TWI692639B - Ultrasonic probe - Google Patents

Ultrasonic probe Download PDF

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TWI692639B
TWI692639B TW108135878A TW108135878A TWI692639B TW I692639 B TWI692639 B TW I692639B TW 108135878 A TW108135878 A TW 108135878A TW 108135878 A TW108135878 A TW 108135878A TW I692639 B TWI692639 B TW I692639B
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ground
ultrasonic probe
wave generating
acoustic wave
conductive adhesive
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TW108135878A
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TW202115395A (en
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蔣富昇
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佳世達科技股份有限公司
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Abstract

An ultrasonic probe includes a Micromachined Ultrasonic Transducer (MUT) substrate and a grounding layer. The MUT substrate has an emitting surface, an acoustic wave generator array and a grounding line, and the acoustic wave generator array and the grounding line are formed on the emitting surface. The grounding layer is formed on an edge of the emitting surface. The grounding line is connected to the acoustic wave generator array and the grounding layer.

Description

超音波探頭Ultrasonic probe

本發明是有關於一種超音波探頭,且特別是有關於一種具有接地層之超音波探頭。The invention relates to an ultrasonic probe, and particularly relates to an ultrasonic probe with a ground layer.

習知超音波探頭包含基板、聲波產生陣列及至少一導線。聲波產生陣列包括數個聲波產生單元,各導線連接對應的連接聲波產生陣列。為了電性連接聲波產生陣列與電路板,一般多採用焊線(bonding wire)橫向地跨接電路板及導線,以電性連接聲波產生陣列與電路板。然而,採用焊線連接的方式需要特別考量打線工具頭的操作性(如操作空間是否足夠),且焊線通常具有一長度,其構成阻抗的一部分,且焊線容易導致電性連接失效,可靠度低。The conventional ultrasonic probe includes a substrate, an acoustic wave generating array and at least one wire. The sound wave generating array includes several sound wave generating units, and each wire is connected to the corresponding connected sound wave generating array. In order to electrically connect the sound wave generating array and the circuit board, a bonding wire is generally used to cross the circuit board and the wire laterally to electrically connect the sound wave generating array and the circuit board. However, the use of wire bonding requires special consideration of the operability of the wire bonding tool head (such as whether the operating space is sufficient), and the wire usually has a length, which forms part of the impedance, and the wire is likely to cause electrical connection failure and reliability Degree is low.

因此,有需要提出一種能夠改善前述問題的超音波探頭及其製造方法。Therefore, there is a need to propose an ultrasonic probe capable of improving the aforementioned problems and a method of manufacturing the same.

本發明實施例提出一種超音波探頭,可改善上述問題。An embodiment of the present invention provides an ultrasonic probe, which can improve the above problems.

本發明一實施例提出一種超音波探頭。超音波探頭包括一微機械超音波換能器基板及一接地層。微機械超音波換能器基板具有一發射面、一聲波產生陣列及一接地線,聲波產生陣列及接地線形成於發射面。接地層形成於發射面之一邊緣。其中,接地線連接聲波產生陣列與接地層。An embodiment of the present invention provides an ultrasonic probe. The ultrasonic probe includes a micromechanical ultrasonic transducer substrate and a ground layer. The micromachined ultrasonic transducer substrate has an emitting surface, an acoustic wave generating array and a ground wire, and the acoustic wave generating array and the ground wire are formed on the emitting surface. The ground layer is formed on one edge of the emitting surface. Among them, the ground wire connects the sound wave generating array and the ground layer.

為了對本發明之上述及其他方面有更佳的瞭解,下文特舉實施例,並配合所附圖式詳細說明如下:In order to have a better understanding of the above and other aspects of the present invention, the following examples are specifically described in conjunction with the accompanying drawings as follows:

為了對本發明之上述及其他方面有更佳的瞭解,下文特舉實施例,並配合所附圖式詳細說明如下。In order to have a better understanding of the above and other aspects of the present invention, the embodiments are specifically described below and described in detail in conjunction with the accompanying drawings.

請參照第1A及1B圖,第1A圖繪示依照本發明一實施例之超音波探頭100的俯視圖,而第1B圖繪示第1圖之超音波探頭100沿方向1B-1B’的剖面圖。Please refer to FIGS. 1A and 1B, FIG. 1A shows a top view of an ultrasonic probe 100 according to an embodiment of the present invention, and FIG. 1B shows a cross-sectional view of the ultrasonic probe 100 of FIG. 1 along the direction 1B-1B′ .

超音波探頭100包括微機械超音波換能器(Micromachined Ultrasonic Transducer, MUT)基板110 (以粗線繪製第1A圖之微機械超音波換能器基板110之外邊界)、接地層120、導電膠130、電路板140、聲波傳遞介質150、蓋板155及封裝體160。微機械超音波換能器基板110具有發射面110u、聲波產生陣列111、至少一接地線110g及至少一訊號線110s。聲波產生陣列111、接地線110g及訊號線110s形成於發射面110u。接地層120形成於發射面110u之邊緣。接地線110g連接聲波產生陣列111與接地層120。如此,所有接地線110g皆延伸至接地層120,且皆透過接地層120電性連接於電路板140之一接地電位(未繪示)。如此,接地線110g不需要透過焊線,就能電性連接於電路板140。The ultrasonic probe 100 includes a micromachined Ultrasonic Transducer (MUT) substrate 110 (drawing the outer boundary of the micromachined Ultrasonic Transducer substrate 110 in FIG. 1A with a thick line), a ground layer 120, and a conductive adhesive 130, a circuit board 140, an acoustic wave transmission medium 150, a cover plate 155, and a package 160. The micromechanical ultrasonic transducer substrate 110 has an emitting surface 110u, an acoustic wave generating array 111, at least one ground wire 110g, and at least one signal wire 110s. The sound wave generating array 111, the ground line 110g and the signal line 110s are formed on the emitting surface 110u. The ground layer 120 is formed on the edge of the emitting surface 110u. The ground line 110g connects the sound wave generation array 111 and the ground layer 120. In this way, all the ground wires 110g extend to the ground layer 120, and are all electrically connected to a ground potential (not shown) of the circuit board 140 through the ground layer 120. In this way, the ground wire 110g can be electrically connected to the circuit board 140 without passing through a bonding wire.

此外,前述「邊緣」例如是聲波產生陣列111以外的區域,其範圍例如可延伸至微機械超音波換能器基板110的外側面110e,然本發明實施例不受此限。In addition, the aforementioned “edge” is, for example, an area other than the acoustic wave generating array 111, and its range may extend to the outer side 110e of the micromechanical ultrasonic transducer substrate 110, but the embodiment of the present invention is not limited thereto.

如第1A及1B圖所示,聲波產生陣列111包括至少一聲波產生單元1111。各聲波產生單元1111包括至少一共振腔1111r及至少一共振膜1112。各共振膜1112形成於發射面110u且覆蓋對應的共振腔1111r。各聲波產生單元1111更包括至少一訊號連接線1111s及至少一接地連接線1111g。各共振膜1112由對應的一條訊號連接線1111s連接至訊號線110s,而各共振膜1112由對應的一條接地連接線1111g連接至接地線110g。各訊號線110s連接對應之聲波產生單元1111至發射面110u之邊緣,而各接地線110g連接對應之聲波產生單元1111至接地層120。以一個聲波產生單元1111的控制來說,一控制器10的控制訊號C1可透過電路板140傳送給訊號線110s,再通過與各共振膜1112連接之訊號連接線1111s及接地連接線1111g後,經由接地線110g及電路板140回到控制器10。控制訊號C1可控制各聲波產生單元1111的所有共振膜1112上下震盪,以發出超聲波。此外,視聲波聚焦特性而定,不同聲波產生單元1111可由不同的控制訊號C1控制,例如由不同延遲時間的控制訊號C1控制,使所有聲波產生單元1111聚焦於同一區域,如同一點。As shown in FIGS. 1A and 1B, the acoustic wave generating array 111 includes at least one acoustic wave generating unit 1111. Each sound wave generating unit 1111 includes at least one resonance cavity 1111r and at least one resonance film 1112. Each resonance film 1112 is formed on the emission surface 110u and covers the corresponding resonance cavity 1111r. Each sound wave generating unit 1111 further includes at least one signal connection line 1111s and at least one ground connection line 1111g. Each resonance film 1112 is connected to the signal line 110s by a corresponding signal connection line 1111s, and each resonance film 1112 is connected to the ground line 110g by a corresponding ground connection line 1111g. Each signal line 110s connects the corresponding sound wave generating unit 1111 to the edge of the emitting surface 110u, and each ground line 110g connects the corresponding sound wave generating unit 1111 to the ground layer 120. For the control of a sound wave generating unit 1111, the control signal C1 of a controller 10 can be transmitted to the signal line 110s through the circuit board 140, and then through the signal connection line 1111s and the ground connection line 1111g connected to each resonance film 1112, Return to the controller 10 via the ground wire 110g and the circuit board 140. The control signal C1 can control all the resonance films 1112 of the sound wave generating units 1111 to oscillate up and down to emit ultrasonic waves. In addition, depending on the acoustic wave focusing characteristics, different acoustic wave generating units 1111 can be controlled by different control signals C1, for example, by different delay time control signals C1, so that all acoustic wave generating units 1111 focus on the same area as a point.

此外,共振腔1111r、共振膜1112、訊號連接線1111s、接地連接線1111g可採用半導體製程形成,其中半導體製程例如包含微影蝕刻技術、塗佈技術及/或其它任何可形成聲波產生陣列111的半導體技術。In addition, the resonant cavity 1111r, the resonant film 1112, the signal connection line 1111s, and the ground connection line 1111g may be formed using a semiconductor process, where the semiconductor process includes, for example, lithography etching technology, coating technology, and/or any other device that can form the acoustic wave generation array 111 Semiconductor technology.

如第1A圖所示,接地層120呈一封閉環形。接地層120封閉式地環繞全部聲波產生單元1111。基板110具有一外側面110e。在本實施例中,接地層120鄰接基板110的外側面110e。在另一實施例中,接地層120可鄰近基板110的外側面110e,但與外側面110e間隔一距離。在其它實施例中,接地層120之一部分可延伸至基板110的外側面110e,而接地層120之另一部分可鄰近基板110的外側面110e,但與外側面110e間隔一距離。As shown in FIG. 1A, the ground layer 120 has a closed ring shape. The ground layer 120 surrounds all the sound wave generating units 1111 in a closed manner. The substrate 110 has an outer side 110e. In this embodiment, the ground layer 120 abuts the outer side 110e of the substrate 110. In another embodiment, the ground layer 120 may be adjacent to the outer side 110e of the substrate 110, but spaced apart from the outer side 110e. In other embodiments, a portion of the ground layer 120 may extend to the outer side 110e of the substrate 110, and another portion of the ground layer 120 may be adjacent to the outer side 110e of the substrate 110, but at a distance from the outer side 110e.

如第1A圖所示,接地層120包含相連接之接地環120g1與二接地墊120g2。二接地墊120g2鄰近發射面110u之一對角配置,各接地墊120g2之寬度W1大於接地環120g1的寬度W2。由於接地層120之接地墊120g2提供一足夠寬度,可增加電路板140的接地墊(未繪示)與接地層120之接地墊120g2的上下重疊面積,提升電性連接品質。As shown in FIG. 1A, the ground layer 120 includes a connected ground ring 120g1 and two ground pads 120g2. The two ground pads 120g2 are disposed diagonally adjacent to one of the emitting surfaces 110u, and the width W1 of each ground pad 120g2 is greater than the width W2 of the ground ring 120g1. Since the ground pad 120g2 of the ground layer 120 provides a sufficient width, the overlapping area of the ground pad (not shown) of the circuit board 140 and the ground pad 120g2 of the ground layer 120 can be increased to improve the electrical connection quality.

如第1B圖所示,整個接地層120透過接地墊120g2(接地墊120g2繪示於第1A圖)、導電膠130及電路板140的接地墊(未繪示)電性連接於電路板140的接地電位。本發明實施例透過導電膠130電性連接電路板140與接地層120,相較於習知焊線,導電膠的可靠度較高,且電傳輸路徑較短,阻抗較低。As shown in FIG. 1B, the entire ground layer 120 is electrically connected to the circuit board 140 through the ground pad 120g2 (the ground pad 120g2 is shown in FIG. 1A), the conductive adhesive 130, and the ground pad (not shown) of the circuit board 140. Ground potential. In the embodiment of the present invention, the circuit board 140 and the ground layer 120 are electrically connected through the conductive adhesive 130. Compared with the conventional bonding wire, the conductive adhesive has higher reliability, shorter electrical transmission paths, and lower impedance.

如第1B圖所示,導電膠130配置於發射面110u上。例如,導電膠130沿聲波發射方向E1位於微機械超音波換能器基板110之接地線110g與電路板140之接地墊140g之間,且位於微機械超音波換能器基板110之訊號線110s與電路板140之訊號墊140s之間。導電膠130允許Z軸向(Z軸向例如是與聲波發射方向E1大致平行)的電性傳輸,但不允許X及Y軸向(例如是與Z軸向大致垂直)的電性傳輸。因此,即使導電膠130為連續延伸的導電膠,相鄰二訊號線110s不會透過導電膠130電性短路且相鄰二接地線110g不會透過導電膠130電性短路。在本實施例中,導電膠130為異方性導電膠(Anisotropic Conductive Film, ACF),或其它僅允許Z軸向電性傳輸的導電材料。圖示的X軸與Y軸之一者例如是超音波探頭100的長軸發射方向,而X軸與Y軸之另一者例如是超音波探頭100的短軸發射方向。As shown in FIG. 1B, the conductive paste 130 is disposed on the emitting surface 110u. For example, the conductive adhesive 130 is located between the ground line 110g of the micromachined ultrasonic transducer substrate 110 and the ground pad 140g of the circuit board 140 along the acoustic emission direction E1, and is located on the signal line 110s of the micromachined ultrasonic transducer substrate 110 Between the signal pad 140s of the circuit board 140. The conductive adhesive 130 allows electrical transmission in the Z axis (the Z axis is, for example, approximately parallel to the acoustic emission direction E1), but does not allow electrical transmission in the X and Y axes (for example, approximately perpendicular to the Z axis). Therefore, even if the conductive adhesive 130 is a continuously extending conductive adhesive, the adjacent two signal lines 110s will not be electrically short-circuited through the conductive adhesive 130 and the adjacent two ground lines 110g will not be electrically short-circuited through the conductive adhesive 130. In this embodiment, the conductive adhesive 130 is an anisotropic conductive film (Anisotropic Conductive Film, ACF), or other conductive materials that only allow electrical transmission in the Z axis. One of the illustrated X axis and Y axis is, for example, the long axis emission direction of the ultrasound probe 100, and the other of the X axis and Y axis is, for example, the short axis emission direction of the ultrasound probe 100.

如第1B圖所示,導電膠130具有第一凹部130r。電路板140例如式軟性電路板(Flexible Print Circuit, FPC),然本發明實施例不受此限。電路板140具有開口140a,電路板140配置在導電膠130上且開口140a對應第一凹部130r形成第二凹部140r。聲波傳遞介質150形成於第一凹部130r及第二凹部140r內,例如是填滿第一凹部130r及第二凹部140r。聲波傳遞介質150例如是矽油、甘油或其它不導電且可傳遞聲波的介質。聲波傳遞介質150可幫助聲波產生陣列111所產生的超聲波傳遞出去。如第1A圖所示,導電膠130具有一封閉環形,使第一凹部130r與導電膠130的外側面不連通,且電路板140具有一封閉環形,使第二凹部140r與電路板140的外側面不連通。如此,位於第一凹部130r及第二凹部140r內的聲波傳遞介質150不會從導電膠130及電路板140側向地外漏。As shown in FIG. 1B, the conductive paste 130 has a first recess 130r. The circuit board 140 is, for example, a flexible printed circuit (FPC), but the embodiment of the present invention is not limited thereto. The circuit board 140 has an opening 140a. The circuit board 140 is disposed on the conductive adhesive 130 and the opening 140a forms a second recess 140r corresponding to the first recess 130r. The acoustic wave transmission medium 150 is formed in the first concave portion 130r and the second concave portion 140r, for example, to fill the first concave portion 130r and the second concave portion 140r. The acoustic wave transmission medium 150 is, for example, silicone oil, glycerin, or other non-conductive medium that can transmit acoustic waves. The acoustic wave transmission medium 150 can help the ultrasonic waves generated by the acoustic wave generation array 111 to be transmitted. As shown in FIG. 1A, the conductive adhesive 130 has a closed ring shape, so that the first concave portion 130r is not in communication with the outer surface of the conductive adhesive 130, and the circuit board 140 has a closed ring shape, so that the second concave portion 140r and the outer surface of the circuit board 140 The sides are not connected. In this way, the acoustic wave transmission medium 150 located in the first concave portion 130r and the second concave portion 140r does not leak outward from the conductive adhesive 130 and the circuit board 140 side.

此外,第二凹部140r與第一凹部130r大致上重疊,如至少部分重疊。在一實施例中,第二凹部140r可小於或大致等於第一凹部130r的大小(如俯視面積),然第二凹部140r也大於第一凹部130r的大小(如俯視面積)。In addition, the second recess 140r and the first recess 130r substantially overlap, for example, at least partially overlap. In one embodiment, the second concave portion 140r may be smaller than or substantially equal to the size of the first concave portion 130r (such as a top view area), but the second concave portion 140r is also larger than the size of the first concave portion 130r (such as a top view area).

蓋板155配置在電路板140上且遮蓋開口140a,以遮蓋第一凹部130r及第二凹部140r,可避免位於第一凹部130r及第二凹部140r內的聲波傳遞介質150從開口140a外漏。此外,雖然圖未繪示,超音波探頭100更包括一黏合層,其形成於蓋板155與電路板140之間,以固定蓋板155與電路板140的相對位置。綜上,聲波傳遞介質150被導電膠130、電路板140與蓋板155封閉在第一凹部130r及第二凹部140r內。此外,蓋板155允許聲波穿出,其具有例如是80%、85%、90%或95%以上的聲波穿透率。在一實施例中,蓋板155可以是透光或非透光蓋板。以材質來說,蓋板155的材料包含樹脂,如聚胺酯。The cover plate 155 is disposed on the circuit board 140 and covers the opening 140a to cover the first concave portion 130r and the second concave portion 140r, so as to avoid the leakage of the acoustic wave transmission medium 150 located in the first concave portion 130r and the second concave portion 140r from the opening 140a. In addition, although not shown in the figure, the ultrasonic probe 100 further includes an adhesive layer formed between the cover plate 155 and the circuit board 140 to fix the relative position of the cover plate 155 and the circuit board 140. In summary, the acoustic wave transmission medium 150 is enclosed in the first concave portion 130r and the second concave portion 140r by the conductive adhesive 130, the circuit board 140 and the cover plate 155. In addition, the cover plate 155 allows sound waves to pass through, which has a sound wave transmittance of, for example, 80%, 85%, 90%, or 95% or more. In an embodiment, the cover plate 155 may be a transparent or non-transparent cover plate. In terms of material, the material of the cover plate 155 includes resin, such as polyurethane.

如第1B圖所示,封裝體160包覆微機械超音波換能器基板110、接地層120、導電膠130、電路板140的一部分及蓋板150。電路板140的另一部分突出於封裝體160,以電性連接於控制器10。封裝體160的材料包括酚醛基樹脂(Novolac-based resin)、環氧基樹脂(epoxy-based resin)、矽基樹脂(silicone-based resin)或其他適當之包覆劑。封裝體160亦可包括適當之填充劑,例如是粉狀之二氧化矽。此外,可利用數種封裝技術形成封裝體160,例如是壓縮成型(compression molding)、液態封裝型(liquid encapsulation)、注射成型(injection molding)或轉注成型(transfer molding)。As shown in FIG. 1B, the package body 160 covers the micromachined ultrasonic transducer substrate 110, the ground layer 120, the conductive adhesive 130, a part of the circuit board 140 and the cover plate 150. Another part of the circuit board 140 protrudes from the package body 160 and is electrically connected to the controller 10. The material of the package body 160 includes Novolac-based resin, epoxy-based resin, silicone-based resin or other suitable coating agent. The package 160 may also include a suitable filler, such as powdered silicon dioxide. In addition, several packaging techniques may be used to form the package body 160, such as compression molding, liquid encapsulation, injection molding, or transfer molding.

請參照第2A~2C圖,第2A圖繪示依照本發明另一實施例之超音波探頭200的俯視圖,第2B圖繪示第2A圖之超音波探頭200沿方向2B-2B’的剖面圖,而第2C圖繪示第2A圖之超音波探頭200沿方向2C-2C’的剖面圖。Please refer to FIGS. 2A~2C, FIG. 2A shows a top view of an ultrasonic probe 200 according to another embodiment of the present invention, and FIG. 2B shows a cross-sectional view of the ultrasonic probe 200 of FIG. 2A along the direction 2B-2B′ FIG. 2C shows a cross-sectional view of the ultrasonic probe 200 of FIG. 2A along the direction 2C-2C′.

超音波探頭200包括微機械超音波換能器基板210 ((以粗線繪製第2A圖之微機械超音波換能器基板210之外邊界))、接地層220、導電膠230、電路板140、聲波傳遞介質150、蓋板155、封裝體160及導電連接層270。微機械超音波換能器基板210具有發射面110u、聲波產生陣列111、至少一接地線110g、至少一訊號線110s及至少一擋牆212。聲波產生陣列111、接地線110g、訊號線110s及擋牆212形成於發射面110u。接地層120形成於發射面110u之邊緣,其中接地線110g連接聲波產生陣列111與接地層120。The ultrasonic probe 200 includes a micromechanical ultrasonic transducer substrate 210 ((drawing the outer boundary of the micromechanical ultrasonic transducer substrate 210 in FIG. 2A with a thick line)), a ground layer 220, a conductive adhesive 230, and a circuit board 140 , Acoustic wave transmission medium 150, cover plate 155, package body 160 and conductive connection layer 270. The micromechanical ultrasonic transducer substrate 210 has an emitting surface 110u, an acoustic wave generating array 111, at least one ground wire 110g, at least one signal wire 110s, and at least one retaining wall 212. The sound wave generating array 111, the ground wire 110g, the signal wire 110s, and the blocking wall 212 are formed on the emitting surface 110u. The ground layer 120 is formed on the edge of the emitting surface 110u, wherein the ground line 110g connects the sound wave generating array 111 and the ground layer 120.

在本實施例中,接地層220鄰接於微機械超音波換能器基板210之外側面210e,然本發明實施例不限於此。接地層220包含相連接之接地環221與二接地墊120g2。二接地墊120g2鄰近發射面110u之一對角配置。各接地墊120g2之寬度W1大於接地環221的寬度W2。由於接地層120之接地墊120g2提供一足夠寬度,可增加電路板140的接地墊(未繪示)與接地層220之接地墊120g2的上下重疊面積,提升電性連接品質。In this embodiment, the ground layer 220 is adjacent to the outer side 210e of the micromachined ultrasonic transducer substrate 210, but the embodiment of the present invention is not limited thereto. The ground layer 220 includes a connected ground ring 221 and two ground pads 120g2. The two ground pads 120g2 are arranged diagonally adjacent to one of the emitting surfaces 110u. The width W1 of each ground pad 120g2 is greater than the width W2 of the ground ring 221. Since the ground pad 120g2 of the ground layer 120 provides a sufficient width, the overlapping area of the ground pad (not shown) of the circuit board 140 and the ground pad 120g2 of the ground layer 220 can be increased to improve the electrical connection quality.

如第2A圖所示,接地層220之接地環221包括彼此分離之數個接地部221g,各接地部221g鄰近微機械超音波換能器基板110之外側面210e,例如是延伸至外側面210e。微機械超音波換能器基板110之各接地線110g連接對應之接地部221g。導電連接層270形成於微機械超音波換能器基板110之外側面210e,並連接此些接地部221g,使彼此分離的數個接地部221g透過導電連接層270電性連接。As shown in FIG. 2A, the ground ring 221 of the ground layer 220 includes several ground portions 221g separated from each other. Each ground portion 221g is adjacent to the outer side 210e of the micromachined ultrasonic transducer substrate 110, for example, extending to the outer side 210e . Each ground line 110g of the micromachined ultrasonic transducer substrate 110 is connected to the corresponding ground portion 221g. The conductive connection layer 270 is formed on the outer surface 210e of the micromachined ultrasonic transducer substrate 110, and is connected to the ground portions 221g, so that the ground portions 221g separated from each other are electrically connected through the conductive connection layer 270.

如第2B圖所示,整個接地層220透過接地墊120g2、導電膠230及電路板140的接地墊(未繪示)電性連接於電路板140的接地電位。如第2A圖所示,導電膠230包括數個分離的導電膠墊231。各導電膠墊231覆蓋對應之接地線110g或對應之訊號線110s。此些導電膠墊231與接地層220之數個接地部221g係彼此間隔,以避免訊號線110s透過導電膠墊231電性短路於接地部221g。在本實施例中,導電膠230的電性傳輸無方向性,即允許沿Z軸向、X軸向及Y軸向的電性傳輸。由於數個導電膠墊231彼此分離,因此即使導電膠230的電性傳輸無方向性,也不會導致相鄰二導電膠墊231電性短路。在一實施例中,導電膠230例如是銀膠,然亦可為其它導電材料。此外,如第2A及2B圖所示,訊號線110s自聲波產生陣列111往發射面110u之邊緣的方向延伸且相距微機械超音波換能器基板110之外側面210e一距離H1,距離H1可避免導電連接層270接觸到訊號線110s。在一實施例中,距離H1例如是大於10微米,如介於150微米與250微米之間。前述數值範圍足以避免導電連接層270接觸到訊號線110s。As shown in FIG. 2B, the entire ground layer 220 is electrically connected to the ground potential of the circuit board 140 through the ground pad 120g2, the conductive adhesive 230, and the ground pad (not shown) of the circuit board 140. As shown in FIG. 2A, the conductive adhesive 230 includes a plurality of separated conductive adhesive pads 231. Each conductive adhesive pad 231 covers the corresponding ground wire 110g or the corresponding signal wire 110s. The conductive adhesive pads 231 and the grounding portions 221g of the ground layer 220 are spaced apart from each other to prevent the signal line 110s from being electrically short-circuited to the grounding portion 221g through the conductive adhesive pads 231. In this embodiment, the electrical transmission of the conductive adhesive 230 is non-directional, that is, electrical transmission along the Z axis, X axis, and Y axis is allowed. Since the conductive adhesive pads 231 are separated from each other, even if the electrical transmission of the conductive adhesive 230 is non-directional, it will not cause an electrical short circuit between the two adjacent conductive adhesive pads 231. In one embodiment, the conductive adhesive 230 is, for example, silver adhesive, but it can also be other conductive materials. In addition, as shown in FIGS. 2A and 2B, the signal line 110s extends from the acoustic wave generating array 111 toward the edge of the emitting surface 110u and is a distance H1 away from the outer side surface 210e of the micromechanical ultrasonic transducer substrate 110, and the distance H1 may be The conductive connection layer 270 is prevented from contacting the signal line 110s. In one embodiment, the distance H1 is, for example, greater than 10 microns, such as between 150 microns and 250 microns. The aforementioned numerical range is sufficient to prevent the conductive connection layer 270 from contacting the signal line 110s.

如第2A~2C圖所示,導電膠230之數個導電膠墊231分布在微機械超音波換能器基板110之發射面110u (第2A圖未繪示)的相對二邊緣,而二擋牆212分別位於發射面110u的另相對二邊緣,其中數個導電膠墊231與二擋牆212圍繞出第一凹部230r,第一凹部230r露出聲波產生陣列111。電路板140具有第二凹部140r。聲波傳遞介質150位於第一凹部230r及第二凹部140r內。由於擋牆212的配置,可阻擋位於第一凹部230r及第二凹部140r內的聲波傳遞介質150外漏。此外,由於數個分離的導電膠墊231相鄰配置(但不接觸),因此也對位於第一凹部230r及第二凹部140r內的聲波傳遞介質150產生一定的外漏阻力,此可減少外漏量或甚至無外漏。此外,在一實施例中,擋牆212與微機械超音波換能器基板110的板體可為一體成形結構。此外,擋牆212例如是絕緣擋牆,因此可避免訊號線110s透過導電膠230及擋牆212與接地層220電性短路。As shown in FIGS. 2A-2C, the conductive adhesive pads 231 of the conductive adhesive 230 are distributed on two opposite edges of the emitting surface 110u (not shown in FIG. 2A) of the micromachined ultrasonic transducer substrate 110, and the second block The walls 212 are respectively located at two opposite edges of the emitting surface 110u. A plurality of conductive adhesive pads 231 and the second blocking wall 212 surround the first concave portion 230r. The first concave portion 230r exposes the sound wave generating array 111. The circuit board 140 has a second recess 140r. The acoustic wave transmission medium 150 is located in the first concave portion 230r and the second concave portion 140r. Due to the configuration of the blocking wall 212, the sound wave transmission medium 150 located in the first concave portion 230r and the second concave portion 140r can be blocked from leaking. In addition, since several separated conductive adhesive pads 231 are arranged adjacent to each other (but not in contact), a certain external leakage resistance is also generated for the acoustic wave transmission medium 150 located in the first concave portion 230r and the second concave portion 140r, which can reduce the external leakage Leakage or even no leakage. In addition, in an embodiment, the retaining wall 212 and the plate body of the micromechanical ultrasonic transducer substrate 110 may be an integrally formed structure. In addition, the retaining wall 212 is, for example, an insulating retaining wall, so that the signal line 110s can be prevented from being electrically short-circuited with the ground layer 220 through the conductive adhesive 230 and the retaining wall 212.

請參照第3A~3B圖,第3A圖繪示依照本發明另一實施例之超音波探頭300的俯視圖,而第3B圖繪示第3A圖之超音波探頭300沿方向3B-3B’的剖面圖。Please refer to FIGS. 3A~3B. FIG. 3A illustrates a top view of an ultrasonic probe 300 according to another embodiment of the present invention, and FIG. 3B illustrates a cross section of the ultrasonic probe 300 of FIG. 3A along the direction 3B-3B′. Figure.

超音波探頭300包括微機械超音波換能器基板210、接地層220、導電膠230、電路板140、聲波傳遞介質150、蓋板155、封裝體160及導電連接層270。微機械超音波換能器基板210具有發射面110u、聲波產生陣列111、至少一接地線110g、至少一訊號線110s及至少一擋牆212。聲波產生陣列111、接地線110g及訊號線110s及擋牆212形成於發射面110u。接地層120形成於發射面110u之邊緣,其中接地線110g連接聲波產生陣列111與接地層120。The ultrasonic probe 300 includes a micromechanical ultrasonic transducer substrate 210, a ground layer 220, a conductive adhesive 230, a circuit board 140, an acoustic transmission medium 150, a cover plate 155, a package 160, and a conductive connection layer 270. The micromechanical ultrasonic transducer substrate 210 has an emitting surface 110u, an acoustic wave generating array 111, at least one ground wire 110g, at least one signal wire 110s, and at least one retaining wall 212. The sound wave generating array 111, the ground line 110g, the signal line 110s, and the blocking wall 212 are formed on the emitting surface 110u. The ground layer 120 is formed on the edge of the emitting surface 110u, wherein the ground line 110g connects the sound wave generating array 111 and the ground layer 120.

本發明實施例之超音波探頭300具有與前述超音波探頭200相同或相似的技術特徵,不同處在於,此些接地部221g與微機械超音波換能器基板210之外側面210e之間具有間隔H2,導電連接層270延伸至間隔H2內,即,延伸至發射面110u上方。此外,導電連接層270連接此些接地部221g,使數個分離的接地部221g透過導電連接層270電性連接。The ultrasonic probe 300 of the embodiment of the present invention has the same or similar technical features as the aforementioned ultrasonic probe 200, except that the grounding portion 221g and the outer surface 210e of the micromechanical ultrasonic transducer substrate 210 have a gap H2, the conductive connection layer 270 extends into the interval H2, that is, extends above the emission surface 110u. In addition, the conductive connection layer 270 is connected to the ground portions 221g, so that several separated ground portions 221g are electrically connected through the conductive connection layer 270.

請參照第4A~4B圖,第4A圖繪示依照本發明另一實施例之共振腔1111r及共振膜1112的俯視圖,而第4B圖繪示第4A圖之共振腔1111r及共振膜1112沿方向4B-4B’的剖面圖。前述超音波探頭100~300之任一者的微機械超音波換能器基板110或210更可包括數個突出牆113。突出牆113相對發射面110u係突出,且鄰近共振腔1111r配置。數個突出牆113環繞對應的共振腔1111r,其中各突出牆113的延伸方向與共振腔1111r之各邊係非平行。此外,相鄰二突出牆113之間的夾角A1例如是介於70度~100度之間。在一實施例中,各突出牆113的高度L1大於或實質上等於共振腔1111r的深度L2。突出牆113可增加微機械超音波換能器基板的強度,減少共振腔1111r及共振膜1112的變形量。如此,當超音波探頭抵壓在待測體(如人體)上時,突出牆113可減少共振腔1111r及共振膜1112受壓時的變形量,確保所產生的超聲波符合預期特性。此外,突出牆113與微機械超音波換能器基板的板體係一體成形結構,然本發明實施例不受此限。Please refer to FIGS. 4A~4B. FIG. 4A illustrates a top view of the resonant cavity 1111r and the resonant film 1112 according to another embodiment of the present invention, and FIG. 4B illustrates the resonant cavity 1111r and the resonant film 1112 of FIG. 4A along the direction. 4B-4B' sectional view. The micromechanical ultrasonic transducer substrate 110 or 210 of any one of the foregoing ultrasonic probes 100-300 may further include a plurality of protruding walls 113. The protruding wall 113 protrudes from the emitting surface 110u, and is disposed adjacent to the resonance cavity 1111r. Several protruding walls 113 surround the corresponding resonant cavity 1111r, wherein the extending direction of each protruding wall 113 is not parallel to each side of the resonant cavity 1111r. In addition, the angle A1 between the two adjacent protruding walls 113 is, for example, between 70 degrees and 100 degrees. In one embodiment, the height L1 of each protruding wall 113 is greater than or substantially equal to the depth L2 of the resonance cavity 1111r. The protruding wall 113 can increase the strength of the micromachined ultrasonic transducer substrate, and reduce the amount of deformation of the resonance cavity 1111r and the resonance film 1112. In this way, when the ultrasonic probe is pressed against the body to be measured (such as a human body), the protruding wall 113 can reduce the amount of deformation of the resonance cavity 1111r and the resonance film 1112 under pressure, and ensure that the generated ultrasonic waves conform to the expected characteristics. In addition, the protruding wall 113 is integrally formed with the plate system of the micromechanical ultrasonic transducer substrate, but the embodiment of the present invention is not limited thereto.

請參照第5A1~5F圖,其繪示第1A圖之超音波探頭100的製造過程圖。Please refer to FIGS. 5A1 to 5F, which illustrate the manufacturing process diagram of the ultrasonic probe 100 of FIG. 1A.

如第5A1及5A2圖所示,提供微機械超音波換能器基板110,其中微機械超音波換能器基板110包括發射面110u、聲波產生陣列111、至少一接地線110g及至少一訊號線110s。聲波產生陣列111包括至少一聲波產生單元1111,其中一條接地線110g及一條訊號線110s自對應的聲波產生單元1111延伸至發射面110u的邊緣。此外,接地層120形成於微機械超音波換能器基板110之發射面110u上,例如是形成於發射面110u之邊緣,其中接地線110g連接聲波產生陣列111與接地層120。As shown in FIGS. 5A1 and 5A2, a micromechanical ultrasonic transducer substrate 110 is provided, wherein the micromechanical ultrasonic transducer substrate 110 includes an emission surface 110u, an acoustic wave generating array 111, at least one ground wire 110g, and at least one signal wire 110s. The acoustic wave generating array 111 includes at least one acoustic wave generating unit 1111, wherein a ground line 110g and a signal line 110s extend from the corresponding acoustic wave generating unit 1111 to the edge of the emitting surface 110u. In addition, the ground layer 120 is formed on the emitting surface 110u of the micromachined ultrasonic transducer substrate 110, for example, formed on the edge of the emitting surface 110u, wherein the ground line 110g connects the sound wave generating array 111 and the ground layer 120.

如第5B1及5B2圖所示,可採用例如是塗佈技術,形成導電膠130覆蓋接地層120的至少一部分、接地線110g之一部分及訊號線110s之一部分。導電膠130具有第一凹部130r,第一凹部130r露出聲波產生陣列111,例如是露出全部的聲波產生單元1111。As shown in FIGS. 5B1 and 5B2, for example, a coating technique may be used to form a conductive adhesive 130 to cover at least a part of the ground layer 120, a part of the ground line 110g, and a part of the signal line 110s. The conductive paste 130 has a first concave portion 130r, and the first concave portion 130r exposes the acoustic wave generating array 111, for example, exposes all the acoustic wave generating units 1111.

如第5C圖所示,配置電路板140於導電膠130上,其中電路板140具有第二凹部140r,第二凹部140r露出聲波產生陣列111及第一凹部130r。第二凹部140r與第一凹部130r大致上重疊,如至少部分重疊。As shown in FIG. 5C, the circuit board 140 is disposed on the conductive adhesive 130, wherein the circuit board 140 has a second recess 140r, and the second recess 140r exposes the sound wave generating array 111 and the first recess 130r. The second recess 140r substantially overlaps the first recess 130r, for example, at least partially.

如第5D圖所示,可採用例如是注射技術,形成聲波傳遞介質150於第一凹部130r及第二凹部140r內。聲波傳遞介質150填滿第一凹部130r及第二凹部140r的至少一部分。As shown in FIG. 5D, for example, an injection technique may be used to form the acoustic wave transmission medium 150 in the first concave portion 130r and the second concave portion 140r. The acoustic wave transmission medium 150 fills at least a part of the first concave portion 130r and the second concave portion 140r.

如第5E圖所示,配置蓋板155覆蓋第二凹部140r之開口140a。雖然未繪示,然蓋板155與電路板140之間可形成有黏合層,以固定聲蓋板155與電路板140之間的相對位置。As shown in FIG. 5E, the cover plate 155 is arranged to cover the opening 140a of the second recess 140r. Although not shown, an adhesive layer may be formed between the cover 155 and the circuit board 140 to fix the relative position between the sound cover 155 and the circuit board 140.

如第5F圖所示,可採用例如是壓縮成型、液態封裝型、注射成型或轉注成型,形成封裝體160包覆微機械超音波換能器基板110、接地層220、導電膠130、電路板140的一部分及蓋板155,以形成超音波探頭100。電路板140的另一部分突出於封裝體160,以電性連接於控制器10(控制器10繪示於第1B圖)。As shown in FIG. 5F, for example, compression molding, liquid encapsulation, injection molding, or injection molding can be used to form the package body 160 to cover the micromechanical ultrasonic transducer substrate 110, the ground layer 220, the conductive adhesive 130, and the circuit board A part of 140 and the cover plate 155 to form the ultrasonic probe 100. Another part of the circuit board 140 protrudes from the package body 160 and is electrically connected to the controller 10 (the controller 10 is shown in FIG. 1B).

請參照第6A1~6H圖,其繪示第2A圖之超音波探頭200的製造過程圖。Please refer to FIGS. 6A1 to 6H, which illustrate the manufacturing process diagram of the ultrasonic probe 200 of FIG. 2A.

如第6A1及6A2圖所示,提供微機械超音波換能器基板210,其中具有發射面110u、聲波產生陣列111、至少一接地線110g、至少一訊號線110s及至少一擋牆212。聲波產生陣列111包括至少一聲波產生單元1111,其中一條接地線110g及一條訊號線110s自對應的聲波產生單元1111延伸至發射面110u的邊緣。擋牆212相對發射面110u係突出且與微機械超音波換能器基板210之板體例如是一體成形結構,然本發明實施例不受此限。As shown in FIGS. 6A1 and 6A2, a micromechanical ultrasonic transducer substrate 210 is provided, which has an emission surface 110u, an acoustic wave generation array 111, at least one ground line 110g, at least one signal line 110s, and at least one retaining wall 212. The acoustic wave generating array 111 includes at least one acoustic wave generating unit 1111, wherein a ground line 110g and a signal line 110s extend from the corresponding acoustic wave generating unit 1111 to the edge of the emitting surface 110u. The retaining wall 212 protrudes from the emitting surface 110u and is integrally formed with the plate body of the micromechanical ultrasonic transducer substrate 210, but the embodiment of the present invention is not limited thereto.

此外,接地層220形成於微機械超音波換能器基板210之發射面110u上,例如是形成於發射面110u之邊緣,其中接地線110g連接聲波產生陣列111與接地層220。接地層220包含相連接之接地環221與二接地墊120g2。二接地墊120g2鄰近發射面110u之一對角配置。In addition, the ground layer 220 is formed on the emitting surface 110u of the micromachined ultrasonic transducer substrate 210, for example, formed on the edge of the emitting surface 110u, wherein the ground line 110g connects the sound wave generating array 111 and the ground layer 220. The ground layer 220 includes a connected ground ring 221 and two ground pads 120g2. The two ground pads 120g2 are arranged diagonally adjacent to one of the emitting surfaces 110u.

如第6B圖所示,可採用塗佈技術,形成導電膠230覆蓋接地層220的至少一部分、接地線110g之一部分及訊號線110s之一部分。在本步驟中,如圖所示,導電膠230包含二條連續延伸的膠條230A及230B,膠條230A及230B分別位於發射面110u的相對二邊緣。各膠條230A及230B覆蓋位於同側邊緣的訊號線110s及接地線110g。二擋牆212分別位於發射面110u的另相對二邊緣,其中導電膠230與擋牆212圍繞出第一凹部230r,第一凹部230r露出聲波產生陣列111。在本實施例中,導電膠230的電性傳輸無方向性,即允許沿Z軸向、X軸向及Y軸向地電性傳輸。As shown in FIG. 6B, a coating technique may be used to form a conductive adhesive 230 to cover at least a part of the ground layer 220, a part of the ground line 110g, and a part of the signal line 110s. In this step, as shown in the figure, the conductive adhesive 230 includes two continuously extending adhesive strips 230A and 230B, and the adhesive strips 230A and 230B are respectively located at two opposite edges of the emitting surface 110u. The rubber strips 230A and 230B cover the signal line 110s and the ground line 110g located on the same side edge. The two retaining walls 212 are respectively located at two opposite edges of the emitting surface 110u, wherein the conductive adhesive 230 and the retaining wall 212 surround a first concave portion 230r, and the first concave portion 230r exposes the sound wave generating array 111. In this embodiment, the electrical transmission of the conductive adhesive 230 is non-directional, that is, it allows electrical transmission along the Z axis, the X axis, and the Y axis.

如第6C圖所示,可採用例如是切割技術,將導電膠230切割成數個分離的導電膠墊231且將接地環221切割成數個分離的接地部221g ,其中各接地線110g被對應的導電膠墊231覆蓋且各訊號線110s被對應的導電膠墊231覆蓋。由於數個導電膠墊231彼此分離,因此即使導電膠230的電性傳輸無方向性,也不會導致相鄰二導電膠墊231電性短路。此外,前述切割製程例如是採用刀具或雷射完成。As shown in FIG. 6C, for example, a cutting technique may be used to cut the conductive adhesive 230 into a plurality of separated conductive adhesive pads 231 and the ground ring 221 into a plurality of separated ground portions 221g, wherein each ground wire 110g is correspondingly conductive The rubber pad 231 is covered and each signal line 110s is covered by the corresponding conductive rubber pad 231. Since the conductive adhesive pads 231 are separated from each other, even if the electrical transmission of the conductive adhesive 230 is non-directional, it will not cause an electrical short circuit between the two adjacent conductive adhesive pads 231. In addition, the foregoing cutting process is completed by using a knife or a laser, for example.

如第6D圖所示,配置電路板140於數個導電膠墊231上,其中電路板140具有第二凹部140r,第二凹部140r露出聲波產生陣列111及第一凹部130r。第二凹部140r與第一凹部230r大致上重疊,如至少部分重疊。As shown in FIG. 6D, the circuit board 140 is disposed on a plurality of conductive adhesive pads 231, wherein the circuit board 140 has a second recess 140r, and the second recess 140r exposes the sound wave generating array 111 and the first recess 130r. The second recess 140r substantially overlaps the first recess 230r, for example, at least partially.

如第6E圖所示,可採用注射技術,形成聲波傳遞介質150於第一凹部230r及第二凹部140r內。聲波傳遞介質150填滿第一凹部230r及第二凹部140r的至少一部分。As shown in FIG. 6E, an injection technique may be used to form the acoustic wave transmission medium 150 in the first concave portion 230r and the second concave portion 140r. The acoustic wave transmission medium 150 fills at least a part of the first concave portion 230r and the second concave portion 140r.

如第6F圖所示,配置蓋板155覆蓋第二凹部140r之開口140a。雖然未繪示,然蓋板155與電路板140之間可形成有黏合層,以固定聲蓋板155與電路板140之間的相對位置。As shown in FIG. 6F, the cover plate 155 is arranged to cover the opening 140a of the second recess 140r. Although not shown, an adhesive layer may be formed between the cover 155 and the circuit board 140 to fix the relative position between the sound cover 155 and the circuit board 140.

如第6G圖所示,將電路板140反折,以露出微機械超音波換能器基板210的外側面210e及接地部221g。As shown in FIG. 6G, the circuit board 140 is folded back to expose the outer surface 210e of the micromachined ultrasonic transducer substrate 210 and the ground portion 221g.

如第6H圖所示,可採用例如是塗佈技術,形成導電連接層270形成於外側面210e。透過毛細現象,呈流動態的導電連接層270滲入到接地部221g與電路板140之間的間隙,並連接從外側面210e露出的所有接地部221g。接著,可加熱導電連接層270,以固化導電連接層270。As shown in FIG. 6H, for example, a coating technique may be used to form a conductive connection layer 270 formed on the outer side surface 210e. Through the capillary phenomenon, the conductive connection layer 270 in a dynamic state penetrates into the gap between the ground portion 221g and the circuit board 140, and connects all the ground portions 221g exposed from the outer side surface 210e. Next, the conductive connection layer 270 may be heated to cure the conductive connection layer 270.

然後,可採用例如是壓縮成型、液態封裝型、注射成型或轉注成型,形成封裝體160包覆第6H圖之微機械超音波換能器基板210、接地層220、導電膠230、電路板140的一部分及蓋板155,以形成超音波探頭200。電路板140的另一部分突出於封裝體160,以電性連接於控制器10(控制器10繪示於第1B圖)。Then, for example, compression molding, liquid encapsulation, injection molding, or injection molding may be used to form the package body 160 to cover the micromechanical ultrasonic transducer substrate 210, ground layer 220, conductive adhesive 230, and circuit board 140 of FIG. 6H. And the cover 155 to form the ultrasonic probe 200. Another part of the circuit board 140 protrudes from the package body 160 and is electrically connected to the controller 10 (the controller 10 is shown in FIG. 1B).

超音波探頭300的製造方法類似或同於前述超音波探頭200,於此不再贅述。The manufacturing method of the ultrasonic probe 300 is similar to or the same as that of the aforementioned ultrasonic probe 200, and will not be repeated here.

綜上所述,雖然本發明已以實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。因此,本發明之保護範圍當視後附之申請專利範圍所界定者為準。In summary, although the present invention has been disclosed as above with examples, it is not intended to limit the present invention. Those with ordinary knowledge in the technical field to which the present invention belongs can make various modifications and retouching without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention shall be deemed as defined by the scope of the attached patent application.

10:控制器 100、200、300:超音波探頭 110、210:微機械超音波換能器基板 110u:發射面 110e、210e:外側面 111:聲波產生陣列 1111:聲波產生單元 1111r:共振腔 1111s:訊號連接線 1111g:接地連接線 1112:共振膜 110g:接地線 110s:訊號線 113:突出牆 120、220:接地層 120g1:接地環 120g2:接地墊 130、230:導電膠 130r、230r:第一凹部 140:電路板 140a:開口 140r:第二凹部 140g:接地墊 140s:訊號墊 150:聲波傳遞介質 155:蓋板 160:封裝體 212:擋牆 221g:接地部 221:接地環 230A、230B:膠條 231:導電膠墊 270:導電連接層 A1:夾角 C1:控制訊號 E1:聲波發射方向 H1:距離 H2:間隔 L1:高度 L2:深度 W1、W2:寬度10: Controller 100, 200, 300: Ultrasonic probe 110, 210: Micromechanical ultrasonic transducer substrate 110u: launch surface 110e, 210e: outer side 111: Sound wave generating array 1111: Sound wave generating unit 1111r: Resonant cavity 1111s: signal cable 1111g: Ground connection cable 1112: Resonance membrane 110g: ground wire 110s: signal cable 113: Highlight the wall 120, 220: ground layer 120g1: ground ring 120g2: grounding pad 130, 230: conductive adhesive 130r, 230r: first recess 140: circuit board 140a: opening 140r: second recess 140g: grounding pad 140s: signal pad 150: Acoustic transmission medium 155: Cover 160: package 212: Retaining wall 221g: Ground 221: Ground ring 230A, 230B: rubber strip 231: conductive rubber pad 270: conductive connection layer A1: Angle C1: Control signal E1: Acoustic wave emission direction H1: distance H2: interval L1: height L2: depth W1, W2: width

第1A圖繪示依照本發明一實施例之超音波探頭的俯視圖。 第1B圖繪示第1圖之超音波探頭沿方向1B-1B’的剖面圖。 第2A圖繪示依照本發明另一實施例之超音波探頭的俯視圖。 第2B圖繪示第2A圖之超音波探頭沿方向2B-2B’的剖面圖。 第2C圖繪示第2A圖之超音波探頭沿方向2C-2C’的剖面圖。 第3A圖繪示依照本發明另一實施例之超音波探頭的俯視圖。 第3B圖繪示第3A圖之超音波探頭沿方向3B-3B’的剖面圖。 第4A圖繪示依照本發明另一實施例之共振腔及共振膜的俯視圖。 第4B圖繪示第4A圖之共振腔及共振膜沿方向4B-4B’的剖面圖。 第5A1~5F圖繪示第1A圖之超音波探頭的製造過程圖。 第6A1~6H圖繪示第2A圖之超音波探頭的製造過程圖。 FIG. 1A is a top view of an ultrasonic probe according to an embodiment of the invention. FIG. 1B is a cross-sectional view of the ultrasonic probe of FIG. 1 along the direction 1B-1B'. FIG. 2A is a top view of an ultrasonic probe according to another embodiment of the invention. Figure 2B shows a cross-sectional view of the ultrasonic probe of Figure 2A along the direction 2B-2B'. Figure 2C shows a cross-sectional view of the ultrasonic probe of Figure 2A along the direction 2C-2C'. FIG. 3A shows a top view of an ultrasonic probe according to another embodiment of the invention. Figure 3B shows a cross-sectional view of the ultrasonic probe of Figure 3A along the direction 3B-3B'. FIG. 4A is a top view of a resonant cavity and a resonant membrane according to another embodiment of the invention. FIG. 4B is a cross-sectional view of the resonant cavity and the resonant membrane of FIG. 4A along the direction 4B-4B'. Figures 5A1~5F show the manufacturing process diagram of the ultrasonic probe of Figure 1A. Figures 6A1~6H show the manufacturing process of the ultrasonic probe of Figure 2A.

100:超音波探頭 100: Ultrasonic probe

110:微機械超音波換能器基板 110: Micromechanical ultrasonic transducer substrate

110e:外側面 110e: outer side

111:聲波產生陣列 111: Sound wave generating array

1111:聲波產生單元 1111: Sound wave generating unit

110g:接地線 110g: ground wire

110s:訊號線 110s: signal cable

120:接地層 120: ground plane

130:導電膠 130: conductive adhesive

130r:第一凹部 130r: the first recess

140:電路板 140: circuit board

160:封裝體 160: package

W1、W2:寬度 W1, W2: width

Claims (10)

一種超音波探頭,包括: 一微機械超音波換能器基板,具有一發射面、一聲波產生陣列及一接地線,該聲波產生陣列及該接地線形成於該發射面;以及 一接地層,形成於該發射面之一邊緣; 其中,該接地線連接該聲波產生陣列與該接地層。 An ultrasonic probe includes: A micromechanical ultrasonic transducer substrate having an emitting surface, an acoustic wave generating array and a ground wire, the acoustic wave generating array and the ground wire are formed on the emitting surface; and A ground layer formed on one edge of the emitting surface; Wherein, the ground wire connects the sound wave generating array and the ground layer. 如申請專利範圍第1項所述的超音波探頭,其中該接地層呈一封閉環形。The ultrasonic probe according to item 1 of the patent application scope, wherein the ground layer has a closed ring shape. 如申請專利範圍第1項所述的超音波探頭,其中該接地層包含相連接之一接地環與二接地墊,該二接地墊鄰近該發射面之一對角配置,各該接地墊之一寬度大於該接地環的一寬度。The ultrasonic probe according to item 1 of the patent application scope, wherein the ground layer includes a ground ring and two ground pads connected to each other, the two ground pads are disposed diagonally adjacent to one of the emission surfaces, and one of each ground pad The width is larger than a width of the ground ring. 如申請專利範圍第1項所述的超音波探頭,其中該聲波產生陣列包括複數個該聲波產生單元,該接地層封閉式地環繞該些聲波產生單元。The ultrasonic probe according to item 1 of the patent application scope, wherein the sound wave generating array includes a plurality of the sound wave generating units, and the ground layer surrounds the sound wave generating units in a closed manner. 如申請專利範圍第1項所述的超音波探頭,更包括: 一導電膠,配置於該發射面上且具有一第一凹部; 一電路板,具有一開口,該電路板配置在該導電膠上且該開口對應該第一凹部形成一第二凹部;以及 一聲波傳遞介質,形成於該第一凹部及該第二凹部內; 其中,該導電膠沿一聲波發射方向位於該微機械超音波換能器基板之該接地線與該電路板之間。 The ultrasonic probe as described in item 1 of the patent application scope further includes: A conductive adhesive disposed on the emitting surface and having a first concave portion; A circuit board having an opening, the circuit board is disposed on the conductive adhesive and the opening corresponds to the first recess to form a second recess; and An acoustic wave transmission medium formed in the first concave portion and the second concave portion; Wherein, the conductive glue is located between the ground line of the micromachined ultrasonic transducer substrate and the circuit board along a sound wave emission direction. 如申請專利範圍第5項所述的超音波探頭,其中該導電膠為異方性導電膠。The ultrasonic probe as described in item 5 of the patent application scope, wherein the conductive adhesive is an anisotropic conductive adhesive. 如申請專利範圍第1項所述的超音波探頭,其中該接地層包括彼此分離之複數個接地部,各該接地部鄰近該微機械超音波換能器基板之一側面,該微機械超音波換能器基板包括複數個該接地線,各該接地線連接對應之該接地部;該超音波探頭更包括: 一導電連接層,形成於該側面,且連接該些接地部。 The ultrasonic probe according to item 1 of the patent application scope, wherein the ground layer includes a plurality of ground portions separated from each other, each of the ground portions is adjacent to a side surface of the micromechanical ultrasonic transducer substrate, the micromechanical ultrasonic wave The transducer substrate includes a plurality of the ground wires, and each of the ground wires is connected to the corresponding ground portion; the ultrasonic probe further includes: A conductive connection layer is formed on the side and connects the grounding portions. 如申請專利範圍第7項所述的超音波探頭,其中該微機械超音波換能器基板更包括一訊號線,該訊號線自該聲波產生陣列往該發射面之該邊緣的方向延伸且相距該微機械超音波換能器基板之一外側面一距離,該距離大於10微米。The ultrasonic probe as described in item 7 of the patent application scope, wherein the micromechanical ultrasonic transducer substrate further includes a signal line extending from the acoustic wave generating array toward the edge of the emitting surface at a distance The outer surface of one of the substrates of the micromachined ultrasonic transducer is at a distance greater than 10 microns. 如申請專利範圍第1項所述的超音波探頭,其中該聲波產生陣列包括一共振腔,該微機械超音波換能器基板更包括: 複數個突出牆,相對該發射面係突出,且鄰近該共振腔配置; 其中,各該突出牆的延伸方向與該共振腔之各邊係非平行。 The ultrasonic probe according to item 1 of the patent application scope, wherein the acoustic wave generating array includes a resonant cavity, and the micromechanical ultrasonic transducer substrate further includes: A plurality of protruding walls protruding relative to the emitting surface, and arranged adjacent to the resonant cavity; Wherein, the extending direction of each protruding wall is non-parallel to each side of the resonant cavity. 如申請專利範圍第9項所述的超音波探頭,其中各突出牆的高度大於或實質上等於該共振腔的深度。The ultrasonic probe according to item 9 of the patent application scope, wherein the height of each protruding wall is greater than or substantially equal to the depth of the resonant cavity.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW310370B (en) * 1995-10-13 1997-07-11 Meiko Denshi Kk
TW200427966A (en) * 2002-11-13 2004-12-16 Touch Panel Systems Kk Acoustic wave touch detecting apparatus
TW201111823A (en) * 2009-09-30 2011-04-01 Pai-Chi Li Ultrasonic image processing system and ultrasonic image processing method thereof
TW201500722A (en) * 2013-06-19 2015-01-01 Ind Tech Res Inst Ultrasonic flow meter and ultrasonic flow measuring

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW310370B (en) * 1995-10-13 1997-07-11 Meiko Denshi Kk
TW200427966A (en) * 2002-11-13 2004-12-16 Touch Panel Systems Kk Acoustic wave touch detecting apparatus
TW201111823A (en) * 2009-09-30 2011-04-01 Pai-Chi Li Ultrasonic image processing system and ultrasonic image processing method thereof
TW201500722A (en) * 2013-06-19 2015-01-01 Ind Tech Res Inst Ultrasonic flow meter and ultrasonic flow measuring

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