CN110325922B - 图案描绘装置、及图案描绘方法 - Google Patents

图案描绘装置、及图案描绘方法 Download PDF

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Publication number
CN110325922B
CN110325922B CN201880012599.7A CN201880012599A CN110325922B CN 110325922 B CN110325922 B CN 110325922B CN 201880012599 A CN201880012599 A CN 201880012599A CN 110325922 B CN110325922 B CN 110325922B
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China
Prior art keywords
substrate
pattern
light
intensity
unit
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CN201880012599.7A
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English (en)
Chinese (zh)
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CN110325922A (zh
Inventor
铃木智也
石垣雄大
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/47—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using the combination of scanning and modulation of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/113—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using oscillating or rotating mirrors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201880012599.7A 2017-02-20 2018-02-08 图案描绘装置、及图案描绘方法 Active CN110325922B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017028629 2017-02-20
JP2017-028629 2017-02-20
PCT/JP2018/004334 WO2018150996A1 (fr) 2017-02-20 2018-02-08 Dispositif et procédé de rendu de motif

Publications (2)

Publication Number Publication Date
CN110325922A CN110325922A (zh) 2019-10-11
CN110325922B true CN110325922B (zh) 2022-06-17

Family

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Family Applications (1)

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CN201880012599.7A Active CN110325922B (zh) 2017-02-20 2018-02-08 图案描绘装置、及图案描绘方法

Country Status (5)

Country Link
JP (1) JP7036041B2 (fr)
KR (1) KR102610675B1 (fr)
CN (1) CN110325922B (fr)
TW (1) TWI753104B (fr)
WO (1) WO2018150996A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5919530B2 (ja) * 2010-12-21 2016-05-18 パナソニックＩｐマネジメント株式会社 光学式検知装置およびそれを用いた機器
JP7013066B2 (ja) * 2019-06-07 2022-01-31 インスペック株式会社 キャリブレーションシステム及び描画装置
JP7495276B2 (ja) * 2020-06-01 2024-06-04 住友重機械工業株式会社 印刷用データ生成装置及びインク塗布装置の制御装置
JP7538016B2 (ja) 2020-11-30 2024-08-21 株式会社Ｓｃｒｅｅｎホールディングス 光学装置および３次元造形装置
WO2022123804A1 (fr) * 2020-12-08 2022-06-16 インスペック株式会社 Tête d'exposition, système de calibrage et dispositif de tracé

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001267211A (ja) * 2000-03-16 2001-09-28 Nikon Corp 位置検出方法及び装置、並びに前記位置検出方法を用いた露光方法及び装置
CN101840162A (zh) * 2005-06-20 2010-09-22 集成方案株式会社 曝光装置及图形形成方法
CN102200716A (zh) * 2010-03-25 2011-09-28 富士施乐株式会社 曝光装置及图像形成装置
TW201144945A (en) * 2010-06-11 2011-12-16 Ind Tech Res Inst Exposure system and adjustment method thereof
CN103676483A (zh) * 2012-09-03 2014-03-26 上海微电子装备有限公司 用于光刻曝光中的光强调节装置及光强调节方法
WO2015166910A1 (fr) * 2014-04-28 2015-11-05 株式会社ニコン Dispositif de tracé de motif, procédé de tracé de motif, procédé de fabrication de dispositif, dispositif de source de lumière laser, dispositif de balayage par faisceau, et procédé de balayage par faisceau
CN105659164A (zh) * 2013-10-22 2016-06-08 应用材料公司 根据光刻胶厚度使用处理器改变写入射束的输送剂量的图案产生器及相关方法
CN106164779A (zh) * 2014-04-01 2016-11-23 株式会社尼康 基板处理装置、器件制造方法及基板处理装置的调整方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3110134B2 (ja) * 1992-03-16 2000-11-20 富士写真フイルム株式会社 画像露光装置
WO2008053915A1 (fr) * 2006-11-02 2008-05-08 Nabtesco Corporation Système optique de balayage, dispositif de traitement laser et dispositif optique de balayage
JP2009109560A (ja) 2007-10-26 2009-05-21 Dainippon Screen Mfg Co Ltd パターン描画装置およびパターン描画方法
JP2011123383A (ja) * 2009-12-14 2011-06-23 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
JP5813961B2 (ja) 2011-02-10 2015-11-17 株式会社Ｓｃｒｅｅｎホールディングス 描画装置、光学ユニット及び描画装置の調整方法
JP6520590B2 (ja) * 2015-09-11 2019-05-29 株式会社ニコン パターン描画装置およびパターン描画方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001267211A (ja) * 2000-03-16 2001-09-28 Nikon Corp 位置検出方法及び装置、並びに前記位置検出方法を用いた露光方法及び装置
CN101840162A (zh) * 2005-06-20 2010-09-22 集成方案株式会社 曝光装置及图形形成方法
CN102200716A (zh) * 2010-03-25 2011-09-28 富士施乐株式会社 曝光装置及图像形成装置
TW201144945A (en) * 2010-06-11 2011-12-16 Ind Tech Res Inst Exposure system and adjustment method thereof
CN103676483A (zh) * 2012-09-03 2014-03-26 上海微电子装备有限公司 用于光刻曝光中的光强调节装置及光强调节方法
CN105659164A (zh) * 2013-10-22 2016-06-08 应用材料公司 根据光刻胶厚度使用处理器改变写入射束的输送剂量的图案产生器及相关方法
CN106164779A (zh) * 2014-04-01 2016-11-23 株式会社尼康 基板处理装置、器件制造方法及基板处理装置的调整方法
WO2015166910A1 (fr) * 2014-04-28 2015-11-05 株式会社ニコン Dispositif de tracé de motif, procédé de tracé de motif, procédé de fabrication de dispositif, dispositif de source de lumière laser, dispositif de balayage par faisceau, et procédé de balayage par faisceau

Also Published As

Publication number Publication date
WO2018150996A1 (fr) 2018-08-23
TWI753104B (zh) 2022-01-21
TW201841072A (zh) 2018-11-16
JPWO2018150996A1 (ja) 2019-12-12
CN110325922A (zh) 2019-10-11
KR102610675B1 (ko) 2023-12-07
JP7036041B2 (ja) 2022-03-15
KR20190117533A (ko) 2019-10-16

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