TWI707719B - Reducing agent supply device and method of operating the reducing agent supply device - Google Patents

Reducing agent supply device and method of operating the reducing agent supply device Download PDF

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TWI707719B
TWI707719B TW108138791A TW108138791A TWI707719B TW I707719 B TWI707719 B TW I707719B TW 108138791 A TW108138791 A TW 108138791A TW 108138791 A TW108138791 A TW 108138791A TW I707719 B TWI707719 B TW I707719B
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reducing agent
injection nozzle
injection
exhaust gas
obstacle
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TW202030015A (en
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戸髙心平
宮西英雄
堤龍二
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日商三菱日立電力系統股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/92Chemical or biological purification of waste gases of engine exhaust gases
    • B01D53/94Chemical or biological purification of waste gases of engine exhaust gases by catalytic processes
    • B01D53/9404Removing only nitrogen compounds
    • B01D53/9409Nitrogen oxides
    • B01D53/9413Processes characterised by a specific catalyst
    • B01D53/9418Processes characterised by a specific catalyst for removing nitrogen oxides by selective catalytic reduction [SCR] using a reducing agent in a lean exhaust gas
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86Catalytic processes
    • B01D53/8621Removing nitrogen compounds
    • B01D53/8625Nitrogen oxides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/92Chemical or biological purification of waste gases of engine exhaust gases
    • B01D53/94Chemical or biological purification of waste gases of engine exhaust gases by catalytic processes
    • B01D53/9404Removing only nitrogen compounds
    • B01D53/9409Nitrogen oxides
    • B01D53/9431Processes characterised by a specific device
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/92Chemical or biological purification of waste gases of engine exhaust gases
    • B01D53/94Chemical or biological purification of waste gases of engine exhaust gases by catalytic processes
    • B01D53/9495Controlling the catalytic process
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2251/00Reactants
    • B01D2251/20Reductants
    • B01D2251/206Ammonium compounds
    • B01D2251/2062Ammonia
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/40Further details for adsorption processes and devices
    • B01D2259/40007Controlling pressure or temperature swing adsorption
    • B01D2259/40009Controlling pressure or temperature swing adsorption using sensors or gas analysers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02TCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T10/00Road transport of goods or passengers
    • Y02T10/10Internal combustion engine [ICE] based vehicles
    • Y02T10/12Improving ICE efficiencies

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Abstract

本發明之課題在於抑制由起因於障礙物之偏流之影響所致的還原劑之局部之濃度分佈之不均衡。 本發明之還原劑供給裝置對配置有障礙物之廢氣流路內之SCR觸媒之上游供給還原劑,且具備:複數個噴射噴嘴,其等在廢氣之流動方向上之障礙物之下游,沿著與廢氣之流動方向交叉之一方向空開間隔地配置;及複數條還原劑供給線,其等對該複數個噴射噴嘴供給還原劑。在複數個噴射噴嘴中,將位於障礙物之下游之噴射噴嘴定義為第1噴射噴嘴,將不位於該下游之噴射噴嘴定義為第2噴射噴嘴之情形下,將複數個噴射噴嘴區分為複數個噴射噴嘴群,該複數個噴射噴嘴群係含有由同一條還原劑供給線供給還原劑之至少一個噴射噴嘴者,且包含:第1噴射噴嘴群,其係含有第1噴射噴嘴之噴射噴嘴群、及第2噴射噴嘴群,其係含有第2噴射噴嘴之噴射噴嘴群。The subject of the present invention is to suppress the unevenness of the local concentration distribution of the reducing agent caused by the influence of the drift of the obstacle. The reductant supply device of the present invention supplies reductant to the upstream of the SCR catalyst in the exhaust gas flow path where the obstacle is arranged, and is equipped with a plurality of injection nozzles, which are downstream of the obstacle in the flow direction of the exhaust gas. It is arranged at intervals in a direction crossing the flow direction of the exhaust gas; and a plurality of reducing agent supply lines which supply the reducing agent to the plurality of injection nozzles. In the case of plural spray nozzles, the spray nozzle located downstream of the obstacle is defined as the first spray nozzle, and the spray nozzle not located downstream is defined as the second spray nozzle, the plural spray nozzles are divided into plural An injection nozzle group, the plurality of injection nozzle groups including at least one injection nozzle that supplies the reducing agent from the same reducing agent supply line, and includes: a first injection nozzle group, which is an injection nozzle group containing the first injection nozzle, And the second jet nozzle group is a jet nozzle group including the second jet nozzle.

Description

還原劑供給裝置、及還原劑供給裝置之運用方法Reducing agent supply device and method of operating the reducing agent supply device

本發明係關於一種還原劑供給裝置、及還原劑供給裝置之運用方法。The invention relates to a reducing agent supply device and an operating method of the reducing agent supply device.

先前已知一種脫硝裝置,其構成為例如為了自化石燃料等之燃燒廢氣去除NOx,而於廢氣中混入氨等還原劑,利用脫硝觸媒(例如SCR觸媒等)促進反應。例如於專利文獻1揭示一種氨注入裝置,其構成為使安裝於氨供給管之噴嘴之朝向及角度沿著廢氣管道之廢氣流路形狀而變化,而使自噴嘴噴出之氨均一地分佈於廢氣中。 [先前技術文獻]  [專利文獻]A denitrification device is previously known, for example, in order to remove NOx from combustion exhaust gas of fossil fuels, etc., a reducing agent such as ammonia is mixed into the exhaust gas, and a denitrification catalyst (such as an SCR catalyst) is used to promote the reaction. For example, Patent Document 1 discloses an ammonia injection device, which is configured to change the orientation and angle of the nozzle installed in the ammonia supply pipe along the shape of the exhaust gas flow path of the exhaust pipe, so that the ammonia sprayed from the nozzle is uniformly distributed in the exhaust gas in. [Prior Technical Document] [Patent Document]

[專利文獻1] 日本特開平9-24246號公報[Patent Document 1] Japanese Patent Application Laid-Open No. 9-24246

[發明所欲解決之問題][The problem to be solved by the invention]

然而,如上述之脫硝觸媒通常遍及廢氣流路之整個寬度而配置。因此,為了將廢氣流路之寬度方向之還原劑之濃度分佈均一且使觸媒通過,會於氨供給管在該供給管之延伸方向空開間隔配置複數個噴嘴。另一方面,會於流路內之氨供給管之上游配置包含配管或支柱等之各種障礙物。由於在如此之障礙物之下游局部地產生偏流,故上述寬度方向之還原劑之濃度分佈在障礙物之下游變得不均一,而有脫硝觸媒之脫硝性能降低之虞。 關於此點,在專利文獻1未揭示有關因位於氨供給管之上游之障礙物之存在而造成之偏流之影響所導致的還原劑之濃度分佈之不均衡之見解。However, the denitration catalyst as described above is usually arranged across the entire width of the exhaust gas flow path. Therefore, in order to make the concentration distribution of the reducing agent in the width direction of the exhaust gas flow path uniform and allow the catalyst to pass through, a plurality of nozzles are arranged in the ammonia supply pipe at intervals in the extending direction of the supply pipe. On the other hand, various obstacles including pipes or pillars are arranged upstream of the ammonia supply pipe in the flow path. Since a partial flow is locally generated in the downstream of such an obstacle, the concentration distribution of the reducing agent in the width direction becomes non-uniform downstream of the obstacle, and the denitration performance of the denitration catalyst may decrease. Regarding this point, Patent Document 1 does not disclose any knowledge about the unbalanced concentration distribution of the reducing agent due to the influence of the bias current caused by the presence of obstacles located upstream of the ammonia supply pipe.

鑒於上述之事態,本發明之至少一實施形態之目的在於提供一種可抑制由起因於障礙物之偏流之影響所致的還原劑之局部之濃度分佈之不均衡的還原劑供給裝置、或還原劑供給裝置之運用方法。 [解決問題之技術手段]In view of the above-mentioned situation, the object of at least one embodiment of the present invention is to provide a reducing agent supply device or reducing agent that can suppress the uneven local concentration distribution of the reducing agent caused by the influence of the drift of obstacles How to use the supply device. [Technical means to solve the problem]

(1)本發明之至少一實施形態之還原劑供給裝置係用於對配置有障礙物之廢氣之流路內之SCR觸媒之上游供給還原劑者,且具備: 複數個噴射噴嘴,其等在前述廢氣之流動方向上之前述障礙物之下游,沿著相對於前述廢氣之流動方向交叉之一方向空開間隔地配置;及 複數條還原劑供給線,其等構成為對前述複數個噴射噴嘴供給前述還原劑;且 在將前述複數個噴射噴嘴中之位於前述障礙物之下游之噴射噴嘴定義為第1噴射噴嘴,將不位於前述障礙物之下游之噴射噴嘴定義為第2噴射噴嘴之情形下, 前述複數個噴射噴嘴被區分為包含構成為由同一條前述還原劑供給線供給前述還原劑之至少一個噴射噴嘴的複數個噴射噴嘴群,且為含有包含前述第1噴射噴嘴之前述噴射噴嘴群即第1噴射噴嘴群、及包含前述第2噴射噴嘴之前述噴射噴嘴群即第2噴射噴嘴群的複數個噴射噴嘴群。(1) The reducing agent supply device of at least one embodiment of the present invention is used for supplying the reducing agent upstream of the SCR catalyst in the flow path of the exhaust gas with obstacles, and has: A plurality of injection nozzles are arranged at intervals along a direction crossing the flow direction of the exhaust gas downstream of the obstacle in the flow direction of the exhaust gas; and A plurality of reducing agent supply lines are configured to supply the aforementioned reducing agent to the aforementioned plurality of injection nozzles; and In the case where the jet nozzle located downstream of the obstacle among the plurality of jet nozzles is defined as the first jet nozzle, and the jet nozzle not located downstream of the obstacle is defined as the second jet nozzle, The plurality of injection nozzles is divided into a plurality of injection nozzle groups including at least one injection nozzle configured to supply the reducing agent from the same reducing agent supply line, and includes the injection nozzle group including the first injection nozzle, namely The first spray nozzle group and a plurality of spray nozzle groups including the second spray nozzle group, which is the spray nozzle group of the second spray nozzle.

根據上述(1)之構成,於廢氣之流路內沿著相對於該廢氣之流動方向交叉之一方向而配置之複數個噴射噴嘴,被區分為包含位於障礙物之下游之第1噴射噴嘴之第1噴射噴嘴群、及包含不位於障礙物之下游之第2噴射噴嘴之噴射噴嘴群,於各個噴射噴嘴群藉由同一條還原劑供給線供給有還原劑。藉此,可將自包含位於障礙物之下游之第1噴射噴嘴之第1噴射噴嘴群噴射之還原劑之噴射量與第2噴射噴嘴群獨立地進行調整。因此,即便假定因障礙物之存在而於該障礙物之下游產生有偏流,但若適切地調整供給至第1噴射噴嘴群之還原劑之量,則亦可抑制起因於上述偏流而在噴射噴嘴群之下游產生的在與廢氣之流動方向交叉之一方向上的還原劑之局部之濃度分佈之不均衡。亦即,可提供一種能夠抑制由起因於障礙物之偏流之影響所致的還原劑之局部之濃度分佈之不均衡的還原劑供給裝置。According to the configuration of (1) above, the plurality of injection nozzles arranged in a direction that intersects the flow direction of the exhaust gas in the flow path of the exhaust gas are divided into those including the first injection nozzle located downstream of the obstacle The first injection nozzle group and the injection nozzle group including the second injection nozzle not located downstream of the obstacle are supplied with a reducing agent through the same reducing agent supply line to each of the injection nozzle groups. Thereby, the injection amount of the reducing agent injected from the first injection nozzle group including the first injection nozzle located downstream of the obstacle can be adjusted independently from the second injection nozzle group. Therefore, even if it is assumed that a drift is generated downstream of the obstacle due to the existence of the obstacle, if the amount of reducing agent supplied to the first injection nozzle group is appropriately adjusted, it is possible to suppress the drift in the injection nozzle due to the drift. The local concentration distribution of the reducing agent in a direction that crosses the flow direction of the exhaust gas generated downstream of the cluster is uneven. In other words, it is possible to provide a reducing agent supply device capable of suppressing the unevenness of the local concentration distribution of the reducing agent caused by the influence of the drift of the obstacle.

(2)在若干個實施形態中,係如上述(1)之構成者,其中 一個前述第1噴射噴嘴群所含之前述第1噴射噴嘴之數目,可少於一個前述第2噴射噴嘴群所含之前述第2噴射噴嘴之數目。(2) In several embodiments, it is constituted as in (1) above, in which The number of the first spray nozzles included in one first spray nozzle group may be less than the number of the second spray nozzles included in one second spray nozzle group.

根據上述(2)之構成,由於廢氣之流路之流路剖面積中第1噴射噴嘴群所佔之比例小於第2噴射噴嘴群,故可更加細微地抑制利用第2噴射噴嘴群無法對應的因流路剖面積中所佔之比例為小之障礙物(例如細的配管或支柱等)對局部之還原劑之濃度分佈帶來之影響,從而謀求濃度分佈之均一化。According to the configuration of (2) above, since the ratio of the first injection nozzle group to the cross-sectional area of the exhaust gas flow path is smaller than that of the second injection nozzle group, it is possible to more finely suppress the problems that cannot be handled by the second injection nozzle group Because the proportion of the cross-sectional area of the flow path is small obstacles (such as thin pipes or pillars, etc.) that affect the concentration distribution of the local reducing agent, the concentration distribution is uniformed.

(3)在若干個實施形態中,係如上述(1)或(2)之構成者,其中 作為前述一方向上之前述流路之寬度W、前述流動方向上之前述障礙物之寬度D,和前述流動方向上之前述障礙物與前述第1噴射噴嘴群之距離L,可滿足下式(i)或(ii)。 L≦2W・・・(i) L≦20D・・・(ii)(3) In several embodiments, it is the composition of (1) or (2) above, where As the width W of the flow path in the one direction, the width D of the obstacle in the flow direction, and the distance L between the obstacle in the flow direction and the first jet nozzle group, the following formula (i ) Or (ii). L≦2W・・・(i) L≦20D・・・(ii)

由於在充分離開障礙物之下游之位置,該障礙物之後流之影響小,而在相對於廢氣之流動方向交叉之一方向的還原劑之濃度分佈接近均一,故局部區分噴射噴嘴群之必要性降低。另一方面,藉由在障礙物與噴射噴嘴群之距離近、而後流之影響顯著之位置,局部區分噴射噴嘴群而可有效地降低局部之濃度分佈之不均衡。 關於此點,根據上述(3)之構成,藉由在滿足障礙物之後流之影響大之(i)或(ii)之關係之位置配置第1噴射噴嘴群,而可最大限度地享受上述(1)或(2)中所述之效果。Since the downstream position of the obstacle is sufficiently far away from the obstacle, the influence of the downstream flow of the obstacle is small, and the concentration distribution of the reducing agent in a direction crossing with the flow direction of the exhaust gas is close to uniform, so it is necessary to locally distinguish the spray nozzle groups reduce. On the other hand, by locally distinguishing the spray nozzle groups at locations where the distance between the obstacle and the spray nozzle group is close, and the influence of the backflow is significant, the unevenness of the local concentration distribution can be effectively reduced. In this regard, according to the configuration of (3) above, by arranging the first jet nozzle group at a position that satisfies the relationship of (i) or (ii), which has a large influence on the flow after the obstacle, the above-mentioned ( The effect described in 1) or (2).

(4)在若干個實施形態中,係如上述(1)~(3)中任一項之構成者,其中 前述複數個噴射噴嘴可遍及前述流路之整個寬度離散地配置。(4) In several embodiments, it is constituted by any one of (1) to (3) above, wherein The plurality of spray nozzles may be discretely arranged over the entire width of the flow path.

根據上述(4)之構成,可遍及廢氣之流路之整個寬度謀求還原劑之濃度分佈之均一化。因此,在例如於遍及流路之整個寬度而設置之SCR觸媒之上游配置還原劑供給裝置之情形下,可最大限度地享受上述(1)中所述之效果,從而最大限度地發揮上述SCR觸媒之脫硝性能。According to the configuration of (4) above, the concentration distribution of the reducing agent can be made uniform across the entire width of the exhaust gas flow path. Therefore, for example, in the case where a reducing agent supply device is arranged upstream of the SCR catalyst that is installed across the entire width of the flow path, the effect described in (1) above can be enjoyed to the fullest, so as to maximize the SCR The denitration performance of the catalyst.

(5)在若干個實施形態中,係如上述(1)~(4)中任一項之構成者,其中 還原劑供給裝置可更具備: 濃度感測器,其在前述流動方向上配置於前述複數個噴射噴嘴群之下游,用於測定前述一方向上之前述廢氣中之前述還原劑之濃度分佈; 與前述複數條還原劑供給線之各者對應地設置之複數個流量調整閥及可獨立地變更該複數個流量調整閥各者之開度之複數個閥致動器;以及 控制器,其根據前述濃度感測器之檢測信號以將前述一方向上之前述還原劑之濃度分佈均一化之方式驅動前述閥致動器。(5) In several embodiments, it is constituted by any one of (1) to (4) above, wherein The reducing agent supply device can be further equipped with: A concentration sensor, which is arranged downstream of the plurality of injection nozzle groups in the flow direction, for measuring the concentration distribution of the reducing agent in the exhaust gas in the one direction; A plurality of flow adjustment valves corresponding to each of the aforementioned plurality of reducing agent supply lines and a plurality of valve actuators capable of independently changing the opening degree of each of the plurality of flow adjustment valves; and A controller that drives the valve actuator in a manner that uniformizes the concentration distribution of the reducing agent in the one direction according to the detection signal of the concentration sensor.

根據上述(5)之構成,控制器可根據來自濃度感測器之檢測信號以將與廢氣之流動方向交叉之一方向上之還原劑之濃度分佈均一化之方式對各個閥致動器進行回饋控制。藉此,可無需例如由操作人員進行之個別之閥之開度調整作業,而將與廢氣之流動方向交叉之一方向上之還原劑之濃度分佈即時地均一化。According to the configuration of (5) above, the controller can perform feedback control on each valve actuator based on the detection signal from the concentration sensor to uniformize the concentration distribution of the reducing agent in a direction crossing the flow direction of the exhaust gas. . Thereby, it is possible to instantly uniformize the concentration distribution of the reducing agent in a direction crossing the flow direction of the exhaust gas without the need for an individual valve opening adjustment operation performed by the operator, for example.

(6)本發明之至少一實施形態之還原劑供給裝置之運用方法, 係用於還原劑供給裝置者,該還原劑供給裝置用於對配置有障礙物之廢氣之流路內之SCR觸媒之上游供給還原劑,且 前述還原劑供給裝置具備: 複數個噴射噴嘴,其等在前述廢氣之流動方向上之前述障礙物之下游,沿著相對於前述廢氣之流動方向交叉之一方向空開間隔地配置;及 複數條還原劑供給線,其等構成為對前述複數個噴射噴嘴供給前述還原劑;且 在將前述複數個噴射噴嘴中之位於前述障礙物之下游之噴射噴嘴定義為第1噴射噴嘴,將不位於前述障礙物之下游之噴射噴嘴定義為第2噴射噴嘴之情形下, 前述複數個噴射噴嘴被區分為包含構成為由同一條前述還原劑供給線供給前述還原劑之至少一個噴射噴嘴的複數個噴射噴嘴群,且為含有包含前述第1噴射噴嘴之前述噴射噴嘴群即第1噴射噴嘴群、及包含前述第2噴射噴嘴之前述噴射噴嘴群即第2噴射噴嘴群的複數個噴射噴嘴群, 前述還原劑供給裝置之運用方法具備: 在前述廢氣之流動方向之前述複數個噴射噴嘴之下游測定前述一方向上之前述還原劑或NOx之濃度分佈之步驟,及 根據前述濃度分佈之測定結果,個別地調整供給至前述第1噴射噴嘴群及前述第2噴射噴嘴群之前述還原劑之量之步驟。(6) The operating method of the reducing agent supply device of at least one embodiment of the present invention, It is used for a reducing agent supply device which is used to supply the reducing agent upstream of the SCR catalyst in the exhaust gas flow path with obstacles, and The aforementioned reducing agent supply device includes: A plurality of injection nozzles are arranged at intervals along a direction crossing the flow direction of the exhaust gas downstream of the obstacle in the flow direction of the exhaust gas; and A plurality of reducing agent supply lines are configured to supply the aforementioned reducing agent to the aforementioned plurality of injection nozzles; and In the case where the jet nozzle located downstream of the obstacle among the plurality of jet nozzles is defined as the first jet nozzle, and the jet nozzle not located downstream of the obstacle is defined as the second jet nozzle, The plurality of injection nozzles is divided into a plurality of injection nozzle groups including at least one injection nozzle configured to supply the reducing agent from the same reducing agent supply line, and includes the injection nozzle group including the first injection nozzle, namely A first spray nozzle group and a plurality of spray nozzle groups including the second spray nozzle group, which is the spray nozzle group of the second spray nozzle, The operating method of the aforementioned reducing agent supply device includes: The step of measuring the concentration distribution of the reducing agent or NOx in the one direction downstream of the plurality of injection nozzles in the flow direction of the exhaust gas, and A step of individually adjusting the amount of the reducing agent supplied to the first injection nozzle group and the second injection nozzle group based on the measurement result of the concentration distribution.

根據上述(6)之方法,如在上述(1)中所述般,於廢氣之流路內沿著相對於該廢氣之流動方向交叉之一方向而配置之複數個噴射噴嘴,被區分為包含位於障礙物之下游之第1噴射噴嘴之第1噴射噴嘴群、及包含不位於障礙物之下游之第2噴射噴嘴之噴射噴嘴群,於各個噴射噴嘴群藉由同一條還原劑供給線供給還原劑。藉此,可將自包含位於障礙物之下游之第1噴射噴嘴之第1噴射噴嘴群噴射之還原劑之噴射量與第2噴射噴嘴群獨立地進行調整。因此,即便假定因障礙物之存在而於該障礙物之下游產生有偏流,但若適切地調整供給至第1噴射噴嘴群之還原劑之量,則亦可抑制起因於上述偏流而在噴射噴嘴群之下游產生的在與廢氣之流動方向交叉之一方向的還原劑之局部之濃度分佈之不均衡。亦即,可提供一種能夠抑制由起因於障礙物之偏流之影響所致的還原劑之局部之濃度分佈之不均衡的還原劑供給裝置之運用方法。又,如上述(5)中所述般,可根據在複數個噴射噴嘴之下游測定之與廢氣之流動方向交叉之一方向上之還原劑之濃度分佈個別地調整供給至第1噴射噴嘴群及第2噴射噴嘴群之還原劑之量。藉此,可無需例如由操作人員進行之個別之噴射噴嘴之開度調整作業,而將與廢氣之流動方向交叉之一方向上之還原劑之濃度分佈均一化。 [發明之效果]According to the method of (6) above, as described in (1) above, the plurality of injection nozzles arranged in a direction crossing the flow direction of the exhaust gas in the flow path of the exhaust gas are classified as including The first injection nozzle group of the first injection nozzle located downstream of the obstacle and the injection nozzle group including the second injection nozzle not located downstream of the obstacle are supplied and restored by the same reducing agent supply line in each injection nozzle group Agent. Thereby, the injection amount of the reducing agent injected from the first injection nozzle group including the first injection nozzle located downstream of the obstacle can be adjusted independently from the second injection nozzle group. Therefore, even if it is assumed that a drift is generated downstream of the obstacle due to the existence of the obstacle, if the amount of reducing agent supplied to the first injection nozzle group is appropriately adjusted, it is possible to suppress the drift in the injection nozzle due to the drift. The local concentration distribution of the reducing agent in a direction crossing the flow direction of the exhaust gas generated downstream of the cluster is uneven. That is, it is possible to provide an operating method of the reducing agent supply device that can suppress the unevenness of the local concentration distribution of the reducing agent caused by the influence of the drift of the obstacle. Furthermore, as described in (5) above, the concentration distribution of the reducing agent in a direction crossing the flow direction of the exhaust gas measured downstream of the plurality of injection nozzles can be individually adjusted and supplied to the first injection nozzle group and the second injection nozzle group. 2 The amount of reducing agent in the spray nozzle group. Thereby, it is possible to uniformize the concentration distribution of the reducing agent in a direction that intersects the flow direction of the exhaust gas without requiring an individual injection nozzle opening adjustment operation performed by an operator, for example. [Effects of Invention]

根據本發明之至少一實施形態,可提供一種能夠抑制由起因於障礙物之偏流之影響所致的還原劑之局部之濃度分佈之不均衡的還原劑供給裝置、及還原劑供給裝置之運用方法。According to at least one embodiment of the present invention, it is possible to provide a reducing agent supply device and an operating method of the reducing agent supply device capable of suppressing the unevenness of the local concentration distribution of the reducing agent caused by the influence of the drift of the obstacle .

以下參照附圖說明本發明之若干個實施形態。然而,實施形態所記載之或顯示於圖式之構成零件之尺寸、材質、形狀、其相對之配置等並非為將本發明之範圍限定於此之主旨,而僅為單純之說明例。 例如,表示「在某方向」、「沿著某方向」、「平行」、「正交」、「中心」、「同心」或「同軸」等相對性或絕對性之配置之表達,不僅嚴密地表示如此之配置,亦表示具有公差、或可獲得相同功能之程度之角度或距離而相對性變位之狀態。 又,例如,表示四角形狀或圓筒形狀等形狀之表達,不僅表示在幾何學上嚴密意義下之四角形狀或圓筒形狀等形狀,而且表示在獲得相同效果之範圍內,包含凹凸部或倒角部等之形狀。 另一方面,「包括」、「備置」、「具備」、「包含」、或「具有」一個構成要素之表達,非為將其他構成要素之存在除外之排他性表達。Several embodiments of the present invention will be described below with reference to the drawings. However, the dimensions, materials, shapes, relative arrangements, etc. of the constituent parts described in the embodiment or shown in the drawings are not intended to limit the scope of the present invention, but are merely illustrative examples. For example, expressions that express relative or absolute arrangements such as "in a certain direction", "along a certain direction", "parallel", "orthogonal", "center", "concentric" or "coaxial", not only strictly It means such a configuration, and it also means a state of relative displacement with a tolerance or an angle or distance that can obtain the same function. Also, for example, expressions that indicate shapes such as quadrangular shapes or cylindrical shapes not only indicate shapes such as quadrangular shapes or cylindrical shapes in a geometrically strict sense, but also include irregularities or inverted portions within the range of obtaining the same effect. Shapes such as corners. On the other hand, the expression of "include", "prepared", "have", "include", or "have" a constituent element is not an exclusive expression that excludes the existence of other constituent elements.

圖1係顯示適用本發明之至少一實施形態之還原劑供給裝置10之鍋爐系統之廢氣流路下游側之構成之概略圖。 再者,在以下之說明中,作為一例而對於在燃煤鍋爐(鍋爐4)之廢氣流路2內配置脫硝裝置1之情形進行說明。鍋爐4具備:圖1所示之火爐5及燃燒裝置(省略圖示)、及連接於廢氣流路2之煙道6。Fig. 1 is a schematic diagram showing the configuration of the downstream side of the exhaust gas flow path of a boiler system to which a reducing agent supply device 10 of at least one embodiment of the present invention is applied. In addition, in the following description, as an example, a case where the denitrification device 1 is arranged in the exhaust gas flow path 2 of a coal-fired boiler (boiler 4) will be described. The boiler 4 includes a furnace 5 and a combustion device (not shown) shown in FIG. 1, and a flue 6 connected to the exhaust gas flow path 2.

如圖1所示般,於鍋爐系統100之廢氣流路2下游側配置有脫硝裝置1。該脫硝裝置1在導引自鍋爐4排出之廢氣G之廢氣流路2內之下游側具備:SCR觸媒3,其以沿著與廢氣G之流動方向交叉之方向(亦即廢氣流路2之寬度方向)延伸之方式配置;及還原劑供給裝置10,其用於對廢氣流路2內之SCR觸媒3之上游供給還原劑8(例如無水氨、氨水、尿素、尿素水、或該等之至少一者與空氣之混合氣體等)。再者,在以下之說明中,作為還原劑8之一例而設為將氨(更詳細而言為氨與空氣之混合氣體)噴霧至廢氣G中者。As shown in FIG. 1, a denitration device 1 is arranged on the downstream side of the exhaust gas flow path 2 of the boiler system 100. The denitration device 1 is equipped with an SCR catalyst 3 on the downstream side of the exhaust gas flow path 2 that guides the exhaust gas G discharged from the boiler 4, which is arranged in a direction intersecting the flow direction of the exhaust gas G (that is, the exhaust gas flow path The width direction of 2) is extended; and the reducing agent supply device 10 is used to supply the reducing agent 8 (such as anhydrous ammonia, ammonia, urea, urea water, or anhydrous ammonia, ammonia water, urea, or urea water) upstream of the SCR catalyst 3 in the exhaust gas flow path 2. Mixed gas of at least one of these and air, etc.). In addition, in the following description, as an example of the reducing agent 8, it is assumed that ammonia (more specifically, a mixed gas of ammonia and air) is sprayed into the exhaust gas G.

SCR觸媒3為選擇式觸媒還原(selective catalytic reduction:SCR,選擇催化還原)脫硝裝置所使用之脫硝觸媒,構成為促進例如含碳燃料等燃燒而產生之廢氣G中之氮氧化物(NOx)與自還原劑供給裝置10供給之還原劑8之反應,而去除廢氣G中之NOx成分。再者,省略SCR觸媒3之詳細之說明,該SCR觸媒3例如將各種陶瓷或氧化鈦等用作載體而構成。SCR catalyst 3 is a denitration catalyst used in a selective catalytic reduction (SCR, selective catalytic reduction) denitration device, and is configured to promote the oxidation of nitrogen in exhaust gas G generated by the combustion of carbon-containing fuels, etc. The NOx component reacts with the reducing agent 8 supplied from the reducing agent supply device 10 to remove the NOx component in the exhaust gas G. In addition, a detailed description of the SCR catalyst 3 is omitted, and the SCR catalyst 3 is configured by using various ceramics, titanium oxide, or the like as a carrier, for example.

還原劑供給裝置10係用於將上述之還原劑8噴霧至廢氣流路2內之裝置。本發明中所述之還原劑供給裝置10構成為以在與廢氣G之流動方向交叉之方向,使氨之濃度分佈變為均一之方式噴射氨。The reducing agent supply device 10 is a device for spraying the aforementioned reducing agent 8 into the exhaust gas flow path 2. The reducing agent supply device 10 described in the present invention is configured to inject ammonia in a direction that intersects the flow direction of the exhaust gas G so that the concentration distribution of ammonia becomes uniform.

接著,就本發明之至少一實施形態之還原劑供給裝置10進行說明。 圖2係概略地顯示一實施形態之還原劑供給裝置之構成之側剖視圖。圖3係概略地顯示一實施形態之還原劑供給裝置之構成之圖,係圖2所示之III部之部分放大圖。 如圖2及圖3所例示般,本發明之至少一實施形態之還原劑供給裝置10為亦被稱為氨注入裝置或注氨閘(ammonia injection grid:AIG)之裝置,構成為於內部可流通氨且具備在廢氣流路2內延伸之至少一個集管12。又,還原劑供給裝置10為用於在配置有障礙物7之廢氣G之流路(廢氣流路2)內之SCR觸媒3之上游供給還原劑8者,在廢氣G之流動方向上之障礙物7之下游,具備:複數個噴射噴嘴20,其等沿著相對於廢氣G之流動方向交叉之一方向空開間隔地配置;及複數條還原劑供給線30,其等構成為對複數個噴射噴嘴20供給還原劑8。Next, the reducing agent supply device 10 according to at least one embodiment of the present invention will be described. Fig. 2 is a side sectional view schematically showing the structure of a reducing agent supply device of an embodiment. FIG. 3 is a diagram schematically showing the structure of the reducing agent supply device of an embodiment, and is a partially enlarged view of part III shown in FIG. 2. As illustrated in Figures 2 and 3, the reducing agent supply device 10 of at least one embodiment of the present invention is also called an ammonia injection device or an ammonia injection grid (AIG), and is configured to be internally Ammonia circulates and at least one header 12 extending in the exhaust gas flow path 2 is provided. In addition, the reducing agent supply device 10 is a device for supplying the reducing agent 8 upstream of the SCR catalyst 3 in the flow path of the exhaust gas G (exhaust gas flow path 2) where the obstacle 7 is arranged, and is in the flow direction of the exhaust gas G. The downstream of the obstacle 7 is provided with: a plurality of injection nozzles 20, which are arranged at intervals in a direction that intersects the flow direction of the exhaust gas G; and a plurality of reducing agent supply lines 30, which are configured in pairs Each injection nozzle 20 supplies the reducing agent 8.

複數個噴射噴嘴20設置為:分別相對於集管12在廢氣G之流動方向之下游側配設於該集管12,而朝向該下游噴射還原劑8。例如複數個噴射噴嘴20可沿著集管12之延伸方向等間隔地隔開配置。 而且,在將該複數個噴射噴嘴20中之位於障礙物7之下游之噴射噴嘴20定義為第1噴射噴嘴21A,將不位於障礙物7之下游之噴射噴嘴20定義為第2噴射噴嘴22A之情形下,將上述複數個噴射噴嘴20區分為複數個噴射噴嘴群24,該複數個噴射噴嘴群24係含有構成為由同一條還原劑供給線30供給還原劑8之至少一個噴射噴嘴20,且包含:第1噴射噴嘴群21,其係含有第1噴射噴嘴21A之噴射噴嘴群24、及第2噴射噴嘴群22,其係含有第2噴射噴嘴22A之噴射噴嘴群24。A plurality of injection nozzles 20 are arranged such that they are respectively arranged on the header 12 on the downstream side of the flow direction of the exhaust gas G with respect to the header 12 and inject the reducing agent 8 toward the downstream. For example, a plurality of spray nozzles 20 may be arranged at equal intervals along the extending direction of the header 12. Moreover, among the plurality of spray nozzles 20, the spray nozzle 20 located downstream of the obstacle 7 is defined as the first spray nozzle 21A, and the spray nozzle 20 not located downstream of the obstacle 7 is defined as the second spray nozzle 22A. In this case, the plurality of injection nozzles 20 are divided into a plurality of injection nozzle groups 24, and the plurality of injection nozzle groups 24 include at least one injection nozzle 20 configured to supply the reducing agent 8 from the same reducing agent supply line 30, and Containing: a first spray nozzle group 21 which is a spray nozzle group 24 including the first spray nozzle 21A and a second spray nozzle group 22 which is a spray nozzle group 24 including a second spray nozzle 22A.

例如第1噴射噴嘴群21可在廢氣流路2內配置於較位於第1噴射噴嘴群21之上游之障礙物7朝下游之投影,在上述一方向寬度更寬之第1集管分區12A。該情形下,第2噴射噴嘴22A可配置於較第1集管分區12B,在上述一方向寬度更寬之第2集管分區12B。各集管分區12A、12B可包含用於將自各自之還原劑供給線30供給之還原劑,朝各自之噴射噴嘴20導引之內部流路。For example, the first injection nozzle group 21 may be arranged in the exhaust gas flow path 2 in a projection of the obstacle 7 located upstream of the first injection nozzle group 21 toward the downstream, and the first header section 12A having a wider width in the above-mentioned one direction. In this case, the second injection nozzle 22A may be arranged in the second header section 12B having a wider width in the above-mentioned one direction than the first header section 12B. Each header section 12A, 12B may include an internal flow path for guiding the reducing agent supplied from the respective reducing agent supply line 30 to the respective injection nozzle 20.

上述複數條還原劑供給線30,可構成為可自未圖示之主供給線分支而在廢氣流路2內延伸,而將還原劑供給至各自對應之噴射噴嘴群24。The plurality of reducing agent supply lines 30 can be configured to branch from a main supply line (not shown) and extend in the exhaust gas flow path 2 to supply the reducing agent to the corresponding injection nozzle groups 24.

根據如上述般構成之還原劑供給裝置10,將在廢氣G之流路2內沿著相對於該廢氣G之流動方向交叉之一方向而配置之複數個噴射噴嘴20區分為:含有位於障礙物7之下游之第1噴射噴嘴21A之第1噴射噴嘴群21、及含有不位於障礙物7之下游之第2噴射噴嘴22A之噴射噴嘴群24,於各個噴射噴嘴群24藉由同一條還原劑供給線30供給有還原劑8。藉此,可將自包含位於障礙物7之下游之第1噴射噴嘴21A之第1噴射噴嘴群21噴射之還原劑8之噴射量與第2噴射噴嘴群22獨立地進行調整。因此,即便假定因障礙物7之存在而於該障礙物7之下游產生有偏流,但若適切地調整供給至第1噴射噴嘴群21之還原劑8之量,則亦可抑制起因於上述偏流而在噴射噴嘴群24之下游產生的在與廢氣G之流動方向交叉之一方向上的還原劑8之局部之濃度分佈之不均衡。亦即,可提供一種能夠抑制由起因於障礙物7之偏流之影響所致的還原劑8之局部之濃度分佈之不均衡的還原劑供給裝置10。According to the reducing agent supply device 10 configured as described above, the plurality of injection nozzles 20 arranged in the flow path 2 of the exhaust gas G along a direction that intersects the flow direction of the exhaust gas G are divided into the following: The first injection nozzle group 21 of the first injection nozzle 21A downstream of the obstacle 7 and the injection nozzle group 24 including the second injection nozzle 22A not located downstream of the obstacle 7 use the same reducing agent in each injection nozzle group 24 The supply line 30 is supplied with the reducing agent 8. Thereby, the injection amount of the reducing agent 8 injected from the first injection nozzle group 21 including the first injection nozzle 21A located downstream of the obstacle 7 and the second injection nozzle group 22 can be adjusted independently. Therefore, even if it is assumed that a drift occurs downstream of the obstacle 7 due to the existence of the obstacle 7, if the amount of the reducing agent 8 supplied to the first injection nozzle group 21 is appropriately adjusted, the drift caused by the aforementioned drift can be suppressed. The local concentration distribution of the reducing agent 8 in a direction crossing the flow direction of the exhaust gas G generated downstream of the injection nozzle group 24 is uneven. That is, it is possible to provide a reducing agent supply device 10 capable of suppressing the unevenness of the local concentration distribution of the reducing agent 8 caused by the influence of the drift of the obstacle 7.

於上述構成中,在若干個實施形態中,例如如圖3所例示般,一個第1噴射噴嘴群21所含之第1噴射噴嘴21A之數目,可少於一個第2噴射噴嘴群22所含之第2噴射噴嘴22A之數目。In the above configuration, in several embodiments, as illustrated in FIG. 3, for example, the number of first injection nozzles 21A included in one first injection nozzle group 21 may be less than that of one second injection nozzle group 22 The number of the second jet nozzle 22A.

根據如此般一個第1噴射噴嘴群21所含之第1噴射噴嘴21A之數目少於一個第2噴射噴嘴群22所含之第2噴射噴嘴22A之數目之構成,由於廢氣流路2之流路剖面積中第1噴射噴嘴群21所佔之比例小於第2噴射噴嘴群22,故可更加細微地抑制利用第2噴射噴嘴群22無法對應的因流路剖面積中所佔之比例為小之障礙物7(例如細的配管或支柱等)對局部之還原劑8之濃度分佈帶來之影響,從而謀求濃度分佈之均一化。According to such a configuration that the number of first injection nozzles 21A included in one first injection nozzle group 21 is less than the number of second injection nozzles 22A included in one second injection nozzle group 22, the flow path of the exhaust gas flow path 2 The ratio of the first jet nozzle group 21 to the cross-sectional area is smaller than that of the second jet nozzle group 22, so it can be more finely suppressed that the ratio of the cross-sectional area of the flow path that cannot be handled by the second jet nozzle group 22 is small. Obstacles 7 (for example, thin pipes, pillars, etc.) have an influence on the concentration distribution of the reducing agent 8 in a local area, so that the concentration distribution can be made uniform.

在上述任一構成中,在若干個實施形態中,例如如圖2及圖3所例示般,作為在與上述廢氣G之流動方向交叉之一方向上之廢氣流路2之寬度W、上述流動方向上之障礙物7之寬度D,和上述流動方向上之障礙物7與第1噴射噴嘴群21之距離L可滿足下式(i)或(ii)。 L≦2W・・・(i) L≦20D・・・(ii)In any of the above configurations, in several embodiments, for example, as illustrated in FIGS. 2 and 3, the width W of the exhaust gas flow path 2 in a direction intersecting the flow direction of the exhaust gas G, the flow direction The width D of the upper obstacle 7 and the distance L between the obstacle 7 in the flow direction and the first spray nozzle group 21 satisfy the following formula (i) or (ii). L≦2W・・・(i) L≦20D・・・(ii)

亦即,包含第1噴射噴嘴群21及第2噴射噴嘴群22之噴射噴嘴群24與障礙物7之沿著廢氣流路2之距離L既可為廢氣流路2之寬度W之大致2倍以下,又,亦可為障礙物7之寬度D(例如配管等為障礙物7之情形下其外徑)之大致20倍以下。That is, the distance L between the jet nozzle group 24 including the first jet nozzle group 21 and the second jet nozzle group 22 and the obstacle 7 along the exhaust gas flow path 2 may be approximately twice the width W of the exhaust gas flow path 2 In the following, the width D of the obstacle 7 (for example, the outer diameter of the obstacle 7 when the pipe or the like is the obstacle 7) may be approximately 20 times or less.

此處,由於在充分離開障礙物7之下游之位置,該障礙物7之後流之影響小,而在相對於廢氣G之流動方向交叉之一方向的還原劑8之濃度分佈接近均一,故局部區分噴射噴嘴群24之必要性降低。另一方面,藉由在障礙物7與噴射噴嘴群24之距離近、而後流之影響顯著之位置,局部區分噴射噴嘴群24而可有效地降低局部之濃度分佈之不均衡。 關於此點,如上述般,根據廢氣流路2之寬度W、障礙物7於廢氣G之流動方向上之寬度D、及上述流動方向上之障礙物7與第1噴射噴嘴群21之距離L滿足上述式(i)或式(ii)之構成,藉由在滿足障礙物7之後流之影響較大之式(i)或式(ii)之關係之位置配置第1噴射噴嘴群21,而可最大限度地享受上述任一實施形態中所述之效果。 再者,上述式(i)或(ii)之距離L,在廢氣G之流動方向上既可以集管12之下游側端部、亦即噴射噴嘴20之基端部作為下游側端,亦可將噴射噴嘴20之下游側端部作為下游側端。又,距離L之上游側端既可應用障礙物7之下游側端部,亦可將障礙物7之中心(例如圖3中之障礙物7之圖心)作為上游側端。Here, since the downstream of the obstacle 7 is sufficiently away from the obstacle 7, the influence of the downstream flow of the obstacle 7 is small, and the concentration distribution of the reducing agent 8 in a direction crossing the flow direction of the exhaust gas G is close to uniform, so locally The necessity to distinguish the spray nozzle groups 24 is reduced. On the other hand, by locally distinguishing the spray nozzle group 24 at a position where the distance between the obstacle 7 and the jet nozzle group 24 is close and the influence of the backflow is significant, the unevenness of the local concentration distribution can be effectively reduced. In this regard, as described above, based on the width W of the exhaust gas flow path 2, the width D of the obstacle 7 in the flow direction of the exhaust gas G, and the distance L between the obstacle 7 in the above-mentioned flow direction and the first injection nozzle group 21 The configuration that satisfies the above-mentioned formula (i) or formula (ii), by arranging the first jet nozzle group 21 at a position where the influence of the flow is greater after the obstacle 7 is satisfied, or the relationship of the formula (ii), and The effect described in any of the above embodiments can be enjoyed to the maximum. Furthermore, the distance L in the above formula (i) or (ii) may be the downstream end of the header 12, that is, the base end of the injection nozzle 20 in the flow direction of the exhaust gas G, or The downstream end of the spray nozzle 20 is referred to as the downstream end. In addition, the upstream end of the distance L may use the downstream end of the obstacle 7, or the center of the obstacle 7 (for example, the center of the obstacle 7 in FIG. 3) as the upstream end.

在上述任一者之構成中,在若干個實施形態中,例如如圖3所例示般,在將例如相對於廢氣G之流動方向至廢氣流路2之管軸、因障礙物7所致之偏流所及之角度範圍設為θ之情形下,第1噴射噴嘴群21可將相對於廢氣流路2之寬度W方向於D+2Lsinθ之範圍所含之噴射噴嘴20包含為第1噴射噴嘴21A。 又,在若干個實施形態中,例如可將相對於位於第1噴射噴嘴群21之上游之障礙物7之朝流動方向之投影在上述一方向偏移地配置之噴射噴嘴20定義為第1噴射噴嘴21A。例如第1噴射噴嘴21A可以相對於障礙物7朝向廢氣流路2之下游之投影而於該廢氣流路2之管軸方向觀察下整體被重疊之方式配置。又,第1噴射噴嘴21A亦可以相對於上述障礙物7之投影在該廢氣流路2之管軸方向觀察下至少一部分重疊之方式配置。進而,第1噴射噴嘴21A還可以與上述投影不重疊之方式在廢氣流路2之寬度方向偏移地配置。 再者,第1噴射噴嘴群21可包含相對於位於上游之障礙物7之投影,在廢氣流路2之寬度方向(與廢氣G之流動方向交叉之一方向)位於緊鄰上述投影處之噴射噴嘴20包含為第1噴射噴嘴21A。或者是,第1噴射噴嘴群21可將可受位於上游之障礙物7之後流之影響之範圍所含之一個或複數個噴射噴嘴20包含為第1噴射噴嘴21A。In any of the above-mentioned configurations, in several embodiments, for example, as illustrated in FIG. 3, for example, the pipe axis of the exhaust gas flow path 2 with respect to the flow direction of the exhaust gas G is caused by the obstacle 7. When the angular range of the drift is set to θ, the first injection nozzle group 21 can include the injection nozzles 20 included in the range of D+2Lsinθ with respect to the width W of the exhaust gas flow path 2 as the first injection nozzle 21A . In addition, in some embodiments, for example, the jet nozzle 20 that is arranged offset in the one direction with respect to the projection of the obstacle 7 located upstream of the first jet nozzle group 21 in the flow direction can be defined as the first jet Nozzle 21A. For example, the first injection nozzle 21A may be arranged such that the entirety of the projection of the obstacle 7 toward the downstream of the exhaust gas flow path 2 is overlapped when viewed in the tube axis direction of the exhaust gas flow path 2. In addition, the first injection nozzle 21A may be arranged such that at least a part of the projection of the obstacle 7 is overlapped when viewed in the tube axis direction of the exhaust gas flow path 2. Furthermore, the first injection nozzle 21A may be arranged offset in the width direction of the exhaust gas flow path 2 so as not to overlap the above-mentioned projection. Furthermore, the first spray nozzle group 21 may include a projection of the obstacle 7 located upstream, and spray nozzles located adjacent to the projection in the width direction of the exhaust gas flow path 2 (a direction intersecting the flow direction of the exhaust gas G) 20 includes the first spray nozzle 21A. Alternatively, the first spray nozzle group 21 may include one or more spray nozzles 20 included in a range that can be affected by the downstream flow of the obstacle 7 located upstream as the first spray nozzle 21A.

此處,由於起因於障礙物7之偏流因該障礙物7之形狀、障礙物7與噴射噴嘴20之距離L、或廢氣G之流速等而可多樣地變化,故有在廢氣G之流動中僅憑藉調整來自配置於障礙物7之嚴密之下游位置之噴射噴嘴20之噴射量,而不能有效地進行濃度分佈之均一化之虞。 關於此點,根據上述之構成,可個別地調整朝包含相對於障礙物7朝廢氣G之流動方向之投影在與廢氣G之流動方向交叉之一方向偏移地配置之第1噴射噴嘴21A之第1噴射噴嘴群21的還原劑8之供給量。因此,可根據廢氣流路2內之障礙物7等之各種配置或設計,而提高在決定複數個噴射噴嘴20中區分為第1噴射噴嘴群21之噴射噴嘴20時之設計自由度。Here, since the drift caused by the obstacle 7 can be variously changed due to the shape of the obstacle 7, the distance L between the obstacle 7 and the injection nozzle 20, or the flow velocity of the exhaust gas G, there is a flow of the exhaust gas G Only by adjusting the injection amount from the injection nozzle 20 arranged at the strict downstream position of the obstacle 7, the uniformity of the concentration distribution cannot be effectively performed. In this regard, according to the above-mentioned configuration, it is possible to individually adjust the first injection nozzle 21A that includes the projection of the obstacle 7 in the flow direction of the exhaust gas G and is offset in a direction that intersects the flow direction of the exhaust gas G. The supply amount of the reducing agent 8 in the first injection nozzle group 21. Therefore, it is possible to increase the design freedom when determining the injection nozzles 20 of the first injection nozzle group 21 among the plurality of injection nozzles 20 according to various arrangements or designs of the obstacles 7 in the exhaust gas flow path 2.

圖4係概略地顯示由一實施形態之還原劑供給裝置進行之還原劑之濃度調整之側剖視圖。 在上述之任一者之構成中,在若干個實施形態中,例如如圖2~圖4所例示般,複數個噴射噴嘴20可遍及廢氣流路2之整個寬度而離散地配置。各噴射噴嘴20間之間隔、及廢氣流路2之寬度方向上之噴射噴嘴20之數目等可任意地設定。4 is a side sectional view schematically showing the concentration adjustment of the reducing agent performed by the reducing agent supply device of an embodiment. In any of the above-mentioned configurations, in some embodiments, as illustrated in FIGS. 2 to 4, for example, a plurality of injection nozzles 20 may be discretely arranged over the entire width of the exhaust gas flow path 2. The interval between the spray nozzles 20 and the number of spray nozzles 20 in the width direction of the exhaust gas flow path 2 can be arbitrarily set.

如此般,根據複數個噴射噴嘴20遍及廢氣流路2之整個寬度而離散地配置之構成,可遍及廢氣流路2之整個寬度而謀求還原劑8之濃度分佈之均一化。因此,在例如在遍及廢氣流路2之整個寬度而設置之SCR觸媒3之上游配置還原劑供給裝置10之情形下,可最大限度地享受將廢氣流路2之寬度方向之還原劑之濃度分佈均一化之效果,從而可最大限度地發揮上述SCR觸媒3之脫硝性能。 再者,複數個噴射噴嘴20例如如圖4所例示般,可在廢氣流路2內之寬度方向,針對廢氣G之流速不同之每個流速區域而予以區分。In this way, according to the configuration in which the plurality of injection nozzles 20 are discretely arranged across the entire width of the exhaust gas flow path 2, the concentration distribution of the reducing agent 8 can be uniformized across the entire width of the exhaust gas flow path 2. Therefore, for example, in the case where the reducing agent supply device 10 is arranged upstream of the SCR catalyst 3 installed across the entire width of the exhaust gas flow path 2, the concentration of the reducing agent in the width direction of the exhaust gas flow path 2 can be maximized. The effect of uniform distribution can maximize the denitration performance of the above-mentioned SCR catalyst 3. Furthermore, the plurality of injection nozzles 20 can be differentiated in the width direction of the exhaust gas flow path 2 for each flow velocity region where the flow velocity of the exhaust gas G is different, as illustrated in FIG. 4, for example.

圖5係顯示一實施形態之還原劑供給裝置之控制系統之構成之方塊圖。 在上述任一者之構成中,在若干個實施形態中,例如如圖2、圖4及圖5所例示般,還原劑供給裝置10可進一步具備:濃度感測器40,其在流動方向上配置於複數個噴射噴嘴群24之下游,用於測定在與上述廢氣G之流動方向交叉之一方向上之廢氣G中之還原劑8之濃度分佈;與複數條還原劑供給線30各者對應地設置之複數個流量調整閥32、及可獨立地變更該複數個流量調整閥32各者之開度之複數個閥致動器34;以及控制器50,其根據濃度感測器40之檢測信號,以將與廢氣G之流動方向交叉之一方向上之還原劑8之濃度分佈均一化之方式,驅動閥致動器34。Fig. 5 is a block diagram showing the structure of the control system of the reducing agent supply device of an embodiment. In any of the above-mentioned configurations, in several embodiments, for example, as illustrated in FIG. 2, FIG. 4, and FIG. 5, the reducing agent supply device 10 may further include a concentration sensor 40 that is in the flow direction It is arranged downstream of the plurality of injection nozzle groups 24 for measuring the concentration distribution of the reducing agent 8 in the exhaust gas G in a direction intersecting the flow direction of the exhaust gas G; corresponding to each of the plurality of reducing agent supply lines 30 A plurality of flow regulating valves 32 are provided, and a plurality of valve actuators 34 that can independently change the opening degree of each of the plurality of flow regulating valves 32; and a controller 50, which is based on the detection signal of the concentration sensor 40 , The valve actuator 34 is driven to uniformize the concentration distribution of the reducing agent 8 in a direction crossing the flow direction of the exhaust gas G.

濃度感測器40可構成為例如測定在廢氣流路2之寬度方向之還原劑之濃度分佈。The concentration sensor 40 may be configured, for example, to measure the concentration distribution of the reducing agent in the width direction of the exhaust gas flow path 2.

控制器50例如為電腦,除了CPU51、用於記憶該CPU51所執行之各種程式或表等資料之作為記憶部之ROM(Read Only Memory,唯讀記憶體)53、作為執行各程式時之展開區域及運算區域等工作區域而發揮功能之RAM(Random Access Memory,隨機存取記憶體)52以外,還可具備未圖示之作為大容量記憶裝置之硬碟機(HDD)、用於連接於通訊網路之通訊介面、及供安裝外部記憶裝置之存取部等。該等全部經由匯流排55連接。進而,控制器50例如亦可與包含鍵盤或滑鼠、觸控面板等輸入部(省略圖示)及包含顯示資料之液晶顯示裝置等顯示部(省略圖示)等連接。The controller 50 is, for example, a computer, except for the CPU 51, a ROM (Read Only Memory) 53 used as a memory for storing various programs or tables and other data executed by the CPU 51, and an expanded area for executing various programs In addition to RAM (Random Access Memory) 52 that functions as a work area such as a computing area, it can also be equipped with a hard disk drive (HDD) as a large-capacity memory device (not shown) for connecting to a communication network Communication interface, and access unit for installing external memory devices, etc. These are all connected via the bus 55. Furthermore, the controller 50 may be connected to, for example, an input unit (not shown) including a keyboard, a mouse, and a touch panel, and a display unit (not shown) including a liquid crystal display device for displaying data.

在若干個實施形態中,於ROM53內可儲存有還原劑噴射量調整程式54,該還原劑噴射量調整程式54用於例如根據來自濃度感測器40之檢測信號,以將廢氣流路2之寬度方向上之還原劑之濃度變為均一之方式,驅動各個閥致動器34而調整流量調整閥32之開度,從而調整自各個第1噴射噴嘴群21或第2噴射噴嘴群22之噴射噴嘴20噴射之還原劑之噴射量。In some embodiments, the reducing agent injection amount adjustment program 54 may be stored in the ROM 53. The reducing agent injection amount adjustment program 54 is used, for example, to adjust the exhaust gas flow path 2 according to the detection signal from the concentration sensor 40 The concentration of the reducing agent in the width direction becomes uniform, and each valve actuator 34 is driven to adjust the opening of the flow rate adjustment valve 32 to adjust the injection from each of the first injection nozzle group 21 or the second injection nozzle group 22 The injection amount of the reducing agent injected by the nozzle 20.

根據如此般進一步具備濃度感測器40、流量調整閥32、閥致動器34及控制器50之構成,控制器50可根據來自濃度感測器40之檢測信號,以將與廢氣G之流動方向交叉之一方向上之還原劑8之濃度分佈均一化之方式,對各個閥致動器34進行回饋控制。藉此,無需例如由操作人員進行個別之流量調整閥32之開度調整作業,而可將與廢氣G之流動方向交叉之一方向上之還原劑8之濃度分佈即時地均一化。According to the configuration further including the concentration sensor 40, the flow rate adjusting valve 32, the valve actuator 34 and the controller 50 in this way, the controller 50 can compare the flow of the exhaust gas G with the detection signal from the concentration sensor 40 The feedback control of each valve actuator 34 is performed in a way that the concentration distribution of the reducing agent 8 in one of the directions crossing is uniform. Thereby, it is not necessary, for example, for an operator to perform an opening adjustment operation of the individual flow adjustment valve 32, and the concentration distribution of the reducing agent 8 in a direction crossing the flow direction of the exhaust gas G can be uniformized instantly.

接著,就本發明之至少一實施形態之還原劑供給方法進行說明。 圖6係顯示本發明之至少一實施形態之還原劑供給方法之流程圖。 如圖6所例示般,本發明之至少一實施形態之還原劑供給裝置10之運用方法係用於還原劑供給裝置10者,該還原劑供給裝置10用於對配置有障礙物7之廢氣流路2內之SCR觸媒3之上游供給還原劑8。 該方法之還原劑供給裝置10具備:複數個噴射噴嘴20,其等在廢氣G之流動方向上之障礙物7之下游,沿著相對於廢氣G之流動方向交叉之一方向空開間隔地配置;及複數條還原劑供給線30,其等構成為對複數個噴射噴嘴20供給還原劑8。在複數個噴射噴嘴20中,將位於障礙物7之下游之噴射噴嘴20定義為第1噴射噴嘴21A,將不位於障礙物7之下游之噴射噴嘴20定義為第2噴射噴嘴22A之情形下,將複數個噴射噴嘴20區分為複數個噴射噴嘴群24,該複數個噴射噴嘴群24係含有構成為由同一條還原劑供給線30供給還原劑8之至少一個噴射噴嘴20,且包含:第1噴射噴嘴群21,其係含有第1噴射噴嘴21A之噴射噴嘴群24、及第2噴射噴嘴群22,其係含有第2噴射噴嘴22A之噴射噴嘴群24。 而且,還原劑供給裝置10之運用方法具備:在廢氣G之流動方向上之複數個噴射噴嘴20之下游測定與上述廢氣G之流動方向交叉之一方向上之還原劑8或NOx之濃度分佈之步驟(步驟S10);及根據該濃度分佈之測定結果,個別地調整供給至第1噴射噴嘴群21及第2噴射噴嘴群22之還原劑8之量之步驟(步驟S20)。Next, the reducing agent supply method of at least one embodiment of the present invention will be described. Fig. 6 is a flowchart showing the reducing agent supply method of at least one embodiment of the present invention. As illustrated in FIG. 6, the operating method of the reducing agent supply device 10 of at least one embodiment of the present invention is used for the reducing agent supply device 10, which is used for the exhaust gas flow provided with the obstacle 7 The upstream of the SCR catalyst 3 in the circuit 2 supplies the reducing agent 8. The reducing agent supply device 10 of this method is provided with a plurality of injection nozzles 20, which are arranged downstream of the obstacle 7 in the flow direction of the exhaust gas G at intervals along a direction that intersects the flow direction of the exhaust gas G ; And a plurality of reducing agent supply lines 30, which are configured to supply the reducing agent 8 to the plurality of injection nozzles 20. Among the plurality of jet nozzles 20, the jet nozzle 20 located downstream of the obstacle 7 is defined as the first jet nozzle 21A, and the jet nozzle 20 not located downstream of the obstacle 7 is defined as the second jet nozzle 22A, The plurality of injection nozzles 20 are divided into a plurality of injection nozzle groups 24. The plurality of injection nozzle groups 24 include at least one injection nozzle 20 configured to supply the reducing agent 8 from the same reducing agent supply line 30, and including: The spray nozzle group 21 is a spray nozzle group 24 including the first spray nozzle 21A and the second spray nozzle group 22 is a spray nozzle group 24 including the second spray nozzle 22A. Furthermore, the operating method of the reducing agent supply device 10 includes a step of measuring the concentration distribution of the reducing agent 8 or NOx in a direction crossing the flow direction of the exhaust gas G downstream of the plurality of injection nozzles 20 in the flow direction of the exhaust gas G (Step S10); and a step of individually adjusting the amount of reducing agent 8 supplied to the first injection nozzle group 21 and the second injection nozzle group 22 based on the measurement result of the concentration distribution (step S20).

根據該方法,在廢氣G之流路2內沿著相對於該廢氣G之流動方向交叉之一方向而配置之複數個噴射噴嘴20被區分為:包含位於障礙物7之下游之第1噴射噴嘴21A之第1噴射噴嘴群21、及包含不位於障礙物7之下游之第2噴射噴嘴22A之噴射噴嘴群24,於各個噴射噴嘴群24藉由同一條還原劑供給線30供給有還原劑8。藉此,可將自包含位於障礙物7之下游之第1噴射噴嘴21A之第1噴射噴嘴群21噴射之還原劑8之噴射量與第2噴射噴嘴群22獨立地進行調整。因此,即便假定因障礙物7之存在而於該障礙物7之下游產生有偏流,但若適切地調整供給至第1噴射噴嘴群21之還原劑8之量,則亦可抑制起因於上述偏流而在噴射噴嘴群24之下游產生的在與廢氣G之流動方向交叉之一方向上的還原劑8之局部之濃度分佈之不均衡。進而,可根據在複數個噴射噴嘴20之下游測定之與廢氣G之流動方向交叉之一方向上之還原劑8之濃度分佈以將還原劑8之濃度分佈均一化之方式個別地調整供給至第1噴射噴嘴群21及第2噴射噴嘴群22之還原劑8之量。藉此,可無需例如由操作人員進行之個別之噴射噴嘴20之開度調整作業,而將與廢氣G之流動方向交叉之一方向上之還原劑8之濃度分佈均一化。According to this method, the plurality of injection nozzles 20 arranged in a direction crossing the flow direction of the exhaust gas G in the flow path 2 of the exhaust gas G are classified as including the first injection nozzle located downstream of the obstacle 7 The first injection nozzle group 21 of 21A and the injection nozzle group 24 including the second injection nozzle 22A not located downstream of the obstacle 7 are supplied with the reducing agent 8 to each of the injection nozzle groups 24 through the same reducing agent supply line 30 . Thereby, the injection amount of the reducing agent 8 injected from the first injection nozzle group 21 including the first injection nozzle 21A located downstream of the obstacle 7 and the second injection nozzle group 22 can be adjusted independently. Therefore, even if it is assumed that a drift occurs downstream of the obstacle 7 due to the existence of the obstacle 7, if the amount of the reducing agent 8 supplied to the first injection nozzle group 21 is appropriately adjusted, the drift caused by the aforementioned drift can be suppressed. The local concentration distribution of the reducing agent 8 in a direction crossing the flow direction of the exhaust gas G generated downstream of the injection nozzle group 24 is uneven. Furthermore, the concentration distribution of the reducing agent 8 in a direction intersecting the flow direction of the exhaust gas G measured downstream of the plurality of injection nozzles 20 can be individually adjusted and supplied to the first in such a way that the concentration distribution of the reducing agent 8 is uniformized. The amount of reducing agent 8 in the injection nozzle group 21 and the second injection nozzle group 22. Thereby, it is possible to uniformize the concentration distribution of the reducing agent 8 in a direction crossing the flow direction of the exhaust gas G without the need for an individual injection nozzle 20 opening adjustment operation performed by the operator, for example.

根據以上所述之本發明之至少一實施形態,可提供一種能夠抑制由起因於障礙物7之偏流之影響所致的還原劑8之局部之濃度分佈之不均衡的還原劑供給裝置10、及還原劑供給裝置10之運用方法。According to at least one embodiment of the present invention described above, it is possible to provide a reducing agent supply device 10 capable of suppressing the unevenness of the local concentration distribution of the reducing agent 8 caused by the influence of the drift of the obstacle 7 and How to use the reducing agent supply device 10.

本發明並不限定於上述實施形態,亦包含對於上述實施形態施加變化之形態、及將該等形態適當組合之形態。The present invention is not limited to the above-mentioned embodiment, and includes a form in which a change is made to the above-mentioned embodiment and a form in which these forms are appropriately combined.

1:脫硝裝置 2:廢氣流路(流路) 3:SCR觸媒 5:火爐 6:煙道 7:障礙物 8:還原劑 10:還原劑供給裝置 12:集管 12A:第1集管分區 12B:第2集管分區 20:噴射噴嘴 21:第1噴射噴嘴群 21A:第1噴射噴嘴 22:第2噴射噴嘴群 22A:第2噴射噴嘴 24:噴射噴嘴群 30:還原劑供給線 32:流量調整閥 34:閥致動器 40:濃度感測器 50:控制器 51:CPU 52:RAM 53:ROM 54:還原劑噴射量調整程式 55:匯流排 100:鍋爐系統 D:寬度 G:廢氣 S10:步驟 S20:步驟 W:寬度1: Denitration device 2: Exhaust gas flow path (flow path) 3: SCR catalyst 5: Stove 6: flue 7: Obstacles 8: reducing agent 10: Reducing agent supply device 12: header 12A: The first header partition 12B: The second header zone 20: Jet nozzle 21: The first jet nozzle group 21A: The first jet nozzle 22: The second jet nozzle group 22A: 2nd jet nozzle 24: Jet nozzle group 30: Reductant supply line 32: Flow adjustment valve 34: Valve actuator 40: Concentration sensor 50: Controller 51: CPU 52: RAM 53: ROM 54: Reductant injection volume adjustment program 55: Bus 100: boiler system D: width G: Exhaust gas S10: steps S20: steps W: width

圖1係顯示適用本發明之一實施形態之還原劑供給裝置之鍋爐系統之廢氣流路下游側之構成之概略圖。 圖2係概略地顯示一實施形態之還原劑供給裝置之構成之側剖視圖。 圖3係概略地顯示一實施形態之還原劑供給裝置之構成之圖,係圖2所示之III部之部分放大圖。 圖4係概略地顯示由一實施形態之還原劑供給裝置進行之還原劑之濃度調整之側剖視圖。 圖5係顯示一實施形態之還原劑供給裝置之控制系統之構成之方塊圖。 圖6係顯示本發明之至少一實施形態之還原劑供給方法之流程圖。Fig. 1 is a schematic diagram showing the configuration of the downstream side of the exhaust gas flow path of a boiler system to which a reducing agent supply device according to an embodiment of the present invention is applied. Fig. 2 is a side sectional view schematically showing the structure of a reducing agent supply device of an embodiment. FIG. 3 is a diagram schematically showing the structure of the reducing agent supply device of an embodiment, and is a partially enlarged view of part III shown in FIG. 2. 4 is a side sectional view schematically showing the concentration adjustment of the reducing agent performed by the reducing agent supply device of an embodiment. Fig. 5 is a block diagram showing the structure of the control system of the reducing agent supply device of an embodiment. Fig. 6 is a flowchart showing the reducing agent supply method of at least one embodiment of the present invention.

2:廢氣流路(流路) 2: Exhaust gas flow path (flow path)

7:障礙物 7: Obstacles

10:還原劑供給裝置 10: Reducing agent supply device

12:集管 12: header

12A:第1集管分區 12A: The first header partition

20:噴射噴嘴 20: Jet nozzle

21:第1噴射噴嘴群 21: The first jet nozzle group

21A:第1噴射噴嘴 21A: The first jet nozzle

22:第2噴射噴嘴群 22: The second jet nozzle group

22A:第2噴射噴嘴 22A: 2nd jet nozzle

24:噴射噴嘴群 24: Jet nozzle group

30:還原劑供給線 30: Reductant supply line

32:流量調整閥 32: Flow adjustment valve

40:濃度感測器 40: Concentration sensor

50:控制器 50: Controller

G:廢氣 G: Exhaust gas

W:寬度 W: width

Claims (6)

一種還原劑供給裝置,其係用於對配置有障礙物之廢氣之流路內之SCR觸媒之上游供給還原劑者,且包含:複數個噴射噴嘴,其等在前述廢氣之流動方向上之前述障礙物之下游,沿著相對於前述廢氣之流動方向交叉之一方向空開間隔地配置;及複數條還原劑供給線,其等構成為對前述複數個噴射噴嘴供給前述還原劑;且在前述複數個噴射噴嘴中,將位於前述障礙物之下游之噴射噴嘴定義為第1噴射噴嘴,將不位於前述障礙物之下游之噴射噴嘴定義為第2噴射噴嘴之情形下,將前述複數個噴射噴嘴區分為複數個噴射噴嘴群,該複數個噴射噴嘴群係含有:第1噴射噴嘴群,其係包含構成為由同一條第1還原劑供給線供給前述還原劑之至少一個噴射噴嘴之複數個噴射噴嘴群者,且含有前述第1噴射噴嘴之前述噴射噴嘴群;及第2噴射噴嘴群,其係包含構成為由同一條第2還原劑供給線供給前述還原劑之至少一個噴射噴嘴之複數個噴射噴嘴群者,且含有前述第2噴射噴嘴之前述噴射噴嘴群;且經由上述第1還原劑供給線之來自上述第1噴射噴嘴群之上述還原劑之噴射量,與經由上述第2還原劑供給線之來自上述第2噴射噴嘴群之上述還原劑之噴射量可獨立調整。 A reductant supply device, which is used to supply reductant upstream of the SCR catalyst in the flow path of the exhaust gas with obstacles, and includes: a plurality of injection nozzles, which are in the flow direction of the aforementioned exhaust gas The downstream of the obstacle is arranged at intervals along a direction that intersects the flow direction of the exhaust gas; and a plurality of reducing agent supply lines are configured to supply the reducing agent to the plurality of injection nozzles; and Among the aforementioned plural jet nozzles, the jet nozzle located downstream of the aforementioned obstacle is defined as the first jet nozzle, and the jet nozzle not located downstream of the aforementioned obstacle is defined as the second jet nozzle, the aforementioned plural jets The nozzles are divided into a plurality of injection nozzle groups, and the plurality of injection nozzle groups includes: a first injection nozzle group, which includes a plurality of injection nozzles configured to supply the aforementioned reducing agent from the same first reducing agent supply line A group of injection nozzles, including the aforementioned group of injection nozzles of the first injection nozzle; and a group of second injection nozzles, including a plurality of at least one injection nozzle configured to supply the aforementioned reducing agent from the same second reducing agent supply line And the injection nozzle group of the second injection nozzle; and the injection amount of the reducing agent from the first injection nozzle group via the first reducing agent supply line is the same as that of the reducing agent via the second injection nozzle group. The injection amount of the reducing agent from the second injection nozzle group of the agent supply line can be adjusted independently. 如請求項1之還原劑供給裝置,其中一個前述第1噴射噴嘴群所含之前述第1噴射噴嘴之數目,少於一個前述第2噴射噴嘴群所含之前述第2噴射噴嘴之數目。 The reducing agent supply device of claim 1, wherein the number of the first injection nozzles included in one first injection nozzle group is less than the number of the second injection nozzles included in one second injection nozzle group. 如請求項1或2之還原劑供給裝置,其中作為前述一方向上之前述流路之寬度W、前述流動方向上之前述障礙物之寬度D,和前述流動方向上之前述障礙物與前述第1噴射噴嘴群之距離L,滿足下式(i)或(ii),L≦2W‧‧‧(i) L≦20D‧‧‧(ii)。 The reducing agent supply device of claim 1 or 2, wherein the width W of the flow path in the one direction, the width D of the obstacle in the flow direction, and the obstacle in the flow direction and the first The distance L of the jet nozzle group satisfies the following formula (i) or (ii), L≦2W‧‧‧(i) L≦20D‧‧‧(ii). 如請求項1或2之還原劑供給裝置,其中前述複數個噴射噴嘴遍及前述流路之整個寬度而離散地配置。 The reducing agent supply device of claim 1 or 2, wherein the plurality of spray nozzles are discretely arranged across the entire width of the flow path. 如請求項1或2之還原劑供給裝置,其進而包含:濃度感測器,其在前述流動方向上配置於前述複數個噴射噴嘴群之下游,用於測定前述一方向上之前述廢氣中之前述還原劑或NOx之濃度分佈;與前述複數條還原劑供給線之各者對應地設置之複數個流量調整閥、及可獨立地變更該複數個流量調整閥各者之開度之複數個閥致動器;以及控制器,其根據前述濃度感測器之檢測信號驅動前述閥致動器。 The reducing agent supply device of claim 1 or 2, further comprising: a concentration sensor, which is arranged downstream of the plurality of injection nozzle groups in the flow direction, and is used to measure the exhaust gas in the one direction Concentration distribution of reducing agent or NOx; a plurality of flow adjustment valves corresponding to each of the aforementioned plurality of reducing agent supply lines, and a plurality of valves that can independently change the opening degree of each of the plurality of flow adjustment valves And a controller, which drives the valve actuator according to the detection signal of the concentration sensor. 一種還原劑供給裝置之運用方法,其係用於還原劑供給裝置者,該還原劑供給裝置係用於對配置有障礙物之廢氣之流路內之SCR觸媒之上游 供給還原劑,且前述還原劑供給裝置包含:複數個噴射噴嘴,其等在前述廢氣之流動方向上之前述障礙物之下游,沿著相對於前述廢氣之流動方向交叉之一方向空開間隔地配置;及複數條還原劑供給線,其等構成為對前述複數個噴射噴嘴供給前述還原劑;且在前述複數個噴射噴嘴中,將位於前述障礙物之下游之噴射噴嘴定義為第1噴射噴嘴,將不位於前述障礙物之下游之噴射噴嘴定義為第2噴射噴嘴之情形下,將前述複數個噴射噴嘴區分為複數個噴射噴嘴群,該複數個噴射噴嘴群係含有:第1噴射噴嘴群,其係包含構成為由同一條第1還原劑供給線供給前述還原劑之至少一個噴射噴嘴之複數個噴射噴嘴群者,且含有前述第1噴射噴嘴之前述噴射噴嘴群;及第2噴射噴嘴群,其係包含構成為由同一條第2還原劑供給線供給前述還原劑之至少一個噴射噴嘴之複數個噴射噴嘴群者,且含有前述第2噴射噴嘴之前述噴射噴嘴群;且前述還原劑供給裝置之運用方法包含:在前述廢氣之流動方向之前述複數個噴射噴嘴之下游,測定前述一方向上之前述還原劑或NOx之濃度分佈之步驟,及根據前述濃度分佈之測定結果,個別地調整供給至前述第1噴射噴嘴群及前述第2噴射噴嘴群之前述還原劑之量之步驟。 An operating method of a reducing agent supply device, which is used for a reducing agent supply device, which is used to upstream the SCR catalyst in the flow path of the exhaust gas with obstacles The reducing agent is supplied, and the reducing agent supply device includes: a plurality of injection nozzles, which are located downstream of the obstacle in the flow direction of the exhaust gas, at intervals along a direction that intersects the flow direction of the exhaust gas Configuration; and a plurality of reducing agent supply lines, which are configured to supply the reducing agent to the plurality of injection nozzles; and among the plurality of injection nozzles, the injection nozzle located downstream of the obstacle is defined as the first injection nozzle , When the jet nozzle that is not located downstream of the obstacle is defined as the second jet nozzle, the plurality of jet nozzles are divided into a plurality of jet nozzle groups, and the plurality of jet nozzle groups include: the first jet nozzle group , Which includes a plurality of injection nozzle groups configured to supply at least one injection nozzle of the reducing agent from the same first reducing agent supply line, and the injection nozzle group including the first injection nozzle; and the second injection nozzle The group includes a plurality of injection nozzle groups configured to supply at least one injection nozzle of the reducing agent from the same second reducing agent supply line, and the injection nozzle group including the second injection nozzle; and the reducing agent The operation method of the supply device includes the step of measuring the concentration distribution of the reducing agent or NOx in the one direction downstream of the plurality of injection nozzles in the flow direction of the exhaust gas, and individually adjusting according to the measurement result of the concentration distribution A step of supplying the amount of the reducing agent to the first injection nozzle group and the second injection nozzle group.
TW108138791A 2019-02-01 2019-10-28 Reducing agent supply device and method of operating the reducing agent supply device TWI707719B (en)

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