36、和於電解液10之電解時,測定含於在電解槽11之內部所產生之流體之霧氣之平均粒子徑的第1平均粒子徑測定部31、和從流體除去霧氣之第1霧氣除去部32、和從流體選取氟氣而取出之氟氣選取部(未圖示)、和將流體從電解槽11之內部輸送至氟氣選取部之流道。In addition, the fluorine gas production device shown in FIG. 2 is equipped with a moisture concentration measuring unit 36 that measures the moisture concentration in the electrolytic solution 10 in the electrolytic cell 11 during the electrolysis of the electrolytic solution 10, and the measurement during the electrolysis of the electrolytic solution 10 The first average particle diameter measuring section 31 containing the average particle diameter of the mist of the fluid generated in the inside of the electrolytic cell 11, the first mist removing section 32 which removes mist from the fluid, and the fluorine gas is extracted from the fluid. A fluorine gas extraction part (not shown), and a flow channel for conveying fluid from the inside of the electrolytic cell 11 to the fluorine gas extraction part.

更且,此流道係具有經由第1霧氣除去部32,從電解槽11之內部向氟氣選取部輸送流體之第1流道,和不經由第1霧氣除去部32,從電解槽11之內部向氟氣選取部輸送流體之第2流道。又,此流道係具有對應於以水分濃度測定部36所測定之電解液10中之水分濃度,將流動流體之流道,切換成第1流道或第2流道的流道切換部。即,於從電解槽11延伸之流道之途中,設置流道切換部,經由流道切換部,可變更流動流體之流道。Furthermore, this flow path has a first flow path that transports fluid from the inside of the electrolytic cell 11 to the fluorine gas extraction section through the first mist removal section 32, and does not go through the first mist removal section 32, and is removed from the electrolytic cell 11 The second flow channel for delivering fluid from the inside to the fluorine gas extraction part. In addition, this flow channel has a flow channel switching section that switches the flow channel of the flowing fluid to the first flow channel or the second flow channel in accordance with the moisture concentration in the electrolyte 10 measured by the moisture concentration measurement section 36. That is, in the middle of the flow passage extending from the electrolytic cell 11, a flow passage switching part is provided, and the flow passage of the flowing fluid can be changed via the flow passage switching part.

此流道切換部係以水分濃度測定部36所測定之電解液10中之水分濃度係預先設定之基準值以下之時,從電解槽11之內部向第1流道,輸送流體,較預先設定之基準值為大之時,從電解槽11之內部向第2流道,輸送流體。然後,第2流道係具有抑制第2流道之霧氣所造成之閉塞的閉塞抑制機構。When the water concentration in the electrolytic solution 10 measured by the water concentration measuring unit 36 is less than the preset reference value, the flow channel switching section transports fluid from the inside of the electrolytic cell 11 to the first flow path, which is more preset When the reference value is large, the fluid is fed from the inside of the electrolytic cell 11 to the second flow channel. Then, the second flow path has an occlusion suppression mechanism that suppresses the occlusion caused by the mist of the second flow path.

即,電解液10中之水分濃度為基準值以下之時,連結電解槽11與氟氣選取部,且於設置第1霧氣除去部32之第1流道,輸送流體,電解液10中之水分濃度為較基準值為大之時,連結電解槽11與氟氣選取部,且於設置閉塞抑制機構之第2流道,輸送流體。 做為水分濃度測定部36,例如可使用卡爾費雪水分測定裝置。That is, when the moisture concentration in the electrolyte 10 is below the reference value, connect the electrolytic cell 11 and the fluorine gas extraction part, and the first flow channel where the first mist removal part 32 is provided, transports the fluid and the moisture in the electrolyte 10 When the concentration is greater than the reference value, connect the electrolytic cell 11 and the fluorine gas extraction part, and the second flow path is provided with the blocking suppression mechanism to transport the fluid. As the moisture concentration measuring unit 36, for example, a Karl Fischer moisture measuring device can be used.

做為第1霧氣除去部32,例如使用可將平均粒子徑0.4μm以下之霧氣,從流體除去之霧氣除去裝置。霧氣除去裝置之種類,即對於除去霧氣之方式,雖未特別加以限定,霧氣之平均粒子徑為小之故,例如可將電氣集塵裝置、文氏管洗淨器、過濾器做為霧氣除去裝置加以使用。As the first mist removing section 32, for example, a mist removing device capable of removing mist having an average particle diameter of 0.4 μm or less from the fluid is used. The type of mist removal device, that is, the method of removing mist, although not particularly limited, the average particle diameter of the mist is small. For example, electric dust collectors, venturi cleaners, and filters can be used as mist removal Device to be used.

上述霧氣除去裝置中,使用圖3所示霧氣除去裝置為佳。圖3所示霧氣除去裝置係將液體之氟化氫做為循環液使用之洗淨器式之霧氣除去裝置。圖3所示霧氣除去裝置係可將平均粒子徑0.4μm以下之霧氣,從流體有效率地加以除去。又,雖將液體之氟化氫做為循環液使用,為使氟氣中之氟化氫之濃度下降,冷卻循環液為佳之故,可經由冷卻溫度之控制,調整氟氣中之氟化氫之濃度。Among the above mist removing devices, the mist removing device shown in FIG. 3 is preferably used. The mist removal device shown in Figure 3 is a washer type mist removal device that uses liquid hydrogen fluoride as a circulating liquid. The mist removal device shown in Fig. 3 can efficiently remove mist with an average particle diameter of 0.4 μm or less from the fluid. In addition, although liquid hydrogen fluoride is used as the circulating fluid, it is better to cool the circulating fluid in order to reduce the concentration of hydrogen fluoride in the fluorine gas. The concentration of hydrogen fluoride in the fluorine gas can be adjusted by controlling the cooling temperature.

對於圖2所示氟氣製造裝置,更詳細加以說明。將電解槽11之陽極室22所產生之流體(有以下記為「陽極氣體」之情形),輸送至外部之第1配管41,則連通電解槽11與第4配管44,從2個電解槽11、11送出之陽極氣體,則經由第1配管41,輸送至第4配管44加以混合。然而,陽極氣體之主成分係氟氣,副成分係霧氣、氟化氫、四氟化碳、氧氣、水。The fluorine gas production apparatus shown in Fig. 2 will be described in more detail. The fluid generated in the anode chamber 22 of the electrolytic cell 11 (hereinafter referred to as "anode gas") is sent to the outside first pipe 41, and then the electrolytic cell 11 and the fourth pipe 44 are connected, from the two electrolytic cells The anode gas sent from 11 and 11 is sent to the fourth pipe 44 via the first pipe 41 to be mixed. However, the main component of the anode gas is fluorine gas, and the secondary components are mist, hydrogen fluoride, carbon tetrafluoride, oxygen, and water.

第4配管44係連接於第1霧氣除去部32,陽極氣體則經由第4配管44輸送至第1霧氣除去部32之故,陽極氣體中之霧氣及氟化氫則經由第1霧氣除去部32,從陽極氣體加以除去。除去霧氣及氟化氫之陽極氣體係經由連接於第1霧氣除去部32之第6配管46,從第1霧氣除去部32,送出至未圖示氟氣選取部。然後,經由氟氣選取部,從陽極氣體選取氟氣而取出。The fourth pipe 44 is connected to the first mist removal section 32, and the anode gas is sent to the first mist removal section 32 through the fourth pipe 44. Therefore, the mist and hydrogen fluoride in the anode gas pass through the first mist removal section 32 to remove The anode gas is removed. The anode gas system for removing mist and hydrogen fluoride is sent from the first mist removing section 32 through the sixth pipe 46 connected to the first mist removing section 32 to a fluorine gas extraction section not shown. Then, the fluorine gas is extracted from the anode gas through the fluorine gas extraction unit and taken out.

然而,於第1霧氣除去部32,連接第8配管48,循環液之液體之氟化氫則經由第8配管48,供給至第1霧氣除去部32。更且,於第1霧氣除去部32,連接第9配管49。第9配管49係藉由第3配管43,連接於電解槽11、11,在第1霧氣除去部32使用於霧氣之除去,含有霧氣之循環液(液體之氟化氫),則從第1霧氣除去部32回到電解槽11、11。However, the eighth pipe 48 is connected to the first mist removal part 32, and the liquid hydrogen fluoride of the circulating fluid is supplied to the first mist removal part 32 through the eighth pipe 48. Furthermore, a ninth pipe 49 is connected to the first mist removal part 32. The ninth pipe 49 is connected to the electrolytic cells 11 and 11 through the third pipe 43, and is used for removing mist in the first mist removing section 32. The circulating fluid (liquid hydrogen fluoride) containing mist is removed from the first mist The section 32 returns to the electrolytic cells 11,11.

對於電解槽11之陰極室24,並與陽極室22相同。即,將電解槽11之陰極室24產生之流體(有以下記為「陰極氣體」之情形),輸送至外部之第2配管42,則連通電解槽11與第5配管45,從2個電解槽11、11送出之陰極氣體,則經由第2配管42,輸送至第5配管45加以混合。然而,陰極氣體之主成分係氫氣,副成分係霧氣、氟化氫、水。The cathode chamber 24 of the electrolytic cell 11 is the same as the anode chamber 22. That is, if the fluid generated in the cathode chamber 24 of the electrolytic cell 11 (hereinafter referred to as "cathode gas") is sent to the second pipe 42 outside, the electrolytic cell 11 and the fifth pipe 45 are connected to each other. The cathode gas sent from the tanks 11 and 11 is sent to the fifth pipe 45 via the second pipe 42 to be mixed. However, the main component of the cathode gas is hydrogen, and the secondary components are mist, hydrogen fluoride, and water.

陰極氣體係含有細微霧氣與5~10體積%之氟化氫之故,直接排出大氣並不好。為此,第5配管45連接於第2霧氣除去部33,陰極氣體則經由第5配管45送至第2霧氣除去部33之故,陰極氣體中之霧氣及氟化氫則經由第2霧氣除去部33,從陰極氣體加以除去。除去霧氣及氟化氫之陰極氣體係經由連接於第2霧氣除去部33之第7配管47,從第2霧氣除去部33,排出到大氣。第2霧氣除去部33之種類,即對於除去霧氣之方式,雖未特別加以限定,可使用將鹼水溶液做為循環液使用之洗淨器式之霧氣除去裝置。Because the cathode gas system contains fine mist and 5-10% by volume of hydrogen fluoride, it is not good to discharge it directly into the atmosphere. For this reason, the fifth pipe 45 is connected to the second mist removal part 33, the cathode gas is sent to the second mist removal part 33 through the fifth pipe 45, and the mist and hydrogen fluoride in the cathode gas are passed through the second mist removal part 33. , Remove the gas from the cathode. The cathode gas system for removing mist and hydrogen fluoride is discharged from the second mist removing section 33 to the atmosphere via the seventh pipe 47 connected to the second mist removing section 33. Although the type of the second mist removing section 33, that is, the method of removing mist is not particularly limited, a washer-type mist removing device using an aqueous alkali solution as a circulating liquid can be used.

第1配管41、第2配管42、第4配管44、第5配管45之管徑或設置方向(意味配管延伸之方向,例如鉛直方向、水平方向)雖未特別加以限定,第1配管41及第2配管42係從電解槽11沿鉛直方向延伸設置,流動於第1配管41及第2配管42之流體之流速在標準狀態成為30 cm/sec以下,設定管徑為佳。如此,含於流體之霧氣以自重落下時,霧氣會沈降於電解槽11內之故,難以產生粉體所造成第1配管41及第2配管42之內部之閉塞。 又,第4配管44及第5配管45係沿水平方向延伸設置,流動於第4配管44及第5配管45之流體之流速成為第1配管41及第2配管42時之1倍~10倍程度快速地,設定管徑為佳。Although the pipe diameters or installation directions of the first pipe 41, the second pipe 42, the fourth pipe 44, and the fifth pipe 45 (meaning the direction in which the pipe extends, such as the vertical direction and the horizontal direction) are not particularly limited, the first pipe 41 and The second piping 42 extends in the vertical direction from the electrolytic cell 11, and the flow velocity of the fluid flowing in the first piping 41 and the second piping 42 is 30 cm/sec or less in the standard state, and the pipe diameter is preferably set. In this way, when the mist contained in the fluid falls under its own weight, the mist settles in the electrolytic cell 11, and it is difficult to generate powder to block the inside of the first pipe 41 and the second pipe 42. In addition, the fourth pipe 44 and the fifth pipe 45 are extended in the horizontal direction, and the flow velocity of the fluid flowing in the fourth pipe 44 and the fifth pipe 45 is 1 to 10 times that of the first pipe 41 and the second pipe 42 It is better to set the pipe diameter quickly.

更且,為將陽極氣體送至電解槽11之外部之第2旁路配管52則與第1配管41另外設置。即,第2旁路配管52係連通電解槽11與第1旁路配管51,從2個電解槽11、11送出之陽極氣體,則經由第2旁路配管52,送至第1旁路配管51加以混合。更且,經由第1旁路配管51,陽極氣體則送出至未圖示氟氣選取部。然後,經由氟氣選取部,從陽極氣體選取氟氣而取出。然而,連接於第1旁路配管51化氟氣選取部、和連接於第6配管46之氟氣選取部係可為相同者,亦可為不同者。Furthermore, the second bypass pipe 52 for sending the anode gas to the outside of the electrolytic cell 11 is provided separately from the first pipe 41. That is, the second bypass piping 52 connects the electrolytic cell 11 and the first bypass piping 51, and the anode gas sent from the two electrolytic cells 11 and 11 is sent to the first bypass piping via the second bypass piping 52 51 to be mixed. Furthermore, through the first bypass pipe 51, the anode gas is sent to a fluorine gas extraction unit not shown. Then, the fluorine gas is extracted from the anode gas through the fluorine gas extraction unit and taken out. However, the fluorine gas extraction part connected to the first bypass pipe 51 and the fluorine gas extraction part connected to the sixth pipe 46 may be the same or different.

第2旁路配管52之管徑或設置方向雖未特別加以限定,第2配管52係從電解槽11沿鉛直方向延伸設置,流動於第2旁路配管52之流體之流速在標準狀態成為30 cm/sec以下,設定管徑為佳。Although the pipe diameter or installation direction of the second bypass pipe 52 is not particularly limited, the second pipe 52 extends in the vertical direction from the electrolytic cell 11, and the flow velocity of the fluid flowing through the second bypass pipe 52 is 30 in the standard state. Below cm/sec, it is better to set the pipe diameter.

又,第1旁路配管51係沿水平方向延伸設置。然後,第1旁路配管51係成為較第4配管44為大之口徑之管徑之配管,第1旁路配管51之管徑係大到難以產生粉體之堆積所造成第1旁路配管51之閉塞。第1旁路配管51係經由成為較第4配管44為大之口徑之管徑之配管,構成閉塞抑制機構。 第1旁路配管51之管徑係第4配管44之超過1.0倍3.2倍以下為佳,1.05倍以上1.5倍以下為更佳。即,第1旁路配管51之流道剖面積係第4配管44之10倍以下為佳。In addition, the first bypass pipe 51 is extended in the horizontal direction. Then, the first bypass pipe 51 is a pipe with a larger diameter than the fourth pipe 44, and the first bypass pipe 51 is so large that it is difficult to cause powder accumulation. Block 51. The first bypass pipe 51 is a pipe having a larger diameter than that of the fourth pipe 44, and constitutes a blocking suppression mechanism. The diameter of the first bypass pipe 51 is preferably greater than 1.0 times and less than 3.2 times of the fourth pipe 44, and more preferably 1.05 times or more and 1.5 times or less. That is, the cross-sectional area of the flow passage of the first bypass pipe 51 is preferably 10 times or less that of the fourth pipe 44.

由以上之說明可知,經由第1配管41及第4配管44,構成上述之第1流道,經由第1旁路配管51及第2旁路配管52,構成上述之第2流道。然後,於構成第2流道之第1旁路配管51設置閉塞抑制機構。As can be seen from the above description, the above-mentioned first flow passage is formed through the first pipe 41 and the fourth pipe 44, and the above-mentioned second flow passage is formed through the first bypass pipe 51 and the second bypass pipe 52. Then, a blocking suppression mechanism is provided in the first bypass pipe 51 constituting the second flow path.

接著,對於流道切換部加以說明。於第1配管41,各別設置第1配管閥61。然後,經由將第1配管閥61切換成開狀態或閉狀態,可控制從電解槽11至第1霧氣除去部32之陽極氣體之送氣與否。又,於第2旁路配管52,各別設置旁路閥62。然後,經由將旁路閥62切換成開狀態或閉狀態,可控制從電解槽11至第1旁路配管51之陽極氣體之送氣與否。Next, the flow channel switching unit will be described. The first piping 41 is provided with a first piping valve 61, respectively. Then, by switching the first piping valve 61 to the open state or the closed state, it is possible to control whether or not the anode gas is supplied from the electrolytic cell 11 to the first mist removal part 32. In addition, in the second bypass pipe 52, bypass valves 62 are respectively provided. Then, by switching the bypass valve 62 to the open state or the closed state, it is possible to control whether the anode gas is supplied from the electrolytic cell 11 to the first bypass pipe 51 or not.

更且,於電解槽11,設置水分濃度測定部36,將電解槽11內之電解液10導入至水分濃度測定部36,可將電解液10中之水分濃度,於電解時加以測定。測定水分濃度之電解液10係可為陽極室22側之電解液10,亦可為陰極室24側之電解液10。Furthermore, the electrolytic cell 11 is provided with a moisture concentration measuring part 36, and the electrolytic solution 10 in the electrolytic cell 11 is introduced to the moisture concentration measuring part 36, and the moisture concentration in the electrolytic solution 10 can be measured during electrolysis. The electrolyte 10 for measuring the water concentration may be the electrolyte 10 on the anode chamber 22 side or the electrolyte 10 on the cathode chamber 24 side.

更且,於電解槽11與第1霧氣除去部32之間,詳細而言,於第4配管44之中間部,且於較第1配管41之連結部下游側,設置第1平均粒子徑測定部31。然後,經由第1平均粒子徑測定部31,測定含於流動第4配管44之陽極氣體的霧氣之平均粒子徑。又,經由分析含於測定霧氣之平均粒子徑後之陽極氣體之氟氣與氮氣,可測定氟氣之製造之電流效率。Furthermore, between the electrolytic cell 11 and the first mist removal part 32, in detail, in the middle part of the fourth pipe 44 and on the downstream side of the connecting part of the first pipe 41, a first average particle diameter measurement is provided部31. Then, the average particle diameter of the mist contained in the anode gas flowing through the fourth pipe 44 is measured via the first average particle diameter measuring unit 31. In addition, by analyzing the fluorine and nitrogen contained in the anode gas after measuring the average particle diameter of the mist, the current efficiency of the production of fluorine gas can be measured.

然後,於第1旁路配管51之中間部,且於較第2旁路配管52之連結部下游側,亦同樣設置第2平均粒子徑測定部34,經由第2平均粒子徑測定部34,測定含於流動第1旁路配管51之陽極氣體的霧氣之平均粒子徑。惟,圖2所氟氣製造裝置係可不具備第1平均粒子徑測定部31及第2平均粒子徑測定部34。Then, in the middle part of the first bypass pipe 51, and on the downstream side of the connection part of the second bypass pipe 52, a second average particle diameter measuring unit 34 is also provided in the same way, via the second average particle diameter measuring unit 34, The average particle diameter of the mist contained in the anode gas flowing through the first bypass pipe 51 is measured. However, the fluorine gas production apparatus shown in FIG. 2 may not include the first average particle diameter measuring unit 31 and the second average particle diameter measuring unit 34.

經由水分濃度測定部36,測定電解槽11內之電解液10中之水分濃度,其測定結果較預先設定之基準值為大之時,令旁路閥62成為開狀態,將陽極氣體從電解槽11送至第1旁路配管51之同時,令第1配管閥61成為閉狀態,使陽極氣體不送至第4配管44及第1霧氣除去部32。即,將陽極氣體送至第2流道。The moisture concentration in the electrolytic solution 10 in the electrolytic cell 11 is measured through the moisture concentration measuring unit 36. When the measurement result is greater than the preset reference value, the bypass valve 62 is opened to remove the anode gas from the electrolytic cell. 11 is sent to the first bypass piping 51, and the first piping valve 61 is closed, so that the anode gas is not sent to the fourth piping 44 and the first mist removal part 32. That is, the anode gas is sent to the second flow channel.

另一方面,測定結果較預先設定之基準值以下之時,令第1配管閥61成為開狀態,將陽極氣體送至第4配管44及第1霧氣除去部32之同時,令旁路閥62成為閉狀態,使陽極氣體不從電解槽11送至第1旁路配管51。即,將陽極氣體送至第1流道。 由以上之說明可知,經由第1配管閥61及旁路閥62,構成上述之流道切換部。On the other hand, when the measurement result is less than the preset reference value, the first piping valve 61 is opened, and the anode gas is sent to the fourth piping 44 and the first mist removal part 32, and the bypass valve 62 The closed state prevents anode gas from being sent from the electrolytic cell 11 to the first bypass pipe 51. That is, the anode gas is sent to the first flow channel. From the above description, it is understood that the above-mentioned flow path switching unit is constituted via the first piping valve 61 and the bypass valve 62.

如上所述,對應於電解時之電解液10中之水分濃度,經由邊切換流道,邊進行氟氣製造裝置之運轉,抑制霧氣所造成配管或閥之閉塞下,邊圓滑地連續進行運轉。因此,根據圖2所示之氟氣製造裝置,可經濟地製造氟氣。As described above, corresponding to the water concentration in the electrolyte 10 during electrolysis, the fluorine gas production device is operated while switching the flow channel, and smoothly continuous operation is performed while suppressing the clogging of pipes or valves caused by mist. Therefore, according to the fluorine gas production apparatus shown in Fig. 2, fluorine gas can be produced economically.

例如,做為霧氣除去部,準備複數設置過濾器之配管,邊適切切換,邊交換過濾器,而實施電解亦無妨。 更且,將頻繁欲進行過濾器之交換之期間、和無需頻繁進行過濾器之交換之期間,可根據電解時之電解液10中之水分濃度之測定加以判斷。然後,根據上述判斷,適切調整流動流體配管之切換頻率時,可有效率持續進行氟氣製造裝置之運轉。For example, as a mist removal part, it is okay to prepare multiple piping with filters, switch the filters as appropriate, and perform electrolysis. Furthermore, the period during which the filter is frequently exchanged and the period during which the filter is not frequently exchanged can be judged based on the measurement of the water concentration in the electrolyte 10 during electrolysis. Then, based on the above judgment, when the switching frequency of the flowing fluid piping is appropriately adjusted, the operation of the fluorine gas production device can be efficiently continued.

接著,對於圖2所示氟氣製造裝置之變形例,加以說明。 [第1變形例] 對於第1變形例,參照圖4加以說明。相較於圖2所示氟氣製造裝置中,第2旁路配管52係連結電解槽11與第1旁路配管51,圖4所示第1變形例之氟氣製造裝置中,第2旁路配管52係連結第1配管41與第1旁路配管51。第1變形例之氟氣製造裝置之構成係除了上述部分以外,與圖2之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。Next, a modification example of the fluorine gas production apparatus shown in FIG. 2 will be described. [First Modification] The first modification will be described with reference to FIG. 4. Compared with the fluorine gas production device shown in FIG. 2, the second bypass pipe 52 connects the electrolytic cell 11 and the first bypass pipe 51. In the fluorine gas production device of the first modification shown in FIG. 4, the second bypass pipe The path piping 52 connects the first piping 41 and the first bypass piping 51. The configuration of the fluorine gas production apparatus of the first modification example is almost the same as that of the fluorine gas production apparatus of FIG. 2 except for the above-mentioned parts, and the description of the same parts is omitted.

[第2變形例] 對於第2變形例,參照圖5加以說明。圖5所示第2變形例之氟氣製造裝置係具備1座電解槽11之例。第1平均粒子徑測定部31係非第4配管44,而設於第1配管41,且設於第1配管閥61之上游側。又,不具有第2旁路配管52,第1旁路配管51係不藉由第2旁路配管52,直接連接於電解槽11。[Second Modification] The second modification will be described with reference to FIG. 5. The fluorine gas production apparatus of the second modification shown in FIG. 5 is an example in which one electrolytic cell 11 is provided. The first average particle diameter measuring unit 31 is not the fourth pipe 44 but is provided in the first pipe 41 and is provided on the upstream side of the first pipe valve 61. In addition, the second bypass pipe 52 is not provided, and the first bypass pipe 51 is directly connected to the electrolytic cell 11 without the second bypass pipe 52.

然後,第1旁路配管51係較第4配管44大口徑之故,做為閉塞抑制機構而工作。更且,例如經由在於第1旁路配管51之下游側末端,設置霧氣蓄留用之空間,更增大閉塞抑制之效果。做為此霧氣蓄留用之空間,可列舉例如形成於令第1旁路配管51之下游側末端部分較設置方向中央部分為大之管徑(設置方向中央部分之例如4倍以上之管徑)而成之空間、或令第1旁路配管51之下游側末端部分形成為如容器之形狀而成之空間,經由霧氣蓄留用之空間,可抑制第1旁路配管51之閉塞。此係針對流路剖面積大所造成閉塞防止之效果、和利用氣體流動之線速度之下降所造成霧氣之重力落下之閉塞防止之效果。 更且,旁路閥62係設置於連接第1旁路配管51與未圖示氟氣選取部之第3旁路配管53。第2變形例之氟氣製造裝置之構成係除了上述部分以外,與圖2之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。Since the first bypass pipe 51 has a larger diameter than the fourth pipe 44, it functions as a blocking suppression mechanism. Furthermore, for example, through the downstream end of the first bypass pipe 51, a space for mist storage is provided to further increase the effect of suppressing the occlusion. As the space for storing the mist, for example, a pipe diameter formed in the downstream end portion of the first bypass pipe 51 to be larger than the central portion in the installation direction (for example, 4 times or more pipe diameter of the central portion in the installation direction) The space formed or the downstream end portion of the first bypass pipe 51 is formed into a container-shaped space, and the clogging of the first bypass pipe 51 can be suppressed through the space for mist storage. This is for the effect of preventing occlusion caused by the large cross-sectional area of the flow path, and the effect of preventing the occlusion of the mist caused by the gravity drop caused by the decrease of the linear velocity of the gas flow. Furthermore, the bypass valve 62 is provided in the third bypass pipe 53 connecting the first bypass pipe 51 and the fluorine gas extraction part not shown. The configuration of the fluorine gas production apparatus of the second modification example is almost the same as that of the fluorine gas production apparatus of FIG. 2 except for the above-mentioned parts, and the description of the same parts is omitted.

[第3變形例] 對於第3變形例,參照圖6加以說明。第3變形例之氟氣製造裝置中,第1平均粒子徑測定部31設於電解槽11,電解槽11之內部之陽極氣體則直接導入第1平均粒子徑測定部31,進行霧氣之平均粒子徑之測定。第3變形例之氟氣製造裝置係不具有第2平均粒子徑測定部34。第3變形例之氟氣製造裝置之構成係除了上述部分以外,與第2變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。[3rd Modification] The third modification will be described with reference to FIG. 6. In the fluorine gas production device of the third modification, the first average particle diameter measuring part 31 is provided in the electrolytic cell 11, and the anode gas inside the electrolytic cell 11 is directly introduced into the first average particle diameter measuring part 31 to perform the average particle diameter of the mist. Determination of diameter. The fluorine gas production apparatus of the third modification does not have the second average particle diameter measuring unit 34. The configuration of the fluorine gas production apparatus of the third modification example is almost the same as that of the fluorine gas production apparatus of the second modification example except for the above-mentioned parts, and the description of the same parts is omitted.

[第4變形例] 對於第4變形例,參照圖7加以說明。第4變形例之氟氣製造裝置係對於圖5所示第2變形例,閉塞抑制機構為不同之例。第2變形例之氟氣製造裝置中,第1旁路配管51雖沿水平方向延伸而設置,但第4變形例之氟氣製造裝置中,第1旁路配管51係對於水平方向而言傾斜,且朝向從上游側向下游側下降之方向延伸。經由此傾斜,可抑制粉體堆積於第1旁路配管51之內部。此傾斜愈大,抑制粉體之堆積之作用愈大。[4th Modification] The fourth modification will be described with reference to FIG. 7. The fluorine gas production apparatus of the fourth modification is a different example from the second modification shown in FIG. 5 in which the occlusion suppression mechanism is different. In the fluorine gas production device of the second modification example, the first bypass pipe 51 is extended in the horizontal direction, but in the fluorine gas production device of the fourth modification example, the first bypass pipe 51 is inclined with respect to the horizontal direction. , And extend toward the descending direction from the upstream side to the downstream side. By this inclination, it is possible to prevent the powder from accumulating inside the first bypass pipe 51. The greater the tilt, the greater the effect of inhibiting the accumulation of powder.

第1旁路配管51之傾斜角度係從水平面之俯角較90度為小之範圍,30度以上為佳,40度以上60度以下為更佳。如果,將產生第1旁路配管51之閉塞時,錘擊傾斜之第1旁路配管51時,第1旁路配管51之內部之堆積物會變得易於移動之故,可避免閉塞。 第4變形例之氟氣製造裝置之構成係除了上述部分以外,與第2變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。The inclination angle of the first bypass pipe 51 is a range where the depression angle from the horizontal plane is smaller than 90 degrees, preferably 30 degrees or more, and more preferably 40 degrees or more and 60 degrees or less. If the first bypass piping 51 is about to be blocked, and the inclined first bypass piping 51 is hammered, the deposits inside the first bypass piping 51 will become easy to move, and the blocking can be avoided. The configuration of the fluorine gas production apparatus of the fourth modification example is almost the same as that of the fluorine gas production apparatus of the second modification example except for the above-mentioned parts, and the description of the same parts is omitted.

[第5變形例] 對於第5變形例,參照圖8加以說明。第5變形例之氟氣製造裝置係對於圖6所示第3變形例,閉塞抑制機構為不同之例。第3變形例之氟氣製造裝置中,第1旁路配管51雖沿水平方向延伸而設置,但第5變形例之氟氣製造裝置中,第1旁路配管51係對於水平方向而言傾斜,且朝向從上游側向下游側下降之方向延伸。經由此傾斜,可抑制粉體堆積於第1旁路配管51之內部。第1旁路配管51之較佳傾斜角度係與上述第4變形例之時相同。第5變形例之氟氣製造裝置之構成係除了上述部分以外,與第3變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。[Fifth Modification] The fifth modification will be described with reference to FIG. 8. The fluorine gas production apparatus of the fifth modification is a different example from the third modification shown in FIG. 6 in which the occlusion suppression mechanism is different. In the fluorine gas production device of the third modification, the first bypass pipe 51 is extended in the horizontal direction, but in the fluorine gas production device of the fifth modification, the first bypass pipe 51 is inclined with respect to the horizontal direction. , And extend toward the descending direction from the upstream side to the downstream side. By this inclination, it is possible to prevent the powder from accumulating inside the first bypass pipe 51. The preferable inclination angle of the first bypass pipe 51 is the same as that of the fourth modification described above. The configuration of the fluorine gas production apparatus of the fifth modification example is almost the same as that of the fluorine gas production apparatus of the third modification example except for the above-mentioned parts, and the description of the same parts is omitted.

[第6變形例] 對於第6變形例,參照圖9加以說明。第6變形例之氟氣製造裝置係對於圖5所示第2變形例,電解槽11之構造為不同之例。電解槽11係具有1個陽極13與2個陰極15、15,且經由包圍1個陽極13之筒狀之間隔壁17,分割成1個陽極室22與1個陰極室24。陽極室22係延伸至較電解槽11之上表面之上方而形成,第1旁路配管51係連接於電解槽11之陽極室22之上端部分。第6變形例之氟氣製造裝置之構成係除了上述部分以外,與第2變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。[6th Modification] The sixth modification will be described with reference to FIG. 9. The fluorine gas production apparatus of the sixth modification is a different example from the second modification shown in FIG. 5 in that the structure of the electrolytic cell 11 is different. The electrolytic cell 11 has one anode 13 and two cathodes 15 and 15, and is divided into one anode chamber 22 and one cathode chamber 24 via a cylindrical partition wall 17 surrounding one anode 13. The anode chamber 22 is formed by extending above the upper surface of the electrolytic cell 11, and the first bypass pipe 51 is connected to the upper end portion of the anode chamber 22 of the electrolytic cell 11. The configuration of the fluorine gas production apparatus of the sixth modification example is almost the same as that of the fluorine gas production apparatus of the second modification example except for the above-mentioned parts, and the description of the same parts is omitted.

[第7變形例] 對於第7變形例,參照圖10加以說明。第7變形例之氟氣製造裝置係對於圖9所示第6變形例,第1旁路配管51之構造為不同之例。即,第7變形例之氟氣製造裝置中,第1旁路配管51係與第4變形例及第5變形例相同,對於水平方向而言傾斜,且延伸在從上游側向下游側下降之方向。第1旁路配管51之較佳傾斜角度係與上述第4變形例之時相同。第7變形例之氟氣製造裝置之構成係除了上述部分以外,與第6變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。[7th Modification] The seventh modification will be described with reference to FIG. 10. The fluorine gas production apparatus of the seventh modification is a different example from the sixth modification shown in FIG. 9 in that the structure of the first bypass pipe 51 is different. That is, in the fluorine gas production device of the seventh modification, the first bypass pipe 51 is the same as the fourth and fifth modifications. direction. The preferable inclination angle of the first bypass pipe 51 is the same as that of the fourth modification described above. The configuration of the fluorine gas production apparatus of the seventh modification example is almost the same as that of the fluorine gas production apparatus of the sixth modification example except for the above-mentioned parts, and the description of the same parts is omitted.

[第8變形例] 對於第8變形例,參照圖11加以說明。第8變形例之氟氣製造裝置係對於圖5所示第2變形例,閉塞抑制機構為不同之例。於第8變形例之氟氣製造裝置中,構成閉塞抑制機構之旋轉螺旋71則設置於第1旁路配管51之內部。此旋轉螺旋71係將該旋轉軸,對於第1旁路配管51之長度方向而言平行地加以設置。 然後,經由馬達72施轉旋轉螺旋71,將堆積於第1旁路配管51內部之霧氣,輸送至上游側或下游側。由此,可抑制粉體堆積於第1旁路配管51之內部。第8變形例之氟氣製造裝置之構成係除了上述部分以外,與第2變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。[Eighth Modification] The eighth modification will be described with reference to FIG. 11. The fluorine gas production apparatus of the eighth modification is a different example from the second modification shown in FIG. 5 in that the occlusion suppression mechanism is different. In the fluorine gas production apparatus of the eighth modification, the rotating screw 71 constituting the occlusion suppression mechanism is installed inside the first bypass pipe 51. The rotating screw 71 is provided with the rotating shaft parallel to the longitudinal direction of the first bypass pipe 51. Then, the rotating screw 71 is rotated by the motor 72, and the mist accumulated in the first bypass pipe 51 is sent to the upstream side or the downstream side. This can prevent the powder from accumulating in the first bypass pipe 51. The configuration of the fluorine gas production apparatus of the eighth modification example is almost the same as that of the fluorine gas production apparatus of the second modification example except for the above-mentioned parts, and the description of the same parts is omitted.

[第9變形例] 對於第9變形例,參照圖12加以說明。第9變形例之氟氣製造裝置係對於圖5所示第2變形例,閉塞抑制機構為不同之例。於第9變形例之氟氣製造裝置中,構成閉塞抑制機構之氣流產生裝置73則設置於第1旁路配管51之內部。氣流產生裝置73係從第1旁路配管51之上游側朝向下游側,送入氣流(例如氮氣之氣流),上昇流動第1旁路配管51內之陽極氣體之流速。由此,可抑制粉體堆積於第1旁路配管51之內部。[Ninth Modification] The ninth modification will be described with reference to FIG. 12. The fluorine gas production apparatus of the ninth modification is a different example from the second modification shown in FIG. 5 in that the occlusion suppression mechanism is different. In the fluorine gas production apparatus of the ninth modification example, the air flow generating device 73 constituting the blockage suppression mechanism is installed inside the first bypass pipe 51. The air flow generator 73 sends an air flow (for example, a nitrogen gas flow) from the upstream side to the downstream side of the first bypass pipe 51 and flows upward at the flow velocity of the anode gas in the first bypass pipe 51. This can prevent the powder from accumulating in the first bypass pipe 51.

流動於此時之第1旁路配管51內之陽極氣體之較佳流速為1 m/sec以上10 m/sec以下。雖可使流速大於10 m/sec,但此時第1旁路配管51內之配管阻抗所造成壓力損失變大,電解槽11之陽極室22內之壓力則變高。陽極室22內之壓力與陰極室24內之壓力係幾乎相同程度者為佳,而陽極室22內之壓力與陰極室24內之壓力之差過大之時,陽極氣體則越過間隔壁17流入陰極室24,氟氣與氫氣產生反應,對於氟氣之產生會發生障礙。 第9變形例之氟氣製造裝置之構成係除了上述部分以外,與第2變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。The preferred flow velocity of the anode gas flowing in the first bypass pipe 51 at this time is 1 m/sec or more and 10 m/sec or less. Although the flow velocity can be greater than 10 m/sec, the pressure loss caused by the resistance of the piping in the first bypass piping 51 will increase, and the pressure in the anode chamber 22 of the electrolytic cell 11 will increase. It is better if the pressure in the anode chamber 22 and the pressure in the cathode chamber 24 are almost the same. When the pressure in the anode chamber 22 and the pressure in the cathode chamber 24 are too large, the anode gas flows across the partition wall 17 into the cathode. In the chamber 24, the fluorine gas reacts with the hydrogen gas, which hinders the generation of the fluorine gas. The configuration of the fluorine gas production apparatus of the ninth modification example is almost the same as that of the fluorine gas production apparatus of the second modification example except for the above-mentioned parts, and the description of the same parts is omitted.

[第10變形例] 對於第10變形例,參照圖13加以說明。第10變形例之氟氣製造裝置中,第1平均粒子徑測定部31設於電解槽11,電解槽11之內部之陽極氣體則直接導入第1平均粒子徑測定部31,進行霧氣之平均粒子徑之測定。第10變形例之氟氣製造裝置係不具有第2平均粒子徑測定部34。第10變形例之氟氣製造裝置之構成係除了上述部分以外,與圖12所示第9變形例之氟氣製造裝置幾乎相同之故,省略相同之部分之說明。 [實施例][Tenth Modification] The tenth modification will be described with reference to FIG. 13. In the fluorine gas production apparatus of the tenth modification, the first average particle diameter measuring unit 31 is provided in the electrolytic cell 11, and the anode gas inside the electrolytic cell 11 is directly introduced into the first average particle diameter measuring unit 31 to perform the average particle diameter measurement of the mist. Determination of diameter. The fluorine gas production apparatus of the tenth modification does not have the second average particle diameter measuring unit 34. The configuration of the fluorine gas production apparatus of the tenth modification example is almost the same as that of the fluorine gas production apparatus of the ninth modification example shown in FIG. 12 except for the above-mentioned parts, and the description of the same parts is omitted. [Example]

以下,顯示實施例及比較例,將本發明更具體加以說明。 [參考例1] 電解電解液,製造氟氣。做為電解液,使用氟化氫434kg與氟化鉀630kg之混合熔融鹽(560L)。做為陽極,使用SGLCabon公司製之非晶質碳電極(橫30cm、縱45cm、厚度7cm),將16枚之陽極設置於電解槽。又,做為陰極使用Monel(商標)之穿孔板,設置電解槽。於1枚之陽極,對向2枚之陰極,1枚之陽極中,對向於陰極之部分之合計面積係1736cm2Hereinafter, examples and comparative examples are shown to explain the present invention in more detail. [Reference Example 1] Electrolyte electrolyte to produce fluorine gas. As the electrolyte, a mixed molten salt (560L) of 434kg of hydrogen fluoride and 630kg of potassium fluoride was used. As the anode, an amorphous carbon electrode (30 cm wide, 45 cm long, 7 cm thick) manufactured by SGLBabon was used, and 16 anodes were set in the electrolytic cell. In addition, a perforated plate of Monel (trademark) is used as the cathode, and an electrolytic cell is installed. For one anode and two cathodes, the total area of one anode facing the cathode is 1736cm 2 .

電解溫度係控制於85~95℃。首先,令電解液溫度為85℃,以電流密度0.036 A/cm2 ,施加1000A之直流電流,開始電解。此時,電解液中之水分濃度係1.0質量%。然而,水分濃度係可經由卡爾費雪分析法加以測定。 以上述條件開始電解,從電解開始後10小時之期間,觀測到在陽極室內之陽極之附近,有小的破裂聲。此破裂聲係應為所產生之氟氣與電解液中之水分反應而產生。The electrolysis temperature is controlled at 85~95℃. First, set the temperature of the electrolyte to 85°C, apply a direct current of 1000 A at a current density of 0.036 A/cm 2, and start electrolysis. At this time, the water concentration in the electrolyte is 1.0% by mass. However, the water concentration can be determined by Karl Fischer analysis. The electrolysis was started under the above conditions. During 10 hours after the start of electrolysis, a small cracking sound was observed near the anode in the anode chamber. This cracking sound should be produced by the reaction of the generated fluorine gas with the moisture in the electrolyte.

於此狀態下,將陽極所產生之流體,從電解槽之陽極室送出至外部而採取,分析含於流體之霧氣。其結果,陽極所產生之流體中,每1L含有5.0~9.0mg(假定霧氣之比重為1.0 g/mL加以算出。以下亦相同。)之粉體,此粉體之平均粒子徑為1.0~2.0μm。將此粉體以光學顯微鏡觀察之結果,主要觀察到穿過球之內部之形狀之粉體。又,此時之氟氣生成之電流效率係0~15%。In this state, the fluid generated by the anode is sent from the anode chamber of the electrolytic cell to the outside and collected, and the mist contained in the fluid is analyzed. As a result, the fluid produced by the anode contains 5.0 to 9.0 mg of powder per 1 L (calculated assuming that the specific gravity of the mist is 1.0 g/mL. The same applies to the following.) The average particle diameter of this powder is 1.0 to 2.0 μm. As a result of observing the powder with an optical microscope, it is mainly observed that the powder has a shape passing through the inside of the ball. In addition, the current efficiency of fluorine gas generation at this time is 0-15%.

更且,通電量持續電解至30kAh時,在陽極室之內部產生破裂聲之頻率則減低。此時,電解液中之水分濃度係0.7質量%。又,於此狀態下,將陽極所產生之流體,從電解槽之陽極室送出至外部而採取,分析含於流體之霧氣。其結果,陽極所產生之流體中,每1L含有0.4~ 1.0mg之霧氣,此霧氣之平均粒子徑為0.5~0.7μm。更且,此時之氟氣生成之電流效率係15~55%。令從電解開始至此之電解階段為「階段(1)」。What's more, when the energizing power continues to electrolyze to 30kAh, the frequency of cracking sound inside the anode chamber is reduced. At this time, the water concentration in the electrolyte is 0.7% by mass. Also, in this state, the fluid generated by the anode is sent from the anode chamber of the electrolytic cell to the outside and collected, and the mist contained in the fluid is analyzed. As a result, the fluid generated by the anode contains 0.4~1.0mg of mist per 1L, and the average particle diameter of this mist is 0.5~0.7μm. Moreover, the current efficiency of fluorine gas generation at this time is 15~55%. Let the electrolysis stage from the beginning of the electrolysis to this point be "stage (1)".

更且,接續階段(1),繼續電解液之電解。結果,消耗掉氟化氫,電解液之水位下降之故,從氟化氫槽向電解槽適切補給氟化氫。補給之氟化氫中之水分濃度係500質量ppm以下。 更且,繼續電解,通電量達60kAh時,含於陽極所產生之流體之霧氣之平均粒子徑則成為0.36μm(即0.4μm以下)。此時,陽極室之內部則完全不產生破裂聲。又,此時之電解液中之水分濃度係0.2質量%(即0.3質量%以下)。更且,此時之氟氣生成之電流效率係65%。令從階段(1)之終止時點至此之電解階段為「階段(2)」。Furthermore, following stage (1), the electrolysis of the electrolyte is continued. As a result, the hydrogen fluoride is consumed, and the water level of the electrolyte drops, so hydrogen fluoride is appropriately supplied from the hydrogen fluoride tank to the electrolytic tank. The water concentration in the supplied hydrogen fluoride is below 500 mass ppm. Furthermore, when the electrolysis is continued and the current flow reaches 60 kAh, the average particle diameter of the mist contained in the fluid generated by the anode becomes 0.36 μm (that is, 0.4 μm or less). At this time, there is no cracking sound inside the anode chamber. In addition, the water concentration in the electrolyte at this time is 0.2% by mass (that is, 0.3% by mass or less). Moreover, the current efficiency of fluorine gas generation at this time is 65%. Let the electrolysis stage from the termination point of stage (1) to this point be "stage (2)".

更且,將電流增加至3500A,將電流密度增加至0.126 A/cm2 ,接續階段(2),繼續電解液之電解。於此狀態下,將陽極所產生之流體,從電解槽之陽極室送出至外部而採取,分析含於流體之霧氣。其結果,陽極所產生之流體中,每1L含有0.03~0.06mg之粉體,此粉體之平均粒子徑為約0.2μm(0.15~0.25μm),粒子徑係具有約0.1~ 0.5μm之分布。於圖14,顯示此粉體之粒子徑分布之測定結果。更且,此時之氟氣生成之電流效率係94%。此時,電解液中之水分濃度係不足0.2質量%。令從階段(2)之終止時點至此之電解階段為「安定階段」。Furthermore, the current is increased to 3500A, the current density is increased to 0.126 A/cm 2 , and stage (2) is continued, and the electrolysis of the electrolyte is continued. In this state, the fluid generated by the anode is sent from the anode chamber of the electrolytic cell to the outside and collected, and the mist contained in the fluid is analyzed. As a result, the fluid produced by the anode contains 0.03~0.06mg of powder per 1L. The average particle diameter of this powder is about 0.2μm (0.15~0.25μm), and the particle diameter has a distribution of about 0.1~0.5μm. . Figure 14 shows the measurement result of the particle size distribution of this powder. Moreover, the current efficiency of fluorine gas generation at this time is 94%. At this time, the water concentration in the electrolyte is less than 0.2% by mass. Let the electrolysis phase from the termination point of phase (2) to this point be the "stable phase".

將如上述所述進行之參考例1之電解之內容,完整顯示於表1。表1中,伴隨電流、電解經過時間、通電量、電解液中之水分濃度、陽極所產生之流體(表1中記為「陽極氣體」)含於1L中之霧氣之質量、霧氣之平均粒子徑、電流效率,亦顯示陽極所產生之流體(含有氟氣、氧氣、霧氣)之量、陽極所產生之霧氣之量、破裂聲之強度、及、陰極所生成之流體中之水分濃度(表1中記為「陰極氣體中之水分濃度」)。The content of the electrolysis of Reference Example 1 performed as described above is shown in Table 1 in its entirety. In Table 1, with current, electrolysis elapsed time, energization amount, water concentration in the electrolyte, the fluid produced by the anode (referred to as "anode gas" in Table 1), the mass of the mist contained in 1L, and the average particle size of the mist The diameter and current efficiency also show the amount of fluid (containing fluorine, oxygen, and mist) produced by the anode, the amount of mist produced by the anode, the intensity of the cracking sound, and the concentration of water in the fluid produced by the cathode (table Recorded as "water concentration in cathode gas" in 1).

又,將顯示霧氣之平均粒子徑與陽極所產生之霧氣之量之關係的圖表,示於圖15。從圖15之圖表,可知霧氣之平均粒子徑與陽極所產生之霧氣之量之間,有相關性。霧氣之產生量愈多,易於產生配管或閥之閉塞,產生較平均粒子徑0.4μm為大之霧氣時,霧氣之產生量則增加,更且經由重力之作用而沈澱之故,圖15之圖表所示之關係則可稱為表示霧氣之平均粒子徑與配管或閥之閉塞之易於產生度之相關性。 更且,將顯示霧氣之平均粒子徑與電解液中之水分濃度之關係之圖表,示於圖16。霧氣之平均粒子徑愈大,更易於產生配管或閥之閉塞之故,圖16之圖表所示之關係則可稱為表示電解液中之水分濃度與配管或閥之閉塞之易於產生度之相關性。In addition, a graph showing the relationship between the average particle diameter of the mist and the amount of mist generated by the anode is shown in FIG. 15. From the graph in Figure 15, it can be seen that there is a correlation between the average particle diameter of the mist and the amount of mist generated by the anode. The more the amount of mist is generated, the occlusion of pipes or valves is likely to occur. When a mist larger than the average particle diameter of 0.4μm is generated, the amount of mist generated will increase, and the amount of mist will be precipitated by the action of gravity. The graph in Figure 15 The relationship shown can be said to indicate the correlation between the average particle diameter of the mist and the degree of occlusion of the pipe or valve. Furthermore, a graph showing the relationship between the average particle diameter of the mist and the moisture concentration in the electrolyte is shown in FIG. 16. The larger the average particle diameter of the mist, the more likely it is to cause piping or valve clogging. The relationship shown in the graph in Figure 16 can be said to indicate the relationship between the concentration of water in the electrolyte and the degree of occlusion of the piping or valve. sex.

Figure 02_image001
Figure 02_image001

[實施例1] 將與參考例1相同之電解,使用圖2所示氟氣製造裝置進行。於階段(1)之電解中,將陽極所產生之流體,經由第2旁路配管、旁路閥、第1旁路配管加以流通。於階段(1)之電解終止後,暫時停止電解,進行氟氣製造裝置之內部之檢查。其結果,於第1旁路配管內,雖堆積有霧氣,但配管之口徑大之故,未產生配管之閉塞。[Example 1] The same electrolysis as in Reference Example 1 was performed using the fluorine gas production apparatus shown in FIG. 2. In the electrolysis of stage (1), the fluid generated by the anode is circulated through the second bypass pipe, the bypass valve, and the first bypass pipe. After the electrolysis of stage (1) is terminated, the electrolysis is temporarily stopped, and the internal inspection of the fluorine gas production device is carried out. As a result, although mist accumulated in the first bypass piping, the piping was not blocked due to the large diameter of the piping.

成為霧氣之平均粒子徑為0.4μm以下(電解液中之水分濃度係基準值之0.3質量%以下之0.2質量%)之段階(2)之電解之故,將陽極所產生之流體,經由第1配管、第1配管閥、第4配管、第1霧氣除去部加以流通。於第1配管、第1配管閥、第4配管未產生霧氣之堆積或閉塞,陽極所產生之流體係供給至第1霧氣除去部之故,於第1霧氣除去部,除去霧氣。第1霧氣除去部係噴霧液體之氟化氫,除去霧氣等之微粒子之洗淨器式之除去部,霧氣之去除率則為98%以上。As the average particle diameter of the mist is 0.4μm or less (the water concentration in the electrolyte is 0.2% by mass of 0.3% by mass or less of the reference value), the fluid generated by the anode is passed through the first step (2) of electrolysis. The piping, the first piping valve, the fourth piping, and the first mist removal part circulate. No accumulation or obstruction of mist occurs in the first piping, the first piping valve, and the fourth piping, and the flow system generated by the anode is supplied to the first mist removal part, and the mist is removed in the first mist removal part. The first mist removal part is a washer-type removal part that sprays liquid hydrogen fluoride and removes particles such as mist. The mist removal rate is 98% or more.

[比較例1] 於階段(1)之電解中,除了將陽極所產生之流體,經由第1配管、第1配管閥、第4配管、第1霧氣除去部加以流通之外,與實施例1進行相同電解。 階段(1)之電解中,安裝於電解槽之陽極側及陰極側之壓力計中之陽極側之壓力計之測量值則逐漸變高,與陰極側之壓力之差壓成為90 mmH2 O之故,停止電解。停止之理由係如以下所述。浸漬於電解槽內之間隔壁中之電解液之部分之鉛直方向長度(浸漬長度)有5cm之故,陽極側之壓力較陰極側之壓力高約100 mmH2 O時,陽極側之電解液之液面則較間隔壁之下端為低。其結果,氟氣則跨過間隔壁,與陰極側之氫氣混合,會產生氟氣與氫氣之劇烈反應之故,非常的危險。[Comparative example 1] In the electrolysis of stage (1), except that the fluid generated by the anode is circulated through the first pipe, the first pipe valve, the fourth pipe, and the first mist removal part, it is the same as that of Example 1. Perform the same electrolysis. In the electrolysis of stage (1), the measured value of the pressure gauge on the anode side of the pressure gauges installed on the anode and cathode sides of the electrolytic cell gradually becomes higher, and the difference between the pressure on the cathode side and the pressure on the cathode side becomes 90 mmH 2 O Therefore, stop electrolysis. The reason for the suspension is as follows. The part of the electrolyte immersed in the partition wall in the electrolytic cell has a vertical length (immersion length) of 5 cm. When the pressure on the anode side is about 100 mmH 2 O higher than the pressure on the cathode side, the electrolyte on the anode side The liquid level is lower than the lower end of the partition wall. As a result, the fluorine gas crosses the partition wall and mixes with the hydrogen gas on the cathode side, causing a violent reaction between the fluorine gas and the hydrogen gas, which is very dangerous.

系統內在氮氣等排氣之後,檢查第1配管、第1配管閥、第4配管之內部的結果,第1配管係延伸於鉛直方向之配管之故,沒有閉塞。於第1配管閥有少量之粉之附著,第1配管閥之下游側之配管,即第4配管之入口部分被粉所閉塞。第4配管也有粉之堆積,但沒有到閉塞配管之量。After exhausting nitrogen gas in the system, check the inside of the first piping, the first piping valve, and the fourth piping. As a result, the first piping is a pipe extending in the vertical direction and is not blocked. A small amount of powder is attached to the first piping valve, and the downstream side of the first piping valve, that is, the inlet of the fourth piping, is blocked by the powder. The fourth pipe also has powder accumulation, but it is not enough to block the pipe.

1:試料室 2:光源 3:散亂光檢測部 4A,4B:透明窗 10:電解液 11:電解槽 13:陽極 15:陰極 22:陽極室 24:陰極室 31:第1平均粒子徑測定部 32:第1霧氣除去部 33:第2霧氣除去部 34:第2平均粒子徑測定部 36:水分濃度測定部 41:第1配管 42:第2配管 43:第3配管 44:第4配管 45:第5配管 46:第6配管 47:第7配管 48:第8配管 49:第9配管 51:第1旁路配管 52:第2旁路配管 61:第1配管閥 62:旁路閥 F:流體 L:光散亂測定用光 M:霧氣 S:散亂光1: sample room 2: light source 3: Scattered light detection section 4A, 4B: transparent window 10: Electrolyte 11: Electrolyzer 13: anode 15: Cathode 22: anode chamber 24: Cathode chamber 31: The first average particle diameter measuring section 32: The first mist removal part 33: The second mist removal part 34: The second average particle diameter measuring part 36: Water concentration measurement department 41: The first piping 42: 2nd piping 43: 3rd piping 44: 4th piping 45: 5th piping 46: 6th piping 47: No. 7 piping 48: 8th piping 49: 9th piping 51: 1st bypass piping 52: 2nd bypass piping 61: The first piping valve 62: Bypass valve F: fluid L: Light used for light scattering measurement M: mist S: Scattered light

[圖1]關於本發明之一實施形態之氟氣製造裝置中,說明做為平均粒子徑測定部使用之光散亂檢測器之一例的模式圖。 [圖2]說明關於本發明之一實施形態之氟氣製造裝置之一例的概略圖。 [圖3]圖2之氟氣製造裝置中,說明做為霧氣除去部使用之霧氣除去裝置之一例的模式圖。 [圖4]說明圖2之氟氣製造裝置之第1變形例的概略圖。 [圖5]說明圖2之氟氣製造裝置之第2變形例的概略圖。 [圖6]說明圖2之氟氣製造裝置之第3變形例的概略圖。 [圖7]說明圖2之氟氣製造裝置之第4變形例的概略圖。 [圖8]說明圖2之氟氣製造裝置之第5變形例的概略圖。 [圖9]說明圖2之氟氣製造裝置之第6變形例的概略圖。 [圖10]說明圖2之氟氣製造裝置之第7變形例的概略圖。 [圖11]說明圖2之氟氣製造裝置之第8變形例的概略圖。 [圖12]說明圖2之氟氣製造裝置之第9變形例的概略圖。 [圖13]說明圖2之氟氣製造裝置之第10變形例的概略圖。 [圖14]於参考例1中,顯示含於陽極所產生之流體之霧氣之粒子徑分布的圖表。 [圖15]於参考例1中,顯示霧氣之平均粒子徑與陽極所產生之霧氣之量之相關性的圖表。 [圖16]於参考例1中,顯示霧氣之平均粒子徑與電解液中之水分濃度之關係的圖表。[Fig. 1] A schematic diagram illustrating an example of a light scattering detector used as an average particle diameter measuring unit in a fluorine gas production apparatus according to an embodiment of the present invention. [Fig. 2] A schematic diagram illustrating an example of a fluorine gas production apparatus related to an embodiment of the present invention. [Fig. 3] In the fluorine gas production device of Fig. 2, a schematic diagram illustrating an example of a mist removal device used as a mist removal unit. [Fig. 4] A schematic diagram illustrating a first modification of the fluorine gas production apparatus of Fig. 2. [Fig. [Fig. 5] A schematic diagram illustrating a second modification of the fluorine gas production apparatus of Fig. 2. [Fig. [Fig. 6] A schematic diagram illustrating a third modification of the fluorine gas production apparatus of Fig. 2. [Fig. [Fig. 7] A schematic diagram illustrating a fourth modification of the fluorine gas production apparatus of Fig. 2. [Fig. [Fig. 8] A schematic diagram illustrating a fifth modification of the fluorine gas production apparatus of Fig. 2. [Fig. [Fig. 9] A schematic diagram illustrating a sixth modification of the fluorine gas production apparatus of Fig. 2. [Fig. [Fig. 10] A schematic diagram illustrating a seventh modification of the fluorine gas production apparatus of Fig. 2. [Fig. [Fig. 11] A schematic diagram illustrating an eighth modification of the fluorine gas production apparatus of Fig. 2. [Fig. [Fig. 12] A schematic diagram illustrating a ninth modification of the fluorine gas production apparatus of Fig. 2. [Fig. [Fig. 13] A schematic diagram illustrating a tenth modification of the fluorine gas production apparatus of Fig. 2. [Fig. [Figure 14] In Reference Example 1, a graph showing the particle diameter distribution of the mist contained in the fluid generated by the anode. [Figure 15] In Reference Example 1, a graph showing the correlation between the average particle diameter of the mist and the amount of mist generated by the anode. [Figure 16] In Reference Example 1, a graph showing the relationship between the average particle diameter of the mist and the moisture concentration in the electrolyte.

10:電解液 10: Electrolyte

11:電解槽 11: Electrolyzer

13:陽極 13: anode

15:陰極 15: Cathode

17:間隔壁 17: next wall

22:陽極室 22: anode chamber

24:陰極室 24: Cathode chamber

31:第1平均粒子徑測定部 31: The first average particle diameter measuring section

32:第1霧氣除去部 32: The first mist removal part

33:第2霧氣除去部 33: The second mist removal part

34:第2平均粒子徑測定部 34: The second average particle diameter measuring part

36:水分濃度測定部 36: Water concentration measurement department

41:第1配管 41: The first piping

42:第2配管 42: 2nd piping

43:第3配管 43: 3rd piping

44:第4配管 44: 4th piping

45:第5配管 45: 5th piping

46:第6配管 46: 6th piping

47:第7配管 47: No. 7 piping

48:第8配管 48: 8th piping

49:第9配管 49: 9th piping

51:第1旁路配管 51: 1st bypass piping

52:第2旁路配管 52: 2nd bypass piping

61:第1配管閥 61: The first piping valve

62:旁路閥 62: Bypass valve

Claims (5)

一種氟氣之製造方法,電解含有氟化氫及金屬氟化物之電解液,製造氟氣之氟氣之製造方法,其特徵係 具備:在電解槽內,進行前述電解之電解工程、 和於前述電解時,測定前述電解液中之水分濃度之水分濃度測定工程、 和於前述電解液之電解時,將在於前述電解槽之內部所產生之流體,藉由從前述電解槽之內部向外部之流道輸送之送氣工程; 前述送氣工程中,對應前述水分濃度測定工程所測定之前述電解液中之水分濃度,切換流動前述流體之流道,前述水分濃度測定工程所測定之前述電解液中之水分濃度為預先設定之基準值以下之時,於從前述電解槽之內部向第1外部輸送前述流體之第1流道,輸送前述流體,較前述預先設定之基準值為大之時,於從前述電解槽之內部向第2外部輸送前述流體之第2流道,輸送前述流體, 前述預先設定之基準值係0.1質量%以上0.8質量%以下之範圍內之數值。A method for producing fluorine gas, electrolyzing an electrolyte containing hydrogen fluoride and metal fluoride, and producing fluorine gas. Its characteristics are Possess: In the electrolytic cell, carry out the electrolysis process of the aforementioned electrolysis, And during the aforementioned electrolysis, the water concentration measurement process to measure the water concentration in the aforementioned electrolyte, And during the electrolysis of the aforementioned electrolyte, the fluid generated inside the aforementioned electrolytic cell is transported from the inside of the aforementioned electrolytic cell to the outside flow channel through the gas supply process; In the aforementioned gas supply project, corresponding to the water concentration in the electrolyte measured by the aforementioned water concentration measurement project, the flow channel through which the fluid flows is switched, and the water concentration in the aforementioned electrolyte measured by the aforementioned water concentration measurement project is a preset reference When the value is less than or equal to the value below, in the first flow path that transports the fluid from the inside of the electrolytic cell to the first outside, and when the fluid is transported, the fluid is transported from the inside of the electrolytic cell to the first 2 The second flow channel for externally transporting the aforementioned fluid, transporting the aforementioned fluid, The aforementioned preset reference value is a value within the range of 0.1% by mass to 0.8% by mass. 如請求項1記載之氟氣之製造方法,其中,前述金屬氟化物係選自鉀、銫、銣、及鋰之至少1種之金屬之氟化物。The method for producing fluorine gas according to claim 1, wherein the metal fluoride is a fluoride of at least one metal selected from potassium, cesium, rubidium, and lithium. 如請求項1或2記載之氟氣之製造方法,其中,於前述電解使用之陽極係選自鑽石、類金剛石碳、非晶質碳、石墨、及玻璃碳之至少1種之碳材料所形成之碳質電極。The method for producing fluorine gas according to claim 1 or 2, wherein the anode used in the aforementioned electrolysis is formed of at least one carbon material selected from diamond, diamond-like carbon, amorphous carbon, graphite, and glassy carbon The carbon electrode. 如請求項1至3之任一項記載之氟氣之製造方法,其中,前述電解槽係具有於前述電解中所使用之陽極或陰極所產生之氣泡,在前述電解液中向鉛直方向上昇,可到達前述電解液之液面之構造。The method for producing fluorine gas according to any one of claims 1 to 3, wherein the electrolytic cell has air bubbles generated by the anode or cathode used in the electrolysis, which rise in the vertical direction in the electrolytic solution, The structure that can reach the liquid level of the aforementioned electrolyte. 一種氟氣製造裝置,電解含有氟化氫及金屬氟化物之電解液,製造氟氣之氟氣製造裝置,其特徵係 具備:收容前述電解液,進行前述電解之電解槽、 和於前述電解時,測定前述電解槽內之電解液中之水分濃度之水分濃度測定部、 和於前述電解液之電解時,將在前述電解槽之內部所產生之流體,從前述電解槽之內部向外部之輸送之流道; 前述流道係具有從前述電解槽之內部向第1外部輸送前述流體之第1流道,和從前述電解槽之內部向第2外部輸送前述流體之第2流道的同時,具有對應於以前述水分濃度測定部所測定之前述電解液中之水分濃度,將流動前述流體之流道,切換成前述第1流道或前述第2流道的流道切換部, 前述流道切換部係以前述水分濃度測定部所測定之前述電解液中之水分濃度係預先設定之基準值以下之時,從前述電解槽之內部向前述第1流道,輸送前述流體,較前述預先設定之基準值為大之時,從前述電解槽之內部向前述第2流道,輸送前述流體, 前述預先設定之基準值係0.1質量%以上0.8質量%以下之範圍內之數值。A fluorine gas production device that electrolyzes an electrolyte containing hydrogen fluoride and metal fluoride to produce fluorine gas. Its characteristics are Equipped with: an electrolytic cell for accommodating the aforementioned electrolyte and performing the aforementioned electrolysis, And during the aforementioned electrolysis, the water concentration measuring part that measures the water concentration in the electrolyte in the aforementioned electrolytic cell, And during the electrolysis of the aforementioned electrolyte, the fluid produced in the aforementioned electrolytic tank is transported from the inside of the aforementioned electrolytic tank to the outside; The flow channel has a first flow channel that transports the fluid from the inside of the electrolytic cell to the first outside, and a second flow channel that transports the fluid from the inside of the electrolytic cell to the second outside, and has a corresponding The water concentration in the electrolyte measured by the water concentration measuring part switches the flow path through which the fluid flows to the flow path switching part of the first flow path or the second flow path, The flow path switching unit transports the fluid from the inside of the electrolytic cell to the first flow path when the water concentration in the electrolyte measured by the water concentration measurement unit is below a preset reference value. When the predetermined reference value is large, the fluid is fed from the inside of the electrolytic cell to the second flow path, The aforementioned preset reference value is a value within the range of 0.1% by mass to 0.8% by mass.
TW109144185A 2019-12-27 2020-12-15 Fluorine gas production method and fluorine gas production device TWI755972B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019238475 2019-12-27
JP2019-238475 2019-12-27

Publications (2)

Publication Number Publication Date
TW202136584A true TW202136584A (en) 2021-10-01
TWI755972B TWI755972B (en) 2022-02-21

Family

ID=76573932

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109144185A TWI755972B (en) 2019-12-27 2020-12-15 Fluorine gas production method and fluorine gas production device

Country Status (7)

Country Link
US (1) US20220275523A1 (en)
EP (1) EP4083264A1 (en)
JP (1) JPWO2021131579A1 (en)
KR (1) KR20220065825A (en)
CN (1) CN113874553B (en)
TW (1) TWI755972B (en)
WO (1) WO2021131579A1 (en)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0718032B2 (en) * 1988-12-27 1995-03-01 三井東圧化学株式会社 Method for producing nitrogen trifluoride gas
JP4584549B2 (en) * 2003-05-28 2010-11-24 レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード Fluorine gas generator
JP3893397B2 (en) * 2005-03-14 2007-03-14 ペルメレック電極株式会社 Anode for electrolysis and method for electrolytic synthesis of fluorine-containing material using the anode for electrolysis
JP2009191362A (en) * 2008-01-18 2009-08-27 Toyo Tanso Kk Apparatus for molten salt electrolysis and method for producing fluorine gas
JP5584904B2 (en) 2008-03-11 2014-09-10 東洋炭素株式会社 Fluorine gas generator
JP2011084806A (en) * 2009-06-29 2011-04-28 Central Glass Co Ltd Fluorine gas generation device
JP2011038145A (en) * 2009-08-10 2011-02-24 Yokogawa Electric Corp Electrolytic apparatus and electrolytic method
EP2488448A1 (en) * 2009-10-16 2012-08-22 Solvay Fluor und Derivate GmbH High-purity fluorine gas, the production and use thereof, and a method for monitoring impurities in a fluorine gas
JP5375673B2 (en) * 2010-03-01 2013-12-25 セントラル硝子株式会社 Fluorine gas generator
JP2011208276A (en) * 2010-03-09 2011-10-20 Central Glass Co Ltd Apparatus for generating fluorine gas
JP5569116B2 (en) * 2010-04-16 2014-08-13 セントラル硝子株式会社 Fluorine gas generator
JP5919824B2 (en) * 2012-01-05 2016-05-18 セントラル硝子株式会社 Gas generator

Also Published As

Publication number Publication date
WO2021131579A1 (en) 2021-07-01
EP4083264A1 (en) 2022-11-02
KR20220065825A (en) 2022-05-20
US20220275523A1 (en) 2022-09-01
CN113874553A (en) 2021-12-31
JPWO2021131579A1 (en) 2021-07-01
TWI755972B (en) 2022-02-21
CN113874553B (en) 2024-02-09

Similar Documents

Publication Publication Date Title
TWI771216B (en) Fluorine gas production equipment
CN113906164B (en) Method for producing fluorine gas and apparatus for producing fluorine gas
TWI755972B (en) Fluorine gas production method and fluorine gas production device
CN113874554B (en) Method and apparatus for producing fluorine gas
TWI753718B (en) Fluorine gas production method and fluorine gas production device
CN113874555B (en) Method for producing fluorine gas and apparatus for producing fluorine gas
TWI759031B (en) Fluorine gas production method and fluorine gas production device