TWI765306B - Flexible printed circuits having high electromagnetic shielding property and preparing methods thereof - Google Patents

Flexible printed circuits having high electromagnetic shielding property and preparing methods thereof Download PDF

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TWI765306B
TWI765306B TW109125283A TW109125283A TWI765306B TW I765306 B TWI765306 B TW I765306B TW 109125283 A TW109125283 A TW 109125283A TW 109125283 A TW109125283 A TW 109125283A TW I765306 B TWI765306 B TW I765306B
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layer
resin
copper foil
printed circuit
flexible printed
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TW109125283A
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TW202120317A (en
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李韋志
杜伯賢
林志銘
李建輝
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亞洲電材股份有限公司
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0216Reduction of cross-talk, noise or electromagnetic interference
    • H05K1/0218Reduction of cross-talk, noise or electromagnetic interference by printed shielding conductors, ground planes or power plane
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/40Adhesives in the form of films or foils characterised by release liners
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073Shielding materials
    • H05K9/0081Electromagnetic shielding materials, e.g. EMI, RFI shielding
    • H05K9/0088Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a plurality of shielding layers; combining different shielding material structure
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02ATECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A30/00Adapting or protecting infrastructure or their operation

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

A flexible printed circuit board having high electromagnetic shielding property comprises a cover film and a flexible copper foil substrate. The cover film comprises a first insulation layer, a second insulation layer, an adhesive layer, a copper foil layer and a first resin layer and a second resin layer. The adhesive layer is disposed between the first insulation layer and the copper foil layer, the copper foil layer is disposed between the adhesive layer and the first resin layer, the first resin layer is disposed between the copper foil layer and the second insulation layer, and the second insulation layer is disposed between the first resin layer and the second resin layer. The cover film has a through hole filing with electro conductive pastes. The present invention further provides a preparing method of the flexible printed circuit board.

Description

具有高電磁屏蔽性能的軟性印刷電路板及其製備方法 Flexible printed circuit board with high electromagnetic shielding performance and preparation method thereof

本發明係關於軟性印刷電路板之技術領域,尤係關於一種具有高電磁屏蔽性能的軟性印刷電路板。 The present invention relates to the technical field of flexible printed circuit boards, in particular to a flexible printed circuit board with high electromagnetic shielding performance.

在現今的電子及通訊產品趨向多功能複雜化的市場需求下,需要更輕薄和短小的電路板結構,且隨著5G的推廣,對於軟性印刷電路板(Flexible printed circuit,FPC)之要求越來越高,對於訊號傳輸的速度以及電磁干擾屏蔽性能的要求越來越高,同時需要低介電常數及低介電損耗,俾使應用該FPC之電子產品正常傳遞訊號,並提高其可靠度。 Under the current market demand for multi-functional and complex electronic and communication products, thinner and shorter circuit board structures are required, and with the promotion of 5G, there are more and more requirements for flexible printed circuit boards (FPC). The higher the level, the higher the requirements for the speed of signal transmission and the shielding performance of electromagnetic interference. At the same time, low dielectric constant and low dielectric loss are required, so that the electronic products using the FPC can transmit signals normally and improve their reliability.

為了滿足高電磁干擾遮蔽性能之需求,需增加FPC之電磁干擾屏蔽率,而為了增加該電磁干擾屏蔽率則需增加電磁干擾屏蔽結構之銅箔厚度,且需於銅箔層上單獨形成氣孔,但是其電磁干擾屏蔽值最高只能達到85dB。因5G應用之電子產品要求大於80dB或甚至100dB之電磁干擾屏蔽率,使用前述製程製備的FPC無法滿足高電磁干擾屏蔽率之需求,且 其製程需於電路板上形成較多氣孔,同時於高溫下會遇到導電膠層膨脹爆板的問題。 In order to meet the requirements of high EMI shielding performance, the EMI shielding rate of the FPC needs to be increased, and in order to increase the EMI shielding rate, the thickness of the copper foil of the EMI shielding structure needs to be increased, and the copper foil layer needs to be formed separately. However, its electromagnetic interference shielding value can only reach a maximum of 85dB. Since the electronic products used in 5G applications require an EMI shielding rate greater than 80dB or even 100dB, the FPC prepared using the aforementioned process cannot meet the requirement of high EMI shielding rate, and The manufacturing process needs to form more pores on the circuit board, and at the same time, it will encounter the problem of the expansion of the conductive adhesive layer and the explosion of the board at high temperature.

為解決上述問題,本發明提供一種具有高電磁屏蔽性能的軟性印刷電路板,係包括覆蓋膜及結合該覆蓋膜之軟性銅箔基板,該覆蓋膜係包括:第一絕緣層,係具有大於4H之表面硬度及5微米至25微米之厚度;接著層,係具有5微米至20微米之厚度,且形成於該第一絕緣層上;銅箔層,係具有2微米至105微米之厚度,且形成於該接著層上,使該接著層位於該第一絕緣層與銅箔層之間;第一樹脂層,係具有8微米至50微米之厚度,且形成於該銅箔層上,使該銅箔層位於該接著層與第一樹脂層之間;第二絕緣層,係形成於該第一樹脂層上,使該第一樹脂層位於該銅箔層與第二絕緣層之間,且該第二絕緣層具有7.5微米至100微米之厚度,且其於10GHz之介電常數係低於4.0,於10GHz之介電損耗係低於0.015;以及第二樹脂層,係具有8微米至50微米之厚度,且形成於該第二絕緣層上其中,該第一樹脂層及第二樹脂層於10GHz之介電常數係各自低於4.0,於10GHz之介電損耗係各自為0.002至0.010,且吸水率係各自為0.001%至0.5%;其中,該覆蓋膜上具有一填充有導電膏之通孔,以該導電膏之總重計,該導電膏係包括40重量%至75重量%之金屬顆粒及25重量%至60重量%之熱固性黏合劑,其中,該金屬顆粒係選自由銀、鋁及銅所組成群組之至少一者,且該熱固性黏合劑係包括選自由環氧樹脂、脲醛樹脂、熱固性酚醛樹脂、熱固 性聚酯樹脂、聚硫橡膠、聚乙烯醇縮丁醛樹脂、丁腈橡膠、異氰酸酯和熱固性聚醯亞胺樹脂所組成群組之至少一者。 In order to solve the above-mentioned problems, the present invention provides a flexible printed circuit board with high electromagnetic shielding performance, which includes a cover film and a flexible copper foil substrate combined with the cover film, the cover film system includes: a first insulating layer, which is greater than 4H surface hardness and thickness of 5 microns to 25 microns; the next layer has a thickness of 5 microns to 20 microns and is formed on the first insulating layer; the copper foil layer has a thickness of 2 microns to 105 microns, and is formed on the adhesive layer, so that the adhesive layer is located between the first insulating layer and the copper foil layer; the first resin layer has a thickness of 8 microns to 50 microns, and is formed on the copper foil layer, so that the The copper foil layer is located between the adhesive layer and the first resin layer; the second insulating layer is formed on the first resin layer, so that the first resin layer is located between the copper foil layer and the second insulating layer, and The second insulating layer has a thickness of 7.5 μm to 100 μm, and its dielectric constant at 10 GHz is lower than 4.0, and its dielectric loss at 10 GHz is lower than 0.015; and the second resin layer has a thickness of 8 μm to 50 μm a thickness of micrometers, and is formed on the second insulating layer, wherein the dielectric constants of the first resin layer and the second resin layer at 10 GHz are respectively lower than 4.0, and the dielectric losses at 10 GHz are respectively 0.002 to 0.010, And the water absorption rates are respectively 0.001% to 0.5%; wherein, the cover film has a through hole filled with conductive paste, and based on the total weight of the conductive paste, the conductive paste includes 40% by weight to 75% by weight. Metal particles and 25% to 60% by weight of a thermosetting adhesive, wherein the metal particles are at least one selected from the group consisting of silver, aluminum, and copper, and the thermosetting adhesive includes epoxy resins, Urea-formaldehyde resin, thermosetting phenolic resin, thermosetting At least one of the group consisting of polyester resin, polysulfide rubber, polyvinyl butyral resin, nitrile rubber, isocyanate and thermosetting polyimide resin.

於本發明之軟性印刷電路板之一具體實施態樣中,該第一樹脂層及第二樹脂層係獨立包含選自由氟系樹脂、環氧樹脂、丙烯酸系樹脂、胺基甲酸酯系樹脂、矽橡膠系樹脂、聚對二甲苯系樹脂、雙馬來醯亞胺系樹脂及熱固性聚醯亞胺樹脂所組成群組之至少一種樹脂。 In an embodiment of the flexible printed circuit board of the present invention, the first resin layer and the second resin layer independently comprise a resin selected from the group consisting of fluorine-based resins, epoxy resins, acrylic resins, and urethane-based resins , at least one resin of the group consisting of silicone rubber resin, parylene resin, bismaleimide resin and thermosetting polyimide resin.

於本發明之軟性印刷電路板之一具體實施態樣中,該銅箔層係為具有2微米至18微米之厚度的薄銅層或具有105微米之厚度的厚銅層。 In one embodiment of the flexible printed circuit board of the present invention, the copper foil layer is a thin copper layer with a thickness of 2 to 18 microns or a thick copper layer with a thickness of 105 microns.

於本發明之軟性印刷電路板之一具體實施態樣中,該薄銅層係為載體箔。 In one embodiment of the flexible printed circuit board of the present invention, the thin copper layer is a carrier foil.

於本發明之軟性印刷電路板之一具體實施態樣中,該第一絕緣層係為非油墨層,且該非油墨層係包含選自由環氧樹脂、聚甲基丙烯酸甲酯、聚酯、聚醯亞胺、聚醯胺醯亞胺、聚醚醚酮、聚碸、聚己二醯丁二胺、聚胺酯、聚苯硫醚、聚醚碸、聚醚醯亞胺、聚丙烯及聚苯乙烯所組成群組之至少一者。於另一具體實施態樣中,該聚酯係包括選自由聚對苯二甲酸環己烷二甲酯、聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯及聚碳酸酯所組成群組之至少一者。 In one embodiment of the flexible printed circuit board of the present invention, the first insulating layer is a non-ink layer, and the non-ink layer is selected from the group consisting of epoxy resin, polymethyl methacrylate, polyester, polyamide, etc. Imide, polyimide imide, polyether ether ketone, polyether, polyadipidine diamine, polyurethane, polyphenylene sulfide, polyether imide, polyether imide, polypropylene and polystyrene At least one of the formed groups. In another specific embodiment, the polyester system comprises selected from the group consisting of polyethylene terephthalate, polyethylene terephthalate, polyethylene naphthalate and polycarbonate. at least one of the groups.

於本發明之軟性印刷電路板之一具體實施態樣中,該第一絕緣層係為油墨層。 In an embodiment of the flexible printed circuit board of the present invention, the first insulating layer is an ink layer.

於本發明之軟性印刷電路板之一具體實施態樣中,該第一絕緣層係包含消光粉體,以該第一絕緣層之總重計,該消光粉體之含量係為5重量%至20重量%。 In one embodiment of the flexible printed circuit board of the present invention, the first insulating layer includes a matting powder, and based on the total weight of the first insulating layer, the content of the matting powder is 5 to 5 wt %. 20% by weight.

於本發明之軟性印刷電路板之一具體實施態樣中,該第二絕緣層係包含選自由聚烯烴、聚苯醚、聚苯硫醚、聚醯亞胺及聚醚醚酮所組成群組之至少一者。 In an embodiment of the flexible printed circuit board of the present invention, the second insulating layer comprises a group selected from the group consisting of polyolefin, polyphenylene ether, polyphenylene sulfide, polyimide and polyether ether ketone at least one of them.

於本發明之軟性印刷電路板之一具體實施態樣中,該接著層係包含選自由環氧系樹脂、丙烯酸系樹脂、聚醋酸乙烯酯系樹脂、胺基甲酸酯系樹脂、矽橡膠系樹脂、聚對二甲苯系樹脂、雙馬來醯亞胺系樹脂及聚醯亞胺系樹脂所組成群組之至少一者。 In one embodiment of the flexible printed circuit board of the present invention, the adhesive layer comprises epoxy resin, acrylic resin, polyvinyl acetate resin, urethane resin, and silicone rubber. At least one of the group consisting of resin, parylene resin, bismaleimide resin and polyimide resin.

於本發明之軟性印刷電路板之一具體實施態樣中,該軟性銅箔基板係結合至該覆蓋膜之第二樹脂層。 In one embodiment of the flexible printed circuit board of the present invention, the flexible copper foil substrate is bonded to the second resin layer of the cover film.

本發明復提供該軟性印刷電路板的製備方法,係包括:形成貫穿該覆蓋膜之具有孔徑為50微米至400微米之通孔;填充導電膏於該通孔中;以50℃至60℃之溫度烘烤該通孔中填充有該導電膏之覆蓋膜,且烘烤時間為至少10分鐘;以及壓合經烘烤之覆蓋膜和軟性銅箔基板,例如以100kgf/cm2之壓力及180±5℃之溫度壓合經烘烤之覆蓋膜和軟性銅箔基板,預壓時間為10秒,壓合成型時間為12秒。又,壓合完成之後,以170℃至180℃之溫度進行熟化,且熟化時間為60分鐘。 The present invention further provides a preparation method of the flexible printed circuit board, which comprises: forming a through hole with a diameter of 50 to 400 μm through the cover film; filling the through hole with conductive paste; temperature baking the cover film filled with the conductive paste in the through hole, and the baking time is at least 10 minutes; and pressing the baked cover film and the flexible copper foil substrate, for example, with a pressure of 100kgf/cm 2 and 180 The baked cover film and the flexible copper foil substrate are pressed together at a temperature of ±5°C. The pre-pressing time is 10 seconds, and the pressing and forming time is 12 seconds. In addition, after completion of pressing, aging was performed at a temperature of 170° C. to 180° C., and the aging time was 60 minutes.

於本發明之製備方法之一具體實施態樣中,係藉由雷射鑽孔以形成該通孔,且該雷射鑽孔之能量為4.5W至15W,雷射鑽孔之次數為4至10次。 In one embodiment of the preparation method of the present invention, the through hole is formed by laser drilling, the energy of the laser drilling is 4.5W to 15W, and the number of laser drilling is 4 to 15W. 10 times.

於本發明之製備方法之一具體實施態樣中,於烘烤該覆蓋膜之前,先貼合該覆蓋膜與軟性銅箔基板。 In one embodiment of the preparation method of the present invention, before baking the cover film, the cover film and the flexible copper foil substrate are bonded together.

於本發明之製備方法之一具體實施態樣中,於形成該通孔前,先貼合該覆蓋膜與軟性銅箔基板。於本具體實施態樣中,貼合該覆蓋膜與軟性銅箔基板後及形成該通孔前,壓合該覆蓋膜與軟性銅箔基板,例如以100kgf/cm2之壓力及180±5℃之溫度壓合該覆蓋膜與軟性銅箔基板,預壓時間為10秒,壓合成型時間為12秒。又,壓合完成之後,以170℃至180℃之溫度進行熟化,且熟化時間為60分鐘。 In one embodiment of the preparation method of the present invention, before forming the through hole, the cover film and the flexible copper foil substrate are firstly bonded. In this embodiment, after laminating the cover film and the flexible copper foil substrate and before forming the through hole, the cover film and the flexible copper foil substrate are pressed together, for example, at a pressure of 100kgf/cm 2 and a temperature of 180±5°C. The cover film and the flexible copper foil substrate are pressed together at the same temperature, the pre-pressing time is 10 seconds, and the pressing and forming time is 12 seconds. In addition, after completion of pressing, aging was performed at a temperature of 170° C. to 180° C., and the aging time was 60 minutes.

根據本發明之軟性印刷電路板之製備方法的一具體實施態樣,係藉由機械鑽孔以形成該通孔,該機械鑽孔之轉速為50至155kr/min,進刀量為25至70mm/min,且退刀量為100至750mm/min。於本具體實施態樣中,形成該通孔後,壓合該覆蓋膜與軟性銅箔基板,例如以100kgf/cm2之壓力及180±5℃之溫度壓合該覆蓋膜與軟性銅箔基板,預壓時間為10秒,壓合成型時間為12秒。又,壓合完成之後,以170℃至180℃之溫度進行熟化,且熟化時間為60分鐘,並對該熟化完成之覆蓋膜進行化金表面處理。 According to an embodiment of the manufacturing method of the flexible printed circuit board of the present invention, the through hole is formed by mechanical drilling. /min, and the retraction amount is 100 to 750mm/min. In this embodiment, after forming the through hole, the cover film and the flexible copper foil substrate are pressed together, for example, the cover film and the flexible copper foil substrate are pressed together at a pressure of 100kgf/cm 2 and a temperature of 180±5°C , the pre-compression time is 10 seconds, and the compression molding time is 12 seconds. In addition, after the lamination is completed, aging is performed at a temperature of 170° C. to 180° C., and the aging time is 60 minutes, and the cured cover film is subjected to chemical gold surface treatment.

本發明之軟性印刷電路板使用之覆蓋膜可提供最高達100dB之高電磁干擾屏蔽性能。此外,該覆蓋膜上之通孔可同時作為導電孔、導熱孔及氣孔,而不需如現有FPC製程中需另外於銅箔上製作氣孔,更可改善使用電磁干擾屏蔽膜之FPC製程產生爆板之問題,且於使用厚度達35微米之銅箔層的情況下,可改善5G高速傳輸下產生發熱的問題。 The cover film used in the flexible printed circuit board of the present invention can provide a high electromagnetic interference shielding performance of up to 100 dB. In addition, the through holes on the cover film can be used as conductive holes, heat conduction holes and air holes at the same time, and it is not necessary to make air holes on the copper foil as in the existing FPC process, which can also improve the explosion caused by the FPC process using the electromagnetic interference shielding film. The problem of the board, and in the case of using a copper foil layer with a thickness of 35 microns, it can improve the problem of heat generation under 5G high-speed transmission.

另一方面,本發明之軟性印刷電路板的覆蓋膜具有低介電常數及低介電損耗,適合作為高頻高速傳輸之FPC中的介電層,且該覆蓋膜與軟性銅箔基板上之線路絕緣,同時具有電磁干擾屏蔽之效果。 On the other hand, the cover film of the flexible printed circuit board of the present invention has low dielectric constant and low dielectric loss, and is suitable as a dielectric layer in an FPC for high-frequency and high-speed transmission, and the cover film and the flexible copper foil substrate are connected to each other. Line insulation, also has the effect of electromagnetic interference shielding.

本發明之軟性印刷電路板之製備方法不需額外增加形成氣孔之製程,可降低製作成本,且有利於快速生產及高密度組裝,更可增加多層結構之設計空間。 The manufacturing method of the flexible printed circuit board of the present invention does not require an additional process for forming air holes, which can reduce the manufacturing cost, facilitate rapid production and high-density assembly, and increase the design space of the multi-layer structure.

1:軟性印刷電路板 1: Flexible printed circuit board

100:覆蓋膜 100: cover film

101:第一絕緣層 101: The first insulating layer

102:接著層 102: Next layer

103:銅箔層 103: Copper foil layer

104:第一樹脂層 104: The first resin layer

105:第二絕緣層 105: Second insulating layer

106:第二樹脂層 106: Second resin layer

107:第一離型層 107: The first release layer

108:第二離型層 108: The second release layer

109:通孔 109: Through hole

110:導電膏 110: conductive paste

110a:金屬顆粒 110a: Metal particles

110b:熱固性黏合劑 110b: Thermosetting Adhesives

200:軟性銅箔基板 200: Flexible copper foil substrate

201:第一銅箔層 201: The first copper foil layer

202:第一聚醯亞胺膠層 202: The first polyimide adhesive layer

203:聚醯亞胺層 203: Polyimide layer

204:第二聚醯亞胺膠層 204: The second polyimide layer

205:第二銅箔層 205: Second copper foil layer

透過例示性之參考附圖說明本發明的實施方式: Embodiments of the invention are described by way of illustrative reference to the accompanying drawings:

圖1係本發明之軟性印刷電路板的結構示意圖。 FIG. 1 is a schematic diagram of the structure of the flexible printed circuit board of the present invention.

圖2係本發明之覆蓋膜的結構示意圖。 FIG. 2 is a schematic view of the structure of the cover film of the present invention.

以下係藉由特定的具體實施例說明本發明之實施方式,熟習此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之優點及功效。 The following describes the implementation of the present invention through specific embodiments, and those skilled in the art can easily understand the advantages and effects of the present invention from the contents disclosed in this specification.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「一」、「下」及「上」亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。此外, 本文所有範圍和值都係包含及可合併的。落在本文中所述的範圍內之任何數值或點,例如任何整數都可以作為最小值或最大值以導出下位範圍等。 It should be noted that the structures, proportions, sizes, etc. shown in the drawings in this specification are only used to cooperate with the contents disclosed in the specification for the understanding and reading of those who are familiar with the art, and are not intended to limit the implementation of the present invention. Therefore, it has no technical significance. Any modification of the structure, change of the proportional relationship or adjustment of the size should still fall within the scope of the present invention without affecting the effect and the purpose that the present invention can achieve. The technical content disclosed by the invention can be covered within the scope. At the same time, references such as "a", "below" and "above" in this specification are only for the convenience of description, and are not intended to limit the scope of the present invention. Substantially changed technical content should also be regarded as the scope of the present invention. also, All ranges and values herein are inclusive and combinable. Any value or point falling within a range described herein, eg, any integer, can be taken as a minimum or maximum value to derive a lower range, etc.

如圖1所示,係顯示本發明之軟性印刷電路板1之一具體實施態樣,係包括覆蓋膜100以及軟性銅箔基板200,且該覆蓋膜100上具有一填充有導電膏110之通孔109,該導電膏110係包括金屬顆粒110a及熱固性黏合劑110b,其中,該金屬顆粒110a係選自由銀、鋁及銅所組成群組之至少一者,且該熱固性黏合劑110b係包括選自由環氧樹脂、脲醛樹脂、熱固性酚醛樹脂、熱固性聚酯樹脂、聚硫橡膠、聚乙烯醇縮丁醛樹脂、丁腈橡膠、異氰酸酯和熱固性聚醯亞胺樹脂所組成群組之至少一者。 As shown in FIG. 1, it shows a specific embodiment of the flexible printed circuit board 1 of the present invention, which includes a cover film 100 and a flexible copper foil substrate 200, and the cover film 100 has a conductive paste 110 on the cover film. The hole 109, the conductive paste 110 includes metal particles 110a and a thermosetting adhesive 110b, wherein the metal particles 110a are at least one selected from the group consisting of silver, aluminum and copper, and the thermosetting adhesive 110b includes a selected At least one selected from the group consisting of epoxy resin, urea-formaldehyde resin, thermosetting phenolic resin, thermosetting polyester resin, polysulfide rubber, polyvinyl butyral resin, nitrile rubber, isocyanate and thermosetting polyimide resin.

本發明之軟性印刷電路板填充於通孔之導電膏係使用具有透氣性之熱固性黏合劑,故該通孔可同時作為導電孔或氣孔,以克服現有FPC製程使用電磁干擾屏蔽膜具有爆板之風險。 The conductive paste filled in the through hole of the flexible printed circuit board of the present invention uses a thermosetting adhesive with air permeability, so the through hole can be used as a conductive hole or an air hole at the same time, so as to overcome the problem of using an electromagnetic interference shielding film in the existing FPC process. risk.

於一具體實施態樣中,該軟性銅箔基板200係結合至該覆蓋膜100之第二樹脂層106。 In an embodiment, the flexible copper foil substrate 200 is bonded to the second resin layer 106 of the cover film 100 .

於一具體實施態樣中,該軟性銅箔基板200可為例如但不限於有膠基板、無膠基板或以液晶高分子(LCP)芯層為主要結構之LCP基板;該有膠基板之疊構由上至下依序為銅箔層、接著層、聚醯亞胺膜、接著層和銅箔層,但不以此為限;該無膠基板之疊構由上至下依序為銅箔層、聚醯亞胺膜和銅箔層,但不以此為限。於另一具體實施態樣中,該LCP基板可為有膠基板或無膠基板,該LCP有膠基板之疊構由上至下依序為銅箔層、接著層、LCP膜、接著層和銅箔層,但不以此為限;該無膠基板之疊構由上至下依序為銅箔層、LCP膜和銅箔層,但不以此為限。 In a specific embodiment, the flexible copper foil substrate 200 can be, for example, but not limited to, an adhesive substrate, a non-adhesive substrate, or an LCP substrate with a liquid crystal polymer (LCP) core layer as the main structure; The structure from top to bottom is copper foil layer, adhesive layer, polyimide film, adhesive layer and copper foil layer, but not limited to this; the laminated structure of the adhesive-free substrate is copper foil in sequence from top to bottom layer, polyimide film and copper foil layer, but not limited thereto. In another specific embodiment, the LCP substrate can be an adhesive substrate or a non-adhesive substrate, and the stacked structure of the LCP adhesive substrate is a copper foil layer, an adhesive layer, an LCP film, an adhesive layer, and a copper foil layer in sequence from top to bottom. A foil layer, but not limited to this; the laminated structure of the adhesive-free substrate is a copper foil layer, an LCP film and a copper foil layer in sequence from top to bottom, but not limited to this.

於一具體實施態樣中,該軟性銅箔基板200係包括:第一銅箔層201、第一聚醯亞胺膠層202、聚醯亞胺層203、第二聚醯亞胺膠層204及第二銅箔層205。於另一具體實施態樣中,該第一聚醯亞胺膠層202係位於該第一銅箔層201與聚醯亞胺層203之間,該聚醯亞胺層203係位於該第一聚醯亞胺膠層202與第二聚醯亞胺膠層204之間,且該第二聚醯亞胺膠層204係位於該聚醯亞胺層203與第二銅箔層205之間。於本具體實施態樣中,該軟性銅箔基板200之第一銅箔層201與該覆蓋膜100之第二樹脂層106接觸。 In a specific embodiment, the flexible copper foil substrate 200 includes: a first copper foil layer 201 , a first polyimide adhesive layer 202 , a polyimide layer 203 , and a second polyimide adhesive layer 204 and the second copper foil layer 205 . In another embodiment, the first polyimide adhesive layer 202 is located between the first copper foil layer 201 and the polyimide layer 203, and the polyimide layer 203 is located in the first Between the polyimide adhesive layer 202 and the second polyimide adhesive layer 204 , and the second polyimide adhesive layer 204 is located between the polyimide layer 203 and the second copper foil layer 205 . In this embodiment, the first copper foil layer 201 of the flexible copper foil substrate 200 is in contact with the second resin layer 106 of the cover film 100 .

於一具體實施態樣中,以該導電膏之總重計,該金屬顆粒之含量係為40重量%至75重量%,例如,40、45、50、55、60、65、70或75重量%;以該導電膏之總重計,該熱固性黏合劑之含量為25重量%至60重量%,例如,25、30、35、40、45、50、55或60重量%。 In a specific embodiment, based on the total weight of the conductive paste, the content of the metal particles is 40% to 75% by weight, for example, 40, 45, 50, 55, 60, 65, 70 or 75% by weight %; based on the total weight of the conductive paste, the content of the thermosetting adhesive is 25% to 60% by weight, for example, 25, 30, 35, 40, 45, 50, 55 or 60% by weight.

於一具體實施態樣中,該覆蓋膜100係包括第一絕緣層101、接著層102、銅箔層103、第一樹脂層104、第二絕緣層105及第二樹脂層106,該接著層102係位於該第一絕緣層101與銅箔層103之間,該銅箔層103係位於該接著層102與第一樹脂層104之間,該第一樹脂層104係位於該銅箔層103與第二絕緣層105之間,該第二絕緣層105係位於該第一樹脂層104與第二樹脂層106之間。 In a specific embodiment, the cover film 100 includes a first insulating layer 101, an adhesive layer 102, a copper foil layer 103, a first resin layer 104, a second insulating layer 105, and a second resin layer 106. The adhesive layer 102 is located between the first insulating layer 101 and the copper foil layer 103, the copper foil layer 103 is located between the bonding layer 102 and the first resin layer 104, and the first resin layer 104 is located in the copper foil layer 103 Between the second insulating layer 105 , the second insulating layer 105 is located between the first resin layer 104 and the second resin layer 106 .

於一具體實施態樣中,該第一絕緣層係具有5微米至25微米之厚度,例如,5、10、15、20或25微米;該第二絕緣層係具有7.5微米至100微米之厚度,例如,7.5、10、15、20、25、30、35、40、45、50、55、60、65、70、75、80、85、90、95或100微米;該接著層係具有5微米至20 微米之厚度,例如,5、10、15或20微米;該銅箔層係具有2微米至105微米之厚度,例如,2、4、6、8、10、12、14、16、18、20、25、30、35、40、45、50、55、60、65、70、75、80、85、90、95、100或105微米;該第一樹脂層係具有8微米至50微米之厚度,例如,8、15、20、25、30、35、40、45或50微米;該第二樹脂層係具有8微米至50微米之厚度,例如,8、15、20、25、30、35、40、45或50微米。 In one embodiment, the first insulating layer has a thickness of 5 microns to 25 microns, eg, 5, 10, 15, 20 or 25 microns; the second insulating layer has a thickness of 7.5 microns to 100 microns , for example, 7.5, 10, 15, 20, 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90, 95 or 100 microns; the adhesive layer has 5 microns to 20 The thickness of microns, for example, 5, 10, 15 or 20 microns; the copper foil layer has a thickness of 2 microns to 105 microns, for example, 2, 4, 6, 8, 10, 12, 14, 16, 18, 20 , 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90, 95, 100 or 105 microns; the first resin layer has a thickness of 8 to 50 microns , for example, 8, 15, 20, 25, 30, 35, 40, 45 or 50 microns; the second resin layer has a thickness of 8 to 50 microns, for example, 8, 15, 20, 25, 30, 35 , 40, 45 or 50 microns.

於一具體實施態樣中,該第一絕緣層之表面硬度係大於4H。 In an embodiment, the surface hardness of the first insulating layer is greater than 4H.

於一具體實施態樣中,該第二絕緣層於10GHz之介電常數係低於4.0,且於10GHz之介電損耗係低於0.015。 In one embodiment, the dielectric constant of the second insulating layer at 10 GHz is lower than 4.0, and the dielectric loss at 10 GHz is lower than 0.015.

於一具體實施態樣中,該第一樹脂層及第二樹脂層於10GHz之介電常數係各自低於4.0,於10GHz之介電損耗係各自為0.002至0.010,吸水率係各自為0.001%至0.5%。 In an embodiment, the dielectric constants of the first resin layer and the second resin layer at 10 GHz are each lower than 4.0, the dielectric losses at 10 GHz are each 0.002 to 0.010, and the water absorption rates are each 0.001% to 0.5%.

於一具體實施態樣中,該第一樹脂層及第二樹脂層係獨立包含選自由氟系樹脂、環氧樹脂、丙烯酸系樹脂、胺基甲酸酯系樹脂、矽橡膠系樹脂、聚對二甲苯系樹脂、雙馬來醯亞胺系樹脂及熱固性聚醯亞胺樹脂所組成群組之至少一種樹脂。 In a specific embodiment, the first resin layer and the second resin layer are independently selected from the group consisting of fluorine-based resins, epoxy resins, acrylic resins, urethane-based resins, silicone rubber-based resins, polypara At least one resin of the group consisting of xylene-based resin, bismaleimide-based resin and thermosetting polyimide resin.

於一具體實施態樣中,該銅箔層係為具有2微米至18微米之厚度的薄銅層或使用厚度達105微米之厚銅層。於另一具體實施態樣中,該薄銅層係為載體箔。 In one embodiment, the copper foil layer is a thin copper layer having a thickness of 2 microns to 18 microns or a thick copper layer up to 105 microns is used. In another embodiment, the thin copper layer is a carrier foil.

於一具體實施態樣中,該第一絕緣層係為非油墨層,且該非油墨層係包含選自由環氧樹脂、聚甲基丙烯酸甲酯、聚酯、聚醯亞胺、聚醯胺醯亞胺、聚醚醚酮、聚碸、聚己二醯丁二胺、聚胺酯、聚苯硫醚、聚 醚碸、聚醚醯亞胺、聚丙烯及聚苯乙烯所組成群組之至少一者。於另一具體實施態樣中,該聚酯係包括選自由聚對苯二甲酸環己烷二甲酯、聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯及聚碳酸酯所組成群組之至少一者。 In a specific embodiment, the first insulating layer is a non-ink layer, and the non-ink layer comprises epoxy resin, polymethyl methacrylate, polyester, polyimide, polyimide imine, polyether ether ketone, polysaccharide, polyadipidine diamine, polyurethane, polyphenylene sulfide, poly At least one of the group consisting of ether, polyetherimide, polypropylene and polystyrene. In another specific embodiment, the polyester system comprises selected from the group consisting of polyethylene terephthalate, polyethylene terephthalate, polyethylene naphthalate and polycarbonate. at least one of the groups.

於一具體實施態樣中,該第一絕緣層係為油墨層。 In an embodiment, the first insulating layer is an ink layer.

於該第一絕緣層為非油墨層之具體實施態樣中,該覆蓋膜之製備方法係包括:塗佈第一樹脂層於第二絕緣層上;壓合一銅箔層於該第一樹脂層之另一表面上;塗佈第二樹脂層於該第二絕緣層之另一表面上;貼附下離型層於該第二樹脂層表面;塗佈接著層於該銅箔層之另一表面;以及壓合並固化第一絕緣層於該接著層上,即得本發明之覆蓋膜。 In the specific embodiment in which the first insulating layer is a non-ink layer, the preparation method of the cover film includes: coating a first resin layer on the second insulating layer; pressing a copper foil layer on the first resin on the other surface of the layer; coating the second resin layer on the other surface of the second insulating layer; attaching the lower release layer on the surface of the second resin layer; coating the adhesive layer on the other surface of the copper foil layer a surface; and pressing and curing the first insulating layer on the adhesive layer to obtain the cover film of the present invention.

於該第一絕緣層為油墨層之具體實施態樣中,該覆蓋膜之製備方法係包括:塗佈第一絕緣層於上離型層上,並收卷備用;塗佈第一樹脂層於第二絕緣層上;壓合一銅箔層於該第一樹脂層之另一表面上;塗佈第二樹脂層於該第二絕緣層之另一表面上;貼附下離型層於該第二樹脂層表面;塗佈接著層於該銅箔層之另一表面;以及壓合並固化該接著層於該上離型層上之第一絕緣層,即得本發明之覆蓋膜。 In the specific embodiment in which the first insulating layer is an ink layer, the preparation method of the cover film includes: coating the first insulating layer on the upper release layer, and winding for standby; coating the first resin layer on the upper release layer. on the second insulating layer; pressing a copper foil layer on the other surface of the first resin layer; coating a second resin layer on the other surface of the second insulating layer; attaching a lower release layer to the The surface of the second resin layer; coating the adhesive layer on the other surface of the copper foil layer; and pressing and curing the adhesive layer on the first insulating layer on the upper release layer to obtain the cover film of the present invention.

由上可知,使用非油墨層作為第一絕緣層之覆蓋膜可省略形成上離型層之步驟。 As can be seen from the above, the step of forming the upper release layer can be omitted by using the non-ink layer as the cover film of the first insulating layer.

於一具體實施態樣中,該第一絕緣層係包含消光粉體,以該第一絕緣層之總重計,該消光粉體之含量係為5重量%至20重量%,例如5、10、15、20重量%。於本實施態樣中,可藉由添加消光粉體以調整該第一絕緣層之光澤度或硬度。 In a specific embodiment, the first insulating layer includes a matting powder, and based on the total weight of the first insulating layer, the content of the matting powder is 5% to 20% by weight, such as 5, 10% by weight. , 15, 20% by weight. In this embodiment, the glossiness or hardness of the first insulating layer can be adjusted by adding matting powder.

於一具體實施態樣中,該消光粉體係選自由硫酸鈣、碳黑、二氧化矽、二氧化鈦、硫化鋅、氧化鋯、碳酸鈣、碳化矽、氮化硼、氧化鋁、滑石粉、氮化鋁、玻璃粉體、石英粉體、金剛砂和黏土所組成之群組中至少一種的無機物粉體;或是聚醯亞胺系有機粉體;或是含有選自由含鹵素化合物、含磷化合物、含氮化合物和含硼化合物所組成之群組中至少一種之阻燃性化合物。於另一具體實施態樣中,該消光粉體係選自聚醯亞胺系有機粉體。於又一具體實施態樣中,該消光粉體係選自由含鹵素化合物、含磷化合物、含氮化合物和含硼化合物所組成之群組中至少一種之阻燃性化合物。 In a specific embodiment, the matting powder system is selected from calcium sulfate, carbon black, silicon dioxide, titanium dioxide, zinc sulfide, zirconia, calcium carbonate, silicon carbide, boron nitride, alumina, talc, nitride Inorganic powder of at least one of the group consisting of aluminum, glass powder, quartz powder, emery and clay; or polyimide-based organic powder; or containing compounds selected from halogen-containing compounds, phosphorus-containing compounds, A flame retardant compound of at least one of the group consisting of a nitrogen-containing compound and a boron-containing compound. In another specific embodiment, the matting powder system is selected from polyimide organic powders. In yet another embodiment, the matting powder system is selected from at least one flame retardant compound selected from the group consisting of halogen-containing compounds, phosphorus-containing compounds, nitrogen-containing compounds and boron-containing compounds.

於一具體實施態樣中,該第二絕緣層係包含選自由聚烯烴、聚苯醚、聚苯硫醚、聚醯亞胺及聚醚醚酮所組成群組之至少一者。 In one embodiment, the second insulating layer includes at least one selected from the group consisting of polyolefin, polyphenylene ether, polyphenylene sulfide, polyimide, and polyether ether ketone.

於一具體實施態樣中,該接著層係包含選自由環氧系樹脂、丙烯酸系樹脂、聚醋酸乙烯酯系樹脂、胺基甲酸酯系樹脂、矽橡膠系樹脂、聚對二甲苯系樹脂、雙馬來醯亞胺系樹脂及聚醯亞胺系樹脂所組成群組之至少一者。 In a specific embodiment, the adhesive layer comprises epoxy resin, acrylic resin, polyvinyl acetate resin, urethane resin, silicone rubber resin, parylene resin , at least one of the group consisting of bismaleimide resin and polyimide resin.

於一具體實施態樣中,該覆蓋膜100復包括第一離型層107及第二離型層108,該第一離型層107係貼合該第一絕緣層101,且該第二離型層108係貼合該第二樹脂層106。於另一具體實施態樣中,該第一離型層107和第二離型層108之厚度係各自為25微米至130微米,例如,25、30、35、40、45、50、55、60、65、70、75、80、85、90、95、100、105、110、115、120、125或130微米。 In a specific embodiment, the cover film 100 further includes a first release layer 107 and a second release layer 108, the first release layer 107 is attached to the first insulating layer 101, and the second release layer 107 The mold layer 108 is attached to the second resin layer 106 . In another embodiment, the thicknesses of the first release layer 107 and the second release layer 108 are respectively 25 μm to 130 μm, for example, 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90, 95, 100, 105, 110, 115, 120, 125 or 130 microns.

於一具體實施態樣中,該第一離型層107及第二離型層108係各自選自離型膜、離型紙及載體膜之一者。於另一具體實施態樣中,該離型膜係選自由PET氟素離型膜、PET矽油離型膜、PET啞光離型膜及PE離型膜所組成群組之至少一者。於本具體實施態樣中,該離型膜之厚度係為25微米至100微米。於又一具體實施態樣中,該離型紙係為單面PET淋膜紙或雙面PET淋膜紙之一者。於本具體實施態樣中,該離型紙之厚度係為25微米至130微米。 In a specific embodiment, the first release layer 107 and the second release layer 108 are each selected from one of a release film, a release paper and a carrier film. In another specific embodiment, the release film is at least one selected from the group consisting of PET fluorine release film, PET silicone oil release film, PET matte release film and PE release film. In this embodiment, the thickness of the release film is from 25 microns to 100 microns. In another specific embodiment, the release paper is one of single-sided PET coated paper or double-sided PET coated paper. In this embodiment, the thickness of the release paper is from 25 microns to 130 microns.

本發明復提供該軟性印刷電路板1的製備方法,係包括:形成貫穿該覆蓋膜之具有孔徑為50微米至400微米之通孔;填充導電膏於該通孔中;以50℃至60℃之溫度烘烤該通孔中填充有該導電膏之覆蓋膜,且烘烤時間為至少10分鐘;以及以100kgf/cm2之壓力及180±5℃之溫度壓合經烘烤之覆蓋膜和軟性銅箔基板,預壓時間為10秒,壓合成型時間為12秒,壓合完成之後,以170℃至180℃之溫度進行熟化,且熟化時間為60分鐘。 The present invention further provides a method for preparing the flexible printed circuit board 1, which includes: forming a through hole with a diameter of 50 to 400 μm through the cover film; filling the through hole with conductive paste; Baking the cover film filled with the conductive paste in the through hole at a temperature of at least 10 minutes; and pressing the baked cover film with a pressure of 100kgf/cm 2 and a temperature of 180±5°C For the flexible copper foil substrate, the pre-pressing time is 10 seconds, and the pressing and forming time is 12 seconds. After the pressing is completed, it is cured at a temperature of 170°C to 180°C, and the curing time is 60 minutes.

本發明之製備方法藉由該低溫烘烤以令該導電膏部分固化,由於該導電膏之固化不完全,使該軟性印刷電路板中的氣體可由通孔中逸出。此外,本發明之製備方法藉由高溫壓合步驟,使該軟性印刷電路板中所含之水氣蒸發為氣體,且該氣體可經覆蓋膜上之通孔逸出,避免製程中發生爆板之問題,同時可固化該軟性印刷電路板。 In the preparation method of the present invention, the conductive paste is partially cured by the low temperature baking, and the gas in the flexible printed circuit board can escape from the through holes due to the incomplete curing of the conductive paste. In addition, in the preparation method of the present invention, through the high temperature lamination step, the moisture contained in the flexible printed circuit board is evaporated into gas, and the gas can escape through the through holes on the cover film to avoid the occurrence of board explosion during the process. problem, and the flexible printed circuit board can be cured at the same time.

於一具體實施態樣中,形成該通孔時,該覆蓋膜可為片式或捲繞式(Roll to Roll,RTR)。 In an embodiment, when the through hole is formed, the cover film may be a sheet type or a roll to roll (RTR) type.

於一具體實施態樣中,由雷射鑽孔以形成該通孔,且該雷射鑽孔之能量為4.5W至15W,雷射鑽孔之次數為4至10次。 In an embodiment, the through hole is formed by laser drilling, the energy of the laser drilling is 4.5W to 15W, and the number of times of the laser drilling is 4 to 10 times.

於一具體實施態樣中,於烘烤該覆蓋膜之前,先貼合該覆蓋膜與軟性銅箔基板。 In a specific embodiment, before baking the cover film, the cover film and the flexible copper foil substrate are bonded together.

於一具體實施態樣中,於形成該通孔前,先貼合該覆蓋膜與軟性銅箔基板。於本具體實施態樣中,貼合該覆蓋膜與軟性銅箔基板後及形成該通孔前,以100kgf/cm2之壓力及180±5℃之溫度壓合該覆蓋膜與軟性銅箔基板,預壓時間為10秒,壓合成型時間為12秒,壓合完成之後,以170℃至180℃之溫度進行熟化,且熟化時間為60分鐘。 In a specific embodiment, before forming the through hole, the cover film and the flexible copper foil substrate are firstly bonded. In this embodiment, after laminating the cover film and the flexible copper foil substrate and before forming the through hole, the cover film and the flexible copper foil substrate are pressed together with a pressure of 100kgf/cm 2 and a temperature of 180±5°C , the pre-pressing time is 10 seconds, and the pressing and forming time is 12 seconds. After the pressing is completed, it is aged at a temperature of 170°C to 180°C, and the curing time is 60 minutes.

於一具體實施態樣中,藉由機械鑽孔以形成該通孔,該機械鑽孔之轉速為50至155kr/min,進刀量為25至70mm/min,且退刀量為100至750mm/min。於本具體實施態樣中,形成該通孔後,以100kgf/cm2之壓力及180±5℃之溫度壓合該覆蓋膜與軟性銅箔基板,預壓時間為10秒,壓合成型時間為12秒,壓合完成之後,以170℃至180℃之溫度進行熟化,且熟化時間為60分鐘,並對該熟化完成之覆蓋膜進行化金表面處理,藉由半置換半還原之化金處理,於該覆蓋膜之表面形成金屬鍍層,防止該覆蓋膜之通孔內的金屬氧化。 In a specific embodiment, the through hole is formed by mechanical drilling, the speed of the mechanical drilling is 50 to 155kr/min, the feed rate is 25 to 70mm/min, and the retraction amount is 100 to 750mm /min. In this embodiment, after the through hole is formed, the cover film and the flexible copper foil substrate are pressed together with a pressure of 100kgf/cm 2 and a temperature of 180±5°C. The pre-pressing time is 10 seconds, and the pressing and forming time is It is 12 seconds. After the lamination is completed, the aging is carried out at a temperature of 170 ° C to 180 ° C, and the curing time is 60 minutes, and the surface treatment of the cured cover film is carried out. During the treatment, a metal plating layer is formed on the surface of the cover film to prevent oxidation of the metal in the through hole of the cover film.

本發明的軟性印刷電路板的疊構係如圖1所示。該第一絕緣層101及接著層102係作為軟性印刷電路板之外表面,該第一絕緣層係為具有消光粉體之黑色絕緣層,可遮蔽線路設計。該第一離型層107除了有利於收捲儲存之外,更可提供挺性,有利於該軟性印刷電路板1之後續加工製程。此外,本發明之第一絕緣層101、接著層102及第一離型層107不影響該軟性印刷電路板1之訊號傳輸及屏蔽性能。 The stack structure of the flexible printed circuit board of the present invention is shown in FIG. 1 . The first insulating layer 101 and the bonding layer 102 are used as the outer surface of the flexible printed circuit board. The first insulating layer is a black insulating layer with matte powder, which can shield the circuit design. The first release layer 107 can not only be beneficial for rolling and storage, but also provide stiffness, which is beneficial to the subsequent processing of the flexible printed circuit board 1 . In addition, the first insulating layer 101 , the adhesive layer 102 and the first release layer 107 of the present invention do not affect the signal transmission and shielding performance of the flexible printed circuit board 1 .

以下透過實施例和比較例說明本發明之軟性印刷電路板之性能。 The following describes the performance of the flexible printed circuit board of the present invention through examples and comparative examples.

由於本發明之覆蓋膜中第一絕緣層和接著層實質上不影響軟性印刷電路板1之性能,故下述實施例1至12將省略第一絕緣層及接著層之結構。具體而言,實施例1至12之覆蓋膜的製備方法係包括:塗佈第一樹脂層於第二絕緣層上;壓合銅箔層於該第一樹脂層之另一表面;以及塗佈第二樹脂層於該第二絕緣層之另一表面;經乾燥收卷後,即得本發明實施例1至12所使用之覆蓋膜。 Since the first insulating layer and the adhesive layer in the cover film of the present invention do not substantially affect the performance of the flexible printed circuit board 1 , the structures of the first insulating layer and the adhesive layer will be omitted in the following embodiments 1 to 12. Specifically, the preparation methods of the cover films of Examples 1 to 12 include: coating a first resin layer on the second insulating layer; laminating a copper foil layer on the other surface of the first resin layer; and coating The second resin layer is on the other surface of the second insulating layer; after drying and winding, the cover films used in Examples 1 to 12 of the present invention are obtained.

於實施例1至12中,第一樹脂層及第二樹脂層係為熱固性聚醯亞胺樹脂,於10GHz下的介電常數為2.8,介電損耗為0.003,吸水率為0.08%,且該熱固性聚醯亞胺樹脂係由70%聚醯亞胺樹脂、8%燒結二氧化矽、3%環氧樹脂、15%磷系耐燃劑及4%氟系樹脂所組成;第二絕緣層係為聚醯亞胺薄膜(SKCKOLONPI公司,型號FS),於10GHz下的介電常數為3.1,介電損耗為0.005。此外,以導電膏之總重計,實施例1至12所用之導電膏係包括70重量%之銀顆粒和30重量%之環氧樹脂,且該銀顆粒係為片狀顆粒和球狀顆粒之混合物。 In Examples 1 to 12, the first resin layer and the second resin layer are thermosetting polyimide resins, the dielectric constant at 10 GHz is 2.8, the dielectric loss is 0.003, the water absorption rate is 0.08%, and the Thermosetting polyimide resin is composed of 70% polyimide resin, 8% sintered silica, 3% epoxy resin, 15% phosphorus-based flame retardant and 4% fluorine-based resin; the second insulating layer is The polyimide film (SKCKOLONPI, model FS) had a dielectric constant of 3.1 and a dielectric loss of 0.005 at 10 GHz. In addition, based on the total weight of the conductive paste, the conductive pastes used in Examples 1 to 12 included 70% by weight of silver particles and 30% by weight of epoxy resin, and the silver particles were a combination of flake particles and spherical particles. mixture.

實施例1至4之軟性印刷電路板係由下述方法製備:藉由雷射鑽孔自該覆蓋膜之上離型層至第二樹脂層之方向形成孔徑為100微米之通孔,形成通孔之條件係記載於下表1中;填充該導電膏於該通孔中;以50℃至60℃之溫度進行烘烤,且烘烤時間為至少10分鐘;從烘烤後之覆蓋膜上撕除該下離型層,並以該覆蓋膜之第二樹脂層與軟性銅箔基板貼合;以及以100kgf/cm2之壓力及180±5℃之溫度進行壓合,預壓時間為10秒,壓合 成型時間為12秒,壓合完成之後,以170℃至180℃之溫度進行熟化,且熟化時間為60分鐘。 The flexible printed circuit boards of Examples 1 to 4 were prepared by the following method: forming through holes with a diameter of 100 microns from the release layer on the cover film to the direction of the second resin layer by laser drilling. The hole conditions are described in Table 1 below; fill the conductive paste in the through hole; bake at a temperature of 50°C to 60°C, and the baking time is at least 10 minutes; from the cover film after baking The lower release layer is peeled off, and the second resin layer of the cover film is attached to the flexible copper foil substrate; and the pressure is 100kgf/cm 2 and the temperature of 180±5℃ is pressed, and the pre-pressing time is 10 Second, the compression molding time is 12 seconds, after the compression is completed, the aging is performed at a temperature of 170°C to 180°C, and the aging time is 60 minutes.

實施例5至8之軟性印刷電路板係由下述方法製備:從該覆蓋膜上撕除下離型層,並以該覆蓋膜之第二樹脂層與軟性銅箔基板貼合;以100kgf/cm2之壓力及180±5℃之溫度壓合該覆蓋膜與軟性銅箔基板,預壓時間為10秒,壓合成型時間為12秒,壓合完成之後,以170℃至180℃之溫度進行熟化,且熟化時間為60分鐘;藉由雷射鑽孔自該覆蓋膜之上離型層至第二樹脂層之方向形成孔徑為100微米之通孔,形成通孔之條件係記載於下表1中;填充該導電膏於該通孔中;以50℃至60℃之溫度進行烘烤,且烘烤時間為至少10分鐘;以及以100kgf/cm2之壓力及180±5℃之溫度進行壓合,預壓時間為10秒,壓合成型時間為12秒,壓合完成之後,以170℃至180℃之溫度進行熟化,且熟化時間為60分鐘。 The flexible printed circuit boards of Examples 5 to 8 were prepared by the following methods: peel off the lower release layer from the cover film, and attach the second resin layer of the cover film to the flexible copper foil substrate; The pressure of cm 2 and the temperature of 180±5°C are used to press the cover film and the flexible copper foil substrate. The pre-pressing time is 10 seconds, and the pressing time is 12 seconds. After the pressing is completed, the temperature is 170°C to 180°C. Carry out curing, and the curing time is 60 minutes; through laser drilling from the release layer on the cover film to the direction of the second resin layer to form through holes with a diameter of 100 microns, and the conditions for forming through holes are described below. In Table 1; fill the conductive paste in the through hole; bake at a temperature of 50°C to 60°C, and the bake time is at least 10 minutes; and at a pressure of 100kgf/cm 2 and a temperature of 180±5°C Pressing is performed, the pre-pressing time is 10 seconds, and the pressing and forming time is 12 seconds. After the pressing is completed, the aging is performed at a temperature of 170°C to 180°C, and the aging time is 60 minutes.

實施例9至12之軟性印刷電路板係由下述方法製備:從該覆蓋膜上撕除下離型層,並以該第二樹脂層與軟性銅箔基板貼合;藉由機械鑽孔自該覆蓋膜之上離型層至第二樹脂層之方向形成孔徑為100微米之通孔,形成通孔之條件係記載於下表1中;以100kgf/cm2之壓力及180±5℃之溫度壓合該覆蓋膜與軟性銅箔基板,預壓時間為10秒,壓合成型時間為12秒,壓合完成之後,以170℃至180℃之溫度進行熟化,且熟化時間為60分鐘;對該熟化完成之覆蓋膜進行化金表面處理;填充該導電膏於該通孔中;以50℃至60℃之溫度進行烘烤,且烘烤時間為至少10分鐘;以及以100kgf/cm2之壓力及180±5℃之溫度進行壓合,預壓時間為10秒,壓合成型時 間為12秒,壓合完成之後,以170℃至180℃之溫度進行熟化,且熟化時間為60分鐘。 The flexible printed circuit boards of Examples 9 to 12 were prepared by the following methods: the lower release layer was peeled off from the cover film, and the second resin layer was attached to the flexible copper foil substrate; A through hole with a diameter of 100 microns is formed from the release layer on the cover film to the second resin layer. The conditions for forming the through hole are described in Table 1 below; with a pressure of 100kgf/ cm2 and a temperature of 180±5℃ The cover film and the flexible copper foil substrate are temperature-bonded, the pre-compression time is 10 seconds, and the compression molding time is 12 seconds. After the lamination is completed, it is cured at a temperature of 170°C to 180°C, and the curing time is 60 minutes; Perform gold surface treatment on the matured cover film; fill the conductive paste in the through hole; bake at a temperature of 50°C to 60°C, and the baking time is at least 10 minutes; and at 100kgf/cm 2 The pressure and the temperature of 180±5℃ are pressed, the pre-pressing time is 10 seconds, and the pressing time is 12 seconds. After the pressing is completed, the temperature is 170℃ to 180℃, and the aging time is 60 minutes. .

表1:實施例1至12中形成通孔之條件

Figure 109125283-A0101-12-0016-3
Table 1: Conditions for forming through holes in Examples 1 to 12
Figure 109125283-A0101-12-0016-3

比較例1及2之軟性印刷電路板係使用覆蓋膜搭配軟性銅箔基板,其疊構由上至下依序為:絕緣層、樹脂層及軟性銅箔基板,比較例1及2之覆蓋膜係使用亞洲電材型號分別為HFC120和HFC035之覆蓋膜。比較例3及4之軟性印刷電路板係使用電磁干擾屏蔽膜搭配軟性銅箔基板,其疊構由上至下依序為:銅箔層、導電膠層及軟性銅箔基板,比較例3及4之電磁干擾屏蔽膜係使用拓自達(Tatsuta)型號分別為SF-PC 8600和SF-PC3300之覆蓋膜。比較例1至4之軟性銅箔基板係使用與本發明實施例1至12相同之軟性銅箔基板,其結構係如本發明圖1所示之軟性銅箔基板200。 The flexible printed circuit boards of Comparative Examples 1 and 2 use a cover film and a flexible copper foil substrate. The stacking structure from top to bottom is: insulating layer, resin layer and flexible copper foil substrate. The cover film of Comparative Examples 1 and 2 The cover films of Asia Electric Materials Model HFC120 and HFC035 are used. The flexible printed circuit boards of Comparative Examples 3 and 4 use electromagnetic interference shielding films and flexible copper foil substrates. The stacking structure from top to bottom is: copper foil layer, conductive adhesive layer and flexible copper foil substrate. The electromagnetic interference shielding film of 4 is the cover film of Tatsuta model SF-PC 8600 and SF-PC3300 respectively. The flexible copper foil substrates of Comparative Examples 1 to 4 used the same flexible copper foil substrates as those of Examples 1 to 12 of the present invention, and their structures were the same as the flexible copper foil substrates 200 shown in FIG. 1 of the present invention.

表2及表3係分別示出實施例1至12之軟性印刷電路板中的覆蓋膜及比較例1至3之軟性印刷電路板中的覆蓋膜或電磁干擾屏蔽膜之各層厚度及性能。 Table 2 and Table 3 respectively show the thickness and performance of each layer of the cover films in the flexible printed circuit boards of Examples 1 to 12 and the cover films or electromagnetic interference shielding films in the flexible printed circuit boards of Comparative Examples 1 to 3.

表2:實施例1至9之軟性印刷電路板中的覆蓋膜之各層厚度及性能

Figure 109125283-A0101-12-0017-4
Table 2: Thickness and properties of each layer of the cover films in the flexible printed circuit boards of Examples 1 to 9
Figure 109125283-A0101-12-0017-4

表3:比較例1至3之軟性印刷電路板中的覆蓋膜或電磁干擾屏蔽膜之各層厚度及性能

Figure 109125283-A0101-12-0018-5
Table 3: Thickness and performance of each layer of the cover film or EMI shielding film in the flexible printed circuit boards of Comparative Examples 1 to 3
Figure 109125283-A0101-12-0018-5

上表2及3中各項性能之測試方法係記載如下。電阻值:依照《軟板組裝要項試驗準則》(TPCA-F-002),使用萬用電表進行測量。剝離強度:依照IPC-TM-650 2.4.9(或依照TPCA-F-002),使用萬能試驗儀進行測量。電磁干擾屏蔽:依照國際電工委員會(IEC)標準進行測量。表面貼焊技術測試:表面貼焊技術測試係依照TPCA-F-002或者IPC-TM-650 2.4.13進行測量,表面 貼焊技術之溫度係表示該實施例或比較例之產品進行漂錫30秒之溫度,且該溫度為該產品之焊錫能力符合規格之最大溫度。介電性能:依照IPC-TM-650 2.5.5.13,使用網路分析儀以及共振腔體進行測量。 The test methods for the properties in Tables 2 and 3 above are described below. Resistance value: In accordance with the "Test Guidelines for Items of Flexible Board Assembly" (TPCA-F-002), use a multimeter to measure. Peel Strength: Measured using a universal tester in accordance with IPC-TM-650 2.4.9 (or in accordance with TPCA-F-002). Electromagnetic Interference Shielding: Measured in accordance with International Electrotechnical Commission (IEC) standards. Surface mount welding technology test: The surface mount welding technology test is measured in accordance with TPCA-F-002 or IPC-TM-650 2.4.13. The temperature of the paste soldering technology refers to the temperature at which the product of the example or the comparative example is bleached for 30 seconds, and this temperature is the maximum temperature at which the solderability of the product meets the specification. Dielectric Properties: Measured using a network analyzer and resonant cavity per IPC-TM-650 2.5.5.13.

由上表2及3可知,本發明之實施例1至12的電磁干擾屏蔽值高於比較例1至4之電磁干擾屏蔽值,且實施例1至12的電磁干擾屏蔽值至少為75,具有高電磁干擾屏蔽性能。此外,本發明之實施例1至12的介電常數及介電損耗高於比較例1至4之介電常數及介電損耗,適合作為高頻高速傳輸之軟性印刷電路板之介電層,且本發明軟性印刷電路板的厚度範圍大,可使用較厚之介電層以減少高頻下之訊號傳遞損失。 It can be seen from the above Tables 2 and 3 that the EMI shielding values of Examples 1 to 12 of the present invention are higher than those of Comparative Examples 1 to 4, and the EMI shielding values of Examples 1 to 12 are at least 75, which have High EMI shielding performance. In addition, the dielectric constants and dielectric losses of Examples 1 to 12 of the present invention are higher than those of Comparative Examples 1 to 4, and are suitable as the dielectric layers of flexible printed circuit boards for high-frequency and high-speed transmission. Moreover, the thickness range of the flexible printed circuit board of the present invention is wide, and a thicker dielectric layer can be used to reduce the signal transmission loss at high frequencies.

此外,本發明之實施例1至12於表面貼焊技術(Surface Mount Technology,SMT)測試之最高溫度為288℃,具有良好焊錫耐熱性,可通過FPC或PCB之製程而不會產生爆板之問題。 In addition, the highest temperature tested by the surface mount technology (SMT) of Examples 1 to 12 of the present invention is 288°C, which has good solder heat resistance, and can pass the FPC or PCB process without causing the board to explode. question.

現有之軟性印刷電路板的製程於銅箔基板上蝕刻線路之後,需先貼合預先通孔及沖型之覆蓋膜,並於壓合熟化該覆蓋膜與銅箔基板之後,再貼合電磁干擾屏蔽膜,經壓合熟化該電磁干擾屏蔽膜之後,再於該軟性印刷電路板上形成導氣孔,以進行烘烤除溼之步驟。相較於現有的軟性印刷電路板的製程,使用本發明之覆蓋膜製備的軟性印刷電路板可以較少步驟之製程製備具有低介電常數及介電損耗之電路板,減少多層結構之工序及製程,可進一步改善使用屏蔽膜於製程上遇到之爆板問題,且該軟性印刷電路板之機械性能佳,可滿足通孔及填孔等加工製程之需求。 In the existing flexible printed circuit board process, after etching the circuit on the copper foil substrate, it is necessary to attach a pre-hole and punched cover film, and after the cover film and the copper foil substrate are pressed and cured, and then the electromagnetic interference is attached. For the shielding film, after pressing and curing the electromagnetic interference shielding film, air-conducting holes are formed on the flexible printed circuit board, so as to perform the step of baking and dehumidification. Compared with the existing flexible printed circuit board manufacturing process, the flexible printed circuit board prepared by using the cover film of the present invention can prepare a circuit board with low dielectric constant and dielectric loss in fewer steps, reducing the process of multi-layer structure and The process can further improve the cracking problem encountered in the process of using the shielding film, and the flexible printed circuit board has good mechanical properties, which can meet the needs of processing processes such as through-hole and hole-filling.

上述實施例僅為例示性說明,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進 行修飾與改變。因此,本發明之權利保護範圍係由本發明所附之申請專利範圍所定義,只要不影響本發明之效果及實施目的,應涵蓋於此公開技術內容中。 The above-mentioned embodiments are only illustrative, and are not intended to limit the present invention. Any person skilled in the art can carry out the above-mentioned embodiments without departing from the spirit and scope of the present invention. Line modifications and changes. Therefore, the scope of the right protection of the present invention is defined by the scope of the patent application attached to the present invention, as long as the effect and implementation purpose of the present invention are not affected, it shall be included in the technical content disclosed herein.

1:軟性印刷電路板 1: Flexible printed circuit board

100:覆蓋膜 100: cover film

101:第一絕緣層 101: The first insulating layer

102:接著層 102: Next layer

103:銅箔層 103: Copper foil layer

104:第一樹脂層 104: The first resin layer

105:第二絕緣層 105: Second insulating layer

106:第二樹脂層 106: Second resin layer

107:第一離型層 107: The first release layer

109:通孔 109: Through hole

110:導電膏 110: conductive paste

110a:金屬顆粒 110a: Metal particles

110b:熱固性黏合劑 110b: Thermosetting Adhesives

200:軟性銅箔基板 200: Flexible copper foil substrate

201:第一銅箔層 201: The first copper foil layer

202:第一聚醯亞胺膠層 202: The first polyimide adhesive layer

203:聚醯亞胺層 203: Polyimide layer

204:第二聚醯亞胺膠層 204: The second polyimide layer

205:第二銅箔層 205: Second copper foil layer

Claims (17)

一種具有高電磁干擾屏蔽性能的軟性印刷電路板,係包括覆蓋膜以及結合該覆蓋膜之軟性銅箔基板;該覆蓋膜係包括:第一絕緣層,係具有大於4H之表面硬度及5微米至25微米之厚度;接著層,係具有5微米至20微米之厚度,且形成於該第一絕緣層上;銅箔層,係具有2微米至105微米之厚度,且形成於該接著層上,使該接著層位於該第一絕緣層與銅箔層之間;第一樹脂層,係具有8微米至50微米之厚度,且形成於該銅箔層上,使該銅箔層位於該接著層與第一樹脂層之間;第二絕緣層,係形成於該第一樹脂層上,使該第一樹脂層位於該銅箔層與第二絕緣層之間,且該第二絕緣層具有7.5微米至100微米之厚度,且其於10GHz之介電常數係低於4.0,於10GHz之介電損耗係低於0.015;以及第二樹脂層,係具有8微米至50微米之厚度,且形成於該第二絕緣層上,使該第二絕緣層位於該第一樹脂層與第二樹脂層之間,其中,該第一樹脂層及第二樹脂層於10GHz之介電常數係各自低於4.0,於10GHz之介電損耗係各自為0.002至0.010,且吸水率係各自為0.001%至0.5%;其中,該覆蓋膜上具有一填充有導電膏之通孔,以該導電膏之總重計,該導電膏係包括40重量%至75重量%之金屬顆粒及25重量%至60重量%之熱固性黏合劑,其中,該金屬顆粒係選自由銀、鋁及銅所組成群組之至少 一者,且該熱固性黏合劑係包括選自由環氧樹脂、脲醛樹脂、熱固性酚醛樹脂、熱固性聚酯樹脂、聚硫橡膠、聚乙烯醇縮丁醛樹脂、丁腈橡膠、異氰酸酯和熱固性聚醯亞胺樹脂所組成群組之至少一者。 A flexible printed circuit board with high electromagnetic interference shielding performance includes a cover film and a flexible copper foil substrate combined with the cover film; the cover film system includes: a first insulating layer, which has a surface hardness of greater than 4H and a surface hardness of 5 microns to A thickness of 25 microns; an adhesive layer, which has a thickness of 5 microns to 20 microns, and is formed on the first insulating layer; a copper foil layer, which has a thickness of 2 microns to 105 microns, and is formed on the adhesive layer, The adhesive layer is located between the first insulating layer and the copper foil layer; the first resin layer has a thickness of 8 microns to 50 microns and is formed on the copper foil layer, so that the copper foil layer is located on the adhesive layer and the first resin layer; the second insulating layer is formed on the first resin layer, so that the first resin layer is located between the copper foil layer and the second insulating layer, and the second insulating layer has 7.5 The thickness of micrometer to 100 micrometers, and its dielectric constant at 10GHz is less than 4.0, the dielectric loss at 10GHz is less than 0.015; and the second resin layer has a thickness of 8 micrometers to 50 micrometers, and is formed on On the second insulating layer, the second insulating layer is located between the first resin layer and the second resin layer, wherein the dielectric constants of the first resin layer and the second resin layer at 10 GHz are respectively lower than 4.0 , the dielectric loss at 10GHz is respectively 0.002 to 0.010, and the water absorption rate is respectively 0.001% to 0.5%; wherein, the cover film has a through hole filled with conductive paste, based on the total weight of the conductive paste , the conductive paste comprises 40% to 75% by weight of metal particles and 25% to 60% by weight of a thermosetting adhesive, wherein the metal particles are at least selected from the group consisting of silver, aluminum and copper One, and the thermosetting adhesive is selected from the group consisting of epoxy resins, urea-formaldehyde resins, thermosetting phenolic resins, thermosetting polyester resins, polysulfide rubbers, polyvinyl butyral resins, nitrile rubbers, isocyanates, and thermosetting polyamides At least one of the group consisting of amine resins. 如請求項1所述之軟性印刷電路板,其中,該第一樹脂層及第二樹脂層係獨立包含選自由氟系樹脂、環氧樹脂、丙烯酸系樹脂、胺基甲酸酯系樹脂、矽橡膠系樹脂、聚對二甲苯系樹脂、雙馬來醯亞胺系樹脂及熱固性聚醯亞胺樹脂所組成群組之至少一種樹脂。 The flexible printed circuit board according to claim 1, wherein the first resin layer and the second resin layer independently comprise a resin selected from the group consisting of fluorine resin, epoxy resin, acrylic resin, urethane resin, silicon resin At least one resin of the group consisting of rubber-based resin, parylene-based resin, bismaleimide-based resin and thermosetting polyimide resin. 如請求項1所述之軟性印刷電路板,其中,該銅箔層係為具有2微米至18微米之厚度的薄銅層或具有105微米之厚度的厚銅層。 The flexible printed circuit board of claim 1, wherein the copper foil layer is a thin copper layer with a thickness of 2 to 18 microns or a thick copper layer with a thickness of 105 microns. 如請求項3所述之軟性印刷電路板,其中,該薄銅層係為載體箔。 The flexible printed circuit board of claim 3, wherein the thin copper layer is a carrier foil. 如請求項1所述之軟性印刷電路板,其中,該第一絕緣層係為非油墨層,且該非油墨層係包含選自由環氧樹脂、聚甲基丙烯酸甲酯、聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、聚碳酸酯、聚醯亞胺、聚醯胺醯亞胺、聚醚醚酮、聚碸、聚己二醯丁二胺、聚對苯二甲酸環己烷二甲酯、聚胺酯、聚苯硫醚、聚醚碸、聚醚醯亞胺、聚丙烯及聚苯乙烯所組成群組之至少一者。 The flexible printed circuit board as claimed in claim 1, wherein the first insulating layer is a non-ink layer, and the non-ink layer comprises epoxy resin, polymethyl methacrylate, polyethylene terephthalate Diester, polyethylene naphthalate, polycarbonate, polyimide, polyimide, polyether ether ketone, polyether, polyhexamethylenediamine, polycyclohexyl terephthalate At least one of the group consisting of alkane dimethyl ester, polyurethane, polyphenylene sulfide, polyether sulfide, polyetherimide, polypropylene and polystyrene. 如請求項1所述之軟性印刷電路板,其中,該第一絕緣層係為油墨層。 The flexible printed circuit board according to claim 1, wherein the first insulating layer is an ink layer. 如請求項1所述之軟性印刷電路板,其中,該第一絕緣層係包含消光粉體,以該第一絕緣層之總重計,該消光粉體之含量係為5重量%至20重量%。 The flexible printed circuit board of claim 1, wherein the first insulating layer comprises a matting powder, and based on the total weight of the first insulating layer, the content of the matting powder is 5% to 20% by weight %. 如請求項1所述之軟性印刷電路板,其中,該第二絕緣層係包含選自由聚烯烴、聚苯醚、聚苯硫醚、聚醯亞胺及聚醚醚酮所組成群組之至少一者。 The flexible printed circuit board of claim 1, wherein the second insulating layer comprises at least one selected from the group consisting of polyolefin, polyphenylene ether, polyphenylene sulfide, polyimide and polyether ether ketone one. 如請求項1所述之軟性印刷電路板,其中,該接著層係包含選自由環氧系樹脂、丙烯酸系樹脂、聚醋酸乙烯酯系樹脂、胺基甲酸酯系樹脂、矽橡膠系樹脂、聚對二甲苯系樹脂、雙馬來醯亞胺系樹脂及聚醯亞胺系樹脂所組成群組之至少一者。 The flexible printed circuit board according to claim 1, wherein the adhesive layer is selected from epoxy resins, acrylic resins, polyvinyl acetate resins, urethane resins, silicone rubber resins, At least one of the group consisting of parylene-based resin, bismaleimide-based resin and polyimide-based resin. 如請求項1所述之軟性印刷電路板,其中,該軟性銅箔基板係結合至該覆蓋膜之第二樹脂層。 The flexible printed circuit board of claim 1, wherein the flexible copper foil substrate is bonded to the second resin layer of the cover film. 一種如請求項1所述之軟性印刷電路板的製備方法,係包括:形成貫穿該覆蓋膜之具有孔徑為50微米至400微米之通孔;填充導電膏於該通孔中;以50℃至60℃之溫度烘烤該通孔中填充有該導電膏之覆蓋膜,且烘烤時間為至少10分鐘;以及以100kgf/cm2之壓力及180±5℃之溫度壓合經烘烤之覆蓋膜和軟性銅箔基板,預壓時間為10秒,壓合成型時間為12秒,壓合完成之後,以170℃至180℃之溫度進行熟化,且熟化時間為60分鐘。 A method for preparing a flexible printed circuit board as claimed in claim 1, comprising: forming through holes with a diameter of 50 to 400 microns through the cover film; filling the through holes with conductive paste; Bake the cover film filled with the conductive paste in the through hole at a temperature of 60°C for at least 10 minutes; and press the baked cover at a pressure of 100kgf/cm 2 and a temperature of 180±5°C For the film and the flexible copper foil substrate, the pre-pressing time is 10 seconds, and the pressing time is 12 seconds. After the pressing is completed, it is aged at a temperature of 170°C to 180°C, and the curing time is 60 minutes. 如請求項11所述之軟性印刷電路板的製備方法,其中,該通孔係藉由雷射鑽孔形成,且該雷射鑽孔之能量為4.5W至15W,雷射鑽孔之次數為4至10次。 The manufacturing method of a flexible printed circuit board according to claim 11, wherein the through hole is formed by laser drilling, the energy of the laser drilling is 4.5W to 15W, and the number of laser drilling is 4 to 10 times. 如請求項11所述之軟性印刷電路板的製備方法,其中,於烘烤該覆蓋膜之前,先貼合該覆蓋膜與軟性銅箔基板。 The method for preparing a flexible printed circuit board according to claim 11, wherein before baking the cover film, the cover film and the flexible copper foil substrate are firstly bonded. 如請求項11所述之軟性印刷電路板的製備方法,其中,於形成該通孔前,先貼合該覆蓋膜與軟性銅箔基板。 The manufacturing method of a flexible printed circuit board according to claim 11, wherein before forming the through hole, the cover film and the flexible copper foil substrate are firstly bonded. 如請求項14所述之軟性印刷電路板的製備方法,復包括在貼合該覆蓋膜與軟性銅箔基板後及形成該通孔前,壓合該覆蓋膜與軟性銅箔基板,以及壓合完成之後,以170℃至180℃之溫度進行熟化。 The method for preparing a flexible printed circuit board according to claim 14, further comprising laminating the cover film and the flexible copper foil substrate after laminating the cover film and the flexible copper foil substrate and before forming the through hole, and laminating the cover film and the flexible copper foil substrate. After completion, aging is performed at a temperature of 170°C to 180°C. 如請求項14所述之軟性印刷電路板的製備方法,其中,該通孔係藉由機械鑽孔形成,該機械鑽孔之轉速為50至155kr/min,進刀量為25至70mm/min,且退刀量為100至750mm/min。 The manufacturing method of a flexible printed circuit board as claimed in claim 14, wherein the through hole is formed by mechanical drilling, the rotating speed of the mechanical drilling is 50-155kr/min, and the feed rate is 25-70mm/min , and the retraction amount is 100 to 750mm/min. 如請求項16所述之軟性印刷電路板的製備方法,復包括在形成該通孔後,壓合該覆蓋膜與軟性銅箔基板,壓合完成之後,以170℃至180℃之溫度進行熟化,再對該熟化完成之覆蓋膜進行化金表面處理。 The method for preparing a flexible printed circuit board according to claim 16, further comprising pressing the cover film and the flexible copper foil substrate after forming the through hole, and curing at a temperature of 170°C to 180°C after the pressing is completed. , and then perform chemical gold surface treatment on the matured cover film.
TW109125283A 2019-09-18 2020-07-27 Flexible printed circuits having high electromagnetic shielding property and preparing methods thereof TWI765306B (en)

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CN113300098B (en) * 2021-05-14 2023-05-05 苏州硕贝德创新技术研究有限公司 Copper-clad substrate, antenna structure and preparation method of antenna structure
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CN114340161B (en) * 2021-12-20 2024-03-29 安捷利电子科技(苏州)有限公司 5G high-frequency multilayer FPC and preparation method thereof
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1307794A (en) * 1998-06-26 2001-08-08 揖斐电株式会社 Multilayer printed wiring board and production method thereof
TW201930076A (en) * 2018-01-08 2019-08-01 亞洲電材股份有限公司 High-frequency high-transmission double-sided copper foil substrate, composite material for flexible printed circuit board and production method thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105282959B (en) * 2014-07-22 2018-06-05 昆山雅森电子材料科技有限公司 High frequency cover film and its manufacturing method with low Dk and Df characteristics
CN109831904A (en) * 2019-03-07 2019-05-31 昆山雅森电子材料科技有限公司 High shielding emi shielding film and preparation method thereof
CN110012655A (en) * 2019-04-28 2019-07-12 昆山雅森电子材料科技有限公司 Slimming cover film with EMI function
CN210899797U (en) * 2019-09-18 2020-06-30 昆山雅森电子材料科技有限公司 High-frequency covering film with high electromagnetic shielding function

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1307794A (en) * 1998-06-26 2001-08-08 揖斐电株式会社 Multilayer printed wiring board and production method thereof
TW201930076A (en) * 2018-01-08 2019-08-01 亞洲電材股份有限公司 High-frequency high-transmission double-sided copper foil substrate, composite material for flexible printed circuit board and production method thereof

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