TWI726917B - Exposure apparatus and exposure method, and manufacturing method of flat panel display - Google Patents

Abstract

The control system is based on a code generated by compensating for at least one of the movement of a plurality of grid regions (RG) (ruler (152)), a plurality of reading heads (66a~66d), and a substrate holder (34) The correction information of the measurement error of the measurement system of the device system and the position information measured by the measurement system are used to control the drive system of the substrate holder. A plurality of reading heads are from the reading head during the movement of the substrate holder in the X-axis direction. The measuring beam is separated from one of the plurality of grid areas (RG) and transferred to another adjacent grid area (RG).

Description

Exposure device, exposure method, and flat panel display manufacturing method

The present invention relates to an exposure device, an exposure method, and a flat-panel display manufacturing method. More specifically, it relates to an exposure device and an exposure method used in the lithography process for manufacturing micro-elements such as liquid crystal display elements, and the use of an exposure device or exposure method The manufacturing method of flat panel display.

In the past, in the lithography process for manufacturing electronic components (micro-components) such as liquid crystal display elements and semiconductor components (integrated circuits, etc.), a step-and-scan exposure device (so-called scanning stepper (also called scanning Machine)), etc., which is to make the photomask or reticle (hereinafter collectively referred to as "mask") and glass plate or wafer (hereinafter collectively referred to as "substrate") along the predetermined scanning direction (SCAN direction) Move synchronously, while transferring the pattern formed on the photomask illuminated by the energy beam to the substrate.

As this type of exposure device, there is known a light interference instrument system that uses a rod mirror (a long mirror) included in the substrate stage device to obtain position information of the substrate to be exposed in the horizontal plane (see, for example, Patent Document 1) .

Here, in the case of using the optical interference instrument system to obtain the position information of the substrate, the influence of the so-called air shaking cannot be ignored. In addition, although the influence of the above-mentioned air shaking can be reduced by using an encoder system, it is difficult to prepare to cover the entire movement of the substrate due to the increase in the size of the substrate in recent years. Ruler of scope.

Advanced technical literature

[Patent Document 1] U.S. Patent Application Publication No. 2010/0018950

According to a first aspect of the present invention, there is provided an exposure apparatus that exposes a substrate with illumination light through a projection optical system, and includes: a movable body arranged under the projection optical system to hold the substrate; The moving body is moved in the first and second directions orthogonal to each other in a predetermined plane where the optical axis of the projection optical system is orthogonal to each other; the measurement system is provided as a lattice member in which a plurality of lattice areas are separated from each other in the first direction, And one of the plurality of first heads that respectively irradiate the measuring beam to the lattice member and can move in the second direction is provided in the movable body, and the other of the lattice member and the plurality of first read heads and The moving body is opposed to the moving body, and the measuring device has a measuring device for measuring the position information of the plurality of first reading heads in the second direction, and the measuring beam is irradiated on the plurality of grid areas according to the plurality of first reading heads The measurement information of at least three first reading heads in at least one grid area and the measurement information of the aforementioned measuring device measure the position information of the aforementioned moving body at least in the direction of 3 degrees of freedom in the aforementioned predetermined plane; and the control system, according to Correction information used to compensate for the measurement error of the measurement system generated by at least one of the movement of the grid member, the plurality of first reading heads, and the moving body, and the position information measured by the measurement system to control the drive System; the plurality of first reading heads, respectively, the measuring beam is separated from one of the plurality of grid regions during the movement of the movable body in the first direction, and moves to the aforementioned one Another grid area adjacent to the grid area.

According to a second aspect of the present invention, there is provided an exposure device that exposes a substrate with illumination light through a projection optical system, and includes: a movable body disposed under the projection optical system to hold the substrate; The moving body is moved in the first and second directions orthogonal to each other in a predetermined plane where the optical axis of the projection optical system is orthogonal to each other; the measurement system is arranged such that a plurality of lattice regions are arranged separately from each other in the first direction and the lattice member and One of the plurality of first heads that are respectively irradiated with a measuring beam and movable in the second direction to the lattice member is provided in the movable body, and the other of the lattice member and the plurality of first read heads is the same as the foregoing The moving body is opposite, the aforementioned measuring system has a measuring device, and the measuring device is arranged such that one of the scale member and the second reading head is provided on the plurality of first reading heads, and the other of the scale member and the second reading head is provided. One side is opposed to the plurality of first reading heads, and irradiating the measuring beam to the scale member through the second reading head to measure the position information of the plurality of first reading heads in the second direction, according to the plurality of first reading heads. The measurement information of at least three first reading heads in which the measurement beam irradiates at least one of the plurality of grid areas and the measurement information of the measurement device in the reading head are irradiated to at least 3 degrees of freedom directions in the predetermined plane. The position information of the moving body; and the control system, based on the correction information used to compensate for the measurement error of the measurement device generated by at least one of the scale member and the second reading head, and the measurement system The position information controls the drive system; the plurality of first reading heads, respectively, when the moving body moves in the first direction, the measuring beam is separated from one of the plurality of grid areas and moved to the same Another grid area adjacent to the grid area.

According to a third aspect of the present invention, there is provided a method for manufacturing a flat panel display, which includes: using the exposure device of the first aspect or the exposure device of the second aspect to expose a substrate; And the action of developing the exposed substrate.

According to a fourth aspect of the present invention, there is provided an exposure method that exposes a substrate with illumination light through a projection optical system, which includes: A grid member in which a plurality of grid regions are separated from each other in the 1 direction and one of a plurality of first heads that respectively irradiate the grid member with a measuring beam and can move in a second direction orthogonal to the first direction in the predetermined plane One is provided on the movable body that holds the substrate, and the lattice member and the other of the plurality of first heads are opposed to the movable body, and have the positions of the plurality of first heads measuring in the second direction The measurement of the information measuring device is based on the measurement information of at least three first reading heads of the plurality of first reading heads irradiated on at least one of the plurality of grid areas by the measuring beams and the measurement of the measuring device Information, measuring the motion of the position information of the moving body at least in the direction of 3 degrees of freedom in the predetermined plane; and according to at least compensation for the movement of the lattice member, the plurality of first reading heads, and the moving body One generated correction information for the measurement error of the measurement system and the movement of the moving body based on the position information measured by the measurement system; the plurality of first reading heads respectively move the moving body in the first direction During the movement, the measuring beam is separated from one of the plurality of grid areas and moved to another grid area adjacent to the one grid area.

According to a fifth aspect of the present invention, there is provided an exposure method that exposes a substrate with illumination light through a projection optical system, which includes: A grid member in which a plurality of grid regions are separated from each other in the 1 direction and one of a plurality of first heads that respectively irradiate the grid member with a measuring beam and can move in a second direction orthogonal to the first direction in the predetermined plane One side is set to hold the aforementioned substrate The movable body and the lattice member and the other of the plurality of first reading heads are opposed to the movable body and are further arranged such that one of the scale members and the second reading head is provided on the plurality of first reading heads and the scale The other of the member and the second head is opposed to the plurality of first heads, and has a measuring beam that irradiates the scale member through the second head to measure the number of the first heads in the second direction. The measurement of the position information measuring device is based on the measurement information of the at least three first reading heads of the plurality of first reading heads irradiated on at least one of the plurality of grid areas by the measuring beams and the measurement information of the measuring device Measuring information, measuring the action of the position information of the moving body in at least 3 degrees of freedom in the predetermined plane; and according to the measuring device used to compensate for at least one of the lattice member and the second reading head The correction information of the measurement error and the movement of the moving body based on the position information measured by the measurement system; the plurality of first reading heads respectively move the moving body in the first direction, and the measuring beam moves from One of the plurality of grid regions is separated from and moved to another grid region adjacent to the one grid region.

According to a sixth aspect of the present invention, there is provided a method for manufacturing a flat panel display, which includes: an action of exposing a substrate using the exposure method of the fourth aspect or the exposure method of the fifth aspect; and an action of developing the exposed substrate .

10‧‧‧LCD Exposure Device

14‧‧‧Mask stage device

20‧‧‧Substrate stage device

34‧‧‧Substrate holder

40‧‧‧Mask holder

44‧‧‧Reading head unit

46‧‧‧Ruler

48‧‧‧Mask Encoder System

50‧‧‧Substrate encoder system

52‧‧‧ Ruler

56‧‧‧Ruler

60‧‧‧Reading head unit

90‧‧‧Main control device

M‧‧‧Mask

P‧‧‧Substrate

Fig. 1 is a diagram schematically showing the structure of the liquid crystal exposure apparatus of the first embodiment.

Fig. 2 is a diagram showing an example of a substrate stage device included in the liquid crystal exposure apparatus of Fig. 1.

Fig. 3(A) is a diagram schematically showing the structure of the mask encoder system, and Fig. 3(B) is an enlarged view of a part of the mask encoder system (part A of Fig. 3(A)).

Fig. 4(A) is a diagram schematically showing the structure of the substrate encoder system, and Figs. 4(B) and 4(C) are enlarged views of a part of the substrate encoder system (part B of Fig. 4(A)).

Figure 5 is a side view of the read head unit of the substrate encoder system.

Fig. 6 is a cross-sectional view taken along the line C-C in Fig. 5.

Figure 7 is a conceptual diagram of the substrate encoder system.

Fig. 8 is a block diagram showing the input-output relationship of the main control device with the control system of the liquid crystal exposure device as the center.

Fig. 9(A) is a diagram showing the operation of the mask encoder system during the exposure operation (Part 1), and Fig. 9(B) is a diagram showing the operation of the substrate encoder system during the exposure operation (Part 1).

Fig. 10(A) is a diagram showing the operation of the mask encoder system during the exposure operation (No. 2), and Fig. 10(B) is a diagram showing the operation of the substrate encoder system during the exposure operation (No. 2).

Fig. 11(A) is a diagram showing the operation of the mask encoder system during the exposure operation (No. 3), and Fig. 11(B) is a diagram showing the operation of the substrate encoder system during the exposure operation (No. 3).

Fig. 12(A) is a diagram showing the operation of the mask encoder system during exposure operation (No. 4), and Fig. 12(B) is a diagram showing the operation of the substrate encoder system during exposure operation (No. 4).

Fig. 13(A) is a diagram showing the operation of the mask encoder system during exposure operation (No. 5), and Fig. 13(B) is a diagram showing the operation of the substrate encoder system during exposure operation (No. 5).

Fig. 14(A) is a diagram showing the operation of the mask encoder system during the exposure operation (No. 6), and Fig. 14(B) is a diagram showing the operation of the substrate encoder system during the exposure operation (No. 6).

Fig. 15(A) is a diagram showing the operation of the mask encoder system during the exposure operation (No. 7), and Fig. 15(B) is a diagram showing the operation of the substrate encoder system during the exposure operation (No. 7).

Figure 16 (A) is a diagram showing the action of the mask encoder system during exposure action (No. 8), Fig. 16(B) is a diagram showing the operation of the substrate encoder system during the exposure operation (No. 8).

Fig. 17 is a plan view showing the head unit and the projection optical system of one of the substrate holder and the substrate encoder system included in the liquid crystal exposure apparatus of the second embodiment.

18(A) and 18(B) are diagrams for explaining the moving range of the substrate holder in the X-axis direction when the position measurement of the substrate holder is performed.

19 (A) ~ FIG. 19 (D) are used to illustrate the second embodiment, the substrate holder is moved in the X-axis direction, a pair of the positional relationship between the head unit and the scale of the state transition Figures from state 1 to state 4.

Fig. 20(A)~Fig. 20(C) are diagrams for explaining the connection process when the read head of the substrate encoder system for measuring the position information of the substrate holder performed by the liquid crystal exposure apparatus of the second embodiment is switched. .

21 is a plan view showing the head unit and the projection optical system of one of the substrate holder and the substrate encoder system included in the liquid crystal exposure apparatus of the third embodiment.

Fig. 22 is a diagram for explaining the characteristic structure of the liquid crystal exposure apparatus of the fourth embodiment.

Figure 23 is a graph showing the measurement error of the encoder relative to the change in the Z position in the pitch θ y=α.

"First Embodiment"

Hereinafter, the first embodiment will be described using FIGS. 1 to 16(B).

FIG. 1 schematically shows the structure of the liquid crystal exposure apparatus 10 of the first embodiment. The liquid crystal exposure device 10 is a step-and-scan method that uses, for example, a rectangular (angled) glass substrate P (hereinafter simply referred to as substrate P) used in a liquid crystal display device (flat-panel display) and the like as an exposure object The projection exposure device is the so-called scanner.

The liquid crystal exposure device 10 has an illuminating system 12, a mask stage device 14 holding a mask M formed with circuit patterns, etc., a projection optical system 16, an apparatus body 18, and is held on the surface (in FIG. 1 it is facing the +Z side). Surface) The substrate stage device 20 of the substrate P coated with a resist (sensor), and the control system for these. Hereinafter, the direction in which the mask M and the substrate P are respectively scanned with respect to the illumination light IL during scanning exposure is taken as a predetermined plane orthogonal to the optical axis of the projection optical system 16 (in this embodiment, it coincides with the optical axis of the illumination system 12) (XY plane, the horizontal plane in Fig. 1) In the X-axis direction, the direction orthogonal to the X-axis in the horizontal plane is the Y-axis direction, and the direction orthogonal to the X-axis and Y-axis is the Z-axis direction. The directions of rotation around the X axis, the Y axis, and the Z axis will be described as the θ x, θ y, and θ z directions, respectively. In addition, the positions in the X-axis, Y-axis, and Z-axis directions will be described as X position, Y position, and Z position, respectively.

The lighting system 12 is configured in the same manner as the lighting system disclosed in the specification of U.S. Patent No. 5,729,331, for example. The illumination system 12 transmits light emitted from a light source not shown (such as a mercury lamp) through a reflector, a beam splitter, a light valve, a wavelength selection filter, various lenses, etc., which are not shown, respectively, as illumination light for exposure ( The illumination light) IL irradiates the mask M. As the illumination light IL, for example, light including at least one of i-line (wavelength 365nm), g-line (wavelength 436nm), and h-line (wavelength 405nm) (in this embodiment, the above-mentioned i-line, g-line, h Synthetic light of the line). The illumination system 12 has a plurality of optical systems for respectively irradiating illumination light IL to a plurality of illumination regions with different positions in the Y-axis direction, and the plurality of optical systems is the same number as the plurality of optical systems of the projection optical system 16 described later.

The mask stage device 14 includes, for example, a mask holder (slider, also called a movable member) 40 that holds the mask M by vacuum suction, and is used to move the mask holder 40 in the scanning direction (X Axis direction) a mask drive system 91 (not shown in FIG. 1; refer to FIG. 8) that is driven with a predetermined long stroke and is appropriately driven in the Y-axis direction and the θ z direction, and a mask holder 40 for measuring At least the position information in the XY plane (including position information in the 3 degrees of freedom direction of the X and Y axis directions and the θ z direction, and the θ z direction is the rotation (yaw) information). The following is the same as the measurement system of the mask position. The mask holder 40 is composed of a frame-shaped member formed with a rectangular opening in a plan view as disclosed in the specification of US Patent Application Publication No. 2008/0030702, for example. The mask holder 40 is mounted on a pair of mask guides 42 fixed on a part of the device body 18, that is, on the upper frame portion 18a through, for example, an air bearing (not shown). The mask drive system 91 includes, for example, a linear motor (not shown). Although the following description will be made by using the mobile photomask holder 40, it can also be used by the mobile platform or stage having the holder of the photomask M. In other words, it is not necessary to install the photomask holder for holding the photomask separately from the photomask platform or the photomask carrier, and the photomask can also be held on the photomask platform or the photomask carrier by vacuum suction or the like. In this case, the mask stage or the mask stage that holds the mask is moved in the direction of 3 degrees of freedom in the XY plane.

The reticle position measurement system is equipped with a reticle encoder system 48, which is configured as a pair of encoder head units 44 (hereinafter simply referred to as head units 44) and a plurality of encoder scales 46 ( It is overlapped in the depth direction of the paper in Fig. 1. Referring to Fig. 3(A)), one side is set on the reticle holder 40, and the other of the encoder head 44 and the plurality of encoder scales 46 is opposite to the reticle holder 40. In this embodiment, the encoder read head 44 is installed on the upper frame portion 18a through the encoder base 43, and a plurality of encoder scales 46 are provided on the lower side of the mask holder 40 so as to be connected to a pair of encoder read heads. 44 opposite. In addition, instead of the upper frame portion 18a, for example, an encoder head 44 may be provided on the upper end side of the projection optical system 16. The configuration of the mask encoder system 48 will be described in detail later.

The projection optical system (projection system) 16 is supported by the upper frame portion 18 a and is arranged below the mask stage device 14. The projection optical system 16 is, for example, a so-called multi-lens projection optical system having the same configuration as the projection optical system disclosed in the specification of U.S. Patent No. 6,552,775. In the embodiment, there are, for example, 11. Refer to Fig. 3(A)) Optical system (projection optical system).

After the liquid crystal exposure device 10 illuminates the illuminated area on the mask M with the illumination light IL from the illumination system 12, the illuminating light passing through the mask M passes through the projection optical system 16 to illuminate the mask M in the illuminated area. The projected image (part of the erect image) of the circuit pattern is formed in the illumination area (exposure area) of the illumination light conjugate with the illumination area on the substrate P. Then, relative to the illumination area (illumination light IL), the mask M is relatively moved in the scanning direction, and relative to the exposure area (illumination light IL), the substrate P is relatively moved in the scanning direction, thereby scanning an illuminated area on the substrate P Expose, and transfer the pattern formed on the mask M to the irradiated area.

The device body (main body, also called frame structure, etc.) 18 supports the above-mentioned mask stage device 14, projection optical system 16, and substrate stage device 20, and is installed in a clean room through a plurality of anti-vibration devices 19 11 on the ground. The device body 18 has the same structure as the device body disclosed in the specification of US Patent Application Publication No. 2008/0030702, for example. In this embodiment, there is a pair of lower rack portions 18b (in FIG. 1) that support the upper frame portion 18a (also referred to as an optical table, etc.) of the above-mentioned projection optical system 16, and arrange the substrate stage device 20 (in FIG. , So one of them is not shown. Refer to Fig. 2), and a pair of middle frame portions 18c.

The substrate stage device 20 is used to accurately position the substrate P with respect to the plurality of partial images (exposure light IL) of the mask pattern projected through the projection optical system 16 during scanning exposure, and to drive the substrate P In the direction of 6 degrees of freedom (X-axis, Y-axis and Z-axis direction and θ x, θ y and θ z directions). Although the structure of the substrate stage device 20 is not particularly limited, it is possible to use, for example, a two-dimensional structure including a gate as disclosed in the specification of U.S. Patent Application Publication No. 2008/129762 or U.S. Patent Application Publication No. 2012/0057140. A stage device composed of a so-called coarse-motion stage and a fine-motion stage that is slightly driven relative to the two-dimensional coarse-motion stage. In this case, the substrate P can be moved in the 3-degree-of-freedom direction in the horizontal plane by the coarse movement stage, and the substrate P can be fine-moved in the 6-degree-of-freedom direction by the fine movement stage.

FIG. 2 shows an example of a substrate stage device 20 of a so-called coarse and fine motion structure used in the liquid crystal exposure device 10 of this embodiment. The substrate stage device 20 includes a pair of base frames 22, a Y coarse motion stage 24, an X coarse motion stage 26, a weight elimination device 28, a Y step guide 30, and a fine motion stage 32.

The base frame 22 is composed of a member extending in the Y-axis direction, and is installed on the ground 11 in a state of being insulated from the device body 18 in terms of vibration. In addition, an auxiliary base frame 23 is arranged between a pair of lower frame portions 18b of the device main body 18. The Y coarse motion stage 24 has a pair of X columns 25 (one of which is not shown in FIG. 2) erected between a pair of base frames 22. The aforementioned auxiliary base frame 23 supports the longitudinal middle portion of the X column 25 from below. The Y coarse motion stage 24 is connected to a pair of Y linear motors through a part of the substrate driving system 93 (not shown in FIG. 2. Refer to FIG. 8) for driving the substrate P in the 6-degree-of-freedom direction. The base frame 22 is driven with a predetermined long stroke in the Y-axis direction. The X coarse motion stage 26 is placed on the Y coarse motion stage 24 in a state of being erected between a pair of X columns 25. The X coarse motion stage 26 is driven by a part of the substrate drive system 93, that is, a plurality of X linear motors on the Y coarse motion stage 24 in the X-axis direction with a predetermined long stroke. In addition, the relative movement of the X coarse motion stage 26 with respect to the Y coarse motion stage 24 in the Y axis direction is mechanically restricted, and moves in the Y axis direction integrally with the Y coarse motion stage 24.

The weight elimination device 28 is inserted between the pair of X columns 25 and is mechanically connected to the X coarse motion stage 26. Thereby, the weight elimination device 28 is integrated with the X coarse motion stage 26 to move in the X-axis and/or Y-axis direction by a predetermined long stroke. The Y step guide 30 is composed of a member extending in the X-axis direction, and is mechanically connected to the Y coarse motion stage 24. Thereby, the Y step guide 30 moves in the Y-axis direction by a predetermined long stroke integrally with the Y coarse motion stage 24. The aforementioned weight elimination device 28 is mounted on the Y step guide 30 through a plurality of air bearings. The weight elimination device 28, when the X coarse-movement stage 26 only moves in the X-axis direction, moves in the X-axis direction on the Y step guide 30 in the stationary state, and moves in the Y-axis direction on the X coarse-movement stage 26 In the case of the direction (including the case accompanying the movement to the X-axis direction), it moves in the Y-axis direction integrally with the Y step guide 30 (in a way that it does not fall off from the Y step guide 30).

The micro-motion stage 32 is composed of a rectangular plate-shaped (or box-shaped) member in a plan view, and is supported by the weight reduction device 28 from below in a state where the center portion is oscillated relative to the XY plane through the spherical bearing device 29. A substrate holder 34 is fixed on the upper surface of the micro-movement stage 32, and the substrate P is placed on the substrate holder 34. In addition, the substrate holder for holding the substrate and the platform or the stage provided with the holding portion of the substrate may not be provided separately from the micro-movement stage 32, and the substrate may be held on the platform or by vacuum suction or the like. On the stage. The micro-movement stage 32 includes a fixed element of the X coarse-movement stage 26 and a movable element of the micro-movement stage 32, and constitutes a part of the substrate drive system 93 (not shown in FIG. 2; refer to FIG. 8). The plurality of linear motors 33 (for example, voice coil motors) are slightly driven in a 6-degree-of-freedom direction relative to the X coarse motion stage 26. In addition, the fine movement stage 32 is given the thrust from the X coarse movement stage 26 through the plurality of linear motors 33, and the X-axis and/or Y-axis direction is set in the X-axis and/or Y-axis direction together with the X coarse-motion stage 26. Long stroke movement. The structure of the substrate stage device 20 described above (except for the measurement system) is disclosed in, for example, the United States Patent Application Publication No. 2012/0057140 Specification.

In addition, the substrate stage device 20 has a substrate position measurement system for measuring the position information of the 6-degree-of-freedom direction of the micro-movement stage 32 (that is, the substrate holder 34 and the substrate P). The substrate position measurement system, as shown in FIG. 8, includes a Z tilt position measurement system 98 for obtaining position information of the Z axis, θ x, and θ y directions of the substrate P (hereinafter referred to as the Z tilt direction), and A substrate encoder system 50 that outputs the position information of the substrate P in the 3-degree-of-freedom direction in the XY plane. The Z tilt position measuring system 98 is provided with a plurality of Z sensors 36 as shown in FIG. 2. The Z sensors 36 include a probe 36 a installed under the micro-movement stage 32 and a target 36 b installed in the weight reduction device 28. The plurality of Z sensors 36 are, for example, four (at least three) arranged at predetermined intervals around an axis parallel to the Z axis passing through the center of the micro-movement stage 32. The main control device 90 (refer to FIG. 8) obtains the Z position information of the micro-movement stage 32 and the rotation amount information in the θ x and θ y directions based on the outputs of the plurality of Z sensors 36 described above. The configuration of the Z tilt position measuring system 98 including the above-mentioned Z sensor 36 is disclosed in detail, for example, in the specification of US Patent Application Publication No. 2010/0018950. The configuration of the substrate encoder system 50 will be described later.

Next, the configuration of the mask encoder system 48 will be described using FIGS. 3(A) and 3(B). As shown schematically in FIG. 3(A), the +Y side and -Y side regions of the mask M (more specifically, the unshown opening for accommodating the mask M) in the mask holder 40 , A plurality of encoder scales 46 are respectively arranged (although it is also referred to as a grid member, a grid portion, a grid member, etc., hereinafter simply referred to as a scale 46). In addition, for ease of understanding, in FIG. 3(A), although the plurality of scales 46 are shown in solid lines, and the illustration appears to be arranged on the mask holder 40, the plurality of scales 46 are actually as As shown in FIG. 1, the Z positions of the respective lower surfaces of the plurality of scales 46 are arranged on the lower surface side of the mask holder 40 in such a way that the Z positions of the lower surface (pattern surface) of the mask M coincide. Multiple marks The ruler 46 has a grid area (grid portion) formed with two reflective one-dimensional grids in which the reflective two-dimensional grid or the arrangement direction (periodic direction) is different (for example, orthogonal), respectively, on the lower side of the mask holder 40. In the Y-axis direction, a plurality of scales 46 are provided on both sides of the mounting area (including the aforementioned opening) of the mask M, and a plurality of scales 46 are arranged such that the grid areas are separated from each other in the X-axis direction. In addition, although it is also possible to form a grid in the X-axis and Y-axis directions so as to cover the entire area of the scale 46, it is difficult to accurately form the grid at the end of the scale 46. Therefore, in this embodiment, the grid is formed in the scale 46. A grid is formed in such a way that the periphery of the grid area becomes a margin part. Therefore, the interval between the grid areas is wider than the interval between the adjacent pair of scales 46 in the X-axis direction. During the period when the measuring beam is irradiated outside the grid area, it becomes a non-measurement period (also referred to as a non-measurement interval) in which position measurement cannot be performed. Collectively referred to as non-measurement period).

In the mask holder 40 of the present embodiment, the regions on the +Y side and -Y side of the mounting region of the mask M are respectively arranged with, for example, three scales 46 at predetermined intervals in the X-axis direction. That is, the mask holder 40 has, for example, six scales 46 in total. Each of the plurality of scales 46 is substantially the same except for the fact that the +Y side and the -Y side of the mask M are arranged symmetrically on the surface of the paper. The scale 46 is formed of, for example, a rectangular plate-shaped (belt-shaped) member in a plan view extending in the X-axis direction formed of quartz glass. The mask holder 40 is formed of, for example, ceramics, and a plurality of scales 46 are fixed to the mask holder 40. In this embodiment, instead of a plurality of scales 46 arranged separately from each other in the X-axis direction, one (single) scale may be used as the scale for the mask holder. In this case, although there may be one grid area, a plurality of grid areas may be separated in the X-axis direction and formed on one scale.

As shown in FIG. 3(B), an X mark is formed in an area on the width direction side (-Y side in FIG. 3(B)) under the scale 46 (the surface facing the -Z side in this embodiment). Ruler 47x. In addition, a Y scale 47y is formed in the area on the other side in the width direction (the +Y side in FIG. 3(B)) of the lower surface of the scale 46. The X scale 47x is formed by a reflection type diffraction grid (X grating) having a plurality of grid lines extending in the Y axis direction formed at a predetermined pitch in the X axis direction (using the X axis direction as the periodic direction). Similarly, the Y scale 47y is a reflection type diffraction grid (Y grating) having a plurality of grating lines formed in the Y-axis direction at a predetermined pitch (using the Y-axis direction as the periodic direction) and extending in the X-axis direction. constitute. In the X scale 47x and the Y scale 47y of this embodiment, a plurality of grid lines are formed at intervals of 10 nm or less, for example. In addition, in FIGS. 3(A) and 3(B), for the convenience of illustration, the interval (pitch) between the grids is shown to be much wider than the actual one. The other pictures are the same.

Moreover, as shown in FIG. 1, a pair of encoder bases 43 are fixed to the upper surface of the upper frame part 18a. One of the pair of encoder bases 43 is arranged on the -X side of the mask guide 42 on the +X side, and the other is arranged on the +X side of the mask guide 42 on the -X side (that is, a pair of light The area between the cover guides 42). In addition, a part of the projection optical system 16 is arranged between the pair of encoder bases 43. As shown in FIG. 3(A), the encoder base 43 is composed of a member extending in the X-axis direction. An encoder head unit 44 (hereinafter simply referred to as the head unit 44) is fixed to the center portion of each of the pair of encoder bases 43 in the longitudinal direction. That is, the head unit 44 is fixed to the device body 18 through the encoder base 43 (refer to FIG. 1). The pair of head units 44 are substantially the same except for the fact that the +Y side and the -Y side of the mask M are arranged symmetrically up and down on the paper. Therefore, only one of them (the -Y side) will be described below.

As shown in FIG. 3(B), the read head unit 44 has a plurality of read heads that irradiate at least one of the plurality of scales 46 arranged in the X-axis direction with a measuring beam whose position is different in at least one of the X-axis and Y-axis directions. The head has a unit base 45 composed of a rectangular plate-shaped member in a plan view. On the unit base 45, a pair of X heads 49x and a pair of X heads 49x are fixedly arranged to irradiate the measuring beam at a wider interval than the interval between a pair of X scales 47x (lattice area) adjacent in the X axis direction and are arranged separately A pair of Y scales 47y (lattice area) adjacent in the X-axis direction is irradiated with a measuring beam at a wide interval, and a pair of Y read heads 49y are arranged separately from each other. That is, the photomask encoder system 48 is attached to, for example, a pair of X heads 49x on both sides of the photomask M placement area of the photomask holder 40 in the Y-axis direction. There are a pair of Y heads 49y on both sides of the mounting area of the mask M in the axial direction, and there are four in total. In addition, the pair of X heads 49x or the pair of Y heads 49y does not need to be arranged wider than the interval between the pair of X scales 49x or the pair of Y scales 49y, respectively, and may be arranged at intervals less than the same degree as the scale interval. Alternatively, they may be arranged in contact with each other. In short, the pair of measuring beams in the X-axis direction may be arranged at an interval that is wider than the interval between the scales. 3(B), although one X head 49x and one Y head 49y are housed in one housing, the other X head 49x and the other Y read head 49y are housed in another housing However, the pair of X heads 49x and the pair of Y heads 49y can also be independently configured. In addition, in FIG. 3(B), for ease of understanding, although the figure shows that a pair of X heads 49x and a pair of Y heads 49y are arranged above the scale 46 (+Z side), in fact, a pair of X heads 49x It is arranged under the X scale 47y, and a pair of Y read heads 49y is arranged under the Y scale 47y (refer to FIG. 1).

A pair of X heads 49x and a pair of Y heads 49y are fixed relative to the unit base 45 so as not to cause at least one position of the pair of X heads 49x (measurement beam) (especially in the measurement direction) due to vibration, etc. (Position in the X-axis direction) or reading head (measurement beam) spacing, and the position of at least one of the pair of Y reading heads 49y (measurement beam) (especially the position in the measurement direction (Y-axis direction)) or reading head ( Measuring beam) interval changes. In addition, the unit base 45 itself also uses the position or interval of a pair of X-read heads 49x and a pair of Y-read heads 49y to be independent of temperature, for example, The method of changing the degree of change, etc., is formed of a material with a lower thermal expansion rate than that of the scale 46 (or equivalent to that of the scale 46).

X-read head 49x and Y-read head 49y, for example, are encoder heads of the so-called diffraction interference method disclosed in the specification of U.S. Patent Application Publication No. 2008/0094592, which correspond to corresponding scales (X scale 47x, Y scale 47y ) Irradiate the measuring beam and receive the beam from the scale, thereby supplying the displacement information of the mask holder 40 (that is, the mask M. Refer to FIG. 3(A)) to the main control device 90 (refer to FIG. 8). That is, the mask encoder system 48 is constituted by, for example, four X-read heads 49x and an X scale 47x opposite to the X-read head 49x (different according to the X position of the mask holder 40). For example, four X linear encoders 92x (not shown in Fig. 3(B). Refer to Fig. 8) to obtain the position information of the mask M in the X-axis direction, by, for example, four Y read heads 49y and the The Y scale 47y (different according to the X position of the mask holder 40) opposite to the Y read head 49y constitutes four Y linear encoders 92y for obtaining the position information of the mask M in the Y-axis direction. Not shown in 3(B). Refer to Fig. 8). In this embodiment, although one of the two different directions in the XY plane (in this embodiment is the same as the X-axis and Y-axis directions) is used as the reading head for the measurement direction, the measurement direction and X can also be used. Read heads with different axis and Y axis directions. For example, it is also possible to use a reading head that uses a direction rotated by 45 degrees relative to the X-axis or Y-axis direction in the XY plane as the measurement direction. Also, instead of one of the two different directions in the XY plane as the measurement direction one-dimensional reading head (X reading head or Y reading head), for example, one of the X-axis and Y-axis directions and the Z-axis can be used Two of the directions are used as a two-dimensional reading head (XZ reading head or YZ reading head) as the measurement direction. In this case, in the three-degree-of-freedom direction (including the Z-axis direction and the θ x and θ y directions) different from the above-mentioned three-degree-of-freedom direction (X-axis and Y-axis directions and θ z direction), the θ x direction is roll information, The position information of the mask holder 40 of θ y direction pitch information) can also be measured.

The main control device 90, as shown in FIG. 8, obtains the mask holder 40 based on the output of the four X linear encoders 92x and the output of the four Y linear encoders 92y, for example, with a resolution of 10 nm or less (refer to FIG. 3( A)) Position information in the X-axis direction and Y-axis direction. Furthermore, the main control device 0, for example, obtains the θ z position information (rotation amount information) of the mask holder 40 based on the outputs of at least two of the four X linear encoders 92x (or, for example, the four Y linear encoders 92y) ). The main control device 90 uses the mask drive system 91 to control the mask holder based on the position information of the mask holder 40 in the 3-degree of freedom direction in the XY plane obtained from the measured values of the mask encoder system 48. The position of 40 in the XY plane.

Here, as shown in FIG. 3(A), in the mask holder 40, as described above, three areas are arranged at predetermined intervals in the X direction in the +Y side and -Y side of the mask M, for example, three Ruler 46. In addition, at least in the scanning exposure of the substrate P, the head unit 44 (a pair of X heads 49x, a pair of Y heads 49y (refer to all of FIG. 3(B))) opposes in the above-mentioned X-axis direction For example, between the position of the ruler 46 closest to the +X side among the three rulers 46 arranged at a predetermined interval and the position of the head unit 44 facing the ruler 46 closest to the -X side, the mask holder 40 is driven to X Axis direction. In addition, in at least one of the exchange operation and the pre-alignment operation of the mask M, the mask holder 40 may be moved so as to be separated from the illumination area irradiated with the illumination light IL in the X-axis direction. When at least one read head is detached from the scale 46, at least one read head is arranged separately from the read head unit 44 in the X-axis direction, and the mask encoder system 48 can continue to be paired during the exchange action or the pre-alignment action. Position measurement of the mask holder 40.

Next, the mask stage device 14 of the present embodiment is shown in FIG. 3(B). One head unit 44 has a pair of X heads 49x and a pair of Y heads 49y. The distance between each of the pair of X heads 49x and the pair of Y heads 49y is set to be smaller. The interval between a pair of adjacent scales 46 among the plurality of scales 46 is wide. With this, the reticle encoder In the system 48, at least one of the pair of X read heads 49x faces the X scale 47x at any time, and at least one of the pair of Y read heads 49y faces the Y scale 47y at any time. Therefore, the mask encoder system 48 can continuously supply the position information of the mask holder 40 (refer to FIG. 3(A)) to the main control device 90 (refer to FIG. 8).

Specifically, for example, when the mask holder 40 (refer to FIG. 3(A)) moves to the +X side, the mask encoder system 48 moves to each state in the following order: two of a pair of read heads 49x The first state (the state shown in Figure 3(B)) of the X scale 47x on the +X side of the adjacent pair of X scale 47x, the X head 49x on the -X side is facing the above phase The area between the adjacent pair of X scale 47x (not facing any X scale 47x) and the X reader 49x on the +X side is facing the second state and -X side of the X scale 47x on the +X side The X head 49x is facing the X scale 47x on the -X side and the X head 49x on the +X side is facing the 3rd state of the X scale 47x on the +X side, and the X head 49x on the -X side is facing -X-side ruler 47x and +X-side X head 49x facing the area between a pair of X rulers 47x (not facing any X ruler 47x) in the 4th state, and a pair of reading heads 49x The two sides face the fifth state of X scale 47x on the -X side. Therefore, there is always at least one X head 49x facing the X scale 47x.

The main control device 90 (refer to FIG. 8), in the above-mentioned first, third, and fifth states, obtains the X position information of the mask holder 40 based on the average value of the outputs of the pair of X read heads 49x. In addition, the main control device 90 obtains the X position information of the mask holder 40 based only on the output of the X head 49x on the +X side in the above second state, and based on the −X side only in the above fourth state The output of the X read head 49x obtains the X position information of the mask holder 40. Therefore, the measurement value of the reticle encoder system 48 will not be interrupted. In addition, it is also possible to obtain the X position information using only the output of one of the pair of X read heads 49x in the first, third, and fifth states. However, in the second and fourth states Next, one of the pair of X heads 49x and one of the pair of Y heads 49y is separated from the scale 46, and the position information of the mask holder 40 in the θ z direction cannot be obtained. (Rotating information). Therefore, it is preferable to arrange the three scales 46 on the +Y side and the three scales 46 on the -Y side in the mounting area of the opposing mask M, and divide the distance between a pair of adjacent scales 46 (not formed with The non-grid area of the grid) is arranged so as not to overlap each other in the X-axis direction, even if one of the three scales 46 arranged on the +Y side and the three scales 46 arranged on the -Y side, the X head 49x and The Y head 49y is separated from the scale 46, and the X head 49x and the Y head 49y on the other side will not be separated from the scale 46. Alternatively, the pair of head units 44 are shifted in the X-axis direction by a distance wider than the interval between a pair of adjacent scales 46 (the width of the non-grid area). Thereby, out of a total of four reading heads, a pair of X heads 49x arranged on the +Y side and a pair of X heads 49x arranged on the -Y side, the measuring beam departs from the grid area of the ruler 46 in the X-axis direction The (unmeasurable) non-measurement period does not overlap. At least during scanning exposure, the position information of the mask holder 40 in the θ z direction can be measured at any time. In addition, in at least one of the pair of head units 44, at least one head that is separated from at least one of the pair of X heads 49x and the pair of Y heads 49y in the X-axis direction may be arranged. Also in the fourth state, at least one of the X head 49x and the Y head 49y has the two heads opposed to the scale 46.

Next, the structure of the substrate encoder system 50 will be described. As shown in FIG. 1, the substrate encoder system 50 includes a plurality of encoder scales 52 (overlaid in the depth direction of the paper in FIG. 1 in the depth direction of the paper surface. Refer to FIG. 4(A)) arranged on the substrate stage device 20 and fixed to the upper frame portion 18a The lower encoder base 54, a plurality of encoder scales 56 fixed under the encoder base 54, and a pair of encoder read head units 60.

As shown schematically in Figure 4(A), the substrate stage device 20 of this embodiment In the area on the +Y side and -Y side of the substrate P (substrate mounting area), for example, five encoder scales 52 (hereinafter simply referred to as scales 52) are arranged at predetermined intervals in the X-axis direction. That is, the substrate stage device 20 has, for example, 10 scales 52 in total. Each of the plurality of scales 52 is substantially the same except for the fact that the +Y side and the -Y side of the substrate P are arranged symmetrically on the paper surface. The ruler 52 is the same as the ruler 46 of the above-mentioned mask encoder system 48 (refer to FIG. 3(A) respectively), and is made of, for example, a rectangular plate-shaped (belt-shaped) member formed of quartz glass and extending in the X-axis direction. Constituted. In addition, each of the plurality of scales 52 has a grid area (grid portion) in which a reflective two-dimensional grid or two reflective one-dimensional grids with different arrangement directions (periodic directions) are formed (e.g., orthogonal) are formed in the Y-axis direction. Five scales 52 are provided on both sides of the substrate mounting area so that the grid areas are separated from each other in the X-axis direction.

In addition, in FIGS. 1 and 4(A), for ease of understanding, although a plurality of scales 52 are shown fixed on the substrate holder 34, the plurality of scales 52 are actually shown in FIG. 2 and are held in contact with the substrate. With the tool 34 separated, it is fixed to the micro-movement stage 32 through the scale base 51 (in addition, FIG. 2 shows a situation where a plurality of scales 52 are arranged on the +X side and -X side of the substrate P). However, according to different occasions, a plurality of scales 52 may actually be fixed on the substrate holder 34. In the following description, the description is based on the preceding description before the plurality of scales 52 are arranged on the substrate holder 34. In addition, a plurality of scales 52 can also be arranged on a substrate platform that has a substrate holder 34 and can be finely moved in at least the Z-axis direction and the θ x and θ y directions, or on a substrate stage that can finely support the substrate platform. Wait.

As shown in FIG. 4(B), an X scale 53x is formed in an area on one side in the width direction of the upper surface of the scale 52 (the -Y side in FIG. 4(B)). In addition, a Y scale 53y is formed in an area on the other side in the width direction of the upper surface of the scale 52 (+Y side in FIG. 4(B)). X scale 53x And the structure of the Y scale 53y is the same as the X scale 47x and Y scale 47y (refer to FIG. 3(B), respectively) formed on the scale 46 (refer to FIG. 3(A) respectively) of the above-mentioned mask encoder system 48, therefore The description is omitted.

The encoder base 54 can be seen from FIGS. 5 and 6 and is provided with a first portion 54a which is formed by a plate-shaped member that is fixed under the upper frame portion 18a and extends in the Y-axis direction, and is fixed under the first portion 54a The second portion 54b, which is composed of a U-shaped member with an XZ cross-section extending in the Y-axis direction, is formed as a cylindrical shape extending in the Y-axis direction as a whole. As shown in FIG. 4(A), although the X position of the encoder base 54 is roughly the same as the X position of the center of the projection optical system 16, the encoder base 54 and the projection optical system 16 are arranged so as not to contact. In addition, the encoder base 54 may be arranged separately from the projection optical system 16 on the +Y side and the -Y side. A pair of Y linear guides 63a are fixed below the encoder base 54 as shown in FIG. 6. The pair of Y linear guides 63a are respectively composed of members extending in the Y-axis direction, and are arranged in parallel with each other at a predetermined interval in the X-axis direction.

A plurality of encoder scales 56 (hereinafter simply referred to as scales 56) are fixed under the encoder base 54. In this embodiment, as shown in FIG. 1, the scale 56 is arranged in the +Y-side area of the projection optical system 16 separately in the Y-axis direction, for example, two, and the -Y-side area in the projection optical system 16 is arranged separately in the Y-axis direction. There are for example two. That is, for example, four scales 56 in total are fixed to the encoder base 54. Each of the plurality of scales 56 is substantially the same. The scale 56 is formed of a rectangular plate-shaped (belt-shaped) member in plan view extending in the Y-axis direction, and is formed of, for example, quartz glass, similarly to the scale 52 disposed on the substrate stage device 20. Each of the plurality of scales 56 has a grid area (grid portion) formed with a reflective two-dimensional grid or two reflective one-dimensional grids whose arrangement directions (periodic directions) are different (for example, orthogonal). In this embodiment, it is the same as the scale 46 and 52 similarly have an X scale formed with a one-dimensional grid with the X axis direction as the arrangement direction (periodic direction), and a shape A one-dimensional grid of Y scales with the Y-axis direction as the arrangement direction (periodic direction) is formed. On both sides of the projection optical system 16 in the Y-axis direction, two grid areas are separated from each other in the Y-axis direction. A ruler 56. In addition, for easy understanding, in FIG. 4(A), a plurality of scales 56 are shown in solid lines and are shown as being arranged on the encoder base 54. However, the plurality of scales 56 are actually shown in FIG. 1 It is arranged on the lower side of the encoder base 54. In addition, although two scales 56 are respectively provided on the +Y side and -Y side of the projection optical system 16 in this embodiment, there may be one or more than three scales 56 instead of two. In the present embodiment, the scale 56 is provided so that the grid surface faces downward (the grid area is parallel to the XY plane), but the scale 56 may be provided, for example, such that the grid area is parallel to the YZ plane.

As shown in FIG. 4(C), an X scale 57x is formed in an area on one side in the width direction below the scale 56 (+X side in FIG. 4(C)). In addition, a Y scale 57y is formed in an area on the other side in the width direction below the scale 56 (the -X side in FIG. 4(C)). The structure of the X scale 57x and the Y scale 57y is the same as the X scale 47x and Y scale 47y (refer to FIG. 3(B) respectively) formed on the scale 46 of the above-mentioned mask encoder system 48 (refer to FIG. 3(A) respectively). The same, so the description is omitted.

Returning to FIG. 1, a pair of encoder head units 60 (hereinafter simply referred to as head units 60) are arranged below the encoder base 54 separately in the Y-axis direction. Since each of the pair of head units 60 is substantially the same except for the point that they are arranged symmetrically on the paper surface in FIG. 1, only one of them (the -Y side) will be described below. As shown in Figure 5, the reading head unit 60 is provided with a Y sliding platform 62, a pair of X reading heads 64x, and a pair of Y reading heads 64y (in Figure 5, they are not shown because they are hidden on the deep side of the paper surface of the pair of X reading heads 64x. .Refer to Figure 4(C)), a pair of X head 66x (one X head 66x in Figure 5 is not shown. Refer to Figure 4(B)), a pair of Y head 66y (one in Figure 5 The Y read head 66y is not shown. Refer to FIG. 4(B)) and a belt drive device 68 for driving the Y sliding platform 62 in the Y axis direction. In addition, one pair of head units 60 of the present embodiment has the same configuration as one pair of head units 44 of the mask encoder system 48 except that it has been rotated by 90 degrees.

The Y sliding platform 62 is composed of a rectangular plate-shaped member in a plan view, and is arranged below the encoder base 54 with a predetermined gap therebetween. In addition, the Z position of the Y sliding platform 62 is set to be closer to the +Z side than the substrate holder 34 regardless of the Z tilt position of the substrate holder 34 (refer to FIG. 1 respectively) of the substrate stage device 20.

On the upper surface of the Y sliding platform 62, a plurality of Y sliding members 63b are fixed as shown in FIG. 6 (for example, two are fixed to one Y linear guide 63a (refer to FIG. 5)), and the Y sliding members 63b are opposed to each other. The Y linear guide 63a is slidably engaged in the Y-axis direction through rolling elements not shown (for example, a plurality of circulating balls). The Y linear guide 63a and the Y sliding member 63b corresponding to the Y linear guide 63a constitute, for example, the mechanical Y linear guide device 63 and the Y sliding platform 62 disclosed in the specification of U.S. Patent No. 6,761,482, through a pair of Y linear guides. The guide device 63 is linearly guided in the Y-axis direction relative to the encoder base 54.

The belt drive device 68 includes a rotation drive device 68a, a pulley 68b, and a belt 68c as shown in FIG. 5. In addition, for driving the Y sliding platform 62 on the -Y side and the Y sliding platform 62 on the +Y side (not shown in Figure 5. Refer to Figure 4(A)) for driving, a belt drive 68 can also be independently configured. A belt driving device 68 can drive the pair of Y sliding platforms 62 integrally.

The rotation driving device 68a is fixed to the encoder base 54 and includes a rotation motor (not shown). The rotation number and rotation direction of the rotary motor are controlled by the main control device 90 (refer to FIG. 8). The pulley 68b is driven to rotate around an axis parallel to the X-axis by the rotation driving device 68a. In addition, although not shown, the belt drive device 68 has another pulley that is separated from the pulley 68b in the Y-axis direction and is attached to the encoder base 54 in a state of being rotatable about an axis parallel to the X-axis. One end and the other end of the belt 68c are connected to the Y sliding platform 62, and two intermediate parts in the longitudinal direction are wound in a state where the pulley 68b and the other pulley (not shown) are given a predetermined tension. A part of the belt 68c is inserted into the encoder base 54, for example, to prevent dust from the belt 68c from adhering to the scales 52, 56 and the like. The Y sliding platform 62 is rotatably driven by the pulley 68b, and is pulled by the belt 68c to reciprocate with a predetermined stroke in the Y-axis direction.

The main control device 90 (refer to FIG. 8) is to arrange the head unit 60 on one side (+Y side) on the +Y side of the projection optical system 16, for example, below two scales 56, and place the other side (- The head unit 60 of the Y side) is arranged on the -Y side of the projection optical system 16, for example, below the two scales 56, and is driven in the Y-axis direction with a predetermined stroke appropriately and synchronously. Here, although the pair of read head units 60 can be moved separately in synchronization with the movement of the substrate stage device 20 in the Y-axis direction, in this embodiment, a pair of read head units 60 are respectively moved in the Y-axis direction. The pair of reading head units 60 are moved in such a way that the measurement beams of the pair of X heads 66x and the pair of Y heads 66y will not depart from the grid area of the scale 52 (maintain at least one measurement beam to irradiate the grid area). In addition, as an actuator for driving the Y sliding platform 62, although the belt driving device 68 including a toothed pulley 68b and a toothed belt 68c is used in this embodiment, it is not limited to this, and a toothless pulley and a belt may also be used. The friction wheel device. In addition, the flexible member for pulling the Y sliding platform 62 is not limited to a belt, and may be tied, for example, with a rope, a metal wire, a chain, and the like. In addition, the type of actuator used to drive the Y sliding platform 62 is not limited to the belt drive device 68, and may be other drive devices such as a linear motor, a feed screw device, etc., for example.

X reading head 64x, Y reading head 64y (not shown in Figure 5. Refer to Figure 6), X reading head Each of the head 66x and the Y head 66y is an encoder head of the so-called diffraction interference method that is the same as the X head 49x and Y head 49y of the above-mentioned mask encoder system 48, and is fixed on the Y sliding platform 62. Here, in the reading head unit 60, a pair of Y reading heads 64y, a pair of X reading heads 64x, a pair of Y reading heads 66y, and a pair of X reading heads 66x are such that the distance between each other will not be caused by, for example, vibration. The way of waiting and changing is fixed relative to the Y sliding platform 62. Also, the Y sliding platform 62 itself is the same, with a pair of Y read heads 64y, a pair of X read heads 64x, a pair of Y read heads 66y, and a pair of X read heads 66x, the distance between each other will not be affected by temperature, for example. The method of changing and changing is made of materials whose thermal expansion rate is lower than that of scales 52,56 (or equivalent to scales 52,56).

As shown in Figure 7, each of a pair of X heads 64x irradiates measurement beams at two locations (2 points) on the X scale 57x that are separated from each other in the Y-axis direction. Each of a pair of Y heads 64y is a pair of The Y scale 57y is irradiated with the measuring beam at two locations (two points) separated from each other in the Y-axis direction. The substrate encoder system 50 receives the light beams from the corresponding scales through the above-mentioned X-read head 64x and Y-read head 64y, and slides the Y slide platform 62 (not shown in FIG. 7. Refer to FIGS. 5 and 6) for the displacement information It is supplied to the main control device 90 (refer to FIG. 8). That is, the substrate encoder system 50, for example, is composed of four X reading heads 64x and an X scale 57x opposite to the X reading head 64x (different according to the Y position of the Y sliding platform 62) to obtain a For the Y sliding platform 62 (that is, a pair of read head units 60 (refer to FIG. 1)), each of the position information in the Y-axis direction, for example, four X linear encoders 96x (not shown in FIG. 7; refer to FIG. 8), By, for example, four Y reading heads 64y and Y scale 57y opposite to the Y reading head 64y (different according to the Y position of the Y sliding platform 62), a pair of Y sliding platforms 62 are formed to find each on the Y axis The position information of the direction is, for example, four Y linear encoders 96y (not shown in FIG. 7; refer to FIG. 8).

The main control device 90 is shown in Fig. 8, based on, for example, four X linear encoders The output of 96x and, for example, four Y linear encoders 96y can obtain position information of a pair of head units 60 (refer to FIG. 1) in the X-axis direction and the Y-axis direction with a resolution of, for example, 10 nm or less. In addition, the main control device 90 obtains the θ z of the one head unit 60 based on the outputs of, for example, two X linear encoders 96x (or, for example, two Y linear encoders 96y) corresponding to one head unit 60 Position information (rotation amount information), based on the output of two X linear encoders 96x (or two Y linear encoders 96y, for example) corresponding to the other read head unit 60 to find the other read head unit 60 Θ z position information (rotation amount information). The main control device 90 uses the belt drive device 68 to control the position of the head unit 60 in the Y-axis direction based on the position information of the pair of head units 60 in the XY plane.

Here, as shown in FIG. 4(A), on the encoder base 54, the +Y side and -Y side regions of the projection optical system 16 are respectively arranged at predetermined intervals in the Y-axis direction, for example, two as described above. Ruler 56. In addition, in the head unit 60 (a pair of X heads 64x, a pair of Y heads 64y (refer to FIG. 4(C)) all) facing each other, for example, two scales 56 are arranged at predetermined intervals in the Y-axis direction. Between the position of the scale 56 on the +Y side and the position of the head unit 60 facing the scale 56 on the -Y side, the Y sliding platform 62 is driven in the Y-axis direction.

Also, similar to the above-mentioned photomask encoder system 48, in the substrate encoder system 50, one head unit 60 has a pair of X heads 64x and a pair of Y heads 64y, respectively, as shown in FIG. 4 ( C) is set to be wider than the interval between adjacent scales 56. Thereby, in the substrate encoder system 50, at least one of the pair of X heads 64x faces the X scale 57x at any time, and at least one of the pair of Y heads 64y faces the Y scale 57y at any time. Therefore, the substrate encoder system 50 can obtain the position information of the Y sliding platform 62 (read head unit 60) without interrupting the measurement value.

Also, as shown in Fig. 7, each of a pair of X read head 66x is a pair of X scale 53x The measurement beam is irradiated at 2 locations (2 points) separated from each other in the X-axis direction, and each of a pair of Y read heads 66y is irradiated to two locations (2 points) separated from each other in the X-axis direction on the Y scale 53y. beam. The substrate encoder system 50 receives the light beams from the corresponding scales by the above-mentioned X read head 66x and Y read head 66y, and supplies the displacement information of the substrate holder 34 (not shown in FIG. 7. Refer to FIG. 2) to the host Control device 90 (refer to FIG. 8). That is, the substrate encoder system 50 is configured to obtain the substrate by, for example, four X heads 66x and an X scale 53x facing the X head 66x (different according to the X position of the substrate holder 34) The position information of P in the X-axis direction is, for example, four X linear encoders 94x (not shown in FIG. 7; refer to FIG. 8), by, for example, four Y read heads 66y and Y opposite to the Y read head 66y The scale 53y (different according to the X position of the substrate holder 34) constitutes, for example, four Y linear encoders 94y (not shown in FIG. 7; refer to FIG. 8) for obtaining position information of the substrate P in the Y-axis direction. .

The main control device 90 is shown in FIG. 8, based on the output of, for example, four X linear encoders 94x and, for example, four Y linear encoders 94y, and the aforementioned four X linear encoders 96x and, for example, four Y linear encoders 96y. The output (that is, the position information of each of the pair of read head units 60 in the XY plane), the position of the substrate holder 34 (refer to Figure 2) in the X-axis direction and the Y-axis direction is obtained with a resolution of, for example, 10nm or less News. Furthermore, the main control device 90 obtains the θz position information (rotation amount information) of the substrate holder 34 based on the outputs of at least two of the four X linear encoders 94x (or, for example, the four Y linear encoders 94y). . The main control device 90 uses the substrate drive system 93 to control the position of the substrate holder 34 in the XY plane based on the position information of the substrate holder 34 in the XY plane obtained from the measured values of the substrate encoder system 50.

In addition, as shown in FIG. 4(A), in the substrate holder 34, as described above, the +Y side and -Y side regions of the substrate P are respectively arranged with 5 scales at predetermined intervals in the X-axis direction. 52. In addition, in the head unit 60 (a pair of X heads 66x, a pair of Y heads 66y (refer to FIG. 4(B))) facing each other, for example, five scales 52 are arranged at predetermined intervals in the X-axis direction. Between the position of the scale 52 on the most +X side and the position of the head unit 60 facing the scale 52 on the most -X side, the substrate holder 34 is driven in the X-axis direction.

Also, similar to the above-mentioned photomask encoder system 48, the distance between a pair of X head 66x and a pair of Y head 66y of one head unit 60 is set as shown in FIG. 4(B) It is wider than the interval between adjacent rulers 52. Thereby, in the substrate encoder system 50, at least one of the pair of X heads 66x faces the X scale 53x at any time, and at least one of the pair of Y heads 66y faces the Y scale 53y at any time. Therefore, the substrate encoder system 50 can obtain the position information of the substrate holder 34 (refer to FIG. 4(A)) without interrupting the measurement value.

In addition, each of the pair of reading head units 60 of the substrate encoder system 50 has a pair of Y reading heads 64y, a pair of X reading heads 64x, a pair of Y reading heads 66y, and a pair of X reading heads 66x, and a pair of X reading heads 66x. The scales 56, 52 irradiated by the measuring beams from these reading heads can be similarly applied to the configuration of all the descriptions (including additional explanations) of the reading heads and scales that constitute the mask encoder system 48.

Returning to Fig. 6, the dust cover 55 is composed of a member extending in the Y-axis direction formed in a U-shape in the XZ section. The second portion 54b of the encoder base 54 and the Y sliding platform 62 are inserted into a pair with a predetermined gap therebetween. To face between. An opening through which the X head 66x and the Y head 66y pass is formed under the dust cover 55. This suppresses the adhesion of dust generated from the Y linear guide device 63, the belt 68c, and the like to the scale 52. In addition, a pair of dustproof plates 55a (not shown in FIG. 5) are fixed to the lower surface of the encoder base 54. The scale 56 is arranged between the pair of dust-proof plates 55a to prevent dust generated from the Y linear guide device 63 and the like from adhering to the scale 56.

FIG. 8 shows a block diagram of the input/output relationship of the main control device 90, which is composed mainly of the control system of the liquid crystal exposure device 10 (refer to FIG. 1), and controls the components of the main control device 90 in an integrated manner. The main control device 90 includes a workstation (or a microcomputer), etc., and controls the components of the liquid crystal exposure device 10 in an overall manner.

The liquid crystal exposure apparatus 10 (refer to FIG. 1) configured as described above is managed by the main control device 90 (refer to FIG. 8), and the mask M is compared to the mask stage by a mask loader (not shown). The loading on the device 14 is performed, and the loading of the substrate P on the substrate stage device 20 (substrate holder 34) is performed by a substrate loader (not shown). After that, the main control device 90 uses an alignment detection system not shown to perform alignment measurement (detection of a plurality of alignment marks on the substrate P). After the alignment measurement is completed, the alignment measurement is set on the substrate P The multiple exposure areas on the top perform step-and-scan exposure. In addition, the position information of the substrate holder 34 is also measured by the substrate encoder system 50 during the alignment measurement operation.

Next, an example of the operation of the mask stage device 14 and the substrate stage device 20 during the exposure operation will be described with reference to FIGS. 9(A) to 16(B). In addition, in the following description, although the case where four shot areas are set on one substrate P (so-called four-sided), the number and arrangement of shot areas set on one substrate P can be changed as appropriate .

9(A) shows the mask stage device 14 after the alignment operation is completed, and FIG. 9(B) shows the substrate stage device 20 after the alignment operation is completed (however, members other than the substrate holder 34 are not shown. The same below). Exposure process, as an example, the system shown in FIG 9 (B), the first irradiation region and the + X side of S ₁ is set to start from the substrate P -Y side. The mask stage device 14, as shown in FIG. 9(A), is such that the +X side end of the mask M is located in an illumination area that is irradiated by the illumination light IL (refer to FIG. 1 respectively) from the illumination system 12 (but , The state shown in Fig. 9(A) is a method that has not yet irradiated the illuminating light IL to the mask M slightly to the -X side. According to the output of the mask encoder system 48 (refer to Fig. 8), perform the mask M Positioning. Specifically, for example, the +X side end of the pattern area of the mask M relative to the illumination area is separated from the -X side by the run-up distance necessary for scanning exposure at a predetermined speed (that is, necessary to achieve a predetermined speed). The acceleration distance) is configured, and a scale 46 is provided in such a way that the position of the mask M can be measured by the mask encoder system 48 at this position. In addition, the substrate stage device 20, as shown in FIG. 9(B), is positioned so that _{the +X side end of the first irradiation area S 1} is more irradiated by the illumination light IL (refer to FIG. 1) from the projection optical system 16 The exposure area (however, the state shown in FIG. 9(B), the substrate P has not yet been irradiated with the illumination light IL) is slightly closer to the -X side, and the substrate P is performed based on the output of the substrate encoder system 50 (refer to FIG. 8) The positioning. Specifically, for example, the relative exposure area of the substrate P of the first irradiation area S + X side end portion _1, based to the -X side separated at a predetermined speed necessary for the scanning exposure approach distance (i.e., to achieve a predetermined The acceleration distance necessary for the speed) is provided with a scale 52 in such a way that the position of the substrate P can be measured by the substrate encoder system 50 at this position. In addition, even on the side where the scanning exposure of the irradiated area is completed and the photomask M and the substrate P are decelerated, the photomask M and the substrate P are also moved further in order to decelerate from the speed during the scanning exposure to the predetermined speed. For the deceleration distance, scales 46 and 52 can be provided in such a way that the mask encoder system 48 and the substrate encoder system 50 measure the positions of the mask M and the substrate P, respectively. Alternatively, it can also be used to measure the photomask M and the substrate P by another measurement system different from the photomask encoder system 48 and the substrate encoder system 50 during at least one of acceleration and deceleration. position.

Next, as shown in FIG. 10(A), the mask holder 40 is driven in the +X direction (acceleration, constant speed driving, and deceleration), and in synchronization with the mask holder 40, as shown in FIG. 10(B As shown in ), the substrate holder 34 is driven in the +X direction (acceleration, constant velocity driving, and deceleration). When the mask holder 40 is driven, the main control device 90 (refer to FIG. 8) controls the position of the mask M according to the output of the mask encoder system 48 (refer to FIG. 8), and according to the substrate encoder system 50 (Refer to Fig. 8) The output is used to control the position of the substrate P. When the substrate holder 34 is driven in the X-axis direction, the pair of head units 60 are in a stationary state. While the mask holder 40 and the substrate holder 34 are driven at constant speed in the X-axis direction, the substrate P is irradiated with illumination light IL (refer to FIG. 1 respectively) passing through the mask M and the projection optical system 16, thereby the mask The mask pattern of M is transferred to the irradiation area S ₁ .

After the transfer of the first shot area on the substrate P S of the end of the reticle _pattern, based substrate stage device 20 in FIG. 11 (B), in order to be set in the first region S ₁ and the irradiation of the + The exposure operation of the second irradiation area S _{2 on} the Y side is based on the output of the substrate encoder system 50 (refer to FIG. 8). The substrate holder 34 is driven in the -Y direction (Y step) for a predetermined distance (the width of the substrate P) The distance of approximately half of the direction dimension). During the Y stepping operation of the substrate holder 34, the mask holder 40 is shown in FIG. 11(A), with the -X side end of the mask M located in the more illuminated area (but in FIG. 11(A) The state shown in) does not illuminate the mask. M) The state slightly on the +X side is still.

Here, as shown in FIG. 11(B), during the Y stepping operation of the substrate holder 34, in the substrate stage device 20, a pair of head units 60 are moved to the Y axis in synchronization with the substrate holder 34 Direction drive. That is, the main control device 90 (refer to FIG. 8) transmits the substrate holder 34 through the substrate drive system 93 (refer to FIG. 8) based on the output of the Y linear encoder 94y in the substrate encoder system 50 (refer to FIG. 8) Drive to the target position in the Y-axis direction, and drive the pair of head units 60 in the Y-axis direction through the corresponding belt drive device 68 (refer to FIG. 8) according to the output of the Y linear encoder 96y (refer to FIG. 8). At this time, the main control device 90 synchronizes the pair of head units 60 with the substrate holder 34 (a pair of head units 60 follow the substrate holder 34). The way) drive. Therefore, no matter what the Y position of the substrate holder 34 (including the movement of the substrate holder 34) is, the measuring beam irradiated from the X head 66x and Y head 66y (refer to FIG. 7 respectively) will not go from the X scale The 53x and Y scale 53y (refer to FIG. 7 respectively) are separated. In other words, as long as the substrate holder 34 is moved in the Y-axis direction (during Y stepping motion), the measuring beams irradiated from the X head 66x and Y head 66y will not be separated from the X scale 53x and Y scale 53y. The degree, that is, the degree of uninterrupted (continuous measurement) measurement through the measuring beams from the X read head 66x and Y read head 66y, just move the pair of read head unit 60 and substrate holder 34 in the Y axis direction . That is, the movement of the pair of head units 60 and the substrate holder 34 in the Y-axis direction can be non-synchronized and follow-up movement.

After the Y stepping action of the substrate holder 34 is completed, as shown in FIG. 12(A), the mask holder 40 is driven in the -X direction according to the output of the mask encoder system 48 (refer to FIG. 8), and The mask holder 40 synchronously drives the substrate holder 34 in the -X direction according to the output of the substrate encoder system 50 (refer to FIG. 8) as shown in FIG. 12(B). Whereby, S ₂ mask pattern is transferred to the second irradiation region. At this time, the pair of read head units 60 are also in a stationary state.

After the irradiation of the second region S ₂ of the end of the exposure operation, the mask stage apparatus 14, as shown in line 13 (A), the driving of the mask holder 40 toward the + X direction, while the mask M to the - The X-side end is located slightly closer to the +X side than the illuminated area, and the mask M is positioned according to the output of the mask encoder system 48 (refer to FIG. 8). Further, substrate stage device 20, as shown in FIG line 13 (B), of ₂ to 3 the -X side of the irradiation region is set to the second irradiation region S S ₃ for the exposure operation, while the holding tool 34 to the substrate + X direction driven to the third irradiation area S ₃ of the -X side end is located slightly more exposure area on the + X side of the embodiment, the positioning of the substrate P substrate 50 according to the output of the encoder system (see FIG. 8) of the. During the movement of the mask holder 40 and the substrate holder 34 shown in Figs. 13(A) and 13(A), the illumination light IL is not applied to the mask M (Fig. 1) from the illumination system 12 (refer to Fig. 1). 13(A) reference) and substrate P (FIG. 13(B) reference) are irradiated. That is, the moving actions of the photomask holder 40 and the substrate holder 34 shown in FIGS. 13(A) and 13(B) are simple positioning actions (X stepping actions) of the photomask M and the substrate P.

After the X stepping action of the mask M and the substrate P is completed, the mask stage device 14, as shown in FIG. 14(A), holds the mask according to the output of the mask encoder system 48 (refer to FIG. 8) The tool 40 is driven in the -X direction, and synchronized with the mask holder 40, as shown in FIG. 14(B), the substrate holder 34 is driven in the -X direction according to the output of the substrate encoder system 50 (refer to FIG. 8) . Whereby the irradiation region to the third mask pattern S ₃ is transferred. At this time, the pair of read head units 60 are also in a stationary state.

3 after the first exposure shot areas S ₃ of the end of operation, the substrate stage device 20, 15 (B), in order of the first irradiation region 4 is set to the third irradiation area S ₃ of the -Y side of the line S in FIG. ₄ Perform an exposure operation, and drive the substrate holder 34 in the +Y direction (Y stepping drive) for a predetermined distance. At this time, as in the Y stepping operation of the substrate holder 34 shown in FIG. 11(B), the mask holder 40 is in a stationary state (refer to FIG. 15(A)). In addition, the pair of head units 60 are driven in the +Y direction in synchronization with the substrate holder 34 (by following the substrate holder 34).

After the Y stepping action of the substrate holder 34 is completed, as shown in FIG. 16(A), the mask holder 40 is driven in the +X direction according to the output of the mask encoder system 48 (refer to FIG. 8), and The mask holder 40 synchronously drives the substrate holder 34 in the +X direction according to the output of the substrate encoder system 50 (refer to FIG. 8) as shown in FIG. 16(B). Whereby, S ₄ mask pattern is transferred to the fourth irradiation area. At this time, the pair of read head units 60 are also in a stationary state.

As described above, the liquid crystal exposure device 10 according to this embodiment is used for The mask encoder system 48 for obtaining the position information of the mask M in the XY plane, and the substrate encoder system 50 (referring to FIG. 1 respectively) for obtaining the position information of the substrate P in the XY plane, due to the corresponding The optical path length of the measuring beam irradiated by the ruler is shorter, so the influence of air fluctuations can be reduced more than that of the conventional interference instrument system, for example. Therefore, the positioning accuracy of the mask M and the substrate P is improved. In addition, since the influence of air fluctuations is small, it is possible to omit part of the air-conditioning equipment necessary when using the conventional interference instrument system, thereby reducing the cost.

Furthermore, in the case of using the interference instrument system, although a large and heavy rod mirror must be installed on the mask stage device 14 and the substrate stage device 20, the mask encoder system 48 and substrate encoder of this embodiment Since the device system 50 does not require the rod mirror described above, the system including the mask holder 40 (for example, the mask stage device) and the system including the substrate holder 34 (for example, the substrate stage device) can be smaller and lighter. , And the weight balance is also improved, thereby improving the position controllability of the mask M and the substrate P. In addition, as compared with the case of using the interference instrument system, fewer adjustment parts are required. Therefore, the cost of the mask stage device 14 and the substrate stage device 20 is reduced, and the maintainability is also improved. In addition, adjustment during assembly is also easy (or unnecessary).

In addition, the substrate encoder system 50 of this embodiment is based on the movement of the substrate P in the Y-axis direction (for example, a stepping operation), and the substrate P is obtained by driving a pair of head units 60 in the Y-axis direction. The structure of the Y position information, therefore, there is no need to arrange the scale extending in the Y axis direction on the substrate stage device 20 side, or to expand the width of the scale extending in the X axis direction in the Y axis direction (or need not be in the device body On the 18 side, a plurality of reading heads are arranged in the Y-axis direction). Therefore, the structure of the substrate position measurement system can be simplified, and the cost can be reduced.

In addition, the mask encoder system 48 of this embodiment is based on the output of the adjacent pair of encoder heads (X head 49x, Y head 49y) according to the mask holder 40. The X position is appropriately switched to obtain the position information of the mask holder 40 in the XY plane. Therefore, even if a plurality of scales 46 are arranged at predetermined intervals (separated from each other) in the X-axis direction, they can be In the case of interruption, the position information of the mask holder 40 is obtained. Therefore, it is not necessary to prepare a scale with the same length as the moving stroke of the mask holder 40 (about 3 times the length of the scale 46 in this embodiment), which can reduce the cost, especially for the use of a large mask as in this embodiment The liquid crystal exposure device 10 of M is very suitable. The same applies to the substrate encoder system 50 of this embodiment. Since the plurality of scales 52 are arranged at a predetermined interval in the X-axis direction, and the plurality of scales 56 are arranged at a predetermined interval in the Y-axis direction, there is no need to prepare a movement stroke with the substrate P A ruler of the same length is very suitable for the liquid crystal exposure device 10 using a large substrate P.

In addition, in the above-mentioned first embodiment, although the pair of head units 60 each have four heads (a pair of X head 66x and Y head 66y) for measuring the position of the substrate holder 34, a total of The case where there are eight read heads for position measurement of the substrate holder has been described, but the number of read heads for position measurement of the substrate holder may be less than eight. This embodiment will be described below.

"Second Embodiment"

Next, the second embodiment will be described based on FIGS. 17 to 20(C). The structure of the liquid crystal exposure apparatus of the second embodiment is the same as that of the first embodiment except for a part of the substrate encoder system 50. Therefore, the following description will only focus on the differences with respect to the first embodiment. Elements having the same structure and function are assigned the same reference numerals as in the first embodiment, and their description is omitted.

FIG. 17 is a plan view showing a pair of the head unit 60 and the projection optical system 16 of the substrate holder 34 and the substrate encoder system 50 of the second embodiment. In Figure 17, in order to make The description is easy to understand, and the illustration of the encoder base 54 and the like is omitted. In addition, in FIG. 17, the read head unit 60 (Y sliding platform 62) is shown with a dotted line, and the illustration of the X read head 64x and the Y read head 64y provided on the Y sliding platform 62 are also omitted.

The liquid crystal exposure apparatus of the second embodiment, as shown in FIG. 17, is located on the +Y side and -Y side of the substrate mounting area with the substrate holder 34 interposed therebetween. In the separate arrangement, for example, five encoder scales 152 (hereinafter simply referred to as scales 152) are arranged at predetermined intervals in the X-axis direction. Among the five scales 152 arranged on the +Y side of the substrate placement area and the five scales 152 arranged on the -Y side area, although the interval between adjacent scales 152 (lattice area) is the same, their arrangement positions With respect to the five scales 152 on the +Y side, the five scales 152 on the -Y side are arranged to deviate from a predetermined distance D (a distance slightly larger than the interval between adjacent scales 152 (lattice area)) toward the +X side as a whole. The reason for this configuration is to avoid generating position information of the measuring substrate holder 34. The two X read heads 66x and the two Y read heads 66y described later are two or more of the four read heads that are not facing each other. The state of a ruler (that is, the non-measuring period when the measuring beam is separated from the ruler in the four reading heads does not overlap).

Each scale 152 is constituted by a rectangular plate-shaped (belt-shaped) member in a plan view extending in the X-axis direction formed of, for example, quartz glass. On the upper surface of each scale 152, a reflection type two-dimensional diffraction grating (two-dimensional grating) RG with a predetermined pitch (for example, 1 μm) whose periodic directions are the X-axis direction and the Y-axis direction is formed. Hereinafter, the aforementioned grid area is also simply referred to as a two-dimensional grating RG. In addition, in FIG. 17, for the convenience of illustration, the interval (pitch) between the grating lines of the two-dimensional grating RG is shown to be much wider than the actual one. The other figures described below are also the same. Hereinafter, the five scales 152 arranged in the +Y side area of the substrate holder 34 are referred to as a first grid group, and the five scales 152 arranged in the −Y side area of the substrate holder 34 are referred to as a second grid group.

The underside of the Y sliding platform 62 of the head unit 60 located on the +Y side (the surface on the -Z side) is opposite to the scale 152, and is separated by a predetermined interval in the X-axis direction (compared to the adjacent scale The distance between 152 is large) X head 66x and Y head 66y are fixed. Similarly, on the underside of the Y sliding platform 62 of the head unit 60 on the other side of -Y (the surface on the -Z side), in a state of being opposed to the scale 152, separated by a predetermined interval in the X-axis direction and fixed Y read head 66y and X read head 66x. That is, the X read head 66x and Y read head 66y facing the first grid group, and the X read head 66x and Y read head 66y facing the second grid group are respectively compared to the grid area of the adjacent scale 152 The wide interval illuminates the measuring beam to the ruler 152. Hereinafter, for the convenience of description, the X head 66x and Y head 66y of the head unit 60 of one side are also referred to as head 66a and head 66b, respectively, and the Y head of the head unit 60 of the other side is read The head 66y and the X head 66x are also referred to as the head 66c and the head 66d, respectively.

In this case, the reading head 66a and the reading head 66c are arranged at the same X position (on the same straight line parallel to the Y axis direction), and the reading head 66b and the reading head 66d are arranged at a different X position from the reading head 66a and the reading head 66c. The same X position (on the same straight line parallel to the Y axis direction). A pair of X linear encoders are formed by the reading heads 66a and 66d and the two-dimensional grating RG facing each other, and a pair of Y linear encoders are formed by the reading heads 66b and 66c and the two-dimensional grating RG facing each other.

The liquid crystal exposure apparatus of the second embodiment has the structure of other parts including the rest of the head unit 60, except for the drive control (position control) of the substrate holder 34 of the substrate encoder system using the main control device 90 The rest is the same as the liquid crystal exposure device 10 of the aforementioned first embodiment.

The liquid crystal exposure apparatus of this second embodiment can be positioned at the first position of the +X end portion of the substrate holder 34 that is opposite to the head unit 60 of the pair of head unit 60 shown in FIG. 18(A) as shown in FIG. 18(B). Shows a pair of read head unit 60 facing between the second position of the -X end of the substrate holder 34, within the range of movement of the substrate holder 34 in the X-axis direction, to perform a pair of read head unit 60 reading The heads 66a-66d, that is, a pair of X linear encoders and a pair of Y linear encoders measure the position of the substrate holder 34. FIG. 18(A) shows a state where only the reading head 66b is not facing any ruler 152, and FIG. 18(B) shows a state where only the reading head 66c is not facing any ruler 152.

In the process of moving the substrate holder 34 in the X-axis direction between the first position shown in FIG. 18(A) and the second position shown in FIG. 18(B), the pair of head unit 60 and the scale 152 The positional relationship is shown in Figure 19 (A) ~ Figure 19 (D) in the first state to the fourth state and all of the four reading heads 66a to 66d are opposed to the two-dimensional grating RG of any scale 152 (That is, the measurement beams are irradiated on the two-dimensional grating RG with all the four read heads 66a to 66d) The fifth state transitions between the five states. Hereinafter, instead of the description of the two-dimensional grating RG facing the scale 152 with the reading head or the two-dimensional grating RG irradiating the measuring beam on the scale 152, the description of "the reading head facing the scale" is used for description.

Here, for the convenience of description, six scales 152 are listed, and marks a to f for identification are respectively assigned to each scale, and are marked as scales 152a to 152f (refer to FIG. 19(A)).

The first state of Fig. 19(A) shows that the reading head 66a is facing the scale 152b and the reading heads 66c and 66d are facing the scale 152e, and only the reading head 66b is not facing any scale. Fig. 19(B) The second state shows that the substrate holder 34 has moved a predetermined distance in the +X direction from the state shown in FIG. 19(A) so that the reading heads 66a and 66b are opposed to the scale 152b and the reading head 66d is opposed to the scale 152e. The read head 66c is not oriented to any ruler. In the process of transitioning from the state of FIG. 19(A) to the state of FIG. 19(B), the reading heads 66a and 66b will face the scale 152b and the reading heads 66c and 66d will face the fifth state of the scale 152e.

The third state of FIG. 19(C) shows that the substrate holder 34 has moved a predetermined distance in the +X direction from the state of FIG. 19(B) to a state where only the read head 66a is not facing any scale. In the process of transitioning from the state of FIG. 19(B) to the state of FIG. 19(C), the reading heads 66a and 66b will face the scale 152b and the reading head 66c will face the scale 152d and the reading head 66d will face the scale 152d. The fifth state of the ruler 152e.

The fourth state of FIG. 19(D) shows that the substrate holder 34 has moved a predetermined distance from the state of FIG. 19(C) to the +X direction, and only the read head 66d is not facing any scale. In the process of transitioning from the state of FIG. 19(C) to the state of FIG. 19(D), the reading head 66a will face the scale 152a, the reading head 66b will face the scale 152b, and the reading head 66c will face the scale 152d. And the reading head 66d faces the fifth state of the scale 152e.

In the state shown in FIG. 19(D), the substrate holder 34 moves a predetermined distance in the +X direction, through the reading head 66a facing the scale 152a, the reading head 66b facing the scale 152b, and the reading heads 66c and 66d facing the scale 152b. After the fifth state of the scale 152d, the reading head 66a is facing the scale 152a and the reading heads 66c and 66d facing the scale 152d, and only the reading head 66b is not facing the first state of any scale.

In the above, although the transition of the state (positional relationship) between each of the three scales 152 and the pair of head units 60 among the scales 152 respectively arranged on the ±Y side of the substrate holder 34 has been described, in the liquid crystal exposure device 10 Between the ruler 152 and a pair of head units 60, if the focus is on the adjacent three rulers 152 among the five rulers respectively arranged on the ±Y side of the substrate holder 34, then the pair of head units 60 The positional relationship is also transferred in the same order as above.

As described above, in the second embodiment, even if the substrate holder 34 moves in the X-axis direction, two X heads 66x, namely heads 66a and 66d, and two Y heads 66y, namely heads 66b, At least three of the total four reading heads of 66c will be aligned with any scale 152 (two-dimensional grating RG) at any time. Furthermore, even if the substrate holder 34 moves in the Y-axis direction, the four read heads drive the pair of Y sliding stages 62 in such a way that the measuring beam in the Y-axis direction does not separate from the scale 152 (two-dimensional grating RG). The Y-axis direction, therefore, at least three of the four reading heads are facing any scale 152 at any time. Therefore, the main control device 90 can use three of the read heads 66a to 66d at any time to manage the position information of the substrate holder 34 in the X-axis direction, the Y-axis direction, and the θz direction. This point is further explained below.

Let the measured values of the X head 66x and the Y head 66y be CX and CY, respectively, and the measured values CX and CY can be represented by the following formulas (1a) and (1b), respectively.

CX=(p _i -X)cos θ z+(q _i -Y)sin θ z……(1a)

CY=-(p _i -X)sin θ z+(q _i -Y)cos θ z……(1b)

Here, X, Y, and θz respectively indicate the positions of the substrate holder 34 in the X-axis direction, the Y-axis direction, and the θz direction. In addition, p _i and q _i are the respective X position (X coordinate value) and Y position (Y coordinate value) of the reading heads 66a to 66d. _{In this embodiment, the X-coordinate values p i} and Y-coordinate values q _i (i=1, 2, 3, 4) of the respective reading heads 66a, 66b, 66c, and 66d are derived from the aforementioned four X linear encoders The output of 96x, four Y linear encoders 96y calculates the position information of a pair of read head unit 60 (refer to Figure 1) in the X-axis direction and Y-axis direction (the center of the Y sliding platform 62 is in the X-axis direction and Y-axis direction). The position of the direction) is simply calculated based on the known positional relationship of each reading head relative to the center of the Y sliding platform 62.

Therefore, the substrate holder 34 and the pair of read head units 60 have a positional relationship as shown in FIG. 18(A). At this time, if the substrate holder 34 is positioned in the 3-degree-of-freedom direction in the XY plane Set to (X, Y, θ z), then the measured values of the three reading heads 66a, 66c, 66d can theoretically be expressed by the following formulas (2a)~(2c) (also known as the relationship of affine conversion).

C1=(p ₁ -X)cos θ z+(q ₁ -Y)sin θ z……(2a)

C ₃ =-(p ₃ -X)sin θ z+(q ₃ -Y)cos θ z……(2b)

C ₄ =(p ₄ -X)cos θ z+(q ₄ -Y)sin θ z……(2c)

In the reference state where the substrate holder 34 is located at the coordinate origin (X, Y, θ z)=(0,0,0), through simultaneous equations (2a)~(2c), it becomes C ₁ =p ₁ ,C ₃ =q ₃ , C ₄ =p ₄ . The reference state is, for example, a state where the center of the substrate holder 34 (approximately the same as the center of the substrate P) coincides with the center of the projection area of the projection optical system 16, and the θz rotation is zero. Therefore, in the reference state, the Y position of the substrate holder 34 can also be measured by the reading head 66b, and the measurement value C _{2 of the reading head 66b is C 2} =q ₂ according to formula (1b).

Therefore, in the reference state, as long as the measurement values of the three reading heads 66a, 66c, and 66d are initially set to p ₁ , q ₃ , and p ₄ , respectively, the displacement (X, Y, θ z), the three reading heads 66a, 66c, 66d will prompt the theoretical values given by equations (2a)~(2c).

In addition, in the reference state, instead of any one of the reading heads 66a, 66c, and 66d, for example, the reading head 66c, the measurement value C _{2 of the} reading head 66b may be initially set to q ₂ .

In this case, relative to the displacement (X, Y, θ z) of the subsequent substrate holder 34, the three reading heads 66a, 66b, and 66d will prompt as given by equations (2a), (2c), and (2d) The theoretical value.

C ₁ =(p1-X)cos θ z+(q ₁ -Y)sin θ z……(2a)

C ₄ =(p ₄ -X)cos θ z+(q ₄ -Y)sin θ z……(2c)

C ₂ =-(p ₂ -X)sin θ z+(q ₂ -Y)cos θ z……(2d)

Simultaneous formulas (2a)~(2c) and simultaneous formulas (2a), (2c), (2d), for three variables (X, Y, θ z), three formulas are assigned. _{Therefore, on the contrary, just assign the subordinate variables C 1} , C ₃ , C ₄ in the simultaneous formulas (2a)~(2c), or the subordinate variables in the simultaneous formulas (2a), (2c), (2d) C ₁ , C ₄ , C ₂ , that is, the variables X, Y, and θ z can be calculated. Here, even if the approximation sin θ z≒θ z is applied, or the higher order approximation is applied, the equation can be solved easily. _{Therefore, the measured values C 1} , C ₃ , C ₄ (or C ₁ , C ₂ , C ₄ ) of the reading head 66a, 66c, 66d (or reading head 66a, 66b, 66d) can be calculated from the wafer stage WST Position (X, Y, θ z).

Next, for the liquid crystal exposure apparatus of the second embodiment to measure the position information of the substrate holder 34, the connection processing when the read head of the substrate encoder system is switched, that is, the initial setting of the measured value, The operation of the main control device 90 will be mainly described.

In the second embodiment, as described above, three encoders (X head and Y head) measure the position information of the substrate holder 34 at any time in the effective stroke range of the substrate holder 34, and the encoder ( During the switching process of X head or Y head), for example, as shown in FIG. 20(B), each of the four heads 66a to 66d is opposed to any ruler 152, and the position of the substrate holder 34 can be measured. (The fifth state mentioned above). Fig. 20(B) shows the state in which the position of the substrate holder 34 is measured with the reading heads 66a, 66b, and 66d as shown in Fig. 20(A). The substrate holder 34 moves in the +X direction, as shown in Fig. 20(C) As shown in ), it is an example of the fifth state that appears during the transition to the state where the position of the substrate holder 34 is measured by the read heads 66b, 66c, and 66d. That is, FIG. 20(B) shows the state in which the three reading heads for measuring the position information of the substrate holder 34 are switched from the reading heads 66a, 66b, and 66d to the reading heads 66b, 66c, and 66d.

When you want to control the position of the substrate holder 34 in the XY plane (position At the moment of the switching process (continuation) of the reading head (encoder) of the measurement of setting information, as shown in Figure 20(B), the reading heads 66a, 66b, 66c, and 66d are opposed to the scales 152b, 152b, and 152d, respectively , 152e. At first glance at Fig. 20(A) to Fig. 20(C), although Fig. 20(B) seems to be switching from the reading head 66a to the reading head 66c, the reading head 66a and the reading head 66c are different from the measurement direction. It can also be clearly seen that even if the measurement value (count value) of the reading head 66a is directly assigned as the initial value of the measurement value of the reading head 66c when the connection is to be made, it has no meaning.

Therefore, in this embodiment, the main control device 90 switches from the measurement (and position control) of the position information of the substrate holder 34 using the three read heads 66a, 66b, and 66d to the use of three read heads 66b, 66c. , 66d measurement of the position information of the substrate holder 34 (and position control). That is, this method is different from the concept of general encoder connection. It is not connected from one read head to another read head, but from a combination of three read heads (encoders) to another three read heads (encoders).器) The combination.

The main control device 90 first calculates the position information of the substrate holder in the XY plane _{based on the measured values C 1} , C ₄ , C _{2 of the} reading heads 66a, 66d, and 66b. (X, Y, θ z).

Next, the main control device 90 substitutes the X and θ z calculated above into the affine conversion formula of the following formula (3) to obtain the initial value of the measured value of the reading head 66c (the value to be measured by the reading head 66c) .

C ₃ =-(p ₃ -X)sin θ z+(q ₃ -Y)cos θ z……(3)

In the above formula (3), p ₃ , q ₃ are the X coordinate value and Y coordinate value of the measuring point of the reading head 66c. In this embodiment, the X-coordinate value p ₃ and the Y-coordinate value q ₃ are calculated from the output of the four X linear encoders 96x and the four Y linear encoders 96y as described above. The position of the center of the Y sliding platform 62 of the respective read head unit 60 in the X-axis direction and the Y-axis direction is calculated based on the known positional relationship between the read head 66c and the center of the Y sliding platform 62.

By assigning the aforementioned initial value C ₃ as the initial value of the read head 66c, the connection is terminated without conflict while maintaining the position (X, Y, θ z) of the substrate holder 34 in the 3-degree-of-freedom direction. _{After that, use the measured values C 2} , C ₃ , C ₄ of the read heads 66b, 66c, and 66d used after switching to solve the simultaneous equations (2b)~(2d) to calculate the position coordinates (X) of the wafer stage WST ,Y,θ z).

C ₃ =-(p ₃ -X)sin θ z+(q ₃ -Y)cos θ z……(2b)

C ₄ =(p ₄ -X)cos θ z+(q ₄ -Y)sin θ z……(2c)

C ₂ =-(p ₂ -X)sin θ z+(q ₂ -Y)cos θ z……(2d)

In addition, although it has been explained above to switch from three reading heads to three reading heads that include a different reading head from the three reading heads, this is due to the use of the measured values of the three reading heads before switching. The position (X, Y, θ z) of the substrate holder 34 is calculated based on the value measured by the other read head used after the switch is calculated according to the principle of affine conversion, and the calculated value is set as the value after the switch The initial value of the other reader is used, pretending to be the above explanation. However, if you ignore the calculation of the value measured by the other read head to be used after the switch, and only focus on the two read heads that are the direct targets of the switching and connection processing, it can also be said that the process before the switch is changed. One of the three reading heads used is switched to the other one. In any case, the switching of the reading head is carried out in a state where the reading head used for the measurement and position control of the position information of the substrate holder before switching and the reading head used after switching are simultaneously oriented to any scale 152.

In addition, although the above description is an example of the switching of reading heads 66a~66d, whether it is the switching from any three reading heads to the other three reading heads or the switching from any reading head to another reading head, it is the same as the above Explain the same procedure for reading head switching.

In addition, as shown in the second embodiment, when the grid portion is composed of a plurality of scales (two-dimensional grating RG), the scales respectively irradiated with the measuring beam are formed on the grid (two-dimensional grating RG) of each scale. The offset of the grating RG) will cause the measurement error of the encoder system.

Furthermore, in the second embodiment, in accordance with the X position of the substrate holder 34, a combination system of at least two rulers 152 irradiated by the measurement beams of at least three reading heads used for position information measurement and position control of the substrate holder 34 Different, in other words, it is possible to consider each existing coordinate system of the combination of these at least two rulers. If, for example, the relative position change of the at least two rulers causes an offset (grid error) between these coordinate systems, it will be The measurement error of the encoder system. In addition, since the relative positional relationship between at least two rulers will change for a long time, the grid error, that is, the measurement error, will also change.

However, in the second embodiment, when the read head is switched, when the initial value of the read head after the switch is set, the four read heads 66a to 66d will all face at least two of the scales 152 at the same time. The fifth state. In this fifth state, although all four reading heads can measure the position information of the substrate holder 34, only three reading heads are required for measuring the position coordinates (X, Y, θ z) of the substrate holder. Therefore, there will be an extra reading head. Therefore, the main control device 90 uses the measurement value of the redundant reading head to correct the measurement error (grid or grid correction information) of the encoder system caused by the offset (grid error) between the coordinate systems. The drive (position control) of the substrate holder 34 to obtain and compensate the measurement error of the encoder system caused by the grid error system).

For example, when each of the four reading heads 66a~66d is facing at least two scales at the same time, the position coordinates (X, Y, θ z) of the reading heads of two groups of three to the substrate holder are measured, Calculate the difference between the positions (X, Y, θ z) obtained by the measurement, specifically the simultaneous equation using the aforementioned affine transformation formula, that is, the offset Δx, Δy, Δθ z, and offset this Set as the offset of the coordinate system constituted by the combination of at least two scales facing the four reading heads 66a~66d at this time. This offset is used for the measurement of the position information of the substrate holder 34 and the position control of the substrate holder 34 by three of the four reading heads opposed to the at least two scales. In addition, because the combination of at least two rulers opposed to the three reading heads for the measurement and position control of the position information of the substrate holder 34 before and after the above-mentioned read head switching and connection processing is performed, and After switching, the combination of at least two rulers facing the three reading heads for measuring and controlling the position information of the substrate holder 34 is of course different. Therefore, before and after the switching of the reading heads, the different offsets are set at The position information of the substrate holder 34 is used as grid or grid correction information in measurement and position control.

Here, as an example, consider the following fifth state (referred to as the state of state 1) that appears immediately before the state of FIG. 20(A) during the movement of the substrate holder 34 in the +X direction. That is, the reading heads 66a and 66b are opposed to the scale 152b, and the reading heads 66c and 66d are opposed to the scale 152e. In this state, it is also possible to obtain the offset using two sets of reading heads composed of a combination of any one of the reading heads 66a to 66d. However, in the state of FIG. 20(A), the reading head 66c cannot measure. In order to restore the measurement of the reading head 66c, in the fifth state shown in FIG. 20(B), three reading heads 66a are used. The position coordinates (X, Y, θ z) of the substrate holder calculated from the measured values of, 66b and 66d. Also, in the process of moving the substrate holder 34 in the +X direction, Before being in the state of state 1, perform the restoration of the read head 66b that has become an unmeasured state. In order to restore the reading head 66b, the position coordinates (X, Y, θ z) of the substrate holder calculated from the measured values of the three reading heads 66a, 66c, and 66d are used. Therefore, in the state of situation 1, a group of three read heads other than the group of three read heads 66a, 66b, 66d and the group of three read heads 66a, 66c, 66d is used, that is, three read heads The group of 66a, 66b, 66c, and the group of three reading heads 66b, 66c, 66d obtain the grid correction information of the coordinate system formed by the combination of rulers 152b, 152e.

Specifically, the main control device 90 uses the measurement values of the reading heads 66a, 66b, and 66c to calculate the position coordinates of the substrate holder 34 (for convenience of description, set to (X ₁ , Y ₁ , θ z ₁ )), and use the measured values of the reading heads 66b, 66c, and 66d to calculate the position coordinates of the substrate holder 34 (for convenience of description, set as (X ₂ , Y ₂ , θ z ₂ )). Next, find the difference between the two positions ΔX=X ₂ -X ₁ , ΔY=Y ₂ -Y ₁ , Δθ z=Δθ z ₁ -Δθ z ₂ , and store this offset as grid correction information in, for example, internal memory (Storage device).

Also, for example, in the fifth state shown in FIG. 20(B), the read head used for position control of the substrate holder 34 is switched from the read head 66a to the read head 66c. At this time, three read heads are used. The measured values of 66a, 66b, and 66d calculate the position coordinates of the substrate holder 34 according to the aforementioned affine transformation formula. At this time, the main control device 90 calculates the position coordinates and uses the set of three reading heads 66a, 66b, 66d (the position coordinates of the substrate holder 34 used to switch the reading heads) Calculated) other than the set of three reading heads 66b, 66c, and 66d used to set the measured value of the reading head after switching when the next reading head is switched, such as the group of three reading heads 66a, 66b, 66c, and The group of three reading heads 66a, 66b, 66d is similar to the combination of scales 152b and 152e. After the above reading head is switched, the reading heads 66b, 66c, 66c, which are used for position measurement and position control of the substrate holder 34 are obtained. Coordinates formed by the combination of three rulers 152b, 152d and 152e facing 66d System grid correction information (offset).

In this embodiment, the main control device 90 is for the process of moving the substrate holder 34 in the +X direction or -X direction from the first position shown in FIG. 18(A) to the second position shown in FIG. 18(B) The multiple coordinate systems corresponding to all the combinations of at least two scales 152 facing the three read heads for position control of the substrate holder 34 that are sequentially switched in order to obtain the offsets ΔX, ΔY, Δθ z is stored in the storage device as grid correction information.

Also, for example, the main control device 90 may also be in the process of transitioning from the first state shown in FIG. 19(A) to the second state shown in FIG. 19(B), with the reading heads 66a, 66b facing the scale 152b and the reading heads 66c, 66d are facing to the fifth state of the scale 152e, after the above-mentioned reading head switching and connection processing are performed, the measured values of the three reading heads 66a, 66b, 66d including the restored reading head 66b For position control, while the substrate holder 34 moves until the reading head 66c fails to measure, obtain the grid correction information (offset) of the coordinate system composed of the scale 152b and the scale 152e at a plurality of positions by the aforementioned process. . That is, instead of each combination of at least two rulers 152 facing the three reading heads for position measurement and position control of the substrate holder 34, one grid correction information is obtained, but a plurality of grid correction information is obtained. In addition, the above-mentioned can also be used during the period in which four reading heads including three reading heads for position measurement and position control of the substrate holder 34 and one more reading head are opposed to at least two rulers 152 of the same combination The method essentially continuously obtains grid correction information. In this case, the grid correction information can be obtained in the entire period (interval) of at least two scales 152 of the same combination that are opposed by the four reading heads. In addition, the number of grid correction information obtained by each combination of at least two rulers 152 facing the three reading heads for position measurement and position control of the substrate holder 34 may not be the same, for example, it may be different according to the ruler combination. And the number of the obtained grid correction information is different. For example, three reading heads can also be used in the exposure action The number of the combination of at least two rulers 152 opposed to and the number of grid correction information for the combination of at least two rulers 152 opposed to the three reading heads outside of the exposure action (alignment action, substrate exchange action, etc.) is different. In addition, in this embodiment, as an example, before or after loading the substrate on the substrate holder 34 and before the substrate processing operation (including exposure operation or alignment operation, etc.), the measurement of the position of the substrate holder 34 And all the combinations of at least two rulers 152 facing the three reading heads of position control obtain the grid correction information and store it in the storage device. The grid correction information is updated regularly or at any time. The update of the grid correction information can be performed at any time including the substrate processing operation, as long as it is in a state where the substrate processing operation can be performed, for example.

In addition, in fact, it is also possible to update the offset ΔX, ΔY, Δθ z every time the head is switched after obtaining all the required grid correction information (offset ΔX, ΔY, Δθ z) at one time, but This is not necessary, and the offsets ΔX, ΔY, and Δθ z may be updated at a predetermined time interval every time the head is switched for a predetermined number of times, or every time the exposure of a predetermined number of substrates ends. It is also possible to obtain and update the offset during the period when the read head is not switched. In addition, the above-mentioned offset update can also be performed before the exposure operation, or during the exposure operation if necessary.

In addition, the above-mentioned offsets can also be used to correct, for example, the target value of positioning or position control when the substrate holder 34 is driven, instead of correcting the measurement information (position coordinates) of the substrate encoder system 50. In this case, It can compensate the position error of the substrate holder 34 (the position error caused by the grid error that occurs when the target value is not corrected).

In addition, in an encoder system using a scale (grid area) and a reading head, it is known that measurement errors may occur due to the relative movement of the scale or reading head, or in a direction other than the measurement direction (non-measurement direction). The measurement error caused by the ruler (hereinafter referred to as the ruler error Poor), there are measurement errors due to deformation, displacement, flatness, or formation errors formed in the grid area of the scale. In addition, the error caused by the reading head (hereinafter referred to as the reading head caused error) includes measurement errors caused by the displacement of the reading head (in addition to the displacement in the measurement direction, rotation, collapse, etc.) or optical characteristics. In addition, it is known that Abbe-caused errors will also occur.

The liquid crystal exposure apparatus of the second embodiment uses correction information in order to compensate for the measurement error of the encoder system as described above. Here, only the measurement error of the encoder is required, and the measurement error can be directly used as correction information.

Initially, the encoder system (hereinafter referred to as the "holding") composed of two reading heads 66a, 66b, 66c, 66d arranged on the lower end side of a pair of reading head units 60 and a scale 152 opposed to these reading heads will be explained. (With encoder system) measurement error.

〈Cause error of scale〉

<Correction information for measurement errors caused by the unevenness (flatness) of the ruler>

When the optical axis of each read head holding the encoder system is roughly the same as the Z axis and the pitch, roll and yaw of the substrate holder 34 are all zero, there should be no occurrence of substrate holding The measurement error of each encoder with 34 positions. However, in fact, even in this case, the measurement error of each encoder will not become zero. The reason is that the grid surface (for example, the surface) of the scale 152 is not an ideal plane, and there may be some irregularities. If the grid surface of the scale has unevenness, even if the substrate holder 34 moves parallel to the XY plane, the grid surface of the scale will be displaced (or moved up and down) or tilted relative to the reading head in the Z-axis direction. As a result, in addition to the relative movement between the reading head and the ruler in the non-measurement direction, this relative movement will also become the main cause of the measurement error. This point is as mentioned above.

Therefore, the liquid crystal exposure apparatus of the second embodiment is mainly used for maintenance, for example, The control device 90, that is, the substrate holder 34, measures the substrate holder 34 while maintaining the pitch, roll, and yaw amounts at zero as a measuring device for distance measurement, such as an interference meter system. At the X position, the micro-movement stage 32 (hereinafter referred to as the "substrate holder 34" as appropriate) to which the substrate holder 34 is fixed is moved in the +X direction or the -X direction. In order to realize such measurement, in the present embodiment, during maintenance, etc., a necessary number of reflective members having a predetermined area with high flatness are mounted on the substrate holder 34. However, it is not limited to this, and the use of the interference instrument system can also be assumed, and a reflective surface with a predetermined area with high flatness is formed in a predetermined position on each end surface of the substrate holder 34 in advance.

In the above-mentioned movement of the substrate holder 34 in the X-axis direction, the main control device 90 uses a sensor with high measurement resolution capability to measure the Z position of the ruler 152 surface, and captures the sensor’s data at a predetermined sampling interval. The measured value and the measured value of the interference instrument system are stored in the storage device. Here, the movement of the substrate holder 34 is preferably performed at a lower speed that can ignore the degree of measurement error caused by the air fluctuation of the interference instrument system. Then, the main control device 90 obtains the relationship between the measured value of the sensor and the measured value of the interference instrument based on the acquired measured values. _{For example, a function Z=f i} (x) representing the unevenness of the scale grid surface (the grid surface of the two-dimensional grating RG) can be obtained as the above-mentioned relationship. Here, x is the X position of the substrate holder 34 measured by the interference meter. In addition, when it is necessary to obtain the unevenness of the grid surface of the scale as a function of x, y, for example, it is only necessary to move and position the substrate holder 34 in the Y-axis direction at a predetermined pitch based on the measured value of the Y read head 66y, and At each positioning position, it is sufficient to repeat the action of moving the substrate holder 34 in the X-axis direction while simultaneously capturing the measured value of the interference meter and the measured value of the sensor at the same time. _{In this way, the function Z=g i} (x, y) representing the unevenness of the surface of the scale 152 is obtained. Here, i is a number used to identify a plurality of scales 152.

In addition, for example, as disclosed in the specification of US Patent No. 8,675,171, the holder encoder system itself can be used to obtain the function Z=f _i (x) or Z=g _i (x,y) representing the unevenness of the grid surface of the scale. Specifically, for any encoder reading head that holds the encoder system, the method disclosed in the above-mentioned US patent specification will be used to find out the points that are not sensitive to the tilting action of the substrate holder 34, that is, to find out Regardless of the inclination angle of the substrate holder 34 with respect to the XY plane, the measurement error of the encoder is performed at a specific point of zero, and the action is performed for a plurality of measurement points on the scale, thereby obtaining the function Z representing the unevenness of the grid surface of the scale =f _i (x) or Z=g _i (x,y). In addition, the concave-convex information of the grid surface of the ruler is not limited to functions, and can also be stored in the form of a map.

<Correction information of the grid pitch of the ruler and correction information of the grid deformation>

The scale of the encoder will deform the diffraction grid due to thermal expansion or other reasons with the passage of time, or the pitch of the diffraction grid will change locally or as a whole, etc., which lacks mechanical long-term stability. Therefore, since the error contained in the measured value increases with the passage of time, it is necessary to correct it.

The correction information of the grid pitch of the ruler and the correction information of the grid deformation are obtained, for example, in the following manner during the maintenance of the liquid crystal exposure device. Before this acquisition operation, the above-mentioned measurement of the concave-convex information of the grid surface of each ruler is performed, and the function Z=f _i (x) or Z=g _i (x, y) representing the concave-convex is stored in the storage device.

The main control device 90 first _{reads the function Z=f i} (x) (or Z=g _i (x, y)) stored in the storage device into the internal memory.

Next, the main control device 90 measures the X position of the substrate holder 34 with the interference meter system while maintaining the pitch, roll, and yaw amount at zero while holding the substrate holder 34. , While moving the substrate holder 34 in the +X direction or the -X direction. The movement of the substrate holder 34 is also preferably performed at a lower speed that can ignore the degree of measurement error caused by the air fluctuation of the interference instrument system. During this movement, the main control device 90 uses the above-mentioned function z=f _i (x) to correct the measurement of the X linear encoder (hereinafter referred to as the X encoder as appropriate) composed of the reading head 66a and the scale 152 of the object to be obtained. Value (output), while capturing the corrected measurement value and the measurement value of the interference instrument at a predetermined sampling interval, the measurement value of the X linear encoder (and the output of the X encoder- The relationship between the measured value corresponding to the function f _i (x) and the measured value of the interference instrument. That is, in this way, the main control device 90 obtains the diffraction of the two-dimensional grating RG arranged in the scale 152 of the reading head 66a in order along with the movement of the substrate holder 34 with the X-axis direction as the periodic direction. The grid pitch (the interval between adjacent grid lines) of the grid (X diffraction grid) and the correction information of the grid pitch. As the correction information of the grid pitch, for example, the horizontal axis can be calculated as the measured value of the interference meter and the vertical axis as the measured value of the encoder (the measured value after the error caused by the unevenness of the scale surface is corrected) The relationship between the two is shown in a modified graph with a curve, etc.

The acquisition of the grid pitch and the correction information of the grid pitch is performed on the adjacent plural scales 152 constituting the first grid group, when the measuring beam from the reading head 66a becomes not irradiated to the initial When the ruler 152 starts to irradiate the adjacent ruler, and the output of the detection signal from the reading head starts again, the initial value of the measured value of the X linear encoder composed of the reading head 66a and the scale 152 of the acquisition target is set to The measurement value of the interference meter at this point in time starts to measure the adjacent ruler 152. In this way, measurement is performed on the rows of scales 152 constituting the first grid group.

For each of the scales 152 constituting the second grid group, the grid pitch and the correction information of the grid pitch are calculated in the same manner as above (however, the reading head 66a is replaced by the reading head 66d). Obtained.

In parallel with the acquisition of the correction information of the grid pitch described above, the measurement value of the read head 66b and the measurement value of the interference instrument are acquired at a predetermined sampling interval, and the measurement of the read head 66b is obtained based on the acquired measurement values The relationship between the value and the measured value of the interference instrument. When capturing the measured value of the reading head 66b, the initial value of the reading head 66b (the Y linear encoder (hereinafter referred to as Y encoder as appropriate) consisting of the reading head 66b and the opposed scale 152) is set to a predetermined value. For example The measurement is started after zero. By this, the grid line curvature and correction information of the diffraction grid (Y diffraction grid) with the Y axis direction as the periodic direction of the two-dimensional grating RG of the scale 152 facing the read head 66b can be obtained As the correction information for the curvature of the grid line, for example, it is possible to obtain a correction graph showing the relationship between the two when the horizontal axis is the measured value of the interference meter and the vertical axis is the measured value of the reading head 66b. The above-mentioned grid line can be obtained. Obtaining the correction information of the bending is performed for the adjacent plural scales 152 constituting the first grid group, after the measuring beam from the reading head 66b becomes non-irradiating to the first scale 152 and starts to irradiate the adjacent scales 152 At the point when the output of the detection signal from the reading head is restarted, the initial value of the measurement value of the reading head 66b is set to a predetermined value such as zero, and the measurement is restarted.

For each of the scales 152 constituting the second grid group, the correction information for the grid line bending is obtained in the same manner as described above (however, the reading head 66c is used instead of the reading head 66b). In addition, the correction information can also be obtained based on the grid information (pitch, deformation, etc.) obtained by shooting the two-dimensional grating RG according to each scale.

<Measurement error caused by the relative movement of the reading head and the ruler in the non-measurement direction>

In addition, when the substrate holder 34 moves in a direction different from the measurement direction, such as the X-axis direction (or Y-axis direction), the direction to be measured is generated between the reading head 66x (or reading head 66y) and the ruler 52 In the case of other relative movement (relative movement in the non-measurement direction), in most cases, the X encoder (or Y encoder) will cause measurement errors.

Therefore, in this embodiment, for example, at the time of activation or maintenance of the exposure device, the correction information for the measurement error of each encoder caused by the relative movement of the reading head and the ruler in the non-measurement direction is obtained in the following manner. .

a. First, the main control device 90 monitors the measurement values of a measurement system different from the encoder system for which the information is obtained, such as the aforementioned interference instrument system, and drives the substrate holder 34 through the substrate drive system 93 to cause the reading head 66a to align with each other. To an arbitrary area of an arbitrary scale 152 of the first grid group (for the convenience of description, it is referred to as a correction area).

b. Next, the main control device 90 makes the roll amount θ x and yaw amount θ z of the substrate holder 34 both zero and the pitch amount θ y to the desired value α ₀ (here Where α ₀ =200μrad.), the substrate holder 34 is driven. After the driving, the measuring beam is irradiated from the reading head 66a to the correction area of the scale 152, and the measurement beam will interact with the photoelectric from the reading head 66a that has received its reflected light. The measured value corresponding to the conversion signal is stored in the internal memory.

c. Secondly, the main control device 90 maintains the posture of the substrate holder 34 based on the measurement value of the interference instrument system (pitch amount θ y=α ₀ , yaw amount θ z=0, roll amount θ x=0), While driving the substrate holder 34 in the Z-axis direction within a predetermined range, for example, the range of -100 μm to +100 μm, the correction area of the scale 152 is irradiated with detection light from the read head 66a during the driving, and the detection light is irradiated at a predetermined sampling interval according to The measured value corresponding to the photoelectric conversion signal from the reading head 66a that has received its reflected light is sequentially captured and stored in the internal memory. In addition, in the above-mentioned measurement, it is also possible to measure the position of the substrate holder 34 in the Z axis direction, the θ x direction, and the θ y direction by the Z tilt position measurement system 98.

d. Next, the main control device 90 changes the pitch amount θ y of the substrate holder 34 to (α=α ₀ -Δα) according to the measured value of the interference meter system.

e. Secondly, for the posture after the change, repeat the same as above c. The same action.

f. Thereafter, interactively repeat the above d. With the action of e, for the pitch amount θ y in the range of -200 μrad<θ x<+200 μrad, the measured value of the reading head 66a in the Z driving range is captured at intervals of Δα(rad), for example, 40 μrad.

g. Secondly, by the above b. ~e. The data in the internal memory obtained by the processing is plotted (plot) on the two-dimensional coordinate system with the horizontal axis as the Z position and the vertical axis as the encoder count value, and sequentially connect the plot points when the pitch amount is the same, and use The line where the pitch amount is zero (the line next to the center) passes through the origin and shifts the horizontal axis in the direction of the vertical axis, thereby obtaining the measurement value of the encoder (read head) corresponding to the Z level of the substrate holder 34 The change characteristics of the graph in Figure 23.

The vertical axis value of each point on the graph of Fig. 23 must be the measurement error of the encoder in each Z position where the pitch θ y = α. Therefore, the main control device 90 uses the pitch amount θ y, Z position, and encoder measurement error of each point on the graph as table data, and uses the table data as the X diffraction grid of the reading head 66a and the scale 152 The position-causing error correction information of the X-encoder is stored in the memory. Alternatively, the main control device 90 uses the measurement error as a function of the Z position z and the pitch amount θ y, calculates the indeterminate data by, for example, the least square method to obtain its function, and uses the function as the holder position-caused error correction information Store in storage device.

h. Next, the main control device 60, while monitoring the measurement value of the interference instrument system, drives the substrate holder 34 through the substrate drive system 93, so that the reading head 66d (the other X reading head 66x) is directed to any of the second grid groups Any area (correction area) of the ruler 152.

i. Next, the main control device 90 performs the same processing as described above for the read head 66d, and stores the correction information of the X encoder formed by the read head 66d and the X diffraction grid of the scale 152 in the storage device.

j. In the same way, the Y encoder consisting of the Y diffraction grid of the arbitrary scale 152 of the reading head 66b and the first grid group, and the Y encoder of the arbitrary scale 152 of the reading head 66c and the second grid group 152 are respectively obtained. The correction information of the Y encoder formed by the diffraction grid is stored in the storage device.

Next, the main control device 90 uses the same procedure as the case of changing the above-mentioned pitch amount to maintain the substrate holder 34 with both the pitch amount and the roll amount at zero. The amount of yaw θ z changes sequentially in the range of -200μrad<θ z<+200μrad, and at each position, the substrate holder 34 is driven in the Z-axis direction within a predetermined range, for example, -100μm~+100μm. In this drive, the measured values of the reading head are sequentially captured at a predetermined sampling interval and stored in the internal memory. This measurement is performed on all read heads 66a~66d, and the data in the internal memory is plotted on the two-dimensional coordinates with the horizontal axis as the Z position and the vertical axis as the encoder count value in the same process as the above. Sequentially connect the drawing points when the yaw amount is the same, and shift the horizontal axis so that the line where the yaw amount is zero (the line next to the center) passes through the origin, so as to obtain the same graph as in FIG. 23. Next, the main control device 90 uses the obtained yaw amount θ z, Z position z, and measurement error of each point on the same graph as in FIG. 23 as table data, and stores the table data as correction information in the storage device. Alternatively, the main control device 90 uses the measurement error as a function of the Z position z and the amount of yaw θ z, calculates indeterminate data by, for example, the least square method to obtain its function, and stores the function as correction information in the storage device.

Here, the pitch amount of the substrate holder 34 is not zero and the pitch amount is not zero. In this case, the measurement error of each encoder at the Z position z of the substrate holder 34 can be thought of as the simple sum of the measurement error corresponding to the above-mentioned pitch and the measurement error of the corresponding yaw amount at the Z position z (Linear and).

In order to simplify the description below, for the X heads (read heads 66a, 66d) of each X encoder, the pitch amount θ y and the deflection of the substrate holder representing the measurement error Δx as shown in the following formula (4) are obtained The shaking amount θ z, the function of Z position z, and stored in the storage device. Also, for the Y heads (read heads 66b, 66c) of each Y encoder, the roll amount θ x and the yaw amount θ of the substrate holder 34 representing the measurement error Δy as shown in the following formula (5) are obtained The function of z, Z position z, and stored in the storage device.

Δx=f(z,θ y,θ z)=θ y(z-a)+θ z(z-b)……(4)

Δy=g(z,θ x,θ z)=θ x(z-c)+θ z(z-d)……(5)

In the above formula (4), a is the intersection of the straight lines in the graph of Fig. 23 when the pitch amount has been changed in order to obtain the correction information of the X encoder, and the drawing points when the pitch amount is the same. The Z coordinate of b is the Z of the point where each straight line intersects when the yaw amount has been changed in order to obtain the correction information of the X encoder. The graph is the same as in Fig. 23, and the drawing points when the yaw amount is the same. coordinate. In addition, in the above formula (5), c is the straight line formed by connecting the drawing points when the roll amount is the same in the same graph as in Fig. 23 when the roll amount has been changed in order to obtain the correction information of the Y encoder. The Z coordinate of the intersecting point, d is the same graph as in Fig. 23 when the yaw amount has been changed in order to obtain the correction information of the Y encoder, and each straight line formed by connecting the drawing points when the yaw amount is the same is intersected The Z coordinate of the point.

In addition, the above Δx or Δy, because the X encoder or Y encoder is displayed The position of the substrate holder 34 in the non-measurement direction (such as the θ y direction or the θ x direction, the θ z direction and the Z axis direction) affects the extent to which the measured value of the X encoder or the Y encoder is measured, so it is called in this specification In order to maintain the position-caused error of the holder, since the position-caused error of the holder can be directly used as correction information, the correction information is referred to as the correction information of the position-caused error of the holder.

<Reading head cause error>

(來自X繞射格子或Y繞射格子之兩個返回光束間之位相差)產生變化，其結果係使編碼器之測量值變化。此外，即使非因讀頭66x(66y)產生倒塌，亦會例如因讀頭之光學特性(遠心等)等而使兩個返回光束之光路之對稱性紊亂，同樣地會使計數值變化。亦即，作為編碼器系統測量誤差產生要因之讀頭單元之特性資訊不僅有讀頭之倒塌，亦包含其光學特性等。 As the error caused by the reading head, the measurement error of the encoder caused by the collapse of the reading head can be representatively cited. Consider the state where the optical axis of the read head 66x (or 66y) is inclined relative to the Z axis (the read head 66x (or 66y) is inclined), and the substrate holder 34 is displaced in the Z axis direction (ΔZ≠0,ΔX=0 (Or ΔY=0)). In this case, due to the tilt of the reading head, the phase difference will be proportional to the Z displacement ΔZ

(The phase difference between the two return beams from the X diffraction grid or the Y diffraction grid) changes, and the result is a change in the measured value of the encoder. In addition, even if the reading head 66x (66y) is not collapsed, the optical properties of the reading head (telecentricity, etc.) will disturb the symmetry of the optical paths of the two returning beams, which will also change the count value. That is, the characteristic information of the read head unit, which is the main cause of the measurement error of the encoder system, includes not only the collapse of the read head, but also its optical characteristics.

In the liquid crystal exposure apparatus of this embodiment, since a pair of reading heads 66a, 66b and a pair of reading heads 66c, 66d are fixed to each of a pair of Y sliding platforms 62, Y is measured by other displacement sensors such as interference meters. The tilt amount of the sliding platform 62 in the θ x direction and the θ y direction can measure the collapse of the reading head.

However, the liquid crystal exposure device of this embodiment must pay attention to the following points.

Through the measurement of the holder encoder system, although the position (X, Y, θ z) of the substrate holder 34 is calculated using three of the aforementioned reading heads 66a~66d, the reading head 66a is used for this calculation , 66b, 66c, 66d respectively X coordinate value p _i and Y coordinate value q _i (i=1,2,3,4), derived from the aforementioned four X linear encoders 96x and four Y linear encoders 96y The output of a pair of head unit 60 (refer to Figure 1) is calculated in the X-axis direction and the Y-axis direction (the position of the center of the Y sliding platform 62 in the X-axis direction and the Y-axis direction), according to each reading head Relative to the known positional relationship of the center of the Y sliding platform 62 to calculate. Hereinafter, an encoder system composed of four X linear encoders 96x and four Y linear encoders 96y is referred to as a read head encoder system. Therefore, the measurement error of the read head encoder system will become the main cause of the measurement error caused by the X displacement and Y displacement of each read head holding the encoder system.

In addition, since a pair of reading heads 66a, 66b and a pair of reading heads 66c, 66d are fixed to each of the pair of Y sliding platforms 62, if a rotation error in the θ z direction occurs on the Y sliding platform 62, the reading head 66a ~66d produces the θ z rotation error relative to the opposite two-dimensional grating RG. Therefore, it can be clearly seen from the aforementioned equations (4) and (5) that measurement errors will occur in the reading heads 66a-66d. Therefore, it is better to measure the θ z rotation of the Y sliding platform 62 with an interference meter or other displacement sensors first. In this embodiment, the reading head encoder system can detect the rotation amount (deflection amount) of the Y sliding platform 62 in the θ z direction, that is, detecting the θ of the reading heads 66a~66d relative to the opposing two-dimensional grating RG. z rotation error.

<Abbe cause error>

In addition, if there is an error (or gap) between the height (Z position) of each scale grid surface (two-dimensional grating surface) on the substrate holder 34 and the height of the reference plane including the exposure center (the center of the aforementioned exposure area), then As the substrate holder 34 rotates (pitch or roll) about the axis parallel to the XY plane (Y-axis or X-axis), so-called Abbe error occurs in the measurement value of the encoder, so this error must be corrected. Here, the so-called reference plane is used to control the substrate holder 34 at Z The reference surface for the position in the axis direction (the surface used as the reference for the displacement of the substrate holder 34 in the Z-axis direction), or the surface on which the substrate P coincides during the exposure operation of the substrate P. In this embodiment, it is the same as the projection optics The image of Department 16 is the same.

In order to correct the above-mentioned error, the height difference (the so-called Abbe shift) of each scale 152 surface (two-dimensional grating surface) relative to the reference surface must be accurately obtained. The reason is that correcting the Abbe error caused by the above-mentioned Abbe offset is necessary for using the encoder system to accurately control the position of the substrate holder 34 in the XY plane. In consideration of this point, in the present embodiment, the main control device 90 performs the correction to obtain the above-mentioned Abbe shift amount by the following procedure when the exposure device is activated, for example.

First, when the calibration process is started, the main control device 90 drives the substrate holder 34 so that one scale 152 of the first grid group is located below the reading head 66a, and at the same time, one scale 152 of the second grid group is located below the reading head 66d. Below. For example, as shown in FIG. 20(A), the scale 152b is positioned below the reading head 66a while the scale 152e is positioned below the reading head 66d.

Secondly, the main control device 90, according to the measurement result of the interference instrument system, in the case where the displacement (pitch amount) Δθ y of the substrate holder 34 relative to the XY plane in the θ y direction is non-zero, according to the measurement result of the interference instrument system The substrate holder 34 is tilted about an axis parallel to the Y axis passing through the exposure center so that the pitch amount Δθ y becomes zero. At this time, since the interference meter system has completed all the necessary corrections for each interference meter (each measurement axis), it is possible to perform the pitch control of the substrate holder 34 described above.

_{Then, after the adjustment of the pitch of the substrate holder 34, the measured values x b0} and x _e0 of the two X encoders formed by the reading heads 66a, 66d and the scales 152b, 152e opposed to these are obtained. .

。接著，取得上述兩個X編碼器之測量值之測量值x_b1,x_e1。 Secondly, the main control device 90, based on the measurement result of the interference instrument system, makes the substrate holder 34 incline about the axis parallel to the Y axis passing through the exposure center

. _{Then, obtain the measured values x b1} , x _e1 of the measured values of the above two X encoders.

，算出標尺152b,152e之所謂阿貝偏移量h_b,h_e。此情形下，由於

為微小角，因此sin

=

，cos

=1成立。 Next, the main control device 90, based on the measured values x _b0 , x _e0 and x _b1 , x _e1 , and the above-mentioned angles of the two encoders obtained above

, Calculate the so-called Abbe offset h _b , h _{e of the} scales 152b and 152e. In this case, due to

Is a tiny angle, so sin

=

, Cos

=1 is established.

The main control device 90 uses the same process as the above to group one scale 152 of the first grid group and one scale 152 of the second grid group substantially opposite to it in the Y-axis direction, and obtain Abbe for the remaining scales. Offset. In addition, for one scale 152 of the first grid group and one scale 152 of the second grid group, it is not necessary to measure the Abbe shift amount at the same time, and the Abbe shift amount may be measured separately for each scale 152.

y，則伴隨基板保持具34之縱搖之各X編碼器之阿貝誤差Δx_abb能以下式(8)表示。 From the above equations (6) and (7), it can be seen that if the pitch of the substrate holder 34 is set as

_{y, the Abbe error Δx abb} of each X encoder accompanying the pitch of the substrate holder 34 can be expressed by the following formula (8).

In the formula (8), h is the Abbe offset of the scale 152 to which the X head of the X encoder is formed.

x，則伴隨基板保持具34之橫搖之各Y編碼器之阿貝誤差Δy_abb能以下式(9)表示。 Similarly, if the roll amount of the substrate holder 34 is set to

_{x, the Abbe error Δy abb} of each Y encoder accompanying the rolling of the substrate holder 34 can be expressed by the following equation (9).

In formula (9), h is the Abbe offset of the scale 152 to which the Y read head of the Y encoder is formed.

The main control device 90 stores the Abbe offset h of each scale 152 obtained in the above-mentioned manner in the storage device. Thereby, the main control device 90, during the actual position control of the substrate holder 34 in batch processing, can be corrected according to formula (8) or formula (9) to keep the encoder system measured in the XY plane (moving surface). The Abbe error contained in the position information of the substrate holder 34 in ), which is caused by the Abbe offset h of the grid surface of the scale 152 (two-dimensional grating RG surface) relative to the aforementioned reference surface, and the substrate holder 34 The measurement error of each X encoder corresponding to the pitch amount, or the Abbe offset h of the grid surface of the scale 152 (two-dimensional grating RG surface) relative to the aforementioned reference plane, which corresponds to the amount of roll of the substrate holder 34 For the measurement error of the Y encoder, the substrate holder 34 is driven (position controlled) with high precision in any direction in the XY plane.

As mentioned above, the measurement error of the read head encoder system will become the main cause of the measurement error caused by the X displacement and Y displacement of each read head holding the encoder system. Therefore, it is better for the reader encoder system to obtain the scale-causing error, the measurement error caused by the relative movement of the reader and the scale in the non-measurement direction, and the measurement error caused by the relative movement of the reader and the ruler in the non-measurement direction when the exposure device is activated or during maintenance, and Error caused by the reading head. The aforementioned various measurement errors and correction information of the reader encoder system can basically be obtained in the same way as the aforementioned measurement errors and correction information of the holder encoder system, so the detailed description is omitted.

In the second embodiment, in the actual position control of the substrate holder 34 such as batch processing, the main control device 90 can read the holder encoder system as the position of the substrate holder 34 changes in the X-axis direction. The switching of the heads 66a~66d is based on at least two scales that are used to compensate for the reading heads 66a~66d, and three of the reading heads 66a~66d are opposed to each other, and Correction information for the measurement error of the substrate position measurement system (including the Z tilt position measurement system 98 and the substrate encoder system 50) generated by the movement of at least one of the substrate holder 34 (referred to as the first correction information for the convenience of explanation), Correction information used to compensate the measurement error of the read head encoder system produced by the scale 56 and the X scale and Y scale of the scale 56 opposite to each of the X read head 64x and Y read head 64y. For the convenience of description, it is called the second correction information) and the position information measured by the substrate position measurement system, and the substrate driving system 93 is controlled.

Here, the position information measured by the substrate position measurement system includes the measurement information of the Z tilt position measurement system 98 on the position (Z, θ x, θ y) of the micro-movement stage 32, and the read head constituting a part of the substrate encoder system 50 The encoder system measures the position (X, Y, θ z) of the Y sliding platform 62 (that is, the read head 66a~66d), and the position of the holder encoder system that forms part of the substrate encoder system 50 on the substrate holder 34 (X, Y, θ z) measurement information. The first correction information includes various measurement errors of the aforementioned holder encoder system (scale-caused error, measurement error caused by the relative movement of the reader and the ruler in a non-measurement direction (holder position-caused error), and the cause of the reader Error, and Abbe error) correction information. The second correction information includes correction information of various measurement errors of the aforementioned reader encoder system (scale-caused error, measurement error caused by the relative movement of the reader and the ruler in a non-measurement direction, and reader-caused error).

Therefore, for example, when the substrate P is exposed, it is based on the position information of the substrate holder 34 in a direction different from the X-axis direction (including tilt information, such as rotation information in the θ y direction, etc.), and the direction of the X read head Characteristic information of the scale 152 (such as the flatness and/or grid formation error of the grid surface of the two-dimensional grating RG, etc.), the Abbe shift caused by the Abbe offset of the scale 152 (the grid surface of the two-dimensional grating RG) _{For the error correction information, the measured values C 1} , C ₄ of the X encoder (read head 66a, 66d) measuring the X position of the substrate holder 34 after correction are used to calculate the position coordinates (X, Y,θ z). More specifically, by the main control device 90, based on the position information of the substrate holder 34 in a direction (non-measurement direction) different from the X-axis direction, for example, the substrate holder 34 measured by the Z tilt position measuring system 98 is at θ Correction information of the position-causing error of the holder corresponding to the position information in the y direction, θ z direction and Z axis direction (correction information calculated by the aforementioned formula (4)), the grid pitch of the X diffraction grid of the two-dimensional grating RG The correction information (this is the correction information after considering the unevenness (flatness) of the scale grid surface (the surface of the two-dimensional grating RG)), the curvature of the grid line of the X-diffraction grid of the two-dimensional grating RG (error and warp during formation) Time change, etc.), the correction information of Abbe error caused by the Abbe offset of the scale 52 (the grid surface of the two-dimensional grating RG), and the correction information used to measure the substrate holder 34 in the X-axis direction The measured value of the X encoder (read head 66a, 66d) of the position information is used to calculate the position coordinates (X, Y, θ z) of the substrate holder 34 _{after the correction of the measured values C 1} and C _4.

Similarly, according to the position information of the substrate holder 34 in a direction different from the Y-axis direction (including tilt information, such as rotation information in the θ x direction, etc.), the characteristic information of the scale 152 facing the Y reading head (such as two-dimensional The flatness and/or grid formation error of the grid surface of the grating RG, etc.), the correction information of the Abbe error caused by the Abbe offset of the scale 152 (the grid surface of the two-dimensional grating RG), will be measured after correction _{The measured values C 2} and C ₃ of the Y encoder (read head 66b, 66c) of the Y position of the substrate holder 34 are used to calculate the position coordinates (X, Y, θ z) of the aforementioned substrate holder 34. More specifically, based on the position information of the substrate holder 34 in a direction (non-measurement direction) different from the Y-axis direction by the main control device 90, for example, the substrate holder 34 measured by the Z tilt position measurement system 98 is at θ Correction information of the position-causing error of the holder corresponding to the position information in the y direction, theta z direction and the Z axis direction (correction information calculated by the aforementioned formula (5)), the grid pitch of the Y diffraction grid of the two-dimensional grating RG The correction information (this is the correction information after considering the unevenness (flatness) of the scale grid surface (the surface of the two-dimensional grating RG)), the curvature of the grid line of the Y diffraction grid of the two-dimensional grating RG (the error and warp during formation) Time change, etc.), the correction information of Abbe error caused by the Abbe offset of the scale 52 (the grid surface of the two-dimensional grating RG), and the correction information for measuring the substrate holder 34 in the Y-axis direction The measured value of the Y encoder (read head 66b, 66c) of the position information is used to calculate the position coordinates (X, Y, θ z) of the substrate holder 34 _{after the correction of the measured values C 2} , C _3.

In addition, in this embodiment, each of the X linear encoders and Y linear encoders composed of the read heads 64x and 64y of the read head encoder system and the scale 56 to which the read heads opposes can also be used for each correction. The information corrects the error caused by the scale, the measurement error caused by the relative movement of the reading head and the scale in the non-measurement direction, and the error caused by the reading head. Therefore, in terms of the result, the corrected reading head encoder can be used extremely _{The position coordinates (p i} , q _i ) of the reading heads of the encoder system calculated by the measured values of the encoders of the system do not include errors.

Therefore, in this embodiment, three of the above-mentioned measured values of the corrected X encoder (read heads 66a, 66d) and the corrected Y encoder (read heads 66b, 66c) are used. _{And using the position coordinates (p i} , q _i ) of each reading head of the encoder system of the holder which is extremely free of errors calculated in the above method, the position coordinates (X, Y, θ z) of the substrate holder 34 are calculated. The movement of the substrate holder 34 is controlled. In this way, to compensate for the aforementioned scale-caused error of the three encoders composed of the three reading heads (three of the reading heads 66a~66d) used for the position control of the substrate holder and the opposed scale 152, the holder The substrate holder 34 is driven (positioned control) by means of all of the position-induced error, the head-induced error, and the Abbe error.

However, if the encoder (read head) used after the aforementioned switch is the read head 66c, when the initial value of the measured value of the read head 66c is obtained, C _{3 obtained by the aforementioned affine conversion formula (3)} Since it is the measurement value of the encoder after the correction of the measurement error of the aforementioned various encoders has been corrected, the main control device 90 uses the aforementioned correction information of the position-causing error of the holder, the correction information of the grid pitch of the ruler (and the grid Deformation correction information), Abbe offset (Abbe error correction information), etc., inversely correct the measured value C ₃ , calculate the original value C ₃ 'before the correction, and use the original value C ₃ ' as the encoder (read head The initial value of the measured value of 66c) is calculated.

Here, the so-called inverse correction refers to the measurement value C ₃ ′ of the encoder without any correction, assuming the use of the aforementioned holder position-caused error correction information and ruler-caused error correction information (for example, the correction of the grid pitch of the ruler Information (and correction information of grid deformation), etc.), and Abbe offset (Abbe error correction information), etc. After correction, the measured value of the encoder after correction is C ₃ , and the measurement is calculated based on the measured value C ₃ Processing of the value C _3'.

The liquid crystal exposure apparatus of the second embodiment described above exerts the same functions and effects as the above-mentioned first embodiment. In addition, according to the liquid crystal exposure apparatus of the second embodiment, the substrate holder 34 is driven by the X head 66x (X linear encoder) and the Y head 66x (X linear encoder) each including at least one substrate encoder system 50. The three reading heads (encoders) of the reading head 66y (Y linear encoder) measure the position information (including the θ z rotation) of the substrate holder 34 in the XY plane. Then, by the main control device 90, the position of the substrate holder 34 in the XY plane is maintained before and after switching, and the reading head (coded) used to measure the position information of the substrate holder 34 in the XY plane is maintained. Before switching, switch from any one of the three reading heads (encoders) used for position measurement and position control of the substrate holder 34 to the other reading head (encoder). Therefore, no matter whether the encoder for controlling the position of the substrate holder 34 has been switched, the position of the substrate holder 34 in the XY plane can be maintained before and after the switching, and the connection can be correctly performed. Therefore, it is possible to switch and connect the reading heads between a plurality of reading heads (encoders). Continuation processing of the magnitude), while correctly moving the substrate holder 34 (substrate P) along the XY plane along the predetermined path.

In addition, the liquid crystal exposure apparatus according to the second embodiment is, for example, in the exposure of the substrate, the main control device 90 is used to measure the position information of the substrate holder 34 and the three reading heads used to measure the position information. The position information ((X, Y) coordinate value) in the XY plane drives the substrate holder 34 in the XY plane. In this case, the main control device 90 uses the relationship of affine transformation to calculate the position information of the substrate holder 34 in the XY plane while driving the substrate holder 34 in the XY plane. Thereby, it is possible to use an encoder system each having a plurality of Y read heads 66y or a plurality of X read heads 66x, while switching the read heads (encoders) for control during the movement of the substrate holder 34. The precision controls the movement of the substrate holder 34 (substrate P).

In addition, according to the liquid crystal exposure apparatus of the second embodiment, each of the scales facing the reading head for the position information measurement and position control of the substrate holder 34 differs depending on the X position of the substrate holder 34 Combine, obtain the aforementioned offsets ΔX, ΔY, Δθ z (grid correction information), and update them as necessary. Therefore, it can compensate for the grid error (X , Y position error and rotation error) the measurement error of the encoder or the position error of the substrate holder 34 caused by the drive (position control) of the substrate holder 34. Therefore, at this point, the position of the substrate holder (substrate P) can also be controlled with good accuracy.

In addition, according to the liquid crystal exposure apparatus of the second embodiment, when the actual position of the substrate holder 34 is controlled in batch processing, the main control device 90 is used to compensate The reading heads 66a~66d of the holder encoder system, at least two scales facing three of the reading heads 66a~66d, and the substrate position measurement system generated by the movement of the substrate holder 34 (including the Z tilt position The correction information of the measurement error of the measurement system 98 and the substrate encoder system 50) (the first correction information mentioned above) is used to compensate for the scale 56 and each pair of X scales and Y scales opposite to the scale 56. Head 64x and Y head 64y and the correction information of the measurement error of the head encoder system generated by the relative movement of the two (the second correction information mentioned above), the position information measured by the substrate position measurement system, and control the substrate drive system 93 . Therefore, it is possible to perform drive control of the substrate holder 34 for compensating the aforementioned various measurement errors of the X encoders and Y encoders respectively constituting the head encoder system and the holder encoder system. Therefore, at this point, the position of the substrate holder (substrate P) can also be controlled with good accuracy.

In addition, in the above-mentioned second embodiment, the main control device 90 is used to compensate for at least two of the reading heads 66a~66d and three of the reading heads 66a~66d facing the encoder system. The correction information (first correction information) of the measurement error of the substrate position measurement system generated by the movement of the ruler and the substrate holder 34 (the micro-movement stage 32), and the correction information used to compensate the aforementioned measurement error of the reader encoder system (Second correction information) and the position information measured by the substrate position measurement system to control the substrate drive system 93. However, it is not limited to this. The main control device 90 may also control the substrate drive system 93 based on one of the position information measured by the substrate position measurement system and the first correction information and the second correction information. In this case, it is possible to drive (position control) the substrate holder 34 with higher accuracy than in the case of controlling the substrate drive system based on only the position information measured by the substrate position measurement system.

In addition, in the above-mentioned second embodiment, the first correction information includes a method for compensating the measurement error of the substrate position measurement system caused by the reading heads 66a~66d of the encoder system. Correction information (correction information of the error caused by the reading head), correction information used to compensate for the measurement error of the substrate position measurement system caused by at least two rulers facing the three of the reading heads 66a~66d (the error caused by the scale) All of (correction information for the error caused by the scale) and correction information used to compensate for the measurement error (error caused by the position of the holder) of the substrate position measurement system generated by the movement of the substrate holder 34. However, it is not limited to this. For the holder encoder system, correction information that compensates for at least one of the error caused by the read head, the error caused by the scale, and the error caused by the position of the holder can also be used. In addition, the Abbe error (Abbe-induced error) is included in either or both of the scale-induced error and the holder position-induced error. In addition, as the correction information for the error caused by the scale, although the correction information for the measurement error caused by the unevenness of the scale, the correction information for the grid pitch of the scale, and the correction information for the grid deformation are all used in the position of 34 of the substrate holder Control, but it is also possible to use only at least one correction information of the error caused by these scales. Similarly, as the error caused by the read head, although the measurement error caused by the displacement (including tilt and rotation) of the read head and the measurement error caused by the optical characteristics of the read head are mentioned, the error caused by the read head can be only The at least one correction information is used for position control of the substrate holder 34.

In addition, in the above-mentioned second embodiment, the second correction information includes correction information for compensating for the measurement error (scale-caused error) of the reader encoder system caused by the scale 56, and for compensating for the factors respectively facing the scale. The correction information of the measurement error of the read head encoder system (the error caused by the read head) produced by each pair of the X read head 64x and the Y read head 64y of the X scale and the Y scale of 56, and to compensate for the error caused by the scale 56 and the read All of the correction information for the measurement error (which can be called the error caused by the position of the Y sliding platform) caused by the relative movement of the head 64x and 64y. However, it is not limited to this. For the read head encoder system, correction information that compensates for at least one of the error caused by the read head, the error caused by the scale, and the error caused by the Y sliding platform position can also be used. About the reader encoder series Similarly, as the correction information of the error caused by the scale, the correction information of at least one of the measurement error caused by the unevenness of the scale, the correction information of the grid pitch of the scale, and the correction information of the grid deformation can also be used. , Only used for position control of the substrate holder 34. In addition, as the error caused by the reading head, it is also possible to use correction information for at least one of the measurement error caused by the displacement (including tilt and rotation) of the reading head and the measurement error caused by the optical characteristics of the reading head for the substrate holder 34 The position control. In addition, it is also possible to individually obtain correction information for the error caused by the reading head, the error caused by the scale, the error caused by the holder, etc., or one correction information for at least two measurement errors.

In addition, similar to the encoders of the encoder system for measuring the position information of the substrate holder 34, the reading heads (encoders) of the photomask encoder system can also be adjusted in a direction different from the measurement direction of each encoder. The correction information of the measurement error of the reading head (encoder) caused by the relative movement of each reading head and the scale to which the reading head is opposed is obtained in the same way as the above, and the correction information is used to correct the reading head ( Encoder) measurement error.

In addition, in the liquid crystal exposure apparatus of the second embodiment described above, it is also possible to use the same intervention instrument system used to obtain the scale cause error (and its correction information) of the holder encoder system during the aforementioned maintenance. The interference instrument system is installed in the device. In this case, not only during maintenance, but also during the operation of the device, it is possible to obtain and update the correction information of the scale-causing error of the encoder system appropriately. Similarly, a measuring device such as an interference instrument used to obtain the scale-causing error (and its correction information) of the reader encoder system can also be installed in the device. In addition, although the above-mentioned correction information is obtained by using another measuring device (interferometer, etc.) different from the encoder system, it is also possible to use an encoder system or by using a measuring wafer without using another measuring device. The exposure processing and so on obtain the correction information in the same way.

In addition, in the above-mentioned second embodiment, although the reading head (equivalent to the above-mentioned other reading head) which separates from one of the adjacent pair of scales and moves the measuring beam to the other scale is used to control the correction information for the movement of the substrate holder (The initial value of the other reading head mentioned above) is obtained based on the position information measured by the three reading heads opposite to at least one scale 152, but this correction information only needs to move the measuring beam of the other reading head to another After one scale, it is only required to obtain it before one of the three reading heads opposite to at least one scale 152 is separated from the two-dimensional grating RG. In addition, in the case of switching the three reading heads opposed to at least one scale 152 to three different reading heads including the above-mentioned other reading head for position measurement or position control of the substrate holder, the switching is only necessary After obtaining the above-mentioned correction information, it can be performed before one of the three reading heads facing at least one scale 152 is separated from the two-dimensional grating RG. In addition, the acquisition and switching of correction information can be performed substantially simultaneously.

In addition, in the above-mentioned second embodiment, in the X-axis direction (first direction), the two-dimensional grating RG without the first grating group (non-grid area) and the two-dimensional grating RG without the second grating group The area (non-lattice area) does not overlap. In other words, the four read heads do not overlap during the non-measurement period when the measuring beam is separated from the two-dimensional grating RG. The scale 152 is arranged on the substrate holder 34. In this case, the read heads 66a, 66b of the read head unit 60 on the +Y side are arranged at intervals that are wider than the width of the region without the two-dimensional grating RG in the first grid group in the X-axis direction, and the -Y side The heads 66c and 66d of the head unit 60 are arranged at intervals that are wider than the width of the area of the second grid group without the two-dimensional grating RG in the X-axis direction. However, the combination of a grid portion including a plurality of two-dimensional grids and a plurality of reading heads that can be opposed to it is not limited to this. In short, as long as the measuring beam is separated from the two-dimensional grating RG (which cannot be measured) during the movement of the moving body in the X-axis direction, the four reading heads 66a, 66b, 66c, 66d do not overlap during the non-measurement period. , Set the interval between reading heads 66a and 66b and between reading heads 66c and 66d The interval, position, the position and length of the grid part of the first and second grid groups, or the interval and position of the grid part may be sufficient. For example, in the first grid group and the second grid group, even if the position and width of the non-grid area in the X-axis direction are the same, at least one scale 152 (two-dimensional grating RG) of the first grid group may be opposed to each other. The two reading heads and the two reading heads facing at least one scale 152 (two-dimensional grating RG) of the second grid group are staggered and arranged in the X-axis direction by a distance wider than the width of the non-grid area. In this case, it is also possible to arrange the read head on the +X side of the two read heads facing the first grid group and the read head on the -X side of the two read heads facing the second grid group. The interval of is set to be wider than the width of the non-grid area, and the two read heads facing the first grid group and the two read heads facing the second grid group can be alternately arranged in the X-axis direction, and Set the distance between a pair of adjacent reading heads to be wider than the width of the non-grid area.

In addition, in the second embodiment described above, although the first lattice group is arranged in the +Y-side area of the substrate holder 34, and the second lattice group is arranged in the -Y-side area of the substrate holder 34, it may be Instead of one of the first grid group and the second grid group, for example, the first grid group, a single scale member formed with a two-dimensional grid extending in the X-axis direction is used. In this case, there can be one reading head facing the single scale member at any time. In this case, three reading heads can be arranged opposite to the second grid group, and the distance between the three reading heads in the X-axis direction (the interval between the irradiation positions of the measuring beam) is set to be shorter than the adjacent scale The space between the two-dimensional gratings RG on 152 is wide, that is, regardless of the position of the substrate holder 34 in the X-axis direction, at least two of the three reading heads facing the second grid group can be opposed to each other. At least one two-dimensional grating RG in the second grid group. Or, regardless of the position of the substrate holder 34 in the X-axis direction, at least two reading heads can be opposed to the single scale member at any time, and at least two reading heads can be opposed to the second At least one two-dimensional grating RG in the grid group. In this case, the at least two reading heads are in the base During the movement of the plate holder 34 in the X-axis direction, the measuring beam will be separated from one of the plurality of rulers 152 (two-dimensional grating RG) and will move to another ruler adjacent to one ruler 152 (two-dimensional grating RG) 152 (two-dimensional grating RG). However, by setting the interval between the at least two reading heads in the X-axis direction to be wider than the interval between the two-dimensional grating RG of the adjacent scale 152, that is, there is no overlap during the non-measurement period between the at least two reading heads, that is, at any time At least one reading head irradiates the measuring beam to the ruler 152. With these configurations, at least three reading heads and at least one ruler 152 can be aligned at any time to measure the position information in the direction of 3 degrees of freedom.

In addition, the number of scales of the first grid group and the second grid group, the interval between adjacent scales, etc. may also be different. In this case, at least two reading heads facing the first grid group and at least two reading heads facing the second grid group may have different distances and positions of the reading heads (measuring beams).

In addition, in the second embodiment described above, the positions of the read heads 66a to 66d in the X-axis direction and the Y-axis direction are calculated from the output of the four X linear encoders 96x and the four Y linear encoders 96y. The positions of the center of the Y sliding platform 62 of each read head unit 60 in the X axis direction and the Y axis direction are calculated based on the known positional relationship of each read head relative to the center of the Y sliding platform 62. That is, the position measurement of the X-axis direction and Y-axis direction of the reading heads 66a~66d uses an encoder system. However, it is not limited to this. The reading heads 66a~66d (a pair of reading head units 60) can only move in the Y-axis direction, so an encoder system can also be used to measure the position of the reading heads 66a~66d in the Y-axis direction. News. That is, in the second embodiment described above, the four X linear encoders 96x may not necessarily be provided. In this case, when the aforementioned formulas (2a) to (2d) are applied to the read heads 66a to 66d, the design value (fixed value) is used as p ₁ to P ₄ (X position), q ₁ to q ₄ ( Y position) uses the value calculated from the output of the four Y linear encoders 96y. In addition, when the position information of the substrate holder 34 in the Y-axis direction is measured by the read heads 66b and 66c without using the relationship of affine conversion, the measurement information of the four Y linear encoders 96y is used. When 66a and 66d measure the position information of the substrate holder 34 in the X-axis direction, the measurement information of the four Y linear encoders 96y may not be used.

In the second embodiment described above, although a plurality of scales 152 each formed with a single two-dimensional grating RG (grid region) are used, it is not limited to this. Two or more grid regions may be used in the first grid. At least one of the group or the second grid group includes a scale 152 formed separately in the X-axis direction.

In addition, in the above-mentioned second embodiment, since the position (X, Y, θ z) of the substrate holder 34 is measured and controlled by three read heads at any time, the first grid including five scales 152 each having the same configuration is explained. The group and the second grid group are arranged offset by a predetermined distance in the X-axis direction, but it is not limited to this. The first grid group and the second grid group may be well spaced in the X-axis direction (approximately opposite each other) Layout of the scale 152), and in the head unit 60 on one side and the head unit 60 on the other side, the reading heads (read heads 66x, 66y) for position measurement of the substrate holder 34 are arranged in the X-axis direction Different on. In this case, three reading heads can also be used to measure and control the position (X, Y, θ z) of the substrate holder 34 at any time.

In addition, in the second embodiment described above, a case where a total of four heads of the heads 66a, 66b and 66c, 66d are used is described, but it is not limited to this, and more than five heads may be used. In other words, at least one redundant read head may be added to at least one of the two read heads facing each of the first grid group and the second grid group. About this structure, the following 3rd Embodiment is used for description.

"Third Embodiment"

Next, a third embodiment will be described based on FIG. 21. Liquid crystal exposure device of the third embodiment The configuration is the same as that of the first and second embodiments except for a part of the substrate encoder system 50. Therefore, only the differences will be described below, and the same configuration and the first and second embodiments will be described below. The functional elements are assigned the same reference numerals as in the first and second embodiments, and their description is omitted.

FIG. 21 is a plan view showing a pair of the head unit 60 and the projection optical system 16 of the substrate holder 34 and the substrate encoder system 50 of the third embodiment. In FIG. 21, in order to make the description easy to understand, the illustration of the encoder base 54 and the like is omitted. In addition, in FIG. 21, the read head unit 60 (Y sliding platform 62) is shown with a dotted line, and the illustration of the X read head 64x and the y read head 64y provided on the Y sliding platform 62 are also omitted.

In the liquid crystal exposure apparatus of the third embodiment, as shown in FIG. 21, the regions on the +Y side and -Y side of the substrate mounting region with the substrate holder 34 interposed therebetween are arranged at predetermined intervals in the X-axis direction, for example, five A ruler 152. The five scales 152 arranged on the +Y side of the substrate placement area and the five scales 152 arranged on the -Y side area have the same interval between adjacent scales 152, and the +Y side and-of the substrate placement area The five rulers 152 on the Y side are opposed to each other and are arranged at the same X position. Therefore, the position of the gap between adjacent scales 152 is located on a straight line with a predetermined line width in substantially the same Y-axis direction.

Under the Y sliding platform 62 of the read head unit 60 located on the +Y side (the surface on the -Z side), respectively facing the ruler 152, Y read head 66Y, X read head 66x and Y read head The total of the three reading heads of 66y are fixed at a predetermined interval (a distance greater than the distance between adjacent scales 152) in the X-axis direction from the -X side in order. Under the Y sliding platform 62 of the reading head unit 60 on the other side of the -Y side (the surface of the -Z side), respectively facing the ruler 152, the Y reading head 66y and the X reading head 66x are on the X axis The direction separation is fixed at a predetermined interval. The following is For the convenience of description, the three read heads of one read head unit 60 are called read head 66e, read head 66a, and read head 66b in order from the -X side, and the other read head unit 60 has The Y reading head 66Y and the X reading head 66x are also referred to as the reading head 66c and the reading head 66d, respectively.

In this case, the read head 66a and the read head 66c are arranged at the same X position (the same line in the Y axis direction), and the read head 66b and the read head 66d are arranged at the same X position (the same line in the Y axis direction) ). A pair of X linear encoders are formed by the two-dimensional gratings RG facing the reading heads 66a, 66d, and three Y linear encoders are formed by the two-dimensional gratings RG facing the reading heads 66b, 66c, and 66e.

The configuration of the other parts of the liquid crystal exposure apparatus of the third embodiment is the same as that of the liquid crystal exposure apparatus of the second embodiment described above.

In the third embodiment, even if the rows of scales 152 on the +Y side and -Y side are not shifted in the X-axis direction, as long as the pair of read head units 60 and the substrate holder 34 move synchronously in the Y-axis direction (or Maintain the Y position of the substrate holder 34 at a position opposite to the row of the pair of read head units 60 and the scale 152), then three of the read heads 66a to 66e can be aligned at any time regardless of the X position of the substrate holder 34 Toward the scale 152 (two-dimensional grating RG).

The liquid crystal exposure apparatus of the third embodiment described above exerts the same functions and effects as the liquid crystal exposure apparatus of the second embodiment described above.

In addition, in the third embodiment described above, the plurality of reading heads for measuring the position information of the substrate holder 34 may be in addition to the four reading heads required to switch the reading heads, for example, reading heads 66e, 66b, 66c, and 66d. It includes a read head 66a that partially overlaps with one of the four read heads 66c during the non-measurement period. Next, in the third embodiment, in the measurement of the position information (X, Y, θ z) of the substrate holder 34, four reading heads 66e, 66b, 66c, 66d and one reading head 66c are used. The measurement information of at least three reading heads in which the measuring beam irradiates at least one of the plurality of grid areas (two-dimensional grating RG) among the five reading heads.

In addition, in the third embodiment described above, at least two of the plurality of read heads overlap during the non-measurement period. For example, the two read heads are separated from the scale 152 (grid area, for example, two-dimensional grating RG) at the same time. An example of a case where it moves to an adjacent scale 152 (a grid area, for example, a two-dimensional grating RG). In this case, even if the measurement of at least two reading heads is interrupted, in order to continue the measurement, at least three reading heads must be opposed to the grid area (two-dimensional grating) of the grid part. Furthermore, the at least three read heads are based on the premise that the measurement is not interrupted until one or more of the at least two read heads whose measurement has been interrupted move to an adjacent grid area. That is, even if there are at least two reading heads that overlap during the non-measurement period, as long as there are at least three reading heads in addition, the measurement can be continued even if the grid areas are arranged at intervals.

"Fourth Embodiment"

Next, the fourth embodiment will be described based on FIG. 22. The configuration of the liquid crystal exposure apparatus of the fourth embodiment is the same as that of the third embodiment, except that the rows of scales 52 respectively arranged on the +Y side and -Y side of the substrate placement area of the substrate holder 34 are the same as those in the third embodiment. The head unit 60 arranged opposite to the ground and located on one of the -Y side has two X heads 66x and y heads 66y in the same way as the first embodiment described above, and is similar to the liquid crystal exposure device of the second embodiment described above. The structure is different, but the structure of other parts is the same as the liquid crystal exposure apparatus of the second embodiment.

Under the Y sliding platform 62 of the reading head unit 60 on one side (the surface on the -Z side), the Y reading head 66y (reading head 66c) adjacent to the -Y side is provided with an X reading head 66x (hereinafter referred to as The reading head 66e), and the Y reading head 66y (hereinafter referred to as reading head 66f as appropriate) is provided adjacent to the -Y side of the X reading head 66x (reading head 66d).

In the liquid crystal exposure apparatus of this embodiment, the Y position of the substrate holder 34 is maintained in the state where the pair of head units 60 are moved in the Y-axis direction (or the position opposite to the row of the pair of head units 60 and the scale 152 In the state), along with the movement of the substrate holder 34 in the X-axis direction, although there are three reading heads 66a, 66c, 66e (called the first group of reading heads) and three reading heads 66b, 66d, 66f (called It is one of the reading heads of the second group, which is not facing any scale, but at this time, the other of the reading heads of the first group and the reading head of the second group must be facing the scale 152 (Two-dimensional grating RG). That is, in the liquid crystal exposure apparatus of the fourth embodiment, even if the rows of scales 152 on the +Y side and -Y side are not shifted in the X-axis direction, as long as the substrate holder 34 moves in the X-axis direction, A pair of head units 60 moves in the Y-axis direction (or the Y position of the substrate holder 34 is maintained at a position opposite to the row of the pair of head units 60 and the scale 152), then the reading of the first group The three reading heads included in at least one of the head and the second group of reading heads can measure the position (X, Y, θ z) of the substrate holder 34 regardless of the X position of the substrate holder 34.

Here, considering, for example, that the reading heads of the first group (reading heads 66a, 66c, 66e) are not facing any of the scales and become unmeasurable, when facing the scale 152 again, the reading heads 66a, 66c are used. 66e Restore the situation (restart the measurement). In this case, at the point before the measurement of the reading heads of the first group (reading heads 66a, 66c, 66e) is restarted, the reading heads of the second group (reading heads 66b, 66d, 66f) continue to perform The position (X, Y, θ z) of the substrate holder 34 is measured and controlled. Therefore, the main control device 90 is shown in FIG. 22. A pair of read head units 60 straddle two adjacent scales 152 respectively arranged on the +Y side and -Y side. When the reading heads of the group are opposed to one of the two adjacent rulers 152 and the other, according to the method detailed in the second embodiment, according to the reading heads of the second group (reading heads 66b, 66d, 66f) ) The measured value to calculate the position of the substrate holder (X, Y, θ z), and substitute the calculated position of the substrate holder (X, Y, θ z) into The aforementioned affine conversion formula is used to simultaneously calculate and set the initial values of the reading heads of the first group (reading heads 66a, 66c, 66e). Thereby, the reading heads of the first group can be easily restored, and the position measurement and control of the substrate holder 34 by these reading heads can be restarted.

According to the liquid crystal exposure device of the fourth embodiment described above, the same functions and effects as the liquid crystal exposure device of the aforementioned second embodiment can be exerted.

"Modifications of the fourth embodiment"

In this modification, in the liquid crystal exposure apparatus of the fourth embodiment, the head unit 60 on the other side of the +Y side uses the same configuration as the head unit 60 on the other side (or a configuration that is symmetrical in the vertical direction on the paper). ) Of the read head unit.

In this case, similarly to the above, the eight heads are grouped into the heads of the first group and the heads of the second group to which the four heads each arranged in a straight line in the same Y-axis direction belong.

Considering the situation where the reading heads of the first group are not aligned with any ruler and become unable to measure, the reading heads of the first group are restored when the reading heads of the first group are oriented to the ruler 152 again, and the measurement of these reading heads is restarted.

In this case, the position of the substrate holder 34 (X, Y, θ) is continuously performed by three of the reading heads of the second group before the measurement of the reading heads of the first group is restarted. z) Measurement and control. Therefore, although the main control device 90 is the same as the above, the pair of head units 60 straddle two adjacent scales 152 arranged on the +Y side and -Y side, respectively, and the heads of the first group and the first When the reading heads of the 2 groups face one of the two adjacent scales 152 and the other, the initial values of the respective measurement values of the reading heads of the first group are calculated. However, in this case, the first reading cannot be calculated at the same time. All initial values of the four reading heads in the group. The reason is that as long as there are three read heads for the return measurement (the number of X read heads and Y read heads added together), when the initial values of the measured values of the three read heads are set in the same process as the above, By setting these initial values to the aforementioned measured values C ₁ , C ₂ , C _3, etc. and solving the aforementioned simultaneous equations, since the position (X, Y, θ) of the substrate holder is uniquely determined, there is nothing special problem. However, it is not possible to recognize a simultaneous equation that uses the relationship of affine transformation among the measured values of the four reading heads that can uniquely determine the position (X, Y, θ) of the substrate holder.

Therefore, in this modified example, the first group to be restored is grouped into two groups to which the three read heads each including another read head belong, and each group uses the same method as described above for three groups. The reading head calculates and sets the initial value at the same time. After the initial value is set, it is enough to use the measured values of the three reading heads of any group for the position control of the substrate holder 34. The position measurement of the substrate holder 34 by the read head of the group not used for position control can also be performed in parallel with the position control of the substrate holder 34. In addition, the initial values of the read heads of the first group to be restored can also be calculated individually and sequentially using the aforementioned method.

In addition, the configuration of the first to fourth embodiments described above can be changed as appropriate. For example, in the mask encoder system 48 and the substrate encoder system 50 of the first embodiment described above, the arrangement of the encoder head and the scale may be reversed. That is, for example, the X linear encoder 92x and the Y linear encoder 92y used to obtain the position information of the mask holder 40 can also be installed with the encoder reading head on the mask holder 40, and the encoder base 43 The composition of the installation ruler. In addition, the X linear encoder 94x and the Y linear encoder 94y used to obtain the position information of the substrate holder 34 can also be equipped with an encoder reading head on the substrate holder 34 and a scale on the Y sliding platform 62. In this case, the encoder read heads mounted on the substrate holder 34 can be arranged along the X-axis direction, for example, and can switch operations. In addition, the encoder read head provided on the substrate holder 34 can be made movable, a sensor for measuring the position information of the encoder read head can be provided, and a scale can be provided on the encoder base 43. This situation Under the shape, the scale provided on the encoder base 43 is fixed. Similarly, the X linear encoder 96x and Y linear encoder 96y used to obtain the position information of the Y sliding platform 62 can also be installed with a scale on the Y sliding platform 62 and the encoder base 54 (device body 18) installed器Reading head. In this case, the encoder read heads installed on the encoder base 54 can be arranged along the Y-axis direction, for example, and can switch actions between them. In the case where the substrate holder 34 and the encoder base 54 fix the encoder reading head, the scale fixed to the Y sliding platform 62 can also be shared.

In addition, although the substrate encoder system 50 has been described, a plurality of scales 52 extending in the X-axis direction are fixed on the substrate stage device 20 side, and a plurality of scales 52 extending in the device body 18 (encoder base 54) side are fixed In the case of the scale 56 in the Y-axis direction, but not limited to this, a plurality of scales extending in the Y-axis direction may be fixed on the side of the substrate stage device 20, and a plurality of scales extending in the X-axis direction may be fixed on the side of the device body 18 The ruler. In this case, the head unit 60 is driven in the X-axis direction during the movement of the substrate holder 34 such as the exposure operation of the substrate P.

Furthermore, although it has been described that in the mask encoder system 48, for example, three scales 46 are arranged separately in the X-axis direction, in the substrate encoder system 50, for example, two scales 52 are arranged separately in the Y-axis direction, for example, five scales 56 are arranged separately in the Y-axis direction. In the case of separate arrangement in the X-axis direction, the number of scales is not limited to this. For example, the size of the mask M, the substrate P, or the movement stroke may be appropriately changed. In addition, a plurality of scales do not have to be arranged separately, and for example, a longer scale may be used (in the case of the above embodiment, for example, a scale of about 3 times the length of scale 46, a scale of about 2 times the length of scale 52, A ruler about 5 times the length of ruler 56). Also, multiple scales with different lengths may be used. As long as multiple grid regions arranged in the X-axis direction or Y-axis direction are included in each grid portion, the number of scales constituting the grid portion can be any number.

In addition, the Y sliding platform 62 and the belt driving device 68 are attached to the main body of the device 18 The structure of the lower surface of the upper frame portion 18a (refer to FIG. 4), but it may also be provided on the lower frame portion 18b or the middle frame portion 18c.

In addition, in the above-mentioned first embodiment, although the case where the X scale and the Y scale are independently formed on the respective surfaces of the scales 46, 52, and 56 is described, it is not limited to this, and may be combined with the above-mentioned second to fourth embodiments. In the same manner, a scale formed with a two-dimensional grating is used. In this case, the encoder read head can also use an XY two-dimensional read head. In addition, in the scale 52 formed on the substrate holder 34, although the X scale 53x and the Y scale 53y are formed with the same length in the X-axis direction, these lengths may be different from each other. In addition, the two may be relatively staggered in the X-axis direction. In addition, although the case of using the encoder system of the diffraction interference method is described, it is not limited to this. Other encoders such as the so-called pick-up method and magnetic method can also be used. For example, US Patent No. 6,639,686 can also be used. The so-called scan encoders, etc. disclosed in the manuals, etc. In addition, the position information of the Y sliding platform 62 can also be obtained by a measurement system other than the encoder system (for example, an optical interference instrument system).

In addition, in the above-mentioned second to fourth embodiments and their modifications (hereinafter referred to as the fourth embodiment), although the case where at least four read heads are installed is described, in this case, it is only necessary to arrange them in the first direction. The plurality of grid regions arranged are included in the grid portion, and the number of scales 152 constituting the grid portion can be arbitrary. The plurality of grid regions may not need to be arranged on both one side and the other side of the substrate holder 34 in the Y-axis direction with the substrate P interposed therebetween, and may be arranged on only one of them. However, in order to continuously control the position (X, Y, θ z) of the substrate holder 34 at least during the exposure operation of the substrate P, the following conditions must be satisfied.

That is, during the period when the measuring beam of at least one of the four reading heads is separated from the plurality of grid areas (for example, the aforementioned two-dimensional grating RG), the measurement beams of the remaining at least three reading heads irradiate the plurality of grid areas At least one of them, and the direction of the X-axis by the substrate holder 34 (First direction) moving, and the measurement beam is separated from the plurality of grid areas among the at least four heads, and the one head is switched. In this case, at least four reading heads, including two reading heads that differ in the position (irradiation position) of the measuring beam in the X-axis direction (first direction), and one of the measuring beam in the Y-axis direction (second direction) Two read heads whose positions are different from at least one of the aforementioned two read heads and the positions of the measuring beam (irradiation position) in the X-axis direction are different from each other. The aforementioned two read heads are in the X-axis direction. The measurement beam is irradiated with a wide interval between a pair of adjacent grid areas in the grid area.

In addition, three or more rows of grid regions (for example, two-dimensional grating RG) arranged in the X-axis direction may be arranged in the Y-axis direction. For example, in the above-mentioned fourth embodiment, instead of the five rulers 152 on the -Y side, the following structure may be adopted: 10 grids each having an area that divides each of the five rulers 152 in the Y-axis direction are provided. A column of two grid regions (such as a two-dimensional grating RG) adjacent in the Y-axis direction formed by a region (such as a two-dimensional grating RG), the reading heads 66e, 66f can face a row of two-dimensional grating RG, and The reading heads 66c, 66d can be opposed to the two-dimensional grating RG in the other column. In addition, in the modification of the fourth embodiment described above, the five scales 152 on the +Y side can also be configured as follows: two adjacent ones in the Y-axis direction composed of the same ten grid areas as the above are provided In the grid area (for example, the two-dimensional grating RG), a pair of reading heads can face the two-dimensional grating RG of one row, and the remaining pair of reading heads can face the two-dimensional grating RG of the other row.

In addition, in the second to fourth embodiments described above, during the movement of the substrate holder 34 in the X-axis direction (the first direction), at least the measurement beams of any two read heads are not irradiated between the four read heads. For any two-dimensional grating RG (detached from the grid area), that is, the position or interval, or position and interval of at least one of the scale and the reading head cannot be set in a way that the reading head measurement (non-measurement interval) does not overlap Is very important.

In addition, in the above-mentioned second to fourth embodiments, although the initial value of the other reading head that the measuring beam is separated from one scale and moved to the other scale is set, it is not limited to this, and it can also be obtained to use another The reading head controls the correction information of the movement of the substrate holder, such as the correction information of the measurement value of another reading head. Although the correction information used to control the movement of the substrate holder using another read head certainly includes an initial value, it is not limited to this, as long as it is information that can be used to make the other read head start measuring again, it may also be The offset value, etc. from the value that should be measured after the measurement is restarted.

In addition, in the second to fourth embodiments described above, instead of each X head 66x that measures the position information of the substrate holder 34, an encoder head (XZ Reading head), and instead of each Y reading head 66y, an encoder reading head (YZ reading head) with the Y-axis direction and the Z-axis direction as the measurement direction can be used. As these reading heads, a sensor reading head having the same configuration as the displacement measurement sensor reading head disclosed in the specification of US Patent No. 7,561,280 can be used, for example. In this case, the main control device 90 can also use the measured values of the three reading heads used for the position control of the substrate holder 34 to perform a predetermined calculation during the switching and connection processing of the aforementioned reading heads. In addition to the connection process used to ensure the continuity of the position measurement results of the substrate holder 34 in the 3 degrees of freedom direction (X, Y, θ z) in the XY plane, the same method as the above is also used to ensure the The continuity of the position measurement result of the substrate holder 34 in the direction of the remaining 3 degrees of freedom (Z, θ x, θ y) is connected. Representatively taking the second embodiment as an example, the main control device 90 only needs to use four reading heads 66a, 66b, 66c, and 66d to measure light beams from one two-dimensional grating RG (grid area). A read head moved to another two-dimensional grating RG (grid area) to control the movement of the substrate holder 34 in the remaining 3 degrees of freedom direction (Z, θ x, θ y) according to the correction information of the remaining three Measurement information in the Z-axis direction (3rd direction) of each read head, or use the remaining three read heads to measure The position information of the substrate holder 34 in the remaining 3 degrees of freedom direction (Z, θ x, θ y) can be obtained.

In addition, if the heights and inclinations of the plurality of scale plates 152 are offset from each other, an offset will occur between the aforementioned coordinate systems, and thus the measurement error of the encoder system will occur. Therefore, the measurement error of the encoder system caused by the deviation of the height and the inclination between the plurality of scale plates 152 can also be corrected. For example, as mentioned above, in the second embodiment, when the read head is switched, when the initial value of the read head after the switch is set, the four read heads 66a~66d will all face any scale 152 at the same time. The fifth state. Therefore, the main control device 90 can also correct the offset between the coordinate systems caused by the offset between the height and the inclination of the plurality of scale plates 152 by using the measurement value of the redundant read head in the fifth state.

For example, in the same manner as when the aforementioned offset (ΔX, ΔY, Δθ z) is obtained, in the fifth state, the position (Z, θ x, θ y) is measured, the difference between the measured values obtained by the measurement, that is, the offset ΔZ, Δθ X, Δθ y, is calculated, and the offset is used to determine the difference by a combination of at least two scales Correction of the offset between the coordinate systems in the Z-axis direction and the θ x, θ y directions. The at least two scales are used for the measurement of the position information of the substrate holder 34 before and after the reading head is switched and the three of the position control The reading head is opposite.

In addition, in the first to fourth embodiments described above, although the Z tilt position measurement system 98 and the substrate encoder system 50 constitute the substrate position measurement system, for example, XZ, YZ reading heads may be used instead of X, Y reading heads. Therefore, only the substrate encoder system 50 constitutes a substrate position measurement system.

In addition, in the first to fourth embodiments described above, at least one head that is separated from the head unit 60 in the X-axis direction may be provided separately from the head unit 60 of one of the substrate encoder systems 50. For example, it can also be arranged separately from the projection optical system 16 in the X-axis direction. For the mark detection system (alignment system) for detecting the alignment mark of the substrate P, the same movable head unit as the head unit 60 is installed on the ±Y side, and the ± placed in the mark detection system is used in the detection operation of the substrate mark. A pair of read head units on the Y side measures the position information of the substrate holder 34. In this case, even if all the measuring beams in the pair of head units 60 are separated from the scale 152 (or 52) during the mark detection operation, the substrate encoder system 50 (the other pair of head units) can continue to face the substrate The measurement of the position information of the holder 34 can improve the design freedom of the position of the mark detection system and the exposure device. In addition, by arranging the substrate position measurement system for measuring the position information of the substrate P in the Z-axis direction near the mark detection system, the substrate encoder system 50 can also perform the substrate holder 34 during the detection operation of the substrate Z position. The measurement of location information. Alternatively, the substrate position measurement system may also be arranged near the projection optical system 16, and a pair of read head units 60 may be used to measure the position information of the substrate holder 34 during the detection operation of the Z position of the substrate. Furthermore, in this embodiment, after the substrate holder 34 is arranged at the substrate exchange position set apart from the projection optical system 16, the measuring beams of all the heads of the pair of head units 60 are separated from the scale 152 (or 52). Therefore, it is also possible to provide at least one read head (either a movable read head or a fixed read head) opposed to at least one of the plurality of scales 152 (or 52) of the substrate holder 34 arranged at the substrate exchange position. , And the measurement of the position information of the substrate holder 34 by the substrate encoder system 50 can also be performed during the substrate exchange operation. Here, before the substrate holder 34 reaches the substrate exchange position, in other words, before at least one read head arranged at the substrate exchange position faces the scale 152 (or 52), the measurement of all the read heads of the pair of read head units 60 When the light beam is separated from the scale 152 (or 52), at least one read head can be additionally arranged in the moving path of the substrate holder 34, and the position information of the substrate holder 34 by the substrate encoder system 50 is continuously measured. In addition, in the case of using at least one read head that is provided separately from a pair of read head units 60, the measurement information of a pair of read head units 60 can also be used for the aforementioned connection. Continue processing.

In addition, in the first to fourth embodiments described above, the aforementioned XZ head may be used instead of each X head of the mask encoder system 48, and the aforementioned YZ head may be used instead of each Y head. Alternatively, in the first to fourth embodiments described above, the reticle encoder system can be used in the same way as the encoder for position measurement of the substrate holder 34 of the substrate encoder system 50, and a plurality of reading heads can be made on the Y axis. The structure moves in the direction relative to the scale 46. In addition, instead of the scale 46, a scale formed with the same two-dimensional grating RG as the aforementioned scale 152 may be used.

Similarly, in the first to fourth embodiments described above, the aforementioned XZ head may be used instead of each X head 64x, and the aforementioned YZ head may be used instead of each Y head 64y. In this case, it is also possible to replace the scale 56 and use a scale formed with the same two-dimensional grating RG as the aforementioned scale 152. In this case, a pair of XZ reading heads and a pair of YZ reading heads, as well as the encoder system where these reading heads can be opposed, can also measure the rotation (θ z) and tilt (θ x) of a plurality of reading heads 66x and 66y. And at least one of θ y).

In addition, although the scales 46, 52, 56, 152, etc. are formed on the surface with a grid (the surface is a grid surface), for example, a cover member (glass or film, etc.) covering the grid can also be provided, and the grid surface can be set as Inside the ruler.

In addition, in the above-mentioned first to fourth embodiments, it is described that each pair of X head 64x and Y head 64y is provided on the head for measuring the position of the substrate holder 34 and is provided on the Y sliding platform 62, but Each pair of X read head 64x and Y read head 64y can also be installed on the read head for measuring the position of the substrate holder 34 without going through the Y sliding platform.

In addition, in the description so far, it has been described that the measurement direction of each read head in the XY plane of the reticle encoder system and the substrate encoder system is the X axis direction or Y The direction of the axis is not limited to this. For example, in the case of the above-mentioned second to fourth embodiments, instead of the two-dimensional grating RG, it may be used to cross the X-axis direction and the Y-axis direction in the XY plane. The alternate two directions (referred to as the α direction and β direction for the convenience of explanation) are used as a two-dimensional grid in the periodic direction. Correspondingly, the α direction (and the Z axis direction) or the β direction (and the Z axis) Direction) as the reading heads of the respective measuring directions as the aforementioned reading heads. In addition, in the first embodiment described above, instead of each of the X scale and Y scale, for example, a one-dimensional grid with the α direction and the β direction as the periodic direction may be used, and the α direction (and the Z axis direction) may be used correspondingly. ) Or β-direction (and Z-axis direction) as the respective measuring direction of the reading heads as the aforementioned reading heads.

In addition, in the above-mentioned second to fourth embodiments, the rows of the aforementioned X scales may constitute the first grid group, and the rows of the aforementioned Y scales may constitute the second grid group. Correspondingly, the rows of the aforementioned X scales can be combined with the X scale. Aligning the rows with multiple X read heads (or XZ read heads) arranged at a predetermined interval (the interval larger than the interval between adjacent X scales), and will be arranged in a manner that can be opposite to the Y scale column. A plurality of Y reading heads (or YZ reading heads) are arranged in the interval (the interval larger than the interval between adjacent Y scales).

In addition, in the first to fourth embodiments described above, as the scales arranged in the X-axis direction or the Y-axis direction, it is of course also possible to use a plurality of scales with different lengths. In this case, when two or more rows of scales with the same or orthogonal periodic direction are arranged, a scale that can be set to a length that the space between the scales does not overlap each other can also be selected. That is, the arrangement interval of the space between the scales constituting a row of scales may not be equal intervals. Also, for example, the length in the X-axis direction of the scales (the scales arranged at each end of the scale row) arranged in the scale row on the substrate holder 34 may be compared to the two ends in the X-axis direction, so that The physical length of the ruler arranged in the central part is longer.

In addition, in the first to fourth embodiments described above, the encoder for the movable read head only needs to measure at least the position information of the movable read head in the moving direction (the Y-axis direction in the above embodiment), but it can also measure and Position information in at least one direction (at least one of X, Z, θ x, θ y, θ z) with different moving directions. For example, the position information in the X-axis direction of the reading head (X reading head) whose measurement direction is the X-axis direction is also measured, and the position information in the X-axis direction is obtained from the X information and the measurement information of the X reading head. However, the reading head whose measurement direction is the Y-axis direction (Y reading head) may not use the position information in the X-axis direction orthogonal to the measurement direction. Similarly, the X-read head may not use the position information in the Y-axis direction orthogonal to the measurement direction. In short, the position information of at least one direction different from the measurement direction of the reading head can be measured, and the position information of the substrate holder 34 in the measurement direction can be obtained from the measurement information and the measurement information of the reading head. In addition, for example, two measuring beams with different positions in the X-axis direction can be used to measure the position information (rotation information) of the movable read head in the θ z direction, and use this rotation information to obtain X from the measurement information of the X and Y read heads. Position information of axis and Y axis. In this case, place two of the X and Y read heads, and one of the other, so that the two read heads with the same measurement direction are not at the same position in the direction orthogonal to the measurement direction. , Which can measure the position information in X, Y, θ z directions. The other reading head can irradiate the measuring beam to a position different from the two reading heads. Furthermore, as long as the read head of the encoder for the movable read head is an XZ or YZ read head, for example, two of the XZ read head and YZ read head, and one of the other are arranged so that they are not on the same straight line. This is not only Z information, but also position information (tilt information) in the θ x and θ y directions. At least one of the position information in the θ x and θ y directions and the measurement information of the X and Y reading heads can also be used to obtain the position information in the X-axis and Y-axis directions. Similarly, even if it is an XZ or YZ reading head, it can also measure the position information of the movable reading head in a direction different from the Z-axis direction, and use the measurement information and the reading head measurement information to obtain the position information in the Z-axis direction. In addition, As long as the encoder scale for measuring the position information of the movable reading head is a single scale (grid area), both XY θ z and Z θ x θ y can be measured with three reading heads, but the multiple scales (grid area) are separated For the configuration, you only need to configure two X and Y read heads, or two XZ and YZ read heads, and set the interval in the X-axis direction so that the non-measurement periods of the four read heads do not overlap. This description is based on the premise that the grid area is parallel to the XY plane, but the grid area is parallel to the YZ plane. The same applies to the scale.

In addition, in the first to fourth embodiments described above, although an encoder is used as a measuring device for measuring the position information of the movable head, in addition to the encoder, for example, an interference device may be used. In this case, for example, a reflective surface may be provided on the movable head (or its holding portion), and the measurement beam may be irradiated on the reflective surface in parallel to the Y-axis direction. Especially when the movable reading head only moves in the Y-axis direction, there is no need to enlarge the reflecting surface, and it is also easy to perform local air conditioning of the beam path of the interference instrument to reduce air fluctuations.

In addition, in the first to fourth embodiments described above, although the movable head that irradiates the measuring beam on the scale of the substrate holder is provided on each side of the projection system in the Y-axis direction, a plurality of movable heads may be provided on each side. Reading head. For example, as long as the adjacent movable reading heads (measurement beams) are arranged in such a way that the measurement period of a plurality of movable reading heads partially overlaps in the Y-axis direction, even if the substrate holder moves in the Y-axis direction, a plurality of movable reading heads can be moved in the Y-axis direction. Continuous position measurement of the reading head. In this case, it is necessary to perform connection processing between a plurality of movable reading heads. Therefore, it is also possible to use the measurement information of a plurality of reading heads arranged only on one of the ±Y sides of the projection system and irradiating the measurement beam to at least one scale to obtain correction information related to the other reading head irradiating the measurement beam to the scale , It is also possible to use the measurement information of at least one read head not only on the ±Y side but also on the other side. In short, as long as the measuring beams of the multiple reading heads arranged on the ±Y side are used to irradiate at least the scale The measurement information of three reading heads is enough.

In addition, in the substrate encoder system 50 of the first to fourth embodiments described above, a plurality of scales (grid areas) can be arranged separately from each other in the scanning direction (X-axis direction) in which the substrate P moves during scanning exposure, and A plurality of reading heads are moved in the stepping direction (Y-axis direction) of the substrate P, but on the contrary, a plurality of scales may be separated from each other in the stepping direction (Y-axis direction), and the plurality of reading heads may be moved In the scanning direction (X-axis direction).

In addition, in the first to fourth embodiments described above, the read heads of the mask encoder system 48 and the substrate encoder system 50 do not need to have the entire part of the optical system that irradiates the light beam from the light source on the scale, and may only have A part of the optical system, such as the emission part.

In addition, in the second to fourth embodiments described above, the heads of the pair of head units 60 are not limited to the arrangement shown in FIG. 17 (the X head and the Y head are respectively arranged on the ±Y side and on one side of the ±Y side and the other The arrangement of the X and Y read heads in the X axis direction on one side is opposite), for example, the X read head and Y read head can be respectively arranged on the ±Y side, and one side of the ±Y side and the other on the X axis direction X , The configuration of Y read head is the same. However, if the X positions of the two Y read heads are the same, the θ z information cannot be measured when the measurement of one of the two X read heads is interrupted. Therefore, it is better to make the X positions of the two Y read heads different .

In addition, in the first to fourth embodiments described above, when the scale (scale member, grid portion) that irradiates the measurement beam from the reading head of the encoder system is provided on the side of the projection optical system 16, it is not limited to supporting the projection optical system 16. A part of the device body 18 (frame member) can also be provided in the lens barrel portion of the projection optical system 16.

In addition, in the first to fourth embodiments described above, the case where the movement direction (scanning direction) of the mask M and the substrate P during scanning exposure is the X-axis direction has been described, but the scanning The direction is set to the Y-axis direction. In this case, the long stroke direction of the mask stage is set to the direction after rotating 90 degrees around the Z axis, and the direction of the projection optical system 16 also needs to be rotated 90 degrees around the Z axis.

In addition, in the first to fourth embodiments described above, on the substrate holder 34, a group of scales (scale rows) in which a plurality of scales are connected with a gap at a predetermined interval in the X-axis direction are arranged to each other in the Y-axis direction. When a plurality of rows are arranged in different positions of separation (for example, the position on one side (+Y side) and the position on the other side (-Y side) relative to the projection optical system 16), multiple scale groups (plural The scale column) is configured to be able to be distinguished and used according to the irradiation arrangement (irradiation map) on the substrate. For example, as long as the lengths of the multiple scale rows as a whole are different from each other among the scale rows, it can correspond to different illumination patterns. It can also be formed on the substrate corresponding to the case of capturing 4 sides and the case of capturing 6 sides. The number of irradiated areas on the top changes. And as long as it is arranged in this way, and the positions of the gaps of the scale rows are set at different positions in the X-axis direction, since the reading heads corresponding to the plurality of scale rows are not located outside the measurement range at the same time, the number of connections can be reduced. The number of sensors that become an indeterminate value during processing can be connected with high precision.

Also, on the substrate holder 34, a plurality of scales in the X-axis direction are separated by a predetermined interval and arranged in a scale group (scale row) in the X-axis direction of one scale (the pattern for X-axis measurement) The length is set to a length that can continuously measure the length of an irradiation area (the length of the device pattern formed on the substrate while being irradiated while scanning the exposure while moving the substrate on the substrate holder in the X-axis direction). In this way, since the scanning exposure of a shot area does not require the read head to control the connection of multiple scales, the position measurement (position control) of the substrate P (substrate holder) in the scanning exposure can be facilitated.

In addition, in the first to fourth embodiments described above, the substrate encoder system is used to obtain position data during the period when the substrate stage device 20 moves to the substrate exchange position with the substrate loader. It is also possible to set a scale for substrate exchange on the substrate stage device 20 or another stage device, and use a downward reading head (X-read head 66x, etc.) to obtain position information of the substrate stage device 20. Alternatively, the substrate stage device 20 or another stage device may be provided with a reading head for substrate exchange and measure the scale 56 or the scale for substrate exchange to obtain the position information of the substrate stage device 20.

In addition, in the mask encoder system of each embodiment, in order to obtain the position information during the period when the mask stage device 14 moves to the mask exchange position of the mask loader, the mask stage device 14 or another The stage device is provided with a scale for mask exchange, and the reading head unit 44 is used to obtain the position information of the mask stage device 14.

In addition, another position measurement system (such as a mark on the carrier and an observation system for observing it) can also be set separately from the encoder system to perform the exchange position control (management) of the carrier.

In addition, in each of the above-mentioned embodiments, although the scale is provided on the substrate holder 34, the scale may be directly formed on the substrate P by exposure processing. For example, it can also be formed on a strip line between the illuminated areas. In this way, the scale formed on the substrate can be measured, and the non-linear component error of each irradiated area on the substrate can be obtained according to the position measurement result, and the overlap accuracy during exposure can be improved according to the error.

In addition, the substrate stage device 20 only needs to be able to drive the substrate P along a horizontal plane with a long stroke at least, and may not be able to perform fine positioning in the 6-degree-of-freedom direction depending on the situation. For such a two-dimensional stage device, the substrate encoder system of the above-mentioned first to fourth embodiments can also be very suitably applied.

In addition, the illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193nm), KrF excimer laser light (wavelength 248nm), and vacuum ultraviolet light such as F2 laser light (wavelength 157nm). In addition, as the illuminating light, for example, DFB semiconductor laser or fiber laser can also be used The emitted infrared band The infrared band or the single-wavelength laser light of the visible light band is amplified by, for example, a fiber amplifier doped with erbium (or both erbium and ytterbium), and a nonlinear optical crystal is used to convert the wavelength into ultraviolet light.之Harmonics. In addition, a solid laser (wavelength: 355nm, 266nm) or the like can also be used.

In addition, although the case where the projection optical system 16 is a multi-lens projection optical system provided with a plurality of optical systems is described, the number of projection optical systems is not limited to this, as long as it is one or more. In addition, it is not limited to a projection optical system of a multi-lens method, and a projection optical system using Offner mirrors, etc. may also be used. In addition, the projection optical system 16 may be a magnification system or a reduction system.

In addition, the use of the exposure device is not limited to the exposure device for liquid crystal that transfers the pattern of the liquid crystal display element to the square glass plate, but can also be widely applied to, for example, exposure devices for the manufacture of organic EL (Electro-Luminescence) panels and semiconductor manufacturing. Exposure equipment used, exposure equipment used to manufacture thin-film magnetic heads, micromachines and DNA chips. In addition, not only micro-components such as semiconductor components, but also for the manufacture of photomasks or reticles used in photoexposure devices, EUV exposure devices, X-ray exposure devices, and electron beam exposure devices, and transfer circuit patterns to glass Exposure devices such as substrates or silicon wafers can also be applied.

In addition, the object to be exposed is not limited to a glass plate, and may be other objects such as a wafer, a ceramic substrate, a thin film member, or a mask master (blank mask). In addition, when the exposure target is a substrate for a flat-panel display, the thickness of the substrate is not particularly limited, and includes, for example, a film-like (flexible sheet-like member). Moreover, the exposure apparatus of this embodiment is especially effective when a board|substrate with a side length or a diagonal length of 500 mm or more is an exposure object.

Electronic components such as liquid crystal display components (or semiconductor components) are through the steps of designing the functional performance of the components, and the steps of making a mask (or reticle) according to this design step. Step, the step of making a glass substrate (or wafer), the photolithography step of transferring the pattern of the photomask (reticle) to the glass substrate using the exposure device and the exposure method of the above-mentioned embodiments, and the photolithography step of the exposed glass The development step of developing the substrate, the etching step of removing the exposed members except the remaining resist portion by etching, the resist removal step of removing the unnecessary resist after etching, the component assembly step, and the inspection step And so on. In this case, since the exposure device of the above-mentioned embodiment is used in the lithography step to implement the aforementioned exposure method to form a device pattern on the glass substrate, a high-integrity device can be manufactured with good productivity.

In addition, the disclosures of all U.S. patent application publications and U.S. patent specifications related to the exposure apparatus cited in the above-mentioned embodiments are cited as part of the description of this specification.

Industrial availability

As explained above, the exposure device and the exposure method of the present invention are suitable for irradiating an object with illumination light in the lithography process to expose it. In addition, the method for manufacturing a flat panel display of the present invention is suitable for the production of flat panel displays.

16‧‧‧Projection Optics

20‧‧‧Substrate stage device

34‧‧‧Substrate holder

50‧‧‧Substrate encoder system

60‧‧‧Encoder reading head unit

62‧‧‧Y sliding platform

66a,66b,66c,66d‧‧‧reading head

66x‧‧‧X reading head

66y‧‧‧Y reading head

152‧‧‧Ruler

P‧‧‧Substrate

RG‧‧‧Two-dimensional grating

Claims (96)

An exposure device that exposes a substrate with illumination light through a projection optical system, and includes: a movable body arranged under the projection optical system to hold the substrate; and a driving system that can be positioned perpendicular to the optical axis of the projection optical system The moving body is moved in the first and second directions orthogonal to each other in a predetermined plane; the measurement system is provided with a grid member in which a plurality of grid regions are separated from each other in the first direction, and the grid member is irradiated with a measuring beam and One of the plurality of first reading heads that can move in the second direction is provided on the moving body, and the lattice member and the other of the plurality of first reading heads are opposed to the moving body, and the measurement system has The measuring device for measuring the position information of the plurality of first reading heads in the second direction is based on at least three of the plurality of first reading heads irradiated with the measuring beam on at least one of the plurality of grid areas The measurement information of the first reading head and the measurement information of the measurement device measure the position information of the moving body at least in the direction of 3 degrees of freedom in the predetermined plane; and the control system is used to compensate for the grid member and the complex number. The correction information of the measurement error of the measurement system generated by the movement of at least one of the first reading head and the moving body, and the position information measured by the measurement system, control the drive system; the plurality of first reading heads, During the movement of the moving body in the first direction, the measuring beam separates from one of the plurality of grid areas and moves to another grid area adjacent to the one grid area. The correction information is Compensation for the measurement error of the measurement system caused by at least one of the optical characteristics of at least one of the plurality of first reading heads and the displacement in a direction different from the second direction. Such as the exposure device of the first item in the scope of the patent application, wherein the aforementioned correction information compensates for the aforementioned measurement caused by at least one of the deformation, displacement, flatness, and formation error of at least one of the aforementioned plurality of grid regions The measurement error of the system. For example, the exposure device of item 1 or 2 of the scope of patent application, in which the plurality of first reading heads respectively use one of the two directions intersecting each other in the predetermined plane as the measurement direction; the aforementioned correction information is based on the compensation factor and The measurement error of the measurement system in the measurement direction caused by the relative movement of the first read head and the lattice member in the direction different from the measurement direction. For example, the exposure device in the scope of patent application 3, wherein the aforementioned different directions include the third direction orthogonal to the predetermined plane, the rotation direction around the axis orthogonal to the predetermined plane, and the direction parallel to the predetermined plane. At least one of the rotation directions of the axis. For example, the exposure device of item 3 of the scope of patent application, wherein the measurement directions of the plurality of first reading heads are different from the first and second directions; the different directions include at least one of the first and second directions. One side. Such as the exposure device of the first or second patent application, wherein the aforementioned correction information is compensated for the reference plane used for the position control of the aforementioned moving body, or the reference plane of the aforementioned substrate coincides with the aforementioned reference plane during the exposure operation of the aforementioned substrate The measurement error of the measurement system caused by the difference in the position of the lattice surface of the lattice member in the third direction orthogonal to the predetermined plane. Such as the exposure device of the 6th patent application, wherein the reference plane includes the image plane of the projection optical system. For example, the exposure device of item 1 or 2 of the scope of patent application, which is further provided with a frame member supporting the aforementioned projection optical system; The measuring device has a scale member provided in one of the plurality of first heads and the projection optical system or the frame member, and is provided in the plurality of first heads and the projection optical system or the frame member The second head on the other side irradiates the scale member with a measuring beam through the second head to measure the position information of the plurality of first heads in the second direction. For example, the exposure device of claim 8, wherein the correction information includes correction information for compensating for the measurement error of the measurement device caused by at least one of the scale member and the second reading head. An exposure device that exposes a substrate with illumination light through a projection optical system, and includes: a movable body arranged under the projection optical system to hold the substrate; and a driving system that can be positioned perpendicular to the optical axis of the projection optical system The moving body is moved in the first and second directions orthogonal to each other in a predetermined plane; the measurement system is provided with a grid member in which a plurality of grid regions are separated from each other in the first direction, and the grid member is irradiated with a measuring beam and One of the plurality of first reading heads that can move in the second direction is provided on the moving body, and the lattice member and the other of the plurality of first reading heads are opposed to the moving body, and the measurement system has The measuring device is arranged such that one of the scale member and the second reading head is provided on the plurality of first reading heads, and the other of the scale member and the second reading head is opposed to the plurality of first reading heads. The reading head irradiates the measuring beam to the scale member through the second reading head to measure the position information of the plurality of first reading heads in the second direction, and irradiating the measuring beam on the measuring beam according to the plurality of first reading heads The measurement information of at least three first reading heads in at least one of the plurality of grid areas and the measurement information of the aforementioned measuring device, measuring at least 3 points in the aforementioned predetermined plane The position information of the moving body in the degree direction; and the control system, based on the correction information used to compensate for the measurement error of the measuring device caused by at least one of the scale member and the second reading head, and the measurement It is the position information of the measurement to control the drive system; the plurality of first reading heads, respectively, in the movement of the moving body in the first direction, the measurement beam departs from one of the plurality of grid areas and moves to Another grid area adjacent to the aforementioned one grid area. For example, the exposure device of item 10 of the scope of patent application further includes a frame member supporting the projection optical system; in the measuring device, one of the scale member and the second head is provided in the plurality of first heads, The other of the scale member and the second head is provided in the projection optical system or the frame member. For example, the exposure device of claim 10 or 11, wherein the scale member has a plurality of grid portions arranged separately from each other in the second direction; the measuring device has a measuring beam included in the second direction A plurality of the second reading heads of the at least two second reading heads with different positions; the at least two second reading heads, in the second direction, are in a pair relative to the adjacent one of the plurality of grid portions The grids are arranged at wide intervals. For example, the exposure device of item 12 of the scope of patent application, wherein the plurality of second reading heads are included in one of the first direction and the third direction orthogonal to the predetermined plane, and the position of the measuring beam is at least At least one of the two second reading heads is different from at least one second reading head. For example, the exposure device of item 10 or 11 in the scope of the patent application, wherein the measuring device irradiates a plurality of the measuring beams to the positions of the scale members that are different from each other to measure the plurality of measuring beams in directions different from the second direction. 1 The position information of the reading head. For example, the exposure device of item 10 or 11 of the scope of patent application, wherein the measuring device measures the position information related to at least one of the rotation and tilt of the plurality of first reading heads. For example, the exposure device of the 10th or 11th patent application, wherein the scale member has at least one of a reflective two-dimensional grid or two one-dimensional grids that are arranged in different directions from each other. For example, the exposure device of item 10 or 11 in the scope of the patent application, wherein the correction information compensates for the measurement error of the measurement device caused by at least one of the deformation, displacement, flatness, and formation error of the scale member. For example, the exposure device of item 10 or 11 of the scope of patent application, wherein the aforementioned correction information compensates for the measurement error of the aforementioned measuring device caused by at least one of the displacement and optical characteristics of the aforementioned second reading head. For example, the exposure device of item 10 or 11 of the scope of patent application, wherein the second read head uses the second direction as the measurement direction; the correction information is compensated for the second direction that is different from the second direction. 2 The measurement error of the measuring device in the second direction caused by the relative movement of the reading head and the scale member. For example, the exposure device of any one of items 1, 2, 10, and 11 in the scope of patent application, wherein the plurality of first reading heads respectively use one of the two directions intersecting each other in the predetermined plane as the measurement direction; The aforementioned at least three first reading heads used for measurement in the aforementioned measurement system, including the aforementioned two directions At least one first reading head with one of the two directions as the measurement direction, and at least two first reading heads with the other of the aforementioned two directions as the measurement direction. For example, the exposure device of any one of items 1, 2, 10, and 11 in the scope of the patent application, wherein the plurality of first reading heads include a direction that is different from the first direction in the predetermined plane as the measurement direction The first reading head; the measurement system uses the measurement information of the measurement device in order to measure the position information of the moving body using the first reading head whose measurement direction is different from the first direction. For example, the exposure device of item 20 of the scope of patent application, wherein the plurality of first read heads include at least two first read heads with the first direction as the measurement direction, and at least the second direction as the measurement direction. Two first reading heads. For example, the exposure device of any one of items 1, 2, 10, and 11 in the scope of patent application, wherein the plurality of first reading heads can move relative to the movable body in the second direction. For example, the exposure device of any one of items 1, 2, 10, and 11 in the scope of patent application, wherein the plurality of first reading heads are included in the first direction so as to be adjacent to those in the plurality of grid regions. A pair of grid areas are widely spaced apart to irradiate the two first heads of the measuring beam, and at least one first head whose position in the second direction of the measuring beam is different from at least one of the two first heads Reading head. For example, the exposure device according to any one of items 1, 2, 10, and 11 in the scope of patent application, wherein the plurality of grid regions respectively have a reflective two-dimensional grid or two one-dimensional grids with different arrangement directions from each other. Such as the exposure device of any one of items 1, 2, 10, and 11 in the scope of patent application, wherein the grid member has a plurality of scales respectively forming the plurality of grid regions. For example, the exposure device of any one of items 1, 2, 10, and 11 in the scope of patent application, wherein the aforementioned measuring system has a driving part capable of moving the aforementioned plural first reading heads in the aforementioned second direction; and the aforementioned control system , Is controlled in such a way that the at least three first reading heads used for measurement in the measurement system are not separated from the plurality of grid areas in the second direction during the movement of the moving body The aforementioned drive unit. For example, the exposure device of any one of items 1, 2, 10, and 11 in the scope of patent application, wherein the aforementioned measurement system has the ability to hold and move one of the aforementioned plural first read heads or plural first read heads, respectively For the plurality of movable parts, the position information of the first reading head is respectively measured on the plurality of movable parts by the measuring device. For example, the exposure device of any one of items 1, 2, 10, and 11 in the scope of the patent application, wherein the plurality of first reading heads are respectively arranged in one of the two directions that cross each other in the predetermined plane, and the predetermined The two directions of the third direction perpendicular to the plane are used as the measurement directions; the aforementioned measurement system can use the aforementioned at least three first reading heads to measure the aforementioned moving body including the aforementioned third direction, which is different from the aforementioned three-degree-of-freedom direction. Position information in the degree direction. Such as the exposure device of any one of items 1, 2, 10, and 11 in the scope of patent application, wherein the plurality of first reading heads have at least four first reading heads; among the aforementioned at least four first reading heads During the period when the measuring beam of a first reading head is separated from the plurality of grid areas, the measuring beams of the remaining at least three first reading heads irradiate at least one of the plurality of grid areas and travel by the moving body The movement in the first direction switches the one of the at least four first heads from which the measuring beam is separated from the plurality of grid areas. Such as the exposure device of item 30 of the scope of patent application, in which at least four first reading heads mentioned above, Including two first heads in which the positions of the measurement beams in the first direction are different from each other, and the positions of the measurement beams in the second direction are different from at least one of the two first heads and are in the first direction. Two first reading heads with different positions of the measuring beams in the 1 direction; the two first reading heads, in the first direction, are spaced apart from one pair of adjacent grid areas in the plurality of grid areas The aforementioned measuring beam is irradiated at a wide interval. For example, the exposure device of the 30th patent application, wherein the lattice member has at least two of the plural lattice regions arranged separately from each other in the second direction; the at least four first reading heads correspond to the at least two The plurality of grid regions respectively irradiate the measuring beam through at least two first reading heads whose positions of the measuring beam are different from each other in the first direction; the at least two first reading heads are in the first direction, The measuring beam is irradiated with a wider interval than the interval between the adjacent pair of lattice areas among the plurality of lattice areas. For example, the exposure device of the 32nd patent application, wherein the lattice member is provided on the movable body, and the plurality of first reading heads are provided above the movable body; the at least two of the plurality of lattice areas are included in the foregoing The second direction is arranged on one pair of the plurality of grid areas on both sides of the substrate placement area of the movable body. For example, the exposure device of item 30 of the scope of patent application, wherein during the movement of the movable body in the first direction, the non-measurement interval in which the measuring beam departs from the plurality of grid areas in the at least four first reading heads is not overlapping. For example, the exposure device of item 34 of the scope of patent application, wherein the plurality of first reading heads include at least one first reading head in which the non-measurement interval overlaps with at least one of the at least four first reading heads; In the measurement of the position information of the moving body, among the at least five first reading heads including the at least four first reading heads and the at least one first reading head, the measurement beam irradiates one of the plurality of grid areas. At least one of at least three first reading heads. For example, the exposure device of item 30 of the scope of patent application, wherein the aforementioned control system uses the aforementioned at least four first reading heads to separate the measuring beam from the aforementioned one grid area and move to one of the aforementioned other grid areas. The reading head controls the correction information of the movement of the moving body, which is obtained based on the measurement information of the remaining at least three first reading heads or the position information of the moving body measured by the remaining at least three first reading heads. For example, the exposure device of the 36th patent application, wherein the correction information is obtained during the period during which the measurement beam is irradiated on at least one of the plurality of grid areas by the at least four first reading heads. For example, the exposure device of item 36 of the scope of patent application, in which the remaining at least three first reading heads before the measuring light beam of the first reading head is separated from one of the plurality of grid areas is used to replace the remaining One of the at least three first reading heads and at least three first reading heads including the one first reading head for which the correction information has been obtained are used to measure the position information of the moving body. For example, the exposure device of item 36 of the scope of patent application, wherein the plurality of first reading heads are respectively arranged in one of the two directions intersecting each other in the predetermined plane and the third direction orthogonal to the predetermined plane As the measurement direction; the aforementioned measurement system can use the aforementioned at least three first read heads to measure the position information of the aforementioned moving body in a 3-degree-of-freedom direction that includes the aforementioned third direction, which is different from the aforementioned 3-degree-of-freedom direction; the aforementioned control system, The system will use the aforementioned measuring beams from the aforementioned at least four first reading heads from the aforementioned One grid area is separated and transferred to a first head in the other grid area to control the correction information of the movement of the moving body in the aforementioned different three-degree-of-freedom directions, based on the aforementioned of the remaining at least three first heads The measurement information in the third direction or the position information of the moving body in the third direction measured using the remaining at least three first reading heads. For example, the exposure apparatus of any one of items 1, 2, and 10 in the scope of the patent application further includes a frame member supporting the projection optical system; the other of the lattice member and the plurality of first reading heads is provided on the frame member . For example, the exposure device of the 40th patent application, wherein, in the measurement system, the lattice member is provided on the moving body, and the plurality of first reading heads are provided on the frame member; in the measurement device, the second reading The head is provided on the plurality of first reading heads, and the scale member is provided on the frame member. For example, the exposure device of the 40th patent application, in which the substrate is held in the opening of the moving body; and a stage system is further provided, and the stage system has a supporting part that supports the moving body and the substrate in suspension, With the drive system, the floating-supported substrate is moved at least in the three-degree-of-freedom direction. For example, the exposure device of any one of items 1, 2, and 10 in the scope of the patent application, further comprising: a frame member supporting the projection optical system; a holding member arranged above the projection optical system and capable of holding the illuminating light The light shield of the illumination is moved; and the encoder system is provided with one of the scale member and the reading head on the holding member, and the other of the scale member and the reading head is set in the projection optical system or the frame member, and With Measure the position information of the aforementioned holding member. For example, the exposure device of item 1 or 2 of the scope of patent application further includes: an illumination optical system for illuminating the mask with the illumination light; and the projection optical system having a plurality of optical systems for respectively projecting partial images of the pattern of the mask. For example, the exposure device of item 44 of the scope of patent application, wherein the substrate is scanned and exposed with the illumination light through the projection optical system; the plurality of optical systems are scanned while moving with the substrate during the scanning exposure A plurality of projection regions whose positions are different from each other in the direction orthogonal to the direction respectively project the aforementioned partial images. For example, the exposure device of any one of items 1, 2, 10, and 11 in the scope of patent application, wherein the substrate is scanned and exposed with the illumination light through the projection optical system, and moves to the first in the scanning exposure. direction. For example, the exposure device of any one of items 1, 2, 10, and 11 in the scope of patent application, wherein the substrate is scanned and exposed with the illumination light through the projection optical system, and moves to the second during the scanning exposure. direction. For example, the exposure device of any one of items 1, 2, 10, and 11 in the scope of patent application, wherein the aforementioned substrate is a substrate for flat-panel displays with at least one side or a diagonal length of 500 mm or more. A method for manufacturing a flat-panel display includes: using the exposure device of any one of items 1, 2, 10, and 11 in the scope of patent application to expose a substrate; and developing the aforementioned substrate after exposure. An exposure method is to expose a substrate with illumination light through a projection optical system, which includes: A plurality of grid areas are arranged to be separated from each other in a first direction in a predetermined plane orthogonal to the optical axis of the projection optical system, and the grid members are respectively irradiated with a measuring beam and can be in the predetermined plane One of the plurality of first heads that move in the second direction orthogonal to the first direction is provided on the movable body holding the substrate, and the other of the lattice member and the plurality of first heads moves with the movement A measuring system with a measuring device that measures the position information of the plurality of first read heads in the second direction and is oriented toward the body, according to the plurality of first read heads, the measuring beam is irradiated in the plurality of grid areas The measurement information of at least three first reading heads in at least one grid area and the measurement information of the aforementioned measuring device to measure the position information of the moving body at least in the direction of 3 degrees of freedom in the predetermined plane; and according to Correction information for compensating for the measurement error of the measurement system generated by at least one of the movement of the grid member, the plurality of first read heads, and the movement of the moving body, and the position information measured by the measurement system, make the moving body Movement of movement; the plurality of first reading heads, respectively, in the movement of the moving body in the first direction, the measurement beam is separated from one of the plurality of grid areas and moved to the same grid area Another adjacent grid area; the aforementioned correction information compensates for at least one of the optical characteristics of at least one of the plurality of first heads and the displacement in a direction different from the aforementioned second direction The aforementioned measurement is the measurement error. For example, the exposure method of item 50 of the scope of patent application, wherein the aforementioned correction information compensates for the aforementioned measurement caused by at least one of the deformation, displacement, flatness, and formation error of at least one of the plurality of grid regions. The measurement error of the system. For example, the exposure method of item 50 or 51 in the scope of the patent application, wherein the plurality of first reading heads respectively use one of the two directions intersecting each other in the predetermined plane as the measurement direction; the aforementioned correction information is based on the compensation factor and The measurement error of the measurement system in the measurement direction caused by the relative movement of the first read head and the lattice member in the direction different from the measurement direction. Such as the exposure method of item 52 in the scope of the patent application, wherein the aforementioned different directions include a third direction orthogonal to the aforementioned predetermined plane, a rotation direction around an axis perpendicular to the aforementioned predetermined plane, and a rotation parallel to the aforementioned predetermined plane At least one of the rotation directions of the axis. For example, the exposure method of item 52 of the scope of patent application, wherein the measurement directions of the plurality of first reading heads are different from the first and second directions; the different directions include at least one of the first and second directions. One side. Such as the exposure method of item 50 or 51 in the scope of the patent application, wherein the aforementioned correction information is compensated for the reference plane used for the position control of the aforementioned moving body, or the reference plane of the aforementioned substrate coincides with the aforementioned reference plane during the exposure operation of the aforementioned substrate The measurement error of the measurement system caused by the difference in the position of the lattice surface of the lattice member in the third direction orthogonal to the predetermined plane. Such as the exposure method of item 55 in the scope of patent application, wherein the reference plane includes the image plane of the projection optical system. For example, the exposure method of item 50 or 51 of the scope of patent application, wherein the position information of the plurality of first reading heads is measured by the aforementioned measuring device, and the measuring device is provided with the plurality of first reading heads and the aforementioned projection An optical system or a scale member supporting one of the frame members of the projection optical system, and a scale member arranged in the plurality of first reading heads and the projection optical system or front The second head on the other of the frame members irradiates the scale member with a measuring beam through the second head. Such as the exposure method of the 57th patent application, wherein the correction information includes correction information for compensating the measurement error of the measurement device caused by at least one of the scale member and the second reading head. An exposure method that exposes a substrate with illumination light through a projection optical system, which includes: arranging a plurality of grid regions separated from each other in a first direction in a predetermined plane orthogonal to the optical axis of the projection optical system The lattice member and one of a plurality of first heads that respectively irradiate a measuring beam to the lattice member and can move in a second direction orthogonal to the first direction in the predetermined plane is provided on the movable body holding the substrate In addition, the lattice member and the other of the plurality of first heads are opposed to the moving body and are further arranged so that one of the scale member and the second head is provided on the plurality of first heads, and the scale member and the second head are provided with one of the scale member and the second head. 2 The other side of the read head is opposed to the plurality of first read heads, and has a measuring beam that irradiates the scale member through the second read head to measure the position information of the plurality of first read heads in the second direction The measurement of the measuring device is based on the measurement information of at least three first reading heads of the plurality of first reading heads irradiated by the measurement beam on at least one of the plurality of grid areas and the measurement information of the measuring device, The action of measuring the position information of the moving body at least in the direction of 3 degrees of freedom in the predetermined plane; and according to the action for compensating for the measurement error of the measuring device caused by at least one of the lattice member and the second read head Correction information, and the motion of moving the moving body based on the position information measured by the measurement system; the plural first reading heads, respectively, in the movement of the moving body in the first direction, The measuring beam is separated from one of the plurality of grid areas and moved to another grid area adjacent to the one grid area. Such as the exposure method of item 59 in the scope of the patent application, wherein one of the scale member and the second reading head is provided in the plurality of first reading heads, and the other of the scale member and the second reading head is provided in The projection optical system or a frame member supporting the projection optical system. Such as the exposure method of item 59 or 60 in the scope of the patent application, wherein the scale member has a plurality of grid portions arranged separately from each other in the second direction; and the position information of the plurality of first reading heads is measured by the measuring device , The measuring device has a plurality of the second reading heads including at least two second reading heads whose positions of the measuring beam are different in the second direction; the at least two second reading heads are in the second direction Above, the measuring beam is irradiated with a wider interval than the interval between a pair of adjacent lattice parts among the plurality of lattice parts. For example, the exposure method of item 61 of the patent application, wherein the plurality of second reading heads are included in one of the first direction and the third direction orthogonal to the predetermined plane, and the position of the measuring beam is at least At least one of the two second reading heads is different from at least one second reading head. For example, the exposure method of item 59 or 60 in the scope of the patent application, wherein a plurality of the measurement beams are irradiated to the positions of the scale members different from each other to measure the plurality of the first reading heads in a direction different from the second direction Location information. Such as the exposure method of item 59 or 60 in the scope of patent application, wherein the position information related to at least one of the rotation and tilt of the plurality of first reading heads is measured by the aforementioned measuring device. For example, the exposure method of item 59 or 60 of the scope of patent application, wherein the aforementioned scale member, It has a reflective two-dimensional grid or two one-dimensional grids that are arranged in different directions from each other. Such as the exposure method of item 59 or 60 in the scope of the patent application, wherein the aforementioned correction information compensates for the measurement error of the aforementioned measuring device caused by at least one of the deformation, displacement, flatness, and formation error of the aforementioned scale member. For example, the exposure method of item 59 or 60 in the scope of the patent application, wherein the aforementioned correction information compensates for the measurement error of the aforementioned measuring device caused by at least one of the displacement and optical characteristics of the aforementioned second reading head. For example, the exposure method of item 59 or 60 in the scope of the patent application, wherein the second read head uses the second direction as the measurement direction; the correction information compensates for the second direction that is different from the second direction. 2 The measurement error of the measuring device in the second direction caused by the relative movement of the reading head and the scale member. For example, the exposure method of any one of items 50, 51, 59, and 60 in the scope of patent application, wherein the plurality of first reading heads respectively use one of the two directions intersecting each other in the predetermined plane as the measurement direction; The aforementioned at least three first reading heads used for measurement in the aforementioned measurement system include at least one first reading head with one of the aforementioned two directions as the measurement direction, and at least two with the other of the aforementioned two directions as the measurement direction First reading head. For example, the exposure method of any one of items 50, 51, 59, and 60 in the scope of the patent application, wherein the plurality of first reading heads include a direction that is different from the first direction in the predetermined plane as the measurement direction The first head; in order to measure the aforementioned movement using the first head whose measurement direction is different from the aforementioned first direction Use the measurement information of the aforementioned measuring device for the position information of the body. Such as the exposure method of item 70 in the scope of the patent application, wherein the plurality of first reading heads include at least two first reading heads with the first direction as the measurement direction, and at least the second direction as the measurement direction. Two first reading heads. For example, the exposure method of any one of items 50, 51, 59, and 60 in the scope of patent application, wherein the plurality of first reading heads can move relative to the moving body in the second direction. For example, the exposure method of any one of items 50, 51, 59, and 60 in the scope of the patent application, wherein the plurality of first reading heads are included in the first direction so as to be adjacent to one of the plurality of grid regions The two first reading heads that irradiate the measuring beam at a wide interval in the grid area, and at least one first reading head whose position in the second direction is different from at least one of the two first reading heads head. For example, the exposure method according to any one of items 50, 51, 59, and 60 in the scope of the patent application, wherein the plurality of grid regions respectively have a reflective two-dimensional grid or two one-dimensional grids that are arranged in different directions from each other. Such as the exposure method of any one of items 50, 51, 59, and 60 in the scope of the patent application, wherein the plurality of grid regions are respectively formed on a plurality of scales that are different from each other. For example, the exposure method of any one of items 50, 51, 59, and 60 in the scope of the patent application, wherein the at least three first reading heads used for measurement in the measurement system in the movement of the moving body are respectively in the aforementioned Move the at least three first heads in the second direction so that the measuring beam does not deviate from the plurality of grid areas. For example, the exposure method of any one of items 50, 51, 59, and 60 in the scope of patent application, wherein one of the plurality of first reading heads or the plurality of first reading heads are protected by a plurality of movable parts respectively. Therefore, the position information of the first reading head is measured on the plurality of movable parts by the measuring device. For example, the exposure method of any one of items 50, 51, 59, and 60 in the scope of the patent application, wherein the plurality of first reading heads are respectively arranged in one of the two directions that cross each other in the predetermined plane, and the predetermined The two directions of the third direction perpendicular to the plane are used as measurement directions; using the aforementioned at least three first reading heads, measure the position information of the moving body in a 3-degree-of-freedom direction that is different from the aforementioned 3-degree-of-freedom direction including the aforementioned third direction . For example, the exposure method of any one of items 50, 51, 59, and 60 in the scope of patent application, wherein the plurality of first reading heads have at least four first reading heads; among the aforementioned at least four first reading heads During the period when the measuring beam of a first reading head is separated from the plurality of grid areas, the measuring beams of the remaining at least three first reading heads irradiate at least one of the plurality of grid areas and travel by the moving body The movement in the first direction switches the one of the at least four first heads from which the measuring beam is separated from the plurality of grid areas. Such as the exposure method of item 79 in the scope of patent application, wherein the aforementioned at least four first reading heads include two first reading heads whose positions of the measuring beam are different from each other in the first direction, and in the second direction The two first reading heads whose positions of the measuring beam are different from at least one of the two first reading heads and the positions of the measuring beams in the first direction are different from each other; the two first reading heads are different from each other in the first direction. In the first direction, the measurement beam is irradiated at an interval wider than the interval between a pair of adjacent lattice areas among the plurality of lattice areas. Such as the exposure method of item 79 in the scope of the patent application, wherein the lattice member has at least two of the plural lattice regions arranged separately from each other in the second direction; The at least four first reading heads irradiate the measurement beams to the at least two plurality of grid regions, respectively, through at least two first reading heads whose positions of the measurement beams in the first direction are different from each other; At least two first reading heads irradiate the measurement beam in the first direction at an interval that is wider than the interval between a pair of adjacent lattice areas among the plurality of lattice areas. Such as the exposure method of item 81 in the scope of the patent application, wherein the lattice member is provided on the movable body, the plurality of first reading heads are provided above the movable body; the at least two of the plurality of lattice areas are included in the foregoing The second direction is arranged on one pair of the plurality of grid areas on both sides of the substrate placement area of the movable body. Such as the exposure method of item 79 in the scope of patent application, wherein, during the movement of the moving body in the first direction, the non-measurement interval in which the measuring beam departs from the plurality of grid areas in the at least four first reading heads is not overlapping. Such as the exposure method of item 83 in the scope of the patent application, wherein the plurality of first reading heads includes at least one first reading head in which the non-measurement interval overlaps with at least one of the at least four first reading heads; In the measurement of the position information of the moving body, at least five of the at least four first reading heads and the at least one first reading head are used to irradiate at least one of the plurality of grid areas with the measurement beam At least three first reading heads. Such as the exposure method of item 79 in the scope of the patent application, wherein among the aforementioned at least four first heads, the measuring beam is separated from the aforementioned one grid area and moved to the aforementioned other grid area to control the aforementioned The correction information of the movement of the moving body is based on the measurement information of the remaining at least three first reading heads or the aforementioned measurement using the aforementioned remaining at least three first reading heads The position information of the moving body can be obtained. For example, the exposure method of item 85 in the scope of patent application, wherein the correction information is obtained during the period during which the measurement beam is irradiated on at least one of the plurality of grid areas by the at least four first reading heads. For example, the exposure method of item 85 of the scope of patent application, wherein, before the measurement beam of the first reading head of the remaining at least three first reading heads is separated from one of the plurality of grid areas, the above remaining One of the at least three first reading heads and at least three first reading heads including the one first reading head for which the correction information has been obtained are used to measure the position information of the moving body. Such as the exposure method of item 85 in the scope of the patent application, wherein the plurality of first reading heads are respectively arranged in one of the two directions intersecting each other in the predetermined plane and the third direction orthogonal to the predetermined plane. As the measurement direction, use the aforementioned at least three first heads to measure the position information of the moving body in a 3-degree-of-freedom direction including the aforementioned third direction, which is different from the aforementioned 3-degree-of-freedom direction; use the aforementioned at least four first heads Among them, the correction information for the measuring beam to separate from the one grid area and move to a first reading head in the other grid area to control the movement of the moving body in the three-degree-of-freedom direction is based on the remaining at least three The measurement information in the third direction of one first reading head or the position information of the moving body in the third direction measured by the remaining at least three first reading heads are obtained. The exposure method according to any one of items 50, 51, and 59 in the scope of patent application, wherein the grid member and the other of the plurality of first reading heads are provided on the frame member supporting the projection optical system. Such as the exposure method of item 89 in the scope of patent application, wherein the lattice member is provided on the movable body, the plurality of first reading heads are provided on the frame member; the second reading head is provided on the plurality of first reading heads, And the aforementioned scale member is provided on the aforementioned frame member. Such as the exposure method of any one of items 50, 51, 59, and 60 in the scope of the patent application, wherein one of a scale member and a reading head is provided with a movable holding member that holds the photomask illuminated by the aforementioned illuminating light , The other of the scale member and the read head is installed in the projection optical system or the encoder system supporting the frame member of the projection optical system, and measures the position information of the holding member. For example, the exposure method of any one of items 50, 51, 59, and 60 in the scope of patent application, wherein the projection optical system has a plurality of optical systems, and the plurality of optical systems respectively project the pattern of the mask illuminated by the illumination light The part is like. Such as the exposure method of the 92nd patent application, wherein the substrate is scanned and exposed with the illumination light through the projection optical system; the plurality of optical systems are scanned while moving with the substrate during the scanning exposure A plurality of projection regions whose positions are different from each other in the direction orthogonal to the direction respectively project the aforementioned partial images. For example, the exposure method of any one of items 50, 51, 59, and 60 in the scope of patent application, wherein the substrate is scanned and exposed with the illumination light through the projection optical system, and moves to the first in the scanning exposure. Direction or the aforementioned second direction. For example, the exposure method of any one of items 50, 51, 59, and 60 in the scope of the patent application, wherein the aforementioned substrate is a substrate for flat-panel displays with at least one side or a diagonal length of 500 mm or more. A method for manufacturing a flat-panel display includes: exposing a substrate using the exposure method of any one of the 50, 51, 59, and 60 scopes of the patent application; and developing the aforementioned substrate after the exposure.

Images