TWI747262B - Notebook computer, vapor chamber device and method for fabricating the vapor chamber device - Google Patents
Notebook computer, vapor chamber device and method for fabricating the vapor chamber device Download PDFInfo
- Publication number
- TWI747262B TWI747262B TW109114405A TW109114405A TWI747262B TW I747262 B TWI747262 B TW I747262B TW 109114405 A TW109114405 A TW 109114405A TW 109114405 A TW109114405 A TW 109114405A TW I747262 B TWI747262 B TW I747262B
- Authority
- TW
- Taiwan
- Prior art keywords
- metal
- layer
- velvet
- fine
- cavities
- Prior art date
Links
Images
Abstract
本發明係揭露一種筆記型電腦、均溫板裝置及其製作方法,首先提供一下殼板,其具有一蒸發區與一冷凝區,並形成一第一金屬絲絨毛細層於下殼板上,以覆蓋蒸發區與冷凝區,再形成金屬粉末於蒸發區之正上方的第一金屬絲絨毛細層中,接著,形成一第二金屬絲絨毛細層於第一金屬絲絨毛細層上。對金屬粉末與二金屬絲絨毛細層進行高溫燒結,以固定金屬粉末與金屬絲絨毛細層。最後提供一上殼板,其底部往下延伸以形成支撐柱,並利用支撐柱固定於第二金屬絲絨毛細層上,以完成均溫板裝置,且可將此整合於薄型筆記型電腦中,以增加其散熱效率。 The present invention discloses a notebook computer, a uniform temperature board device and a manufacturing method thereof. First, a lower shell is provided, which has an evaporation zone and a condensation zone, and forms a first fine layer of metal wool on the lower shell to Cover the evaporation zone and the condensation zone, and then form metal powder in the first fine metal velvet layer directly above the evaporation region, and then form a second fine metal velvet layer on the first fine metal velvet layer. High-temperature sintering is performed on the metal powder and the fine layer of metal wool to fix the metal powder and the fine layer of metal wool. Finally, an upper shell plate is provided, the bottom of which extends downward to form a supporting column, and the supporting column is fixed on the second metal velvet fine layer to complete the uniform temperature plate device, and this can be integrated into a thin notebook computer. To increase its heat dissipation efficiency.
Description
本發明係關於一種筆記型電腦及其均溫板製作技術,且特別關於一種筆記型電腦、均溫板裝置及其製作方法。 The present invention relates to a notebook computer and its uniform temperature board manufacturing technology, and particularly to a notebook computer, a uniform temperature board device and a manufacturing method thereof.
目前,均溫板(Vapor chamber)屬於一種板狀熱管,其原理與熱管(Heat pipe)相同,均通過內部真空的環境,使注入其內部的工作流體(working fluid)可因遇熱而產生液汽相變化,進而以蒸汽傳遞熱量,再因遇冷而回復成液態後以回流循環。 At present, the Vapor chamber is a kind of plate-shaped heat pipe. Its principle is the same as that of a heat pipe. It passes through the internal vacuum environment, so that the working fluid injected into it can generate liquid due to heat. The vapor phase changes, and then the heat is transferred by the vapor, and then it returns to a liquid state due to the cold, and then circulates in a reflux.
然而,均溫板與熱管在製造上卻不盡相同。熱管的管體通常呈管狀,管體可先封閉一端後,再通過開放的另一端來進行如注入工作流體、除氣或真空化等作業,在除氣完成的瞬間,立刻封閉管體,即可完成熱管的製作。但是,均溫板的板體呈板狀,且通常由上、下相蓋合的兩個蓋板所組成,故其成型後為板狀,而非管狀;且均溫板利用其上、下具較大表面積的兩個板面,分別作為受熱端與冷凝端,故均溫板在使用時呈平躺狀態,工作流體並被其內壁上的毛細組織(wick structure)所吸附而聚集在其內部底部處。如此狀況下,再加上均溫板多利用其受熱端中央部位貼附發熱源,而其受熱端、冷凝端的毛細結構並不能有效使工作流體快速汽化,因此影響了熱傳遞效果。此外,在高瓦數散熱之筆記型電腦中,例如是75瓦以上規格的筆記型電腦,因為內部機構設 計考量,冷凝端和受熱端距離較遠,並在通道中需留螺絲孔位以便和晶片固定,且冷凝端之寬度需小於30毫米(mm),使用發熱的元件較多,冷凝效果也比較好,導致冷凝端回水不容易,所以必須使用散熱效果較佳的散熱裝置,以維持筆記型電腦的運作效能。雖然熱管的散熱效能不錯,但熱管較厚,並不符合筆記型電腦在輕薄上的需求。若使用現有的均溫板,為了增加更大的毛細梯度,則必須使用更厚的毛細結構,但此種方式亦不符合筆記型電腦在輕薄上的需求,同時還會增加成本與製程。舉例來說,對150瓦的筆記型電腦而言,其冷凝區之寬度約70-75mm,熱源中心和冷凝區末端傳輸距離可能超過150mm以上,均溫板須能充分用到冷凝區寬度才有有效散熱,但常因毛細力不夠無法成功回水,所以只能使用到一半距離,代表解熱能力只能到50%,故需要提升毛細結構之厚度。 However, the uniform temperature plate and the heat pipe are different in manufacturing. The tube body of the heat pipe is usually tubular. The tube body can be closed at one end, and then the other end is opened to perform operations such as injecting working fluid, degassing or vacuuming. When the degassing is completed, the tube body is immediately closed, that is The production of heat pipes can be completed. However, the plate body of the uniform temperature plate is plate-shaped and usually consists of two cover plates covering the upper and lower sides. Therefore, it is formed into a plate shape instead of a tube; and the uniform temperature plate uses its upper and lower cover plates. The two plates with a larger surface area are respectively used as the heating end and the condensation end. Therefore, the uniform temperature plate is in a flat state when in use, and the working fluid is absorbed by the wick structure on its inner wall and gathers on it. At the bottom of its interior. In this situation, the heat equalizing plate mostly uses the central part of the heated end to attach the heat source, and the capillary structure of the heated end and the condensing end cannot effectively vaporize the working fluid, thus affecting the heat transfer effect. In addition, among the notebook computers with high wattage heat dissipation, such as notebook computers with specifications above 75 watts, because of the internal mechanism Considering that the distance between the condensing end and the heating end is relatively long, and screw holes are required in the channel for fixing with the chip, and the width of the condensing end should be less than 30 millimeters (mm), more heating elements are used, and the condensing effect is also relatively good. Good, it is not easy for the condensation end to return water, so a heat sink with better heat dissipation effect must be used to maintain the operating performance of the notebook computer. Although the heat dissipation performance of the heat pipe is good, the heat pipe is thicker, which does not meet the needs of thin and light notebook computers. If the existing temperature equalizing plate is used, in order to increase the capillary gradient, a thicker capillary structure must be used. However, this method does not meet the needs of thin and light notebook computers, and will increase the cost and manufacturing process. For example, for a 150-watt laptop, the width of the condensing zone is about 70-75mm, and the transmission distance between the center of the heat source and the end of the condensing zone may exceed 150mm. Effective heat dissipation, but often because of insufficient capillary force to successfully return water, it can only be used up to half the distance, which means that the heat dissipation capacity can only reach 50%, so the thickness of the capillary structure needs to be increased.
因此,本發明係在針對上述的困擾,提出一種筆記型電腦、均溫板裝置及其製作方法,以解決習知所產生的問題。 Therefore, the present invention aims at solving the above-mentioned problems and proposes a notebook computer, a uniform temperature plate device and a manufacturing method thereof, so as to solve the problems caused by the prior art.
本發明提供一種筆記型電腦、均溫板裝置及其製作方法,其係增加毛細梯度,進而增進散熱效率。 The invention provides a notebook computer, a temperature equalizing plate device and a manufacturing method thereof, which increase the capillary gradient, thereby improving the heat dissipation efficiency.
本發明提供一種筆記型電腦,其包含一主機板、至少一處理器、至少一散熱鰭片、至少一散熱風扇與一均溫板裝置。處理器設於主機板上,散熱鰭片設於主機板上,並與處理器彼此相隔。散熱風扇設於主機板上,並對應散熱鰭片設置。均溫板裝置跨設於處理器與散熱鰭片上。均溫板裝置包含一下殼板、一第一金屬絲絨毛細層、複數個金屬粉末、一第二金屬絲絨毛細層與一上殼板。下殼板具有一蒸發區與一冷凝區,蒸發區設於處理器上,冷凝區設於散熱鰭片上。第一金屬絲絨毛細層設於下殼板上,並覆蓋蒸發區與冷凝區,其中第一金屬絲絨毛細層具有複數個第一空洞。金屬粉末填入蒸發區之正上方的第一空洞中,其中 蒸發區之正上方的每一第一空洞之空間大於其對應之金屬粉末所佔之體積。第二金屬絲絨毛細層設於第一金屬絲絨毛細層上,其中第二金屬絲絨毛細層具有複數個第二空洞,且第二空洞之孔徑大於第一空洞之孔徑。上殼板之底部往下延伸以形成複數個支撐柱,並利用支撐柱固定於第二金屬絲絨毛細層上。 The present invention provides a notebook computer, which includes a motherboard, at least one processor, at least one heat dissipation fin, at least one heat dissipation fan, and a uniform temperature plate device. The processor is arranged on the motherboard, and the heat dissipation fins are arranged on the motherboard and are separated from the processor. The cooling fan is arranged on the motherboard and corresponding to the cooling fins. The uniform temperature board device is arranged across the processor and the heat dissipation fins. The uniform temperature plate device includes a lower shell plate, a first fine metal velvet layer, a plurality of metal powders, a second fine metal velvet layer and an upper shell plate. The lower shell plate has an evaporation zone and a condensation zone, the evaporation zone is arranged on the processor, and the condensation zone is arranged on the radiating fins. The first metal wool fine layer is arranged on the lower shell plate and covers the evaporation zone and the condensation zone, wherein the first metal wool fine layer has a plurality of first cavities. The metal powder is filled into the first cavity directly above the evaporation zone, where The space of each first cavity directly above the evaporation zone is larger than the volume occupied by its corresponding metal powder. The second metal velvet capillary layer is arranged on the first metal velvet capillary layer, wherein the second metal velvet capillary layer has a plurality of second cavities, and the aperture of the second cavity is larger than the aperture of the first cavity. The bottom of the upper shell plate extends downward to form a plurality of supporting pillars, and the supporting pillars are used to fix the second metal wool fine layer.
在本發明之一實施例中,下殼板更包含一邊緣區,邊緣區圍繞蒸發區與冷凝區,邊緣區往上延伸以形成一凸垣,凸垣圍繞第一金屬絲絨毛細層、金屬粉末、第二金屬絲絨毛細層與支撐柱,且上殼板固定於凸垣上。 In an embodiment of the present invention, the lower shell plate further includes an edge zone, the edge zone surrounds the evaporation zone and the condensation zone, the edge zone extends upward to form a convex wall, the convex wall surrounds the first fine metal velvet layer, metal powder , The second metal velvet fine layer and the supporting column, and the upper shell plate is fixed on the convex wall.
在本發明之一實施例中,第二空洞中填有親水性微結構。 In an embodiment of the present invention, the second cavity is filled with hydrophilic microstructures.
在本發明之一實施例中,第二空洞之密度小於第一空洞之密度。 In an embodiment of the present invention, the density of the second cavity is less than the density of the first cavity.
在本發明之一實施例中,金屬粉末之表面積為其對應之第一空洞之截面積的25-75%。 In an embodiment of the present invention, the surface area of the metal powder is 25-75% of the cross-sectional area of the corresponding first cavity.
在本發明之一實施例中,上殼板、下殼板、金屬粉末、支撐柱、第一金屬絲絨毛細層與第二金屬絲絨毛細層之材質皆為相同。 In an embodiment of the present invention, the materials of the upper shell plate, the lower shell plate, the metal powder, the supporting column, the first metal wool fine layer and the second metal wool fine layer are all the same.
在本發明之一實施例中,上殼板、下殼板、金屬粉末、支撐柱、第一金屬絲絨毛細層與第二金屬絲絨毛細層之材質皆為銅、合金銅或無氧銅。 In an embodiment of the present invention, the materials of the upper shell plate, the lower shell plate, the metal powder, the supporting column, the first metal velvet fine layer and the second metal velvet fine layer are all copper, alloy copper or oxygen-free copper.
在本發明之一實施例中,處理器之數量、散熱鰭片之數量與散熱風扇之數量皆為相同。 In an embodiment of the present invention, the number of processors, the number of cooling fins, and the number of cooling fans are all the same.
在本發明之一實施例中,處理器為中央處理器或圖形處理器。 In an embodiment of the present invention, the processor is a central processing unit or a graphics processing unit.
在本發明之一實施例中,筆記型電腦更包含一殼體,其係包覆主機板、處理器、散熱鰭片、散熱風扇與均溫板裝置。 In an embodiment of the present invention, the notebook computer further includes a casing that covers the motherboard, the processor, the heat dissipation fins, the heat dissipation fan and the uniform temperature plate device.
本發明亦提供一種均溫板裝置,其包含一下殼板、一第一金屬絲絨毛細層、複數個金屬粉末、一第二金屬絲絨毛細層與一上殼板。下殼板具有一蒸發區與一冷凝區,蒸發區設於處理器上,冷凝區設於散熱鰭片上。第一金屬絲絨毛細層設於下殼板上,並覆蓋蒸發區與冷凝區,其中第一金屬絲絨毛細層具有複數個第一空洞。金屬粉末填入蒸發區之正上方的第一空洞中,其中蒸發區之正上方的每一第一空洞之空間大於其對應之金屬粉末所佔之體積。第二金屬絲絨毛細層設於第一金屬絲絨毛細層上,其中第二金屬絲絨毛細層具有複數個第二空洞,且第二空洞之孔徑大於第一空洞之孔徑。上殼板之底部往下延伸以形成複數個支撐柱,並利用支撐柱固定於第二金屬絲絨毛細層上。 The present invention also provides a uniform temperature plate device, which includes a lower shell, a first fine layer of metal velvet, a plurality of metal powders, a second fine layer of velvet, and an upper shell. The lower shell plate has an evaporation zone and a condensation zone, the evaporation zone is arranged on the processor, and the condensation zone is arranged on the radiating fins. The first metal wool fine layer is arranged on the lower shell plate and covers the evaporation zone and the condensation zone, wherein the first metal wool fine layer has a plurality of first cavities. The metal powder is filled into the first cavity directly above the evaporation zone, and the space of each first cavity directly above the evaporation zone is larger than the volume occupied by the corresponding metal powder. The second metal velvet capillary layer is arranged on the first metal velvet capillary layer, wherein the second metal velvet capillary layer has a plurality of second cavities, and the aperture of the second cavity is larger than the aperture of the first cavity. The bottom of the upper shell plate extends downward to form a plurality of supporting pillars, and the supporting pillars are used to fix the second metal wool fine layer.
本發明又提供一種均溫板裝置之製作方法,其係包含下列步驟:提供一下殼板,其具有一蒸發區與一冷凝區,並形成一第一金屬絲絨毛細層於下殼板上,並利用第一金屬絲絨毛細層覆蓋蒸發區與冷凝區,其中第一金屬絲絨毛細層具有複數個第一空洞;形成複數個金屬粉末於蒸發區之正上方的第一空洞中,其中蒸發區之正上方的每一第一空洞之空間大於其對應之金屬粉末所佔之體積;形成一第二金屬絲絨毛細層於第一金屬絲絨毛細層上,其中第二金屬絲絨毛細層具有複數個第二空洞,且第二空洞之孔徑大於第一空洞之孔徑;對第一金屬絲絨毛細層、金屬粉末與第二金屬絲絨毛細層進行高溫燒結,以固定金屬粉末與第二金屬絲絨毛細層於第一金屬絲絨毛細層上;以及提供一上殼板,其底部往下延伸以形成複數個支撐柱,並利用支撐柱固定於第二金屬絲絨毛細層上。 The present invention also provides a method for manufacturing a uniform temperature plate device, which includes the following steps: providing a lower shell plate, which has an evaporation zone and a condensation zone, and forming a first fine layer of metal wool on the lower shell plate, and The evaporation zone and the condensation zone are covered by the first fine metal velvet layer, wherein the first fine metal velvet layer has a plurality of first cavities; a plurality of metal powders are formed in the first cavities directly above the evaporation zone, and the evaporation zone is directly above the evaporation zone. The space of each first cavity above is larger than the volume occupied by the corresponding metal powder; a second metal velvet capillary layer is formed on the first metal velvet capillary layer, wherein the second metal velvet capillary layer has a plurality of second cavities , And the pore size of the second cavity is larger than the pore size of the first cavity; high-temperature sintering of the first fine metal velvet layer, metal powder, and second fine metal velvet layer to fix the fine metal powder and the second fine metal velvet layer on the first metal On the velvet hair layer; and an upper shell plate is provided, the bottom of which extends downward to form a plurality of support columns, and the support columns are used to fix the second metal velvet layer.
在本發明之一實施例中,在形成金屬粉末於蒸發區之正上方的第一空洞中之步驟中,噴塗金屬粉末於蒸發區之正上方的第一空洞 中。 In one embodiment of the present invention, in the step of forming the metal powder in the first cavity directly above the evaporation zone, spraying the metal powder in the first cavity directly above the evaporation zone middle.
在本發明之一實施例中,在形成金屬粉末於蒸發區之正上方的第一空洞中之步驟中,利用一多孔性材料沾附金屬粉末,以轉印金屬粉末於蒸發區之正上方的第一空洞中。 In an embodiment of the present invention, in the step of forming the metal powder in the first cavity directly above the evaporation zone, a porous material is used to adhere the metal powder to transfer the metal powder directly above the evaporation zone In the first hole.
在本發明之一實施例中,第一金屬絲絨毛細層、金屬粉末與第二金屬絲絨毛細層以攝氏700-800度進行高溫燒結。 In an embodiment of the present invention, the first fine metal velvet layer, the metal powder, and the second fine metal velvet layer are sintered at a high temperature at 700-800 degrees Celsius.
在本發明之一實施例中,在固定金屬粉末與第二金屬絲絨毛細層於第一金屬絲絨毛細層上之步驟後,更包含下列步驟:在第一空洞中填滿易揮發性溶液,並藉此覆蓋金屬粉末;利用一多孔性材料沾附與易揮發性溶液不相溶之親水性溶凝膠(sol-gel),並將親水性溶凝膠塗布於第二空洞中;以及對易揮發性溶液與親水性溶凝膠進行高溫燒結,以揮發易揮發性溶液,並將親水性溶凝膠轉化為親水性微結構,接著再進行提供上殼板之步驟。 In an embodiment of the present invention, after the step of fixing the metal powder and the second metal velvet capillary layer on the first metal velvet capillary layer, the method further includes the following steps: filling the first cavity with a volatile solution, and To cover the metal powder; use a porous material to adhere to the hydrophilic sol-gel that is incompatible with the volatile solution, and coat the hydrophilic sol-gel in the second cavity; and The volatile solution and the hydrophilic hydrogel are sintered at a high temperature to volatilize the volatile solution, and the hydrophilic hydrogel is converted into a hydrophilic microstructure, and then the step of providing an upper shell plate is performed.
在本發明之一實施例中,易揮發性溶液與親水性溶凝膠以攝氏500-600度進行高溫燒結。 In an embodiment of the present invention, the volatile solution and the hydrophilic solvogel are sintered at a high temperature at 500-600 degrees Celsius.
在本發明之一實施例中,易揮發性溶液為酒精或丙酮。 In an embodiment of the present invention, the volatile solution is alcohol or acetone.
在本發明之一實施例中,親水性溶凝膠之成分為異丙醇基底氧化物(IPA-based oxide)。 In an embodiment of the present invention, the component of the hydrophilic lyogel is IPA-based oxide.
基於上述,本發明之實施例於金屬絲絨毛細層中填入金屬粉末與親水性微結構,同時設計金屬絲絨毛細層之上層具有大空洞,下層具有小空洞,以增加毛細梯度,進而增進散熱效率與有助於薄化筆記型電腦。 Based on the above, the embodiment of the present invention fills the metal velvet capillary layer with metal powder and hydrophilic microstructures, and at the same time, the metal velvet capillary layer is designed to have large cavities in the upper layer and small cavities in the lower layer to increase the capillary gradient and improve the heat dissipation efficiency. And help to thin the notebook computer.
茲為使 貴審查委員對本發明的結構特徵及所達成的功效更有進一步的瞭解與認識,謹佐以較佳的實施例圖及配合詳細的說明,說明如後: In order to enable your reviewers to have a better understanding and understanding of the structural features of the present invention and the effects achieved, I would like to provide a better embodiment diagram and detailed descriptions. The description is as follows:
10:均溫板裝置 10: Uniform temperature plate device
12:下殼板 12: Lower shell
122:蒸發區 122: Evaporation Zone
124:冷凝區 124: Condensation zone
126:邊緣區 126: fringe zone
128:凸垣 128: Protruding Wall
14:第一金屬絲絨毛細層 14: The first fine layer of metal velvet
142:第一空洞 142: The First Hole
16:金屬粉末 16: metal powder
18:第二金屬絲絨毛細層 18: The second fine layer of metal velvet
182:第二空洞 182: The Second Hole
20:上殼板 20: Upper shell
202:支撐柱 202: support column
22:親水性微結構 22: Hydrophilic microstructure
24:易揮發性溶液 24: Volatile solution
26:親水性溶凝膠 26: Hydrophilic solvogel
30:筆記型電腦 30: laptop
32:主機板 32: Motherboard
34:處理器 34: processor
36:散熱鰭片 36: cooling fins
38:散熱風扇 38: cooling fan
40:殼體 40: shell
第1圖為本發明之均溫板裝置之一實施例之立體圖。 Figure 1 is a perspective view of an embodiment of the uniform temperature plate device of the present invention.
第2圖為本發明之均溫板裝置之一實施例之分解圖。 Figure 2 is an exploded view of an embodiment of the uniform temperature plate device of the present invention.
第3圖為本發明之沿第1圖之A-A’線之一實施例之結構剖視圖。 Figure 3 is a cross-sectional view of an embodiment of the present invention along the line A-A' in Figure 1.
第4(a)圖至第4(e)圖為本發明之製作均溫板裝置之一實施例之各步驟結構剖視圖。 Figures 4(a) to 4(e) are cross-sectional views of the structure of each step of an embodiment of the apparatus for manufacturing a uniform temperature plate of the present invention.
第5(a)圖至第5(h)圖為本發明之製作均溫板裝置之另一實施例之各步驟結構剖視圖。 Fig. 5(a) to Fig. 5(h) are cross-sectional views of the structure of each step of another embodiment of the apparatus for manufacturing a uniform temperature plate of the present invention.
第6圖為本發明之筆記型電腦之一實施例之俯視圖。 Figure 6 is a top view of an embodiment of the notebook computer of the present invention.
第7圖為本發明之沿第5圖之B-B’線之一實施例之結構剖視圖。 Fig. 7 is a cross-sectional view of an embodiment of the present invention along the line B-B' in Fig. 5.
本發明之實施例將藉由下文配合相關圖式進一步加以解說。盡可能的,於圖式與說明書中,相同標號係代表相同或相似構件。於圖式中,基於簡化與方便標示,形狀與厚度可能經過誇大表示。可以理解的是,未特別顯示於圖式中或描述於說明書中之元件,為所屬技術領域中具有通常技術者所知之形態。本領域之通常技術者可依據本發明之內容而進行多種之改變與修改。 The embodiments of the present invention will be further explained by following relevant drawings. As far as possible, in the drawings and the description, the same reference numerals represent the same or similar components. In the drawings, the shape and thickness may be exaggerated based on simplification and convenient labeling. It can be understood that the elements not specifically shown in the drawings or described in the specification are in the form known to those skilled in the art. Those skilled in the art can make various changes and modifications based on the content of the present invention.
當一個元件被稱為『在...上』時,它可泛指該元件直接在其他元件上,也可以是有其他元件存在於兩者之中。相反地,當一個元件被稱為『直接在』另一元件,它是不能有其他元件存在於兩者之中間。如本文所用,詞彙『及/或』包含了列出的關聯項目中的一個或多個的任何組合。 When an element is called "on", it can generally mean that the element is directly on other elements, or there can be other elements existing in both. Conversely, when an element is said to be "directly in" another element, it cannot have other elements in between. As used herein, the term "and/or" includes any combination of one or more of the listed related items.
於下文中關於“一個實施例”或“一實施例”之描述係指關於至少一實施例內所相關連之一特定元件、結構或特徵。因此,於下文中多處所出現 之“一個實施例”或“一實施例”之多個描述並非針對同一實施例。再者,於一或多個實施例中之特定構件、結構與特徵可依照一適當方式而結合。 The following description of "one embodiment" or "an embodiment" refers to at least one specific element, structure, or feature related to the embodiment. Therefore, it appears in many places below Multiple descriptions of "one embodiment" or "an embodiment" are not directed to the same embodiment. Furthermore, specific components, structures, and features in one or more embodiments can be combined in an appropriate manner.
第1圖為本發明之均溫板裝置之一實施例之立體圖。以下請參閱第1圖,並介紹本發明之均溫板裝置10之一實施例,其形狀可為長方形或T型,但本發明不限於此。
Figure 1 is a perspective view of an embodiment of the uniform temperature plate device of the present invention. Please refer to Figure 1 below to introduce an embodiment of the uniform
第2圖為本發明之均溫板裝置之一實施例之分解圖,第3圖為本發明之沿第1圖之A-A’線之一實施例之結構剖視圖。以下請同時參閱第2圖與第3圖。在本發明之一實施例中,均溫板裝置10包含一下殼板12、一第一金屬絲絨毛細層14、複數個金屬粉末16、一第二金屬絲絨毛細層18與一上殼板20,其中金屬粉末16可為球狀,樹枝狀或不規則狀,但本發明不限於此。
Fig. 2 is an exploded view of an embodiment of the uniform temperature plate device of the present invention, and Fig. 3 is a structural cross-sectional view of an embodiment of the present invention along the line A-A' in Fig. 1. Please refer to Figure 2 and Figure 3 at the same time below. In an embodiment of the present invention, the uniform
下殼板12具有一蒸發區122與一冷凝區124。第一金屬絲絨毛細層14設於下殼板12上,並覆蓋蒸發區122與冷凝區124,其中第一金屬絲絨毛細層14具有複數個第一空洞142。所有金屬粉末16填入蒸發區122之正上方的第一空洞142中,其中蒸發區122之正上方的每一第一空洞142之空間大於其對應之金屬粉末16所佔之體積。舉例來說,金屬粉末16之表面積為其對應之第一空洞142之截面積的25-75%,較佳為50%。金屬粉末16的存在可以在蒸發區122內形成較大的毛細壓力梯度,使回流液體受到較大的毛細力而更快速地補充至蒸發區122,以提升蒸發區122的抗乾化能力與均溫板裝置10之散熱效率。因此,蒸發區122可保持有充足的液體來進行相變化,進而降低蒸發區122內的液體在汽化後,來不及補充液體到蒸發區122,使熱源持續升溫的機率。由於散熱效率得以提升,所以均溫板裝置10之厚度也可以設計地較薄。第二金屬絲絨毛細層18設於第一金屬絲絨毛細層14上,其中第二金屬絲絨毛
細層18具有複數個第二空洞182,且第二空洞182之孔徑大於第一空洞142之孔徑,以增加回流液體之流量。在本發明之某些實施例中,所有第二空洞182之密度可小於所有第一空洞142之密度,以增加液體從冷凝區124流向蒸發區122的機率。上殼板20之底部往下延伸以形成複數個支撐柱202,並利用所有支撐柱202固定於第二金屬絲絨毛細層18上。所有支撐柱202周圍的空間都是互相連通的,以供汽化後液體流動。為了具有較佳的散熱效率,上殼板20、下殼板12、所有金屬粉末16、所有支撐柱202、第一金屬絲絨毛細層14與第二金屬絲絨毛細層18之材質皆可為相同,例如為銅、合金銅或無氧銅,但本發明不限於此。
The
為了密封所有金屬粉末16、所有支撐柱202、第一金屬絲絨毛細層14與第二金屬絲絨毛細層18,使液體不會散逸到外部,下殼板12可更包含一邊緣區126,邊緣區126圍繞蒸發區122與冷凝區124,邊緣區126往上延伸以形成一凸垣128,凸垣128圍繞第一金屬絲絨毛細層14、所有金屬粉末16、第二金屬絲絨毛細層18與所有支撐柱202,且上殼板20固定於凸垣128上。此外,在本發明之某些實施例中,所有第二空洞182中可填有親水性微結構22,以改善親水性,使液體更快流回蒸發區122。
In order to seal all the
當蒸發區122之下方設有熱源,且冷凝區124之下方設有冷卻源時,蒸發區122上的水分會逐漸被熱源蒸發,以形成水蒸氣並往上方流動,直到佈滿支撐柱202周圍的空間。冷卻源可以降低自身上方的水蒸氣之溫度,當水蒸氣降溫時,便會形成水滴落下。當冷凝區124之上方的水蒸氣減少時,蒸發區122之上方的水蒸氣便會往冷凝區124之上方流動。冷凝區124上累積的水滴會藉由金屬粉末16、親水性微結構22、第一金屬絲絨毛細層14與第二金屬絲絨毛細層18之內聚力與毛細力,向蒸發區122移動,
以完成一個散熱循環。
When a heat source is provided under the
第4(a)圖至第4(e)圖為本發明之製作均溫板裝置之一實施例之各步驟結構剖視圖。以下請參閱第4(a)圖至第4(e)圖,以介紹本發明之均溫板裝置之製作方法之一實施例。首先如第4(a)圖所示,提供下殼板12,其具有蒸發區122與冷凝區124,並形成第一金屬絲絨毛細層14於下殼板12上,並利用第一金屬絲絨毛細層14覆蓋蒸發區122與冷凝區124,其中第一金屬絲絨毛細層14具有複數個第一空洞142。接著如第4(b)圖所示,形成金屬粉末16於蒸發區122之正上方的第一空洞142中,其中蒸發區122之正上方的每一第一空洞142之空間大於其對應之金屬粉末16所佔之體積。在一實施例中,噴塗所有金屬粉末16於蒸發區122之正上方的第一空洞142中。在另一實施例中,利用一多孔性材料,例如,但不限於多孔性海綿或石墨沾附所有金屬粉末16,以轉印所有金屬粉末16於蒸發區122之正上方的第一空洞142中。再來,如第4(c)圖所示,形成第二金屬絲絨毛細層18於第一金屬絲絨毛細層14上,其中第二金屬絲絨毛細層18具有複數個第二空洞182,且第二空洞182之孔徑大於第一空洞142之孔徑。此外,所有第二空洞182之密度可小於所有第一空洞142之密度。形成完後,如第4(d)圖所示,對第一金屬絲絨毛細層14、所有金屬粉末16與第二金屬絲絨毛細層18進行高溫燒結,以固定所有金屬粉末16與第二金屬絲絨毛細層18於第一金屬絲絨毛細層14上。舉例來說,第一金屬絲絨毛細層14、所有金屬粉末16與第二金屬絲絨毛細層18以攝氏700-800度進行高溫燒結,但高溫燒結的溫度並不限於攝氏700-800度,高溫燒結的溫度係用於固定所有金屬粉末16與第二金屬絲絨毛細層18於第一金屬絲絨毛細層14上。最後,如第4(e)圖所示,提供上殼板20,其底部往下延伸以形成複數個支撐柱202,並利用所有支撐柱202固定於
第二金屬絲絨毛細層18上。
Figures 4(a) to 4(e) are cross-sectional views of the structure of each step of an embodiment of the apparatus for manufacturing a uniform temperature plate of the present invention. Please refer to Fig. 4(a) to Fig. 4(e) below to introduce an embodiment of the method for manufacturing the uniform temperature plate device of the present invention. First, as shown in Figure 4(a), a
第5(a)圖至第5(h)圖為本發明之製作均溫板裝置之另一實施例之各步驟結構剖視圖。以下請參閱第5(a)圖至第5(h)圖,以介紹均溫板裝置之製作方法之另一實施例。第5(a)圖至第5(d)圖之步驟分別與第4(a)圖至第4(d)圖之步驟相同,於此不再贅述。完成第5(d)圖之步驟後,為了進一步增加散熱效率更可進行下列步驟: Fig. 5(a) to Fig. 5(h) are cross-sectional views of the structure of each step of another embodiment of the apparatus for manufacturing a uniform temperature plate of the present invention. Please refer to Fig. 5(a) to Fig. 5(h) below to introduce another embodiment of the manufacturing method of the uniform temperature plate device. The steps in Fig. 5(a) to Fig. 5(d) are the same as those in Fig. 4(a) to Fig. 4(d) respectively, and will not be repeated here. After completing the steps in Figure 5(d), in order to further increase the heat dissipation efficiency, the following steps can be performed:
如第5(e)圖所示,在所有第一空洞142中填滿易揮發性溶液24,並藉此覆蓋所有金屬粉末16,及填滿金屬粉末16之空隙,以將金屬粉末16與其他外部結構隔離,其中易揮發性溶液24可為酒精或丙酮,但本發明並不以此為限。在所有第一空洞142中填滿易揮發性溶液24,並藉此覆蓋所有金屬粉末16,及填滿金屬粉末16之空隙之方式,可以地心引力及毛細拉力實現,但本發明不限於此。接著,如第5(f)圖所示,利用一多孔性材料,例如,但不限於多孔性海綿或石墨沾附與易揮發性溶液24不相溶之具有低熱阻之親水性溶凝膠(sol-gel)26,並將親水性溶凝26膠塗布於所有第二空洞182中。舉例來說,親水性溶凝膠26之成分可為異丙醇基底氧化物(IPA-based oxide)或其他適合的親水性成分。因為易揮發性溶液24與親水性溶凝膠26具有不同黏度,所以易揮發性溶液24能有效隔離親水性溶凝膠26與金屬粉末16。再來,如第5(g)圖所示,對易揮發性溶液24與親水性溶凝膠26進行高溫燒結,以揮發或燒乾易揮發性溶液24,並將親水性溶凝膠26轉化為親水性微結構22。舉例來說,對易揮發性溶液24與親水性溶凝膠26以攝氏500-600度進行高溫燒結,但高溫燒結的溫度並不限於攝氏700-800度,高溫燒結的溫度可根據需求而調整。在本發明之某些實施例中,易揮發性溶液24的量盡量控制不要觸碰到親水性溶凝膠26,如此可以增加親水性微結構22的厚度。此外,根據
第一空洞142的體積可以計算所需要的易揮發性溶液24的量,並以定量注射器注入易揮發性溶液24,以避免觸碰到親水性溶凝膠26。最後,如第5(h)圖所示,提供上殼板20,其底部往下延伸以形成複數個支撐柱202,並利用所有支撐柱202固定於第二金屬絲絨毛細層18上。
As shown in Figure 5(e), all the
第6圖為本發明之筆記型電腦之一實施例之俯視圖。第7圖為本發明之沿第5圖之B-B’線之一實施例之結構剖視圖。以下請參閱第6圖與第7圖,以介紹本發明之筆記型電腦之一實施例。筆記型電腦30包含一主機板32、至少一處理器34、至少一散熱鰭片36、至少一散熱風扇38與一均溫板裝置10,其中處理器34可為中央處理器或圖形處理器,但本發明並不以此為限,處理器34亦可為其他會發熱的電子裝置。處理器34之數量、散熱鰭片36之數量與散熱風扇38之數量皆不限定,處理器34之數量、散熱鰭片36之數量與散熱風扇38之數量可皆為相同,即皆為一或皆為二以上。此外,在本發明之某些實施例中,筆記型電腦30更可包含一殼體40,以達到可攜式的目的。第6圖中所示的結構可應用於第1圖或本發明中的其它實施例,但是不限於此。
Figure 6 is a top view of an embodiment of the notebook computer of the present invention. Fig. 7 is a cross-sectional view of an embodiment of the present invention along the line B-B' in Fig. 5. Please refer to FIGS. 6 and 7 below to introduce an embodiment of the notebook computer of the present invention. The
處理器34、散熱鰭片36與散熱風扇38皆設於主機板32上,處理器34與散熱鰭片36彼此相隔,散熱風扇38對應散熱鰭片36設置。均溫板裝置10則跨設於處理器34與散熱鰭片36上。均溫板裝置10之內部結構與前述實施例相同,於此不再贅述。殼體40則包覆主機板32、處理器34、散熱鰭片36、散熱風扇38與均溫板裝置10。在高瓦數筆記型電腦中,處理器34設置在主機板32之中央,散熱鰭片36靠近主機板32之邊緣,故處理器34與散熱鰭片36之間的距離較遠,加上現今筆記型電腦有輕薄的要求,配合本發明之均溫板裝置10,可符合輕薄的趨勢,在提升散熱效率的前提下,進一步薄化筆記型電腦30之厚度。
The
綜上所述,上述實施例於金屬絲絨毛細層中填入金屬粉末與親水性微結構,同時設計金屬絲絨毛細層之上層具有大空洞,下層具有小空洞,以增加毛細梯度,進而增進散熱效率與有助於薄化筆記型電腦。 To sum up, in the above embodiment, the metal velvet capillary layer is filled with metal powder and hydrophilic microstructure, and the metal velvet capillary layer is designed to have large cavities in the upper layer and small cavities in the lower layer to increase the capillary gradient and improve the heat dissipation efficiency. And help to thin the notebook computer.
以上所述者,僅為本發明一較佳實施例而已,並非用來限定本發明實施之範圍,故舉凡依本發明申請專利範圍所述之形狀、構造、特徵及精神所為之均等變化與修飾,均應包括於本發明之申請專利範圍內。 The above is only a preferred embodiment of the present invention, and is not used to limit the scope of implementation of the present invention. Therefore, all the shapes, structures, characteristics and spirits described in the scope of the patent application of the present invention are equally changed and modified. , Should be included in the scope of patent application of the present invention.
10:均溫板裝置 10: Uniform temperature plate device
12:下殼板 12: Lower shell
122:蒸發區 122: Evaporation Zone
124:冷凝區 124: Condensation zone
126:邊緣區 126: fringe zone
128:凸垣 128: Protruding Wall
14:第一金屬絲絨毛細層 14: The first fine layer of metal velvet
142:第一空洞 142: The First Hole
16:金屬粉末 16: metal powder
18:第二金屬絲絨毛細層 18: The second fine layer of metal velvet
182:第二空洞 182: The Second Hole
20:上殼板 20: Upper shell
202:支撐柱 202: support column
22:親水性微結構 22: Hydrophilic microstructure
Claims (25)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109114405A TWI747262B (en) | 2020-04-29 | 2020-04-29 | Notebook computer, vapor chamber device and method for fabricating the vapor chamber device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109114405A TWI747262B (en) | 2020-04-29 | 2020-04-29 | Notebook computer, vapor chamber device and method for fabricating the vapor chamber device |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202142995A TW202142995A (en) | 2021-11-16 |
TWI747262B true TWI747262B (en) | 2021-11-21 |
Family
ID=79907963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109114405A TWI747262B (en) | 2020-04-29 | 2020-04-29 | Notebook computer, vapor chamber device and method for fabricating the vapor chamber device |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI747262B (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9163883B2 (en) * | 2009-03-06 | 2015-10-20 | Kevlin Thermal Technologies, Inc. | Flexible thermal ground plane and manufacturing the same |
TWM568349U (en) * | 2018-01-18 | 2018-10-11 | 奇鋐科技股份有限公司 | Middle member of heat dissipation device and the heat dissipation device |
US20190390919A1 (en) * | 2014-09-15 | 2019-12-26 | Kelvin Thermal Technologies, Inc. | Polymer-based microfabricated thermal ground plane |
-
2020
- 2020-04-29 TW TW109114405A patent/TWI747262B/en active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9163883B2 (en) * | 2009-03-06 | 2015-10-20 | Kevlin Thermal Technologies, Inc. | Flexible thermal ground plane and manufacturing the same |
US20190390919A1 (en) * | 2014-09-15 | 2019-12-26 | Kelvin Thermal Technologies, Inc. | Polymer-based microfabricated thermal ground plane |
TWM568349U (en) * | 2018-01-18 | 2018-10-11 | 奇鋐科技股份有限公司 | Middle member of heat dissipation device and the heat dissipation device |
Also Published As
Publication number | Publication date |
---|---|
TW202142995A (en) | 2021-11-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN105865241B (en) | A kind of ultra-thin soaking plate and preparation method thereof | |
US7578338B2 (en) | Heat dissipating apparatus having micro-structure layer and method of fabricating the same | |
US7603775B2 (en) | Heat spreader with vapor chamber and method of manufacturing the same | |
US9685393B2 (en) | Phase-change chamber with patterned regions of high and low affinity to a phase-change medium for electronic device cooling | |
JP2006503436A (en) | Plate heat transfer device and manufacturing method thereof | |
CN211429852U (en) | Heat dissipation plate and electronic device with same | |
TWI649528B (en) | Diffusion method of small area cold surface and its flat cold plate | |
TWI235817B (en) | Heat-dissipating module | |
Feng et al. | A novel ultra-large flat plate heat pipe manufactured by thermal spray | |
KR20030024916A (en) | Refrigeration device and a method for producing the same | |
JP5765045B2 (en) | Loop heat pipe and manufacturing method thereof | |
WO2005071747A1 (en) | Heat pipe radiator of heat-generating electronic component | |
Gukeh et al. | Low-profile heat pipe consisting of wick-lined and non-adiabatic wickless wettability-patterned surfaces | |
TWM262755U (en) | Heat sink module for slim electronic equipment | |
TWI747262B (en) | Notebook computer, vapor chamber device and method for fabricating the vapor chamber device | |
Sun et al. | Thermal performance of a vapor chamber with synergistic effects of droplet jumping and pillared-wick capillarity | |
JP3185277U (en) | Support structure for heat dissipation unit | |
TW201104201A (en) | Heat dissipation device and manufacturing method thereof | |
US20140174704A1 (en) | Heat dissipation device | |
JP3941606B2 (en) | Cooling device, evaporator substrate, electronic device and cooling device manufacturing method | |
JPH10238973A (en) | Thin composite plate heat pipe | |
TWM629671U (en) | Immersion-cooled heat-dissipation structure | |
Liu et al. | Experimental study in thermal expansion devices of phase-change material coupled to vapor chamber with gradient wettability wick | |
Wei et al. | An improved vapor chamber with enhanced two-phase transport by using structured surfaces | |
TWM384507U (en) | Vapor chamber device with metal mesh heat-dissipating structure |