TWI751794B - Touch sensor module and method of fabricating the same - Google Patents

Touch sensor module and method of fabricating the same Download PDF

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TWI751794B
TWI751794B TW109140167A TW109140167A TWI751794B TW I751794 B TWI751794 B TW I751794B TW 109140167 A TW109140167 A TW 109140167A TW 109140167 A TW109140167 A TW 109140167A TW I751794 B TWI751794 B TW I751794B
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protective layer
layer
forming
touch sensing
sensing module
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TW109140167A
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TW202219726A (en
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周書綺
陳語蘋
林新茹
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大陸商業成科技(成都)有限公司
大陸商業成光電(深圳)有限公司
英特盛科技股份有限公司
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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

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  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

A method of fabricating touch sensor module includes forming a metal layer on a substrate, forming a hydrophobic cover layer on the metal layer, patterning the cover layer and the metal layer with laser, and cleaning the cover layer after patterning with laser. A conductive trace layer is formed by patterning the metal layer.

Description

觸控感測模組與形成其之方法Touch sensing module and method of forming the same

本發明為一種觸控感測模組與其形成之方法。The present invention is a touch sensing module and a method for forming the same.

隨著觸控面板產業的高度成長,對於於觸控感測模組的需求大幅增加。因此,產生高品質觸控感測模組有益於電性訊號傳輸的穩定。With the high growth of the touch panel industry, the demand for touch sensing modules has increased significantly. Therefore, generating a high-quality touch sensing module is beneficial to the stability of electrical signal transmission.

本發明之一態樣為一種形成觸控感測模組的方法,包括形成金屬層在基板上、形成具有疏水性的保護層在金屬層上、藉由雷射圖案化保護層和金屬層使得金屬層經雷射圖案化後形成導線層、以及雷射圖案化之後清潔保護層。One aspect of the present invention is a method of forming a touch sensing module, which includes forming a metal layer on a substrate, forming a hydrophobic protective layer on the metal layer, patterning the protective layer and the metal layer by laser to make A wire layer is formed after the metal layer is patterned by a laser, and the protective layer is cleaned after being patterned by the laser.

本發明之另一態樣為一種觸控感測模組包括基板、位於基板上的導線層、和位於導線層上的保護層。導線層包括數個第一斜面和數個第一上表面,其中第一上表面相連於第一斜面。保護層包括數個第二斜面和數個第二上表面,其中該些第一斜面與該些第二斜面為藉由同一圖案化製程同時形成,使得第二斜面與第一斜面為連續的斜面,第二上表面相連於第二斜面。Another aspect of the present invention is a touch sensing module including a substrate, a wire layer on the substrate, and a protection layer on the wire layer. The wire layer includes several first inclined surfaces and several first upper surfaces, wherein the first upper surfaces are connected to the first inclined surfaces. The protective layer includes a plurality of second slopes and a plurality of second upper surfaces, wherein the first slopes and the second slopes are simultaneously formed by the same patterning process, so that the second slopes and the first slopes are continuous slopes , the second upper surface is connected to the second inclined surface.

當一個元件被稱為「在…上」時,它可泛指該元件直接在其他元件上,也可以是有其他元件存在於兩者之中。相反地,當一個元件被稱為「直接在」另一元件,它是不能有其他元件存在於兩者之中間。如本文所用,詞彙「及/或」包含了列出的關聯項目中的一個或多個的任何組合。When an element is referred to as being "on", it can generally mean that the element is directly on the other element or that the other element is present in both. Conversely, when an element is said to be "directly on" another element, it cannot have the other element intervening. As used herein, the term "and/or" includes any combination of one or more of the associated listed items.

再者,為了方便描述圖示中一元件或特徵部件與另一(些)元件或特徵部件的關係,可使用空間相關用語,例如「在...之下」、「下方」、「下部」、「上方」、「上部」及諸如此類用語。除了圖示所繪示之方位外,空間相關用語亦涵蓋使用或操作中之裝置的不同方位。當裝置被轉向不同方位時(例如,旋轉90度或者其他方位),則其中所使用的空間相關形容詞亦將依轉向後的方位來解釋。Furthermore, for convenience in describing the relationship of one element or feature to another element or feature(s) in the figures, spatially relative terms such as "under", "under", "under" may be used , "above," "above," and similar terms. In addition to the orientation shown in the figures, spatially relative terms also encompass different orientations of the device in use or operation. When the device is turned in a different orientation (eg, rotated 90 degrees or otherwise), the spatially relative adjectives used therein will also be interpreted according to the turned orientation.

本文所使用的術語「基本上」可以表示一給定量的值在例如目標狀態或數值(或預期狀態或數值)的±5%之內變化。As used herein, the term "substantially" may mean that a given amount of value varies within ±5% of, for example, a target state or value (or an expected state or value).

隨著觸控面板產業的高度成長,對於觸控感測模組的需求大幅增加。由於金屬具有成本較低、阻抗較低、可撓性較佳等優勢,經常使用於觸控感測模組中作為電性訊號傳輸的導線。為了在觸控感測模組中電性訊號傳輸的穩定性,需產生高品質的導線,並且藉由圖案化過程中降低導線間距以提高觸控感測模組內的導線面積。因此,本發明的實施方式提供一種觸控感測模組與形成此觸控感測模組的方法。With the high growth of the touch panel industry, the demand for touch sensing modules has increased significantly. Due to the advantages of lower cost, lower impedance, and better flexibility, metal is often used as a wire for electrical signal transmission in touch sensing modules. In order to stabilize the electrical signal transmission in the touch sensing module, high-quality wires need to be produced, and the wire area in the touch sensing module can be increased by reducing the wire spacing during the patterning process. Therefore, embodiments of the present invention provide a touch sensing module and a method for forming the touch sensing module.

參見第1圖,繪示出觸控面板100內的簡化結構,其中包含顯示模組102、保護蓋板106、以及介於顯示模組102和保護蓋板106之間的觸控感測模組104。在一些實施例中,顯示模組102可包括液晶顯示面板。在另一些實施例中,顯示模組102可包括發光二極體(light emitting diode, LED)顯示面板或有機發光二極體(organic light emitting diode, OLED)顯示面板。在一些實施例中,保護蓋板106具有保護作用。在一些實施例中,當保護蓋板106上有導電物體(例如,手指)觸摸時,觸控感測模組104中的電容耦合發生差異而產生訊號,電容感應訊號經處理後,便可計算出導電物體觸摸的相對位置。Referring to FIG. 1 , a simplified structure of the touch panel 100 is shown, which includes a display module 102 , a protective cover 106 , and a touch sensing module between the display module 102 and the protective cover 106 104. In some embodiments, the display module 102 may include a liquid crystal display panel. In other embodiments, the display module 102 may include a light emitting diode (LED) display panel or an organic light emitting diode (OLED) display panel. In some embodiments, the protective cover 106 has a protective function. In some embodiments, when a conductive object (eg, a finger) touches the protective cover 106 , the capacitive coupling in the touch sensing module 104 is different to generate a signal, and the capacitive sensing signal can be calculated after being processed. Shows the relative position of the touch of the conductive object.

參見第2A圖,其為根據本發明的一些實施例而繪示的觸控感測模組104之簡化截面圖,其呈現的單層為簡化結構僅作為範例而非限制。在一些實施例中,觸控感測模組104包括基板200,其中基板200包括感測電極區R1與周邊線路區R2。感測電極區R1設置位置為觸控感測模組104的操作範圍,即導電物體(例如,手指)靠近時,電容耦合發生差異而產生訊號之範圍。周圍線路區R2設置於感測電極區R1之邊緣,感測電極區R1產生的訊號可藉由周邊線路區R2進行電性訊號之傳輸。Referring to FIG. 2A , which is a simplified cross-sectional view of the touch sensing module 104 according to some embodiments of the present invention, the single layer presented is a simplified structure only as an example and not a limitation. In some embodiments, the touch sensing module 104 includes a substrate 200, wherein the substrate 200 includes a sensing electrode region R1 and a peripheral circuit region R2. The setting position of the sensing electrode region R1 is the operating range of the touch sensing module 104 , that is, the range where the capacitive coupling is different to generate a signal when a conductive object (eg, a finger) approaches. The peripheral circuit area R2 is disposed on the edge of the sensing electrode area R1, and the signal generated by the sensing electrode area R1 can transmit electrical signals through the peripheral circuit area R2.

繼續參見第2A圖,觸控感測模組104包括設置在感測電極區R1的導線結構202、設置在感測電極區R1的導線結構202上的保護層204、以及設置在周邊線路區R2的導線結構206。設置在感測電極區R1的導線結構202和以及設置在周邊線路區R2的導線結構206設置於基板200上。保護層204僅分布在感測電極區R1的導線結構202上。保護層204與感測電極區R1的導線結構202是藉由相同的圖案化製程製作,而使保護層204具有與感測電極區R1的導線結構202相應的圖案。Continuing to refer to FIG. 2A, the touch sensing module 104 includes a wire structure 202 disposed in the sensing electrode region R1, a protective layer 204 disposed on the wire structure 202 in the sensing electrode region R1, and a peripheral circuit region R2 The wire structure 206 . The wire structures 202 disposed in the sensing electrode region R1 and the wire structures 206 disposed in the peripheral circuit region R2 are disposed on the substrate 200 . The protective layer 204 is only distributed on the wire structure 202 of the sensing electrode region R1. The protective layer 204 and the wire structure 202 of the sensing electrode region R1 are fabricated by the same patterning process, so that the protective layer 204 has a pattern corresponding to the wire structure 202 of the sensing electrode region R1.

參見第2B圖,其為根據本發明的另一些實施例而繪示的觸控感測模組104之簡化截面圖,呈現單層為簡化之結構僅作範例而非限制。在一些實施例中,觸控感測模組104包括基板200,其中基板200包括感測電極區R1與周邊線路區R2。觸控感測模組104包括設置在感測電極區R1的導線結構202、設置在感測電極區R1的導線結構202上的保護層204、設置在周邊線路區R2的導線結構206、以及設置在周邊線路區R2的導線結構206上的保護層208。設置在感測電極區R1的導線結構202和設置在周邊線路區R2的導線結構206設置於基板200上。保護層204與感測電極區R1的導線結構202是藉由相同的圖案化製程製作,而使保護層204具有與感測電極區R1的導線結構202相應的圖案。保護層208與周邊線路區R2的導線結構206是藉由相同的圖案化製程製作,而使保護層208具有與周邊線路區R2的導線結構206相應的圖案。Referring to FIG. 2B , which is a simplified cross-sectional view of the touch sensing module 104 according to other embodiments of the present invention, the single-layer structure is shown for simplicity only as an example and not a limitation. In some embodiments, the touch sensing module 104 includes a substrate 200, wherein the substrate 200 includes a sensing electrode region R1 and a peripheral circuit region R2. The touch sensing module 104 includes a wire structure 202 disposed in the sensing electrode region R1, a protective layer 204 disposed on the wire structure 202 in the sensing electrode region R1, a wire structure 206 disposed in the peripheral circuit region R2, and The protective layer 208 on the wire structure 206 in the peripheral circuit region R2. The wire structures 202 disposed in the sensing electrode region R1 and the wire structures 206 disposed in the peripheral circuit region R2 are disposed on the substrate 200 . The protective layer 204 and the wire structure 202 of the sensing electrode region R1 are fabricated by the same patterning process, so that the protective layer 204 has a pattern corresponding to the wire structure 202 of the sensing electrode region R1. The protective layer 208 and the conductive structure 206 of the peripheral circuit region R2 are fabricated by the same patterning process, so that the protective layer 208 has a pattern corresponding to the conductive structure 206 of the peripheral circuit region R2.

第2A圖與第2B圖亦可為雙層結構(在此未繪出),例如,操作相似的製程在基板200的另一側形成感測電極區的導線結構、周邊線路區的導線結構、和導線結構上的保護層。其中保護層可以僅設置在感測電極區的導線結構上、或是保護層可以同時設置在感測電極區的導線結構上和周邊線路區的導線結構上。保護層因藉由相同的圖案化製程而具有與導線結構相同的圖案。2A and 2B can also be a double-layer structure (not shown here). and protective layer on the conductor structure. The protective layer may be disposed only on the wire structure of the sensing electrode area, or the protective layer may be disposed on the wire structure of the sensing electrode area and the wire structure of the peripheral circuit area at the same time. The protective layer has the same pattern as the wire structure due to the same patterning process.

上述的導線結構可藉由圖案化感測電極區及/或周邊線路區的金屬層而達成,其中圖案化的方法包括曝光顯影、遮罩、雷射、或是其他合適的技術。舉例來說,曝光顯影製程中,將光阻塗佈至金屬層上經黃光製程後,以蝕刻液除去空白區而留下導線,然而製程過程中會產生大量的廢液。另一例子中,遮罩的技術是將定義為導線的部分於遮罩中鏤空,接者,依照遮罩的鏤空部分在基板上鍍出導線,然而製程後遮罩上會殘留金屬需以藥劑清潔。在另一例子中,使用雷射蝕刻導電層的空白區而留下導線,過程中不會產生大量廢液,並且雷射圖案化製程相對於曝光顯影圖案化製程,具有高方向性和高功率之特性,易於簡化製程操作。然而雷射過程中的熔渣可能會附著在導線上而導致汙染,影響導線加工品質。因此,本發明的實施方式提供一種觸控感測模組104的裝置與形成此觸控感測模組104的方法,尤其是使用雷射圖案化製程形成的導線之結構與其方法。The above-mentioned wire structure can be achieved by patterning the metal layer of the sensing electrode region and/or the peripheral circuit region, wherein the patterning method includes exposure and development, masking, laser, or other suitable techniques. For example, in the exposure and development process, after the photoresist is coated on the metal layer and subjected to the yellow light process, the blank area is removed with an etching solution to leave the wires. However, a large amount of waste liquid is generated during the process. In another example, the mask technology is to hollow out the part defined as the wire in the mask. Then, according to the hollow part of the mask, the wire is plated on the substrate. However, after the process, there will be residual metal on the mask, which needs to be treated with chemicals. clean. In another example, using a laser to etch the blank areas of the conductive layer to leave wires, a large amount of waste liquid will not be generated during the process, and the laser patterning process has high directionality and high power compared to the exposure and development patterning process. It is easy to simplify the process operation. However, the slag in the laser process may adhere to the wire and cause contamination, which affects the processing quality of the wire. Therefore, the embodiments of the present invention provide an apparatus for the touch sensing module 104 and a method for forming the touch sensing module 104 , especially a structure and method of wires formed by a laser patterning process.

第3圖至第7圖繪示了形成觸控感測模組104的方法的各製程階段之簡化截面圖,其圖式呈現的製程順序僅為示例,並且不意圖限制本發明。再者,形成觸控感測模組104的各製程階段之間可能有其他的製程操作,為了簡化說明的目的,可能會將其他的製程操作的說明省略。同樣地,在圖式中,除了本發明提及之裝置或系統,亦可能包括其他裝置或系統。為了簡化說明,以上裝置或系統在第3圖至第7圖中未繪出。FIGS. 3 to 7 are simplified cross-sectional views of various process stages of the method of forming the touch sensing module 104 , and the process sequences presented in the figures are merely examples and are not intended to limit the present invention. Furthermore, there may be other process operations between the various process stages of forming the touch sensing module 104 , and for the purpose of simplifying the description, the description of the other process operations may be omitted. Likewise, in the drawings, in addition to the devices or systems mentioned in the present invention, other devices or systems may also be included. To simplify the description, the above devices or systems are not shown in FIGS. 3 to 7 .

第3圖至第7圖所示的流程圖不限於應用在如第2A圖和第2B圖所示的設置在感測電極區R1的導線結構202以及設置在周邊線路區R2的導線結構206。換言之,只要藉由圖案化金屬層而製成的結構皆適用以第3圖至第7圖所製作。The flowcharts shown in FIGS. 3 to 7 are not limited to be applied to the wire structures 202 disposed in the sensing electrode region R1 and the wire structures 206 disposed in the peripheral circuit region R2 as shown in FIGS. 2A and 2B . In other words, as long as the structure is made by patterning the metal layer, it is suitable to be made with the third to the seventh drawings.

參見第3圖,繪示了觸控感測模組104的其中一個製程階段的簡化截面圖:在基板300上依序形成金屬層302A和保護層304A,其中保護層304A覆蓋金屬層302A的暴露出的表面,例如上表面及/或側表面。基板300包括透光性的玻璃基板、透光塑膠薄膜、金屬基板、或其他合適的材料。作為範例而非限制,透光塑膠薄膜的材料可包括聚乙烯對苯二甲酸甲酯(polyethylene terephthalate, PET)、聚醯亞胺(polyimide, PI)、聚甲基丙烯酸甲酯(Polymethylmethacrylate, PMMA)、聚碳酸酯(Polycarbonate, PC)、三醋酸纖維素(Triacetate cellulose, TAC)、或聚對萘二甲酸乙二酯(polyethylene naphthalate, PEN)。在一些實施例中,基板300的厚度為50µm至125µm,例如為60µm、70µm、80µm、90µm、100µm、110µm、或120µm。Referring to FIG. 3, a simplified cross-sectional view of one of the process stages of the touch sensing module 104 is shown: a metal layer 302A and a protective layer 304A are sequentially formed on the substrate 300, wherein the protective layer 304A covers the exposed metal layer 302A external surfaces, such as the top and/or side surfaces. The substrate 300 includes a transparent glass substrate, a transparent plastic film, a metal substrate, or other suitable materials. As an example and not a limitation, the material of the light-transmitting plastic film may include polyethylene terephthalate (PET), polyimide (PI), polymethylmethacrylate (PMMA) , Polycarbonate (PC), Triacetate cellulose (TAC), or polyethylene naphthalate (PEN). In some embodiments, the thickness of the substrate 300 is 50µm to 125µm, such as 60µm, 70µm, 80µm, 90µm, 100µm, 110µm, or 120µm.

金屬層302A材料可能包括金、銀、鋁、銅、鎢、鐵、錫、鉑、其他具有導電性質的材料、或上述之任意組合。在一些實施例中,金屬層302A的材料可為銅。在一些實施例中,金屬層302A可為奈米銅層。在一些實施例中,形成金屬層302A至基板300上的技術可包括濺鍍(sputter)、物理氣相沉積(physical vapor deposition, PVD)、化學氣相沉積(chemical vapor deposition, CVD)、其他合適的技術、或上述技術之任意組合。在一些其他的實施例中,金屬層302可使用網印技術而形成。並且,在一些實施例中,金屬層302使用網印技術而形成之後,可以使用雷射圖案化製程進行加工。The material of the metal layer 302A may include gold, silver, aluminum, copper, tungsten, iron, tin, platinum, other materials with conductive properties, or any combination thereof. In some embodiments, the material of the metal layer 302A may be copper. In some embodiments, the metal layer 302A may be a nano-copper layer. In some embodiments, the technique of forming the metal layer 302A on the substrate 300 may include sputtering, physical vapor deposition (PVD), chemical vapor deposition (CVD), other suitable technology, or any combination of the above. In some other embodiments, the metal layer 302 may be formed using screen printing techniques. Also, in some embodiments, after the metal layer 302 is formed using a screen printing technique, a laser patterning process can be used for processing.

覆蓋金屬層302A的保護層304A具有疏水性。保護層304A的疏水性可能來自材料自身具有的疏水性、透過前處理產生疏水性、或是上述之組合。在一些實施例中,保護層304A的材料包括有機聚合物。在一些實施例中,保護層304A的材料進一步包括含有氟官能基的有機聚合物,舉例來說,四氟化碳(Tetrafluoromethane)、全氟辛烷磺酸(Perfluorooctanesulfonic acid, PFOS)、全氟異己烷(Perfluoro(2-methylpentane))、或全氟-1,3-二甲基環己烷(Perfluoro-1,3-dimethyl cyclohexane),這類的有機氟化合物混摻至有機聚合物中。應注意的是,有機氟化合物的選擇不限於此。在一些實施例中,保護層304A除了具有疏水性之外,保護層304A的材料可包括不含酸性化學物質之材料,即此材料可解離出的氫離子濃度小於1×10 -7體積莫耳濃度(mol/L)。因此在物理接觸金屬層302A時,保護層304A基本上不會對金屬層302A產生不良的影響(如,氧化)。並且,保護層304A亦可作為抗腐蝕層從而保護金屬層302A。 The protective layer 304A covering the metal layer 302A has hydrophobicity. The hydrophobicity of the protective layer 304A may come from the hydrophobicity of the material itself, the hydrophobicity generated by pretreatment, or a combination of the above. In some embodiments, the material of the protective layer 304A includes an organic polymer. In some embodiments, the material of the protective layer 304A further includes an organic polymer containing fluorine functional groups, for example, carbon tetrafluoromethane (Tetrafluoromethane), perfluorooctanesulfonic acid (PFOS), perfluoroisohexane Perfluoro(2-methylpentane), or Perfluoro-1,3-dimethyl cyclohexane (Perfluoro-1,3-dimethyl cyclohexane), such organofluorine compounds are incorporated into organic polymers. It should be noted that the selection of the organofluorine compound is not limited to this. In some embodiments, in addition to the protection layer 304A having hydrophobicity, the material of the protection layer 304A may include a material that does not contain acidic chemical substances, that is, the hydrogen ion concentration that can be dissociated from the material is less than 1×10 −7 vol moles Concentration (mol/L). Therefore, when physically contacting the metal layer 302A, the protective layer 304A will not substantially adversely affect (eg, oxidize) the metal layer 302A. In addition, the protective layer 304A can also serve as an anti-corrosion layer to protect the metal layer 302A.

在一實施例中,可使用前處理使保護層304A產生疏水性,此前處理製程可包括先沉積與金屬層302A相容之薄膜後(即,不會對金屬層302A產生不良的影響),接著對此薄膜進行材料處理以產生疏水效果,其中材料處理包括形成疏水材料在此薄膜上,此疏水材料自身具有疏水性質,但由於可能會對金屬層302A產生不良之影響或是與金屬層302A之間的黏著性不理想,因此需先形成薄膜在金屬層302A上,再形成疏水材料。在另一實施例中,可先沉積與金屬層302A相容之薄膜後(即,不會對金屬層302A產生不良的影響),接著對此薄膜進行雷射處理以產生疏水效果。在一實施例中,使用雷射處理以產生疏水效果包括使用高功率的高頻脈衝之雷射在薄膜表面形成細微結構的技術。In one embodiment, the protective layer 304A may be made hydrophobic using a pre-treatment, which may include first depositing a film compatible with the metal layer 302A (ie, without adversely affecting the metal layer 302A), and then The film is subjected to material treatment to produce a hydrophobic effect, wherein the material treatment includes forming a hydrophobic material on the film. The hydrophobic material itself has hydrophobic properties, but may have an adverse effect on the metal layer 302A or interact with the metal layer 302A. The adhesion between them is not ideal, so a thin film needs to be formed on the metal layer 302A first, and then the hydrophobic material is formed. In another embodiment, a film that is compatible with the metal layer 302A (ie, does not adversely affect the metal layer 302A) may be deposited first, and then the film may be laser processed to produce a hydrophobic effect. In one embodiment, the use of laser processing to produce the hydrophobic effect includes the use of high-power, high-frequency pulsed lasers to form microstructures on the surface of the film.

保護層304A的材料,在一些實施例中,可為液態材料。使用液態材料作為保護層304A時可能使用網印或是噴塗的技術使液態材料覆蓋在金屬層302A的整個表面,甚至同時覆蓋在基板300上。接著,對液態材料進行固化(curing)程序,固化的技術包括室溫濕氣固化、紫外線(ultraviolet, UV)固化、熱固化、其他合適的固化技術、或上述之組合。在另一些實施例中,保護層304A的材料為固態材料時,此固態材料可能為片狀材料。在一些實施例中,固態材料放置並黏附至金屬層302A的表面上。The material of the protective layer 304A, in some embodiments, may be a liquid material. When using the liquid material as the protective layer 304A, a screen printing or spraying technique may be used to cover the entire surface of the metal layer 302A with the liquid material, or even cover the substrate 300 at the same time. Next, a curing process is performed on the liquid material, and the curing technique includes room temperature moisture curing, ultraviolet (ultraviolet, UV) curing, thermal curing, other suitable curing techniques, or a combination thereof. In other embodiments, when the material of the protective layer 304A is a solid material, the solid material may be a sheet material. In some embodiments, solid state material is placed and adhered to the surface of metal layer 302A.

參見第4圖,繪示了觸控感測模組104的其中一個製程階段的簡化截面圖:使用雷射306在金屬層302A和保護層304A上進行圖案化製程。在一些實施例中,雷射306聚焦以確實切割金屬層302A而形成導線層302,同時亦將保護層304A形成了圖案化的保護層304。在一些實施例中,可使用脈衝式雷射306。一般而言,使用雷射306進行圖案化過程中,因高能量密度的雷射306連續照射在金屬層302A特定位置,使得位在此位置的金屬層302A之材料溫度升高並達到熔點或沸點,藉此除去位於此位置的金屬層302A之材料以達到切割和圖案化金屬層302A的功能。因此,雷射圖案化過程中可能會因高溫而產生異物308,例如熔渣,在保護層304A上。Referring to FIG. 4 , a simplified cross-sectional view of one of the process stages of the touch sensing module 104 is shown: a patterning process is performed on the metal layer 302A and the protective layer 304A using the laser 306 . In some embodiments, the laser 306 is focused to actually cut the metal layer 302A to form the conductive layer 302 , and at the same time, the protective layer 304A is also formed into a patterned protective layer 304 . In some embodiments, a pulsed laser 306 may be used. Generally speaking, during the patterning process using the laser 306, the high energy density laser 306 continuously irradiates a specific position of the metal layer 302A, so that the temperature of the material of the metal layer 302A at this position increases and reaches the melting point or boiling point , thereby removing the material of the metal layer 302A at this position to achieve the function of cutting and patterning the metal layer 302A. Therefore, foreign matter 308, such as slag, may be generated on the protective layer 304A due to high temperature during the laser patterning process.

參見第5圖,進行清潔步驟310除去殘留在保護層304上的異物308。由於保護層304的材料經過選擇或是進行前處理,已具有疏水性,使得異物308附著於保護層304上呈現弱黏性,易於除去。因此,在一些實施例中,清潔步驟310可使用水進行水洗除去異物308,再搭配氣體吹除異物308和乾燥觸控感測模組104,其中氣體可能是高壓氣體。Referring to FIG. 5 , a cleaning step 310 is performed to remove foreign matter 308 remaining on the protective layer 304 . Since the material of the protective layer 304 has been selected or pre-treated, it has hydrophobicity, so that the foreign matter 308 adheres to the protective layer 304 with weak viscosity and is easy to remove. Therefore, in some embodiments, the cleaning step 310 may be performed by washing with water to remove the foreign matter 308 , and then combined with a gas to remove the foreign matter 308 and dry the touch sensing module 104 , wherein the gas may be a high-pressure gas.

參見第6A圖,繪示了形成導線層302後的觸控感測模組104的簡化截面圖。觸控感測模組104經過圖案化製程後,產生複數個斜面S。在一些實施例中,這些斜面S的延伸範圍包括保護層304和導線層302。第6A圖中虛線方框圈選處為局部放大M,繪示於第6B圖。Referring to FIG. 6A , a simplified cross-sectional view of the touch sensing module 104 after the conductive layer 302 is formed is shown. After the touch sensing module 104 is subjected to a patterning process, a plurality of slopes S are generated. In some embodiments, the extension of these slopes S includes the protective layer 304 and the wire layer 302 . The part encircled by the dotted box in Fig. 6A is a partial enlargement M, which is shown in Fig. 6B.

參見第6B圖,觸控感測模組104的斜面S可以進一步分類成位於導線層302的第一斜面S1以及位於保護層304的第二斜面S2。由於位於導線層302的第一斜面S1和位於保護層304的第二斜面S2是藉由相同的雷射圖案化製程而同時形成,因此位於導線層302的第一斜面S1和位於保護層304的第二斜面S2兩者呈現為連續的斜面且具有相同的斜率。導線層302的第一上表面U1具有邊緣A與邊緣A’,保護層304的第二上表面U2具有邊緣B與邊緣B’。在雷射圖案化製程中,由於雷射306能量呈現高斯分佈,保護層304可以吸收雷射306大部分的能量,僅位在雷射306中心的較高能量的雷射306可穿透保護層304和導線層302,使得導線層302上的邊緣A到邊緣A’的距離S A-A’小於保護層304上的邊緣B到邊緣B’的距離S B-B’。如此一來,雷射圖案化可在導線層302產生寬度較小的切割道,藉此增加導線可利用的面積,例如第一上表面U1的長度。 Referring to FIG. 6B , the slope S of the touch sensing module 104 can be further classified into a first slope S1 located on the wire layer 302 and a second slope S2 located on the protective layer 304 . Since the first slope S1 on the wire layer 302 and the second slope S2 on the protective layer 304 are simultaneously formed by the same laser patterning process, the first slope S1 on the wire layer 302 and the second slope S2 on the protective layer 304 are formed simultaneously by the same laser patterning process. Both the second slopes S2 appear as continuous slopes and have the same slope. The first upper surface U1 of the wire layer 302 has an edge A and an edge A', and the second upper surface U2 of the protective layer 304 has an edge B and an edge B'. In the laser patterning process, since the energy of the laser 306 exhibits a Gaussian distribution, the protective layer 304 can absorb most of the energy of the laser 306 , and only the higher-energy laser 306 located in the center of the laser 306 can penetrate the protective layer 304 and the wire layer 302, so that the distance S A-A' from the edge A to the edge A' on the wire layer 302 is smaller than the distance S B-B' from the edge B to the edge B' on the protective layer 304. In this way, the laser patterning can generate scribe lines with smaller widths on the wire layer 302 , thereby increasing the area available for the wires, such as the length of the first upper surface U1 .

除此之外,保護層304可吸收雷射306的部分能量,從而避免雷射圖案化製程對基板的造成過度切割。在一些實施例中,經過雷射圖案化製程之後,基板300上沒有雷射圖案化製程產生之切割,意即這些斜面S終止於基板表面,此為理想之態樣。在一些實施例中,為確保導線層302中相鄰的導線確實地分離以避免短路之情形,基板300上可能有雷射圖案化製程產生之切割,意即這些斜面S的延伸範圍包括保護層304、導線層302和部分基板300,其中這些斜面S延伸至基板300的深度應小於基板300約10%厚度,以避免影響觸控感測模組104之功能。In addition, the protective layer 304 can absorb part of the energy of the laser 306, so as to avoid excessive cutting of the substrate caused by the laser patterning process. In some embodiments, after the laser patterning process, there is no cutting on the substrate 300 caused by the laser patterning process, which means that the sloped surfaces S terminate on the substrate surface, which is ideal. In some embodiments, in order to ensure that the adjacent wires in the wire layer 302 are reliably separated to avoid short circuit, there may be cuts on the substrate 300 caused by the laser patterning process, which means that the extension of the slopes S includes the protective layer 304 , the wire layer 302 and part of the substrate 300 , wherein the depth of the slopes S extending to the substrate 300 should be less than about 10% of the thickness of the substrate 300 to avoid affecting the function of the touch sensing module 104 .

雷射圖案化過程中除了可能會因高溫而產生異物308之外,使用雷射圖案化製程亦可能使圖案化的標的材料產生一些缺陷(如,火山口缺陷)。在一些實施例中,雷射圖案化製程後保護層304的第二上表面U2無法維持原先平行基板300的平整度,例如形成突出物312在保護層304上,更準確地說,形成突出物312在保護層304的第二上表面U2並且靠近邊緣B和B’,如第6B圖所繪示。然而,在一些實施例中,保護層304發揮緩衝的作用,使雷射圖案化製程產生的缺陷發生保護層304的第二上表面U2並且靠近邊緣B和B’,並保持導線層302的第一上表面U1呈現大致上平行於基板300的平面之狀態,更準確地說,導線層302的第一上表面U1並且靠近邊緣A和A’仍可基本上保持原本平行於基板300的平整度。導線層302的第一上表面U1維持平整將有助於觸控感測模組104中電性訊號的穩定表現。In addition to the possibility of generating foreign objects 308 due to high temperature during the laser patterning process, some defects (eg, crater defects) may also be generated in the patterned target material using the laser patterning process. In some embodiments, after the laser patterning process, the second upper surface U2 of the protective layer 304 cannot maintain the flatness of the original parallel substrate 300 , for example, the protrusions 312 are formed on the protective layer 304 , more precisely, the protrusions are formed 312 is on the second upper surface U2 of the protective layer 304 and close to the edges B and B', as shown in FIG. 6B. However, in some embodiments, the protective layer 304 acts as a buffer, so that defects generated by the laser patterning process occur on the second upper surface U2 of the protective layer 304 and are close to the edges B and B′, and maintain the second upper surface U2 of the conductive layer 302 An upper surface U1 is substantially parallel to the plane of the substrate 300 . More precisely, the first upper surface U1 of the wire layer 302 and close to the edges A and A′ can still substantially maintain the flatness originally parallel to the substrate 300 . The flatness of the first upper surface U1 of the wire layer 302 will facilitate stable performance of electrical signals in the touch sensing module 104 .

參見第7圖,在觸控感測模組104上形成透明絕緣層314和保護蓋板316(即,第1圖的保護蓋板106),透明絕緣層314設置在介於觸控感測模組104與保護蓋板316之間,具有黏結的作用。在一些實施例中,透明絕緣層314的材料可以包括,但不限於,固態的光學透明膠(optical clear adhesive, OCA)、液態光學透明膠(liquid optical clear adhesive, LOCA)、或其他具有高透光率的膠黏劑,以免於影響顯示效果。透明絕緣層314覆蓋在觸控感測模組104上,並且接觸斜面S或部分接觸斜面S,意即透明絕緣層314接觸位於導線層302的第一斜面S1、位於保護層304的第二斜面S2、或上述之組合。Referring to FIG. 7 , a transparent insulating layer 314 and a protective cover 316 (ie, the protective cover 106 in FIG. 1 ) are formed on the touch sensing module 104 , and the transparent insulating layer 314 is disposed between the touch sensing mold The group 104 and the protective cover plate 316 have the function of bonding. In some embodiments, the material of the transparent insulating layer 314 may include, but is not limited to, solid optical clear adhesive (OCA), liquid optical clear adhesive (LOCA), or other materials with high transparency Light rate adhesive, so as not to affect the display effect. The transparent insulating layer 314 covers the touch sensing module 104 and contacts the slope S or a part of the slope S, which means that the transparent insulating layer 314 contacts the first slope S1 on the wire layer 302 and the second slope on the protective layer 304 S2, or a combination of the above.

在一些實施例中,保護蓋板316的材料可以為玻璃,作為範例而非限制,例如鈉玻璃、鋁矽酸玻璃、無鹼玻璃、或其他合適的玻璃材料。在另一些實施例中,保護蓋板316的材料可以為透明塑膠,或是其他任何具有一定透光度且可以對與其貼合的結構產生保護作用的材料。In some embodiments, the material of the protective cover plate 316 may be glass, by way of example and not limitation, such as soda glass, aluminosilicate glass, alkali-free glass, or other suitable glass materials. In other embodiments, the material of the protective cover plate 316 may be transparent plastic, or any other material that has a certain degree of light transmittance and can protect the structure attached thereto.

基於上述內容,形成在導線層上的保護層可以提供以下功能:(1)導線層的抗腐蝕層;(2)具有疏水性的保護層使附著於導線層上的異物呈現弱黏性,因此雷射圖案化製程所產生的異物(例如,熔渣)可經由水洗和氣體吹除的製程輕易除去;(3)雷射圖案化製程中,保護層吸收雷射大部分的能量,具有高能量的雷射中心能穿透至金屬層產生寬度較小的切割道,增加導線可利用的面積;(4)雷射圖案化製程中,保護層可避免雷射圖案化製程對基材產生過度切割;以及(5)保護層可做為緩衝層,使雷射圖案化製程產生的缺陷(如,火山口缺陷)發生於保護層上,導線層的上表面可保持平整,加工品質提升有助於電性表現。Based on the above, the protective layer formed on the wire layer can provide the following functions: (1) the anti-corrosion layer of the wire layer; (2) the protective layer with hydrophobicity makes the foreign matter attached to the wire layer show weak adhesion, so Foreign matter (for example, molten slag) generated in the laser patterning process can be easily removed by the process of water washing and gas blowing; (3) During the laser patterning process, the protective layer absorbs most of the energy of the laser and has high energy The center of the laser can penetrate into the metal layer to produce a smaller width of the dicing line, which increases the available area of the wire; (4) In the laser patterning process, the protective layer can prevent the laser patterning process from causing excessive cutting of the substrate ; and (5) the protective layer can be used as a buffer layer, so that defects (such as crater defects) generated by the laser patterning process occur on the protective layer, the upper surface of the wire layer can be kept flat, and the improvement of processing quality helps electrical performance.

以上概略說明了本發明數個實施例的特徵,使所屬技術領域內具有通常知識者對於本發明可更為容易理解。任何所屬技術領域內具有通常知識者應瞭解到本說明書可輕易作為其他結構或製程的變更或設計基礎,以進行相同於本發明實施例的目的及/或獲得相同的優點。任何所屬技術領域內具有通常知識者亦可理解與上述等同的結構並未脫離本發明之精神及保護範圍內,且可在不脫離本發明之精神及範圍內,可作更動、替代與修改。The features of several embodiments of the present invention are briefly described above, so that those skilled in the art can more easily understand the present invention. Anyone with ordinary knowledge in the art should understand that this specification can easily be used as a basis for modification or design of other structures or processes to achieve the same purpose and/or obtain the same advantages of the embodiments of the present invention. Anyone with ordinary knowledge in the technical field can also understand that the structures equivalent to the above do not depart from the spirit and protection scope of the present invention, and can make changes, substitutions and modifications without departing from the spirit and scope of the present invention.

100:觸控面板100: touch panel

102:顯示模組102: Display module

104:觸控感測模組104: Touch Sensing Module

106:保護蓋板106: Protective cover

200:基板200: Substrate

202:導線結構202: Wire Structure

204:保護層204: Protective Layer

206:導線結構206: Wire Structure

208:保護層208: Protective Layer

300:基板300: Substrate

302:導線層302: Conductor layer

302A:金屬層302A: Metal Layer

304:保護層304: Protective Layer

304A:保護層304A: Protective layer

306:雷射306: Laser

308:異物308: Foreign body

310:清潔步驟310: Cleaning Steps

312:突出物312: Overhang

314:透明絕緣層314: Transparent insulating layer

316:保護蓋板316: Protective cover

A:邊緣A: Edge

A’:邊緣A': edge

B:邊緣B: edge

B’:邊緣B': edge

M:局部放大M: Partial magnification

R1:感測電極區R1: Sensing electrode area

R2:周邊線路區R2: Peripheral line area

S:斜面S: Bevel

S1:第一斜面S1: The first slope

S2:第二斜面S2: Second slope

S A-A’:距離S A-A' : distance

S B-B’:距離S B-B' : distance

U1:第一上表面U1: first upper surface

U2:第二上表面U2: Second upper surface

閱讀以下實施方法時搭配附圖以清楚理解本發明的觀點。應注意的是,根據業界的標準做法,各種特徵並未按照比例繪製。事實上,為了能清楚地討論,各種特徵的尺寸可能任意地放大或縮小。 第1圖根據本發明的一些實施例而繪示的觸控面板之簡化示意圖。 第2A圖根據本發明的一些實施例而繪示的觸控感測模組之簡化截面圖。 第2B圖根據本發明的一些實施例而繪示的觸控感測模組之簡化截面圖。 第3圖根據本發明的一些實施例而繪示的形成觸控感測模組的方法的其中一製程階段之簡化截面圖。 第4圖根據本發明的一些實施例而繪示的形成觸控感測模組的方法的其中一製程階段之簡化截面圖。 第5圖根據本發明的一些實施例而繪示的形成觸控感測模組的方法的其中一製程階段之簡化截面圖。 第6A圖根據本發明的一些實施例而繪示的形成觸控感測模組的方法的其中一製程階段之簡化截面圖。 第6B圖繪示第6A圖之局部放大圖之簡化截面圖。 第7圖根據本發明的一些實施例而繪示的部分觸控面板之簡化截面圖。 The following embodiments are read in conjunction with the accompanying drawings for a clear understanding of the concepts of the present invention. It should be noted that, in accordance with standard industry practice, the various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily enlarged or reduced for clarity of discussion. FIG. 1 shows a simplified schematic diagram of a touch panel according to some embodiments of the present invention. FIG. 2A illustrates a simplified cross-sectional view of a touch sensing module according to some embodiments of the present invention. FIG. 2B illustrates a simplified cross-sectional view of a touch sensing module according to some embodiments of the present invention. FIG. 3 is a simplified cross-sectional view of one of the process stages of a method of forming a touch sensing module according to some embodiments of the present invention. FIG. 4 is a simplified cross-sectional view of one of the process stages of a method of forming a touch sensing module according to some embodiments of the present invention. 5 is a simplified cross-sectional view of one of the process stages of a method of forming a touch sensing module according to some embodiments of the present invention. 6A illustrates a simplified cross-sectional view of one of the process stages of a method of forming a touch sensing module according to some embodiments of the present invention. FIG. 6B shows a simplified cross-sectional view of the enlarged partial view of FIG. 6A. FIG. 7 is a simplified cross-sectional view of a portion of a touch panel according to some embodiments of the present invention.

國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic storage information (please note in the order of storage institution, date and number) none Foreign deposit information (please note in the order of deposit country, institution, date and number) none

104:觸控感測模組 104: Touch Sensing Module

300:基板 300: Substrate

302:導線層 302: Conductor layer

302A:金屬層 302A: Metal Layer

304:保護層 304: Protective Layer

304A:保護層 304A: Protective layer

306:雷射 306: Laser

308:異物 308: Foreign body

Claims (13)

一種形成觸控感測模組的方法,包括:形成一金屬層在一基板上;形成具有疏水性的一保護層在該金屬層上;藉由一雷射同時圖案化該保護層與該金屬層,以使圖案化後的該金屬層形成一導線層;以及在該雷射圖案化後,清潔該保護層。 A method of forming a touch sensing module, comprising: forming a metal layer on a substrate; forming a protective layer with hydrophobicity on the metal layer; patterning the protective layer and the metal simultaneously by a laser layer, so that the patterned metal layer forms a wire layer; and after the laser patterning, cleaning the protective layer. 如請求項1所述之形成觸控感測模組的方法,其中形成具有疏水性的該保護層包括使用一含氟官能基的有機聚合材料。 The method for forming a touch sensing module as claimed in claim 1, wherein forming the protective layer with hydrophobicity comprises using an organic polymer material containing a fluorine functional group. 如請求項1所述之形成觸控感測模組的方法,其中形成具有疏水性的該保護層包括使用一材料,其中該材料可解離出的氫離子濃度小於1×10-7體積莫耳濃度。 The method for forming a touch sensing module as claimed in claim 1, wherein forming the protective layer having hydrophobicity comprises using a material, wherein the dissociable hydrogen ion concentration of the material is less than 1×10 -7 vol mol concentration. 如請求項1所述之形成觸控感測模組的方法,其中形成具有疏水性的該保護層包括形成具有疏水性的一液態材料在該金屬層上並且固化該液態材料在該金屬層上。 The method for forming a touch sensing module as claimed in claim 1, wherein forming the protective layer having hydrophobicity comprises forming a liquid material having hydrophobicity on the metal layer and curing the liquid material on the metal layer . 如請求項1所述之形成觸控感測模組的方法,其中形成具有疏水性的該保護層包括形成具有疏水性的一固態材料在該金屬層上。 The method for forming a touch sensing module as claimed in claim 1, wherein forming the protective layer with hydrophobicity comprises forming a solid material with hydrophobicity on the metal layer. 如請求項1所述之形成觸控感測模組的方法,其中形成具有疏水性的該保護層包括在該保護層進行一疏水性前處理。 The method for forming a touch sensing module according to claim 1, wherein forming the protective layer with hydrophobicity includes performing a hydrophobic pretreatment on the protective layer. 如請求項1所述之形成觸控感測模組的方法,其中該雷射圖案化該保護層與該金屬層包括圖案化一感測電極區的該保護層和該金屬層、圖案化一周邊線路區的該保護層和該金屬層、或圖案化上述位置之組合的該保護層和該金屬層。 The method for forming a touch sensing module as claimed in claim 1, wherein the laser patterning the protective layer and the metal layer comprises patterning the protective layer and the metal layer in a sensing electrode region, patterning a The protective layer and the metal layer in the peripheral circuit area, or the protective layer and the metal layer of the combination of the above-mentioned positions are patterned. 如請求項1所述之形成觸控感測模組的方法,其中清潔該保護層包括使用水和氣體清潔該保護層。 The method for forming a touch sensing module as claimed in claim 1, wherein cleaning the protective layer comprises cleaning the protective layer with water and gas. 一種觸控感測模組,包括:一基板;一導線層,位於該基板上,包括:複數個第一斜面;以及複數個第一上表面,相連於該些第一斜面;以及一保護層,位於該導線層上,包括:複數個第二斜面,其中該些第一斜面與該些第二斜面為藉由同一圖案化製程同時形成,使得該些第二斜面與該些第一斜面為一連續的斜面;以及複數個第二上表面,相連於該些第二斜面。 A touch sensing module includes: a substrate; a wire layer on the substrate, comprising: a plurality of first slopes; and a plurality of first upper surfaces connected to the first slopes; and a protective layer , located on the wire layer, comprising: a plurality of second slopes, wherein the first slopes and the second slopes are simultaneously formed by the same patterning process, so that the second slopes and the first slopes are a continuous inclined surface; and a plurality of second upper surfaces connected to the second inclined surfaces. 如請求項9所述之觸控感測模組,其中該保護層包括一疏水性材料。 The touch sensing module of claim 9, wherein the protective layer comprises a hydrophobic material. 如請求項9所述之觸控感測模組,其中該導線層包括位在一感測電極區的該導線層、位在一周邊線路區的該導線層、或位在上述位置之組合的該導線層。 The touch sensing module of claim 9, wherein the wire layer comprises the wire layer located in a sensing electrode area, the wire layer located in a peripheral circuit area, or a combination of the above-mentioned positions the wire layer. 如請求項9所述之觸控感測模組,其中該些第一上表面實質上為平行於該基板的一平面。 The touch sensing module of claim 9, wherein the first upper surfaces are substantially a plane parallel to the substrate. 如請求項9所述之觸控感測模組,進一步包括複數個突出物,位於該保護層的該些第二上表面上。The touch sensing module as claimed in claim 9, further comprising a plurality of protrusions located on the second upper surfaces of the protective layer.
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