TWI677813B - Active device substrate - Google Patents

Abstract

An active element substrate includes a base, an active element, a touch signal line, a first insulation layer, a touch electrode, a second insulation layer, a pixel electrode, and a first bridge element. The touch signal line is disposed on the substrate. The first insulating layer is disposed on the touch signal line and has a first contact window overlapping the contact portion of the touch signal line. The touch electrode is disposed on the first insulating layer and has a contact portion. The second insulating layer is disposed on the touch electrode and has a second contact window. The second contact window overlaps the contact portion of the touch electrode and the first contact window of the first insulating layer. The first bridge element is disposed on the second insulating layer and is separated from the pixel electrode. The first bridge element is electrically connected to the contact portion of the touch electrode and the contact portion of the touch signal line through the first contact window and the second contact window.

Description

Active element substrate

The present invention relates to a substrate, and more particularly, to an active element substrate.

Generally speaking, liquid crystal displays can be divided into two types: amorphous silicon thin film transistor liquid crystal displays and low temperature poly-silicon thin film transistor liquid crystal displays. Unlike traditional amorphous silicon thin-film transistors, low-temperature polycrystalline silicon thin-film transistors have better electron mobility and can produce thin-film thin-film transistors, which can increase the aperture ratio, improve display brightness, and reduce power consumption. .

However, in the manufacturing process of low-temperature polycrystalline silicon thin film liquid crystal displays, 10 to 11 photomask processes are usually used when making pixel structures, compared with 7 to 8 processes of amorphous silicon thin film liquid crystal displays. In the manufacturing process, the low-temperature polycrystalline silicon thin film liquid crystal liquid crystal display must take more manufacturing time and higher cost, and the manufacturing steps are very complicated.

The invention provides an active element substrate, which can simplify the manufacturing process and improve the production capacity.

The active element substrate of the present invention includes a base, an active element, a touch signal line, a first insulation layer, a touch electrode, a second insulation layer, a pixel electrode, and a first bridge element. The substrate has an active area and a peripheral area outside the active area. The active element is disposed on the active area of the substrate. The touch signal line is disposed on the substrate. The first insulating layer is disposed on the touch signal line and has a first contact window overlapping with the contact portion of the touch signal line. The touch electrode is disposed on the first insulating layer and has a contact portion. The second insulating layer is disposed on the touch electrode and has a second contact window. The second contact window overlaps the contact portion of the touch electrode and the first contact window of the first insulating layer. The pixel electrode is disposed on the second insulation layer and is electrically connected to the active device. The first bridge element is disposed on the second insulating layer and is separated from the pixel electrode. The first bridge element is electrically connected to the contact portion of the touch electrode and the contact portion of the touch signal line through the first contact window and the second contact window.

In an embodiment of the present invention, the first insulating layer has a sidewall defining a first contact window. The sidewall of the contact portion of the touch electrode is substantially aligned with the sidewall of the first insulating layer.

In an embodiment of the present invention, a portion of the edge of the first projection window vertically projected on the substrate and a portion of the edge of the projection vertical projection of the contact portion of the touch electrode on the substrate substantially coincide.

In an embodiment of the present invention, the touch signal line extends in a first direction. The contact portion of the touch electrode to the edge portion and the first direction vertical projection on the substrate holder at an angle α, and 0 ^o ≦ α ≦ 90 ^o.

In an embodiment of the present invention, the active device substrate further includes a first signal line. The first signal line is electrically connected to the active element and is interlaced with the touch signal line. The first signal line extends in the second direction, and the portion of the edge of the vertical projection of the contact portion of the touch electrode on the substrate is at an angle β with the second direction, and 0 ^o ≦ β ≦ 90 ^o .

In an embodiment of the present invention, the touch signal line extends in a first direction. The second contact window has a first portion and a second portion, which respectively overlap the contact portion of the touch electrode and the first contact window of the first insulating layer. The first portion of the second contact window and the second portion of the second contact window are aligned in a third direction, and the first direction and the third direction are staggered.

In an embodiment of the present invention, the active device substrate further includes a pad and a dielectric layer. The pads are disposed in the peripheral area. The dielectric layer is disposed on the pad and has at least a third contact window overlapping the pad. The touch signal line is disposed on the dielectric layer and has a first end portion disposed in a peripheral region. The first end portion of the touch signal line is disposed in the at least one third contact window of the dielectric layer and directly contacts the electrical contact pad.

In an embodiment of the present invention, the above-mentioned active element substrate further includes a touch switch, a dielectric layer, and a second bridge element. The touch switch is disposed in a peripheral region of the active device substrate. The dielectric layer is disposed on the touch switch. The touch signal line is disposed on the dielectric layer and has a second end portion. The first insulating layer has a fourth contact window and a fifth contact window that overlap with a portion of the touch switch and a second end portion of the touch signal line, respectively. The second insulating layer has a sixth contact window and a seventh contact window which overlap the fourth contact window and the fifth contact window, respectively. The second bridge element is disposed on the second insulating layer. The second bridge element is electrically connected to a part of the touch switch through the fourth contact window of the first insulation layer and the sixth contact window of the second insulation layer. The second bridge element is electrically connected to the second end portion of the touch signal line through the fifth contact window of the first insulation layer and the seventh contact window of the second insulation layer.

In an embodiment of the present invention, the fourth contact window of the first insulating layer and the sixth contact window of the second insulating layer are substantially aligned.

In an embodiment of the present invention, the fifth contact window of the first insulating layer and the seventh contact window of the second insulating layer are substantially aligned.

In order to make the above features and advantages of the present invention more comprehensible, embodiments are hereinafter described in detail with reference to the accompanying drawings.

FIG. 1 is a schematic top view of an active device substrate according to an embodiment of the present invention. FIGS. 2A to 2I are schematic top views of a manufacturing process of an active device substrate according to an embodiment of the present invention, wherein FIGS. 2A to 2I correspond to the region R1 of FIG. 1. 3A to 3I are schematic cross-sectional views illustrating a manufacturing process of an active device substrate according to an embodiment of the present invention, wherein FIGS. 3A to 3I correspond to the section lines A-A 'and B-B' of FIGS. 2A to 2I.

Please refer to FIG. 1, FIG. 2I and FIG. 3I first. The active device substrate 100 includes a substrate 110 having an active area 100 a and a peripheral area 100 b outside the active area 100 a. The substrate 110 is used to carry other components of the active device substrate 100. For example, in this embodiment, the material of the substrate 110 may be glass, quartz, organic polymer, or an opaque / reflective material (such as wafer, ceramic, or other applicable materials), or Other applicable materials.

The following describes the manufacturing process of each component in the active area 100a with reference to FIGS. 2A to 2I and FIGS. 3A to 3I.

2A and 3A, first, a substrate 110 is provided, and a semiconductor layer is formed on the substrate 110. The semiconductor layer has a plurality of semiconductor patterns 111. In this embodiment, the material of the semiconductor pattern 111 is, for example, poly-silicon, but the invention is not limited thereto.

Referring to FIG. 2B and FIG. 3B, a gate insulating layer 112 is formed to cover the semiconductor pattern 111 and the substrate 110. Then, a first signal line 113 (shown in FIG. 2B) and a gate electrode 113a (shown in FIG. 2B) are formed on the gate insulating layer 112. The first signal line 113 extends along the second direction D2. The first signal line 113 is electrically connected to the gate electrode 113a. That is, the first signal line 113 may be a scanning line. In this embodiment, the gate electrode 113a is, for example, a part of the first signal line 113, but the present invention is not limited thereto.

Referring to FIG. 2C and FIG. 3C, a barrier layer 114 is formed, and the barrier layer 114 covers the first signal line 113 and the gate insulating layer 112. The blocking layer 114 has contact windows 114a and 114b, and both ends of the semiconductor pattern 111 are exposed.

Referring to FIG. 2D and FIG. 3D, a second signal line 115, a source 115 b and a drain 115 a are formed on the blocking layer 114. Referring to FIG. 2C, FIG. 2D, FIG. 3C and FIG. 3D, the source 115b is filled in the contact window 114b to be electrically connected to one end of the semiconductor pattern 111. The drain electrode 115a is separated from the source electrode 115b, and is filled in the contact window 114a to be electrically connected to the other end of the semiconductor pattern 111. The semiconductor pattern 111, the gate 113a, the source 115b, and the drain 115a may form an active device 120. The second signal line 115 is electrically connected to the source 115b. That is, the second signal line 115 may be a data line. The first signal line 113 extends substantially along the second direction D2, the second signal line 115 extends substantially along the first direction D1, and the first direction D1 and the second direction D2 are staggered. For example, in this embodiment, the first direction D1 and the second direction D2 may be substantially perpendicular, but the present invention is not limited thereto.

Referring to FIG. 2E and FIG. 3E, a dielectric layer (or flat layer) 116 is formed to cover the second signal line 115, the drain 115a, the source 115b, and the blocking layer 114. The dielectric layer 116 has a contact window 116a (shown in FIG. 2E), and the contact window 116a exposes a part of the drain electrode 115a.

Please refer to FIG. 2F and FIG. 3F. Then, a touch signal line 130 is formed on the dielectric layer 116. In this embodiment, the touch signal line 130 may selectively extend in the first direction D1 and overlap the second signal line 115.

Referring to FIG. 2G and FIG. 3G, a first insulating material layer 140 a is formed to cover the touch signal line 130 and the dielectric layer 116. Then, a touch electrode 150 is formed on the first insulating material layer 140a. The touch electrode 150 exposes a part of the first insulating material layer 140a.

Referring to FIG. 2H and FIG. 3H, a second insulating material layer 160a is formed to cover the touch electrodes 150 and the first insulating material layer 140a.

Please refer to FIG. 2I and FIG. 3I, and then use the same mask to pattern the first insulating material layer 140a and the second insulating material layer 160a simultaneously to form the first insulating layer 140 and the second insulating layer 160. The first insulating layer 140 has a first contact window 141 and overlaps the contact portion 131 of the touch signal line 130. The second insulating layer 160 has a second contact window 161 that overlaps the contact portion 151 of the touch electrode 150 and the first contact window 141 of the first insulating layer 140.

In this embodiment, the first insulating layer 140 and the second insulating layer 160 are simultaneously patterned by using the same mask, and the first portion 161a of the second contact window 161 of the second insulating layer 160 is touched. On the electrode 150, and the second portion 161b of the second contact window 161 of the second insulating layer 160 is not on the touch electrode 150, therefore, the sidewall 142 of the first insulating layer 140 defining the first contact window 141 and the touch electrode The side walls 152 of the contact portion 151 of 150 are substantially aligned. That is, a part of the edge of the vertical projection of the first contact window 141 on the substrate 110 and a part of the edge of the vertical projection of the contact portion 151 of the touch electrode 150 on the substrate 110 substantially coincide.

Referring to FIG. 2I and FIG. 3I, a pixel electrode 170 and a first bridge element 180 are formed on the second insulating layer 150. The pixel electrode 170 is separated from the first bridge element 180. The pixel electrode 170 is electrically connected to the active device 120. The first bridge element 180 is electrically connected to the contact portion 151 of the touch electrode 150 and the contact portion 131 of the touch signal line 130 through the first contact window 141 and the second contact window 161. The touch electrode 150 is electrically connected to the touch signal line 130 to sense a touch action during a touch period. In addition, the touch electrodes 150 and the pixel electrodes 170 overlap, and the touch electrodes 150 and the pixel electrodes 170 are used to drive a display medium (such as, but not limited to, a liquid crystal) during a display period. That is, the touch electrode 150 can be regarded as a common electrode during a display period. At this point, the fabrication of the active device substrate 100 (labeled in FIG. 1) is completed. For example, in this embodiment, the pixel electrode 170 may be a transparent conductive layer including a metal oxide, such as: indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium germanium Zinc oxide, or other suitable oxides, or a stacked layer of at least two of the above, but the invention is not limited thereto.

It is worth mentioning that in this embodiment, the same contact mask is used to form the first contact window 141 and the second contact window 161 that overlap the contact portion 151 of the touch electrode 150 and the contact portion 131 of the touch signal line 130. The first bridge element 180 filled in the first contact window 141 and the second contact window 161 is used to electrically connect the contact portion 151 of the touch electrode 150 and the contact portion 131 of the touch signal line 130, and the first bridge element 180 can be used. Existing film layers (such as, but not limited to, the film layer to which the pixel electrode 170 belongs) are manufactured. Therefore, the number of masks required to manufacture the active device array substrate 100 can be reduced, which helps reduce manufacturing costs.

FIG. 4 is an enlarged schematic diagram of a region R4 corresponding to FIG. 2I. Please refer to FIGS. 2I and 4. In this embodiment, the touch signal line 130 extends in the first direction D1. The touch electrode contact portions 151,150 of the first portion in a direction perpendicular to the edge of the projection 151a on the substrate 110 D1 sandwiched at an angle α, and 0 ^o ≦ α ≦ 90 ^o, preferably 30 ^o ≦ α ≦ 60 ^o. In addition, in this embodiment, the first signal line 113 is electrically connected to the active device 120 and is interleaved with the touch signal line 130. Wherein, the first signal line 113 extends in the second direction D2, and a part of the edge of the vertical projection of the contact portion 151 of the touch electrode 150 on the substrate 110 is at an angle β with the second direction D2, and 0 ^o ≦ β ≦ 90 ^o , preferably 30 ^o ≦ α ≦ 60 ^o .

Please refer to FIGS. 3I and 4. In this embodiment, the second contact window 161 has a first portion 161 a and a second portion 161 b, which are respectively in contact with the contact portion 151 of the touch electrode 150 and the first contact window of the first insulating layer 140. 141 overlap. The first portion 161a of the second contact window 160 and the second portion 161b of the second contact window 160 are aligned in the third direction D3, and the first direction D1 and the third direction D3 are staggered. That is, in this embodiment, the second contact window 161, the contact portion 151 of the touch electrode 150, and the contact portion 131 of the touch signal line 130 may be substantially rhombic, and the sides of the rhombus are opposite to the first The signal line 113 and the second signal line 115 are inclined. Thereby, the second contact window 161, the contact portion 151 of the touch electrode 150, and the contact portion 131 of the touch signal line 130 can be disposed between adjacent pixel electrodes 170 with a smaller area, thereby improving the The aperture ratio of the element substrate 100.

FIG. 5A is an enlarged schematic diagram of a region R2 corresponding to FIG. 1. Fig. 5B is a schematic cross-sectional view corresponding to the section line C-C 'of Fig. 5A. The respective stacking and manufacturing methods of the region R2 in the peripheral region 100b are substantially similar to the respective stacking and manufacturing methods of the region R1 in the active region 100a, and are not repeated here.

Please refer to FIG. 5A and FIG. 5B. In this embodiment, the active device substrate 100 further includes a pad 115c, which is electrically connected to a driving chip (not shown) and is disposed in the peripheral region 100b. The dielectric layer 116 is disposed on the contact pad 115c and has at least one third contact window 116b overlapping the contact pad 115c. The touch signal line 130 is disposed on the dielectric layer 116b and has a first end portion 132 disposed on the peripheral region 100b. The first end portion 132 of the touch signal line 130 is electrically connected to the pad 115c through the third contact window 116b of the dielectric layer 116b. Specifically, in this embodiment, the first end portion 132 of the touch signal line 130 is disposed in the at least one third contact window 116b of the dielectric layer 116 and is in direct electrical contact with the pad 115c.

FIG. 6A is an enlarged schematic diagram of a region R3 corresponding to FIG. 1. Fig. 6B is a schematic sectional view corresponding to the section line D-D 'of Fig. 6A. The respective stacking and manufacturing methods of the region R3 in the peripheral region 100b are substantially similar to the respective stacking and manufacturing methods of the region R1 in the active region 100a, and are not repeated here.

Please refer to FIGS. 6A and 6B. In this embodiment, the active device substrate 100 further includes a touch switch 121 and a second bridge device 180a. The touch switch 121 is disposed in the peripheral region 100 b of the active device substrate 110. The dielectric layer 116 is disposed on the touch switch 121. The dielectric layer 116 has a contact window 116d that overlaps a portion 121a of the touch switch 121. The touch signal line 130 is disposed on the dielectric layer 116 and has a second end portion 133. The first insulating layer 140 includes a fourth contact window 144 and a fifth contact window 145. The fourth contact window 144 overlaps a portion 121 a of the touch switch 121. The fifth contact window 145 overlaps the second end portion 133 of the touch signal line 130. The second insulating layer 160 includes a sixth contact window 162 and a seventh contact window 163. The sixth contact window 162 overlaps the fourth contact window 144, and the seventh contact window 163 overlaps the fifth contact window 145. In this embodiment, the vertical projection of the fourth contact window 144 on the substrate 110 and the vertical projection of the sixth contact window 162 on the substrate 110 may be selectively located within the vertical projection of the contact window 116d on the substrate 110. The invention is not limited to this.

The second bridge element 180 a can be electrically connected to the portion 121 a of the touch switch 121 through the fourth contact window 144 of the first insulating layer 140 and the sixth contact window 162 of the second insulating layer 160. The second bridge element 180 a can be electrically connected to the second end portion 133 of the touch signal line 130 through the fifth contact window 145 of the first insulating layer 140 and the seventh contact window 163 of the second insulating layer 160.

In this embodiment, the fourth contact window 144 of the first insulating layer 140 and the sixth contact window 162 of the second insulating layer 160 are substantially aligned. In this embodiment, the fifth contact window 145 of the first insulating layer 140 and the seventh contact window 163 of the second insulating layer 160 are substantially aligned.

In summary, in the manufacturing process of the active device substrate according to an embodiment of the present invention, the first contact window of the first insulating layer overlapping the contact portion of the touch electrode and the contact portion of the touch signal line is formed by using the same mask. And the second contact window of the second insulation layer, the first bridge element filled in the first contact window and the second contact window is used to electrically connect the contact portion of the touch electrode and the contact portion of the touch signal line, In addition, the first bridge element can be manufactured by using an existing film layer (such as, but not limited to, a film layer to which a pixel electrode belongs). Therefore, the number of masks required to fabricate an active element array substrate can be reduced, which can help reduce manufacturing costs. .

Although the present invention has been disclosed as above with the examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some modifications and retouching without departing from the spirit and scope of the present invention. The protection scope of the present invention shall be determined by the scope of the attached patent application.

100‧‧‧Active component substrate

100a‧‧‧active zone

100b‧‧‧Peripheral area

110‧‧‧ substrate

111‧‧‧Semiconductor pattern

112‧‧‧Gate insulation

113‧‧‧The first signal line

113a‧‧‧Gate

114‧‧‧ Barrier

114a, 114b‧‧‧ contact window

115‧‧‧The second signal line

115a‧‧‧Drain

115b‧‧‧Source

115c‧‧‧pad

116‧‧‧ Dielectric layer

116a, 116d‧‧‧touch window

116b‧‧‧Third contact window

120‧‧‧active element

121‧‧‧touch switch

121a‧‧‧part

130‧‧‧touch signal line

131‧‧‧Contact

132‧‧‧first end

133‧‧‧ second end

140‧‧‧first insulating layer

140a‧‧‧first insulating material layer

141‧‧‧The first contact window

142‧‧‧ sidewall

144‧‧‧Fourth contact window

145‧‧‧Fifth contact window

150‧‧‧touch electrode

151‧‧‧Contact

151a‧‧‧Edge

152‧‧‧ sidewall

160‧‧‧Second insulation layer

160a‧‧‧second insulating material layer

161‧‧‧Second contact window

161a‧‧‧Part I

161b‧‧‧Part II

162‧‧‧The sixth contact window

163‧‧‧The seventh contact window

170‧‧‧pixel electrode

180‧‧‧first bridge element

180a‧‧‧Second bridge element

D1‧‧‧ first direction

D2‧‧‧ Second direction

D3‧‧‧ Third direction

G‧‧‧Gate

R1, R2, R3, R4‧‧‧ area

α, β‧‧‧ angle

FIG. 1 is a schematic top view of an active device substrate according to an embodiment of the present invention. 2A to 2I are schematic top views of a manufacturing process of an active device substrate according to an embodiment of the present invention. 3A to 3I are schematic cross-sectional views illustrating a manufacturing process of an active device substrate according to an embodiment of the present invention. FIG. 4 is an enlarged schematic diagram of a region R4 corresponding to FIG. 2I. FIG. 5A is an enlarged schematic diagram of a region R2 corresponding to FIG. 1. Fig. 5B is a schematic cross-sectional view corresponding to the section line C-C 'of Fig. 5A. FIG. 6A is an enlarged schematic diagram of a region R3 corresponding to FIG. 1. Fig. 6B is a schematic sectional view corresponding to the section line D-D 'of Fig. 6A.

Claims (10)

An active element substrate includes: a substrate having an active region and a peripheral region outside the active region; an active element disposed on the active region of the substrate; a touch signal line disposed on the substrate; a A first insulation layer is disposed on the touch signal line and has a first contact window overlapping with a contact portion of the touch signal line; a touch electrode is disposed on the first insulation layer and has a A contact portion; a second insulating layer disposed on the touch electrode and having a second contact window, wherein the second contact window and the contact portion of the touch electrode and the first insulating layer The contact window overlaps; a pixel electrode is disposed on the second insulation layer and is electrically connected to the active element; and a first bridge element is disposed on the second insulation layer and separated from the pixel electrode The first bridge element is electrically connected to the contact portion of the touch electrode and the contact portion of the touch signal line through the first contact window and the second contact window. The active device substrate according to item 1 of the patent application scope, wherein the first insulating layer has a sidewall defining the first contact window, a sidewall of the contact portion of the touch electrode and the first insulating layer The side walls are substantially aligned. The active device substrate according to item 1 of the scope of patent application, wherein a part of an edge of a vertical projection of the first contact window on the substrate and a vertical projection of the contact portion of the touch electrode on the substrate A part of an edge of the substantially coincides. The active device substrate according to item 1 of the patent application scope, wherein the touch signal line extends in a first direction, and a portion of an edge of a vertical projection of the contact portion of the touch electrode on the substrate and the first direction by an angle α, and 0 ^o ≦ α ≦ 90 ^o. The active device substrate according to item 1 of the scope of patent application, further comprising: a first signal line electrically connected to the active device and interlaced with the touch signal line, wherein the first signal line is in a second extends in a direction, and the contact portion of the electrodes of the touch on the substrate an edge portion of one of the vertical projection of the second direction by an angle beta], and 0 ^o ≦ β ≦ 90 ^o. The active device substrate according to item 1 of the scope of patent application, wherein the touch signal line extends in a first direction; the second contact window has a first portion and a second portion, which are respectively connected to the touch electrodes. The contact portion and the first contact window of the first insulation layer overlap, the first portion of the second contact window and the second portion of the second contact window are aligned in a third direction, and the first direction and The third direction is staggered. The active device substrate according to item 1 of the scope of the patent application, further comprising: a pad provided on the peripheral area of the substrate; and a dielectric layer provided on the pad and having an overlap with the pad. At least one third contact window, wherein the touch signal line is disposed on the dielectric layer and has a first end portion disposed on the peripheral area, and the first end portion of the touch signal line is disposed on the dielectric layer. The at least one third contact window of the electrical layer is directly in electrical contact with the pad. The active device substrate according to item 1 of the patent application scope further includes: a touch switch provided in the peripheral region of the active device substrate; a dielectric layer provided on the touch switch, wherein the touch The signal line is disposed on the dielectric layer and has a second end portion, and the first insulating layer has a fourth contact window that overlaps a portion of the touch switch and the second end portion of the touch signal line, respectively. And a fifth contact window, the second insulating layer has a sixth contact window and a seventh contact window respectively overlapping the fourth contact window and the fifth contact window; and a second bridge element disposed on the On the second insulating layer, the fourth contact window of the first insulating layer and the sixth contact window of the second insulating layer are electrically connected to the part of the touch switch, and pass through the first insulating layer. The fifth contact window and the seventh contact window of the second insulation layer are electrically connected to the second end portion of the touch signal line. The active device substrate according to item 8 of the scope of patent application, wherein the fourth contact window of the first insulation layer and the sixth contact window of the second insulation layer are substantially aligned. According to the active device substrate according to item 8 of the scope of patent application, the fifth contact window of the first insulating layer and the seventh contact window of the second insulating layer are substantially aligned.