TWI668520B - 液浸曝光裝置、曝光方法及元件製造方法 - Google Patents

液浸曝光裝置、曝光方法及元件製造方法 Download PDF

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Publication number
TWI668520B
TWI668520B TW106123571A TW106123571A TWI668520B TW I668520 B TWI668520 B TW I668520B TW 106123571 A TW106123571 A TW 106123571A TW 106123571 A TW106123571 A TW 106123571A TW I668520 B TWI668520 B TW I668520B
Authority
TW
Taiwan
Prior art keywords
substrate
liquid
liquid immersion
space
recovery
Prior art date
Application number
TW106123571A
Other languages
English (en)
Chinese (zh)
Other versions
TW201740219A (zh
Inventor
Shinji Sato
佐藤真路
Original Assignee
Nikon Corporation
日商尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation, 日商尼康股份有限公司 filed Critical Nikon Corporation
Publication of TW201740219A publication Critical patent/TW201740219A/zh
Application granted granted Critical
Publication of TWI668520B publication Critical patent/TWI668520B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW106123571A 2012-04-10 2013-03-20 液浸曝光裝置、曝光方法及元件製造方法 TWI668520B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201261622182P 2012-04-10 2012-04-10
US61/622,182 2012-04-10
US13/800,448 2013-03-13
US13/800,448 US9268231B2 (en) 2012-04-10 2013-03-13 Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium

Publications (2)

Publication Number Publication Date
TW201740219A TW201740219A (zh) 2017-11-16
TWI668520B true TWI668520B (zh) 2019-08-11

Family

ID=49292051

Family Applications (3)

Application Number Title Priority Date Filing Date
TW106123571A TWI668520B (zh) 2012-04-10 2013-03-20 液浸曝光裝置、曝光方法及元件製造方法
TW108118244A TW201935146A (zh) 2012-04-10 2013-03-20 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體
TW102109844A TWI606305B (zh) 2012-04-10 2013-03-20 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW108118244A TW201935146A (zh) 2012-04-10 2013-03-20 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體
TW102109844A TWI606305B (zh) 2012-04-10 2013-03-20 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體

Country Status (8)

Country Link
US (5) US9268231B2 (enExample)
EP (1) EP2836876B1 (enExample)
JP (3) JP6447131B2 (enExample)
KR (1) KR102147071B1 (enExample)
CN (2) CN108614393A (enExample)
HK (2) HK1205279A1 (enExample)
TW (3) TWI668520B (enExample)
WO (1) WO2013153965A1 (enExample)

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Also Published As

Publication number Publication date
US10768537B2 (en) 2020-09-08
WO2013153965A1 (en) 2013-10-17
KR102147071B1 (ko) 2020-08-24
TWI606305B (zh) 2017-11-21
TW201935146A (zh) 2019-09-01
HK1205279A1 (zh) 2015-12-11
EP2836876A1 (en) 2015-02-18
JP2018136581A (ja) 2018-08-30
US20190391503A1 (en) 2019-12-26
TW201740219A (zh) 2017-11-16
US9557654B2 (en) 2017-01-31
EP2836876B1 (en) 2020-08-05
CN104508560A (zh) 2015-04-08
US9268231B2 (en) 2016-02-23
JP6447131B2 (ja) 2019-01-09
US10409177B2 (en) 2019-09-10
US9927724B2 (en) 2018-03-27
HK1207908A1 (en) 2016-02-12
CN104508560B (zh) 2018-05-22
HK1257550A1 (zh) 2019-10-25
JP6593493B2 (ja) 2019-10-23
CN108614393A (zh) 2018-10-02
KR20150003276A (ko) 2015-01-08
US20130265556A1 (en) 2013-10-10
US20160161860A1 (en) 2016-06-09
US20180217511A1 (en) 2018-08-02
JP2015514304A (ja) 2015-05-18
US20170108786A1 (en) 2017-04-20
TW201348890A (zh) 2013-12-01
JP2019215586A (ja) 2019-12-19

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