TWI696024B - Flexible resin coated copper foil substrate and methods thereof - Google Patents

Flexible resin coated copper foil substrate and methods thereof Download PDF

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TWI696024B
TWI696024B TW108109809A TW108109809A TWI696024B TW I696024 B TWI696024 B TW I696024B TW 108109809 A TW108109809 A TW 108109809A TW 108109809 A TW108109809 A TW 108109809A TW I696024 B TWI696024 B TW I696024B
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copper foil
layer
adhesive layer
dielectric adhesive
foil substrate
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TW108109809A
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TW202036130A (en
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何家華
莊朝欽
林志銘
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亞洲電材股份有限公司
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Abstract

The present invention provides a flexible resin coated copper foil substrate and methods thereof. The flexible resin coated copper foil substrate comprises an upper dielectric layer, a lower dielectric layer, a core layer which is formed between the upper dielectric layer and a lower dielectric layer and comprises liquid crystal polymer and filled powder dispersed in the liquid crystal polymer, and a copper foil layer formed on the upper dielectric layer. The upper dielectric layer being disposed between the core layer and the copper foil substrate. The present invention provides a flexible resin coated copper foil substrate possessing the advantage of low water-absorbent, low coefficient of thermal expansion, high adhesive strength, low dielectric loss etc., and is suitable for high-frequency and high-speed flexible substrate.

Description

柔性塗膠銅箔基板及其製法 Flexible glue-coated copper foil substrate and manufacturing method thereof

本發明涉及使用柔性塗膠銅箔(Flexible resin coated copper,FRCC)基板的柔性線路板(Flexible printed circuit,FPC)及其製備技術領域,尤其涉及一種柔性塗膠銅箔基板。 The invention relates to a flexible printed circuit (FPC) using a flexible resin coated copper (FRCC) substrate and a manufacturing technology field thereof, in particular to a flexible adhesive coated copper foil substrate.

隨著高頻高速傳輸需求的增加及5G時代的來臨,高性能工程塑膠需求大幅提升,過去軟性銅箔基板是以銅箔及聚醯亞胺(PI)樹脂等原料製成,但聚醯亞胺膜介電常數高、易吸濕,在高頻高速傳輸下易造成訊號損失。液晶高分子(LCP)材料因具備低吸濕性、高耐化性、高尺寸安定性、低介電常數及低介電損失因子(Dk/Df)等特性,其介電性能的低損耗、低吸水性在微波及高頻的毫米波均較傳統聚醯亞胺膜有明顯優勢,逐漸成為新應用材料,可應用於天線、基地台、毫米波雷達等。 With the increase in demand for high-frequency high-speed transmission and the advent of the 5G era, the demand for high-performance engineering plastics has increased significantly. In the past, flexible copper foil substrates were made of copper foil and polyimide (PI) resin and other raw materials, but polyimide The amine film has a high dielectric constant, is easy to absorb moisture, and is likely to cause signal loss under high-frequency and high-speed transmission. Liquid crystal polymer (LCP) materials have the characteristics of low moisture absorption, high chemical resistance, high dimensional stability, low dielectric constant and low dielectric loss factor (Dk/Df). The low water absorption in microwave and high-frequency millimeter waves has obvious advantages over traditional polyimide films, and it has gradually become a new application material, which can be applied to antennas, base stations, millimeter wave radars, etc.

目前市面上使用塗布法製作的液晶高分子基板產品,其吸水率及熱膨脹係數偏高,高吸水率(0.5至0.6%)在後續下游廠商應用階段,可能發生爆板,而液晶高分子層的高膨脹係數(30至35ppm/℃)和銅箔(17至18ppm/℃)不匹配,可能產生捲曲。此外,和聚醯亞胺相比,液晶高分 子與銅箔之間的接著力差,故液晶高分子基板通常選用表面較粗糙、Rz值較高的銅箔以提升接著強度。然而,在高頻高速傳輸時的集膚效應(skin effect),電子傳輸傾向在銅箔表面進行,若銅箔表面較粗糙,則會形成較大的訊號損失,故如何降低液晶高分子的吸水率及熱膨脹係數與如何提升液晶高分子層與銅箔層的接著強度,使製作基板時可選用Rz值較低的銅箔,是液晶高分子基板發展的重要議題。 At present, the liquid crystal polymer substrate products manufactured by the coating method on the market have high water absorption rate and thermal expansion coefficient. High water absorption rate (0.5 to 0.6%) may occur in the downstream application stage of downstream manufacturers, and the liquid crystal polymer layer may The high expansion coefficient (30 to 35 ppm/°C) and copper foil (17 to 18 ppm/°C) do not match, and curling may occur. In addition, compared with polyimide, the liquid crystal has a high score The bonding force between the sub and the copper foil is poor, so the liquid crystal polymer substrate usually uses a copper foil with a rougher surface and a higher Rz value to improve the bonding strength. However, in the skin effect of high-frequency and high-speed transmission, the electron transmission tends to proceed on the surface of the copper foil. If the surface of the copper foil is rough, a large signal loss will be formed, so how to reduce the water absorption of the liquid crystal polymer The rate and thermal expansion coefficient and how to improve the bonding strength of the liquid crystal polymer layer and the copper foil layer, so that the copper foil with a lower Rz value can be used when manufacturing the substrate is an important issue in the development of liquid crystal polymer substrates.

為了滿足市場對高頻高速可撓性板材的需求,本發明提供了一種柔性塗膠銅箔基板,其具有低吸水率、低熱膨脹係數、高接著強度、低介電常數、低介電損失、高速傳輸性及良好的機械性能,特別適合應用在5G智慧型手機及智慧手錶、手環等穿戴型設備中。 In order to meet the market demand for high-frequency and high-speed flexible sheets, the present invention provides a flexible rubber-coated copper foil substrate, which has low water absorption rate, low thermal expansion coefficient, high adhesion strength, low dielectric constant, low dielectric loss, High-speed transmission and good mechanical properties are especially suitable for 5G smart phones, smart watches, wristbands and other wearable devices.

為了解決上述技術問題,本發明提供一種柔性塗膠銅箔基板,係包括:具有相對的第一表面和第二表面之芯層,係包含液晶高分子及分散在該液晶高分子中之填充粉體;分別形成於該芯層的第一表面上和第二表面上之上介電膠層和下介電膠層;以及形成於該上介電膠層上之銅箔層,使該上介電膠層位於該芯層及銅箔層之間。 In order to solve the above technical problems, the present invention provides a flexible rubber-coated copper foil substrate, which includes: a core layer having opposing first and second surfaces, which includes a liquid crystal polymer and a filler powder dispersed in the liquid crystal polymer A body; a dielectric adhesive layer and a lower dielectric adhesive layer respectively formed on the first surface and the second surface of the core layer; and a copper foil layer formed on the upper dielectric adhesive layer to make the upper intermediary The glue layer is located between the core layer and the copper foil layer.

於一具體實施態樣中,與該上介電膠層接觸之該銅箔層之表面粗糙度Rz為0至1.2μm,表面粗糙度Ra為0至0.04μm,且該銅箔層為壓延銅箔層或電解銅箔層。 In an embodiment, the surface roughness Rz of the copper foil layer in contact with the upper dielectric adhesive layer is 0 to 1.2 μm, the surface roughness Ra is 0 to 0.04 μm, and the copper foil layer is rolled copper Foil layer or electrolytic copper foil layer.

於一具體實施態樣中,該芯層的厚度係為12至75μm;該上介電膠層的厚度係為1至10μm;該下介電膠層的厚度係為15至50μm;以及該銅箔層的厚度係為1至35μm。 In an embodiment, the thickness of the core layer is 12 to 75 μm; the thickness of the upper dielectric layer is 1 to 10 μm; the thickness of the lower dielectric layer is 15 to 50 μm; and the copper The thickness of the foil layer is 1 to 35 μm.

於一具體實施態樣中,該芯層係具有二層該芯層或三層該芯層。 In an embodiment, the core layer has two core layers or three core layers.

於一具體實施態樣中,該上介電膠層和下介電膠層之Dk值皆為2.0至4.0且Df值皆為0.001至0.010。 In an embodiment, the upper dielectric layer and the lower dielectric layer have a Dk value of 2.0 to 4.0 and a Df value of 0.001 to 0.010.

於一具體實施態樣中,該上介電膠層和下介電膠層係獨立包括組分A和組分B中的至少一種,且該組分A係選自由陶瓷粉體、燒結二氧化矽、鐵氟龍、不同於鐵氟龍之氟系樹脂、聚醚醚酮和阻燃劑所組成群組中的至少一種,該組分B係選自由環氧樹脂、丙烯酸系樹脂、胺基甲酸酯系樹脂、矽橡膠系樹脂、聚對二甲苯系樹脂、雙馬來醯亞胺系樹脂和聚醯亞胺系樹脂所組成群組中的至少一種。 In a specific embodiment, the upper dielectric layer and the lower dielectric layer independently include at least one of component A and component B, and the component A is selected from ceramic powder, sintered dioxide At least one of the group consisting of silicon, Teflon, fluorine resins other than Teflon, polyetheretherketone and flame retardants, the component B is selected from epoxy resins, acrylic resins, amine groups At least one of the group consisting of formate resin, silicone rubber resin, parylene resin, bismaleimide resin and polyimide resin.

於一具體實施態樣中,該組分A係佔該上介電膠層和下介電膠層中任一者的總固體含量的大於0至50重量%,且該組分B係佔該上介電膠層和下介電膠層中任一者的總固體含量的5至80重量%。 In a specific embodiment, the component A accounts for more than 0 to 50% by weight of the total solid content of any of the upper and lower dielectric adhesive layers, and the component B accounts for the The total solid content of any one of the upper dielectric adhesive layer and the lower dielectric adhesive layer is 5 to 80% by weight.

於一具體實施態樣中,該芯層之Dk值為2.5至4.0,且Df值為0.001至0.010。 In an embodiment, the Dk value of the core layer is 2.5 to 4.0, and the Df value is 0.001 to 0.010.

於一具體實施態樣中,該填充粉體係包括第一填充粉體、第二填充粉體及第三填充粉體所組成群組之至少一種,該第一填充粉體係選自由二氧化矽、石英、二氧化鈦、氧化鋁、氧化鋅、氧化鋯、氧化鎂及氫氧化鋁所組成群組之至少一種;該第二填充粉體係選自由碳酸鈣、碳酸鋁、 碳酸鎂、矽酸鈣、矽酸鎂、矽酸鋁、矽酸鋁鈣、矽酸鈣鎂、硫酸鋇、滑石粉、黏土、高嶺土、雲母、方解石、矽灰石及白雲石粉所組成群組之至少一種;該第三填充粉體係選自碳化矽、碳化硼、氮化硼、聚醚醚酮及鐵氟龍所組成群組之至少一種。 In a specific embodiment, the filled powder system includes at least one of a group consisting of a first filled powder, a second filled powder, and a third filled powder. The first filled powder system is selected from silicon dioxide, At least one of the group consisting of quartz, titanium dioxide, aluminum oxide, zinc oxide, zirconium oxide, magnesium oxide, and aluminum hydroxide; the second filler powder system is selected from calcium carbonate, aluminum carbonate, Magnesium carbonate, calcium silicate, magnesium silicate, aluminum silicate, calcium aluminum silicate, calcium magnesium silicate, barium sulfate, talc, clay, kaolin, mica, calcite, wollastonite and dolomite powder At least one; the third filling powder system is at least one selected from the group consisting of silicon carbide, boron carbide, boron nitride, polyetheretherketone, and Teflon.

於一具體實施態樣中,該第一填充粉體係佔該芯層的總固體含量的20至70重量%,該第二填充粉體係佔芯層的總固體含量的10至30重量%,該第三填充粉體係佔芯層的總固體含量的0至30重量%。 In a specific embodiment, the first filled powder system accounts for 20 to 70% by weight of the total solid content of the core layer, and the second filled powder system accounts for 10 to 30% by weight of the total solid content of the core layer. The third filled powder system accounts for 0 to 30% by weight of the total solid content of the core layer.

於本發明的另一具體實施態樣中,該柔性塗膠銅箔基板復包括離型層,係形成於該下介電膠層上,使該下介電膠層位於該芯層及離型層之間。 In another embodiment of the present invention, the flexible glued copper foil substrate further includes a release layer formed on the lower dielectric adhesive layer so that the lower dielectric adhesive layer is located on the core layer and the release Between layers.

本發明復提供一種柔性塗膠銅箔基板的製備方法,係包括以下步驟:於該銅箔層上形成該上介電膠層;於該上介電膠層上形成該芯層,以形成柔性塗膠銅箔基板半成品;回火處理該柔性塗膠銅箔基板半成品;以及於經回火處理之該柔性塗膠銅箔基板半成品之芯層上形成下介電膠層,使該芯層位於該上介電膠層與下介電膠層之間。 The invention further provides a method for preparing a flexible glue-coated copper foil substrate, which includes the following steps: forming the upper dielectric glue layer on the copper foil layer; forming the core layer on the upper dielectric glue layer to form flexibility Semi-finished products of glued copper foil substrates; tempering the semi-finished products of flexible glued copper foil substrates; and forming a lower dielectric adhesive layer on the core layer of the semi-finished products of flexible glued copper foil substrates tempered so that the core layer is located Between the upper dielectric adhesive layer and the lower dielectric adhesive layer.

於本發明的另一具體實施態樣中,復包括在形成該上介電膠層之步驟中,於60至180℃去除該上介電膠層中之溶劑。 In another embodiment of the present invention, in the step of forming the upper dielectric paste layer, the solvent in the upper dielectric paste layer is removed at 60 to 180°C.

於本發明的另一具體實施態樣中,復包括在形成該芯層之步驟中,於60至180℃去除該芯層中之溶劑。 In another embodiment of the present invention, in the step of forming the core layer, the solvent in the core layer is removed at 60 to 180°C.

於本發明的另一具體實施態樣中,復包括在形成該下介電膠層之步驟中,於60至180℃去除該下介電膠層中之溶劑。 In another embodiment of the present invention, in the step of forming the lower dielectric adhesive layer, the solvent in the lower dielectric adhesive layer is removed at 60 to 180°C.

於本發明的另一具體實施態樣中,復包括於該下介電膠層的表面上壓合離型層。 In another embodiment of the present invention, the compound includes a release layer pressed on the surface of the lower dielectric adhesive layer.

本發明之柔性塗膠銅箔基板具高接著強度,因而可選用Rz值較低的銅箔層,信號傳輸過程中具有集膚效應,由於低輪廓銅箔表面粗糙度較低,結晶細膩,表面平坦性較佳,因而信號能實現高速傳輸,同時上、下介電膠層具有較低且穩定的Dk/Df性能,可減少信號傳輸過程中的損耗,進一步提高信號傳輸質量,且不影響柔性線路板(FPC)的高頻高傳輸性,可達成散熱導熱快速化以及生產成本最低化發展的需要。 The flexible glued copper foil substrate of the present invention has high adhesive strength, so a copper foil layer with a lower Rz value can be selected, and has a skin effect during signal transmission. Due to the low surface roughness of the low-profile copper foil, the crystal is delicate and the surface The flatness is better, so the signal can realize high-speed transmission, and the upper and lower dielectric adhesive layers have low and stable Dk/Df performance, which can reduce the loss during signal transmission, further improve the signal transmission quality, and do not affect the flexibility The high frequency and high transmission of the circuit board (FPC) can meet the needs of rapid heat dissipation and heat conduction and the development of the lowest production cost.

再者,本發明之柔性塗膠銅箔基板採用之介電膠層的Dk值為2.0至4.0(10GHz),使得本發明適合低溫(低於180℃)快速壓合,工藝加工性強,而且對製作設備要求低,進而降低生產成本,其設備操作性及加工性均優於現有的液晶高分子基板和聚醯亞胺基板。此外,本發明之柔性塗膠銅箔基板的製法由於適合低溫壓合,大幅降低FPC製程中線路氧化的風險。 Furthermore, the Dk value of the dielectric adhesive layer used in the flexible glued copper foil substrate of the present invention is 2.0 to 4.0 (10 GHz), which makes the present invention suitable for rapid lamination at low temperature (below 180°C), strong processability, and Low requirements for production equipment, thereby reducing production costs, its equipment operability and processability are superior to existing liquid crystal polymer substrates and polyimide substrates. In addition, the manufacturing method of the flexible glued copper foil substrate of the present invention is suitable for low temperature lamination, which greatly reduces the risk of line oxidation in the FPC process.

此外,本發明之柔性塗膠銅箔基板之芯層的材質為包含填充粉體之液晶高分子,上、下介電膠層以聚醯亞胺樹脂為主要成分,由於聚醯亞胺樹脂具有低吸水率且填充粉體亦可有效降低吸水率,故本發明的整體吸水率在0.19至0.4%,由於其低吸水率,吸水後性能穩定,具有較佳的電氣性能。 In addition, the material of the core layer of the flexible glued copper foil substrate of the present invention is a liquid crystal polymer containing powder, and the upper and lower dielectric glue layers are mainly composed of polyimide resin. Since the polyimide resin has The low water absorption rate and the filling powder can also effectively reduce the water absorption rate, so the overall water absorption rate of the present invention is 0.19 to 0.4%. Due to its low water absorption rate, the performance after the water absorption is stable and has better electrical performance.

本發明之柔性塗膠銅箔基板於液晶高分子中添加填充粉體,可降低液晶高分子芯層的熱膨脹係數,使該液晶高分子芯層的熱膨脹係數降低為18至26ppm/℃與銅箔的熱膨脹係數(17至18ppm/℃)匹配,進而改善產品發生捲曲的問題。 The flexible glue-coated copper foil substrate of the present invention can be added with liquid crystal polymer to fill the powder, which can reduce the thermal expansion coefficient of the liquid crystal polymer core layer and reduce the thermal expansion coefficient of the liquid crystal polymer core layer to 18 to 26 ppm/°C with copper foil The coefficient of thermal expansion (17 to 18ppm/℃) is matched, which further improves the problem of product curling.

本發明除了具有熱膨脹性佳等有益效果外,還具有較低的反彈力,適合下游高密度組裝製程,更具有極佳的機械性能、雷射鑽孔工藝適應性佳等優點,且介電膠層的接著強度佳(大於1.01kgf/cm),因此本 發明之柔性塗膠銅箔基板特別適合在5G智慧型手機及智慧手錶、手環等穿戴型設備中使用。 In addition to the beneficial effects of good thermal expansion and the like, the invention also has a low rebound force, is suitable for downstream high-density assembly processes, and has the advantages of excellent mechanical properties, good adaptability of laser drilling technology, and the like, and a dielectric adhesive The adhesion strength of the layer is good (greater than 1.01kgf/cm), so this The invented flexible glued copper foil substrate is particularly suitable for use in 5G smart phones, smart watches, bracelets and other wearable devices.

另一方面,習知技術使用熱塑性聚醯亞胺(Thermoplastic polyimide,TPI)之基板在製備38微米以上之厚度時,製程生產效率低,但採用本發明之製法不僅可以製造適宜厚度的液晶高分子基板及雙面銅箔基板,更可輕易製得厚度100微米的基板。 On the other hand, the conventional technology uses a thermoplastic polyimide (Thermoplastic polyimide, TPI) substrate to prepare a thickness of 38 microns or more, the process production efficiency is low, but using the method of the present invention can not only produce a suitable thickness of liquid crystal polymer The substrate and the double-sided copper foil substrate can be easily manufactured with a thickness of 100 microns.

10‧‧‧芯層 10‧‧‧Core

20、30‧‧‧第一芯層 20, 30‧‧‧ First core layer

20’、30’‧‧‧第二芯層 20’, 30’‧‧‧second core layer

30”‧‧‧第三芯層 30”‧‧‧third core layer

10a、20a、30a‧‧‧第一表面 10a, 20a, 30a ‧‧‧ first surface

10b、20b、30b‧‧‧第二表面 10b, 20b, 30b ‧‧‧ second surface

11、21、31‧‧‧銅箔層 11, 21, 31 ‧‧‧ copper foil layer

12、22、32‧‧‧上介電膠層 12, 22, 32 ‧‧‧ Upper dielectric adhesive layer

13、23、33‧‧‧下介電膠層 13, 23, 33‧‧‧‧Lower dielectric adhesive layer

101、201、201’、301、301’、301”‧‧‧填充粉體 101, 201, 201’, 301, 301’, 301”‧‧‧‧filled powder

100、200、200’、300、300’、300”‧‧‧液晶高分子 100, 200, 200’, 300, 300’, 300”‧‧‧‧ liquid crystal polymer

14、24、34‧‧‧離型層 14, 24, 34 ‧‧‧ release layer

透過例示性之參考附圖說明本發明的實施方式:第1圖係本發明之柔性塗膠銅箔基板的結構示意圖。 The embodiment of the present invention will be described by way of exemplary reference to the drawings: FIG. 1 is a schematic view of the structure of the flexible glued copper foil substrate of the present invention.

第2圖係本發明之柔性塗膠銅箔基板的另一結構示意圖。 FIG. 2 is another schematic structural view of the flexible glued copper foil substrate of the present invention.

第3圖係本發明之柔性塗膠銅箔基板的另一結構示意圖。 FIG. 3 is another schematic structural view of the flexible glued copper foil substrate of the present invention.

以下係藉由特定的具體實施例說明本發明之實施方式,熟習此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之優點及功效。 The following describes the implementation of the present invention by specific specific examples. Those skilled in the art can easily understand the advantages and effects of the present invention from the contents disclosed in this specification.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「一」、「下」及「上」亦僅為 便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。此外,本文所有範圍和值都係包含及可合併的。落在本文中所述的範圍內之任何數值或點,例如任何整數都可以作為最小值或最大值以導出下位範圍等。 It should be noted that the structure, ratio, size, etc. shown in the drawings of this specification are only used to match the content disclosed in the specification, for those who are familiar with this skill to understand and read, not to limit the implementation of the present invention The limited conditions do not have technical significance. Any modification of structure, change of proportional relationship or adjustment of size should still fall within the scope of the invention without affecting the efficacy and the purpose of the invention. The technical content disclosed by the invention can be covered. At the same time, references such as "one", "down" and "upper" in this manual are only It is convenient for description and not intended to limit the scope of the present invention. Changes or adjustments in the relative relationship are regarded as the scope of the present invention without substantial changes in the technical content. In addition, all ranges and values herein are inclusive and combinable. Any value or point that falls within the range described herein, for example, any integer can be used as the minimum or maximum value to derive the lower range.

如第1圖所示,係顯示本發明之柔性塗膠銅箔基板之一具體實施態樣,係包括:芯層10,係具有相對的第一表面10a和第二表面10b,且該芯層10包含液晶高分子100及分散在該液晶高分子中之填充粉體101;上介電膠層12和下介電膠層13,係分別形成於該芯層的第一表面10a上和第二表面10b上;銅箔層11,係形成於該上介電膠層12上,使該上介電膠層12位於該芯層10及銅箔層11之間;以及離型層14,係形成於該下介電膠層13上,使該下介電膠層13位於該芯層10及離型層14之間。 As shown in FIG. 1, it shows one embodiment of the flexible glued copper foil substrate of the present invention, which includes: a core layer 10 having a first surface 10a and a second surface 10b opposite to each other, and the core layer 10 includes a liquid crystal polymer 100 and a filled powder 101 dispersed in the liquid crystal polymer; an upper dielectric adhesive layer 12 and a lower dielectric adhesive layer 13 are formed on the first surface 10a of the core layer and the second On the surface 10b; the copper foil layer 11 is formed on the upper dielectric adhesive layer 12 so that the upper dielectric adhesive layer 12 is located between the core layer 10 and the copper foil layer 11; and the release layer 14 is formed On the lower dielectric adhesive layer 13, the lower dielectric adhesive layer 13 is located between the core layer 10 and the release layer 14.

在本實施態樣中,與該上介電膠層接觸之該銅箔層之表面粗糙度Rz為0至1.2μm,而表面粗糙度Ra為0至0.4μm,且該銅箔層為壓延銅箔層或電解銅箔層。 In this embodiment, the surface roughness Rz of the copper foil layer in contact with the upper dielectric adhesive layer is 0 to 1.2 μm, and the surface roughness Ra is 0 to 0.4 μm, and the copper foil layer is rolled copper Foil layer or electrolytic copper foil layer.

於一具體實施態樣中,該芯層的厚度係為12至75μm;該上介電膠層的厚度係為1至10μm;該下介電膠層的厚度係為15至50μm;以及該銅箔層的厚度係為1至35μm。 In an embodiment, the thickness of the core layer is 12 to 75 μm; the thickness of the upper dielectric layer is 1 to 10 μm; the thickness of the lower dielectric layer is 15 to 50 μm; and the copper The thickness of the foil layer is 1 to 35 μm.

於一具體實施態樣中,該柔性塗膠銅箔基板係具有二層該芯層;於另一具體實施態樣中,該柔性塗膠銅箔基板係具有三層該芯層。 In one embodiment, the flexible glued copper foil substrate has two layers of the core layer; in another embodiment, the flexible glued copper foil substrate has three layers of the core layer.

於一具體實施態樣中,該上介電膠層和下介電膠層之Dk值皆為2.0至4.0,且Df值皆為0.001至0.010。 In an embodiment, the upper dielectric layer and the lower dielectric layer have a Dk value of 2.0 to 4.0, and a Df value of 0.001 to 0.010.

於一具體實施態樣中,該介電膠層係獨立包括組分A和組分B中的至少一種且該組分A係選自由陶瓷粉體、燒結二氧化矽、鐵氟龍、不 同於鐵氟龍之氟系樹脂、聚醚醚酮和阻燃劑所組成群組中的至少一種,該組分B係選自由環氧樹脂、丙烯酸系樹脂、胺基甲酸酯系樹脂、矽橡膠系樹脂;聚對二甲苯系樹脂、雙馬來醯亞胺系樹脂和聚醯亞胺系樹脂所組成群組中的至少一種。 In a specific embodiment, the dielectric adhesive layer independently includes at least one of component A and component B and the component A is selected from the group consisting of ceramic powder, sintered silica, Teflon, and The same as Teflon's fluorine-based resin, polyether ether ketone and flame retardant at least one of the group consisting of this component B is selected from epoxy resin, acrylic resin, urethane resin, Silicone rubber-based resin; at least one of the group consisting of parylene-based resin, bismaleimide-based resin and polyimide-based resin.

於一具體實施態樣中,該組分A係佔該上介電膠層和下介電膠層中任一者的總固體含量的0至50重量%,且該組分B係佔該上介電膠層和下介電膠層中任一者的總固體含量的5至80重量%。 In a specific embodiment, the component A accounts for 0 to 50% by weight of the total solid content of any one of the upper dielectric adhesive layer and the lower dielectric adhesive layer, and the component B accounts for the upper The total solid content of any one of the dielectric adhesive layer and the lower dielectric adhesive layer is 5 to 80% by weight.

較佳地,該陶瓷粉體係佔該上介電膠層和下介電膠層中任一者的總固體含量的0至45重量%,該燒結二氧化矽係佔該上介電膠層和下介電膠層中任一者的總固體含量的0至45重量%,該鐵氟龍係佔該上介電膠層和下介電膠層中任一者的總固體含量的0至45重量%,該不同於鐵氟龍之氟系樹脂係佔該上介電膠層和下介電膠層中任一者的總固體含量的0至45重量%,該聚醚醚酮係佔該上介電膠層和下介電膠層中任一者的總固體含量的0至45重量%,該阻燃劑係佔該上介電膠層和下介電膠層中任一者的總固體含量的0至45重量%。 Preferably, the ceramic powder system accounts for 0 to 45% by weight of the total solid content of any of the upper dielectric adhesive layer and the lower dielectric adhesive layer, and the sintered silica system accounts for the upper dielectric adhesive layer and 0 to 45% by weight of the total solid content of any one of the lower dielectric adhesive layers, and the Teflon system accounts for 0 to 45 of the total solid content of any of the upper and lower dielectric adhesive layers % By weight, the fluorine-based resin different from Teflon accounts for 0 to 45% by weight of the total solid content of any of the upper dielectric adhesive layer and the lower dielectric adhesive layer, and the polyetheretherketone accounts for the 0 to 45% by weight of the total solid content of any one of the upper dielectric adhesive layer and the lower dielectric adhesive layer, the flame retardant accounts for the total of any of the upper dielectric adhesive layer and the lower dielectric adhesive layer 0 to 45% by weight of solids.

於一具體實施態樣中,該陶瓷粉體係選自由鈦酸鋇(BaTiO3)、鈦酸鍶(SrTiO3)、鈦酸鍶鋇(Ba(Sr)TiO3)、鈦酸鉛(PbTiO3)、鈦酸鈣(CaTiO3)及鈦酸鎂(Mg2TiO4)所組成群組之至少一種;該不同於鐵氟龍之氟系樹脂係選自由聚偏氟乙烯、氟乙烯-乙烯基醚共聚物、四氟乙烯-乙烯共聚物、聚三氟氯乙烯-乙烯共聚物、四氟乙烯、六氟丙烯-偏氟乙烯共聚物、四氟乙烯-全氟烷基乙烯共聚物、聚三氟氯乙烯、聚氯乙烯、四氟乙烯-六氟丙烯共聚物、乙烯-氟乙烯共聚物及四氟乙烯-六氟丙烯-三氟乙烯共聚物所組成群組之至少一種。 In a specific embodiment, the ceramic powder system is selected from barium titanate (BaTiO 3 ), strontium titanate (SrTiO 3 ), barium strontium titanate (Ba(Sr)TiO 3 ), and lead titanate (PbTiO 3 ) , Calcium titanate (CaTiO 3 ) and magnesium titanate (Mg 2 TiO 4 ) at least one group; the fluorine-based resin different from Teflon is selected from polyvinylidene fluoride, vinyl fluoride-vinyl ether Copolymer, tetrafluoroethylene-ethylene copolymer, polychlorotrifluoroethylene-ethylene copolymer, tetrafluoroethylene, hexafluoropropylene-vinylidene fluoride copolymer, tetrafluoroethylene-perfluoroalkyl ethylene copolymer, polytrifluoroethylene At least one of the group consisting of vinyl chloride, polyvinyl chloride, tetrafluoroethylene-hexafluoropropylene copolymer, ethylene-fluoroethylene copolymer, and tetrafluoroethylene-hexafluoropropylene-trifluoroethylene copolymer.

於一具體實施態樣中,該組分A係鈦酸鋇、燒結二氧化矽、鐵氟龍及阻燃劑,該組分B係聚醯亞胺樹脂。 In a specific embodiment, the component A is barium titanate, sintered silica, Teflon and flame retardant, and the component B is polyimide resin.

於另一具體實施態樣中,該組分A係鈦酸鋇、鈦酸鍶、燒結二氧化矽、鐵氟龍及阻燃劑,該組分B係聚醯亞胺樹脂。 In another specific embodiment, the component A is barium titanate, strontium titanate, sintered silica, Teflon, and flame retardant, and the component B is polyimide resin.

於一具體實施態樣中,該芯層之Dk值為2.5至4.0,且Df值為0.001至0.010。 In an embodiment, the Dk value of the core layer is 2.5 to 4.0, and the Df value is 0.001 to 0.010.

於一具體實施態樣中,該填充粉體係包括第一填充粉體、第二填充粉體及第三填充粉體所組成群組之至少一種,該第一填充粉體係選自由二氧化矽、石英、二氧化鈦、氧化鋁、氧化鋅、氧化鋯、氧化鎂及氫氧化鋁所組成群組之至少一種;該第二填充粉體係選自碳酸鈣、碳酸鋁、碳酸鎂、矽酸鈣、矽酸鎂、矽酸鋁、矽酸鋁鈣、矽酸鈣鎂、硫酸鋇、滑石粉、黏土、高嶺土、雲母、方解石、矽灰石及白雲石粉所組成群組之至少一種;該第三填充粉體係選自碳化矽、碳化硼、氮化硼、聚醚醚酮及鐵氟龍所組成群組之至少一種。 In a specific embodiment, the filled powder system includes at least one of a group consisting of a first filled powder, a second filled powder, and a third filled powder. The first filled powder system is selected from silicon dioxide, At least one of the group consisting of quartz, titanium dioxide, aluminum oxide, zinc oxide, zirconium oxide, magnesium oxide, and aluminum hydroxide; the second filler powder system is selected from calcium carbonate, aluminum carbonate, magnesium carbonate, calcium silicate, silicic acid At least one of the group consisting of magnesium, aluminum silicate, calcium aluminum silicate, calcium magnesium silicate, barium sulfate, talc, clay, kaolin, mica, calcite, wollastonite and dolomite powder; the third filling powder system At least one selected from the group consisting of silicon carbide, boron carbide, boron nitride, polyetheretherketone, and Teflon.

於一具體實施態樣中,該第一填充粉體係二氧化矽,該第二填充粉體係滑石粉,該第三填充粉體係氮化硼。 In a specific embodiment, the first filled powder system is silicon dioxide, the second filled powder system is talc powder, and the third filled powder system is boron nitride.

於一具體實施態樣中,該第一填充粉體係佔芯層的總固體含量的20至70重量%,該第二填充粉體係佔芯層的總固體含量的10至30重量%,該第三填充粉體係佔芯層的總固體含量的0至30重量%。 In a specific embodiment, the first filled powder system accounts for 20 to 70% by weight of the total solid content of the core layer, and the second filled powder system accounts for 10 to 30% by weight of the total solid content of the core layer. The three-filled powder system accounts for 0 to 30% by weight of the total solid content of the core layer.

於本發明的另一具體實施態樣中,該柔性塗膠銅箔基板復包括離型層14,係形成於該下介電膠層13上,使該下介電膠層13位於該芯層10及離型層14之間,且較佳地,該離型層係選自由聚丙烯、雙向拉伸聚丙烯和聚對苯二甲酸乙二醇酯所組成群組之至少一種。 In another embodiment of the present invention, the flexible glued copper foil substrate further includes a release layer 14 formed on the lower dielectric adhesive layer 13 so that the lower dielectric adhesive layer 13 is located on the core layer 10 and the release layer 14, and preferably, the release layer is at least one selected from the group consisting of polypropylene, biaxially oriented polypropylene, and polyethylene terephthalate.

如第2圖所示,係顯示本發明之柔性塗膠銅箔基板之另一具體實施態樣,係包括:第一芯層20及第二芯層20’,在該二芯層整體之相對兩側係具有相對的第一表面20a和第二表面20b,且該第一芯層20及第二芯層20’分別包含液晶高分子200、200’及分散在該液晶高分子200、200’中之填充粉體201、201’;上介電膠層22和下介電膠層23,係分別形成於該第一表面20a上和第二表面20b上;銅箔層21,係形成於該上介電膠層22上,使該上介電膠層22位於該第一芯層20及銅箔層21之間;以及離型層24,係形成於該下介電膠層23上,使該下介電膠層23位於第二芯層20’及離型層24之間。 As shown in FIG. 2, it shows another embodiment of the flexible glued copper foil substrate of the present invention, which includes: a first core layer 20 and a second core layer 20 ′. The two sides have opposing first surface 20a and second surface 20b, and the first core layer 20 and the second core layer 20' respectively include liquid crystal polymers 200, 200' and dispersed in the liquid crystal polymers 200, 200' Filled powder 201, 201'; upper dielectric adhesive layer 22 and lower dielectric adhesive layer 23 are formed on the first surface 20a and the second surface 20b respectively; copper foil layer 21 is formed on the On the upper dielectric adhesive layer 22, the upper dielectric adhesive layer 22 is located between the first core layer 20 and the copper foil layer 21; and the release layer 24 is formed on the lower dielectric adhesive layer 23, so that The lower dielectric adhesive layer 23 is located between the second core layer 20 ′ and the release layer 24.

如第3圖所示,係顯示本發明之柔性塗膠銅箔基板之另一具體實施態樣,係包括:第一芯層30、第二芯層30’及第三芯層30”,該三層芯層整體的相對兩側係具有相對的第一表面30a和第二表面30b,且該第一芯層30、第二芯層30’及第三芯層30”分別包含液晶高分子300、300’、300”及分散在該液晶高分子300、300’、300”中之填充粉體301、301’、301”;上介電膠層32和下介電膠層33,係分別形成於該第一表面30a上和第二表面30b上;銅箔層31,係形成於該上介電膠層32上,使該上介電膠層32位於該第一芯層30及銅箔層31之間;以及離型層34,係形成於該下介電膠層33上,使該下介電膠層33位於該第三芯層30”及離型層34之間。 As shown in FIG. 3, it shows another embodiment of the flexible glued copper foil substrate of the present invention, which includes: a first core layer 30, a second core layer 30' and a third core layer 30". The opposite sides of the whole three-layer core layer have opposing first surface 30a and second surface 30b, and the first core layer 30, the second core layer 30' and the third core layer 30" respectively include a liquid crystal polymer 300 , 300', 300" and the filled powder 301, 301', 301" dispersed in the liquid crystal polymer 300, 300', 300"; the upper dielectric adhesive layer 32 and the lower dielectric adhesive layer 33 are formed separately On the first surface 30a and the second surface 30b; the copper foil layer 31 is formed on the upper dielectric adhesive layer 32 so that the upper dielectric adhesive layer 32 is located on the first core layer 30 and the copper foil layer 31; and the release layer 34 is formed on the lower dielectric adhesive layer 33, so that the lower dielectric adhesive layer 33 is located between the third core layer 30" and the release layer 34.

本發明復提供一種柔性塗膠銅箔基板的製備方法,係包括以下步驟:於該銅箔層上形成該上介電膠層;於該上介電膠層上形成該芯層,以形成柔性塗膠銅箔基板半成品;回火處理該柔性塗膠銅箔基板半成品;以及於經回火處理之該柔性塗膠銅箔基板半成品之芯層上形成下介電膠層,使該芯層位於該上介電膠層與下介電膠層之間。 The invention further provides a method for preparing a flexible glue-coated copper foil substrate, which includes the following steps: forming the upper dielectric glue layer on the copper foil layer; forming the core layer on the upper dielectric glue layer to form flexibility Semi-finished products of glued copper foil substrates; tempering the semi-finished products of flexible glued copper foil substrates; and forming a lower dielectric adhesive layer on the core layer of the semi-finished products of flexible glued copper foil substrates tempered so that the core layer is located Between the upper dielectric adhesive layer and the lower dielectric adhesive layer.

於一具體實施態樣中,於形成該上介電膠層之步驟中,係以塗佈法將膠體溶液塗佈在銅箔層上,因該膠體溶液中含有溶劑,故此步驟中復包括於60至180℃去除該上介電膠層中之溶劑。 In an embodiment, in the step of forming the upper dielectric adhesive layer, the colloidal solution is coated on the copper foil layer by a coating method. Since the colloidal solution contains a solvent, this step is included in The solvent in the upper dielectric adhesive layer is removed at 60 to 180°C.

於另一具體實施態樣中,於形成該芯層之步驟中,以塗佈法將含有液晶高分子及填充粉體的高分子溶液塗佈在上介電膠層上,因該高分子溶液中含有溶劑,故此步驟中復包括於60至180℃去除該芯層中之溶劑。 In another embodiment, in the step of forming the core layer, a polymer solution containing liquid crystal polymer and filled powder is coated on the upper dielectric adhesive layer by a coating method, because the polymer solution It contains solvent, so this step includes removing the solvent in the core layer at 60 to 180℃.

於另一具體實施態樣中,於形成該下介電膠層之步驟中,係以塗佈法將膠體溶液塗佈在芯層上,因該膠體溶液中含有溶劑,故此步驟中復包括於60至180℃去除該下介電膠層中之溶劑。 In another embodiment, in the step of forming the lower dielectric adhesive layer, the colloidal solution is coated on the core layer by a coating method. Since the colloidal solution contains a solvent, this step is included in The solvent in the lower dielectric adhesive layer is removed at 60 to 180°C.

於一具體實施態樣中,該製備方法復包括在該下介電膠層的下表面壓合離型層。 In a specific embodiment, the preparation method further includes pressing a release layer on the lower surface of the lower dielectric adhesive layer.

於一具體實施態樣中,該離型層係選自由聚丙烯、雙向拉伸聚丙烯和聚對苯二甲酸乙二醇酯所組成群組之至少一種。 In a specific embodiment, the release layer is at least one selected from the group consisting of polypropylene, biaxially oriented polypropylene, and polyethylene terephthalate.

實施例Examples

實施例1 本發明柔性塗膠銅箔基板之製備 Example 1 Preparation of the flexible glued copper foil substrate of the present invention

根據表1所示之重量(克)混合上介電膠層的組分A及組分B、根據表2所示之重量(克)混合下介電膠層的組分A及組分B,並使用丁酮作為溶劑以形成介電膠層。根據表3所示之重量(克)混合液晶高分子與第一填充粉體、第二填充粉體及第三填充粉體,並使用N-甲基吡咯烷酮(NMP)作為溶劑以形成芯層。 Mix the components A and B of the upper dielectric adhesive layer according to the weight (g) shown in Table 1, and mix the components A and B of the lower dielectric adhesive layer according to the weight (g) shown in Table 2, And use methyl ethyl ketone as a solvent to form a dielectric adhesive layer. The liquid crystal polymer was mixed with the first filled powder, the second filled powder, and the third filled powder according to the weight (gram) shown in Table 3, and N-methylpyrrolidone (NMP) was used as a solvent to form the core layer.

於該銅箔層上形成該上介電膠層,並於130℃去除上介電膠層中之溶劑;於該上介電膠層上形成該芯層,並於160℃去除該芯層中之溶劑,以形成柔性塗膠銅箔基板半成品;置於250℃下10小時以回火處理 該柔性塗膠銅箔基板半成品,於經回火處理之該柔性塗膠銅箔基板半成品之芯層上形成下介電膠層,並於130℃去除該下介電膠層中之溶劑,使該芯層位於該上介電膠層與下介電膠層之間。 Forming the upper dielectric adhesive layer on the copper foil layer, and removing the solvent in the upper dielectric adhesive layer at 130°C; forming the core layer on the upper dielectric adhesive layer, and removing the core layer at 160°C Solvent to form a semi-finished product of flexible coated copper foil substrate; placed at 250℃ for 10 hours for tempering treatment The semi-finished flexible glued copper foil substrate forms a lower dielectric glue layer on the core layer of the semi-finished flexible glued copper foil substrate after tempering, and removes the solvent in the lower dielectric glue layer at 130°C, so that The core layer is located between the upper dielectric adhesive layer and the lower dielectric adhesive layer.

接著測試該柔性塗膠銅箔基板成品的各項性質並記錄於下表4中。 Next, the properties of the finished flexible rubber-coated copper foil substrate were tested and recorded in Table 4 below.

實施例2 本發明柔性塗膠銅箔基板之製備 Example 2 Preparation of the flexible glued copper foil substrate of the present invention

依實施例1的製備方法製造實施例2之柔性塗膠銅箔基板,其差異在於僅根據表1至表3調整比例,以製備介電膠層及芯層。 The flexible glued copper foil substrate of Example 2 is manufactured according to the preparation method of Example 1. The difference is that the ratio is adjusted only according to Tables 1 to 3 to prepare the dielectric adhesive layer and the core layer.

實施例3 本發明柔性塗膠銅箔基板之製備 Example 3 Preparation of the flexible glued copper foil substrate of the present invention

依實施例1的製備方法製造實施例3之柔性塗膠銅箔基板,其差異在於僅根據表1至表3調整比例,以製備介電膠層及芯層。 The flexible glued copper foil substrate of Example 3 is manufactured according to the preparation method of Example 1. The difference is that the ratio is adjusted according to Tables 1 to 3 only to prepare the dielectric adhesive layer and the core layer.

實施例4 本發明柔性塗膠銅箔基板之製備 Example 4 Preparation of the flexible glued copper foil substrate of the present invention

依實施例1的製備方法製造實施例4之柔性塗膠銅箔基板,其差異在於僅根據表1至表3調整比例,以製備介電膠層、第一芯層及第二芯層。 The flexible glued copper foil substrate of Example 4 is manufactured according to the preparation method of Example 1. The difference is that the ratio is adjusted only according to Tables 1 to 3 to prepare the dielectric adhesive layer, the first core layer, and the second core layer.

實施例5 本發明柔性塗膠銅箔基板之製備 Example 5 Preparation of the flexible glued copper foil substrate of the present invention

依實施例1的製備方法製造實施例5之柔性塗膠銅箔基板,其差異在於僅根據表1至表3調整比例,以製備介電膠層、第一芯層及第二芯層。 The flexible adhesive-coated copper foil substrate of Example 5 is manufactured according to the preparation method of Example 1. The difference is that the ratio is adjusted according to Tables 1 to 3 only to prepare the dielectric adhesive layer, the first core layer, and the second core layer.

實施例6 本發明柔性塗膠銅箔基板之製備 Example 6 Preparation of the flexible glued copper foil substrate of the present invention

依實施例1的製備方法製造實施例6之柔性塗膠銅箔基板,其差異在於僅根據表1至表3調整比例,以製備介電膠層、第一芯層、第二芯層及第三芯層。 The flexible glued copper foil substrate of Example 6 is manufactured according to the preparation method of Example 1, the difference is that the ratio is adjusted according to Tables 1 to 3 only to prepare the dielectric adhesive layer, the first core layer, the second core layer and the first Three core layer.

實施例7 本發明柔性塗膠銅箔基板之製備 Example 7 Preparation of the flexible glued copper foil substrate of the present invention

依實施例1的製備方法製造實施例7之柔性塗膠銅箔基板,其差異在於僅根據表1至表3調整比例,以製備介電膠層、第一芯層、第二芯層及第三芯層。 The flexible glued copper foil substrate of Example 7 is manufactured according to the preparation method of Example 1. The difference is that the ratio is adjusted only according to Tables 1 to 3 to prepare the dielectric adhesive layer, the first core layer, the second core layer and the first Three core layer.

比較例Comparative example

比較例1、2 Comparative examples 1, 2

依實施例1的製備方法製造比較例1、2的柔性塗膠銅箔基板,差異在於比較例1、2之結構不具有上介電膠層,且芯層中不包含填充粉體。 The flexible glued copper foil substrates of Comparative Examples 1 and 2 are manufactured according to the preparation method of Example 1. The difference is that the structures of Comparative Examples 1 and 2 do not have an upper dielectric adhesive layer, and the core layer does not contain filler powder.

比較例3 Comparative Example 3

依實施例1的製備方法製造比較例3的柔性塗膠銅箔基板,差異在於比較例3之芯層中不包含填充粉體。 The flexible glued copper foil substrate of Comparative Example 3 is manufactured according to the preparation method of Example 1, except that the core layer of Comparative Example 3 does not contain filler powder.

比較例4 Comparative Example 4

依實施例1的製備方法製造比較例4的柔性塗膠銅箔基板,差異在於比較例4之芯層使用聚醯亞胺取代液晶高分子,且芯層中不包含填充粉體。 The flexible glued copper foil substrate of Comparative Example 4 is manufactured according to the preparation method of Example 1, the difference is that the core layer of Comparative Example 4 uses polyimide instead of liquid crystal polymer, and the core layer does not contain filler powder.

實施例1至實施例7及比較例1至比較例4之成分、各層厚度、測試方法及性能指標係如表1至表5所示。 The components, the thickness of each layer, the test method and the performance indexes of Examples 1 to 7 and Comparative Examples 1 to 4 are shown in Table 1 to Table 5.

Figure 108109809-A0101-12-0014-1
Figure 108109809-A0101-12-0014-1

Figure 108109809-A0101-12-0014-3
Figure 108109809-A0101-12-0014-3

Figure 108109809-A0101-12-0015-4
Figure 108109809-A0101-12-0015-4

Figure 108109809-A0101-12-0016-5
Figure 108109809-A0101-12-0016-5

Figure 108109809-A0101-12-0017-6
Figure 108109809-A0101-12-0017-6

表5中,銅箔層Rz值及Ra值為銅箔層與上介電膠層黏著面之Rz值及Ra值,介電常數Dk及介電損失Df為基板整體之介電常數Dk及介電損失Df。 In Table 5, the Rz value and Ra value of the copper foil layer are the Rz value and Ra value of the adhesion surface of the copper foil layer and the upper dielectric adhesive layer, and the dielectric constant Dk and dielectric loss Df are the dielectric constant Dk and dielectric of the whole substrate Electricity loss Df.

從表5中可以看出,本發明之柔性塗膠銅箔基板具有高接著強度、較佳的電氣性能等優勢,有利於高頻高速傳輸,而且具低吸水率、低熱膨脹係數,優於一般液晶高分子基板和聚醯亞胺基板,特別適合在5G智慧型手機及智慧手錶、手環等穿戴型設備中使用。 It can be seen from Table 5 that the flexible glued copper foil substrate of the present invention has the advantages of high adhesion strength, better electrical performance, etc., which is beneficial to high-frequency and high-speed transmission, and has low water absorption rate and low thermal expansion coefficient, which is superior to the general Liquid crystal polymer substrates and polyimide substrates are particularly suitable for use in 5G smart phones, smart watches, bracelets and other wearable devices.

上述實施例僅為例示性說明,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修飾與改變。因此,本發明之權利保護範圍係由本發明所附之申請專利範圍所定義,只要不影響本發明之效果及實施目的,應涵蓋於此公開技術內容中。 The above-mentioned embodiments are only illustrative and not intended to limit the present invention. Anyone who is familiar with this skill can modify and change the above embodiments without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the rights of the present invention is defined by the scope of the patent application attached to the present invention, as long as it does not affect the effects and implementation purposes of the present invention, it should be covered in the disclosed technical content.

10‧‧‧芯層 10‧‧‧Core

10a‧‧‧第一表面 10a‧‧‧First surface

10b‧‧‧第二表面 10b‧‧‧Second surface

100‧‧‧液晶高分子 100‧‧‧Liquid crystal polymer

101‧‧‧填充粉體 101‧‧‧filled powder

11‧‧‧銅箔層 11‧‧‧Copper foil layer

12‧‧‧上介電膠層 12‧‧‧Upper dielectric adhesive layer

13‧‧‧下介電膠層 13‧‧‧Lower dielectric adhesive layer

14‧‧‧離型層 14‧‧‧ Release layer

Claims (15)

一種柔性塗膠銅箔基板,係包括:芯層,係具有相對的第一表面和第二表面,且該芯層包含液晶高分子及分散在該液晶高分子中之填充粉體,以令該芯層具有18至26ppm/℃的熱膨脹係數;上介電膠層和下介電膠層,係分別形成於該芯層的第一表面上和第二表面上;以及銅箔層,係形成於該上介電膠層上,使該上介電膠層位於該芯層及銅箔層之間;其中,該柔性塗膠銅箔基板的整體吸水率在0.19%至0.4%之間。 A flexible rubber-coated copper foil substrate includes a core layer having opposing first and second surfaces, and the core layer includes a liquid crystal polymer and a filler powder dispersed in the liquid crystal polymer to make the The core layer has a thermal expansion coefficient of 18 to 26 ppm/°C; the upper dielectric adhesive layer and the lower dielectric adhesive layer are respectively formed on the first surface and the second surface of the core layer; and the copper foil layer is formed on On the upper dielectric adhesive layer, the upper dielectric adhesive layer is located between the core layer and the copper foil layer; wherein, the overall water absorption rate of the flexible glued copper foil substrate is between 0.19% and 0.4%. 如申請專利範圍第1項所述的柔性塗膠銅箔基板,其中,與該上介電膠層接觸之該銅箔層之表面粗糙度Rz為0至1.2μm,表面粗糙度Ra為0至0.4μm,且該銅箔層為壓延銅箔層或電解銅箔層。 The flexible rubber-coated copper foil substrate as described in item 1 of the patent scope, wherein the surface roughness Rz of the copper foil layer in contact with the upper dielectric adhesive layer is 0 to 1.2 μm, and the surface roughness Ra is 0 to 0.4 μm, and the copper foil layer is a rolled copper foil layer or an electrolytic copper foil layer. 如申請專利範圍第1項所述的柔性塗膠銅箔基板,其中,該芯層的厚度係為12至75μm,該上介電膠層的厚度係為1至10μm,該下介電膠層的厚度係為15至50μm,以及該銅箔層的厚度係為1至35μm。 The flexible glue-coated copper foil substrate as described in item 1 of the patent application range, wherein the thickness of the core layer is 12 to 75 μm, the thickness of the upper dielectric layer is 1 to 10 μm, and the lower dielectric layer The thickness is 15 to 50 μm, and the thickness of the copper foil layer is 1 to 35 μm. 如申請專利範圍第1項所述的柔性塗膠銅箔基板,其中,該柔性塗膠銅箔基板係具有二層該芯層或三層該芯層。 The flexible glue-coated copper foil substrate as described in item 1 of the patent application range, wherein the flexible glue-coated copper foil substrate has two layers of the core layer or three layers of the core layer. 如申請專利範圍第1項所述的柔性塗膠銅箔基板,其中,該上介電膠層和下介電膠層之Dk值皆為2.0至4.0,且Df值皆為0.001至0.010。 The flexible rubber-coated copper foil substrate as described in item 1 of the patent application range, wherein the Dk values of the upper dielectric adhesive layer and the lower dielectric adhesive layer are both 2.0 to 4.0, and the Df values are both 0.001 to 0.010. 如申請專利範圍第1項所述的柔性塗膠銅箔基板,其中,該上介電膠層和下介電膠層係獨立包括組分A和組分B中的至少一種,且該組 分A係選自由陶瓷粉體、燒結二氧化矽、鐵氟龍、不同於鐵氟龍之氟系樹脂、聚醚醚酮和阻燃劑所組成群組中的至少一種,該組分B係選自由環氧樹脂、丙烯酸系樹脂、胺基甲酸酯系樹脂、矽橡膠系樹脂、聚對二甲苯系樹脂、雙馬來醯亞胺系樹脂和聚醯亞胺系樹脂所組成群組中的至少一種。 The flexible rubber-coated copper foil substrate as described in item 1 of the patent application range, wherein the upper dielectric adhesive layer and the lower dielectric adhesive layer independently include at least one of component A and component B, and the group Sub-A is at least one selected from the group consisting of ceramic powder, sintered silica, Teflon, fluorine-based resins other than Teflon, polyether ether ketone, and flame retardant, and component B is Selected from the group consisting of epoxy resins, acrylic resins, urethane resins, silicone rubber resins, parylene resins, bismaleimide resins and polyimide resins At least one. 如申請專利範圍第6項所述的柔性塗膠銅箔基板,其中,該組分A係佔該上介電膠層和下介電膠層中任一者的總固體含量的大於0至50重量%,且該組分B係佔該上介電膠層和下介電膠層中任一者的總固體含量的5至80重量%。 The flexible rubber-coated copper foil substrate as described in item 6 of the patent application range, wherein the component A accounts for more than 0 to 50 of the total solid content of any of the upper dielectric adhesive layer and the lower dielectric adhesive layer % By weight, and the component B accounts for 5 to 80% by weight of the total solid content of any of the upper dielectric adhesive layer and the lower dielectric adhesive layer. 如申請專利範圍第1項所述的柔性塗膠銅箔基板,其中,該芯層之Dk值為2.5至4.0,且Df值為0.001至0.010。 The flexible rubber-coated copper foil substrate as described in item 1 of the patent application range, wherein the Dk value of the core layer is 2.5 to 4.0, and the Df value is 0.001 to 0.010. 如申請專利範圍第1項所述的柔性塗膠銅箔基板,其中,該填充粉體係包括第一填充粉體、第二填充粉體及第三填充粉體所組成群組之至少一種,其中,該第一填充粉體係選自由二氧化矽、石英、二氧化鈦、氧化鋁、氧化鋅、氧化鋯、氧化鎂及氫氧化鋁所組成群組之至少一種,該第二填充粉體係選自由碳酸鈣、碳酸鋁、碳酸鎂、矽酸鈣、矽酸鎂、矽酸鋁、矽酸鋁鈣、矽酸鈣鎂、硫酸鋇、滑石粉、黏土、高嶺土、雲母、方解石、矽灰石及白雲石粉所組成群組之至少一種,且該第三填充粉體係選自由碳化矽、碳化硼、氮化硼、聚醚醚酮及鐵氟龍所組成群組之至少一種。 The flexible rubber-coated copper foil substrate as described in item 1 of the patent application range, wherein the filled powder system includes at least one of the group consisting of a first filled powder, a second filled powder and a third filled powder, wherein , The first filling powder system is selected from at least one group consisting of silicon dioxide, quartz, titanium dioxide, aluminum oxide, zinc oxide, zirconium oxide, magnesium oxide, and aluminum hydroxide, and the second filling powder system is selected from calcium carbonate , Aluminum carbonate, magnesium carbonate, calcium silicate, magnesium silicate, aluminum silicate, calcium aluminum silicate, calcium magnesium silicate, barium sulfate, talc, clay, kaolin, mica, calcite, wollastonite and dolomite powder At least one of the groups, and the third filling powder system is selected from at least one of the group consisting of silicon carbide, boron carbide, boron nitride, polyetheretherketone, and Teflon. 如申請專利範圍第9項所述的柔性塗膠銅箔基板,其中,該第一填充粉體係佔該芯層的總固體含量的20至70重量%,該第二填充粉體係佔芯層的總固體含量的10至30重量%,該第三填充粉體係佔芯層的總固體含量的0至30重量%。 The flexible coated copper foil substrate as described in item 9 of the patent application range, wherein the first filler powder system accounts for 20 to 70% by weight of the total solid content of the core layer, and the second filler powder system accounts for the core layer 10 to 30% by weight of the total solids content, the third filled powder system accounts for 0 to 30% by weight of the total solids content of the core layer. 如申請專利範圍第1項所述的柔性塗膠銅箔基板,復包括離型層,係形成於該下介電膠層上,使該下介電膠層位於該芯層及離型層之間。 The flexible rubber-coated copper foil substrate as described in item 1 of the patent application scope, including a release layer, is formed on the lower dielectric adhesive layer so that the lower dielectric adhesive layer is located between the core layer and the release layer between. 一種如申請專利範圍第1至11項任一項所述的柔性塗膠銅箔基板的製備方法,係包括以下步驟:於該銅箔層上形成該上介電膠層;於該上介電膠層上形成該芯層,以形成柔性塗膠銅箔基板半成品;回火處理該柔性塗膠銅箔基板半成品,其中,在形成該芯層之步驟中,於60至180℃去除該芯層中之溶劑;以及於經回火處理之該柔性塗膠銅箔基板半成品之芯層上形成下介電膠層,使該芯層位於該上介電膠層與下介電膠層之間。 A method for preparing a flexible glue-coated copper foil substrate as described in any one of patent application items 1 to 11 includes the following steps: forming the upper dielectric adhesive layer on the copper foil layer; The core layer is formed on the adhesive layer to form a semi-finished product of flexible coated copper foil substrate; the semi-finished product of flexible coated copper foil substrate is tempered, wherein in the step of forming the core layer, the core layer is removed at 60 to 180°C Solvent; and forming a lower dielectric adhesive layer on the core layer of the semi-finished flexible glued copper foil substrate after tempering so that the core layer is located between the upper dielectric adhesive layer and the lower dielectric adhesive layer. 如申請專利範圍第12項所述的製備方法,復包括在形成該上介電膠層之步驟中,於60至180℃去除該上介電膠層中之溶劑。 The preparation method as described in Item 12 of the scope of the patent application includes the step of removing the solvent in the upper dielectric adhesive layer at 60 to 180°C in the step of forming the upper dielectric adhesive layer. 如申請專利範圍第12項所述的製備方法,復包括在形成該下介電膠層之步驟中,於60至180℃去除該下介電膠層中之溶劑。 The preparation method as described in item 12 of the patent application scope further includes removing the solvent in the lower dielectric adhesive layer at a temperature of 60 to 180°C in the step of forming the lower dielectric adhesive layer. 如申請專利範圍第12項所述的製備方法,復包括於該下介電膠層的表面上壓合離型層。 According to the preparation method described in item 12 of the patent application scope, the method further includes pressing a release layer on the surface of the lower dielectric adhesive layer.
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