TWI688129B - Aluminum alloy lead frame and manufacturing method thereof - Google Patents

Aluminum alloy lead frame and manufacturing method thereof Download PDF

Info

Publication number
TWI688129B
TWI688129B TW107122797A TW107122797A TWI688129B TW I688129 B TWI688129 B TW I688129B TW 107122797 A TW107122797 A TW 107122797A TW 107122797 A TW107122797 A TW 107122797A TW I688129 B TWI688129 B TW I688129B
Authority
TW
Taiwan
Prior art keywords
layer
aluminum alloy
lead frame
reflective
intermediate layer
Prior art date
Application number
TW107122797A
Other languages
Chinese (zh)
Other versions
TW202006975A (en
Inventor
德瑞克 提羅
蔡鴻麟
高于迦
Original Assignee
安森科技材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 安森科技材料股份有限公司 filed Critical 安森科技材料股份有限公司
Priority to TW107122797A priority Critical patent/TWI688129B/en
Publication of TW202006975A publication Critical patent/TW202006975A/en
Application granted granted Critical
Publication of TWI688129B publication Critical patent/TWI688129B/en

Links

Images

Abstract

本發明提供一種鋁合金導線架及其製造方法,該導線架提供一鋁合金基板,其具有相對的一上表面和一下表面;其中,一反射複合層設置於該上表面,該反射複合層依序包括一第一中間層、一功能層及一反射層,該第一中間層設置於該鋁合金基板和該功能層間;以及一焊接複合層設置於該下表面,該焊接複合層依序包括一第二中間層、一焊接層及一第二保護層,該第二中間層設置於該鋁合金基板和該焊接層間,得一鋁合金導線架。本發明藉由提升該功能層及該焊接層與該鋁合金基板之結合力,改善一般鋁合金基板之各膜層附著性不佳、以及現有銅合金導線架反射率不佳的問題,不僅提升其應用價值,進而提供一價格及重量具優勢之導線架。The invention provides an aluminum alloy lead frame and a manufacturing method thereof. The lead frame provides an aluminum alloy substrate having opposite upper and lower surfaces; wherein, a reflective composite layer is disposed on the upper surface, and the reflective composite layer The sequence includes a first intermediate layer, a functional layer, and a reflective layer, the first intermediate layer is disposed between the aluminum alloy substrate and the functional layer; and a welded composite layer is disposed on the lower surface, the welded composite layer includes sequentially A second intermediate layer, a welding layer, and a second protective layer. The second intermediate layer is disposed between the aluminum alloy substrate and the welding layer to obtain an aluminum alloy lead frame. The invention improves the problems of poor adhesion of the film layers of the general aluminum alloy substrate and the poor reflectivity of the existing copper alloy lead frame by improving the bonding force of the functional layer and the welding layer with the aluminum alloy substrate, not only improves Its application value, in turn, provides a lead frame with advantages in price and weight.

Description

鋁合金導線架及其製造方法Aluminum alloy lead frame and manufacturing method thereof

本發明是關於一種導線架,尤指一種鋁合金導線架。 The invention relates to a lead frame, especially an aluminum alloy lead frame.

發光二極體(LED:Light Emitting Diode)做為光源之發光裝置,其高亮度、低耗能、體積小、壽命長,且穩定表現的特性,使其廣泛又快速的發展。當晶粒黏置於導線架上形成各類型LED時,導線架肩負高光提取效能、較佳導電性及熱傳導性等需求;市面常用之銅合金導線架具有熱傳導性佳及導電性佳的特性,又於銅合金導線架表面設置反光功能之金屬層,能有效提取從LED元件發出的光源。如中華民國發明專利第I564406號之LED用銅合金導線架及其製造方法,即使用銅合金做為導線架基板,其藉由改良銅合金基板的熱傳導性、導電性及表面粗糙度,並於表面形成銀層的反射層,提高由LED元件提取光效能的功效。 Light Emitting Diode (LED: Light Emitting Diode) as the light source of light source, its high brightness, low energy consumption, small size, long life, and stable performance characteristics, making it extensive and rapid development. When the die is stuck on the lead frame to form various types of LEDs, the lead frame shoulders the requirements of high light extraction performance, better conductivity and thermal conductivity; the copper alloy lead frames commonly used in the market have the characteristics of good thermal conductivity and good conductivity. Furthermore, a metal layer with a reflective function is provided on the surface of the copper alloy lead frame, which can effectively extract the light source emitted from the LED element. For example, the copper alloy lead frame for LED of the Republic of China Invention Patent No. I564406 and its manufacturing method, that is, using copper alloy as the lead frame substrate, by improving the thermal conductivity, electrical conductivity and surface roughness of the copper alloy substrate, and A reflective layer of silver layer is formed on the surface to improve the light extraction efficiency of the LED element.

然而,銅合金之原物料價格高,且隨著現今電子產品要求輕薄短小的特性,藉由使用不同材質製造擁有相同或更佳效能之導線架,一直是業界努力的方向。 However, the price of raw materials of copper alloys is high, and with today's electronic products requiring light, thin and short characteristics, it is always the direction of the industry to use different materials to manufacture lead frames with the same or better performance.

鋁合金不僅較銅合金有價格上的優勢,又鋁密度(2.7g/cm3)較銅密度低(8.9g/cm3),使用鋁合金能達到減輕重量之目的;尤其,鋁合金之表面粗糙度優於銅合金,能製得反射率更佳的反射層。 Aluminum alloy not only has a price advantage over copper alloy, but also has a lower aluminum density (2.7g/cm 3 ) than copper density (8.9g/cm 3 ). Using aluminum alloy can achieve the purpose of reducing weight; in particular, the surface of aluminum alloy The roughness is better than copper alloy, which can produce a reflective layer with better reflectivity.

但鋁與氧有強親和力,表面易形成氧化膜而削弱反射層與鋁的結合力,且鋁為化學活性高之兩性金屬,鍍膜前處理造成的鋁表面腐蝕會使鍍層結合力下降;導致具反射功能之鍍膜脫膜、焊接層分離,或是焊線脫落的現象,故普遍導線架之基材仍以銅與其合金居多。 However, aluminum has a strong affinity for oxygen, and an oxide film is easily formed on the surface to weaken the binding force between the reflective layer and aluminum. Aluminum is an amphoteric metal with high chemical activity. Corrosion of the aluminum surface caused by pretreatment of the coating will reduce the bonding force of the coating; The coating film of the reflective function is peeled off, the welding layer is separated, or the welding wire is dropped, so the base material of the lead frame is still mostly copper and its alloy.

有鑑於上述現有的鋁合金導線架存在技術缺陷,本發明之目的在於提供一種膜層附著性及反射率良好的鋁合金導線架,且其價格及重量具優勢。 In view of the above technical defects of the existing aluminum alloy lead frame, the object of the present invention is to provide an aluminum alloy lead frame with good film adhesion and reflectivity, and its price and weight have advantages.

為達成前述目的,本發明提供一鋁合金導線架,該鋁合金導線架提供一鋁合金基板,其具有相對的一上表面和一下表面;其中,一反射複合層設置於該上表面,該反射複合層依序包括一第一中間層、一功能層及一反射層,該第一中間層設置於該鋁合金基板和該功能層之間;以及一焊接複合層設置於該下表面,該焊接複合層依序包括一第二中間層、一焊接層及一第二保護層,該第二中間層設置於該鋁合金基板和該焊接層之間。 In order to achieve the foregoing object, the present invention provides an aluminum alloy lead frame which provides an aluminum alloy substrate having an upper surface and a lower surface opposite to each other; wherein, a reflective composite layer is provided on the upper surface, the reflection The composite layer includes a first intermediate layer, a functional layer and a reflective layer in sequence, the first intermediate layer is disposed between the aluminum alloy substrate and the functional layer; and a welding composite layer is disposed on the lower surface, the welding The composite layer includes a second intermediate layer, a welding layer, and a second protective layer in sequence. The second intermediate layer is disposed between the aluminum alloy substrate and the welding layer.

藉由上述的技術手段,本發明鋁合金導線架以鋁合金為基板,其表面粗糙度佳可提高反射率,且其熱傳導性佳可避免熱度峰值發生;另外,於鋁合金基板上設置反射複合層和焊接複合層,並控制第一中間層、功能層、反射層、第二中間層、焊接層及第二保護層的材料與厚度;其中,該第一中間層及該第二中間層能增強其上形成之膜層的附著性,並能降低因表面安裝元件(Surface-mounted device,SMD)產生熱能所造成的脫膜現象;再者,設置於該第一中間層上之該功能層,能使反射層附著良好且提高後續焊接的可焊性;反射層附著性佳,能突顯鋁合金表面低粗糙度之特性,提高反射率,進而有效提取從LED元件發出之光源。因此,上述技術手段不僅提高鋁合金基板上各膜層之間的附著性,相較於現有銅合金導線架,進而提供一反射率更高的鋁合金導線架,從而提升鋁合金導線架的應用價值。 By the above-mentioned technical means, the aluminum alloy lead frame of the present invention uses an aluminum alloy as a substrate, its surface roughness is good to improve reflectivity, and its thermal conductivity is good to avoid the occurrence of heat peaks; in addition, a reflective composite is provided on the aluminum alloy substrate Layer and welding composite layer, and control the material and thickness of the first intermediate layer, functional layer, reflective layer, second intermediate layer, welding layer and second protective layer; wherein, the first intermediate layer and the second intermediate layer can Enhances the adhesion of the film layer formed thereon, and can reduce the peeling phenomenon caused by the thermal energy generated by the surface-mounted device (SMD); furthermore, the functional layer provided on the first intermediate layer It can make the reflective layer adhere well and improve the solderability of subsequent welding; the reflective layer has good adhesion, can highlight the low roughness of the aluminum alloy surface, improve the reflectivity, and then effectively extract the light source emitted from the LED element. Therefore, the above technical means not only improve the adhesion between the film layers on the aluminum alloy substrate, but also provide an aluminum alloy lead frame with higher reflectivity compared to the existing copper alloy lead frame, thereby enhancing the application of the aluminum alloy lead frame value.

依據本發明,可進一步於該反射複合層之該反射層上設置一第一保護層,該第一保護層可維持該反射層之膜層品質,因此可使該反射層維持其最佳反射率。 According to the present invention, a first protective layer can be further provided on the reflective layer of the reflective composite layer, the first protective layer can maintain the film quality of the reflective layer, and thus the reflective layer can maintain its optimal reflectivity .

本發明另提供一鋁合金導線架的製造方法,其包括以下步驟:準備一鋁合金基板,其具有相對的一上表面和一下表面;於該鋁合金基板之該上表面依序設置一第一中間層、一功能層及一反射層,藉以於該鋁合金基板之該上表面形成一反射複合層,該反射複合層依序包括該第一中間層、該功能層及該反射層,該第一中間層設置於該鋁合金基板和該功能層之間;以及於該鋁合金基板之該下表面依序設置一第二中間層、一焊接層及一第二保護層,藉以於該鋁合金基板之該下表面形成一焊接複合層,該焊接複合層依序包括該第二中間層、該焊接層及該第二保護層,該第二中間層設置於該鋁合金基板和該焊接層之間,以形成該鋁合金導線架。 The present invention also provides a method for manufacturing an aluminum alloy lead frame, which includes the following steps: preparing an aluminum alloy substrate having an upper surface and a lower surface opposite to each other; a first order is provided on the upper surface of the aluminum alloy substrate in sequence An intermediate layer, a functional layer and a reflective layer, whereby a reflective composite layer is formed on the upper surface of the aluminum alloy substrate, the reflective composite layer includes the first intermediate layer, the functional layer and the reflective layer in sequence An intermediate layer is disposed between the aluminum alloy substrate and the functional layer; and a second intermediate layer, a soldering layer, and a second protective layer are sequentially disposed on the lower surface of the aluminum alloy substrate, thereby the aluminum alloy A welding composite layer is formed on the lower surface of the substrate, the welding composite layer includes the second intermediate layer, the welding layer and the second protective layer in sequence, the second intermediate layer is disposed between the aluminum alloy substrate and the welding layer To form the aluminum alloy lead frame.

依據本發明之該鋁合金導線架的製造方法,於該反射複合層更包括一第一保護層,將該第一保護層設置於該反射層上。 According to the manufacturing method of the aluminum alloy lead frame of the present invention, the reflective composite layer further includes a first protective layer, and the first protective layer is disposed on the reflective layer.

依據本發明,該鋁合金導線架使用的該鋁合金基板,可為鍛造鋁合金,較佳的,該鍛造鋁合金之純度高於99.0%,包括鋁猛合金或鋁鎂合金;本發明可適用之鋁合金基板材料,如鍛造鋁合金之1000、3000或5000系列,但並非僅限於此;該鋁合金基板厚度介於0.1毫米(mm)至1.5mm,較佳的,厚度介於0.2mm至0.8mm。 According to the present invention, the aluminum alloy substrate used for the aluminum alloy lead frame may be a forged aluminum alloy, preferably, the purity of the forged aluminum alloy is higher than 99.0%, including aluminum alloy or aluminum magnesium alloy; the present invention is applicable Aluminum alloy substrate materials, such as forged aluminum alloy 1000, 3000 or 5000 series, but not limited to this; the thickness of the aluminum alloy substrate is between 0.1 millimeters (mm) to 1.5mm, preferably, the thickness is between 0.2mm to 0.8mm.

依據本發明,該反射複合層及該焊接複合層分別設置該第一中間層及該第二中間層,該第一中間層及該第二中間層可選用相同或不同之材料,該第一中間層、該第二中間層之材料可包含鋁、鈦、鉻、鎳,其等之金屬合金、其等之氧化物、其等之氮化物、其等之氮氧化物、或其組合,但並非僅限於此;本發明可適用之第一中間層及第二中間層可例如鈦金屬層、鈦氧化物層、鋁鈦合金層、或氮化鋁鈦層,但並非僅限於此。 According to the present invention, the reflective composite layer and the welding composite layer are respectively provided with the first intermediate layer and the second intermediate layer. The first intermediate layer and the second intermediate layer may be made of the same or different materials. The material of the second intermediate layer may include aluminum, titanium, chromium, nickel, their metal alloys, their oxides, their nitrides, their nitrogen oxides, or a combination thereof, but not It is only limited to this; the first intermediate layer and the second intermediate layer applicable to the present invention may be, for example, a titanium metal layer, a titanium oxide layer, an aluminum-titanium alloy layer, or an aluminum titanium nitride layer, but it is not limited thereto.

依據本發明,該第一中間層及該第二中間層厚度介於2奈米(nm)至1000nm,較佳的,厚度介於2nm至200nm。 According to the present invention, the thickness of the first intermediate layer and the second intermediate layer is between 2 nanometers (nm) and 1000 nm, preferably, the thickness is between 2 nm and 200 nm.

依據本發明,該第一中間層及該第二中間層可使用包括電鍍、真空鍍膜技術等技術手段,但並非僅限於此。其中,真空鍍膜技術具有膜層與工件表面的結合力強、膜層沉積速率快、可鍍膜層種類廣,且膜層性能穩定等特性;例如,使用真空鍍膜技術將鈦金屬附著於鋁基材表面作為該第一中間層或該第二中間層之鍍膜材料,可提升該第一中間層及該第二中間層上形成之膜層的附著性。 According to the present invention, the first intermediate layer and the second intermediate layer may use technical means including electroplating, vacuum coating technology, etc., but it is not limited to this. Among them, the vacuum coating technology has the characteristics of strong binding force between the film layer and the workpiece surface, fast film deposition rate, wide variety of coatable layers, and stable film performance; for example, using vacuum coating technology to attach titanium metal to an aluminum substrate The surface serves as a coating material for the first intermediate layer or the second intermediate layer, which can improve the adhesion of the film layer formed on the first intermediate layer and the second intermediate layer.

依據本發明,該功能層之材料包括金屬或金屬合金,較佳的,可為銅層;該功能層厚度介於2nm至2500nm,較佳的,厚度介於100nm至1000nm。 According to the present invention, the material of the functional layer includes a metal or a metal alloy, preferably a copper layer; the thickness of the functional layer is between 2 nm and 2500 nm, preferably, the thickness is between 100 nm and 1000 nm.

依據本發明,該反射層之材料包括金屬或金屬合金,較佳的,該反射層可為銀層或鋁層。該反射層厚度介於50nm至6000nm,較佳的,厚度介於100nm至4000nm。 According to the present invention, the material of the reflective layer includes a metal or a metal alloy. Preferably, the reflective layer may be a silver layer or an aluminum layer. The thickness of the reflective layer is between 50 nm and 6000 nm, preferably, the thickness is between 100 nm and 4000 nm.

依據本發明,該第一保護層之材料包括非金屬低吸收材料,較佳的,該第一保護層可為矽氧化物層。該保護層之厚度介於0.5nm至20nm,較佳的,厚度介於0.5nm至10nm。 According to the present invention, the material of the first protective layer includes a non-metallic low absorption material. Preferably, the first protective layer may be a silicon oxide layer. The thickness of the protective layer is between 0.5 nm and 20 nm, preferably, the thickness is between 0.5 nm and 10 nm.

依據本發明,該焊接層之材料可使用包括金屬或金屬合金,較佳的,該焊接層可為銅層。該焊接層厚度介於100nm至5000nm,較佳的,厚度介於500nm至1000nm;且該鋁合金基板之表面鍍上該焊接層於25℃下具有不超過1.2×10-1歐姆.平方毫米/公尺(Ω mm2/m)之電阻率。 According to the present invention, the material of the soldering layer may include metals or metal alloys. Preferably, the soldering layer may be a copper layer. The thickness of the welding layer is between 100 nm and 5000 nm, preferably, the thickness is between 500 nm and 1000 nm; and the surface of the aluminum alloy substrate coated with the welding layer has no more than 1.2×10 -1 ohm at 25°C. The resistivity of square millimeter/meter (Ω mm 2 /m).

依據本發明,該第二保護層之材料包括金屬或金屬合金,較佳的,該第二保護層可為銀層。該保護層厚度介於50nm至1000nm,較佳的,厚度介於50nm至200nm。 According to the present invention, the material of the second protective layer includes a metal or a metal alloy. Preferably, the second protective layer may be a silver layer. The thickness of the protective layer is between 50 nm and 1000 nm, preferably, the thickness is between 50 nm and 200 nm.

依據本發明,導線架不僅可應用於二極體和發光二極體的產品,亦可應用於積體電路,例如用於半導體,作為晶片及印刷電路板線路的連接元件,但並非僅限於此。 According to the present invention, the lead frame can be applied not only to the products of diodes and light-emitting diodes, but also to integrated circuits, such as semiconductors, as connecting elements for chips and printed circuit board circuits, but it is not limited to this .

因此,本發明提高該鋁合金導線架之各膜層之間的附著性,並提供一相較現有銅合金導線架之反射率更好的鋁合金導線架,有效降低產品價格、減輕重量,進一步提升該鋁合金導線架的應用價值。 Therefore, the present invention improves the adhesion between the film layers of the aluminum alloy lead frame, and provides an aluminum alloy lead frame with better reflectivity than the existing copper alloy lead frame, which effectively reduces the product price, reduces the weight, and further Improve the application value of the aluminum alloy lead frame.

1、1’、1”:鋁合金導線架 1. 1’, 1”: Aluminum alloy lead frame

2:銅合金導線架 2: copper alloy lead frame

11、11’:上表面 11, 11’: upper surface

21:反射複合層 21: Reflective composite layer

L1:鋁合金基板 L1: Aluminum alloy substrate

L1’:銅合金基板 L1’: Copper alloy substrate

12、12’:下表面 12, 12’: Lower surface

22:焊接複合層 22: Welding composite layer

L2:第一中間層 L2: the first middle layer

L3、L3’:功能層 L3, L3’: functional layer

L4、L4’:反射層 L4, L4’: reflective layer

L5:第一保護層 L5: the first protective layer

L6:第二中間層 L6: Second middle layer

L7:焊接層 L7: Welding layer

L8:第二保護層 L8: second protective layer

圖1為實施例1之鋁合金導線架的剖面圖。 1 is a cross-sectional view of the aluminum alloy lead frame of Example 1. FIG.

圖2為實施例2之鋁合金導線架的剖面圖。 2 is a cross-sectional view of the aluminum alloy lead frame of Example 2. FIG.

圖3為比較例1之銅合金導線架的剖面圖。 3 is a cross-sectional view of the copper alloy lead frame of Comparative Example 1. FIG.

圖4為比較例2之鋁合金導線架的剖面圖。 4 is a cross-sectional view of the aluminum alloy lead frame of Comparative Example 2. FIG.

以下列舉數種實施例及比較例說明本發明之實施方式,熟習此技藝者可經由本說明書之內容輕易地了解本發明所能達成之優點與功效,並且於不悖離本發明之精神下進行各種修飾與變更,以施行或應用本發明之內容。 Several examples and comparative examples are listed below to illustrate the implementation of the present invention. Those skilled in the art can easily understand the advantages and effects achieved by the present invention through the contents of this specification, and proceed without departing from the spirit of the present invention. Various modifications and changes to implement or apply the content of the present invention.

實施例1:鋁合金導線架Example 1: Aluminum alloy lead frame

如圖1所示,實施例1之鋁合金導線架係經由以下方法所製得。首先,選用5005系列之鋁鎂合金作為鋁合金基板L1,其厚度為0.3mm;基材可為捲料之形式,以連續式製程進行製造。以真空鍍膜技術,於該鋁合金基板L1之上表面11形成第一中間層L2,第一中間層L2為鈦金屬層,其厚度為20nm;接著,以真空鍍膜技術,於第一中間層L2上形成功能層L3,功能層L3為銅層,其厚度為800nm;再以真空鍍膜技術,於該鋁合金基板L1之下表面12形成第二中間層L6,第二中間層L6為鈦金屬層,其厚度為20nm;下一步,以真空鍍膜 技術,於第二中間層L6上形成焊接層L7,焊接層L7為銅層,其厚度為800nm;另以電鍍法於功能層L3上形成反射層L4,反射層L4為銀層,其厚度2000nm;最後,以電鍍法於焊接層L7上形成第二保護層L8,第二保護層L8為銀層,其厚度為1000nm。鍍膜後之鋁合金基板經沖壓加工成型,得一鋁合金導線架1。 As shown in FIG. 1, the aluminum alloy lead frame of Example 1 is manufactured by the following method. First, the 5005 series of aluminum-magnesium alloy is selected as the aluminum alloy substrate L1, which has a thickness of 0.3mm; the substrate can be in the form of a roll material, which is manufactured in a continuous process. The first intermediate layer L2 is formed on the upper surface 11 of the aluminum alloy substrate L1 by vacuum coating technology. The first intermediate layer L2 is a titanium metal layer with a thickness of 20 nm; then, the first intermediate layer L2 is formed by vacuum coating technology A functional layer L3 is formed thereon. The functional layer L3 is a copper layer with a thickness of 800 nm. Then, a second intermediate layer L6 is formed on the lower surface 12 of the aluminum alloy substrate L1 by vacuum coating technology, and the second intermediate layer L6 is a titanium metal layer , Its thickness is 20nm; next, vacuum coating Technology, a solder layer L7 is formed on the second intermediate layer L6, the solder layer L7 is a copper layer, and its thickness is 800 nm; another plating layer is used to form a reflective layer L4 on the functional layer L3, and the reflective layer L4 is a silver layer, and its thickness is 2000 nm Finally, a second protective layer L8 is formed on the solder layer L7 by electroplating. The second protective layer L8 is a silver layer with a thickness of 1000 nm. The aluminum alloy substrate after the coating is formed by stamping to obtain an aluminum alloy lead frame 1.

請參閱圖1所示,鋁合金導線架1具有鋁合金基板L1、反射複合層21及焊接複合層22,該鋁合金基板L1上具有相對的上表面11和下表面12。該反射複合層21設置於該上表面11,該反射複合層21包括第一中間層L2、功能層L3及反射層L4;而該下表面12設置焊接複合層22,該焊接複合層22具有第二中間層L6、焊接層L7及第二保護層L8。 As shown in FIG. 1, the aluminum alloy lead frame 1 has an aluminum alloy substrate L1, a reflective composite layer 21 and a welding composite layer 22. The aluminum alloy substrate L1 has an upper surface 11 and a lower surface 12 opposite to each other. The reflective composite layer 21 is disposed on the upper surface 11, the reflective composite layer 21 includes a first intermediate layer L2, a functional layer L3, and a reflective layer L4; and the lower surface 12 is provided with a welding composite layer 22, the welding composite layer 22 has a Two intermediate layers L6, welding layer L7 and second protective layer L8.

實施例2:鋁合金導線架Example 2: Aluminum alloy lead frame

如圖2所示,實施例2之鋁合金導線架製作過程係全程使用真空鍍膜技術並經由以下方法所製得。首先,選用1085系列之鋁合金作為鋁合金基板L1,其厚度為0.2mm;基材可為捲料之形式,以連續式製程進行製造。於該鋁合金基板L1之上表面11形成第一中間層L2,第一中間層L2為鈦氧化物層(TiOx),其厚度為10nm;接著,於第一中間層L2上形成功能層L3,功能層L3為銅層,其厚度為800nm;並於功能層L3上形成反射層L4,反射層L4為銀層,其厚度1000nm;再於反射層L4上形成第一保護層L5,第一保護層L5為矽氧化物層(SiOx),其厚度為10nm;下一步,於該鋁合金基板L1之下表面12形成第二中間層L6,第二中間層L6為鈦氧化物層(TiOx),其厚度為10nm;再於第二中間層L6上形成焊接層L7,焊接層L7為銅層,其厚度為400nm;最後,於焊接層L7上形成第二保護層L8,第二保護層L8為銀層,其厚度為500nm。鍍膜後之鋁合金基板經沖壓加工成型,得一鋁合金導線架1’。 As shown in FIG. 2, the manufacturing process of the aluminum alloy lead frame of Example 2 is made by using the vacuum coating technology throughout the following method. First, the 1085 series aluminum alloy is selected as the aluminum alloy substrate L1, and its thickness is 0.2 mm; the base material can be in the form of a roll material and manufactured in a continuous process. A first intermediate layer L2 is formed on the upper surface 11 of the aluminum alloy substrate L1. The first intermediate layer L2 is a titanium oxide layer (TiO x ) with a thickness of 10 nm; then, a functional layer L3 is formed on the first intermediate layer L2 , The functional layer L3 is a copper layer with a thickness of 800 nm; and a reflective layer L4 is formed on the functional layer L3, the reflective layer L4 is a silver layer with a thickness of 1000 nm; and then a first protective layer L5 is formed on the reflective layer L4, the first The protective layer L5 is a silicon oxide layer (SiO x ) with a thickness of 10 nm; next, a second intermediate layer L6 is formed on the lower surface 12 of the aluminum alloy substrate L1, and the second intermediate layer L6 is a titanium oxide layer (TiO x ) with a thickness of 10 nm; a solder layer L7 is formed on the second intermediate layer L6, and the solder layer L7 is a copper layer with a thickness of 400 nm; and finally, a second protective layer L8 is formed on the solder layer L7, the second protection Layer L8 is a silver layer with a thickness of 500 nm. After the coating, the aluminum alloy substrate is formed by stamping to obtain an aluminum alloy lead frame 1'.

請參閱圖2所示,鋁合金導線架1’具有鋁合金基板L1、反射複合層21及焊接複合層22,該鋁合金基板L1上具有相對的上表面11和下表面12。該 反射複合層21設置於該上表面11,該反射複合層21包括第一中間層L2、功能層L3及反射層L4,及第一保護層L5;而該下表面12設置焊接複合層22,該焊接複合層22具有第二中間層L6、焊接層L7及第二保護層L8。 As shown in FIG. 2, the aluminum alloy lead frame 1'has an aluminum alloy substrate L1, a reflective composite layer 21 and a welding composite layer 22. The aluminum alloy substrate L1 has an upper surface 11 and a lower surface 12 opposite to each other. The The reflective composite layer 21 is disposed on the upper surface 11. The reflective composite layer 21 includes a first intermediate layer L2, a functional layer L3 and a reflective layer L4, and a first protective layer L5; and the lower surface 12 is provided with a welding composite layer 22, which The welding composite layer 22 has a second intermediate layer L6, a welding layer L7, and a second protective layer L8.

比較例1:銅合金導線架Comparative Example 1: Copper alloy lead frame

另為方便比較其他材質的導線架和上述實施例1及2的鋁合金導線架於附著性及反射率的差異,本發明另製備一銅合金導線架2,如圖3所示,比較例1之銅合金導線架係經由以下方法所製得。首先,選用銅合金基板L1’,其厚度為0.2mm;以電鍍法於該銅合金基板L1’之上表面11’形成功能層L3’,功能層L3’為銅層,其厚度為100nm至200nm;接著,以電鍍法於功能層L3’上形成反射層L4’,反射層L4’為銀層,其厚度為2500nm。鍍膜後之銅合金基板經沖壓加工成型,得一銅合金導線架2。 In addition, in order to facilitate the comparison of the difference in adhesion and reflectivity between the lead frames of other materials and the aluminum alloy lead frames of the above examples 1 and 2, a copper alloy lead frame 2 is also prepared in the present invention, as shown in FIG. 3, Comparative Example 1 The copper alloy lead frame is made by the following method. First, the copper alloy substrate L1' is selected and its thickness is 0.2mm; a functional layer L3' is formed on the upper surface 11' of the copper alloy substrate L1' by electroplating, and the functional layer L3' is a copper layer with a thickness of 100nm to 200nm Next, a reflective layer L4' is formed on the functional layer L3' by electroplating, the reflective layer L4' is a silver layer, and its thickness is 2500 nm. The coated copper alloy substrate is formed by stamping and processing to obtain a copper alloy lead frame 2.

請參閱圖3所示,銅合金導線架2具有銅合金基板L1’、該銅合金基板L1’上具有相對的上表面11’和下表面12’。該上表面11’設置包括功能層L3’及反射層L4’。 As shown in FIG. 3, the copper alloy lead frame 2 has a copper alloy substrate L1' having opposed upper and lower surfaces 11' and 12' on the copper alloy substrate L1'. The upper surface 11' is provided with a functional layer L3' and a reflective layer L4'.

比較例2:無第一中間層之鋁合金導線架Comparative Example 2: Aluminum alloy lead frame without first intermediate layer

另為方便比較不具第一中間層之導線架和上述實施例1及2的鋁合金導線架於附著性之差異,本發明另製備一鋁合金導線架1”。如圖4所示,比較例2之鋁合金導線架係經由以下方法所製得。首先,選用鋁合金基板L1,其厚度為0.2mm,以真空鍍膜技術於鋁合金基板L1之上表面11形成功能層L3,功能層L3為銅層,其厚度為1000nm;接著,以電鍍法於功能層L3上形成反射層L4,反射層L4為銀層,其厚度為2000nm。鍍膜後之鋁合金基板經沖壓加工成型,得一鋁合金導線架1”。 In addition, in order to facilitate comparison of the difference in adhesion between the lead frame without the first intermediate layer and the aluminum alloy lead frame of the above examples 1 and 2, an aluminum alloy lead frame 1" is prepared in the present invention. As shown in FIG. 4, the comparative example The aluminum alloy lead frame of 2 is made by the following method: First, the aluminum alloy substrate L1 is selected, which has a thickness of 0.2 mm, and a functional layer L3 is formed on the upper surface 11 of the aluminum alloy substrate L1 by vacuum coating technology, and the functional layer L3 is The thickness of the copper layer is 1000 nm; then, a reflective layer L4 is formed on the functional layer L3 by electroplating, and the reflective layer L4 is a silver layer with a thickness of 2000 nm. The aluminum alloy substrate after the coating is formed by stamping to obtain an aluminum alloy Lead frame 1".

請參閱圖4所示,鋁合金導線架1”具有鋁合金基板L1、該鋁合金基板L1上具有相對的上表面11和下表面12。該上表面11設置功能層L3及反射層L4。 As shown in FIG. 4, the aluminum alloy lead frame 1" has an aluminum alloy substrate L1, and the aluminum alloy substrate L1 has an upper surface 11 and a lower surface 12 opposite to each other. The upper surface 11 is provided with a functional layer L3 and a reflective layer L4.

試驗例:導線架之特性分析Test example: Characteristic analysis of lead frame

本試驗例係由如下所述之相同試驗方法分析實施例1及2之鋁合金導線架試片、以及比較例1之銅合金導線架試片和比較例2之鋁合金導線架試片的附著性測試與全反射率測試。 This test example analyzes the adhesion of the aluminum alloy lead frame test pieces of Examples 1 and 2 and the copper alloy lead frame test piece of Comparative Example 1 and the aluminum alloy lead frame test piece of Comparative Example 2 by the same test method as described below Sex test and total reflectance test.

試驗方法: experiment method:

1.附著性測試:本試驗例所選用的測試樣品係以前述各實施例及比較例未經沖壓加工前但已鍍完膜層之合金基板(以下簡稱為導線架試片)進行測試。將210(mm)×297(mm)之A4尺寸的導線架試片於180℃分別烘烤1小時及4小時,待導線架試片冷卻至室溫,使用日本米奇邦膠帶(Nichiban)進行附著性測試;將膠帶黏貼至導線架試片之上表面鍍好的膜層,以45度角快速拉起膠帶,觀察膠帶黏貼撕膜後之樣品的膜層與基板間是否有脫膜狀況;若導電架試片有1.0mm以上之脫膜情況,或導電架試片之0.3mm至1.0mm的脫膜情況多於7處,代表鋁合金之鍍層結合力效果不佳,判定為膜層附著性不佳,於下表1中表示為「NG」;若導線架試片之膠帶黏貼撕膜後之脫膜情況小於0.3mm,或導電架試片之0.3mm至1.0mm的脫膜情況為7處以下,則判定為膜層附著性良好,於下表1中表示為「OK」。 1. Adhesion test: The test sample selected in this test example was tested on the alloy substrate (hereinafter referred to as the lead frame test piece) which had not been stamped but the film layer had been plated before the above examples and comparative examples. Bake 210 (mm) × 297 (mm) A4 size lead frame test pieces at 180°C for 1 hour and 4 hours respectively. After the lead frame test pieces are cooled to room temperature, use Japanese Michiban tape (Nichiban) for attachment Performance test; stick the tape to the film layer on the surface of the lead frame test piece, quickly pull the tape at a 45-degree angle, and observe whether there is a peeling condition between the film layer and the substrate of the sample after the tape is stuck to the film; if The strip of the conductive frame has a stripping of more than 1.0mm, or the stripping of the strip of the conductive frame from 0.3mm to 1.0mm is more than 7, indicating that the adhesion of the coating of the aluminum alloy is not good, and the film adhesion is judged Poor, expressed as "NG" in Table 1 below; if the stripping condition of the lead frame test strip after sticking and tearing the film is less than 0.3mm, or the stripping condition of the conductive frame test strip from 0.3mm to 1.0mm is 7 Below the limit, it is judged that the adhesion of the film layer is good, which is indicated as "OK" in Table 1 below.

2.全反射率測試:依據DIN 5036 part 3規定的量測方法,將導線架試片置於反射/穿透率量測儀(型號:LMT RT-500)之測量口,其光源之可見光範圍介於380nm至780nm,進行全反射率量測;全反射率數值越高,表示導線架試片之反射層的反射率良好。 2. Total reflectance test: According to the measurement method specified in DIN 5036 part 3, the lead frame test piece is placed in the measurement port of the reflection/transmittance measuring instrument (model: LMT RT-500), and the visible range of the light source The total reflectance is measured between 380nm and 780nm; the higher the total reflectance value, the better the reflectivity of the reflective layer of the lead frame test piece.

表1:實施例1和2與比較例1和2之導線架試片特性分析結果。

Figure 107122797-A0305-02-0010-1
Table 1: Analysis results of the characteristics of the lead frame test pieces of Examples 1 and 2 and Comparative Examples 1 and 2.
Figure 107122797-A0305-02-0010-1

如上表1所示,比較附著性測試結果,將具有第一中間層之實施例1、2的鋁合金導線架對照比較例2之不具第一中間層的鋁合金導線架,實施例1、2之鋁合金導線架的附著性測試皆良好,而比較例2之不具第一中間層的鋁合金導線架的試驗結果為NG;代表第一中間層應用於實施例1及2之鋁合金導線架能有效提高鋁合金基板與各膜層之間的附著性。 As shown in Table 1 above, comparing the results of the adhesion test, the aluminum alloy lead frames of Examples 1 and 2 with the first intermediate layer were compared with the aluminum alloy lead frames without the first intermediate layer of Comparative Example 2, Examples 1, 2 The adhesion test of the aluminum alloy lead frame is good, and the test result of the aluminum alloy lead frame without the first intermediate layer of Comparative Example 2 is NG; it means that the first intermediate layer is applied to the aluminum alloy lead frame of Examples 1 and 2 It can effectively improve the adhesion between the aluminum alloy substrate and each film layer.

將實施例1及2之鋁合金導線架的全反射率測試結果與比較例1之銅合金導線架的全反射率測試結果做比較,實施例1及2之鋁合金導線架的全反射率皆達97%,高於比較例1之銅合金導線架的全反射率;代表若將實施例1及2的鋁合金導線架應用於發光二極體上時,可因其具有較高的反射率,達到更好的光提取效能。 The total reflectivity test results of the aluminum alloy lead frames of Examples 1 and 2 are compared with the total reflectivity test results of the copper alloy lead frames of Comparative Example 1, and the total reflectivity of the aluminum alloy lead frames of Examples 1 and 2 are both Up to 97%, higher than the total reflectivity of the copper alloy lead frame of Comparative Example 1; it means that if the aluminum alloy lead frames of Examples 1 and 2 are applied to the light-emitting diode, they can have higher reflectivity , To achieve better light extraction efficiency.

導電率:實施例1及2所選用之鋁合金基板之電阻率於25℃下皆不超過1.2×10-1Ω mm2/m。 Conductivity: The resistivity of the aluminum alloy substrate selected in Examples 1 and 2 does not exceed 1.2×10 -1 Ω mm 2 /m at 25°C.

綜合上述分析結果可知,本發明之技術手段能有效提升鋁合金導線架之各膜層之間的附著性,且鋁合金導線架具有良好的反射率,並降低生產成本及減輕導線架重量,進而提升本發明的應用價值。 Based on the above analysis results, it can be seen that the technical means of the present invention can effectively improve the adhesion between the various layers of the aluminum alloy lead frame, and the aluminum alloy lead frame has good reflectivity, and reduces the production cost and weight of the lead frame. Enhance the application value of the present invention.

Claims (12)

一種鋁合金導線架,其包含:一鋁合金基板,其具有相對的一上表面和一下表面;以及一反射複合層,其設置於該上表面,該反射複合層依序包括一第一中間層、一功能層及一反射層,該第一中間層設置於該鋁合金基板和該功能層之間;以及一焊接複合層,其設置於該下表面,該焊接複合層依序設置包括一第二中間層、一焊接層及一第二保護層,該第二中間層設置於該鋁合金基板和該焊接層之間;其中,該第一中間層及該第二中間層之材料包含鋁、鈦、鉻、鎳或其之金屬合金、其之氧化物、其之氮化物、或其之氮氧化物。 An aluminum alloy lead frame includes: an aluminum alloy substrate having an upper surface and a lower surface opposite to each other; and a reflective composite layer disposed on the upper surface, the reflective composite layer sequentially including a first intermediate layer , A functional layer and a reflective layer, the first intermediate layer is disposed between the aluminum alloy substrate and the functional layer; and a welded composite layer is disposed on the lower surface, the welded composite layer is sequentially disposed including a first Two intermediate layers, a welding layer and a second protective layer, the second intermediate layer is disposed between the aluminum alloy substrate and the welding layer; wherein, the material of the first intermediate layer and the second intermediate layer includes aluminum, Titanium, chromium, nickel or their metal alloys, their oxides, their nitrides, or their nitrogen oxides. 如請求項1所述之鋁合金導線架,其中該反射複合層更包括一第一保護層,該第一保護層設置於該反射層上。 The aluminum alloy lead frame according to claim 1, wherein the reflective composite layer further includes a first protective layer, and the first protective layer is disposed on the reflective layer. 如請求項1所述之鋁合金導線架,其中該鋁合金基板的厚度介於0.1mm至1.5mm。 The aluminum alloy lead frame according to claim 1, wherein the thickness of the aluminum alloy substrate is between 0.1 mm and 1.5 mm. 如請求項3所述之鋁合金導線架,其中該第一中間層及該第二中間層為一鈦金屬層、一鈦氧化物層、一鋁鈦合金層、或一氮化鋁鈦層。 The aluminum alloy lead frame of claim 3, wherein the first intermediate layer and the second intermediate layer are a titanium metal layer, a titanium oxide layer, an aluminum titanium alloy layer, or an aluminum titanium nitride layer. 如請求項1所述之鋁合金導線架,其中該功能層之材料包含金屬或金屬合金;該反射層之材料包括金屬或金屬合金;該焊接層之材料包括金屬或金屬合金;該第二保護層之材料包括金屬或金屬合金。 The aluminum alloy lead frame according to claim 1, wherein the material of the functional layer includes metal or metal alloy; the material of the reflective layer includes metal or metal alloy; the material of the welding layer includes metal or metal alloy; the second protection The material of the layer includes metal or metal alloy. 如請求項5所述之鋁合金導線架,其中該功能層為一銅層;該反射層為一銀層或一鋁層;該焊接層為一銅層;該第二保護層為一銀層。 The aluminum alloy lead frame according to claim 5, wherein the functional layer is a copper layer; the reflective layer is a silver layer or an aluminum layer; the solder layer is a copper layer; and the second protective layer is a silver layer . 如請求項2所述之鋁合金導線架,其中該第一保護層之材料包含非金屬的低吸收材料。 The aluminum alloy lead frame according to claim 2, wherein the material of the first protective layer includes a non-metallic low-absorption material. 如請求項7所述之鋁合金導線架,其中該第一保護層為一矽氧化物層。 The aluminum alloy lead frame according to claim 7, wherein the first protective layer is a silicon oxide layer. 如請求項2所述之鋁合金導線架,其中該第一中間層及該第二中間層厚度介於2nm至1000nm;該功能層厚度介於2nm至2500nm;該反射層厚度介於50nm至6000nm;該焊接層厚度介於100nm至5000nm;該第二保護層厚度介於50nm至1000nm;該第一保護層厚度介於0.5nm至20nm。 The aluminum alloy lead frame according to claim 2, wherein the thickness of the first intermediate layer and the second intermediate layer is between 2 nm and 1000 nm; the thickness of the functional layer is between 2 nm and 2500 nm; and the thickness of the reflective layer is between 50 nm and 6000 nm The thickness of the solder layer is between 100 nm and 5000 nm; the thickness of the second protective layer is between 50 nm and 1000 nm; and the thickness of the first protective layer is between 0.5 nm and 20 nm. 一種鋁合金導線架的製造方法,其包括以下步驟:準備一鋁合金基板,其具有相對的一上表面和一下表面;於該鋁合金基板之該上表面依序設置一第一中間層、一功能層及一反射層,藉以於該鋁合金基板之該上表面形成一反射複合層,該反射複合層依序包括該第一中間層、該功能層及該反射層,該第一中間層設置於該鋁合金基板和該功能層之間;以及於該鋁合金基板之該下表面依序設置一第二中間層、一焊接層及一第二保護層,藉以於該鋁合金基板之該下表面形成一焊接複合層,該焊接複合層依序包括該第二中間層、該焊接層及該第二保護層,該第二中間層設置於該鋁合金基板和該焊接層之間,以形成一鋁合金導線架。 A method for manufacturing an aluminum alloy lead frame includes the following steps: preparing an aluminum alloy substrate having an upper surface and a lower surface opposite to each other; on the upper surface of the aluminum alloy substrate, a first intermediate layer, a A functional layer and a reflective layer, thereby forming a reflective composite layer on the upper surface of the aluminum alloy substrate, the reflective composite layer sequentially including the first intermediate layer, the functional layer and the reflective layer, the first intermediate layer is provided Between the aluminum alloy substrate and the functional layer; and a second intermediate layer, a soldering layer, and a second protective layer are sequentially arranged on the lower surface of the aluminum alloy substrate, so as to be under the aluminum alloy substrate A welding composite layer is formed on the surface, the welding composite layer includes the second intermediate layer, the welding layer and the second protective layer in sequence, the second intermediate layer is disposed between the aluminum alloy substrate and the welding layer to form An aluminum alloy lead frame. 如請求項10所述之製造方法,其中該製造方法所製得之該反射複合層更包括一第一保護層,該第一保護層設置於該反射層上。 The manufacturing method according to claim 10, wherein the reflective composite layer manufactured by the manufacturing method further includes a first protective layer, and the first protective layer is disposed on the reflective layer. 如請求項10或11所述之製造方法,其中該製造方法所製得之鋁合金導線架係如請求項3至9中任一項所述之鋁合金導線架。 The manufacturing method according to claim 10 or 11, wherein the aluminum alloy lead frame produced by the manufacturing method is the aluminum alloy lead frame according to any one of claims 3 to 9.
TW107122797A 2018-07-02 2018-07-02 Aluminum alloy lead frame and manufacturing method thereof TWI688129B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW107122797A TWI688129B (en) 2018-07-02 2018-07-02 Aluminum alloy lead frame and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW107122797A TWI688129B (en) 2018-07-02 2018-07-02 Aluminum alloy lead frame and manufacturing method thereof

Publications (2)

Publication Number Publication Date
TW202006975A TW202006975A (en) 2020-02-01
TWI688129B true TWI688129B (en) 2020-03-11

Family

ID=70412993

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107122797A TWI688129B (en) 2018-07-02 2018-07-02 Aluminum alloy lead frame and manufacturing method thereof

Country Status (1)

Country Link
TW (1) TWI688129B (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101680975A (en) * 2007-07-23 2010-03-24 东洋钢钣株式会社 Light reflection plate, process for producing the light reflection plate, and light reflection apparatus
TW201813132A (en) * 2016-09-08 2018-04-01 隆達電子股份有限公司 Metal composite layer structure, metal lead frame and light emitting device having the metal lead frame

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101680975A (en) * 2007-07-23 2010-03-24 东洋钢钣株式会社 Light reflection plate, process for producing the light reflection plate, and light reflection apparatus
TW201813132A (en) * 2016-09-08 2018-04-01 隆達電子股份有限公司 Metal composite layer structure, metal lead frame and light emitting device having the metal lead frame

Also Published As

Publication number Publication date
TW202006975A (en) 2020-02-01

Similar Documents

Publication Publication Date Title
KR101718575B1 (en) Leadframe for optical semiconductor device, method for manufacturing leadframe for optical semiconductor device, and optical semiconductor device
WO2010071182A1 (en) Optical semiconductor device lead frame and manufacturing method thereof
WO2010074184A1 (en) Lead frame for optical semiconductor device, method for manufacturing same, and optical semiconductor device
TWI592294B (en) Metal foil and its composite heat sink
JP5578960B2 (en) Lead frame for optical semiconductor device and manufacturing method thereof
JP6110581B2 (en) Surface-treated copper foil, copper-clad laminate and printed wiring board for high-frequency signal transmission circuit formation
WO2010110061A1 (en) Metal foil with electric resistance film and production method therefor
TWI688129B (en) Aluminum alloy lead frame and manufacturing method thereof
US11469357B2 (en) Reflective composite material, in particular for surface-mounted devices (SMD), and light-emitting device with a composite material of this type
JP2011023704A (en) Lead frame for led
US9769933B2 (en) Printed circuit board and method of manufacturing the same
CN110690338B (en) Aluminum alloy lead frame and manufacturing method thereof
JP2013201399A (en) Substrate of lead frame for optical semiconductor device, lead frame for optical semiconductor device using the same and manufacturing method therefor, and optical semiconductor device
JP4981979B2 (en) LED component material having a highly reflective plating film and LED component
JP2014179410A (en) Circuit board for mounting light-emitting component, and light-emitting component mounted circuit board
JP2007294870A (en) Thin-film sensor, thin-film sensor module, and method for manufacturing the thin-film sensor
JP6500746B2 (en) Method of manufacturing conductive substrate
CN205082042U (en) Reflection of light heat -conducting metal base PCB board
CN206118168U (en) Transparent circuit board
CN105376933B (en) Ceramic base printed circuit board and preparation method thereof, LED module and preparation method thereof
JP2001011612A (en) Target material, electrode material, and packaging parts
CN205141012U (en) A transparent ceramic base circuit board for LED filament
TW201829182A (en) A metal nanoparticles base plate for superfine circuit FPC and COF material
TWM521540U (en) Copper clad laminate
WO2023276433A1 (en) Electrically conductive film for high-frequency circuit board, and high-frequency circuit board