TWI747262B - Notebook computer, vapor chamber device and method for fabricating the vapor chamber device - Google Patents

Notebook computer, vapor chamber device and method for fabricating the vapor chamber device Download PDF

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TWI747262B
TWI747262B TW109114405A TW109114405A TWI747262B TW I747262 B TWI747262 B TW I747262B TW 109114405 A TW109114405 A TW 109114405A TW 109114405 A TW109114405 A TW 109114405A TW I747262 B TWI747262 B TW I747262B
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metal
layer
velvet
fine
cavities
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TW202142995A (en
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雷永振
吳韋德
陳昌毅
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永善精密股份有限公司
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本發明係揭露一種筆記型電腦、均溫板裝置及其製作方法,首先提供一下殼板,其具有一蒸發區與一冷凝區,並形成一第一金屬絲絨毛細層於下殼板上,以覆蓋蒸發區與冷凝區,再形成金屬粉末於蒸發區之正上方的第一金屬絲絨毛細層中,接著,形成一第二金屬絲絨毛細層於第一金屬絲絨毛細層上。對金屬粉末與二金屬絲絨毛細層進行高溫燒結,以固定金屬粉末與金屬絲絨毛細層。最後提供一上殼板,其底部往下延伸以形成支撐柱,並利用支撐柱固定於第二金屬絲絨毛細層上,以完成均溫板裝置,且可將此整合於薄型筆記型電腦中,以增加其散熱效率。 The present invention discloses a notebook computer, a uniform temperature board device and a manufacturing method thereof. First, a lower shell is provided, which has an evaporation zone and a condensation zone, and forms a first fine layer of metal wool on the lower shell to Cover the evaporation zone and the condensation zone, and then form metal powder in the first fine metal velvet layer directly above the evaporation region, and then form a second fine metal velvet layer on the first fine metal velvet layer. High-temperature sintering is performed on the metal powder and the fine layer of metal wool to fix the metal powder and the fine layer of metal wool. Finally, an upper shell plate is provided, the bottom of which extends downward to form a supporting column, and the supporting column is fixed on the second metal velvet fine layer to complete the uniform temperature plate device, and this can be integrated into a thin notebook computer. To increase its heat dissipation efficiency.

Description

筆記型電腦、均溫板裝置及其製作方法 Notebook computer, uniform temperature board device and manufacturing method thereof

本發明係關於一種筆記型電腦及其均溫板製作技術,且特別關於一種筆記型電腦、均溫板裝置及其製作方法。 The present invention relates to a notebook computer and its uniform temperature board manufacturing technology, and particularly to a notebook computer, a uniform temperature board device and a manufacturing method thereof.

目前,均溫板(Vapor chamber)屬於一種板狀熱管,其原理與熱管(Heat pipe)相同,均通過內部真空的環境,使注入其內部的工作流體(working fluid)可因遇熱而產生液汽相變化,進而以蒸汽傳遞熱量,再因遇冷而回復成液態後以回流循環。 At present, the Vapor chamber is a kind of plate-shaped heat pipe. Its principle is the same as that of a heat pipe. It passes through the internal vacuum environment, so that the working fluid injected into it can generate liquid due to heat. The vapor phase changes, and then the heat is transferred by the vapor, and then it returns to a liquid state due to the cold, and then circulates in a reflux.

然而,均溫板與熱管在製造上卻不盡相同。熱管的管體通常呈管狀,管體可先封閉一端後,再通過開放的另一端來進行如注入工作流體、除氣或真空化等作業,在除氣完成的瞬間,立刻封閉管體,即可完成熱管的製作。但是,均溫板的板體呈板狀,且通常由上、下相蓋合的兩個蓋板所組成,故其成型後為板狀,而非管狀;且均溫板利用其上、下具較大表面積的兩個板面,分別作為受熱端與冷凝端,故均溫板在使用時呈平躺狀態,工作流體並被其內壁上的毛細組織(wick structure)所吸附而聚集在其內部底部處。如此狀況下,再加上均溫板多利用其受熱端中央部位貼附發熱源,而其受熱端、冷凝端的毛細結構並不能有效使工作流體快速汽化,因此影響了熱傳遞效果。此外,在高瓦數散熱之筆記型電腦中,例如是75瓦以上規格的筆記型電腦,因為內部機構設 計考量,冷凝端和受熱端距離較遠,並在通道中需留螺絲孔位以便和晶片固定,且冷凝端之寬度需小於30毫米(mm),使用發熱的元件較多,冷凝效果也比較好,導致冷凝端回水不容易,所以必須使用散熱效果較佳的散熱裝置,以維持筆記型電腦的運作效能。雖然熱管的散熱效能不錯,但熱管較厚,並不符合筆記型電腦在輕薄上的需求。若使用現有的均溫板,為了增加更大的毛細梯度,則必須使用更厚的毛細結構,但此種方式亦不符合筆記型電腦在輕薄上的需求,同時還會增加成本與製程。舉例來說,對150瓦的筆記型電腦而言,其冷凝區之寬度約70-75mm,熱源中心和冷凝區末端傳輸距離可能超過150mm以上,均溫板須能充分用到冷凝區寬度才有有效散熱,但常因毛細力不夠無法成功回水,所以只能使用到一半距離,代表解熱能力只能到50%,故需要提升毛細結構之厚度。 However, the uniform temperature plate and the heat pipe are different in manufacturing. The tube body of the heat pipe is usually tubular. The tube body can be closed at one end, and then the other end is opened to perform operations such as injecting working fluid, degassing or vacuuming. When the degassing is completed, the tube body is immediately closed, that is The production of heat pipes can be completed. However, the plate body of the uniform temperature plate is plate-shaped and usually consists of two cover plates covering the upper and lower sides. Therefore, it is formed into a plate shape instead of a tube; and the uniform temperature plate uses its upper and lower cover plates. The two plates with a larger surface area are respectively used as the heating end and the condensation end. Therefore, the uniform temperature plate is in a flat state when in use, and the working fluid is absorbed by the wick structure on its inner wall and gathers on it. At the bottom of its interior. In this situation, the heat equalizing plate mostly uses the central part of the heated end to attach the heat source, and the capillary structure of the heated end and the condensing end cannot effectively vaporize the working fluid, thus affecting the heat transfer effect. In addition, among the notebook computers with high wattage heat dissipation, such as notebook computers with specifications above 75 watts, because of the internal mechanism Considering that the distance between the condensing end and the heating end is relatively long, and screw holes are required in the channel for fixing with the chip, and the width of the condensing end should be less than 30 millimeters (mm), more heating elements are used, and the condensing effect is also relatively good. Good, it is not easy for the condensation end to return water, so a heat sink with better heat dissipation effect must be used to maintain the operating performance of the notebook computer. Although the heat dissipation performance of the heat pipe is good, the heat pipe is thicker, which does not meet the needs of thin and light notebook computers. If the existing temperature equalizing plate is used, in order to increase the capillary gradient, a thicker capillary structure must be used. However, this method does not meet the needs of thin and light notebook computers, and will increase the cost and manufacturing process. For example, for a 150-watt laptop, the width of the condensing zone is about 70-75mm, and the transmission distance between the center of the heat source and the end of the condensing zone may exceed 150mm. Effective heat dissipation, but often because of insufficient capillary force to successfully return water, it can only be used up to half the distance, which means that the heat dissipation capacity can only reach 50%, so the thickness of the capillary structure needs to be increased.

因此,本發明係在針對上述的困擾,提出一種筆記型電腦、均溫板裝置及其製作方法,以解決習知所產生的問題。 Therefore, the present invention aims at solving the above-mentioned problems and proposes a notebook computer, a uniform temperature plate device and a manufacturing method thereof, so as to solve the problems caused by the prior art.

本發明提供一種筆記型電腦、均溫板裝置及其製作方法,其係增加毛細梯度,進而增進散熱效率。 The invention provides a notebook computer, a temperature equalizing plate device and a manufacturing method thereof, which increase the capillary gradient, thereby improving the heat dissipation efficiency.

本發明提供一種筆記型電腦,其包含一主機板、至少一處理器、至少一散熱鰭片、至少一散熱風扇與一均溫板裝置。處理器設於主機板上,散熱鰭片設於主機板上,並與處理器彼此相隔。散熱風扇設於主機板上,並對應散熱鰭片設置。均溫板裝置跨設於處理器與散熱鰭片上。均溫板裝置包含一下殼板、一第一金屬絲絨毛細層、複數個金屬粉末、一第二金屬絲絨毛細層與一上殼板。下殼板具有一蒸發區與一冷凝區,蒸發區設於處理器上,冷凝區設於散熱鰭片上。第一金屬絲絨毛細層設於下殼板上,並覆蓋蒸發區與冷凝區,其中第一金屬絲絨毛細層具有複數個第一空洞。金屬粉末填入蒸發區之正上方的第一空洞中,其中 蒸發區之正上方的每一第一空洞之空間大於其對應之金屬粉末所佔之體積。第二金屬絲絨毛細層設於第一金屬絲絨毛細層上,其中第二金屬絲絨毛細層具有複數個第二空洞,且第二空洞之孔徑大於第一空洞之孔徑。上殼板之底部往下延伸以形成複數個支撐柱,並利用支撐柱固定於第二金屬絲絨毛細層上。 The present invention provides a notebook computer, which includes a motherboard, at least one processor, at least one heat dissipation fin, at least one heat dissipation fan, and a uniform temperature plate device. The processor is arranged on the motherboard, and the heat dissipation fins are arranged on the motherboard and are separated from the processor. The cooling fan is arranged on the motherboard and corresponding to the cooling fins. The uniform temperature board device is arranged across the processor and the heat dissipation fins. The uniform temperature plate device includes a lower shell plate, a first fine metal velvet layer, a plurality of metal powders, a second fine metal velvet layer and an upper shell plate. The lower shell plate has an evaporation zone and a condensation zone, the evaporation zone is arranged on the processor, and the condensation zone is arranged on the radiating fins. The first metal wool fine layer is arranged on the lower shell plate and covers the evaporation zone and the condensation zone, wherein the first metal wool fine layer has a plurality of first cavities. The metal powder is filled into the first cavity directly above the evaporation zone, where The space of each first cavity directly above the evaporation zone is larger than the volume occupied by its corresponding metal powder. The second metal velvet capillary layer is arranged on the first metal velvet capillary layer, wherein the second metal velvet capillary layer has a plurality of second cavities, and the aperture of the second cavity is larger than the aperture of the first cavity. The bottom of the upper shell plate extends downward to form a plurality of supporting pillars, and the supporting pillars are used to fix the second metal wool fine layer.

在本發明之一實施例中,下殼板更包含一邊緣區,邊緣區圍繞蒸發區與冷凝區,邊緣區往上延伸以形成一凸垣,凸垣圍繞第一金屬絲絨毛細層、金屬粉末、第二金屬絲絨毛細層與支撐柱,且上殼板固定於凸垣上。 In an embodiment of the present invention, the lower shell plate further includes an edge zone, the edge zone surrounds the evaporation zone and the condensation zone, the edge zone extends upward to form a convex wall, the convex wall surrounds the first fine metal velvet layer, metal powder , The second metal velvet fine layer and the supporting column, and the upper shell plate is fixed on the convex wall.

在本發明之一實施例中,第二空洞中填有親水性微結構。 In an embodiment of the present invention, the second cavity is filled with hydrophilic microstructures.

在本發明之一實施例中,第二空洞之密度小於第一空洞之密度。 In an embodiment of the present invention, the density of the second cavity is less than the density of the first cavity.

在本發明之一實施例中,金屬粉末之表面積為其對應之第一空洞之截面積的25-75%。 In an embodiment of the present invention, the surface area of the metal powder is 25-75% of the cross-sectional area of the corresponding first cavity.

在本發明之一實施例中,上殼板、下殼板、金屬粉末、支撐柱、第一金屬絲絨毛細層與第二金屬絲絨毛細層之材質皆為相同。 In an embodiment of the present invention, the materials of the upper shell plate, the lower shell plate, the metal powder, the supporting column, the first metal wool fine layer and the second metal wool fine layer are all the same.

在本發明之一實施例中,上殼板、下殼板、金屬粉末、支撐柱、第一金屬絲絨毛細層與第二金屬絲絨毛細層之材質皆為銅、合金銅或無氧銅。 In an embodiment of the present invention, the materials of the upper shell plate, the lower shell plate, the metal powder, the supporting column, the first metal velvet fine layer and the second metal velvet fine layer are all copper, alloy copper or oxygen-free copper.

在本發明之一實施例中,處理器之數量、散熱鰭片之數量與散熱風扇之數量皆為相同。 In an embodiment of the present invention, the number of processors, the number of cooling fins, and the number of cooling fans are all the same.

在本發明之一實施例中,處理器為中央處理器或圖形處理器。 In an embodiment of the present invention, the processor is a central processing unit or a graphics processing unit.

在本發明之一實施例中,筆記型電腦更包含一殼體,其係包覆主機板、處理器、散熱鰭片、散熱風扇與均溫板裝置。 In an embodiment of the present invention, the notebook computer further includes a casing that covers the motherboard, the processor, the heat dissipation fins, the heat dissipation fan and the uniform temperature plate device.

本發明亦提供一種均溫板裝置,其包含一下殼板、一第一金屬絲絨毛細層、複數個金屬粉末、一第二金屬絲絨毛細層與一上殼板。下殼板具有一蒸發區與一冷凝區,蒸發區設於處理器上,冷凝區設於散熱鰭片上。第一金屬絲絨毛細層設於下殼板上,並覆蓋蒸發區與冷凝區,其中第一金屬絲絨毛細層具有複數個第一空洞。金屬粉末填入蒸發區之正上方的第一空洞中,其中蒸發區之正上方的每一第一空洞之空間大於其對應之金屬粉末所佔之體積。第二金屬絲絨毛細層設於第一金屬絲絨毛細層上,其中第二金屬絲絨毛細層具有複數個第二空洞,且第二空洞之孔徑大於第一空洞之孔徑。上殼板之底部往下延伸以形成複數個支撐柱,並利用支撐柱固定於第二金屬絲絨毛細層上。 The present invention also provides a uniform temperature plate device, which includes a lower shell, a first fine layer of metal velvet, a plurality of metal powders, a second fine layer of velvet, and an upper shell. The lower shell plate has an evaporation zone and a condensation zone, the evaporation zone is arranged on the processor, and the condensation zone is arranged on the radiating fins. The first metal wool fine layer is arranged on the lower shell plate and covers the evaporation zone and the condensation zone, wherein the first metal wool fine layer has a plurality of first cavities. The metal powder is filled into the first cavity directly above the evaporation zone, and the space of each first cavity directly above the evaporation zone is larger than the volume occupied by the corresponding metal powder. The second metal velvet capillary layer is arranged on the first metal velvet capillary layer, wherein the second metal velvet capillary layer has a plurality of second cavities, and the aperture of the second cavity is larger than the aperture of the first cavity. The bottom of the upper shell plate extends downward to form a plurality of supporting pillars, and the supporting pillars are used to fix the second metal wool fine layer.

本發明又提供一種均溫板裝置之製作方法,其係包含下列步驟:提供一下殼板,其具有一蒸發區與一冷凝區,並形成一第一金屬絲絨毛細層於下殼板上,並利用第一金屬絲絨毛細層覆蓋蒸發區與冷凝區,其中第一金屬絲絨毛細層具有複數個第一空洞;形成複數個金屬粉末於蒸發區之正上方的第一空洞中,其中蒸發區之正上方的每一第一空洞之空間大於其對應之金屬粉末所佔之體積;形成一第二金屬絲絨毛細層於第一金屬絲絨毛細層上,其中第二金屬絲絨毛細層具有複數個第二空洞,且第二空洞之孔徑大於第一空洞之孔徑;對第一金屬絲絨毛細層、金屬粉末與第二金屬絲絨毛細層進行高溫燒結,以固定金屬粉末與第二金屬絲絨毛細層於第一金屬絲絨毛細層上;以及提供一上殼板,其底部往下延伸以形成複數個支撐柱,並利用支撐柱固定於第二金屬絲絨毛細層上。 The present invention also provides a method for manufacturing a uniform temperature plate device, which includes the following steps: providing a lower shell plate, which has an evaporation zone and a condensation zone, and forming a first fine layer of metal wool on the lower shell plate, and The evaporation zone and the condensation zone are covered by the first fine metal velvet layer, wherein the first fine metal velvet layer has a plurality of first cavities; a plurality of metal powders are formed in the first cavities directly above the evaporation zone, and the evaporation zone is directly above the evaporation zone. The space of each first cavity above is larger than the volume occupied by the corresponding metal powder; a second metal velvet capillary layer is formed on the first metal velvet capillary layer, wherein the second metal velvet capillary layer has a plurality of second cavities , And the pore size of the second cavity is larger than the pore size of the first cavity; high-temperature sintering of the first fine metal velvet layer, metal powder, and second fine metal velvet layer to fix the fine metal powder and the second fine metal velvet layer on the first metal On the velvet hair layer; and an upper shell plate is provided, the bottom of which extends downward to form a plurality of support columns, and the support columns are used to fix the second metal velvet layer.

在本發明之一實施例中,在形成金屬粉末於蒸發區之正上方的第一空洞中之步驟中,噴塗金屬粉末於蒸發區之正上方的第一空洞 中。 In one embodiment of the present invention, in the step of forming the metal powder in the first cavity directly above the evaporation zone, spraying the metal powder in the first cavity directly above the evaporation zone middle.

在本發明之一實施例中,在形成金屬粉末於蒸發區之正上方的第一空洞中之步驟中,利用一多孔性材料沾附金屬粉末,以轉印金屬粉末於蒸發區之正上方的第一空洞中。 In an embodiment of the present invention, in the step of forming the metal powder in the first cavity directly above the evaporation zone, a porous material is used to adhere the metal powder to transfer the metal powder directly above the evaporation zone In the first hole.

在本發明之一實施例中,第一金屬絲絨毛細層、金屬粉末與第二金屬絲絨毛細層以攝氏700-800度進行高溫燒結。 In an embodiment of the present invention, the first fine metal velvet layer, the metal powder, and the second fine metal velvet layer are sintered at a high temperature at 700-800 degrees Celsius.

在本發明之一實施例中,在固定金屬粉末與第二金屬絲絨毛細層於第一金屬絲絨毛細層上之步驟後,更包含下列步驟:在第一空洞中填滿易揮發性溶液,並藉此覆蓋金屬粉末;利用一多孔性材料沾附與易揮發性溶液不相溶之親水性溶凝膠(sol-gel),並將親水性溶凝膠塗布於第二空洞中;以及對易揮發性溶液與親水性溶凝膠進行高溫燒結,以揮發易揮發性溶液,並將親水性溶凝膠轉化為親水性微結構,接著再進行提供上殼板之步驟。 In an embodiment of the present invention, after the step of fixing the metal powder and the second metal velvet capillary layer on the first metal velvet capillary layer, the method further includes the following steps: filling the first cavity with a volatile solution, and To cover the metal powder; use a porous material to adhere to the hydrophilic sol-gel that is incompatible with the volatile solution, and coat the hydrophilic sol-gel in the second cavity; and The volatile solution and the hydrophilic hydrogel are sintered at a high temperature to volatilize the volatile solution, and the hydrophilic hydrogel is converted into a hydrophilic microstructure, and then the step of providing an upper shell plate is performed.

在本發明之一實施例中,易揮發性溶液與親水性溶凝膠以攝氏500-600度進行高溫燒結。 In an embodiment of the present invention, the volatile solution and the hydrophilic solvogel are sintered at a high temperature at 500-600 degrees Celsius.

在本發明之一實施例中,易揮發性溶液為酒精或丙酮。 In an embodiment of the present invention, the volatile solution is alcohol or acetone.

在本發明之一實施例中,親水性溶凝膠之成分為異丙醇基底氧化物(IPA-based oxide)。 In an embodiment of the present invention, the component of the hydrophilic lyogel is IPA-based oxide.

基於上述,本發明之實施例於金屬絲絨毛細層中填入金屬粉末與親水性微結構,同時設計金屬絲絨毛細層之上層具有大空洞,下層具有小空洞,以增加毛細梯度,進而增進散熱效率與有助於薄化筆記型電腦。 Based on the above, the embodiment of the present invention fills the metal velvet capillary layer with metal powder and hydrophilic microstructures, and at the same time, the metal velvet capillary layer is designed to have large cavities in the upper layer and small cavities in the lower layer to increase the capillary gradient and improve the heat dissipation efficiency. And help to thin the notebook computer.

茲為使 貴審查委員對本發明的結構特徵及所達成的功效更有進一步的瞭解與認識,謹佐以較佳的實施例圖及配合詳細的說明,說明如後: In order to enable your reviewers to have a better understanding and understanding of the structural features of the present invention and the effects achieved, I would like to provide a better embodiment diagram and detailed descriptions. The description is as follows:

10:均溫板裝置 10: Uniform temperature plate device

12:下殼板 12: Lower shell

122:蒸發區 122: Evaporation Zone

124:冷凝區 124: Condensation zone

126:邊緣區 126: fringe zone

128:凸垣 128: Protruding Wall

14:第一金屬絲絨毛細層 14: The first fine layer of metal velvet

142:第一空洞 142: The First Hole

16:金屬粉末 16: metal powder

18:第二金屬絲絨毛細層 18: The second fine layer of metal velvet

182:第二空洞 182: The Second Hole

20:上殼板 20: Upper shell

202:支撐柱 202: support column

22:親水性微結構 22: Hydrophilic microstructure

24:易揮發性溶液 24: Volatile solution

26:親水性溶凝膠 26: Hydrophilic solvogel

30:筆記型電腦 30: laptop

32:主機板 32: Motherboard

34:處理器 34: processor

36:散熱鰭片 36: cooling fins

38:散熱風扇 38: cooling fan

40:殼體 40: shell

第1圖為本發明之均溫板裝置之一實施例之立體圖。 Figure 1 is a perspective view of an embodiment of the uniform temperature plate device of the present invention.

第2圖為本發明之均溫板裝置之一實施例之分解圖。 Figure 2 is an exploded view of an embodiment of the uniform temperature plate device of the present invention.

第3圖為本發明之沿第1圖之A-A’線之一實施例之結構剖視圖。 Figure 3 is a cross-sectional view of an embodiment of the present invention along the line A-A' in Figure 1.

第4(a)圖至第4(e)圖為本發明之製作均溫板裝置之一實施例之各步驟結構剖視圖。 Figures 4(a) to 4(e) are cross-sectional views of the structure of each step of an embodiment of the apparatus for manufacturing a uniform temperature plate of the present invention.

第5(a)圖至第5(h)圖為本發明之製作均溫板裝置之另一實施例之各步驟結構剖視圖。 Fig. 5(a) to Fig. 5(h) are cross-sectional views of the structure of each step of another embodiment of the apparatus for manufacturing a uniform temperature plate of the present invention.

第6圖為本發明之筆記型電腦之一實施例之俯視圖。 Figure 6 is a top view of an embodiment of the notebook computer of the present invention.

第7圖為本發明之沿第5圖之B-B’線之一實施例之結構剖視圖。 Fig. 7 is a cross-sectional view of an embodiment of the present invention along the line B-B' in Fig. 5.

本發明之實施例將藉由下文配合相關圖式進一步加以解說。盡可能的,於圖式與說明書中,相同標號係代表相同或相似構件。於圖式中,基於簡化與方便標示,形狀與厚度可能經過誇大表示。可以理解的是,未特別顯示於圖式中或描述於說明書中之元件,為所屬技術領域中具有通常技術者所知之形態。本領域之通常技術者可依據本發明之內容而進行多種之改變與修改。 The embodiments of the present invention will be further explained by following relevant drawings. As far as possible, in the drawings and the description, the same reference numerals represent the same or similar components. In the drawings, the shape and thickness may be exaggerated based on simplification and convenient labeling. It can be understood that the elements not specifically shown in the drawings or described in the specification are in the form known to those skilled in the art. Those skilled in the art can make various changes and modifications based on the content of the present invention.

當一個元件被稱為『在...上』時,它可泛指該元件直接在其他元件上,也可以是有其他元件存在於兩者之中。相反地,當一個元件被稱為『直接在』另一元件,它是不能有其他元件存在於兩者之中間。如本文所用,詞彙『及/或』包含了列出的關聯項目中的一個或多個的任何組合。 When an element is called "on", it can generally mean that the element is directly on other elements, or there can be other elements existing in both. Conversely, when an element is said to be "directly in" another element, it cannot have other elements in between. As used herein, the term "and/or" includes any combination of one or more of the listed related items.

於下文中關於“一個實施例”或“一實施例”之描述係指關於至少一實施例內所相關連之一特定元件、結構或特徵。因此,於下文中多處所出現 之“一個實施例”或“一實施例”之多個描述並非針對同一實施例。再者,於一或多個實施例中之特定構件、結構與特徵可依照一適當方式而結合。 The following description of "one embodiment" or "an embodiment" refers to at least one specific element, structure, or feature related to the embodiment. Therefore, it appears in many places below Multiple descriptions of "one embodiment" or "an embodiment" are not directed to the same embodiment. Furthermore, specific components, structures, and features in one or more embodiments can be combined in an appropriate manner.

第1圖為本發明之均溫板裝置之一實施例之立體圖。以下請參閱第1圖,並介紹本發明之均溫板裝置10之一實施例,其形狀可為長方形或T型,但本發明不限於此。 Figure 1 is a perspective view of an embodiment of the uniform temperature plate device of the present invention. Please refer to Figure 1 below to introduce an embodiment of the uniform temperature plate device 10 of the present invention. The shape can be rectangular or T-shaped, but the present invention is not limited to this.

第2圖為本發明之均溫板裝置之一實施例之分解圖,第3圖為本發明之沿第1圖之A-A’線之一實施例之結構剖視圖。以下請同時參閱第2圖與第3圖。在本發明之一實施例中,均溫板裝置10包含一下殼板12、一第一金屬絲絨毛細層14、複數個金屬粉末16、一第二金屬絲絨毛細層18與一上殼板20,其中金屬粉末16可為球狀,樹枝狀或不規則狀,但本發明不限於此。 Fig. 2 is an exploded view of an embodiment of the uniform temperature plate device of the present invention, and Fig. 3 is a structural cross-sectional view of an embodiment of the present invention along the line A-A' in Fig. 1. Please refer to Figure 2 and Figure 3 at the same time below. In an embodiment of the present invention, the uniform temperature plate device 10 includes a lower shell 12, a first metal velvet capillary layer 14, a plurality of metal powders 16, a second metal velvet capillary layer 18, and an upper shell plate 20, The metal powder 16 may be spherical, dendritic or irregular, but the present invention is not limited thereto.

下殼板12具有一蒸發區122與一冷凝區124。第一金屬絲絨毛細層14設於下殼板12上,並覆蓋蒸發區122與冷凝區124,其中第一金屬絲絨毛細層14具有複數個第一空洞142。所有金屬粉末16填入蒸發區122之正上方的第一空洞142中,其中蒸發區122之正上方的每一第一空洞142之空間大於其對應之金屬粉末16所佔之體積。舉例來說,金屬粉末16之表面積為其對應之第一空洞142之截面積的25-75%,較佳為50%。金屬粉末16的存在可以在蒸發區122內形成較大的毛細壓力梯度,使回流液體受到較大的毛細力而更快速地補充至蒸發區122,以提升蒸發區122的抗乾化能力與均溫板裝置10之散熱效率。因此,蒸發區122可保持有充足的液體來進行相變化,進而降低蒸發區122內的液體在汽化後,來不及補充液體到蒸發區122,使熱源持續升溫的機率。由於散熱效率得以提升,所以均溫板裝置10之厚度也可以設計地較薄。第二金屬絲絨毛細層18設於第一金屬絲絨毛細層14上,其中第二金屬絲絨毛 細層18具有複數個第二空洞182,且第二空洞182之孔徑大於第一空洞142之孔徑,以增加回流液體之流量。在本發明之某些實施例中,所有第二空洞182之密度可小於所有第一空洞142之密度,以增加液體從冷凝區124流向蒸發區122的機率。上殼板20之底部往下延伸以形成複數個支撐柱202,並利用所有支撐柱202固定於第二金屬絲絨毛細層18上。所有支撐柱202周圍的空間都是互相連通的,以供汽化後液體流動。為了具有較佳的散熱效率,上殼板20、下殼板12、所有金屬粉末16、所有支撐柱202、第一金屬絲絨毛細層14與第二金屬絲絨毛細層18之材質皆可為相同,例如為銅、合金銅或無氧銅,但本發明不限於此。 The lower shell 12 has an evaporation zone 122 and a condensation zone 124. The first metal wool fine layer 14 is disposed on the lower shell plate 12 and covers the evaporation zone 122 and the condensation zone 124. The first metal wool fine layer 14 has a plurality of first cavities 142. All the metal powder 16 is filled in the first cavity 142 directly above the evaporation zone 122, and the space of each first cavity 142 directly above the evaporation zone 122 is larger than the volume occupied by the corresponding metal powder 16. For example, the surface area of the metal powder 16 is 25-75% of the cross-sectional area of the corresponding first cavity 142, preferably 50%. The presence of the metal powder 16 can form a larger capillary pressure gradient in the evaporation zone 122, so that the returning liquid receives a larger capillary force and is replenished to the evaporation zone 122 more quickly, so as to improve the anti-drying ability and uniformity of the evaporation zone 122. The heat dissipation efficiency of the warm plate device 10. Therefore, the evaporation zone 122 can maintain sufficient liquid to perform the phase change, thereby reducing the probability that after the liquid in the evaporation zone 122 is vaporized, it is too late to replenish the liquid to the evaporation zone 122, so that the heat source will continue to rise. As the heat dissipation efficiency is improved, the thickness of the uniform temperature plate device 10 can also be designed to be thinner. The second metal wool fine layer 18 is arranged on the first metal wool fine layer 14, wherein the second metal wool fine layer The fine layer 18 has a plurality of second cavities 182, and the pore diameter of the second cavities 182 is larger than the pore diameter of the first cavities 142, so as to increase the flow rate of the returning liquid. In some embodiments of the present invention, the density of all the second cavities 182 may be less than the density of all the first cavities 142 to increase the probability of liquid flowing from the condensation zone 124 to the evaporation zone 122. The bottom of the upper shell plate 20 extends downward to form a plurality of supporting pillars 202, and all the supporting pillars 202 are fixed on the second metal wool fine layer 18. The spaces around all supporting columns 202 are connected to each other to allow liquid to flow after vaporization. In order to have better heat dissipation efficiency, the materials of the upper shell plate 20, the lower shell plate 12, all the metal powder 16, all the support columns 202, the first metal velvet capillary layer 14 and the second metal velvet capillary layer 18 can all be the same. For example, it is copper, alloy copper or oxygen-free copper, but the present invention is not limited thereto.

為了密封所有金屬粉末16、所有支撐柱202、第一金屬絲絨毛細層14與第二金屬絲絨毛細層18,使液體不會散逸到外部,下殼板12可更包含一邊緣區126,邊緣區126圍繞蒸發區122與冷凝區124,邊緣區126往上延伸以形成一凸垣128,凸垣128圍繞第一金屬絲絨毛細層14、所有金屬粉末16、第二金屬絲絨毛細層18與所有支撐柱202,且上殼板20固定於凸垣128上。此外,在本發明之某些實施例中,所有第二空洞182中可填有親水性微結構22,以改善親水性,使液體更快流回蒸發區122。 In order to seal all the metal powder 16, all the support columns 202, the first metal velvet capillary layer 14 and the second metal velvet capillary layer 18, so that the liquid will not escape to the outside, the lower shell plate 12 may further include an edge area 126, an edge area 126 surrounds the evaporation zone 122 and the condensation zone 124, and the edge zone 126 extends upward to form a convex wall 128. The convex wall 128 surrounds the first fine metal velvet layer 14, all the metal powder 16, the second fine metal velvet layer 18 and all supports The pillar 202 and the upper shell plate 20 are fixed on the convex wall 128. In addition, in some embodiments of the present invention, all the second cavities 182 may be filled with hydrophilic microstructures 22 to improve the hydrophilicity and allow the liquid to flow back to the evaporation zone 122 more quickly.

當蒸發區122之下方設有熱源,且冷凝區124之下方設有冷卻源時,蒸發區122上的水分會逐漸被熱源蒸發,以形成水蒸氣並往上方流動,直到佈滿支撐柱202周圍的空間。冷卻源可以降低自身上方的水蒸氣之溫度,當水蒸氣降溫時,便會形成水滴落下。當冷凝區124之上方的水蒸氣減少時,蒸發區122之上方的水蒸氣便會往冷凝區124之上方流動。冷凝區124上累積的水滴會藉由金屬粉末16、親水性微結構22、第一金屬絲絨毛細層14與第二金屬絲絨毛細層18之內聚力與毛細力,向蒸發區122移動, 以完成一個散熱循環。 When a heat source is provided under the evaporation zone 122 and a cooling source is provided under the condensation zone 124, the moisture on the evaporation zone 122 will be gradually evaporated by the heat source to form water vapor and flow upwards until it is covered around the support column 202 Space. The cooling source can lower the temperature of the water vapor above itself. When the water vapor cools down, it will form water droplets and fall. When the water vapor above the condensation zone 124 decreases, the water vapor above the evaporation zone 122 will flow above the condensation zone 124. The water droplets accumulated on the condensation zone 124 will move to the evaporation zone 122 by the cohesion and capillary force of the metal powder 16, the hydrophilic microstructure 22, the first metal velvet capillary layer 14 and the second metal velvet capillary layer 18, To complete a heat dissipation cycle.

第4(a)圖至第4(e)圖為本發明之製作均溫板裝置之一實施例之各步驟結構剖視圖。以下請參閱第4(a)圖至第4(e)圖,以介紹本發明之均溫板裝置之製作方法之一實施例。首先如第4(a)圖所示,提供下殼板12,其具有蒸發區122與冷凝區124,並形成第一金屬絲絨毛細層14於下殼板12上,並利用第一金屬絲絨毛細層14覆蓋蒸發區122與冷凝區124,其中第一金屬絲絨毛細層14具有複數個第一空洞142。接著如第4(b)圖所示,形成金屬粉末16於蒸發區122之正上方的第一空洞142中,其中蒸發區122之正上方的每一第一空洞142之空間大於其對應之金屬粉末16所佔之體積。在一實施例中,噴塗所有金屬粉末16於蒸發區122之正上方的第一空洞142中。在另一實施例中,利用一多孔性材料,例如,但不限於多孔性海綿或石墨沾附所有金屬粉末16,以轉印所有金屬粉末16於蒸發區122之正上方的第一空洞142中。再來,如第4(c)圖所示,形成第二金屬絲絨毛細層18於第一金屬絲絨毛細層14上,其中第二金屬絲絨毛細層18具有複數個第二空洞182,且第二空洞182之孔徑大於第一空洞142之孔徑。此外,所有第二空洞182之密度可小於所有第一空洞142之密度。形成完後,如第4(d)圖所示,對第一金屬絲絨毛細層14、所有金屬粉末16與第二金屬絲絨毛細層18進行高溫燒結,以固定所有金屬粉末16與第二金屬絲絨毛細層18於第一金屬絲絨毛細層14上。舉例來說,第一金屬絲絨毛細層14、所有金屬粉末16與第二金屬絲絨毛細層18以攝氏700-800度進行高溫燒結,但高溫燒結的溫度並不限於攝氏700-800度,高溫燒結的溫度係用於固定所有金屬粉末16與第二金屬絲絨毛細層18於第一金屬絲絨毛細層14上。最後,如第4(e)圖所示,提供上殼板20,其底部往下延伸以形成複數個支撐柱202,並利用所有支撐柱202固定於 第二金屬絲絨毛細層18上。 Figures 4(a) to 4(e) are cross-sectional views of the structure of each step of an embodiment of the apparatus for manufacturing a uniform temperature plate of the present invention. Please refer to Fig. 4(a) to Fig. 4(e) below to introduce an embodiment of the method for manufacturing the uniform temperature plate device of the present invention. First, as shown in Figure 4(a), a lower shell 12 is provided, which has an evaporation zone 122 and a condensation zone 124, and forms a first metal velvet capillary layer 14 on the lower shell 12, and uses the first metal velvet capillary The layer 14 covers the evaporation zone 122 and the condensation zone 124, wherein the first metal wool fine layer 14 has a plurality of first cavities 142. Then, as shown in Figure 4(b), the metal powder 16 is formed in the first cavity 142 directly above the evaporation region 122, wherein the space of each first cavity 142 directly above the evaporation region 122 is larger than its corresponding metal The volume occupied by powder 16. In one embodiment, all the metal powder 16 is sprayed in the first cavity 142 directly above the evaporation zone 122. In another embodiment, a porous material, such as, but not limited to, porous sponge or graphite is used to adhere all the metal powder 16 to transfer all the metal powder 16 to the first cavity 142 directly above the evaporation zone 122 middle. Furthermore, as shown in FIG. 4(c), a second metal velvet hair layer 18 is formed on the first metal velvet hair layer 14. The second metal velvet hair layer 18 has a plurality of second cavities 182, and the second metal velvet hair layer 18 has a plurality of second cavities 182. The aperture of the cavity 182 is larger than the aperture of the first cavity 142. In addition, the density of all the second cavities 182 may be less than the density of all the first cavities 142. After the formation is completed, as shown in Figure 4(d), the first fine metal velvet layer 14, all metal powders 16 and the second fine metal velvet layer 18 are sintered at a high temperature to fix all the metal powder 16 and the second metal velvet. The capillary layer 18 is on the first metal wool capillary layer 14. For example, the first fine metal velvet layer 14, all metal powders 16, and the second fine metal velvet layer 18 are sintered at a high temperature at 700-800 degrees Celsius, but the high-temperature sintering temperature is not limited to 700-800 degrees Celsius. The temperature is used to fix all the metal powder 16 and the second fine metal wool layer 18 on the first fine metal wool layer 14. Finally, as shown in Figure 4(e), an upper shell plate 20 is provided, the bottom of which extends downward to form a plurality of support columns 202, and all the support columns 202 are fixed to On the second fine layer of metal velvet 18.

第5(a)圖至第5(h)圖為本發明之製作均溫板裝置之另一實施例之各步驟結構剖視圖。以下請參閱第5(a)圖至第5(h)圖,以介紹均溫板裝置之製作方法之另一實施例。第5(a)圖至第5(d)圖之步驟分別與第4(a)圖至第4(d)圖之步驟相同,於此不再贅述。完成第5(d)圖之步驟後,為了進一步增加散熱效率更可進行下列步驟: Fig. 5(a) to Fig. 5(h) are cross-sectional views of the structure of each step of another embodiment of the apparatus for manufacturing a uniform temperature plate of the present invention. Please refer to Fig. 5(a) to Fig. 5(h) below to introduce another embodiment of the manufacturing method of the uniform temperature plate device. The steps in Fig. 5(a) to Fig. 5(d) are the same as those in Fig. 4(a) to Fig. 4(d) respectively, and will not be repeated here. After completing the steps in Figure 5(d), in order to further increase the heat dissipation efficiency, the following steps can be performed:

如第5(e)圖所示,在所有第一空洞142中填滿易揮發性溶液24,並藉此覆蓋所有金屬粉末16,及填滿金屬粉末16之空隙,以將金屬粉末16與其他外部結構隔離,其中易揮發性溶液24可為酒精或丙酮,但本發明並不以此為限。在所有第一空洞142中填滿易揮發性溶液24,並藉此覆蓋所有金屬粉末16,及填滿金屬粉末16之空隙之方式,可以地心引力及毛細拉力實現,但本發明不限於此。接著,如第5(f)圖所示,利用一多孔性材料,例如,但不限於多孔性海綿或石墨沾附與易揮發性溶液24不相溶之具有低熱阻之親水性溶凝膠(sol-gel)26,並將親水性溶凝26膠塗布於所有第二空洞182中。舉例來說,親水性溶凝膠26之成分可為異丙醇基底氧化物(IPA-based oxide)或其他適合的親水性成分。因為易揮發性溶液24與親水性溶凝膠26具有不同黏度,所以易揮發性溶液24能有效隔離親水性溶凝膠26與金屬粉末16。再來,如第5(g)圖所示,對易揮發性溶液24與親水性溶凝膠26進行高溫燒結,以揮發或燒乾易揮發性溶液24,並將親水性溶凝膠26轉化為親水性微結構22。舉例來說,對易揮發性溶液24與親水性溶凝膠26以攝氏500-600度進行高溫燒結,但高溫燒結的溫度並不限於攝氏700-800度,高溫燒結的溫度可根據需求而調整。在本發明之某些實施例中,易揮發性溶液24的量盡量控制不要觸碰到親水性溶凝膠26,如此可以增加親水性微結構22的厚度。此外,根據 第一空洞142的體積可以計算所需要的易揮發性溶液24的量,並以定量注射器注入易揮發性溶液24,以避免觸碰到親水性溶凝膠26。最後,如第5(h)圖所示,提供上殼板20,其底部往下延伸以形成複數個支撐柱202,並利用所有支撐柱202固定於第二金屬絲絨毛細層18上。 As shown in Figure 5(e), all the first cavities 142 are filled with the volatile solution 24 to cover all the metal powders 16, and fill the gaps between the metal powders 16, so as to separate the metal powders 16 from others. The external structure is isolated, and the volatile solution 24 can be alcohol or acetone, but the present invention is not limited to this. The method of filling all the first cavities 142 with the volatile solution 24 and thereby covering all the metal powder 16 and filling the gaps of the metal powder 16 can be achieved by gravity and capillary pulling force, but the present invention is not limited to this . Next, as shown in Figure 5(f), use a porous material, such as, but not limited to, porous sponge or graphite to adhere to a hydrophilic soluble gel with low thermal resistance that is incompatible with the volatile solution 24 (sol-gel) 26, and the hydrophilic gel 26 glue is coated in all the second cavities 182. For example, the component of the hydrophilic lyogel 26 may be IPA-based oxide or other suitable hydrophilic components. Because the volatile solution 24 and the hydrophilic solvate 26 have different viscosities, the volatile solution 24 can effectively isolate the hydrophilic solvate 26 and the metal powder 16. Next, as shown in Figure 5(g), the volatile solution 24 and the hydrophilic solvogel 26 are sintered at a high temperature to volatilize or burn dry the volatile solution 24 and convert the hydrophilic solvogel 26 into It is a hydrophilic microstructure 22. For example, the volatile solution 24 and the hydrophilic gel 26 are sintered at a high temperature at 500-600 degrees Celsius, but the high-temperature sintering temperature is not limited to 700-800 degrees Celsius. The high-temperature sintering temperature can be adjusted according to requirements. . In some embodiments of the present invention, the amount of the volatile solution 24 should be controlled as far as possible so as not to touch the hydrophilic gel 26, so that the thickness of the hydrophilic microstructure 22 can be increased. In addition, according to The volume of the first cavity 142 can be calculated for the amount of the volatile solution 24 required, and the volatile solution 24 can be injected with a quantitative syringe to avoid touching the hydrophilic gel 26. Finally, as shown in FIG. 5(h), an upper shell 20 is provided, the bottom of which extends downward to form a plurality of support columns 202, and all the support columns 202 are used to fix the second metal wool fine layer 18.

第6圖為本發明之筆記型電腦之一實施例之俯視圖。第7圖為本發明之沿第5圖之B-B’線之一實施例之結構剖視圖。以下請參閱第6圖與第7圖,以介紹本發明之筆記型電腦之一實施例。筆記型電腦30包含一主機板32、至少一處理器34、至少一散熱鰭片36、至少一散熱風扇38與一均溫板裝置10,其中處理器34可為中央處理器或圖形處理器,但本發明並不以此為限,處理器34亦可為其他會發熱的電子裝置。處理器34之數量、散熱鰭片36之數量與散熱風扇38之數量皆不限定,處理器34之數量、散熱鰭片36之數量與散熱風扇38之數量可皆為相同,即皆為一或皆為二以上。此外,在本發明之某些實施例中,筆記型電腦30更可包含一殼體40,以達到可攜式的目的。第6圖中所示的結構可應用於第1圖或本發明中的其它實施例,但是不限於此。 Figure 6 is a top view of an embodiment of the notebook computer of the present invention. Fig. 7 is a cross-sectional view of an embodiment of the present invention along the line B-B' in Fig. 5. Please refer to FIGS. 6 and 7 below to introduce an embodiment of the notebook computer of the present invention. The notebook computer 30 includes a motherboard 32, at least one processor 34, at least one heat dissipation fin 36, at least one heat dissipation fan 38, and a uniform temperature board device 10. The processor 34 may be a central processing unit or a graphics processing unit. However, the present invention is not limited to this, and the processor 34 can also be other electronic devices that generate heat. The number of processors 34, the number of cooling fins 36, and the number of cooling fans 38 are not limited. The number of processors 34, the number of cooling fins 36, and the number of cooling fans 38 can all be the same, that is, they are all one or All are two or more. In addition, in some embodiments of the present invention, the notebook computer 30 may further include a casing 40 to achieve the purpose of being portable. The structure shown in Fig. 6 can be applied to Fig. 1 or other embodiments of the present invention, but is not limited to this.

處理器34、散熱鰭片36與散熱風扇38皆設於主機板32上,處理器34與散熱鰭片36彼此相隔,散熱風扇38對應散熱鰭片36設置。均溫板裝置10則跨設於處理器34與散熱鰭片36上。均溫板裝置10之內部結構與前述實施例相同,於此不再贅述。殼體40則包覆主機板32、處理器34、散熱鰭片36、散熱風扇38與均溫板裝置10。在高瓦數筆記型電腦中,處理器34設置在主機板32之中央,散熱鰭片36靠近主機板32之邊緣,故處理器34與散熱鰭片36之間的距離較遠,加上現今筆記型電腦有輕薄的要求,配合本發明之均溫板裝置10,可符合輕薄的趨勢,在提升散熱效率的前提下,進一步薄化筆記型電腦30之厚度。 The processor 34, the heat dissipation fin 36 and the heat dissipation fan 38 are all disposed on the motherboard 32, the processor 34 and the heat dissipation fin 36 are separated from each other, and the heat dissipation fan 38 is arranged corresponding to the heat dissipation fin 36. The uniform temperature plate device 10 is arranged across the processor 34 and the heat dissipation fin 36. The internal structure of the uniform temperature plate device 10 is the same as that of the previous embodiment, and will not be repeated here. The casing 40 covers the motherboard 32, the processor 34, the heat dissipation fins 36, the heat dissipation fan 38 and the uniform temperature plate device 10. In a high-wattage notebook computer, the processor 34 is arranged in the center of the motherboard 32, and the heat dissipation fins 36 are close to the edge of the motherboard 32. Therefore, the distance between the processor 34 and the heat dissipation fins 36 is relatively long. Notebook computers have requirements for lightness and thinness. With the uniform temperature plate device 10 of the present invention, it can meet the trend of lightness and thinness. Under the premise of improving heat dissipation efficiency, the thickness of the notebook computer 30 can be further thinned.

綜上所述,上述實施例於金屬絲絨毛細層中填入金屬粉末與親水性微結構,同時設計金屬絲絨毛細層之上層具有大空洞,下層具有小空洞,以增加毛細梯度,進而增進散熱效率與有助於薄化筆記型電腦。 To sum up, in the above embodiment, the metal velvet capillary layer is filled with metal powder and hydrophilic microstructure, and the metal velvet capillary layer is designed to have large cavities in the upper layer and small cavities in the lower layer to increase the capillary gradient and improve the heat dissipation efficiency. And help to thin the notebook computer.

以上所述者,僅為本發明一較佳實施例而已,並非用來限定本發明實施之範圍,故舉凡依本發明申請專利範圍所述之形狀、構造、特徵及精神所為之均等變化與修飾,均應包括於本發明之申請專利範圍內。 The above is only a preferred embodiment of the present invention, and is not used to limit the scope of implementation of the present invention. Therefore, all the shapes, structures, characteristics and spirits described in the scope of the patent application of the present invention are equally changed and modified. , Should be included in the scope of patent application of the present invention.

10:均溫板裝置 10: Uniform temperature plate device

12:下殼板 12: Lower shell

122:蒸發區 122: Evaporation Zone

124:冷凝區 124: Condensation zone

126:邊緣區 126: fringe zone

128:凸垣 128: Protruding Wall

14:第一金屬絲絨毛細層 14: The first fine layer of metal velvet

142:第一空洞 142: The First Hole

16:金屬粉末 16: metal powder

18:第二金屬絲絨毛細層 18: The second fine layer of metal velvet

182:第二空洞 182: The Second Hole

20:上殼板 20: Upper shell

202:支撐柱 202: support column

22:親水性微結構 22: Hydrophilic microstructure

Claims (25)

一種筆記型電腦,包含:一主機板;至少一處理器,設於該主機板上;至少一散熱鰭片,設於該主機板上,並與該至少一處理器彼此相隔;至少一散熱風扇,設於該主機板上,並對應該至少一散熱鰭片設置;以及一均溫板裝置,跨設於該至少一處理器與該至少一散熱鰭片上,該均溫板裝置包含:一下殼板,具有一蒸發區與一冷凝區,該蒸發區設於該至少一處理器上,該冷凝區設於該至少一散熱鰭片上;一第一金屬絲絨毛細層,設於該下殼板上,並覆蓋該蒸發區與該冷凝區,其中該第一金屬絲絨毛細層具有複數個第一空洞;複數個金屬粉末,填入該蒸發區之正上方的該第一空洞中,其中該蒸發區之正上方的每一該第一空洞之空間大於其對應之該金屬粉末所佔之體積;一第二金屬絲絨毛細層,設於該第一金屬絲絨毛細層上,其中該第二金屬絲絨毛細層具有複數個第二空洞,且該第二空洞之孔徑大於該第一空洞之孔徑;以及一上殼板,其底部往下延伸以形成複數個支撐柱,並利用該些支撐柱固定於該第二金屬絲絨毛細層上。 A notebook computer includes: a motherboard; at least one processor arranged on the motherboard; at least one heat dissipation fin arranged on the motherboard and separated from the at least one processor; at least one cooling fan , Arranged on the motherboard and corresponding to at least one heat dissipation fin; and a uniform temperature board device straddling the at least one processor and the at least one heat dissipation fin, the uniform temperature board device includes: a lower shell The plate has an evaporation zone and a condensation zone, the evaporation zone is arranged on the at least one processor, the condensation zone is arranged on the at least one heat dissipation fin; a first fine layer of metal wool is arranged on the lower shell plate , And cover the evaporation zone and the condensation zone, wherein the first fine layer of metal velvet has a plurality of first cavities; a plurality of metal powders are filled in the first cavity directly above the evaporation zone, wherein the evaporation zone The space of each of the first holes directly above is larger than the volume occupied by the corresponding metal powder; a second fine metal velvet layer is arranged on the fine layer of the first metal velvet, wherein the second metal velvet finely The layer has a plurality of second cavities, and the aperture of the second cavity is larger than the aperture of the first cavity; and an upper shell plate, the bottom of which extends downward to form a plurality of supporting columns, and the supporting columns are fixed to the On the second fine layer of metal velvet. 如請求項1所述之筆記型電腦,其中該下殼板更包含一邊緣 區,該邊緣區圍繞該蒸發區與該冷凝區,該邊緣區往上延伸以形成一凸垣,該凸垣圍繞該第一金屬絲絨毛細層、該些金屬粉末、該第二金屬絲絨毛細層與該些支撐柱,且該上殼板固定於該凸垣上。 The notebook computer according to claim 1, wherein the lower shell further includes an edge Zone, the edge zone surrounds the evaporation zone and the condensation zone, the edge zone extends upward to form a convex wall surrounding the first fine metal velvet layer, the metal powders, and the second fine metal velvet layer And the supporting columns, and the upper shell plate is fixed on the convex wall. 如請求項1所述之筆記型電腦,其中該些第二空洞中填有親水性微結構。 The notebook computer according to claim 1, wherein the second cavities are filled with hydrophilic microstructures. 如請求項1所述之筆記型電腦,其中該些第二空洞之密度小於該些第一空洞之密度。 The notebook computer according to claim 1, wherein the density of the second cavities is less than the density of the first cavities. 如請求項1所述之筆記型電腦,其中該金屬粉末之表面積為其對應之該第一空洞之截面積的25-75%。 The notebook computer according to claim 1, wherein the surface area of the metal powder is 25-75% of the cross-sectional area of the corresponding first cavity. 如請求項1所述之筆記型電腦,其中該上殼板、該下殼板、該些金屬粉末、該些支撐柱、該第一金屬絲絨毛細層與該第二金屬絲絨毛細層之材質皆為相同。 The notebook computer according to claim 1, wherein the materials of the upper shell plate, the lower shell plate, the metal powders, the support columns, the first metal velvet hair layer and the second metal velvet hair layer are all For the same. 如請求項1所述之筆記型電腦,其中該上殼板、該下殼板、該些金屬粉末、該些支撐柱、該第一金屬絲絨毛細層與該第二金屬絲絨毛細層之材質皆為銅、合金銅或無氧銅。 The notebook computer according to claim 1, wherein the materials of the upper shell plate, the lower shell plate, the metal powders, the support columns, the first metal velvet hair layer and the second metal velvet hair layer are all It is copper, alloyed copper or oxygen-free copper. 如請求項1所述之筆記型電腦,其中該至少一處理器之數量、該至少一散熱鰭片之數量與該至少一散熱風扇之數量皆為相同。 The notebook computer according to claim 1, wherein the number of the at least one processor, the number of the at least one heat dissipation fin, and the number of the at least one heat dissipation fan are all the same. 如請求項1所述之筆記型電腦,其中該至少一處理器為中央處理器或圖形處理器。 The notebook computer according to claim 1, wherein the at least one processor is a central processing unit or a graphics processor. 如請求項1所述之筆記型電腦,更包含一殼體,其係包覆該主機板、該至少一處理器、該至少一散熱鰭片、該至少一散熱風扇與該均溫板裝置。 The notebook computer according to claim 1, further comprising a casing covering the motherboard, the at least one processor, the at least one heat dissipation fin, the at least one heat dissipation fan, and the uniform temperature plate device. 一種均溫板裝置,包含:一下殼板,具有一蒸發區與一冷凝區;一第一金屬絲絨毛細層,設於該下殼板上,並覆蓋該蒸發區與該冷凝區,其中該第一金屬絲絨毛細層具有複數個第一空洞;複數個金屬粉末,填入該蒸發區之正上方的該第一空洞中,其中該蒸發區之正上方的每一該第一空洞之空間大於其對應之該金屬粉末所佔之體積;一第二金屬絲絨毛細層,設於該第一金屬絲絨毛細層上,其中該第二金屬絲絨毛細層具有複數個第二空洞,且該第二空洞之孔徑大於該第一空洞之孔徑;以及一上殼板,其底部往下延伸以形成複數個支撐柱,並利用該些支撐柱固定於該第二金屬絲絨毛細層上。 A uniform temperature plate device, comprising: a lower shell plate having an evaporation zone and a condensation zone; a first fine layer of metal wool, arranged on the lower shell plate, and covering the evaporation zone and the condensation zone, wherein the second A fine layer of metal velvet has a plurality of first cavities; a plurality of metal powders are filled in the first cavities directly above the evaporation zone, wherein the space of each of the first cavities directly above the evaporation zone is larger than its Corresponding to the volume occupied by the metal powder; a second fine metal velvet layer is arranged on the fine layer of the first metal velvet, wherein the second fine metal velvet layer has a plurality of second cavities, and the second cavities The hole diameter is larger than the hole diameter of the first cavity; and an upper shell plate, the bottom of which extends downward to form a plurality of supporting pillars, and the supporting pillars are used to fix the second metal wool fine layer. 如請求項11所述之均溫板裝置,其中該下殼板更包含一邊緣區,該邊緣區圍繞該蒸發區與該冷凝區,該邊緣區往上延伸以形成一凸垣,該凸垣圍繞該第一金屬絲絨毛細層、該些金屬粉末、該第二金屬絲絨毛細層與該些支撐柱,且該上殼板固定於該凸垣上。 The uniform temperature plate device according to claim 11, wherein the lower shell plate further includes an edge area surrounding the evaporation area and the condensation area, and the edge area extends upward to form a convex wall, the convex wall Surrounding the first fine metal velvet layer, the metal powders, the second fine metal velvet layer and the supporting columns, and the upper shell plate is fixed on the convex wall. 如請求項11所述之均溫板裝置,其中該些第二空洞中填有親水性微結構。 The uniform temperature plate device according to claim 11, wherein the second cavities are filled with hydrophilic microstructures. 如請求項11所述之均溫板裝置,其中該些第二空洞之密度小於該些第一空洞之密度。 The uniform temperature plate device according to claim 11, wherein the density of the second cavities is less than the density of the first cavities. 如請求項11所述之均溫板裝置,其中該金屬粉末之表面積為其對應之該第一空洞之截面積的25-75%。 The uniform temperature plate device according to claim 11, wherein the surface area of the metal powder is 25-75% of the cross-sectional area of the corresponding first cavity. 如請求項11所述之均溫板裝置,其中該上殼板、該下殼板、該些金屬粉末、該些支撐柱、該第一金屬絲絨毛細層與該第二金屬絲絨毛細層之材質皆為相同。 The uniform temperature plate device according to claim 11, wherein the materials of the upper shell plate, the lower shell plate, the metal powders, the support columns, the first metal velvet capillary layer and the second metal velvet capillary layer All are the same. 如請求項11所述之均溫板裝置,其中該上殼板、該下殼板、該些金屬粉末、該些支撐柱、該第一金屬絲絨毛細層與該第二金屬絲絨毛細層之材質皆為銅、合金銅或無氧銅。 The uniform temperature plate device according to claim 11, wherein the materials of the upper shell plate, the lower shell plate, the metal powders, the support columns, the first metal velvet fine layer and the second metal velvet fine layer All are copper, alloy copper or oxygen-free copper. 一種均溫板裝置之製作方法,包含下列步驟:提供一下殼板,其具有一蒸發區與一冷凝區,並形成一第一金屬絲絨毛細層於該下殼板上,並利用該第一金屬絲絨毛細層覆蓋該蒸發區與該冷凝區,其中該第一金屬絲絨毛細層具有複數個第一空洞;形成複數個金屬粉末於該蒸發區之正上方的該第一空洞中,其中該蒸發區之正上方的每一該第一空洞之空間大於其對應之該金屬粉末所佔之體積;形成一第二金屬絲絨毛細層於該第一金屬絲絨毛細層上,其中該第二金屬絲絨毛細層具有複數個第二空洞,且該第二空洞之孔徑大於該第一空洞之孔徑;對該第一金屬絲絨毛細層、該些金屬粉末與該第二金屬絲絨毛細層進行高溫燒結,以固定該些金屬粉末與該第二金屬絲絨毛細層於該第一金屬絲絨毛細層上;以及提供一上殼板,其底部往下延伸以形成複數個支撐柱,並利用該些支撐柱固定於該第二金屬絲絨毛細層上。 A method for manufacturing a uniform temperature plate device includes the following steps: providing a lower shell, which has an evaporation zone and a condensation zone, and forming a first fine layer of metal wool on the lower shell, and using the first metal The velvet hair layer covers the evaporation zone and the condensation zone, wherein the first metal velvet hair layer has a plurality of first cavities; a plurality of metal powders are formed in the first cavity directly above the evaporation zone, wherein the evaporation zone The space of each first cavity directly above is larger than the volume occupied by the corresponding metal powder; forming a second fine metal velvet layer on the first fine metal velvet layer, wherein the second fine metal velvet layer There are a plurality of second cavities, and the pore diameter of the second cavities is larger than the pore diameter of the first cavities; the first fine metal velvet layer, the metal powders, and the second fine metal velvet layer are sintered at a high temperature to fix the Some metal powders and the second metal velvet capillary layer are on the first metal velvet capillary layer; and an upper shell plate is provided, the bottom of which extends downward to form a plurality of supporting pillars, and the supporting pillars are fixed to the first Two fine layers of metal velvet. 如請求項18所述之均溫板裝置之製作方法,其中在形成該些金屬粉末於該蒸發區之正上方的該第一空洞中之步驟中,噴塗 該些金屬粉末於該蒸發區之正上方的該第一空洞中。 The method for manufacturing a uniform temperature plate device according to claim 18, wherein in the step of forming the metal powders in the first cavity directly above the evaporation zone, spraying The metal powders are in the first cavity directly above the evaporation zone. 如請求項18所述之均溫板裝置之製作方法,其中在形成該些金屬粉末於該蒸發區之正上方的該第一空洞中之步驟中,利用一多孔性材料沾附該些金屬粉末,以轉印該些金屬粉末於該蒸發區之正上方的該第一空洞中。 The method for manufacturing a uniform temperature plate device according to claim 18, wherein in the step of forming the metal powders in the first cavity directly above the evaporation zone, a porous material is used to adhere the metals Powder to transfer the metal powder in the first cavity directly above the evaporation zone. 如請求項18所述之均溫板裝置之製作方法,其中該第一金屬絲絨毛細層、該些金屬粉末與該第二金屬絲絨毛細層以攝氏700-800度進行高溫燒結。 The manufacturing method of the uniform temperature plate device according to claim 18, wherein the first fine metal velvet layer, the metal powders and the second fine metal velvet layer are sintered at a high temperature at 700-800 degrees Celsius. 如請求項18所述之均溫板裝置之製作方法,其中在固定該些金屬粉末與該第二金屬絲絨毛細層於該第一金屬絲絨毛細層上之步驟後,更包含下列步驟:在該些第一空洞中填滿易揮發性溶液,並藉此覆蓋該些金屬粉末;利用一多孔性材料沾附與該易揮發性溶液不相溶之親水性溶凝膠(sol-gel),並將該親水性溶凝膠塗布於該些第二空洞中;以及對該易揮發性溶液與該親水性溶凝膠進行高溫燒結,以揮發該易揮發性溶液,並將該親水性溶凝膠轉化為親水性微結構,接著再進行提供該上殼板之步驟。 The method for manufacturing a uniform temperature plate device according to claim 18, wherein after the step of fixing the metal powders and the second metal wool fine layer on the first metal wool fine layer, the method further comprises the following steps: The first cavities are filled with a volatile solution to cover the metal powder; a porous material is used to attach a hydrophilic sol-gel that is incompatible with the volatile solution, And coating the hydrophilic sol gel in the second cavities; and sintering the volatile solution and the hydrophilic sol gel at a high temperature to volatilize the volatile solution and coagulate the hydrophilic The glue is transformed into a hydrophilic microstructure, and then the step of providing the upper shell plate is carried out. 如請求項22所述之均溫板裝置之製作方法,其中該易揮發性溶液與該親水性溶凝膠以攝氏500-600度進行高溫燒結。 The method for manufacturing a uniform temperature plate device according to claim 22, wherein the volatile solution and the hydrophilic soluble gel are sintered at a high temperature at 500-600 degrees Celsius. 如請求項22所述之均溫板裝置之製作方法,其中該易揮發性溶液為酒精或丙酮。 The method for manufacturing a uniform temperature plate device according to claim 22, wherein the volatile solution is alcohol or acetone. 如請求項22所述之均溫板裝置之製作方法,其中該親水性溶凝 膠之成分為異丙醇基底氧化物(IPA-based oxide)。 The method for manufacturing a uniform temperature plate device according to claim 22, wherein the hydrophilic coagulation The composition of the glue is IPA-based oxide.
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