TWI753104B - 圖案描繪裝置、及圖案描繪方法 - Google Patents

圖案描繪裝置、及圖案描繪方法 Download PDF

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Publication number
TWI753104B
TWI753104B TW107104902A TW107104902A TWI753104B TW I753104 B TWI753104 B TW I753104B TW 107104902 A TW107104902 A TW 107104902A TW 107104902 A TW107104902 A TW 107104902A TW I753104 B TWI753104 B TW I753104B
Authority
TW
Taiwan
Prior art keywords
pattern
substrate
light
scanning direction
unit
Prior art date
Application number
TW107104902A
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English (en)
Chinese (zh)
Other versions
TW201841072A (zh
Inventor
鈴木智也
石垣雄大
Original Assignee
日商尼康股份有限公司
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Filing date
Publication date
Application filed by 日商尼康股份有限公司 filed Critical 日商尼康股份有限公司
Publication of TW201841072A publication Critical patent/TW201841072A/zh
Application granted granted Critical
Publication of TWI753104B publication Critical patent/TWI753104B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/47—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using the combination of scanning and modulation of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/113—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using oscillating or rotating mirrors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW107104902A 2017-02-20 2018-02-12 圖案描繪裝置、及圖案描繪方法 TWI753104B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017028629 2017-02-20
JPJP2017-028629 2017-02-20

Publications (2)

Publication Number Publication Date
TW201841072A TW201841072A (zh) 2018-11-16
TWI753104B true TWI753104B (zh) 2022-01-21

Family

ID=63169434

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107104902A TWI753104B (zh) 2017-02-20 2018-02-12 圖案描繪裝置、及圖案描繪方法

Country Status (5)

Country Link
JP (1) JP7036041B2 (fr)
KR (1) KR102610675B1 (fr)
CN (1) CN110325922B (fr)
TW (1) TWI753104B (fr)
WO (1) WO2018150996A1 (fr)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5919530B2 (ja) * 2010-12-21 2016-05-18 パナソニックＩｐマネジメント株式会社 光学式検知装置およびそれを用いた機器
EP3982199B1 (fr) * 2019-06-07 2023-10-04 Inspec Inc. Système d'étalonnage et dispositif de dessin
JP7495276B2 (ja) * 2020-06-01 2024-06-04 住友重機械工業株式会社 印刷用データ生成装置及びインク塗布装置の制御装置
JP2022086581A (ja) 2020-11-30 2022-06-09 株式会社Ｓｃｒｅｅｎホールディングス 光学装置および３次元造形装置
EP4261615A4 (fr) * 2020-12-08 2024-06-19 Inspec Inc. Tête d'exposition, système de calibrage et dispositif de tracé

Citations (2)

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Publication number Priority date Publication date Assignee Title
CN102200716A (zh) * 2010-03-25 2011-09-28 富士施乐株式会社 曝光装置及图像形成装置
WO2015166910A1 (fr) * 2014-04-28 2015-11-05 株式会社ニコン Dispositif de tracé de motif, procédé de tracé de motif, procédé de fabrication de dispositif, dispositif de source de lumière laser, dispositif de balayage par faisceau, et procédé de balayage par faisceau

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JP3110134B2 (ja) * 1992-03-16 2000-11-20 富士写真フイルム株式会社 画像露光装置
JP2001267211A (ja) 2000-03-16 2001-09-28 Nikon Corp 位置検出方法及び装置、並びに前記位置検出方法を用いた露光方法及び装置
CN101840162B (zh) * 2005-06-20 2011-09-28 株式会社V技术 曝光装置及图形形成方法
WO2008053915A1 (fr) * 2006-11-02 2008-05-08 Nabtesco Corporation Système optique de balayage, dispositif de traitement laser et dispositif optique de balayage
JP2009109560A (ja) * 2007-10-26 2009-05-21 Dainippon Screen Mfg Co Ltd パターン描画装置およびパターン描画方法
JP2011123383A (ja) 2009-12-14 2011-06-23 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
TWI416275B (zh) * 2010-06-11 2013-11-21 Ind Tech Res Inst 曝光系統及其調校方法
JP5813961B2 (ja) * 2011-02-10 2015-11-17 株式会社Ｓｃｒｅｅｎホールディングス 描画装置、光学ユニット及び描画装置の調整方法
CN103676483B (zh) * 2012-09-03 2015-09-30 上海微电子装备有限公司 用于光刻曝光中的光强调节装置及光强调节方法
KR102255954B1 (ko) * 2013-10-22 2021-05-24 어플라이드 머티어리얼스, 인코포레이티드 포토레지스트 두께에 따라 라이팅 빔들의 전달 도즈를 변화시키기 위한 프로세서들을 이용하는 패턴 생성기들, 및 관련 방법들
CN110083018A (zh) * 2014-04-01 2019-08-02 株式会社尼康 基板处理装置的调整方法
JP6520590B2 (ja) * 2015-09-11 2019-05-29 株式会社ニコン パターン描画装置およびパターン描画方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102200716A (zh) * 2010-03-25 2011-09-28 富士施乐株式会社 曝光装置及图像形成装置
WO2015166910A1 (fr) * 2014-04-28 2015-11-05 株式会社ニコン Dispositif de tracé de motif, procédé de tracé de motif, procédé de fabrication de dispositif, dispositif de source de lumière laser, dispositif de balayage par faisceau, et procédé de balayage par faisceau

Also Published As

Publication number Publication date
JPWO2018150996A1 (ja) 2019-12-12
CN110325922B (zh) 2022-06-17
KR20190117533A (ko) 2019-10-16
JP7036041B2 (ja) 2022-03-15
WO2018150996A1 (fr) 2018-08-23
CN110325922A (zh) 2019-10-11
KR102610675B1 (ko) 2023-12-07
TW201841072A (zh) 2018-11-16

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