TWI733374B - Flexible connector, flexible adsorption device and photoetching system - Google Patents
Flexible connector, flexible adsorption device and photoetching system Download PDFInfo
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- TWI733374B TWI733374B TW109108649A TW109108649A TWI733374B TW I733374 B TWI733374 B TW I733374B TW 109108649 A TW109108649 A TW 109108649A TW 109108649 A TW109108649 A TW 109108649A TW I733374 B TWI733374 B TW I733374B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
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Abstract
本發明提供了一種軟性連接件、軟性吸附裝置及光刻系統,多個吸附單元均通過軟性連接件與支撑單元連接,且每個軟性連接件的底部位於同一水平面上,每個吸附單元的底部位於同一水平面上,真空單元與每個吸附單元連接以實現對遮罩板的真空吸附,由於軟性連接件包括連接件本體及設置於連接件本體上的第一方向凹槽和第二方向凹槽,在吸附遮罩板時連接件本體可以產生形變,實現在繞第一方向旋轉和繞第二方向旋轉兩個方向上的自適應調整,保證吸附單元的底部與遮罩板表面的完全貼合,減小了遮罩板的變形量,從而提高了交接精度,並且有效避免了吸附單元和遮罩板的剛性接觸,起到保護遮罩板的作用。 The present invention provides a flexible connector, a flexible adsorption device and a photoetching system. A plurality of adsorption units are connected to a supporting unit through a flexible connector, and the bottom of each flexible connector is located on the same level. The bottom of each adsorption unit Located on the same level, the vacuum unit is connected with each suction unit to realize the vacuum suction of the shield plate, because the flexible connecting piece includes the connecting piece body and the first direction groove and the second direction groove provided on the connecting piece body , The body of the connector can be deformed when the shield plate is adsorbed to realize the self-adaptive adjustment in both directions of rotation around the first direction and rotation around the second direction, ensuring that the bottom of the suction unit is completely attached to the surface of the shield plate , The deformation of the shield plate is reduced, the transfer accuracy is improved, and the rigid contact between the suction unit and the shield plate is effectively avoided, and the shield plate is protected.
Description
本發明有關於半導體製造技術領域,特別是有關於一種軟性連接件、軟性吸附裝置及光刻系統。 The invention relates to the technical field of semiconductor manufacturing, in particular to a flexible connector, a flexible adsorption device and a photolithography system.
在光刻過程中,遮罩板的傳輸是必不可少的一道工序,其中遮罩板在交接過程中的交接精度是一項關鍵指標。現有技術中遮罩板在交接時通常是採用光刻機內的遮罩板吸附裝置對遮罩板進行真空吸附,要使遮罩板在交接過程中達到一定的交接精度,必須保證吸附遮罩板的吸附面與遮罩板表面有效貼合,這樣能夠大幅度減小遮罩板的變形量。 In the photolithography process, the transmission of the mask plate is an indispensable process, and the transfer accuracy of the mask plate in the transfer process is a key indicator. In the prior art, when the mask plate is handed over, the mask plate suction device in the lithography machine is usually used to vacuum the mask plate. To make the mask plate reach a certain handover accuracy during the handover process, the suction mask must be guaranteed The suction surface of the plate is effectively attached to the surface of the mask plate, which can greatly reduce the deformation of the mask plate.
目前在光刻機內的遮罩板吸附裝置,一般採用剛性結構,例如陶瓷或鋁,受零件加工精度的限制,剛性結構的遮罩板吸附裝置的共面度最高能做到0.25μm(3級精度),再加上遮罩板自身在吸附區域的平面度最大為1μm,在採用剛性結構的遮罩板吸附裝置時,遮罩板可能產生的變形量可以達到1.25μm,導致遮罩板與遮罩板吸附裝置無法完全貼合,在移動遮罩板過程中容易出現遮罩板移動,使得遮罩板的交接精度大幅下降,此外,對於剛性結構的遮罩板吸附裝置,如果要將吸附面的共面度做到0.25μm(3級精度),加工成本非常高。 At present, the mask plate suction device in the lithography machine generally adopts a rigid structure, such as ceramic or aluminum. Due to the limitation of the machining accuracy of the parts, the coplanarity of the mask plate suction device of the rigid structure can be as high as 0.25 μm (3 Class accuracy), plus the maximum flatness of the mask plate itself in the suction area is 1μm. When a rigid structure of the mask plate suction device is used, the possible deformation of the mask plate can reach 1.25μm, resulting in the mask plate It cannot be completely attached to the mask plate suction device, and the mask plate is likely to move during the process of moving the mask plate, which greatly reduces the transfer accuracy of the mask plate. In addition, for the rigid structure of the mask plate suction device, if you want to The coplanarity of the adsorption surface is 0.25μm (level 3 accuracy), and the processing cost is very high.
本發明的目的在於提供一種軟性連接件、軟性吸附裝置及光刻系統,能夠保證軟性吸附裝置的吸附面與遮罩板能夠完全貼合,從而大幅度減小遮罩板的變形量,提高遮罩板的交接精度。 The purpose of the present invention is to provide a flexible connector, a flexible suction device and a photolithography system, which can ensure that the suction surface of the flexible suction device and the mask plate can be completely attached, thereby greatly reducing the deformation of the mask plate and improving the mask The transfer accuracy of the cover plate.
為了達到上述目的,本發明提供了一種軟性連接件,包括連接件本體及設置於連接件本體上的第一方向凹槽和第二方向凹槽,第一方向凹槽沿第一方向割裂連接件本體並延伸進連接件本體內部,第二方向凹槽沿第二方向割裂連接件本體並延伸進連接件本體內部,第一方向與第二方向垂直。 In order to achieve the above objective, the present invention provides a flexible connector, including a connector body and a first direction groove and a second direction groove provided on the connector body, the first direction groove splits the connector along the first direction The body extends into the inside of the connector body, the second direction groove cuts the connector body along the second direction and extends into the inside of the connector body, the first direction is perpendicular to the second direction.
較佳地,第一方向凹槽和第二方向凹槽的數量均為兩個,兩個第一方向凹槽沿連接件本體的體中軸線對稱設置,兩個第二方向凹槽沿連接件本體的體中軸線對稱設置。 Preferably, there are two first-direction grooves and two second-direction grooves. The two first-direction grooves are symmetrically arranged along the central axis of the connector body, and the two second-direction grooves extend along the connector body. The central axis of the body is symmetrically arranged.
較佳地,連接件本體上還設置有第一延伸槽和第二延伸槽,第一延伸槽從第一方向凹槽位於連接件本體內的一端開始沿第三方向延伸,第一延伸槽和第一方向凹槽呈L型,第二延伸槽從第二方向凹槽位於連接件本體內的一端開始沿第三方向延伸,第二延伸槽和第二方向凹槽呈L型,第三方向與第一方向和第二方向均垂直。 Preferably, the connector body is further provided with a first extension groove and a second extension groove. The first extension groove extends in the third direction from the end of the groove in the first direction in the connector body. The first extension groove and The groove in the first direction is L-shaped, the second extension groove extends in the third direction from the end of the groove in the second direction in the body of the connector, the second extension groove and the groove in the second direction are L-shaped, the third direction It is perpendicular to both the first direction and the second direction.
較佳地,第一方向凹槽沿第二方向的深度為大於0mm且小於等於8mm,第二方向凹槽沿第一方向的深度為大於0mm且小於等於8mm,第一延伸槽和第二延伸槽沿第三方向的長度尺寸均為大於0mm且小於等於7mm。 Preferably, the depth of the groove in the first direction along the second direction is greater than 0 mm and less than or equal to 8 mm, the depth of the groove in the second direction along the first direction is greater than 0 mm and less than or equal to 8 mm, the first extension groove and the second extension The length of the groove along the third direction is greater than 0 mm and less than or equal to 7 mm.
較佳地,第一方向凹槽和第二方向凹槽的寬度均為大於0mm且小於等於0.1mm。 Preferably, the widths of the grooves in the first direction and the grooves in the second direction are both greater than 0 mm and less than or equal to 0.1 mm.
較佳地,第一方向凹槽和第二方向凹槽共同能夠產生的阻尼係數大於1。 Preferably, the damping coefficient jointly produced by the first direction groove and the second direction groove is greater than one.
較佳地,連接件本體在第三方向上的兩個端部均設置有安裝孔。 Preferably, both ends of the connector body in the third direction are provided with mounting holes.
本發明還提供了一種軟性吸附裝置,用於吸附遮罩板,包括:支撑單元;多個吸附單元和多個如上的軟性連接件,每個吸附單元均通過一個軟性連接件與支撑單元連接,且每個軟性連接件與每個吸附單元連接的一面位於同一水平面上,每個吸附單元用於吸附遮罩板的一面位於同一水平面上;以及真空單元,與每個吸附單元連接以實現對遮罩板的真空吸附。 The present invention also provides a soft adsorption device for adsorbing the mask plate, comprising: a support unit; a plurality of adsorption units and a plurality of flexible connectors as described above, each adsorption unit is connected to the support unit through a flexible connector, And the side of each flexible connecting piece connected with each suction unit is located on the same horizontal surface, and the side of each suction unit used for adsorbing the mask plate is located on the same horizontal surface; and a vacuum unit is connected with each suction unit to realize the opposite shielding. Vacuum adsorption of the cover plate.
較佳地,遮罩板與每個軟性連接件的剛度比為K,多個軟性連接件與多個吸附單元連接的一面的共面度與遮罩板的變形量的比值為G,且KG。 Preferably, the stiffness ratio of the shield plate to each flexible connector is K, and the ratio of the coplanarity of the side connecting the multiple flexible connectors with the multiple adsorption units to the deformation of the shield plate is G, and K G.
較佳地,每個吸附單元包括吸附塊及設置於吸附塊遠離軟性連接件一面的吸附接觸塊,吸附塊中形成有吸附腔,吸附接觸塊中形成有與吸附腔連通的吸附孔,真空單元與吸附腔連通。 Preferably, each adsorption unit includes an adsorption block and an adsorption contact block arranged on the side of the adsorption block away from the flexible connecting member. An adsorption cavity is formed in the adsorption block, and an adsorption hole communicating with the adsorption cavity is formed in the adsorption contact block. The vacuum unit Connect with the adsorption chamber.
較佳地,吸附接觸塊採用防靜電材料製成。 Preferably, the adsorption contact block is made of anti-static material.
較佳地,真空單元包括抽氣泵及氣體管道,抽氣泵通過氣體管道與每個吸附塊內的吸附腔連通,以使吸附腔形成真空。 Preferably, the vacuum unit includes an air pump and a gas pipeline, and the air pump communicates with the adsorption chamber in each adsorption block through the gas pipeline, so that the adsorption chamber forms a vacuum.
較佳地,每個吸附塊中具有兩個吸附腔,真空單元具有兩個氣體管道,兩個氣體管道分別與每個吸附塊內的兩個吸附腔對應連通,以形成兩路獨立的真空通道。 Preferably, each adsorption block has two adsorption cavities, the vacuum unit has two gas pipes, and the two gas pipes are respectively connected with the two adsorption cavities in each adsorption block to form two independent vacuum channels .
本發明還提供了一種光刻系統,包括的軟性吸附裝置。 The invention also provides a photolithography system, including a soft adsorption device.
在本發明提供的軟性連接件、軟性吸附裝置及光刻系統中,多個吸附單元均通過軟性連接件與支撑單元連接,且每個軟性連接件的底部位於同一水平面上,每個吸附單元的底部位於同一水平面上,真空單元與每個吸附單元連接以實現對遮罩板的真空吸附,由於軟性連接件包括連接件本體及設置於 連接件本體上的第一方向凹槽和第二方向凹槽,在吸附遮罩板時連接件本體可以產生形變,實現在繞第一方向旋轉和繞第二方向旋轉兩個方向上的自適應調整,保證吸附單元的底部與遮罩板表面的完全貼合,減小了遮罩板的變形量,從而提高了交接精度,並且有效避免了吸附單元和遮罩板的剛性接觸,起到保護遮罩板的作用。 In the flexible connector, the flexible adsorption device and the lithography system provided by the present invention, a plurality of adsorption units are connected to the supporting unit through a flexible connector, and the bottom of each flexible connector is located on the same horizontal surface, and the The bottom is located on the same level. The vacuum unit is connected with each adsorption unit to realize the vacuum adsorption of the shield plate. Because the flexible connector includes the connector body and is arranged on the The first direction groove and the second direction groove on the connector body, the connector body can be deformed when the shield plate is adsorbed, so as to realize the self-adaptation in two directions of rotation around the first direction and rotation around the second direction Adjust to ensure that the bottom of the suction unit is completely attached to the surface of the shield plate, reduce the deformation of the shield plate, thereby improve the accuracy of handover, and effectively avoid the rigid contact between the suction unit and the shield plate for protection The role of the mask plate.
10:支撑單元 10: Support unit
20:軟性連接件 20: Flexible connector
21:連接件本體 21: Connector body
22:X向凹槽 22: X groove
23:Y向凹槽 23: Y groove
30:吸附單元 30: Adsorption unit
31:吸附塊 31: Adsorption block
311a:第一吸附腔 311a: The first adsorption chamber
311b:第二吸附腔 311b: The second adsorption chamber
32:吸附接觸塊 32: Adsorption contact block
321a:第一吸附孔 321a: The first adsorption hole
321b:第二吸附孔 321b: second adsorption hole
41a:第一氣體管道 41a: First gas pipeline
41b:第二氣體管道 41b: Second gas pipeline
42:總氣管接頭 42: Main air pipe joint
43a:第一真空接口 43a: The first vacuum port
43b:第二真空接口 43b: second vacuum port
50:遮罩板 50: Mask plate
第1圖為本發明實施例提供的軟性連接件的結構示意圖。 Figure 1 is a schematic structural diagram of a flexible connector provided by an embodiment of the present invention.
第2圖為本發明實施例提供的軟性連接件在X方向上的剖面示意圖。 Figure 2 is a schematic cross-sectional view in the X direction of a flexible connector provided by an embodiment of the present invention.
第3圖為本發明實施例提供的第2圖中Q視野的示意圖。 Figure 3 is a schematic diagram of the Q field of view in Figure 2 provided by an embodiment of the present invention.
第4圖為本發明實施例提供的軟性連接件在Y方向上的剖面示意圖。 Figure 4 is a schematic cross-sectional view in the Y direction of a flexible connector provided by an embodiment of the present invention.
第5圖為本發明實施例提供的X向凹槽或Y向凹槽等效為阻尼的示意圖。 Figure 5 is a schematic diagram showing that the X-direction groove or the Y-direction groove provided by an embodiment of the present invention is equivalent to damping.
第6圖為本發明實施例提供的軟性吸附裝置的結構示意圖。 Figure 6 is a schematic structural diagram of a soft adsorption device provided by an embodiment of the present invention.
第7圖為本發明實施例提供的吸附塊的結構示意圖。 Figure 7 is a schematic structural diagram of an adsorption block provided by an embodiment of the present invention.
下面將結合示意圖對本發明的具體實施方式進行更詳細的描述。根據下列描述和申請專利範圍,本發明的優點和特徵將更清楚。需說明的是,圖式均採用非常簡化的形式且均使用非精準的比例,僅用以方便、明晰地輔助說明本發明實施例的目的。 The specific embodiments of the present invention will be described in more detail below in conjunction with the schematic diagrams. According to the following description and the scope of patent application, the advantages and features of the present invention will be more clear. It should be noted that the drawings all adopt a very simplified form and all use imprecise proportions, which are only used to conveniently and clearly assist in explaining the purpose of the embodiments of the present invention.
如第1圖-第4圖所示,本實施例提供了一種軟性連接件20,包括連接件本體21及設置於連接件本體21上的第一方向凹槽22(在此第一方向為X方向,也即X向凹槽22)和第二方向凹槽23(在此第二方向為Y方向,也即Y向凹槽23),所述X向凹槽22沿X向割裂所述連接件本體21並延伸進所述連接件本體
21內部,所述Y向凹槽23沿Y向割裂所述連接件本體21並延伸進所述連接件本體21內部。
As shown in Figures 1 to 4, this embodiment provides a
具體的,如第1圖所示,所述連接件本體21是採用金屬材料一體成型的,結構較為牢固,所述連接件本體21沿Z向上的兩個端部均具有安裝孔,通過所述安裝孔進行連接和固定,所述安裝孔通常可以是螺孔,並且所述連接件本體21兩端的安裝孔可以是一個或多個。
Specifically, as shown in Figure 1, the
進一步,所述連接件本體21上還設置有X向凹槽22和Y向凹槽23,可以理解為,所述X向凹槽22是沿著X向切割所述連接件本體21而形成的縫隙,所述Y向凹槽23是沿著Y向切割所述連接件本體21而形成的縫隙,且所述X向凹槽22和所述Y向凹槽23均延伸進所述連接件本體21內部,而不能將所述連接件本體21切割成兩部分,即所述X向凹槽22和所述Y向凹槽23不能貫穿所述連接件本體21。較佳地,所述X向凹槽22和所述Y向凹槽23均延伸進所述連接件本體21的體中軸線附近即可。
Further, the
可以理解的是,所述X向凹槽22和所述Y向凹槽23在Z向上位於不同的平面(在Z向上的位置不同),如第5圖所示,當所述連接件本體21受力時,所述X向凹槽22或所述Y向凹槽23均可以等效為一個阻尼和一個彈簧的彈性結構(其中彈簧的剛度為K,阻尼的阻尼係數為C),起到緩衝變形的效果。由於所述X向凹槽22的存在,所述連接件本體21可以繞Y向前後轉動一個角度(調整Ry),由於所述Y向凹槽23的存在,所述連接件本體21可以繞X向左右轉動一個角度(調整Rx)。所以所述連接件本體21採用了金屬材料製成以保證穩定性和牢固的同時,通過在Rx、Ry兩個方向的位置自適應實現軟性連接。
It can be understood that the
如第2圖及第4圖所示,本實施例中,所述X向凹槽22和所述Y向凹槽23的數量均為兩個,兩個所述X向凹槽22沿所述連接件本體21的體中軸線對稱設置,兩個所述Y向凹槽23沿所述連接件本體21的體中軸線對稱設置,這樣一來,所述連接件本體21繞X向左右轉動的角度近似相等,繞Y向前後轉動的角度也近似相等,使所述連接件本體21受力時能夠平穩的發生形變,避免了所述軟性連接件20損壞。
As shown in Figures 2 and 4, in this embodiment, the number of the
較佳地,所述X向凹槽22和所述Y向凹槽23均具有與其連通的延伸槽,也即,所述X向凹槽22和所述Y向凹槽不僅可以是一字形,還可以在延伸進所述連接件本體21內部後,再沿第三方向(在此為Z向)延伸以形成所述延伸槽,即所述連接件本體21上還設置有沿Z向延伸的第一延伸槽和第二延伸槽,所述第一延伸槽和所述X向凹槽22延伸連接,所述第二延伸槽和所述Y向凹槽23延伸連接,以使所述X向凹槽22(含所述第一延伸槽)和所述Y向凹槽23(含所述第二延伸槽)呈L型,L型的所述X向凹槽22和所述Y向凹槽23能夠使所述軟性連接件20更容易產生形變。
Preferably, both the
基於此,如第6圖所示,本實施例還提供了一種軟性吸附裝置,用於吸附一遮罩板50,包括:支撑單元10,本實施例中,所述支撑單元10是一Y型的支架,為整個所述軟性吸附裝置提供支撑,其頂部可以與一機械手連接,以使所述軟性吸附裝置吸附住所述遮罩板50後,可以進行移動以轉移所述遮罩板50。
Based on this, as shown in Figure 6, this embodiment also provides a flexible suction device for absorbing a
多個吸附單元30,例如,本實施例中具有4個所述吸附單元30,每個所述吸附單元30均通過所述軟性連接件20與所述支撑單元10的底部連接。4個所述吸附單元30均包括一吸附塊31,每個所述吸附塊31的底部為吸附面,用
於與所述遮罩板50接觸以實現吸附。較佳地,所述遮罩板50可以是一方形的板狀結構,4個所述吸附塊31可以分別固定住所述遮罩板50的4個角,吸附所述遮罩板50時更加穩定,可以防止所述遮罩板50在移動的過程中相對所述吸附單元30產生滑動。進一步,每個所述軟性連接件20的底部位於同一水平面上,每個所述吸附單元30(或吸附塊31)的底部位於同一水平面上,使所述吸附塊31的吸附面能夠儘量貼合所述遮罩板50。
A plurality of
真空單元,與每個所述吸附單元30連接以實現對所述遮罩板50的真空吸附。具體的,如第6及7圖所示,本實施例中,所述真空單元包括抽氣泵(未圖示)及兩路獨立的氣體管道(第一氣體管道41a和第二氣體管道41b),每個所述吸附塊31中具有兩個獨立的吸附腔(第一吸附腔311a和第二吸附腔311b),所述第一氣體管道41a和第二氣體管道41b安裝在所述支撑單元10上,且所述支撑單元10設置有一總氣管接頭42,所述抽氣泵通過與所述總氣管接頭42與所述第一氣體管道41a和第二氣體管道41b連通,所述第一氣體管道41a通過第一真空接口43a與每個所述吸附塊31內的第一吸附腔311a連通,所述第二氣體管道41b通過第二真空接口43b與每個所述吸附塊31內的第二吸附腔311b連通,以形成兩路獨立的真空通道,實現對遮罩板50的真空吸附,兩路真空通道互不干擾,防止一路真空通道漏氣或失效,造成遮罩板50掉落的風險。
A vacuum unit is connected to each of the
如第6圖所示,所述吸附單元30還包括吸附接觸塊32,所述吸附接觸塊32黏接在所述吸附塊31的底部,用於直接與所述遮罩板50接觸,本實施例中,所述吸附接觸塊32的材料採用的是防靜電材料,例如是PEEK(ESD)材料,該材料具有靜電耗散作用,所述吸附單元30吸附所述遮罩板50時產生的靜電,可通過所述吸附接觸塊32傳遞到所述支撑單元10上,再傳到所述支撑單元
10上的接地線,可導出靜電,有效防止靜電對所述遮罩板50的傷害。可以理解的是,所述吸附接觸塊32上也具有兩個獨立的吸附孔(第一吸附孔321a和第二吸附孔321b),所述第一吸附孔321a和所述第二吸附孔321b分別與所述第一吸附腔311a和第二吸附腔311b連通,以用於吸附所述遮罩板50。
As shown in Fig. 6, the
進一步,如第5圖所示,本實施提供的軟性吸附裝置在吸附所述遮罩板50時,可實現吸附遮罩板在Rx、Ry兩個方向的位置自適應,可以對一定小傾斜角度放置的遮罩板50實現軟性接觸與吸附,有效避免剛性接觸,起到保護遮罩板50的作用,保證吸附面與遮罩板50完全貼合。較佳地,所述遮罩板50與所述軟性連接件20的剛度比為K,4個所述軟性連接件20底部的共面度與所述遮罩板50的變形量的比值為G,本實施例中KG,以實現大幅度減小遮罩板50的變形量,同時,所述X向凹槽和所述Y向凹槽共同產生的阻尼係數大於1,以有效抑制所述吸附單元30在接觸所述遮罩板50時的振動。
Further, as shown in Fig. 5, the flexible suction device provided by this embodiment can realize the self-adaptive position of the suction mask plate in the two directions of Rx and Ry when the
較佳地,為了得到所述X向凹槽22和所述Y向凹槽23的尺寸,在所述X向凹槽22和所述Y向凹槽23為如第1圖所示的L型結構時,作如下的計算:當所述吸附塊31的吸附面相對所述遮罩板50表面的平面度較大時,在吸附力的作用下,4個所述軟性連接件20與所述遮罩板50會受到一個扭轉力矩,發生扭轉變形,兩者變形量由其扭轉剛度比决定,即所述遮罩板50與所述軟性連接件20的剛度比K為其扭轉剛度比κr/κm:
其中,如第2圖-第4圖所示,Br為遮罩板的長度;Er為遮罩板的彈性模量(遮罩板材料為石英);tr為遮罩板的厚度;Lr為遮罩板寬度的一半;Bm為延伸槽沿Z向的長度尺寸;Em為吸附單元的彈性模量;tm為X向凹槽的寬度(或者也可以是Y向凹槽的寬度,這裏默認X向凹槽和Y向凹槽的寬度相等);Lm為Y向凹槽沿X向的長度尺寸(軟性連接件沿X向的長度尺寸)。 Wherein, as in FIG. 2 - section shown in FIG. 4, B r is the mask length of the plate; E r is the modulus of elasticity of the mask plate (mask material, quartz plate); t r is the thickness of the mask plate; L r is half the sheet width of the mask; B m of a length dimension extending along the Z direction groove; E m is the modulus of elasticity of the adsorption unit; t m X-directional width of the grooves (or the groove may be a Y The width of the X-direction groove and the Y-direction groove are assumed to be equal here); L m is the length dimension of the Y-direction groove along the X direction (the length dimension of the flexible connector along the X direction).
得到所述遮罩板50與軟性連接件20的剛度比K之後,根據KG和4個軟性連接件20的平面度值可以確定此時遮罩板50的變形量,再通過靜力學分析,得到遮罩板50由自重引起的變形量,綜合二者之和可得到遮罩板50的總變形量。通過反復試驗可計算出,當所述X向凹槽22沿Y向的深度為大於0mm且小於等於8mm,所述Y向凹槽23沿X向的深度為大於0mm且小於等於8mm,所述延伸槽沿Z向的長度尺寸為大於0mm且小於等於7mm,所述X向凹槽22和所述Y向凹槽23的寬度均大於0mm且小於等於0.1mm時,可以達到較大幅度減小遮罩板的變形量目的,且此時在不同的衝擊頻率下,整個振動周期內所述X向凹槽22和所述Y向凹槽23共同產生的阻尼係數大於1,能滿足使用要求。
After obtaining the stiffness ratio K of the
基於此,本實施例還提供了一種光刻系統,所述光刻系統採用所述軟性吸附裝置進行遮罩板的交接和傳遞,能夠減小遮罩板的變形量,並使得交接精度較高。 Based on this, this embodiment also provides a photolithography system that uses the flexible adsorption device to transfer and transfer the mask plate, which can reduce the deformation of the mask plate and make the transfer accuracy higher. .
綜上,在本發明實施例提供的軟性連接件、軟性吸附裝置及光刻系統中,多個吸附單元均通過軟性連接件與支撑單元連接,且每個所述軟性連接件的底部位於同一水平面上,每個所述吸附單元的底部位於同一水平面上,真空單元,與每個所述吸附單元連接以實現對遮罩板的真空吸附,由於軟性連接件包括連接件本體及設置於所述連接件本體上的X向凹槽和Y向凹槽,在吸附 所述遮罩板時連接件本體可以產生形變,實現在Rx、Ry兩個方向上的自適應調整,保證吸附單元的底部與遮罩板表面的完全貼合,減小了遮罩板的變形量,從而提高了交接精度,並且有效避免了吸附單元和遮罩板的剛性接觸,起到保護遮罩板的作用。 In summary, in the flexible connector, the flexible adsorption device, and the photolithography system provided by the embodiments of the present invention, a plurality of adsorption units are connected to the supporting unit through the flexible connector, and the bottom of each of the flexible connectors is located on the same horizontal plane Above, the bottom of each adsorption unit is located on the same horizontal surface, and the vacuum unit is connected with each adsorption unit to achieve vacuum adsorption of the shield plate. Because the flexible connector includes a connector body and is arranged on the connection The X-direction groove and Y-direction groove on the body of the piece are adsorbing The body of the connector can be deformed when the shield plate is used to realize adaptive adjustment in the two directions of Rx and Ry, to ensure that the bottom of the suction unit is completely attached to the surface of the shield plate, and the deformation of the shield plate is reduced Therefore, the transfer accuracy is improved, and the rigid contact between the suction unit and the shield plate is effectively avoided, and the shield plate is protected.
上述僅為本發明的較佳實施例而已,並不對本發明起到任何限制作用。任何所屬技術領域的具通常知識者,在不脫離本發明的技術手段的範圍內,對本發明揭露的技術手段和技術內容做任何形式的等同替換或修改等變動,均屬未脫離本發明的技術手段的內容,仍屬於本發明的保護範圍之內。 The above are only preferred embodiments of the present invention, and do not play any restrictive effect on the present invention. Any person with ordinary knowledge in the technical field, without departing from the scope of the technical means of the present invention, makes any form of equivalent replacement or modification or other changes to the technical means and technical content disclosed in the present invention, which is a technology that does not depart from the present invention. The content of the means still falls within the protection scope of the present invention.
10:支撑單元 10: Support unit
20:軟性連接件 20: Flexible connector
30:吸附單元 30: Adsorption unit
31:吸附塊 31: Adsorption block
32:吸附接觸塊 32: Adsorption contact block
41a:第一氣體管道 41a: First gas pipeline
41b:第二氣體管道 41b: Second gas pipeline
42:總氣管接頭 42: Main air pipe joint
43a:第一真空接口 43a: The first vacuum port
43b:第二真空接口 43b: second vacuum port
50:遮罩板 50: Mask plate
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TW201739588A (en) * | 2016-05-05 | 2017-11-16 | 應用材料股份有限公司 | Robot subassemblies, end effector assemblies, and methods with reduced cracking |
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