TWI716593B - Method of forming hardened coating - Google Patents

Method of forming hardened coating Download PDF

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TWI716593B
TWI716593B TW106115157A TW106115157A TWI716593B TW I716593 B TWI716593 B TW I716593B TW 106115157 A TW106115157 A TW 106115157A TW 106115157 A TW106115157 A TW 106115157A TW I716593 B TWI716593 B TW I716593B
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photosensitive resin
resin composition
coating film
coating
forming
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TW201743136A (en
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上杉尚之
齋藤𨺓英
木村健人
岡本吉生
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日商田村製作所股份有限公司
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Abstract

本發明之課題為,本發明之目的係提供即使於基板上設置通孔或盲孔,亦可將通孔或盲孔充分地埋填,並且使塗膜之厚度均勻化的硬化塗膜之形成方法。 The subject of the present invention is to provide the formation of a hardened coating film that can fill the through holes or blind holes sufficiently even if the through holes or blind holes are provided on the substrate and make the thickness of the coating film uniform method.

本發明之解決手段為,一種硬化塗膜之形成方法,其特徵為,具有下列步驟:藉由噴墨法,於基板上塗佈25℃時之黏度為120~3300mPa.s之第1感光性樹脂組成物的步驟、由前述所塗佈之第1感光性樹脂組成物,以第1硬化處理來形成第1硬化塗膜的步驟、於前述第1硬化塗膜上塗佈第2感光性樹脂組成物的步驟、以及由前述所塗佈之第2感光性樹脂組成物,以第2硬化處理來形成第2硬化塗膜的步驟。 The solution of the present invention is a method for forming a hardened coating film, which is characterized in that it has the following steps: by ink-jet method, the viscosity of the substrate at 25°C is 120~3300mPa. s step of the first photosensitive resin composition, the step of forming a first cured coating film from the first photosensitive resin composition applied as described above by the first curing treatment, coating on the first cured coating film The step of applying the second photosensitive resin composition and the step of forming a second cured coating film from the second photosensitive resin composition applied above by the second curing treatment.

Description

硬化塗膜之形成方法 Method of forming hardened coating

本發明係關於使用噴墨法將感光性樹脂組成物吐出於基板上來形成塗膜的硬化塗膜之形成方法者。 The present invention relates to a method for forming a cured coating film by ejecting a photosensitive resin composition onto a substrate using an inkjet method to form a coating film.

以往,基板,係例如,在印刷配線板上形成具有所期望之電路圖型的絕緣被覆時,使用網版印刷法,來塗佈感光性樹脂組成物後,進行預備乾燥,使具有將電路圖型之墊以外設為透光性的圖型之底片密黏於感光性樹脂組成物之塗膜上,從其上方照射活性能量線,以稀鹼水溶液去除與墊相對應的非曝光區域,使塗膜顯像,而進行後硬化(專利文獻1)。 Conventionally, the substrate, for example, when forming an insulating coating with a desired circuit pattern on a printed wiring board, a photosensitive resin composition is coated by a screen printing method and then preliminarily dried to have a circuit pattern. A film with a translucent pattern other than the pad is closely adhered to the coating film of the photosensitive resin composition, and active energy rays are irradiated from above to remove the non-exposed area corresponding to the pad with a dilute alkali aqueous solution to make the coating film It is developed and post-cured (Patent Document 1).

但,於印刷配線板上有時會設置盲孔。於此情況中,若使用網版印刷法,則無法將盲孔充分地埋填,而有在盲孔之周緣部所塗佈的感光性樹脂組成物會移開的問題。 However, blind holes are sometimes provided on the printed wiring board. In this case, if the screen printing method is used, the blind holes cannot be fully filled, and there is a problem that the photosensitive resin composition applied on the periphery of the blind holes may move away.

又,若於印刷配線板上設置盲孔,則盲孔無法藉由感光性樹脂組成物被充分埋填,在其周緣部所塗佈的感光性樹脂組成物會移開,因此,有導致形成於印刷配 線板的硬化塗膜之厚度成為不均勻的問題。 In addition, if a blind hole is provided on the printed wiring board, the blind hole cannot be sufficiently filled with the photosensitive resin composition, and the photosensitive resin composition applied on the periphery of the blind hole may move away, which may cause formation For printing The thickness of the cured coating film of the wire board becomes a problem of unevenness.

又,在印刷配線板上設置有通孔的情況,若使用網版印刷法,則所塗佈的感光性樹脂組成物會經由通孔漏到印刷配線板的背側,而無法將通孔埋填,又,在通孔的周緣部所塗佈的感光性樹脂組成物會移開,因此,依據基板之使用條件等,亦有要求對如此之問題加以防止的情況。 In addition, when a through hole is provided on the printed wiring board, if the screen printing method is used, the coated photosensitive resin composition will leak to the back side of the printed wiring board through the through hole, making it impossible to bury the through hole In addition, the photosensitive resin composition applied on the periphery of the through hole will move away. Therefore, depending on the use conditions of the substrate, etc., it is also required to prevent such a problem.

[先前技術文獻] [Prior Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2002-293882號公報 [Patent Document 1] JP 2002-293882 A

鑑於上述情事,本發明之目的係提供即使於基板上設置通孔或盲孔,亦可將通孔或盲孔充分地埋填,並且使塗膜之厚度均勻化的硬化塗膜之形成方法。 In view of the above situation, the object of the present invention is to provide a method for forming a hardened coating film that can fill the through holes or blind holes sufficiently even if a through hole or a blind hole is provided on a substrate, and uniformize the thickness of the coating film.

本發明之樣態係一種硬化塗膜之形成方法,其特徵為,具有下列步驟:藉由噴墨法,於基板上塗佈25℃時之黏度為120~3300mPa.s之第1感光性樹脂組成物的步驟、由前述所塗佈之第1感光性樹脂組成物,以第1 硬化處理來形成第1硬化塗膜的步驟、於前述第1硬化塗膜上塗佈第2感光性樹脂組成物的步驟、以及由前述所塗佈之第2感光性樹脂組成物,以第2硬化處理來形成第2硬化塗膜的步驟。 The aspect of the present invention is a method for forming a hardened coating film, which is characterized in that it has the following steps: by ink-jet method, coating the substrate with a viscosity of 120~3300mPa at 25°C. The step of the first photosensitive resin composition of s is based on the first photosensitive resin composition applied above, and the first The step of curing treatment to form the first cured coating film, the step of coating the second photosensitive resin composition on the first cured coating film, and the second photosensitive resin composition applied by the aforementioned The step of curing to form a second cured coating film.

於上述樣態中,係將藉由噴墨法塗佈的第1感光性樹脂組成物以第1硬化處理製成第1硬化塗膜,並於第1硬化塗膜上進一步以也包含噴墨法之所期望的塗佈方法來塗佈第2感光性樹脂組成物,而對於第1硬化塗膜與所塗佈的第2感光性樹脂組成物進行第2硬化處理。 In the above aspect, the first photosensitive resin composition applied by the inkjet method is subjected to a first curing treatment to form a first cured coating film, and the first cured coating film is further included with inkjet The second photosensitive resin composition is applied by a desired coating method of the method, and the second curing treatment is performed on the first cured coating film and the applied second photosensitive resin composition.

本發明之樣態係硬化塗膜之形成方法,其中,前述第2感光性樹脂組成物之塗佈方法係網版印刷法、噴墨法、輥塗佈法、刮棒塗佈法、噴塗法、淋幕式塗佈法、刮板法、塗抹法、刮刀式塗佈法、刀塗法或者凹版塗佈法。 The aspect of the present invention is a method for forming a cured coating film, wherein the coating method of the second photosensitive resin composition is screen printing method, inkjet method, roll coating method, bar coating method, spraying method , Curtain coating method, doctor blade method, smear method, doctor blade coating method, knife coating method or gravure coating method.

本發明之樣態係硬化塗膜之形成方法,其中,於前述第1硬化塗膜上,以噴墨法以外的其他塗佈方法來塗佈前述第2感光性樹脂組成物。 The aspect of the present invention is a method for forming a cured coating film, wherein the second photosensitive resin composition is coated on the first cured coating film by a coating method other than the inkjet method.

本發明之樣態係硬化塗膜之形成方法,其中,前述其他塗佈方法係網版印刷法、輥塗佈法、刮棒塗佈法、噴塗法、淋幕式塗佈法、刮板法、塗抹法、刮刀式塗佈法、刀塗法或者凹版塗佈法。 The aspect of the present invention is a method for forming a hardened coating film, wherein the aforementioned other coating methods are screen printing, roll coating, bar coating, spray coating, curtain coating, and doctor blade method , Smear method, knife coating method, knife coating method or gravure coating method.

本發明之樣態係硬化塗膜之形成方法,其中,前述第1感光性樹脂組成物之25℃時的黏度為200~1000mPa.s。 The aspect of the present invention is a method of forming a hardened coating film, wherein the viscosity of the first photosensitive resin composition at 25°C is 200 to 1000 mPa. s.

本發明之樣態係硬化塗膜之形成方法,其中,前述第2感光性樹脂組成物之25℃時的黏度為120~60000mPa.s。 The aspect of the present invention is a method for forming a hardened coating film, wherein the viscosity of the second photosensitive resin composition at 25°C is 120 to 60,000 mPa. s.

本發明之樣態係硬化塗膜之形成方法,其中,前述第1感光性樹脂組成物係與前述第2感光性樹脂組成物相同的組成物。 The aspect of the present invention is a method for forming a cured coating film, wherein the first photosensitive resin composition is the same composition as the second photosensitive resin composition.

本發明之樣態係硬化塗膜之形成方法,其中,前述第1感光性樹脂組成物係塗佈於前述基板之通孔及/或盲孔。 The aspect of the present invention is a method for forming a cured coating film, wherein the first photosensitive resin composition is applied to the through holes and/or blind holes of the substrate.

本發明之樣態係硬化塗膜之形成方法,其中,前述第1硬化處理係以活性能量線進行之曝光處理或者熱處理。 The aspect of the present invention is a method for forming a hardened coating film, wherein the first hardening treatment is exposure treatment or heat treatment by active energy rays.

本發明之樣態係硬化塗膜之形成方法,其中,以前述活性能量線進行之曝光處理的曝光量為30~500mJ/cm2The aspect of the present invention is a method for forming a hardened coating film, wherein the exposure amount of the exposure treatment by the active energy rays is 30 to 500 mJ/cm 2 .

本發明之樣態係硬化塗膜之形成方法,其中,前述第2硬化處理係以活性能量線進行之曝光處理或者熱處理。 The aspect of the present invention is a method for forming a cured coating film, wherein the second curing treatment is exposure treatment or heat treatment performed by active energy rays.

依據本發明之樣態,在以所期望之塗佈方法來塗佈感光性樹脂組成物之前,首先,以噴墨法塗佈25℃時之黏度為120~3300mPa.s的第1感光性樹脂組成物來形成第1硬化塗膜,藉此即使於作為塗佈對象之基板上設 置通孔或盲孔,亦可將通孔或盲孔充分地埋填,又,可防止在通孔或盲孔之周緣部所塗佈的感光性樹脂組成物移開一事。進而,將通孔或盲孔充分地埋填,不僅可防止感光性樹脂組成物移開一事,亦可防止第1感光性樹脂組成物被塗佈成凸狀一事,因此,可使硬化塗膜之厚度均勻化。 According to aspects of the present invention, before coating the photosensitive resin composition by the desired coating method, first, the viscosity at 25°C is coated by inkjet method to 120~3300mPa. s's first photosensitive resin composition to form a first cured coating film, thereby even if it is provided on the substrate to be coated By placing through holes or blind holes, the through holes or blind holes can be fully filled, and the photosensitive resin composition coated on the periphery of the through holes or blind holes can be prevented from moving away. Furthermore, sufficient filling of the through holes or blind holes not only prevents the photosensitive resin composition from moving, but also prevents the first photosensitive resin composition from being coated in a convex shape, so that the coating film can be cured The thickness is uniform.

依據本發明之樣態,藉由第1感光性樹脂組成物之25℃時的黏度為200~1000mPa.s,而可將通孔或盲孔確實地埋填,並且使硬化塗膜之厚度更加均勻化。 According to the aspect of the present invention, the viscosity at 25°C of the first photosensitive resin composition is 200~1000mPa. s, and can fill through holes or blind holes reliably, and make the thickness of the hardened coating film more uniform.

依據本發明之樣態,藉由以活性能量線進行之曝光處理的曝光量為30~500mJ/cm2,而縮短曝光時間,且不僅是盲孔,連通孔亦可更確實地填埋。因而,可一面提昇生產性,一面更確實地防止在通孔之周緣部所塗佈的感光性樹脂組成物移開一事。 According to the aspect of the present invention, the exposure amount by the exposure process with the active energy line is 30~500mJ/cm 2 , and the exposure time is shortened, and not only blind holes but also via holes can be filled more reliably. Therefore, it is possible to more reliably prevent the photosensitive resin composition applied on the periphery of the through hole from moving away while improving productivity.

1‧‧‧第1感光性樹脂組成物 1.‧‧The first photosensitive resin composition

2‧‧‧第2感光性樹脂組成物 2‧‧‧The second photosensitive resin composition

3‧‧‧基板 3‧‧‧Substrate

4‧‧‧噴射分配器 4‧‧‧Jet distributor

5‧‧‧第1硬化處理 5‧‧‧The first hardening treatment

11‧‧‧第1硬化塗膜 11‧‧‧The first hardened coating

12‧‧‧第2硬化塗膜 12‧‧‧Second Hardening Film

[第1圖](a)圖係本發明之實施形態例的硬化塗膜之形成方法中之以噴墨法進行的塗佈之說明圖,同(b)圖係本發明之實施形態例的硬化塗膜之形成方法中之第1硬化處理之說明圖,同(c)圖係以本發明之實施形態例的硬化塗膜之形成方法所得到的硬化塗膜之說明圖。 [Figure 1] Figure (a) is an explanatory diagram of coating by the inkjet method in the method of forming a cured coating film of the embodiment of the present invention, and Figure (b) is of the embodiment of the present invention The explanatory diagram of the first curing treatment in the forming method of the hardened coating film is the same as the diagram (c) is an explanatory diagram of the hardened coating film obtained by the method of forming the hardened coating film of the embodiment of the present invention.

[第2圖]係實施例之塗膜均勻性的評估方法之說明圖。 [Figure 2] is an explanatory diagram of the method of evaluating the uniformity of the coating film of the example.

接著,針對本發明之硬化塗膜之形成方法的實施形態例,一邊使用附圖一邊進行說明。本發明之硬化塗膜之形成方法,雖即使是設置有盲孔的基板亦可適用,但在此,以於設置有通孔的基板(例如,印刷配線板或可撓性印刷配線板之電路基板)上形成硬化塗膜的情況為例進行說明。 Next, embodiments of the method for forming a cured coating film of the present invention will be described with reference to the drawings. The method of forming a hardened coating film of the present invention is applicable even to a substrate provided with a blind hole, but here, it is applied to a substrate provided with a through hole (for example, a circuit of a printed wiring board or a flexible printed wiring board). The case where a cured coating film is formed on the substrate) will be described as an example.

如第1圖(a)所示般,在本發明之實施形態例的硬化塗膜之形成方法中,首先,藉由噴墨法(於第1圖中,係使用有噴射分配器4的噴墨法作為例子),於基板3上塗佈特定量之第1感光性樹脂組成物1。於第1圖中,於基板3上設置通孔31,於通孔31部塗佈第1感光性樹脂組成物1。 As shown in Fig. 1(a), in the method of forming a cured coating film according to the embodiment of the present invention, first, by the inkjet method (in Fig. 1, the spray dispenser 4 is used) Ink method as an example), a specific amount of the first photosensitive resin composition 1 is applied on the substrate 3. In Fig. 1, a through hole 31 is provided in the substrate 3, and the first photosensitive resin composition 1 is applied to the through hole 31 part.

第1感光性樹脂組成物1之25℃時的黏度係藉由稀釋劑被調整成120~3300mPa.s。藉由25℃時之黏度的下限值為120mPa.s,而在將第1感光性樹脂組成物1以噴墨法塗佈於通孔31時,可防止在塗佈時,第1感光性樹脂組成物1經由通孔31漏到基板3的背側,甚至於可以第1感光性樹脂組成物1將通孔31進行填充。又,藉由25℃時之黏度的上限值為3300mPa.s,在將第1感光性樹脂組成物1以噴墨法進行塗佈時,可防止第1感光性樹脂組成物1被塗佈成凸狀,甚至於可使硬化塗膜之厚度均勻化。 The viscosity of the first photosensitive resin composition 1 at 25°C is adjusted to 120~3300mPa with a thinner. s. The lower limit of the viscosity at 25°C is 120mPa. s, and when the first photosensitive resin composition 1 is applied to the through hole 31 by the inkjet method, it can prevent the first photosensitive resin composition 1 from leaking to the back of the substrate 3 through the through hole 31 during coating. On the other hand, even the through hole 31 can be filled with the first photosensitive resin composition 1. In addition, the upper limit of the viscosity at 25°C is 3300mPa. s. When the first photosensitive resin composition 1 is applied by the inkjet method, the first photosensitive resin composition 1 can be prevented from being coated in a convex shape, and even the thickness of the cured coating film can be made uniform.

第1感光性樹脂組成物1之25℃時的黏度若 為120~3300mPa.s之範圍,則無特別限定,但就將通孔31更確實地填充的點而言,其下限值較佳為200mPa.s,特佳為250mPa.s。又,就使硬化塗膜之厚度更加均勻化的點而言,25℃時之黏度的上限值較佳為1000mPa.s,更佳為800mPa.s,特佳為600mPa.s。另外,通孔31的尺寸並無特別限定,例如,內徑為50~200μm,深度為50~200μm。 The viscosity of the first photosensitive resin composition 1 at 25°C It is 120~3300mPa. The range of s is not particularly limited, but in terms of filling the through holes 31 more reliably, the lower limit is preferably 200 mPa. s, 250mPa is particularly preferred. s. Furthermore, in terms of making the thickness of the cured coating film more uniform, the upper limit of the viscosity at 25°C is preferably 1000 mPa. s, more preferably 800mPa. s, 600mPa is particularly preferred. s. In addition, the size of the through hole 31 is not particularly limited. For example, the inner diameter is 50 to 200 μm and the depth is 50 to 200 μm.

接著,如第1圖(b)所示般,對於所塗佈的第1感光性樹脂組成物進行第1硬化處理5,而形成第1硬化塗膜11。作為第1硬化處理5係可列舉:使用有活性能量線的曝光處理、使用有加熱裝置的熱處理等。 Next, as shown in 1st (b), the 1st hardening process 5 is performed with respect to the applied 1st photosensitive resin composition, and the 1st hardening coating film 11 is formed. Examples of the first curing treatment 5 series include: exposure treatment using active energy rays, heat treatment using a heating device, and the like.

作為使用有活性能量線的曝光處理之條件,係只要是第1感光性樹脂組成物1會進行光硬化的條件則無特別限定,例如,就將通孔或盲孔更確實地埋填並且使硬化塗膜之厚度更均勻化的點而言,紫外線(例如,波長240~420nm)之曝光的下限值較佳為10mJ/cm2,就可將通孔更確實地埋填的點而言,更佳為25mJ/cm2,特佳為30mJ/cm2。另一方面,紫外線之曝光量的上限值,就光硬化的點而言雖無特別限定,但就使曝光時間縮短化而提昇生產性的點而言,較佳為2000mJ/cm2,特佳為500mJ/cm2。作為紫外線之光源雖無特別限定,但可列舉例如:金屬鹵素燈、超高壓水銀燈、氙氣燈、UV-LED等。又,作為熱處理條件係只要是第1感光性樹脂組成物1會進行熱硬化的條件則無特別限定,可列舉例如: 60~170℃,15~80分鐘等。 The conditions for the exposure treatment using active energy rays are not particularly limited as long as the first photosensitive resin composition 1 undergoes photocuring. For example, through holes or blind holes are filled more reliably and As far as the thickness of the cured coating film is more uniform, the lower limit of exposure to ultraviolet light (for example, wavelength 240~420nm) is preferably 10mJ/cm 2 , so that the through hole can be filled more reliably. , More preferably 25mJ/cm 2 , particularly preferably 30mJ/cm 2 . On the other hand, the upper limit of the exposure dose of ultraviolet rays is not particularly limited in terms of the point of photocuring, but in terms of shortening the exposure time and improving productivity, it is preferably 2000 mJ/cm 2 , especially Preferably, it is 500mJ/cm 2 . Although there are no particular limitations on the light source of ultraviolet rays, examples thereof include metal halide lamps, ultra-high pressure mercury lamps, xenon lamps, UV-LEDs, and the like. In addition, the heat treatment conditions are not particularly limited as long as the first photosensitive resin composition 1 is thermally cured, and examples thereof include 60 to 170° C., 15 to 80 minutes, and the like.

接著,如第1圖(c)所示般,於所得到的第1硬化塗膜11上,以所期望的塗佈方法塗佈第2感光性樹脂組成物2。於第1圖(c)中係於基板3之表面全體塗佈第2感光性樹脂組成物2。從第1硬化處理5之結束時起至第2感光性樹脂組成物2之塗佈開始為止的時間間隔雖無特別限定,但就防止基板3表面或第1硬化塗膜11表面之氧化的點而言,較佳為72小時以下。 Next, as shown in FIG. 1(c), the second photosensitive resin composition 2 is coated on the obtained first cured coating film 11 by a desired coating method. In FIG. 1(c), the second photosensitive resin composition 2 is applied to the entire surface of the substrate 3. Although the time interval from the end of the first curing treatment 5 to the start of the application of the second photosensitive resin composition 2 is not particularly limited, it prevents oxidation on the surface of the substrate 3 or the surface of the first cured coating film 11 In particular, it is preferably 72 hours or less.

作為第2感光性樹脂組成物2之塗佈方法並無特別限定,以往所使用之周知的方法皆可使用,可列舉例如:網版印刷法、噴墨法(例如,使用有噴射分配器的噴墨法等)、輥塗佈法、刮棒塗佈法、噴塗法、淋幕式塗佈法、刮漿法、塗抹法、刮刀式塗佈法、刀塗法、凹版塗佈法等。第2感光性樹脂組成物2之塗佈方法係可與第1感光性樹脂組成物1之塗佈方法(亦即,噴墨法)相同的塗佈方法,亦可為噴墨法以外之塗佈方法。其中,就對於基板全面之塗佈的容易性的點而言,較佳為網版印刷法。 The coating method of the second photosensitive resin composition 2 is not particularly limited, and well-known methods used in the past can be used. Examples include screen printing methods and inkjet methods (for example, using a jet dispenser). Inkjet method, etc.), roll coating method, bar coating method, spray coating method, curtain coating method, doctor blade method, smear method, knife coating method, knife coating method, gravure coating method, etc. The coating method of the second photosensitive resin composition 2 may be the same as the coating method of the first photosensitive resin composition 1 (that is, the inkjet method), or may be coating other than the inkjet method. Cloth method. Among them, the screen printing method is preferred in terms of ease of coating the entire substrate.

第2感光性樹脂組成物2係可與第1感光性樹脂組成物1相同的組成物,亦可為不同的組成物。又,第2感光性樹脂組成物2之25℃時的黏度係可與第1感光性樹脂組成物1之25℃時的黏度相同,亦可不同。第2感光性樹脂組成物之25℃時的黏度雖依據所採用的塗佈方法而異,但例如,就塗佈成特定之膜厚的點而言,其下限值較佳為120mPa.s,在使用網版印刷法作為塗佈方法 的情況下,就確實地塗佈成特定之膜厚的點而言,更佳為10000mPa.s,特佳為12000mPa.s。又,例如,就塗佈性的點而言,25℃時之黏度的上限值較佳為60000mPa.s,在使用網版印刷法作為塗佈方法的情況下,更佳為50000mPa.s,就調平性的點而言,特佳為30000mPa.s。 The second photosensitive resin composition 2 may be the same composition as the first photosensitive resin composition 1, or may be a different composition. In addition, the viscosity of the second photosensitive resin composition 2 at 25°C may be the same as or different from the viscosity of the first photosensitive resin composition 1 at 25°C. Although the viscosity of the second photosensitive resin composition at 25°C varies depending on the coating method used, for example, the lower limit is preferably 120 mPa in terms of coating to a specific film thickness. s, using screen printing as the coating method In the case of 10000mPa, it is more preferable for the point to be applied to a specific film thickness. s, particularly preferably 12000mPa. s. Also, for example, in terms of coatability, the upper limit of the viscosity at 25°C is preferably 60000mPa. s, in the case of using screen printing as the coating method, it is more preferably 50000mPa. s, as far as the leveling point is concerned, it is particularly preferably 30000mPa. s.

第2感光性樹脂組成物2之塗佈時的膜厚係可因應於基板的使用狀況來適當選擇,例如,在塗佈於電路基板的情況係可列舉10~100μm。 The film thickness when the second photosensitive resin composition 2 is applied can be appropriately selected in accordance with the use condition of the substrate. For example, when applied to a circuit substrate, 10 to 100 μm can be cited.

接著,對於所塗佈的第2感光性樹脂組成物2進行第2硬化處理,而形成第2硬化塗膜12。作為第2硬化處理係與第1硬化處理5相同,可列舉:使用有活性能量線的曝光處理、使用有加熱裝置的熱處理等。又,作為第2硬化處理之處理條件係可列舉與第1硬化處理5相同的處理條件。又,就生產性等的點而言,第1硬化處理5係可比第2硬化處理更少的曝光量,且可比第2硬化處理更低的加熱溫度、更短的加熱時間。 Next, a second curing treatment is performed on the applied second photosensitive resin composition 2 to form a second cured coating film 12. The second hardening treatment system is the same as the first hardening treatment 5, and examples thereof include exposure treatment using active energy rays, heat treatment using a heating device, and the like. In addition, as the treatment conditions of the second hardening treatment, the same treatment conditions as those of the first hardening treatment 5 can be cited. Moreover, in terms of productivity and the like, the first curing treatment 5 series can have a smaller exposure amount than the second curing treatment, and can have a lower heating temperature and a shorter heating time than the second curing treatment.

藉由進行第2硬化處理,而可於基板表面全體形成由第2感光性樹脂組成物2所構成的第2硬化塗膜12。 By performing the second curing treatment, the second cured coating film 12 composed of the second photosensitive resin composition 2 can be formed on the entire substrate surface.

另外,在第2感光性樹脂組成物2中包含有機溶劑的情況,在第2感光性樹脂組成物2之塗佈後,為了使有機溶劑揮散而成為無黏性的塗膜,亦可在以乾燥機等進行預備乾燥之後,實施第2硬化處理。作為預備乾燥之條件係可列舉例如:以60~80℃左右之溫度進行15~60 分鐘左右之加熱時間。又,在使第2感光性樹脂組成物2之塗膜顯像的情況,(在預備乾燥後進行)第2硬化處理較佳係設為曝光處理。於此情況中,曝光處理係使具有將電路圖型之墊以外設為透光性之圖型的底片密黏於第2感光性樹脂組成物2之塗膜上,從其上方照射活性能量線,而使第2感光性樹脂組成物2之塗膜進行光硬化。 In addition, when the second photosensitive resin composition 2 contains an organic solvent, after the second photosensitive resin composition 2 is applied, in order to volatilize the organic solvent and become a non-sticky coating film, it may be After preliminary drying by a dryer or the like, the second curing treatment is performed. As the pre-drying conditions, for example, 15~60 at a temperature of 60~80℃ The heating time is about minutes. In addition, when the coating film of the second photosensitive resin composition 2 is developed, the second curing treatment (performed after preliminary drying) is preferably an exposure treatment. In this case, the exposure process is to closely adhere a film with a pattern that has a light-transmitting pattern other than the circuit pattern pad on the coating film of the second photosensitive resin composition 2, and irradiate active energy rays from above. Then, the coating film of the second photosensitive resin composition 2 is photocured.

第2感光性樹脂組成物2之光硬化後,以稀鹼水溶液去除與前述墊相對應的非曝光區域,藉此使塗膜進行顯像。上述顯像方法係可使用例如噴塗法、淋浴法等,作為所使用之稀鹼水溶液雖並無特別限定,可列舉例如:0.5~5質量%之碳酸鈉水溶液。顯像後,以130~170℃之熱風循環式的乾燥機等進行20~80分鐘後硬化,藉此可於基板3上形成作為目的之硬化被膜。 After the second photosensitive resin composition 2 is cured by light, the non-exposed area corresponding to the aforementioned pad is removed with a dilute alkali aqueous solution to develop the coating film. The above-mentioned development method can be used, for example, a spray method, a shower method, etc., although the diluted alkali aqueous solution used is not particularly limited, for example, 0.5 to 5 mass% sodium carbonate aqueous solution can be mentioned. After development, it is cured with a hot air circulating dryer at 130 to 170° C. for 20 to 80 minutes, thereby forming a target cured film on the substrate 3.

接著,針對第1感光性樹脂組成物及第2感光性樹脂組成物(以下,有時將第1感光性樹脂組成物與第2感光性樹脂組成物統稱為「感光性樹脂組成物」)進行說明。 Next, the first photosensitive resin composition and the second photosensitive resin composition (hereinafter, the first photosensitive resin composition and the second photosensitive resin composition may be collectively referred to as "photosensitive resin composition"). Description.

作為感光性樹脂組成物之硬化膜係可列舉例如:形成於印刷配線板等之電路基板的防焊阻劑膜等之絕緣被膜。 Examples of the cured film system of the photosensitive resin composition include insulating films such as solder resist films formed on circuit boards such as printed wiring boards.

作為上述感光性樹脂組成物係可列舉例如:含有含羧基之感光性樹脂、光聚合起始劑、胺基甲酸酯(甲基)丙烯酸酯、環氧化合物、以及稀釋劑的感光性樹脂組成物。 Examples of the aforementioned photosensitive resin composition system include: a photosensitive resin composition containing a carboxyl group-containing photosensitive resin, a photopolymerization initiator, a urethane (meth)acrylate, an epoxy compound, and a diluent Things.

含羧基之感光性樹脂 Carboxyl-containing photosensitive resin

含羧基之感光性樹脂並無特別限定,可列舉例如:具有1個以上之感光性不飽和雙鍵的樹脂。作為含羧基之感光性樹脂係可列舉例如:使丙烯酸或甲基丙烯酸(以下,有時稱為「(甲基)丙烯酸」)等之自由基聚合性不飽和單羧酸,與1分子中具有2個以上之環氧基的多官能環氧樹脂之環氧基的至少一部分進行反應,而得到環氧(甲基)丙烯酸酯等之自由基聚合性不飽和單羧酸化環氧樹脂,使多元酸或其酐與所生成之羥基進行反應所得到的多元酸變性環氧(甲基)丙烯酸酯等之多元酸變性自由基聚合性不飽和單羧酸化環氧樹脂。 The carboxyl group-containing photosensitive resin is not particularly limited, and examples include resins having one or more photosensitive unsaturated double bonds. Examples of the carboxyl group-containing photosensitive resin system include radically polymerizable unsaturated monocarboxylic acids such as acrylic acid or methacrylic acid (hereinafter, sometimes referred to as "(meth)acrylic acid"), which have a compound in one molecule At least a part of the epoxy groups of the polyfunctional epoxy resin having two or more epoxy groups react to obtain radically polymerizable unsaturated monocarboxylated epoxy resins such as epoxy (meth)acrylate, and Polyacid denatured radical polymerizable unsaturated monocarboxylated epoxy resin such as polyacid denatured epoxy (meth)acrylate obtained by reacting an acid or its anhydride with the generated hydroxyl group.

前述多官能性環氧樹脂係只要是2官能以上之環氧樹脂則任一者皆可使用。多官能性環氧樹脂之環氧當量雖無特別限定,但較佳為1000以下,特佳為100~500。於多官能性環氧樹脂中係可列舉例如:聯苯型環氧樹脂、萘型環氧樹脂、二環戊二烯型環氧樹脂、聚矽氧變性環氧樹脂等之橡膠變性環氧樹脂、ε-己內酯變性環氧樹脂、雙酚A型、雙酚F型、雙酚AD型等之酚酚醛清漆型環氧樹脂、o-甲酚酚醛清漆型等之甲酚酚醛清漆型環氧樹脂、雙酚A酚醛清漆型環氧樹脂、環狀脂肪族多官能環氧樹脂、縮水甘油酯型多官能環氧樹脂、縮水甘油胺型多官能環氧樹脂、雜環式多官能環氧樹脂、雙酚變性酚醛清漆型環氧樹脂、多官能變性酚醛清漆型環氧樹脂、酚類 與具有酚性羥基的芳香族醛之縮合物型環氧樹脂等。又,亦可使用於此等之樹脂中導入有Br、Cl等之鹵素原子者。此等之環氧樹脂係可單獨使用,又,亦可將2種以上混合使用。 Any one of the aforementioned polyfunctional epoxy resins can be used as long as it is a bifunctional or higher epoxy resin. Although the epoxy equivalent of the multifunctional epoxy resin is not particularly limited, it is preferably 1000 or less, and particularly preferably 100 to 500. Examples of polyfunctional epoxy resins include rubber-modified epoxy resins such as biphenyl type epoxy resins, naphthalene type epoxy resins, dicyclopentadiene type epoxy resins, and silicone modified epoxy resins. , Ε-caprolactone modified epoxy resin, bisphenol A type, bisphenol F type, bisphenol AD type and other phenol novolac type epoxy resin, o-cresol novolak type and other cresol novolac type ring Oxygen resin, bisphenol A novolac type epoxy resin, cycloaliphatic multifunctional epoxy resin, glycidyl ester type multifunctional epoxy resin, glycidylamine type multifunctional epoxy resin, heterocyclic multifunctional epoxy resin Resins, bisphenol modified novolac type epoxy resins, multifunctional modified novolac type epoxy resins, phenols Condensate type epoxy resin with aromatic aldehyde having phenolic hydroxyl group. In addition, it is also possible to use halogen atoms such as Br and Cl introduced into these resins. These epoxy resins can be used alone, or two or more of them can be mixed and used.

自由基聚合性不飽和單羧酸並無特別限定,可列舉例如:丙烯酸、甲基丙烯酸、巴豆酸、桂皮酸等,較佳為丙烯酸、甲基丙烯酸。此等之自由基聚合性不飽和單羧酸係可單獨使用,又,亦可將2種以上混合使用。 The radically polymerizable unsaturated monocarboxylic acid is not particularly limited, and examples thereof include acrylic acid, methacrylic acid, crotonic acid, and cinnamic acid, and acrylic acid and methacrylic acid are preferred. These radically polymerizable unsaturated monocarboxylic acids may be used alone, or two or more of them may be mixed and used.

環氧樹脂與自由基聚合性不飽和單羧酸之反應方法並無特別限定,例如,可藉由將環氧樹脂與自由基聚合性不飽和單羧酸在適當的稀釋劑中進行加熱而使其反應。 The reaction method of the epoxy resin and the radical polymerizable unsaturated monocarboxylic acid is not particularly limited. For example, the epoxy resin and the radical polymerizable unsaturated monocarboxylic acid can be heated in a suitable diluent. Its response.

多元酸或多元酸酐係用來與藉由前述環氧樹脂與自由基聚合性不飽和單羧酸之反應所生成的羥基進行反應,而將游離的羧基導入樹脂者。多元酸或其酐並無特別限定,飽和、不飽和之任一者皆可使用。多元酸係可列舉例如:琥珀酸、馬來酸、己二酸、檸檬酸、鄰苯二甲酸、四氫鄰苯二甲酸、3-甲基四氫鄰苯二甲酸、4-甲基四氫鄰苯二甲酸、3-乙基四氫鄰苯二甲酸、4-乙基四氫鄰苯二甲酸、六氫鄰苯二甲酸、3-甲基六氫鄰苯二甲酸、4-甲基六氫鄰苯二甲酸、3-乙基六氫鄰苯二甲酸、4-乙基六氫鄰苯二甲酸、甲基四氫鄰苯二甲酸、甲基六氫鄰苯二甲酸、橋聯亞甲基四氫鄰苯二甲酸、甲基橋聯亞甲基四氫鄰苯二甲酸、偏苯三甲酸、苯均四酸及二甘醇酸等,作為多 元酸酐係可列舉此等之酐。此等之化合物係可單獨使用,亦可將2種以上混合使用。 The polybasic acid or polybasic acid anhydride is used to react with the hydroxyl group generated by the reaction of the aforementioned epoxy resin and the radically polymerizable unsaturated monocarboxylic acid to introduce free carboxyl groups into the resin. The polybasic acid or its anhydride is not particularly limited, and either saturated or unsaturated can be used. Examples of polybasic acids include succinic acid, maleic acid, adipic acid, citric acid, phthalic acid, tetrahydrophthalic acid, 3-methyltetrahydrophthalic acid, 4-methyltetrahydro Phthalic acid, 3-ethyltetrahydrophthalic acid, 4-ethyltetrahydrophthalic acid, hexahydrophthalic acid, 3-methylhexahydrophthalic acid, 4-methylhexahydrophthalic acid Hydrophthalic acid, 3-ethylhexahydrophthalic acid, 4-ethylhexahydrophthalic acid, methyltetrahydrophthalic acid, methylhexahydrophthalic acid, bridged methylene Tetrahydrophthalic acid, methyl bridged methylene tetrahydrophthalic acid, trimellitic acid, pyromellitic acid and diglycolic acid, etc. Examples of the basic acid anhydride series include these anhydrides. These compounds can be used alone or in combination of two or more.

上述之多元酸變性不飽和單羧酸環氧樹脂雖也可作為含羧酸之感光性樹脂來使用,但亦可為因應需要,藉由使具有1個以上之自由基聚合性不飽和基及環氧基的縮水甘油基化合物與上述之多元酸變性不飽和單羧酸化環氧樹脂的羧基進行反應,進一步導入自由基聚合性不飽和基,而使感光性更加提昇的含羧基之感光性樹脂。 The above-mentioned polybasic acid-modified unsaturated monocarboxylic acid epoxy resin can also be used as a carboxylic acid-containing photosensitive resin, but it can also be used as required by having one or more radical polymerizable unsaturated groups and The epoxy glycidyl compound reacts with the carboxyl group of the above-mentioned polybasic acid-denatured unsaturated monocarboxylated epoxy resin to further introduce radical polymerizable unsaturated groups to further improve the sensitivity of the carboxyl-containing photosensitive resin .

使此感光性更加提昇的含羧基之感光性樹脂,是藉由前述縮水甘油基化合物的反應,自由基聚合性不飽和基鍵結於多元酸變性不飽和單羧酸化環氧樹脂骨架的側鏈,因此,光聚合反性性為高,而可具有優異的感光特性。作為具有1個以上之自由基聚合性不飽和基與環氧基的化合物係可列舉例如:丙烯酸縮水甘油酯、甲基丙烯酸縮水甘油酯、烯丙基縮水甘油醚、新戊四醇三丙烯酸酯單縮水甘油醚等。另外,縮水甘油基亦可於1分子中具有複數個。上述之具有1個以上之自由基聚合性不飽和基與環氧基的化合物係可單獨使用,亦可將2種以上混合使用。 The carboxyl group-containing photosensitive resin that enhances the photosensitivity is that by the reaction of the aforementioned glycidyl compound, the radically polymerizable unsaturated group is bonded to the side chain of the polybasic acid modified unsaturated monocarboxylated epoxy resin skeleton Therefore, the photopolymerization reversibility is high, and it can have excellent photosensitive properties. Examples of the compound system having one or more radically polymerizable unsaturated groups and epoxy groups include: glycidyl acrylate, glycidyl methacrylate, allyl glycidyl ether, and neopentyl erythritol triacrylate Monoglycidyl ether and so on. In addition, glycidyl groups may have a plurality in one molecule. The above-mentioned compound system having one or more radically polymerizable unsaturated groups and epoxy groups may be used alone or in combination of two or more kinds.

光聚合起始劑 Photopolymerization initiator

光聚合起始劑係只要一般所使用者則無特別限定,可列舉例如:乙酮,1-[9-乙基-6-(2-甲基苄醯基)-9H-咔唑-3-基]-1-(0-乙醯肟)等之肟系起始劑、安息香、安息香甲基 醚、安息香乙基醚、安息香異丙基醚、安息香-n-丁基醚、安息香異丁基醚、苯乙酮、二甲基胺基苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、2,2-二乙氧基-2-苯基苯乙酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、1-羥基環己基苯基酮、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉-丙烷-1-酮、4-(2-羥基乙氧基)苯基-2-(羥基-2-丙基)酮、二苯基酮、p-苯基二苯基酮、4,4′-二乙基胺基二苯基酮、二氯二苯基酮、2-甲基蒽醌、2-乙基蒽醌、2-tert-丁基蒽醌、2-胺基蒽醌、2-甲基噻噸酮、2-乙基噻噸酮、2-氯噻噸酮、2,4-二甲基噻噸酮、2,4-二乙基噻噸酮、苄基二甲基縮酮、苯乙酮二甲基縮酮、P-二甲基胺基苯甲酸乙酯等。此等係可單獨使用,亦可將2種以上混合使用。 The photopolymerization initiator is not particularly limited as long as the general user is used. Examples include ethyl ketone, 1-[9-ethyl-6-(2-methylbenzyl)-9H-carbazole-3- Base)-1-(0-acetoxime) and other oxime initiators, benzoin, benzoin methyl Ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin-n-butyl ether, benzoin isobutyl ether, acetophenone, dimethylaminoacetophenone, 2,2-dimethoxy-2 -Phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, 1-hydroxycyclohexylphenyl Ketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholine-propan-1-one, 4-(2-hydroxyethoxy)phenyl-2-(hydroxy- 2-propyl) ketone, diphenyl ketone, p-phenyl diphenyl ketone, 4,4′-diethylamino diphenyl ketone, dichloro diphenyl ketone, 2-methylanthraquinone, 2-ethylanthraquinone, 2-tert-butylanthraquinone, 2-aminoanthraquinone, 2-methylthioxanthone, 2-ethylthioxanthone, 2-chlorothioxanthone, 2,4- Dimethyl thioxanthone, 2,4-diethyl thioxanthone, benzyl dimethyl ketal, acetophenone dimethyl ketal, ethyl P-dimethylaminobenzoate, etc. These systems can be used alone, or two or more of them can be mixed and used.

光聚合起始劑之摻合量雖無特別限定,但較佳係相對於含羧基之感光性樹脂100質量份,為5~20質量份。 Although the blending amount of the photopolymerization initiator is not particularly limited, it is preferably 5 to 20 parts by mass relative to 100 parts by mass of the carboxyl group-containing photosensitive resin.

胺基甲酸酯(甲基)丙烯酸酯 Urethane (meth)acrylate

胺基甲酸酯(甲基)丙烯酸酯係對於得到具有柔軟性的硬化塗膜一事有所助益。胺基甲酸酯(甲基)丙烯酸酯係只要是使作為自由基聚合性不飽和單羧酸之(甲基)丙烯酸與胺基甲酸酯進行反應所得到的胺基甲酸酯(甲基)丙烯酸酯即可,並不限定於特定之化合物。胺基甲酸酯係使於1分子中具有2個以上之異氰酸酯基的化合物與於1分子中具有2個以上之羥基的多元醇化合物進行反應所得者。 The urethane (meth)acrylate system is helpful for obtaining a flexible hardened coating film. The urethane (meth)acrylate is a urethane (meth)acrylate obtained by reacting (meth)acrylic acid as a radically polymerizable unsaturated monocarboxylic acid with a urethane ) Acrylate is sufficient, and it is not limited to a specific compound. The urethane is obtained by reacting a compound having two or more isocyanate groups in one molecule with a polyol compound having two or more hydroxyl groups in one molecule.

作為於1分子中具有2個以上之異氰酸酯基的化合物雖無特別限定,但可列舉例如:六亞甲基二異氰酸酯(HDI)、異佛酮二異氰酸酯(IPDI)、亞甲基二異氰酸酯(MDI)、亞甲基雙環己基異氰酸酯、三甲基六甲基二異氰酸酯、己烷二異氰酸酯、六甲基胺二異氰酸酯、亞甲基雙環己基異氰酸酯、甲苯二異氰酸酯、1,2-二苯基乙烷二異氰酸酯、1,3-二苯基丙烷二異氰酸酯、二苯基甲烷二異氰酸酯、二環己基甲基二異氰酸酯等之二異氰酸酯。此等之化合物係可單獨使用,亦可將2種以上混合使用。 Although there are no particular limitations on the compound having two or more isocyanate groups in one molecule, examples include hexamethylene diisocyanate (HDI), isophorone diisocyanate (IPDI), and methylene diisocyanate (MDI). ), methylene biscyclohexyl isocyanate, trimethyl hexamethyl diisocyanate, hexane diisocyanate, hexamethylamine diisocyanate, methylene biscyclohexyl isocyanate, toluene diisocyanate, 1,2-diphenyl ethane Diisocyanate, 1,3-diphenylpropane diisocyanate, diphenylmethane diisocyanate, dicyclohexylmethyl diisocyanate and other diisocyanates. These compounds can be used alone or in combination of two or more.

於1分子中具有2個以上之羥基的多元醇化合物雖無特別限定,但可列舉例如:乙二醇、丙二醇、三亞甲基二醇、1,4-丁二醇、1,3-丁二醇、1,2-丁二醇、1,5-戊二醇、3-甲基-1,5-戊二醇、2,2-二甲基-1,3-丙二醇、新戊二醇、1,6-己二醇、2,2-二乙基-1,3-丙二醇、3,3-二羥甲基庚烷、2-乙基-2-丁基-1,3-丙二醇、1,12-十二烷二醇、1,18-十八烷二醇等之C2-C22烷烴二醇,或2-丁烯-1,4-二醇、2,6-二甲基-1-辛烯-3,8-二醇等之烯二醇等之脂肪族二醇;1,4-環己二醇、1,4-環己烷二甲醇等之脂環族二醇;甘油、2-甲基-2-羥甲基-1,3-丙二醇、2,4-二羥基-3-羥甲基戊烷、1,2,6-己三醇、三羥甲基乙烷、三羥甲基丙烷、2-甲基-2-羥甲基-1,3-丙二醇、2,4-二羥基-3-(羥甲基)戊烷、2,2-雙(羥甲基)-3-丁醇等之脂肪族三醇;四羥甲基甲烷、季戊四醇、二季戊四醇、木糖醇等之具有4個以上之羥基的多元醇等。此等之化合物係可單獨使用,亦可將2種以上 混合使用。 The polyol compound having two or more hydroxyl groups in one molecule is not particularly limited, but examples thereof include ethylene glycol, propylene glycol, trimethylene glycol, 1,4-butanediol, and 1,3-butanediol Alcohol, 1,2-butanediol, 1,5-pentanediol, 3-methyl-1,5-pentanediol, 2,2-dimethyl-1,3-propanediol, neopentyl glycol, 1,6-hexanediol, 2,2-diethyl-1,3-propanediol, 3,3-dimethylolheptane, 2-ethyl-2-butyl-1,3-propanediol, 1 , C 2 -C 22 alkane diols such as 12-dodecanediol, 1,18-octadecanediol, or 2-butene-1,4-diol, 2,6-dimethyl- Aliphatic diols such as 1-octene-3,8-diol and other enediols; alicyclic diols such as 1,4-cyclohexanediol and 1,4-cyclohexanedimethanol; glycerin , 2-methyl-2-hydroxymethyl-1,3-propanediol, 2,4-dihydroxy-3-hydroxymethylpentane, 1,2,6-hexanetriol, trimethylolethane, Trimethylolpropane, 2-methyl-2-hydroxymethyl-1,3-propanediol, 2,4-dihydroxy-3-(hydroxymethyl)pentane, 2,2-bis(hydroxymethyl) Aliphatic triols such as -3-butanol; polyols with more than 4 hydroxyl groups such as tetramethylolmethane, pentaerythritol, dipentaerythritol, and xylitol. These compounds can be used alone or in combination of two or more.

胺基甲酸酯(甲基)丙烯酸酯之摻合量雖無特別限定,但相對於含羧基之感光性樹脂100質量份,就提昇柔軟性的點而言,其下限值較佳為5質量份,特佳為10質量份。另一方面,就感光性的點而言,其上限值較佳為50質量份。 Although the blending amount of urethane (meth)acrylate is not particularly limited, the lower limit is preferably 5 in terms of improving flexibility with respect to 100 parts by mass of the carboxyl group-containing photosensitive resin. Parts by mass, particularly preferably 10 parts by mass. On the other hand, in terms of photosensitivity, the upper limit is preferably 50 parts by mass.

環氧化合物 Epoxy compound

環氧化合物係用以提高硬化塗膜之交聯密度而得到充分的強度之硬化塗膜者,例如,添加環氧樹脂。作為環氧樹脂係可列舉例如:雙酚A型環氧樹脂、酚醛清漆型環氧樹脂(酚酚醛清漆型環氧樹脂、o-甲酚酚醛清漆型環氧樹脂、p-tert-丁基酚酚醛清漆型等)、使表氯醇與雙酚F或雙酚S進行反應所得到的雙酚F型或雙酚S型環氧樹脂、進一步具有環己烷氧化物基、三環癸烷氧化物基、環戊烯氧化物基等之脂環式環氧樹脂、參(2,3-環氧丙基)異氰脲酸酯、三縮水甘油基參(2-羥乙基)異氰脲酸酯等之具有三嗪環之三縮水甘油基異氰脲酸酯、二環戊二烯型環氧樹脂、金剛烷型環氧樹脂。此等之化合物係可單獨使用,亦可將2種以上混合使用。 The epoxy compound is used to increase the crosslinking density of the cured coating film to obtain a cured coating film with sufficient strength, for example, epoxy resin is added. Examples of epoxy resins include bisphenol A epoxy resins, novolac epoxy resins (phenol novolac epoxy resins, o-cresol novolac epoxy resins, p-tert-butyl phenol Novolac type, etc.), bisphenol F type or bisphenol S type epoxy resin obtained by reacting epichlorohydrin with bisphenol F or bisphenol S, further having cyclohexane oxide group, tricyclodecane oxidation Cycloalicyclic epoxy resins such as compound base, cyclopentene oxide base, etc., ginseng (2,3-epoxypropyl) isocyanurate, triglycidyl ginseng (2-hydroxyethyl) isocyanurate Triglycidyl isocyanurate with triazine ring, dicyclopentadiene type epoxy resin, adamantane type epoxy resin such as acid ester. These compounds can be used alone or in combination of two or more.

環氧化合物之摻合量雖無特別限定,但就硬化後得到充分的強度之塗膜的點而言,相對於含羧基之感光性樹脂100質量份,較佳為10~50質量份,特佳為20~40質量份。 Although the blending amount of the epoxy compound is not particularly limited, it is preferably 10-50 parts by mass relative to 100 parts by mass of the carboxyl-containing photosensitive resin in terms of obtaining a coating film with sufficient strength after curing. Preferably it is 20-40 mass parts.

稀釋劑 Thinner

稀釋劑係用來調節感光性樹脂組成物之黏度或乾燥性者。於稀釋劑中係可列舉例如:作為非反應性稀釋劑之有機溶劑。作為有機溶劑係可列舉例如:甲基乙基酮、環己酮等之酮類、甲苯、二甲苯等之芳香族烴類、甲醇、異丙醇、環己醇等之醇類、環己烷、甲基環己烷等之脂環式烴類、石油醚、石腦油等之石油系溶劑類、賽路蘇、丁基賽路蘇等之賽路蘇類、卡必醇、丁基卡必醇等之卡必醇類、乙酸乙酯、乙酸丁酯、賽路蘇乙酸酯、丁基賽路蘇乙酸酯、卡必醇乙酸酯、丁基卡必醇乙酸酯、乙基二甘醇乙酸酯、二乙二醇單乙基醚乙酸酯等之酯類等。此等係可單獨使用,亦可將2種以上混合使用。 The thinner is used to adjust the viscosity or dryness of the photosensitive resin composition. Examples of the diluent include organic solvents that are non-reactive diluents. Examples of organic solvent systems include ketones such as methyl ethyl ketone and cyclohexanone, aromatic hydrocarbons such as toluene and xylene, alcohols such as methanol, isopropanol, and cyclohexanol, and cyclohexane. , Methylcyclohexane and other alicyclic hydrocarbons, petroleum ether, naphtha and other petroleum-based solvents, siloxu, butyl siloxu, carbitol, butyl card Carbitols such as carbitol, ethyl acetate, butyl acetate, cyrus acetate, butyl cyrus acetate, carbitol acetate, butyl carbitol acetate, ethyl acetate Diethylene glycol acetate, diethylene glycol monoethyl ether acetate and other esters. These systems can be used alone, or two or more of them can be mixed and used.

又,於感光性樹脂組成物中,亦可因應需要而摻合著色劑、體質顏料、各種添加劑、消泡劑、難燃劑等。 Moreover, in the photosensitive resin composition, colorants, extender pigments, various additives, defoamers, flame retardants, etc. may be blended as needed.

接著,針對本發明之硬化塗膜之形成方法,來說明其他實施形態例。於上述本發明之硬化塗膜之形成方法的實施形態例中,雖使用設置有通孔的基板,但可取而代之,為設置有盲孔的基板,亦可為未設置有通孔或盲孔的基板。又,亦可適用於設置有通孔與盲孔的基板。又,於本發明之硬化塗膜之形成方法中,塗佈區域並無特別限定,例如,可將藉由噴墨法所塗佈的第1硬化塗膜形成於基板全面或者基板之特定區域的全面,亦可於該第1 硬化塗膜上,以包含噴墨法之所期望的塗佈方法來形成第2硬化塗膜。又,亦可因應需要,而於第2硬化塗膜上進一步形成硬化塗膜。 Next, other embodiments of the method for forming the cured coating film of the present invention will be described. In the above-mentioned embodiment of the method for forming a hardened coating film of the present invention, although a substrate provided with through holes is used, it may be replaced by a substrate provided with blind holes, or may be a substrate not provided with through holes or blind holes. Substrate. It is also applicable to substrates provided with through holes and blind holes. Furthermore, in the method for forming a cured coating film of the present invention, the coating area is not particularly limited. For example, the first cured coating film applied by the inkjet method can be formed on the entire surface of the substrate or on a specific area of the substrate. Comprehensive, can also be in the first On the cured coating film, a second cured coating film is formed by a desired coating method including an inkjet method. In addition, if necessary, a cured coating film may be further formed on the second cured coating film.

[實施例] [Example]

以下,雖說明本發明之實施例,但本發明係只要不超過其趣旨,則不限定於此等之例。 Hereinafter, although the embodiments of the present invention are described, the present invention is not limited to these examples as long as it does not exceed the gist.

實施例1~4、比較例1~3 Examples 1~4, Comparative Examples 1~3

將下述表1所示之各成分以下述表1所示之摻合比例進行摻合,使用3輥機在室溫下進行混合分散來製作樹脂組成物,於此樹脂組成物中,進一步添加特定量之稀釋劑,而調製實施例1~4、比較例1~3所使用之感光性樹脂組成物。接著,將所調製之感光性樹脂組成物以下述方式進行塗佈,而製作試驗片。 The components shown in Table 1 below were blended at the blending ratios shown in Table 1 below, and mixed and dispersed using a 3-roller at room temperature to prepare a resin composition. To this resin composition, further add A specific amount of diluent was used to prepare the photosensitive resin compositions used in Examples 1 to 4 and Comparative Examples 1 to 3. Next, the prepared photosensitive resin composition was coated in the following manner to prepare a test piece.

Figure 106115157-A0202-12-0019-1
Figure 106115157-A0202-12-0019-1

試驗片製作步驟 Test piece production steps

基板:設置有內徑Φ150μm、深度70μm之通孔部的第1基板;設置有內徑Φ100μm、深度70μm之盲孔的第2基板 Substrate: the first substrate provided with a through hole with an inner diameter of Φ150μm and a depth of 70μm; the second substrate with a blind hole with an inner diameter of Φ100μm and a depth of 70μm

表面處理:酸處理(5質量%之硫酸水溶液) Surface treatment: acid treatment (5 mass% sulfuric acid aqueous solution)

表面處理後,使用噴射分配器(Nordson Advanced Technology公司製,載台主體Quantum Q-6800,分配噴射閥DJ-9500),將實施例1~4、比較例2~3之感光性樹脂組成物一打點一打點地塗佈於第1基板之各通孔、第2基板之各盲孔,並在此處,以UV照射機(USHIO電機公司製),使波長250~450nm之紫外線(光源:金屬鹵素燈)進行250mJ/cm2曝光(第1硬化處理)。以金屬鹵素燈進行之250mJ/cm2曝光的曝光時間為約5秒鐘。曝光之後,以實施例1~4、比較例1~3之感光性樹脂組成物,針對第1基板及第2基板之表面全體進行網版印刷。另外,網版印刷時之實施例1~4、比較例1~3之感光性樹脂組成物的黏度係調整為15000mPa.s。 After surface treatment, using a jet dispenser (manufactured by Nordson Advanced Technology, stage main body Quantum Q-6800, dispensing jet valve DJ-9500), the photosensitive resin composition 1 of Examples 1 to 4 and Comparative Examples 2 to 3 Dot by dot, apply to each through hole of the first substrate and each blind hole of the second substrate. Here, use a UV irradiator (manufactured by USHIO Electric Co.) to make ultraviolet rays with a wavelength of 250~450nm (light source: metal Halogen lamp) 250mJ/cm 2 exposure (first curing treatment). The exposure time of 250 mJ/cm 2 exposure with a metal halide lamp is about 5 seconds. After exposure, the photosensitive resin compositions of Examples 1 to 4 and Comparative Examples 1 to 3 were screen-printed on the entire surface of the first substrate and the second substrate. In addition, the viscosity of the photosensitive resin composition of Examples 1 to 4 and Comparative Examples 1 to 3 during screen printing was adjusted to 15000 mPa. s.

網版印刷之DRY膜厚:20~23μm DRY film thickness for screen printing: 20~23μm

預備乾燥:80℃、20分鐘 Preliminary drying: 80°C, 20 minutes

曝光(第2硬化處理):波長250~450nm(光源:金屬鹵素燈)、250mJ/cm2(Oak公司製,「HMW-680GW」) Exposure (second hardening treatment): wavelength 250~450nm (light source: metal halide lamp), 250mJ/cm 2 (manufactured by Oak Corporation, "HMW-680GW")

顯像:1質量%之碳酸鈉水溶液、60秒、噴霧壓0.2MPa Development: 1% by mass sodium carbonate aqueous solution, 60 seconds, spray pressure 0.2MPa

後硬化:150℃、30分鐘 Post-curing: 150°C, 30 minutes

另外,網版印刷之DRY膜厚係在未進行以噴射分配器所致之塗佈的部位進行測定。又,於比較例1中,並不進行以噴射分配器所致之塗佈,而僅進行網版印刷。 In addition, the DRY film thickness of the screen printing was measured at the part where the coating by the jet dispenser was not performed. In addition, in Comparative Example 1, coating by a jet dispenser was not performed, but only screen printing was performed.

評估 Evaluation

(1)黏度(mPa.s) (1) Viscosity (mPa.s)

使用布魯克非(Brookfield)B型黏度計,以實施例1~4及比較例1~3之感光性樹脂組成物的溫度25℃,測定50rpm之黏度。 Using a Brookfield B-type viscometer, the temperature of the photosensitive resin composition of Examples 1 to 4 and Comparative Examples 1 to 3 was 25° C., and the viscosity at 50 rpm was measured.

(2)通孔埋填性 (2) Through hole filling

針對試驗片之通孔部100個部位,以顯微鏡(×40倍)觀察實施例1~4及比較例1~3之感光性樹脂組成物是否填充、埋填,並計測所埋填之通孔部的數目。 For 100 parts of the through holes of the test piece, observe whether the photosensitive resin compositions of Examples 1 to 4 and Comparative Examples 1 to 3 are filled and filled with a microscope (×40 times), and measure the filled through holes The number of departments.

○:100個部位 ○: 100 parts

△:99~80個部位 △: 99~80 parts

×:79個部位以下 ×: Less than 79 parts

(3)盲孔埋填性 (3) Blind hole filling

針對試驗片之盲孔部100個部位,以顯微鏡(×40倍)觀察實施例1~4及比較例1~3之感光性樹脂組成物是否填充、埋填,並計測所埋填之盲孔部的數目。 For 100 blind holes of the test piece, observe whether the photosensitive resin composition of Examples 1 to 4 and Comparative Examples 1 to 3 are filled and buried with a microscope (×40 times), and measure the buried blind holes The number of departments.

○:100個部位 ○: 100 parts

×:99個部位以下 ×: Less than 99 parts

(4)塗膜均勻性 (4) Film uniformity

觀察試驗片之通孔部與盲孔部的剖面,測定噴射分配器塗佈部分的膜厚。藉由測定第2圖(於第2圖中係僅顯示第1基板作為例示)所示之a的部位,作為噴射分配器塗佈部分的膜厚。進而,目視評估第1基板及第2基板之塗膜外觀。 The cross section of the through hole and the blind hole of the test piece was observed, and the film thickness of the coating portion of the jet distributor was measured. By measuring the part a shown in Fig. 2 (in Fig. 2 only the first substrate is shown as an example), the film thickness of the coating portion of the jet dispenser was measured. Furthermore, the appearance of the coating film of the first substrate and the second substrate was visually evaluated.

○:噴射分配器塗佈部分的膜厚為10μm以下的突起,亦無色不均。 ○: The film thickness of the coating portion of the jet dispenser is a protrusion of 10 μm or less, and there is no color unevenness.

△:噴射分配器塗佈部分的膜厚雖為10μm以下的突起,但有色不均。 △: Although the film thickness of the coating portion of the jet dispenser is a protrusion of 10 μm or less, the color is uneven.

×:噴射分配器塗佈部分的膜厚超過10μm的突起。 ×: A protrusion with a film thickness of more than 10 μm in the coating portion of the jet dispenser.

將評估結果顯示於表2。 The evaluation results are shown in Table 2.

Figure 106115157-A0202-12-0022-2
Figure 106115157-A0202-12-0022-2

如表2所示般,若使用25℃之黏度為160~1200mPa.s的實施例1~4之感光性樹脂組成物,藉由噴墨法形成第1硬化塗膜後,藉由網版印刷法形成第2硬化塗膜,則可得到通孔埋填性、盲孔埋填性及塗膜均勻性優異的硬化塗膜。又,依據實施例2、3,若使用25℃ 之黏度為260~580mPa.s之感光性樹脂組成物,則通孔埋填性與塗膜均勻性更加提昇。 As shown in Table 2, if the viscosity is 160~1200mPa at 25℃. For the photosensitive resin compositions of Examples 1 to 4 of s, after forming the first cured coating film by the inkjet method, and then forming the second cured coating film by the screen printing method, it is possible to obtain through-hole filling and blinding properties. A hardened coating film with excellent hole filling properties and coating uniformity. Also, according to Examples 2 and 3, if 25°C is used The viscosity is 260~580mPa. The photosensitive resin composition of s improves the filling of via holes and the uniformity of the coating film.

另一方面,於25℃之黏度為3400mPa.s的比較例2之感光性樹脂組成物中,係塗膜成為凸狀,而無法得到塗膜均勻性。又,於25℃之黏度為110mPa.s的比較例3之感光性樹脂組成物中,所塗佈的感光性樹脂組成物大多經由通孔漏到第1基板的背側,而無法得到通孔埋填性。又,依據比較例1,僅藉由網版印刷法,通孔埋填性、盲孔埋填性皆無法得到。 On the other hand, the viscosity at 25°C is 3400mPa. In the photosensitive resin composition of Comparative Example 2 of s, the coating film became convex, and the uniformity of the coating film could not be obtained. Moreover, the viscosity at 25°C is 110mPa. In the photosensitive resin composition of Comparative Example 3 of s, the coated photosensitive resin composition often leaks to the back side of the first substrate through the through holes, and the through hole filling properties cannot be obtained. In addition, according to Comparative Example 1, only the screen printing method can not obtain the through hole filling property and the blind hole filling property.

實施例5~11、比較例4 Examples 5-11, Comparative Example 4

接著,作為第1硬化處理所使用之UV照射機,係取代以金屬鹵素燈作為上述光源之上述UV照射機,而使用以超高壓水銀燈作為光源之曝光裝置(USHIO電機公司製,型號UX-2123SM),將第1硬化處理之曝光量設為10~100mJ/cm2,除此之外,與實施例3相同地進行。亦即,於實施例5~11中,係使用實施例3之感光性樹脂組成物來形成硬化塗膜。超高壓水銀燈之波長係設為365nm、385nm、405nm。以超高壓水銀燈進行之30mJ/cm2曝光的曝光時間為未達1秒鐘。 Next, as the UV irradiator used in the first curing treatment, instead of the UV irradiator using a metal halide lamp as the light source, an exposure device (manufactured by USHIO Electric Co., Ltd., model UX-2123SM) using an ultra-high pressure mercury lamp as the light source was used. ), except that the exposure amount of the first hardening treatment is set to 10-100 mJ/cm 2 , it is performed in the same manner as in Example 3. That is, in Examples 5 to 11, the photosensitive resin composition of Example 3 was used to form a cured coating film. The wavelength of the ultra-high pressure mercury lamp is set to 365nm, 385nm, 405nm. The exposure time of 30mJ/cm 2 exposure with ultra-high pressure mercury lamp is less than 1 second.

將實施例5~11中之超高壓水銀燈之波長與曝光量、作為上述之評估項目之通孔埋填性、盲孔埋填性及塗膜均勻性的結果顯示於下述表3。另外,下述表3之比較例4,雖使用實施例3之感光性樹脂組成物,但無法進 行第1硬化處理。 The results of the wavelength and exposure of the ultra-high pressure mercury lamp in Examples 5 to 11, the through hole filling property, the blind hole filling property and the coating uniformity as the above evaluation items are shown in the following Table 3. In addition, in Comparative Example 4 in Table 3 below, although the photosensitive resin composition of Example 3 was used, it could not Line 1 hardening treatment.

Figure 106115157-A0202-12-0024-3
Figure 106115157-A0202-12-0024-3

如表3所示般,於以將超高壓水銀燈作為光源的曝光裝置進行10~100mJ/cm2曝光的實施例5~11,係365nm、385nm、405nm之任一波長皆可得到通孔埋填性、盲孔埋填性及塗膜均勻性優異的硬化塗膜。又,於曝光量30~100mJ/cm2之實施例5~9中,係可得到更優異的通孔埋填性。 As shown in Table 3, in Examples 5 to 11 where 10-100mJ/cm 2 exposure was carried out with an exposure device using an ultra-high pressure mercury lamp as the light source, any wavelength of 365nm, 385nm, 405nm can be filled with via holes A cured coating film with excellent properties, blind hole filling properties, and coating uniformity. In addition, in Examples 5 to 9 with an exposure amount of 30 to 100 mJ/cm 2 , more excellent through hole filling properties can be obtained.

又,依據實施例5,由於可得到優異的通孔埋填性、盲孔埋填性及塗膜均勻性之以超高壓水銀燈作為光源的30mJ/cm2曝光之曝光時間為未達1秒鐘,因此以超高壓水銀燈作為光源使用的第1硬化處理,相較於使用了金屬鹵素燈之實施例1~4的第1硬化處理,可縮短曝光所需要的時間,故生產性亦更加提昇。 In addition, according to Example 5, the exposure time of 30mJ/cm 2 exposure using ultra-high pressure mercury lamp as the light source is less than 1 second due to the excellent through hole filling property, blind hole filling property and coating uniformity. Therefore, the first hardening treatment using the ultra-high pressure mercury lamp as the light source can shorten the time required for exposure compared with the first hardening treatment of Examples 1 to 4 using metal halide lamps, so the productivity is also improved.

另一方面,即使是使用25℃時之黏度為260mPa.s的實施例3之感光性樹脂組成物,於不進行第1硬化處理(於本實施例中為曝光處理)的比較例4中,亦無法得到通孔埋填性。 On the other hand, the viscosity is 260mPa even at 25℃. In the photosensitive resin composition of Example 3 of s, even in Comparative Example 4 where the first curing treatment (exposure treatment in this embodiment) was not performed, the through-hole filling property could not be obtained.

[產業上之可利用性] [Industrial availability]

本發明之硬化塗膜之形成方法,係由於即使 於基板上設置通孔或盲孔,亦可將通孔或盲孔充分地埋填,並且使塗膜之厚度均勻化,因此,例如在電路基板之絕緣被膜的領域中利用價值為高。 The method of forming a hardened coating film of the present invention is due to By providing through holes or blind holes on the substrate, the through holes or blind holes can also be fully filled and the thickness of the coating film can be made uniform. Therefore, for example, the utility value is high in the field of the insulating film of the circuit substrate.

1‧‧‧第1感光性樹脂組成物 1.‧‧The first photosensitive resin composition

2‧‧‧第2感光性樹脂組成物 2‧‧‧The second photosensitive resin composition

3‧‧‧基板 3‧‧‧Substrate

4‧‧‧噴射分配器 4‧‧‧Jet distributor

5‧‧‧第1硬化處理 5‧‧‧The first hardening treatment

11‧‧‧第1硬化塗膜 11‧‧‧The first hardened coating

12‧‧‧第2硬化塗膜 12‧‧‧Second Hardening Film

31‧‧‧通孔 31‧‧‧Through hole

Claims (10)

一種硬化塗膜之形成方法,其特徵為,具有下列步驟:藉由使用噴射分配器的噴墨法,於基板上塗佈25℃時之黏度為120~3300mPa.s之第1感光性樹脂組成物的步驟、由前述所塗佈之第1感光性樹脂組成物,以第1硬化處理來形成第1硬化塗膜的步驟、於前述第1硬化塗膜上塗佈第2感光性樹脂組成物的步驟、以及由前述所塗佈之第2感光性樹脂組成物,以第2硬化處理來形成第2硬化塗膜的步驟,其中,前述第1感光性樹脂組成物係塗佈於前述基板之通孔及/或盲孔。 A method for forming a hardened coating film, which is characterized by having the following steps: by using an inkjet method using a jet dispenser, coating the substrate with a viscosity of 120~3300mPa at 25°C. s step of the first photosensitive resin composition, the step of forming a first cured coating film from the first photosensitive resin composition applied as described above by the first curing treatment, coating on the first cured coating film The step of applying the second photosensitive resin composition, and the step of forming a second cured coating film from the second photosensitive resin composition applied above by a second curing treatment, wherein the first photosensitive resin composition The substance is coated on the through holes and/or blind holes of the aforementioned substrate. 如請求項1之硬化塗膜之形成方法,其中,前述第2感光性樹脂組成物之塗佈方法係網版印刷法、噴墨法、輥塗佈法、刮棒塗佈法、噴塗法、淋幕式塗佈法、刮板法、塗抹法、刮刀式塗佈法、刀塗法或者凹版塗佈法。 The method for forming a cured coating film according to claim 1, wherein the coating method of the second photosensitive resin composition is screen printing, inkjet, roll coating, bar coating, spray coating, Curtain coating method, doctor blade method, smear method, knife coating method, knife coating method or gravure coating method. 如請求項1之硬化塗膜之形成方法,其係於前述第1硬化塗膜上,以噴墨法以外的其他塗佈方法來塗佈前述第2感光性樹脂組成物。 The method for forming a cured coating film according to claim 1, which is to coat the second photosensitive resin composition on the first cured coating film by a coating method other than the inkjet method. 如請求項3之硬化塗膜之形成方法,其中,前述其他塗佈方法係網版印刷法、輥塗佈法、刮棒塗佈法、噴塗法、淋幕式塗佈法、刮板法、塗抹法、刮刀式塗佈法、刀 塗法或者凹版塗佈法。 Such as the method for forming a hardened coating film of claim 3, wherein the aforementioned other coating methods are screen printing method, roll coating method, bar coating method, spraying method, curtain coating method, doctor blade method, Smearing method, doctor blade coating method, knife Coating method or gravure coating method. 如請求項1或2之硬化塗膜之形成方法,其中,前述第1感光性樹脂組成物之25℃時的黏度為200~1000mPa.s。 The method for forming a hardened coating film of claim 1 or 2, wherein the viscosity of the first photosensitive resin composition at 25°C is 200~1000mPa. s. 如請求項1或2之硬化塗膜之形成方法,其中,前述第2感光性樹脂組成物之25℃時的黏度為120~60000mPa.s。 The method for forming a hardened coating film of claim 1 or 2, wherein the viscosity of the second photosensitive resin composition at 25°C is 120 to 60000 mPa. s. 如請求項1或2之硬化塗膜之形成方法,其中,前述第1感光性樹脂組成物係與前述第2感光性樹脂組成物相同的組成物。 The method for forming a cured coating film according to claim 1 or 2, wherein the first photosensitive resin composition is the same composition as the second photosensitive resin composition. 如請求項1或2之硬化塗膜之形成方法,其中,前述第1硬化處理係以活性能量線進行之曝光處理或者熱處理。 The method for forming a cured coating film according to claim 1 or 2, wherein the first curing treatment is exposure treatment or heat treatment performed by active energy rays. 如請求項8之硬化塗膜之形成方法,其中,以前述活性能量線進行之曝光處理的曝光量為30~500mJ/cm2The method for forming a hardened coating film according to claim 8, wherein the exposure amount of the exposure treatment with the active energy rays is 30 to 500 mJ/cm 2 . 如請求項1或2之硬化塗膜之形成方法,其中,前述第2硬化處理係以活性能量線進行之曝光處理或者熱處理。 The method for forming a cured coating film according to claim 1 or 2, wherein the second curing treatment is exposure treatment or heat treatment performed by active energy rays.
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