TWI742049B - 用於射頻產生器之多狀態的以步進方式調節射頻產生器及阻抗匹配網路之系統 - Google Patents

用於射頻產生器之多狀態的以步進方式調節射頻產生器及阻抗匹配網路之系統 Download PDF

Info

Publication number
TWI742049B
TWI742049B TW106106913A TW106106913A TWI742049B TW I742049 B TWI742049 B TW I742049B TW 106106913 A TW106106913 A TW 106106913A TW 106106913 A TW106106913 A TW 106106913A TW I742049 B TWI742049 B TW I742049B
Authority
TW
Taiwan
Prior art keywords
parameter value
state
models
processor
generator
Prior art date
Application number
TW106106913A
Other languages
English (en)
Chinese (zh)
Other versions
TW201810352A (zh
Inventor
亞瑟 Ｍ 豪瓦德
約翰 Ｃ 小微寇爾
安德魯 馮
大衛 霍普金斯
Original Assignee
美商蘭姆研究公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US15/098,189 external-priority patent/US9711332B2/en
Application filed by 美商蘭姆研究公司 filed Critical 美商蘭姆研究公司
Publication of TW201810352A publication Critical patent/TW201810352A/zh
Application granted granted Critical
Publication of TWI742049B publication Critical patent/TWI742049B/zh

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H11/00—Networks using active elements
    • H03H11/02—Multiple-port networks
    • H03H11/28—Impedance matching networks
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F17/00—Digital computing or data processing equipment or methods, specially adapted for specific functions
    • G06F17/10—Complex mathematical operations
    • G06F17/11—Complex mathematical operations for solving equations, e.g. nonlinear equations, general mathematical optimization problems
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/36—Circuit design at the analogue level
    • G06F30/367—Design verification, e.g. using simulation, simulation program with integrated circuit emphasis [SPICE], direct methods or relaxation methods
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Mathematical Physics (AREA)
  • Data Mining & Analysis (AREA)
  • Pure & Applied Mathematics (AREA)
  • Computational Mathematics (AREA)
  • Mathematical Analysis (AREA)
  • Mathematical Optimization (AREA)
  • General Engineering & Computer Science (AREA)
  • Algebra (AREA)
  • Operations Research (AREA)
  • Databases & Information Systems (AREA)
  • Software Systems (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Geometry (AREA)
  • Evolutionary Computation (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Plasma Technology (AREA)
TW106106913A 2016-04-13 2017-03-03 用於射頻產生器之多狀態的以步進方式調節射頻產生器及阻抗匹配網路之系統 TWI742049B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/098,189 2016-04-13
US15/098,189 US9711332B2 (en) 2013-05-09 2016-04-13 Systems and methods for tuning an impedance matching network in a step-wise fashion for multiple states of an RF generator

Publications (2)

Publication Number Publication Date
TW201810352A TW201810352A (zh) 2018-03-16
TWI742049B true TWI742049B (zh) 2021-10-11

Family

ID=60093793

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106106913A TWI742049B (zh) 2016-04-13 2017-03-03 用於射頻產生器之多狀態的以步進方式調節射頻產生器及阻抗匹配網路之系統

Country Status (3)

Country Link
KR (1) KR20170117311A (ko)
CN (1) CN107294510B (ko)
TW (1) TWI742049B (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10679825B2 (en) * 2017-11-15 2020-06-09 Lam Research Corporation Systems and methods for applying frequency and match tuning in a non-overlapping manner for processing substrate
US10910197B2 (en) * 2018-10-19 2021-02-02 Mks Instruments, Inc. Impedance matching network model based correction scheme and performance repeatability
CN114188204B (zh) * 2020-09-14 2023-10-31 中微半导体设备(上海)股份有限公司 一种等离子体处理方法、射频发生器以及装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040027069A1 (en) * 2002-03-27 2004-02-12 Ki-Jung Kim Plasma display device
US20050029954A1 (en) * 2003-08-06 2005-02-10 Canon Kabushiki Kaisha Plasma processing apparatus and method
US20100133974A1 (en) * 2008-12-02 2010-06-03 Young-Suk Cho Plasma display panel
TW201327620A (zh) * 2011-12-29 2013-07-01 Mks Instr Inc 頻率調諧射頻功率源之基於功率失真的伺服控制系統
US20150002018A1 (en) * 2013-06-28 2015-01-01 Lam Research Corporation Controlling Ion Energy Within A Plasma Chamber
TW201538991A (zh) * 2014-01-10 2015-10-16 Lam Res Corp 用於虛擬量測之電纜功率損失決定

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7480571B2 (en) * 2002-03-08 2009-01-20 Lam Research Corporation Apparatus and methods for improving the stability of RF power delivery to a plasma load
US8072285B2 (en) * 2008-09-24 2011-12-06 Paratek Microwave, Inc. Methods for tuning an adaptive impedance matching network with a look-up table
US8942650B2 (en) * 2010-04-20 2015-01-27 Rf Micro Devices, Inc. RF PA linearity requirements based converter operating mode selection
US9173253B2 (en) * 2011-11-16 2015-10-27 Cool Dry, Inc. Ionic adder dryer technology
US9881772B2 (en) * 2012-03-28 2018-01-30 Lam Research Corporation Multi-radiofrequency impedance control for plasma uniformity tuning
US9263350B2 (en) * 2014-06-03 2016-02-16 Lam Research Corporation Multi-station plasma reactor with RF balancing

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040027069A1 (en) * 2002-03-27 2004-02-12 Ki-Jung Kim Plasma display device
US20050029954A1 (en) * 2003-08-06 2005-02-10 Canon Kabushiki Kaisha Plasma processing apparatus and method
US20100133974A1 (en) * 2008-12-02 2010-06-03 Young-Suk Cho Plasma display panel
TW201327620A (zh) * 2011-12-29 2013-07-01 Mks Instr Inc 頻率調諧射頻功率源之基於功率失真的伺服控制系統
US20150002018A1 (en) * 2013-06-28 2015-01-01 Lam Research Corporation Controlling Ion Energy Within A Plasma Chamber
TW201538991A (zh) * 2014-01-10 2015-10-16 Lam Res Corp 用於虛擬量測之電纜功率損失決定

Also Published As

Publication number Publication date
CN107294510A (zh) 2017-10-24
CN107294510B (zh) 2021-05-18
TW201810352A (zh) 2018-03-16
KR20170117311A (ko) 2017-10-23

Similar Documents

Publication Publication Date Title
US10403482B2 (en) Systems and methods for tuning an impedance matching network in a step-wise fashion for multiple states of an RF generator
US10911081B2 (en) Systems and methods for reducing power reflected towards a higher frequency RF generator during a period of a lower RF generator and for using a relationship to reduce reflected power
TWI727005B (zh) 在較低頻射頻產生器期間減少反射到較高頻射頻產生器之功率及使用一關係以減少反射功率之系統及方法
TWI750154B (zh) 以步進方式調節阻抗匹配網路之系統及方法
US10276350B2 (en) Systems and methods for using computer-generated models to reduce reflected power towards an RF generator during state transitions of the RF generator by controlling RF values of the RF generator
US10853444B2 (en) Systems and methods for tuning an impedance matching network in a step-wise fashion
US10296676B2 (en) Systems and methods for tuning an impedance matching network in a step-wise fashion
US10020168B1 (en) Systems and methods for increasing efficiency of delivered power of a megahertz radio frequency generator in the presence of a kilohertz radio frequency generator
US9837252B2 (en) Systems and methods for using one or more fixtures and efficiency to determine parameters of a match network model
US11335539B2 (en) Systems and methods for optimizing power delivery to an electrode of a plasma chamber
TWI742049B (zh) 用於射頻產生器之多狀態的以步進方式調節射頻產生器及阻抗匹配網路之系統
TWI751138B (zh) 使用射頻值降低狀態變遷期間之反射功率的系統及方法