TWI744956B - Substrate carrier apparatus, and method for correcting position of hand of substrate carrier apparatus - Google Patents

Abstract

The subject of the present invention is to provide a technique capable of moving the hand with higher position accuracy. The substrate conveying device CR2 for conveying substrates includes a hand 46, a rotating mechanism 42, a rotation detecting section 47, a first linear motion mechanism 43, a first detecting section 48, a second linear motion mechanism 44, and a second detecting section 49. The substrate is placed on the hand 46. The rotating mechanism 42 includes a rotating body 421 that is linked to the hand 46 and rotates the rotating body 421 around the rotation axis CA1. The rotation detection unit 47 detects the rotation position of the rotating body 421. The first linear motion mechanism 43 includes a first moving body 431 linked with the hand 46, and moves the first moving body 431 along the first moving direction D1. The first detection unit 48 detects the position of the first moving body 431. The second linear motion mechanism 44 includes a second moving body 441 linked with the hand 46 and moves the second moving body 441 in the second moving direction. The second detection unit 49 detects the position of the second moving body 441.

Description

Substrate conveying device and method for correcting the hand position of the substrate conveying device

The present invention relates to a substrate conveying device and a method for correcting the position of the hands of the substrate conveying device.

In the past, a direct-acting substrate transfer device for transferring substrates has been proposed (Patent Document 1 to Patent Document 3). Patent Document 1 discloses a substrate transfer robot including a direct-acting arm. The substrate transfer robot includes a main body and a direct-acting arm provided on the main body. A fork is provided at the front end of the direct-acting arm. Place the substrate on the fork. The direct-acting arm is driven by a belt and a motor. The direct-acting arm expands and contracts to transport the substrate placed on the fork to the desired position.

In addition, in Patent Document 2, the substrate conveying device includes a hand, a lift shaft drive section, a linear shaft drive section, and a swing shaft drive section. Place the substrate on the hand. The linear axis driving part makes the hand move back and forth in one horizontal direction. The swivel axis drive unit makes the linear axis drive unit swivel around a vertical axis of rotation, thereby making the hand swivel. The lifting shaft drive unit raises and lowers the swing shaft drive unit, thereby lifting the linear shaft drive unit and the hand. Such a substrate transport device can adjust the position of the hand three-dimensionally.

[Prior Technical Literature]

[Patent Literature]

[Patent Document 1] JP 2009-23021 A.

[Patent Document 2] JP 2011-159884 A.

[Patent Document 3] Japanese Patent No. 4980978.

In the case where the substrate conveying device carries the substrate into the substrate processing device, the position of the substrate in the substrate processing device may become a problem. For example, there may be cases where a spin chuck is provided in the substrate processing apparatus to hold the substrate. In this case, it is desirable that the substrate transport device transports the substrate to the substrate processing device in such a manner that the center of the substrate coincides with the rotation center of the rotation jig.

In Patent Document 1, a belt is provided in the driving force transmission system from the motor to the direct-acting arm. When the belt is an elastic body, the position accuracy of the direct-acting arm is lowered.

In addition, in Patent Document 2, the substrate conveying device adjusts the position of the substrate in the horizontal plane by the two shafts of the linear axis drive unit and the gyration drive unit. In the adjustment of the two axes, there is a limit to the improvement of the accuracy of the hand position.

Therefore, the object of the present invention is to provide a technology capable of moving the hand with higher position accuracy.

The first aspect of the substrate conveying device is: for conveying substrates, and equipped with: a hand for placing the substrate; a rotating mechanism including a rotating body linked with the hand and allowing the rotating body to go around Rotates along the axis of rotation in the vertical direction; the rotation detection unit detects the rotation position of the aforementioned rotating body; the first linear motion mechanism includes a first moving body linked with the aforementioned hand, and makes the aforementioned first moving body follow The first moving direction that crosses the vertical direction moves; the first detecting part detects the position of the first moving body; the second linear moving mechanism includes the second moving body linked with the hand, and makes the second moving body The moving body moves in a second moving direction that intersects the first moving direction and the vertical direction; and a second detection unit that detects the position of the second moving body.

The second aspect of the substrate conveying device is that in the first aspect of the substrate conveying device, the rotating mechanism includes a motor directly connected to the rotating body.

The first aspect of the method of correcting the hand position of the substrate conveying device is: to correct the position of the hand when the substrate conveying device of the first aspect or the substrate conveying device of the second aspect transfers the substrate to the substrate holder The method also includes: a first step of using the substrate transport device according to the teaching data to move the hand for placing the substrate, and move the hand to be higher than the substrate holding portion Position; The second step is to capture the substrate placed on the hand stopped at the predetermined position by a camera and obtain image data; the third step is to detect the center of the substrate based on the image data ; And the fourth step is to correct the predetermined position and correct the teaching material in such a way that the position of the center of the substrate is close to the central axis of the substrate holding portion.

The second aspect of the method for correcting the hand position of the substrate conveying device is to correct the position of the hand when the substrate conveying device of the first aspect or the substrate conveying device of the second aspect transfers the substrate to the substrate holder The method includes: the first step, which is used by the aforementioned substrate conveying device for placement The hand of the substrate is moved to a predetermined position above the substrate holding portion; the second step is to lower the hand and place the substrate on the substrate by the vertical drive mechanism included in the substrate conveying device The holding part; the third step is to hold the substrate by the substrate holding part; the fourth step is to photograph the substrate held by the substrate holding part by a camera and obtain image data; the fifth step is to obtain based on the image data The placement position of the substrate is obtained by shifting the center of the substrate relative to the central axis of the substrate holding portion to the opposite side of the offset direction of the substrate generated when the substrate holding portion holds the substrate Obtained; The sixth step is that the substrate conveying device replaces the substrate in the placement position; and the seventh step is that the substrate holding portion holds the substrate.

The third aspect of the method for correcting the position of the hands of the substrate conveying device is: in the second aspect of the method of correcting the position of the hands of the substrate conveying device, the fifth step includes the following steps: detecting based on the aforementioned image data The offset amount of the substrate and the offset direction generated when the substrate holding portion is held; the predetermined position is corrected based on the offset and the offset direction, and the position when viewed from above is calculated to be equal to the placement position Corrected position; the substrate holding portion releases the holding of the substrate, and the vertical drive mechanism raises the hand to the predetermined position and lifts the substrate; at least the drive is set to be closer to the hand than the second direct motion mechanism The rotating mechanism and the first linear motion mechanism move the hand to the corrected position; and the vertical drive mechanism lowers the hand and places the substrate on the substrate holding portion.

The fourth aspect of the method for correcting the position of the hands of the substrate conveying device is: in the second aspect or the third aspect of the method of correcting the position of the hands of the substrate conveying device, the fifth step is based on the image The machine learning of the data finds the aforementioned placement position.

The fifth aspect of the method of correcting the position of the hands of the substrate conveying device is: in the fourth aspect of the method of correcting the position of the hands of the substrate conveying device, in the fifth step, it is compared with the type and plural of the aforementioned substrates. A plurality of machine learning parts corresponding to at least any one of the aforementioned substrate holding parts selects the aforementioned machine learning part corresponding to at least one of the type of the aforementioned substrate to be transported and the aforementioned substrate holding part of the transport destination, and The placement position is obtained using the selected machine learning unit.

According to the first aspect of the substrate conveying device, the position of the horizontal plane of the hand can be adjusted by the rotation mechanism, the first linear motion mechanism, and the second linear motion mechanism. That is, the position of the horizontal plane of the hand can be adjusted by three axes. Therefore, the position accuracy of the hand can be improved. Furthermore, since the rotation detection unit, the first detection unit, and the second detection unit are provided, it is possible to control the hand with high position accuracy for each axis.

According to the second aspect of the substrate conveying device, the rotation position of the rotating body can be controlled with high precision.

According to the first aspect of the method for correcting the position of the hand of the substrate conveying device, the predetermined position is corrected based on the image data taken by the camera. Therefore, it is possible to accurately approach the center of the substrate to the central axis of the substrate holding portion and place the substrate on the substrate holding portion by the subsequent transportation process following the teaching materials.

According to the second aspect of the method for correcting the position of the hand of the substrate transport device, the substrate is newly placed in a placement position where the center of the substrate is shifted from the central axis to the opposite side of the offset direction. Therefore, when the substrate holding portion again holds the substrate, the center of the substrate is shifted in the offset direction, that is, the center of the substrate is shifted toward the central axis side of the substrate holding portion. With this, the center of the substrate can be approached to The central axis. In other words, the displacement of the substrate caused by the holding of the substrate holding portion can be absorbed, and the center of the substrate can be brought close to the central axis of the substrate holding portion with high accuracy.

According to the third aspect of the hand position correction method of the substrate conveying device, since the rotation mechanism and the first driving mechanism provided near the hand are preferentially driven, the hand can be moved to a predetermined position with high accuracy.

According to the fourth aspect of the hand position correction method of the substrate conveying device, since machine learning is used, the offset amount and the offset direction can be obtained with high accuracy.

According to the fifth aspect of the hand position correction method of the substrate conveying device, since the machine learning part corresponding to the type of the substrate or the substrate holding part is selected, the placement position can be obtained with high accuracy.

1,1A: Substrate processing equipment

2, 2a: Index area

3,3a: Processing area

3A: The first processing module

3B: The second processing module

3C: The third processing module

3T: Handling module

7: Control Department

20: substrate container

32: Board holding part

36: Shuttle handling device

41: Abutment

42: Rotating mechanism

43: The first permanent moving mechanism

44: The second direct-acting mechanism

45: Vertical drive mechanism

46, 46A, 46B: hands

47: Rotation detection section

48: The first detection department

49: The second detection department

51: Rotation fixture

51a: Rotation base

51b: Fixture pin

51c: Rotation axis

51d: Rotation motor

52: Treatment hood

53: Nozzle

54: Piping

55: Treatment liquid supply source

56: Valve

57: Camera

71: CPU

72: ROM

73: RAM

74: Memory Department

75: bus wiring

76: Input section

77: Display

321: Support

411: Pillar

421: Rotating Body

422,432,442: fixed body

423,433,452: Motor

431: First Moving Body

434,444: strap

441: second moving body

445: Linear guide

451: Elevating Body

453, ST1 to ST6: Taiwan

461: finger

462: Connection member

463: Clamping protrusion

464: pressing part

465: deposit amount detection department

710, 710_1, 710_2, 710_3 to 710_n, 710_m: Machine Learning Department

720: Transport Control Department

CA1, X1: axis of rotation

CR1: The first handling robot

CR2: Second handling robot

CRA: Handling robot

D1: The first moving direction

D2: Second moving direction

IR: Index Robot

L: Wiring

P1 to P18, P1A to P12A: processing unit

Pc1, Pc2: Center

PS1: The first delivery part

PS2: The second transfer part

PSA: Transmission Department

R1: radius of curvature

SP1: Stop position

TW1 to TW6: Treatment tower

W, W1, W2: substrate

△H: Poor

△P: Offset

Fig. 1 is a plan view showing an example of the schematic configuration of the substrate conveying device.

[Fig. 2] A side cross-sectional view showing an example of the schematic configuration of the substrate conveying device.

Fig. 3 is a side cross-sectional view showing an example of the schematic configuration of the substrate conveying device.

Fig. 4 is a side cross-sectional view showing an example of the schematic configuration of the substrate conveying device.

[Fig. 5] A diagram schematically showing an example of the configuration of the processing unit.

[Fig. 6] A diagram schematically showing an example of the structure of the transport robot.

Fig. 7 is a block diagram schematically showing an example of the connection between each element of the substrate processing apparatus and the control unit.

[Fig. 8] is a flowchart showing an example of the hand position correction method.

[Fig. 9] A diagram for explaining an example of the method of obtaining the position of the rotation axis.

[Fig. 10] is a flowchart showing an example of the hand position correction method.

Fig. 11 is a diagram schematically showing an example of the position of the rotation axis and the center of the substrate.

[Fig. 12] A functional block diagram schematically showing an example of the internal structure of the control unit.

[Fig. 13] A plan view schematically showing an example of the substrate on the hand.

[Figure 14] is a flowchart showing an example of correction processing of teaching materials.

Fig. 15 is a diagram schematically showing another example of the configuration of the substrate processing apparatus.

Hereinafter, the embodiment will be described with reference to the drawings. In the drawings, the same reference numerals are attached to the parts having the same structure and function, and repeated descriptions are omitted in the following description. In addition, the following embodiment is an example, and is not an example for limiting the technical scope. In addition, for ease of understanding, there may be cases where the size and quantity of each part are shown exaggeratedly or briefly in the drawings. In addition, in order to illustrate the direction, XYZ orthogonal coordinate axes are appropriately attached to each drawing. The Z direction in the XYZ orthogonal coordinate axis indicates the vertical direction, and the XY plane is a horizontal plane. Hereinafter, the side in the X direction is referred to as the +X side, and the side opposite to the side in the X direction is referred to as the -X side. The same is true for the Y axis and the Z axis, and the +Z axis system indicates a vertical upward direction.

Unless otherwise specified, it is used to express the performance of the positional relationship (for example, "toward one direction", "along one direction", "parallel", "orthogonal", "center", "concentric" and "coaxial", etc.) The system not only strictly expresses the positional relationship referred to, but also expresses the state in which the angle or distance has been displaced within the tolerance or the same degree of function can be obtained. Unless otherwise specified, the performance used to represent the state of equality (such as "identical", "identical", "equal" and "homogeneous", etc.) is not It only indicates a state that is quantitatively and strictly equal, and it also indicates a state where there is a tolerance or an error in which the same degree of function can be obtained. Unless otherwise specified, the expressions used to express the shape (such as "square shape" and "cylindrical shape", etc.) not only geometrically and rigorously express the referred shape, but also mean that the same degree can be obtained. The range of efficacy has a shape such as unevenness or chamfer. The expression of "has," "has," "has," "contains," or "includes" a constituent element is not an exclusive expression that excludes the existence of other constituent elements. The expression of "at least one of A, B, and C" includes only A, only B, only C, a combination of any two of A to C, and all A to C.

FIG. 1 is a plan view schematically showing an example of the structure of the substrate processing apparatus 1. FIG. 2 is a side cross-sectional view schematically showing an example of the inside of the substrate processing apparatus 1 on the II-II line of FIG. 1. FIG. 3 is a side cross-sectional view schematically showing an example of the inside of the substrate processing apparatus 1 on the line III-III of FIG. 1. FIG. 4 is a side cross-sectional view schematically showing an example of the inside of the substrate processing apparatus 1 on the IV-IV line in FIG. 1.

[Substrate Processing Equipment]

The substrate processing apparatus 1 is a blade-type apparatus for processing disk-shaped substrates W such as semiconductor wafers one by one. The substrate processing apparatus 1 applies various processing such as cleaning processing or etching processing to the substrate W. As shown in FIG. 1, the substrate processing apparatus 1 includes an indexer section 2 and a processing section 3 in sequence toward the +X side.

The processing area 3 includes a first processing module 3A, a handling module 3T, a second processing module 3B, and a third processing module 3C in sequence toward the +X side.

The first processing module 3A includes a first transfer part PS1, and the index area 2 supplies the substrate W to the first transfer part PS1. The processing area 3 includes a processing unit P1 to a processing unit P18, and the processing unit P1 to a processing unit P18 apply predetermined processing to an unprocessed piece of substrate W. The prescribed treatment system can include, for example, fluid treatment using liquid or gas for treatment, treatment using electromagnetic waves such as ultraviolet rays, and physical washing. Various treatments such as cleaning (brush cleaning and spray nozzle cleaning, etc.). The index area 2 receives the substrate W that has been processed in the processing area 3 from the first transfer portion PS1.

In addition, although FIGS. 2 to 4 show the structure of the supply system for supplying liquid or gas to the processing unit P1 to the processing unit P18 and the discharge system for recovering the liquid or gas from the processing unit P1 to the processing unit P18, However, the essence of these structures is different from the present embodiment, so the description of these structures is omitted.

[Index Area]

The index area 2 includes an indexer robot IR and a plurality of (here, four) stages ST1 to ST4. The stage ST1 to the stage ST4 are substrate storage container holding parts, which can hold the substrate storage container 20, respectively, and the substrate storage container 20 accommodates a plurality of substrates W in a stacked state. The substrate container 20 can be a front opening wafer transfer box (FOUP; Front Opening Unified Pod) that stores the substrate W in a sealed state, or a standard mechanized interface (SMIF; Standard Mechanical Inter Face) box or an open cassette ( OC; Open Cassette) and so on. For example, in the substrate storage container 20, a plurality of substrates W in a horizontal posture are stacked in a vertical direction with an interval therebetween.

The index robot IR includes a hand, and operates in the following manner: With one hand, it unloads a piece of unprocessed substrate W from the substrate container 20 held in one of the stages ST1 to ST4, and puts the substrate W on it. It is transmitted from the -X side to the first transmission part PS1. Furthermore, the index robot IR operates in the following manner: With the other hand, a piece of processed substrate W is received from the first transfer part PS1 and stored in a substrate container held in one of the stages ST1 to ST4. 20.

[Processing area]

The first processing module 3A of the processing area 3 includes: a first transfer portion PS1 that temporarily holds the substrate W carried in from the index area 2; and processing units P1 to P6 that perform predetermined processing on the substrate W.

The first transfer part PS1 holds the substrate W carried in from the -X side by the index robot IR. The processing units P1 to P3 are arranged on the +Y side of the first transfer part PS1, and the processing units P4 to P6 are arranged on the -Y side of the first transfer part PS1. The processing unit P1 to the processing unit P3 and the processing unit P4 to the processing unit P6 are sequentially overlapped in the Z direction, respectively, and constitute the processing towers TW1 and TW2.

The handling module 3T is adjacently arranged on the +X side of the first processing module 3A. A first transfer robot CR1 (substrate transfer device) is installed inside the transfer module 3T. The first transfer robot CR1 unloads the substrate W from the first transfer part PS1 to the +X side, and transfers the substrate W to any one of the processing unit P1 to the processing unit P6 from the +X side. In addition, the first transfer robot CR1 unloads the substrate W that has been processed in the processing unit P1 to the processing unit P6, and carries the substrate W into the first transfer unit PS1 from the +X side. In addition, the first transfer robot CR1 carries the substrate W into the second transfer part PS2 of the second processing module 3B from the -X side.

The first transfer portion PS1 includes a substrate holding portion 32, and the substrate holding portion 32 holds the substrate W in a horizontal posture. The substrate holding portion 32 holds the substrate W by the support 321, and the support 321 supports, for example, the peripheral portion of the substrate W from below. A plurality of (for example, two) substrate holding portions 32 may be provided in the Z direction at intervals. Thereby, the first transfer portion PS1 can hold a plurality of (for example, two) substrates W.

The second processing module 3B of the processing zone 3 is adjacently arranged on the +X side of the handling module 3T. The second processing module 3B includes: a second transfer unit PS2 that temporarily holds the substrate W carried in by the first transfer robot CR1; and processing units P7 to P12 that perform predetermined processing on the substrate W.

The processing units P7 to P9 are arranged on the +Y side of the second transfer portion PS2, and the processing units P10 to P12 are arranged on the -Y side of the second transfer portion PS2. The processing unit P7 to the processing unit P9 and the processing unit P10 to the processing unit P12 are sequentially overlapped in the Z direction, respectively, and constitute the processing towers TW3 and TW4.

The second transmission part PS2 includes a shuttle transport device 36. The shuttle transport device 36 reciprocates the substrate W along the X axis while holding the substrate W in a horizontal posture. Here, the shuttle conveying device 36 is spaced apart in the Z direction and can hold two substrates W at the same time and convey the two substrates W in the X direction. In the second transfer part PS2, the substrate W can be transported by the shuttle transport device 36 between the -X position and the +X position. The -X side position is close to the position of the first transport robot CR1, and the +X side position is close to the position described later. The position of the second transfer robot CR2 (substrate transfer device). Therefore, even in the case where the horizontal movement of the substrate W of the first transfer robot CR1 and the second transfer robot CR2 is smaller than that of the index robot IR, it can be used between the first transfer robot CR1 and the second transfer robot CR2. Transfer the substrate W between.

The third processing module 3C of the processing area 3 is adjacently arranged on the +X side of the second processing module 3B. The third processing module 3C includes a second transfer robot CR2 and processing units P13 to P18.

The processing unit P13 to the processing unit P15 are arranged on the +Y side of the second transfer robot CR2, and the processing unit P16 to the processing unit P18 are arranged on the -Y side of the second transfer robot CR2. The processing unit P13 to the processing unit P15 and the processing unit P16 to the processing unit P18 are sequentially overlapped in the Z direction, respectively, and constitute the processing towers TW5 and TW6.

The second transfer robot CR2 unloads the substrate W from the shuttle transfer device 36 to the +X side, and transfers the substrate W to any one of the processing unit P7 to the processing unit P18. In addition, the second transfer robot CR2 unloads the substrate W that has been processed in the processing unit P7 to the processing unit P18, and transfers the substrate W to the shuttle transfer device 36 from the +X side.

[Processing Unit]

Next, an example of a specific configuration of the processing unit P1 to the processing unit P18 will be described. Here, the processing unit P10 will be described representatively. At least any one of the other processing units P1 to P9 and the processing units P11 to P18 may have the same configuration as the processing unit P10. FIG. 5 is a diagram schematically showing an example of the configuration of the processing unit P10. The processing unit P10 includes a rotation jig 51 (substrate holding portion), a processing cup 52 and a nozzle 53. The rotation jig 51 holds a substrate W in a horizontal posture, and rotates the substrate W around a vertical rotation axis X1 passing through the center of the substrate W. The horizontal posture here refers to a state where the thickness direction of the substrate W is along the Z direction. The rotation axis X1 is also the central axis of the rotation jig 51. The processing cover 52 has a cylindrical shape and surrounds the rotation jig 51. The nozzle 53 supplies the processing liquid to the substrate W held by the rotation jig 51. The treatment liquid system includes, for example, a chemical liquid such as an etching liquid and a rinse liquid such as pure water.

The rotation clamp 51 includes: a circular plate-shaped spin base 51a, which is in a horizontal posture; a plurality of chuck pins 51b, which protrude upward from the outer periphery of the upper surface of the spin base 51a; A clamp opening and closing mechanism (not shown), which presses a plurality of clamp pins 51b against the peripheral edge of the substrate W; a rotating shaft 51c, which extends downward from the central part of the rotation base 51a; and a spin motor 51d , By rotating the rotation shaft 51c, the substrate W held by the plurality of clamp pins 51b is rotated about the rotation axis X1. The rotation jig 51 is not limited to the clamp-type clamp shown in FIG. 5, and may be a vacuum-type clamp. The vacuum-type clamp is horizontal by adsorbing the lower surface of the substrate W to the upper surface of the rotation base. The substrate W is maintained in the posture.

As shown in FIG. 5, the nozzle 53 is connected to one end of the pipe 54, and the other end of the pipe 54 is connected to the processing liquid supply source 55. The processing liquid supply source 55 supplies the processing liquid to the nozzle 53 via the pipe 54. A valve 56 is arranged in the pipe 54. The valve 56 is controlled by the control unit 7 to switch the internal flow path of the pipe 54 The opening and closing. The valve 56 opens the internal flow path of the pipe 54 so that the processing liquid system from the processing liquid supply source 55 is supplied to the nozzle 53 via the pipe 54. The nozzle 53 ejects the processing liquid to the substrate W.

In the example of FIG. 5, the nozzle 53 is opposed to the peripheral edge of the upper surface of the substrate W held by the rotation jig 51. The nozzle 53 may be moved back and forth between the processing position and the standby position by a nozzle moving mechanism not shown. As shown in FIG. 5, the processing position is a position facing the peripheral edge portion of the upper surface of the substrate W. The standby position is, for example, a position that does not face the substrate W held by the rotation jig 51 in the Z direction.

The nozzle 53 supplies the processing liquid to the peripheral edge portion of the upper surface of the substrate W in the processing position. By rotating the substrate W, the nozzle 53 can supply the processing liquid to the entire periphery of the substrate W. In the case where the processing liquid is an etching liquid, impurities in the peripheral portion of the substrate W can be removed by the supply of the processing liquid (that is, so-called bevel etching).

The processing unit P10 may be configured to be able to supply a plurality of types of processing liquids. For example, a plurality of nozzles are provided, and the plurality of nozzles are respectively connected to a processing liquid supply source via a pipe. The processing liquid supply sources connected to the respective nozzles are different from each other. For example, after the etching liquid is supplied from the first nozzle, the cleaning liquid is supplied from the second nozzle, whereby the etching liquid on the substrate W can be rinsed.

In the bevel etching described above, it is desirable that the center of the substrate W is located on the rotation axis X1 of the rotation jig 51. In other words, it is desirable that the center of the substrate W coincides with the rotation axis X1 when viewed from above. It is assumed that when the center position of the substrate W is shifted from the rotation axis X1, the position of the etching solution on the substrate W changes in the radial direction in accordance with the rotation position of the substrate W. Such changes are not expected.

Therefore, the second transfer robot CR2 is important for the transfer accuracy of the substrate W. That is, it is desirable that the second transfer robot CR2 transfer the substrate W with high transfer accuracy, and place the substrate W on the rotation jig 51 of the processing unit P10 such that the center of the substrate W coincides with the rotation axis X1 of the rotation jig 51.

[Handling robot]

Next, an example of the configuration of the second transfer robot CR2 will be described. In addition, here, the first transfer robot CR1 has the same configuration as the second transfer robot CR2.

3, the second transfer robot CR2 includes a base portion 41, a rotating mechanism 42, a first linear motion mechanism 43, a second linear motion mechanism 44, a vertical drive mechanism 45, and two hands 46A and 46B. The base portion 41 is disposed at the bottom of the plate shape, and the third processing module 3C is disposed on the bottom of the plate shape. Pillars 411 are provided on the base portion 41. A vertical drive mechanism 45 is provided on the pillar 411, and a rotation mechanism 42, a first linear motion mechanism 43, and a second linear motion mechanism 44 are provided between the vertical drive mechanism 45 and the hands 46A and 46B.

A substrate W is placed on the hands 46A and 46B, respectively. The hands 46A and 46B have holding mechanisms (described later), and hold the substrate W in a horizontal posture, respectively. The hands 46A and 46B are moved three-dimensionally by the rotation mechanism 42, the first linear motion mechanism 43, the second linear motion mechanism 44, and the vertical drive mechanism 45.

FIG. 6 is a diagram schematically showing an example of the configuration of the second transfer robot CR2. The first linear motion mechanism 43 includes a first moving body 431 and reciprocates the first moving body 431 in the first moving direction D1. The first movement direction D1 is a direction crossing the Z direction, and more specifically, the first movement direction D1 is orthogonal to the Z direction. The first moving body 431 is composed of, for example, a rigid body including metal such as iron. In the example of FIG. 6, the first moving body 431 is connected to the proximal end portions of the hands 46A and 46B and is linked with the hands 46A and 46B. That is, the first moving body 431 reciprocates in the first moving direction D1, whereby the hands 46A, 46B and the first moving body 431 reciprocate in the first moving direction D1 integrally. In addition, the first linear motion mechanism 43 may also move the hands 46A and 46B in the first moving direction D1 independently of each other. That is, the first linear motion mechanism 43 for the hand 46A and the first linear motion mechanism 43 for the hand 46B may be provided.

The rotating mechanism 42 includes a rotating body 421, and rotates the rotating body 421 around a vertical rotation axis CA1. The rotating body 421 may also be formed of a rigid body including metal such as iron. In the example of FIG. 6, the rotating body 421 is connected to the 1st linear motion mechanism 43 (specifically, the fixed body 432 mentioned later). Since the first linear motion mechanism 43 is connected to the hands 46A and 46B, the rotating body 421 is linked to the hands 46A and 46B. Specifically, the rotating body 421 rotates, whereby the first linear motion mechanism 43 and the hands 46A and 46B are integrally rotated with the rotating body 421 around the rotation axis CA1. With this rotation, the orientation of the hands 46A and 46B can be changed.

The first movement direction D1 in which the first linear motion mechanism 43 moves the hands 46A and 46B is, for example, a radial direction with respect to the rotation axis CA1.

The second linear motion mechanism 44 includes a second moving body 441 and reciprocates the second moving body 441 in the second moving direction D2. The second movement direction D2 is a direction crossing the first movement direction D1 and the Z direction. Specifically, the second movement direction D2 is orthogonal to the Z direction. The second moving body 441 is also composed of a rigid body including metal such as iron. In the example of FIG. 6, the second moving body 441 is connected to the rotation mechanism 42 (specifically, a fixed body 422 described later). Since the rotation mechanism 42 is connected to the hands 46A and 46B via the first linear motion mechanism 43, the second moving body 441 is linked to the hands 46A and 46B. Specifically, the second moving body 441 reciprocates in the second moving direction D2, whereby the rotation mechanism 42, the first linear mechanism 43, and the hands 46A and 46B are integrally moved toward the second moving body 441. The moving direction D2 reciprocates.

In addition, in the example of FIG. 6, since the second linear motion mechanism 44 is not rotated by the rotation mechanism 42, the second movement direction D2 does not depend on the rotation of the rotation mechanism 42. On the other hand, the first linear motion mechanism 43 is rotated by the rotation mechanism 42. Therefore, the first moving direction D1 rotates in response to the rotation of the rotating mechanism 42. Therefore, the crossing angle between the first movement direction D1 and the second movement direction D2 varies in accordance with the rotation position of the rotation mechanism 42.

3, the vertical drive mechanism 45 includes an elevator body 451 and a motor 452, and reciprocates the elevator body 451 in the Z direction. That is, the lifting body 451 is raised and lowered. For example, the elevating body 451 is fitted to a rail (not shown) that is provided on the pillar 411 and extends in the vertical direction. The motor 452 reciprocates the lifting body 451 in the vertical direction along the track.

In the example of FIG. 3, the lift body 451 is connected to the 2nd linear motion mechanism 44 (specifically, the fixed body 442 mentioned later) via the stand 453. The stage 453 has, for example, a plate-like shape, and is arranged such that the thickness direction of the stage 453 is along the Z direction. A second linear motion mechanism 44 and an elevating body 451 are provided on the table 453. The lifting body 451 is raised and lowered, whereby the rotation mechanism 42, the first linear motion mechanism 43, the second linear motion mechanism 44, and the hands 46A and 46B are raised and lowered integrally with the lifting body 451.

For ease of description, the hands 46A and 46B are collectively referred to as the hands 46 below.

[The first permanent mechanism]

In the example of FIG. 6, the first linear motion mechanism 43 includes a first moving body 431, a fixed body 432, and a motor 433. The fixed body 432 combines the first moving body 431 in a manner capable of moving in the first moving direction D1. The fixed body 432 may be, for example, a frame body having various configurations in which the first linear motion mechanism 43 is incorporated. The motor 433 provides a driving force for reciprocating the first moving body 431 in the first moving direction D1. The motor 433 is controlled by the control unit 7.

In the example of FIG. 6, the first linear motion mechanism 43 includes a belt 434. The belt 434 is straddled across a plurality of pulleys (two in the figure). Each pulley system is coupled to the fixed body 432 in such a manner that the central axis of the pulley is orthogonal to the first moving direction D1 and is rotatable around the central axis of the pulley. The belt 434 is formed of, for example, an elastic body made of rubber. Such a belt 434 is also called a timing belt. The motor 433 rotates the belt 434. For example, the motor 433 rotates the pulley, thereby causing the belt 434 to rotate. The first moving body 431 is connected to the belt 434, and the belt 434 rotates, whereby the first moving body 431 is Move back and forth in the first moving direction D1. Compared with the case of using a linear motor that is expensive and large in size, the first linear motion mechanism 43 is low in price and small in size.

The first linear mechanism 43 may have a linear guide (not shown). The linear guide includes: a first track that extends along the first moving direction D1; and a first traveling portion that is engaged with the first track and travels on the first track. The first traveling part is connected to the first moving body 431. Thereby, the first linear motion mechanism 43 can reciprocate the first moving body 431 in the first moving direction D1 with higher linear motion accuracy.

[Rotating Mechanism]

The rotating mechanism 42 includes a rotating body 421, a fixed body 422 and a motor 423. The rotating body 421 is, for example, a cylindrical rotating shaft extending along the rotating axis CA1. The rotating body 421 is constituted by a rigid body including metal such as iron. One end of the rotating body 421 is connected to the fixed body 432 of the first linear motion mechanism 43.

The motor 423 is directly connected to the rotating body 421. Here, the so-called direct connection includes, for example, a state in which the rotor of the motor 423 and the rotating body 421 are directly connected. In this case, the motor 423 is coaxially connected with the rotating body 421. In addition, the so-called direct connection may also include a state where the rotor of the motor 423 is coupled to the rotating body 421 via a transmission (for example, a harmonic gear) made of a rigid body including metal such as iron. As long as the speed reducer is used as the speed changer, a small motor 423 can be used.

The stator of the motor 423 is fixed to the fixed body 422. The fixed body 422 may also be a frame body for accommodating various configurations of the rotating mechanism 42.

The motor 423 is controlled by the control unit 7. The motor 423 rotates the rotating body 421 about the rotation axis CA1, thereby rotating the first linear motion mechanism 43 and the hand 46 integrally.

[Second Direct Acting Mechanism]

In the example of FIG. 6, the second linear motion mechanism 44 has the same configuration as the first linear motion mechanism 43. Specifically, the second linear motion mechanism 44 includes a second moving body 441, a fixed body 442, and a motor (not shown). The fixed body 442 combines the second moving body 441 in a manner that can move in the second moving direction D2. The fixed body 442 may also be, for example, a frame body with various configurations for incorporating the second linear motion mechanism 44. The motor of the second linear motion mechanism 44 provides a driving force for reciprocating the second moving body 441 in the second moving direction D2. This motor is controlled by the control unit 7.

In the example of FIG. 6, the second linear motion mechanism 44 includes a strap 444. The belt 444 is installed on a plurality of pulleys (not shown). The pulley system is rotatably coupled to the fixed body 442 around the central axis of the pulley in such a way that the central axis of the pulley is orthogonal to the second moving direction D2. The belt 444 is formed of, for example, an elastic body made of rubber. Such bands 444 are also called timing bands. The motor of the second linear motion mechanism 44 rotates a pulley to rotate the belt 444, for example. The second moving body 441 is connected to the belt 444, and the belt 444 rotates, whereby the second moving body 441 reciprocates in the second moving direction D2.

In the example of FIG. 6, the second linear motion mechanism 44 includes a linear guide 445. The linear guide 445 includes: a second guide rail, which extends along the second moving direction D2; and a second traveling part, which is engaged with the second guide rail and travels on the second guide rail. The second traveling part is connected to the second moving body 441. Thereby, the second linear motion mechanism 44 can reciprocate the second moving body 441 in the second moving direction D2 with higher linear motion accuracy.

[Location Detection]

As shown in FIG. 6, the second transfer robot CR2 system further includes: a rotation detection unit 47 that detects the rotation position of the rotating body 421; a first detection unit 48 that detects the position of the first moving body 431; and a second detection unit 49. Detect the position of the second moving body 441.

The rotation detecting unit 47 may also be, for example, an optical sensor or a magnetic sensor. The rotation detecting unit 47 is also referred to as a rotary encoder. The rotation detecting unit 47 includes, for example, a disk-shaped disk, which is fixed to the rotating body 421 (or the rotating shaft of the motor 423); and the light source and the light receiving element are opposed to each other through the disk. A slit pattern is formed on the disc, and the light from the light source is transmitted through or blocked by the slit pattern according to the rotation position of the disc. The rotation position of the rotating body 421 is detected by the pattern of the light received by the light receiving element. The rotation detection unit 47 outputs a detection signal for displaying the detected rotation position of the motor 423 to the control unit 7.

The first detection unit 48 is installed on the fixed body 432 to detect the position of the first moving body 431 in the first moving direction D1. The first detection unit 48 may also be, for example, an optical sensor or a magnetic sensor. The first detection unit 48 is also called a linear encoder. The first detection unit 48 directly detects the position of the first moving body 431. For example, the first detection unit 48 includes a scale that extends in the first moving direction D1; and the scanning member is disposed relative to the scale in a manner movable in the first moving direction D1. The scanning member is connected to the first moving body 431 and moves integrally with the first moving body 431. For example, the scanning member is built-in: a light source, which irradiates light to the scale; and a light-receiving element, which receives light transmitted through the scale or reflected on the scale; At the position of the scale, that is, the position of the first moving body 431 in the first moving direction D1 is detected.

Since the first detection unit 48 directly detects the position of the first moving body 431, the position of the first moving body 431 can be detected with high accuracy. The first detection unit 48 outputs a detection signal for displaying the detected position of the first moving body 431 to the control unit 7.

The second detecting part 49 is installed on the fixed body 442 to detect the position of the second moving body 441 in the second moving direction D2. The second detection part 49 may also be, for example, an optical sensor or a magnetic sensor. Detector. The second detection unit 49 is also called a linear encoder. The second detection unit 49 directly detects the position of the second moving body 441. The specific configuration of the second detection unit 49 is the same as that of the first detection unit 48.

Since the second detection unit 49 directly detects the position of the second moving body 441, the position of the second moving body 441 can be detected with high accuracy. The second detection unit 49 outputs a detection signal for displaying the detected position of the second moving body 441 to the control unit 7.

[Control Department]

FIG. 7 is a block diagram showing an example of the connection between the various elements of the substrate processing apparatus 1 and the control unit 7. The hardware configuration of the control unit 7 is the same as that of a general computer. That is, the control unit 7 includes: a CPU (Central Processing Unit; central processing unit) 71, which is used to perform various arithmetic processing; ROM (Read Only Memory; read-only memory) 72, which is a memory dedicated for reading , Used to memorize basic programs; RAM (Random Access Memory; random access memory) 73, is a freely readable memory, used to store various information; and non-temporary memory 74, used for memory control Control application (program) or data, etc. The CPU 71, the ROM 72, the RAM 73, and the storage unit 74 are connected to each other by a bus wire 75.

The control application or data can also be provided to the control unit 7 in a state where it has been recorded on a non-transitory recording medium (semiconductor memory, optical medium, magnetic medium, etc.). In this case, it is only necessary to connect a reading device for reading control applications or data from the recording medium to the bus line 75. In addition, control applications or data may also be provided to the control unit 7 from a server or the like via the Internet. In this case, it is only necessary to connect a communication unit for Internet communication with an external device to the bus line 75. In addition, the functions of the control unit 7 do not necessarily need to be realized by software, and may be realized by hardware circuits including logic circuits.

The input unit 76 and the display unit 77 are connected to the bus wire 75. The input unit 76 includes various input devices such as a keyboard and a mouse. The operator inputs various information to the control unit 7 via the input unit 76. The display unit 77 is composed of a display device such as a liquid crystal screen for displaying various information.

The control unit 7 is connected to the operating unit (rotation motor 51d and valve 56 etc.) of the processing unit P1 to the processing unit P18, the operating unit (motor etc.) of the shuttle transport device 36, the first transport robot CR1 and the second transport robot CR2. Actuating parts (motors 423, 433, etc.), and control the actions of these actuating parts.

In addition, the control unit 7 is also electrically connected to the rotation detection unit 47, the first detection unit 48, and the second detection unit 49 of the first transfer robot CR1 and the second transfer robot CR2. The control unit 7 receives detection signals from the rotation detection unit 47, the first detection unit 48, and the second detection unit 49. The control unit 7 controls the rotation mechanism 42 based on the rotation position detected by the rotation detection unit 47, controls the first linear mechanism 43 based on the position detected by the first detection unit 48, and based on the position detected by the second detection unit 49 Control the second direct-acting mechanism 44.

Teaching materials are stored in the memory 74, and the teaching materials define the movement paths of the hands 46 of the first transfer robot CR1 and the second transfer robot CR2. The control unit 7 controls the first transfer robot CR1 and the second transfer robot CR2 according to the teaching materials.

In the following, a case where the second transfer robot CR2 transfers the substrate W to the processing unit P10 will be representatively described. That is, the control unit 7 follows the teaching data that defines the transport path toward the processing unit P10 to control the second transport robot CR2 in the following manner.

The second transfer robot CR2 uses, for example, the hand 46 to take out the substrate W from the second transfer portion PS2 and hold the substrate W. Next, the rotation mechanism 42 adjusts the direction of the hand 46, and the vertical drive mechanism 45 adjusts the height position of the hand 46 to stop the hand 46 at a predetermined facing position facing the processing unit P10. Next, the first linear mechanism 43 moves the hand 46 toward the processing unit P10 and is positioned above the rotation jig 51 Stop at the specified stop position. In this state, the center of the upper substrate W is ideally located on the rotation axis X1. Next, the vertical drive mechanism 45 lowers the hand 46 and places the substrate W on the rotation jig 51. Therefore, the stop position corresponds to the placement position of the substrate W on the rotation jig 51 in a plan view. Thereby, the substrate W is placed on the rotation jig 51 in a state where the center of the substrate W is located on the rotation axis X1. Next, the first linear motion mechanism 43 retracts the hand 46 to the outside of the processing unit P10.

In addition, a plurality of lift pins (not shown) may be provided in the processing unit P10. A plurality of lifting pins are arranged at slightly equal intervals around the rotation axis X1 and are raised and lowered. In the state where the plurality of lift pins have been raised, the second transfer robot CR2 lowers the hand 46 from the predetermined stop position, thereby placing the substrate W on the lift pins. After the second transfer robot CR2 retracts the hand 46, the lift pins are lowered and the substrate W is placed on the rotation jig 51. In this case, ideally the center of the upper substrate W is also located on the rotation axis X1.

However, when the predetermined stop position in the teaching material itself includes an error in the horizontal direction, the center of the substrate W is offset from the rotation axis X1 of the rotation jig 51 in the horizontal direction due to the error in the horizontal direction. Since such a positional deviation system is not good, it is desirable to specify a stop position that coincides with the rotation axis X1 (ideal position) with high accuracy in the teaching materials.

In addition, the respective driving amounts of the rotating mechanism 42, the first linear motion mechanism 43, the second linear motion mechanism 44, and the vertical drive mechanism 45 are substantially specified in the teaching materials, thereby specifying the movement path of the hand 46. The so-called driving amount indicates the amount of rotation of the rotating body 421, the amount of movement of the first moving body 431, the amount of movement of the second moving body 441, and the amount of movement of the lifting body 451. That is, the stop position is substantially defined by the respective driving amounts from the initial position of the hand 46. Therefore, it is desirable to specify each drive amount so that the predetermined stop position is close to the ideal position.

In this embodiment, as a mechanism for horizontally moving the hand 46, a rotation mechanism 42, a first linear motion mechanism 43, and a second linear motion mechanism 44 are provided. Therefore, the stop position (position in the horizontal plane) in the teaching material can be specified by the drive amount of the three axes. The so-called three axes refer to the axis along the first movement direction D1, the axis along the second movement direction D2, and the axis along the rotation axis CA1. Thereby, the stop position can be specified with higher position accuracy. Hereinafter, a specific example will be explained.

For example, the control unit 7 may also control the position of the hand 46 in the following manner, thereby specifying the stop position of the hand 46. For example, the control unit 7 drives the rotation mechanism 42 and the first linear mechanism 43 with the ideal position as the target position based on the detection signals of the rotation detection unit 47 and the first detection unit 48. Thereby, the position of the hand 46 can be approached to an ideal position (rotation axis X1) in a plan view. The information used to display the ideal position (rotation axis X1) can be input to the input unit 76 by an operator, for example, or can be detected in a manner described later.

Here, it is set to stop the hand 46 to the first position by the rotation mechanism 42 and the first linear motion mechanism 43. Next, the control unit 7 drives one of the rotating mechanism 42 and the first linear motion mechanism 43 and the second linear motion mechanism 44. As a specific example, the control unit 7 drives the first linear motion mechanism 43 and the second linear motion mechanism 44. The control unit 7 drives the first linear motion mechanism 43 and the second linear motion mechanism 44 based on the detection signals of the first detection unit 48 and the second detection unit 49 with the ideal position as the target position. With this driving, when the position of the hand 46 is closer to the ideal position than the first position, the control unit 7 ends the driving of the first linear motion mechanism 43 and the second linear motion mechanism 44. The control unit 7 includes the driving amounts of the rotating mechanism 42, the first linear motion mechanism 43, and the second linear motion mechanism 44 at this time as information for displaying the stop position in the teaching data. In this case, the stop position (position in the horizontal plane) in the teaching material is specified by the respective driving amounts of the rotating mechanism 42, the first linear motion mechanism 43, and the second linear motion mechanism 44. On the other hand, when the position of the hand 46 is far away from the ideal position, the control unit 7 drives the first linear motion mechanism 43 and the second linear motion The mechanism 44 returns the hand 46 to its original first position. The control unit 7 includes the driving amounts of the rotating mechanism 42 and the first linear motion mechanism 43 at this time as information for displaying the stop position in the teaching data. In this case, the stop position (position in the horizontal plane) in the teaching material is specified by the driving amount of the rotating mechanism 42 and the first linear mechanism 43.

As described above, the second transfer robot CR2 can appropriately adjust the three axes and specify the stopping position of the teaching material in such a way that the position of the hand 46 is closest to the ideal position. Therefore, compared with the case where only two axes are adjusted, teaching materials can be generated with high position accuracy. The second transfer robot CR2 driven in accordance with the teaching materials can place the substrate W on the rotation jig 51 while approaching the center of the substrate W to the rotation axis X1 with high position accuracy.

In addition, in the substrate processing apparatus 1 of FIG. 1, the initial position of the hand 46 of the second transfer robot CR2 is surrounded by the processing tower TW3 to the processing tower TW6 and the second transfer portion PS2 in a plan view. That is, the transfer destination unit of the substrate W for the second transfer robot CR2 is arranged so as to surround the periphery of the second transfer robot CR2, and three or more transfer destination units are not arranged in one horizontal direction. According to this structure, the second transfer robot CR2 adjusts the direction of the hand 46 by the rotation mechanism 42 so that the hand 46 can face the processing tower TW3 to the processing tower TW6 and the second transfer portion PS2, respectively. For example, in a state where the hand 46 faces the processing tower TW3, the first movement direction D1 of the first linear motion mechanism 43 coincides with the linear direction connecting the hand 46 and the processing tower TW3. Therefore, the first linear motion mechanism 43 moves the hand 46 toward the processing tower TW3, thereby allowing the hand 46 to enter one processing unit of the processing tower TW3.

As described above, in terms of the transfer of the substrate W, the second transfer robot CR2 only needs to provide the rotation mechanism 42 and the first linear motion mechanism 43. Furthermore, the position in the horizontal plane of the hand 46 in the processing unit can also be adjusted to some extent by the rotation mechanism 42 and the first linear motion mechanism 43.

However, in this embodiment, not only the rotation mechanism 42 and the first linear motion mechanism 43 are provided, but also the second linear motion mechanism 44 is provided. Thereby, the number of axes for adjusting the position of the hand 46 can be increased, and the position of the hand 46 can be adjusted with higher accuracy.

Furthermore, the first detection unit 48 and the second detection unit 49 directly detect the positions of the first moving body 431 of the first linear motion motor 43 and the second moving body 441 of the second linear motion mechanism 44, respectively. Therefore, the positions of the first moving body 431 and the second moving body 441 can be detected with high accuracy. Therefore, the control unit 7 can feedback the position of the first movement direction D1 and the position of the second movement direction D2 of the control hand 46 with higher accuracy. For example, as described above, in the first linear mechanism 43, even in the case where the motor 433 transmits the driving force to the first movable body 431 via the speed changer (for example, the belt 434), the first movable body can be detected with high accuracy. The position of the first movable body 431 is adjusted according to the detected position of the first movable body 431, so that the position of the first movable body 431 can be controlled with high precision. The same is true for the second moving body 441.

The rotation mechanism 42 is different from the first linear motion mechanism 43 and the second linear motion mechanism 44, and is used to reciprocate the hand 46 in the circumferential direction with respect to the rotation axis CA1. Therefore, the longer the distance between the rotation axis CA1 and the hand 46, the lower the position accuracy of the hand 46 in the circumferential direction.

In addition, in the above example, the motor 423 is directly connected to the rotating body 421. Therefore, the rotational position of the motor 423 displays the rotational position of the rotating body 421 with high accuracy. Therefore, the rotating mechanism 42 can control the rotating position of the rotating body 421 with high accuracy. Therefore, even if the distance between the hand 46 and the rotation axis CA1 becomes longer, the position of the hand 46 in the circumferential direction can be adjusted with high accuracy.

That is, in the rotating mechanism 42 in which the position accuracy in the circumferential direction is reduced by the position of the hand 46, the motor 423 is directly connected to the rotating body 421, thereby suppressing the decrease in the position accuracy or improving the position accuracy. On the other hand, adopting a belt mechanism in the first linear motion mechanism 43 and the second linear motion mechanism 44 reduces the cost and size of the first linear motion mechanism 43 and the second linear motion mechanism 44. In addition, the cost is If the size is not a problem, the first linear motion mechanism 43 and the second linear motion mechanism 44 can also be directly connected to linear motors.

In addition, since the rotation detection unit 47 can detect the rotation position of the rotating body 421 with high accuracy, the control unit 7 can feedback and control the position of the hand 46 in the circumferential direction with higher accuracy.

Although the second transfer robot CR2 has been described as an example in the above example, the same is true for the first transfer robot CR1. In addition, in the substrate processing apparatus 1 of FIG. 1, the initial position of the hand of the first transfer robot CR1 is surrounded by the processing towers TW1, TW2, the first transfer unit PS1, and the second transfer unit PS2. According to this structure, in the same way as the second transfer robot CR2, in terms of the transfer of the substrate W, the rotation mechanism 42 and the first linear motion mechanism 43 may be provided. However, as in this embodiment, not only the rotation mechanism 42 and the first linear motion mechanism 43 are provided, but also the second linear motion mechanism 44 is provided, thereby increasing the number of axes used to adjust the position of the hand 46. The position can be adjusted with higher accuracy.

In addition, in the above example, although the second linear motion mechanism 44 integrally moves the rotation mechanism 42 and the first linear motion mechanism 43, it is not limited to this. For example, the second linear motion mechanism 44 may be provided at a position closer to the hand 46 than the rotation mechanism 42, and the rotation mechanism 42 may integrally rotate the first linear motion mechanism 43 and the second linear motion mechanism 44.

[Generation of Teaching Materials]

Next, an example of the specificity of the method of generating teaching materials will be explained. Here, first, the initial teaching materials are generated, and the teaching materials are generated by modifying the initial teaching materials. The initial teaching materials are generated, for example, by the operator inputting to the input unit 76 or a dedicated input device.

First, the second transfer robot CR2 moves the hand 46 according to the initial teaching materials and stops at a predetermined stop position above the rotation jig 51. Then, while monitoring the status of the basic The position of the center of the plate W corrects the stop position so that the center of the substrate W coincides with the rotation axis X1 (ideal position) of the rotation jig 51 when viewed from above. This will be specifically explained below.

As illustrated in FIG. 5, a camera 57 is provided in the processing unit P10. The camera 57 includes, for example, a CCD (Charge Coupled Device) imaging sensor or a CMOS (Complementary Metal-Oxide Semiconductor) imaging sensor, and is set in the rotation jig 51 Above. In the example of FIG. 5, the shooting direction of the camera 57 is vertically downward. The imaging area of the camera 57 includes at least a part of the peripheral portion of the rotation jig 51. The entire rotation jig 51 may also be included in the shooting area. The camera 57 photographs the shooting area and obtains image data, and outputs the image data to the control unit 7.

When the second transfer robot CR2 carries the substrate W into the processing unit P10, the hand 46 holding the substrate W moves to a predetermined stop position above the rotation jig 51. In the example of FIG. 5, the substrate W and the hand 46 that have stopped at a predetermined stop position are displayed by imaginary lines. The imaging area of the camera 57 includes at least a part of the peripheral portion of the substrate W that has stopped at a predetermined stop position. In other words, the installation position of the camera 57 is adjusted so that the imaging area includes at least a part of the substrate W. The entire substrate W may be included in the imaging area.

In addition, a camera moving mechanism (not shown) for moving the camera 57 can also be provided in the processing unit P10. The camera moving mechanism moves the camera 57 so that the shooting area can be changed appropriately.

The control unit 7 performs image processing on the image data obtained by the camera 57 and detects the center position of the substrate W. The control unit 7 calculates the correction amount for the predetermined stop position so that the center position of the substrate W coincides with the rotation axis X1 of the rotation jig 51.

Fig. 8 is a flowchart showing an example of a position correction method. Initially, the substrate W has not been carried in to the processing unit P10. First, the camera 57 photographs the rotation jig 51 (step S1). Specifically, for example, the camera moving mechanism moves the camera 57 to the first shooting position suitable for shooting the rotation jig 51. Then, the camera 57 photographs the shooting area and obtains image data, and outputs the image data to the control unit 7. The image data includes a rotation jig 51.

Next, the control unit 7 detects the position of the rotation axis X1 of the rotation jig 51 by image processing on the image data (step S2). FIG. 9 is a diagram for explaining an example of a method for obtaining the position of the rotation axis X1. The rotation base 51a is formed in a substantially circular shape in plan view, and the curvature radius R1 of the rotation base 51a is known. Therefore, only the equation of the line L passing through a point on the periphery of the rotation base 51a is required, that is, the position of the rotation axis X1 of the rotation base 51a (X coordinate and Y coordinate). The position of the rotation axis X1 becomes an ideal position for the stop position.

Next, the second transfer robot CR2 stops the hand 46 holding the substrate W at a predetermined stop position above the rotation jig 51 (step S3). Next, the camera 57 images the substrate W (step S4). Specifically, for example, the camera moving mechanism moves the camera 57 to a second imaging position suitable for imaging the substrate W on the hand 46. For example, the second shooting position is a position on the +Z side than the first shooting position. Then, the camera 57 photographs the shooting area and obtains image data, and outputs the image data to the control unit 7. The image data includes a substrate W.

The control unit 7 performs image processing on the image data and detects the position of the center of the substrate W (step S5). The method for obtaining the position of the center of the substrate W is the same as the method for obtaining the rotation axis X1, for example. That is, since the radius of curvature of the substrate W is known, only a wire passing through a point on the periphery of the substrate W is required, that is, the center position of the substrate W can be obtained based on the equation of the known radius of curvature and the wire.

Next, the control unit 7 calculates the difference between the center position of the substrate W and the rotation axis X1 (step S6). Next, the control unit 7 determines whether the absolute value of the difference is equal to or greater than the allowable value (step S7). When the difference is less than the allowable value, since there is no need to modify the teaching data, the process ends without executing step S8 described later. That is, the original teaching materials are directly used as teaching materials.

When the difference is greater than or equal to the allowable value, the control unit 7 obtains the first correction amount and the first correction direction for making the center position of the substrate W coincide with the rotation axis X1, and based on the first correction amount and the first correction direction The teaching material (specifically, the stop position) is corrected (step S8). The first correction amount is equal to the absolute value of the difference between the center position of the substrate W and the rotation axis X1, and the first correction direction is a direction from the center of the substrate W to the rotation axis X1.

In order to correct the predetermined stop position, the drive amount of each drive mechanism for moving the hand 46 to the corrected stop position is corrected. Here, since the stop position is corrected in the horizontal plane, the control unit 7 drives the rotation mechanism 42, the first linear motion mechanism 43, and the second linear motion mechanism 44 in the above-described manner using the corrected stop position as the target position, for example. Thereby, the drive amount (correction amount) of each drive mechanism for moving the hand 46 to the corrected stop position is determined. In this way, the original teaching materials are revised.

As described above, the control unit 7 can correct the initial teaching data (specifically, the stop position) so that the center position of the substrate W in a plan view coincides with the rotation axis X1 of the rotation jig 51. Furthermore, in this embodiment, since the drive amount of the three axes can be corrected and the initial teaching data can be corrected, the initial teaching data can be corrected with higher accuracy.

In this way, teaching materials with higher position accuracy can be obtained. Since the second transfer robot CR2 operates in accordance with the teaching materials, the substrate W can be transferred to the rotation jig 51 in a state where the center of the substrate W and the rotation axis X1 of the rotation jig 51 are aligned with high accuracy.

The control unit 7 only needs to control the second transfer robot CR2 by feedforward control based on teaching materials. That is, in order to generate teaching materials, feedback control using the detection signals of the rotation detection section 47, the first detection section 48, and the second detection section 49 is used to generate the teaching materials with high position accuracy. The substrate W is conveyed at a high speed by the feedforward control.

[Real time correction]

As described above, the second transfer robot CR2 can transfer the substrate W to the rotation jig 51 at an appropriate position according to the teaching materials. However, there may be cases where the substrate W is shifted in the horizontal direction when the rotation jig 51 holds the substrate W. For example, in the case where the rotation jig 51 holds the substrate W by suction, the substrate W will slide in the horizontal direction when the rotation jig 51 starts to attract the substrate W, causing the center of the substrate W to shift from the rotation axis X1. The offset amount and the offset direction at this time will be different for each of the processing unit P1 to the processing unit P18, and will also be different due to the temporal degradation of the processing unit P1 to the processing unit P18.

Therefore, consider the following situation: the substrate processing apparatus 1 monitors the center position of the substrate W when the rotation jig 51 is holding the substrate W, and places the substrate W on the rotation jig again when the center position of the substrate W is shifted from the rotation axis X1 51.

Fig. 10 is a flowchart showing another example of the position correction method. First, the camera 57 photographs the rotation jig 51 (step S11). Next, the control unit 7 performs image processing on the image data input from the camera 57, and detects the position of the rotation axis X1 of the rotation jig 51 (step S12).

Next, the second transfer robot CR2 stops the hand 46 holding the substrate W at a predetermined stop position above the rotation jig 51 (step S13). Next, the second transfer robot CR2 lowers the hand 46 and places the substrate W on the rotation jig 51 (step S14). Next, the rotation jig 51 sucks and holds the substrate W (step S15). The substrate W slides on the rotation jig 51 due to suction. Figure 11 system outline A diagram schematically showing an example of the positions of the rotation axis X1 and the center Pc1 of the substrate W. In the example of FIG. 11, the center Pc1 of the substrate W after suction is shifted to the lower right with respect to the rotation axis X1.

Next, the camera 57 photographs the substrate W on the rotation jig 51 (step S16). Next, the control unit 7 performs image processing on the image data input from the camera 57 and detects the position of the center Pc1 of the substrate W (step S17). Next, the control unit 7 calculates the difference (deviation amount) ΔH between the position of the center Pc1 of the substrate W and the rotation axis X1 (step S18). Next, the control unit 7 determines whether the absolute value of the difference ΔH is greater than or equal to the allowable value (step S19). When the absolute value of the difference ΔH is less than the allowable value, since there is no need to remount the substrate W, the process ends without executing steps S20 to S24 described later.

When the absolute value of the difference ΔH is greater than or equal to the allowable value, the control unit 7 obtains the second correction amount and the second correction direction for making the position of the center Pc1 of the substrate W coincide with the rotation axis X1, and the second correction direction is based on the second correction The stop position is corrected by the amount and the second correction direction, and the stop position SP1 (position after correction) is calculated (step S20). The second correction amount is equal to twice the absolute value of the difference ΔH, and the second correction direction is the direction from the center Pc1 of the substrate W toward the rotation axis X1 in a plan view. That is, since the center Pc1 of the substrate W is shifted from the rotation axis X1 in the offset direction by the component of the difference ΔH (offset) due to the suction of the rotation jig 51, the stop position SP1 of the substrate W is set relative to The rotation axis X1 moves to the side opposite to the offset direction by the amount of the offset. In addition, the stop position SP1 is equivalent to the mounting position of the substrate W on the rotation jig 51 when the substrate W is newly mounted.

Next, the second transfer robot CR2 lifts the substrate W from the rotation jig 51 (step S21). Specifically, the rotation jig 51 releases the holding of the substrate W, the lift pin lifts the substrate W, and the hand 46 lifts the substrate W.

Next, the second transfer robot CR2 moves the hand 46 to the stop position SP1 obtained in step S20 (step S22). Specifically, the control unit 7 sets the stop position SP1 as the target position to For example, the rotation mechanism 42, the first linear motion mechanism 43, and the second linear motion mechanism 44 are driven in the manner already described to move the hand 46. Thereby, the hand 46 can be moved to the stop position SP1 with high precision.

Next, the second transfer robot CR2 lowers the hand 46 and places the substrate W on the rotation jig 51 (step S23). Next, the rotation jig 51 sucks and holds the substrate W (step S24). Since the substrate W will slide in the offset direction up to the offset amount (difference ΔH) during such attraction, the center Pc1 of the substrate W is close to the rotation axis X1.

As described above, the substrate W can be remounted on the rotation jig 51 such that the position of the center Pc1 of the substrate W in a plan view coincides with the rotation axis X1 of the rotation jig 51. Therefore, it is possible to accurately align the center Pc1 of the substrate W after the suction with the rotation axis X1.

[Mechanical Learning]

As described above, the offset system of the substrate W at the time of holding (suction) may be different in the processing unit P1 to the processing unit P18. Therefore, it is also possible to learn the difference caused by the processing unit P1 to the processing unit P18 through mechanical learning, and to reposition the substrate W using the mechanical learning.

FIG. 12 is a functional block diagram schematically showing an example of the internal structure of the control unit 7. The control unit 7 includes a machine learning unit 710 and a transport control unit 720. The image data taken by the camera 57 is input to the machine learning unit 710. Specifically, the image data including the rotation jig 51 (step S11) and the image data including the substrate W are input to the machine learning unit 710 (step S16). The control unit 7 uses the machine learning based on the two image data to obtain the placement position (stop position SP1, post-correction position) when the substrate W has been remounted on the rotation jig 51. For example, the machine learning unit 710 can obtain the offset amount and the offset direction of the substrate W based on two image data, and can also obtain the second correction amount and the second correction direction based on the stop position of the hand 46, and can also obtain Exit the stop position SP1. Here, the machine learning unit 710 obtains the offset amount and the offset direction, and outputs the obtained offset amount and the offset direction to the conveyance control unit 720. machine The machine learning algorithm (algorithm) of the machine learning unit 710 is not particularly limited, but, for example, an algorithm such as a neural network (for example, deep learning) can be used.

The machine learning part 710 is created by the prior learning procedure using teacher data. The teacher information is obtained, for example, in each processing unit P1 to processing unit P18. The following image data are used as teacher data: image data obtained by the camera 57 and including the rotation jig 51; and image data obtained by the camera 57 and including the substrate W held by the rotation jig 51. In addition, the amount of shift and the direction of shift at this time are measured. This series of processing is performed a plurality of times, thereby obtaining a plurality of two image data and sets of offsets and offset directions corresponding to the image data. Each group is used as the teacher data for the processing unit P10. In addition, it is also possible to measure the second correction amount and the second correction direction or to measure the stop position SP1 instead of the offset amount and the offset direction. The machine learning unit 710 for the processing unit P10 can be generated by a known learning procedure using teacher data. Similarly, a machine learning unit 710 for other processing units is also generated.

In addition, there may be cases where different types of substrates W are contained in the substrate storage container 20. The offset amount and the offset direction of the substrate W when held (attracted) by the rotation jig 51 also depend on the type of substrate W, for example, the size (diameter) and weight of the substrate W. Therefore, teacher information can also be obtained for each type of substrate W. For example, by transporting the substrate W of the first type to the processing unit P10 and repeating the above-mentioned processing, the substrate W of the first type and teacher data for the processing unit P10 can be obtained. The first type of substrate W and the machine learning unit 710_1 for the processing unit P10 can be generated by the learning procedure using such teacher data. Similarly, by transporting the substrate W of the second type to the processing unit P10 and repeating the above-mentioned processing, the substrate W of the second type and the teacher data for the processing unit P10 can be obtained. The second type of substrate W and the machine learning unit 710_2 for the processing unit P10 can be generated by the learning procedure using such teacher data.

Similarly, it is possible to generate a plurality of machine learning parts 710_3,.

In the example of FIG. 12, substrate information and processing unit information are also input to the machine learning unit 710. The substrate information includes information (for example, size information) for displaying the type of substrate W to be transported, and the processing unit information includes information for specifying the processing unit for processing the substrate W. The machine learning part 710 selects a corresponding machine learning part 710_m from the machine learning parts 710_1,...710_n according to the substrate information and the processing unit information. The machine learning unit 710_m obtains the offset amount and offset direction of the substrate W based on the image data input from the camera 57 and outputs the obtained offset amount and offset direction of the substrate W to the transport control unit 720.

As described above, the transfer control unit 720 calculates the stop position SP1 based on the offset amount and the offset direction, and controls the second transfer robot CR2 to lift the substrate W from the rotation jig 51 and move the hand 46 to the stop position SP1. At this time, the control unit 7 sets the stop position SP1 as a target position and drives the rotating mechanism 42, the first linear motion mechanism 43, and the second linear motion mechanism 44 in the manner described, for example. Thereby, the hand 46 can be moved to the stop position SP1 with high precision. Next, the second transfer robot CR2 lowers the hand 46 and places the substrate W on the rotation jig 51.

As described above, the control unit 7 uses machine learning to obtain the stop position SP1. Therefore, the stop position SP1 can be obtained with high accuracy. Therefore, the position of the center Pc1 of the substrate W after the hold can be aligned with the rotation axis X1 with higher accuracy.

Furthermore, since the machine learning unit 710 is generated for each of the processing unit P1 to the processing unit P18, the control unit 7 (machine learning unit 710) can accurately obtain the stop position SP1 in accordance with the processing unit. Similarly, since the machine learning unit 710 is generated for each type of substrate W, the control unit 7 (machine learning unit 710) can accurately obtain the stop position SP1 according to the type of substrate W.

[Position adjustment]

In the example of FIG. 6, the rotation mechanism 42 and the first linear motion mechanism 43 are provided at a position closer to the hand 46 than the second linear motion mechanism 44. Therefore, the position adjustment of the hand 46 may be performed as long as the rotation mechanism 42 and the first linear motion mechanism 43 are performed preferentially. For example, when the substrate W is newly placed, the second transfer robot CR2 moves the hand 46 from the stop position before the correction to the stop position SP1 after the correction. At this time, the second transfer robot CR2 system only needs to use at least the rotation mechanism 42 and the first linear motion mechanism 43 to move the hand 46. The reasons are explained below.

As long as the second linear motion mechanism 44 is driven and the second moving body 441 moves in the second moving direction D2, the rotation mechanism 42 and the first linear motion mechanism 43 also move integrally with the second moving body 441. Therefore, inertial force acts on the rotation mechanism 42 and the first linear motion mechanism 43. Because of this inertial force, the rotating body 421 of the rotating mechanism 42 and the first moving body 431 of the first linear motion mechanism 43 respectively fluctuate within the range of clearance. In this way, the error of the hand 46 will increase.

On the other hand, when the rotating mechanism 42 is driven and the rotating body 421 rotates, the first linear motion mechanism 43 rotates integrally with the rotating body 421, and the second linear motion mechanism 44 does not rotate relative to this. In addition, even if the first linear motion mechanism 43 is driven and the first moving body 431 moves, the rotation mechanism 42 and the second linear motion mechanism 44 will not move. Therefore, even if the rotation mechanism 42 and the first linear motion mechanism 43 are driven, little inertial force is applied to the second linear motion mechanism 44, and the second movable body 441 has little fluctuation. Therefore, the error of the hand 46 is not likely to increase.

Therefore, the control unit 7 may also drive each drive mechanism in the following manner, for example. That is, the control unit 7 drives the rotation mechanism 42 and the first linear mechanism 43 respectively according to the detection signals of the rotation detection unit 47 and the first detection unit 48 to move the hand 46 to the corrected stop position (target position). Moreover, when the difference between the position of the hand 46 and the target position is outside the allowable range, the control section 7 is based on the second detection The detection signal of the portion 49 also drives the second direct motion mechanism 44 and adjusts the position of the hand 46. When the difference between the position of the hand 46 and the target position is within the allowable range, the second direct motion mechanism 44 is not used.

As described above, when the hand 46 moves from the stop position before the correction to the stop position SP1 after the correction, the rotation mechanism 42 and the first linear motion mechanism 43 closer to the hand 46 are preferentially used. Thereby, the position adjustment of the hand 46 can be performed with higher accuracy.

[Substrate size]

In addition, when the size of the substrate W is different from the reference size, the position of the substrate W placed on the hand 46 will be different. FIG. 13 is a plan view schematically showing an example of the substrate W on the hand 46. The hand 46 includes a pair of fingers 461, a connecting member 462, a clamping protrusion 463, a pressing portion 464, and a pushing amount detecting portion 465.

The finger 461 has an elongated shape, and is arranged such that the longitudinal direction of the finger 461 is along the first moving direction D1. The two fingers 461 are arranged in parallel with each other with an interval therebetween. The upper surface of the finger 461 is horizontal. The substrate W is placed on the upper surface of the two fingers 461. The connecting member 462 has, for example, a plate-like shape, and connects the substrates of the fingers 461 to each other. The structural system including the pair of fingers 461 and the connecting member 462 has a U-shape in a plan view.

A clamping protrusion 463 is erected on the front end of each finger 461. The clamping protrusion 463 protrudes upward from the upper surface of the finger 461. The clamping protrusion 463 is in contact with the peripheral edge (side surface) of the substrate W in a state where the substrate W is placed on the finger 461.

The pressing portion 464 is attached to the connecting member 462 and presses the substrate W to the clamping protrusion 463 side along the first movement direction D1. The pressing portion 464 may have, for example, a cylinder mechanism. The rod (rod) of the pressing portion 464 is moved (extended) to the side of the clamping protrusion 463 along the first movement direction D1, whereby the tip of the rod of the pressing portion 464 can abut the peripheral edge (side surface) of the substrate W and Press the substrate W to the clamping protrusion 463 side. The hand 46 can clamp the substrate W by the clamping protrusion 463 and the pressing portion 464. In addition, the lever system of the pressing portion 464 is retracted (shrinked) to the opposite side of the clamping protrusion 463, whereby the clamping of the substrate W can be released.

The pushing amount detection unit 465 detects the pushing amount of the substrate W by the pressing portion 464. The pushing amount detecting unit 465 may be, for example, a linear encoder for detecting the position of the lever of the pressing portion 464. The pushing amount detection unit 465 is a cylinder mechanism that can be built in the pressing unit 464. The bet amount detection unit 465 outputs a detection signal for displaying the detected bet amount to the control unit 7.

In addition, in the case where the hand 46 holds the substrate W with a large size and the case where the hand 46 holds the substrate W with a small size, the placement position of the substrate W with respect to the hand 46 is different. In FIG. 13, the substrate W of the reference size is shown as the substrate W1, and the substrate W smaller than the reference size is shown as the substrate W2. In FIG. 13, the substrate W2 and the pressing portion 464 for pressing the substrate W2 are shown by imaginary lines. In FIG. 13, the center Pc2 of the substrate W2 is shifted from the center Pc1 of the substrate W1 to the clamping protrusion 463 side along the first movement direction D1 by the shift amount ΔP. Hereinafter, the clamping protrusion 463 side in the first movement direction D1 is referred to as the inner side, and the connecting member 462 side is referred to as the front side. The center Pc2 of the substrate W2 is shifted inwardly from the center Pc1 of the substrate W1.

In addition, since the position of the substrate W in the orthogonal direction orthogonal to the first movement direction D1 is regulated by the pair of clamping protrusions 463, even if the size of the substrate W is different from the position of the center of the substrate W in the orthogonal direction It will hardly be different.

Here, the teaching materials are generated and stored in the memory 74 corresponding to the substrate W1. Therefore, when the second transfer robot CR2 transfers the substrate W1, the center Pc1 of the substrate W1 in a plan view coincides with the rotation axis X1 with high accuracy. On the other hand, in the case where the second transfer robot CR2 transfers the substrate W2, the center Pc2 of the substrate W2 is shifted inward from the rotation axis X1 by the shift amount ΔP. Therefore, it is desirable to move the stop position of the hand 46 toward the front side by the offset amount ΔP.

Therefore, the control unit 7 detects the position of the center Pc2 of the substrate W2 on the hand 46 based on the pushing amount of the pressing portion 464, and corrects the teaching data based on the position of the center Pc2 of the substrate W2. Fig. 14 is a flowchart showing an example of correction processing of teaching materials.

First, the control unit 7 obtains the position of the center Pc2 of the substrate W on the hand 46 based on the detection signal input from the pushing amount detection unit 465 (step S31). More specifically, the control unit 7 obtains the center Pc2 of the substrate W2, the offset amount ΔP between the reference size and the center Pc1 of the substrate W1, and the offset direction of the center Pc2 with respect to the center Pc1. Next, the control unit 7 corrects the teaching data based on the offset ΔP and the offset direction (step S32). Specifically, the control unit 7 sets the offset amount ΔP as the third correction amount and the direction on the opposite side of the offset direction as the third correction direction, and corrects the predetermined stop position. In the example of FIG. 13, since the center Pc2 is located further inward than the center Pc1, the third correction direction is the front side.

The control unit 7 sets the corrected stop position as the target position, and drives the rotating mechanism 42, the first linear motion mechanism 43, and the second linear motion mechanism 44 in the manner described, for example, to move the hand 46 to the corrected position. Stop position. Thereby, the hand 46 can be moved to the corrected stop position with high accuracy. Therefore, even if the size of the substrate W is different, the second transfer robot CR2 can place the substrate W on the rotation jig 51 at an appropriate position.

[Substrate Information]

The size of the substrate W can be geometrically determined based on the amount of pushing of the pressing portion 464. Therefore, the pushing amount of the pressing portion 464 may also be used as the substrate information described with reference to FIG. 12.

Although the embodiment has been described above, as long as the substrate processing apparatus 1 does not deviate from the spirit and scope of the present invention, various changes can be made in addition to the embodiment described above. In this embodiment, the respective embodiments can be freely combined within the scope disclosed by the present invention, or any constituent elements of the respective embodiments can be arbitrarily changed, or any constituent elements can be omitted in the respective embodiments.

For example, the first transfer robot CR1 and the second transfer robot CR2 may have different configurations from each other. Any one of the first transfer robot CR1 and the second transfer robot CR2 may not include the second direct motion mechanism 44.

FIG. 15 is a diagram schematically showing an example of the configuration of the substrate processing apparatus 1A. The substrate processing apparatus 1A includes an index area 2a and a processing area 3a. The structure of the index area 2a is the same as that of the index area 2. The processing area 3a includes the processing unit P1A to the processing unit P12A, the transfer unit PSA, and the transfer robot CRA (substrate transfer device). The processing unit P1A to the processing unit P6A are arranged side by side in the X direction on the +Y side of the transfer robot CRA. The processing unit P7A to the processing unit P12A are arranged side by side in the X direction on the -Y side of the transfer robot CRA. The group of the processing unit P1A to the processing unit P6A and the group of the processing unit P7A to the processing unit P12A face each other in the Y direction. The processing unit P1A to the processing unit P12A have the same configuration as the processing unit P1 to the processing unit P18.

The transfer part PSA is arranged between the transfer robot CRA and the index area 2a. The transmission part PSA has the same structure as the first transmission part PS1. The transfer unit PSA relays the substrate W between the index area 2a and the transfer robot CRA.

The transport robot CRA is configured to be movable in the Y direction, and can face each of the processing unit P1A to the processing unit P10A in the Y direction. The transfer robot CRA has the same configuration as the first transfer robot CR1 and the second transfer robot CR2. In this case, for example, the second linear motion mechanism 44 may also move the transport robot CRA in the Y direction which is the second movement direction D2.

In this substrate processing apparatus 1A, the transfer robot CRA can also adjust the position of the hand with three axes, and is provided with each drive mechanism (rotation mechanism 42, first linear motion mechanism 43, and second linear motion mechanism 44) The rotation detection unit 47, the first detection unit 48, and the second detection unit 49. Therefore, the transfer robot CRA system can adjust the position of the hand 46 with high accuracy.

42: Rotating mechanism

43: The first permanent moving mechanism

44: The second direct-acting mechanism

46, 46A, 46B: hands

47: Rotation detection section

48: The first detection department

49: The second detection department

421: Rotating Body

422,432,442: fixed body

423,433: Motor

431: First Moving Body

434,444: strap

441: second moving body

445: Linear guide

461: finger

462: Connection member

463: Clamping protrusion

464: pressing part

CA1: Rotation axis

Claims (9)

A substrate conveying device is used to convey a substrate to a processing unit for processing the aforementioned substrate, and is provided with: a hand for placing the aforementioned substrate; a rotating mechanism including a rotating body linked with the aforementioned hand , And make the rotating body rotate around the axis of rotation along the vertical direction, and move the hand to each of the three or more processing units arranged to surround the hand in a plan view The opposite position; the rotation detection unit detects the rotation position of the aforementioned rotating body; the first linear motion mechanism includes a first moving body linked with the aforementioned hand, and makes the aforementioned first moving body cross the vertical direction Move in the first moving direction; the first detection unit detects the position of the first moving body; the second direct-acting mechanism includes the second moving body linked with the hand, and makes the second moving body face the The first moving direction and the second moving direction intersecting the vertical direction move; and the second detecting unit detects the position of the second moving body. A substrate conveying device is used for conveying substrates, and is provided with: a hand for placing the substrate; a rotating mechanism including a rotating body linked with the hand and making the rotating body go around in a vertical direction The rotation axis rotates; the rotation detection unit detects the rotation position of the aforementioned rotating body; the first linear motion mechanism includes a first moving body linked with the aforementioned hand, and makes the aforementioned first moving body cross in the vertical direction The first moving direction moves; the first detection unit detects the position of the first moving body; The second direct-acting mechanism includes a second moving body linked with the hand, and moves the second moving body in a second moving direction that intersects the first moving direction and the vertical direction; the second detecting unit is The position of the second moving body is detected; the base part is arranged at the bottom; the pillar is arranged on the base part; and the vertical drive mechanism is installed on the pillar; between the vertical drive mechanism and the hand The rotation mechanism, the first linear motion mechanism, and the second linear motion mechanism are provided in between. The substrate conveying device according to claim 1 or 2, wherein the rotating mechanism includes a motor directly connected to the rotating body. A method for correcting the hand position of a substrate conveying device, which is used to correct the hand position of the substrate conveying device as described in claim 1 or 2 when the substrate is transferred to the substrate holding portion, and includes: the first step , The substrate transport device is used in accordance with the teaching materials to move the hand for placing the substrate and move the hand to a predetermined position higher than the substrate holding part; the second step is to use a camera to shoot the hand The predetermined position is stopped on the substrate placed on the hand and the image data is obtained; the third step is to detect the position of the center of the substrate based on the image data; and the fourth step is to approach the center of the substrate to The central axis of the substrate holding portion corrects the predetermined position and corrects the teaching material. A method for correcting the position of the hand of a substrate conveying device, which is used to correct the position of the hand when the substrate conveying device transfers a substrate to a substrate holding portion as described in claim 1, and includes: the first step: The substrate transfer device is used to move the hand on which the substrate is placed to a predetermined position above the substrate holding portion; the second step is to lower the hand by the vertical drive mechanism included in the substrate transfer device. Place the substrate on the substrate holding portion; the third step is to hold the substrate by the substrate holding portion; the fourth step is to photograph the substrate held by the substrate holding portion by a camera and obtain image data; the fifth step , Based on the aforementioned image data, the placement position of the substrate obtained by the following method: the center of the substrate is shifted from the central axis of the substrate holding portion to the substrate holding portion holding the substrate The offset direction of the substrate is obtained from the opposite side; the sixth step is that the substrate conveying device replaces the substrate in the placement position; and the seventh step is that the substrate holding portion holds the substrate. A method for correcting the hand position of a substrate conveying device, which is used to correct the position of the hand when the substrate conveying device transfers a substrate to a substrate holding portion as described in claim 2, and includes: the first step is: The aforementioned substrate conveying device is used to move the aforementioned hand on which the aforementioned substrate is placed to a predetermined position higher than the aforementioned substrate holding portion; The second step is to lower the hand by the vertical drive mechanism and place the substrate on the substrate holding portion; the third step is to hold the substrate by the substrate holding portion; and the fourth step is to take a photo by a camera The substrate is held by the substrate holding portion and image data is obtained; the fifth step is to obtain the placement position of the substrate obtained in the following manner based on the image data: the center of the substrate is relative to the center of the substrate holding portion The central axis is shifted to the opposite side of the offset direction of the substrate generated when the substrate holding portion holds the substrate; the sixth step is to reposition the substrate in the placement position by the substrate transport device; and In the seventh step, the substrate holding portion holds the substrate. The method for correcting the position of the hand of a substrate conveying device according to claim 5 or 6, wherein the fifth step includes the following step: detecting, based on the image data, the offset of the substrate generated when the substrate holding portion is held Correct the predetermined position based on the offset and the offset direction, and calculate the corrected position at which the position when viewed from above is equal to the placement position; the substrate holding portion releases the holding of the substrate, And the vertical drive mechanism raises the hand to the predetermined position and lifts the substrate; at least it drives the rotation mechanism and the first direct motion mechanism that are arranged closer to the hand than the second direct motion mechanism, and makes The hand moves to the corrected position; and the vertical drive mechanism lowers the hand and places the substrate on the substrate holding portion. The method for correcting the position of the hand of the substrate conveying device according to claim 5 or 6, wherein the placement position is obtained in the fifth step using machine learning based on the image data. The method for correcting the hand position of a substrate transport device according to claim 8, wherein in the fifth step, a plurality of machines corresponding to at least any one of the type of the substrate and the plurality of substrate holding parts is learned The section selects the machine learning section corresponding to at least any one of the type of the substrate to be transported and the substrate holding section of the transport destination, and uses the selected machine learning section to find the placement position.

Images