TWI728114B - 用於形成雷射持續電漿之系統及電漿燈以及用於產生雷射持續電漿輻射之方法 - Google Patents

用於形成雷射持續電漿之系統及電漿燈以及用於產生雷射持續電漿輻射之方法 Download PDF

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Publication number
TWI728114B
TWI728114B TW106117298A TW106117298A TWI728114B TW I728114 B TWI728114 B TW I728114B TW 106117298 A TW106117298 A TW 106117298A TW 106117298 A TW106117298 A TW 106117298A TW I728114 B TWI728114 B TW I728114B
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Taiwan
Prior art keywords
gas
radiation
gas mixture
plasma
gas component
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TW106117298A
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English (en)
Chinese (zh)
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TW201805997A (zh
Inventor
伊爾亞 畢札爾
肯尼斯 Ｐ 葛洛斯
勞倫 威爾森
拉赫 亞達夫
約書亞 威坦伯格
艾札茲 柏輝原
亞納圖里 斯奇密利尼
亞納特 奇瑪吉
瑞秋 索拉施
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美商克萊譚克公司
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Publication of TW201805997A publication Critical patent/TW201805997A/zh
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/025—Associated optical elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
    • H01J61/16—Selection of substances for gas fillings; Specified operating pressure or temperature having helium, argon, neon, krypton, or xenon as the principle constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
    • H01J61/18—Selection of substances for gas fillings; Specified operating pressure or temperature having a metallic vapour as the principal constituent
    • H01J61/20—Selection of substances for gas fillings; Specified operating pressure or temperature having a metallic vapour as the principal constituent mercury vapour
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/36—Seals between parts of vessels; Seals for leading-in conductors; Leading-in conductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Discharge Lamp (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
TW106117298A 2016-05-25 2017-05-25 用於形成雷射持續電漿之系統及電漿燈以及用於產生雷射持續電漿輻射之方法 TWI728114B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201662341532P 2016-05-25 2016-05-25
US62/341,532 2016-05-25
US15/223,335 2016-07-29
US15/223,335 US9899205B2 (en) 2016-05-25 2016-07-29 System and method for inhibiting VUV radiative emission of a laser-sustained plasma source

Publications (2)

Publication Number Publication Date
TW201805997A TW201805997A (zh) 2018-02-16
TWI728114B true TWI728114B (zh) 2021-05-21

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TW106117298A TWI728114B (zh) 2016-05-25 2017-05-25 用於形成雷射持續電漿之系統及電漿燈以及用於產生雷射持續電漿輻射之方法

Country Status (8)

Country Link
US (1) US9899205B2 (ko)
EP (1) EP3466220B1 (ko)
JP (1) JP6847129B2 (ko)
KR (1) KR102228496B1 (ko)
CN (2) CN115696707A (ko)
IL (2) IL272856B2 (ko)
TW (1) TWI728114B (ko)
WO (1) WO2017205198A1 (ko)

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US10690589B2 (en) * 2017-07-28 2020-06-23 Kla-Tencor Corporation Laser sustained plasma light source with forced flow through natural convection
US10631392B2 (en) * 2018-04-30 2020-04-21 Taiwan Semiconductor Manufacturing Company, Ltd. EUV collector contamination prevention
US11690162B2 (en) 2020-04-13 2023-06-27 Kla Corporation Laser-sustained plasma light source with gas vortex flow
RU2738462C1 (ru) * 2020-06-08 2020-12-14 Федеральное государственное бюджетное учреждение науки Институт проблем механики им. А.Ю. Ишлинского Российской академии наук (ИПМех РАН) Устройство и способ устранения неустойчивостей оптического разряда
RU2734111C1 (ru) * 2020-06-08 2020-10-13 Федеральное государственное бюджетное учреждение науки Институт проблем механики им. А.Ю. Ишлинского Российской академии наук (ИПМех РАН) Способ предотвращения колебаний оптического разряда
RU2738463C1 (ru) * 2020-06-08 2020-12-14 Федеральное государственное бюджетное учреждение науки Институт проблем механики им. А.Ю. Ишлинского Российской академии наук (ИПМех РАН) Устройство и способ избавления от неустойчивостей оптического разряда

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US20130001438A1 (en) * 2011-06-29 2013-01-03 Kla-Tencor Corporation Optically pumping to sustain plasma
US20130003384A1 (en) * 2011-06-29 2013-01-03 Kla-Tencor Corporation Adaptive optics for compensating aberrations in light-sustained plasma cells
US20130342105A1 (en) * 2012-06-26 2013-12-26 Kla-Tencor Corporation Laser Sustained Plasma Light Source With Electrically Induced Gas Flow
TW201415529A (zh) * 2012-08-08 2014-04-16 Kla Tencor Corp 雷射支持之含水之電漿泡
TW201515058A (zh) * 2013-08-14 2015-04-16 Kla Tencor Corp 用來使用雷射支持之電漿照明輸出對樣本成像之系統與方法
WO2015168407A1 (en) * 2014-04-30 2015-11-05 Kla-Tencor Corporation Broadband light source including transparent portion with high hydroxide content

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TWI258795B (en) * 2001-07-12 2006-07-21 Axcelis Tech Inc Tunable radiation source providing a VUV wavelength planar illumination pattern for processing semiconductor wafers
US20130001438A1 (en) * 2011-06-29 2013-01-03 Kla-Tencor Corporation Optically pumping to sustain plasma
US20130003384A1 (en) * 2011-06-29 2013-01-03 Kla-Tencor Corporation Adaptive optics for compensating aberrations in light-sustained plasma cells
US20130342105A1 (en) * 2012-06-26 2013-12-26 Kla-Tencor Corporation Laser Sustained Plasma Light Source With Electrically Induced Gas Flow
TW201415529A (zh) * 2012-08-08 2014-04-16 Kla Tencor Corp 雷射支持之含水之電漿泡
TW201515058A (zh) * 2013-08-14 2015-04-16 Kla Tencor Corp 用來使用雷射支持之電漿照明輸出對樣本成像之系統與方法
WO2015168407A1 (en) * 2014-04-30 2015-11-05 Kla-Tencor Corporation Broadband light source including transparent portion with high hydroxide content

Also Published As

Publication number Publication date
US9899205B2 (en) 2018-02-20
EP3466220A4 (en) 2020-03-18
KR102228496B1 (ko) 2021-03-15
IL272856B1 (en) 2023-09-01
CN115696707A (zh) 2023-02-03
IL262666A (en) 2018-12-31
TW201805997A (zh) 2018-02-16
KR20190001606A (ko) 2019-01-04
IL272856A (en) 2020-04-30
CN109315058A (zh) 2019-02-05
US20170345639A1 (en) 2017-11-30
WO2017205198A1 (en) 2017-11-30
JP6847129B2 (ja) 2021-03-24
EP3466220B1 (en) 2023-08-02
EP3466220A1 (en) 2019-04-10
IL262666B (en) 2022-04-01
IL272856B2 (en) 2024-01-01
JP2019519887A (ja) 2019-07-11

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