TWI691574B - Method for producing curd product, curd product, and a laminate containing the cured product - Google Patents

Method for producing curd product, curd product, and a laminate containing the cured product Download PDF

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TWI691574B
TWI691574B TW105119145A TW105119145A TWI691574B TW I691574 B TWI691574 B TW I691574B TW 105119145 A TW105119145 A TW 105119145A TW 105119145 A TW105119145 A TW 105119145A TW I691574 B TWI691574 B TW I691574B
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TW201710455A (en
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辻直子
顧蔚紅
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日商大賽璐股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • C08L101/02Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • C09J201/02Adhesives based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups

Abstract

The present invention provides a cured product having excellent thermal resistance, crack resistance (or cold-heat shock resistance) and adhesion and close attaching properties to an adhered article.
The cured product of this invention is obtained by carrying out a thermal treatment, which gradually changes curing-temperature, to a curing composition containing a compound having a polymerizable group, the degree of cure is 85% or less after a first stage of the thermal treatment, and allows the degree of cure to be over 85% by the second or the following stage of the thermal treatment. The compound having a polymerizable group is preferably a compound having a group selected from the group consisting of an epoxy group, an oxetanyl group, an ethylether group, and an ethylphenyl group, and especially preferably an epoxy-group modified polyorganosilsesquioxane.

Description

硬化物之製造方法、硬化物,及含有前述硬化物之積層物 Manufacturing method of hardened product, hardened product, and laminate containing the aforementioned hardened product

本發明係關於硬化物之製造方法、以前述方法所得之硬化物、及具有以前述硬化物接著被接著體之構成之積層物。本案係依2015年6月17日於日本申請之日本特願2015-122349號主張優先權,並援用其內容。 The present invention relates to a method for manufacturing a hardened product, a hardened product obtained by the aforementioned method, and a laminate having a structure in which the hardened product is subsequently adhered. This case claims priority based on Japanese Patent Application No. 2015-122349 filed in Japan on June 17, 2015, and invokes its content.

半導體之積層、電子零件之接著所使用之接著劑已知含有苯並環丁烯(BCB)、酚醛清漆系環氧樹脂、或環氧基改質聚有機矽倍半氧烷之熱硬化型接著劑(專利文獻1)。 Adhesives used for lamination of semiconductors and bonding of electronic parts are known to contain benzocyclobutene (BCB), novolac epoxy resin, or epoxy-modified polyorganosilsesquioxane. Agent (Patent Document 1).

但為了硬化含有BCB之熱硬化型接著劑,係需以200至350℃左右之高溫加熱,因暴露於前述高溫而有可能使接著體受到傷害。又,含有酚醛清漆系環氧樹脂之熱硬化型接著劑在實施無鉛回焊等高溫步驟(例如260至280℃)時,接著劑會分解產生釋氣,因此有接著性降低之問題。 However, in order to harden the thermosetting adhesive containing BCB, it needs to be heated at a high temperature of about 200 to 350°C, which may cause damage to the adhesive body due to exposure to the aforementioned high temperature. In addition, when thermosetting adhesives containing novolac-based epoxy resins are subjected to high-temperature steps such as lead-free reflow (for example, 260 to 280°C), the adhesives decompose to generate outgassing, so there is a problem of reduced adhesion.

另一方面,相較於含有BCB之熱硬化型接著劑,含有環氧基改質聚有機矽倍半氧烷之熱硬化型接著劑可在低溫硬化,可對於基板形成接著性及密著性優異之硬化物。又,實施高溫步驟時也可維持接著性。但含有環氧基改質聚有機矽倍半氧烷之熱硬化型接著劑之硬化物,係有因賦予冷熱衝撃而容易產生破裂之問題。 On the other hand, compared with thermosetting adhesives containing BCB, thermosetting adhesives containing epoxy-modified polyorganosilicon silsesquioxane can be hardened at low temperature, and can form adhesion and adhesion to the substrate Excellent hardening. In addition, the adhesion can be maintained even when the high-temperature step is performed. However, the cured product of the thermosetting adhesive containing epoxy-modified polyorganosilicon silsesquioxane has the problem that it is prone to cracking due to the hot and cold shock.

[先前技術文獻] [Prior Technical Literature] [專利文獻] [Patent Literature]

專利文獻1:日本特開2010-226060號公報。 Patent Document 1: Japanese Patent Laid-Open No. 2010-226060

因此,本發明之目的係提供耐熱性、耐破裂性(或耐冷熱衝撃性)、對被接著體之接著性及密著性優異之硬化物。 Therefore, an object of the present invention is to provide a hardened product excellent in heat resistance, crack resistance (or hot and cold impact resistance), adhesion to an adherend, and adhesion.

本發明之另一目的係提供具有透過前述硬化物接著被接著體之構成之積層物。 Another object of the present invention is to provide a laminate having a structure that passes through the hardened material and then is adhered.

本發明之另一目的係提供前述硬化物之製造方法。 Another object of the present invention is to provide a method for manufacturing the aforementioned hardened product.

本發明人等為了解決上述課題而努力研究,結果發現藉由對硬化性組成物實施階段性改變硬化溫度之加熱處理並硬化,且使第1階段之加熱處理結束時之硬化度為85%以下,而可獲得耐熱性、耐破裂性(或耐冷熱衝撃性)、對被接著體之接著性及密著性優異之硬化物。本 發明係根據該等發現而完成。 The present inventors have worked hard to solve the above-mentioned problems, and as a result, they have found that the curable composition is subjected to heat treatment in which the hardening temperature is changed stepwise and cured, and the curing degree at the end of the first-stage heat treatment is 85% or less In addition, a hardened product excellent in heat resistance, crack resistance (or cold and hot impact resistance), adhesion to an adherend, and adhesion can be obtained. this The invention is based on these findings.

亦即,本發明係提供一種硬化物,係對含有具有聚合性基之化合物之硬化性組成物實施階段性改變硬化溫度之加熱處理所得,第1階段之加熱處理結束時之硬化度為85%以下,藉由第2階段以後之加熱處理而使硬化度超過85%。 That is, the present invention provides a hardened product obtained by subjecting a hardenable composition containing a compound having a polymerizable group to a heat treatment in which the hardening temperature is changed stepwise, and the degree of hardening at the end of the first heat treatment is 85% In the following, the degree of hardening exceeds 85% by heat treatment after the second stage.

又,本發明係提供前述硬化物,其中具有聚合性基之化合物中的聚合性基為由環氧基、氧雜環丁基、乙烯醚基、及乙烯苯基所成群組所選擇之1種以上的基。 Furthermore, the present invention provides the aforementioned hardened product, wherein the polymerizable group in the compound having a polymerizable group is one selected from the group consisting of an epoxy group, an oxetanyl group, a vinyl ether group, and a vinyl phenyl group More than one kind of base.

又,本發明係提供前述硬化物,其中具有聚合性基之化合物為環氧基改質聚有機矽倍半氧烷,該環氧基改質聚有機矽倍半氧烷的特徵為:具有下述式(1)所示之構成單元,且下述式(I)所示之構成單元與下述式(II)所示之構成單元的莫耳比[式(I)所示之構成單元/式(II)所示之構成單元]為5以上;相對於矽氧烷構成單元總量(100莫耳%)之上述式(1)所示之構成單元及下述式(4)所示之構成單元的比例為55至100莫耳%,數目平均分子量為1000至3000,分子量分散度(重量平均分子量/數目平均分子量)為1.0至3.0。 In addition, the present invention provides the aforementioned hardened product, wherein the compound having a polymerizable group is an epoxy-modified polyorganosilsesquioxane. The characteristics of the epoxy-modified polyorganosilsesquioxane are: The structural unit represented by the formula (1) and the molar ratio of the structural unit represented by the following formula (I) and the structural unit represented by the following formula (II) [the structural unit represented by the formula (I)/ The structural unit represented by formula (II)] is 5 or more; the structural unit represented by the above formula (1) and the following formula (4) with respect to the total amount of siloxane constituent units (100 mol%) The ratio of the constituent units is 55 to 100 mol %, the number average molecular weight is 1000 to 3000, and the molecular weight dispersion degree (weight average molecular weight/number average molecular weight) is 1.0 to 3.0.

[R1SiO3/2] (1)式(1)中,R1表示含有環氧基之基。 [R 1 SiO 3/2 ] (1) In formula (1), R 1 represents an epoxy group-containing group.

[RaSiO3/2] (I)式(I)中,Ra表示含有環氧基之基、取代或無取代之芳基、 取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、取代或無取代之烯基、或氫原子。 [R a SiO 3/2 ] (I) In formula (I), R a represents an epoxy-containing group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted ring Alkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom.

[RbSiO2/2(ORc)] (II)式(II)中,Rb表示含有環氧基之基、取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、取代或無取代之烯基、或氫原子。Rc表示氫原子或碳數1至4之烷基。 [R b SiO 2/2 (OR c )] (II) In formula (II), R b represents an epoxy group-containing group, substituted or unsubstituted aryl group, substituted or unsubstituted aralkyl group, substituted or Unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom. R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.

[R1SiO2/2(ORc)] (4)式(4)中,R1係與式(1)中相同。Rc係與式(II)中相同。 [R 1 SiO 2/2 (OR c )] (4) In formula (4), R 1 is the same as in formula (1). R c is the same as in formula (II).

又,本發明係提供前述硬化物,其中上述R1為由下述式(1a)至(1d)所示之基所成群組所選擇之1種以上的基。 In addition, the present invention provides the aforementioned hardened product, wherein the R 1 is one or more groups selected from the group consisting of groups represented by the following formulas (1a) to (1d).

Figure 105119145-A0202-12-0004-2
Figure 105119145-A0202-12-0004-2

Figure 105119145-A0202-12-0004-3
Figure 105119145-A0202-12-0004-3

Figure 105119145-A0202-12-0004-4
Figure 105119145-A0202-12-0004-4

Figure 105119145-A0202-12-0004-5
式中,R1a,R1b,R1c,R1d相同或相異且表示直鏈或分支鏈狀之伸烷基。
Figure 105119145-A0202-12-0004-5
In the formula, R 1a , R 1b , R 1c and R 1d are the same or different and represent straight-chain or branched-chain alkylene.

又,本發明係提供前述硬化物,其中環氧基改質聚有機矽倍半氧烷係進一步含有下述式(2)所示之構成單元。 Furthermore, the present invention provides the aforementioned hardened product, wherein the epoxy-modified polyorganosilsesquioxane system further contains a structural unit represented by the following formula (2).

[R2SiO3/2] (2)式(2)中,R2表示取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、或取代或無取代之烯基。 [R 2 SiO 3/2 ] (2) In formula (2), R 2 represents substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted Alkyl, or substituted or unsubstituted alkenyl.

又,本發明提供前述硬化物,其中上述R2為取代或無取代之芳基。 In addition, the present invention provides the aforementioned hardened product, wherein R 2 is a substituted or unsubstituted aryl group.

又,本發明提供前述硬化物,其中硬化性組成物係進一步含有聚合起始劑。 Furthermore, the present invention provides the aforementioned cured product, wherein the curable composition further contains a polymerization initiator.

又,本發明提供前述硬化物,其中硬化性組成物係進一步含有聚合安定劑。 In addition, the present invention provides the aforementioned cured product, wherein the curable composition further contains a polymerization stabilizer.

又,本發明提供前述硬化物,其中硬化性組成物係進一步含有矽烷耦合劑。 Furthermore, the present invention provides the aforementioned hardened product, wherein the hardenable composition system further contains a silane coupling agent.

又,本發明提供一種硬化物之製造方法,係對含有具有聚合性基之化合物之硬化性組成物實施階段性改變硬化溫度之加熱處理而製造硬化物,其中,第1階段之加熱處理結束時之硬化度為85%以下,藉由第2階段以後之加熱處理而使硬化度超過85%。 In addition, the present invention provides a method for producing a cured product by performing a heat treatment in which the curing temperature is changed stepwise on a curable composition containing a compound having a polymerizable group, wherein the first stage of the heat treatment is completed The degree of curing is 85% or less, and the degree of curing exceeds 85% by the heat treatment after the second stage.

又,本發明提供一種積層物,係以3層以上所構成,且具有2層之被接著層、及該被接著層之間之接著層,其中,前述接著層係前述硬化物之層。 In addition, the present invention provides a laminate, which is composed of three or more layers, and has two layers to be adhered, and an adhesion layer between the adhered layers, wherein the adhesion layer is the layer of the cured product.

又,本發明提供一種裝置,係具有前述積 層物。 Furthermore, the present invention provides a device having the aforementioned product Layers.

亦即,本發明係關於以下所述。 That is, the present invention relates to the following.

[1]一種硬化物,係對含有具有聚合性基之化合物之硬化性組成物實施階段性改變硬化溫度之加熱處理所得,第1階段之加熱處理結束時之硬化度為85%以下,藉由第2階段以後之加熱處理而使硬化度超過85%。 [1] A hardened product obtained by subjecting a hardenable composition containing a compound having a polymerizable group to a heat treatment in which the hardening temperature is changed in stages, and the degree of hardening at the end of the first heat treatment is 85% or less, by The heat treatment after the second stage makes the degree of hardening exceed 85%.

[2]如[1]所記載之硬化物,其中具有聚合性基之化合物中的聚合性基為由環氧基、氧雜環丁基、乙烯醚基、及乙烯苯基所成群組所選擇之1種以上的基。 [2] The cured product as described in [1], wherein the polymerizable group in the compound having a polymerizable group is composed of an epoxy group, an oxetanyl group, a vinyl ether group, and a vinyl phenyl group Choose more than one type of base.

[3]如[1]所記載之硬化物,其中具有聚合性基之化合物為環氧基改質聚有機矽倍半氧烷,該環氧基改質聚有機矽倍半氧烷係:具有下述式(1)所示之構成單元,且下述式(I)所示之構成單元與下述式(II)所示之構成單元的莫耳比[式(I)所示之構成單元/式(II)所示之構成單元]為5以上;相對於矽氧烷構成單元總量(100莫耳%)之上述式(1)所示之構成單元及下述式(4)所示之構成單元的比例為55至100莫耳%,數目平均分子量為1000至3000,分子量分散度(重量平均分子量/數目平均分子量)為1.0至3.0。[R1SiO3/2] (1)式(1)中,R1表示含有環氧基之基。[RaSiO3/2] (I)式(I)中,Ra表示含有環氧基之基、取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、取代或無取代之烯基、或氫原子。 [RbSiO2/2(ORc)] (II)式(II)中,Rb表示含有環氧基之基、取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、取代或無取代之烯基、或氫原子。Rc表示氫原子或碳數1至4之烷基。[R1SiO2/2(ORc)] (4)式(4)中,R1係與式(1)中相同。Rc係與式(II)中相同。 [3] The hardened product as described in [1], wherein the compound having a polymerizable group is an epoxy-modified polyorganosilsesquioxane, and the epoxy-modified polyorganosilsesquioxane system has: The structural unit represented by the following formula (1), and the molar ratio of the structural unit represented by the following formula (I) and the structural unit represented by the following formula (II) [the structural unit represented by the formula (I) /The structural unit represented by formula (II)] is 5 or more; the structural unit represented by the above formula (1) and the following formula (4) with respect to the total amount of siloxane constituent units (100 mol %) The ratio of the constituent units is 55 to 100 mol%, the number average molecular weight is 1000 to 3000, and the molecular weight dispersion degree (weight average molecular weight/number average molecular weight) is 1.0 to 3.0. [R 1 SiO 3/2 ] (1) In formula (1), R 1 represents an epoxy group-containing group. [R a SiO 3/2 ] (I) In formula (I), R a represents an epoxy-containing group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted ring Alkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom. [R b SiO 2/2 (OR c )] (II) In formula (II), R b represents an epoxy group-containing group, substituted or unsubstituted aryl group, substituted or unsubstituted aralkyl group, substituted or Unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom. R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. [R 1 SiO 2/2 (OR c )] (4) In formula (4), R 1 is the same as in formula (1). R c is the same as in formula (II).

[4]如[3]所記載之硬化物,其中上述R1為由下述式(1a)至(1d)所示之基所成群組所選擇之1種以上的基。

Figure 105119145-A0202-12-0007-6
Figure 105119145-A0202-12-0007-7
Figure 105119145-A0202-12-0007-8
Figure 105119145-A0202-12-0007-9
式中,R1a、R1b、R1c、R1d係相同或相異且表示直鏈或分支鏈狀之伸烷基。 [4] The cured product according to [3], wherein the above R 1 is one or more groups selected from the group consisting of groups represented by the following formulas (1a) to (1d).
Figure 105119145-A0202-12-0007-6
Figure 105119145-A0202-12-0007-7
Figure 105119145-A0202-12-0007-8
Figure 105119145-A0202-12-0007-9
In the formula, R 1a , R 1b , R 1c and R 1d are the same or different and represent a straight-chain or branched-chain alkylene group.

[5]如[3]或[4]所記載之硬化物,其中環氧基改質聚有機矽倍半氧烷係進一步具有下述式(2)所示之構成單元。[R2SiO3/2] (2) 式(2)中,R2表示取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、或取代或無取代之烯基。 [5] The cured product according to [3] or [4], wherein the epoxy-modified polyorganosilsesquioxane system further has a structural unit represented by the following formula (2). [R 2 SiO 3/2 ] (2) In formula (2), R 2 represents substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted Alkyl, or substituted or unsubstituted alkenyl.

[6]如[5]所記載之硬化物,其中上述R2為取代或無取代之芳基。 [6] The hardened product according to [5], wherein the above R 2 is a substituted or unsubstituted aryl group.

[7]如[5]或[6]所記載之硬化物,其中相對於環氧基改質聚有機矽倍半氧烷中的矽氧烷構成單元之總量(100莫耳%),上述式(1)所示之構成單元、上述式(2)所示之構成單元、上述式(4)所示之構成單元、及下述式(5)所示之構成單元的比例(總量)為60至100莫耳%。[R2SiO2/2(ORc)] (5)式(5)中,R2表示取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、或取代或無取代之烯基。Rc表示氫原子或碳數1至4之烷基。 [7] The hardened product as described in [5] or [6], wherein, relative to the total amount (100 mol %) of the siloxane constituent units in the epoxy-modified polyorganosilsesquioxane, the above The ratio (total amount) of the structural unit represented by the formula (1), the structural unit represented by the above formula (2), the structural unit represented by the above formula (4), and the structural unit represented by the following formula (5) 60 to 100 mol%. [R 2 SiO 2/2 (OR c )] (5) In formula (5), R 2 represents a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, Substituted or unsubstituted alkyl, or substituted or unsubstituted alkenyl. R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.

[8]如[3]至[7]中任一項所記載之硬化物,其中相對於除去溶劑之硬化性組成物之總量(100重量%),硬化性組成物中的上述聚合性化合物之含量(配合量)為70重量%以上且未滿100重量%,環氧基改質聚有機矽倍半氧烷的比例為聚合性化合物總量(100重量%)之70重量%以上。 [8] The cured product according to any one of [3] to [7], wherein the polymerizable compound in the curable composition is the total amount (100% by weight) of the curable composition excluding the solvent The content (compounding amount) is 70% by weight or more and less than 100% by weight, and the proportion of epoxy-modified polyorganosilsesquioxane is 70% by weight or more of the total polymerizable compound (100% by weight).

[9]如[1]至[8]中任一項所記載之硬化物,其中硬化性組成物係進一步含有聚合起始劑。 [9] The cured product according to any one of [1] to [8], wherein the curable composition further contains a polymerization initiator.

[10]如[1]至[9]中任一項所記載之硬化物,其中硬化性組成物係進一步含有聚合安定劑。 [10] The cured product according to any one of [1] to [9], wherein the curable composition further contains a polymerization stabilizer.

[11]如[1]至[10]中任一項所記載之硬化物,其中硬化性組 成物係進一步含有矽烷耦合劑。 [11] The hardened product as described in any one of [1] to [10], wherein the hardening group The adult system further contains a silane coupling agent.

[12]如[1]至[11]中任一項所記載之硬化物,其中熱分解溫度為200℃以上。 [12] The cured product according to any one of [1] to [11], wherein the thermal decomposition temperature is 200° C. or higher.

[13]一種硬化物之製造方法,係對含有具有聚合性基之化合物之硬化性組成物實施階段性改變硬化溫度之加熱處理而製造硬化物,第1階段之加熱處理結束時之硬化度為85%以下,藉由第2階段以後之加熱處理而使硬化度超過85%。 [13] A method for manufacturing a hardened product, which is to perform a heat treatment in which the hardening composition containing a compound having a polymerizable group is changed stepwise to a curing temperature to produce a hardened product, and the degree of curing at the end of the first stage of the heat treatment is Below 85%, the degree of hardening exceeds 85% by heat treatment after the second stage.

[14]如[13]所記載之硬化物之製造方法,其中具有聚合性基之化合物係含有環氧基改質聚有機矽倍半氧烷,該環氧基改質聚有機矽倍半氧烷係:具有下述式(1)所示之構成單元,下述式(I)所示之構成單元與下述式(II)所示之構成單元的莫耳比[式(I)所示之構成單元/式(II)所示之構成單元]為5以上,相對於矽氧烷構成單元之總量(100莫耳%)之上述式(1)所示之構成單元及下述式(4)所示之構成單元的比例為55至100莫耳%,數目平均分子量為1000至3000,分子量分散度(重量平均分子量/數目平均分子量)為1.0至3.0。[R1SiO3/2] (1)式(1)中,R1表示含有環氧基之基。[RaSiO3/2] (I)式(I)中,Ra表示含有環氧基之基、取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、取代或無取代之烯基、或氫原子。 [RbSiO2/2(ORc)] (II)式(II)中,Rb表示含有環氧基之基、取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、取代或無取代之烯基、或氫原子。Rc表示氫原子或碳數1至4之烷基。[R1SiO2/2(ORc)] (4)式(4)中,R1係與式(1)中相同。Rc係與式(II)中相同。 [14] The method for producing a hardened product as described in [13], wherein the compound having a polymerizable group contains epoxy-modified polyorganosilicon silsesquioxane, and the epoxy-modified polyorganosilicon silsesquioxane Alkanes: having a structural unit represented by the following formula (1), a molar ratio of a structural unit represented by the following formula (I) and a structural unit represented by the following formula (II) [represented by the formula (I) The constitutional unit/the constitutional unit represented by formula (II)] is 5 or more, and the constitutional unit represented by the above formula (1) and the following formula (1) with respect to the total amount (100 mole %) of siloxane constituent units 4) The ratio of the constituent units shown is 55 to 100 mol%, the number average molecular weight is 1000 to 3000, and the molecular weight dispersion degree (weight average molecular weight/number average molecular weight) is 1.0 to 3.0. [R 1 SiO 3/2 ] (1) In formula (1), R 1 represents an epoxy group-containing group. [R a SiO 3/2 ] (I) In formula (I), R a represents an epoxy-containing group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted ring Alkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom. [R b SiO 2/2 (OR c )] (II) In formula (II), R b represents an epoxy group-containing group, substituted or unsubstituted aryl group, substituted or unsubstituted aralkyl group, substituted or Unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom. R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. [R 1 SiO 2/2 (OR c )] (4) In formula (4), R 1 is the same as in formula (1). R c is the same as in formula (II).

[15]如[13]或[14]所記載之硬化物之製造方法,其中第1階段之加熱處理係進行5分鐘以上。 [15] The method for producing a cured product as described in [13] or [14], wherein the first-stage heat treatment is performed for 5 minutes or more.

[16]如[15]所記載之硬化物之製造方法,其中第1階段之加熱處理中的加熱溫度為90℃以上且未滿150℃。 [16] The method for producing a cured product as described in [15], wherein the heating temperature in the first-stage heating treatment is 90° C. or more and less than 150° C.

[17]如[13]至[16]中任一項所記載之硬化物之製造方法,其中第2階段以後之加熱處理中的加熱溫度為150至200℃。 [17] The method for producing a cured product according to any one of [13] to [16], wherein the heating temperature in the heat treatment after the second stage is 150 to 200°C.

[18]如[13]至[17]中任一項所記載之硬化物之製造方法,其中第2階段以後之加熱處理中的加熱時間為5至120分鐘。 [18] The method for producing a hardened product according to any one of [13] to [17], wherein the heating time in the heat treatment after the second stage is 5 to 120 minutes.

[19]如[13]至[18]中任一項所記載之硬化物之製造方法,其中第1階段與第2階段加熱處理之時間合計(進行第3階段以後時,亦合計第3階段以後之加熱處理所需要的時間)為0.5至2小時。 [19] The method for manufacturing a hardened product as described in any one of [13] to [18], wherein the heat treatment time of the first stage and the second stage is totaled (when the third stage and later are performed, the third stage is also added) The time required for the subsequent heat treatment) is 0.5 to 2 hours.

[20]一種積層物,係3層以上所構成,且具有2層之被接著層、及該被接著層之間之接著層,其中,前述接著層係[1]至[12]中任一項所記載之硬化物之層。 [20] A laminate consisting of three or more layers and having two layers to be bonded, and a bonding layer between the bonded layers, wherein the bonding layer is any one of [1] to [12] The hardened layer described in the item.

[21]一種裝置,係具有[20]所記載之積層物。 [21] An apparatus having the laminate as described in [20].

若積層物中之接著層產生破裂或剝離,則會成為被接著層剝離、線路被破壞之原因,結果會成為具備積層物之裝置的故障之原因,但本發明之硬化物係耐熱性、耐破裂性、對被接著體之接著性及密著性優異,故即使賦予冷熱衝撃也不會於接著層產生破裂、剝離,可形成具有信頼性之裝置。又,本發明之積層物為半導體晶片之三維積層體時,係較以往之半導體更高積體、省電,故若使用本發明之積層物,則可提供更小型之高性能電子機器。 If the adhesive layer in the laminate is cracked or peeled, it will cause the adhesive layer to be peeled off and the wiring will be destroyed. As a result, it will cause the failure of the device equipped with the laminate, but the hardened material of the present invention has heat resistance and resistance The crackability, adhesion to the adherend, and adhesion are excellent, so even if the hot and cold shocks are applied, the adhesive layer will not be cracked or peeled, and a device with trustworthiness can be formed. In addition, when the laminate of the present invention is a three-dimensional laminate of a semiconductor wafer, it is higher in volume and power-saving than conventional semiconductors. Therefore, if the laminate of the present invention is used, a smaller and high-performance electronic device can be provided.

第1圖係表示硬化物之耐熱性評價方法之說明圖(熱重量分析結果之示意圖)。 Fig. 1 is an explanatory diagram showing a method of evaluating the heat resistance of a cured product (schematic diagram of thermogravimetric analysis results).

[硬化性組成物] [Hardening composition]

本發明中的硬化性組成物係至少含有具有聚合性基之化合物(以下稱為「聚合性化合物」)。本發明中的硬化性組成物係可進一步含有聚合起始劑、聚合安定劑、表面調整劑或表面改質劑等其他成分。 The curable composition in the present invention contains at least a compound having a polymerizable group (hereinafter referred to as "polymerizable compound"). The curable composition system in the present invention may further contain other components such as a polymerization initiator, a polymerization stabilizer, a surface modifier, or a surface modifier.

(具有聚合性基之化合物) (Compound with a polymerizable group)

前述具有聚合性基之化合物中的聚合性基,只要是可藉由實施加熱處理而聚合並形成硬化物的基即可,例如包括陽離子聚合性基、自由基聚合性基。本發明中,其中較佳為由環氧基、氧雜環丁基、乙烯醚基、及乙烯苯基所成群組所選擇之1種以上的基。 The polymerizable group in the compound having a polymerizable group may be any group that can be polymerized by heat treatment to form a cured product, and includes, for example, a cationic polymerizable group and a radical polymerizable group. In the present invention, among them, one or more groups selected from the group consisting of an epoxy group, an oxetanyl group, a vinyl ether group, and a vinyl phenyl group are preferred.

亦即,本發明中的聚合性化合物較佳為由具有環氧基之化合物(以下稱為「環氧化合物」)、具有氧雜環丁基之化合物(以下稱為「氧雜環丁烷化合物」)、具有乙烯醚基之化合物(以下稱為「乙烯醚化合物」)、及具有乙烯苯基之化合物(以下稱為「乙烯苯基化合物」)所成群組所選擇之1種以上之化合物。 That is, the polymerizable compound in the present invention is preferably a compound having an epoxy group (hereinafter referred to as an "epoxy compound") and a compound having an oxetanyl group (hereinafter referred to as an "oxetane compound" ”), a compound having a vinyl ether group (hereinafter referred to as a “vinyl ether compound”), and a compound having a vinyl phenyl group (hereinafter referred to as a “vinyl phenyl compound”) selected from more than one type of compound .

(環氧化合物) (Epoxy compound)

環氧化合物可使用分子內具有1個以上環氧基(環氧乙烷環)之公知或慣用化合物,並無特別限定,但可舉例如環氧基改質矽氧烷化合物、脂環式環氧化合物(脂環式環氧樹脂)、芳香族環氧化合物(芳香族環氧樹脂)、脂肪族環氧化合物(脂肪族環氧樹脂)等。 The epoxy compound may be a known or conventional compound having one or more epoxy groups (ethylene oxide ring) in the molecule, and is not particularly limited, but examples thereof include epoxy-modified silicone compounds and alicyclic rings. Oxygen compounds (alicyclic epoxy resin), aromatic epoxy compounds (aromatic epoxy resin), aliphatic epoxy compounds (aliphatic epoxy resin), etc.

<環氧基改質矽氧烷化合物> <Epoxy-modified silicone compound>

上述環氧基改質矽氧烷化合物可舉例如環氧基改質聚矽氧、環氧基改質聚有機矽倍半氧烷等。該等可單獨使用1種或組合2種以上使用。 Examples of the epoxy-modified silicone compound include epoxy-modified polysiloxane, epoxy-modified polyorganosilsesquioxane, and the like. These can be used alone or in combination of two or more.

前述環氧基改質聚矽氧係在二甲基聚矽氧骨架之末端及側鏈之至少1者導入環氧基(例如環氧丙基、脂環環氧基等)之化合物。 The epoxy-modified polysiloxane is a compound in which an epoxy group (for example, epoxypropyl group, alicyclic epoxy group, etc.) is introduced into at least one of the terminal and side chain of the dimethyl polysiloxane skeleton.

前述環氧基改質聚有機矽倍半氧烷係具有矽倍半氧烷構造及與其鍵結之環氧基之聚矽氧烷化合物,前述矽倍半氧烷構造係包括無規型構造、籠型構造、及梯子(ladder)型構造。 The epoxy-modified polyorganosilsesquioxane system has a silsesquioxane structure and an epoxy-bonded polysiloxane compound bonded thereto. The silsesquioxane structure includes a random structure, Cage-type structure and ladder-type structure.

較佳之環氧基改質聚有機矽倍半氧烷係可 舉例下述化合物,該化合物具有下述式(1)所示之構成單元,下述式(I)所示之構成單元(以下稱為「T3體」)與下述式(II)所示之構成單元(以下稱為「T2體」)的莫耳比[式(I)所示之構成單元/式(II)所示之構成單元;以下記載為「T3體/T2體」]為5以上,相對於矽氧烷構成單元之總量(100莫耳%)之上述式(1)所示之構成單元及下述式(4)所示之構成單元的比例(總量)為55至100莫耳%,數目平均分子量為1000至3000,分子量分散度(重量平均分子量/數目平均分子量)為1.0至3.0。 The better epoxy-modified polyorganosilicon silsesquioxane system can The following compounds are exemplified, the compound having a structural unit represented by the following formula (1), a structural unit represented by the following formula (I) (hereinafter referred to as "T3 body") and a compound represented by the following formula (II) The molar ratio of the structural unit (hereinafter referred to as "T2 body") [the structural unit represented by formula (I)/the structural unit represented by formula (II); hereinafter described as "T3 body/T2 body"] is 5 or more , The ratio (total amount) of the structural unit shown in the above formula (1) and the structural unit shown in the following formula (4) with respect to the total amount (100 mole %) of the siloxane structural units is 55 to 100 Molar %, the number average molecular weight is 1000 to 3000, and the molecular weight dispersion degree (weight average molecular weight/number average molecular weight) is 1.0 to 3.0.

[R1SiO3/2] (1)式(1)中,R1表示含有環氧基之基。 [R 1 SiO 3/2 ] (1) In formula (1), R 1 represents an epoxy group-containing group.

[RaSiO3/2] (I)式(I)中,Ra表示含有環氧基之基、取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、取代或無取代之烯基、或氫原子。 [R a SiO 3/2 ] (I) In formula (I), R a represents an epoxy-containing group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted ring Alkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom.

[RbSiO2/2(ORc)] (II)式(II)中,Rb表示含有環氧基之基、取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、取代或無取代之烯基、或氫原子。Rc表示氫原子或碳數1至4之烷基。 [R b SiO 2/2 (OR c )] (II) In formula (II), R b represents an epoxy group-containing group, substituted or unsubstituted aryl group, substituted or unsubstituted aralkyl group, substituted or Unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom. R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.

[R1SiO2/2(ORc)] (4)式(4)中,R1係與式(1)中相同,Rc係與式(II)中相同。 [R 1 SiO 2/2 (OR c )] (4) In formula (4), R 1 is the same as in formula (1), and R c is the same as in formula (II).

若更詳細記載上述式(I)所示之構成單元,則為下述式(I')所示。又,若更詳細記載上述式(II)所示之 構成單元,則為下述式(II')所示。下述式(I')所示構造中所示之鍵結於矽原子之3個氧原子,係分別與其他矽原子(式(I')未表示之矽原子)鍵結。又,位於下述式(II')所示構造中所示之矽原子的上及下的2個氧原子,亦分別與其他矽原子(式(II')未表示之矽原子)鍵結。亦即,上述T3體及T2體一般皆為[RSiO3/2]所示之構成單元(亦即T單元),係藉由對應之水解性三官能矽烷化合物之水解及縮合反應而形成。又,上述式中之R係表示氫原子或一價有機基,以下亦同。 If the structural unit represented by the above formula (I) is described in more detail, it is represented by the following formula (I′). In addition, if the structural unit represented by the above formula (II) is described in more detail, it is represented by the following formula (II′). The three oxygen atoms bonded to the silicon atom shown in the structure shown in the following formula (I') are respectively bonded to other silicon atoms (silicon atoms not represented by the formula (I')). In addition, the two oxygen atoms located above and below the silicon atoms shown in the structure represented by the following formula (II') are also bonded to other silicon atoms (silicon atoms not represented by the formula (II')), respectively. That is, the T3 body and the T2 body are generally the structural units (ie, T units) represented by [RSiO 3/2 ], and are formed by the hydrolysis and condensation reaction of the corresponding hydrolyzable trifunctional silane compound. In addition, R in the above formula represents a hydrogen atom or a monovalent organic group, and the same applies hereinafter.

Figure 105119145-A0202-12-0014-10
Figure 105119145-A0202-12-0014-10

Figure 105119145-A0202-12-0014-11
Figure 105119145-A0202-12-0014-11

上述式(I)中之Ra(式(I')中之Ra亦相同)及式(II)中之Rb(式(II')中之Rb亦相同)係分別表示含有環氧基之基、取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、取代或無取代之烯基、或氫原子。Ra及Rb之具體例可例示與後述式(1)中的R1、式(2)中的R2相同者。又,式(I)中之Ra及式(II) 中之Rb係分別源自於使用作為環氧基改質聚有機矽倍半氧烷之原料之水解性三官能矽烷化合物中鍵結於矽原子的基(烷氧基及鹵原子以外的基;例如後述式(a)至(c)中的R1、R2、氫原子等)。 In the above formula (I) R a (formula (I 'in the middle of) R a are also the same) and formula (II) R b (formula (II' of the) R b are also the same) respectively comprising an epoxy-based Radical, substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom. Specific examples of R a and R b can be the same as R 1 in formula (1) and R 2 in formula (2) described later. Further, in the middle of the formula (I) R a and formula (II) R b lines were derived from an epoxy group is used as the modified polyethylene bonded hydrolyzable organic silicon material of the silsesquioxane compound of trifunctional Silane Groups based on silicon atoms (groups other than alkoxy groups and halogen atoms; for example, R 1 , R 2 , and hydrogen atoms in formulae (a) to (c) described later).

上述式(II)中之(ORc)基(式(II')中之(ORc)基亦相同)係表示羥基或碳數1至4之烷氧基。碳數1至4之烷氧基可舉例如甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基等碳數1至4之烷氧基等。式(II)中之(ORc)基一般係源自於使用作為環氧基改質聚有機矽倍半氧烷之原料之水解性矽烷化合物中的烷氧基(例如作為後述X1至X3之烷氧基等)。 In the above formula (II) (OR c) group (in the formula (II ') (OR c) are also the same yl) system represents a hydroxyl group or an alkoxy group having a carbon number of 1-4. Examples of the alkoxy group having 1 to 4 carbon atoms include alkoxy groups having 1 to 4 carbon atoms such as methoxy, ethoxy, propoxy, isopropoxy, butoxy, and isobutoxy groups. The (OR c ) group in formula (II) is generally derived from the alkoxy group in the hydrolyzable silane compound used as the raw material of the epoxy-modified polyorganosilsesquioxane (for example, as X 1 to X described later) 3 alkoxy, etc.).

上述式(1)所示之構成單元係T單元(尤其是T3體),係藉由對應之水解性三官能矽烷化合物(例如後述式(a)所示之化合物)之水解及縮合反應而形成。 The structural unit represented by the above formula (1) is a T unit (especially T3 body), which is formed by hydrolysis and condensation reaction of a corresponding hydrolyzable trifunctional silane compound (for example, a compound represented by formula (a) described later) .

式(1)中之R1係表示含有環氧基之基(一價基)。上述含有環氧基之基可舉出具有環氧乙烷環之公知或慣用的基,並無特別限定,但以硬化性組成物之硬化性及硬化物之耐熱性之觀點而言,較佳為由下述式(1a)至(1d)所示之基所成群組所選擇之1種以上的基,其中更佳為下述式(1a)或(1c)所示之基,特佳為下述式(1a)所示之基。 R 1 in formula (1) represents an epoxy group-containing group (monovalent group). The epoxy group-containing group may be a known or conventional group having an ethylene oxide ring, and it is not particularly limited, but it is preferably from the viewpoint of the curability of the curable composition and the heat resistance of the cured product One or more groups selected from the group consisting of the groups represented by the following formulas (1a) to (1d), of which the group represented by the following formula (1a) or (1c) is more preferred, particularly preferred It is a base represented by the following formula (1a).

Figure 105119145-A0202-12-0016-12
Figure 105119145-A0202-12-0016-12

Figure 105119145-A0202-12-0016-13
Figure 105119145-A0202-12-0016-13

Figure 105119145-A0202-12-0016-14
Figure 105119145-A0202-12-0016-14

Figure 105119145-A0202-12-0016-15
Figure 105119145-A0202-12-0016-15

式中,R1a、R1b、R1c、R1d係相同或相異且表示直鏈或分支鏈狀之伸烷基,可舉例如亞甲基、甲基亞甲基、二甲基亞甲基、伸乙基、伸丙基、三亞甲基、四亞甲基、五亞甲基、六亞甲基、十亞甲基等碳數1至10之直鏈或分支鏈狀之伸烷基。 In the formula, R 1a , R 1b , R 1c and R 1d are the same or different and represent a straight-chain or branched-chain alkylene group, and examples include methylene, methylmethylene and dimethylmethylene Straight or branched chain alkylene groups with 1 to 10 carbon atoms, such as alkyl, ethylidene, propylidene, trimethylene, tetramethylene, pentamethylene, hexamethylene, decamethylene, etc. .

其中,R1a、R1b、R1c、R1d較佳為碳數1至4之直鏈狀伸烷基、碳數3或4之分支鏈狀伸烷基,更佳為伸乙基、三亞甲基、伸丙基,又更佳為伸乙基、三亞甲基。 Among them, R 1a , R 1b , R 1c and R 1d are preferably straight-chain alkylene having 1 to 4 carbon atoms, branched chain alkylene having 3 or 4 carbon atoms, and more preferably ethylidene or trialkylene Methyl and propyl, and more preferably ethyl and trimethylene.

式(1)中之R1特佳為上述式(1a)所示之基且R1a為伸乙基之基[例如2-(3',4'-環氧環己基)乙基]。 R 1 in formula (1) is particularly preferably a group represented by the above formula (1a) and R 1a is an ethylidene group [for example, 2-(3′,4′-epoxycyclohexyl)ethyl].

環氧基改質聚有機矽倍半氧烷可為僅具有1種上述式(1)所示之構成單元者,也可為具有2種以上之上述式(1)所示之構成單元者。 The epoxy-modified polyorganosilsesquioxane may have only one type of structural unit represented by the above formula (1), or may have two or more types of structural units represented by the above formula (1).

環氧基改質聚有機矽倍半氧烷中,作為T 單元(尤其是T3體),除了上述式(1)所示之構成單元以外,也可具有下述式(2) Epoxy-modified polyorganosilicon silsesquioxane, as T The unit (especially the T3 body) may have the following formula (2) in addition to the structural unit represented by the above formula (1)

[R2SiO3/2] (2)所示之構成單元。上述式(2)所示之構成單元係藉由對應之水解性三官能矽烷化合物(例如後述式(b)所示之化合物)之水解及縮合反應而形成。 [R 2 SiO 3/2 ] The structural unit shown in (2). The structural unit represented by the above formula (2) is formed by the hydrolysis and condensation reaction of a corresponding hydrolyzable trifunctional silane compound (for example, a compound represented by the formula (b) described later).

上述式(2)中之R2係表示取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、或取代或無取代之烯基。上述芳基可舉例如苯基、甲苯基、萘基等。上述芳烷基可舉例如苄基、苯乙基等。上述環烷基可舉例如環丁基、環戊基、環己基等。上述烷基可舉例如甲基、乙基、丙基、正丁基、異丙基、異丁基、第二丁基、第三丁基、異戊基等直鏈或分支鏈狀之烷基。上述烯基可例如乙烯基、烯丙基、異丙烯基等直鏈或分支鏈狀之烯基。 R 2 in the above formula (2) represents substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, or substituted or unsubstituted Alkenyl. Examples of the aryl group include phenyl, tolyl, and naphthyl. Examples of the aralkyl group include benzyl and phenethyl. Examples of the cycloalkyl group include cyclobutyl, cyclopentyl, and cyclohexyl. Examples of the alkyl group include straight-chain or branched-chain alkyl groups such as methyl, ethyl, propyl, n-butyl, isopropyl, isobutyl, second butyl, third butyl, and isopentyl groups. . The above-mentioned alkenyl group may be straight-chain or branched-chain alkenyl groups such as vinyl, allyl, and isopropenyl.

上述取代芳基、取代芳烷基、取代環烷基、取代烷基、取代烯基,可舉出將上述芳基、芳烷基、環烷基、烷基、烯基中的氫原子或主鏈骨架之一部分或全部以由醚基、酯基、羰基、矽氧烷基、鹵原子(氟原子等)、丙烯醯基、甲基丙烯醯基、巰基、胺基、及羥基(羥基)所成群組所選擇之至少1種所取代的基。 Examples of the substituted aryl group, substituted aralkyl group, substituted cycloalkyl group, substituted alkyl group, and substituted alkenyl group include the hydrogen atom or main group in the aryl group, aralkyl group, cycloalkyl group, alkyl group, and alkenyl group. Part or all of the chain skeleton is composed of ether groups, ester groups, carbonyl groups, siloxyalkyl groups, halogen atoms (fluorine atoms, etc.), acryl groups, methacryl groups, mercapto groups, amine groups, and hydroxyl groups (hydroxyl groups). At least one substituted group selected in groups.

其中,R2較佳為取代或無取代之芳基、取代或無取代之烷基、取代或無取代之烯基,更佳為取代或無取代之芳基,又更佳為苯基。 Among them, R 2 is preferably a substituted or unsubstituted aryl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, more preferably a substituted or unsubstituted aryl group, and still more preferably a phenyl group.

環氧基改質聚有機矽倍半氧烷中,式(1)所示之構成單元及式(2)所示之構成單元的比例,可因應用以形成該等構成單元之原料(水解性三官能矽烷)之組成而適宜調整。 In the epoxy-modified polyorganosilicon silsesquioxane, the ratio of the structural unit represented by formula (1) and the structural unit represented by formula (2) can be used to form the raw materials (hydrolyzability) of these structural units The composition of trifunctional silane) can be adjusted appropriately.

環氧基改質聚有機矽倍半氧烷中,作為T單元(尤其是T3體),除了上述式(1)所示之構成單元及式(2)所示之構成單元以外,可具有例如下述式(3)所示之構成單元。 In the epoxy-modified polyorganosilsesquioxane, as the T unit (especially the T3 body), in addition to the structural unit represented by the above formula (1) and the structural unit represented by the formula (2), it may have, for example The structural unit represented by the following formula (3).

[HSiO3/2] (3) [HSiO 3/2 ] (3)

環氧基改質聚有機矽倍半氧烷之上述比例[T3體/T2體]為5以上,係代表相對於T3體而存在一定以上之T2體。如此之T2體可舉例如下述式(4)所示之構成單元、下述式(5)所示之構成單元、下述式(6)所示之構成單元等。 The above ratio [T3 body/T2 body] of epoxy-modified polyorganosilsesquioxane is 5 or more, which means that there is a certain amount of T2 body relative to T3 body. Examples of such a T2 body include a structural unit represented by the following formula (4), a structural unit represented by the following formula (5), and a structural unit represented by the following formula (6).

[R1SiO2/2(ORc)] (4) [R 1 SiO 2/2 (OR c )] (4)

[R2SiO2/2(ORc)] (5) [R 2 SiO 2/2 (OR c )] (5)

[HSiO2/2(ORc)] (6)又,上述R1、R2、(ORc)係與前述相同。 [HSiO 2/2 (OR c )] (6) The above R 1 , R 2 , and (OR c ) are the same as described above.

環氧基改質聚有機矽倍半氧烷中,上述式(I)所示之構成單元(T3體)與上述式(II)所示之構成單元(T2體)的比例[T3體/T2體]係如上述般為5以上,較佳為5至18,更佳為6至16,又更佳為7至14。藉由使上述比例[T3體/T2體]為5以上,而可顯著提升硬化物之接著性。 In epoxy-modified polyorganosilsesquioxane, the ratio of the structural unit (T3 body) represented by the above formula (I) to the structural unit (T2 body) represented by the above formula (II) [T3 body/T2 As described above, the system is 5 or more, preferably 5 to 18, more preferably 6 to 16, and even more preferably 7 to 14. By setting the above ratio [T3 body/T2 body] to 5 or more, the adhesion of the hardened product can be significantly improved.

環氧基改質聚有機矽倍半氧烷中,上述比 例[T3體/T2體]係例如可由29Si-NMR光譜測定而求得。29Si-NMR光譜中,上述式(I)所示之構成單元(T3體)中的矽原子與上述式(II)所示之構成單元(T2體)中的矽原子係於不同位置(化學位移)顯示訊號(波峰),藉由計算個別波峰之積分比而求得上述比例[T3體/T2體]。例如,環氧基改質聚有機矽倍半氧烷具有上述式(1)所表示且R1為2-(3',4'-環氧環己基)乙基之構成單元時,上述式(I)所示構造(T3體)中的矽原子之訊號出現於-64至-70ppm,上述式(II)所示構造(T2體)中的矽原子之訊號出現於-54至-60ppm。因此,藉由算出此時-64至-70ppm之訊號(T3體)與-54至-60ppm之訊號(T2體)之積分比,而可求上述比例[T3體/T2體]。 In the epoxy-modified polyorganosilsesquioxane, the above ratio [T3 body/T2 body] system can be obtained by 29 Si-NMR spectrometry, for example. 29 In the Si-NMR spectrum, the silicon atom in the structural unit (T3 body) represented by the above formula (I) and the silicon atom in the structural unit (T2 body) represented by the above formula (II) are at different positions (chemical Displacement) shows the signal (peak), and the above ratio [T3 body/T2 body] is obtained by calculating the integral ratio of individual peaks. For example, when the epoxy-modified polyorganosilsesquioxane has the structural unit represented by the above formula (1) and R 1 is 2-(3′,4′-epoxycyclohexyl)ethyl, the above formula ( The signal of the silicon atom in the structure (T3 body) shown in I) appears from -64 to -70 ppm, and the signal of the silicon atom in the structure (T2 body) shown in the above formula (II) appears in -54 to -60 ppm. Therefore, by calculating the integral ratio of the signal of -64 to -70 ppm (T3 body) and the signal of -54 to -60 ppm (T2 body) at this time, the above ratio [T3 body/T2 body] can be obtained.

又,例如可藉由下述裝置及條件而測定環氧基改質聚有機矽倍半氧烷之29Si-NMR光譜。 In addition, for example, the 29 Si-NMR spectrum of the epoxy-modified polyorganosilsesquioxane can be measured by the following equipment and conditions.

測定裝置:商品名「JNM-ECA500NMR」(日本電子股份有限公司製)。 Measuring device: Trade name "JNM-ECA500NMR" (manufactured by JEOL Ltd.).

溶劑:重氯仿。 Solvent: heavy chloroform.

累積次數:1800次。 Cumulative times: 1800 times.

測定溫度:25℃。 Measurement temperature: 25°C.

一般而言,完全籠型矽倍半氧烷係僅由T3體所構成之聚有機矽倍半氧烷,且在分子中不存在T2體。亦即暗示上述比例[T3體/T2體]為5以上之環氧基改質聚有機矽倍半氧烷係具有不完全籠型矽倍半氧烷構造。 In general, the complete cage silsesquioxane is a polyorganosilsesquioxane composed of only T3 body, and there is no T2 body in the molecule. That is to say, the epoxy-modified polyorganosilsesquioxane system having the above ratio [T3 body/T2 body] of 5 or more has an incomplete cage-type silsesquioxane structure.

可由FT-IR光譜中,在1050cm-1附近與1150cm-1附近分別不具有固有吸收波峰且在1100cm-1附近 具有一個固有吸收波峰,而確認環氧基改質聚有機矽倍半氧烷具有籠型(尤其是不完全籠型)矽倍半氧烷構造[參考文獻:R.H.Raney,M.Itoh,A.Sakakibara and T.Suzuki,Chem.Rev.95,1409(1995)]。對此,一般在FT-IR光譜中在1050cm-1附近與1150cm-1附近分別具有固有吸收波峰時,係識別為具有梯子型矽倍半氧烷構造。又,例如可藉由下述裝置及條件而測定環氧基改質聚有機矽倍半氧烷之FT-IR光譜。 It can be confirmed from the FT-IR spectrum that there are no intrinsic absorption peaks near 1050cm -1 and 1150cm -1 respectively, and there is an intrinsic absorption peak near 1100cm -1 , and it is confirmed that the epoxy-modified polyorganosilsesquioxane has Cage type (especially incomplete cage type) silsesquioxane structure [Reference: RHRaney, M. Itoh, A. Sakakibara and T. Suzuki, Chem. Rev. 95, 1409 (1995)]. For this reason, it is generally recognized as having a ladder-type silsesquioxane structure when the FT-IR spectrum has inherent absorption peaks near 1050 cm -1 and 1150 cm -1 , respectively. In addition, for example, the FT-IR spectrum of epoxy-modified polyorganosilsesquioxane can be measured by the following equipment and conditions.

測定裝置:商品名「FT-720」(堀場製作所股份有限公司製)。 Measuring device: Trade name "FT-720" (Horiba Manufacturing Co., Ltd.).

測定方法:穿透法。 Measurement method: penetration method.

分解能:4cm-1Decomposition energy: 4cm -1 .

測定波數域:400至4000cm-1Measurement wavenumber domain: 400 to 4000 cm -1 .

累積次數:16次。 Cumulative times: 16 times.

環氧基改質聚有機矽倍半氧烷除了上述T單元以外,亦可具有例如由[R3SiO1/2]所示之構成單元(亦即M單元)、[R2SiO]所示之構成單元(亦即D單元)、及[SiO2]所示之構成單元(亦即Q單元)所成群組所選擇之至少1種之矽氧烷構成單元。 The epoxy-modified polyorganosilicon silsesquioxane may have, in addition to the T unit described above, for example, a structural unit represented by [R 3 SiO 1/2 ] (that is, an M unit) or [R 2 SiO] At least one type of siloxane constituent unit selected from the group consisting of the constituent unit (that is, D unit) and the constituent unit (that is, Q unit) shown in [SiO 2 ].

相對於環氧基改質聚有機矽倍半氧烷中矽氧烷構成單元之總量[全矽氧烷構成單元;M單元、D單元、T單元、及Q單元之總量](100莫耳%),上述式(1)所示之構成單元及上述式(4)所示之構成單元的比例(總量)係如上述般為55至100莫耳%,較佳為65至100莫耳%,更佳為80至99莫耳%。藉由使上述比例為55莫耳%以上, 而可提升硬化性組成物之硬化性,又,可明顯提升硬化物之接著性。又,環氧基改質聚有機矽倍半氧烷中各矽氧烷構成單元的比例係例如可由原料組成、NMR光譜測定等而算出。 Relative to the total amount of siloxane constituent units in epoxy-modified polyorganosilicon silsesquioxane [total siloxane constituent units; total amount of M units, D units, T units, and Q units] (100 Mo Ear %), the ratio (total amount) of the structural unit shown in the above formula (1) and the structural unit shown in the above formula (4) is 55 to 100 mole% as described above, preferably 65 to 100 mole Ear %, more preferably 80 to 99 mole %. By making the above ratio 55 mol% or more, While the hardenability of the hardenable composition can be improved, the adherence of the hardened object can be significantly improved. In addition, the ratio of each siloxane constituent unit in the epoxy-modified polyorganosilsesquioxane can be calculated from, for example, the raw material composition, NMR spectrum measurement, and the like.

相對於環氧基改質聚有機矽倍半氧烷中矽氧烷構成單元之總量[全矽氧烷構成單元;M單元、D單元、T單元、及Q單元之總量](100莫耳%),上述式(2)所示之構成單元及上述式(5)所示之構成單元的比例(總量)並無特別限定,但較佳為0至70莫耳%,更佳為0至60莫耳%,又更佳為0至40莫耳%,特佳為1至15莫耳%。藉由使上述比例為70莫耳%以下,而可使式(1)所示之構成單元及式(4)所示之構成單元的比例相對較多,故有提升硬化性組成物之硬化性且進一步提高硬化物之接著性的傾向。 Relative to the total amount of siloxane constituent units in epoxy-modified polyorganosilicon silsesquioxane [total siloxane constituent units; total amount of M units, D units, T units, and Q units] (100 Mo Ear%), the ratio (total amount) of the structural unit represented by the above formula (2) and the structural unit represented by the above formula (5) is not particularly limited, but it is preferably 0 to 70 mol%, more preferably 0 to 60 mol%, more preferably 0 to 40 mol%, particularly preferably 1 to 15 mol%. By setting the above ratio to 70 mol% or less, the ratio of the structural unit represented by the formula (1) and the structural unit represented by the formula (4) can be relatively large, so the curability of the curable composition is improved Moreover, the tendency of the adhesiveness of the hardened material is further improved.

相對於環氧基改質聚有機矽倍半氧烷中矽氧烷構成單元之總量[全矽氧烷構成單元;M單元、D單元、T單元、及Q單元之總量](100莫耳%),上述式(1)所示之構成單元、上述式(2)所示之構成單元、上述式(4)所示之構成單元、及上述式(5)所示之構成單元的比例(總量)並無特別限定,但較佳為60至100莫耳%,更佳為70至100莫耳%,又更佳為80至100莫耳%。藉由使上述比例為60莫耳%以上,有進一步提高硬化物之接著性的傾向。 Relative to the total amount of siloxane constituent units in epoxy-modified polyorganosilicon silsesquioxane [total siloxane constituent units; total amount of M units, D units, T units, and Q units] (100 Mo Ear %), the proportion of the constituent unit shown in the above formula (1), the constituent unit shown in the above formula (2), the constituent unit shown in the above formula (4), and the constituent unit shown in the above formula (5) (Total amount) is not particularly limited, but it is preferably 60 to 100 mol%, more preferably 70 to 100 mol%, and still more preferably 80 to 100 mol%. By setting the above ratio to 60 mol% or more, there is a tendency to further improve the adhesion of the hardened product.

環氧基改質聚有機矽倍半氧烷由GPC所測定的標準聚苯乙烯換算之分子量分散度(Mw/Mn)係如上述般為1.0至3.0,較佳為1.1至2.0,更佳為1.2至1.9,特 佳為1.45至1.80。藉由使分子量分散度為3.0以下,可進一步提高硬化物之接著性。另一方面,藉由使分子量分散度為1.0以上(較佳為1.1以上),有容易形成液狀且提升操作性的傾向。 The epoxy-modified polyorganosilicon silsesquioxane has a molecular weight dispersion (Mw/Mn) in terms of standard polystyrene measured by GPC of 1.0 to 3.0 as described above, preferably 1.1 to 2.0, more preferably 1.2 to 1.9, special Good is 1.45 to 1.80. By making the molecular weight dispersion degree 3.0 or less, the adhesiveness of the cured product can be further improved. On the other hand, by setting the molecular weight dispersion degree to 1.0 or more (preferably 1.1 or more), there is a tendency to easily form a liquid state and improve workability.

環氧基改質聚有機矽倍半氧烷由GPC所測定的標準聚苯乙烯換算之數目平均分子量(Mn)係如上述般為1000至3000,較佳為1000至2800,更佳為1000至2600。藉由使數目平均分子量為1000以上,可進一步提升硬化物之耐熱性、接著性。另一方面,藉由使數目平均分子量為3000以下,可提升與硬化性組成物中其他成分之相溶性,且可進一步提升硬化物之耐熱性。 The number-average molecular weight (Mn) of the epoxy-modified polyorganosilsesquioxane measured by GPC in terms of standard polystyrene is 1000 to 3000 as described above, preferably 1000 to 2800, more preferably 1000 to 2600. By setting the number average molecular weight to 1,000 or more, the heat resistance and adhesiveness of the cured product can be further improved. On the other hand, by setting the number average molecular weight to 3000 or less, the compatibility with other components in the curable composition can be improved, and the heat resistance of the cured product can be further improved.

又,環氧基改質聚有機矽倍半氧烷之數目平均分子量、分子量分散度可以實施例所記載之方法測定。 In addition, the number average molecular weight and molecular weight dispersion of the epoxy-modified polyorganosilsesquioxane can be measured by the method described in the examples.

例如可藉由將1種或2種以上之水解性矽烷化合物水解及縮合之方法,而製造環氧基改質聚有機矽倍半氧烷。但,作為前述水解性矽烷化合物,係需將用以形成上述式(1)所示之構成單元之水解性三官能矽烷化合物(下述式(a)所示之化合物)使用作為必須之水解性矽烷化合物。 For example, epoxy-modified polyorganosilsesquioxane can be produced by the method of hydrolyzing and condensing one or more hydrolyzable silane compounds. However, as the aforementioned hydrolyzable silane compound, it is necessary to use a hydrolyzable trifunctional silane compound (compound represented by the following formula (a)) used to form the structural unit represented by the above formula (1) as a necessary hydrolyzability Silane compounds.

更具體而言,例如可藉由將用以形成T單元之水解性矽烷化合物之下述式(a)所示之化合物、及視需要之下述式(b)所示之化合物、下述式(c)所示之化合物水解及縮合之方法,而製造環氧基改質聚有機矽倍半氧烷。 More specifically, for example, the compound represented by the following formula (a) used to form the hydrolyzable silane compound of the T unit, and the compound represented by the following formula (b) if necessary, the following formula (c) The method of hydrolysis and condensation of the compound shown to produce epoxy-modified polyorganosilsesquioxane.

R1Si(X1)3 (a) R 1 Si(X 1 ) 3 (a)

R2Si(X2)3 (b) R 2 Si(X 2 ) 3 (b)

HSi(X3)3 (c) HSi(X 3 ) 3 (c)

上述式(a)所示之化合物係形成環氧基改質聚有機矽倍半氧烷中的式(1)所示之構成單元、及式(4)所示之構成單元之化合物。式(a)中之R1係對應上述式(1)、(4)中的R1The compound represented by the above formula (a) is a compound forming the structural unit represented by the formula (1) and the structural unit represented by the formula (4) in the epoxy-modified polyorganosilsesquioxane. In the formula (a) R 1 group corresponding the above formula (1), (4) R 1.

上述式(a)中之X1表示烷氧基或鹵原子。X1中的烷氧基可舉出與(ORc)基中碳數1至4之烷氧基相同的例子。又,X1中的鹵原子可舉例如氟原子、氯原子、溴原子、碘原子等。X1中較佳為烷氧基,更佳為甲氧基、乙氧基。又,3個X1可分別相同或相異。 X 1 in the above formula (a) represents an alkoxy group or a halogen atom. The alkoxy group in X 1 may be the same as the alkoxy group having 1 to 4 carbon atoms in the (OR c ) group. In addition, the halogen atom in X 1 may be a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, or the like. X 1 is preferably an alkoxy group, and more preferably a methoxy group or an ethoxy group. In addition, the three X 1s may be the same or different.

上述式(b)所示之化合物係形成環氧基改質聚有機矽倍半氧烷中的式(2)所示之構成單元、及式(5)所示之構成單元之化合物。式(b)中之R2係對應上述式(2)、(5)中的R2The compound represented by the above formula (b) is a compound that forms the structural unit represented by the formula (2) and the structural unit represented by the formula (5) in the epoxy-modified polyorganosilsesquioxane. In the formula (b) R 2 lines corresponding to the above formula (2), (5) R 2.

上述式(b)中之X2係表示烷氧基或鹵原子。 X2之具體例可舉出X1所例示者。其中,X2較佳為烷氧基,更佳為甲氧基、乙氧基。又,3個X2可分別相同或相異。 X 2 in the above formula (b) represents an alkoxy group or a halogen atom. Specific examples of X 2 include those exemplified by X 1 . Among them, X 2 is preferably an alkoxy group, and more preferably a methoxy group or an ethoxy group. In addition, the three X 2 may be the same or different.

上述式(c)所示之化合物係形成環氧基改質聚有機矽倍半氧烷中的式(3)所示之構成單元、及式(6)所示之構成單元之化合物。上述式(c)中之X3係表示烷氧基或鹵原子。X3之具體例可舉出X1所例示者。其中,X3較佳為烷氧基,更佳為甲氧基、乙氧基。又,3個X3可分別相同或相異。 The compound represented by the above formula (c) is a compound forming the structural unit represented by the formula (3) and the structural unit represented by the formula (6) in the epoxy-modified polyorganosilsesquioxane. X 3 in the above formula (c) represents an alkoxy group or a halogen atom. Specific examples of X 3 include those exemplified by X 1 . Among them, X 3 is preferably an alkoxy group, and more preferably a methoxy group or an ethoxy group. In addition, the three X 3 may be the same or different.

上述水解性矽烷化合物可併用上述式(a)至(c)所示之化合物以外之水解性矽烷化合物。可舉例如上述式(a)至(c)所示之化合物以外之水解性三官能矽烷化合物、形成M單元之水解性單官能矽烷化合物、形成D單元之水解性二官能矽烷化合物、形成Q單元之水解性四官能矽烷化合物等。 As the hydrolyzable silane compound, hydrolyzable silane compounds other than the compounds represented by the above formulas (a) to (c) may be used in combination. Examples include hydrolyzable trifunctional silane compounds other than the compounds represented by the above formulas (a) to (c), hydrolyzable monofunctional silane compounds forming M units, hydrolyzable difunctional silane compounds forming D units, and Q units forming The hydrolyzable tetrafunctional silane compound, etc.

上述水解性矽烷化合物之使用量、組成可因應所要求之環氧基改質聚有機矽倍半氧烷之構造而適宜調整。例如,上述式(a)所示之化合物之使用量係無特別限定,但相對於所使用水解性矽烷化合物之總量(100莫耳%)較佳為55至100莫耳%,更佳為65至100莫耳%,又更佳為80至99莫耳%。 The use amount and composition of the above hydrolyzable silane compound can be adjusted appropriately according to the required structure of epoxy-modified polyorganosilsesquioxane. For example, the amount of the compound represented by the above formula (a) is not particularly limited, but it is preferably 55 to 100 mol% relative to the total amount of hydrolyzable silane compounds used (100 mol%), more preferably 65 to 100 mol%, and more preferably 80 to 99 mol%.

又,上述式(b)所示之化合物之使用量係無特別限定,但相對於所使用水解性矽烷化合物之總量(100莫耳%)較佳為0至70莫耳%,更佳為0至60莫耳%,又更佳為0至40莫耳%,特佳為1至15莫耳%。 In addition, the amount of the compound represented by the above formula (b) is not particularly limited, but it is preferably 0 to 70 mol% relative to the total amount of hydrolyzable silane compounds used (100 mol%), more preferably 0 to 60 mol%, more preferably 0 to 40 mol%, particularly preferably 1 to 15 mol%.

又,相對於所使用水解性矽烷化合物之總量(100莫耳%)之式(a)所示之化合物與式(b)所示之化合物的比例(總量的比例)係無特別限定,但較佳為60至100莫耳%,更佳為70至100莫耳%,又更佳為80至100莫耳%。 In addition, the ratio (ratio of the total amount) of the compound represented by the formula (a) to the compound represented by the formula (b) with respect to the total amount (100 mole %) of the hydrolyzable silane compound used is not particularly limited, However, it is preferably 60 to 100 mol%, more preferably 70 to 100 mol%, and still more preferably 80 to 100 mol%.

又,上述水解性矽烷化合物併用2種以上時,該等水解性矽烷化合物之水解及縮合反應可同時進行或逐次進行。逐次進行上述反應時,進行反應之順序並無特別限定。 Furthermore, when two or more of the above hydrolyzable silane compounds are used in combination, the hydrolysis and condensation reactions of these hydrolyzable silane compounds may be performed simultaneously or sequentially. When the above reaction is carried out one by one, the order of carrying out the reaction is not particularly limited.

上述水解性矽烷化合物之水解及縮合反應可在溶劑存在下進行,也可在非存在下進行。其中較佳為在溶劑存在下進行。上述溶劑可舉例如苯、甲苯、二甲苯、乙基苯等芳香族烴;二乙醚、二甲氧基乙烷、四氫呋喃、二

Figure 105119145-A0202-12-0025-26
烷等醚;丙酮、甲基乙酮、甲基異丁酮等酮;乙酸甲酯、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺;乙腈、丙腈、苯甲腈等腈;甲醇、乙醇、異丙醇、丁醇等醇等。上述溶劑中較佳為酮、醚。又,溶劑可單獨使用1種或組合2種以上使用。 The hydrolysis and condensation reaction of the above hydrolyzable silane compound may be carried out in the presence of a solvent or in the absence. Among them, it is preferably carried out in the presence of a solvent. Examples of the solvent include aromatic hydrocarbons such as benzene, toluene, xylene, and ethylbenzene; diethyl ether, dimethoxyethane, tetrahydrofuran,
Figure 105119145-A0202-12-0025-26
Ethers such as alkane; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone; methyl acetate, ethyl acetate, isopropyl acetate, butyl acetate and other esters; N,N-dimethylformamide, N , N-dimethylacetamide and other amides; acetonitrile, propionitrile, benzonitrile and other nitriles; methanol, ethanol, isopropanol, butanol and other alcohols. Among the above solvents, ketones and ethers are preferred. In addition, one type of solvent may be used alone or two or more types may be used in combination.

溶劑之使用量並無特別限定,可在相對於水解性矽烷化合物之總量100重量分為0至2000重量分之範圍內,因應所要求之反應時間等而適宜調整。 The amount of the solvent used is not particularly limited, and it can be appropriately adjusted according to the required reaction time, etc. within a range of 0 to 2000 parts by weight with respect to the total amount of 100 parts by weight of the hydrolyzable silane compound.

上述水解性矽烷化合物之水解及縮合反應較佳為在觸媒及水存在下進行。上述觸媒可為酸觸媒或鹼觸媒。上述酸觸媒可舉例如鹽酸、硫酸、硝酸、磷酸、硼酸等無機酸;磷酸酯;乙酸、甲酸、三氟乙酸等羧酸;甲磺酸、三氟甲磺酸、對甲苯磺酸等磺酸;活性白土等固體酸;氯化鐵等路易斯酸等。上述鹼觸媒可舉例如氫氧化鋰、氫氧化鈉、氫氧化鉀、氫氧化銫等鹼金屬之氫氧化物;氫氧化鎂、氫氧化鈣、氫氧化鋇等鹼土類金屬之氫氧化物;碳酸鋰、碳酸鈉、碳酸鉀、碳酸銫等鹼金屬之碳酸鹽;碳酸鎂等鹼土類金屬之碳酸鹽;碳酸氫鋰、碳酸氫鈉、碳酸氫鉀、碳酸氫銫等鹼金屬之碳酸氫鹽;乙酸鋰、乙酸鈉、 乙酸鉀、乙酸銫等鹼金屬之有機酸鹽(例如乙酸鹽);乙酸鎂等鹼土類金屬之有機酸鹽(例如乙酸鹽);甲氧化鋰、甲氧化鈉、乙氧化鈉、異丙氧化鈉、乙氧化鉀、第三丁氧化鉀等鹼金屬之烷氧化物;苯氧化鈉等鹼金屬之苯氧化物;三乙胺、N-甲基哌啶、1,8-二氮雜雙環[5.4.0]十一烷-7-烯、1,5-二氮雜雙環[4.3.0]壬烷-5-烯等胺類(3級胺等);吡啶、2,2'-聯吡啶、1,10-啡啉等含氮芳香族雜環化合物等。又,觸媒可單獨使用1種或組合2種以上使用。又,觸媒可以溶解或分散於水、溶劑等之狀態使用。 The hydrolysis and condensation reaction of the hydrolyzable silane compound is preferably carried out in the presence of a catalyst and water. The above catalyst may be an acid catalyst or an alkali catalyst. Examples of the acid catalyst include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, and boric acid; phosphate esters; carboxylic acids such as acetic acid, formic acid, and trifluoroacetic acid; methanesulfonic acid, trifluoromethanesulfonic acid, and p-toluenesulfonic acid. Acid; solid acid such as activated clay; Lewis acid such as ferric chloride. Examples of the alkali catalyst include hydroxides of alkali metals such as lithium hydroxide, sodium hydroxide, potassium hydroxide, and cesium hydroxide; hydroxides of alkaline earth metals such as magnesium hydroxide, calcium hydroxide, and barium hydroxide; Lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate and other alkali metal carbonates; magnesium carbonate and other alkaline earth metal carbonates; lithium bicarbonate, sodium bicarbonate, potassium bicarbonate, cesium bicarbonate and other alkali metal bicarbonates ; Lithium acetate, sodium acetate, Organic acid salts of alkali metals such as potassium acetate and cesium acetate (such as acetate); Organic acid salts of alkaline earth metals such as magnesium acetate (such as acetate); lithium methoxide, sodium methoxide, sodium ethoxide, sodium isopropoxide , Alkali metal alkoxides such as potassium ethoxide, potassium tributoxide, etc.; benzene oxides of alkali metals such as sodium phenoxide; triethylamine, N-methylpiperidine, 1,8-diazabicyclo[5.4 .0] Undecane-7-ene, 1,5-diazabicyclo[4.3.0]nonane-5-ene and other amines (level 3 amine, etc.); pyridine, 2,2'-bipyridine, 1,10-Porphyrin and other nitrogen-containing aromatic heterocyclic compounds. In addition, the catalyst can be used alone or in combination of two or more. In addition, the catalyst can be used in a state where it is dissolved or dispersed in water, a solvent, or the like.

上述觸媒之使用量係無特別限定,可在相對於水解性矽烷化合物之總量1莫耳為0.002至0.200莫耳之範圍內適宜調整。 The amount of the catalyst used is not particularly limited, and can be appropriately adjusted within a range of 0.002 to 0.200 mol relative to 1 mol of the total amount of hydrolyzable silane compounds.

上述水解及縮合反應時,水之使用量係無特別限定,可在相對於水解性矽烷化合物之總量1莫耳為0.5至20莫耳之範圍內適宜調整。 In the above hydrolysis and condensation reaction, the amount of water used is not particularly limited, and can be appropriately adjusted within a range of 0.5 to 20 moles relative to 1 mole of the total amount of hydrolyzable silane compounds.

上述水之添加方法係無特別限定,可將所使用水之總量(全使用量)一次添加,也可逐次添加。逐次添加時,可連續添加或間隔添加。 The method of adding the above water is not particularly limited, and the total amount of water used (total use amount) may be added at a time, or may be added sequentially. When adding one by one, it can be added continuously or at intervals.

作為上述水解性矽烷化合物進行水解及縮合反應時之反應條件,尤其重要的是選擇使環氧基改質聚有機矽倍半氧烷中的上述比例[T3體/T2體]成為5以上之反應條件。上述水解及縮合反應之反應溫度並無特別限定,但較佳為40至100℃,更佳為45至80℃。藉由控制反應溫度在上述範圍,有可更有效率地將上述比例[T3體 /T2體]控制在5以上的傾向。又,上述水解及縮合反應之反應時間並無特別限定,但較佳為0.1至10小時,更佳為1.5至8小時。又,上述水解及縮合反應可在常壓下進行,也可在加壓下或減壓下進行。又,進行上述水解及縮合反應時之環境係無特別限定,例如可為氮環境、氬環境等惰性氣體環境下、空氣下等氧存在下等的任一者,但較佳為惰性氣體環境下。 As the reaction conditions for the hydrolysis and condensation reaction of the above hydrolyzable silane compound, it is particularly important to select a reaction in which the above ratio [T3 body/T2 body] in the epoxy-modified polyorganosilsesquioxane becomes 5 or more condition. The reaction temperature of the above hydrolysis and condensation reaction is not particularly limited, but it is preferably 40 to 100°C, more preferably 45 to 80°C. By controlling the reaction temperature in the above range, it is possible to more efficiently convert the above ratio [T3 body /T2 body] tends to be controlled at 5 or more. In addition, the reaction time of the above-mentioned hydrolysis and condensation reaction is not particularly limited, but it is preferably 0.1 to 10 hours, and more preferably 1.5 to 8 hours. In addition, the above-mentioned hydrolysis and condensation reactions may be carried out under normal pressure, or may be carried out under pressure or under reduced pressure. The environment during the hydrolysis and condensation reaction is not particularly limited. For example, it may be any of an inert gas environment such as a nitrogen environment and an argon environment, and the presence of oxygen such as air. However, it is preferably an inert gas environment. .

藉由上述水解性矽烷化合物之水解及縮合反應,而可獲得環氧基改質聚有機矽倍半氧烷。上述水解及縮合反應之結束後,為了抑制環氧基之開環,較佳為中和觸媒。又,所得之環氧基改質聚有機矽倍半氧烷係可藉由例如水洗、酸洗淨、鹼洗淨、過濾、濃縮、蒸餾、萃取、晶析、再結晶、管柱層析等分離手段、或組合該等分離手段等,而實施分離精製。 Through the hydrolysis and condensation reaction of the above hydrolyzable silane compound, epoxy-modified polyorganosilsesquioxane can be obtained. After the completion of the above hydrolysis and condensation reaction, in order to suppress the ring opening of the epoxy group, it is preferable to neutralize the catalyst. In addition, the obtained epoxy-modified polyorganosilsesquioxane can be washed, washed, pickled, washed with alkali, filtered, concentrated, distilled, extracted, crystallized, recrystallized, column chromatography, etc. Separation means, or a combination of these separation means, etc., and separation purification.

<脂環式環氧化合物> <alicyclic epoxy compound>

上述脂環式環氧化合物可舉出分子內具有1個以上脂環與1個以上環氧基之公知或慣用之化合物,係無特別限定,但可舉例如以下化合物等。 Examples of the alicyclic epoxy compound include known or conventional compounds having one or more alicyclic rings and one or more epoxy groups in the molecule, which are not particularly limited, but include, for example, the following compounds.

(1)分子內具有構成脂環之鄰接的2個碳原子與氧原子所構成之環氧基(本明細書中稱為「脂環環氧基」。脂環環氧基係包括例如氧化環己烯基等)之化合物。 (1) The molecule has an epoxy group composed of two adjacent carbon atoms and oxygen atoms constituting an alicyclic ring (referred to as "alicyclic epoxy group" in this specification. The alicyclic epoxy group includes, for example, an oxidized ring Compounds such as hexenyl.

(2)環氧基直接以單鍵鍵結於脂環之化合物。 (2) A compound in which an epoxy group is directly bonded to an alicyclic ring by a single bond.

(3)分子內具有脂環及環氧丙基醚基之化合物(環氧丙基醚型環氧化合物)。 (3) Compounds having alicyclic and glycidyl ether groups in the molecule (epoxypropyl ether type epoxy compounds).

上述(1)分子內具有脂環環氧基之化合物可舉出下述式(i)所示之化合物。 Examples of the compound (1) having an alicyclic epoxy group in the molecule include compounds represented by the following formula (i).

Figure 105119145-A0202-12-0028-16
Figure 105119145-A0202-12-0028-16

上述式(i)中,Y表示單鍵或連結基(具有1以上原子之二價基)。上述連結基可舉例如二價烴基、碳-碳雙鍵之一部分或全部被環氧基化之伸烯基、羰基、醚鍵結、酯鍵結、碳酸酯基、醯胺基、及該等複數個連結的基等。 In the above formula (i), Y represents a single bond or a linking group (a divalent group having 1 or more atoms). Examples of the above-mentioned linking group include a divalent hydrocarbon group, an alkenyl group in which a part or all of a carbon-carbon double bond is partially epoxy-based, a carbonyl group, an ether bond, an ester bond, a carbonate group, an amide group, and the like Plural connected bases, etc.

上述二價烴基可舉出碳數1至18之直鏈或分支鏈狀之伸烷基、碳數3至18之二價脂環式烴基等。碳數1至18之直鏈或分支鏈狀之伸烷基可舉例如亞甲基、甲基亞甲基、二甲基亞甲基、伸乙基、伸丙基、三亞甲基等。碳數3至18之二價脂環式烴基可舉例如1,2-環戊基、1,3-環戊基、環亞戊基、1,2-環己基、1,3-環己基、1,4-環己基、環亞己基等環伸烷基(包括環亞烷基)等。 Examples of the divalent hydrocarbon group include straight-chain or branched chain alkylene groups having 1 to 18 carbon atoms, and divalent alicyclic hydrocarbon groups having 3 to 18 carbon atoms. Examples of the straight-chain or branched-chain alkylene group having 1 to 18 carbon atoms include methylene, methylmethylene, dimethylmethylene, ethylidene, propylidene and trimethylene groups. Examples of the divalent alicyclic hydrocarbon group having 3 to 18 carbon atoms include 1,2-cyclopentyl, 1,3-cyclopentyl, cyclopentylene, 1,2-cyclohexyl, 1,3-cyclohexyl, Cycloalkylene (including cycloalkylene) such as 1,4-cyclohexylene and cyclohexylene, etc.

上述碳-碳雙鍵之一部分或全部被環氧基化之伸烯基(下稱為「環氧基化伸烯基」)中的伸烯基,可舉例如伸乙烯基、伸丙烯基、1-伸丁烯基、2-伸丁烯基、伸丁二烯基、伸戊烯基、伸己烯基、伸庚烯基、伸辛烯基等碳數2至8之直鏈或分支鏈狀之伸烯基等。尤其較佳為上述環氧基化伸烯基係碳-碳雙鍵全部被環氧基化之伸烯基,更佳為碳-碳雙鍵全部被環氧基化之碳數2至4之伸烯 基。 The alkenyl group in the alkenyl group in which a part or all of the above carbon-carbon double bond is partially or fully epoxylated (hereinafter referred to as "epoxylated alkenyl group") includes, for example, vinylidene group, propenyl group, Straight-chain or branched carbon number 2 to 8 such as 1-butenyl, 2-butenyl, butadienyl, pentenyl, hexenyl, heptenyl, octenyl, etc. Chain-like alkenyl and so on. Especially preferably, the above-mentioned epoxy-based alkenyl group is an alkenyl group in which all the carbon-carbon double bonds are epoxy-based, more preferably the carbon number of the carbon-carbon double bonds is all epoxy-based in the range of 2 to 4. Diene base.

上述式(i)所示之脂環式環氧化合物之代表例可舉出(3,4,3’,4’-二環氧基)雙環己基、雙(3,4-環氧環己基甲基)醚、1,2-環氧基-1,2-雙(3,4-環氧環己烷-1-基)乙烷、2,2-雙(3,4-環氧環己烷-1-基)丙烷、1,2-雙(3,4-環氧環己烷-1-基)乙烷、下述式(i-1)至(i-10)所示之化合物等。又,下述式(i-5)中之R'係碳數1至8之伸烷基,其中較佳為亞甲基、伸乙基、伸丙基、異伸丙基等碳數1至3之直鏈或分支鏈狀之伸烷基。又,下述式(i-5)、(i-7)、(i-9)、(i-10)中之n1至n8係分別表示1至30之整數。 Representative examples of the alicyclic epoxy compound represented by the above formula (i) include (3,4,3',4'-diepoxy)dicyclohexyl, bis(3,4-epoxycyclohexylmethyl Group) ether, 1,2-epoxy-1,2-bis(3,4-epoxycyclohexane-1-yl)ethane, 2,2-bis(3,4-epoxycyclohexane -1-yl)propane, 1,2-bis(3,4-epoxycyclohexane-1-yl)ethane, compounds represented by the following formulas (i-1) to (i-10), etc. In addition, R′ in the following formula (i-5) is an alkylene group having 1 to 8 carbon atoms, and among them, methylene, ethylidene, propylidene, isopropylidene, etc. are preferred. 3 straight chain or branched chain alkylene. In addition, n 1 to n 8 in the following formulas (i-5), (i-7), (i-9), and (i-10) each represent an integer of 1 to 30.

Figure 105119145-A0202-12-0030-17
Figure 105119145-A0202-12-0030-17

Figure 105119145-A0202-12-0031-18
Figure 105119145-A0202-12-0031-18

Figure 105119145-A0202-12-0031-19
Figure 105119145-A0202-12-0031-19

上述(2)環氧基直接以單鍵鍵結於脂環之化合物可舉例如下述式(ii)所示之化合物等。 Examples of the compound in which (2) the epoxy group is directly bonded to the alicyclic ring by a single bond include compounds represented by the following formula (ii).

Figure 105119145-A0202-12-0031-20
Figure 105119145-A0202-12-0031-20

式(ii)中,R”係由p元醇之構造式取去除p個羥基(-OH)之基(p價有機基),p、n分別表示自然數。p價之醇[R”(OH)p]可舉出2,2-雙(羥基甲基)-1-丁醇等多元醇(碳數1至15之醇等)等。p較佳為1至6,n較佳為1至30。p為2以上時,各個[ ]內(外側之括弧內)的基中的n可為相同或相異。上述式(ii)所示之化合物具體而言可舉出2,2-雙(羥基甲基)-1-丁醇之1,2-環氧基-4-(2-環氧乙烷基)環 己烷加成物[例如商品名「EHPE3150」(daicel股份有限公司製)等]等。 In formula (ii), R” is a group (p-valent organic group) in which p hydroxyl groups (-OH) are removed from the structural formula of p-alcohol, p and n represent natural numbers, respectively. p-valent alcohol [R” ( OH) p ] include polyhydric alcohols such as 2,2-bis(hydroxymethyl)-1-butanol (alcohols having 1 to 15 carbon atoms) and the like. p is preferably 1 to 6, and n is preferably 1 to 30. When p is 2 or more, n in the base within each [] (inside the parenthesis) may be the same or different. The compound represented by the above formula (ii) specifically includes 1,2-epoxy-4-(2-oxiranyl) of 2,2-bis(hydroxymethyl)-1-butanol Cyclohexane adduct [for example, trade name "EHPE3150" (made by Daicel Corporation), etc.], etc.

上述(3)分子內具有脂環及環氧丙基醚基之化合物可舉例如脂環式醇(尤其是脂環式多元醇)之環氧丙基醚。更詳細而言可舉例如2,2-雙[4-(2,3-環氧丙氧基)環己基]丙烷、2,2-雙[3,5-二甲基-4-(2,3-環氧丙氧基)環己基]丙烷等將雙酚A型環氧化合物氫化之化合物(氫化雙酚A型環氧化合物);雙[鄰,鄰-(2,3-環氧丙氧基)環己基]甲烷、雙[鄰,對-(2,3-環氧丙氧基)環己基]甲烷、雙[對,對-(2,3-環氧丙氧基)環己基]甲烷、雙[3,5-二甲基-4-(2,3-環氧丙氧基)環己基]甲烷等將雙酚F型環氧化合物氫化之化合物(氫化雙酚F型環氧化合物);氫化聯苯型環氧化合物;氫化酚酚醛清漆型環氧化合物;氫化甲酚酚醛清漆型環氧化合物;雙酚A之氫化甲酚酚醛清漆型環氧化合物;氫化萘型環氧化合物;將由三酚甲烷所得之環氧化合物氫化之化合物;將下述芳香族環氧化合物氫化之化合物等。 Examples of the compound (3) having alicyclic and glycidyl ether groups in the molecule include glycidyl ethers of alicyclic alcohols (especially alicyclic polyols). More specifically, for example, 2,2-bis[4-(2,3-epoxypropoxy)cyclohexyl]propane, 2,2-bis[3,5-dimethyl-4-(2, 3-epoxypropoxy)cyclohexyl]propane and other compounds that hydrogenate bisphenol A epoxy compound (hydrogenated bisphenol A epoxy compound); bis[o,o-(2,3-epoxypropoxy Yl)cyclohexyl]methane, bis[o,p-(2,3-epoxypropoxy)cyclohexyl]methane, bis[p,p-(2,3-epoxypropoxy)cyclohexyl]methane , Bis[3,5-dimethyl-4-(2,3-epoxypropoxy)cyclohexyl]methane and other compounds that hydrogenate bisphenol F-type epoxy compounds (hydrogenated bisphenol F-type epoxy compounds) ; Hydrogenated biphenyl epoxy compound; Hydrogenated phenol novolac epoxy compound; Hydrogenated cresol novolac epoxy compound; Bisphenol A hydrogenated cresol novolac epoxy compound; Hydrogenated naphthalene epoxy compound; Hydrogenated epoxy compounds obtained from triphenol methane; hydrogenated aromatic epoxy compounds described below, etc.

<芳香族環氧化合物> <aromatic epoxy compound>

上述芳香族環氧化合物可舉例如藉由雙酚類[例如雙酚A、雙酚F、雙酚S、茀雙酚等]與環氧氯丙烷之縮合反應所得之Epi-Bis型環氧丙基醚型環氧樹脂;藉由將該等Epi-Bis型環氧丙基醚型環氧樹脂進一步與上述雙酚類進行加成反應所得之高分子量Epi-Bis型環氧丙基醚型環氧樹脂;將酚類[例如酚、甲酚、茬酚、間苯二酚、鄰苯二酚、雙酚A、雙酚F、雙酚S等]與醛[例如甲醛、乙醛、苯甲醛、 羥基苯甲醛、水楊醛等]進行縮合反應所得之多元醇類,再與環氧氯丙烷進行縮合反應所得之酚醛清漆/烷基型環氧丙基醚型環氧樹脂;在茀環的9位鍵結2個酚骨架,且在從該等酚骨架之羥基除去氫原子之氧原子上分別直接或透過伸烷氧基鍵結環氧丙基之環氧化合物等。 Examples of the above-mentioned aromatic epoxy compound include Epi-Bis-type propylene oxide obtained by condensation reaction of bisphenols [for example, bisphenol A, bisphenol F, bisphenol S, stilbene, etc.] with epichlorohydrin. Ether based epoxy resin; high molecular weight Epi-Bis epoxy propyl ether ring obtained by further addition reaction of these Epi-Bis epoxy propyl ether epoxy resin with the above bisphenols Oxygen resin; combining phenols [such as phenol, cresol, phenol, resorcinol, catechol, bisphenol A, bisphenol F, bisphenol S, etc.] with aldehydes [such as formaldehyde, acetaldehyde, benzaldehyde , Hydroxybenzaldehyde, salicylaldehyde, etc.] Polyols obtained by condensation reaction, and then novolak/alkyl epoxypropyl ether type epoxy resin obtained by condensation reaction with epichlorohydrin; Two phenol skeletons are bonded to the site, and an epoxy compound, such as an epoxy group, is directly or through an alkoxy group bonded to an oxygen atom on which a hydrogen atom is removed from the hydroxyl group of the phenol skeleton.

<脂肪族環氧化合物> <aliphatic epoxy compound>

上述脂肪族環氧化合物可舉例如不具有q價環狀構造之醇(q為自然數)之環氧丙基醚;一價或多價羧酸[例如乙酸、丙酸、丁酸、硬脂酸、己二酸、癸二酸、馬來酸、伊康酸等]之環氧丙基酯;環氧基化亞麻仁油、環氧基化大豆油、環氧基化蓖麻油等具有雙鍵之油脂之環氧基化物;環氧基化聚丁二烯等之聚烯烴(含有聚烷二烯)之環氧化物等。又,上述不具有q價環狀構造之醇可舉例如甲醇、乙醇、1-丙醇、異丙醇、1-丁醇等一元醇;乙二醇、1,2-丙烷二醇、1,3-丙烷二醇、1,4-丁烷二醇、新戊二醇、1,6-己烷二醇、二乙二醇、三乙二醇、四乙二醇、二丙二醇、聚乙二醇、聚丙二醇等二元醇;甘油、二甘油、赤蘚醇、三羥甲基乙烷、三羥甲基丙烷、新戊四醇、二新戊四醇、山梨糖醇等之三價以上之多元醇等。又,q價醇可為聚醚多元醇、聚酯多元醇、聚碳酸酯多元醇、聚烯烴多元醇等。 Examples of the above-mentioned aliphatic epoxy compound include epoxypropyl ethers of alcohols having no q-valent cyclic structure (q is a natural number); monovalent or polyvalent carboxylic acids [e.g. acetic acid, propionic acid, butyric acid, stearic acid Acid, adipic acid, sebacic acid, maleic acid, itaconic acid, etc.] epoxypropyl ester; epoxy-based linseed oil, epoxy-based soybean oil, epoxy-based castor oil, etc. The epoxy compound of the oil and fat of the bond; the epoxy compound of the polyolefin (containing polyalkylene) containing epoxy group polybutadiene, etc. Moreover, the alcohol which does not have a q-valent cyclic structure includes, for example, monohydric alcohols such as methanol, ethanol, 1-propanol, isopropanol, and 1-butanol; ethylene glycol, 1,2-propanediol, 1, 3-propanediol, 1,4-butanediol, neopentyl glycol, 1,6-hexanediol, diethylene glycol, triethylene glycol, tetraethylene glycol, dipropylene glycol, polyethylene glycol Alcohol, polypropylene glycol and other diols; glycerin, diglycerin, erythritol, trimethylolethane, trimethylolpropane, neopentyl alcohol, dipentaerythritol, sorbitol, etc., with a trivalent or higher Of polyols, etc. Furthermore, the q-valent alcohol may be polyether polyol, polyester polyol, polycarbonate polyol, polyolefin polyol, or the like.

(氧雜環丁烷化合物) (Oxetane compound)

上述氧雜環丁烷化合物可舉出分子內具有1個以上氧雜環丁烷環之公知或慣用之化合物,並無特別限定,但可舉例如3,3-雙(乙烯氧基甲基)氧雜環丁烷、3-乙基-3-(羥基 甲基)氧雜環丁烷、3-乙基-3-(2-乙基己氧基甲基)氧雜環丁烷、3-乙基-3-[(苯氧基)甲基]氧雜環丁烷、3-乙基-3-(己氧基甲基)氧雜環丁烷、3-乙基-3-(氯甲基)氧雜環丁烷、3,3-雙(氯甲基)氧雜環丁烷、1,4-雙[(3-乙基-3-氧雜環丁基甲氧基)甲基]苯、雙{[1-乙基(3-氧雜環丁基)]甲基}醚、4,4’-雙[(3-乙基-3-氧雜環丁基)甲氧基甲基]聯環己烷、1,4-雙[(3-乙基-3-氧雜環丁基)甲氧基甲基]環己烷、1,4-雙{[(3-乙基-3-氧雜環丁基)甲氧基]甲基}苯、3-乙基-3-{[(3-乙基氧雜環丁烷-3-基)甲氧基]甲基)}氧雜環丁烷、二甲苯雙氧雜環丁烷、3-乙基-3-{[3-(三乙氧基矽基)丙氧基]甲基}氧雜環丁烷、氧雜環丁基矽倍半氧烷、酚酚醛清漆氧雜環丁烷等。 The oxetane compound may be a known or conventional compound having one or more oxetane rings in the molecule, and is not particularly limited, but it may be, for example, 3,3-bis(ethyleneoxymethyl) Oxetane, 3-ethyl-3-(hydroxyl Methyl)oxetane, 3-ethyl-3-(2-ethylhexyloxymethyl)oxetane, 3-ethyl-3-[(phenoxy)methyl]oxy Heterocyclobutane, 3-ethyl-3-(hexyloxymethyl)oxetane, 3-ethyl-3-(chloromethyl)oxetane, 3,3-bis(chloro Methyl)oxetane, 1,4-bis[(3-ethyl-3-oxetanylmethoxy)methyl]benzene, bis{[1-ethyl(3-oxetanyl )]Methyl}ether, 4,4'-bis[(3-ethyl-3-oxetanyl)methoxymethyl]bicyclohexane, 1,4-bis[(3-ethyl -3-oxetanyl)methoxymethyl]cyclohexane, 1,4-bis{[(3-ethyl-3-oxetanyl)methoxy]methyl}benzene, 3 -Ethyl-3-{[(3-ethyloxetan-3-yl)methoxy]methyl)}oxetane, xylene dioxetane, 3-ethyl -3-{[3-(triethoxysilyl)propoxy]methyl}oxetane, oxetanyl silsesquioxane, phenol novolak oxetane, etc.

(乙烯醚化合物) (Vinyl ether compound)

上述乙烯醚化合物可使用分子內具有1個以上乙烯醚基之公知或慣用化合物,並無特別限定,但可舉例如2-羥基乙基乙烯醚(乙二醇單乙烯醚)、3-羥基丙基乙烯醚、2-羥基丙基乙烯醚、2-羥基異丙基乙烯醚、4-羥基丁基乙烯醚、3-羥基丁基乙烯醚、2-羥基丁基乙烯醚、3-羥基異丁基乙烯醚、2-羥基異丁基乙烯醚、1-甲基-3-羥基丙基乙烯醚、1-甲基-2-羥基丙基乙烯醚、1-羥基甲基丙基乙烯醚、4-羥基環己基乙烯醚、1,6-己烷二醇單乙烯醚、1,6-己烷二醇二乙烯醚、1,8-辛烷二醇二乙烯醚、1,4-環己烷二甲醇單乙烯醚、1,4-環己烷二甲醇二乙烯醚、1,3-環己烷二甲醇單乙烯醚、1,3-環己烷二甲醇二乙烯醚、1,2-環己烷二甲醇單乙烯醚、1,2-環己烷二甲醇二乙烯醚、對二甲苯二醇單乙烯醚、 對二甲苯二醇二乙烯醚、間二甲苯二醇單乙烯醚、間二甲苯二醇二乙烯醚、鄰二甲苯二醇單乙烯醚、鄰二甲苯二醇二乙烯醚、乙二醇二乙烯醚、二乙二醇單乙烯醚、二乙二醇二乙烯醚、三乙二醇單乙烯醚、三乙二醇二乙烯醚、四乙二醇單乙烯醚、四乙二醇二乙烯醚、五乙二醇單乙烯醚、五乙二醇二乙烯醚、寡聚乙二醇單乙烯醚、寡聚乙二醇二乙烯醚、聚乙二醇單乙烯醚、聚乙二醇二乙烯醚、二丙二醇單乙烯醚、二丙二醇二乙烯醚、三丙二醇單乙烯醚、三丙二醇二乙烯醚、四丙二醇單乙烯醚、四丙二醇二乙烯醚、五丙二醇單乙烯醚、五丙二醇二乙烯醚、寡聚丙二醇單乙烯醚、寡聚丙二醇二乙烯醚、聚丙二醇單乙烯醚、聚丙二醇二乙烯醚、異山梨醇二乙烯醚、氧雜降莰烯二乙烯醚、苯基乙烯醚、正丁基乙烯醚、異丁基乙烯醚、辛基乙烯醚、環己基乙烯醚、氫醌二乙烯醚、1,4-丁烷二醇二乙烯醚、環己烷二甲醇二乙烯醚、三羥甲基丙烷二乙烯醚、三羥甲基丙烷三乙烯醚、雙酚A二乙烯醚、雙酚F二乙烯醚、羥基氧雜降莰烷甲醇二乙烯醚、1,4-環己烷二醇二乙烯醚、新戊四醇三乙烯醚、新戊四醇四乙烯醚、二新戊四醇五乙烯醚、二新戊四醇六乙烯醚等。 The vinyl ether compound may be a known or conventional compound having one or more vinyl ether groups in the molecule, and is not particularly limited, but examples thereof include 2-hydroxyethyl vinyl ether (ethylene glycol monovinyl ether) and 3-hydroxypropyl Vinyl ether, 2-hydroxypropyl vinyl ether, 2-hydroxyisopropyl vinyl ether, 4-hydroxybutyl vinyl ether, 3-hydroxybutyl vinyl ether, 2-hydroxybutyl vinyl ether, 3-hydroxyisobutyl Vinyl ether, 2-hydroxyisobutyl vinyl ether, 1-methyl-3-hydroxypropyl vinyl ether, 1-methyl-2-hydroxypropyl vinyl ether, 1-hydroxymethylpropyl vinyl ether, 4 -Hydroxycyclohexyl vinyl ether, 1,6-hexanediol monovinyl ether, 1,6-hexanediol divinyl ether, 1,8-octanediol divinyl ether, 1,4-cyclohexane Dimethanol monovinyl ether, 1,4-cyclohexane dimethanol divinyl ether, 1,3-cyclohexane dimethanol monovinyl ether, 1,3-cyclohexane dimethanol divinyl ether, 1,2-cyclo Hexane dimethanol monovinyl ether, 1,2-cyclohexane dimethanol divinyl ether, p-xylene glycol monovinyl ether, P-xylene glycol divinyl ether, m-xylene glycol monovinyl ether, m-xylene glycol divinyl ether, o-xylene glycol monovinyl ether, o-xylene glycol divinyl ether, ethylene glycol divinyl ether Ether, diethylene glycol monovinyl ether, diethylene glycol divinyl ether, triethylene glycol monovinyl ether, triethylene glycol divinyl ether, tetraethylene glycol monovinyl ether, tetraethylene glycol divinyl ether, Pentaethylene glycol monovinyl ether, pentaethylene glycol divinyl ether, oligomeric polyethylene glycol monovinyl ether, oligomeric polyethylene glycol divinyl ether, polyethylene glycol monovinyl ether, polyethylene glycol divinyl ether, Dipropylene glycol monovinyl ether, dipropylene glycol divinyl ether, tripropylene glycol monovinyl ether, tripropylene glycol divinyl ether, tetrapropylene glycol monovinyl ether, tetrapropylene glycol divinyl ether, pentapropylene glycol monovinyl ether, pentapropylene glycol divinyl ether, oligomer Propylene glycol monovinyl ether, oligomeric propylene glycol divinyl ether, polypropylene glycol monovinyl ether, polypropylene glycol divinyl ether, isosorbide divinyl ether, oxanor camphenene divinyl ether, phenyl vinyl ether, n-butyl vinyl ether , Isobutyl vinyl ether, octyl vinyl ether, cyclohexyl vinyl ether, hydroquinone divinyl ether, 1,4-butanediol divinyl ether, cyclohexane dimethanol divinyl ether, trimethylol propane di Vinyl ether, trimethylolpropane trivinyl ether, bisphenol A divinyl ether, bisphenol F divinyl ether, hydroxyoxorane camphane methanol divinyl ether, 1,4-cyclohexanediol divinyl ether, Neopentaerythritol triethylene ether, neopentaerythritol tetraethylene ether, dipentaerythritol pentaethylene ether, dipentaerythritol hexaethylene ether, etc.

(乙烯苯基化合物) (Vinyl phenyl compound)

上述乙烯苯基化合物可舉例如苯乙烯、二乙烯苯、甲氧基苯乙烯、乙氧基苯乙烯、羥基苯乙烯、乙烯萘、乙烯蒽、乙酸4-乙烯苯酯、(4-乙烯苯基)二羥基硼烷、4-乙烯基苯基硼酸、4-乙烯苯基硼烷酸、4-乙烯苯基硼酸、對乙烯 苯基硼酸、N-(4-乙烯苯基)馬來亞醯胺等;及該等之衍生物等。 Examples of the vinyl phenyl compound include styrene, divinylbenzene, methoxystyrene, ethoxystyrene, hydroxystyrene, vinylnaphthalene, vinylanthracene, 4-vinylphenyl acetate, (4-vinylphenyl ) Dihydroxyborane, 4-vinylphenylboronic acid, 4-vinylphenylborane acid, 4-vinylphenylboronic acid, p-ethylene Phenylboronic acid, N-(4-vinylphenyl)maleimide, etc.; and derivatives thereof.

本發明中,硬化性組成物中的上述聚合性化合物之含量(配合量)並無特別限定,但相對於除去溶劑之硬化性組成物之總量(100重量%)為70重量%以上,較佳為未滿100重量%,更佳為80至99.8重量%,又更佳為90至99.5重量%。藉由使上述聚合性化合物之含量為70重量%以上,而有使硬化物之耐熱性進一步提升的傾向。 In the present invention, the content (compounding amount) of the polymerizable compound in the curable composition is not particularly limited, but the total amount (100% by weight) of the curable composition excluding the solvent is 70% by weight or more, which is It is preferably less than 100% by weight, more preferably 80 to 99.8% by weight, and still more preferably 90 to 99.5% by weight. When the content of the polymerizable compound is 70% by weight or more, the heat resistance of the cured product tends to be further improved.

又,本發明中,以可形成耐熱性、耐破裂性優異之硬化物此點而言,硬化性組成物較佳為含有環氧基改質聚有機矽倍半氧烷作為聚合性化合物。環氧基改質聚有機矽倍半氧烷的比例較佳為硬化性組成物所含之聚合性化合物總量(100重量%)之70重量%以上(例如70至100重量%),更佳為75重量%以上,又更佳為80重量%以上。 In addition, in the present invention, the curable composition preferably contains an epoxy-modified polyorganosilsesquioxane as a polymerizable compound in that it can form a cured product excellent in heat resistance and crack resistance. The proportion of epoxy-modified polyorganosilsesquioxane is preferably 70% by weight or more (for example, 70 to 100% by weight) of the total amount of polymerizable compounds (100% by weight) contained in the hardenable composition, more preferably It is 75% by weight or more, and more preferably 80% by weight or more.

(聚合起始劑) (Polymerization initiator)

聚合起始劑包括陽離子聚合起始劑與陰離子聚合起始劑。前述陽離子聚合起始劑係藉由加熱產生陽離子種並開始聚合性化合物之硬化反應之化合物,前述陰離子聚合起始劑係藉由加熱產生陰離子種並開始聚合性化合物之硬化反應之化合物。若本發明中的硬化性組成物含有聚合起始劑,則可縮短至無黏性為止之硬化時間。又,聚合起始劑可單獨使用1種或組合2種以上使用。 The polymerization initiator includes a cationic polymerization initiator and an anionic polymerization initiator. The cationic polymerization initiator is a compound that generates cationic species by heating and starts the hardening reaction of the polymerizable compound, and the anionic polymerization initiator is a compound that generates anionic species by heating and starts the hardening reaction of the polymerizable compound. If the curable composition in the present invention contains a polymerization initiator, the curing time until it becomes non-sticky can be shortened. In addition, the polymerization initiator may be used alone or in combination of two or more.

本發明中,以獲得聚有以下特性之接著劑層此點而言,較佳為含有具有下述硬化特性之聚合起始 劑:藉由加熱乾燥而在不進行硬化反應下可迅速形成接著劑層,又,在未滿50℃不具有接著性,並藉由在可抑制對接著體造成傷害之溫度加熱而展現接著性,之後迅速地硬化至無黏性為止。 In the present invention, in order to obtain an adhesive layer having the following characteristics, it is preferable to include a polymerization start having the following hardening characteristics Agent: By heating and drying, the adhesive layer can be quickly formed without the hardening reaction, and it does not have adhesiveness at less than 50°C, and exhibits adhesiveness by heating at a temperature that can suppress damage to the adhesive body. , And then quickly hardened until it became non-sticky.

亦即,在陽離子聚合起始劑的情形,較佳為使用下述聚合起始劑,該聚合起始劑係使對3,4-環氧環己基甲基(3,4-環氧基)環己烷羧酸酯[例如商品名「CELLOXIDE 2021P」(daicel股份有限公司製)]100重量分添加陽離子聚合起始劑1重量分所得組成物在130℃的熱硬化時間為3.5分鐘以上(例如3.5至7.0分鐘,較佳為4.5至6.0分鐘)。 That is, in the case of a cationic polymerization initiator, it is preferable to use the following polymerization initiator, which is made of 3,4-epoxycyclohexylmethyl (3,4-epoxy) Cyclohexane carboxylate [e.g. trade name "CELLOXIDE 2021P" (made by Daicel Co., Ltd.)] 100 parts by weight of a composition obtained by adding 1 part by weight of a cationic polymerization initiator at 130°C has a heat curing time of 3.5 minutes or more (e.g. 3.5 to 7.0 minutes, preferably 4.5 to 6.0 minutes).

又,陰離子聚合起始劑的情形,較佳為使用下述聚合起始劑,該聚合起始劑係使對雙酚A二環氧丙基醚100重量分添加陰離子聚合起始劑1重量分所得組成物在130℃的熱硬化時間為3.5分鐘以上者。 Moreover, in the case of an anionic polymerization initiator, it is preferable to use the following polymerization initiator which added 1 weight part of anionic polymerization initiators to 100 weight part of p-bisphenol A diglycidyl ether. The obtained composition had a heat curing time at 130°C of 3.5 minutes or more.

又,本發明中的熱硬化時間係以根據JIS K5909(1994年)之方法而求得,係將前述組成物在熱板上加熱至成為橡膠狀(更具體而言係硬化進行至以針頭不會拉絲為止)之時間。若使用熱硬化時間低於上述範圍之聚合起始劑,則在加熱乾燥時,使用陽離子聚合起始劑時會產生陽離子種、使用陰離子聚合起始劑時會產生陰離子種,之後即使在室溫也會緩緩進行聚合,故難以形成具有保存安定性之接著劑層。 In addition, the thermal hardening time in the present invention is obtained by a method according to JIS K5909 (1994), and the aforementioned composition is heated on a hot plate until it becomes rubber-like (more specifically, hardening is performed until the needle does not Time until drawing). If a polymerization initiator with a heat hardening time lower than the above range is used, cationic species will be generated when the cationic polymerization initiator is used during heating and drying, and anionic species will be generated when the anionic polymerization initiator is used, and then even at room temperature It also slowly polymerizes, so it is difficult to form an adhesive layer with preservation stability.

上述陽離子聚合起始劑係包括吸收熱之陽 離子部與成為酸產生源之陰離子部。陽離子聚合起始劑可舉例如芳基鋶鹽、芳基錪鹽、芳烴-離子錯合物、4級銨鹽、鋁螫合物、三氟化硼胺錯合物等。本發明中,其中以硬化速度此點而言較佳為芳基鋶鹽。 The above cationic polymerization initiators include heat-absorbing sun The ion part and the anion part which becomes the source of acid generation. Examples of the cationic polymerization initiator include aryl alkoxide salts, aryl gallium salts, aromatic hydrocarbon-ion complexes, quaternary ammonium salts, aluminum chelate compounds, and boron trifluoride amine complexes. In the present invention, among them, aryl alkanoate is preferred in terms of hardening rate.

芳基鋶鹽中的陽離子部可舉例如(4-羥基苯基)甲基苄基鋶離子、三苯基鋶離子、二苯基[4-(苯基硫基)苯基]鋶離子、4-(4-聯苯基硫基)苯基-4-聯苯基苯基鋶離子、三對甲苯基鋶離子等芳基鋶離子(尤其是三芳基鋶離子)。 Examples of the cationic part in the aryl carbomer salt include (4-hydroxyphenyl) methylbenzyl carbamide ion, triphenyl carbamide ion, diphenyl[4-(phenylthio)phenyl] carbamide ion, 4 -(4-biphenylthio) phenyl-4-biphenylphenyl amide ions, tri-p-tolyl amide ions and other aryl amide ions (especially triaryl amide ions).

芳基鋶鹽中的陰離子部可例如SbF6 -、PF6 -、BF4 -、(CF3CF2)3PF3 -、(CF3CF2CF2)3PF3 -、(C6F5)4B-、(C6F5)4Ga-、磺酸陰離子(三氟甲磺酸陰離子、五氟乙烷磺酸陰離子、九氟丁烷磺酸陰離子、甲磺酸陰離子、苯磺酸陰離子、對甲苯磺酸陰離子等)、(CF3SO2)3C-、(CF3SO2)2N-、過鹵酸離子、鹵化磺酸離子、硫酸離子、碳酸離子、鋁酸離子、六氟鉍酸離子、羧酸離子、芳基硼酸離子、硫氰酸離子、硝酸離子等。 Aryl sulfonium anion portion salts may be, for example, SbF 6 -, PF 6 -, BF 4 -, (CF 3 CF 2) 3 PF 3 -, (CF 3 CF 2 CF 2) 3 PF 3 -, (C 6 F 5) 4 B -, (C 6 F 5) 4 Ga -, sulfonic acid anion (trifluoromethanesulfonic acid anion, pentafluoroethane sulfonic acid anion, nonafluorobutanesulfonic acid anion, methanesulfonic acid anion, benzenesulfonic acid anions, toluenesulfonic acid anions, etc.), (CF 3 SO 2) 3 C -, (CF 3 SO 2) 2 N -, perhalogen acid ion, a sulfonic acid halide ion, sulfate ion, carbonate ion, aluminate ion , Hexafluorobismuth acid ion, carboxylic acid ion, aryl boric acid ion, thiocyanate ion, nitric acid ion, etc.

上述陽離子聚合起始劑可舉例如商品名「SP-66」、「SP-77」(以上為ADEKA股份有限公司製);商品名「SANEID SI-60L」、「SANEID SI-80L」、「SANEID SI-100L」、「SANEID SI-150L」(以上為三新化學工業股份有限公司製)等市售品。 Examples of the cationic polymerization initiators include trade names "SP-66" and "SP-77" (above manufactured by ADEKA Corporation); trade names "SANEID SI-60L", "SANEID SI-80L", and "SANEID" "SI-100L", "SANEID SI-150L" (above are manufactured by Sanxin Chemical Industry Co., Ltd.) and other commercial products.

陰離子聚合起始劑可舉例如1級胺、2級胺、3級胺、咪唑類、三氟化硼-胺錯合物等。前述咪唑類 包括例如2-乙基-4-甲基咪唑、2-苯基咪唑、1-(2-氰基乙基)-2-乙基-4-甲基咪唑、2,4-二胺基-6-[2-甲基咪唑基-(1)]乙基-s-三

Figure 105119145-A0202-12-0039-27
、2-苯基咪唑啉、2,3-二氫-1H-吡咯并[1,2-a]苯并咪唑、1-氰基乙基-2-甲基咪唑、1-氫基乙基-2-十一烷基咪唑等。又,前述3級胺包括例如三(二甲基胺基甲基)酚、苄基二甲胺、DBU(1,8-二氮雜雙環[5.4.0]十一烯-7)等。 Examples of the anionic polymerization initiator include primary amines, secondary amines, tertiary amines, imidazoles, and boron trifluoride-amine complexes. The aforementioned imidazoles include, for example, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 1-(2-cyanoethyl)-2-ethyl-4-methylimidazole, 2,4-diamine Yl-6-[2-methylimidazolyl-(1)]ethyl-s-tri
Figure 105119145-A0202-12-0039-27
, 2-phenylimidazoline, 2,3-dihydro-1H-pyrrolo[1,2-a]benzimidazole, 1-cyanoethyl-2-methylimidazole, 1-hydroethyl- 2-undecyl imidazole, etc. In addition, the aforementioned tertiary amine includes, for example, tris(dimethylaminomethyl)phenol, benzyldimethylamine, DBU (1,8-diazabicyclo[5.4.0]undecene-7), and the like.

本發明中,以硬化速度此點而言較佳為使用陽離子聚合起始劑(特佳為熱陽離子聚合起始劑,最佳為芳基鋶鹽)。 In the present invention, it is preferable to use a cationic polymerization initiator (in particular, a thermal cationic polymerization initiator, and most preferably an aryl alkoxide salt) in terms of the hardening rate.

上述聚合起始劑之含量(配合量)並無特別限定,但相對於本發明中的硬化性組成物所含之聚合性化合物100重量分較佳為0.01至3.0重量分,更佳為0.05至2.0重量分,又更佳為0.1至1.0重量分,特佳為0.3至0.8重量分。藉由使聚合起始劑之含量為0.01重量分以上,而可有效率地進行硬化反應,有進一步提升硬化物之耐熱性、接著性的傾向。另一方面,藉由使聚合起始劑之含量為3.0重量分以下,而有進一步提升硬化性組成物之保存性、抑制硬化物之著色的傾向。 The content (compounding amount) of the polymerization initiator is not particularly limited, but it is preferably 0.01 to 3.0 parts by weight, more preferably 0.05 to 100 parts by weight with respect to 100 parts by weight of the polymerizable compound contained in the curable composition in the present invention. 2.0 parts by weight, more preferably 0.1 to 1.0 parts by weight, particularly preferably 0.3 to 0.8 parts by weight. By setting the content of the polymerization initiator to be 0.01 parts by weight or more, the curing reaction can be efficiently performed, and there is a tendency to further improve the heat resistance and adhesiveness of the cured product. On the other hand, by setting the content of the polymerization initiator to 3.0 parts by weight or less, there is a tendency to further improve the storage property of the curable composition and suppress the coloration of the cured product.

(聚合安定劑) (Polymer stabilizer)

聚合安定劑係藉由捕捉陽離子而抑制陽離子聚合進行之化合物。聚合安定劑之陽離子捕捉能係藉由加熱而飽和並喪失。本發明中的硬化性組成物含有陽離子聚合起始劑時,以在塗布、乾燥並形成接著劑層後可長時間抑制聚合進行、在要求接著性之時機藉由加熱而可展現優異接著 性、形成保存安定性優異之接著劑層數點而言,較佳為含有陽離子聚合起始劑及聚合安定劑。 The polymerization stabilizer is a compound that inhibits the progress of cationic polymerization by capturing cations. The cation trapping energy of the polymerization stabilizer is saturated and lost by heating. When the curable composition in the present invention contains a cationic polymerization initiator, it is possible to suppress the progress of polymerization for a long time after coating, drying and forming an adhesive layer, and excellent adhesion can be exhibited by heating when the adhesiveness is required It is preferable to contain a cationic polymerization initiator and a polymerization stabilizer in terms of the number of adhesive layers having excellent properties and excellent storage stability.

前述聚合安定劑可舉例如雙(2,2,6,6-四甲基-4-哌啶基)癸二酸酯、聚([6-(1,1,3,3-四甲基丁基)亞胺基-1,3,5-三

Figure 105119145-A0202-12-0040-29
-2,4-二基][(2,2,6,6-四甲基-4-哌啶基)亞胺基]六亞甲基[(2,2,6,6-四甲基-4-哌啶基)亞胺基])、四(2,2,6,6-四甲基-4-哌啶基)丁烷-1,2,3,4-四羧酸酯、2,2,6,6-四甲基-4-哌啶基苯甲酸酯、(混合2,2,6,6-四甲基-4-哌啶基/三癸基)-1,2,3,4-丁烷四羧酸酯、3,9-雙(2,3-二第三丁基-4-甲基苯氧基)-2,4,8,10-四氧雜-3,9-二磷雜螺[5.5]十一烷、混合(2,2,6,6-四甲基-4-哌啶基/β,β,β’,β’-四甲基-3-9-[2,4,8,10-四氧雜螺[5.5]十一烷]二乙基)-1,2,3,4-丁烷四羧酸酯、聚([6-N-嗎啉基-1,3,5-三
Figure 105119145-A0202-12-0040-30
-2,4-二基][(2,2,6,6-四甲基-4-哌啶基)亞胺基]六亞甲基[(2,2,6,6-四甲基-4-哌啶基)亞胺基])、[N-(2,2,6,6-四甲基-4-哌啶基)-2-甲基-2-(2,2,6,6-四甲基-4-哌啶基)亞胺基]丙醯胺、商品名「LA-77」、「LA-67」、「LA-57」(以上為ADEKA製)、商品名「TINUVIN123」、「TINUVIN152」(以上為CibaJapan股份有限公司製)等受阻胺系化合物;(4-羥基苯基)二甲基鋶甲基亞硫酸酯(SANEIDSI助劑、三新化學工業股份有限公司製)等鋶硫酸鹽系化合物、商品名「PEP-36」(ADEKA股份有限公司製)等亞磷酸酯系化合物等。該等可單獨使用1種或組合2種以上使用。 Examples of the aforementioned polymerization stabilizer include bis(2,2,6,6-tetramethyl-4-piperidyl) sebacate and poly((6-(1,1,3,3-tetramethylbutane Group) imino-1,3,5-tri
Figure 105119145-A0202-12-0040-29
-2,4-diyl][(2,2,6,6-tetramethyl-4-piperidinyl)imino]hexamethylene[(2,2,6,6-tetramethyl- 4-piperidinyl)imino]), tetrakis(2,2,6,6-tetramethyl-4-piperidinyl)butane-1,2,3,4-tetracarboxylate, 2, 2,6,6-tetramethyl-4-piperidinyl benzoate, (mixed 2,2,6,6-tetramethyl-4-piperidinyl/tridecyl)-1,2,3 ,4-butane tetracarboxylate, 3,9-bis(2,3-di-tert-butyl-4-methylphenoxy)-2,4,8,10-tetraoxa-3,9 -Diphosphaspiro[5.5]undecane, mixed (2,2,6,6-tetramethyl-4-piperidinyl/β,β,β',β'-tetramethyl-3-9- [2,4,8,10-tetraoxaspiro[5.5]undecane]diethyl)-1,2,3,4-butane tetracarboxylate, poly([6-N-morpholinyl -1,3,5-three
Figure 105119145-A0202-12-0040-30
-2,4-diyl][(2,2,6,6-tetramethyl-4-piperidinyl)imino]hexamethylene[(2,2,6,6-tetramethyl- 4-piperidinyl)imino]), [N-(2,2,6,6-tetramethyl-4-piperidinyl)-2-methyl-2-(2,2,6,6 -Tetramethyl-4-piperidinyl)imino] acrylamide, trade names "LA-77", "LA-67", "LA-57" (above manufactured by ADEKA), trade name "TINUVIN123" , "TINUVIN152" (above is made by CibaJapan Co., Ltd.) and other hindered amine compounds; (4-hydroxyphenyl) dimethyl carbamoyl sulfite (SANEIDSI additives, manufactured by Sanshin Chemical Industry Co., Ltd.), etc. Phosphite-based compounds such as akura sulfate-based compounds and trade name "PEP-36" (made by ADEKA Corporation). These can be used alone or in combination of two or more.

聚合安定劑之使用量相對於陽離子聚合起 始劑100重量分例如為1重量分以上,較佳為3至20重量分,特佳為5至15重量分。 The amount of polymerization stabilizer used relative to cationic polymerization The 100 parts by weight of the starting agent is, for example, 1 part by weight or more, preferably 3 to 20 parts by weight, particularly preferably 5 to 15 parts by weight.

本發明中的硬化性組成物又可視需要含有1種或2種以上沈降二氧化矽、濕式二氧化矽、霧化二氧化矽、燒成二氧化矽、氧化鈦、氧化鋁、玻璃、石英、鋁矽酸、氧化鐵、氧化鋅、碳酸鈣、碳黑、碳化矽、氮化矽、氮化硼等無機質充填劑;將該等充填劑以有機鹵化矽烷、有機烷氧基矽烷、有機矽氮烷等有機矽化合物處理之無機質充填劑;聚矽氧樹脂、環氧樹脂、氟樹脂等有機樹脂微粉末;銀、銅等導電性金屬粉末等之充填劑、硬化助劑、溶劑(有機溶劑等)、安定化劑(抗氧化劑、紫外線吸收劑、耐光安定劑、熱安定化劑、重金屬失活劑等)、阻燃劑(磷系阻燃劑、鹵素系阻燃劑、無機系阻燃劑等)、阻燃助劑、補強材(其他充填劑等)、成核劑、耦合劑(矽烷耦合劑等)、滑劑、蠟、塑化劑、脫模劑、耐衝撃改良劑、色相改良劑、透明化劑、流變性調整劑(流動性改良劑等)、加工性改良劑、著色劑(染料、顏料等)、抗靜電劑、分散劑、表面調整劑(調平劑、針孔防止劑等)、表面改質劑(滑劑等)、消光劑、消泡劑、抑泡劑、脫泡劑、發泡劑、抗菌劑、防腐劑、黏度調整劑、增黏劑等慣用之添加劑。 The hardening composition in the present invention may optionally contain one or more kinds of precipitated silica, wet silica, atomized silica, fired silica, titanium oxide, alumina, glass, quartz , Aluminosilicate, iron oxide, zinc oxide, calcium carbonate, carbon black, silicon carbide, silicon nitride, boron nitride and other inorganic fillers; the fillers are organic halogenated silane, organic alkoxysilane, organic silicon Inorganic fillers treated with organosilicon compounds such as azones; fine powders of organic resins such as polysiloxane resins, epoxy resins, fluororesins; fillers, hardening aids, solvents (organic solvents) of conductive metal powders such as silver and copper Etc.), stabilizers (antioxidants, ultraviolet absorbers, light stabilizers, thermal stabilizers, heavy metal deactivators, etc.), flame retardants (phosphorus flame retardants, halogen flame retardants, inorganic flame retardants) Agents), flame retardant additives, reinforcing materials (other fillers, etc.), nucleating agents, coupling agents (silane coupling agents, etc.), slip agents, waxes, plasticizers, mold release agents, impact modifiers, hue Improvers, clearing agents, rheology modifiers (fluidity modifiers, etc.), processability modifiers, colorants (dyes, pigments, etc.), antistatic agents, dispersants, surface modifiers (leveling agents, pinholes) Preventive agents, etc.), surface modifiers (slip agents, etc.), matting agents, defoaming agents, foam inhibitors, defoamers, foaming agents, antibacterial agents, preservatives, viscosity modifiers, tackifiers, etc. additive.

本發明中的硬化性組成物並無特別限定,但可藉由將上述各成分一邊於室溫或視需要加熱一邊攪拌、混合而調製。又,本發明中的硬化性組成物可使用作為將各成分預先混合並直接使用之1液系組成物,也可使 用作為例如將個別保管之2個以上成分在使用前以特定比例混合使用之多液系(例如2液系)組成物。 The curable composition in the present invention is not particularly limited, but it can be prepared by stirring and mixing the above-mentioned components while heating at room temperature or heating as necessary. In addition, the curable composition in the present invention may be used as a one-component composition in which each component is mixed in advance and used directly, or may be used For example, it is used as a multi-liquid system (for example, two-liquid system) composition in which two or more components stored separately are mixed and used in a specific ratio before use.

本發明中的硬化性組成物並無特別限定,但較佳為常溫(約25℃)為液體。以旋轉塗布進行塗布時,硬化性組成物之黏度較佳為因應塗布膜厚而調整,塗布為0.1至50μm之膜厚時,較佳為1至5000mPa.s。該黏度係可在例如矽晶圓等基板形成具有均一膜厚之塗膜。又,硬化性組成物之黏度係使用黏度計(商品名「MCR301」、Anton-Paar公司製)並以擺角5%、頻率數0.1至100(1/s)、溫度:25℃之條件測定。 The curable composition in the present invention is not particularly limited, but it is preferably liquid at normal temperature (about 25°C). When coating by spin coating, the viscosity of the curable composition is preferably adjusted according to the thickness of the coating film, and when the coating thickness is 0.1 to 50 μm, it is preferably 1 to 5000 mPa. s. The viscosity can form a coating film with a uniform film thickness on a substrate such as a silicon wafer. In addition, the viscosity of the hardenable composition is measured using a viscometer (trade name "MCR301", manufactured by Anton-Paar) under a condition of a swing angle of 5%, a frequency of 0.1 to 100 (1/s), and a temperature of 25°C .

[硬化物] [Hardened]

本發明之硬化物係對上述硬化性組成物實施階段性改變硬化溫度之加熱處理而得,第1階段之加熱處理結束時之硬化度為85%以下(例如50至85%,更佳為55至85%,又更佳為60至80%),藉由第2階段以後之加熱處理而使硬化度超過85%(較佳為90%以上,特佳為95%以上。又,硬化度上限為100%)。又,第1階段之加熱處理結束時之硬化度係可以DSC測定第1階段之加熱處理結束時樣品之發熱量、及實施加熱處理前樣品之發熱量,並以下式算出。 The cured product of the present invention is obtained by subjecting the above-mentioned curable composition to a heat treatment in which the curing temperature is changed step by step, and the curing degree at the end of the first-stage heat treatment is 85% or less (for example, 50 to 85%, more preferably 55 To 85%, and more preferably 60 to 80%), the heat treatment after the second stage makes the degree of hardening exceed 85% (preferably 90% or more, particularly preferably 95% or more. Also, the upper limit of the degree of hardening Is 100%). In addition, the degree of hardening at the end of the first-stage heat treatment can be calculated by DSC by measuring the calorific value of the sample at the end of the first-stage heat treatment and the calorific value of the sample before the heat treatment, and the following formula can be calculated.

硬化度(%)=[1-(第1階段之加熱處理結束時之發熱量/實施加熱處理前之發熱量)]×100。 Hardness (%)=[1-(heat value at the end of the first stage of heat treatment/heat value before the heat treatment)]×100.

亦即,本發明之硬化物之製造方法,係對於含有具有聚合性基之化合物之硬化性組成物實施階段性改變硬化溫度之加熱處理而製造硬化物,第1階段之加熱 處理結束時之硬化度為85%以下(例如50至85%,更佳為55至85%,又更佳為60至80%),藉由第2階段以後之加熱處理而使硬化度超過85%(較佳為90%以上,特佳為95%以上。又,硬化度之上限為100%)。藉由控制第1階段之加熱處理結束時之硬化度為85%以下,而可形成易緩和應力之構造體,並提升最後所得硬化物之耐破裂性。 That is, the method for manufacturing a hardened product of the present invention is to perform a heat treatment in which the hardening temperature of the compound containing a polymerizable group is changed step by step to produce a hardened product, and the first stage of heating At the end of the treatment, the degree of hardening is less than 85% (for example, 50 to 85%, more preferably 55 to 85%, and still more preferably 60 to 80%), and the degree of hardening exceeds 85 by heat treatment after the second stage % (Preferably 90% or more, particularly preferably 95% or more. The upper limit of the degree of hardening is 100%). By controlling the degree of hardening at the end of the heat treatment in the first stage to be 85% or less, it is possible to form a stress-relieving structure and improve the crack resistance of the resulting hardened product.

可藉由調整加熱溫度及加熱時間而控制硬化度。本發明中,以可獲得耐破裂性更優異之硬化物此點而言,較佳為在硬化度到達50至85%(較佳為55至85%,更佳為60至80%)為止花費一定程度時間緩慢硬化,較佳為第1階段加熱處理例如花費5分鐘以上(較佳為5至120分鐘,更佳為10至60分鐘,最佳為30至60分鐘)進行。 The degree of hardening can be controlled by adjusting the heating temperature and heating time. In the present invention, in terms of obtaining a hardened product having more excellent crack resistance, it is preferable to spend until the hardening degree reaches 50 to 85% (preferably 55 to 85%, more preferably 60 to 80%) Slow curing for a certain period of time, preferably the first-stage heat treatment takes, for example, 5 minutes or more (preferably 5 to 120 minutes, more preferably 10 to 60 minutes, and most preferably 30 to 60 minutes).

即使進行5分鐘以上加熱處理,第1階段之加熱處理中的加熱溫度只要為第1階段之加熱處理結束時之硬化度不超過85%之溫度即可,硬化性組成物含有環氧基改質聚有機矽倍半氧烷作為聚合性化合物時,例如為90℃以上且未滿150℃,較佳為100至140℃,特佳為110至140℃。若以上述範圍之溫度進行第1階段之加熱處理,則可以良好作業性製造耐破裂性優異之硬化物。另一方面,若以超過150℃之溫度進行第1階段之加熱處理,則無法緩慢硬化,有所得硬化物之耐破裂性降低的傾向。又,因硬化進行過快,故有難以在硬化度為85%以下之階段結束第1階段之加熱處理的傾向。若以未滿90℃之溫度進行第1階段之加熱處理,則硬化過於費時,有作業性降低的傾 向。 Even if the heat treatment is performed for more than 5 minutes, the heating temperature in the first-stage heating treatment may be a temperature at which the curing degree at the end of the first-stage heating treatment does not exceed 85%, and the curable composition contains epoxy-based modification When polyorganosilicon silsesquioxane is used as the polymerizable compound, it is, for example, 90°C or more and less than 150°C, preferably 100 to 140°C, and particularly preferably 110 to 140°C. If the first-stage heat treatment is performed at a temperature in the above range, a hardened product excellent in crack resistance can be produced with good workability. On the other hand, if the first-stage heat treatment is performed at a temperature exceeding 150° C., the curing will not proceed slowly, and the crack resistance of the resulting cured product tends to decrease. In addition, since the curing progresses too fast, it is difficult to terminate the heat treatment in the first stage at a stage where the degree of curing is 85% or less. If the first-stage heat treatment is performed at a temperature less than 90°C, the curing will take too much time and the workability will be reduced. to.

第2階段以後之加熱處理中的加熱溫度例如為150至200℃,較佳為160至190℃,特佳為160至180℃。加熱時間例如為5至120分鐘,較佳為10至60分鐘。若第2階段以後之加熱處理溫度低於150℃,則難以使所得硬化物之硬化度提高至100%,有耐熱性、耐破裂性、對被接著體之接著性及密著性降低的傾向。又,即使可將硬化度提高至接近100%,硬化係過於費時且作業性降低,故不佳。另一方面,若第2階段以後之加熱處理溫度高於200℃,則有被接著體因熱而劣化的情形。 The heating temperature in the heat treatment after the second stage is, for example, 150 to 200°C, preferably 160 to 190°C, and particularly preferably 160 to 180°C. The heating time is, for example, 5 to 120 minutes, preferably 10 to 60 minutes. If the heat treatment temperature after the second stage is lower than 150°C, it is difficult to increase the degree of curing of the resulting cured product to 100%, and there is a tendency for heat resistance, crack resistance, adhesion to the adherend, and adhesion to decrease . Moreover, even if the degree of hardening can be increased to close to 100%, the hardening system takes too much time and the workability is reduced, which is not good. On the other hand, if the heat treatment temperature after the second stage is higher than 200°C, the adherend may deteriorate due to heat.

又,各階段中的加熱處理可在上述範圍內階段性變更溫度而進行,也可固定於在上述範圍內之特定溫度而進行加熱處理。又,本發明之加熱處理只要為2階段以上即可,可為2階段,也可為3階段以上之多階段。 In addition, the heat treatment in each stage may be performed by changing the temperature stepwise within the above range, or may be fixed at a specific temperature within the above range to perform the heat treatment. In addition, the heat treatment of the present invention may be performed in two or more stages, and may be two or more stages in three or more stages.

又,第1階段與第2階段之加熱處理所花費時間之合計(進行3階段以後時,亦合計3階段以後之加熱處理所需之時間)例如為0.5至2小時左右,較佳為0.75至1.5小時。 In addition, the total time taken for the heat treatment in the first stage and the second stage (when performing the heat treatment after the third stage, the total time required for the heat treatment after the third stage) is, for example, about 0.5 to 2 hours, preferably 0.75 to 1.5 hours.

以上述製造方法所得之本發明之硬化物係耐破裂性優異,即使賦予冷熱衝撃也可抑制破裂之產生。 The hardened system of the present invention obtained by the above-mentioned manufacturing method is excellent in crack resistance, and even if cold or hot shock is applied, the occurrence of cracks can be suppressed.

又,以上述製造方法所得之本發明之硬化物係耐熱性優異,熱分解溫度例如為200℃以上(例如200至500℃),較佳為260℃以上。又,熱分解溫度係以實施例所記載之方法而求得。 Furthermore, the cured product of the present invention obtained by the above production method is excellent in heat resistance, and the thermal decomposition temperature is, for example, 200°C or higher (for example, 200 to 500°C), preferably 260°C or higher. In addition, the thermal decomposition temperature was obtained by the method described in the examples.

本發明之硬化物之形狀可因應用途而適宜調整,並無特別限制,但可舉例如片狀、膜狀、帶狀、板狀等。硬化物之厚度並無特別限制。 The shape of the cured product of the present invention can be appropriately adjusted according to the application, and is not particularly limited, but examples thereof include a sheet shape, a film shape, a belt shape, and a plate shape. The thickness of the hardened material is not particularly limited.

本發明之硬化物係具有耐熱性、耐破裂性、對於被著體之優異接著性及密著性。因此,將本發明中的硬化性組成物使用作為接著劑,尤其是作為熱硬化性接著劑時,藉由將其硬化所得之本發明之硬化物係耐熱性、耐破裂性、對於被著體之接著性及密著性優異之接著材,可使用於接著所要求之被接著體彼此之用途。 The hardened system of the present invention has heat resistance, crack resistance, excellent adhesion to an object, and adhesion. Therefore, when the curable composition of the present invention is used as an adhesive, especially as a thermosetting adhesive, the cured product of the present invention obtained by curing it has heat resistance, crack resistance, and resistance to an object Adhesive materials with excellent adhesion and adhesion can be used for the purpose of joining the required adherends.

[積層物] [Laminate]

本發明之積層物係3層以上所構成,具有2層之被接著層、及該被接著層之間之接著層,前述接著層係上述硬化物之層。 The laminate of the present invention is composed of three or more layers, and has two layers to be adhered, and an adhesion layer between the adhered layers, and the adhesion layer is the layer of the hardened material.

本發明之積層物係無特別限定,但例如可藉由在一被接著層塗布本發明之硬化性組成物並視需要乾燥而形成接著劑層、或是可將預先將本發明之硬化性組成物塗布於剝離紙等的表面並視需要乾燥而獲得之接著劑層貼合於一被接著層,接著,對該接著劑層貼合另一被接著層,之後實施如上述加熱處理使前述接著劑層硬化,藉此而獲得本發明之積層物。但本發明之積層物之製造方法並不限定於上述方法。 The laminate of the present invention is not particularly limited, but, for example, the adhesive layer can be formed by coating the curable composition of the present invention on an adhered layer and drying if necessary, or the curable composition of the present invention can be previously formed The adhesive layer applied to the surface of the release paper, etc. and dried if necessary, is bonded to a layer to be adhered, and then, another layer to be adhered is adhered to the layer of adhesive, and then the heat treatment as described above is carried out to The agent layer is hardened to obtain the laminate of the present invention. However, the manufacturing method of the laminate of the present invention is not limited to the above method.

硬化性組成物之塗布方法係無特別限定,可利用周知慣用之手段。又,乾燥之手段、條件係無特別限定,可適當設定可盡可能去除溶劑等揮發分之條件,並 使用周知慣用之手段。尤其,硬化性組成物含有使對於CELLOXIDE 2021P(daicel股份有限公司製)100重量分添加1重量分所得之組成物在130℃中的熱硬化時間為3.5分鐘以上之聚合起始劑時,可藉由加熱乾燥抑制硬化反應進行,並可迅速去除溶劑等揮發分,係作業性優異。又,所得接著劑層在未滿50℃時不具有接著性,並藉由在可抑制對被接著體造成傷害之溫度加熱而展現接著性。 The coating method of the curable composition is not particularly limited, and a well-known and usual method can be used. In addition, the means and conditions for drying are not particularly limited, and conditions can be appropriately set to remove volatile components such as solvents as much as possible, and Use well-known methods. In particular, when the curable composition contains a polymerization initiator obtained by adding 1 part by weight to 100 parts by weight of CELLOXIDE 2021P (made by Daicel Co., Ltd.), the thermal curing time at 130° C. is 3.5 minutes or more. The heating and drying suppress the progress of the hardening reaction, and can quickly remove volatile components such as solvents, and the system is excellent in workability. In addition, the resulting adhesive layer does not have adhesiveness below 50°C, and exhibits adhesiveness by heating at a temperature that can suppress damage to the adherend.

形成本發明之積層物中的被接著層之被接著體係無特別限定,可舉例如塑膠基材、金屬基材、陶瓷基材、半導體基材(包括半導體晶片、半導體晶圓等)、玻璃基材、紙基材、木基材、表面為塗裝表面之基材等。又,本發明之積層物可為僅具有2層被接著層者,也可為具有3層以上者。又,被接著層之厚度係無特別限定,例如可在1至100000μm之範圍內適宜選擇。被接著層可不具有嚴密之層狀之形態。 The adhered system forming the adhered layer in the laminate of the present invention is not particularly limited, and examples thereof include plastic substrates, metal substrates, ceramic substrates, semiconductor substrates (including semiconductor wafers, semiconductor wafers, etc.), glass substrates Materials, paper substrates, wood substrates, substrates with painted surfaces, etc. In addition, the laminate of the present invention may have only two layers to be adhered, or may have three or more layers. In addition, the thickness of the layer to be adhered is not particularly limited, and can be appropriately selected, for example, in the range of 1 to 100,000 μm. The layer to be adhered may not have a strict layered form.

本發明之積層物可為僅具有1層接著層者,也可為具有2層以上者。又,接著層之厚度係無特別限定,例如可在0.1至10000μm之範圍內適宜選擇。 The laminate of the present invention may have only one subsequent layer, or may have two or more layers. In addition, the thickness of the adhesive layer is not particularly limited, for example, it can be appropriately selected within the range of 0.1 to 10000 μm.

本發明之積層物除了上述被接著層與接著層以外,也可為具有其他層(例如中間層、底塗層、其他接著層等)者。 The laminate of the present invention may have other layers (for example, an intermediate layer, an undercoat layer, and other adhesive layers) in addition to the adhered layer and the adhesive layer.

本發明之積層物係具有以耐熱性、耐破裂性、對被接著體之接著性及密著性優異之接著層接著被接著體的構成。因此,本發明之積層物可防止因在接著層產 生破裂、剝離而使被接著體剝離、線路被破壞,可提升具備積層物之裝置之信頼性。又,本發明之積層物為半導體晶片之三維積層體時,係較以往之半導體更為高積體、省電,故若使用本發明之積層物,則可提供更小型且高性能之電子機器。 The laminate of the present invention has a structure in which an adhesive layer and an adherend are excellent in heat resistance, crack resistance, adhesion to an adherend, and adhesion. Therefore, the layered product of the present invention can prevent Cracking and peeling will cause the adherend to peel off and the line will be destroyed, which can improve the reliability of the device with laminates. In addition, when the laminate of the present invention is a three-dimensional laminate of semiconductor wafers, it is higher in volume and power-saving than conventional semiconductors. Therefore, if the laminate of the present invention is used, a more compact and high-performance electronic device can be provided .

本發明之積層物可舉例如微處理機、半導體記憶體、電源用IC、通訊用IC、半導體感應器、MEMS、及組合該等之半導體等。該等係可使用於高性能伺服器、工作站、車用電腦、個人電腦、通訊機器、撮影機器、影像顯示裝置等。 The laminate of the present invention includes, for example, a microprocessor, a semiconductor memory, an IC for power supply, an IC for communication, a semiconductor sensor, a MEMS, a semiconductor combining these, and the like. These systems can be used for high-performance servers, workstations, automotive computers, personal computers, communication equipment, photo equipment, image display devices, etc.

因此,具有前述積層物(或具備積層物)之本發明之裝置可舉例如伺服器、工作站、車用電腦、個人電腦、通訊機器、撮影機器、影像顯示裝置等。 Therefore, the device of the present invention having the aforementioned laminate (or having the laminate) can be exemplified by a server, a workstation, a car computer, a personal computer, a communication device, a photographing device, an image display device, and the like.

(實施例) (Example)

以下基於實施例更詳細說明本發明,但本發明並不限定於該等實施例。 The present invention will be described in more detail based on examples below, but the present invention is not limited to these examples.

又,生成物之數目平均分子量及分子量分散度係以下述條件之GPC分析而求得。 The number average molecular weight and molecular weight dispersion of the product were obtained by GPC analysis under the following conditions.

Alliance HPLC系統2695(Waters製)。 Alliance HPLC system 2695 (manufactured by Waters).

Refractive Index Detector 2414(Waters製)。 Refractive Index Detector 2414 (made by Waters).

管柱:Tskgel GMHHR-M×2(TOSOH股份有限公司製)。 Column: Tskgel GMH HR- M×2 (manufactured by TOSOH Co., Ltd.).

保護管柱:Tskgel guard column HHRL(TOSOH股份有限公司製)。 Protection column: Tskgel guard column H HR L (manufactured by TOSOH Corporation).

管柱烘箱:COLUMN HEATER U-620(Sugai製)。 Column oven: COLUMN HEATER U-620 (manufactured by Sugai).

溶劑:THF。 Solvent: THF.

測定條件:40℃。 Measurement conditions: 40°C.

分子量:標準聚苯乙烯換算。 Molecular weight: Standard polystyrene conversion.

生成物中T2體與T3體的比例[T3體/T2體]之測定係以JEOL ECA500(500MHz)之29Si-NMR光譜測定而進行。 The ratio of the T2 body to the T3 body in the product [T3 body/T2 body] was measured by 29 Si-NMR spectrum measurement of JEOL ECA500 (500 MHz).

調製例1 Modulation example 1

(調製環氧基改質聚有機矽倍半氧烷) (Modified epoxy-modified polyorganosilicon silsesquioxane)

在裝設溫度計、攪拌裝置、迴流冷卻器、及氮導入管之300mL燒瓶(反應容器)中,於氮氣流下加入2-(3,4-環氧環己基)乙基三甲氧基矽烷161.5mmol(39.79g)、苯基三甲氧基矽烷9mmol(1.69g)、及丙酮165.9g,升溫至50℃。於如此所得之混合物花費20分鐘滴入水1700mmol(30.60g)後,花費5分鐘滴入5%碳酸鉀水溶液4.70g(碳酸鉀為1.7mmol)。又,在滴入時係未引起明顯溫度上升。之後維持50℃並在氮氣流下進行4小時聚縮合反應。 In a 300 mL flask (reaction vessel) equipped with a thermometer, a stirring device, a reflux cooler, and a nitrogen introduction tube, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane 161.5 mmol ( 39.79g), phenyltrimethoxysilane 9mmol (1.69g), and acetone 165.9g, warmed to 50 ℃. After the mixture thus obtained took 1700 mmol (30.60 g) of water in 20 minutes, 4.70 g of 5% potassium carbonate aqueous solution (1.7 mmol of potassium carbonate) was added in 5 minutes. In addition, there was no significant temperature rise during dripping. Thereafter, the temperature was maintained at 50°C and the polycondensation reaction was carried out under a nitrogen flow for 4 hours.

分析聚縮合反應後反應溶液中之生成物,數目平均分子量為1900,分子量分散度為1.5。由上述生成物之29Si-NMR光譜所算出T2體與T3體的比例[T3體/T2體]為10.3。 The product in the reaction solution after the polycondensation reaction was analyzed. The number average molecular weight was 1900, and the molecular weight dispersion degree was 1.5. The ratio of T2 body to T3 body [T3 body/T2 body] calculated from the 29 Si-NMR spectrum of the above product was 10.3.

之後添加甲基異丁酮及食鹽水並進行加熱攪拌後,冷卻反應溶液並進行水洗至下層液成為中性為止,分取上層液後,以1mmHg、40℃之條件由上層液蒸餾去除溶劑至溶劑量成為25重量%為止,而獲得無色透明之液狀生成物(環氧基改質聚有機矽倍半氧烷)。 After adding methyl isobutyl ketone and saline and heating and stirring, the reaction solution was cooled and washed with water until the lower layer liquid became neutral. After the upper layer liquid was separated, the solvent was distilled off from the upper layer liquid under the conditions of 1 mmHg and 40°C. Until the amount of the solvent becomes 25% by weight, a colorless and transparent liquid product (epoxy-modified polyorganosilsesquioxane) is obtained.

(調製硬化性組成物) (Modulated hardenable composition)

混合所得環氧基改質聚有機矽倍半氧烷100重量分、丙二醇單甲醚乙酸酯50重量分、銻系鋶鹽(商品名「SI-150L」,三新化學工業股份有限公司製;對於CELLOXIDE 2021P(daicel股份有限公司製)100重量分添加1重量分所得之組成物,在130℃中的熱硬化時間:5.4分鐘)0.45重量分(固形分換算)、(4-羥基苯基)二甲基鋶甲基亞硫酸酯(商品名「SANEID SI助劑」,三新化學工業股份有限公司製)0.05重量分,而得硬化性組成物。 100 parts by weight of epoxy-modified polyorganosilicon silsesquioxane obtained by mixing, 50 parts by weight of propylene glycol monomethyl ether acetate, antimony-based monium salt (trade name "SI-150L", manufactured by Sanshin Chemical Industry Co., Ltd.) ; For a composition obtained by adding 1 weight part to 100 weight parts of CELLOXIDE 2021P (made by Daicel Co., Ltd.), heat hardening time at 130° C.: 5.4 minutes) 0.45 weight parts (solid content conversion), (4-hydroxyphenyl ) Dimethyl carbamoyl sulfite (trade name "SANEID SI Auxiliary", manufactured by Sanshin Chemical Industry Co., Ltd.) 0.05 parts by weight to obtain a hardenable composition.

實施例1 Example 1

於矽板(尺寸:2cm×5cm,SUMCO股份有限公司製,切割直徑100mm之矽晶圓而得)以旋轉塗布而塗布矽烷耦合劑(商品名「KBE403」,信越化學工業股份有限公司製,以下稱為「KBE403」),以120℃加熱5分鐘,而獲得附矽烷耦合劑層的矽板。 Apply a silane coupling agent (trade name "KBE403", manufactured by Shin-Etsu Chemical Co., Ltd., below) on a silicon plate (size: 2cm x 5cm, made by SUMCO Corporation, cutting a silicon wafer with a diameter of 100mm) by spin coating It is called "KBE403") and heated at 120°C for 5 minutes to obtain a silicon plate with a silane coupling agent layer.

在附矽烷耦合劑層的矽板之矽烷耦合劑層表面以旋轉塗布而塗布調製例1所得之硬化性組成物,以80℃加熱4分鐘,接著以100℃加熱2分鐘而去除殘留溶劑,而獲得附接著劑層的矽板[接著劑層/矽烷耦合劑層/矽板]。接著劑層之膜厚為5至6μm。 The surface of the silane coupling agent layer of the silicon plate with the silane coupling agent layer was spin-coated to apply the curable composition obtained in Preparation Example 1, heated at 80°C for 4 minutes, and then heated at 100°C for 2 minutes to remove residual solvent, and Obtain a silicon plate with an adhesive layer [adhesive layer/silane coupling agent layer/silicon plate]. The thickness of the adhesive layer is 5 to 6 μm.

以所得附接著劑層的矽板之接著劑層為樣品,將其以130℃加熱30分鐘,接著以170℃加熱30分鐘,而獲得硬化物。第1階段之硬化反應結束後(以130℃加熱30分鐘後)之接著劑層之硬化度為80%。又,第1階段之加 熱處理結束時之硬化度,係以DSC測定第1階段之加熱處理結束時樣品之發熱量、及實施加熱處理前樣品之發熱量,並由下式算出。以下實施例及比較例中係以相同方法算出硬化度。 Using the adhesive layer of the obtained silicon plate with an adhesive layer as a sample, it was heated at 130° C. for 30 minutes and then at 170° C. for 30 minutes to obtain a hardened product. After the curing reaction of the first stage (after heating at 130°C for 30 minutes), the curing degree of the adhesive layer is 80%. Also, the addition of the first stage The degree of hardening at the end of the heat treatment was measured by DSC to measure the calorific value of the sample at the end of the first-stage heating treatment and the calorific value of the sample before the heat treatment, and was calculated by the following formula. In the following examples and comparative examples, the degree of hardening was calculated by the same method.

硬化度(%)=[1-(第1階段之加熱處理結束時之發熱量/實施加熱處理前之發熱量)]×100。 Hardness (%)=[1-(heat value at the end of the first stage of heat treatment/heat value before the heat treatment)]×100.

用以下方法評價所得硬化物之耐熱性、耐破裂性、及密著性。 The heat resistance, crack resistance, and adhesion of the resulting cured product were evaluated by the following methods.

(耐熱性) (Heat resistance)

對硬化物使用熱分析裝置(商品名「TG-DTA6300」,Seiko電子工業股份有限公司製),在氮環境下、升溫速度10℃/分鐘之條件進行熱重量分析並測定熱分解溫度(T),結果係260℃以上,可知耐熱性優異。 A thermoanalyzer (trade name "TG-DTA6300", manufactured by Seiko Electronics Co., Ltd.) was used for the hardened material, thermogravimetric analysis was performed under a nitrogen environment at a temperature increase rate of 10°C/min, and the thermal decomposition temperature (T) was measured The result was 260°C or higher, and it was found that it was excellent in heat resistance.

又,如第1圖所示,熱分解溫度(T)係初期無重量減少或漸減時(圖中A所示範圍)之切線與產生急劇重量減少時(圖中B所示範圍)之反曲點之切線所交叉之溫度。 Also, as shown in Figure 1, the thermal decomposition temperature (T) is the inverse of the tangent when there is no initial weight loss or gradual decrease (the range shown in A in the figure) and when there is a sudden weight loss (the range shown in B in the figure) The temperature at which the tangent of the point crosses.

(耐破裂性) (Crack resistance)

對硬化物實施以250℃加熱30分鐘接著急冷至室溫之冷熱衝撃,無破裂部分係佔硬化物之60%以上,係確認耐破裂性優異。 The hardened product was heated and cooled at 250°C for 30 minutes and then quenched to room temperature. The non-cracked portion accounted for more than 60% of the hardened product, which was confirmed to be excellent in crack resistance.

(密著性) (Adhesion)

進行棋盤狀膠帶試驗(根據JIS K5400-8.5準拠)而評價硬化物對矽板之密著性。其結果未觀察到從矽板剝離,係確認密著性優異。 A checkerboard tape test (according to JIS K5400-8.5) was performed to evaluate the adhesion of the cured product to the silicon plate. As a result, peeling from the silicon plate was not observed, and it was confirmed that the adhesiveness was excellent.

實施例2 Example 2

將以與實施例1相同之方法所得之附接著劑層的矽板之接著劑層作為樣品,將其以120℃加熱30分鐘,接著以170℃加熱30分鐘,而獲得硬化物。第1階段硬化反應結束後(以120℃加熱30分鐘後)之接著劑層之硬化度為60%。 The adhesive layer of the silicon plate with the adhesive layer obtained by the same method as in Example 1 was used as a sample, and it was heated at 120° C. for 30 minutes and then at 170° C. for 30 minutes to obtain a hardened product. After the end of the first stage hardening reaction (after heating at 120°C for 30 minutes), the degree of hardening of the adhesive layer is 60%.

以與實施例1相同之方法評價所得硬化物之耐熱性、耐破裂性、及密著性。 The heat resistance, crack resistance, and adhesion of the resulting cured product were evaluated in the same manner as in Example 1.

(耐熱性) (Heat resistance)

熱分解溫度(T)為260℃以上,可知耐熱性優異。 The thermal decomposition temperature (T) is 260°C or higher, and it is understood that the heat resistance is excellent.

(耐破裂性) (Crack resistance)

無破裂部分佔硬化物之60%以上,係確認耐破裂性優異。 The non-cracked portion accounts for more than 60% of the hardened product, and it is confirmed that the crack resistance is excellent.

(密著性) (Adhesion)

未觀察到從矽板剝離,係確認密著性優異。 No peeling from the silicon plate was observed, and it was confirmed that the adhesion was excellent.

比較例1 Comparative example 1

將以與實施例1相同之方法所得之附接著劑層的矽板之接著劑層作為樣品,將其以150℃加熱30分鐘,接著以170℃加熱30分鐘,而獲得硬化物。第1階段之硬化反應結束後(以150℃加熱30分鐘後)之接著劑層之硬化度為95%。 The adhesive layer of the silicon plate with an adhesive layer obtained by the same method as in Example 1 was used as a sample, and it was heated at 150° C. for 30 minutes and then at 170° C. for 30 minutes to obtain a hardened product. After the hardening reaction in the first stage (after heating at 150°C for 30 minutes), the curing degree of the adhesive layer is 95%.

以與實施例1相同之方法評價所得硬化物之耐破裂性時,係在硬化物全體嚴重地產生破裂。 When the crack resistance of the obtained cured product was evaluated in the same manner as in Example 1, the entire cured product was severely cracked.

實施例3 Example 3

於玻璃板(4吋,SCHOTT日本股份有限公司製)以旋轉 塗布而塗布矽烷耦合劑(商品名「KBE403」,信越化學工業股份有限公司製,以下稱為「KBE403」),以120℃加熱5分鐘,而獲得附矽烷耦合劑層的玻璃板。於所得附矽烷耦合劑層的玻璃板之矽烷耦合劑層面,在減壓下貼合以與實施例1相同之方法所得之附接著劑層的矽板[接著劑層/矽烷耦合劑層/矽板]之接著劑層面,一邊加熱至60℃一邊施加200g/cm2之壓力並貼合後,以130℃加熱30分鐘,接著以170℃加熱30分鐘,藉此獲得積層物[玻璃板/矽烷耦合劑層/接著層/矽烷耦合劑層/矽板]。又,第1階段之硬化反應結束後(以130℃加熱30分鐘後)之接著劑層之硬化度為80%。 Apply a silane coupling agent (trade name "KBE403", manufactured by Shin-Etsu Chemical Co., Ltd., hereinafter referred to as "KBE403") on a glass plate (4-inch, manufactured by SCHOTT Japan Co., Ltd.) by spin coating, and heat at 120°C for 5 Minutes to obtain a glass plate with a silane coupling agent layer. On the silane coupling agent layer of the obtained glass plate with silane coupling agent layer, the silicon board with adhesive layer obtained by the same method as in Example 1 was bonded under reduced pressure [adhesive layer/silane coupling agent layer/silicon The adhesive layer of the board] is heated to 60°C while applying a pressure of 200g/cm 2 and bonding, then heated at 130°C for 30 minutes and then at 170°C for 30 minutes to obtain a laminate [glass plate/silane Coupling agent layer/adhesive layer/silane coupling agent layer/silicon plate]. In addition, the curing degree of the adhesive layer after the curing reaction in the first stage (after heating at 130°C for 30 minutes) was 80%.

用以下方法評價所得積層物之接著性。 The adhesion of the resulting laminate was evaluated by the following method.

(接著性) (Adequacy)

在積層物之接著界面插入刮鬍刀片(商品名「單面刀片修整用刮鬍刀片」,日新EM股份有限公司製)時,未產生界面之剝離,可確認接著層係接著性優異。 When a razor blade (trade name "Single-face Blade Shaving Blade", manufactured by Nissin EM Co., Ltd.) was inserted at the adhesive interface of the laminate, peeling of the interface did not occur, and it was confirmed that the adhesiveness of the adhesive layer system was excellent.

實施例4 Example 4

於以與實施例3相同之方法所得之附矽烷耦合劑層的玻璃板之矽烷耦合劑層面,在減壓下貼合以與實施例3相同之方法所得之附接著劑層的矽板[接著劑層/矽烷耦合劑層/矽板]之接著劑層面,一邊加熱至60℃一邊施加200g/cm2之壓力並貼合後,以120℃加熱30分鐘,接著以170℃加熱30分鐘,藉此獲得積層物[玻璃板/矽烷耦合劑層/接著層/矽烷耦合劑層/矽板]。又,第1階段之硬化反應結 束後(以120℃加熱30分鐘後)之接著劑層之硬化度為60%。 On the silane coupling agent layer of the glass plate with the silane coupling agent layer obtained by the same method as in Example 3, the silicon plate with the adhesive layer obtained by the same method as in Example 3 was bonded under reduced pressure [Next Adhesive layer/silane coupling agent layer/silicon plate], apply 200g/cm 2 of pressure while heating to 60°C and apply the pressure, then heat at 120°C for 30 minutes, then 170°C for 30 minutes. This obtained a laminate [glass plate/silane coupling agent layer/adhesion layer/silane coupling agent layer/silicon plate]. Moreover, the curing degree of the adhesive layer after the curing reaction of the first stage (after heating at 120°C for 30 minutes) was 60%.

以與實施例3相同之方法評價所得積層物之接著性時,未產生界面之剝離,可確認接著層係接著性優異。 When the adhesiveness of the resulting laminate was evaluated in the same manner as in Example 3, peeling of the interface did not occur, and it was confirmed that the adhesiveness of the adhesive layer system was excellent.

[產業上之可利用性] [Industry availability]

本發明之硬化物係具有耐熱性、耐破裂性、對於被著體之優異接著性及密著性。因此,將本發明中的硬化性組成物使用作為接著劑,尤其是使用作為熱硬化性接著劑時,藉由將其硬化所得之本發明之硬化物係耐熱性、耐破裂性、對於被著體之接著性及密著性優異之接著材,可使用於接著所要求之被接著體彼此之用途。 The hardened system of the present invention has heat resistance, crack resistance, excellent adhesion to an object, and adhesion. Therefore, when the curable composition of the present invention is used as an adhesive, especially when it is used as a thermosetting adhesive, the cured product of the present invention obtained by curing it has heat resistance, crack resistance, Adhesive materials with excellent adhesion and adhesion of the body can be used for the purpose of joining the required adherend bodies.

Figure 105119145-A0202-11-0003-1
Figure 105119145-A0202-11-0003-1

由於本案的圖為硬化物之耐熱性評價方法之說明圖,並非本案的代表圖。故本案無指定代表圖。 Since the figure in this case is an explanatory diagram of the heat resistance evaluation method of the hardened product, it is not a representative figure in this case. Therefore, there is no designated representative figure in this case.

Claims (12)

一種硬化物,係對硬化性組成物實施階段性改變硬化溫度之加熱處理所得,該硬化性組成物含有:環氧基改質聚有機矽倍半氧烷;及熱陽離子聚合起始劑及/或熱陰離子聚合起始劑,第1階段之加熱處理結束時之硬化度為85%以下,藉由第2階段以後之加熱處理而使硬化度超過85%。 A hardened product obtained by subjecting a hardenable composition to heat treatment in which the hardening temperature is changed in stages. The hardenable composition contains: epoxy-modified polyorganosilsesquioxane; and a thermal cationic polymerization initiator and/or Or thermal anionic polymerization initiator, the degree of curing at the end of the first stage of heat treatment is 85% or less, and the degree of curing exceeds 85% by the heat treatment after the second stage. 如申請專利範圍第1項所述之硬化物,其中前述硬化性組成物含有熱陽離子聚合起始劑。 The hardened product as described in item 1 of the patent application range, wherein the hardenable composition contains a thermal cationic polymerization initiator. 如申請專利範圍第2項所述之硬化物,其中前述硬化性組成物係進一步含有聚合安定劑,其係藉由捕捉陽離子而抑制陽離子聚合進行。 The cured product as described in item 2 of the patent application range, wherein the curable composition further contains a polymerization stabilizer, which inhibits cationic polymerization by trapping cations. 如申請專利範圍第1至3項中任一項所述之硬化物,其中第1階段加熱處理係在90℃以上花費10至120分鐘進行。 The hardened product according to any one of items 1 to 3 of the patent application scope, wherein the first-stage heat treatment is performed at 90°C or more in 10 to 120 minutes. 如申請專利範圍第1至3項中任一項所述之硬化物,其中環氧基改質聚有機矽倍半氧烷為環氧基改質聚有機矽倍半氧烷,該環氧基改質聚有機矽倍半氧烷係:具有下述式(1)所示之構成單元,且下述式(I)所示之構成單元與下述式(II)所示之構成單元的莫耳比[式(I)所示之構成單元/式(II)所示之構成單元]為5以上;相對於矽氧烷構成單元總量(100莫耳%)之上述式(1)所示之構成單元及下述式(4)所示之構成單元的比例為55至100莫耳%,數目平均分子量為1000至3000, 分子量分散度(重量平均分子量/數目平均分子量)為1.0至3.0;[R1SiO3/2] (1)式(1)中,R1表示含有環氧基之基;[RaSiO3/2] (I)式(I)中,Ra表示含有環氧基之基、取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、取代或無取代之烯基、或氫原子;[RbSiO2/2(ORc)] (II)式(II)中,Rb表示含有環氧基之基、取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、取代或無取代之烯基、或氫原子,Rc表示氫原子或碳數1至4之烷基;[R1SiO2/2(ORc)] (4)式(4)中,R1係與式(1)中相同,Rc係與式(II)中相同。 The hardened product as described in any one of claims 1 to 3, wherein the epoxy-modified polyorganosilsesquioxane is an epoxy-modified polyorganosilsesquioxane, and the epoxy group Modified polyorganosilicon silsesquioxane system: It has a structural unit represented by the following formula (1), and a structural unit represented by the following formula (I) and a structural unit represented by the following formula (II) The ear ratio [the structural unit shown in formula (I)/the structural unit shown in formula (II)] is 5 or more; it is shown in the above formula (1) with respect to the total amount of siloxane constituent units (100 mole %) The ratio of the constituent unit and the constituent unit represented by the following formula (4) is 55 to 100 mol %, the number average molecular weight is 1000 to 3000, and the molecular weight dispersion degree (weight average molecular weight/number average molecular weight) is 1.0 to 3.0; [R 1 SiO 3/2 ] (1) In formula (1), R 1 represents an epoxy group-containing group; [R a SiO 3/2 ] (I) In formula (I), R a represents an epoxy group Radical, substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom; [R b SiO 2/2 (OR c )] (II) In formula (II), R b represents an epoxy group-containing group, substituted or unsubstituted aryl group, substituted or unsubstituted aralkyl group, substituted or Unsubstituted cycloalkyl, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, or hydrogen atom, R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; [R 1 SiO 2/2 ( OR c )] (4) In formula (4), R 1 is the same as in formula (1), and R c is the same as in formula (II). 如申請專利範圍第5項所述之硬化物,其中上述R1為由下述式(1a)至(1d)所示之基所成群組所選擇之1種以上的基;
Figure 105119145-A0305-02-0059-1
Figure 105119145-A0305-02-0059-2
Figure 105119145-A0305-02-0059-3
Figure 105119145-A0305-02-0059-4
式中,R1a,R1b,R1c,R1d係相同或相異且表示直鏈或分支鏈狀之伸烷基。
The hardened product as described in item 5 of the patent application scope, wherein the above R 1 is one or more groups selected from the group consisting of groups represented by the following formulas (1a) to (1d);
Figure 105119145-A0305-02-0059-1
Figure 105119145-A0305-02-0059-2
Figure 105119145-A0305-02-0059-3
Figure 105119145-A0305-02-0059-4
In the formula, R 1a , R 1b , R 1c and R 1d are the same or different and represent straight-chain or branched-chain alkylene.
如申請專利範圍第5項所述之硬化物,其中環氧基改質聚有機矽倍半氧烷係進一步具有下述式(2)所示之構成單元;[R2SiO3/2] (2)式(2)中,R2表示取代或無取代之芳基、取代或無取代之芳烷基、取代或無取代之環烷基、取代或無取代之烷基、或取代或無取代之烯基。 The hardened product as described in item 5 of the patent application scope, wherein the epoxy-modified polyorganosilsesquioxane system further has a structural unit represented by the following formula (2); [R 2 SiO 3/2 ] ( 2) In formula (2), R 2 represents substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkyl, or substituted or unsubstituted Alkenyl. 如申請專利範圍第7項所述之硬化物,其中上述R2為取代或無取代之芳基。 The hardened product as described in item 7 of the patent application, wherein R 2 is a substituted or unsubstituted aryl group. 如申請專利範圍第1至3項中任一項所述之硬化物,其中硬化性組成物係進一步含有矽烷耦合劑。 The hardened product as described in any one of claims 1 to 3, wherein the hardenable composition further contains a silane coupling agent. 一種硬化物之製造方法,係對硬化性組成物實施階段 性改變硬化溫度之加熱處理而製造硬化物,該硬化性組成物含有:環氧基改質聚有機矽倍半氧烷;及熱陽離子聚合起始劑及/或熱陰離子聚合起始劑,其中,第1階段之加熱處理結束時之硬化度為85%以下,藉由第2階段以後之加熱處理而使硬化度超過85%。 A method of manufacturing a hardened product, which is the implementation stage of a hardenable composition Heat treatment to change the hardening temperature to produce a hardened product, the hardenable composition contains: epoxy-modified polyorganosilsesquioxane; and thermal cationic polymerization initiator and/or thermal anionic polymerization initiator, wherein At the end of the first stage of heat treatment, the degree of curing is 85% or less, and the degree of curing exceeds 85% by the heat treatment after the second stage. 一種積層物,係以3層以上所構成,且具有2層之被接著層、及該被接著層之間之接著層;其中,前述接著層係申請專利範圍第1至9項中任一項所述之硬化物之層。 A laminate consisting of more than 3 layers and having 2 layers to be bonded, and the bonding layer between the bonded layers; wherein, the bonding layer is any one of items 1 to 9 of the patent application The hardened layer. 一種電子機器,係具有申請專利範圍第11項所述之積層物。 An electronic device with a laminate as described in item 11 of the patent scope.
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