TWI731481B - 框架一體型掩模的製造裝置 - Google Patents

框架一體型掩模的製造裝置 Download PDF

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Publication number
TWI731481B
TWI731481B TW108142939A TW108142939A TWI731481B TW I731481 B TWI731481 B TW I731481B TW 108142939 A TW108142939 A TW 108142939A TW 108142939 A TW108142939 A TW 108142939A TW I731481 B TWI731481 B TW I731481B
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TW
Taiwan
Prior art keywords
mask
frame
unit
temperature
template
Prior art date
Application number
TW108142939A
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English (en)
Chinese (zh)
Other versions
TW202036958A (zh
Inventor
李裕進
李炳一
Original Assignee
南韓商Tgo科技股份有限公司
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Application filed by 南韓商Tgo科技股份有限公司 filed Critical 南韓商Tgo科技股份有限公司
Publication of TW202036958A publication Critical patent/TW202036958A/zh
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Publication of TWI731481B publication Critical patent/TWI731481B/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20—Bonding
    • B23K26/21—Bonding by welding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70—Auxiliary operations or equipment
    • B23K26/702—Auxiliary equipment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G03F7/2063—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching
TW108142939A 2018-11-28 2019-11-26 框架一體型掩模的製造裝置 TWI731481B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020180149589A KR102217812B1 (ko) 2018-11-28 2018-11-28 프레임 일체형 마스크의 제조 장치
KR10-2018-0149589 2018-11-28

Publications (2)

Publication Number Publication Date
TW202036958A TW202036958A (zh) 2020-10-01
TWI731481B true TWI731481B (zh) 2021-06-21

Family

ID=70866500

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108142939A TWI731481B (zh) 2018-11-28 2019-11-26 框架一體型掩模的製造裝置

Country Status (3)

Country Link
KR (1) KR102217812B1 (ko)
CN (1) CN111230295B (ko)
TW (1) TWI731481B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115537717A (zh) * 2021-06-30 2022-12-30 上海微电子装备（集团）股份有限公司 金属掩模的张网装置及其方法、张网设备

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW459319B (en) * 1999-06-01 2001-10-11 Mitsubishi Electric Corp Method for mounting semiconductor elements
KR20040008314A (ko) * 2002-07-18 2004-01-31 요업기술원 항균력이 우수한 수산화 아파타이트의 제조방법
TW200947156A (en) * 2007-11-20 2009-11-16 Samsung Mobile Display Co Ltd Method and apparatus for fabricating vertical deposition mask
TW201306652A (zh) * 2011-08-25 2013-02-01 Hansong Co Ltd 用於主動式有機電發光二極體顯示器（ａｍｏｌｅｄ）面板製造的分割遮罩框架組件製造裝置
TW201424060A (zh) * 2012-10-17 2014-06-16 Nobukazu Kato 導電圖案構材以及導電圖案構件的製造方法
JP2015127441A (ja) * 2013-12-27 2015-07-09 大日本印刷株式会社 蒸着マスク装置の製造方法
CN107425135A (zh) * 2017-05-05 2017-12-01 京东方科技集团股份有限公司 掩膜板固定底板及掩模板固定装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100534580B1 (ko) * 2003-03-27 2005-12-07 삼성에스디아이 주식회사 표시장치용 증착 마스크 및 그의 제조방법
CN102717187B (zh) * 2011-03-31 2015-03-25 昆山允升吉光电科技有限公司 金属掩模板组装机
CN104097027A (zh) * 2013-04-10 2014-10-15 昆山思拓机器有限公司 一种oled金属掩膜板的制作方法
KR102227473B1 (ko) * 2013-04-15 2021-03-15 삼성디스플레이 주식회사 박막 증착 장치 및 이를 이용한 박막 형성 방법

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW459319B (en) * 1999-06-01 2001-10-11 Mitsubishi Electric Corp Method for mounting semiconductor elements
KR20040008314A (ko) * 2002-07-18 2004-01-31 요업기술원 항균력이 우수한 수산화 아파타이트의 제조방법
TW200947156A (en) * 2007-11-20 2009-11-16 Samsung Mobile Display Co Ltd Method and apparatus for fabricating vertical deposition mask
TW201306652A (zh) * 2011-08-25 2013-02-01 Hansong Co Ltd 用於主動式有機電發光二極體顯示器（ａｍｏｌｅｄ）面板製造的分割遮罩框架組件製造裝置
TW201424060A (zh) * 2012-10-17 2014-06-16 Nobukazu Kato 導電圖案構材以及導電圖案構件的製造方法
JP2015127441A (ja) * 2013-12-27 2015-07-09 大日本印刷株式会社 蒸着マスク装置の製造方法
CN107425135A (zh) * 2017-05-05 2017-12-01 京东方科技集团股份有限公司 掩膜板固定底板及掩模板固定装置

Also Published As

Publication number Publication date
KR102217812B1 (ko) 2021-02-22
TW202036958A (zh) 2020-10-01
KR20200063638A (ko) 2020-06-05
CN111230295B (zh) 2021-12-24
CN111230295A (zh) 2020-06-05

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