TWI703090B - Boride particles, boride particle dispersion, infrared shielding transparent substrate, infrared shielding optical member, infrared shielding particle dispersion, infrared shielding interlayer transparent substrate, infrared shielding particle dispersion powder, and master batch - Google Patents

Boride particles, boride particle dispersion, infrared shielding transparent substrate, infrared shielding optical member, infrared shielding particle dispersion, infrared shielding interlayer transparent substrate, infrared shielding particle dispersion powder, and master batch Download PDF

Info

Publication number
TWI703090B
TWI703090B TW105144050A TW105144050A TWI703090B TW I703090 B TWI703090 B TW I703090B TW 105144050 A TW105144050 A TW 105144050A TW 105144050 A TW105144050 A TW 105144050A TW I703090 B TWI703090 B TW I703090B
Authority
TW
Taiwan
Prior art keywords
infrared
particles
particle dispersion
infrared shielding
boride
Prior art date
Application number
TW105144050A
Other languages
Chinese (zh)
Other versions
TW201739693A (en
Inventor
福田健二
見良津三信
常松裕史
長南武
Original Assignee
日商住友金屬礦山股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2016254440A external-priority patent/JP6859704B2/en
Priority claimed from JP2016254437A external-priority patent/JP6838396B2/en
Priority claimed from JP2016254433A external-priority patent/JP7272614B2/en
Application filed by 日商住友金屬礦山股份有限公司 filed Critical 日商住友金屬礦山股份有限公司
Publication of TW201739693A publication Critical patent/TW201739693A/en
Application granted granted Critical
Publication of TWI703090B publication Critical patent/TWI703090B/en

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00Boron; Compounds thereof
    • C01B35/02Boron; Borides
    • C01B35/04Metal borides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • B32B17/10005Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
    • B32B17/1055Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer
    • B32B17/10614Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer comprising particles for purposes other than dyeing
    • B32B17/10633Infrared radiation absorbing or reflecting agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • B32B17/10005Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
    • B32B17/1055Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer
    • B32B17/10761Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer containing vinyl acetal
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/5156Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on rare earth compounds
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/62222Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic coatings
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/626Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
    • C04B35/63Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B using additives specially adapted for forming the products, e.g.. binder binders
    • C04B35/632Organic additives
    • C04B35/634Polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/20Compounding polymers with additives, e.g. colouring
    • C08J3/22Compounding polymers with additives, e.g. colouring using masterbatch techniques
    • C08J3/226Compounding polymers with additives, e.g. colouring using masterbatch techniques using a polymer as a carrier
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/66Additives characterised by particle size
    • C09D7/67Particle size smaller than 100 nm
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/206Filters comprising particles embedded in a solid matrix
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/208Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/80Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/82Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/60Optical properties, e.g. expressed in CIELAB-values
    • C01P2006/66Hue (H*)
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
    • C04B2235/9646Optical properties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/002Physical properties
    • C08K2201/005Additives being defined by their particle size in general
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/011Nanostructured additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/38Boron-containing compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/25Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles

Abstract

提供一種硼化物粒子,其由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示,用燃燒紅外吸收法測定時的該硼化物粒子中包含的碳含量為0.2質量%以下。 Provided is a boride particle, which has the general formula XB m (where X is selected from Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sr One or more metal elements of Ca, where m is a number representing the content of boron in the general formula) means that the carbon content contained in the boride particles when measured by the combustion infrared absorption method is 0.2% by mass or less.

Description

硼化物粒子、硼化物粒子分散液、紅外線遮蔽透明基材、紅外線遮蔽光學構件、紅外線遮蔽粒子分散體、紅外線遮蔽夾層透明基材、紅外線遮蔽粒子分散粉末、以及母料 Boride particles, boride particle dispersion, infrared shielding transparent substrate, infrared shielding optical member, infrared shielding particle dispersion, infrared shielding interlayer transparent substrate, infrared shielding particle dispersion powder, and master batch

本發明關於一種硼化物粒子、硼化物粒子分散液、紅外線遮蔽透明基材、紅外線遮蔽光學構件、紅外線遮蔽粒子分散體、紅外線遮蔽夾層透明基材、紅外線遮蔽粒子分散粉末、以及母料。 The present invention relates to a boride particle, a boride particle dispersion, an infrared shielding transparent substrate, an infrared shielding optical member, an infrared shielding particle dispersion, an infrared shielding interlayer transparent substrate, an infrared shielding particle dispersion powder, and a master batch.

以往,對於La等稀土元素的硼化物粒子,利用固相反應法進行合成後,利用乾式粉碎法進行粉碎來製造,特別是利用噴射研磨機等的高速氣流使粒子彼此碰撞來進行粉碎的方法較為普遍。對於稀土元素的硼化物粒子之中的例如六硼化鑭,藉由在碳的存在下將鑭氧化物和硼氧化物加熱至高溫而得到,之後利用乾式粉碎裝置進行粉碎。需要說明的是,例如在專利文獻1中公開了使用噴射研磨機的粉狀體的微粉碎方法。 In the past, boride particles of rare earth elements such as La were synthesized by a solid-phase reaction method and then pulverized by a dry pulverization method. In particular, the method of pulverizing the particles by colliding with each other by high-speed airflow of a jet mill is more universal. Among rare earth element boride particles, for example, lanthanum hexaboride is obtained by heating lanthanum oxide and boron oxide to a high temperature in the presence of carbon, and then pulverized by a dry pulverizing device. It should be noted that, for example, Patent Document 1 discloses a method of finely pulverizing powder using a jet mill.

該些硼化物粒子以往被用於厚膜電阻糊劑等,另外當變成細微粒子時能夠用作日照遮蔽用的光學材料。換言之,由於使硼化物粒子分散的膜使可見光線透射,并能夠有效地遮蔽作為熱能作用近紅外線,因此已知其作為用於住宅或汽車車窗等的日照遮蔽材料較佳(例如參見專利文獻2、3)。 These boride particles have conventionally been used in thick film resistor pastes and the like, and when they become fine particles, they can be used as optical materials for sun-shielding. In other words, since the film in which the boride particles are dispersed transmits visible light and can effectively shield the near-infrared rays acting as heat energy, it is known to be suitable as a solar shielding material for houses or car windows (for example, see Patent Literature 2, 3).

然而,由於La等稀土元素的硼化物為硬質,因此存在難以利用使用噴射研磨機等的乾式粉碎法來粉碎成細微的粒子,只能得到1μm~3μm左右 的較大的粒子的問題。另外,對於利用乾式粉碎法所得到的硼化物粒子,難以抑制再凝集。 However, since the borides of rare earth elements such as La are hard, it is difficult to pulverize into fine particles by dry pulverization using jet mills, etc., and only about 1 μm to 3 μm can be obtained. The problem of larger particles. In addition, it is difficult to suppress re-aggregation of boride particles obtained by the dry pulverization method.

在之後的研究中,發現了藉由利用介質攪拌研磨機進行處理,能夠使硼化物粒子的平均分散粒徑為200nm以下(例如參見專利文獻4)。由此,從而能夠經濟地得到平均分散粒徑為200nm左右的硼化物粒子。如果使用平均分散粒徑為200nm以下的硼化物粒子,則能夠降低粒徑大於200nm時所引起的幾何散射或米氏散射。因此,從而能夠防止400nm~780nm的可見光範圍的光散射而變成磨砂玻璃般的現象,并從而能夠得到重視透明性的光學構件。 In subsequent studies, it was found that by processing with a media stirring mill, the average dispersed particle diameter of boride particles can be made 200 nm or less (for example, see Patent Document 4). In this way, boride particles having an average dispersed particle diameter of about 200 nm can be obtained economically. If boride particles with an average dispersed particle diameter of 200 nm or less are used, geometric scattering or Mie scattering caused when the particle diameter is larger than 200 nm can be reduced. Therefore, it is possible to prevent the light scattering in the visible light range of 400 nm to 780 nm from becoming frosted glass-like phenomenon, and thereby it is possible to obtain an optical member that emphasizes transparency.

然而,作為紅外線遮蔽粒子,對於分散有上述硼化物粒子的紅外線遮蔽光學構件,當照射太陽光或聚光燈等強光時有時會發生變色成藍白色的現象(以下有時將該現象記載為“藍霧”(blue haze))。如果發生該藍霧,則會存在有可能損害紅外線遮蔽光學構件的美觀等的問題。 However, as infrared shielding particles, infrared shielding optical members in which the above-mentioned boride particles are dispersed may change color to blue-white when irradiated with strong light such as sunlight or spotlights (hereinafter, this phenomenon may be described as " "Blue haze" (blue haze)). If this blue haze occurs, there is a problem that the beauty of the infrared shielding optical member may be impaired.

已知如果硼化物粒子的平均分散粒徑為200nm以下,則幾何散射或米氏散射降低,大部分散射的散射係數遵循由下述式(1)定義的瑞利散射。 It is known that if the average dispersed particle diameter of the boride particles is 200 nm or less, geometric scattering or Mie scattering is reduced, and the scattering coefficient of most of the scattering follows the Rayleigh scattering defined by the following formula (1).

S=[16 π5r6/3 λ4]‧[(m2-1)/(m2+2)]2‧[m] (1) S=[16 π 5 r 6 /3 λ 4 ]‧[(m 2 -1)/(m 2 +2)] 2 ‧[m] (1)

[其中,上述式(1)中,S為散射係數,λ為波長,r為粒徑,m=n1/n0,n0為基底的折射率,並且n1為分散物質的折射率] [Among them, in the above formula (1), S is the scattering coefficient, λ is the wavelength, r is the particle size, m=n 1 /n 0 , n 0 is the refractive index of the substrate, and n 1 is the refractive index of the dispersed substance]

上述瑞利散射是由於尺寸小於光的波長的粒子產生的光的散射。根據上述式(1),由於瑞利散射與波長(λ)的四次方成反比例,因此認為波長較短的藍色光多發生散射而變色成藍白色。 The aforementioned Rayleigh scattering is the scattering of light due to particles having a size smaller than the wavelength of light. According to the above-mentioned formula (1), since Rayleigh scattering is inversely proportional to the fourth power of the wavelength (λ), it is considered that blue light with a shorter wavelength is scattered and changed to a blue-white color.

另外,在瑞利散射區域中,根據上述式(1),由於散射光與粒徑(r) 的六次方成比例,因此認為藉由減小粒徑,從而能夠降低瑞利散射,并抑制藍霧發生。 In addition, in the Rayleigh scattering region, according to the above formula (1), due to the scattered light and the particle size (r) Is proportional to the sixth power, so it is believed that by reducing the particle size, Rayleigh scattering can be reduced and blue haze can be suppressed.

並且,例如在專利文獻5中公開了藉由使平均分散粒徑為85nm以下從而能夠抑制藍霧發生的例子。 In addition, for example, Patent Document 5 discloses an example in which the occurrence of blue haze can be suppressed by setting the average dispersed particle diameter to 85 nm or less.

<先前技術文獻> <Prior Technical Literature> <專利文獻> <Patent Literature>

專利文獻1:日本國特開2001-314776號公報 Patent Document 1: Japanese Patent Application Publication No. 2001-314776

專利文獻2:日本國特開2000-096034號公報 Patent Document 2: Japanese Patent Application Publication No. 2000-096034

專利文獻3:日本國特開平11-181336號公報 Patent Document 3: Japanese Patent Application Publication No. 11-181336

專利文獻4:日本國特開2004-237250號公報 Patent Document 4: Japanese Patent Application Publication No. 2004-237250

專利文獻5:日本國特開2009-150979號公報 Patent Document 5: Japanese Patent Application Publication No. 2009-150979

<非專利文獻> <Non-Patent Literature>

非專利文獻1:V. Domnich et al., J. Am. Ceram. Soc., (2011) vol.94, Issue 11, pp.3605-3628 Non-Patent Document 1: V. Domnich et al., J. Am. Ceram. Soc., (2011) vol.94, Issue 11, pp.3605-3628

非專利文獻2:X.H.Zhao et al., App. Mech. Mater., (2011) vol.55-57, pp.1436-1440 Non-Patent Document 2: X.H. Zhao et al., App. Mech. Mater., (2011) vol.55-57, pp.1436-1440

然而,若要利用專利文獻4公開的使用介質攪拌研磨機的粉碎方法將以往所使用的硼化物粒子粉碎至平均分散粒徑為85nm以下,則漿料粘度會變高並且有時難以進行粉碎處理。 However, if the pulverization method using a media stirring mill disclosed in Patent Document 4 is used to pulverize conventionally used boride particles to an average dispersed particle size of 85 nm or less, the slurry viscosity will increase and the pulverization process may be difficult. .

因此,存在為了繼續進行粉碎處理而進一步縮小平均分散粒徑、并抑 制藍霧,需要極端地降低漿料中的硼化物粒子的濃度而將粘度降低、並且粉碎效率較差且不經濟的問題。 Therefore, in order to continue the pulverization process, there is a further reduction in the average dispersion particle size and suppression of To make blue mist, it is necessary to extremely reduce the concentration of boride particles in the slurry to reduce the viscosity, and the pulverization efficiency is poor and uneconomical.

因此,鑑於上述以往技術中存在的問題,本發明的一個方面的目的在於提供一種硼化物粒子,其能夠容易地進行微粉碎。 Therefore, in view of the above-mentioned problems in the prior art, an object of one aspect of the present invention is to provide boride particles that can be easily pulverized.

為了解決上述問題,根據本發明的一個實施方式,提供一種硼化物粒子,其由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示,用燃燒紅外吸收法測定時的該硼化物粒子中包含的碳含量為0.2質量%以下。 In order to solve the above-mentioned problem, according to an embodiment of the present invention, a boride particle is provided, which has the general formula XB m (where X is selected from Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, One or more metal elements of Dy, Ho, Er, Tm, Yb, Lu, Sr, and Ca, where m is a number representing the content of boron in the general formula), and the boride particles when measured by the combustion infrared absorption method contain The carbon content is 0.2% by mass or less.

根據本發明的一個實施方式,能夠提供一種硼化物粒子,其能夠容易地進行微粉碎。 According to an embodiment of the present invention, it is possible to provide boride particles that can be easily pulverized.

10:測定裝置 10: Measuring device

11:光源 11: light source

12:測定試劑 12: Determination reagent

13:受光器 13: Receiver

14:積分球 14: Integrating sphere

15:標準反射板 15: Standard reflector

16:光阱部件 16: Optical trap components

141:第一開口部 141: first opening

142:第二開口部 142: second opening

143:第三開口部 143: Third opening

圖1是表示本發明的實施方式的紅外線遮蔽粒子分散體等的漫透射曲線的測定原理的說明圖(其一)。 Fig. 1 is an explanatory diagram showing the principle of measuring the diffuse transmission curve of an infrared shielding particle dispersion and the like according to an embodiment of the present invention (Part 1).

圖2是表示本發明的實施方式的紅外線遮蔽粒子分散體等的漫透射曲線的測定原理的說明圖(其二)。 Fig. 2 is an explanatory diagram showing the principle of measuring a diffuse transmission curve of an infrared shielding particle dispersion and the like according to an embodiment of the present invention (Part 2).

以下,參照附圖對本發明的實施方式進行說明,本發明並不限定於下述實施方式,在不脫離本發明範圍的情況下,可以對下述實施方式進行各種變形及替換。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. The present invention is not limited to the following embodiments, and various modifications and substitutions can be made to the following embodiments without departing from the scope of the present invention.

(硼化物粒子) (Boride particles)

在本實施方式中首先對硼化物粒子的構成例進行說明。 In this embodiment, first, a configuration example of boride particles will be described.

本實施方式的硼化物粒子涉及由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示的硼化物粒子。並且,用燃燒紅外吸收法測定時的該硼化物粒子中包含的碳含量可以被設定為0.2質量%以下。 The boride particles of this embodiment relate to the general formula XB m (where X is selected from Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, One or more metal elements of Sr and Ca, and m is a boride particle represented by a number representing the boron content in the general formula). In addition, the carbon content contained in the boride particles when measured by the combustion infrared absorption method can be set to 0.2% by mass or less.

本發明的發明人針對能夠容易地進行微粉碎、亦即能夠粉碎成細微粒子的硼化物粒子進行了深入研究。並且,發現藉由將硼化物粒子中的碳含量(碳濃度)設定為預定值以下,從而能夠得到容易地進行微粉碎的硼化物粒子,并完成了本發明。 The inventors of the present invention conducted intensive studies on boride particles that can be easily pulverized, that is, can be pulverized into fine particles. In addition, they discovered that by setting the carbon content (carbon concentration) in the boride particles to a predetermined value or less, it is possible to obtain boride particles that can be easily pulverized, and completed the present invention.

本實施方式的硼化物粒子如上所述可以為由通式XBm表示的硼化物的粒子。 The boride particles of this embodiment may be particles of boride represented by the general formula XB m as described above.

在由上述的通式XBm表示的本實施方式的硼化物粒子中,對於作為硼(B)與金屬元素X的元素比(莫耳比)(B/X)的m,並無特別限定,優選為3.0以上20.0以下。 In the boride particles of the present embodiment represented by the above-mentioned general formula XB m, m , which is the element ratio (molar ratio) (B/X) of boron (B) and the metal element X, is not particularly limited. Preferably it is 3.0 or more and 20.0 or less.

作為構成由通式XBm表示的硼化物粒子的硼化物,例如可舉出XB4、XB6、XB12等。然而,從選擇性地有效地降低部長1000nm附近處的近紅外區域的光的透射率的觀點來看,本實施方式的硼化物粒子優選以XB4或XB6為主體,可以部分地含有XB12Examples of borides constituting the boride particles represented by the general formula XB m include XB 4 , XB 6 , XB 12 and the like. However, from the viewpoint of selectively and effectively reducing the transmittance of light in the near-infrared region near the length of 1000 nm, the boride particles of this embodiment preferably contain XB 4 or XB 6 as the main component, and may partially contain XB 12 .

因此,對於上述通式XBm中的作為硼(B)與金屬元素(X)的元素比(B/X)的m,進一步優選為4.0以上6.2以下。 Therefore, m , which is the element ratio (B/X) of boron (B) to metal element (X) in the general formula XB m , is more preferably 4.0 or more and 6.2 or less.

需要說明的是,當上述(B/X)為4.0以上時,能夠抑制XB或XB2等的生成,儘管原因並不清楚,然而能夠提高日照遮蔽特性。另外,當上述(B/X)為6.2以下時,特別能夠增加日照遮蔽特性優異的六硼化物的含有比率,由於提高了日照遮蔽特性因此優選。 It should be noted that when the above-mentioned (B/X) is 4.0 or more, the generation of XB or XB 2 can be suppressed. Although the reason is not clear, the solar shading characteristics can be improved. In addition, when the aforementioned (B/X) is 6.2 or less, the content ratio of hexaborides having excellent solar shading properties can be increased, and it is preferable because the solar shading properties are improved.

特別是由於在硼化物中近紅外線的吸收能力較高,因此本實施方式的硼化物粒子優選以XB6為主體。 Particularly, since the absorption ability of near-infrared rays is high among borides, it is preferable that the boride particles of this embodiment contain XB 6 as the main component.

因此,在上述通式XBm表示的硼化物粒子中,對於作為硼(B)與金屬元素(X)的元素比(B/X)的m,更進一步優選為5.8以上6.2以下。 Therefore, in the boride particles represented by the general formula XB m, m , which is the element ratio (B/X) of boron (B) to metal element (X), is more preferably 5.8 or more and 6.2 or less.

需要說明的是,在製造硼化物粒子時,對於所得到的包括硼化物粒子的粉狀體,並非僅由單一組成的硼化物的粒子構成,而是可以為包括複數個組成的硼化物的粒子。具體而言,例如可以為XB4、XB6、XB12等硼化物的混合物的粒子。 It should be noted that in the production of boride particles, the obtained powder including boride particles is not only composed of boride particles of a single composition, but may be particles composed of a plurality of borides. . Specifically, it may be particles of a mixture of borides such as XB 4 , XB 6 , XB 12 and the like.

因此,當針對例如作為代表性的硼化物粒子的六硼化物的粒子進行X射線衍射的測定時,即使X射線衍射分析上為單相,也認為實際上微量地含有其他相。 Therefore, when X-ray diffraction measurement is performed on, for example, hexaboride particles, which are representative boride particles, even if the X-ray diffraction analysis is a single phase, it is considered that the other phases are actually contained in a small amount.

因此,本實施方式的硼化物粒子的通式XBm中的m可以為例如對包含所得到的硼化物粒子的粉狀體利用ICP發光分光分析法(高頻電感耦合離子發光分光分析法)等進行化學分析時的、硼(B)與X元素1個原子的原子比。 Therefore, m in the general formula XB m of the boride particles of the present embodiment may be, for example, the use of ICP emission spectroscopy (high frequency inductively coupled ion emission spectroscopy) on a powder containing the obtained boride particles. The atomic ratio of boron (B) to one atom of X element in chemical analysis.

對於本實施方式的硼化物粒子的金屬元素(X)如上述通式所示並無特別限定,例如可以為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素。 The metal element (X) of the boride particles of this embodiment is not particularly limited as shown in the above general formula. For example, it may be selected from Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, One or more metal elements of Ho, Er, Tm, Yb, Lu, Sr, and Ca.

然而,由於作為鑭的六硼化物的六硼化鑭的近紅外線的吸收能力特別高,因此本實施方式的硼化物粒子優選包括六硼化鑭粒子。 However, since lanthanum hexaboride, which is a hexaboride of lanthanum, has a particularly high near-infrared absorption ability, the boride particles of the present embodiment preferably include lanthanum hexaboride particles.

並且,如上所述,根據本發明的發明人的研究,藉由將硼化物粒子中的碳含量(碳濃度)設定為預定值以下,從而能夠得到能夠容易地進行微粉碎的硼化物粒子。對於其理由以下將進行說明。 Furthermore, as described above, according to the research of the inventors of the present invention, by setting the carbon content (carbon concentration) in the boride particles to a predetermined value or less, it is possible to obtain boride particles that can be easily pulverized. The reason will be explained below.

根據本發明的發明人的研究,硼化物粒子中所包含的碳與硼化物粒子的成分形成碳化合物,或者有時殘留有原料中包含的碳化合物。 According to the study of the inventor of the present invention, carbon contained in the boride particles and the components of the boride particles form a carbon compound, or the carbon compound contained in the raw material may remain.

作為這樣的碳化合物,例如可舉出LaB2C2、LaB2C4、B4C、B4.5C、B5.6C、B6.5C、B7.7C、B9C等。 Examples of such carbon compounds include LaB 2 C 2 , LaB 2 C 4 , B 4 C, B 4.5 C, B 5.6 C, B 6.5 C, B 7.7 C, B 9 C and the like.

根據非專利文獻1,上述碳化合物之中,B4C、B4.5C、B5.6C、B6.5C、B7.7C、B9C為作為硬度指標的楊氏模量分別為472GPa、463GPa、462GPa、446GPa、352GPa、348GPa的高硬度的碳化合物。 According to Non-Patent Document 1, among the above-mentioned carbon compounds, B 4 C, B 4.5 C, B 5.6 C, B 6.5 C, B 7.7 C, and B 9 C are hardness indexes of Young’s modulus of 472 GPa, 463 GPa, High hardness carbon compounds of 462GPa, 446GPa, 352GPa, 348GPa.

另一方面,在非專利文獻2中,報告了例如六硼化鑭的楊氏模量為194GPa。另外,推定其他的硼化物粒子亦具有同等程度的楊氏模量。 On the other hand, in Non-Patent Document 2, for example, it is reported that the Young's modulus of lanthanum hexaboride is 194 GPa. In addition, it is estimated that other boride particles also have the same Young's modulus.

這樣一來,與作為目標的硼化物粒子相比,作為雜質混入的碳化合物的楊氏模量有時較高。因此,為了得到能夠容易進行微粉碎的硼化物粒子,尋求抑制這些碳化合物的混入。 In this way, the Young's modulus of the carbon compound mixed as an impurity may be higher than that of the target boride particle. Therefore, in order to obtain boride particles that can be easily pulverized, it is required to suppress the incorporation of these carbon compounds.

並且,由於這些碳化合物的混入量(含量)與硼化物粒子中的碳含量相關,因此如上所述,考慮藉由將硼化物粒子中的碳含量設為預定值以下,從而能夠得到能夠容易地進行微粉碎的硼化物粒子。 In addition, since the mixing amount (content) of these carbon compounds is related to the carbon content in the boride particles, as described above, it is considered that by setting the carbon content in the boride particles to a predetermined value or less, it is possible to easily obtain Finely pulverized boride particles.

本實施方式的硼化物粒子中包含的碳含量可以利用燃燒紅外吸收法來測定。並且,利用燃燒紅外吸收法測定的本實施方式的硼化物粒子中包含 的碳含量優選為0.2質量%以下,更優選0.1質量%以下。 The carbon content contained in the boride particles of the present embodiment can be measured by the combustion infrared absorption method. In addition, the boride particles of this embodiment measured by the combustion infrared absorption method contain The carbon content of is preferably 0.2% by mass or less, more preferably 0.1% by mass or less.

另外,由於在硼化物粒子中上述碳化合物之中的B4C(碳化硼)特別容易生成,因此本實施方式的硼化物粒子優選對所含有的B4C的量亦進行抑制。例如,本實施方式的硼化物粒子的B4C的含量(含有比率)優選為1.0質量%以下。 In addition, since B 4 C (boron carbide) among the above-mentioned carbon compounds is particularly easily produced in the boride particles, the boride particles of the present embodiment preferably also suppress the amount of B 4 C contained. For example, the content (content ratio) of B 4 C in the boride particles of the present embodiment is preferably 1.0% by mass or less.

藉由使本實施方式的硼化物粒子中包含的B4C的量、亦即B4C的含有比率為1.0質量%以下,從而亦能夠抑制其他碳化合物的含量,能夠得到能夠特別容易地進行微粉碎的硼化物粒子,因而優選。 By setting the amount of B 4 C contained in the boride particles of the present embodiment, that is, the content ratio of B 4 C to 1.0% by mass or less, the content of other carbon compounds can also be suppressed, and it is possible to obtain particularly easy Finely pulverized boride particles are therefore preferred.

本實施方式的硼化物粒子中所包含的B4C量可以藉由實施硝酸溶解和過濾分離的預處理而利用ICP分析來測定。 The amount of B 4 C contained in the boride particles of the present embodiment can be measured by ICP analysis by performing pretreatment of nitric acid dissolution and filtration separation.

已知B4C幾乎不溶解於硝酸。另一方面,已知硼化物粒子溶解於硝酸。 It is known that B 4 C hardly dissolves in nitric acid. On the other hand, it is known that boride particles are dissolved in nitric acid.

因而,當對硼化物粒子中的B4C量進行評價時,藉由在硝酸中添加硼化物粒子,使硼化物粒子溶解後,過濾分離未溶解殘渣,從而能夠僅提取出硼化物粒子中的B4C粒子。並且,藉由利用碳酸鈉將所分離的B4C粒子溶解,并利用ICP分析對硼濃度進行測定,從而能夠計算出B4C濃度。 Therefore, when evaluating the amount of B 4 C in the boride particles, by adding the boride particles to nitric acid to dissolve the boride particles, the undissolved residue can be separated by filtration, so that only the boride particles can be extracted B 4 C particles. In addition, the B 4 C concentration can be calculated by dissolving the separated B 4 C particles with sodium carbonate and measuring the boron concentration by ICP analysis.

此時,為了確認在過濾分離後所得到的未溶解殘渣為B4C,希望並行地準備至過濾分離為止進行了同樣處理的試劑,并且對在過濾分離後所得到的試劑的未溶解殘渣進行XRD測定并確認為B4C單相。 At this time, in order to confirm that the undissolved residue obtained after filtration separation is B 4 C, it is desirable to prepare reagents that have been treated in the same way until filtration separation, and to perform the undissolved residues of the reagents obtained after filtration separation. XRD measured and confirmed that it was B 4 C single phase.

另一方面,儘管六硼化物粒子等硼化物粒子為著色成暗紫色等的粉末,但在將其粉碎成粒徑與可見光波長相比充分小、在膜中分散的狀態下,對於膜產生了可見光透射性。同時,發現紅外線遮蔽功能。 On the other hand, although boride particles such as hexaboride particles are powders colored in dark purple, etc., when they are crushed to a particle size sufficiently smaller than the wavelength of visible light and dispersed in the film, visible light is generated for the film. Transmittance. At the same time, the infrared shielding function was discovered.

對於其原因還未詳細弄清,但考慮其是由於這些硼化物材料保有較多 的自由電子,在近紅外線區域中存在4f-5d間的帶間遷移或因電子-電子、電子-聲子相互作用而產生的吸收。 The reason for this has not been clarified in detail, but it is considered that these boride materials hold more The free electrons in the near-infrared region have 4f-5d band-to-band migration or absorption due to electron-electron and electron-phonon interaction.

根據實驗,確認在使這些硼化物粒子充分細微并均勻分散的膜中,膜的透射率在波長400nm以上700以下的區域內具有極大值,並且在波長700nm以上1800nm以下的區域具有極小值。若考慮可見光波長為380nm以上780nm以下,光敏度是以550nm附近為峰值的鐘形,則能夠理解在這樣的膜中有效地使可見光透射,并有效地吸收并反射除此以外的日光。 According to experiments, it is confirmed that in a film in which these boride particles are sufficiently fine and uniformly dispersed, the transmittance of the film has a maximum value in a wavelength range from 400 nm to 700 and a minimum value in a wavelength range from 700 nm to 1800 nm. Considering that the wavelength of visible light is 380 nm or more and 780 nm or less, and the photosensitivity is a bell shape with a peak near 550 nm, it can be understood that such a film effectively transmits visible light and effectively absorbs and reflects other sunlight.

本實施方式的硼化物粒子的平均分散粒徑優選為100nm以下,更優選為85nm以下。需要說明的是,在此所說的平均分散粒徑可以利用基於動態光散射法的粒徑測定裝置來測定。 The average dispersed particle diameter of the boride particles of the present embodiment is preferably 100 nm or less, and more preferably 85 nm or less. It should be noted that the average dispersed particle diameter mentioned here can be measured by a particle diameter measuring device based on a dynamic light scattering method.

儘管對於硼化物粒子的平均分散粒徑的下限值並未特別限定,但優選為例如1nm以上。這是由於工業上難以將硼化物粒子的平均分散粒徑形成為小於1nm。 Although the lower limit of the average dispersed particle diameter of the boride particles is not particularly limited, it is preferably, for example, 1 nm or more. This is because it is industrially difficult to make the average dispersed particle diameter of boride particles smaller than 1 nm.

對於上述的本實施方式的硼化物粒子,由於其碳的含量為預定值以下,因此能夠容易地以例如平均分散粒徑為100nm以下,特別為85nm以下的方式進行微粉碎。因此,分散有本實施方式的硼化物粒子的紅外線遮蔽光學構件即使在照射太陽光或聚光燈等強光的情況下也能夠抑制藍霧的發生。 Since the boride particles of the present embodiment described above have a carbon content of a predetermined value or less, they can be easily pulverized so that the average dispersed particle diameter is 100 nm or less, particularly 85 nm or less, for example. Therefore, the infrared shielding optical member in which the boride particles of the present embodiment are dispersed can suppress the occurrence of blue haze even when irradiated with strong light such as sunlight or spotlights.

(硼化物粒子的製造方法) (Method of manufacturing boride particles)

接著,對本實施方式的硼化物粒子的製造方法的一個構成例進行說明。 Next, a configuration example of the manufacturing method of boride particles of this embodiment will be described.

作為本實施方式的硼化物粒子的製造方法,只要所得到的硼化物粒子由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、 Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示,並且用燃燒紅外吸收法對該硼化物粒子進行測定時的該硼化物粒子中包含的碳含量(碳濃度)為0.2質量%以下便並無特別限定。 As the method for producing boride particles in this embodiment, as long as the boride particles obtained have the general formula XB m (where X is selected from Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy , Ho, Er, Tm, Yb, Lu, Sr, Ca and more than one metal element, m is the number representing the boron content in the general formula), and the boride particles are measured by the combustion infrared absorption method The carbon content (carbon concentration) contained in the boride particles is not particularly limited if it is 0.2% by mass or less.

作為本實施方式的硼化物粒子的製造方法的一個構成例,例如可舉出將碳或碳化硼用作還原劑的固相反應法。以下以對製造將鑭作為金屬元素使用的硼化物粒子的情況為例進行說明。 As an example of the configuration of the method for producing boride particles of the present embodiment, for example, a solid phase reaction method using carbon or boron carbide as a reducing agent can be cited. Hereinafter, a case of manufacturing boride particles using lanthanum as a metal element will be described as an example.

例如,作為金屬元素使用鑭的硼化物粒子可藉由對硼源和還原劑和鑭源的混合物進行燒成來製造。 For example, boride particles using lanthanum as a metal element can be produced by firing a mixture of a boron source and a reducing agent and a lanthanum source.

具體而言,當例如作為硼源及還原劑使用碳化硼、作為鑭源使用氧化鑭來製造硼化鑭粒子時,首先調製碳化硼和氧化鑭的原料混合物。接著,藉由在惰性氣氛中以1500℃以上的溫度對該原料混合物進行燒成,利用碳化硼中的碳將鑭氧化物還原,產生一氧化碳及二氧化碳并將碳除去。然後,由剩餘的鑭和硼得到硼化鑭。 Specifically, when boron carbide is used as a boron source and reducing agent, and lanthanum oxide is used as a lanthanum source to produce lanthanum boride particles, first, a raw material mixture of boron carbide and lanthanum oxide is prepared. Next, by firing the raw material mixture at a temperature of 1500° C. or higher in an inert atmosphere, the carbon in the boron carbide is used to reduce the lanthanum oxide to generate carbon monoxide and carbon dioxide and remove the carbon. Then, lanthanum boride is obtained from the remaining lanthanum and boron.

需要說明的是,來自碳化硼的碳並未作為一氧化碳及二氧化碳被完全除去,而是其一部分殘留在硼化鑭粒子中成為雜質碳。因此,原料中的碳化硼的比率增加,所得到的硼化鑭粒子中的雜質碳濃度增大。 It should be noted that the carbon derived from boron carbide is not completely removed as carbon monoxide and carbon dioxide, but a part of it remains in the lanthanum boride particles as impurity carbon. Therefore, the ratio of boron carbide in the raw material increases, and the impurity carbon concentration in the obtained lanthanum boride particles increases.

如上所述,所得到的包括硼化物粒子的粉狀體,並非僅由單一組成的硼化物的粒子構成,而是為LaB4、LaB6、LaB12等的混合物的粒子。因此,當針對所得到的包括硼化物粒子的粉狀體進行X射線衍射的測定時,即使X射線衍射分析上關於硼化物為單相,也認為實際上微量地含有其他相。 As described above, the obtained powder including boride particles is not only composed of boride particles of a single composition, but is a mixture of LaB 4 , LaB 6 , LaB 12 and the like. Therefore, when the X-ray diffraction measurement is performed on the obtained powder including boride particles, even if the boride is a single phase in X-ray diffraction analysis, it is considered that the other phase is actually contained in a small amount.

此時,如上所述在製造作為金屬元素使用鑭的硼化物粒子時,對於原 料的硼源中的硼及鑭源中的鑭的元素比B/La並無特別限定,優選為3.0以上20.0以下。 At this time, when manufacturing boride particles using lanthanum as a metal element as described above, the original The element ratio B/La of boron in the boron source of the material and lanthanum in the lanthanum source is not particularly limited, but is preferably 3.0 or more and 20.0 or less.

特別是,當原料的硼源中的硼及鑭源中的鑭的元素比B/La為4.0以上時,能夠抑制LaB、LaB2等的生成。另外,儘管原因並不清楚,然而能夠提高日照遮蔽特性。 In particular, when the element ratio B/La of boron in the boron source of the raw material and lanthanum in the lanthanum source is 4.0 or more, the generation of LaB, LaB 2 and the like can be suppressed. In addition, although the reason is not clear, it is possible to improve solar shading characteristics.

另一方面,當原料的硼源中的硼及鑭源中的鑭的元素比B/La為6.2以下時,硼化物粒子以外的氧化硼的生成被抑制。由於氧化硼粒子具有吸濕性,因此如果在包含硼化物粒子的粉狀體中混入氧化硼粒子則包含硼化物粒子的粉狀體的耐濕性降低,日照遮蔽特性的隨時間的劣化會增大。 On the other hand, when the element ratio B/La of boron in the boron source of the raw material and lanthanum in the lanthanum source is 6.2 or less, the production of boron oxide other than boride particles is suppressed. Since boron oxide particles are hygroscopic, if boron oxide particles are mixed into a powder containing boride particles, the moisture resistance of the powder containing boride particles will decrease, and the deterioration of solar shading properties over time will increase. Big.

因此,優選使原料的硼源中的硼及鑭源中的鑭的元素比B/La為6.2以下并抑制氧化硼粒子的生成。另外,當元素比B/La為6.2以下時,特別能夠增加日照遮蔽特性優異的六硼化物的含有比率,由於提高了日照遮蔽特性因此優選。 Therefore, it is preferable to make the element ratio B/La of boron in the boron source of the raw material and lanthanum in the lanthanum source 6.2 or less and suppress the generation of boron oxide particles. In addition, when the element ratio B/La is 6.2 or less, it is particularly possible to increase the content ratio of hexaborides having excellent solar shading properties, and it is preferable because the solar shading properties are improved.

為了進一步降低雜質碳濃度,儘可能地降低原料中的碳化硼的比率較為有效。因此,例如藉由使B/La為6.2以下來生成硼化鑭的粒子,從而能夠更確實地得到包括雜質碳濃度為0.2質量%以下的硼化鑭的粒子的粉狀體。 In order to further reduce the impurity carbon concentration, it is effective to reduce the ratio of boron carbide in the raw material as much as possible. Therefore, for example, by setting B/La to 6.2 or less to generate lanthanum boride particles, it is possible to more reliably obtain a powder including lanthanum boride particles having an impurity carbon concentration of 0.2% by mass or less.

如上所述,當製造作為金屬元素使用鑭的硼化物粒子時,優選使硼源中的硼及鑭源中的鑭的元素比(莫耳比)B/La為4.0以上6.2以下。藉由使原料的組成為上述範圍,從而能夠將所得到的包含硼化鑭粒子的粉體中的雜質碳濃度抑制得較低,同時能夠得到含有顯示出較高日照遮蔽特性得硼化鑭粒子的粉狀體。 As described above, when producing boride particles using lanthanum as a metal element, it is preferable that the element ratio (molar ratio) B/La of boron in the boron source and lanthanum in the lanthanum source is 4.0 or more and 6.2 or less. By setting the composition of the raw materials within the above range, the impurity carbon concentration in the obtained powder containing lanthanum boride particles can be suppressed to a low level, and at the same time, it is possible to obtain lanthanum boride particles containing lanthanum boride particles exhibiting high solar shading properties. Powder.

另外,特別優選所得到的硼化鑭的粒子以LaB6為主體。 In addition, it is particularly preferable that the obtained lanthanum boride particles have LaB 6 as the main component.

這是由於LaB6的近紅外線的吸收能力特別高。 This is because LaB 6 has a particularly high near-infrared absorption capacity.

因此,進一步優選原料的硼源中的硼及鑭源中的鑭的元素比B/La為5.8以上6.2以下。 Therefore, it is more preferable that the element ratio B/La of boron in the boron source of the raw material and lanthanum in the lanthanum source is 5.8 or more and 6.2 or less.

需要說明的是,儘管在此以作為硼源及還原劑使用碳化硼、作為鑭源使用氧化鑭來製造硼化鑭粒子的情況為例進行了說明,但並不限定於該實施方式。例如亦可以作為硼源使用硼或氧化硼,作為還原劑使用碳,作為鑭源使用氧化鑭。此時,優選以在生成物中不殘留剩餘的碳或氧的方式進行初步試驗等,并選擇各成分的混合比率。 In addition, although a case where boron carbide is used as a boron source and a reducing agent, and lanthanum oxide is used as a lanthanum source to produce a lanthanum boride particle is demonstrated here as an example, it is not limited to this embodiment. For example, boron or boron oxide may be used as the boron source, carbon may be used as the reducing agent, and lanthanum oxide may be used as the lanthanum source. At this time, it is preferable to conduct preliminary tests or the like so that no residual carbon or oxygen remains in the product, and to select the mixing ratio of each component.

另外,例如亦可以根據製造的硼化物粒子所含有的金屬元素X使用包含金屬元素X的化合物來代替氧化鑭。作為包含金屬元素X的化合物,例如可舉出選自金屬元素X的氫氧化物、金屬元素X的水合物、金屬元素X的氧化物的1種以上的化合物。對於該含有金屬元素X的化合物的製造方法並無特別限定,例如可以一邊攪拌含有包含金屬元素X的化合物的溶液與鹼性溶液一邊使其反應而生成沉澱物,并由該沉澱物得到。 In addition, for example, in accordance with the metal element X contained in the boride particles to be produced, a compound containing the metal element X may be used instead of lanthanum oxide. Examples of the compound containing the metal element X include one or more compounds selected from the group consisting of a hydroxide of the metal element X, a hydrate of the metal element X, and an oxide of the metal element X. The method for producing the compound containing the metal element X is not particularly limited. For example, a solution containing the compound containing the metal element X and an alkaline solution can be reacted while stirring to produce a precipitate, which can be obtained from the precipitate.

如上所述,即使是使用含有金屬元素X的化合物來代替氧化鑭的情況,亦優選以在生成物中不殘留剩餘的碳或氧的方式進行準備試驗等,并選擇各成分的混合比率。例如亦可以使硼源中的硼及金屬元素X源中的金屬元素X的元素比為與上述硼源中的硼及鑭源中的鑭元素的元素比同樣的比率。 As described above, even when a compound containing the metal element X is used instead of lanthanum oxide, it is preferable to perform preparation tests and the like so that no residual carbon or oxygen remains in the product, and to select the mixing ratio of each component. For example, the element ratio of boron in the boron source and the metal element X in the metal element X source may be the same ratio as the element ratio of boron in the boron source and the lanthanum element in the lanthanum source.

藉由對所得到的硼化物粒子進行例如濕式粉碎等,從而能夠得到具有期望的平均分散粒徑的硼化物粒子。 By subjecting the obtained boride particles to wet pulverization, for example, boride particles having a desired average dispersed particle diameter can be obtained.

(硼化物粒子分散液) (Boride particle dispersion)

接著,對本實施方式的硼化物粒子分散液的一個構成例進行說明。 Next, a configuration example of the boride particle dispersion liquid of this embodiment will be described.

本實施方式的硼化物粒子分散液可以包括上述的硼化物粒子、以及液體介質。需要說明的是,優選硼化物粒子為例如分散在液體介質中的狀態。 The boride particle dispersion of the present embodiment may include the above-mentioned boride particles and a liquid medium. It should be noted that the boride particles are preferably dispersed in a liquid medium, for example.

用於硼化物粒子分散液的液體介質可以包括選自水、有機溶劑、油脂、液體樹脂、可塑劑的一種以上的液體介質。 The liquid medium used for the boride particle dispersion may include one or more liquid mediums selected from water, organic solvents, oils and fats, liquid resins, and plasticizers.

有機溶劑優選具有用於保持硼化物粒子的分散性的功能、以及用於在塗布分散液時不產生塗布缺陷的功能。作為有機溶劑,例如可舉出甲醇(MA)、乙醇(EA)、1-丙醇(NPA)、異丙醇(IPA)、丁醇、戊醇、芐醇、雙丙酮醇等醇類溶劑、丙酮、甲基乙基酮(MEK)、甲基丙基酮、甲基異丁基酮(MIBK)、環己酮、異佛爾酮等酮類溶劑、3-甲基-甲氧基-丙酸酯(MMP)等酯類溶劑、乙二醇單甲醚(MCS)、乙二醇單醚(ECS)、乙二醇異丙醚(IPC)、丙二醇甲基醚(PGM)、丙二醇乙醚(PE)、丙二醇甲基醚乙酸酯(PGMEA)、丙二醇乙醚乙酸酯(PE-AC)等二醇衍生物、甲酰胺(FA)、N-甲基甲酰胺、二甲基甲酰胺(DMF)、二甲基乙酰胺、N-甲基-2-吡咯烷酮(NMP)等酰胺類、甲苯、二甲苯等芳香烴類、氯化乙烯、氯苯等鹵化烴類等,并可以組合使用從以上選出的一種或兩種以上。 The organic solvent preferably has a function of maintaining the dispersibility of boride particles and a function of preventing coating defects when the dispersion liquid is applied. Examples of organic solvents include methanol (MA), ethanol (EA), 1-propanol (NPA), isopropanol (IPA), butanol, pentanol, benzyl alcohol, diacetone alcohol and other alcohol solvents, Acetone, methyl ethyl ketone (MEK), methyl propyl ketone, methyl isobutyl ketone (MIBK), cyclohexanone, isophorone and other ketone solvents, 3-methyl-methoxy-propyl Ester solvents such as esters (MMP), ethylene glycol monomethyl ether (MCS), ethylene glycol monoether (ECS), ethylene glycol isopropyl ether (IPC), propylene glycol methyl ether (PGM), propylene glycol ethyl ether ( PE), propylene glycol methyl ether acetate (PGMEA), propylene glycol ethyl ether acetate (PE-AC) and other glycol derivatives, formamide (FA), N-methyl formamide, dimethyl formamide (DMF) ), amides such as dimethylacetamide, N-methyl-2-pyrrolidone (NMP), aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as chlorinated vinyl, chlorobenzene, etc., and can be used in combination from the above One or two or more selected.

在上述中,作為有機溶劑,更優選MIBK、MEK等酮類、甲苯、二甲苯等芳香烴類、PGMEA、PE-AC等乙二醇醚乙酸酯類等疏水性特別高者。因此,可以組合使用從上選出的一種或兩種以上。 Among the above, as the organic solvent, ketones such as MIBK and MEK, aromatic hydrocarbons such as toluene and xylene, and glycol ether acetates such as PGMEA and PE-AC are particularly highly hydrophobic. Therefore, one or two or more selected from the above can be used in combination.

作為油脂,例如可以使用選自亞麻子油、向日葵油、桐油等乾性油、芝麻油、棉籽油、菜籽油、大豆油、米糠油等半乾性油、橄欖油、椰子油、 棕櫚油、脫水蓖麻油等非乾性油、使植物油的脂肪酸與單醇直接進行酯化反應的脂肪酸單酯、醚類、Isopar E、Exxsol Hexane、Exxsol Heptane、Exxsol E、Exxsol D30、Exxsol D40、Exxsol D60、Exxsol D80、Exxsol D95、Exxsol D110、的Exxsol D130(以上為埃克森美孚公司制)等石油類溶劑的一種以上的油脂。 As fats and oils, for example, dry oils selected from linseed oil, sunflower oil, tung oil, semi-drying oils such as sesame oil, cottonseed oil, rapeseed oil, soybean oil, and rice bran oil, olive oil, coconut oil, etc. can be used. Non-drying oils such as palm oil and dehydrated castor oil, fatty acid monoesters, ethers, Isopar E, Exxsol Hexane, Exxsol Heptane, Exxsol E, Exxsol D30, Exxsol D40, Exxsol that directly esterify the fatty acids of vegetable oils with monoalcohols D60, Exxsol D80, Exxsol D95, Exxsol D110, Exxsol D130 (the above are manufactured by Exxon Mobil Corporation) and other petroleum solvents.

作為液體樹脂,例如可以使用選自液體丙烯酸樹脂、液體環氧樹脂、液體聚酯樹脂、液體聚氨酯樹脂的一種以上。 As the liquid resin, for example, one or more selected from the group consisting of liquid acrylic resin, liquid epoxy resin, liquid polyester resin, and liquid polyurethane resin can be used.

作為可塑劑,例如可以使用液體塑料用可塑劑。作為液體塑料用可塑劑,例如可以使用選自DEHP、DINP等鄰苯二甲酸類可塑劑、DINA、DOA等己二酸類可塑劑、磷酸類可塑劑、環氧類可塑劑、聚酯類可塑劑的一種以上。 As the plasticizer, for example, a plasticizer for liquid plastics can be used. As the plasticizer for liquid plastics, for example, phthalic acid plasticizers such as DEHP and DINP, adipic acid plasticizers such as DINA and DOA, phosphoric acid plasticizers, epoxy plasticizers, and polyester plasticizers can be used. More than one kind.

另外,用於本實施方式的硼化物粒子分散液的液體介質除了含有上述成分以外,還可以含有例如分散劑、偶聯劑、表面活性劑等。分散劑、偶聯劑、表面活性劑可以隨著用途來選定,優選具有含胺基、羥基、羧基或環氧基作為官能基者。這些官能基能夠吸附在硼化物粒子的表面,并防止硼化物粒子的凝集,例如在使用硼化物粒子分散液製作的硼化物粒子分散體中,發揮使硼化物粒子均勻分散的效果。 In addition, the liquid medium used for the boride particle dispersion of the present embodiment may contain, for example, a dispersant, a coupling agent, a surfactant, etc. in addition to the above-mentioned components. The dispersant, coupling agent, and surfactant can be selected according to the application, and those having an amino group, a hydroxyl group, a carboxyl group, or an epoxy group as a functional group are preferred. These functional groups can be adsorbed on the surface of the boride particles and prevent agglomeration of the boride particles. For example, in a boride particle dispersion prepared using a boride particle dispersion, the boride particles can be uniformly dispersed.

作為分散劑、偶聯劑、表面活性劑,例如可以優選使用磷酸酯化合物、高分子類分散劑、矽烷類偶聯劑、鈦酸酯類偶聯劑、鋁類偶合劑等,但並不限定於此。作為高分子類分散劑,可以舉出丙烯酸類高分子分散劑、聚氨酯類高分子分散劑、丙烯酸-嵌段共聚物類高分子分散劑、聚醚類分散劑、聚酯類高分子分散劑等。 As dispersants, coupling agents, and surfactants, for example, phosphate compounds, polymer-based dispersants, silane-based coupling agents, titanate-based coupling agents, aluminum-based coupling agents, etc. can be preferably used, but they are not limited. Here. Examples of polymer dispersants include acrylic polymer dispersants, polyurethane polymer dispersants, acrylic-block copolymer polymer dispersants, polyether dispersants, polyester polymer dispersants, etc. .

對於向硼化物粒子分散液的選自分散劑、偶聯劑、表面活性劑的一種以上的材料的添加量,優選為相對於100重量份硼化物粒子的10重量份以上1000重量份以下的範圍,更優選為20重量份以上200重量份以下的範圍。若分散劑等添加量處於上述範圍,則能夠抑制硼化物粒子在分散液中的凝集,并較高地保持分散穩定性,因此優選。 The addition amount of one or more materials selected from dispersants, coupling agents, and surfactants to the boride particle dispersion is preferably in the range of 10 parts by weight to 1000 parts by weight relative to 100 parts by weight of the boride particles, More preferably, it is a range of 20 parts by weight or more and 200 parts by weight or less. If the addition amount of a dispersant or the like is in the above range, the aggregation of the boride particles in the dispersion liquid can be suppressed and the dispersion stability can be maintained high, which is preferable.

對於在液體介質中分散硼化物粒子的方法並無特別限定。例如可舉出使用珠磨機、球磨機、沙磨機等濕式介質研磨機對硼化物粒子分散液的原料混合物進行分散處理的方法。特別是,本實施方式的硼化物粒子分散液優選具有使平均分散粒徑為100nm以下的硼化物粒子分散在液體介質中的狀態,更優選該硼化物粒子的平均分散粒徑為85nm以下。因此,優選利用使用了珠磨機等介質攪拌研磨機的濕式粉碎法來將硼化物粒子分散并調製分散液。 The method for dispersing boride particles in a liquid medium is not particularly limited. For example, a method of dispersing the raw material mixture of the boride particle dispersion liquid using a wet media mill such as a bead mill, a ball mill, or a sand mill can be mentioned. In particular, the boride particle dispersion of the present embodiment preferably has a state in which boride particles having an average dispersed particle diameter of 100 nm or less are dispersed in a liquid medium, and it is more preferable that the average dispersed particle diameter of the boride particles is 85 nm or less. Therefore, it is preferable to disperse boride particles to prepare a dispersion by a wet grinding method using a media stirring mill such as a bead mill.

作為硼化物粒子分散液,當對在分散介質(液體介質)之中分散有硼化物粒子的硼化物粒子分散液進行調製時,可以舉出如上所述將作為原料的硼化物粒子或分散劑等添加到作為液體介質的水、有機溶劑、油脂、液體樹脂、可塑劑等之中并利用介質攪拌研磨機等進行分散處理的方法。 As the boride particle dispersion, when preparing a boride particle dispersion in which boride particles are dispersed in a dispersion medium (liquid medium), the boride particles or dispersants used as the raw material may be mentioned as described above. A method of adding to water, organic solvents, oils and fats, liquid resins, plasticizers, etc. as a liquid medium, and performing dispersion treatment using a medium stirring mill or the like.

另外,亦可以利用下述步驟來調製硼化物粒子分散液。在此以調製硼化物粒子可塑劑分散液的情況為例進行說明。 In addition, the boride particle dispersion liquid can also be prepared by the following procedure. Here, the case of preparing a boride particle plasticizer dispersion is described as an example.

具體而言,首先,使用上述的有機溶劑作為液體介質,預先調製在有機溶劑中分散了硼化物粒子的硼化物粒子分散液。接著,在該硼化物粒子分散液中添加可塑劑,并藉由除去有機溶劑從而能夠得到硼化物粒子可塑劑分散液。 Specifically, first, using the above-mentioned organic solvent as a liquid medium, a boride particle dispersion liquid in which boride particles are dispersed in an organic solvent is prepared in advance. Next, a plasticizer is added to the boride particle dispersion, and the organic solvent is removed to obtain the boride particle plasticizer dispersion.

需要說明的是,作為除去有機溶劑的方法,例如可舉出對硼化物粒子分散液進行減壓乾燥的方法。 Incidentally, as a method of removing the organic solvent, for example, a method of drying the boride particle dispersion under reduced pressure can be cited.

具體而言,一邊對添加了可塑劑的以有機溶劑為液體介質的硼化物粒子分散液進行攪拌一邊進行減壓乾燥,對有機溶劑成分進行分離。作為用於該減壓乾燥的裝置,可舉出真空攪拌型的乾燥機,但只要為具有上述功能的裝置即可,並無特別限定。另外,對於減壓時的壓力值適當地選擇。 Specifically, the boride particle dispersion liquid containing an organic solvent as a liquid medium to which a plasticizer has been added is dried under reduced pressure while stirring, and the organic solvent component is separated. As an apparatus used for this reduced-pressure drying, a vacuum stirring type dryer is mentioned, but it does not specifically limit as long as it has the said function. In addition, the pressure value at the time of decompression is appropriately selected.

由於藉由使用該減壓乾燥法,從而能夠提高從以添加了可塑劑的有機溶劑為液體介質的硼化物粒子分散液的有機溶劑的除去效率,因此未引起在硼化物粒子可塑劑分散液中分散的硼化物粒子的凝集因此優選。再有,硼化物粒子可塑劑分散液的生產性亦得到提高、亦容易對蒸發的有機溶劑進行回收、從環境考慮亦優選。 Since the use of this reduced-pressure drying method can improve the removal efficiency of the organic solvent from the boride particle dispersion in which the plasticizer-added organic solvent is used as the liquid medium, it does not cause any increase in the boride particle plasticizer dispersion. Aggregation of the dispersed boride particles is therefore preferred. Furthermore, the productivity of the boride particle plasticizer dispersion liquid is also improved, and the evaporated organic solvent can be easily recovered, which is also preferable from environmental considerations.

需要說明的是,為了得到均勻的硼化物粒子分散液,可以添加各種添加劑或上述的分散劑,或者進行pH調節。 In addition, in order to obtain a uniform boride particle dispersion liquid, various additives or the above-mentioned dispersing agent may be added, or pH may be adjusted.

另外,在此,儘管以對使用可塑劑作為分散劑的硼化物粒子可塑劑分散液進行調製的情況為例進行了說明,但並不限定於該實施方式,藉由使用水、有機溶劑、油脂、液體樹脂等其他分散介質(液體介質)來代替可塑劑,從而能夠得到在各種分散介質中分散有硼化物粒子的分散液。 In addition, although the case where the boride particle plasticizer dispersion liquid using a plasticizer as a dispersant is prepared as an example has been described here, it is not limited to this embodiment, and the use of water, organic solvents, and fats and oils By replacing the plasticizer with other dispersion media (liquid media) such as liquid resin, it is possible to obtain dispersions in which boride particles are dispersed in various dispersion media.

對於硼化物粒子分散液中的硼化物粒子的含量、亦即濃度並無特別限定,例如優選為0.01質量%以上30質量%以下。 The content of the boride particles in the boride particle dispersion, that is, the concentration is not particularly limited, but for example, it is preferably 0.01% by mass or more and 30% by mass or less.

這是因為,若硼化物粒子的含量為0.01質量%以上,則能夠得到具有充分紅外線遮蔽功能的硼化物粒子分散液。 This is because if the content of the boride particles is 0.01% by mass or more, a dispersion of boride particles having a sufficient infrared shielding function can be obtained.

另外還因為,若硼化物粒子的含量為30質量%以下,則硼化物粒子分 散液的粘度並不會過高,且能夠保持分散穩定性,因而優選。特別是,硼化物粒子分散液中的硼化物粒子的含量更優選為1質量%以上30質量%以下。 In addition, if the content of boride particles is 30% by mass or less, the boride particles are The viscosity of the dispersion is not too high and the dispersion stability can be maintained, which is preferable. In particular, the content of the boride particles in the boride particle dispersion is more preferably 1% by mass or more and 30% by mass or less.

另外,對於硼化物粒子分散液中的硼化物粒子,利用動態光散射法測定的平均分散粒徑優選以100nm以下分散,更優選以85nm以下分散。這是因為,若硼化物粒子的平均分散粒徑為100nm以下,則能夠抑制利用本實施方式的硼化物粒子分散液所製造的紅外線遮蔽膜中的藍霧的發生,并能夠提高光學特性。另外因為,當該平均分散粒徑為85nm以下時,能夠特別地抑制紅外線遮蔽膜中的藍霧的發生。 In addition, as for the boride particles in the boride particle dispersion, the average dispersed particle diameter measured by the dynamic light scattering method is preferably dispersed at 100 nm or less, and more preferably at 85 nm or less. This is because if the average dispersed particle diameter of the boride particles is 100 nm or less, the occurrence of blue haze in the infrared shielding film manufactured using the boride particle dispersion of the present embodiment can be suppressed, and the optical characteristics can be improved. In addition, when the average dispersed particle diameter is 85 nm or less, the occurrence of blue haze in the infrared shielding film can be particularly suppressed.

需要說明的是,關於使用上述的硼化物粒子製作硼化物粒子分散液時,不會發生硼化物粒子分散液(漿料)的凝膠化等問題而能夠有效地將平均分散粒徑粉碎至100nm以下、特別至85nm以下的原因,本發明的發明人進行了以下推測。 It should be noted that when the above-mentioned boride particles are used to prepare a boride particle dispersion, there will be no problems such as gelation of the boride particle dispersion (slurry), and the average dispersed particle size can be effectively pulverized to 100nm. Hereinafter, the inventors of the present invention have made the following guesses for the reason, especially for 85 nm or less.

由於硼化物粒子為硬質,因此當使用濕式介質攪拌研磨機進行粉碎時,介質珠磨損出的微粉末或介質珠破碎後的細微珠片等磨損渣會混入到漿料中。此時,隨著碳濃度的增大硼化物粒子的硬度增大,因此當以所含有的碳濃度高於0.2質量%的硼化物粒子為原料時,大量的介質珠的磨損渣會混入到漿料中。該介質珠的磨損渣的混入為使漿料濃度上升的原因。 Since the boride particles are hard, when a wet media stirring mill is used for pulverization, abrasion residues such as fine powder abraded by the media beads or fine beads after the media beads are broken will be mixed into the slurry. At this time, as the carbon concentration increases, the hardness of the boride particles increases. Therefore, when boride particles with a carbon concentration higher than 0.2% by mass are used as raw materials, a large amount of wear slag of the media beads will be mixed into the slurry. In material. The mixing of the wear slag of the media beads is the cause of the increase in the slurry concentration.

漿料中的介質珠的磨損渣與硼化物的濃度比可以作為介質珠磨損量的指標。例如當使用以高耐磨性熟知的氧化釔穩定化氧化鋯珠(亦僅記載為“氧化鋯珠”)作為介質珠時,可以將漿料中的來自氧化鋯珠的Zr與由通式XBm表示的硼化物中的金屬元素X的重量濃度(質量%)的濃度比Zr/X 作為介質珠的磨損量的指標。 The concentration ratio of the wear slag to the boride of the media beads in the slurry can be used as an indicator of the wear volume of the media beads. For example, when using yttria-stabilized zirconia beads (also only described as "zirconia beads"), which are well-known for their high wear resistance, as the media beads, the Zr from the zirconia beads in the slurry can be combined with the formula XB The concentration ratio Zr/X of the weight concentration (mass %) of the metal element X in the boride represented by m is used as an index of the wear amount of the media beads.

並且,當硼化物粒子所含有的碳濃度高於0.2質量%時,所得到的漿料中的來自氧化鋯珠的鋯與由通式XBm表示的硼化物中的金屬元素X的濃度比Zr/X大於1.5。換言之,顯示出介質珠的磨損量變得非常多。該介質珠的磨損渣混入是使漿料粘度上升的原因。 And, when the carbon concentration contained in the boride particles is higher than 0.2% by mass, the concentration ratio of zirconium from the zirconia beads to the metal element X in the boride represented by the general formula XB m in the resulting slurry is Zr /X is greater than 1.5. In other words, it was shown that the amount of wear of the media beads became very large. The mixing of the wear slag of the media beads is the cause of the increase in the viscosity of the slurry.

相對於此,藉由使用所含有的碳濃度為0.2質量%以下的硼化物粒子作為原料,從而當使用氧化釔穩定化氧化鋯珠作為介質珠,并粉碎至平均分散粒徑為100nm以下、特別為85nm以下時,能夠使所得到的漿料中的濃度比Zr/X為1.5以下。換言之,由於介質珠的磨損渣的混入量大大減少,因此推測能夠有效地進行粉碎而不使漿料的粘度惡化。但是,關於漿料的粘度上升化未能解釋的部分還很多,亦有可能起到上述以外的作用,因此並不限定於上述作用。 In contrast, by using boride particles with a carbon concentration of 0.2% by mass or less as a raw material, when yttria-stabilized zirconia beads are used as media beads, they are crushed to an average dispersed particle size of 100 nm or less, especially When it is 85 nm or less, the concentration ratio Zr/X in the obtained slurry can be 1.5 or less. In other words, since the mixing amount of the wear slag of the media beads is greatly reduced, it is estimated that the pulverization can be effectively performed without deteriorating the viscosity of the slurry. However, there are still many unexplained parts regarding the increase in the viscosity of the slurry, and it may play a role other than the above, so it is not limited to the above.

需要說明的是,當使用氧化鋯珠作為介質珠來實施硼化物粒子分散液的分散處理時,優選硼化物粒子分散液中的來自氧化鋯珠的Zr與由通式XBm表示的硼化物中的金屬元素X的濃度比Zr/X為1.5以下。換言之,硼化物粒子分散液可以含有來自在粉碎時所使用的介質珠的氧化鋯,並且相對於硼化物粒子分散液中的金屬元素X的重量濃度,優選Zr的重量濃度為1.5倍以下。這是因為,當如上得到的硼化物粒子分散液中的濃度比Zr/X為1.5以下時,能夠充分地抑制硼化物粒子的粘度上升。 It should be noted that when zirconia beads are used as media beads to perform the dispersion treatment of the boride particle dispersion, it is preferable that the Zr derived from the zirconia beads in the boride particle dispersion and the boride represented by the general formula XB m The concentration ratio Zr/X of the metal element X is 1.5 or less. In other words, the boride particle dispersion may contain zirconia derived from the media beads used in the pulverization, and the weight concentration of Zr relative to the weight concentration of the metal element X in the boride particle dispersion is preferably 1.5 times or less. This is because when the concentration ratio Zr/X in the boride particle dispersion liquid obtained as described above is 1.5 or less, the increase in the viscosity of the boride particles can be sufficiently suppressed.

上述的本實施方式的硼化物粒子分散液可以作為紅外線遮蔽粒子分散液用於各種用途。並且,本實施方式的硼化物粒子分散液含有上述的硼化物粒子,並能夠容易地使平均分散粒徑為100nm以下,特別為85nm以下。 因此,能夠抑制藍霧的發生。 The boride particle dispersion of the present embodiment described above can be used for various applications as an infrared shielding particle dispersion. In addition, the boride particle dispersion of the present embodiment contains the above-mentioned boride particles, and can easily make the average dispersed particle diameter be 100 nm or less, particularly 85 nm or less. Therefore, the occurrence of blue haze can be suppressed.

(紅外線遮蔽透明基材、紅外線遮蔽光學構件) (Infrared shielding transparent substrate, infrared shielding optical member)

對本實施方式的紅外線遮蔽透明基材的一個構成例進行說明。 A configuration example of the infrared-shielding transparent substrate of the present embodiment will be described.

本實施方式的紅外線遮蔽透明基材在透明基材的至少一個面上具有塗層,塗層包括紅外線遮蔽粒子以及粘合劑。 The infrared shielding transparent substrate of this embodiment has a coating on at least one surface of the transparent substrate, and the coating includes infrared shielding particles and a binder.

並且,紅外線遮蔽粒子可以使用由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示,並且用燃燒紅外吸收法測定時的碳含量為0.2質量%以下的硼化物粒子。 In addition, infrared shielding particles can be used by the general formula XB m (where X is selected from Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sr One or more metal elements of Ca, where m is a number representing the boron content in the general formula), and the carbon content measured by the combustion infrared absorption method is 0.2% by mass or less of boride particles.

如上所述,本實施方式的紅外線遮蔽透明基材可以具有透明基材、以及在透明基材的至少一個面上所配置的塗層。並且,塗層可以包括紅外線遮蔽粒子以及粘合劑。 As described above, the infrared shielding transparent substrate of this embodiment may have a transparent substrate and a coating layer arranged on at least one surface of the transparent substrate. Also, the coating may include infrared shielding particles and a binder.

以下對各成分進行說明。 The components are explained below.

(1)關於紅外線遮蔽粒子及其製造方法 (1) About infrared shielding particles and their manufacturing method

由於作為紅外線遮蔽粒子可以使用上述硼化物粒子,因此在此省略說明。 Since the above-mentioned boride particles can be used as the infrared shielding particles, the description is omitted here.

(2)粘合劑 (2) Adhesive

由於如上所述塗層含有粘合劑,因此以下對粘合劑進行說明。 Since the coating layer contains a binder as described above, the binder will be described below.

作為粘合劑,例如可以根據目的來選定紫外線(UV)固化樹脂、熱塑性樹脂、熱固性樹脂、電子束固化樹脂、室溫固化樹脂等。特別地,作為粘合劑,優選包括選自紫外線固化樹脂、熱塑性樹脂、熱固性樹脂、室溫固化樹脂的一種以上的粘合劑。 As the binder, for example, ultraviolet (UV) curing resin, thermoplastic resin, thermosetting resin, electron beam curing resin, room temperature curing resin, etc. can be selected according to the purpose. In particular, as the adhesive, it is preferable to include one or more adhesives selected from ultraviolet curable resins, thermoplastic resins, thermosetting resins, and room temperature curable resins.

作為粘合劑,具體而言,可舉出聚乙烯樹脂、聚氯乙烯樹脂、聚偏氯乙烯樹脂、聚乙烯醇樹脂、聚苯乙烯樹脂、聚丙烯樹脂、乙烯乙酸乙烯酯共聚物、聚酯樹脂、聚對苯二甲酸乙二酯樹脂、氟樹脂、聚碳酸酯樹脂、丙烯酸樹脂、聚乙烯醇縮丁醛樹脂等。 Specific examples of the binder include polyethylene resin, polyvinyl chloride resin, polyvinylidene chloride resin, polyvinyl alcohol resin, polystyrene resin, polypropylene resin, ethylene vinyl acetate copolymer, polyester Resin, polyethylene terephthalate resin, fluororesin, polycarbonate resin, acrylic resin, polyvinyl butyral resin, etc.

作為粘合劑,例如可以組合使用從上述樹脂組中選擇的一種或兩種以上。但是,作為塗層用的粘合劑,在上述樹脂組之中,從生產性或裝置成本等觀點來看特別優選使用UV固化樹脂。 As the binder, for example, one or two or more selected from the above-mentioned resin group can be used in combination. However, as a binder for coating, among the above-mentioned resin groups, it is particularly preferable to use a UV curable resin from the viewpoint of productivity, equipment cost, and the like.

另外,亦可以使用利用了金屬醇鹽的無機粘合劑來代替上述樹脂類的粘合劑。作為金屬醇鹽,可舉出Si、Ti、Al、Zr等的醇鹽作為代表性的材料。藉由對於使用了這些金屬醇鹽的無機樹脂透過加熱等使其加水分解、縮聚,從而能夠形成氧化物膜的塗層。 In addition, an inorganic binder using a metal alkoxide may be used instead of the aforementioned resin-based binder. As the metal alkoxide, alkoxides such as Si, Ti, Al, and Zr can be cited as representative materials. The inorganic resin using these metal alkoxides can be hydrolyzed and polycondensed by heating or the like to form an oxide film coating.

再有,可以混合使用上述樹脂類的粘合劑及上述無機粘合劑。 In addition, the above-mentioned resin-based binder and the above-mentioned inorganic binder may be mixed and used.

(3)透明基材 (3) Transparent substrate

本實施方式的紅外線遮蔽透明基材可以在透明基材的至少一個面上具有塗層。因此,以下對透明基材的構成例進行說明。 The infrared-shielding transparent substrate of this embodiment may have a coating on at least one surface of the transparent substrate. Therefore, a configuration example of the transparent substrate will be described below.

作為透明基材,例如可以優選使用透明薄膜基材或透明玻璃基材。 As the transparent substrate, for example, a transparent film substrate or a transparent glass substrate can be preferably used.

透明薄膜基材并不限定於薄膜形狀,例如可以為板狀或片狀。作為透明薄膜基材的材料,並無特別限定,例如可以使用選自聚酯、丙烯酸、聚氨酯、聚碳酸酯、聚乙烯、乙烯乙酸乙烯酯共聚物、氯乙烯、氟樹脂等的一種以上。作為透明薄膜基材,優選為聚酯薄膜,更優選為聚對苯二甲酸乙二酯(PET)薄膜。 The transparent film substrate is not limited to the film shape, and may be, for example, a plate shape or a sheet shape. The material of the transparent film substrate is not particularly limited. For example, one or more selected from polyester, acrylic, polyurethane, polycarbonate, polyethylene, ethylene vinyl acetate copolymer, vinyl chloride, fluororesin, etc. can be used. The transparent film substrate is preferably a polyester film, and more preferably a polyethylene terephthalate (PET) film.

另外,對於透明玻璃基材亦無特別限定,可以使用石英玻璃、鈉玻璃 等透明玻璃基材。 In addition, the transparent glass substrate is not particularly limited, and quartz glass and soda glass can be used. And other transparent glass substrates.

另外,對於透明基材的表面,為了改善紅外線遮蔽粒子分散液的塗布性、或與塗層的密合性,優選進行表面處理。另外,為了提高透明基材與塗層的黏接性,亦可以在透明基材上形成中間層,在中間層上形成塗層。對於中間層的構成並無特別限定,例如可以利用聚合物薄膜、金屬層、無機層(例如二氧化矽、二氧化鈦、氧化鋯等無機氧化物層)、有機/無機複合層等構成。 In addition, it is preferable to perform surface treatment on the surface of the transparent substrate in order to improve the coatability of the infrared shielding particle dispersion or the adhesion with the coating. In addition, in order to improve the adhesion between the transparent substrate and the coating, an intermediate layer can also be formed on the transparent substrate, and a coating can be formed on the intermediate layer. The composition of the intermediate layer is not particularly limited. For example, a polymer film, a metal layer, an inorganic layer (for example, an inorganic oxide layer such as silicon dioxide, titanium dioxide, and zirconium oxide), an organic/inorganic composite layer, etc. can be used.

如上所述,本實施方式的紅外線遮蔽透明基材在透明基材的至少一個面上具有塗層,塗層包括紅外線遮蔽粒子以及粘合劑。 As described above, the infrared-shielding transparent substrate of this embodiment has a coating on at least one surface of the transparent substrate, and the coating includes infrared-shielding particles and a binder.

塗層可以僅由紅外線遮蔽粒子以及粘合劑構成,亦可以含有其他成分。例如,如上所述可以使用紅外線遮蔽粒子分散液來製造塗層,在紅外線遮蔽粒子分散液中可以添加溶劑、分散劑、偶聯劑、或表面活性劑等。因此,在塗層中可以含有向紅外線遮蔽粒子分散液添加的添加成分、或來自該添加成分的成分。 The coating may consist of only infrared shielding particles and a binder, or may contain other components. For example, as described above, an infrared shielding particle dispersion can be used to produce a coating, and a solvent, a dispersant, a coupling agent, or a surfactant can be added to the infrared shielding particle dispersion. Therefore, the coating layer may contain an additive component added to the infrared shielding particle dispersion, or a component derived from the additive component.

另外,為了進一步對本實施方式的紅外線遮蔽透明基材賦予紫外線遮蔽功能,可以在塗層中添加選自無機類的氧化鈦、氧化鋅或氧化鈰等的粒子、有機類的二苯甲酮或苯並三唑等至少一種以上的紫外線遮蔽材料。 In addition, in order to further impart an ultraviolet shielding function to the infrared shielding transparent substrate of this embodiment, particles selected from inorganic titanium oxide, zinc oxide, or cerium oxide, organic benzophenone or benzene may be added to the coating. At least one ultraviolet shielding material such as triazole.

需要說明的是,上述紫外線遮蔽材料並不限定於添加到塗層中的形態,亦可以另外形成含有紫外線遮蔽材料的層。當形成含有紫外線遮蔽材料的層時,對於該層的配置並無特別限定,例如可以形成在塗層上。 It should be noted that the above-mentioned ultraviolet shielding material is not limited to the form added to the coating, and a layer containing the ultraviolet shielding material may be formed separately. When a layer containing an ultraviolet shielding material is formed, the arrangement of the layer is not particularly limited. For example, it may be formed on a coating layer.

另外,為了提高本實施方式的紅外線遮蔽透明基材的可見光透射率,可以進一步向塗層混入選自ATO、ITO、添加鋁的氧化鋅、銦錫複合氧化物 的一種以上的粒子。由於藉由向塗層添加這些透明粒子,從而使波長750nm附近的透射率增加、同時遮蔽較1200nm更長的波長的紅外光,因此能夠得到近紅外光的透射率較高、且熱射線遮蔽特性較高的熱射線遮蔽體。需要說明的是,關於上述選自ATO等的一種以上的粒子,並不限定於添加到塗層的形態,亦可以除了塗層之外另形成含有該粒子的層。 In addition, in order to increase the visible light transmittance of the infrared shielding transparent substrate of the present embodiment, the coating layer may be further mixed with ATO, ITO, aluminum-added zinc oxide, and indium tin composite oxide. More than one kind of particles. By adding these transparent particles to the coating layer, the transmittance around 750nm is increased and the infrared light with a wavelength longer than 1200nm is blocked at the same time. Therefore, the transmittance of near-infrared light is higher and the heat ray shielding characteristics can be obtained. Higher heat ray shielding body. It should be noted that the above-mentioned one or more particles selected from ATO and the like are not limited to the form added to the coating, and a layer containing the particles may be formed in addition to the coating.

對於透明基材上的塗層的厚度並無特別限定,實踐中優選為20μm以下,更優選為6μm以下。這是因為,若塗層的厚度為20μm以下,則除了發揮充分的鉛筆硬度并具有耐擦傷性之外,在塗層中的溶劑揮發及粘合劑固化時,能夠避免基板薄膜發生翹曲等步驟異常的發生。 The thickness of the coating on the transparent substrate is not particularly limited. In practice, it is preferably 20 μm or less, and more preferably 6 μm or less. This is because if the thickness of the coating is 20μm or less, in addition to exhibiting sufficient pencil hardness and scratch resistance, the substrate film can be prevented from warping when the solvent in the coating is volatilized and the adhesive is cured. An abnormal step occurred.

需要說明的是,對於塗層的厚度的下限值並無特別限定,例如優選為10nm以上,更優選為50nm以上。 It should be noted that the lower limit of the thickness of the coating layer is not particularly limited. For example, it is preferably 10 nm or more, and more preferably 50 nm or more.

對於塗層中所包含的紅外線遮蔽粒子的含量並無特別限定,優選透明基材/塗層的每單位投影面積的含量為0.01g/m2以上1.0g/m2以下。這是因為,若含量為0.01g/m2以上,則與不含有紅外線遮蔽粒子的情況相比能夠有意地發揮熱射線遮蔽特性,若含量為1.0g/m2以下,則紅外線遮蔽透明基材能夠充分地保持可見光的透射性。 The content of infrared shielding particles contained in the coating is not particularly limited, but the content per unit projected area of the transparent substrate/coating is preferably 0.01 g/m 2 or more and 1.0 g/m 2 or less. This is because if the content is 0.01g/m 2 or more, the heat ray shielding properties can be deliberately exhibited compared to the case without infrared shielding particles, and if the content is 1.0g/m 2 or less, the infrared shielding transparent substrate It can sufficiently maintain the transmittance of visible light.

另外,對於本實施方式的紅外線遮蔽透明基材,優選當將塗層的可見光(波長400nm以上780nm以下)透射率設定為45%以上55%以下的範圍時的、波長360nm以上500nm以下的區域處的漫透射曲線的極大值為1.5%以下。 In addition, for the infrared-shielding transparent substrate of the present embodiment, it is preferable that when the visible light (wavelength 400nm or more and 780nm or less) transmittance of the coating is set to a range of 45% or more and 55% or less, the region having a wavelength of 360nm or more and 500nm or less The maximum value of the diffuse transmission curve is 1.5% or less.

需要說明的是,使用具有充分的可見光透射率的透明基材並且透明基材對於紅外線遮蔽透明基材的可見光透射率幾乎沒有影響時,亦即例如使 用了具有90%以上的可見光透射率的透明基材時,上述塗層的可見光透射率可以視為紅外線遮蔽透明基材的可見光透射率。 It should be noted that when a transparent substrate with sufficient visible light transmittance is used and the transparent substrate has almost no effect on the visible light transmittance of the infrared-shielding transparent substrate, that is, for example, When a transparent substrate having a visible light transmittance of 90% or more is used, the visible light transmittance of the coating can be regarded as the visible light transmittance of the infrared shielding transparent substrate.

在此,對藍霧的評價方法進行說明。 Here, the evaluation method of the blue haze will be described.

并不知道對藍霧直接進行測定的方法。然而,本發明的申請人已經提出了著眼於對於作為試劑的紅外線遮蔽粒子分散體等照射光時的作為透射光的成分的直線入射光和散射光,并藉由求出每個波長的漫透射率來對“藍霧”進行評價的方法(參見專利文獻5)。以下,使用圖1及圖2對每個波長的漫透射率、亦即漫透射曲線的測定原理進行說明。 I don't know how to directly measure the blue haze. However, the applicant of the present invention has proposed focusing on the linear incident light and scattered light as components of the transmitted light when light is irradiated with an infrared shielding particle dispersion or the like as a reagent, and by calculating the diffuse transmission for each wavelength The method of evaluating "blue haze" based on the rate (see Patent Document 5). Hereinafter, the measurement principle of the diffuse transmittance for each wavelength, that is, the diffuse transmittance curve, will be described using FIGS. 1 and 2.

首先,使用圖1及圖2對測定漫透射曲線的測定裝置進行說明。 First, the measuring device for measuring the diffuse transmission curve will be described using FIGS. 1 and 2.

如圖1、圖2所示,該測定裝置10具有積分球14。並且,積分球14其球狀主體內表面具有漫反射性,並且積分球14具有安裝有測定試劑12(參見圖2)的第一開口部141、安裝有標準反射板15或光阱部件16的第二開口部142、以及安裝有受光器13的第三開口部143。 As shown in FIGS. 1 and 2, the measuring device 10 has an integrating sphere 14. In addition, the integrating sphere 14 has diffuse reflectivity on the inner surface of the spherical body, and the integrating sphere 14 has a first opening 141 where the measuring reagent 12 (see FIG. 2) is installed, and a standard reflector 15 or light trap member 16 is installed. The second opening 142 and the third opening 143 to which the light receiver 13 is attached.

另外,具有射出將經由第一開口部141入射到球狀空間內的直線光的光源11、安裝在上述受光器13上並且對接收的反射光或散射光進行分光的未示出的分光器、與上述分光器連接並且對被分光的反射光或散射光的分光數據進行保存的未示出的數據保存單元、根據所保存的空白透射光強度和漫透射光強度的各分光數據分別計算漫透射光強度和空白透射光強度的每個波長的比率并得到每個波長的漫透射率的未示出的運算單元。 In addition, it has a light source 11 that emits linear light to be incident into the spherical space through the first opening 141, a spectroscope, not shown, which is mounted on the light receiver 13 and splits the received reflected light or scattered light, An unshown data storage unit that is connected to the above spectroscope and stores the spectroscopic data of the reflected light or scattered light to be split, and calculates the diffuse transmission separately based on the stored blank transmitted light intensity and diffuse transmitted light intensity of each spectroscopic data An unshown arithmetic unit that obtains the ratio of the light intensity and the blank transmitted light intensity for each wavelength and the diffuse transmittance of each wavelength.

在此,積分球14在球狀主體內表面上塗布有硫酸鋇或 SPECTRALON(註冊商標)等并具有漫反射性,向標準反射板15的入射角在標準側和對照側均可以為例如10°。另外,作為上述受光器13,例如 可以使用光電倍增管(紫外、可見光區域)或冷卻硫化鉛(近紅外區域)。另外,對於安裝在受光器13上的未示出的分光器,紫外、可見光區域的波長測定範圍、測光精度(±0.002Abs)是必需的。 Here, the integrating sphere 14 is coated with barium sulfate or barium sulfate on the inner surface of the spherical body. SPECTRALON (registered trademark) and the like have diffuse reflectivity, and the incident angle to the standard reflector 15 can be, for example, 10° on both the standard side and the contrast side. In addition, as the aforementioned light receiver 13, for example Either a photomultiplier tube (in the ultraviolet, visible region) or cooled lead sulfide (in the near infrared region) can be used. In addition, for an unshown spectroscope mounted on the light receiver 13, the wavelength measurement range of the ultraviolet and visible light regions and the photometry accuracy (±0.002 Abs) are necessary.

並且,作為射出將射入到球狀空間內的光源11,例如在紫外區域可使用氘燈,在可見光、近紅外區域可使用50W鹵素燈。 In addition, as the light source 11 that emits and enters the spherical space, for example, a deuterium lamp can be used in the ultraviolet region, and a 50W halogen lamp can be used in the visible light and near-infrared region.

另外,對於標準反射板15,例如可使用材質為SPECTRALON的白板,對於上述光阱部件16,對所入射的直線光進行捕獲而不反射的功能是必須的,例如使用將所入射的直線光幾乎完全吸收的暗箱。 In addition, for the standard reflector 15, for example, a whiteboard made of SPECTRALON can be used. For the light trap member 16, the function of capturing the incident linear light without reflecting is necessary, for example, it can be used to almost Fully absorbing black box.

並且,可以使用上述漫透射曲線的測定裝置,藉由空白透射光強度測定步驟、漫透射光強度測定步驟、以及漫透射運算步驟各個步驟來評價作為測定試劑的紅外線遮蔽透明基材等的漫透射曲線的極大值。 In addition, the above-mentioned diffuse transmission curve measuring device can be used to evaluate the diffuse transmission of the infrared shielding transparent substrate as a measuring reagent through the blank transmitted light intensity measurement step, the diffuse transmitted light intensity measurement step, and the diffuse transmission calculation step. The maximum value of the curve.

首先,在空白透射光強度測定步驟中,如圖1所示,在積分球14的第二開口部142上安裝標準反射板15,在第一開口部141上未安裝有測定試劑的狀態下使來自光源11的直線光經由第一開口部141射入球狀空間內。接著,由受光器13接收被標準反射板15所反射的反射光,並且,利用安裝在受光器13上的未示出的分光器進行分光并得到反射光的分光數據。此時的分光數據為空白透射光強度。 First, in the blank transmitted light intensity measurement step, as shown in FIG. 1, the standard reflector 15 is mounted on the second opening 142 of the integrating sphere 14, and the measurement reagent is not mounted on the first opening 141. The linear light from the light source 11 enters the spherical space through the first opening 141. Next, the reflected light reflected by the standard reflector 15 is received by the light receiver 13, and the light is split by an unshown spectroscope mounted on the light receiver 13 to obtain spectroscopic data of the reflected light. The spectroscopic data at this time is the blank transmitted light intensity.

接著,在漫透射光強度測定步驟中,如圖2所示,在積分球14的第二開口部142上安裝光阱部件16。接著,在第一開口部141上安裝有測定試劑的狀態下使來自光源11的直線光經由測定試劑12和第一開口部141射入球狀空間內,並且由受光器13接收被光阱部件16捕獲的光以外的散射光。此時,利用安裝在受光器13上的未示出的分光器進行分光并得到散射光的 分光數據。此時的分光數據為漫透射光強度。 Next, in the diffuse transmission light intensity measurement step, as shown in FIG. 2, the optical trap member 16 is attached to the second opening 142 of the integrating sphere 14. Next, with the measuring reagent installed in the first opening 141, the linear light from the light source 11 is incident into the spherical space through the measuring reagent 12 and the first opening 141, and the light trap member is received by the light receiver 13 16 Scattered light other than captured light. At this time, an unshown spectroscope mounted on the light receiver 13 is used to split the light and obtain the scattered light Spectroscopic data. The spectroscopic data at this time is the intensity of diffuse transmitted light.

接著,在漫透射運算步驟中,可以基於由未示出的數據保存單元(未示出)所保存的空白透射光強度和漫透射光強度的各個數據,利用未示出的運算單元分別計算漫透射光強度和空白透射光強度的每個波長之比并求出每個波長的漫透射率,並且根據所得到的每個波長的漫透射率來求出測定試劑12的漫透射曲線中的波長360nm~500nm區域的極大值。 Next, in the diffuse transmission calculation step, based on the respective data of the blank transmitted light intensity and the diffuse transmitted light intensity stored by an unshown data storage unit (not shown), an unshown arithmetic unit may be used to calculate the diffuse transmission respectively. The ratio of the transmitted light intensity and the blank transmitted light intensity for each wavelength and the diffuse transmittance of each wavelength is obtained, and the wavelength in the diffuse transmittance curve of the measurement reagent 12 is obtained from the obtained diffuse transmittance of each wavelength The maximum value in the region of 360nm~500nm.

在此,在對漫透射曲線進行測定的測定裝置中,可以在上述光源11與測定試劑12之間設置光線調節用的光學系統。並且,在該光學系統中,例如組合複數片透鏡來調節平行光,利用光圈來進行光量的調節。有時可以利用濾光片來進行特定波長的去除。 Here, in the measurement device that measures the diffuse transmission curve, an optical system for adjusting light may be provided between the light source 11 and the measurement reagent 12. In addition, in this optical system, for example, a plurality of lenses are combined to adjust parallel light, and an aperture is used to adjust the amount of light. Sometimes filters can be used to remove specific wavelengths.

並且,對於本實施方式的紅外線遮蔽透明基材,優選如上所述當將塗層的可見光(波長400nm以上780nm以下)透射率設定為45%以上55%以下的任意時的波長360nm以上500nm以下的區域處的漫透射曲線的極大值為1.5%以下。這是因為確認了在滿足上述條件的紅外線遮蔽透明基材上幾乎觀察不到藍霧。 In addition, for the infrared-shielding transparent substrate of the present embodiment, it is preferable that the visible light (wavelength 400nm or more and 780nm or less) transmittance of the coating is set to any of 45% or more and 55% or less, as described above, with a wavelength of 360nm or more and 500nm or less. The maximum value of the diffuse transmission curve at the area is 1.5% or less. This is because it was confirmed that almost no blue haze was observed on the infrared-shielding transparent substrate that satisfies the above conditions.

需要說明的是,將塗層的可見光透射率設定為45%以上55%以下是為了限定漫透射率(漫透射曲線)的測定條件,由於漫透射率與可見光透射率成比例,因此設定範圍。另外,對波長360nm以上500nm以下的區域處的漫透射率(漫透射曲線)進行測定是因為該區域處的散射正是藍霧的起因。若上述範圍處的漫透射率的極大值為1.5%以下,則實驗上用肉眼觀察不到藍霧。 It should be noted that setting the visible light transmittance of the coating to 45% or more and 55% or less is to limit the measurement conditions of the diffuse transmittance (diffuse transmittance curve). Since the diffuse transmittance is proportional to the visible light transmittance, the range is set. In addition, the measurement of the diffuse transmittance (diffuse transmittance curve) in the region with a wavelength of 360 nm or more and 500 nm or less is because the scattering in this region is the cause of the blue haze. If the maximum value of the diffuse transmittance in the above range is 1.5% or less, the blue haze cannot be observed with the naked eye experimentally.

本實施方式的紅外線遮蔽透明基材例如可用於各種光學構件,可以為 包括本實施方式的紅外線遮蔽透明基材的紅外線遮蔽光學構件。 The infrared-shielding transparent substrate of this embodiment can be used for various optical members, for example, An infrared-shielding optical member including the infrared-shielding transparent substrate of the present embodiment.

作為這裡所說的紅外線遮蔽光學構件,例如可舉出建築物的窗戶、或汽車的窗戶等。 Examples of the infrared shielding optical member referred to here include windows of buildings, windows of automobiles, and the like.

根據上述的本實施方式的紅外線遮蔽透明基材、以及包括該紅外線遮蔽透明基材的紅外線遮蔽光學構件,能夠得到使用了能夠容易地進行微粉碎的硼化物粒子的紅外線遮蔽透明基材。因此,能夠充分地減小包含在塗層中的紅外線遮蔽粒子的平均分散粒徑,能夠抑制藍霧的發生。 According to the infrared-shielding transparent substrate of the present embodiment described above and the infrared-shielding optical member including the infrared-shielding transparent substrate, it is possible to obtain an infrared-shielding transparent substrate using boride particles that can be easily pulverized. Therefore, it is possible to sufficiently reduce the average dispersed particle diameter of the infrared shielding particles contained in the coating layer, and it is possible to suppress the occurrence of blue haze.

(紅外線遮蔽透明基材的製造方法) (Manufacturing method of infrared shielding transparent substrate)

本實施方式的紅外線遮蔽透明基材例如可使用紅外線遮蔽粒子分散液來製造。因此,在此首先對紅外線遮蔽粒子分散液及其製造方法進行說明。 The infrared-shielding transparent base material of this embodiment can be manufactured using an infrared-shielding particle dispersion liquid, for example. Therefore, first, the infrared shielding particle dispersion liquid and its manufacturing method will be described here.

(1)紅外線遮蔽粒子分散液及其製造方法 (1) Infrared shielding particle dispersion and its manufacturing method

如上所述,本實施方式的紅外線遮蔽透明基材可以使用含有上述說明的作為紅外線遮蔽粒子的硼化物粒子的紅外線遮蔽粒子分散液來製造。因此,在此對紅外線遮蔽粒子分散液及其製造方法的一個構成例進行說明。 As described above, the infrared-shielding transparent substrate of the present embodiment can be produced using an infrared-shielding particle dispersion containing boride particles as the infrared-shielding particles described above. Therefore, an example of the configuration of the infrared shielding particle dispersion and its manufacturing method will be described here.

紅外線遮蔽粒子分散液是使上述紅外線遮蔽粒子分散在溶劑中的分散液。紅外線遮蔽粒子分散液藉由將上述紅外線遮蔽粒子、根據需要的分散劑、偶聯劑、及表面活性劑等添加到溶劑中并進行分散處理,將該紅外線遮蔽粒子分散在溶劑中而得到。 The infrared-shielding particle dispersion is a dispersion liquid in which the above-mentioned infrared-shielding particles are dispersed in a solvent. The infrared-shielding particle dispersion liquid is obtained by adding the above-mentioned infrared-shielding particles, a dispersant, coupling agent, surfactant, etc., if necessary, to a solvent and performing a dispersion treatment to disperse the infrared-shielding particles in the solvent.

對於紅外線遮蔽粒子分散液的溶劑,要求用於保持紅外線遮蔽粒子的分散性的功能、以及用於塗布分散液時不產生塗布缺陷的功能。 For the solvent of the infrared shielding particle dispersion liquid, the function of maintaining the dispersibility of the infrared shielding particle and the function of not causing coating defects when used for coating the dispersion are required.

具體而言,可舉出甲醇(MA)、乙醇(EA)、1-丙醇(NPA)、異丙醇(IPA)、丁醇、戊醇、芐醇、雙丙酮醇等醇類溶劑、丙酮、甲基乙基酮(MEK)、 甲基丙基酮、甲基異丁基酮(MIBK)、環己酮、異佛爾酮等酮類溶劑、3-甲基-甲氧基-丙酸酯(MMP)等酯類溶劑、乙二醇單甲醚(MCS)、乙二醇單醚(ECS)、乙二醇異丙醚(IPC)、丙二醇甲基醚(PGM)、丙二醇乙醚(PE)、丙二醇甲基醚乙酸酯(PGMEA)、丙二醇乙醚乙酸酯(PE-AC)等二醇衍生物、甲酰胺(FA)、N-甲基甲酰胺、二甲基甲酰胺(DMF)、二甲基乙酰胺、N-甲基-2-吡咯烷酮(NMP)等酰胺類、甲苯、二甲苯等芳香烴類、氯化乙烯、氯苯等鹵化烴類等,并可以組合使用從以上選出的一種或兩種以上。 Specifically, alcohol solvents such as methanol (MA), ethanol (EA), 1-propanol (NPA), isopropanol (IPA), butanol, pentanol, benzyl alcohol, diacetone alcohol, acetone , Methyl ethyl ketone (MEK), Methyl propyl ketone, methyl isobutyl ketone (MIBK), cyclohexanone, isophorone and other ketone solvents, 3-methyl-methoxy-propionate (MMP) and other ester solvents, ethyl Glycol monomethyl ether (MCS), ethylene glycol monoether (ECS), ethylene glycol isopropyl ether (IPC), propylene glycol methyl ether (PGM), propylene glycol ethyl ether (PE), propylene glycol methyl ether acetate ( PGMEA), propylene glycol ethyl ether acetate (PE-AC) and other glycol derivatives, formamide (FA), N-methylformamide, dimethylformamide (DMF), dimethylacetamide, N-formamide Amides such as nyl-2-pyrrolidone (NMP), aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as chlorinated vinyl and chlorobenzene, etc., and one or two or more selected from the above can be used in combination.

在上述中,作為溶劑,更優選MIBK、MEK等酮類、甲苯、二甲苯等芳香烴類、PGMEA、PE-AC等乙二醇醚乙酸酯類等疏水性特別高者。因此,可以組合使用從上選出的一種或兩種以上。 Among the above, as the solvent, ketones such as MIBK and MEK, aromatic hydrocarbons such as toluene and xylene, and glycol ether acetates such as PGMEA and PE-AC are particularly highly hydrophobic. Therefore, one or two or more selected from the above can be used in combination.

另外,為了在透明薄膜基材或透明玻璃基材等透明基材上形成塗層,作為溶劑優選選擇低沸點的有機溶劑。這是因為,若溶劑為低沸點的有機溶劑,則能夠在塗布後的乾燥步驟中容易地除去溶劑,并無損塗布層的特性,例如硬度或透明性等。 In addition, in order to form a coating on a transparent substrate such as a transparent film substrate or a transparent glass substrate, it is preferable to select an organic solvent with a low boiling point as the solvent. This is because if the solvent is an organic solvent with a low boiling point, the solvent can be easily removed in the drying step after coating without impairing the characteristics of the coating layer, such as hardness or transparency.

具體來說,例如優選組合使用選自甲基異丁基酮、甲基乙基酮等酮類、甲苯、二甲苯等芳香烴類的一種或兩種以上。 Specifically, for example, it is preferable to use one or two or more selected from ketones such as methyl isobutyl ketone and methyl ethyl ketone, and aromatic hydrocarbons such as toluene and xylene in combination.

對於分散劑、偶聯劑、表面活性劑,可以隨著用途來選定,優選具有含胺基、羥基、羧基或環氧基作為官能基者。這些官能基藉由吸附在紅外線遮蔽粒子的表面,并防止紅外線遮蔽粒子的凝集,從而當在透明基材上形成塗層時或形成下述紅外線遮蔽粒子分散體等時,在塗層中或該紅外線遮蔽粒子分散體中,發揮使紅外線遮蔽粒子均勻分散的效果。 The dispersant, coupling agent, and surfactant can be selected according to the application, and those having an amino group, a hydroxyl group, a carboxyl group, or an epoxy group as a functional group are preferred. These functional groups are adsorbed on the surface of the infrared shielding particles and prevent aggregation of the infrared shielding particles, so that when the coating is formed on the transparent substrate or the following infrared shielding particle dispersion is formed, the coating or the In the infrared shielding particle dispersion, the effect of uniformly dispersing the infrared shielding particles is exerted.

作為分散劑、偶聯劑、表面活性劑,例如可以優選使用磷酸酯化合物、高分子類分散劑、矽烷類偶聯劑、鈦酸酯類偶聯劑、鋁類偶合劑等。 As the dispersant, coupling agent, and surfactant, for example, phosphate compounds, polymer-based dispersants, silane-based coupling agents, titanate-based coupling agents, aluminum-based coupling agents, and the like can be preferably used.

需要說明的是,作為高分子類分散劑,可以舉出丙烯酸類高分子分散劑、聚氨酯類高分子分散劑、丙烯酸-嵌段共聚物類高分子分散劑、聚醚類分散劑、聚酯類高分子分散劑等。 It should be noted that, as the polymer dispersant, acrylic polymer dispersant, polyurethane polymer dispersant, acrylic-block copolymer polymer dispersant, polyether dispersant, polyester Polymer dispersant, etc.

但是,作為分散劑、偶聯劑、表面活性劑並不限定於此,可以使用各種分散劑、偶聯劑、表面活性劑。 However, the dispersant, coupling agent, and surfactant are not limited to these, and various dispersants, coupling agents, and surfactants can be used.

對於向紅外線遮蔽粒子分散液添加的選自分散劑、偶聯劑、表面活性劑的一種以上的材料的添加量,優選為相對於100重量份的作為紅外線遮蔽粒子的硼化物粒子的10重量份以上1000重量份以下的範圍,更優選為20重量份以上200重量份以下的範圍。 The amount of one or more materials selected from the group consisting of dispersants, coupling agents, and surfactants added to the infrared shielding particle dispersion is preferably 10 parts by weight or more relative to 100 parts by weight of the boride particles as infrared shielding particles The range of 1000 parts by weight or less is more preferably the range of 20 parts by weight or more and 200 parts by weight or less.

若分散劑等添加量處於上述範圍,則能夠抑制紅外線遮蔽粒子在分散液中引起凝集,并較高地保持分散穩定性。 If the addition amount of a dispersant or the like is in the above range, it is possible to suppress the aggregation of the infrared shielding particles in the dispersion liquid and maintain high dispersion stability.

對於在溶劑(液體介質)中分散作為紅外線遮蔽粒子的硼化物粒子的方法並無特別限定。例如可舉出使用珠磨機、球磨機、沙磨機等濕式介質研磨機對紅外線遮蔽粒子分散液的原料混合物進行分散處理的方法。特別是,本實施方式的紅外線遮蔽粒子分散液優選具有使平均分散粒徑為100nm以下的紅外線遮蔽粒子分散在溶劑(液體介質)中的狀態,更優選該紅外線遮蔽粒子的平均分散粒徑為85nm以下。因此,優選利用使用了珠磨機等介質攪拌研磨機的濕式粉碎法來將硼化物粒子分散并調製分散液。 The method of dispersing boride particles as infrared shielding particles in a solvent (liquid medium) is not particularly limited. For example, a method of dispersing the raw material mixture of the infrared shielding particle dispersion liquid using a wet media grinder such as a bead mill, a ball mill, or a sand mill can be mentioned. In particular, the infrared shielding particle dispersion of the present embodiment preferably has a state in which infrared shielding particles having an average dispersed particle diameter of 100 nm or less are dispersed in a solvent (liquid medium), and it is more preferable that the average dispersed particle diameter of the infrared shielding particles is 85 nm the following. Therefore, it is preferable to disperse boride particles to prepare a dispersion by a wet grinding method using a media stirring mill such as a bead mill.

為了得到均勻的紅外線遮蔽粒子分散液,可以添加各種添加劑或上述的分散劑,或者進行pH調節。 In order to obtain a uniform dispersion of infrared shielding particles, various additives or the above-mentioned dispersants may be added, or pH may be adjusted.

上述的紅外線遮蔽粒子分散液中的紅外線遮蔽粒子的含量優選為0.01質量%以上30質量%以下。這是因為,若紅外線遮蔽粒子的含量為0.01質量%以上,則能夠在透明基材上形成具有紅外線遮蔽功能的塗層。另外還因為,若紅外線遮蔽粒子的含量為30質量%以下,則能夠容易地在透明基材上進行紅外線遮蔽粒子的塗布,并能夠提高塗層的生產性。 The content of the infrared shielding particles in the above-mentioned infrared shielding particle dispersion is preferably 0.01% by mass to 30% by mass. This is because if the content of the infrared shielding particles is 0.01% by mass or more, a coating having an infrared shielding function can be formed on the transparent substrate. It is also because if the content of the infrared shielding particles is 30% by mass or less, the infrared shielding particles can be easily coated on the transparent substrate, and the productivity of the coating can be improved.

另外,對於紅外線遮蔽粒子分散液中的紅外線遮蔽粒子,優選以平均分散粒徑為100nm以下進行分散,更優選以85nm以下進行分散。這是因為,若紅外線遮蔽粒子的平均分散粒徑為100nm以下,則能夠抑制使用本實施方式的紅外線遮蔽粒子分散液所製造的紅外線遮蔽透明基材中的藍霧的發生,并能夠提高光學特性。另外因為,當該平均分散粒徑為85nm以下時,能夠特別地抑制紅外線遮蔽透明基材中的藍霧的發生。 In addition, the infrared-shielding particles in the infrared-shielding particle dispersion are preferably dispersed so that the average dispersed particle diameter is 100 nm or less, and more preferably 85 nm or less. This is because if the average dispersed particle diameter of the infrared shielding particles is 100 nm or less, the occurrence of blue haze in the infrared shielding transparent substrate manufactured using the infrared shielding particle dispersion of this embodiment can be suppressed, and the optical characteristics can be improved. . In addition, when the average dispersed particle diameter is 85 nm or less, the occurrence of blue haze in the infrared-shielding transparent substrate can be particularly suppressed.

需要說明的是,關於使用上述的硼化物粒子製作紅外線遮蔽粒子分散液時,不會發生紅外線遮蔽粒子分散液(漿料)的凝膠化等問題而能夠有效地將平均分散粒徑粉碎至100nm以下、特別至85nm以下的原因,本發明的發明人進行了以下推測。 It should be noted that when the above-mentioned boride particles are used to produce an infrared shielding particle dispersion, there will be no problems such as gelation of the infrared shielding particle dispersion (slurry), and the average dispersed particle size can be effectively pulverized to 100nm Hereinafter, the inventors of the present invention have made the following guesses for the reason, especially for 85 nm or less.

由於硼化物粒子為硬質,因此當使用濕式介質攪拌研磨機進行粉碎時,介質珠磨損出的微粉末或介質珠破碎後的細微珠片等磨損渣會混入到漿料中。此時,隨著碳濃度的增大硼化物粒子的硬度增大,因此當以所含有的碳濃度高於0.2質量%的硼化物粒子為原料時,大量的介質珠的磨損渣會混入到漿料中。該介質珠的磨損渣的混入為使漿料濃度上升的原因。 Since the boride particles are hard, when a wet media stirring mill is used for pulverization, abrasion residues such as fine powder abraded by the media beads or fine beads after the media beads are broken will be mixed into the slurry. At this time, as the carbon concentration increases, the hardness of the boride particles increases. Therefore, when boride particles with a carbon concentration higher than 0.2% by mass are used as raw materials, a large amount of wear slag of the media beads will be mixed into the slurry. In material. The mixing of the wear slag of the media beads is the cause of the increase in the slurry concentration.

相對於此,藉由使用所含有的碳濃度為0.2質量%以下的硼化物粒子作為原料,從而當粉碎至平均分散粒徑為100nm以下、特別為85nm以下時, 能夠使介質珠的磨損渣的混入量大大減少,因此推測能夠有效地進行粉碎而不使漿料的粘度惡化。但是,關於漿料的粘度上升化未能解釋的部分還很多,亦有可能起到上述以外的作用,因此並不限定於上述作用。 In contrast, by using boride particles having a carbon concentration of 0.2% by mass or less as a raw material, when pulverized to an average dispersed particle diameter of 100 nm or less, particularly 85 nm or less, The mixing amount of the wear slag of the media beads can be greatly reduced, so it is presumed that the grinding can be effectively carried out without deteriorating the viscosity of the slurry. However, there are still many unexplained parts regarding the increase in the viscosity of the slurry, and it may play a role other than the above, so it is not limited to the above.

(2)紅外線遮蔽透明基材的製造方法 (2) Manufacturing method of infrared shielding transparent substrate

接著,對本實施方式的紅外線遮蔽透明基材的製造方法的一個構成例進行說明。 Next, a configuration example of the method of manufacturing an infrared shielding transparent substrate of this embodiment will be described.

本實施方式的紅外線遮蔽透明基材使用上述紅外線遮蔽粒子分散液,并藉由在透明基材上形成含有紅外線遮蔽粒子的塗層而製造。以下對具體步驟的例子進行說明 The infrared-shielding transparent substrate of the present embodiment uses the above-mentioned infrared-shielding particle dispersion liquid and is manufactured by forming a coating layer containing infrared-shielding particles on the transparent substrate. The following is an example of specific steps

在上述紅外線遮蔽粒子分散液中添加粘合劑,得到塗布液。 A binder is added to the infrared shielding particle dispersion liquid to obtain a coating liquid.

將所得到的塗布液塗在透明基材表面後,使溶劑蒸發并用預定的方法使粘合劑固化,則能夠形成在介質中分散有該紅外線遮蔽粒子的塗層。 After coating the obtained coating liquid on the surface of the transparent substrate, evaporating the solvent and curing the binder by a predetermined method, a coating layer in which the infrared shielding particles are dispersed in the medium can be formed.

另外,可以藉由不在紅外線遮蔽粒子分散液中添加粘合劑,在製作濃度調整了的塗布液,并在透明基材上塗布後,使溶劑蒸發,之後覆蓋塗布包含粘合劑的塗布液,使溶劑蒸發來形成塗層。 In addition, by not adding a binder to the infrared shielding particle dispersion liquid, a coating liquid with adjusted concentration can be prepared, and after coating on a transparent substrate, the solvent is evaporated, and then the coating liquid containing the binder is covered and coated. The solvent is evaporated to form a coating.

對於可優選適用於塗層的粘合劑及透明基材,由於已經說明,因此在此省略說明。 Since the adhesive and transparent substrate that can be preferably applied to the coating have already been described, the description is omitted here.

需要說明的是,對於透明基材的表面,為了改善紅外線遮蔽粒子分散液的塗布性、或與塗層的密合性,優選進行表面處理。另外,為了提高透明基材與塗層的黏接性,亦可以在透明基材上形成中間層,在中間層上形成塗層。對於中間層的構成並無特別限定,例如可以利用聚合物薄膜、金屬層、無機層(例如二氧化矽、二氧化鈦、氧化鋯等無機氧化物層)、有機 /無機複合層等來構成。 In addition, for the surface of the transparent substrate, in order to improve the coatability of the infrared shielding particle dispersion liquid or the adhesion with the coating, it is preferable to perform surface treatment. In addition, in order to improve the adhesion between the transparent substrate and the coating, an intermediate layer can also be formed on the transparent substrate, and a coating can be formed on the intermediate layer. The composition of the intermediate layer is not particularly limited. For example, polymer films, metal layers, inorganic layers (such as inorganic oxide layers such as silicon dioxide, titanium dioxide, and zirconium oxide), organic /Inorganic composite layer.

對於在透明基材上設置塗層的方法,只要是能夠向透明基材表面均勻地塗布紅外線遮蔽粒子分散液的方法即可,並無特別限定。例如,可舉出棒塗(bar coat)法、凹版塗布法、噴塗法、浸塗法等。 The method of providing a coating on the transparent substrate is not particularly limited as long as it can uniformly apply the infrared shielding particle dispersion to the surface of the transparent substrate. For example, a bar coating method, a gravure coating method, a spray coating method, a dip coating method, etc. can be mentioned.

例如當使用UV固化樹脂作為紅外線遮蔽粒子中所包含的粘合劑、利用棒塗法形成塗層時,優選對於紅外線遮蔽粒子分散液預先適當地調節液濃度及添加劑使其具有適當的均衡性(leveling)。並且,可以選擇棒號的線棒(wire bar)在透明基材上形成塗膜,以使塗層的厚度及紅外線遮蔽粒子的含量達到所要得到的紅外線遮蔽透明基材的目標。 For example, when a UV curable resin is used as the binder contained in the infrared shielding particles, and the coating is formed by the bar coating method, it is preferable to appropriately adjust the liquid concentration and additives to the infrared shielding particle dispersion in advance to have an appropriate balance ( leveling). In addition, a wire bar of bar size can be selected to form a coating film on the transparent substrate, so that the thickness of the coating and the content of infrared shielding particles can reach the target of the infrared shielding transparent substrate to be obtained.

接著,藉由乾燥將包含在塗膜中的有機溶劑除去後,藉由照射紫外線使其固化,從而能夠在透明基材上形成塗層。此時,作為塗膜的乾燥條件,隨著各成分、溶劑的種類或使用比率而不同,例如可以藉由以60℃~140℃的溫度加熱20秒~10分鐘左右來實施。對於紫外線的照射方法並無特別限定,例如可以優選使用超高壓汞燈等UV曝光機。 Next, after the organic solvent contained in the coating film is removed by drying, it is cured by irradiating ultraviolet rays, so that a coating layer can be formed on the transparent substrate. At this time, the drying conditions of the coating film vary depending on the types or usage ratios of the respective components and solvents. For example, it can be implemented by heating at a temperature of 60°C to 140°C for about 20 seconds to 10 minutes. The ultraviolet irradiation method is not particularly limited. For example, a UV exposure machine such as an ultra-high pressure mercury lamp can be preferably used.

此外,亦可以利用塗層形成的前後步驟,對透明基材與塗層的密合性、塗布時塗膜的平滑性、有機溶劑的乾燥性等進行操作。作為該前後步驟,例如可以適當選擇透明基材的表面處理步驟、預烘烤(基板的預加熱)步驟、後烘烤(基板的後加熱)步驟等。預烘烤步驟和/或後烘烤步驟中的加熱溫度優選為80℃以上200℃以下,加熱時間優選為30秒以上240秒以下。 In addition, it is also possible to perform operations on the adhesion between the transparent substrate and the coating, the smoothness of the coating film at the time of coating, the drying property of the organic solvent, etc., using the steps before and after the coating is formed. As the preceding and following steps, for example, a surface treatment step of a transparent substrate, a pre-baking (pre-heating of the substrate) step, a post-baking (post-heating of the substrate) step, etc. can be appropriately selected. The heating temperature in the pre-baking step and/or the post-baking step is preferably 80°C or more and 200°C or less, and the heating time is preferably 30 seconds or more and 240 seconds or less.

對於形成的塗層的厚度、或塗層中的紅外線遮蔽粒子的含量的優選範圍已經說明,因此在此省略說明。 The thickness of the coating formed or the preferred range of the content of the infrared shielding particles in the coating has already been described, so the description is omitted here.

需要說明的是,為了進一步對本實施方式的紅外線遮蔽透明基材賦予紫外線遮蔽功能,可以在塗層中添加選自無機類的氧化鈦、氧化鋅或氧化鈰等的粒子、有機類的二苯甲酮或苯並三唑等至少一種以上的紫外線遮蔽材料。 It should be noted that, in order to further impart an ultraviolet shielding function to the infrared shielding transparent substrate of the present embodiment, particles selected from inorganic titanium oxide, zinc oxide, cerium oxide, etc., and organic diphenylmethyl can be added to the coating. At least one ultraviolet shielding material such as ketone or benzotriazole.

另外,為了提高本實施方式的紅外線遮蔽透明基材的可見光透射率,可以進一步向塗層混入選自ATO、ITO、添加鋁的氧化鋅、銦錫複合氧化物的一種以上的粒子。由於藉由向塗層添加這些透明粒子,從而使波長750nm附近的透射率增加、同時遮蔽較1200nm更長的波長的紅外光,因此能夠得到近紅外光的透射率較高、且熱射線遮蔽特性較高的熱射線遮蔽體。 In addition, in order to increase the visible light transmittance of the infrared shielding transparent substrate of the present embodiment, one or more particles selected from ATO, ITO, aluminum-added zinc oxide, and indium tin composite oxide may be further mixed into the coating layer. By adding these transparent particles to the coating layer, the transmittance around 750nm is increased and the infrared light with a wavelength longer than 1200nm is blocked at the same time. Therefore, the transmittance of near-infrared light is higher and the heat ray shielding characteristics can be obtained. Higher heat ray shielding body.

根據上述的本實施方式的紅外線遮蔽透明基材的製造方法,能夠製造使用了能夠容易地進行微粉碎的硼化物粒子的紅外線遮蔽透明基材。根據該紅外線遮蔽透明基材,能夠充分地減小包含在塗層中的紅外線遮蔽粒子的平均分散粒徑,能夠抑制藍霧的發生。 According to the method for producing an infrared-shielding transparent substrate of the present embodiment described above, it is possible to produce an infrared-shielding transparent substrate using boride particles that can be easily pulverized. According to this infrared-shielding transparent substrate, the average dispersed particle diameter of the infrared-shielding particles contained in the coating layer can be sufficiently reduced, and the occurrence of blue haze can be suppressed.

(紅外線遮蔽粒子分散體) (Infrared shielding particle dispersion)

對本實施方式的紅外線遮蔽粒子分散體的一個構成例進行說明。 A configuration example of the infrared shielding particle dispersion of this embodiment will be described.

本實施方式的紅外線遮蔽粒子分散體可以包括硼化物粒子以及熱塑性樹脂。在此,作為硼化物粒子,可以由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示,並且用燃燒紅外吸收法測定時的碳含量為0.2質量%以下。 The infrared shielding particle dispersion of this embodiment may include boride particles and a thermoplastic resin. Here, as the boride particles, the general formula XB m (where X is selected from Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu , Sr, Ca, one or more metal elements, m is a number representing the boron content in the general formula), and the carbon content when measured by the combustion infrared absorption method is 0.2% by mass or less.

以下對各成分進行說明。 The components are explained below.

(1)關於硼化物粒子(紅外線遮蔽粒子)及其製造方法 (1) Regarding boride particles (infrared shielding particles) and their manufacturing methods

由於可以使用上述的硼化物粒子,因此在此省略說明。 Since the above-mentioned boride particles can be used, the description is omitted here.

(2)熱塑性樹脂 (2) Thermoplastic resin

如上所述,本實施方式的紅外線遮蔽粒子分散體可以具有熱塑性樹脂。作為熱塑性樹脂並無特別限定,可以根據用途等使用各種熱塑性樹脂。 As described above, the infrared shielding particle dispersion of this embodiment may have a thermoplastic resin. The thermoplastic resin is not particularly limited, and various thermoplastic resins can be used according to the use and the like.

例如,當本實施方式的紅外線遮蔽粒子分散體用於各種窗戶材料時,優選為具有充分透明性的熱塑性樹脂。 For example, when the infrared shielding particle dispersion of the present embodiment is used for various window materials, it is preferably a thermoplastic resin having sufficient transparency.

具體而言,熱塑性樹脂優選為選自以下的一種以上的熱塑性樹脂:選自由聚對苯二甲酸乙二酯樹脂、聚碳酸酯樹脂、丙烯酸樹脂、苯乙烯樹脂、聚酰胺樹脂、聚乙烯樹脂、氯乙烯樹脂、烯烴樹脂、環氧樹脂、聚酰亞胺樹脂、氟樹脂、乙烯-乙酸乙烯酯共聚物、離子聚合物樹脂、聚乙烯縮丁醛樹脂、聚乙烯縮醛樹脂組成的樹脂組的一種樹脂;選自上述樹脂組的兩種以上樹脂的混合物;或者選自該樹脂組的兩種以上樹脂的共聚物。 Specifically, the thermoplastic resin is preferably one or more thermoplastic resins selected from the group consisting of polyethylene terephthalate resin, polycarbonate resin, acrylic resin, styrene resin, polyamide resin, polyethylene resin, Resin group consisting of vinyl chloride resin, olefin resin, epoxy resin, polyimide resin, fluororesin, ethylene-vinyl acetate copolymer, ionomer resin, polyvinyl butyral resin, and polyvinyl acetal resin A resin; a mixture of two or more resins selected from the above resin group; or a copolymer of two or more resins selected from the resin group.

另外,例如當使用本實施方式的紅外線遮蔽粒子分散體作為原樣板形狀的窗戶材料時,作為熱塑性樹脂,優選滿足透明性高,並且作為窗戶材料所要求的一般特性、亦即剛性、輕量性、長期耐久性、低成本等要件。此時,熱塑性樹脂例如優選為選自聚對苯二甲酸乙二酯樹脂、聚碳酸酯樹脂、離子聚合物樹脂、丙烯酸樹脂的一種以上,進一步優選聚碳酸酯樹脂。 In addition, for example, when the infrared shielding particle dispersion of the present embodiment is used as a window material of the original plate shape, as a thermoplastic resin, it is preferable to satisfy high transparency and general characteristics required as a window material, namely rigidity and light weight. , Long-term durability and low cost. In this case, the thermoplastic resin is preferably one or more selected from polyethylene terephthalate resin, polycarbonate resin, ionomer resin, and acrylic resin, and more preferably polycarbonate resin.

另一方面,當將本實施方式的紅外線遮蔽粒子分散體用作後面將說明的紅外線遮蔽夾層透明基材的中間層時,從與透明基材的密合性、耐候性、耐貫穿性等觀點來看,作為熱塑性樹脂,可優選使用聚乙烯縮醛樹脂或乙烯-乙酸乙烯酯共聚物。特別地,此時熱塑性樹脂進一步優選為聚乙烯縮醛樹脂。 On the other hand, when the infrared-shielding particle dispersion of the present embodiment is used as an intermediate layer of an infrared-shielding interlayer transparent substrate to be described later, from the viewpoint of adhesion to the transparent substrate, weather resistance, penetration resistance, etc. In view, as the thermoplastic resin, polyvinyl acetal resin or ethylene-vinyl acetate copolymer can be preferably used. In particular, in this case, the thermoplastic resin is more preferably a polyvinyl acetal resin.

另外,當將本實施方式的紅外線遮蔽粒子分散體用作中間層、並且構成該紅外線遮蔽粒子分散體的熱塑性樹脂單獨地并不充分地具有柔軟性或與透明基材的密合性時,例如熱塑性樹脂為聚乙烯縮醛時,優選進一步添加可塑劑。 In addition, when the infrared-shielding particle dispersion of this embodiment is used as an intermediate layer, and the thermoplastic resin constituting the infrared-shielding particle dispersion alone does not have sufficient flexibility or adhesion to a transparent substrate, for example When the thermoplastic resin is polyvinyl acetal, it is preferable to further add a plasticizer.

作為可塑劑,並無特別限定,可使用相對於所使用的熱塑性樹脂起到可塑劑功能的物質。例如作為用於聚乙烯縮醛樹脂的可塑劑,可舉出作為一元醇與有機酸酯的化合物的可塑劑、作為多元醇有機酸酯化合物等的酯類的可塑劑、作為有機磷酸類可塑劑等的磷酸類的可塑劑等。各個可塑劑均優選在室溫下為液體。其中,優選作為從多元醇與脂肪酸所合成的酯化合物的可塑劑。 The plasticizer is not particularly limited, and a substance that functions as a plasticizer with respect to the thermoplastic resin used can be used. For example, plasticizers used for polyvinyl acetal resins include plasticizers that are compounds of monohydric alcohols and organic acid esters, plasticizers that are esters such as polyol organic acid ester compounds, and organic phosphoric acid plasticizers. And other phosphoric acid plasticizers. Each plasticizer is preferably liquid at room temperature. Among them, it is preferable as a plasticizer for ester compounds synthesized from polyhydric alcohols and fatty acids.

如上所述,本實施方式的紅外線遮蔽粒子分散體可以含有硼化物粒子和熱塑性樹脂,例如可以具有在熱塑性樹脂內分散有上述硼化物粒子的形態。 As described above, the infrared shielding particle dispersion of the present embodiment may contain boride particles and a thermoplastic resin, and for example, may have a form in which the boride particles are dispersed in the thermoplastic resin.

需要說明的是,本實施方式的紅外線遮蔽粒子分散體除了含有硼化物粒子和熱塑性樹脂以外,還可以根據需要含有任意成分。例如,如上所述,亦可以含有可塑劑、或在製造紅外線遮蔽粒子分散體的過程中添加的任意的添加成分、或來自該添加成分的成分。 In addition, the infrared shielding particle dispersion of this embodiment may contain arbitrary components as needed in addition to boride particles and a thermoplastic resin. For example, as described above, a plasticizer, or any additional component added in the process of producing the infrared shielding particle dispersion, or a component derived from the additional component may be contained.

另外,為了進一步對本實施方式的紅外線遮蔽粒子分散體賦予紫外線遮蔽功能,可以在紅外線遮蔽粒子分散體中添加無機類的氧化鈦、氧化鋅或氧化鈰等的粒子、有機類的二苯甲酮或苯並三唑等的至少一種以上。 In addition, in order to further impart an ultraviolet shielding function to the infrared shielding particle dispersion of the present embodiment, particles of inorganic titanium oxide, zinc oxide, or cerium oxide, organic benzophenone, or benzophenone may be added to the infrared shielding particle dispersion. At least one of benzotriazole and the like.

另外,為了提高本實施方式的紅外線遮蔽粒子分散體的可見光透射率,可以進一步向塗層混入選自ATO、ITO、添加鋁的氧化鋅、銦錫複合氧 化物的一種以上的粒子。由於藉由向紅外線遮蔽粒子分散體添加這些透明粒子,從而使波長750nm附近的透射率增加、同時遮蔽較1200nm更長的波長的紅外光,因此能夠得到近紅外光的透射率較高、且熱射線遮蔽特性較高的紅外線遮蔽粒子分散體。 In addition, in order to increase the visible light transmittance of the infrared shielding particle dispersion of the present embodiment, it is possible to further mix in the coating layer selected from ATO, ITO, aluminum-added zinc oxide, and indium tin composite oxygen. More than one kind of particles. Since these transparent particles are added to the infrared shielding particle dispersion, the transmittance around 750nm is increased, and the infrared light with a wavelength longer than 1200nm can be shielded. Therefore, it is possible to obtain high transmittance of near-infrared light and heat Infrared shielding particle dispersion with high radiation shielding properties.

對於紅外線遮蔽粒子分散體中所包含的作為紅外線遮蔽粒子的硼化物粒子的含量並無特別限定,優選每單位投影面積的硼化物粒子的含量為0.01g/m2以上1.0g/m2以下。這是因為,若含量為0.01g/m2以上,則與不含有作為紅外線遮蔽粒子的硼化物粒子的情況相比能夠有意地發揮熱射線遮蔽特性,若含量為1.0g/m2以下,則紅外線遮蔽粒子分散體能夠充分地保持可見光的透射性。 The content of boride particles as infrared-shielding particles contained in the infrared-shielding particle dispersion is not particularly limited, but the content of boride particles per unit projected area is preferably 0.01 g/m 2 or more and 1.0 g/m 2 or less. This is because if the content is 0.01 g/m 2 or more, the heat ray shielding properties can be deliberately exhibited compared to the case where the boride particles as infrared shielding particles are not contained, and if the content is 1.0 g/m 2 or less, then The infrared shielding particle dispersion can sufficiently maintain the transmittance of visible light.

對於本實施方式的紅外線遮蔽粒子分散體的光學特性並無特別限定,優選當可見光波長區域處的最大透射率為70%時,波長850nm的近紅外光的透射率為23%以上45%以下,並且波長1200nm以上1800nm以下的熱射線的透射率的最小值為15%以下。 The optical properties of the infrared shielding particle dispersion of the present embodiment are not particularly limited. Preferably, when the maximum transmittance in the visible light wavelength region is 70%, the transmittance of near-infrared light at a wavelength of 850 nm is 23% to 45%, In addition, the minimum transmittance of heat rays having a wavelength of 1200 nm or more and 1800 nm or less is 15% or less.

在此,作為將可見光波長區域處的最大透射率調節為70%的方法,可以舉出對紅外線遮蔽粒子分散體的、作為紅外線遮蔽粒子的硼化物粒子的含量或紅外線遮蔽粒子分散體的厚度等進行調節的方法。 Here, as a method of adjusting the maximum transmittance in the visible light wavelength region to 70%, the content of boride particles as infrared-shielding particles for the dispersion of infrared-shielding particles or the thickness of the dispersion of infrared-shielding particles, etc. Method of adjustment.

具體而言,藉由對後面將說明的紅外線遮蔽粒子分散粉末、紅外線遮蔽粒子可塑劑分散液或母料中所含有的紅外線遮蔽粒子的濃度、調製樹脂組成物時的上述紅外線遮蔽粒子分散粉末、紅外線遮蔽粒子可塑劑分散液或母料的添加量、以及薄膜或片材的厚度等進行調節從而能夠容易地進行。 Specifically, the concentration of infrared shielding particles contained in the infrared shielding particle dispersion powder, the infrared shielding particle plasticizer dispersion or the master batch described later, the above-mentioned infrared shielding particle dispersion powder when preparing the resin composition, The addition amount of the infrared-shielding particle plasticizer dispersion or the master batch, the thickness of the film or sheet, etc. can be adjusted easily.

對於本實施方式的紅外線遮蔽粒子分散體的形狀並無特別限定,例如 可以具有板狀形狀,具體而言,可以為片形狀、板形狀或薄膜形狀。需要說明的是,本實施方式的紅外線遮蔽粒子分散體亦可以根據其形狀而稱為例如紅外線遮蔽薄膜、紅外線遮蔽片。 The shape of the infrared shielding particle dispersion of this embodiment is not particularly limited, for example It may have a plate shape, specifically, a sheet shape, a plate shape, or a film shape. In addition, the infrared shielding particle dispersion of this embodiment can also be called an infrared shielding film or an infrared shielding sheet according to its shape, for example.

另外,對於本實施方式的紅外線遮蔽粒子分散體,當將可見光(波長400nm以上780nm以下)透射率設定為45%以上55%以下的範圍時,波長360nm以上500nm以下的區域處的漫透射曲線的極大值為1.5%以下。 In addition, for the infrared shielding particle dispersion of the present embodiment, when the visible light (wavelength 400nm or more and 780nm or less) transmittance is set to 45% or more and 55% or less, the diffuse transmission curve at the wavelength of 360nm or more and 500nm or less is The maximum value is 1.5% or less.

由於關於藍霧的評價方法已經說明,因此在此省略說明。需要說明的是,儘管如上所述并不知道對藍霧直接進行測定的方法,但本發明的申請人著眼於對於作為試劑的紅外線遮蔽粒子分散體照射光時的作為透射光的成分的直線入射光和散射光,已經提出了藉由求出每個波長的漫透射率來對“藍霧”進行評價的方法,在本說明書中進行了說明。 Since the evaluation method of the blue haze has already been described, the description is omitted here. It should be noted that although the method for directly measuring the blue haze is not known as described above, the applicant of the present invention focused on the linear incidence of the transmitted light component when the infrared shielding particle dispersion as a reagent is irradiated with light. For light and scattered light, a method for evaluating the "blue haze" by finding the diffuse transmittance of each wavelength has been proposed, and it is described in this specification.

並且,對於本實施方式的紅外線遮蔽粒子分散體,優選如上所述當將紅外線遮蔽粒子分散體的可見光(波長400nm以上780nm以下)透射率設定為45%以上55%以下的任意時,波長360nm以上500nm以下的區域處的漫透射曲線的極大值為1.5%以下。這是因為確認了在滿足上述條件的紅外線遮蔽粒子分散體上幾乎觀察不到藍霧。 In addition, for the infrared shielding particle dispersion of the present embodiment, it is preferable that the wavelength of 360 nm or more when the visible light (wavelength 400 nm or more and 780 nm or less) transmittance of the infrared shielding particle dispersion is set to any of 45% or more and 55% or less as described above The maximum value of the diffuse transmission curve in the region below 500 nm is 1.5% or less. This is because it was confirmed that almost no blue haze was observed on the infrared shielding particle dispersion satisfying the above-mentioned conditions.

需要說明的是,將紅外線遮蔽粒子分散體的可見光透射率設定為45%以上55%以下是為了限定漫透射率(漫透射曲線)的測定條件,由於漫透射率與可見光透射率成比例,因此設定範圍。另外,對波長360nm以上500nm以下的區域處的漫透射率(漫透射曲線)進行測定是因為該區域處的散射正是藍霧的起因。若上述範圍處的漫透射率的極大值為1.5%以下,則實驗上用肉眼觀察不到藍霧。 It should be noted that setting the visible light transmittance of the infrared shielding particle dispersion to 45% or more and 55% or less is to limit the measurement conditions of the diffuse transmittance (diffuse transmittance curve). Since the diffuse transmittance is proportional to the visible light transmittance, Predetermined area. In addition, the measurement of the diffuse transmittance (diffuse transmittance curve) in the region with a wavelength of 360 nm or more and 500 nm or less is because the scattering in this region is the cause of the blue haze. If the maximum value of the diffuse transmittance in the above range is 1.5% or less, the blue haze cannot be observed with the naked eye experimentally.

根據上述的本實施方式的紅外線遮蔽粒子分散體,能夠得到使用了能夠容易地進行微粉碎的硼化物粒子的紅外線遮蔽粒子分散體。因此,能夠充分地減小所包含的作為紅外線遮蔽粒子的硼化物粒子的平均分散粒徑,能夠抑制藍霧的發生。 According to the infrared-shielding particle dispersion of the present embodiment described above, it is possible to obtain an infrared-shielding particle dispersion using boride particles that can be easily pulverized. Therefore, the average dispersed particle diameter of the boride particles contained as infrared shielding particles can be sufficiently reduced, and the occurrence of blue haze can be suppressed.

(紅外線遮蔽粒子分散粉末、母料、以及紅外線遮蔽粒子分散體的製造方法) (Method for manufacturing infrared shielding particle dispersion powder, master batch, and infrared shielding particle dispersion)

(1)紅外線遮蔽粒子分散液及其製造方法 (1) Infrared shielding particle dispersion and its manufacturing method

並且,本實施方式的紅外線遮蔽粒子分散體可以使用上述的含有硼化物粒子作為紅外線遮蔽粒子的紅外線遮蔽粒子分散液來製造。因此,在此對紅外線遮蔽粒子分散液及其製造方法的一個構成例進行說明。 In addition, the infrared-shielding particle dispersion of the present embodiment can be produced using the above-mentioned infrared-shielding particle dispersion containing boride particles as infrared-shielding particles. Therefore, an example of the configuration of the infrared shielding particle dispersion and its manufacturing method will be described here.

紅外線遮蔽粒子分散液是使上述硼化物粒子分散在溶劑中的分散液。紅外線遮蔽粒子分散液藉由將作為紅外線遮蔽粒子的上述硼化物粒子、根據需要適量的分散劑、偶聯劑、及表面活性劑等添加到溶劑中并進行分散處理,將該硼化物粒子分散在溶劑中而得到。 The infrared shielding particle dispersion is a dispersion in which the above-mentioned boride particles are dispersed in a solvent. Infrared shielding particle dispersion liquid, by adding the above-mentioned boride particles as infrared shielding particles, an appropriate amount of dispersing agent, coupling agent, surfactant, etc. as necessary, to a solvent and performing dispersion treatment, the boride particles are dispersed in Obtained in solvent.

由於紅外線遮蔽粒子分散液可以使用與在紅外線遮蔽透明基材的製造方法處說明的分散液同樣的物質,因此在此省略說明。 Since the infrared-shielding particle dispersion liquid can use the same thing as the dispersion liquid demonstrated in the manufacturing method of an infrared-shielding transparent base material, description is abbreviate|omitted here.

紅外線遮蔽粒子分散液中的紅外線遮蔽粒子的含量優選為0.01質量%以上30質量%以下。這是因為,若紅外線遮蔽粒子的含量為0.01質量%以上,則能夠形成具有充分的紅外線遮蔽功能的紅外線遮蔽粒子分散體。另外還因為,若紅外線遮蔽粒子的含量為30質量%以下,則能夠容易地成形弘外線遮蔽粒子分散體,能夠提高紅外線遮蔽粒子分散體的生產性。 The content of the infrared shielding particles in the infrared shielding particle dispersion is preferably 0.01% by mass or more and 30% by mass or less. This is because if the content of the infrared shielding particles is 0.01% by mass or more, it is possible to form an infrared shielding particle dispersion having a sufficient infrared shielding function. In addition, if the content of the infrared shielding particles is 30% by mass or less, the Hirowai Line shielding particle dispersion can be easily formed, and the productivity of the infrared shielding particle dispersion can be improved.

另外,對於紅外線遮蔽粒子分散液中的紅外線遮蔽粒子,優選以平均 分散粒徑為100nm以下進行分散,更優選以85nm以下進行分散。這是因為,若紅外線遮蔽粒子的平均分散粒徑為100nm以下,則能夠抑制使用本實施方式的紅外線遮蔽粒子分散液所製造的紅外線遮蔽粒子分散體中的藍霧的發生,并能夠提高光學特性。另外因為,當該平均分散粒徑為85nm以下時,能夠特別地抑制紅外線遮蔽粒子分散體中的藍霧的發生。 In addition, the infrared shielding particles in the dispersion of infrared shielding particles are preferably The dispersion particle size is 100 nm or less for dispersion, more preferably 85 nm or less for dispersion. This is because if the average dispersed particle diameter of the infrared shielding particles is 100 nm or less, the occurrence of blue haze in the infrared shielding particle dispersion produced using the infrared shielding particle dispersion of this embodiment can be suppressed, and the optical characteristics can be improved. . In addition, when the average dispersed particle diameter is 85 nm or less, it is possible to particularly suppress the occurrence of blue haze in the infrared shielding particle dispersion.

(2)紅外線遮蔽粒子分散粉末、紅外線遮蔽粒子可塑劑分散液、母料、及其製造方法 (2) Infrared shielding particle dispersion powder, infrared shielding particle plasticizer dispersion, master batch, and manufacturing method thereof

可以將上述作為紅外線遮蔽粒子的硼化物粒子、根據需要與分散劑、偶聯劑和/或表面活性劑一起分散在溶劑中而得到紅外線遮蔽粒子分散液。 The above-mentioned boride particles as infrared shielding particles can be dispersed in a solvent together with a dispersant, a coupling agent and/or a surfactant as necessary to obtain an infrared shielding particle dispersion.

並且,藉由從該紅外線遮蔽粒子分散液中除去溶劑,從而能夠得到例如在分散劑中分散了紅外線遮蔽粒子的本實施方式的紅外線遮蔽粒子分散粉末。 In addition, by removing the solvent from the infrared-shielding particle dispersion, for example, the infrared-shielding particle dispersion powder of the present embodiment in which the infrared-shielding particles are dispersed in a dispersant can be obtained.

此時,紅外線遮蔽粒子分散粉末可以包括硼化物粒子以及分散劑,該硼化物粒子由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示,並且用燃燒紅外吸收法測定時的碳含量為0.2質量%以下。 At this time, the infrared shielding particle dispersion powder may include boride particles and a dispersant. The boride particles have the general formula XB m (where X is selected from Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb , Dy, Ho, Er, Tm, Yb, Lu, Sr, Ca, more than one metal element, m is a number representing the boron content in the general formula), and the carbon content when measured by the combustion infrared absorption method is 0.2 Less than mass%.

作為從紅外線遮蔽粒子分散液中除去溶劑的方法,優選對紅外線遮蔽粒子分散液進行減壓乾燥。具體而言,一邊對紅外線遮蔽粒子分散液進行攪拌一邊進行減壓乾燥,對紅外線遮蔽粒子含有組成無與溶劑成分進行分離。作為用於該減壓乾燥的裝置,可舉出真空攪拌型的乾燥機,但只要為 具有上述功能的裝置即可,並無特別限定。另外,對於乾燥步驟的減壓時的壓力值適當地選擇。 As a method of removing the solvent from the infrared-shielding particle dispersion, it is preferable to dry the infrared-shielding particle dispersion under reduced pressure. Specifically, the infrared-shielding particle dispersion is dried under reduced pressure while stirring, and the infrared-shielding particle containing composition is separated from the solvent component. As a device used for this reduced pressure drying, a vacuum stirring type dryer can be mentioned, but as long as it is A device having the above-mentioned functions is sufficient, and it is not particularly limited. In addition, the pressure value at the time of pressure reduction in the drying step is appropriately selected.

由於藉由使用該減壓乾燥法,從而能夠提高從紅外線遮蔽粒子分散液的溶劑的除去效率,並且不會將本實施方式的紅外線遮蔽粒子分散液長時間暴露在高溫下,因此未引起在該分散粉末或可塑劑分散液中分散的紅外線遮蔽粒子的凝集因此優選。再有,紅外線遮蔽粒子分散粉末等的生產性亦得到提高、亦容易對蒸發的溶劑進行回收、從環境考慮亦優選。 Since the use of this reduced-pressure drying method can improve the removal efficiency of the solvent from the infrared-shielding particle dispersion, and does not expose the infrared-shielding particle dispersion of this embodiment to high temperatures for a long time, it does not cause any damage to the The agglomeration of the infrared shielding particles dispersed in the dispersion powder or the plasticizer dispersion liquid is therefore preferable. In addition, the productivity of the infrared shielding particle dispersion powder and the like is also improved, and the evaporated solvent can be easily recovered, which is also preferable from environmental considerations.

在該乾燥步驟後所得到的本實施方式的紅外線遮蔽粒子分散粉末中,殘留的有機溶劑優選為5質量%以下。原因若殘留的有機溶劑為5質量%以下,則在將該紅外線遮蔽粒子分散粉末加工成紅外線遮蔽夾層透明基材等時不會產生氣泡、外觀或光學特性保持良好。 In the infrared shielding particle dispersion powder of the present embodiment obtained after the drying step, the residual organic solvent is preferably 5% by mass or less. The reason is that if the residual organic solvent is 5% by mass or less, no bubbles are generated when the infrared shielding particle dispersion powder is processed into an infrared shielding interlayer transparent substrate, and the appearance or optical properties are maintained well.

另外,亦可以將紅外線遮蔽粒子與分散劑、偶聯劑和/或表面活性劑一起分散在可塑劑中而得到紅外線遮蔽粒子可塑劑分散液。 In addition, infrared shielding particles may be dispersed in a plasticizer together with a dispersant, coupling agent, and/or surfactant to obtain an infrared shielding particle plasticizer dispersion.

需要說明的是,紅外線遮蔽粒子可塑劑分散液不限於上述方法,亦可以藉由在紅外線遮蔽粒子分散液中添加可塑劑并將溶劑除去而得到。關於溶劑的除去,優選與製作紅外線遮蔽粒子分散粉末的過程同樣地利用減壓乾燥來進行。 It should be noted that the infrared shielding particle plasticizer dispersion is not limited to the above method, and it can be obtained by adding a plasticizer to the infrared shielding particle dispersion and removing the solvent. The removal of the solvent is preferably performed by drying under reduced pressure in the same manner as the process of producing the infrared shielding particle dispersion powder.

作為紅外線遮蔽粒子可塑劑分散液,可以包括硼化物粒子和可塑劑,該硼化物粒子由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示,用燃燒紅外吸收法測定時的碳含量為0.2質量%以下。 As an infrared shielding particle plasticizer dispersion, it may include boride particles and a plasticizer. The boride particles have the general formula XB m (where X is selected from Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sr, Ca, more than one metal element, m is a number representing the boron content in the general formula), the carbon content when measured by the combustion infrared absorption method is 0.2 Less than mass%.

另外,可以藉由使硼化物粒子或分散粉末在樹脂中分散,使該樹脂顆粒化(pelletizing),從而得到本實施方式的母料(master batch)。 In addition, by dispersing boride particles or dispersed powder in a resin, the resin is pelletized to obtain a master batch of the present embodiment.

此外,藉由將硼化物粒子或紅外線遮蔽粒子分散粉末、熱塑性樹脂的粉粒體或顆粒(pellet)、以及根據需要的其他添加劑均勻地混合之後,利用排氣式單桿或雙桿擠出機進行混煉,利用切割的方法將熔融擠出的絲加工成顆粒形狀,亦能夠得到母料。 In addition, by uniformly mixing boride particles or infrared shielding particles dispersed powder, thermoplastic resin powder or pellets, and other additives as needed, a vented single-rod or double-rod extruder is used Kneading and cutting the melt-extruded filaments into pellet shapes can also obtain a masterbatch.

對於母料的形狀並無特別限定,例如可舉出圓柱形或棱柱形。另外,可以採用將熔融擠出物直接切割的所謂的熱切割法。此時常見取得接近球形的形狀。 The shape of the master batch is not particularly limited, and examples include cylindrical or prismatic shapes. In addition, a so-called thermal cutting method in which the molten extrudate is directly cut can be used. At this time, it is common to obtain a nearly spherical shape.

需要說明的是,本實施方式的母料為包括硼化物粒子以及熱塑性樹脂的紅外線遮蔽粒子分散體,並且具有顆粒形狀,該硼化物粒子由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示,並且用燃燒紅外吸收法測定時的碳含量為0.2質量%以下。 It should be noted that the masterbatch of this embodiment is an infrared shielding particle dispersion including boride particles and a thermoplastic resin, and has a particle shape. The boride particles are represented by the general formula XB m (where X is selected from Y, La , Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sr, Ca, more than one metal element, m is the number representing the boron content in the general formula) And the carbon content when measured by the combustion infrared absorption method is 0.2% by mass or less.

(3)紅外線遮蔽粒子分散體的製造方法 (3) Manufacturing method of infrared shielding particle dispersion

藉由將上述本實施方式的紅外線遮蔽粒子分散粉末、紅外線遮蔽粒子可塑劑分散液、或母料均勻地混合到作為透明樹脂的熱塑性樹脂中,從而能夠製造本實施方式的紅外線遮蔽粒子分散體。 By uniformly mixing the infrared-shielding particle dispersion powder, the infrared-shielding particle plasticizer dispersion, or the master batch of the above-mentioned present embodiment into a thermoplastic resin as a transparent resin, the infrared-shielding particle dispersion of the present embodiment can be manufactured.

根據本實施方式的紅外線遮蔽粒子分散體,例如能夠確保先前技術的複合鎢氧化物的紅外線遮蔽特性,同時能夠提高波長700nm以上1200nm以下的區域的近紅外光的透射率。 According to the infrared shielding particle dispersion of the present embodiment, for example, the infrared shielding characteristics of the composite tungsten oxide of the prior art can be ensured, and the transmittance of near-infrared light in the wavelength range from 700 nm to 1200 nm can be improved.

由於對於可優選用於本實施方式的紅外線遮蔽粒子分散體的熱塑性樹 脂已經說明,因此在此省略說明。 Since the thermoplastic resin that can be preferably used in the infrared shielding particle dispersion of this embodiment Grease has already been explained, so the explanation is omitted here.

並且,藉由將分散粉末或可塑劑分散液或母料、熱塑性樹脂、以及根據需要的可塑劑等其他添加劑混煉後,利用擠出成形法、射出成形法等公知的方法將該混煉物成形為平面狀或曲面狀的片材,從而能夠製造紅外線遮蔽粒子分散體。 In addition, by kneading the dispersed powder or plasticizer dispersion or masterbatch, thermoplastic resin, and other additives such as plasticizers as necessary, the kneaded product is made by known methods such as extrusion molding and injection molding. It is formed into a flat or curved sheet to produce an infrared shielding particle dispersion.

對於紅外線遮蔽粒子分散體的形成方法,可使用公知的方法。例如,可使用壓延輥法、擠出法、流延法、吹脹法等。 For the method of forming the infrared shielding particle dispersion, a known method can be used. For example, a calender roll method, extrusion method, casting method, inflation method, etc. can be used.

(紅外線遮蔽夾層透明基材) (Infrared shielding laminated transparent substrate)

本實施方式的紅外線遮蔽夾層透明基材可以具有複數片透明基材、以及上述的紅外線遮蔽粒子分散體。並且,可以具有紅外線遮蔽粒子分散體設置在複數片透明基材之間的結構。 The infrared-shielding interlayer transparent substrate of the present embodiment may have a plurality of transparent substrates and the aforementioned infrared-shielding particle dispersion. In addition, it may have a structure in which the infrared shielding particle dispersion is provided between a plurality of transparent substrates.

紅外線遮蔽夾層透明基材是使用透明基材從兩側夾合作為中間層的紅外線遮蔽粒子分散體的透明基材。 The infrared shielding interlayer transparent substrate is a transparent substrate that uses a transparent substrate sandwiched from both sides to form an intermediate layer of an infrared shielding particle dispersion.

作為透明基材,可以使用在可見光區域透明的玻璃板、板狀的塑料、或者薄膜狀的塑料等。換言之,可以使用透明玻璃基材或透明塑料基材。 As the transparent substrate, a glass plate, plate-shaped plastic, or film-shaped plastic that is transparent in the visible light region can be used. In other words, a transparent glass substrate or a transparent plastic substrate can be used.

對於塑料的材質並無特別限定可以根據用途來選擇,例如當用於汽車等運輸設備時,從確保該運輸設備的駕駛員或乘坐者的透視性的觀點來看,優選聚碳酸酯樹脂、丙烯酸樹脂、聚對苯二甲酸乙二酯樹脂等透明樹脂。除此以外,可以使用聚酰胺樹脂、氯乙烯樹脂、烯烴樹脂、環氧樹脂、聚酰亞胺樹脂、氟樹脂等。 The material of the plastic is not particularly limited and can be selected according to the application. For example, when used in transportation equipment such as automobiles, from the viewpoint of ensuring the visibility of the driver or occupant of the transportation equipment, polycarbonate resin and acrylic are preferred. Transparent resin such as resin and polyethylene terephthalate resin. In addition to this, polyamide resin, vinyl chloride resin, olefin resin, epoxy resin, polyimide resin, fluororesin, etc. can be used.

需要說明的是,對於本實施方式的紅外線遮蔽夾層透明基材,優選當將所包含的紅外線遮蔽粒子分散體的可見光(波長400nm以上780nm以下) 透射率設定為45%以上55%以下的任意時,波長360nm以上500nm以下的區域處的漫透射曲線的極大值為1.5%以下。這是因為,當漫透射曲線的極大值為上述範圍時,能夠確實地抑制藍霧。 It should be noted that for the infrared shielding interlayer transparent substrate of the present embodiment, it is preferable to use the infrared shielding particle dispersion contained in the visible light (wavelength 400nm or more and 780nm or less) When the transmittance is set to any of 45% or more and 55% or less, the maximum value of the diffuse transmission curve in the region with a wavelength of 360 nm or more and 500 nm or less is 1.5% or less. This is because when the maximum value of the diffuse transmission curve is in the above range, the blue haze can be reliably suppressed.

對於本實施方式的紅外線遮蔽夾層透明基材亦可以藉由公知方法將夾入有上述紅外線遮蔽粒子分散體的相對的複數片無機玻璃貼合并一體化而得到。所得到的紅外線遮蔽夾層無機玻璃可以優選主要用作汽車的前側用的無機玻璃或建築物的玻璃。 The infrared-shielding interlayer transparent substrate of the present embodiment can also be obtained by laminating and integrating a plurality of opposing inorganic glasses sandwiching the infrared-shielding particle dispersion by a known method. The obtained infrared-shielding laminated inorganic glass can be preferably used mainly as inorganic glass for the front side of automobiles or glass for buildings.

<實施例> <Example>

以下,參照實施例具體地對本發明進行進行說明。但是,本發明並不限定於以下實施例。 Hereinafter, the present invention will be specifically described with reference to Examples. However, the present invention is not limited to the following examples.

在此首先對以下的實施例、比較例中的試劑的評價方法進行說明。 First, the evaluation method of the reagent in the following Examples and Comparative Examples will be described.

(硼化物粒子的組成) (Composition of boride particles)

對於在以下的實施例、比較例中所得到的硼化物粒子,使用ICP(島津製作所製造。型號:ICPE9000)進行分析,計算出由通式XBm表示時的硼(B)與金屬元素X的元素比(莫耳比)、亦即作為硼化物粒子中的硼(B)與金屬元素X的元素比(B/X)的m的值。 The boride particles obtained in the following Examples and Comparative Examples were analyzed using ICP (manufactured by Shimadzu Corporation. Model: ICPE9000), and the ratio of boron (B) and metal element X expressed by the general formula XB m was calculated. The element ratio (molar ratio), that is, the value of m, which is the element ratio (B/X) of boron (B) and the metal element X in the boride particles.

(硼化物粒子中的碳濃度) (Carbon concentration in boride particles)

對於在以下的各實施例、比較例中製作的硼化物粒子中的碳含量(碳濃度),利用燃燒紅外吸收法進行測定。 The carbon content (carbon concentration) in the boride particles produced in the following examples and comparative examples was measured by the combustion infrared absorption method.

(硼化物粒子中的B4C濃度) (B 4 C concentration in boride particles)

在所得到的硼化物粒子之中,將B4C濃度測定用的試劑分成兩個,分別在鉑坩堝中稱量,添加7N硝酸加熱至50℃後將硼化物粒子溶解。冷卻 後,加入純水之後,利用孔徑0.2μm的乙酸纖維素製的膜過濾器將未溶解殘渣(B4C)過濾分離。 Among the obtained boride particles, the reagent for measuring the B 4 C concentration was divided into two, weighed in a platinum crucible, and 7N nitric acid was added and heated to 50° C. to dissolve the boride particles. After cooling, after adding pure water, the undissolved residue (B 4 C) was separated by filtration with a membrane filter made of cellulose acetate with a pore size of 0.2 μm.

將所得到的一部分未溶解殘渣放入原始的鉑坩堝中,為了防止硼的揮發用氫氧化鈣的飽和水溶液潤濕後在大約80℃的乾燥機中進行乾燥。乾燥後加入碳酸鈉充分混合後加熱融解。冷卻後,將坩堝內的溶融鹽用溫水溶解移送到特氟隆(註冊商標)燒杯中。添加硝酸後,使其加熱沸騰除去碳酸氣體後作為ICP用的試劑溶液。對所得到的試劑溶液的硼濃度利用ICP進行分析。 A part of the obtained undissolved residue was put into an original platinum crucible, and then wetted with a saturated aqueous solution of calcium hydroxide in order to prevent boron volatilization, and then dried in a dryer at about 80°C. After drying, add sodium carbonate and mix well and heat to melt. After cooling, the molten salt in the crucible was dissolved in warm water and transferred to a Teflon (registered trademark) beaker. After adding nitric acid, it is heated and boiled to remove carbon dioxide gas and used as a reagent solution for ICP. The boron concentration of the obtained reagent solution was analyzed by ICP.

另外,對於所得到的另一部分未溶解殘渣進行XRD測定,確認未溶解殘渣是否為B4C單相。當為B4C單相時,根據利用ICP分析出的硼濃度計算出B4C濃度。 In addition, the other part of the obtained undissolved residue was subjected to XRD measurement to confirm whether the undissolved residue was a B 4 C single phase. In the case of a B 4 C single phase, the B 4 C concentration is calculated from the boron concentration analyzed by ICP.

(平均分散粒徑) (Average dispersion particle size)

對於在以下的實施例、比較例中製作的紅外線遮蔽粒子分散液(硼化物粒子分散液)中的硼化物粒子的平均分散粒徑利用基於動態光散射法的粒徑測定裝置(大塚電子(股)製造。型號:ELS-8000)進行測定。粒子折射率設為1.81,粒子形狀使用非球形。背景用甲苯測定,溶劑折射率設為1.50。 For the average dispersed particle diameter of the boride particles in the infrared shielding particle dispersion (boride particle dispersion) prepared in the following examples and comparative examples, a particle diameter measuring device based on the dynamic light scattering method (Otsuka Electronics Co., Ltd. ) Manufacturing. Model: ELS-8000) for measurement. The refractive index of the particles was set to 1.81, and the particle shape was non-spherical. The background was measured with toluene, and the solvent refractive index was set to 1.50.

(硼化物粒子分散液中的Zr與金屬元素X的重量濃度比(Zr/X)) (The weight concentration ratio of Zr in the boride particle dispersion to the metal element X (Zr/X))

對於硼化物粒子分散液中的Zr與金屬元素X的重量濃度比(Zr/X),利用ICP(島津製作所製造。型號ICPE9000)進行測定,根據測定值進行計算。 The weight concentration ratio (Zr/X) of Zr to the metal element X in the boride particle dispersion liquid was measured by ICP (manufactured by Shimadzu Corporation. Model ICPE9000) and calculated from the measured value.

(可見光透射率) (Visible light transmittance)

以下的實施例、比較例中的可見光透射率是關於垂直射入到試劑的日光的光束的透射光束與射入光束之比。在此,上述所謂的日光是指國際照明委員會規定的CIE日光。對於該CIE日光,基於觀測數據將與黑體輻射的色溫相同的色溫的日光的分光照度分布用相對於波長560nm的值的相對值來表示。另外,該光束是指將每個輻射波長的輻射束與光敏度(人眼對於光的靈敏度)的值之積的數值按波長積分的值。換言之,所謂的可見光透射率是利用將波長380nm以上780nm以下的區域的光透射量用人眼的光敏度標準化後的透射光量的積分值來指示人眼所感覺到的亮度的值。 The visible light transmittance in the following Examples and Comparative Examples refers to the ratio of the transmitted light beam to the incident light beam of the sunlight beam perpendicularly incident on the reagent. Here, the so-called daylight mentioned above refers to CIE daylight specified by the International Commission of Illumination. For this CIE daylight, the spectral illuminance distribution of daylight at the same color temperature as the color temperature of black body radiation is expressed as a relative value with respect to a value at a wavelength of 560 nm based on observation data. In addition, the light beam refers to a value obtained by integrating the value of the product of the radiation beam for each radiation wavelength and the value of the photosensitivity (the sensitivity of the human eye to light) by the wavelength. In other words, the so-called visible light transmittance is a value indicating the brightness perceived by the human eye using the integrated value of the transmitted light amount normalized to the light sensitivity of the human eye by the light transmittance in the region having a wavelength of 380 nm or more and 780 nm or less.

對於可見光透射率測定,使用分光光度計(日立製作所製造。型號:U-4100),對於在以下的實施例、比較例中製作的紅外線遮蔽粒子分散體或紅外線遮蔽夾層透明基材,在波長300nm以上2600nm以下的範圍以1nm的間隔進行測定。 For the measurement of visible light transmittance, a spectrophotometer (manufactured by Hitachi, Ltd. Model: U-4100) was used for the infrared shielding particle dispersions or infrared shielding interlayer transparent substrates produced in the following examples and comparative examples at a wavelength of 300nm The above range of 2600 nm or less is measured at 1 nm intervals.

(漫透射曲線的極大值) (Maximum value of diffuse transmission curve)

對於在以下實施例、比較例中製作的硼化物粒子分散液,以可見光(波長400nm以上780nm以下)透射率為50%的方式進行調節,使用了分光光度計(日立製作所製造。型號:U-4100)作為分光器,利用使用圖1、圖2進行說明的方法對波長360nm以上500以下的區域處的漫透射曲線的極大值進行測定。 For the boride particle dispersions prepared in the following Examples and Comparative Examples, the visible light (wavelength 400nm or more and 780nm or less) transmittance was adjusted to 50%, and a spectrophotometer (manufactured by Hitachi, Ltd., model: U-) was used. 4100) As a spectroscope, the maximum value of the diffuse transmission curve in the region with a wavelength of 360 nm or more and 500 or less was measured by the method described using FIGS. 1 and 2.

對於測定試劑,以成為上述可見光透射率的方式,將在各實施例、比較例中製作的硼化物粒子分散液用主溶劑稀釋,放入10mm矩形玻璃槽內以供測定。 For the measurement reagent, the boride particle dispersion prepared in each of the Examples and Comparative Examples was diluted with a main solvent so as to obtain the above-mentioned visible light transmittance, and placed in a 10 mm rectangular glass cell for measurement.

當測定的漫透射曲線的極大值為1.5%以下時,確認了在利用該硼化物 粒子分散液所製作的紅外線遮蔽粒子分散體中幾乎觀測不到藍霧。 When the maximum value of the measured diffuse transmission curve is 1.5% or less, it is confirmed that the boride is used In the infrared shielding particle dispersion produced by the particle dispersion, almost no blue haze was observed.

在測定時,將硼化物粒子分散液的可見光透射率設定為50%以下是為了限定漫透射率(漫透射曲線)的測定條件,由於漫透射率與可見光透射率成比例,因此設定範圍。另外,對波長360nm以上500nm以下的區域處的漫透射率(漫透射曲線)進行測定是因為該區域處的散射正是藍霧的起因。 In the measurement, the visible light transmittance of the boride particle dispersion is set to 50% or less in order to limit the measurement conditions of the diffuse transmittance (diffuse transmittance curve). Since the diffuse transmittance is proportional to the visible light transmittance, the range is set. In addition, the measurement of the diffuse transmittance (diffuse transmittance curve) in the region with a wavelength of 360 nm or more and 500 nm or less is because the scattering in this region is the cause of the blue haze.

另外,對於在以下實施例、比較例中製作的紅外線遮蔽透明基材、紅外線遮蔽粒子分散體或紅外線遮蔽夾層透明基材,使用了分光光度計(日立製作所製造。型號:U-4100)作為分光器,利用使用圖1、圖2進行說明的方法在波長300nm以上800nm以下的範圍以1nm的間隔對漫透射率進行測定。並且,根據所得到的漫透射曲線求出極大值。 In addition, for the infrared-shielding transparent substrates, infrared-shielding particle dispersions, or infrared-shielding interlayer transparent substrates produced in the following examples and comparative examples, a spectrophotometer (manufactured by Hitachi, Ltd., model: U-4100) was used as the spectrometer The diffuser was measured at intervals of 1 nm in the range of 300 nm or more and 800 nm or less in wavelength by the method described using FIGS. 1 and 2. In addition, the maximum value is obtained from the obtained diffuse transmission curve.

需要說明的是,當對紅外線遮蔽粒子分散體、紅外線遮蔽夾層透明基材的漫透射曲線的極大值進行評價時,除了在各實施例、比較例中,以可見光透射率為50%的方式,調節紅外線遮蔽粒子分散體的厚度此點以外,以與各實施例、比較例相同的條件,分別製作漫透射曲線測定用的紅外線遮蔽比例分散體、紅外線遮蔽夾層透明基材,并進行評價。 It should be noted that when evaluating the maximum value of the diffuse transmission curve of the infrared-shielding particle dispersion and the infrared-shielding interlayer transparent substrate, except for the examples and comparative examples, the visible light transmittance is 50%. Except for adjusting the thickness of the infrared shielding particle dispersion, under the same conditions as in the respective examples and comparative examples, an infrared shielding ratio dispersion and an infrared shielding interlayer transparent substrate for diffuse transmission curve measurement were prepared and evaluated.

(霧度) (Haze)

對於在以下的實施例、比較例中製作的紅外線遮蔽透明基材、紅外線遮蔽粒子分散體或紅外線遮蔽夾層透明基材的霧度值,使用霧度計(村上色彩技術研究所製造。型號:HM-150),基於JIS K 7105-1981進行測定。 For the haze values of the infrared-shielding transparent substrates, infrared-shielding particle dispersions, or infrared-shielding interlayer transparent substrates produced in the following examples and comparative examples, a haze meter (manufactured by Murakami Color Technology Laboratory. Model: HM) -150), measured based on JIS K 7105-1981.

(藍霧) (Blue mist)

對於藍霧,對在以下的實施例、比較例中製作的紅外線遮蔽透明基材、 紅外線遮蔽粒子分散體或紅外線遮蔽夾層透明基材照射人工太陽光燈(Seric(股)公司製造XC-100)并用目測進行確認。 For the blue haze, the infrared shielding transparent substrate made in the following examples and comparative examples, The infrared-shielding particle dispersion or the infrared-shielding interlayer transparent substrate is irradiated with an artificial solar lamp (XC-100 manufactured by Seric Co., Ltd.) and confirmed by visual inspection.

以下對各實施例、比較例中的試劑的製作條件及評價結果進行說明。 The preparation conditions and evaluation results of the reagents in the respective examples and comparative examples will be described below.

[實施例1] [Example 1]

使用碳化硼作為硼源及還原劑、使用氧化鑭作為鑭源,以作為鑭與硼的元素比的B/La為5.90的方式對其進行稱量、混合。之後,在氬氣氛中以1600±50℃的溫度條件燒成6小時,得到含有六硼化鑭粒子的粉末。 Boron carbide was used as a boron source and reducing agent, lanthanum oxide was used as a lanthanum source, and lanthanum and boron were weighed and mixed so that the element ratio of B/La was 5.90. After that, it was fired in an argon atmosphere at a temperature of 1600±50°C for 6 hours to obtain a powder containing lanthanum hexaboride particles.

用燃燒紅外吸收法對所得到的含有六硼化鑭粒子的粉末的含碳濃度進行測定,碳含量為0.05質量%。另外,利用ICP對所得到的含有六硼化鑭粒子的組成進行評價,能夠確認作為通式LaBm中的硼(B)與鑭(La)的元素比(B/La)的m為5.8。 The carbon content of the obtained powder containing lanthanum hexaboride particles was measured by a combustion infrared absorption method, and the carbon content was 0.05% by mass. In addition, the composition of the obtained lanthanum hexaboride particles was evaluated by ICP, and it was confirmed that m , which is the element ratio (B/La) of boron (B) to lanthanum (La) in the general formula LaB m , was 5.8.

再有,對於所得到的含有六硼化鑭粒子的粉末,利用上述的硼化物粒子中的B4C濃度的評價方法,對含有六硼化鑭粒子的粉末的B4C濃度進行測定,為0.2質量%。 Furthermore, for powder containing lanthanum hexaboride particles to be obtained using the evaluation method described above B 4 C concentration boride particles, the concentration of B 4 C powder containing lanthanum hexaboride particles was measured as 0.2% by mass.

接著,按照10重量份的所製作的含有六硼化鑭粒子的粉末(紅外線遮蔽材料)、80重量份的甲苯、10重量份的分散劑(具有氨基的丙烯酸類高分子分散劑)的比例進行稱量、混合,調製3kg的漿料。將該漿料與珠一起投入介質攪拌研磨機中,使漿料循環,進行20小時的粉碎分散處理。 Then, the ratio of 10 parts by weight of the prepared powder containing lanthanum hexaboride particles (infrared shielding material), 80 parts by weight of toluene, and 10 parts by weight of dispersant (acrylic polymer dispersant with amino group) Weigh and mix to prepare 3kg slurry. The slurry and the beads were put into a media stirring mill, the slurry was circulated, and the pulverization and dispersion treatment was performed for 20 hours.

使用的介質攪拌研磨機為橫式圓筒形的Annular-type(Ashizawa株式會社製造),容器內部和轉子(旋轉攪拌部)的材質為ZrO2。另外,對於上述珠,使用直徑0.3mm的YSZ(Yttria-Stabilized Zirconia:氧化釔穩定化氧化鋯)製的珠。轉子的旋轉速度為13m/秒,以漿料流量1kg/分進行粉碎。對所 得到的硼化物粒子分散液中的硼化物粒子的平均分散粒徑進行測定為70nm。 The media stirring mill used was a horizontal cylindrical Annular-type (manufactured by Ashizawa Co., Ltd.), and the material of the inside of the container and the rotor (rotating stirring part) was ZrO 2 . In addition, for the above-mentioned beads, beads made of YSZ (Yttria-Stabilized Zirconia) with a diameter of 0.3 mm were used. The rotation speed of the rotor was 13 m/sec, and the pulverization was performed at a slurry flow rate of 1 kg/min. The average dispersed particle diameter of the boride particles in the obtained boride particle dispersion was measured to be 70 nm.

再有,對於分散液,如上所述對硼化物粒子分散液中的Zr與La的重量濃度比(Zr/La)以及漫透射曲線的極大值進行了評價。 Furthermore, for the dispersion liquid, the weight concentration ratio (Zr/La) of Zr to La in the boride particle dispersion liquid and the maximum value of the diffuse transmission curve were evaluated as described above.

結果如表1所示。 The results are shown in Table 1.

另外,按重量比以分散液:紫外線固化樹脂:甲苯=2:1:1的比例將所得到的分散液、紫外線固化樹脂及甲苯混合并製作塗布液。將其用棒塗機塗布在透明玻璃基材上形成塗布膜。此時,以得到的塗層的可見光透射率為50%左右的方式選擇用於塗布的棒。需要說明的是,作為棒塗機使用井元製作所製造的IMC-700,得到的塗層的厚度大約為10μm。 In addition, the obtained dispersion liquid, the ultraviolet curable resin, and toluene were mixed in a ratio of dispersion liquid: ultraviolet curable resin: toluene = 2:1:1 in a weight ratio to prepare a coating liquid. It is coated on a transparent glass substrate with a bar coater to form a coating film. At this time, the rod used for coating is selected so that the visible light transmittance of the coating obtained is about 50%. It should be noted that the IMC-700 manufactured by Imoto Seisakusho was used as a bar coater, and the thickness of the coating obtained was approximately 10 μm.

接著,藉由在70℃保持1分鐘從而使溶劑從該塗布膜蒸發,照射紫外線使塗布膜固化。並且,對所得到的紅外線遮蔽透明基材的光學特性進行測定。測定結果如以下的表1所示。 Next, the solvent was evaporated from the coating film by maintaining at 70°C for 1 minute, and ultraviolet rays were irradiated to cure the coating film. In addition, the optical properties of the obtained infrared shielding transparent substrate were measured. The measurement results are shown in Table 1 below.

所得到的紅外線遮蔽透明基材的霧度為0.2%,確認其透明性極高。另外,波長360nm以上500nm以下的區域處的漫透射曲線的極大值為0.6%。另外,未觀測到照射人工太陽光時的藍霧。 The haze of the obtained transparent infrared shielding substrate was 0.2%, and it was confirmed that the transparency was extremely high. In addition, the maximum value of the diffuse transmission curve in the region with a wavelength of 360 nm or more and 500 nm or less is 0.6%. In addition, blue haze when irradiated with artificial sunlight was not observed.

再有,藉由向所得到的分散液添加同等量的分散劑(具有氨基的丙烯酸類高分子分散劑),將所得到的混合液保持在乾燥機中將溶劑成分除去後進行粉碎,得到紅外線遮蔽粒子分散劑粉末。 Furthermore, by adding the same amount of dispersant (acrylic polymer dispersant with amino group) to the obtained dispersion, the resulting mixed liquid is kept in a dryer to remove the solvent component and then pulverize to obtain infrared rays. Masking particle dispersant powder.

將所得到的紅外線遮蔽粒子分散粉末與聚碳酸酯樹脂混合,使用擠出加工機製作顆粒形狀的母料。 The obtained infrared shielding particle dispersion powder was mixed with a polycarbonate resin, and an extrusion machine was used to prepare a pellet-shaped masterbatch.

再有,將上述母料與聚碳酸酯樹脂混合,利用擠出加工機形成紅外線 遮蔽粒子分散體。此時,以得到的紅外線遮蔽粒子分散體的可見光透射率為70%左右的方式調節聚碳酸酯樹脂與母料的混合比。所得到的紅外線遮蔽粒子分散體的光學特性測定結果如以下的表1所示。 In addition, the above masterbatch is mixed with polycarbonate resin, and the infrared ray is formed by an extrusion machine Mask the particle dispersion. At this time, the mixing ratio of the polycarbonate resin and the master batch was adjusted so that the visible light transmittance of the obtained infrared shielding particle dispersion was about 70%. The measurement results of the optical properties of the obtained infrared shielding particle dispersion are shown in Table 1 below.

可見光透射率為大約70%并確認了充分地透射了可見光區域的光。再有,霧度為0.3%,確認了透明性極高。另外,波長360nm~500nm區域處的漫透射曲線的極大值為0.8%,另外,未觀測到照射人工太陽光時的藍霧(著色)。 The visible light transmittance was about 70%, and it was confirmed that light in the visible light region was sufficiently transmitted. Furthermore, the haze was 0.3%, which confirmed that the transparency was extremely high. In addition, the maximum value of the diffuse transmission curve in the wavelength range of 360 nm to 500 nm is 0.8%, and blue haze (coloring) when irradiated with artificial sunlight is not observed.

需要說明的是,當對紅外線遮蔽粒子分散體或紅外線遮蔽夾層透明基材的漫透射曲線的極大值進行評價時,製作上述的漫透射曲線測定用的紅外線遮蔽粒子分散體或紅外線遮蔽夾層透明基材,并進行評價。對於以下的其他的實施例、比較例亦同樣。 It should be noted that when evaluating the maximum value of the diffuse transmission curve of the infrared-shielding particle dispersion or the infrared-shielding interlayer transparent substrate, the above-mentioned infrared-shielding particle dispersion or the infrared-shielding interlayer transparent substrate for the measurement of the diffuse transmission curve is produced Materials and evaluate them. The same applies to the following other Examples and Comparative Examples.

[實施例2] [Example 2]

除了以作為鑭與硼的元素比的B/La為5.95的方式對碳化硼及氧化鑭進行稱量、混合以外,與實施例1同樣地,得到含有六硼化鑭粒子的粉末。 Except that the boron carbide and lanthanum oxide were weighed and mixed so that the element ratio of lanthanum and boron was 5.95, B/La, a powder containing lanthanum hexaboride particles was obtained in the same manner as in Example 1.

用燃燒紅外吸收法對所得到的含有六硼化鑭粒子的粉末的含碳濃度進行測定,碳含量為0.1質量%。另外,利用ICP對所得到的含有六硼化鑭粒子的組成進行評價,能夠確認作為通式LaBm中的硼(B)與鑭(La)的元素比(B/La)的m為5.9。 The carbon content of the obtained powder containing lanthanum hexaboride particles was measured by a combustion infrared absorption method, and the carbon content was 0.1% by mass. In addition, the composition of the obtained lanthanum hexaboride particles was evaluated by ICP, and it was confirmed that m , which is the element ratio (B/La) of boron (B) to lanthanum (La) in the general formula LaB m , was 5.9.

再有,對於所得到的含有六硼化鑭粒子的粉末,利用上述的硼化物粒子中的B4C濃度的評價方法,對含有六硼化鑭粒子的粉末的B4C濃度進行測定,為0.5質量%。 Furthermore, for powder containing lanthanum hexaboride particles to be obtained using the evaluation method described above B 4 C concentration boride particles, the concentration of B 4 C powder containing lanthanum hexaboride particles was measured as 0.5% by mass.

接著,除了使用該含有六硼化鑭粒子的粉末以外,與實施例1同樣地, 調製硼化物粒子分散液。另外,使用所得到的分散液,與實施例1同樣地製作紅外線遮蔽透明基材、紅外線遮蔽粒子分散粉末、母料、以及紅外線遮蔽粒子分散體。 Next, in the same manner as in Example 1, except that the powder containing lanthanum hexaboride particles was used, Prepare a dispersion of boride particles. In addition, using the obtained dispersion liquid, an infrared-shielding transparent substrate, an infrared-shielding particle dispersion powder, a master batch, and an infrared-shielding particle dispersion were produced in the same manner as in Example 1.

對於所得到的分散液、紅外線遮蔽透明基材、以及紅外線遮蔽粒子分散體進行了與實施例1同樣的評價。結果如表1所示。 The same evaluations as in Example 1 were performed for the obtained dispersion liquid, the infrared-shielding transparent substrate, and the infrared-shielding particle dispersion. The results are shown in Table 1.

[實施例3] [Example 3]

除了以作為鑭與硼的元素比的B/La為6.00的方式對碳化硼及氧化鑭進行稱量、混合以外,與實施例1同樣地,得到含有六硼化鑭粒子的粉末。 Except that the boron carbide and lanthanum oxide were weighed and mixed so that the element ratio of lanthanum and boron was 6.00 B/La, a powder containing lanthanum hexaboride particles was obtained in the same manner as in Example 1.

用燃燒紅外吸收法對所得到的含有六硼化鑭粒子的粉末的含碳濃度進行測定,碳含量為0.2質量%。另外,利用ICP對所得到的含有六硼化鑭粒子的組成進行評價,能夠確認作為通式LaBm中的硼(B)與鑭(La)的元素比(B/La)的m為5.9。 The carbon content of the obtained powder containing lanthanum hexaboride particles was measured by a combustion infrared absorption method, and the carbon content was 0.2% by mass. In addition, the composition of the obtained lanthanum hexaboride particles was evaluated by ICP, and it was confirmed that m , which is the element ratio (B/La) of boron (B) to lanthanum (La) in the general formula LaB m , was 5.9.

再有,對於所得到的含有六硼化鑭粒子的粉末,利用上述的硼化物粒子中的B4C濃度的評價方法,對含有六硼化鑭粒子的粉末的B4C濃度進行測定,為0.9質量%。 Furthermore, for powder containing lanthanum hexaboride particles to be obtained using the evaluation method described above B 4 C concentration boride particles, the concentration of B 4 C powder containing lanthanum hexaboride particles was measured as 0.9% by mass.

接著,除了使用該含有六硼化鑭粒子的粉末以外,與實施例1同樣地,調製硼化物粒子分散液。另外,使用所得到的分散液,與實施例1同樣地製作紅外線遮蔽透明基材、紅外線遮蔽粒子分散粉末、母料、以及紅外線遮蔽粒子分散體。 Next, except that the powder containing the lanthanum hexaboride particles was used, the boride particle dispersion was prepared in the same manner as in Example 1. In addition, using the obtained dispersion liquid, an infrared-shielding transparent substrate, an infrared-shielding particle dispersion powder, a master batch, and an infrared-shielding particle dispersion were produced in the same manner as in Example 1.

對於所得到的分散液、紅外線遮蔽透明基材、以及紅外線遮蔽粒子分散體進行了與實施例1同樣的評價。結果如表1所示。 The same evaluations as in Example 1 were performed for the obtained dispersion liquid, the infrared-shielding transparent substrate, and the infrared-shielding particle dispersion. The results are shown in Table 1.

[實施例4] [Example 4]

除了以作為鑭與硼的元素比的B/La為6.10的方式對碳化硼及氧化鑭進行稱量、混合以外,與實施例1同樣地,得到含有六硼化鑭粒子的粉末。 Except that the boron carbide and lanthanum oxide were weighed and mixed so that the element ratio of lanthanum to boron was 6.10, B/La, a powder containing lanthanum hexaboride particles was obtained in the same manner as in Example 1.

用燃燒紅外吸收法對所得到的含有六硼化鑭粒子的粉末的含碳濃度進行測定,碳含量為0.2質量%。另外,利用ICP對所得到的含有六硼化鑭粒子的組成進行評價,能夠確認作為通式LaBm中的硼(B)與鑭(La)的元素比(B/La)的m為6.0。 The carbon content of the obtained powder containing lanthanum hexaboride particles was measured by a combustion infrared absorption method, and the carbon content was 0.2% by mass. In addition, the composition of the obtained lanthanum hexaboride particles was evaluated by ICP, and it was confirmed that m , which is the element ratio (B/La) of boron (B) to lanthanum (La) in the general formula LaB m , was 6.0.

再有,對於所得到的含有六硼化鑭粒子的粉末,利用上述的硼化物粒子中的B4C濃度的評價方法,對含有六硼化鑭粒子的粉末的B4C濃度進行測定,為0.9質量%。 Furthermore, for powder containing lanthanum hexaboride particles to be obtained using the evaluation method described above B 4 C concentration boride particles, the concentration of B 4 C powder containing lanthanum hexaboride particles was measured as 0.9% by mass.

接著,除了使用該含有六硼化鑭粒子的粉末以外,與實施例1同樣地,調製硼化物粒子分散液。另外,使用所得到的分散液,與實施例1同樣地製作紅外線遮蔽透明基材、紅外線遮蔽粒子分散粉末、母料、以及紅外線遮蔽粒子分散體。 Next, except that the powder containing the lanthanum hexaboride particles was used, the boride particle dispersion was prepared in the same manner as in Example 1. In addition, using the obtained dispersion liquid, an infrared-shielding transparent substrate, an infrared-shielding particle dispersion powder, a master batch, and an infrared-shielding particle dispersion were produced in the same manner as in Example 1.

對於所得到的分散液、紅外線遮蔽透明基材、以及紅外線遮蔽粒子分散體進行了與實施例1同樣的評價。結果如表1所示。 The same evaluations as in Example 1 were performed for the obtained dispersion liquid, the infrared-shielding transparent substrate, and the infrared-shielding particle dispersion. The results are shown in Table 1.

[實施例5] [Example 5]

除了以作為鑭與硼的元素比的B/La為6.20的方式對碳化硼及氧化鑭進行稱量、混合,并以1650±50℃的溫度條件進行燒成以外,與實施例1同樣地,得到含有六硼化鑭粒子的粉末。 Except that boron carbide and lanthanum oxide were weighed and mixed so that B/La, which is the element ratio of lanthanum to boron, was 6.20, and then fired under the temperature condition of 1650±50°C, it was the same as in Example 1. A powder containing lanthanum hexaboride particles was obtained.

用燃燒紅外吸收法對所得到的含有六硼化鑭粒子的粉末的含碳濃度進行測定,碳含量為0.2質量%。另外,利用ICP對所得到的含有六硼化鑭粒子的組成進行評價,能夠確認作為通式LaBm中的硼(B)與鑭(La)的元 素比(B/La)的m為6.0。 The carbon content of the obtained powder containing lanthanum hexaboride particles was measured by a combustion infrared absorption method, and the carbon content was 0.2% by mass. In addition, the composition of the obtained lanthanum hexaboride particles was evaluated by ICP, and it was confirmed that m , which is the element ratio (B/La) of boron (B) to lanthanum (La) in the general formula LaB m , was 6.0.

再有,對於所得到的含有六硼化鑭粒子的粉末,利用上述的硼化物粒子中的B4C濃度的評價方法,對含有六硼化鑭粒子的粉末的B4C濃度進行測定,為0.9質量%。 Furthermore, for powder containing lanthanum hexaboride particles to be obtained using the evaluation method described above B 4 C concentration boride particles, the concentration of B 4 C powder containing lanthanum hexaboride particles was measured as 0.9% by mass.

接著,除了使用該含有六硼化鑭粒子的粉末以外,與實施例1同樣地,調製硼化物粒子分散液。另外,使用所得到的分散液,與實施例1同樣地製作紅外線遮蔽透明基材、紅外線遮蔽粒子分散粉末、母料、以及紅外線遮蔽粒子分散體。 Next, except that the powder containing the lanthanum hexaboride particles was used, the boride particle dispersion was prepared in the same manner as in Example 1. In addition, using the obtained dispersion liquid, an infrared-shielding transparent substrate, an infrared-shielding particle dispersion powder, a master batch, and an infrared-shielding particle dispersion were produced in the same manner as in Example 1.

對於所得到的分散液、紅外線遮蔽透明基材、以及紅外線遮蔽粒子分散體進行了與實施例1同樣的評價。結果如表1所示。 The same evaluations as in Example 1 were performed for the obtained dispersion liquid, the infrared-shielding transparent substrate, and the infrared-shielding particle dispersion. The results are shown in Table 1.

[實施例6] [Example 6]

除了以使用氧化硼作為硼源、使用氧化鑭作為鑭源、使用碳(石墨)作為還原劑,作為鑭與硼的元素比的B/La為6.10的方式進行稱量、混合以外,與實施例1同樣地,得到含有六硼化鑭粒子的粉末。但是,相對於100重量份的氧化硼,稱量、混合了60重量份的碳。 Except that boron oxide is used as a boron source, lanthanum oxide is used as a lanthanum source, carbon (graphite) is used as a reducing agent, and the element ratio of lanthanum to boron is B/La of 6.10, the measurement and mixing are carried out in accordance with the examples. 1 In the same manner, a powder containing lanthanum hexaboride particles was obtained. However, 60 parts by weight of carbon were weighed and mixed with respect to 100 parts by weight of boron oxide.

用燃燒紅外吸收法對所得到的含有六硼化鑭粒子的粉末的含碳濃度進行測定,碳含量為0.1質量%。另外,利用ICP對所得到的含有六硼化鑭粒子的組成進行評價,能夠確認作為通式LaBm中的硼(B)與鑭(La)的元素比(B/La)的m為6.0。 The carbon content of the obtained powder containing lanthanum hexaboride particles was measured by a combustion infrared absorption method, and the carbon content was 0.1% by mass. In addition, the composition of the obtained lanthanum hexaboride particles was evaluated by ICP, and it was confirmed that m , which is the element ratio (B/La) of boron (B) to lanthanum (La) in the general formula LaB m , was 6.0.

再有,對於所得到的含有六硼化鑭粒子的粉末,利用上述的硼化物粒子中的B4C濃度的評價方法,對含有六硼化鑭粒子的粉末的B4C濃度進行測定,為0.4質量%。 Furthermore, for powder containing lanthanum hexaboride particles to be obtained using the evaluation method described above B 4 C concentration boride particles, the concentration of B 4 C powder containing lanthanum hexaboride particles was measured as 0.4% by mass.

接著,除了使用該含有六硼化鑭粒子的粉末以外,與實施例1同樣地,調製硼化物粒子分散液。另外,使用所得到的分散液,與實施例1同樣地製作紅外線遮蔽透明基材、紅外線遮蔽粒子分散粉末、母料、以及紅外線遮蔽粒子分散體。 Next, except that the powder containing the lanthanum hexaboride particles was used, the boride particle dispersion was prepared in the same manner as in Example 1. In addition, using the obtained dispersion liquid, an infrared-shielding transparent substrate, an infrared-shielding particle dispersion powder, a master batch, and an infrared-shielding particle dispersion were produced in the same manner as in Example 1.

對於所得到的分散液、紅外線遮蔽透明基材、以及紅外線遮蔽粒子分散體進行了與實施例1同樣的評價。結果如表1所示。 The same evaluations as in Example 1 were performed for the obtained dispersion liquid, the infrared-shielding transparent substrate, and the infrared-shielding particle dispersion. The results are shown in Table 1.

[實施例7] [Example 7]

除了以鈰與硼的元素比的B/Ce為6.10的方式,使用氧化鈰來代替氧化鑭以外,與實施例1同樣地,得到含有六硼化鈰粒子的粉末。 A powder containing cerium hexaboride particles was obtained in the same manner as in Example 1, except that cerium oxide was used instead of lanthanum oxide so that the element ratio of cerium to boron B/Ce was 6.10.

用燃燒紅外吸收法對所得到的含有六硼化鈰粒子的粉末的含碳濃度進行測定,碳含量為0.2質量%。另外,利用ICP對所得到的含有六硼化鈰,能夠確認作為通式CeBm中的硼(B)與鈰(Ce)的元素比(B/Ce)的m為6.0。 The carbon content of the obtained powder containing cerium hexaboride particles was measured by a combustion infrared absorption method, and the carbon content was 0.2% by mass. In addition, it was confirmed that m , which is the element ratio (B/Ce) of boron (B) to cerium (Ce) in the general formula CeB m , of the obtained cerium hexaboride contained by ICP was 6.0.

再有,對於所得到的含有六硼化鈰粒子的粉末,利用上述的硼化物粒子中的B4C濃度的評價方法,對含有六硼化鈰粒子的粉末的B4C濃度進行測定,為0.9質量%。 Furthermore, for powder containing cerium hexaboride particles to be obtained using the evaluation method described above B 4 C concentration boride particles, the concentration of B 4 C powder containing cerium hexaboride particles was measured as 0.9% by mass.

接著,除了使用該含有六硼化鈰粒子的粉末以外,與實施例1同樣地,調製硼化物粒子分散液。另外,使用所得到的分散液,與實施例1同樣地製作紅外線遮蔽透明基材、紅外線遮蔽粒子分散粉末、母料、以及紅外線遮蔽粒子分散體。 Next, except for using the powder containing the cerium hexaboride particles, a dispersion of boride particles was prepared in the same manner as in Example 1. In addition, using the obtained dispersion liquid, an infrared-shielding transparent substrate, an infrared-shielding particle dispersion powder, a master batch, and an infrared-shielding particle dispersion were produced in the same manner as in Example 1.

對於所得到的分散液、紅外線遮蔽透明基材、以及紅外線遮蔽粒子分散體進行了與實施例1同樣的評價。結果如表1所示。 The same evaluations as in Example 1 were performed for the obtained dispersion liquid, the infrared-shielding transparent substrate, and the infrared-shielding particle dispersion. The results are shown in Table 1.

[實施例8] [Example 8]

藉由以重量比為4:1:10的比例在實施例1中所製作的紅外線遮蔽粒子分散液(硼化物粒子分散液)中添加分散劑(脂肪酸胺類分散劑)及可塑劑,在減壓乾燥機中除去溶劑成分,從而得到紅外線遮蔽粒子可塑劑分散液。 By adding a dispersant (fatty acid amine dispersant) and a plasticizer to the infrared shielding particle dispersion (boride particle dispersion) prepared in Example 1 in a weight ratio of 4:1:10, the reduction The solvent component is removed in a press dryer to obtain an infrared shielding particle plasticizer dispersion.

將所得到的紅外線遮蔽粒子可塑劑分散液與聚乙烯醇縮丁醛樹脂混合,利用擠出加工機得到片形狀的紅外線遮蔽粒子分散體。 The obtained infrared-shielding particle plasticizer dispersion is mixed with polyvinyl butyral resin, and a sheet-shaped infrared-shielding particle dispersion is obtained by an extrusion machine.

此時,以最終得到的紅外線遮蔽夾層透明基材的可見光透射率為70%左右的方式調節混合比率。 At this time, the mixing ratio is adjusted so that the visible light transmittance of the finally obtained infrared shielding interlayer transparent substrate is about 70%.

用2片玻璃基材(厚度:3mm)將所得到的片形狀的紅外線遮蔽粒子分散體夾入,使用加熱壓機製作夾層玻璃形態的紅外線遮蔽夾層透明基材。 The obtained sheet-shaped infrared shielding particle dispersion was sandwiched between two glass substrates (thickness: 3 mm), and a laminated glass-shaped infrared shielding interlayer transparent substrate was produced using a heating press.

對於所得到的線遮蔽夾層透明基材,進行了與實施例1的紅外線遮蔽粒子分散體的情況同樣的評價。結果如表1所示。 The obtained wire-shielding interlayer transparent substrate was evaluated in the same manner as in the case of the infrared-shielding particle dispersion of Example 1. The results are shown in Table 1.

[比較例1] [Comparative Example 1]

使用碳化硼作為硼源及還原劑、使用氧化鑭作為鑭源,以鑭與硼的元素比B/La為6.10的方式對其進行稱量、混合。之後,在氬氣氛中以1480±50℃的溫度條件燒成6小時,得到含有六硼化鑭粒子的粉末。 Boron carbide was used as the boron source and reducing agent, and lanthanum oxide was used as the lanthanum source, and the lanthanum and boron element ratio B/La was weighed and mixed. After that, it was fired in an argon atmosphere at a temperature of 1480±50°C for 6 hours to obtain a powder containing lanthanum hexaboride particles.

用燃燒紅外吸收法對所得到的含有六硼化鑭粒子的粉末的含碳濃度進行測定,碳含量為0.6質量%。另外,利用ICP對所得到的含有六硼化鑭粒子的組成進行評價,能夠確認作為通式LaBm中的硼(B)與鑭(La)的元素比(B/La)的m為6.0。 The carbon content of the obtained powder containing lanthanum hexaboride particles was measured by a combustion infrared absorption method, and the carbon content was 0.6% by mass. In addition, the composition of the obtained lanthanum hexaboride particles was evaluated by ICP, and it was confirmed that m , which is the element ratio (B/La) of boron (B) to lanthanum (La) in the general formula LaB m , was 6.0.

再有,對於所得到的含有六硼化鑭粒子的粉末,利用上述的硼化物粒 子中的B4C濃度的評價方法,對含有六硼化鑭粒子的粉末的B4C濃度進行測定,為2.6質量%。 Furthermore, for powder containing lanthanum hexaboride particles to be obtained using the evaluation method described above B 4 C concentration boride particles, the concentration of B 4 C powder containing lanthanum hexaboride particles was measured as 2.6 mass%.

接著,除了使用該含有六硼化鑭粒子的粉末以外,與實施例1同樣地,調製硼化物粒子分散液。 Next, except that the powder containing the lanthanum hexaboride particles was used, the boride particle dispersion was prepared in the same manner as in Example 1.

對於所得到的分散液進行與實施例1同樣的評價。結果如表2所示。 The same evaluation as in Example 1 was performed on the obtained dispersion liquid. The results are shown in Table 2.

需要說明的是,為了調製分散液,在進行了20小時粉碎處理的時間點儘管平均分散粒徑為105nm較100nm更大,然而由於漿料粘度上升因此粉碎效果顯著降低,因此判斷為即使繼續進行以上粉碎處理亦難以得到100nm以下的粒徑。 It should be noted that in order to prepare the dispersion, even though the average dispersed particle size was 105nm larger than 100nm at the time of the pulverization treatment for 20 hours, the pulverization effect was significantly reduced due to the increase in the slurry viscosity, so it was judged that The above pulverization treatment is also difficult to obtain a particle size of 100 nm or less.

另外,所得到的硼化物粒子分散液中的Zr/La為1.8,與實施例1~實施例8的情況相比較高,判明介質珠大量地磨損并混入漿料中。 In addition, Zr/La in the obtained boride particle dispersion was 1.8, which was high compared to the cases of Examples 1 to 8, and it was found that a large amount of media beads were abraded and mixed in the slurry.

再有,漫透射率峰值為1.8%與實施例1~實施例8的情況相比較高,擔心當利用其製作光學構件時會強烈地觀察到藍霧。 In addition, the diffuse transmittance peak value of 1.8% is higher than in the cases of Examples 1 to 8, and it is feared that blue haze may be strongly observed when optical members are produced using this.

使用所得到的分散液與實施例1的情況同樣地在透明玻璃基材上形成塗層,作為紅外線遮蔽透明基材。並且,對所得到的紅外線遮蔽透明基材的光學特性進行測定。測定結果如以下的表2所示。 Using the obtained dispersion liquid, as in the case of Example 1, a coating layer was formed on a transparent glass substrate as an infrared shielding transparent substrate. In addition, the optical properties of the obtained infrared shielding transparent substrate were measured. The measurement results are shown in Table 2 below.

所得到的紅外線遮蔽透明基材的霧度為1.6%,確認其透明性非常低。另外,波長360nm以上500nm以下的區域處的漫透射曲線的極大值為1.9%,另外,在照射人工太陽光時以目視清楚地確認出藍霧。 The haze of the obtained transparent infrared shielding substrate was 1.6%, and it was confirmed that the transparency was very low. In addition, the maximum value of the diffuse transmission curve in the region having a wavelength of 360 nm or more and 500 nm or less was 1.9%, and the blue haze was clearly confirmed visually when artificial sunlight was irradiated.

再有,藉由向所得到的分散液添加同等量的分散劑(具有氨基的丙烯酸類高分子分散劑),將所得到的混合液保持在乾燥機中將溶劑成分除去後進行粉碎,得到紅外線遮蔽粒子分散劑粉末。 Furthermore, by adding the same amount of dispersant (acrylic polymer dispersant with amino group) to the obtained dispersion, the resulting mixed liquid is kept in a dryer to remove the solvent component and then pulverize to obtain infrared rays. Masking particle dispersant powder.

將所得到的紅外線遮蔽粒子分散粉末與聚碳酸酯樹脂混合,使用擠出加工機製作顆粒形狀的母料。 The obtained infrared shielding particle dispersion powder was mixed with a polycarbonate resin, and an extrusion machine was used to prepare a pellet-shaped masterbatch.

再有,將上述母料與聚碳酸酯樹脂混合,利用擠出加工機形成紅外線遮蔽粒子分散體。此時,以得到的紅外線遮蔽粒子分散體的可見光透射率為70%左右的方式調節聚碳酸酯樹脂與母料的混合比。所得到的紅外線遮蔽粒子分散體的光學特性測定結果如以下的表2所示。 Furthermore, the above-mentioned master batch is mixed with a polycarbonate resin, and an infrared shielding particle dispersion is formed by an extrusion processing machine. At this time, the mixing ratio of the polycarbonate resin and the master batch was adjusted so that the visible light transmittance of the obtained infrared shielding particle dispersion was about 70%. The measurement results of the optical properties of the obtained infrared shielding particle dispersion are shown in Table 2 below.

可見光透射率為大約70%并確認了充分地透射了可見光區域的光。然而,霧度為1.6%,確認了透明性非常低。另外,波長360nm~500nm區域處的漫透射曲線的極大值為2.0%,另外,照射人工太陽光時以目視清楚地確認出藍霧。 The visible light transmittance was about 70%, and it was confirmed that light in the visible light region was sufficiently transmitted. However, the haze was 1.6%, confirming that the transparency was very low. In addition, the maximum value of the diffuse transmission curve in the wavelength range of 360nm to 500nm is 2.0%, and the blue haze is clearly confirmed visually when irradiated with artificial sunlight.

[比較例2] [Comparative Example 2]

除了以鑭與硼的元素比的B/La為6.20的方式對碳化硼及氧化鑭進行稱量、混合以外,與比較例1同樣地,得到含有六硼化鑭粒子的粉末。 Except that the boron carbide and lanthanum oxide were weighed and mixed so that the element ratio of lanthanum to boron B/La was 6.20, a powder containing lanthanum hexaboride particles was obtained in the same manner as in Comparative Example 1.

用燃燒紅外吸收法對所得到的含有六硼化鑭粒子的粉末的含碳濃度進行測定,碳含量為0.8質量%。另外,利用ICP對所得到的含有六硼化鑭粒子的組成進行評價,能夠確認作為通式LaBm中的硼(B)與鑭(La)的元素比(B/La)的m為6.1。 The carbon content of the obtained powder containing lanthanum hexaboride particles was measured by a combustion infrared absorption method, and the carbon content was 0.8% by mass. In addition, the composition of the obtained lanthanum hexaboride particles was evaluated by ICP, and it was confirmed that m , which is the element ratio (B/La) of boron (B) to lanthanum (La) in the general formula LaB m , was 6.1.

再有,對於所得到的含有六硼化鑭粒子的粉末,利用上述的硼化物粒子中的B4C濃度的評價方法,對含有六硼化鑭粒子的粉末的B4C濃度進行測定,為3.7質量%。 Furthermore, for powder containing lanthanum hexaboride particles to be obtained using the evaluation method described above B 4 C concentration boride particles, the concentration of B 4 C powder containing lanthanum hexaboride particles was measured as 3.7 mass%.

接著,除了使用該含有六硼化鑭粒子的粉末以外,與實施例1同樣地,調製硼化物粒子分散液。另外,使用所得到的分散液與實施例1同樣地製 作紅外線遮蔽透明基材、紅外線遮蔽粒子分散粉末、母料、以及紅外線遮蔽粒子分散體。 Next, except that the powder containing the lanthanum hexaboride particles was used, the boride particle dispersion was prepared in the same manner as in Example 1. In addition, the obtained dispersion liquid was prepared in the same manner as in Example 1. Used as infrared shielding transparent substrate, infrared shielding particle dispersion powder, master batch, and infrared shielding particle dispersion.

對於所得到的分散液、紅外線遮蔽透明基材、以及紅外線遮蔽粒子分散體進行了與實施例1同樣的評價。結果如表2所示。 The same evaluations as in Example 1 were performed for the obtained dispersion liquid, the infrared-shielding transparent substrate, and the infrared-shielding particle dispersion. The results are shown in Table 2.

需要說明的是,為了調製分散液,在進行了20小時粉碎處理的時間點儘管平均分散粒徑為111nm較100nm更大,然而由於漿料粘度上升因此粉碎效果顯著降低,因此判斷為即使繼續進行以上粉碎處理亦難以得到100nm以下的粒徑。 It should be noted that in order to prepare the dispersion, even though the average dispersed particle size was 111nm larger than 100nm at the time of the pulverization treatment for 20 hours, the pulverization effect was significantly reduced due to the increase in slurry viscosity, so it was judged that The above pulverization treatment is also difficult to obtain a particle size of 100 nm or less.

另外,所得到的硼化物粒子分散液中的Zr/La為2.0,與實施例1~實施例8的情況相比較高,判明介質珠大量地磨損并混入漿料中。 In addition, Zr/La in the obtained boride particle dispersion was 2.0, which was high compared to the cases of Examples 1 to 8, and it was found that a large amount of media beads were worn and mixed in the slurry.

再有,漫透射率峰值為2.4%與實施例1~實施例8的情況相比較高,擔心當利用其製作光學構件時會強烈地觀察到藍霧。 In addition, the diffuse transmittance peak value of 2.4% is higher than in the cases of Examples 1 to 8, and it is feared that blue haze may be strongly observed when an optical member is produced using this.

另外,使用所得到的分散液與實施例1的情況同樣地在透明玻璃基材上形成塗層。並且,對所得到的紅外線遮蔽透明基材的光學特性進行測定。測定結果如以下的表2所示。 In addition, the obtained dispersion liquid was used to form a coating layer on the transparent glass substrate in the same manner as in the case of Example 1. In addition, the optical properties of the obtained infrared shielding transparent substrate were measured. The measurement results are shown in Table 2 below.

所得到的紅外線遮蔽透明基材的霧度為1.8%,確認其透明性非常低。另外,波長360nm以上500nm以下的區域處的漫透射曲線的極大值為2.4%,另外,在照射人工太陽光時與比較例1同樣地以目視清楚地確認出藍霧。 The haze of the obtained transparent infrared shielding substrate was 1.8%, and it was confirmed that the transparency was very low. In addition, the maximum value of the diffuse transmission curve in the region having a wavelength of 360 nm or more and 500 nm or less was 2.4%, and when artificial sunlight was irradiated, the blue haze was clearly confirmed visually as in Comparative Example 1.

[比較例3] [Comparative Example 3]

除了使用氧化硼作為硼源、使用氧化鑭作為鑭源、使用碳(石墨)作為還原劑,並且以鑭與硼的元素比的B/La為6.10的方式進行稱量、混合以外,與比較例1同樣地,得到含有六硼化鑭粒子的粉末。但是,相對於 100重量份的氧化硼,稱量、混合了60重量份的碳。 In addition to using boron oxide as a boron source, lanthanum oxide as a lanthanum source, carbon (graphite) as a reducing agent, and weighing and mixing so that the element ratio of lanthanum to boron is B/La of 6.10, the comparison example 1 In the same manner, a powder containing lanthanum hexaboride particles was obtained. However, relative to 100 parts by weight of boron oxide are weighed and mixed with 60 parts by weight of carbon.

用燃燒紅外吸收法對所得到的含有六硼化鑭粒子的粉末的含碳濃度進行測定,碳含量為0.7質量%。另外,利用ICP對所得到的含有六硼化鑭粒子的組成進行評價,能夠確認作為通式LaBm中的硼(B)與鑭(La)的元素比(B/La)的m為6.0。 The carbon content of the obtained powder containing lanthanum hexaboride particles was measured by a combustion infrared absorption method, and the carbon content was 0.7% by mass. In addition, the composition of the obtained lanthanum hexaboride particles was evaluated by ICP, and it was confirmed that m , which is the element ratio (B/La) of boron (B) to lanthanum (La) in the general formula LaB m , was 6.0.

再有,對於所得到的含有六硼化鑭粒子的粉末,利用上述的硼化物粒子中的B4C濃度的評價方法,對含有六硼化鑭粒子的粉末的B4C濃度進行測定,為3.4質量%。 Furthermore, for powder containing lanthanum hexaboride particles to be obtained using the evaluation method described above B 4 C concentration boride particles, the concentration of B 4 C powder containing lanthanum hexaboride particles was measured as 3.4% by mass.

接著,除了使用該含有六硼化鑭粒子的粉末以外,與實施例1同樣地,調製硼化物粒子分散液。另外,使用所得到的分散液與實施例1同樣地製作紅外線遮蔽透明基材、紅外線遮蔽粒子分散粉末、母料、以及紅外線遮蔽粒子分散體。 Next, except that the powder containing the lanthanum hexaboride particles was used, the boride particle dispersion was prepared in the same manner as in Example 1. In addition, the obtained dispersion liquid was used in the same manner as in Example 1 to produce an infrared-shielding transparent substrate, an infrared-shielding particle dispersion powder, a master batch, and an infrared-shielding particle dispersion.

對於所得到的分散液、紅外線遮蔽透明基材、以及紅外線遮蔽粒子分散體進行了與實施例1同樣的評價。結果如表2所示。 The same evaluations as in Example 1 were performed for the obtained dispersion liquid, the infrared-shielding transparent substrate, and the infrared-shielding particle dispersion. The results are shown in Table 2.

所得到的紅外線遮蔽透明基材的霧度為1.7%,確認其透明性非常低。另外,波長360nm以上500nm以下的區域處的漫透射曲線的極大值為2.2%,另外,在照射人工太陽光時與比較例1同樣地以目視清楚地確認出藍霧。 The haze of the obtained transparent infrared shielding substrate was 1.7%, and it was confirmed that the transparency was very low. In addition, the maximum value of the diffuse transmission curve in the region with a wavelength of 360 nm or more and 500 nm or less was 2.2%. In addition, when artificial sunlight was irradiated, the blue haze was clearly confirmed visually as in Comparative Example 1.

[比較例4] [Comparative Example 4]

除了以鈰與硼的元素比的B/Ce為6.10的方式進一步使用氧化鈰來代替氧化鑭以外,與比較例1同樣地,得到含有六硼化鈰粒子的粉末。 A powder containing cerium hexaboride particles was obtained in the same manner as in Comparative Example 1, except that cerium oxide was further used instead of lanthanum oxide so that the element ratio of cerium to boron B/Ce was 6.10.

用燃燒紅外吸收法對所得到的含有六硼化鈰粒子的粉末的含碳濃度進行測定,碳含量為0.9質量%。另外,利用ICP對所得到的含有六硼化鈰粒 子的組成進行評價,能夠確認作為通式CeBm中的硼(B)與鑭(Ce)的元素比(B/Ce)的m為6.0。 The carbon content of the obtained powder containing cerium hexaboride particles was measured by a combustion infrared absorption method, and the carbon content was 0.9% by mass. In addition, the composition of the obtained cerium hexaboride particles was evaluated by ICP, and it was confirmed that m , which is the element ratio (B/Ce) of boron (B) to lanthanum (Ce) in the general formula CeB m , was 6.0.

再有,對於所得到的含有六硼化鈰粒子的粉末,利用上述的硼化物粒子中的B4C濃度的評價方法,對含有六硼化鈰粒子的粉末的B4C濃度進行測定,為4.4質量%。 Furthermore, for powder containing cerium hexaboride particles to be obtained using the evaluation method described above B 4 C concentration boride particles, the concentration of B 4 C powder containing cerium hexaboride particles was measured as 4.4% by mass.

接著,除了使用該含有六硼化鈰粒子的粉末以外,與實施例1同樣地,調製硼化物粒子分散液。另外,使用所得到的分散液與實施例1同樣地製作紅外線遮蔽透明基材、紅外線遮蔽粒子分散粉末、母料、以及紅外線遮蔽粒子分散體。 Next, except for using the powder containing the cerium hexaboride particles, a dispersion of boride particles was prepared in the same manner as in Example 1. In addition, the obtained dispersion liquid was used in the same manner as in Example 1 to produce an infrared-shielding transparent substrate, an infrared-shielding particle dispersion powder, a master batch, and an infrared-shielding particle dispersion.

對於所得到的分散液、紅外線遮蔽透明基材、以及紅外線遮蔽粒子分散體進行了與實施例1同樣的評價。結果如表2所示。 The same evaluations as in Example 1 were performed for the obtained dispersion liquid, the infrared-shielding transparent substrate, and the infrared-shielding particle dispersion. The results are shown in Table 2.

所得到的紅外線遮蔽透明基材的霧度為1.9%,確認其透明性非常低。另外,波長360nm以上500nm以下的區域處的漫透射曲線的極大值為2.5%,另外,在照射人工太陽光時與比較例1同樣地以目視清楚地確認出藍霧。 The haze of the obtained transparent infrared shielding substrate was 1.9%, and it was confirmed that the transparency was very low. In addition, the maximum value of the diffuse transmission curve in the region having a wavelength of 360 nm or more and 500 nm or less was 2.5%, and when artificial sunlight was irradiated, the blue haze was clearly confirmed visually as in Comparative Example 1.

Figure 105144050-A0305-02-0061-1
Figure 105144050-A0305-02-0061-1

Figure 105144050-A0305-02-0062-2
Figure 105144050-A0305-02-0062-2

在實施例1~實施例8中能夠確認,能夠針對利用固相反應等得到的硼化物粒子,較簡單且經濟地,將平均分散粒徑粉碎并細微化至100nm以下、特別至85nm以下。另外,在實施例1~實施例8中,由於得到的硼化物粒子 的平均分散粒徑為100nm以下、特別為85nm以下,因此即使對使用該粒子或分散液製作的紅外線遮蔽膜、具有塗層的紅外線遮蔽透明基材、或紅外線遮蔽粒子分散體照射人工太陽光亦不會著色成藍白色。換言之,確認藍霧被抑制。 In Examples 1 to 8, it can be confirmed that the average dispersed particle size can be pulverized and made fine to 100 nm or less, particularly to 85 nm or less, relatively simply and economically, for boride particles obtained by solid phase reaction or the like. In addition, in Examples 1 to 8, the boride particles obtained The average dispersed particle size is 100nm or less, especially 85nm or less, so even if the infrared shielding film made using the particles or dispersion, the infrared shielding transparent substrate with coating, or the infrared shielding particle dispersion is irradiated with artificial sunlight Will not be colored blue-white. In other words, it is confirmed that the blue haze is suppressed.

因此,能夠確認利用實施例1~實施例8的硼化物粒子分散液製作的紅外線遮蔽膜、紅外線遮蔽透明基材、具有紅外線遮蔽透明基材的紅外線遮蔽光學構件、紅外線遮蔽粒子分散體、或紅外線遮蔽夾層透明基材等能夠被優選地用於建材用的窗戶玻璃或車窗玻璃等。 Therefore, it can be confirmed that the infrared shielding film, the infrared shielding transparent substrate, the infrared shielding optical member with the infrared shielding transparent substrate, the infrared shielding particle dispersion, or the infrared ray prepared by using the boride particle dispersions of Examples 1 to 8 The shielding laminated transparent substrate and the like can be preferably used for window glass or vehicle window glass for building materials.

需要說明的是,在實施例1~實施例7中,其塗層的厚度均為10μm左右,為20μm以下。 It should be noted that in Example 1 to Example 7, the thickness of the coating is about 10 μm, which is 20 μm or less.

另一方面,對於使用所含有的碳濃度高於0.2質量%的含有硼化物粒子的粉末作為原料的比較例1~比較例4,能夠確認在粉碎處理20小時平均分散粒徑大於100nm,另外由於粘度增大即使進一步進行粉碎亦難以形成100nm以下的粒徑。再有,硼化物粒子分散液的漫透射曲線的極大值亦高於1.5%。因此,能夠確認對於使用該硼化物粒子分散液所製作的紅外線遮蔽透明基材等,擔心會發生藍霧。另外,對於用於建材用的窗戶玻璃或車窗玻璃等存在問題。 On the other hand, for Comparative Examples 1 to 4 using powders containing boride particles with a carbon concentration higher than 0.2% by mass as raw materials, it can be confirmed that the average dispersed particle size is greater than 100 nm after 20 hours of pulverization. Even if the viscosity increases, it is difficult to form a particle size of 100 nm or less even if it is further crushed. Furthermore, the maximum value of the diffuse transmission curve of the boride particle dispersion is also higher than 1.5%. Therefore, it can be confirmed that there is a concern that blue haze may occur in the infrared-shielding transparent substrate and the like produced using the boride particle dispersion. In addition, there are problems with window glass or vehicle window glass used for building materials.

以上藉由實施方式及實施例等對硼化物粒子、硼化物粒子分散液、紅外線遮蔽透明基材、紅外線遮蔽光學構件、紅外線遮蔽粒子分散體、紅外線遮蔽夾層透明基材、紅外線遮蔽粒子分散粉末、以及母料進行了說明,但本發明並不限定上述實施方式及實施例等。在申請專利範圍所記載的本發明的主旨的範圍內,可進行各種變形、變更。 In the above, through the embodiments and examples, the boride particles, boride particle dispersions, infrared shielding transparent substrates, infrared shielding optical members, infrared shielding particle dispersions, infrared shielding interlayer transparent substrates, infrared shielding particle dispersion powder, And the master batch has been described, but the present invention is not limited to the above-mentioned embodiments and examples. Various modifications and changes can be made within the scope of the gist of the present invention described in the scope of the patent application.

本申請案係主張基於2016年1月4日向日本國特許廳申請的日本專利申請案第2016-000298號、2016年1月4日向日本國特許廳申請的日本專利申請案第2016-000300號、2016年1月4日向日本國特許廳申請的日本專利申請案第2016-000301號、2016年12月27日向日本國特許廳申請的日本專利申請案第2016-254433號、2016年12月27日向日本國特許廳申請的日本專利申請案第2016-254437號、2016年12月27日向日本國特許廳申請的日本專利申請案第2016-254440號的優先權,該日本專利申請案第2016-000298號、日本專利申請案第2016-000300號、日本專利申請案第2016-000301號、日本專利申請案第2016-254433號、日本專利申請案第2016-254437號、日本專利申請案第2016-254440號的全部內容係藉由參照而併入本國際申請中。 This application is based on the Japanese Patent Application No. 2016-000298 filed with the Japan Patent Office on January 4, 2016, and the Japanese Patent Application No. 2016-000300 filed with the Japan Patent Office on January 4, 2016. The Japanese Patent Application No. 2016-000301 filed with the Japan Patent Office on January 4, 2016, the Japanese Patent Application No. 2016-254433 filed with the Japan Patent Office on December 27, 2016, and the Japanese Patent Application No. 2016-254433 filed with the Japan Patent Office on December 27, 2016. Priority of the Japanese Patent Application No. 2016-254437 filed by the Japan Patent Office and the Japanese Patent Application No. 2016-254440 filed with the Japan Patent Office on December 27, 2016, the Japanese Patent Application No. 2016-000298 No., Japanese Patent Application No. 2016-000300, Japanese Patent Application No. 2016-000301, Japanese Patent Application No. 2016-254433, Japanese Patent Application No. 2016-254437, Japanese Patent Application No. 2016-254440 The entire content of the number is incorporated into this international application by reference.

10‧‧‧測定裝置 10‧‧‧Measurement device

11‧‧‧光源 11‧‧‧Light source

13‧‧‧受光器 13‧‧‧Receiver

14‧‧‧積分球 14‧‧‧Integrating Sphere

15‧‧‧標準反射板 15‧‧‧Standard reflector

141‧‧‧第一開口部 141‧‧‧First opening

142‧‧‧第二開口部 142‧‧‧Second opening

143‧‧‧第三開口部 143‧‧‧The third opening

Claims (26)

一種硼化物粒子,其由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示,用燃燒紅外吸收法測定時的該硼化物粒子中包含的碳含量為0.2質量%以下,且B4C的含量為1.0質量%以下。 A kind of boride particles, which are represented by the general formula XB m (where X is selected from Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sr, One or more metal elements of Ca, where m is a number representing the content of boron in the general formula) means that the carbon content contained in the boride particles when measured by the combustion infrared absorption method is 0.2% by mass or less, and the content of B 4 C The content is 1.0% by mass or less. 如申請專利範圍第1項之硼化物粒子,其中,該通式XBm中的m為4.0以上6.2以下。 For example, the boride particle of item 1 in the scope of patent application, wherein m in the general formula XB m is 4.0 or more and 6.2 or less. 如申請專利範圍第1或2項之硼化物粒子,其中,該硼化物粒子包括六硼化鑭粒子。 Such as the boride particles of item 1 or 2 in the scope of patent application, wherein the boride particles include lanthanum hexaboride particles. 一種硼化物粒子分散液,其包括申請專利範圍第1至3項中任一項之硼化物粒子、以及液體介質。 A dispersion of boride particles, which includes the boride particles of any one of items 1 to 3 in the scope of patent application, and a liquid medium. 如申請專利範圍第4項之硼化物粒子分散液,其中,該液體介質包括選自水、有機溶劑、油脂、液體樹脂、可塑劑的一種以上。 For example, the boride particle dispersion of item 4 in the scope of the patent application, wherein the liquid medium includes one or more selected from the group consisting of water, organic solvents, grease, liquid resins, and plasticizers. 如申請專利範圍第4或5項之硼化物粒子分散液,其中,用動態光散射法測定的硼化物粒子的平均分散粒徑為85nm以下。 For example, the boride particle dispersion liquid of item 4 or 5 of the scope of patent application, wherein the average dispersed particle diameter of the boride particles measured by the dynamic light scattering method is 85 nm or less. 如申請專利範圍第4或5項之硼化物粒子分散液,其中,硼化物粒子的濃度為0.01質量%以上30質量%以下。 For example, the boride particle dispersion of item 4 or 5 in the scope of patent application, wherein the concentration of the boride particles is 0.01% by mass to 30% by mass. 如申請專利範圍第4或5項中任一項之硼化物粒子分散液,其中,相對於金屬元素X的重量濃度,Zr的重量濃度為1.5倍以下。 Such as the boride particle dispersion liquid of any one of the 4th or 5th item of the scope of patent application, wherein the weight concentration of Zr relative to the weight concentration of the metal element X is 1.5 times or less. 一種紅外線遮蔽透明基材,其在透明基材的至少一個面上具有塗層, 該塗層包括紅外線遮蔽粒子以及粘合劑,該紅外線遮蔽粒子為由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示,並且用燃燒紅外吸收法測定時的碳含量為0.2質量%以下的硼化物粒子,且該硼化物粒子中包含的B4C的量為1.0質量%以下。 An infrared shielding transparent substrate, which has a coating on at least one surface of the transparent substrate. The coating includes infrared shielding particles and a binder. The infrared shielding particles are composed of the general formula XB m (where X is selected from One or more metal elements of Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sr, Ca, and m represents the boron content in the general formula The number) represents boride particles with a carbon content of 0.2% by mass or less when measured by the combustion infrared absorption method, and the amount of B 4 C contained in the boride particles is 1.0% by mass or less. 如申請專利範圍第9項之紅外線遮蔽透明基材,其中,該通式XBm中的m為4.0以上6.2以下。 For example, the infrared-shielding transparent substrate of item 9 in the scope of patent application, wherein m in the general formula XB m is 4.0 or more and 6.2 or less. 如申請專利範圍第9或10項之紅外線遮蔽透明基材,其中,該硼化物粒子的平均分散粒徑為1nm以上100nm以下。 For example, the infrared-shielding transparent substrate of item 9 or 10 in the scope of patent application, wherein the average dispersed particle diameter of the boride particles is 1 nm or more and 100 nm or less. 如申請專利範圍第9或10項之紅外線遮蔽透明基材,其中,該粘合劑包括選自紫外線固化樹脂、熱塑性樹脂、熱固性樹脂、室溫固化樹脂的一種以上。 For example, the infrared shielding transparent substrate of item 9 or 10 of the scope of patent application, wherein the adhesive includes one or more selected from the group consisting of ultraviolet curable resin, thermoplastic resin, thermosetting resin, and room temperature curable resin. 如申請專利範圍第9或10項之紅外線遮蔽透明基材,其中,該塗層的厚度為20μm以下。 For example, the infrared shielding transparent substrate of item 9 or 10 of the scope of patent application, wherein the thickness of the coating is 20 μm or less. 如申請專利範圍第9或10項之紅外線遮蔽透明基材,其中,當將該塗層的可見光透射率設定為45%以上55%以下的範圍時,波長360nm以上500nm以下的區域處的漫透射曲線的極大值為1.5%以下。 For example, the infrared shielding transparent substrate of the 9th or 10th item of the scope of patent application, wherein when the visible light transmittance of the coating is set to the range of 45% to 55%, the diffuse transmission at the wavelength of 360nm to 500nm The maximum value of the curve is 1.5% or less. 如申請專利範圍第9或10項之紅外線遮蔽透明基材,其中,該透明基材為透明薄膜基材或透明玻璃基材。 For example, the infrared-shielding transparent substrate of item 9 or 10 in the scope of patent application, wherein the transparent substrate is a transparent film substrate or a transparent glass substrate. 一種紅外線遮蔽光學構件,其包括申請專利範圍第9至15項中任一項之紅外線遮蔽透明基材。 An infrared shielding optical component, which includes the infrared shielding transparent substrate of any one of the 9th to 15th patent applications. 一種紅外線遮蔽粒子分散體,其包括硼化物粒子以及熱塑性樹脂,其中,該硼化物粒子由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示,並且用燃燒紅外吸收法測定時的碳含量為0.2質量%以下,且該硼化物粒子中包含的B4C的量為1.0質量%以下。 An infrared shielding particle dispersion, which includes boride particles and a thermoplastic resin, wherein the boride particles have the general formula XB m (wherein X is selected from Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sr, Ca, more than one metal element, m is a number representing the boron content in the general formula), and the carbon content when measured by the combustion infrared absorption method is 0.2% by mass or less, and the amount of B 4 C contained in the boride particles is 1.0% by mass or less. 如申請專利範圍第17項之紅外線遮蔽粒子分散體,其中,該通式XBm中的m為4.0以上6.2以下。 For example, the infrared shielding particle dispersion of item 17 in the scope of patent application, wherein m in the general formula XB m is 4.0 or more and 6.2 or less. 如申請專利範圍第17或18項之紅外線遮蔽粒子分散體,其中,該硼化物粒子的平均分散粒徑為1nm以上100nm以下。 For example, the infrared shielding particle dispersion of item 17 or 18 in the scope of patent application, wherein the average dispersed particle diameter of the boride particles is 1 nm or more and 100 nm or less. 如申請專利範圍第17或18項之紅外線遮蔽粒子分散體,其中,該熱塑性樹脂為選自以下的一種以上:選自由聚對苯二甲酸乙二酯樹脂、聚碳酸酯樹脂、丙烯酸樹脂、苯乙烯樹脂、聚酰胺樹脂、聚乙烯樹脂、氯乙烯樹脂、烯烴樹脂、環氧樹脂、聚酰亞胺樹脂、氟樹脂、乙烯-乙酸乙烯酯共聚物、離子聚合物樹脂、聚乙烯縮丁醛樹脂、聚乙烯縮醛樹脂組成的樹脂組的一種樹脂;選自該樹脂組的兩種以上樹脂的混合物;以及選自該樹脂組的兩種以上樹脂的共聚物。 For example, the infrared shielding particle dispersion of item 17 or 18 in the scope of the patent application, wherein the thermoplastic resin is one or more selected from the group consisting of polyethylene terephthalate resin, polycarbonate resin, acrylic resin, benzene Vinyl resin, polyamide resin, polyethylene resin, vinyl chloride resin, olefin resin, epoxy resin, polyimide resin, fluororesin, ethylene-vinyl acetate copolymer, ionomer resin, polyvinyl butyral resin 1. One resin of the resin group consisting of polyvinyl acetal resin; a mixture of two or more resins selected from the resin group; and a copolymer of two or more resins selected from the resin group. 如申請專利範圍第17或18項之紅外線遮蔽粒子分散體,其中,該紅外線遮蔽粒子分散體為片形狀、板形狀或薄膜形狀。 For example, the infrared shielding particle dispersion of item 17 or 18 in the scope of patent application, wherein the infrared shielding particle dispersion is in the shape of a sheet, a plate or a film. 如申請專利範圍第17或18項之紅外線遮蔽粒子分散體,其中,每單位投影面積的該硼化物粒子的含量為0.01g/m2以上1.0g/m2以下。 For example, the infrared shielding particle dispersion of item 17 or 18 in the scope of patent application, wherein the content of the boride particles per unit projected area is 0.01 g/m 2 or more and 1.0 g/m 2 or less. 如申請專利範圍第17或18項之紅外線遮蔽粒子分散體,其中,當將可見光透射率設定為45%以上55%以下的範圍時,波長360nm以上500nm以下的區域處的漫透射曲線的極大值為1.5%以下。 For example, the infrared shielding particle dispersion of No. 17 or 18 of the scope of patent application, wherein when the visible light transmittance is set to the range of 45% to 55%, the maximum value of the diffuse transmission curve at the wavelength of 360nm to 500nm It is 1.5% or less. 一種紅外線遮蔽夾層透明基材,其具有:複數片透明基材;以及申請專利範圍第17至23項中任一項之紅外線遮蔽粒子分散體,其中,該紅外線遮蔽粒子分散體設置在該複數片透明基材之間。 An infrared shielding interlayer transparent substrate, which has: a plurality of transparent substrates; and the infrared shielding particle dispersion of any one of the 17 to 23 patent applications, wherein the infrared shielding particle dispersion is arranged on the plurality of sheets Between transparent substrates. 一種紅外線遮蔽粒子分散粉末,其包括硼化物粒子以及分散劑,其中,該硼化物粒子由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示,並且用燃燒紅外吸收法測定時的碳含量為0.2質量%以下,且該硼化物粒子中包含的B4C的量為1.0質量%以下。 An infrared shielding particle dispersion powder, comprising boride particles and a dispersant, wherein the boride particles have the general formula XB m (where X is selected from Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sr, Ca, more than one metal element, m is a number representing the boron content in the general formula), and the carbon content when measured by the combustion infrared absorption method is 0.2% by mass or less, and the amount of B 4 C contained in the boride particles is 1.0% by mass or less. 一種母料,其為包括硼化物粒子以及熱塑性樹脂的紅外線遮蔽粒子分散體,並且具有顆粒形狀,其中,該硼化物粒子由通式XBm(其中,X為選自Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Sr、Ca的一種以上的金屬元素,m為表示通式中的硼含量的數字)表示,並且用燃燒紅外吸收法測定時的碳含量為0.2質量%以下,且該硼化物粒子中包含的B4C的量為1.0質量%以下。 A master batch, which is a dispersion of infrared shielding particles including boride particles and thermoplastic resin, and has a particle shape, wherein the boride particles have the general formula XB m (where X is selected from Y, La, Ce, Pr , Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sr, Ca, more than one metal element, m is the number that represents the boron content in the general formula), and it is expressed by burning The carbon content measured by the infrared absorption method is 0.2% by mass or less, and the amount of B 4 C contained in the boride particles is 1.0% by mass or less.
TW105144050A 2016-01-04 2016-12-30 Boride particles, boride particle dispersion, infrared shielding transparent substrate, infrared shielding optical member, infrared shielding particle dispersion, infrared shielding interlayer transparent substrate, infrared shielding particle dispersion powder, and master batch TWI703090B (en)

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
JPJP2016-000298 2016-01-04
JPJP2016-000301 2016-01-04
JP2016000298 2016-01-04
JP2016000300 2016-01-04
JP2016000301 2016-01-04
JPJP2016-000300 2016-01-04
JP2016254440A JP6859704B2 (en) 2016-01-04 2016-12-27 Infrared shielding particle dispersion, infrared shielding laminated transparent base material, infrared shielding particle dispersion powder, and masterbatch
JPJP2016-254433 2016-12-27
JP2016254437A JP6838396B2 (en) 2016-01-04 2016-12-27 Infrared shielding transparent base material, infrared shielding optical member
JPJP2016-254440 2016-12-27
JPJP2016-254437 2016-12-27
JP2016254433A JP7272614B2 (en) 2016-01-04 2016-12-27 boride particle dispersion

Publications (2)

Publication Number Publication Date
TW201739693A TW201739693A (en) 2017-11-16
TWI703090B true TWI703090B (en) 2020-09-01

Family

ID=61022845

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105144050A TWI703090B (en) 2016-01-04 2016-12-30 Boride particles, boride particle dispersion, infrared shielding transparent substrate, infrared shielding optical member, infrared shielding particle dispersion, infrared shielding interlayer transparent substrate, infrared shielding particle dispersion powder, and master batch

Country Status (4)

Country Link
KR (1) KR20180100123A (en)
CN (1) CN108473324B (en)
IL (1) IL260353B (en)
TW (1) TWI703090B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111285380B (en) * 2020-02-04 2022-12-16 天津包钢稀土研究院有限责任公司 Preparation method and application of multi-rare earth co-doped boride and nano heat insulation powder thereof
CN112408409B (en) * 2020-10-29 2022-07-05 航天材料及工艺研究所 High-temperature-resistant high-entropy wave-absorbing ceramic and preparation method and application thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040028920A1 (en) * 2002-07-31 2004-02-12 Sumitomo Metal Mining Co., Ltd. Master batch containing heat radiation shielding component, and heat radiation shielding transparent resin form and heat radiation shielding transparent laminate for which the master batch has been used
CN101151321A (en) * 2005-03-28 2008-03-26 三菱工程塑料株式会社 Polycarbonate resin composition and heat radiation-shielding member
JP2009265485A (en) * 2008-04-28 2009-11-12 Sumitomo Metal Mining Co Ltd Infrared shielding material particle dispersion liquid, infrared shielding film, and infrared shielding optical member
JP2011063486A (en) * 2009-09-18 2011-03-31 Sumitomo Osaka Cement Co Ltd Method for producing high-purity metal boride particle, and high-purity metal boride particle obtained by the method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04243913A (en) * 1991-01-25 1992-09-01 Sumitomo Metal Mining Co Ltd Production of fine boride powder
JP4058822B2 (en) 1997-09-30 2008-03-12 住友金属鉱山株式会社 Selective permeable membrane coating solution, selective permeable membrane and selective permeable multilayer membrane
JP4096277B2 (en) 1998-09-22 2008-06-04 住友金属鉱山株式会社 Solar shading material, coating liquid for solar shading film, and solar shading film
JP2001314776A (en) 2000-05-09 2001-11-13 Hitachi Cable Ltd Method for pulverizing powder finely
JP2004237250A (en) 2003-02-07 2004-08-26 Sumitomo Metal Mining Co Ltd Method of pulverizing and dispersing boride particle, and dispersion liquid
JP2009150979A (en) 2007-12-19 2009-07-09 Sumitomo Metal Mining Co Ltd Method and device for evaluating blue haze
US9346715B2 (en) * 2010-03-29 2016-05-24 Sumitomo Osaka Cement Co., Ltd. Lanthanum hexaboride sintered body, target and lanthanum hexaboride film each comprising same, and process for production of the sintered body
JP5910242B2 (en) * 2011-03-29 2016-04-27 住友大阪セメント株式会社 Method for producing lanthanum hexaboride fine particles, lanthanum hexaboride fine particles, lanthanum hexaboride sintered body, lanthanum hexaboride film, and organic semiconductor device
JP6325202B2 (en) * 2012-09-03 2018-05-16 日本碍子株式会社 Lanthanum boride sintered body and manufacturing method thereof
JP5975292B2 (en) * 2013-01-24 2016-08-23 住友金属鉱山株式会社 Heat ray shielding film and heat ray shielding laminated transparent base material

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040028920A1 (en) * 2002-07-31 2004-02-12 Sumitomo Metal Mining Co., Ltd. Master batch containing heat radiation shielding component, and heat radiation shielding transparent resin form and heat radiation shielding transparent laminate for which the master batch has been used
CN101151321A (en) * 2005-03-28 2008-03-26 三菱工程塑料株式会社 Polycarbonate resin composition and heat radiation-shielding member
JP2009265485A (en) * 2008-04-28 2009-11-12 Sumitomo Metal Mining Co Ltd Infrared shielding material particle dispersion liquid, infrared shielding film, and infrared shielding optical member
JP2011063486A (en) * 2009-09-18 2011-03-31 Sumitomo Osaka Cement Co Ltd Method for producing high-purity metal boride particle, and high-purity metal boride particle obtained by the method

Also Published As

Publication number Publication date
IL260353A (en) 2018-08-30
CN108473324A (en) 2018-08-31
TW201739693A (en) 2017-11-16
IL260353B (en) 2022-08-01
KR20180100123A (en) 2018-09-07
CN108473324B (en) 2023-06-02

Similar Documents

Publication Publication Date Title
KR102620283B1 (en) Near-infrared shielding ultrafine particle dispersion, solar radiation shielding interlayer, infrared shielding laminated structure, and method for producing near-infrared shielding ultrafine particle dispersion
US10934207B2 (en) Methods for producing an assembly of hexaboride fine particles
TW201631226A (en) Heat-ray-shielding particles, heat-ray-shielding particle liquid dispersion, heat-ray-shielding particle dispersion, heat-ray-shielding particle dispersion laminate transparent substrate, infrared-absorbent transparent substrate
US11312116B2 (en) Boride particles, boride particle dispersed liquid, infrared light shielding transparent base, infrared light shielding optical member, infrared light shielding particle dispersed body, infrared light shielding laminated transparent base, infrared light shielding particle dispersed powder, and master batch
WO2016010156A1 (en) Heat-ray-shielding microparticles, heat-ray-shielding microparticle liquid dispersion, heat-ray-shielding film, heat-ray-shielding glass, heat-ray-shielding dispersion, and heat-ray-shielding laminated transparent substrate
TWI703090B (en) Boride particles, boride particle dispersion, infrared shielding transparent substrate, infrared shielding optical member, infrared shielding particle dispersion, infrared shielding interlayer transparent substrate, infrared shielding particle dispersion powder, and master batch
JP6859704B2 (en) Infrared shielding particle dispersion, infrared shielding laminated transparent base material, infrared shielding particle dispersion powder, and masterbatch
TWI705099B (en) Aggregate of fine metal particles, fine metal particle dispersion liquid, heat ray shielding film, heat ray shielding glass, heat ray shielding fine particle dispersion and heat ray shielding laminated transparent base material
US10486982B2 (en) Infrared absorbing fine particles, dispersion liquid using the same, dispersion body, laminated transparent base material, film, glass, and method for producing the same
JP2017128485A (en) Manufacturing method of boride fine particles
JP6838396B2 (en) Infrared shielding transparent base material, infrared shielding optical member
JP7272614B2 (en) boride particle dispersion
TWI666352B (en) Heat-ray shielding fine particles, heat-ray shielding fine particles dispersion liquid, heat-ray shielding film, heat-ray shielding glass, heat-ray shielding fine particles dispersion body and heat-ray shielding laminated transparent base material
JP2023176735A (en) Solar radiation insulating material, solar radiation insulating material dispersion, and solar radiation insulating transparent substrate
CN116323199A (en) Near-infrared ray absorbing particles, method for producing near-infrared ray absorbing particles, near-infrared ray absorbing particle dispersion, near-infrared ray absorbing laminate, and near-infrared ray absorbing transparent substrate
JP2017154902A (en) Hexaboride fine particle aggregate, hexaboride fine particle dispersion liquid, hexaboride fine particle dispersion body, hexaboride fine particle dispersion body-laminated transparent substrate, infrared absorption film, and infrared absorption glass