TWI682894B - Hydrogen recovery and reuse system - Google Patents
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Abstract
一種氫氣回收再利用系統,係包括一處理裝置、一電化學氫氣純化裝置及一除水裝置,該處理裝置用以接收並處理一混合氣體並用以移除有害物質,該電化學氫氣純化裝置與所述處理裝置相連接並用以清除所述混合氣體內的非氫氣的氣體及雜質,該除水裝置與所述電化學氫氣純化裝置相連接並用以去除純化後之氫氣內的水分。 A hydrogen recovery and reuse system includes a processing device, an electrochemical hydrogen purification device, and a water removal device. The processing device is used to receive and process a mixed gas and remove harmful substances. The processing device is connected and used to remove non-hydrogen gas and impurities in the mixed gas. The water removal device is connected to the electrochemical hydrogen purification device and used to remove moisture in the purified hydrogen.
Description
本發明係有關於一種氫氣回收再利用系統,尤指一種可有效回收氫氣並再利用且可純化出純度高的氫氣之氫氣回收再利用系統。 The invention relates to a hydrogen recovery and reuse system, in particular to a hydrogen recovery and reuse system that can effectively recover and reuse hydrogen and can purify hydrogen with high purity.
在一般的半導製程體與光電製程結束後,剩餘的製程氣體(即廢氣)中通常含有氨氣(NH3)、矽甲烷(SiH4)、二矽甲烷(Si2H6)、磷化氫(PH3)、砷化氫(AsH3)、三甲基鎵(Ga(CH3)3)與高濃度的氫氣,其中氨氣、矽甲烷、二矽甲烷、磷化氫、砷化氫、三甲基鎵皆為環境污染物。 After the general semiconducting process body and the photoelectric process are completed, the remaining process gas (i.e., exhaust gas) usually contains ammonia (NH 3 ), silicon methane (SiH 4 ), disilyl methane (Si 2 H 6 ), phosphating Hydrogen (PH 3 ), arsine (AsH 3 ), trimethylgallium (Ga(CH 3 ) 3 ) and high-concentration hydrogen, including ammonia, silane, methane, phosphine, arsenide And trimethylgallium are environmental pollutants.
目前,對於上述環境污染物的處理方式通常是將廢氣經過硫酸或次氯酸水洗之後直接排放至大氣中。然而,此處理方式具有許多缺點。例如,經處理後的廢水中的氮濃度達數萬ppm,遠高於法規標準。此外,氫氣被直接排放至大氣中具有爆炸的風險,且造成氫氣的浪費。 At present, the treatment method for the above environmental pollutants is usually to directly discharge the exhaust gas into the atmosphere after being washed with sulfuric acid or hypochlorous acid. However, this approach has many disadvantages. For example, the nitrogen concentration in the treated wastewater reaches tens of thousands of ppm, which is far higher than the legal standards. In addition, hydrogen is directly discharged into the atmosphere with the risk of explosion and waste of hydrogen.
此外,於半導體製程或光電製程或化工廠製程中,相關行業業者通常是將剩餘的製程廢氣(如前述之各種氣體)透過燃燒的方式處理,因此,製程較為複雜且設備及處理費用也相對較昂貴。 In addition, in the semiconductor process, the photoelectric process or the chemical plant process, the relevant industry players usually treat the remaining process waste gas (such as the aforementioned various gases) through combustion, so the process is more complicated and the equipment and processing costs are relatively relatively high. expensive.
爰此,為有效解決上述之問題,本發明之主要目的在於提供 一種有效回收氫氣並再利用之氫氣回收再利用系統。 So, in order to effectively solve the above problems, the main purpose of the present invention is to provide A hydrogen recovery and reuse system that efficiently recovers and reuses hydrogen.
本發明之次要目的,在於提供一種可純化出純度高的氫氣之氫氣回收再利用系統。 The secondary object of the present invention is to provide a hydrogen recovery and reuse system that can purify hydrogen with high purity.
本發明之次要目的,在於提供一種回收製程成本較低之氫氣回收再利用系統。 The secondary objective of the present invention is to provide a hydrogen recovery and reuse system with a relatively low recovery process cost.
為達上述目的,本發明係提供一種氫氣回收再利用系統,係包括一處理裝置、一電化學氫氣純化裝置及一除水裝置,該處理裝置用以接收並處理一混合氣體並用以移除有害電化學處裡裝置之物質,該電化學氫氣純化裝置與所述處理裝置相連接並用以去除所述混合氣體內的非氫氣的氣體,該除水裝置與所述電化學氫氣純化裝置相連接並用以去除純化後之氫氣內的水分。 To achieve the above object, the present invention provides a hydrogen recovery and reuse system, which includes a processing device, an electrochemical hydrogen purification device and a water removal device, the processing device is used to receive and process a mixed gas and to remove harmful Substances in the electrochemical treatment unit. The electrochemical hydrogen purification device is connected to the treatment device and used to remove non-hydrogen gas in the mixed gas. The water removal device is connected to the electrochemical hydrogen purification device and used To remove the water in the purified hydrogen.
透過本發明此系統的設計,先以所述處理裝置接收並處理一製程中所排出的混合氣體,並且移除該混合氣體內的有害物質如含氮化物、硫化物…)等,然後利用所述電化學氫氣純化裝置清除混合氣體內的非氫氣的氣體及雜質,再利用所述泵浦裝置提供壓力以將所述電化學氫氣純化裝置內的氫氣推出至所述除水裝置,最後利用該除水裝置以去除純化後之氫氣內的水分,如此得以分離出純度較高的氫氣,因此,可以有效地達成回收氫氣並再利用。 Through the design of the system of the present invention, the processing device first receives and processes the mixed gas discharged in a process, and removes harmful substances such as nitrides, sulfides, etc. in the mixed gas, and then uses the The electrochemical hydrogen purification device removes non-hydrogen gas and impurities in the mixed gas, and then uses the pump device to provide pressure to push the hydrogen in the electrochemical hydrogen purification device to the water removal device, and finally uses the The water removal device removes the water in the purified hydrogen, so that the hydrogen with higher purity can be separated, so that the hydrogen can be recovered and reused effectively.
2‧‧‧氫氣回收再利用系統 2‧‧‧Hydrogen recovery and reuse system
20‧‧‧處理裝置 20‧‧‧Processing device
21‧‧‧電化學氫氣純化裝置 21‧‧‧Electrochemical hydrogen purification device
22‧‧‧泵浦裝置 22‧‧‧Pump device
23‧‧‧除水裝置 23‧‧‧water removal device
24‧‧‧吸附元件 24‧‧‧Adsorption components
3‧‧‧混合氣體 3‧‧‧ Mixed gas
4‧‧‧氫氣 4‧‧‧hydrogen
40‧‧‧氫離子 40‧‧‧ hydrogen ion
41‧‧‧電子 41‧‧‧Electronics
5‧‧‧管路 5‧‧‧Pipeline
6‧‧‧氮氣 6‧‧‧ Nitrogen
7‧‧‧質子交換膜 7‧‧‧ Proton exchange membrane
70‧‧‧陽極觸媒反應層 70‧‧‧Anode catalyst reaction layer
71‧‧‧陰極觸媒反應層 71‧‧‧ Cathode catalyst reaction layer
8‧‧‧外部電源 8‧‧‧External power supply
90‧‧‧進氣通道 90‧‧‧ Intake channel
91‧‧‧出氣通道 91‧‧‧ Outlet channel
第1圖係為本發明氫氣回收再利用系統之較佳實施例之方塊示意圖;第2圖係為本發明氫氣回收再利用系統之較佳實施例之電化學氫氣純
化裝置之實施示意圖;第3圖係為本發明氫氣回收再利用系統之另一實施例之方塊示意圖。
Figure 1 is a block schematic diagram of a preferred embodiment of the hydrogen recovery and reuse system of the present invention; Figure 2 is a electrochemical hydrogen purification of a preferred embodiment of the hydrogen recovery and reuse system of the
本發明之上述目的及其結構與功能上的特性,將依據所附圖式之較佳實施例予以說明。 The above objects, structural and functional characteristics of the present invention will be described based on the preferred embodiments of the accompanying drawings.
請參閱第1、2圖,係為本發明氫氣回收再利用系統2之較佳實施例之方塊示意圖及電化學氫氣純化裝置之實施示意圖,如圖所示,一種氫氣回收再利用系統2,係包括一處理裝置20、一氫氣純化裝置21及一除水裝置23,於本發明中,所述氫氣回收再利用系統2係自含有氫氣4、氮氣6、氨氣與其他氣體形成一混合氣體3中回收氫氣4並且再利用,該混合氣體3例如是半導體製程或光電製程進行完成之後所剩餘的廢氣,其包含有氫氣4、氮氣6、氨氣、矽甲烷、二矽甲烷、磷化氫、砷化氫、三甲基鎵或其組合;首先,前述之混合氣體3會先透過一管路5排出至所述處理裝置20,該處理裝置20係選擇為一區域洗滌塔(local scrubber),透過該區域洗滌塔先行初步處裡所述混合氣體3,以將該混合氣體3內的有毒氣體或物體顆粒(如粉塵…)或有害物質(如含氮化物、硫化物…)等先行去除,留下無害氣體進入所述電化學氫氣純化裝置21,尤須說明的是,該區域洗滌塔依原理可分為電熱水洗式、填充水洗式、乾式吸附式等,而於本發明氫氣回收再利用系統2中,端視使用者的需求決定該混合氣體3需使用何種型式進行處理,因此前述處理裝置20之各型式接包含於本發明之範圍內,合先敘明;然後,將清洗過後的混合氣體3透過所述管路5傳送至所述電
化學氫氣純化裝置21,並利用該電化學氫氣純化裝置21來清除混合氣體3內的非氫氣4的氣體及其餘雜質,尤須說明的是,所述電化學氫氣純化裝置21係選擇利用電化學方式以清除所述混合氣體3內的非氫氣4的氣體及雜質,換句話說,所述混合氣體3於該電化學氫氣純化裝置21內透過電化學的方式將氫氣4以外的氣體(如氫氣4、氮氣6、氨氣…)及雜質進行去除分離的動作,以只保留氫氣4於該電化學氫氣純化裝置21內,至此,所述混合氣體3內除了氫氣4以外的氣體皆已被分離而不存在,而氫氣4則經由所述管路5進入所述除水裝置23;請一併參閱第2圖,更進一步說明,該電化學氫氣純化裝置更具有一進氣通道90、一質子交換膜7、一陽極觸媒反應層70、一陰極觸媒反應層71、一出氣通道91及一外部電源8,該進氣通道90與前述處理裝置20相連通,於該處理裝置20內處理過後的混合氣體3會透過進氣通道90進入該電化學氫氣純化裝置21,接著利用該質子交換膜7隔阻氫氣4以外之氣體,並可透過該質子交換膜7傳送複數氫離子40並隔離複數電子41通過,所述陽極觸媒反應層70及陰極觸媒反應層71係分設於該質子交換膜7之相對兩側,於所述陽、陰極觸媒反應層70、71提供鉑(Pt)或釕(Ru)或其他貴金屬為一觸媒進行一電化學反應後並將一生成物(該生成物係指氫氣4)經由所述出氣通道91擴散排出,進而完成去除所述混合氣體3內的非氫氣4的氣體及雜質;接著,於該氫氣4進入除水裝置23之前先行經過一泵浦裝置22,並利用所述泵浦裝置22提供壓力將所述氫氣4純化裝置21內的氫氣4推送至所述除水裝置23,由於在該電化學氫氣純化裝置21分離出來的氫氣4仍然
會存有部分的水分,因此需透過該除水裝置23將水分去除,而該除水裝置23選擇利用冷凍除水的方式去除純化後之氫氣4內的水分,如此得以分離出純度較高的氫氣4;此外,請一併參閱第3圖,尤須說明的是,於本發明中可更進一步包括一吸附元件24與所述除水裝置23相連接,該吸附元件24用以吸附純化後之氫氣4內的水分,也就是說,該吸附元件24可作為所述除水裝置23的輔助元件,以令分離後之氫氣4內的水分去除速率更快且氫氣4純度更高,達到具有加乘之功效,該吸附元件24係可選擇為下列材質:活性碳、沸石、矽膠、活性氧化鋁、分子篩、氧化錳、氫氧化鈣、石墨烯或中空纖維其中任一種;如此一來,透過前述之各裝置的各功用,進以達到分離出高純度的氫氣4,形成具有高效率之回收氫氣4並再利用的系統,並且,回收製程與習知氫氣回收之方式相比之下其成本也相對較為低廉,大幅降低氫氣4回收的成本。
Please refer to Figures 1 and 2 for a block schematic diagram of a preferred embodiment of the hydrogen recovery and
以上所述,本發明相較於習知具有下列優點:1.有效回收氫氣並再利用;2.可純化出純度高的氫氣;3.回收製程成本較低。 As described above, the present invention has the following advantages over conventional ones: 1. Effectively recover hydrogen and reuse it; 2. Can purify hydrogen with high purity; 3. Lower recovery process cost.
以上已將本發明做一詳細說明,惟以上所述者,僅為本發明之一較佳實施例而已,當不能限定本發明實施之範圍,即凡依本發明申請範圍所作之均等變化與修飾等,皆應仍屬本發明之專利涵蓋範圍。 The present invention has been described in detail above, but the above is only one of the preferred embodiments of the present invention. When the scope of the present invention cannot be limited, that is, all changes and modifications made in accordance with the scope of the application of the present invention Etc., should still be covered by the patent of the present invention.
2‧‧‧氫氣回收再利用系統 2‧‧‧Hydrogen recovery and reuse system
20‧‧‧處理裝置 20‧‧‧Processing device
21‧‧‧電化學氫氣純化裝置 21‧‧‧Electrochemical hydrogen purification device
22‧‧‧泵浦裝置 22‧‧‧Pump device
23‧‧‧除水裝置 23‧‧‧water removal device
3‧‧‧混合氣體 3‧‧‧ Mixed gas
4‧‧‧氫氣 4‧‧‧hydrogen
5‧‧‧管路 5‧‧‧Pipeline
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CN101306302A (en) * | 2008-01-31 | 2008-11-19 | 上海交通大学 | Hydrogen containing industrial waste gas separation and purification method |
CN104416163A (en) * | 2013-08-31 | 2015-03-18 | 天津联一科技有限公司 | Novel energy-saving hydrogen recovery device |
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CN101306302A (en) * | 2008-01-31 | 2008-11-19 | 上海交通大学 | Hydrogen containing industrial waste gas separation and purification method |
CN104416163A (en) * | 2013-08-31 | 2015-03-18 | 天津联一科技有限公司 | Novel energy-saving hydrogen recovery device |
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