TWI708107B - Pixel array substrate - Google Patents

Abstract

A pixel array substrate including a substrate, scan line groups, data lines, touch sensing lines, and a common electrode is provided. Each scan line group includes a first and a second scan lines each having a pixel section and a transition section. The transition section of the first scan line spaces from the transition section of the second scan line by a first distance. The pixel section of the first scan line spaces from the pixel section of the second scan line by a second distance smaller than the first distance. The data lines and the touch sensing lines are arranged alternatively. The common electrode includes an electrode portion overlapping the pixel structures, a contact portion and a connection portion. The contact portion is located between the transition section of one first scan line and the transition section of one second scan line and electrically connected to one touch sensing line. The connection portion crosses over one transition section to connect between the electrode portion and the contact portion.

Description

Pixel array substrate

The present invention relates to a substrate of an electronic device, and particularly relates to a pixel array substrate.

In order to integrate the touch function in the display panel, generally two integration technologies can be used, namely, an externally attached type and an in-cell type. The integration of touch and display with in-cell technology can achieve the advantages of thinner overall device thickness and lighter weight, so it is widely used. The in-cell touch display panel can use the conductive layer in the pixel array substrate to form touch electrodes and touch circuits, or fabricate touch electrodes and circuits on the pixel array substrate. At this time, the pixel array substrate includes lines for display and lines for touch, which may cause different lines to increase mutual load. Therefore, avoiding the line load from affecting the performance of the display or touch function is an issue that needs to be considered when planning and manufacturing the pixel array substrate.

The present invention provides a pixel array substrate, which can reduce the load caused by touch-related circuits to display-related circuits and provide good touch and display performance.

The pixel array substrate of the present invention includes a substrate, multiple scan line groups, multiple data lines, multiple touch signal lines, multiple pixel structures, and common electrodes. The scan line group is arranged on the substrate. Each scan line group includes a first scan line and a second scan line. Each of the first scan line and the second scan line includes a pixel segment and a transitional segment of the subsequent pixel segment. The transition section of the first scan line and the transition section of the second scan line are separated by at least a first distance, and the pixel section of the first scan line and the pixel section of the second scan line are separated by at least a second distance, And the first distance is greater than the second distance. The data lines are arranged on the substrate, and each data line extends to the interlaced scan line group. The touch signal lines are arranged on the substrate, and each touch signal line extends the interlaced scanning line group, and the data lines and the touch signal lines are arranged alternately. The pixel structures are arranged on the substrate and arranged in an array. Each scan line group is located between two adjacent pixel structures. The common electrode is disposed on the substrate, and the common electrode includes an electrode part, a contact part and a connection part. The electrode portion overlaps the pixel structure. The contact portion is located between the transition section of the first scan line and the transition section of the second scan line in one of the scan line groups and is electrically connected to one of the touch signal lines. The connecting part traverses one of the transition sections to connect between the electrode part and the contact part.

Based on the above, the pixel array substrate of the embodiment of the present invention can use the pattern design of the scan line to make the touch electrode and the corresponding touch signal line contact point under the structure of half source driving the pixel array. It is located between the adjacent scan lines and the area of the contact point does not overlap the scan line. In this way, the load caused by the touch electrode to the scan line can be reduced, so that the scan line does not need to be widened in response to the increase in the load, thereby helping to reduce the frame width.

In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail in conjunction with the accompanying drawings.

100, 200: pixel array substrate

110: substrate

120, 120A, 120B: scan line group

122: first scan line

1222, 1242: pixel segment

1222A, 1242A: widened part

1224, 1244: Transition section

1226, 1246: turning section

124: second scan line

130: data line

140, 140A, 140B: touch signal cable

150, 250: Pixel structure

150A: The first pixel structure

150B: second pixel structure

152, 152A, 152B: active components

154, 254: pixel electrode

154S, 262S: slit

160, 260: common electrode

162, 262: Electrode section

162A: Hole

164, 264: Contact part

166, 266: connecting part

170: Conduction electrode

182: gate insulation

184: The first protective layer

186: The second protective layer

192, 192A, 192B: first contact hole

194: second contact hole

290: contact hole

A: area

C: semiconductor layer

D: Dip pole

D1: direction

DA: first end

DB: second end

DC: Drain contact

D192A, D194, D290: size

G: Gate

G1: first distance

G2: second distance

I-I’, II-II’, III-III’, IV-IV’: Sectional line

LO: overlapping length

LS: interval length

P1, P2: gap

W166: width

FIG. 1A is a top view of a pixel array substrate according to an embodiment of the invention.

Fig. 1B is an enlarged view of area A in Fig. 1A.

FIG. 2 is a schematic diagram of a scan line group according to an embodiment of the invention.

FIG. 3 is a schematic diagram of a scan line group and a semiconductor layer according to an embodiment of the invention.

4 is a schematic diagram of data lines, touch signal lines, and active components arranged on the structure of FIG. 3 according to an embodiment of the present invention.

FIG. 5 is a schematic diagram of a common electrode according to an embodiment of the invention.

Fig. 6 is a schematic cross-sectional view taken along the line I-I' and II-II' of Fig. 1A.

FIG. 7 is a partial schematic diagram of a pixel array substrate according to an embodiment of the invention.

Fig. 8 is a cross-sectional view taken along the line III-III' and IV-IV' of Fig. 7.

FIG. 1A is a top view of a pixel array substrate according to an embodiment of the present invention, and FIG. 1B is an enlarged view of area A in FIG. 1A. 1A and 1B, the pixel array substrate 100 includes a substrate 110, a plurality of scan line groups 120, a plurality of data lines 130, a plurality of touch signal lines 140, a plurality of pixel structures 150, and a common electrode 160. Scan line group 120, the data line 130, the touch signal line 140, the pixel structure 150 and the common electrode 160 are all disposed on the substrate 110. The plurality of pixel structures 150 are arranged on the substrate 110 in an array. The scan line group 120, the data line 130, the touch signal line 140, the pixel structure 150, the common electrode 160 and the substrate 110 integrally constitute the pixel array substrate 100. In this embodiment, the pixel structure 150 can provide a display driving electric field under the signal control of the scan line group 120 and the data line 130 to realize the display operation. In this embodiment, the pixel array substrate 100 further includes a conductive electrode 170, and the conductive electrode 170 electrically connects the common electrode 160 and the corresponding touch signal line 140. In this way, the common electrode 160 can realize the touch sensing operation under the signal control and transmission of the touch signal line 140. Therefore, the pixel array substrate 100 can be applied to a touch display device to realize the dual functions of touch and display.

In this embodiment, the scan line groups 120 each include a pair of first scan lines 122 and second scan lines 124, and each scan line group 120 is located between the pixel structures 150 in two adjacent columns. In other words, there is no pixel structure 150 between the first scan line 122 and the second scan line 124 in the same scan line group 120. The extension direction of each data line 130 is staggered with the scan line group 120, and the extension direction of each touch signal line 140 is also staggered with the scan line group 120. The data lines 130 and the touch signal lines 140 are alternately arranged. 1A and 1B, a touch signal line 140 is provided between two adjacent data lines 130, and a data line 130 is provided between two adjacent touch signal lines 140. In addition, each pixel structure 150 is disposed between two adjacent scan line groups 120, and is located between one of the data lines 130 and one of the touch signal lines 140 between. Each pixel structure 150 includes an active device 152 and a pixel electrode 154. The active device 152 includes a gate G, a semiconductor layer C, a source S and a drain D, and the pixel electrode 154 is connected to the drain D and electrically connected to the active Component 152.

FIG. 2 is a schematic diagram of a scan line group according to an embodiment of the invention. 1A, 1B and FIG. 2 at the same time, each scan line group 120 includes a first scan line 122 and a second scan line 124. Each of the first scan line 122 and the second scan line 124 is made of metal or an alternative material with good conductivity, and can be divided into a plurality of sections according to the pattern design. Each first scan line 122 includes alternately connected pixel segments 1222 and transition segments 1224. Each transition segment 1224 is connected to one of the pixel segments 1222, and each pixel segment 1222 is connected to one of the transition segments 1224. Similarly, each second scan line 124 includes alternately connected pixel segments 1242 and transition segments 1244. Each transition segment 1244 is connected to one of the pixel segments 1242, and each pixel segment 1242 is connected to one of the transition segments 1244. In addition, the first scan line 122 further includes a turning section 1226 connected between the pixel section 1222 and the transition section 1224, and the extension direction of the turning section 1226 intersects the pixel section 1222 and the transition section 1224. The second scan line 124 further includes a turning section 1246 connected between the pixel section 1242 and the transition section 1244, and the extension direction of the turning section 1246 intersects the pixel section 1242 and the transition section 1244. In this way, the first scan line 122 and the second scan line 124 are respectively curved transmission lines.

In this embodiment, the transition section 1224 of the first scan line 122 and the transition section 1244 of the second scan line 124 are at least separated by a first distance G1, and the pixel section 1222 of the first scan line 122 and the second scan line 124 pixel segments at least 1242 separated The second distance G2, and the first distance G1 is greater than the second distance G2. In other words, the pixel segment 1222 of each first scan line 122 is closer to the second scan line 124 in the same scan line group 120 than the transition segment 1224, and the pixel segment 1242 of each second scan line 124 is relatively It is closer to the first scan line 122 in the same scan line group 120 than the transition section 1244, so as to reserve a larger space between the transition section 1224 and the transition section 1244. In some embodiments, the first distance G1 may be 12 μm to 15 μm, and the second distance G2 may be 3.5 μm to 4 μm.

In FIGS. 1A, 1B, and 2, the segment layouts of different scan line groups 120 may not be aligned. For example, in the two scan line groups 120 shown in FIG. 2, the pixel segment of each scan line group 120 is shifted by a distance relative to the pixel segment of the other scan line group 120. In this way, the pattern designs of the two scan line groups 120 are misaligned rather than aligned with each other. In addition, in the same scan line group 120, the first scan line 122 and the second scan line 124 can optionally be mirror-symmetric to each other.

As can be seen from FIGS. 1A, 1B and FIG. 2, the pixel segment 1222 of the first scan line 122 has a widened portion 1222A, and there is a gap P1 between the widened portion 1222A and the turning section 1226 of the first scan line 122. The pixel section 1242 of the second scan line 124 has a widened portion 1242A, and the widened portion 1242A and the turning section 1246 of the second scan line 124 are separated by a gap P2. In this embodiment, the widened portion 1222A and the widened portion 1242A are used to form the gate G of the active device 152 in each pixel structure 150 of FIGS. 1A and 1B. However, in other embodiments, the layout of the gate G and the scan line can be adjusted according to different requirements, and it is not limited to include the widening portion 1222A and the widening portion. 1224A. The gap P1 and the gap P2 may each be 12 μm to 14 μm.

FIG. 3 is a schematic diagram of a scan line group and a semiconductor layer according to an embodiment of the invention. 1A, 1B and FIG. 3, the widening portion 1222A of the first scan line 122 and the widening portion 1242A of the second scan line 124 are used to define the active element 152 in each pixel structure 150 of FIGS. 1A and 1B The gate G. Therefore, in the pixel array substrate 100, part of the semiconductor layer C is respectively arranged on the widened portion 1222A of the pixel section 1222 of the first scan line 122, and another part of the semiconductor layer C is respectively arranged on the pixel section of the second scan line 124 The widening of 1242 1242A. The semiconductor layer C is made of semiconductor material, which can have different carrier mobility under different electric fields, so as to control the turning on and off of the active device 152. The semiconductor material may include polycrystalline silicon, amorphous silicon, microcrystalline silicon, semiconductor oxide, organic semiconductor materials, and the like.

4 is a schematic diagram of data lines, touch signal lines, and active components arranged on the structure of FIG. 3 according to an embodiment of the present invention. Referring to FIGS. 1A, 1B and 4 at the same time, the data lines 130 and the touch signal lines 140 are alternately arranged along the lateral direction of the figure. The extension direction of each data line 130 intersects the scan line group 120, and the extension direction of each touch signal line 140 also intersects the scan line group 120. In addition, each data line 130 traverses the pixel segment 1222 of the first scan line 122 and the pixel segment 1242 of the second scan line 124 of the corresponding scan line group 120, and each touch signal line 140 traverses the corresponding The transition section 1224 of the first scan line 122 and the transition section 1244 of the second scan line 124 of the scan line group 120. In some embodiments, the separation distance between the data line 130 and the touch signal line 140 can be kept constant to avoid interference with each other's signals. The material line 130 and the touch signal line 140 are parallel to each other.

Each data line 130 traverses the gate G on the corresponding pixel segment 1222 or 1224 and the semiconductor layer C on the corresponding gate G. When the data line 130 and the touch signal line 140 are fabricated, the source S and the drain D of each active element 152 are also fabricated. Therefore, the source S, the drain D, the data line 130 and the touch signal line 140 are composed of the same film layer. In this embodiment, the source S may be formed by a part of the corresponding data line 130 that crosses the gate G, and is electrically connected to the corresponding data line 130. However, in other embodiments, the source S can optionally be formed by a branch extending from the data line 130. The drain D is composed of a conductor pattern independent of the data line 130 and the source S. The source electrode S and the drain electrode D both overlap the semiconductor layer C and may both contact the semiconductor layer C.

In FIGS. 1A, 1B and 4, the active devices 152 of the two pixel structures 150 located on opposite sides of the same data line 130 are connected to different scan line groups 120, respectively. In FIG. 4, the active device 152A is connected to the first scan line 122 of the scan line group 120A, and the active device 152B is connected to the second scan line 124 of the scan line group 120B. As such, the pixel structure 150 corresponding to the active device 152A is located on the first side of one of the data lines 130 and the pixel structure 150 corresponding to the active device 152B is located on the second side of the same data line 130, and the first side and the second side The two sides are opposite sides. Here, the pixel segment of the first scan line 122 and the pixel segment of the second scan line 124 of the scan line group 120A are located between one of the data lines 130 and one of the touch signal lines 140A, and the first scan line group 120B The pixel segment of one scan line 122 and the pixel segment of the second scan line 124 are located between the same data line 130 and another touch signal line 140B, In addition, the touch signal line 140A and the touch signal line 140B are located on opposite sides of the data line 130.

For the convenience of description, the following uses the first pixel structure 150A and the second pixel structure 150B to illustrate the pixel structure 150 located on the first side of one of the data lines 130 and the pixel located on the second side of the same data line 130. Structure 150. In this embodiment, the active element 152A of the first pixel structure 150A and the active element 152B of the second pixel structure 150B are respectively connected to the next two scan line groups 120A and 120B. The drain D of the active device 152A of the first pixel structure 150A is closer to the touch signal line 140A on the first side of the corresponding data line 130 than the gate G. The drain D of the active device 152B of the second pixel structure 150B is closer to the touch signal line 140B on the second side of the corresponding data line 130 than the gate G, and the first side and the second side are opposite sides.

The drain D of each active element 152A or 152B may include a first terminal DA, a second terminal DB, and a drain contact part DC, wherein the drain contact part DC is located between the first terminal DA and the second terminal DB, and the first terminal The end DA overlaps the gate G and the second end DB overlaps the turning section (1226 or 1246) of the corresponding scan line (122 or 124). For the active device 152B marked in FIG. 4, its drain D overlaps the gate G, extends from the gate G toward the turning section 1246 and traverses the gap P2 between the gate G and the turning section 1246, and the drain contacts The part DC is located in the gap P2. Therefore, the drain D and the overlapping gate G also overlap the turning section 1246. In this embodiment, the width of the gap P2 (or the gap P1 in FIG. 2) can be set to be sufficient to accommodate the drain contact portion DC, and the drain contact portion DC can have There is enough area for subsequent components to contact.

The data lines 130, the touch signal lines 140, and the drain electrode D are formed by patterning the same film layer (for example, a metal layer or other conductive material layer). During the manufacturing process, the data line 130, the touch signal line 140, and the drain electrode D may be laterally displaced relative to the predetermined setting position due to alignment errors during the manufacturing process. Assuming that the data line 130, the touch signal line 140, and the drain D are offset in the direction D1 relative to the predetermined position, the overlap area of the drain D and the gate G of the active device 152A will be reduced, but the drain D of the active device 152A and The overlapping area of the turning section 1226 of the corresponding first scan line 122 will increase. In this way, the parasitic capacitance (which can be referred to as the gate-drain capacitance Cgd) formed by the drain D of the active device 152A and the first scan line 122 overlapping each other can be close to the preset size, and will not change due to alignment errors .

In addition, under the same displacement, the overlap area of the drain D of the active device 152B and the gate G will increase, but the overlap area of the drain D of the active device 152B and the corresponding turning section 1246 of the second scan line 124 Will decrease. In this way, the parasitic capacitance formed by the drain D of the active device 152B and the corresponding second scan line 124 due to overlap with each other can also be close to the preset size, and does not change due to alignment errors. In general, the active device 152A and the active device 152B are located on opposite sides of the corresponding data line 130, and the drain D of the active device 152A and the drain D of the active device 152B extend in opposite directions from the corresponding data line 130. However, one end of the drain D of the active device 152A away from the corresponding data line 130 overlaps the corresponding turning section 1226 of the first scan line 122, and the drain D of the active device 152B is away from one of the corresponding data lines 130. The end overlaps the corresponding turning section 1246 of the second scan line 124, so that no matter if the film layer of the drain D moves in the direction D1 relative to the preset position or moves in the opposite direction of the direction D1, the drains of all the active devices 152 The overlap area between D and the corresponding scan line can be maintained approximately constant. In this way, even if an alignment error occurs, the gate-drain capacitances of all active devices 152 in the pixel array substrate 100 still remain approximately similar to provide consistent charging characteristics.

FIG. 5 is a schematic diagram of a common electrode according to an embodiment of the present invention, wherein FIG. 5 shows that the common electrode is arranged on the structure of FIG. 4. 1A, 1B and FIG. 5 at the same time, the common electrode 160 includes an electrode portion 162, a contact portion 164 and a connection portion 166. The contact portion 164 is located between the transition section 1224 of the first scan line 122 and the transition section 1244 of the second scan line 124 of one of the scan line groups 120. The connecting portion 166 crosses the transition section 1224 of the first scan line 122 of the corresponding scan line group 120 to be connected between the electrode portion 162 and the contact portion 164. The electrode portion 162 substantially extends between two adjacent scan line groups 120. Specifically, the common electrode 160 may be divided into a plurality of electrode portions 162, a plurality of connection portions 166, and a plurality of contact portions 164. A portion of the connecting portion 166 crosses the transition section 1224 of the first scan line 122 of the corresponding scan line group 120 to connect the corresponding electrode portion 162 and the contact portion 164 together, and another portion crosses the transition section 1224 of the corresponding scan line group 120 The transition section 1244 of the second scan line 124 connects the corresponding electrode portion 162 and the contact portion 164 together.

The electrode portion 162 may have an opening 162A, and the opening 162A correspondingly exposes the touch signal line 140, which helps to reduce the common electrode 160 and the touch signal line 140 The coupling between them helps to improve the touch sensing sensitivity of the common electrode 160. In addition, the electrode portion 162 may traverse and overlap the data lines 130, but not traverse the first scan line 122 and the second scan line 124. In this embodiment, the electrode portion 162 of the common electrode 160 can optionally overlap a part of the gate G (for example, the widened portion 1222A or 1242A in FIG. 2), and not overlap the scan line connected to the gate G The rest. For example, the electrode portion 162 may not overlap the transition section (1224 or 1244) of any scan line (122 or 124). In some embodiments, the overlap length LO of the electrode portion 162 overlapping the gate electrode G may be 1 μm to 3.5 μm, for example, about 1.5 μm, and the interval length LS between the electrode portion 162 and the transition section 1224 or 1244 may be 1 μm to 3 μm. For example, it is about 1.5 microns.

In addition, the contact portion 164 is separated from the first scan line 122 or the second scan line 124 of the corresponding scan line group 120 by a third distance G3, and the third distance G3 is greater than zero so that the contact portion 164 is not connected to the corresponding first scan line. The scan line 122 or the second scan line 124 overlap. The connecting portion 166 overlaps the corresponding transition section 1224 or 1244, and the width W166 of the connecting portion 166 is significantly reduced relative to the width of the contact portion 164. For example, the width W166 is about 4 to 5 microns. Therefore, the overlapping area of the connecting portion 166 and the scan line (122 or 124) and the overlapping area of the electrode portion 162 and the scan line (122 or 124) are not large, and the other parts of the common electrode 160 do not overlap the scan line (122 or 124). This helps to prevent the common electrode 160 and the scan line group 120 from causing a load to each other, thereby stabilizing the signal transmission quality of the scan line (122 or 124), and ensuring the touch sensitivity of the common electrode 160.

Please continue to refer to FIGS. 1A, 1B and 5, where FIGS. 1A and 1B show that the pixel electrodes 154 of each pixel structure 150 are arranged on the structure of FIG. 5. The pixel electrode 154 of the pixel structure 150 overlaps the electrode portion 162 of the common electrode 160 and has a plurality of slits 154S. In this way, the slit 154S of the pixel electrode 154 can expose a partial area of the electrode portion 162 of the common electrode 160 to form a fringe field switch (FFS) pixel structure.

In addition, as shown in FIGS. 1A and 1B, the pixel array substrate 100 further includes a conductive electrode 170. The conductive electrode 170 is disposed on the substrate 110 and connected between the contact portion 164 of the common electrode 160 and one of the touch signal lines 140, and the conductive electrode 170 and the pixel electrode 154 are the same film layer. Here, the contact portion 164 and the conductive electrode 170 may be completely located between the first scan line 122 and the second scan line 124 corresponding to one scan line group 120. In some embodiments, the contact portion 164 and the conductive electrode 170 do not overlap the first scan line 122 and the second scan line 124 of the corresponding scan line group 120, thereby reducing the load on the scan line group 120 caused by the common electrode 160 This helps stabilize the transmission quality of the scan line group 120. At the same time, the common electrode 160 can also provide good touch sensitivity.

Fig. 6 is a schematic cross-sectional view taken along the line I-I' and II-II' of Fig. 1A. 1A, 1B and FIG. 6 at the same time, the pixel array substrate 100 includes a substrate 110, a plurality of scan line groups 120, a plurality of data lines 130, a plurality of touch signal lines 140, a plurality of pixel structures 150, a common electrode In addition to the conductive electrodes 160 and 170, the gate insulating layer 182, the first protective layer 184 and the second protective layer 186 are further included. Gate insulating layer 182, first protective layer 184 The second protective layer 186 is an insulating material disposed on the substrate 110 to isolate different conductive layers.

The gate insulating layer 182 is fabricated on the substrate 110 after the structure of FIG. 2 is fabricated. Therefore, the gate insulating layer 182 covers the scan line group 120 and also covers the gate G of each active device 152. The material of the gate insulating layer 182 includes silicon oxide, silicon nitride, silicon oxynitride or other alternative insulating materials. After the gate insulating layer 182 is formed on the substrate 110, the semiconductor layer C of FIG. 3 and the structure of FIG. 4 are sequentially formed on the substrate 110. Therefore, the semiconductor layer C is disposed on the gate insulating layer 182, and the data line 130 and the touch signal line 140 are also disposed on the gate insulating layer 182. After the structure of FIG. 4 is completed, the active element 152 of each pixel structure 150 is completed.

Next, a first protection layer 184 is formed on the substrate 110, and the first protection layer 184 covers the active device 152, the data line 130 and the touch signal line 140. The material of the first protection layer 184 may be an organic insulating material, an inorganic insulating material, or a stack of multiple insulating materials. Next, the common electrode 160 of FIG. 5 is formed on the first protection layer 184. The first protection layer 184 can provide a planarization effect, and therefore the common electrode 160 can be formed on a relatively flat surface provided by the first protection layer 184. After that, a second protection layer 186 is formed on the common electrode 160 to cover the common electrode 160. The material of the second protection layer 186 includes silicon oxide, silicon nitride, silicon oxynitride or other alternative insulating materials.

In order to realize the connection between the components, a patterning process can be performed after the formation of the second protective layer 186, so as to form a shape in the first protective layer 184 and the second protective layer 186. Into the corresponding contact hole. For example, this patterning step can form a first contact hole 192 penetrating the first protection layer 184 and the second protection layer 186 and a second contact hole 194 penetrating the second protection layer 186. In the pixel array substrate 100, there are two types of first contact holes 192 penetrating the first protection layer 184 and the second protection layer 186. The first contact hole 192A corresponds to the touch signal line 140, and the first contact hole 192B Corresponds to drain D. 1A, 1B and FIG. 6, it can be seen that the first contact hole 192A is located between the first scan line 122 and the second scan line 124 of the scan line group 120, and the first contact hole 192B is located at the drain contact portion of the drain D On DC. In addition, the second contact hole 194 is located on the contact portion 164 of the common electrode 160.

After making the first contact holes 192A, 192B and the second contact hole 194, the pixel electrode 154 and the conductive electrode 170 are formed on the substrate 110, and the pixel electrode 154 and the conductive electrode 170 are arranged on the second protective layer 186 to complete the picture. 1A, 1B and the pixel array substrate 100 of FIG. 6. Here, the conductive electrode 170 continuously extends between the first contact hole 192A and the second contact hole 194. Since the first contact hole 192A exposes the touch signal line 140 and the second contact hole 194 exposes the contact portion 164 of the common electrode 160, the conductive electrode 170 can contact the touch signal line 140 in the first contact hole 192A and in the second contact hole 194 contacts the contact portion 164 of the common electrode 160. In this way, the common electrode 160 can be electrically connected to the touch signal line 140 through the conductive electrode 170.

In FIGS. 1A and 1B, the first contact hole 192A, the second contact hole 194, the conductive electrode 170, and the contact portion 164 of the common electrode 160 are all located in the transition section 1224 and the second scan line 122 of the scan line group 120. Transition section of scan line 124 Between 1244. The connection structure of the common electrode 160 electrically connected to the touch signal line 140 is completely located in the first scan line 122 and the second scan line 124, so there is no need to sacrifice the area of the pixel electrode 154 to realize the connection between the common electrode 160 and the touch signal line 140. Electrical connection. The size D192A of the first contact hole 192A between the first scan line 122 and the second scan line 124 and the size D194 of the second contact hole 194 between the first scan line 122 and the second scan line 124 are both smaller than in the first scan The first distance G1 between the line 122 and the second scan line 124. Therefore, the first contact hole 192A, the second contact hole 194, the conductive electrode 170, and the contact portion 164 of the common electrode 160 do not overlap the scan line group 120. In some embodiments, the size D192A and the size D194 may be 10 μm to 11 μm, respectively. In this way, the load on the scan line group 120 caused by the signals of the touch signal line 140 and the common electrode 160 can be controlled, the scan line group 120 will not reduce the transmission quality due to the increase in load, and the common electrode 160 can also maintain ideal touch sensitivity. Sex. In addition, the pixel electrode 154 extends in the first contact hole 192B and contacts the drain contact portion DC of the drain D, so as to realize the electrical connection relationship between the pixel electrode 154 and the active device 152.

In some embodiments, all the first scan lines 122 and all the second scan lines 124 extend to the periphery of the substrate 110 and then turn to extend toward the bonding area of the substrate 110. When faced with a large load on the scan line group 120, most designs will widen the line segment extending the scan line toward the bonding area, thereby increasing the width of the peripheral area of the entire pixel array substrate 100, which cannot meet the requirements of a narrow frame design. However, in this embodiment, the first scan line 122 and the second scan line 124 of the same scan line group 120 are designed to be bent, and the contact structure between the common electrode 160 and the touch signal line 140 is set It is placed between the section where the first scan line 122 and the second scan line 124 have a larger interval. In this way, the overlapping area of the common electrode 160 overlapping the scan line group 120 is reduced, so that the scan line group 120 does not need to increase the line width to provide ideal transmission quality. Therefore, the pixel array substrate 100 can be applied to products with a narrow frame design. In addition, the reduction in the overlapping area of the common electrode 160 overlapping the scan line group 120 also helps to reduce the load of the common electrode 160. Therefore, when the common electrode 160 performs a touch function, it can provide ideal touch performance.

FIG. 7 is a partial schematic diagram of a pixel array substrate according to an embodiment of the present invention, and FIG. 8 is a cross-sectional view along the line III-III' and IV-IV' of FIG. In FIG. 7, the pixel array substrate 200 is similar to the pixel array substrate 100 of FIGS. 1A and 1B, but FIG. 7 only shows a set of scan line groups 120. The same or similar reference numerals in the embodiments of FIGS. 1A, 1B and FIG. 7 indicate the same or similar components, and the specific structure, function and design of these components can be referred to the foregoing description. In FIGS. 7 and 8, the pixel array substrate 200 includes a substrate 110, a plurality of scan line groups 120 (only one group is shown in FIG. 7), a plurality of data lines 130, and a plurality of touch signal lines 140 (only in FIG. One is shown), a plurality of pixel structures 250 (only a part of each pixel structure 250 is shown in FIG. 7) and a common electrode 260, wherein each pixel structure 250 includes an active element 152 and a pixel electrode 254. The main difference between this embodiment and the embodiment of FIGS. 1A and 1B lies in the stacking sequence of the common electrode 260 and the pixel electrode 254. In addition, the pixel array substrate 200 includes a gate insulating layer 182 and a first protective layer 184, but does not include the second protective layer shown in FIG. 6.

In FIGS. 7 and 8, the scan line group 120, the data line 130, and the touch signal The configuration relationship of the wire 140, the gate insulating layer 182 of the active device 152, and the first protection layer 184 can refer to the embodiments of FIGS. 1A and 1B. In addition, the pixel electrode 254 is disposed between the gate insulating layer 182 and the first protection layer 184 and contacts the drain D of the active device 152. The common electrode 260 is disposed on the first protection layer 184. In this way, the film layer where the pixel electrode 254 is located is located between the film layer where the common electrode 260 is located and the substrate 110. The common electrode 260 includes an electrode portion 262 overlapping the pixel electrode 254, a contact portion 264 located between the first scan line 122 and the second scan line 124 of the scan line group 120, and a first scan line extending across the scan line group 120 122 or the connecting portion 266 of the second scan line 124. The connecting portion 266 is connected between the electrode portion 262 and the contact portion 264. In the pixel array substrate 200, the electrode part 262 may have a plurality of slits 262S. The slit 262S of the electrode portion 262 can expose a part of the area of the pixel electrode 254 to form a fringe field switch (FFS) pixel structure. It can be seen from FIG. 8 that a contact hole 290 is formed in the first protection layer 184, and the contact hole 290 is located on the touch signal line 140. The contact portion 264 may extend in the contact hole 290 and directly contact a corresponding touch signal line 140.

In this embodiment, the pattern design of the first scan line 122 and the second scan line 124 is substantially the same as the embodiment in FIGS. 1A and 1B. The transition section 1224 of the first scan line 122 and the transition section 1244 of the second scan line 124 are separated by a first distance G1, and the distance between the pixel section 1222 of the first scan line 122 and the pixel section 1242 of the second scan line 124 Open a second distance G2, and the first distance G1 is greater than the second distance G2. The contact hole 290 is located at the transition section 1224 of the first scan line 122 and the transition section of the second scan line 124 The size D290 of the contact hole 290 is not greater than the first distance G1 between the transition section 1224 of the first scan line 122 and the transition section 1244 of the second scan line 124. Therefore, the contact hole 290 does not overlap the first scan line 122 nor the second scan line 124. In addition, the contact portion 264 may be separated from the first scan line 122 and the second scan line 124 by a third distance G3 so that the contact portion 264 does not overlap the first scan line 122 and the second scan line 124. Therefore, the area where the common electrode 260 overlaps the scan line group 120 can be controlled without increasing the load between the common electrode 260 and the scan line group 120, which helps stabilize the signal transmission quality of the scan line group 120 and ensure the common electrode The touch sensitivity.

In summary, the pixel array substrate of the embodiment of the present invention adopts a curved scan line design, so that the separation distance between the first scan line and the second scan line in the scan line group is not constant. In this way, the structure in which the common electrode is in contact with the touch signal line can be arranged in the section where the distance between the first scan line and the second scan line is relatively large, so as to reduce the area of the common electrode overlapping the scan line group. Reduce the load caused by the common electrode and the scan line group to each other. Therefore, the scan line group of the pixel array substrate of the embodiment of the present invention can have ideal transmission quality without deliberately increasing the line width, thereby helping to reduce the frame width of the pixel array substrate. At the same time, it can also ensure that the touch sensitivity of the common electrode is not reduced due to excessive load. In addition, in the active element of the pixel array substrate of the embodiment of the present invention, both ends of the drain electrode overlap the scan line. In this way, when an alignment error occurs in the manufacturing process and the drain is shifted from the predetermined position, the overlapping area of the drain and the scan line can be maintained approximately, thereby improving the yield of the pixel array substrate.

Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be determined by the scope of the attached patent application.

122: the first scan line 1222, 1242: pixel segment 1224, 1244: Transition section 124: second scan line 130: data line 140: Touch signal line 152: Active component 160: Common electrode 162: Electrode 164: Contact 166: Connection part 170: Conduction electrode 192, 192A, 192B: first contact hole 194: Second contact hole A: area C: Semiconductor layer D: Dip pole DA: first end DB: second end DC: Drain contact D192A, D194: Dimensions G: Gate G1: the first distance G2: second distance G3: third distance LO: overlapping length LS: interval length S: Source W166: width

Claims (18)

A pixel array substrate includes: a substrate; a plurality of scan line groups are arranged on the substrate, each of the scan line groups includes a first scan line and a second scan line, the first scan line and the second scan line Each includes a pixel segment and a transition segment following the pixel segment, wherein the transition segment of the first scan line and the transition segment of the second scan line are separated by at least a first distance, and the first scan The pixel segment of the line and the pixel segment of the second scan line are separated by at least a second distance, and the first distance is greater than the second distance; a plurality of data lines are arranged on the substrate, and each The data lines extend to intersect the scan line groups; a plurality of touch signal lines are arranged on the substrate, each touch signal line extends to intersect the scan line groups, and the data lines and the touch signal lines are alternately arranged A plurality of pixel structures are arranged on the substrate and arranged in an array, each of the scan line groups is located between two adjacent columns of pixel structures; and a common electrode is arranged on the substrate, and the common electrode includes an electrode portion , A contact portion and a connection portion, the electrode portion overlaps the pixel structures, the contact portion is located between the transition section of the first scan line and the transition section of the second scan line in one of the scan line groups and is electrically connected One of the touch signal lines is connected, and the connecting portion traverses one of the transition sections to connect between the electrode portion and the contact portion, wherein each data line traverses the first scan line of the corresponding scan line group Pixel segment And traverse the pixel segment of the second scan line of the corresponding scan line group, and each touch signal line traverses the transition segment of the first scan line of the corresponding scan line group and traverses the corresponding The transition section of the second scan line of the scan line group. In the pixel array substrate described in the first item of the scope of patent application, the width of the connecting portion of the common electrode is 4 μm to 5 μm. The pixel array substrate according to claim 1, wherein each of the pixel structures includes an active device and a pixel electrode connected to the active device, and the pixel electrode and the common electrode The electrodes overlap. The pixel array substrate according to claim 3, wherein the active device includes a gate, a semiconductor layer, a source and a drain, and the gate is connected to the first scan line and the first scan line of one of the scan line groups For the pixel segment of one of the second scan lines, the semiconductor layer overlaps the gate, the source is connected to one of the data lines and contacts the semiconductor layer, and the drain is connected to the pixel electrode and contacts the Semiconductor layer. The pixel array substrate according to claim 4, wherein each of the first scan line and the second scan line further includes a turning section connected to the pixel section and the transition section The turning section and the gate are located at both ends of the pixel section with a gap. The pixel array substrate according to claim 5, wherein the drain electrode overlaps the gate electrode, crosses the gap and overlaps the turning section. According to the pixel array substrate according to claim 6, wherein the drain includes a drain contact part in contact with the pixel electrode, and the drain contact part is located in the gap. According to the pixel array substrate described in item 4 of the scope of patent application, the first pixel structure and the second pixel structure in the pixel structures are located on both sides of one of the data lines, and the first pixel structure The active element and the active element of the second pixel structure are respectively connected to two scan line groups next to each other. According to the pixel array substrate described in claim 8, wherein the drain of the active element of the first pixel structure is closer to one of the touch signal lines than the gate, and the second picture The drain of the active element of the element structure is closer to the other of the touch signal lines than the gate, and the one of the touch signal lines and the other of the touch signal lines are located in the one The opposite side of a data line. The pixel array substrate according to claim 4, wherein the one of the first scan line and the second scan line connected to the gate has a widened portion to form the gate, and the common The electrode portion of the electrode overlaps the gate electrode. According to the pixel array substrate described in item 3 of the scope of patent application, the common electrode is located between the pixel electrode and the substrate, and the pixel electrode has a plurality of slits. As described in item 11 of the scope of the patent application, the pixel array substrate further includes a conductive electrode disposed on the substrate and connected to the contact portion and the other Between a touch signal line, and the conductive electrode and the pixel electrode are the same film layer. The pixel array substrate described in item 12 of the scope of patent application further includes a first protective layer and a second protective layer, the first protective layer covers the touch signal lines, and the common electrode is disposed on the first protective layer Above, the second protective layer covers the common electrode, and the pixel electrode and the conductive electrode are disposed on the second protective layer, wherein the conductive electrode passes through the first protective layer and the second protective layer. A contact hole contacts the one of the touch signal lines, and the conductive electrode contacts the common electrode through a second contact hole penetrating the second protection layer. According to the pixel array substrate described in item 3 of the scope of patent application, the pixel electrode is located between the common electrode and the substrate, and the common electrode has a plurality of slits. In the pixel array substrate described in claim 14, wherein the contact portion directly contacts one of the touch signal lines. According to the pixel array substrate described in the first item of the scope of patent application, the first scan line and the second scan line of each scan line group are mirror-symmetrical. The pixel array substrate according to claim 1, wherein the pixel segment of the first scan line of one of the scan line groups and the pixel segment of the second scan line are located in one of the data Line and one of the touch signal lines, the pixel segment of the first scan line and the pixel segment of the second scan line of the other scan line group are located between one of the data lines and the other touch signal line Between control signal lines, and The one touch signal line and the other touch signal line are located on opposite sides of the one data line. The pixel array substrate according to claim 1, wherein the orthographic projection of the contact portion on the substrate and the orthographic projection of one of the scan line groups on the substrate are separated by a third distance, and the third distance Greater than zero.

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