TWI666976B - Flexible substrate and method thereof - Google Patents

Flexible substrate and method thereof Download PDF

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TWI666976B
TWI666976B TW106143555A TW106143555A TWI666976B TW I666976 B TWI666976 B TW I666976B TW 106143555 A TW106143555 A TW 106143555A TW 106143555 A TW106143555 A TW 106143555A TW I666976 B TWI666976 B TW I666976B
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layer
hard
substrate
flexible substrate
dielectric layer
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TW201929617A (en
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余俊賢
蔡憲銘
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英屬開曼群島商鳳凰先驅股份有限公司
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Abstract

一種可撓式基板,係包括:具有撓折段之無核心形式基板本體、以及形成於該基板本體上且具有穿孔之增設件,以令該撓折段外露於該穿孔,故藉由該基板本體為無核心形式,降低該可撓式基板之總厚度,符合薄化之需求。 A flexible substrate includes a coreless substrate body having a flexure section and an add-on formed on the substrate body and having a perforation to expose the flexure section to the perforation. The body is a coreless form, which reduces the total thickness of the flexible substrate and meets the demand for thinning.

Description

可撓式基板及其製法 Flexible substrate and manufacturing method thereof

本發明係有關一種封裝基板,尤指一種可撓式基板及其製法。 The present invention relates to a packaging substrate, in particular to a flexible substrate and a method for manufacturing the same.

軟硬結合電路板目前廣泛應用於智慧型手機板、光電板、互補式金屬氧化物半導體(Complementary Metal-Oxide-Semiconductor,簡稱CMOS)、電池模組和穿戴裝置。 Soft-hard circuit boards are currently widely used in smart phone boards, optoelectronic boards, complementary metal-oxide semiconductors (CMOS for short), battery modules and wearable devices.

傳統軟硬結合板係將軟板結構包覆於硬板結構內,僅露出需撓折的部分,並以層間互連取代傳統的表面焊接,故不僅能節省機構空間與簡化組裝流程,也能有效降低訊號從軟板結構傳遞到硬板結構的雜訊問題。 The traditional soft-hard board combines the soft-board structure in the hard-board structure, exposing only the parts that need to be bent, and replacing the traditional surface welding with interlayer interconnections, so it can not only save mechanism space and simplify the assembly process, but also Effectively reduce the problem of noise transmitted from the soft board structure to the hard board structure.

因此,藉由其良好的可靠性、組裝方便性、雜訊抑制等優點,使得軟硬結合板在目前電子產品的使用比例上快速地成長,並特別適用於需要輕、薄、短、小的行動裝置與穿戴式裝置。 Therefore, with its advantages of good reliability, ease of assembly, and noise suppression, the combination of soft and hard boards has grown rapidly in the current proportion of electronic products, and is particularly suitable for applications that require lightness, thinness, shortness, and smallness. Mobile and wearable devices.

第1A至1D圖係為習知軟硬結合型封裝基板1之第一製法之剖面示意圖。 Figures 1A to 1D are schematic cross-sectional views of the first manufacturing method of a conventional flexible-hard-type package substrate 1.

如第1A至1B圖所示,於一具有撓折段A之軟板10之相對兩側上分別貼合一具有穿孔110之硬板11,且該些 穿孔110對應該撓折段A,使該撓折段A對應外露於該些穿孔110。 As shown in Figs. 1A to 1B, a rigid plate 11 having a perforation 110 is attached to two opposite sides of a flexible plate 10 having a bending section A, and these The perforations 110 correspond to the flexure sections A, so that the flexure sections A are exposed correspondingly to the perforations 110.

所述之軟板10具有一核心層10a、設於該核心層10a相對兩側之第一線路層10b、包覆該第一線路層10b之覆蓋膠層(Coverly Adhesives)10c、及遮蓋該覆蓋膠層10c之覆蓋保護膜10d。例如,以銅箔基板(copper clad laminate,簡稱CCL)製作該核心層10a與該第一線路層10b。 The flexible board 10 has a core layer 10a, a first circuit layer 10b provided on opposite sides of the core layer 10a, a coverly adhesive layer 10c covering the first circuit layer 10b, and covering the cover. The adhesive layer 10c is covered with a protective film 10d. For example, a copper clad laminate (CCL) is used to fabricate the core layer 10a and the first circuit layer 10b.

所述之硬板11具有一硬質基材11a、設於該硬質基材11a其中一側之金屬層11b及設於該硬質基材11a另一側之純膠材11c,且該硬板11以機械鑽孔方式貫穿該硬質基材11a、金屬層11b與純膠材11c而形成該穿孔110,再以其純膠材11c黏貼於該軟板10之覆蓋保護膜10d上。 The hard board 11 has a hard substrate 11a, a metal layer 11b provided on one side of the hard substrate 11a, and a pure rubber material 11c provided on the other side of the hard substrate 11a. The mechanical drilling method penetrates the hard substrate 11a, the metal layer 11b, and the pure rubber material 11c to form the perforation 110, and then adheres the pure rubber material 11c to the cover protective film 10d of the soft board 10.

如第1C圖所示,以機械鑽孔或雷射燒灼方式貫穿該軟板10與該硬板11,以形成複數通孔100。 As shown in FIG. 1C, the soft board 10 and the hard board 11 are penetrated by mechanical drilling or laser cauterization to form a plurality of through holes 100.

如第1D圖所示,藉由該金屬層11b電鍍導電材12a於整層該金屬層11b上及該些通孔100之孔壁上,再經圖案化蝕刻該金屬層11b與該導電材12a,以於該硬質基材11a上形成第二線路層12,且於該些通孔100中形成中空型導電通孔13,以令該導電通孔13電性連接該些第一線路層10b之電性接觸墊101與第二線路層12。之後,於該硬質基材11a與該第二線路層12上及於該導電通孔13中形成外露部分該第二線路層12之防焊層14(如油墨或綠漆),但該防焊層14未形成於該穿孔110中。 As shown in FIG. 1D, the metal layer 11b is used to electroplat a conductive material 12a on the entire layer of the metal layer 11b and the hole walls of the through holes 100, and then pattern-etch the metal layer 11b and the conductive material 12a. A second circuit layer 12 is formed on the hard substrate 11a, and a hollow conductive via 13 is formed in the through holes 100, so that the conductive via 13 is electrically connected to the first circuit layers 10b The electrical contact pad 101 and the second circuit layer 12. After that, an exposed part of the solder resist layer 14 (such as ink or green paint) of the second circuit layer 12 is formed on the hard substrate 11a and the second circuit layer 12 and in the conductive through hole 13, but the solder resist The layer 14 is not formed in the through hole 110.

因此,習知軟硬結合型封裝基板1係藉由該撓折段A 與該穿孔110之設計以進行撓曲動作。 Therefore, the conventional flexible and rigid package substrate 1 uses the flexure A And the perforation 110 is designed to perform a flexing action.

惟,習知軟硬結合型封裝基板1中,因該軟板10之層間尺寸變異較大,且受到貼合製程限制,導致該軟板10與該硬板11的層間對位精度不佳(該純膠材11c容易使該硬板11偏位,致使該軟板10與該硬板11的層間對位精度約+/-100um),故需增加該軟板10之電性接觸墊101的面積,以避免孔位偏移而使該導電通孔13無法連接該電性接觸墊101,但也因此減少該第一線路層10b之其它功能線路之佈線面積,導致需增大該軟板10之寬度或減少該軟板10之線路功能。然而,若不增加該電性接觸墊101之面積,則需增加該電性接觸墊101與其周圍線路之間的距離t,以避免因孔位偏移而錯接所導致之電路短路之問題,但也因此無法符合細間距的需求。 However, in the conventional soft-hard combined packaging substrate 1, the inter-layer alignment accuracy of the soft board 10 and the hard board 11 is poor due to the large inter-layer size variation of the soft board 10 and the limitation of the bonding process. The pure rubber material 11c easily deviates the hard board 11 and causes the interlayer alignment accuracy of the soft board 10 and the hard board 11 to be about +/- 100um), so the electric contact pad 101 of the soft board 10 needs to be increased. To prevent the conductive vias 13 from being connected to the electrical contact pads 101, but also reduce the wiring area of other functional circuits of the first circuit layer 10b, resulting in the need to increase the flexible board 10. The width of the flexible board 10 may be reduced. However, if the area of the electrical contact pad 101 is not increased, the distance t between the electrical contact pad 101 and its surrounding circuits needs to be increased to avoid the problem of short circuit caused by the misalignment of the hole position. However, it cannot meet the requirements of fine pitch.

再者,由於該硬板11以其純膠材11c黏貼於該軟板10上,致使該軟板10與該硬板11的交接處會產生溢膠e(如第1B圖所示之穿孔110角落處受該硬質基材11a之壓迫)、缺膠、板邊凹陷等問題,進而影響後續組裝貼合與撓折能力。 In addition, because the hard board 11 is adhered to the soft board 10 with its pure rubber material 11c, the overflow of the soft board 10 and the hard board 11 will cause an overflow of glue e (such as the perforation 110 shown in FIG. 1B). The corners are pressed by the hard substrate 11a), lack of glue, and board edge depression, etc., which further affect the subsequent assembly, bonding and bending capabilities.

又,該封裝基板1受限於該軟板10之核心層10a、該硬板11之厚度(一定的厚度才能提供所需之硬度)與雙面增層(上下兩側之第二線路層12)之設計,故該封裝基板1之厚度H難以降到0.3mm以下,因而難以符合薄化之需求。 In addition, the package substrate 1 is limited by the core layer 10a of the flexible board 10, the thickness of the rigid board 11 (a certain thickness can provide the required hardness) and the double-sided build-up (the second circuit layer 12 on the upper and lower sides) ) Design, it is difficult to reduce the thickness H of the package substrate 1 to less than 0.3 mm, and it is difficult to meet the demand for thinning.

第2A至2D圖係為習知軟硬結合型封裝基板2之第二 製法之剖面示意圖。 Figures 2A to 2D are the second of the conventional soft-hard combined packaging substrate 2 Schematic sectional view of the manufacturing method.

如第2A至2B圖所示,於一具有撓折段A之軟板20之相對兩側上分別壓合一具有穿孔210之介電層21,且該些穿孔210對應該撓折段A,使該撓折段A對應外露於該些穿孔210。接著,於該些介電層21、該穿孔210之孔壁與該撓折段A上形成如銅材之金屬層21b。 As shown in FIGS. 2A to 2B, a dielectric layer 21 having perforations 210 is pressed on opposite sides of a flexible board 20 having a flexure section A, and the perforations 210 correspond to the flexure section A. The flexures A are exposed correspondingly to the perforations 210. Next, a metal layer 21b such as a copper material is formed on the dielectric layers 21, the hole walls of the through holes 210, and the flexure A.

所述之軟板20具有一核心層20a、設於該核心層20a相對兩側之第一線路層20b、形成於該撓折段A上之覆蓋膠層20c、及遮蓋該覆蓋膠層20c之覆蓋保護膜20d。例如,以銅箔基板(CCL)製作該核心層20a與該第一線路層20b。 The flexible board 20 has a core layer 20a, first circuit layers 20b provided on opposite sides of the core layer 20a, a cover rubber layer 20c formed on the flexure A, and a cover rubber layer 20c that covers the cover rubber layer 20c. Cover the protective film 20d. For example, the core layer 20a and the first circuit layer 20b are fabricated by using a copper foil substrate (CCL).

所述之介電層21係為預浸材(prepreg,簡稱PP),並以機械鑽孔方式貫穿該介電層21而形成該穿孔210,且該介電層21結合該軟板20之核心層20a、第一線路層20b與部分覆蓋保護膜20d。 The dielectric layer 21 is a prepreg (PP), and the through hole 210 is formed through the dielectric layer 21 by mechanical drilling. The dielectric layer 21 is combined with the core of the flexible board 20. The layer 20a, the first wiring layer 20b, and a partial covering protective film 20d.

如第2C圖所示,以機械鑽孔或雷射燒灼方式貫穿該軟板20、該介電層21與該金屬層21b,以形成複數通孔200。 As shown in FIG. 2C, the soft board 20, the dielectric layer 21 and the metal layer 21 b are penetrated through mechanical drilling or laser cauterization to form a plurality of through holes 200.

如第2D圖所示,藉由該金屬層21b電鍍導電材22a於該金屬層21b上及該些通孔200之孔壁上,再經圖案化蝕刻該金屬層21b與該導電材22a,以於該介電層21上形成第二線路層22,且於該些通孔200中形成中空型導電通孔23,以令該導電通孔23電性連接該第一線路層20b之電性接觸墊201與該第二線路層22。之後,於該介電層21與該第二線路層22上及於該導電通孔23中形成外露部分 該第二線路層22之防焊層24(如油墨或綠漆),但該防焊層24未形成於該穿孔210中。 As shown in FIG. 2D, the metal layer 21b is plated with a conductive material 22a on the metal layer 21b and the hole walls of the through holes 200, and then the metal layer 21b and the conductive material 22a are patterned and etched to A second circuit layer 22 is formed on the dielectric layer 21, and a hollow conductive via 23 is formed in the through holes 200, so that the conductive via 23 is electrically connected to the electrical contact of the first circuit layer 20b. The pad 201 and the second circuit layer 22. Thereafter, exposed portions are formed on the dielectric layer 21 and the second circuit layer 22 and in the conductive vias 23. The solder resist layer 24 (such as ink or green paint) of the second circuit layer 22, but the solder resist layer 24 is not formed in the through hole 210.

因此,習知軟硬結合型封裝基板2係藉由該撓折段A與該穿孔210之設計以進行撓曲動作。 Therefore, the conventional flexible and rigid combined package substrate 2 is designed to perform a flexing action by the design of the bending section A and the perforation 210.

惟,習知軟硬結合型封裝基板2中,因該軟板20之層間尺寸變異較大,且於壓合製程中,需以高溫高壓結合不同材料的介電層21,導致該封裝基板2容易產生不規則變形,且該軟板20與該介電層21的層間對位精度不佳(約+/-100um),故需增加該軟板20之電性接觸墊201的面積,以避免孔位偏移而使該導電通孔23無法連接該電性接觸墊201,但也因此減少該第一線路層20b之其它功能線路之佈線面積,導致需增大該軟板20之寬度或減少該軟板20之線路功能。然而,若不增加該電性接觸墊201之面積,則需增加該電性接觸墊201與其周圍線路之間的距離t,以避免因孔位偏移而錯接所導致之電路短路之問題,但也因此無法符合細間距的需求。 However, in the conventional flexible and rigid combined packaging substrate 2, the flexible substrate 20 has a large variation in the interlayer dimensions, and in the lamination process, the dielectric layers 21 of different materials need to be combined at high temperature and pressure, resulting in the package substrate 2 Irregular deformation is easy to occur, and the interlayer alignment accuracy of the flexible board 20 and the dielectric layer 21 is not good (about +/- 100um), so the area of the electrical contact pad 201 of the flexible board 20 needs to be increased to avoid The displacement of the hole prevents the conductive through hole 23 from being connected to the electrical contact pad 201, but also reduces the wiring area of other functional circuits of the first circuit layer 20b, resulting in the need to increase the width or decrease of the flexible board 20. The function of the flexible board 20. However, if the area of the electrical contact pad 201 is not increased, the distance t between the electrical contact pad 201 and its surrounding lines needs to be increased to avoid the problem of short circuit caused by the misalignment of the hole position. However, it cannot meet the requirements of fine pitch.

再者,因該封裝基板2之軟硬交接處同時有如預浸材(PP)之介電層21與該覆蓋保護膜20d等兩種材質,故於壓合該介電層21後,此處容易發生隆起,進而影響後續組裝貼合與撓折能力。 Furthermore, since the soft and hard interface of the package substrate 2 has two materials such as the dielectric layer 21 of the prepreg (PP) and the cover protective film 20d, after the dielectric layer 21 is laminated, here Protrusions are prone to occur, which in turn affects the ability of subsequent assembly and fitting and bending.

又,該封裝基板2受限於該軟板20之核心層20a與該覆蓋保護膜20d之厚度(一定的厚度才不會因撓曲而碎裂)、該介電層21之厚度(一定的厚度才能提供所需之硬度)及雙面增層(上下兩側之第二線路層22)之設計,故 該封裝基板2之厚度h難以降到0.25mm以下,因而難以符合薄化之需求。 In addition, the package substrate 2 is limited by the thickness of the core layer 20a of the flexible board 20 and the cover protective film 20d (a certain thickness will not be broken due to deflection), and the thickness of the dielectric layer 21 (a certain Thickness to provide the required hardness) and double-sided build-up (second circuit layer 22 on the upper and lower sides), so It is difficult to reduce the thickness h of the package substrate 2 to less than 0.25 mm, so it is difficult to meet the demand for thinning.

第3A至3E圖係為習知軟硬結合型封裝基板3之第三製法之剖面示意圖。 Figures 3A to 3E are schematic cross-sectional views of a third method of manufacturing a conventional flexible-hard-type package substrate 3;

如第3A圖所示,提供一具有開口311之硬板31,其包含一硬質基材31a及設於該硬質基材31a相對兩側上之內部線路層31c。例如,以銅箔基板(CCL)製作該硬質基材31a與該內部線路層31c,並以機械鑽孔方式貫穿該硬質基材31a而形成該開口311。 As shown in FIG. 3A, a hard board 31 having an opening 311 is provided, which includes a hard substrate 31 a and internal circuit layers 31 c provided on opposite sides of the hard substrate 31 a. For example, the hard substrate 31a and the inner circuit layer 31c are made of a copper foil substrate (CCL), and the hard substrate 31a is penetrated by mechanical drilling to form the opening 311.

如第3B圖所示,於該開口311中設置一具有撓折段A之軟板30,其具有一核心層30a、設於該核心層30a相對兩側之第一線路層30b、形成於該撓折段A上之覆蓋膠層30c、及遮蓋該覆蓋膠層30c之覆蓋保護膜30d。 As shown in FIG. 3B, a flexible board 30 having a folding section A is provided in the opening 311, which has a core layer 30a, first circuit layers 30b provided on opposite sides of the core layer 30a, and formed in the opening 311. The cover rubber layer 30c on the folding section A and the cover protective film 30d covering the cover rubber layer 30c.

如第3C圖所示,於該硬板31與該軟板30之相對兩側上分別壓合一具有穿孔310之介電層31d,且該些穿孔310對應該撓折段A,使該撓折段A對應外露於該些穿孔310。接著,於該些介電層31d、該穿孔310之孔壁與該撓折段A上形成如銅材之金屬層31b。之後,貫穿該硬板31、該介電層31d與該金屬層31b以形成複數通孔300,且貫穿該介電層31d與該金屬層31b以形成複數外露部分該第一線路層30b之盲孔301。 As shown in FIG. 3C, a dielectric layer 31d having a perforation 310 is pressed on the opposite sides of the hard plate 31 and the soft plate 30 respectively, and the perforations 310 correspond to the flexing section A to make the flexure The folded sections A are exposed from the perforations 310. Next, a metal layer 31b such as a copper material is formed on the dielectric layers 31d, the hole wall of the through hole 310, and the flexure A. Thereafter, the hard board 31, the dielectric layer 31d, and the metal layer 31b are penetrated to form a plurality of through holes 300, and the dielectric layer 31d and the metal layer 31b are penetrated to form a plurality of exposed portions of the first circuit layer 30b.孔 301。 Hole 301.

所述之介電層31d係為預浸材(prepreg,簡稱PP),且該介電層31d結合該硬板31、該軟板30之部分第一線路層30b與部分覆蓋保護膜30d。 The dielectric layer 31d is a prepreg (PP), and the dielectric layer 31d combines the hard board 31 and a part of the first circuit layer 30b of the soft board 30 and a part of the protective film 30d.

如第3D圖所示,藉由該金屬層31b電鍍導電材32a於整層該金屬層31b上、該些通孔300之孔壁上及該些盲孔300中,再經圖案化蝕刻該金屬層31b與該導電材32a,以於該介電層31d上形成第二線路層32,且於該些通孔300中形成用以電性連接該些內部線路層31c與第二線路層32之導電通孔33,並於該些盲孔301中形成用以電性連接該些第一與第二線路層30b,32之導電盲孔320。之後,於該介電層31d上形成一用以電性連接該第二線路層32之增層線路結構35,且該增層線路結構35上形成有一外露部分該增層線路結構35之防焊層34(如油墨或綠漆)。 As shown in FIG. 3D, the metal layer 31b is used to electroplat a conductive material 32a on the entire layer of the metal layer 31b, on the walls of the through holes 300, and in the blind holes 300, and then pattern-etch the metal. Layer 31b and the conductive material 32a, so as to form a second circuit layer 32 on the dielectric layer 31d, and to form in the through holes 300 electrically connecting the internal circuit layers 31c and the second circuit layer 32 A conductive via 33 is formed in the blind holes 301 to form conductive blind holes 320 for electrically connecting the first and second circuit layers 30b, 32. Thereafter, a layered circuit structure 35 for electrically connecting the second circuit layer 32 is formed on the dielectric layer 31d, and an exposed portion of the layered circuit structure 35 is formed on the layered circuit structure 35 for soldering. Layer 34 (such as ink or green paint).

如第3E圖所示,以機械切除方式移除對應該穿孔310上方之材質(即該增層線路結構35、該導電材32a與該金屬層31b),以外露該撓折段A(即外露該覆蓋保護膜30d)。 As shown in FIG. 3E, the material corresponding to the perforation 310 (that is, the layered circuit structure 35, the conductive material 32a, and the metal layer 31b) is removed by mechanical resection, and the flexure A is exposed (that is, exposed) This cover protective film 30d).

因此,習知軟硬結合型封裝基板3係藉由該撓折段A之設計以進行撓曲動作。 Therefore, the conventional flexible and rigid package substrate 3 is designed to perform a flexing operation by the design of the flexure section A.

惟,習知軟硬結合型封裝基板3中,因該第二線路層32使用減層法製作(即經由蝕刻該金屬層31b與該導電材32a),故受限於線路製程之能力,該第二線路層32之線寬/線距(L/S)僅能呈現大於或等於40/40um,並無法小於40/40um。 However, in the conventional soft-hard combined packaging substrate 3, because the second circuit layer 32 is manufactured by a subtractive method (that is, by etching the metal layer 31b and the conductive material 32a), it is limited by the ability of the circuit process. The line width / space (L / S) of the second circuit layer 32 can only be greater than or equal to 40 / 40um, and cannot be less than 40 / 40um.

再者,因該封裝基板3之軟硬交接處同時有介電層31d與該覆蓋保護膜30d等兩種材質,故於壓合該介電層31d後,此處容易發生該軟板30之邊緣突起、PP溢膠等問題,進而影響後續組裝貼合與撓折能力。 Furthermore, since the soft-hard interface of the package substrate 3 has two materials such as a dielectric layer 31d and the cover protective film 30d, after the dielectric layer 31d is laminated, the soft board 30 easily occurs here. Issues such as edge protrusions and PP overflow glue affect the ability of subsequent assembly and fitting and bending.

又,由於該硬板31之厚度需配合該軟板30之厚度(該軟板30需具有一定的厚度,才不會因撓曲而碎裂),故該封裝基板3之厚度L難以降到0.25mm以下,因而難以符合薄化之需求。 In addition, since the thickness of the hard board 31 needs to match the thickness of the soft board 30 (the soft board 30 must have a certain thickness so as not to be broken due to deflection), it is difficult to reduce the thickness L of the package substrate 3 to Below 0.25mm, it is difficult to meet the demand for thinning.

第4圖係為習知軟硬結合型封裝基板4之第四製法之剖面示意圖。 FIG. 4 is a schematic cross-sectional view of a fourth manufacturing method of a conventional soft-hard combined packaging substrate 4.

如第4圖所示,於一核心板9之相對兩側上壓合具有撓折段A之線路板40,其具有線路層40b、軟質部40c及第一介電層40d,且該線路層40b壓合於該核心板9上,並使該第一介電層40d具有對應該撓折段A之開口400,以令該軟質部40c外露於該開口400。接著,依需求壓合一具有穿孔410之第二介電層41及保護膜90。 As shown in FIG. 4, a circuit board 40 having a bent section A is laminated on opposite sides of a core board 9, which has a circuit layer 40 b, a soft portion 40 c, and a first dielectric layer 40 d. 40b is pressed onto the core board 9 and the first dielectric layer 40d has an opening 400 corresponding to the flexing section A, so that the soft portion 40c is exposed from the opening 400. Then, a second dielectric layer 41 with a through hole 410 and a protective film 90 are laminated according to requirements.

因此,習知軟硬結合型封裝基板4係藉由該開口400、穿孔410與撓折段A之設計以進行撓曲動作,且該線路層40b不受限減層法之線路製作能力。 Therefore, the conventional soft-hard combined package substrate 4 uses the design of the opening 400, the perforation 410, and the bending section A to perform a flexing action, and the circuit layer 40b is not limited to the circuit making ability of the subtraction method.

惟,習知軟硬結合型封裝基板4中,因該封裝基板4之軟硬交接處同時有軟質部40c及第一介電層40d等兩種材質,故於壓合該第二介電層41後,此處容易因應力分佈不均而發生該開口400(或該穿孔410)之角落邊緣突起的問題,進而影響後續組裝貼合與撓折能力。 However, in the conventional soft-hard combined packaging substrate 4, since the soft-hard interface of the packaging substrate 4 has two materials such as a soft portion 40c and a first dielectric layer 40d, the second dielectric layer is laminated. After 41, the problem that the corner edges of the opening 400 (or the perforation 410) protrude easily occurs due to uneven stress distribution, which further affects the subsequent assembly and fitting and bending capabilities.

再者,該封裝基板4需設有該核心板9,使其厚度能夠縮減之幅度有限,因而不利於薄化需求。 Furthermore, the package substrate 4 needs to be provided with the core plate 9 so that the thickness can be reduced to a limited extent, which is not conducive to thinning requirements.

因此,如何克服習知技術中之種種問題,實已成目前亟欲解決的課題。 Therefore, how to overcome the various problems in the conventional technology has become an urgent problem to be solved.

鑑於上述習知技術之缺失,本發明提供一種可撓式基板,係包括:基板本體,係為無核心形式,並具有撓折段及至少一介電層,且形成該介電層之材料係為鑄模化合物或底層塗料;以及增設件,係形成於該基板本體上,且具有穿孔,以令該撓折段外露於該穿孔。 In view of the lack of the above-mentioned conventional technology, the present invention provides a flexible substrate, including: a substrate body, which is a coreless form, has a flexure section and at least one dielectric layer, and a material system forming the dielectric layer Is a mold compound or a primer; and an additional part is formed on the substrate body and has a perforation so that the flexure section is exposed through the perforation.

本發明復提供一種可撓式基板之製法,係包括:提供一基板本體,其中,該基板本體係為無核心形式且具有撓折段,並包含至少一介電層,且形成該介電層之材料係為鑄模化合物或底層塗料;於該基板本體上形成增設件,其中,該增設件係包含絕緣層、嵌埋於該絕緣層中之導電柱及貫通該絕緣層之擋塊;以及移除該擋塊,使該增設件形成有穿孔,以供該撓折段外露於該穿孔。 The invention further provides a method for manufacturing a flexible substrate, which includes: providing a substrate body, wherein the substrate system is a coreless form and has a flexure section, and includes at least one dielectric layer, and the dielectric layer is formed. The material is a mold compound or a primer; an add-on is formed on the substrate body, wherein the add-on includes an insulating layer, a conductive pillar embedded in the insulating layer, and a stopper penetrating the insulating layer; and Except for the stopper, a perforation is formed on the additional part so that the flexure section is exposed through the perforation.

前述之可撓式基板及製法中,該增設件係包含絕緣層及嵌埋於該絕緣層中之導電柱。例如,形成該絕緣層之材質係為介電材料,其係為鑄模化合物或底層塗料。 In the aforementioned flexible substrate and manufacturing method, the additional component includes an insulating layer and a conductive pillar embedded in the insulating layer. For example, the material forming the insulating layer is a dielectric material, which is a mold compound or a primer.

本發明亦提供一種可撓式基板之製法,係包括:於一承載板上形成基板本體,其中,該基板本體係為無核心形式,並具有撓折段及至少一介電層,且形成該介電層之材料係為鑄模化合物或底層塗料;以及移除該承載板之部分材質,以形成貫通該承載板之穿孔而令該具有穿孔之承載板作為增設件,並供該撓折段外露於該穿孔。 The invention also provides a method for manufacturing a flexible substrate, which comprises: forming a substrate body on a carrier board, wherein the substrate is a coreless system, and has a flexure section and at least one dielectric layer, and forms the substrate. The material of the dielectric layer is a molding compound or a primer; and a part of the material of the carrier plate is removed to form a perforation penetrating the carrier plate and the carrier plate with the perforation is used as an additional part, and the flexure is exposed In the perforation.

前述之可撓式基板及製法中,該增設件係為金屬板材。 In the aforementioned flexible substrate and manufacturing method, the additional component is a metal plate.

前述之可撓式基板及兩種製法中,該基板本體更包含結合該介電層之線路結構。 In the aforementioned flexible substrate and the two manufacturing methods, the substrate body further includes a circuit structure combined with the dielectric layer.

由上可知,本發明之可撓式基板及兩種製法中,係採用不同於習知技術的增層材料與產品結構,以大幅提高軟硬結合板結構的電路密度與降低整體基板之厚度,特別適用於需薄型化與電路複雜化(或多功能)的高階行動裝置產品。 It can be known from the above that in the flexible substrate and the two manufacturing methods of the present invention, a layering material and a product structure different from the conventional technology are used to greatly increase the circuit density of the rigid-flex board structure and reduce the overall substrate thickness. It is especially suitable for high-end mobile device products that require thinning and circuit complexity (or multi-function).

1,2,3,4‧‧‧封裝基板 1,2,3,4‧‧‧package substrate

10,20,30‧‧‧軟板 10,20,30‧‧‧Flexible board

10a,20a,30a‧‧‧核心層 10a, 20a, 30a‧‧‧Core layer

10b,20b,30b‧‧‧第一線路層 10b, 20b, 30b ‧‧‧ first circuit layer

10c,20c,30c‧‧‧覆蓋膠層 10c, 20c, 30c‧‧‧ Overlay

10d,20d,30d‧‧‧覆蓋保護膜 10d, 20d, 30d ‧‧‧ Cover protective film

100,200,300‧‧‧通孔 100,200,300‧‧‧through holes

101,201‧‧‧電性接觸墊 101,201‧‧‧electric contact pad

11,31‧‧‧硬板 11,31‧‧‧hard board

11a,31a‧‧‧硬質基材 11a, 31a‧‧‧hard substrate

11b,21b,31b‧‧‧金屬層 11b, 21b, 31b‧‧‧ metal layer

11c‧‧‧純膠材 11c‧‧‧Pure rubber

110,210,310,410,640,700‧‧‧穿孔 110,210,310,410,640,700‧‧‧‧perforation

12,22,32‧‧‧第二線路層 12,22,32‧‧‧Second circuit layer

12a,22a,32a‧‧‧導電材 12a, 22a, 32a‧‧‧ conductive material

13,23,33‧‧‧導電通孔 13,23,33‧‧‧Conductive vias

14,24,34‧‧‧防焊層 14,24,34‧‧‧Solder mask

21,31d,550‧‧‧介電層 21,31d, 550‧‧‧Dielectric layer

301‧‧‧盲孔 301‧‧‧ blind hole

31c‧‧‧內部線路層 31c‧‧‧Internal circuit layer

311,400‧‧‧開口 311,400‧‧‧ opening

320‧‧‧導電盲孔 320‧‧‧ conductive blind hole

35‧‧‧增層線路結構 35‧‧‧Additional line structure

40‧‧‧線路板 40‧‧‧Circuit board

40b,551‧‧‧線路層 40b, 551‧‧‧line layer

40c‧‧‧軟質部 40c‧‧‧Soft Department

40d‧‧‧第一介電層 40d‧‧‧First dielectric layer

41‧‧‧第二介電層 41‧‧‧Second dielectric layer

5,6,7‧‧‧可撓式基板 5,6,7‧‧‧Flexible substrate

5a,5b,60,70‧‧‧增設件 5a, 5b, 60,70‧‧‧Additions

50‧‧‧承載板 50‧‧‧carrying plate

51‧‧‧第一導電柱 51‧‧‧The first conductive post

52‧‧‧第二導電柱 52‧‧‧Second conductive post

53‧‧‧第一絕緣層 53‧‧‧First insulation layer

530‧‧‧第一穿孔 530‧‧‧first perforation

54‧‧‧第二絕緣層 54‧‧‧Second insulation layer

540‧‧‧第二穿孔 540‧‧‧second perforation

55‧‧‧基板本體 55‧‧‧ substrate body

552‧‧‧導電體 552‧‧‧conductor

56‧‧‧表面處理層 56‧‧‧Surface treatment layer

59a,59b,69‧‧‧擋塊 59a, 59b, 69‧‧‧ stop

62‧‧‧導電柱 62‧‧‧ conductive post

64‧‧‧絕緣層 64‧‧‧ Insulation

651‧‧‧電磁屏蔽層 651‧‧‧Electromagnetic shielding layer

77‧‧‧絕緣保護層 77‧‧‧Insulation protective layer

770‧‧‧開口區 770‧‧‧opening area

771‧‧‧開孔 771‧‧‧ opening

9‧‧‧核心板 9‧‧‧Core board

90‧‧‧保護膜 90‧‧‧ protective film

A,F‧‧‧撓折段 A, F‧‧‧Folding section

H,h,L,D,d,R‧‧‧厚度 H, h, L, D, d, R‧‧‧thickness

e‧‧‧距離 e‧‧‧distance

t‧‧‧溢膠 t‧‧‧ overflow glue

第1A至1D圖係為習知軟硬結合型封裝基板之第一製法之剖面示意圖;第2A至2D圖係為習知軟硬結合型封裝基板之第二製法之剖面示意圖;第3A至3E圖係為習知軟硬結合型封裝基板之第三製法之剖面示意圖;第4圖係為習知軟硬結合型封裝基板之第四製法之剖面示意圖;第5A至5F圖係為本發明之可撓式基板之製法之第一實施例的剖視示意圖;第6A至6C圖係為本發明之可撓式基板之製法之第二實施例的剖視示意圖;以及第7A至7B圖係為本發明之可撓式基板之製法之第三實施例的剖視示意圖。 Figures 1A to 1D are schematic cross-sectional views of the first manufacturing method of the conventional soft-hard combined packaging substrate; Figures 2A to 2D are schematic cross-sectional views of the second manufacturing method of the conventional flexible-hard combined packaging substrate; 3A to 3E The figure is a schematic cross-sectional view of the third manufacturing method of the conventional soft-hard combined packaging substrate. The fourth figure is the cross-sectional schematic view of the fourth manufacturing method of the conventional soft-hard combined packaging substrate. The 5A to 5F are the drawings of the present invention. A schematic cross-sectional view of the first embodiment of the flexible substrate manufacturing method; Figures 6A to 6C are schematic cross-sectional views of the second embodiment of the flexible substrate manufacturing method of the present invention; and Figures 7A to 7B are A schematic cross-sectional view of a third embodiment of a method for manufacturing a flexible substrate according to the present invention.

以下藉由特定的具體實施例說明本發明之實施方 式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The following describes the embodiment of the present invention by using specific embodiments. Formula, those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如“上”、“下”、“第一”、“第二”及“一”等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It should be noted that the structures, proportions, sizes, etc. shown in the drawings in this specification are only used to match the content disclosed in the specification for the understanding and reading of those skilled in the art, and are not intended to limit the implementation of the present invention. The limited conditions are not technically significant. Any modification of the structure, change of the proportional relationship, or adjustment of the size should still fall within the scope of this invention without affecting the effects and goals that can be achieved by the present invention. The technical content disclosed by the invention can be covered. At the same time, the terms such as "upper", "lower", "first", "second", and "one" cited in this specification are only for the convenience of description, and are not intended to limit the present invention. The scope of implementation, the change or adjustment of its relative relationship, without substantial changes in the technical content, should also be regarded as the scope of the present invention.

第5A至5F圖係為本發明之可撓式基板5之製法之第一實施例的剖視示意圖。 5A to 5F are schematic sectional views of the first embodiment of the method for manufacturing the flexible substrate 5 according to the present invention.

如第5A圖所示,藉由圖案化製程形成複數第一導電柱51與擋塊59a於一承載板50上。 As shown in FIG. 5A, a plurality of first conductive pillars 51 and stoppers 59 a are formed on a carrier plate 50 by a patterning process.

於本實施例中,該承載板50係為金屬基材、半導體基材或絕緣基材,並無特別限制。 In this embodiment, the carrier plate 50 is a metal substrate, a semiconductor substrate, or an insulating substrate, and is not particularly limited.

再者,該第一導電柱51與該擋塊59a係為金屬材,如銅材,且兩者之材質可相同或不相同。 Furthermore, the first conductive pillar 51 and the stopper 59a are made of a metal material, such as a copper material, and the materials of the two may be the same or different.

如第5B圖所示,形成一第一絕緣層53於該承載板50上以包覆該些第一導電柱51與擋塊59a,且該些第一導電柱51之表面與該擋塊59a之表面係齊平於該第一絕緣層 53之表面,使該些第一導電柱51與該擋塊59a外露於該第一絕緣層53,且該擋塊59a貫通該第一絕緣層53。 As shown in FIG. 5B, a first insulating layer 53 is formed on the carrier plate 50 to cover the first conductive pillars 51 and the stoppers 59 a, and the surfaces of the first conductive pillars 51 and the stoppers 59 a are formed. The surface is flush with the first insulating layer On the surface of 53, the first conductive pillars 51 and the stopper 59 a are exposed to the first insulating layer 53, and the stopper 59 a penetrates the first insulating layer 53.

於本實施例中,該第一絕緣層53係作為硬質部,其以鑄模方式、塗佈方式或壓合方式形成於該承載板50上,且形成該第一絕緣層53之材質係為介電材料,其可為環氧樹脂(Epoxy),且該環氧樹脂更包含鑄模化合物(Molding Compound)或底層塗料(Primer),如環氧模壓樹脂(Epoxy Molding Compound,簡稱EMC),其中,該環氧模壓樹脂係含有充填物(filler),且該充填物之含量為70至90wt%。 In this embodiment, the first insulating layer 53 is used as a hard part, which is formed on the carrier plate 50 by a casting method, a coating method, or a compression bonding method, and the material forming the first insulating layer 53 is used as an intermediary. The electrical material may be epoxy resin, and the epoxy resin further includes a molding compound or a primer such as an epoxy molding resin (EMC), wherein, the The epoxy molding resin contains a filler, and the content of the filler is 70 to 90% by weight.

如第5C圖所示,形成一基板本體55於該第一絕緣層53上,且該基板本體55電性連接該些第一導電柱51。 As shown in FIG. 5C, a substrate body 55 is formed on the first insulating layer 53, and the substrate body 55 is electrically connected to the first conductive pillars 51.

於本實施例中,該基板本體55係為無核心(coreless)形式,其可採用線路增層製程方式製作,故該基板本體55包含至少一以塗佈方式製作之介電層550、結合該介電層550之線路層551、及複數設於該介電層550中並電性連接該線路層551之盲孔型導電體552。 In this embodiment, the substrate body 55 is a coreless form, which can be manufactured by a circuit layer-adding process. Therefore, the substrate body 55 includes at least one dielectric layer 550 made by coating, and combined with the A circuit layer 551 of the dielectric layer 550 and a plurality of blind hole-type conductors 552 disposed in the dielectric layer 550 and electrically connected to the circuit layer 551.

再者,於其它實施例中,該基板本體55亦可採用鑄模製程方式製作,例如,先形成一線路層551於該第一絕緣層53上,再形成導電柱於該線路層551上,之後以鑄模方式形成該介電層550以包覆該線路層551與該導電柱,使該導電柱作為該導電體552,且可依上述步驟增加層數。 Furthermore, in other embodiments, the substrate body 55 may also be manufactured by a casting process. For example, a circuit layer 551 is formed on the first insulating layer 53 first, and then a conductive pillar is formed on the circuit layer 551. The dielectric layer 550 is formed by a mold to cover the circuit layer 551 and the conductive pillar, and the conductive pillar is used as the conductive body 552, and the number of layers can be increased according to the above steps.

又,該介電層550係為軟質部,但該介電層550之材質與該第一絕緣層53之材質可相同或不相同,例如,該介電層550可為環氧樹脂之其中一種類型,而該第一絕緣層 53可為環氧樹脂之另一種類型或同類型。 In addition, the dielectric layer 550 is a soft part, but the material of the dielectric layer 550 and the material of the first insulating layer 53 may be the same or different. For example, the dielectric layer 550 may be one of epoxy resins Type and the first insulating layer 53 may be another type or the same type of epoxy resin.

如第5D圖所示,形成複數第二導電柱52與擋塊59b於該基板本體55上,且形成一第二絕緣層54於該基板本體55上以包覆該些第二導電柱52與擋塊59b,且該些第二導電柱52之表面與該擋塊59b之表面係齊平於該第二絕緣層54之表面,使該些第二導電柱52與該擋塊59b外露於該第二絕緣層54,且該擋塊59b貫通該第二絕緣層54。 As shown in FIG. 5D, a plurality of second conductive pillars 52 and stoppers 59b are formed on the substrate body 55, and a second insulating layer 54 is formed on the substrate body 55 to cover the second conductive pillars 52 and The stoppers 59b, and the surfaces of the second conductive posts 52 and the surface of the stoppers 59b are flush with the surface of the second insulating layer 54 so that the second conductive posts 52 and the stoppers 59b are exposed outside the The second insulating layer 54, and the stopper 59 b penetrates the second insulating layer 54.

於本實施例中,該第二導電柱52與該擋塊59b係為金屬材,如銅材,且兩者之材質可相同或不相同。 In this embodiment, the second conductive pillar 52 and the stopper 59b are made of a metal material, such as a copper material, and the materials of the two may be the same or different.

再者,該第二絕緣層54係作為硬質部,其以鑄模方式、塗佈方式或壓合方式形成者,且形成該第二絕緣層54之材質係為介電材料,其可為環氧樹脂,且該環氧樹脂更包括鑄模化合物或底層塗料,如環氧模壓樹脂,其中,該環氧模壓樹脂係含有充填物,其中,該充填物之含量為70~90wt%。 In addition, the second insulating layer 54 is a hard part, which is formed by a casting method, a coating method, or a compression bonding method, and the material forming the second insulating layer 54 is a dielectric material, which may be epoxy. Resin, and the epoxy resin further includes a molding compound or a primer, such as an epoxy molding resin, wherein the epoxy molding resin contains a filler, wherein the content of the filler is 70-90 wt%.

另外,該第二絕緣層54之材質與該第一絕緣層53之材質可相同或不相同,且該第二絕緣層54之材質與該介電層550之材質可相同或不相同。 In addition, the material of the second insulating layer 54 and the material of the first insulating layer 53 may be the same or different, and the material of the second insulating layer 54 and the material of the dielectric layer 550 may be the same or different.

如第5E及5F圖所示,以剝離方式移除該承載板50,再以蝕刻方式移除該些擋塊59a,59b,以於該第一絕緣層53上形成第一穿孔530,且於該第二絕緣層54上形成第二穿孔540,使該基板本體55外露於該第一與第二穿孔530,540,以作為撓折段F,且該些第一導電柱51與該第一絕緣層53可視為一增設件5a,而該些第二導電柱52與該 第二絕緣層54可視為另一增設件5b。 As shown in FIGS. 5E and 5F, the carrier plate 50 is removed by peeling, and the stoppers 59a, 59b are removed by etching to form a first through hole 530 on the first insulating layer 53, and A second through-hole 540 is formed on the second insulating layer 54 so that the substrate body 55 is exposed from the first and second through-holes 530 and 540 to serve as a bending section F, and the first conductive pillars 51 and the first insulating layer 53 can be regarded as an additional member 5a, and the second conductive pillars 52 and the The second insulating layer 54 can be regarded as another additional member 5b.

於本實施例中,當移除該擋塊59a時,可依需求一併移除該基板本體55之部分材質,使該第一穿孔530延伸至該基板本體55中。同理地,該第二穿孔540亦可依需求延伸至該基板本體55中。 In this embodiment, when the stopper 59 a is removed, a part of the material of the substrate body 55 may be removed together as required, so that the first through hole 530 extends into the substrate body 55. Similarly, the second through hole 540 can also be extended into the substrate body 55 as required.

再者,於後續製程中,該增設件5a,5b可依需求於該第一與第二導電柱51,52上形成表面處理層56。 Furthermore, in subsequent processes, the additional parts 5a, 5b can form a surface treatment layer 56 on the first and second conductive pillars 51, 52 as required.

因此,本發明之可撓式基板5係直接於該第一絕緣層53上製作該基板本體55(即塗佈該介電層550),以取代習知壓合或貼合增層材,故本發明之軟硬交接處為介電材直接結合(例如,兩層環氧樹脂直接結合),因而可完全消除習知軟硬結合板在軟硬交接區所產生之缺點,亦即本發明之軟硬交接區沒有如習知技術之溢膠、缺膠、突起等問題,且可將層間對位精度提高至+/-25um(習知軟硬結合板的層間對位精度為+/-100um)。 Therefore, the flexible substrate 5 of the present invention is to fabricate the substrate body 55 directly on the first insulating layer 53 (that is, to coat the dielectric layer 550) to replace the conventional laminating or laminating layers, so The soft-hard interface of the present invention is a direct combination of dielectric materials (for example, two layers of epoxy resin are directly bonded), so the disadvantages of the conventional soft-hard board in the soft-hard interface can be completely eliminated. The soft-hard interface does not have problems such as overflow, lack of glue, protrusions, etc., as in the conventional technology, and can improve the inter-layer alignment accuracy to +/- 25um (the inter-layer alignment accuracy of the conventional soft-hard bonded board is +/- 100um ).

再者,該基板本體55係為無核心形式,故可大幅降低該可撓式基板5之總厚度,例如,四層板形式之厚度D可小於0.2mm,如0.16mm,其小於習知技術之四層板形式之厚度(約0.25mm)。 In addition, the substrate body 55 is a coreless form, so the total thickness of the flexible substrate 5 can be greatly reduced. For example, the thickness D of the four-layer board form can be less than 0.2mm, such as 0.16mm, which is less than the conventional technology. The thickness of the four-layer board (about 0.25mm).

又,該基板本體55因其線路層551使用半加成法製作(即直接電鍍出該線路層551)而無需蝕刻金屬材,故該線路層551之邊緣呈平直狀,而無蝕刻製程所產生的殘足問題,因而利於阻抗控制,且該線路層551之線寬/線距可降至20/20um(習知減層法所製作之線路之線寬/線距最小 為40/40um)。 In addition, the substrate body 55 is fabricated by using a semi-additive method for the circuit layer 551 (that is, the circuit layer 551 is directly plated) without etching a metal material. Therefore, the edge of the circuit layer 551 is straight, and there is no etching process. The residual problem caused by it is conducive to impedance control, and the line width / space of the line layer 551 can be reduced to 20 / 20um (the line width / space of the line produced by the conventional layer reduction method is the smallest 40 / 40um).

另外,本發明之連結位置(即該撓折段F)係以影像轉移方式配合圖案化電鍍厚銅(該些擋塊59a,59b)及蝕刻移除厚銅(該些擋塊59a,59b)等方式製作,故該撓折段F之形狀、尺寸與精度不受習知機械加工之限制,因而可提高機構設計之自由度(例如,可同時製作多組任意形狀之撓折段F),且因該些擋塊59a,59b可與該第一與第二導電柱51,52一起製作而能減少加工成本。 In addition, the connection position of the present invention (that is, the flexure section F) is matched with the patterned plated thick copper (the blocks 59a, 59b) and the etching to remove the thick copper (the blocks 59a, 59b) by image transfer. The shape, size, and accuracy of the flexure section F are not limited by conventional machining, so the freedom of mechanism design can be improved (for example, multiple sets of flexure sections F of any shape can be made simultaneously), And because the stoppers 59a, 59b can be made with the first and second conductive pillars 51, 52, the processing cost can be reduced.

此外,本發明之可撓式基板5之最外側(即硬板區之外層)接觸墊係製作成銅柱形式(即該第一與第二導電柱51,52),並藉由介電材(該第一與第二絕緣層53,54)取代習知防焊層,故本發明能強化接觸墊(該第一與第二導電柱51,52)與介電材(該第一與第二絕緣層53,54)之間的結合力,並提高後續打線製程之打線強度,因而可提高產品可靠度與封裝能力。 In addition, the outermost (that is, the outer layer of the hard board region) contact pads of the flexible substrate 5 of the present invention are made in the form of copper pillars (that is, the first and second conductive pillars 51 and 52), and are made of a dielectric material. (The first and second insulating layers 53, 54) replace the conventional solder resist layer, so the present invention can strengthen the contact pad (the first and second conductive posts 51, 52) and the dielectric material (the first and second The bonding force between the two insulating layers 53 and 54) and the bonding strength of the subsequent bonding process can be improved, thereby improving the reliability and packaging ability of the product.

第6A至6C圖係為本發明之可撓式基板6之製法之第二實施例的剖視示意圖。本實施例與第一實施例之差異在於穿孔之數量,其它製程大致相同,故以下僅說明相異處,而不再贅述相同處。 6A to 6C are schematic sectional views of a second embodiment of a method for manufacturing a flexible substrate 6 according to the present invention. The difference between this embodiment and the first embodiment lies in the number of perforations, and other processes are substantially the same, so only the differences will be described below, and the same points will not be described again.

如第6A圖所示,形成該基板本體55於該承載板50上,且該些介電層550係作為軟質部,並以塗佈方式將該介電層550形成於該承載板50上。 As shown in FIG. 6A, the substrate body 55 is formed on the carrier plate 50, and the dielectric layers 550 are used as soft portions, and the dielectric layer 550 is formed on the carrier plate 50 by a coating method.

如第6B圖所示,形成複數導電柱62與擋塊69於該基板本體55上,且形成一絕緣層64於該基板本體55上以包 覆該些導電柱62與擋塊69,且該些導電柱62之表面與該擋塊69之表面係齊平於該絕緣層64之表面,使該些導電柱62與該擋塊69外露於該絕緣層64。 As shown in FIG. 6B, a plurality of conductive pillars 62 and stoppers 69 are formed on the substrate body 55, and an insulating layer 64 is formed on the substrate body 55 to cover the substrate body 55. The conductive posts 62 and the stoppers 69 are covered, and the surfaces of the conductive posts 62 and the stoppers 69 are flush with the surface of the insulating layer 64, so that the conductive posts 62 and the stoppers 69 are exposed on the The insulation layer 64.

於本實施例中,該導電柱62與該擋塊69係為金屬材,如銅材,且兩者之材質可相同或不相同。 In this embodiment, the conductive pillar 62 and the stopper 69 are metal materials, such as copper, and the materials of the two can be the same or different.

再者,該絕緣層64係作為硬質部,其以鑄模方式、塗佈方式或壓合方式形成者,且形成該絕緣層64之材質係為介電材料,其可為環氧樹脂,且該環氧樹脂更包括鑄模化合物或底層塗料,如環氧模壓樹脂,其中,該環氧模壓樹脂係含有充填物,其中,該充填物之含量為70~90wt%。 Moreover, the insulating layer 64 is a hard part, which is formed by a casting method, a coating method, or a compression bonding method, and the material forming the insulating layer 64 is a dielectric material, which may be an epoxy resin, and the The epoxy resin further includes a molding compound or a primer, such as an epoxy molding resin, wherein the epoxy molding resin contains a filler, wherein the content of the filler is 70 to 90 wt%.

又,該介電層550之材質與該絕緣層64之材質可相同或不相同,例如,該介電層550可為環氧樹脂(Epoxy)之其中一種類型,而該絕緣層64可為環氧樹脂(Epoxy)之另一種類型或同類型。 In addition, the material of the dielectric layer 550 may be the same as or different from that of the insulating layer 64. For example, the dielectric layer 550 may be one of the types of epoxy, and the insulating layer 64 may be a ring. Another type or the same type of epoxy resin.

如第6C圖所示,蝕刻移除該擋塊69,以於該絕緣層64上形成穿孔640,使該基板本體55外露於該穿孔640,以令該基板本體55外露於該穿孔640之部分作為撓折段F。之後,移除該承載板50,且該些導電柱62與該絕緣層64可視為增設件60。 As shown in FIG. 6C, the stopper 69 is removed by etching to form a through hole 640 on the insulating layer 64, so that the substrate body 55 is exposed from the through hole 640, so that the substrate body 55 is exposed from a portion of the through hole 640. As the flexure section F. After that, the carrier plate 50 is removed, and the conductive pillars 62 and the insulating layer 64 can be regarded as an additional component 60.

於本實施例中,當蝕刻移除該擋塊69時,會一併移除部分該導電柱62之外露材質,使該導電柱62之端面高度低於該絕緣層64之表面,且可依需求一併移除該基板本體55之部分金屬材質,以增加該穿孔640之深度。 In this embodiment, when the stopper 69 is removed by etching, a part of the exposed material of the conductive pillar 62 is also removed, so that the height of the end surface of the conductive pillar 62 is lower than the surface of the insulating layer 64, and can be adjusted according to It is required to remove a part of the metal material of the substrate body 55 to increase the depth of the through hole 640.

再者,當移除該承載板50時,可保留軟板部(該基板 本體55)於外露側之電鍍銅層(部分該線路層551),以作為電磁屏蔽層651,而無須額外貼覆銀膠導電膜作為電磁屏蔽。 Furthermore, when the carrier plate 50 is removed, the flexible plate portion (the substrate The main body 55) is an electroplated copper layer (part of the circuit layer 551) on the exposed side to serve as the electromagnetic shielding layer 651, and it is not necessary to additionally coat a silver adhesive conductive film as the electromagnetic shielding.

又,於後續製程中,可依需求形成表面處理層(圖略)於該些導電柱62上。 In the subsequent processes, a surface treatment layer (not shown) may be formed on the conductive pillars 62 according to requirements.

因此,本發明之可撓式基板6係於該承載板50的單一側上直接製作該基板本體55,使軟板部(該介電層550)或硬板部(該絕緣層64)之層數可任意選擇,而不受如習知技術之核心層兩側設計之對稱式增層限制。 Therefore, in the flexible substrate 6 of the present invention, the substrate body 55 is directly fabricated on a single side of the carrier board 50, so that a layer of a soft plate portion (the dielectric layer 550) or a hard plate portion (the insulating layer 64) is formed. The number can be arbitrarily selected, and is not limited by the symmetrical build-up of the core layer design on both sides of the conventional technology.

再者,本發明之可撓式基板6僅於該基板本體55之單一側具有軟硬交接處,且該處係為兩層環氧樹脂(該介電層550與該絕緣層64)直接結合,因而可完全消除習知軟硬結合板在軟硬交接區所產生之缺點,亦即本發明之軟硬交接區沒有如習知技術之溢膠、缺膠、突起等問題,且可減少撓折變異。 Furthermore, the flexible substrate 6 of the present invention has a soft-hard junction only on one side of the substrate body 55, and the place is a direct combination of two layers of epoxy resin (the dielectric layer 550 and the insulating layer 64). Therefore, the shortcomings of the conventional soft-hard combination board in the soft-hard interface can be completely eliminated, that is, the soft-hard interface of the present invention does not have problems such as overflow, lack of glue, protrusions and the like of the conventional technology, and can reduce the flexibility. Fold variation.

又,該基板本體55係為無核心形式,故可大幅降低該可撓式基板6之總厚度,例如,四層板形式之厚度d可小於0.2mm,其遠小於習知四層板形式之厚度。 In addition, the substrate body 55 is a coreless form, so the total thickness of the flexible substrate 6 can be greatly reduced. For example, the thickness d of the four-layer board form can be less than 0.2 mm, which is much smaller than that of the conventional four-layer board form. thickness.

另外,本發明之可撓式基板6之最外側(即硬板區之外層)接觸墊係製作成銅柱形式(即該導電柱62),並藉由介電材(該絕緣層64)取代習知防焊層,故本發明能強化接觸墊(該導電柱62)與介電材(該絕緣層64)之間的結合力,並提高後續打線製程之打線強度,因而可提高產品可靠度與封裝能力。 In addition, the outermost (that is, the outer layer of the hard board region) contact pad of the flexible substrate 6 of the present invention is made in the form of a copper pillar (ie, the conductive pillar 62), and is replaced by a dielectric material (the insulating layer 64). The solder resist is known, so the present invention can strengthen the bonding force between the contact pad (the conductive pillar 62) and the dielectric material (the insulating layer 64), and improve the bonding strength of the subsequent bonding process, thereby improving the reliability of the product. And packaging capabilities.

此外,本發明之連結位置(即該撓折段F)係以影像轉移方式配合圖案化電鍍厚銅(該擋塊69)及蝕刻移除厚銅(該擋塊69)等方式製作,故該撓折段F之形狀、尺寸與精度不受習知機械加工之限制,因而可提高機構設計之自由度(例如,可同時製作多組任意形狀之撓折段F),且因該些擋塊69可與該導電柱62一起製作而能減少加工成本。 In addition, the connection position of the present invention (that is, the flexure F) is produced by image transfer with patterned thick copper plating (the stopper 69) and etching to remove the thick copper (the stopper 69). The shape, size and accuracy of the flexure section F are not limited by conventional machining, so the freedom of mechanism design can be improved (for example, multiple sets of flexure sections F of any shape can be made at the same time). 69 can be manufactured together with the conductive pillar 62, which can reduce the processing cost.

第7A至7B圖係為本發明之可撓式基板7之製法之第三實施例的剖視示意圖。本實施例與第二實施例之差異在於穿孔之製作方式,其它製程大致相同,故以下僅說明相異處,而不再贅述相同處。 7A to 7B are schematic sectional views of a third embodiment of a method for manufacturing a flexible substrate 7 according to the present invention. The difference between this embodiment and the second embodiment lies in the manufacturing method of the perforation. The other processes are roughly the same, so only the differences will be described below, and the same points will not be described again.

如第7A圖所示,接續第6A圖之製程,係於該基板本體55上形成一絕緣保護層77,其具有複數外露該線路層551之開孔771與至少一外露該介電層550之開口區770,且於本實施例中,該承載板50係為金屬板。 As shown in FIG. 7A, following the process of FIG. 6A, an insulating protection layer 77 is formed on the substrate body 55, which has a plurality of openings 771 exposing the circuit layer 551 and at least one exposing the dielectric layer 550. The opening area 770, and in this embodiment, the carrier plate 50 is a metal plate.

如第7B圖所示,對應該開口區770之位置蝕刻移除該承載板50之部分材質,以於該承載板50上對應該開口區770之處形成一貫通該承載板50之穿孔700,使該基板本體55外露於該穿孔700,以令該具有該穿孔700之承載板50作為增設件70(可視為硬質部),且令該基板本體55外露於該穿孔700之部分作為撓折段F。 As shown in FIG. 7B, a part of the material of the carrier plate 50 is removed by etching at a position corresponding to the opening area 770, so that a hole 700 penetrating the carrier plate 50 is formed on the carrier plate 50 corresponding to the opening area 770. The substrate body 55 is exposed from the perforation 700, so that the carrier plate 50 having the perforation 700 is used as an add-on 70 (can be regarded as a hard part), and the part of the substrate body 55 exposed from the perforation 700 is used as a flexure section. F.

因此,本發明之可撓式基板7係採用金屬板材作為該承載板50以於其上進行增層製程,並保留部分該承載板50以作為該增設件70,俾供作為硬板區之支撐與散熱之 用。 Therefore, the flexible substrate 7 of the present invention uses a metal plate as the carrier plate 50 to perform a layer-increasing process thereon, and reserves a part of the carrier plate 50 as the add-on 70 to serve as a support for the hard board area. And cooling use.

再者,本發明之可撓式基板7僅於該基板本體55之單一側具有軟硬交接處,且該處係為介電材(該介電層550)與金屬材(該承載板50)直接結合,再蝕刻移除該承載板50之部分材質,以形成該貫通該承載板50之穿孔700,因而可完全消除習知軟硬結合板在軟硬交接區所產生之缺點,亦即本發明之軟硬交接區沒有如習知技術之溢膠、缺膠、突起等問題。 Furthermore, the flexible substrate 7 of the present invention has a soft-hard junction only on one side of the substrate body 55, and the place is a dielectric material (the dielectric layer 550) and a metal material (the carrier plate 50). Directly combine, and then etch and remove part of the material of the carrier plate 50 to form the perforation 700 penetrating the carrier plate 50, so that the disadvantages of the conventional soft-hard board in the soft-hard interface can be completely eliminated, which is the present The soft-hard interface of the invention is free from problems such as overflow, lack of glue, and protrusions of the conventional technology.

又,本發明之連結位置(即該撓折段F)係以蝕刻金屬(該承載板50之部分材質)之方式製作,故該撓折段F之形狀、尺寸與精度不受習知機械加工之限制,因而可提高機構設計之自由度,例如,可同時製作多組任意形狀之撓折段F。 In addition, the connection position of the present invention (that is, the flexure section F) is made by etching metal (a part of the material of the bearing plate 50), so the shape, size and accuracy of the flexure section F are not subject to conventional mechanical processing. The limitation of the mechanism can increase the degree of freedom in the design of the mechanism. For example, multiple sets of flexure sections F of any shape can be made at the same time.

另外,該基板本體55係為無核心形式,故可大幅降低該可撓式基板7之總厚度,例如,四層板形式之厚度R可小於0.2mm,其遠小於習知四層板形式之厚度。 In addition, the substrate body 55 is a coreless form, so the total thickness of the flexible substrate 7 can be greatly reduced. For example, the thickness R of the four-layer board form can be less than 0.2mm, which is much smaller than the conventional four-layer board form. thickness.

本發明提供一種可撓式基板5,6,7,係包括:一基板本體55以及至少一增設件5a,5b,60,70。 The present invention provides a flexible substrate 5, 6, 7, which includes: a substrate body 55 and at least one additional member 5a, 5b, 60, 70.

所述之基板本體55係為無核心形式且具有至少一撓折段F。 The substrate body 55 is a coreless form and has at least one bending section F.

所述之增設件5a,5b,60,70係形成於該基板本體55上,且該增設件5a,5b,60,70具有穿孔640,700(該第一與第二穿孔530,540),以令該撓折段F外露於該穿孔640,700(該第一與第二穿孔530,540)。 The additional pieces 5a, 5b, 60, 70 are formed on the substrate body 55, and the additional pieces 5a, 5b, 60, 70 have perforations 640,700 (the first and second perforations 530,540) to make the flexible The folding section F is exposed at the perforations 640,700 (the first and second perforations 530,540).

於一實施例中,該基板本體55係包含至少一介電層550及結合該介電層550之線路結構(例如,該線路層551及/或該導電體552)。 In one embodiment, the substrate body 55 includes at least one dielectric layer 550 and a circuit structure (eg, the circuit layer 551 and / or the conductive body 552) combined with the dielectric layer 550.

於一實施例中,該增設件5a,5b,60係包含絕緣層64(該第一與第二絕緣層53,54)及嵌埋於該絕緣層64中之導電柱62(該第一與第二導電柱51,52)。例如,形成該絕緣層64(該第一與第二絕緣層53,54)之材質係為介電材料,其為鑄模化合物或底層塗料。 In one embodiment, the extensions 5a, 5b, and 60 include an insulating layer 64 (the first and second insulating layers 53, 54) and a conductive pillar 62 (the first and second electrodes) embedded in the insulating layer 64. Second conductive pillars 51, 52). For example, the material forming the insulating layer 64 (the first and second insulating layers 53, 54) is a dielectric material, which is a mold compound or a primer.

於一實施例中,該增設件70係為金屬板材。 In one embodiment, the extension member 70 is a metal plate.

綜上所述,本發明之可撓式基板及其製法,係藉由該基板本體為無核心形式,以降低該可撓式基板之總厚度,故能符合薄化之需求。 In summary, the flexible substrate and the manufacturing method thereof of the present invention reduce the total thickness of the flexible substrate by using the substrate body as a coreless form, so that it can meet the demand for thinning.

再者,藉由軟硬交接處為介電材直接結合增設件,以於軟硬交接區不會產生如溢膠、缺膠、突起等習知問題,且能提升層間對位精度提高。 In addition, the soft and hard interface is a direct combination of the dielectric material and the add-on, so that the soft and hard interface will not cause conventional problems such as overflow, lack of glue, and protrusions, and can improve the accuracy of inter-layer alignment.

又,該基板本體因其線路層使用半加成法製作而無需蝕刻金屬材,以利於阻抗控制,且能縮小線寬/線距,故能符合細間距/細線路之需求。 In addition, the substrate body is fabricated using a semi-additive method without etching metal materials, which is beneficial to impedance control, and can reduce the line width / space, so it can meet the requirements of fine pitch / fine lines.

另外,藉由蝕刻金屬材之方式定義出該撓折段,故該撓折段之形狀、尺寸與精度不受習知機械加工之限制,因而能提高機構設計之自由度。 In addition, the flexure section is defined by etching a metal material, so the shape, size and accuracy of the flexure section are not limited by the conventional mechanical processing, so the freedom of mechanism design can be improved.

上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修 改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are used to exemplify the principle of the present invention and its effects, but not to limit the present invention. Anyone skilled in the art can modify the above embodiments without departing from the spirit and scope of the present invention. change. Therefore, the scope of protection of the rights of the present invention should be listed in the scope of patent application described later.

Claims (13)

一種可撓式基板,係包括:基板本體,係為無核心形式,並具有撓折段、至少一作為軟質部之介電層及結合該介電層之線路層,且形成該介電層之材料係為軟質之鑄模化合物或底層塗料;以及增設件,係作為硬度相對該軟質部之硬質部,其形成於該基板本體上並電性連接該線路層,且具有穿孔,以令該撓折段外露於該穿孔。A flexible substrate includes: a substrate body, which is a coreless form, has a flexure section, at least one dielectric layer as a soft portion, and a circuit layer combined with the dielectric layer, and forms the dielectric layer. The material is a soft mold compound or primer; and an additional part is a hard part having a hardness relative to the soft part, which is formed on the substrate body and electrically connected to the circuit layer, and has a perforation to make the flexure The segment is exposed at the perforation. 如申請專利範圍第1項所述之可撓式基板,其中,該基板本體更包含結合該介電層之線路結構。The flexible substrate according to item 1 of the patent application scope, wherein the substrate body further comprises a circuit structure combined with the dielectric layer. 如申請專利範圍第1項所述之可撓式基板,其中,該增設件係包含絕緣層及嵌埋於該絕緣層中之導電柱,且該導電柱電性連接該基板本體之線路層。The flexible substrate according to item 1 of the scope of the patent application, wherein the additional component includes an insulating layer and a conductive pillar embedded in the insulating layer, and the conductive pillar is electrically connected to the circuit layer of the substrate body. 如申請專利範圍第3項所述之可撓式基板,其中,形成該絕緣層之材質係為硬質介電材料。The flexible substrate according to item 3 of the scope of patent application, wherein the material forming the insulating layer is a hard dielectric material. 如申請專利範圍第4項所述之可撓式基板,其中,該介電材料係為硬質之鑄模化合物或底層塗料。The flexible substrate according to item 4 of the scope of patent application, wherein the dielectric material is a hard mold compound or a primer. 如申請專利範圍第1項所述之可撓式基板,其中,該增設件係為金屬板材。The flexible substrate according to item 1 of the scope of patent application, wherein the additional component is a metal plate. 一種可撓式基板之製法,係包括:於一金屬板材的承載板上形成一為無核心形式且具有撓折段之基板本體,其中,該基板本體係包含至少一作為軟質部之介電層及結合該介電層之線路層,且形成該介電層之材料係為軟質之鑄模化合物或底層塗料;於該基板本體上形成增設件,其中,該增設件係包含硬質絕緣層、嵌埋於該絕緣層中之導電柱及貫通該絕緣層之擋塊,且該增設件電性連接該線路層;以及移除該承載板與該擋塊,使該增設件形成有穿孔,以供該撓折段外露於該穿孔,且該增設件作為硬度相對該軟質部之硬質部。A method for manufacturing a flexible substrate includes forming a substrate body in a coreless form and having a bending section on a carrier plate of a metal plate, wherein the substrate system includes at least one dielectric layer as a soft part. And a circuit layer combined with the dielectric layer, and the material forming the dielectric layer is a soft mold compound or a primer; an add-on is formed on the substrate body, wherein the add-on includes a hard insulating layer, embedded A conductive pillar in the insulating layer and a stopper penetrating the insulating layer, and the add-on is electrically connected to the circuit layer; and removing the carrier board and the stopper, so that the add-on has a perforation for the add-on The bending section is exposed in the perforation, and the additional member is used as a hard part with a hardness relative to the soft part. 如申請專利範圍第7項所述之可撓式基板之製法,復包括當於該承載板上形成該基板本體之前,形成另一增設件於該承載板上,以令該基板本體設於該另一增設件上,其中,該另一增設件係包含另一硬質絕緣層、嵌埋於該另一絕緣層中之另一導電柱及另一貫通該絕緣層之擋塊,且該另一增設件電性連接該基板本體之該線路層,並於移除該該承載板與該擋塊時,移除該另一擋塊,使該另一增設件形成有另一穿孔,以供該撓折段外露於該另一穿孔,且該另一增設件作為硬度相對該軟質部之另一硬質部。According to the method for manufacturing a flexible substrate described in item 7 of the scope of patent application, the method further includes, before forming the substrate body on the carrier plate, forming another add-on on the carrier plate, so that the substrate body is disposed on the carrier plate. On another add-on, the additional add-on includes another hard insulating layer, another conductive pillar embedded in the other insulating layer, and another stopper penetrating the insulating layer, and the another The add-on is electrically connected to the circuit layer of the substrate body, and when the carrier board and the stopper are removed, the other stopper is removed, so that another add-on is formed with another perforation for the The tortuous section is exposed in the other perforation, and the other add-on is used as the other hard part whose hardness is relative to the soft part. 如申請專利範圍第7或8項所述之可撓式基板之製法,其中,該基板本體更包含結合該介電層之線路結構。The method for manufacturing a flexible substrate according to item 7 or 8 of the scope of the patent application, wherein the substrate body further includes a circuit structure combined with the dielectric layer. 如申請專利範圍第7或8項所述之可撓式基板之製法,其中,形成該絕緣層之材質係為硬質介電材料。According to the method for manufacturing a flexible substrate as described in item 7 or 8 of the scope of patent application, wherein the material forming the insulating layer is a hard dielectric material. 如申請專利範圍第10項所述之可撓式基板之製法,其中,該介電材料係為硬質之鑄模化合物或底層塗料。According to the method for manufacturing a flexible substrate as described in item 10 of the scope of patent application, wherein the dielectric material is a hard mold compound or a primer. 一種可撓式基板之製法,係包括:於一金屬板材的承載板上形成基板本體,其中,該基板本體係為無核心形式,並具有撓折段、至少一作為軟質部之介電層及結合該介電層之線路層,且形成該介電層之材料係為軟質之鑄模化合物或底層塗料;以及移除該承載板之部分材質,以形成貫通該承載板之穿孔而令該具有穿孔之承載板作為增設件,並供該撓折段外露於該穿孔,且該增設件配置於該基板本體之單一側而作為硬度相對該軟質部之硬質部,並且電性連接該線路層。A method for manufacturing a flexible substrate includes forming a substrate body on a carrier plate of a metal plate, wherein the substrate has a coreless system and has a flexure section, at least one dielectric layer as a soft part, and Combine the circuit layer of the dielectric layer, and the material forming the dielectric layer is a soft mold compound or primer; and remove a part of the material of the carrier plate to form a perforation through the carrier plate so that the perforation is provided. The carrier board is used as an add-on, and the flexure is exposed to the perforation. The add-on is arranged on a single side of the substrate body as a hard part with a hardness relative to the soft part, and is electrically connected to the circuit layer. 如申請專利範圍第12項所述之可撓式基板之製法,其中,該基板本體更包含結合該介電層之線路結構。According to the method for manufacturing a flexible substrate according to item 12 of the scope of the patent application, wherein the substrate body further includes a circuit structure combined with the dielectric layer.
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