TWI675913B - Detergent composition for substrate for hard disk - Google Patents

Abstract

The present invention provides a cleaning agent composition for a hard disk substrate having excellent cleanability of particles remaining on the surface of the substrate. The present invention relates to a cleaner composition for a hard disk substrate, which contains a polymer (ingredient A) which contains a structural unit derived from the monomer a1 or an anhydride represented by the following general formula (I) (a1), and a structural unit (a2) derived from at least one monomer a2 selected from a monomer represented by the following general formula (II) and a monomer represented by the following general formula (III), a component The weight average molecular weight of A is 15,000 or more and 200,000 or less, and the pH value is 8 or more.

Description

Detergent composition for hard disk substrate

The present invention relates to a cleaning agent composition for a hard disk substrate, a method for cleaning the substrate, and a method for manufacturing a hard disk substrate.

In recent years, large data such as moving images or audio have been processed in personal computers or various electronic devices, and large-capacity information recording devices have become necessary. As a result, the demand for higher recording density of the information recording medium has been increasing year by year. To cope with this situation, the industry is promoting the adoption and mass production of perpendicular magnetic recording methods for hard disks. Regarding the perpendicular magnetic recording method, a substrate for an information recording medium (hereinafter, also referred to as a “hard disk substrate”) requires a higher level of substrate heat resistance and surface smoothness than the current substrate. Furthermore, the required cleanliness on the surface of the hard disk substrate is also increased. As a material for the substrate for a hard disk, there are aluminum, glass, and the like having nickel-phosphorus plating on the surface. Recently, in the field of semiconductor substrates with different substrate materials, higher cleanliness of the substrate surface is also required, and various cleaners have been developed. Patent Document 1 is an effective cleaning agent for cleaning pads such as polishing pads used in polishing contaminated with abrasive particles such as abrasive particles in abrasive liquids, their agglomerates, and solid stains such as abrasive particles of abrasives. The composition discloses a detergent composition containing an anionic surfactant having a group selected from the group consisting of -COOR and -SO ₃ R (R represents a hydrogen atom, an inorganic base, or an organic base) in a molecule. Patent Document 2 discloses the following semiconductors as a cleaning composition effective for removing organic or inorganic fine foreign matters and oil components and having a small foaming property when forming a semiconductor element on a semiconductor substrate such as a silicon wafer. A cleaning composition for a substrate or a semiconductor element, which is a polycarboxylic acid compound having a weight average molecular weight of 500 to 150,000, and the polycarboxylic acid compound is selected from acrylic acid, methacrylic acid, and maleic acid At least one of them is used as the monomer component, and it is obtained by using the monomer component in an amount of 20 mol% or more of the total amount of the monomer component. In Patent Document 3, as a burden on the environment, CMP abrasive grains such as silicon oxide and alumina remaining on semiconductor parts such as semiconductor substrates before and after chemical mechanical polishing (CMP), and metals contained in CMP are included. Impurities or cleaners based on impurities such as Fe, Mn, Al, Ce, Cu, W, and Ti, such as metal wiring, have higher cleaning effects. Detergent for semiconductor parts with (co) polymer as a main component, which is copolymerized. Prior Art Literature Patent Literature Patent Literature 1: Japanese Patent Laid-Open No. 2000-309796 Patent Literature 2: Japanese Patent Laid-Open No. 11-181494 Patent Literature 3: Japanese Patent Laid-Open No. 2001-64680

[Problems to be Solved by the Invention] Generally, a manufacturing step of a hard disk substrate includes a polishing step using a polishing liquid composition. If particles such as abrasive dust or abrasive particles remain on the surface of the substrate after the polishing step, the performance and yield of the magnetic disk will be adversely affected. In particular, even if fine particles are temporarily peeled from the substrate, they are likely to reattach to the surface of the substrate, and the detergent composition is also required to have high particle dispersibility. Therefore, the present invention provides a detergent composition having excellent cleanability of particles remaining on the surface of a substrate, a method for cleaning the substrate using the same, and a method for manufacturing a substrate for a hard disk. [Technical means to solve the problem] In one aspect, the present invention relates to a cleaning agent composition for a substrate for a hard disk, which contains a polymer (ingredient A) which contains a polymer derived from the following general formula (I The structural unit (a1) of the monomer a1 or its anhydride represented by), and derived from at least one selected from the monomers represented by the following general formula (II) and the monomers represented by the following general formula (III) The structural unit (a2) of one type of monomer a2 has a weight average molecular weight of component A of 15,000 or more and 200,000 or less, and a pH value of 8 or more. [Chemical 1] [In formula (I), R ¹ , R ^2, and R ³ each independently represent a hydrogen atom, a methyl group, or-(CH ₂ ) _p COOM ² , and M ¹ and M ² each independently represent a hydrogen atom, an alkali metal, or alkaline earth. Metal (1/2 atom), organic ammonium group, or ammonium group, p represents an integer of 0 or more and 2 or less] [化 2] [In formula (II), R ⁴ and R ⁵ each independently represent a hydrogen atom or a methyl group, q represents an integer of 0 or more and 2 or less, AO represents an alkyleneoxy group having 2 or 3 carbon atoms, and n is AO The average addition mole number is a number of 4 or more and 300 or less, and X is a hydrogen atom or an alkyl group having 1 or more and 3 or less carbon] [Chemical 3] [In formula (III), R ⁶ and R ⁷ each independently represent a hydrogen atom or a methyl group, r represents an integer of 0 or more and 2 or less, AO represents an alkyleneoxy group having 2 or 3 carbon atoms, and m is AO The average addition mole number is 4 or more and 300 or less, and Y is a hydrogen atom or an alkyl group having 1 or more and 3 or less carbon] In another aspect, the present invention relates to a method for cleaning a substrate It includes a cleaning step of cleaning the substrate to be cleaned by using the cleaning agent composition of the present invention. The substrate to be cleaned is a substrate that is polished by using a polishing liquid composition. In yet another aspect, the present invention relates to a method for manufacturing a substrate for a hard disk, which includes a cleaning step of cleaning the substrate to be cleaned using the cleaning agent composition of the present invention, wherein the substrate to be cleaned uses a polishing liquid composition The substrate after polishing. [Effects of the Invention] According to the present invention, it is possible to provide a detergent composition having excellent cleanability of particles remaining on the substrate surface. In addition, according to the cleaning method and manufacturing method using the detergent composition of the present invention, a substrate for a hard disk having excellent cleanliness on the surface of the substrate after cleaning can be obtained. Furthermore, according to the cleaning method and manufacturing method using the detergent composition of the present invention, a hard disk recording device with a high recording density can be obtained.

The present invention is based on the insight that if a substrate that has been polished with a polishing liquid composition is cleaned using a detergent composition containing a specific polymer (ingredient A) and a pH value of 8 or more, the residue on the surface of the substrate can be increased. Removability of particles. That is, in one aspect, the present invention relates to a cleaning composition for a substrate for a hard disk (hereinafter, also referred to as "the cleaning composition of the present invention"), which contains a polymer (ingredient A), which The polymer includes a structural unit (a1) derived from the monomer a1 represented by the general formula (I) or an anhydride thereof, and a polymer selected from the monomers represented by the general formula (II) and the following general formula (III) In the structural unit (a2) of at least one monomer a2 among the monomers represented by), the weight average molecular weight of component A is 15,000 or more and 200,000 or less, and the pH value is 8 or more. The detailed mechanism showing the effect of the present invention is not clear, but it is inferred as follows. It is speculated that by adsorbing the carboxyl group of the polymer (ingredient A) in the detergent composition on the substrate surface and the particle surface, a three-dimensional barrier caused by a polyalkylene oxide group is formed on the substrate surface and the particle surface, and on the substrate surface- There is a three-dimensional repulsion between particles or between particles. As a result, the removal of particles from the surface of the substrate is promoted, and the re-attachment of particles to the surface of the substrate and the aggregation of particles with each other are suppressed. The particles can be efficiently removed from the surface of the substrate, and Improve cleanliness. Furthermore, it is considered that by having the polymer (ingredient A) a specific weight average molecular weight, the above-mentioned steric repulsion effect is more effectively produced, and the re-attachment of particles to the surface of the substrate or the aggregation of particles with each other can be more effectively suppressed. Generally, compared with particles derived from abrasive particles, particles derived from abrasive particles have a smaller particle size and are difficult to remove. However, it is considered that the detergent composition of the present invention can also contain a specific polymer (ingredient A). Efficiently removes hard-to-remove particles from abrasive particles. However, the present invention is not limited to these mechanisms and is explained. Therefore, according to the detergent composition of the present invention, in one or more embodiments, the dispersibility of the particles in the detergent composition is excellent, and the particles remaining on the surface of the substrate can be effectively removed. Furthermore, according to the cleaning method and manufacturing method using the detergent composition of the present invention, in one or more embodiments, a substrate for a hard disk having excellent cleanliness can be obtained. Furthermore, by using a hard disk substrate cleaned with the detergent composition of the present invention, a hard disk recording device with a high recording density can be realized. In the present invention, the "particle" refers to a foreign substance remaining or adhering to the surface of a substrate. The "particles" of the present invention include foreign matter derived from abrasive particles such as nickel oxide, silicon oxide, and the like; foreign matter derived from abrasive particles such as silicon oxide, alumina, and ceria. Hereinafter, each component contained in the cleaner composition of this invention is demonstrated. [Component A: Polymer] The component A contained in the detergent composition of the present invention is a polymer containing a structural unit derived from the monomer a1 or its anhydride represented by the following general formula (I) ( a1) and a structural unit (a2) derived from at least one monomer a2 selected from a monomer represented by the following general formula (II) and a monomer represented by the following general formula (III). (Monomer a1) In formula (I), R ¹ , R ² And R ³ Each independently represents a hydrogen atom, a methyl group, or-(CH ₂ ) _p COOM ² , M ¹ And M ² Each independently represents a hydrogen atom, an alkali metal, an alkaline earth metal (1/2 atom), an organic ammonium group, or an ammonium group, and p represents an integer of 0 or more and 2 or less. In formula (I), R ¹ , R ² And R ³ Is selected from the group consisting of a hydrogen atom, a methyl group, and-(CH ₂ ) _p COOM ² At least one of them is preferably R from the viewpoint of improving cleanability. ¹ And R ³ Is a hydrogen atom, R ² A hydrogen atom or a methyl group, more preferably R ¹ And R ³ Is a hydrogen atom, R ² Is methyl. In formula (I), M ¹ And M ² It is at least one selected from the group consisting of a hydrogen atom, an alkali metal, an alkaline earth metal (1/2 atom), an organic ammonium group, and an ammonium group. From the viewpoint of improving cleanability, an alkali metal is preferred, and sodium and Potassium. In formula (I), p is an integer of 0 or more and 2 or less. From the viewpoint of improving the cleanability, 0 or 1 is preferable, and 0 is more preferable. The monomer a1 represented by the formula (I) may be an acid anhydride. Examples of the monomer a1 include acrylic acid, methacrylic acid, maleic acid, fumaric acid, itaconic acid and the like, acid anhydrides thereof, and salts thereof, and from the viewpoint of improving cleanability , Preferably at least one selected from the group consisting of acrylic acid, methacrylic acid, maleic acid and maleic anhydride, more preferably at least one of acrylic acid and methacrylic acid, and further preferably methacrylic acid . Examples of the salt include an alkali metal salt, an alkaline earth metal salt, an ammonium salt, and an organic ammonium salt. From the viewpoint of improving cleanability, an alkali metal salt is preferable, and a sodium salt and a potassium salt are more preferable. (Monomer a2) The monomer a2 is selected from a monomer represented by the following general formula (II) (hereinafter, also referred to as "monomer a21") and a monomer represented by the following general formula (III) (hereinafter , Also known as "monomer a22"). ＜ monomer a21 ＞ [chemical 5] In formula (II), R ⁴ And R ⁵ Each independently represents a hydrogen atom or a methyl group, q represents an integer of 0 or more and 2 or less, AO represents an alkyleneoxy group having 2 or 3 carbon atoms, n is an average addition mole number of AO, and represents 4 or more and 300 or less, X represents a hydrogen atom or an alkyl group having 1 or more and 3 or less carbon atoms. In the formula (II), AO represents an alkyleneoxy group having 2 or 3 carbon atoms, and the alkyleneoxy group may have any of a linear form and a branched form. AO may be 1 type, and may be 2 or more types. When there are two or more types of AO, the addition form may be random or block. Examples of AO include oxyethylene (EO) and oxyethylene (PO). In terms of cleanability, oxyethylene (EO) is preferred. In the formula (II), n is a number of 4 or more and 300 or less. From the viewpoint of improving the cleanability, it is preferably 6 or more, more preferably 9 or more, still more preferably 20 or more, and even more preferably 40 or more. It is more preferably 80 or more, and from the same viewpoint, it is preferably 200 or less, more preferably 150 or less, and still more preferably 130 or less. In the formula (II), X represents a hydrogen atom or an alkyl group having 1 or more and 3 carbon atoms, and from the viewpoint of improving cleanability, an alkyl group having 1 or more and 3 carbon atoms is preferred. The alkyl group may have any of a linear form and a branched form. Examples of the alkyl group having 1 to 3 carbon atoms include methyl, ethyl, n-propyl, and isopropyl. As the monomer a21, when q in Formula (II) is 0, for example, methoxypolyethylene glycol (meth) acrylate, ethoxypolyethylene glycol (meth) acrylate, Propoxy polyethylene glycol (meth) acrylate, methoxy polypropylene glycol (meth) acrylate, ethoxy polypropylene glycol (meth) acrylate, and propoxy polypropylene glycol (meth) acrylate From the viewpoint of improving cleanability, it is preferably selected from the group consisting of methoxy polyethylene glycol (meth) acrylate, ethoxy polyethylene glycol (meth) acrylate, and propoxy polyethylene. At least one of the glycol (meth) acrylates is more preferably a methoxypolyethylene glycol (meth) acrylate, and even more preferably a methoxypolyethylene glycol methacrylate. The "(meth) acrylate" means at least one of an acrylate and a methacrylate. As the monomer a21, when q in Formula (II) is 1, for example, methoxypolyethylene glycol 3-butenoate, ethoxypolyethylene glycol 3-butenoate, Propoxy polyethylene glycol 3-butenoate, methoxy polypropylene glycol 3-butenoate, ethoxy polypropylene glycol 3-butenoate, and propoxy polypropylene glycol 3-butenoate Wait. As the monomer a21, when q in the formula (II) is 2, for example, methoxy polyethylene glycol 4-pentenoate, ethoxy polyethylene glycol 4-pentenoate, Propoxy polyethylene glycol 4-pentenoate, methoxy polypropylene glycol 4-pentenoate, ethoxy polypropylene glycol 4-pentenoate, and propoxy polypropylene glycol 4-pentenoate Wait. ＜ monomer a22 ＞ [chemical 6] In formula (III), R ⁶ And R ⁷ Each independently represents a hydrogen atom or a methyl group, r represents an integer of 0 or more and 2 or less, AO represents an alkyleneoxy group having 2 or 3 carbon atoms, and m is an average addition mole number of AO, representing 4 or more and A number of 300 or less, Y represents a hydrogen atom or an alkyl group having 1 or more and 3 or less carbon atoms. In the formula (III), AO represents an alkyleneoxy group having 2 or 3 carbon atoms, and the alkyleneoxy group may have any of a linear form and a branched form. AO may be 1 type, and may be 2 or more types. When there are two or more types of AO, the addition form may be random or block. Examples of AO include oxyethylene (EO) and oxyethylene (PO). In terms of cleanability, oxyethylene (EO) is preferred. In formula (III), m is a number of 4 or more and 300 or less. From the viewpoint of improving the cleanability, it is preferably 6 or more, more preferably 9 or more, still more preferably 20 or more, and even more preferably 40 or more. It is more preferably 80 or more, and from the same viewpoint, it is preferably 200 or less, more preferably 150 or less, and still more preferably 130 or less. In the formula (III), Y represents a hydrogen atom or an alkyl group having 1 or more and 3 carbon atoms, and from the viewpoint of improving cleanability, an alkyl group having 1 or more and 3 carbon atoms is preferred. The alkyl group may have any of a linear form and a branched form. Examples of the alkyl group having 1 to 3 carbon atoms include methyl, ethyl, n-propyl, and isopropyl. As the monomer a22, when r in the formula (III) is 0, for example, polyethylene glycol vinyl ether, methoxy polyethylene glycol vinyl ether, and ethoxy polyethylene glycol vinyl are mentioned. Ether, propoxy polyethylene glycol vinyl ether, polypropylene glycol vinyl ether, methoxy polypropylene glycol vinyl ether, ethoxy polypropylene glycol vinyl ether, propoxy polypropylene glycol vinyl ether, polyethylene glycol Isopropenyl ether, polypropylene glycol isopropenyl ether, and the like. As the monomer a22, when r in Formula (III) is 1, for example, polyethylene glycol allyl ether, methoxy polyethylene glycol allyl ether, and ethoxy polyethylene glycol can be exemplified. Allyl ether, propoxy polyethylene glycol allyl ether, polypropylene glycol allyl ether, methoxy polypropylene glycol allyl ether, ethoxy polypropylene glycol allyl ether, propoxy polypropylene glycol Propyl ether, polyethylene glycol 2-methylallyl ether, polypropylene glycol 2-methylallyl ether, polyethylene glycol 2-butenyl ether, polypropylene glycol 2-butenyl ether, and the like. As the monomer a22, when r in the formula (III) is 2, for example, polyethylene glycol 3-butenyl ether, methoxy polyethylene glycol 3-butenyl ether, and ethoxy group may be mentioned. Polyethylene glycol 3-butenyl ether, propoxy polyethylene glycol 3-butenyl ether, polypropylene glycol 3-butenyl ether, methoxy polypropylene glycol 3-butenyl ether, ethoxy poly Propylene glycol 3-butenyl ether, propoxy polypropylene glycol 3-butenyl ether, polyethylene glycol 3-methyl-3-butenyl ether, methoxypolyethylene glycol 3-methyl-3- Butenyl ether, ethoxy polyethylene glycol 3-methyl-3-butenyl ether, propoxy polyethylene glycol 3-methyl-3-butenyl ether, polypropylene glycol 3-methyl- 3-butenyl ether, methoxy polypropylene glycol 3-methyl-3-butenyl ether, ethoxy polypropylene glycol 3-methyl-3-butenyl ether, propoxy polypropylene glycol 3-methyl -3-butenyl ether and the like. From the viewpoint of improving the cleanability, the molar ratio a1 / a2 of the structural unit (a1) to the structural unit (a2) in all the structural units of the component A of the present invention is preferably 0.1 or more, more preferably 0.5 or more It is more preferably 1 or more, further more preferably 2 or more, and from the same viewpoint, it is preferably 100 or less, more preferably 50 or less, still more preferably 30 or less, and even more preferably 20 or less. From the viewpoint of improving the cleanability, the molar ratio a1 / a2 in all the structural units of the component A is preferably 0.1 or more and 100 or less, more preferably 0.5 or more and 50 or less, and further preferably 1 or more and 30 or less. . Furthermore, it is more preferably 2 or more and 20 or less. Component A of the present invention may further contain structural units (a1) and structural units other than the structural unit (a2). Examples of other structural units include those derived from alkyl (meth) acrylate, hydroxyethyl (meth) acrylate, acrylamide, vinyl acetate, styrene, olefin, vinyl alcohol, and allyl alcohol. A structural unit of at least one compound among polyalkylene oxide adducts of allyl alcohol. From the viewpoint of exhibiting the effects of the present invention, the content of the other structural units in all the structural units of the component A of the present invention is preferably 10% by mass or less, more preferably 3% by mass or less, and even more preferably 1 Mass% or less. The component A of the present invention can be obtained by a known method such as polymerizing a monomer mixture containing a monomer a1 and a monomer a2 by a solution polymerization method. Examples of solvents used in solution polymerization include water; aromatic hydrocarbons such as toluene and xylene; alcohols such as ethanol and 2-propanol; ketones such as acetone and methyl ethyl ketone; tetrahydrofuran and diethylene glycol dimethyl Ether and other ethers. As the polymerization initiator used in the polymerization, a known radical initiator can be used, and examples thereof include ammonium peroxodisulfate (ammonium persulfate), hydrogen peroxide water, sodium peroxodisulfate, and the like. At the time of polymerization, a chain transfer agent can be further used, and examples thereof include thiol-based chain transfer agents such as 2-mercaptoethanol and β-mercaptopropionic acid; and chain transfer agents and solvents such as 1,2-propanediol. In the present invention, the content of each structural unit in all the structural units of component A can be regarded as the ratio of the amount of each monomer used to the total amount of monomers used for polymerization. The arrangement of the structural units of the component A may be any of random, block, or graft. A salt-forming group (-COOH,-(CH ₂ ) _p In the case of COOH), it can be neutralized with a neutralizing agent and used. Examples of the neutralizing agent include sodium hydroxide, potassium hydroxide, and ammonia. From the viewpoint of cleanness, the weight average molecular weight of the component A is 15,000 or more, preferably 20,000 or more, more preferably 25,000 or more, still more preferably 30,000 or more, and even more preferably 50,000 or more, and from the same viewpoint In other words, it is 200,000 or less, preferably 150,000 or less, more preferably 100,000 or less, and even more preferably 80,000 or less. From the viewpoint of cleanness, the weight average molecular weight of the component A is 15,000 or more and 200,000 or less, preferably 20,000 or more and 150,000 or less, more preferably 20,000 or more and 100,000 or less, and further preferably 20,000 or more and 80,000 or less, and furthermore More preferably, it is 25,000 or more and 80,000 or less. In the present invention, the weight average molecular weight is measured by gel permeation chromatography (polyethylene glycol conversion), and specifically, it can be measured by a method described in Examples. From the viewpoint of improving the cleanability, the content of the component A in the detergent composition of the present invention with respect to the total mass of components other than water is preferably 1% by mass or more, more preferably 10% by mass or more, and further preferably It is 15% by mass or more, more preferably 20% by mass or more, and from the same viewpoint, it is preferably 99.9% by mass or less, more preferably 99% by mass or less, and still more preferably 98% by mass or less. Furthermore, from the viewpoint of improving the cleanability, the content of the component A in the detergent composition with respect to the total mass of components other than water is preferably 1% by mass or more and 99.9% by mass or less, and more preferably 10% by mass or more. The content is 99.9% by mass or less, more preferably 15% by mass or more and 99% by mass or less, and still more preferably 20% by mass or more and 98% by mass or less. From the viewpoint of cleanability, the content of the component A at the time of cleaning of the detergent composition of the present invention is preferably 0.001% by mass or more, more preferably 0.005% by mass or more, and still more preferably 0.01% by mass or more. From the same viewpoint, it is preferably 10% by mass or less, more preferably 5% by mass or less, still more preferably 2% by mass or less, still more preferably 1% by mass or less, and still more preferably 0.5% by mass or less. It is more preferably 0.2% by mass or less. Furthermore, from the same viewpoint, the content of the component A at the time of cleaning in the detergent composition is preferably 0.001% by mass or more and 10% by mass or less, more preferably 0.005% by mass or more and 5% by mass or less, and more 0.01 mass% or more and 2 mass% or less, still more preferably 0.01 mass% or more and 1 mass% or less, still more preferably 0.01 mass% or more and 0.5 mass% or less, and still more preferably 0.01 mass% or more and 0.2 Mass% or less. As described below, the detergent composition of the present invention can also be made into a concentrate, which is diluted and used during cleaning. Therefore, in the present invention, in one or more embodiments, "when cleaning agent composition is cleaned, The content of each component "means the content of each component of the detergent composition used in the cleaning step. Therefore, in the present invention, in one or more embodiments, the detergent composition during cleaning, that is, the detergent composition used in the cleaning step refers to the detergent composition in a diluted state. [Component B: Alkali agent] The detergent composition of the present invention may further contain an alkali agent (component B). Examples of the alkaline agent include compounds capable of imparting alkalinity to the detergent composition, or compounds capable of adjusting the pH value of the detergent composition to the following range, and examples thereof include inorganic alkali agents and organic alkali agents. Examples of the inorganic alkali agent include ammonia; alkali metal hydroxides such as potassium hydroxide and sodium hydroxide. Examples of the organic alkali agent include hydroxyalkylamine, quaternary ammonium salt, and the like. Examples of the hydroxyalkylamine include monoethanolamine, diethanolamine, triethanolamine, methylethanolamine, methyldiethanolamine, monopropanolamine, dipropanolamine, tripropanolamine, methylpropanolamine, and ethyl acetate. Dipropanolamine, and aminoethylethanolamine. Examples of the quaternary ammonium salt include tetramethylammonium hydroxide and choline. These alkali agents may be used alone or as a mixture of two or more. As the component B, at least one selected from the group consisting of an alkali metal hydroxide, a hydroxyalkylamine, and a quaternary ammonium salt is preferable from the viewpoint of improving the cleanability, and from the viewpoint of reducing the burden of the drainage treatment Is more preferably an alkali metal hydroxide, and even more preferably at least one of potassium hydroxide and sodium hydroxide. From the viewpoint of improving cleanability, the content of the component B in the detergent composition of the present invention with respect to the total mass of components other than water is preferably 0.1% by mass or more, more preferably 0.3% by mass or more, and further preferably It is 0.5 mass% or more, and from the same viewpoint, it is preferably 99 mass% or less, more preferably 90 mass% or less, still more preferably 80 mass% or less, and still more preferably 75 mass% or less. Furthermore, from the viewpoint of improving cleanability, the content of the component B in the detergent composition of the present invention with respect to the total mass of components other than water is preferably 0.1% by mass or more and 99% by mass or less, and more preferably 0.1%. Mass% or more and 90 mass% or less, more preferably 0.3 mass% or more and 80 mass% or less, still more preferably 0.5 mass% or more and 75 mass% or less. From the viewpoint of cleanness, the content of the component B during cleaning of the detergent composition of the present invention is preferably 0.00005 mass% or more, more preferably 0.0001 mass% or more, and further preferably 0.001 mass% or more. From the same viewpoint, it is preferably 2.0% by mass or less, more preferably 0.3% by mass or less, still more preferably 0.1% by mass or less, still more preferably 0.07% by mass or less, and still more preferably 0.05% by mass or less. Furthermore, from the same viewpoint, the content of the component B at the time of cleaning of the detergent composition is preferably 0.00005 mass% or more and 2.0 mass% or less, more preferably 0.00005 mass% or more and 0.3 mass% or less, and further preferably It is 0.00005 mass% or more and 0.1 mass% or less, still more preferably 0.0001 mass% or more and 0.07 mass% or less, and still more preferably 0.001 mass% or more and 0.05 mass% or less. From the viewpoint of improving cleanability, the ratio A / B of the content of the component A to the content of the component B in the detergent composition of the present invention is preferably 0.01 or more, more preferably 0.1 or more, and even more preferably 0.3. Above, from the same viewpoint, it is preferably 20,000 or less, more preferably 1,000 or less, and even more preferably 100 or less. From the viewpoint of improving the cleanability, the content ratio A / B in the detergent composition is preferably 0.01 or more and 20,000 or less, more preferably 0.1 or more and 1,000 or less, and still more preferably 0.3 or more and 100 or less. [Component C: Water] The detergent composition of the present invention may further contain water (component C). The water is not particularly limited as long as it can function as a solvent, and examples thereof include ultrapure water, pure water, ion-exchanged water, or distilled water, and ultrapure water, pure water, or ion-exchanged water is preferred. , More preferably ultrapure water. Pure water and ultrapure water can be obtained, for example, by subjecting tap water to ion-exchange treatment with activated carbon and then performing distillation, and irradiating or passing a filter through a specific ultraviolet germicidal lamp as needed for the obtained person. From the viewpoint of improving the cleanability and stabilizing the detergent composition, the content of the component C at the time of cleaning of the detergent composition of the present invention is preferably 90% by mass or more, more preferably 95% by mass or more, and further It is preferably 99% by mass or more, and from the same viewpoint, it is preferably 99.99% by mass or less, more preferably 99.98% by mass or less, and still more preferably 99.97% by mass or less. [Optional component] In addition to the above components A to C, the detergent composition of the present invention may contain a chelating agent, an anionic polymer, a nonionic surfactant, a co-solvent, an antioxidant, a preservative, an antifoaming agent, and an antibacterial agent. Agents and other optional ingredients. The optional component is preferably contained in the detergent composition within a range that does not impair the effect of the present invention. The content of the optional component during cleaning of the detergent composition is preferably 0% by mass or more and 2.0% by mass or less, more preferably 0 mass% or more and 1.5 mass% or less, more preferably 0 mass% or more and 1.3 mass% or less, and still more preferably 0 mass% or more and 1.0 mass% or less. (Chelating agent) The cleaning composition of the present invention may contain a chelating agent from the viewpoint of improving the cleanability. Examples of the chelating agent include: selected from aldonic acids such as gluconic acid and glucoheptanoic acid; aminocarboxylic acids such as ethylenediaminetetraacetic acid and diethylenetriaminepentaacetic acid; hydroxycarboxylic acids such as citric acid and malic acid; Phosphonic acids such as 1-hydroxyethylene-1,1-diphosphonic acid; and at least one of the group consisting of these salts. (Anionic polymer) The cleaner composition of the present invention may contain an anionic polymer such as a carboxylic acid polymer from the viewpoint of improving cleanability. Examples of the carboxylic acid-based polymer include an acrylic polymer, a methacrylic polymer, a maleic acid polymer, an acrylic acid / methacrylic acid copolymer, an acrylic acid / maleic acid copolymer, and formic acid. An anionic polymer containing methacrylic acid or acrylic acid in a structural unit such as a methacrylic acid / methyl acrylate copolymer. (Nonionic Surfactant) The cleansing composition of the present invention may contain a nonionic surfactant from the viewpoint of improving cleanability. Examples of the nonionic surfactant include polyalkylene glycol alkyl ethers. (Cosolvent) The cleaning composition of the present invention may contain a cosolvent from the viewpoint of improving storage stability. Examples of the co-solvent include at least one selected from the group consisting of p-toluenesulfonic acid, dimethylbenzenesulfonic acid, 2-ethylhexanoic acid, and salts thereof. In addition to the water described above, the detergent composition of the present invention may further contain an aqueous solvent (for example, an alcohol such as ethanol) as a solvent. The solvent contained in the detergent composition of the present invention preferably contains only water. [PH value of the detergent composition] The pH value of the detergent composition of the present invention at the time of cleaning is 8 or more. From the viewpoint of cleanability, it is preferably 9 or more, more preferably 9.5 or more, and even more preferably 10 or more, more preferably 10.5 or more, and from the same viewpoint, 14 or less is more preferable, 13 or less is more preferable, 12.5 or less is further preferable, 12 or less is further preferable, and 11.5 is further more preferable. the following. For example, from the viewpoint of improving the cleanability, the pH value of the detergent composition of the present invention can be adjusted using an acid or an alkali agent of component B. Examples of the acid include inorganic acids such as nitric acid, sulfuric acid, and hydrochloric acid; and organic acids such as hydroxycarboxylic acid and amino acid. In the present invention, the "pH value during cleaning" refers to the pH value when the detergent composition is used (after dilution) at 25 ° C, and can be measured by a pH meter, preferably an electrode with a pH meter Value after immersing in the detergent composition for 3 minutes. [Manufacturing Method of Detergent Composition] The detergent composition of the present invention can be produced by mixing component A, and optionally component B, component C, and optional components by a known method. For example, the detergent composition of the present invention can be prepared by blending at least component A. Therefore, the present invention relates to a method for producing a detergent composition including a step of formulating at least component A. In the present invention, the "mixing" includes a case where the component A, the component B, the component C, and an optional component are mixed at the same time or in an arbitrary order. In the manufacturing method of the detergent composition of this invention, the compounding quantity of each component can be set to the same content as each component of the said detergent composition of this invention. From the standpoint of storage and transportation, the detergent composition of the present invention can also be made into a concentrate and diluted during use. From the standpoint of storage and transportation, the concentrate of the detergent composition is preferably made into a concentrate having a dilution ratio of 3 times or more, and from the standpoint of storage stability, it is preferably made to have a dilution ratio of 200 times. The following concentrates. The concentrate of the detergent composition can be used by diluting with the water so that the content of each component becomes the above-mentioned content (that is, the content at the time of cleaning) during use. Furthermore, the concentrate of a detergent composition can also be used by adding each component separately at the time of use. In the present invention, the "during use" or "during cleaning" of the concentrate of the detergent composition refers to a state where the concentrate of the detergent composition is diluted. From the viewpoint of improving the cleanability after dilution, the pH value of the concentrate of the detergent composition of the present invention is preferably 8 or more, more preferably 9.0 or more, still more preferably 9.5 or more, and even more preferably 10.0 or more. Moreover, from the same viewpoint, it is preferably 14.0 or less, more preferably 13.0 or less, and even more preferably 12.0 or less. The pH value of the concentrate of the detergent composition of the present invention can be measured by the same method as the pH value of the detergent composition of the present invention described above. [Substrate to be cleaned] In one or more embodiments, the detergent composition of the present invention can be used to clean a substrate polished with a polishing liquid composition, or a substrate remaining or having particles adhered thereto. Examples of the substrate to be cleaned include an aluminum alloy substrate and a glass substrate coated with Ni-P. The glass substrate may be a crystallized glass substrate or an amorphous glass substrate. In one or more embodiments, the particles remaining or attached to the substrate to be cleaned include particles derived from abrasive particles such as nickel oxide, silicon oxide, and the like; abrasives derived from silicon oxide, aluminum oxide, and cerium oxide, etc. Grain and so on. In one or more embodiments, the cleaning composition of the present invention may be suitably used for cleaning particles to which abrasive particles derived from nickel oxide, silicon oxide, etc. are adhered, and preferably a source, in terms of cleaning effect. Substrate of abrasive particles of nickel oxide. Furthermore, in one or more embodiments, in terms of cleaning effect, the cleaning composition of the present invention can be preferably used for cleaning an aluminum alloy substrate plated with Ni-P, preferably using a polishing liquid. The Ni-P-plated aluminum alloy substrate after the composition is polished, more preferably, the Ni-P-plated aluminum alloy substrate after being polished using a polishing liquid composition containing silicon oxide abrasive particles. [Cleaning method of substrate] In one aspect, the present invention relates to a method for cleaning a substrate (hereinafter, also referred to as "the cleaning method of the present invention"), which includes using the cleaning agent composition of the present invention to clean a substrate to be cleaned. A cleaning step is performed. The substrate to be cleaned is a substrate that has been polished with a polishing liquid composition. The cleaning method of the present invention may further include a dilution step of diluting the above-mentioned concentrate of the cleaning composition of the present invention. As the substrate to be cleaned, the above substrate can be used. In one or more embodiments, the cleaning step may include a step of bringing the cleaning agent composition of the present invention into contact with the substrate to be cleaned. In one or more embodiments, the cleaning step may include performing dip cleaning and / or scrub cleaning. According to the cleaning method of the present invention, particles adhering to the surface of the substrate can be efficiently removed, preferably particles of abrasive dust derived from nickel oxide, silicon oxide, etc., and more preferably particles of abrasive dust derived from nickel oxide. (Immersion Cleaning) There are no particular restrictions on the immersion conditions of the substrate to be cleaned in the detergent composition. For example, from the viewpoints of workability and operability, the temperature of the detergent composition is preferably from 20 to 100 ° C. For example, from the viewpoint of improving the cleanability of the detergent composition, the immersion time is preferably 5 seconds or more, more preferably 10 seconds or more, and still more preferably 100 seconds or more, and the production of the cleaned substrate is improved. From the viewpoint of efficiency, the immersion time is preferably 30 minutes or less, more preferably 10 minutes or less, and even more preferably 5 minutes or less. From the viewpoint of improving the removability of the residue and the dispersibility of the residue, it is preferable to give ultrasonic cleaner to the detergent composition. The frequency of the ultrasonic wave is, for example, preferably from 20 to 2000 kHz, more preferably from 40 to 2000 kHz, and even more preferably from 40 to 1500 kHz. (Scrubbing and cleaning) As a method of scrubbing and cleaning, from the viewpoint of promoting the cleanability of residues such as abrasive particles or the solubility of oil, it is preferred to perform cleaning by spraying a cleaning agent being subjected to ultrasonic vibration The composition cleans the surface of the substrate to be cleaned by bringing the cleaning composition into contact with the surface of the substrate; or the cleaning composition is supplied by spraying onto the surface of the substrate to be cleaned, and the cleaning composition is scrubbed with a cleaning brush. The surface. Further, from the same point of view, the method of scrubbing and cleaning is preferably performed by cleaning the surface of the object to be cleaned by applying a cleaning agent composition to which ultrasonic vibration is applied by injection, and using the cleaning agent. The surface to which the detergent composition is supplied is scrubbed. As a method for applying the cleaning agent composition to the surface of the substrate to be cleaned, a mechanism such as a spray nozzle can be used. The cleaning brush is not particularly limited, and for example, a nylon brush or a PVA (polyvinyl alcohol) sponge brush can be used. The frequency of the ultrasonic wave can be set, for example, to the same value as that preferably used in the above-mentioned dipping cleaning. The cleaning method of the present invention may include, in addition to the above-mentioned dipping cleaning and / or the above-mentioned scrub cleaning, one or more well-known cleaning steps such as swing cleaning, cleaning using a spinner or the like, and liquid cleaning. The cleaning method of the present invention can clean the substrates to be cleaned one by one, and can also collect multiple pieces of the substrates to be cleaned at a time for cleaning. The number of cleaning tanks used during cleaning may be one or plural. [Manufacturing Method of Hard Disk Substrate] In one aspect, the present invention relates to a manufacturing method of a hard disk substrate (hereinafter, also referred to as "the manufacturing method of the present invention"), which includes using the cleaning agent of the present invention A step of cleaning the substrate to be cleaned by the composition. As the substrate to be cleaned, the above substrate can be used. In general, a substrate for a hard disk can be manufactured by subjecting a base material that becomes the base of the substrate for a hard disk to a shape processing step, a rough grinding step, a fine grinding step, a rough grinding step, a fine grinding step, and the like. Moreover, there may be a case where a cleaning step is included between the above steps. The hard disk substrate can be made into a magnetic hard disk, for example, by passing through the recording portion forming step after the final cleaning step. The recording portion forming step can be performed, for example, by forming a magnetic layer having a magnetic recording area and including a metal thin film on a hard disk substrate by a method such as sputtering. Examples of the metal material constituting the metal thin film include an alloy of chromium, tantalum, platinum, and the like with cobalt, an alloy of iron, and platinum, and the like. The magnetic layer may be formed on both main surface sides of the hard disk substrate, or may be formed only on one main surface side. The rough grinding step and the fine grinding step are performed in this order, for example. As the inorganic fine particles contained in the abrasive composition used when performing the rough grinding step, for example, cerium oxide particles or alumina particles are preferred for reasons of enabling high-speed grinding. For the purpose of improving the smoothness (surface roughness) of the surface, it is preferable that the inorganic fine particles contained in the abrasive composition used in the fine grinding step are silica particles. In one or more embodiments, after the rough grinding step, the cleaning step (the first cleaning step), the rinsing step (the first rinsing step), and the drying step (the first drying step) using the detergent composition may be sequentially performed. ), A fine grinding step, a cleaning step (second cleaning step) using a detergent composition, a rinsing step (second rinsing step), and a drying step (second drying step). The cleaning method of the present invention can be applied to the first cleaning step and / or the second cleaning step. From the viewpoint of improving the cleanability, the cleaning method of the present invention is preferably used in the second cleaning step. Therefore, in one aspect, the present invention relates to a method for manufacturing a hard disk substrate including the following steps (1) and (2). (1) A polishing step of polishing a substrate to be polished using a polishing liquid composition. (2) A cleaning step of cleaning the substrate (the substrate to be cleaned) obtained in step (1) using the detergent composition of the present invention. The substrate to be polished in the above step (1) is generally a substrate after the fine grinding step, and preferably a substrate after the rough grinding step. As the substrate to be polished, the same substrate as the substrate to be cleaned can be used. Step (1) can be performed by supplying a polishing liquid composition to the polishing target surface of the substrate to be polished, bringing the polishing pad into contact with the polishing target surface, and applying a specific pressure (load) while moving the polishing pad or The substrate to be polished. From the viewpoint of improving the quality of the final substrate, step (1) is preferably a fine polishing step using a polishing liquid composition containing silicon oxide particles. In the fine grinding step, it is preferable to repeatedly use the polishing liquid composition. The cleaning step of the above step (2) can be performed in the same manner as the cleaning method of the present invention described above. [Set] In one aspect, the present invention relates to a set (hereinafter, also referred to as the "set of the present invention"), which is used to manufacture a detergent composition, and includes The solution contained the container-containing component A solution in a container. The kit of the present invention may further include at least one selected from the group consisting of component B, component C, and an arbitrary component stored in a container different from the component A solution contained in the container. For example, as the set of the present invention, the solution containing the component A (first liquid) and the solution containing the component B (second liquid) are stored in a state where they are not mixed with each other. Mixing kit (2-liquid cleaner composition). In the first liquid and the second liquid, if necessary, the above-mentioned component C and any component may be mixed, respectively. When the first liquid and the second liquid are mixed, for example, the concentration of each component in the detergent composition can be adjusted by adjusting the usage amount of the second liquid. According to the present invention, it is possible to provide a kit for obtaining a detergent composition for a substrate for a hard disk having excellent cleanability of particles remaining on the substrate surface. [Hard Disk Recording Device] In one aspect, the present invention relates to a hard disk recording device (hereinafter, also referred to as "the hard disk recording device of the present invention") which uses the cleaning agent composition of the present invention for cleaning Substrate for hard disk. By using a substrate for a hard disk to be cleaned using the detergent composition of the present invention, a hard disk recording device with a high recording density can be provided. Furthermore, the present invention relates to one or more of the following embodiments. <1> A cleaner composition for a substrate for a hard disk, comprising a polymer (component A) containing a structural unit derived from a monomer a1 or an anhydride thereof represented by the following general formula (I) ( a1) and a structural unit (a2) derived from at least one monomer a2 selected from a monomer represented by the following general formula (II) and a monomer represented by the following general formula (III), component A The weight average molecular weight is 15,000 or more and 200,000 or less, and the pH is 8 or more. [Chemical 7] [In formula (I), R ¹ , R ² And R ³ Each independently represents a hydrogen atom, a methyl group, or-(CH ₂ ) _p COOM ² , M ¹ And M ² Each independently represents a hydrogen atom, an alkali metal, an alkaline earth metal (1/2 atom), an organic ammonium group, or an ammonium group, and p represents an integer of 0 or more and 2 or less] [Chem. 8] [In formula (II), R ⁴ And R ⁵ Each independently represents a hydrogen atom or a methyl group, q represents an integer of 0 or more and 2 or less, AO represents an alkyleneoxy group having 2 or 3 carbon atoms, n is an average addition mole number of AO, and represents 4 or more and 300 or less, X represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms] [Chem. 9] [In formula (III), R ⁶ And R ⁷ Each independently represents a hydrogen atom or a methyl group, r represents an integer of 0 or more and 2 or less, AO represents an alkyleneoxy group having 2 or 3 carbon atoms, and m is an average addition mole number of AO, representing 4 or more and 300 or less, Y represents a hydrogen atom or an alkyl group having a carbon number of 1 or more and 3 or less] <2> The cleaner composition according to <1>, wherein in the formula (I), R ¹ , R ² And R ³ Is selected from the group consisting of a hydrogen atom, a methyl group, and-(CH ₂ ) _p COOM ² At least one of them, preferably R ¹ And R ³ Is a hydrogen atom, R ² A hydrogen atom or a methyl group, more preferably R ¹ And R ³ Is a hydrogen atom, R ² Is methyl. <3> The cleaner composition according to <1> or <2>, wherein in formula (I), M ¹ And M ² It is at least one selected from the group consisting of a hydrogen atom, an alkali metal, an alkaline earth metal (1/2 atom), an organic ammonium group, and an ammonium group, preferably an alkali metal, and more preferably sodium and potassium. <4> The cleaner composition according to any one of <1> to <3>, wherein in the formula (I), p is an integer of 0 or more and 2 or less, preferably 0 or 1, and more preferably 0. <5> The cleaner composition according to any one of <1> to <4>, wherein in the formula (II), n is 4 or more, preferably 6 or more, more preferably 9 or more, and even more preferably It is 20 or more, more preferably 40 or more, and even more preferably 80 or more. <6> The cleaner composition according to any one of <1> to <5>, wherein in formula (II), n is 300 or less, preferably 200 or less, more preferably 150 or less, and further preferably It is 130 or less. <7> The cleaner composition according to any one of <1> to <6>, wherein in the formula (II), X is a hydrogen atom or an alkyl group having a carbon number of 1 or more and 3 or less, preferably An alkyl group having 1 to 3 carbon atoms. <8> The cleaner composition according to any one of <1> to <7>, wherein the molar ratio a1 / of the structural unit (a1) to the structural unit (a2) in all the structural units of the component A a2 is preferably 0.1 or more, more preferably 0.5 or more, even more preferably 1 or more, and even more preferably 2 or more. <9> The cleaner composition according to any one of <1> to <8>, in which the molar ratio a1 / of the structural unit (a1) to the structural unit (a2) of all the structural units of the component A is 1 / a2 is preferably 100 or less, more preferably 50 or less, still more preferably 30 or less, and even more preferably 20 or less. <10> The cleaner composition according to any one of <1> to <9>, in which the molar ratio a1 / of the structural unit (a1) to the structural unit (a2) of all the structural units of the component A is 1 / a2 is preferably 0.1 or more and 100 or less, more preferably 0.5 or more and 50 or less, still more preferably 1 or more and 30 or less, and even more preferably 2 or more and 20 or less. <11> The cleaner composition according to any one of <1> to <10>, wherein the weight average molecular weight of component A is 15,000 or more, preferably 20,000 or more, more preferably 25,000 or more, and even more preferably 30,000 or more, more preferably 50,000 or more. <12> The cleaner composition according to any one of <1> to <11>, wherein the weight average molecular weight of the component A is 200,000 or less, preferably 150,000 or less, more preferably 100,000 or less, and even more preferably Below 80,000. <13> The cleaner composition according to any one of <1> to <12>, wherein the weight average molecular weight of the component A is 15,000 or more and 200,000 or less, preferably 20,000 or more and 150,000 or less, and more preferably 20,000 The above is 100,000 or less, more preferably 20,000 or more and 80,000 or less, and even more preferably 25,000 or more and 80,000 or less. <14> The cleaner composition according to any one of <1> to <13>, wherein the content of component A in the detergent composition relative to the total mass of components other than water is preferably 1% by mass or more 10% by mass or more, more preferably 15% by mass or more, and even more preferably 20% by mass or more. <15> The cleaner composition according to any one of <1> to <14>, wherein the content of component A in the detergent composition relative to the total mass of components other than water is preferably 99.9% by mass or less , More preferably 99% by mass or less, still more preferably 98% by mass or less. <16> The cleaner composition according to any one of <1> to <15>, wherein the content of component A in the detergent composition relative to the total mass of components other than water is preferably 1% by mass or more The content is 99.9% by mass or less, more preferably 10% by mass or more and 99.9% by mass or less, still more preferably 15% by mass or more and 99% by mass or less, and still more preferably 20% by mass or more and 98% by mass or less. <17> The cleaner composition according to any one of <1> to <16>, wherein the content of the component A during cleaning of the cleaner composition is preferably 0.001% by mass or more, and more preferably 0.005% by mass The above is more preferably 0.01% by mass or more. <18> The cleaner composition according to any one of <1> to <17>, wherein the content of the component A during cleaning of the cleaner composition is preferably 10% by mass or less, and more preferably 5% by mass Hereinafter, it is more preferably 2% by mass or less, still more preferably 1% by mass or less, still more preferably 0.5% by mass or less, still more preferably 0.2% by mass or less. <19> The cleaner composition according to any one of <1> to <18>, wherein the content of the component A at the time of cleaning in the cleaner composition is preferably 0.001% by mass or more and 10% by mass or less, More preferably, it is 0.005 mass% or more and 5 mass% or less, still more preferably 0.01 mass% or more and 2 mass% or less, still more preferably 0.01 mass% or more and 1 mass% or less, and still more preferably 0.01 mass% or more and 0.5 mass% or less, more preferably 0.01 mass% or more and 0.2 mass% or less. <20> The cleaner composition as described in any one of <1> to <19>, which further contains an alkali agent (component B). <21> The cleaner composition according to <20>, wherein component B is preferably at least one selected from the group consisting of alkali metal hydroxides, hydroxyalkylamines, and quaternary ammonium salts, and more preferably alkali metal hydrogen The oxide is more preferably at least one of potassium hydroxide and sodium hydroxide. <22> The cleaner composition according to any one of <20> or <21>, wherein the content of component B in the detergent composition relative to the total mass of components other than water is preferably 0.1% by mass or more , More preferably 0.3% by mass or more, and even more preferably 0.5% by mass or more. <23> The cleaner composition according to any one of <20> to <22>, wherein the content of component B in the detergent composition relative to the total mass of components other than water is preferably 99% by mass or less It is more preferably 90% by mass or less, still more preferably 80% by mass or less, and even more preferably 75% by mass or less. <24> The cleaner composition according to any one of <20> to <23>, wherein the content of component B in the detergent composition relative to the total mass of components other than water is preferably 0.1% by mass or more And 90% by mass or less, more preferably 0.3% by mass or more and 80% by mass or less, still more preferably 0.5% by mass or more and 75% by mass or less. <25> The cleaner composition according to any one of <20> to <24>, wherein the content of the component B during cleaning of the cleaner composition is preferably 0.00005% by mass or more, more preferably 0.0001% by mass The above is more preferably 0.001% by mass or more. <26> The cleaner composition according to any one of <20> to <25>, wherein the content of the component B during cleaning of the cleaner composition is preferably 2.0% by mass or less, and more preferably 0.3% by mass Hereinafter, it is more preferably 0.1% by mass or less, still more preferably 0.07% by mass or less, and still more preferably 0.05% by mass or less. <27> The cleaner composition according to any one of <20> to <26>, wherein the content of the component B during cleaning of the cleaner composition is preferably 0.00005% by mass or more and 2.0% by mass or less, more 0.00005 mass% or more and 0.3 mass% or less, more preferably 0.00005 mass% or more and 0.1 mass% or less, still more preferably 0.0001 mass% or more and 0.07 mass% or less, still more preferably 0.001 mass% or more and 0.05 Mass% or less. <28> The cleaner composition according to any one of <20> to <27>, wherein the ratio A / B of the content of the component A to the content of the component B in the detergent composition is preferably 0.01 or more , More preferably 0.1 or more, and even more preferably 0.3 or more. <29> The cleaner composition according to any one of <20> to <28>, wherein the ratio A / B of the content of the component A to the content of the component B in the detergent composition is preferably 20,000 or less Is more preferably 1,000 or less, and even more preferably 100 or less. <30> The cleaner composition according to any one of <20> to <29>, wherein the ratio A / B of the content of the component A to the content of the component B in the detergent composition is preferably 0.01 or more It is 20,000 or less, more preferably 0.1 or more and 1,000 or less, and still more preferably 0.3 or more and 100 or less. <31> The cleaner composition as described in any one of <1> to <30>, further containing water (component C). <32> The cleaner composition according to <31>, wherein the content of component C during cleaning of the cleaner composition is preferably 90% by mass or more, more preferably 95% by mass or more, and still more preferably 99% by mass %the above. <33> The cleaner composition according to <31> or <32>, wherein the content of the component C during cleaning of the cleaner composition is preferably 99.99% by mass or less, more preferably 99.98% by mass or less, It is preferably 99.97 mass% or less. <34> The cleaner composition according to any one of <1> to <33>, further comprising a member selected from the group consisting of a chelating agent, an anionic polymer, a nonionic surfactant, a co-solvent, an antioxidant, and a preservative At least one of any of the antifoaming agents and antibacterial agents. <35> The cleaner composition according to <34>, wherein the content of any component during cleaning of the cleaner composition is preferably 0% by mass or more and 2.0% by mass or less, more preferably 0% by mass or more and 1.5 The mass% or less is more preferably 0 mass% or more and 1.3 mass% or less, and still more preferably 0 mass% or more and 1.0 mass% or less. <36> The cleaner composition according to any one of <1> to <35>, wherein the pH value during cleaning is 8 or more, preferably 9 or more, more preferably 9.5 or more, and even more preferably 10 The above is more preferably 10.5 or more. <37> The cleaner composition according to any one of <1> to <36>, in which the pH value during cleaning is preferably 14 or lower, more preferably 13 or lower, even more preferably 12.5 or lower, and even more It is preferably 12 or less, and more preferably 11.5 or less. <38> The use of the cleaner composition according to any one of <1> to <37>, which is used to clean a substrate polished by a polishing liquid composition, or a substrate remaining or attached with particles . <39> A substrate cleaning method, comprising a cleaning step of cleaning a substrate to be cleaned using the detergent composition according to any one of <1> to <37>, wherein the substrate to be cleaned is a combination of polishing liquids The substrate after polishing. <40> The cleaning method according to <39>, wherein the substrate is an aluminum alloy substrate plated with Ni-P. <41> The cleaning method according to <39> or <40>, wherein the polishing liquid composition is a polishing liquid composition containing silicon oxide abrasive particles. <42> A method for manufacturing a substrate for a hard disk, comprising a cleaning step of cleaning the substrate to be cleaned using the detergent composition according to any one of <1> to <37>, wherein the substrate to be cleaned is used The substrate after the polishing liquid composition is polished. <43> A kit for producing the detergent composition according to any one of <1> to <37>, comprising a container-packed component containing a solution containing the component A in a container A solution. <44> A hard disk recording device using a substrate for a hard disk that is cleaned with the detergent composition according to any one of <1> to <37>. <45> Use of the cleaner composition as described in any one of <1> to <37> for cleaning the board | substrate for hard disks. [Examples] Hereinafter, the present invention will be specifically described by examples, but the present invention is not limited to these examples. 1. Preparation of polymer (ingredient A) When preparing polymers A1 to A16 shown in Table 1, the following raw materials were used. <Monomer a1> (1) MAA: methacrylic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) (2) AA: acrylic acid (manufactured by Kogyo Pharmaceutical Co., Ltd.) (3) MA: maleic anhydride ( (Manufactured by Mitsubishi Chemical Corporation) <Monomer a2> (1) Monomer a2-1 Polyethylene glycol monomethyl ether (weight average molecular weight) of ethylene oxide addition mol number 120 which will melt at 80 ° C 5344) 1000 parts by mass was charged into a glass reaction container provided with a thermometer, a stirrer, a dropping funnel, a nitrogen introduction tube, and a cooling condenser. Next, 3 parts by mass of hydroquinone and 32 parts by mass of p-toluenesulfonic acid were added. Here, air was introduced into the reaction solution at a flow rate of 6 ml / min based on a total mass of 1 kg of polyethylene glycol monomethyl ether and methacrylic acid. Nitrogen was introduced into the gas phase part, and 483 parts by mass of methacrylic acid (30 mol times with respect to polyethylene glycol monomethyl ether) was introduced while heating and pressure reduction in the reaction vessel were started. The pressure system was controlled to 26.7 kPa, and the time when the temperature of the reaction solution reached 105 ° C was set as the reaction start time. The reaction was continued while the temperature of the reaction solution was kept at 110 ° C while the reaction water and methacrylic acid distillate were reacted. The pressure was reduced to 12 to 13.3 kPa 1 hour after the start of the reaction, and the state was maintained thereafter. After 6 hours from the start of the reaction, the pressure was returned to normal pressure, and 1.05 times equivalent of a 48% sodium hydroxide aqueous solution was added to p-toluenesulfonic acid to neutralize the reaction. Thereafter, the temperature of the reaction solution was maintained at 130 ° C. or lower, and unreacted methacrylic acid was recovered by a vacuum distillation method to obtain an esterification reaction product. After cooling to 100 ° C, 200 parts by mass of saturated saline and 1,000 parts by mass of toluene were added to the reaction mixture, and the reaction mixture was adjusted to 50 ° C. The lower layer extraction was repeated 5 times, and 200 parts by mass of saturated saline was added and the layer was separated. Then, toluene was distilled off to obtain refined methoxypolyethylene glycol methacrylate of monomer a2-1. (The average EO addition mole number is 120). (2) Monomer a2-2 methoxypolyethylene glycol methacrylate (average addition mole number of EO is 23), M-230G (manufactured by Shin Nakamura Chemical Industry Co., Ltd.) (3) Monomer a2 -3 methoxy polyethylene glycol methacrylate (average EO addition mole number is 9), M-90G (manufactured by Shin Nakamura Chemical Industry Co., Ltd.) (4) monomer a2-4 will be polyethylene The ethylene oxide addition mole number of the monomethyl ether was changed to 41 (weight average molecular weight is 1838), and the amount of methacrylic acid was changed to 1405 parts by mass. The same procedure was followed as in the above-mentioned monomer a2-1. The methoxypolyethylene glycol methacrylate of the refined monomer a2-4 was obtained (the average addition mole number of EO was 41). (5) EG: ethylene glycol (6) monomer a2-5 methoxypolyethylene glycol allyl ether (average molecular weight is 1500, EO average addition mole number is 32), Uniox PKA-5010 (day (Manufactured by Oil Corporation) (7) Monomer a2-6, polyethylene glycol 3-methyl-3-butenyl ether (average addition mole number of EO is 50) (8) Monomer a2-7, polyethylene Glycol allyl ether (average addition mole number of EO is 25) (9) Monomer a2-8 polyethylene glycol acrylate (average addition mole number of EO is 5) <Polymerization chain transfer agent> ・ 2 -Mercaptoethanol (manufactured by Tokyo Chemical Industry Co., Ltd.) ・ β-Mercaptopropionic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) <Polymer chain transfer agent and solvent> ・ 1,2-propanediol (manufactured by Wako Pure Chemical Industries, Ltd.) ) 〈Polymerization initiator〉 ・ Ammonium peroxodisulfate (ammonium persulfate) (manufactured by Nacalai Tesque Co., Ltd.) Sodium disulfate (manufactured by Nacalai Tesque Co., Ltd.) <neutralizer> ・ Sodium hydroxide (48% by mass of NaOH, manufactured by Asahi Glass Co., Ltd.) [Production example of polymer A1] attached The reaction vessel was charged with a stirrer in water: 282 g (15.7 mole), stirred for one side, one side was replaced with nitrogen, warmed to 75 deg.] C in a nitrogen atmosphere. MAA: 20.7 g (0.24 mole), monomer a2-1: 323 g (0.06 mole) (mass ratio = 6/94, mole ratio = 80/20) and water: 239 g (13.3 mol) The obtained, 10% by mass aqueous ammonium persulfate solution: 34.7 g, and 2-mercaptoethanol: 1.8 g were simultaneously added dropwise to the reaction system. Next, a 10 mass% ammonium persulfate aqueous solution: 13.9 g was added dropwise over 30 minutes, and the mixture was aged at the same temperature (75 ° C) for 1 hour. After the aging was completed, 23.9 g of a 48% by mass aqueous NaOH solution was added and neutralized to obtain a polymer A1 (37% by mass aqueous solution). [Production Example of Polymer A2] A reaction vessel with a stirrer was charged with water: 367 g (20.4 mol), while stirring, nitrogen substitution was performed, and the temperature was raised to 80 ° C. in a nitrogen environment. MAA: 62.9 g (0.73 moles), monomer a2-2: 300 g (0.27 moles) (mass ratio = 17.3 / 82.7, mole ratio = 73/27) and water: 173 g (9.6 mol) The obtained, 10% by mass of an aqueous solution of ammonium persulfate: 34.1 g, and 2-mercaptoethanol: 2.9 g were simultaneously added dropwise to the reaction system. Next, a 10 mass% ammonium persulfate aqueous solution: 11.4 g was added dropwise over 30 minutes, and the mixture was aged at the same temperature (75 ° C) for 1 hour. After the aging was completed, 61 g of a 48% by mass aqueous NaOH solution was added for neutralization to obtain a polymer A2 (36% by mass aqueous solution). [Production example of polymer A3] Water was charged in a reaction vessel with a stirrer: 317 g (17.6 mol), and the mixture was stirred while being replaced with nitrogen, and the temperature was raised to 75 ° C. in a nitrogen environment. MAA was mixed and dissolved in 2 hours: 46.5 g (0.54 mole), monomer a2-1 323 g (0.06 mole) (mass ratio = 12.6 / 87.4, mole ratio = 90/10), and water: 239 g ( 13.3 moles), 10% by mass of an ammonium persulfate aqueous solution: 41.7 g, and 2-mercaptoethanol: 1.9 g were simultaneously added dropwise to the reaction system. Next, a 10 mass% ammonium persulfate aqueous solution: 13.9 g was added dropwise over 30 minutes, and the mixture was aged at the same temperature (75 ° C) for 1 hour. After the aging was completed, 49.3 g of a 48% by mass aqueous NaOH solution was added and neutralized to obtain a polymer A3 (36% by mass aqueous solution). [Production example of polymer A4] Water was charged in a reaction container with a stirrer: 275 g (15.3 mol), and while stirring, nitrogen was substituted, and the temperature was raised to 75 ° C. in a nitrogen environment. MAA: 9.5 g (0.11 mole), monomer a2-1: 323 g (0.06 mole) (mass ratio = 2.9 / 97.1, mole ratio a1 / a2 = 65/35) and water were dissolved and mixed in 2 hours. : 239 g (13.3 mol) of the obtained, a 10% by mass aqueous solution of ammonium persulfate: 3.8 g, and 1.2 g of 2-mercaptoethanol were simultaneously added dropwise to the reaction system. Next, a 10 mass% ammonium persulfate aqueous solution: 11.9 g was added dropwise over 30 minutes, and the mixture was aged at the same temperature (75 ° C) for 1 hour. After the aging was completed, 13.1 g of a 48% by mass aqueous NaOH solution was added and neutralized to obtain a polymer A4 (38% by mass aqueous solution). [Production example of polymer A5] Water was charged in a reaction container with a stirrer: 449 g (24.9) moles, while stirring and nitrogen substitution, and the temperature was raised to 80 ° C in a nitrogen environment. MAA: 55.9 g (0.65 moles), monomer a2-2: 390 g (0.35 moles) (mass ratio = 12.5 / 87.5, mole ratio = 65/35) and water: 220 g (12.2 mol) The obtained, 10% by mass aqueous ammonium persulfate solution: 31.0 g, and 2-mercaptoethanol: 4.2 g were added to the reaction system simultaneously and dropwise, respectively. Next, a 10 mass% ammonium persulfate aqueous solution: 10.5 g was added dropwise over 30 minutes, and the mixture was aged at the same temperature (75 ° C) for 1 hour. After the aging was completed, 54.2 g of a 48% by mass NaOH aqueous solution was added and neutralized to obtain a polymer A5 (37% by mass aqueous solution). [Production Example of Polymer A6] Water was charged in a reaction container with a stirrer: 292 g (16.2 mol), while stirring and nitrogen substitution, and the temperature was raised to 75 ° C. in a nitrogen environment. MAA: 102 g (1.19 moles), monomer a2-1: 339 g (0.063 moles) (mass ratio = 23.1 / 76.9, mole ratio = 95/5), and water: 252 g (14.0 mol) The obtained, 10% by mass of an aqueous solution of ammonium persulfate: 71.5 g, and 2-mercaptoethanol: 10.3 g were simultaneously added dropwise to the reaction system. Next, a 10 mass% ammonium persulfate aqueous solution: 57.2 g was added dropwise over 30 minutes, and the mixture was aged at the same temperature (75 ° C) for 1 hour. After the aging was completed, 103.3 g of a 48% by mass NaOH aqueous solution was added and neutralized to obtain a polymer A6 (36% by mass aqueous solution). [Production example of polymer A7] A reaction vessel with a stirrer was charged with water: 303 g (16.8 mol), while stirring, nitrogen substitution was performed, and the temperature was raised to 75 ° C. in a nitrogen environment. MAA: 40.4 g (0.47 moles), monomer a2-3: 257 g (0.53 moles) (mass ratio = 13.3 / 86.7, mole ratio = 47/53) and water: 152 g (8.42 mol) The obtained, 10 mass% ammonium persulfate aqueous solution: 15.5 g, and 2-mercaptoethanol: 2.1 g were simultaneously added dropwise to the reaction system. Next, a 10% by mass ammonium persulfate aqueous solution: 5.2 g was added dropwise over 30 minutes, and the mixture was aged at the same temperature (75 ° C.) for 1 hour. After the aging was completed, 39.2 g of a 48% by mass NaOH aqueous solution was added and neutralized to obtain a polymer A7 (37% by mass aqueous solution). [Production Example of Polymer A8] Water was charged in a reaction vessel with a stirrer: 22.6 g (1.26 mol), and while stirring, nitrogen was replaced, and the temperature was raised to 85 ° C in a nitrogen environment. AA: 8.7 g (0.12 mole), monomer a2-4: 89.6 g (0.047 mole) (mass ratio = 8.8 / 91.2, mole ratio = 72/28) and water: 92.3 g (5.13 mole) The obtained, a 5% by mass aqueous solution of ammonium persulfate: 15.0 g, and a 6% by mass aqueous solution of β-mercaptopropionic acid: 15.0 g were simultaneously added dropwise to the reaction system. Next, a 22 mass% ammonium persulfate aqueous solution: 5.0 g was added dropwise over 5 minutes, and the mixture was aged at the same temperature (85 ° C) for 0.5 hours. After the aging was completed, 10.1 g of a 48% by mass aqueous NaOH solution was added and neutralized to obtain a polymer A8 (38% by mass aqueous solution). [Polymer A9] ・ Sodium polyacrylate "Aron A-210" (43 mass% aqueous solution, weight average molecular weight is 3000, manufactured by Toa Synthesis Co., Ltd.) [Polymer A10] ・ Sodium polyacrylate (35 mass% aqueous solution , Weight average molecular weight is 60,000, manufactured by Polysciences, Inc.] [Polymer A11] • Polyethylene glycol methyl ether (number average molecular weight is 5000, manufactured by Sigmα-Aldrich) [Polymer A12] • Dodecylbenzenesulfonic acid Sodium "Neopelex G-25" (25% by mass aqueous solution, manufactured by Kao Corporation) [Production example of polymer A13] Fill a reaction vessel with a stirrer with water: 90.5 g (5.0 mol) on one side The mixture was stirred and replaced with nitrogen, and the temperature was raised to 75 ° C in a nitrogen environment. MA was mixed and dissolved in 2 hours: 63.7 g (0.65 moles), monomer a2-5: 525 g (0.35 moles) (mass ratio = 11/89, mole ratio = 65/35), and water: 161 g (8.9 moles) The obtained, 10% by mass aqueous ammonium persulfate solution: 37.0 g were simultaneously added dropwise to the reaction system. Next, a 10 mass% ammonium persulfate aqueous solution: 14.8 g was added dropwise over 30 minutes, and the mixture was aged at the same temperature (75 ° C) for 3 hours. After the aging was completed, 108 g of a 48% by mass aqueous NaOH solution was added and neutralized to obtain a polymer A13 (a 60% by mass aqueous solution). [Production Example of Polymer A14] A reaction vessel with a stirrer was charged with water: 234 g (13.0 mol) and monomer a2-6: 546 g (0.24 mol), while stirring and nitrogen replacement. , The temperature was raised to 65 ° C. in a nitrogen environment, and 8.6 g of hydrogen peroxide water was added dropwise. Next, a mixture obtained by dissolving AA: 54.4 g (0.76 moles) and water: 45.6 g (2.5 moles), and dissolving β-mercaptopropionic acid: 8.0 g, L-ascorbic acid 3.3 g, and water were mixed and dissolved in 2 hours. : 38.8 g of each obtained were added dropwise to the reaction system at the same time. Thereafter, it was aged at the same temperature (65 ° C) for 1 hour. After maturation, 62.9 g of a 48% by mass aqueous NaOH solution was added for neutralization to obtain a polymer A14 (60% by mass aqueous solution) (AA / monomer a2-6 mass ratio = 9/91, Molar ratio = 76 / twenty four). [Production Example of Polymer A15] A reaction vessel with a stirrer was charged with water: 193 g (10.7 mol), 1,2-propylene glycol: 295 g (3.9 mol), AA: 5.0 g (0.069 mol) ), Monomer a2-7: 150 g (0.13 mol), while stirring, nitrogen substitution, and the temperature was raised to 85 ° C. in a nitrogen environment. The mixture obtained by dissolving AA: 49.7 g (0.69 mol), monomer a2-7: 150 g (0.13 mol), and water: 50.3 g (2.8 mol) was mixed and dissolved in 75 minutes, and the peroxodisulfate was mixed and dissolved. Sodium: 5.3 g and water: 21.2 g were simultaneously added dropwise to the reaction system. Next, the obtained AA: 45.1 g (0.63 mol), sodium peroxodisulfate: 4.8 g, and water: 30.3 g were mixed and dissolved in the reaction system at the same time in 135 minutes. Thereafter, it was aged at the same temperature (85 ° C) for 3 hours. After the aging was completed, 52.2 g of a 48% by mass NaOH aqueous solution was added for neutralization to obtain a polymer A15 (a 40% by mass solution) (AA / monomer a2-7 mass ratio = 25/75, Molar ratio = 84 / 16). [Polymer A16] Sodium salt of copolymer of acrylic acid / polyethylene glycol acrylate (average addition mole number of EO is 5) in polymer A16 (weight average molecular weight is 10,000, Japanese Patent Laid-Open No. 2000-309796) Compound E) described in the gazette. In Table 1, the acrylic acid that becomes the structural unit (a1) of the polymer A16 is represented as AA, and the polyethylene glycol acrylate that becomes the structural unit (a2) (the average addition mole number of EO is 5) is represented as the monomer a2 -8. [Measurement of weight average molecular weight] The weight average molecular weights of the polymers A1 to A11 and A13 to A16 were measured using a gel permeation chromatography (hereinafter also referred to as "GPC") method under the following conditions. The measurement results are shown in Table 1. The weight average molecular weight (348.5) of the polymer A12 in Table 1 is a value recorded on an international chemical substance safety card. [GPC conditions] Column: G4000PWXL ＋ G2500PWXL (manufactured by Tosoh Co., Ltd.) Eluent: 0.2M phosphate buffer solution / CH ₃ CN = 9/1 (volume ratio) Flow rate: 1.0 mL / min Column temperature: 40 ° C Detection: RI (Refractive Index, refractive index) Sample size: 0.5 mg / mL Standard substance: Polyethylene glycol conversion [Table 1] 2. Preparation of Detergent Compositions (Examples 1 to 22 and Comparative Examples 1 to 8) Each component described in Table 2 was mixed by mixing the ratio (mass%, active ingredient) described in Table 2 and The detergent compositions of Examples 1 to 22 and Comparative Examples 1 to 8 were prepared. The pH value is the pH value of the detergent composition at 25 ° C, and the value after immersing the electrode of the pH meter (East Asia Electric Industrial Co., Ltd., HM-30G) in the detergent composition for 3 minutes was measured. When adjusting the pH, potassium hydroxide and sulfuric acid are used. Component B and component C use the following. <Component B: Alkali agent> KOH: Potassium hydroxide (manufactured by Kanto Chemical Co., Ltd., deer grade, solid content of 48% by mass) MEA: monoethanolamine (manufactured by Japan Catalyst Co., Ltd.) MDA: N-methyldiamine Ethanolamine (manufactured by Japan Emulsifier Co., Ltd., amino alcohol MDA) EA: N- (β-amino ethyl) ethanolamine (manufactured by Japan Emulsifier Co., Ltd., amino alcohol EA) <Component C: Water> Water: Ultra-pure water made using continuous pure water manufacturing equipment (Pureconti PC-2000VRL type) and subsystems (Makuace KC-05H type) manufactured by Kurita Industry Co., Ltd. <Other components> Sulfuric acid: manufactured by Wako Pure Chemical Industries, Ltd. , Reagent special grade, purity is 95.0% by mass 3. Evaluation method [dispersion test method] Add 30.0 g of the detergent composition to a 50 mL polypropylene bottle, and add 0.15 g of nickel oxide particles (average particle size is less than 50 nm) , Using an ultrasonic cleaner UT-105HS (manufactured by Sharp Manufacturing System Co., Ltd., 100 W, 35 kHz, 30 minutes) for stirring, and using an ultraviolet-visible spectrophotometer UV-2700 (manufactured by Shimadzu Corporation, measuring waves) The length was 660 nm), and the absorbance of the supernatant was measured immediately after stirring and after standing for 1 hour. The absorbance immediately after stirring was set to 100, and the relative value is shown in Table 2 as the dispersibility. The larger the value, the better the dispersibility. [Cleanability test method] Ni-P plated aluminum alloy substrate (outer diameter: 95 mm f, inner diameter: 25 mm f, thickness: 1.75 mm) Dipping into a dispersion (concentration: 0.0025 mass%) of the average particle diameter of less than 50 nm) for 2 minutes, and preparing a cleaned substrate to be contaminated, that is, a cleaned substrate to which particles are attached. Then, the above-mentioned substrate to be cleaned was cleaned using each detergent composition, and the cleanability of each detergent composition was evaluated. Cleaning is performed as follows. (Cleaning) Using a cleaning device, clean five substrates to be cleaned under the following conditions. Prepare two sets of flushing tanks. (1) Cleaning-1: 4000 g of a detergent composition for cleaning is prepared. The prepared detergent composition was added to the cleaning tank (a), and the liquid temperature in the cleaning tank (a) was set to 25 ° C. Then, the substrate to be cleaned was immersed in the detergent composition in the cleaning tank (a), and the ultrasonic wave (200 kHz) was irradiated while the substrate was cleaned for 120 seconds. (2) Rinse-1: Add ultrapure water to the washing tank (b), and set it so that the liquid temperature in the washing tank (b) becomes 25 ° C. Then, the substrate to be cleaned in the cleaning tank (a) was moved to the washing tank (b) and immersed in ultrapure water in the washing tank (b), and the ultrasonic wave (600 kHz) was irradiated while washing for 120 seconds. (3) Repeat the procedure (2) again using the rinse tank (c) with ultrapure water prepared under the same conditions as the rinse tank (b). (4) Cleaning-2: Move the substrate to be cleaned in the washing tank (c) to the cleaning and cleaning unit (A) equipped with a cleaning brush. Then, the cleaning brush was sprayed with a cleaning composition at 25 ° C, while the cleaning brush was rotated at 400 rpm on both sides of the substrate to be cleaned in the presence of the cleaning composition, and pressed against each other at 25 ° C. Clean for 5 seconds at ℃. The detergent composition uses the same composition as the detergent composition used in "(1) Cleaning-1". (5) Rinse-2: Move the substrate to be cleaned to the scrubbing and cleaning unit (B) prepared under the same conditions as those of the scrubbing and cleaning unit (A), and spray ultra-pure water at 25 ° C. Make the cleaning brush the same as (4) The ground was rotated at 400 rpm on both sides of the substrate to be cleaned, and pressed on one side, thereby rinsing at 25 ° C for 5 seconds. (6) The scrubbing and cleaning unit (C) prepared under the same conditions as the scrubbing and cleaning unit (A), and the scrubbing and cleaning unit (D) prepared under the same conditions as those of the scrubbing and cleaning unit (B) are repeated (4) and (5). (7) Rinse-3: Add ultrapure water to the washing tank (e), and set the temperature of the liquid in the washing tank (e) to 25 ° C. Then, the substrate to be cleaned was moved to the washing tank (e) and immersed in ultrapure water in the washing tank (e), and was irradiated with ultrasonic waves (170 kHz) while being washed for 600 seconds. (8) Drying: The substrate to be cleaned is moved to a spin dryer, and the surface of the substrate is completely dried at a speed of 700 rpm for 60 seconds. [Evaluation method of cleanliness] Using a mode Q-scattering of an optical micro defect inspection device (Candela 7100, manufactured by KLA-Tencor), the cleaned substrate rotated at 10,000 rpm was irradiated with laser light, and the number of defects (on the substrate Of foreign matter). The above measurement was performed on each of the ten substrates for each detergent composition, and an average value was calculated. The value of Comparative Example 1 was set to 100, and the relative values are shown in Table 2. The smaller the value, the smaller the number of defects, and it can be evaluated that the cleanliness is excellent. [Table 2] As shown in Table 2, the detergent compositions of Examples 1 to 22 showed better dispersibility than the detergent compositions of Comparative Examples 1 to 8. Furthermore, the cleaner compositions of Examples 1 to 22 exhibited better cleanability than the cleaner compositions of Comparative Examples 1 to 8.

Claims (10)

A cleaner composition for a substrate for a hard disk, comprising a polymer (ingredient A) containing a structural unit (a1) derived from the monomer a1 or an anhydride represented by the following general formula (I) And the weight of component A derived from the structural unit (a2) of at least one monomer a2 selected from the monomers represented by the following general formula (II) and the monomers represented by the following general formula (III) The average molecular weight is 15,000 or more and 200,000 or less, and the pH is 8 or more. [In formula (I), R ¹ , R ^2, and R ³ each independently represent a hydrogen atom, a methyl group, or-(CH ₂ ) _p COOM ² , and M ¹ and M ² each independently represent a hydrogen atom, an alkali metal, or alkaline earth. Metal (1/2 atom), or ammonium group, p represents an integer from 0 to 2] [In formula (II), R ⁴ and R ⁵ each independently represent a hydrogen atom or a methyl group, q represents an integer of 0 or more and 2 or less, AO represents an alkyleneoxy group having 2 or 3 carbon atoms, and n is AO The average addition mole number represents a number of 4 or more and 300 or less, and X represents a hydrogen atom or an alkyl group having a carbon number of 1 or more and 3 or less] [Chemical 3] [In formula (III), R ⁶ and R ⁷ each independently represent a hydrogen atom or a methyl group, r represents an integer of 0 or more and 2 or less, AO represents an alkyleneoxy group having 2 or 3 carbon atoms, and m is AO The average addition mole number represents a number of 4 or more and 300 or less, and Y represents a hydrogen atom or an alkyl group having a carbon number of 1 or more and 3 or less]. The detergent composition according to claim 1, wherein in the formula (I), M ¹ and M ² each independently represent an organic ammonium group. The detergent composition according to claim 1, wherein the weight average molecular weight of the component A is 20,000 or more and 80,000 or less. The detergent composition according to any one of claims 1 to 3, further comprising an alkali agent (ingredient B). The detergent composition according to claim 4, wherein component B is at least one selected from the group consisting of an alkali metal hydroxide, a hydroxyalkylamine, and a quaternary ammonium salt. The cleaner composition according to any one of claims 1 to 3, wherein the content of the component A during cleaning of the cleaner composition is 0.001% by mass or more and 10% by mass or less. A substrate cleaning method includes a cleaning step of cleaning a substrate to be cleaned using the detergent composition according to any one of claims 1 to 6, wherein the substrate to be cleaned is a substrate that has been polished with a polishing liquid composition. The cleaning method of claim 7, wherein the substrate is an aluminum alloy substrate plated with Ni-P. The cleaning method according to claim 7 or 8, wherein the polishing liquid composition is a polishing liquid composition containing silicon oxide abrasive particles. A method for manufacturing a substrate for a hard disk, comprising a cleaning step of cleaning a substrate to be cleaned using the detergent composition according to any one of claims 1 to 6, wherein the substrate to be cleaned is polished by using a polishing liquid composition The substrate.