TWI665588B - Three-dimensional curved touch structure and manufacturing method thereof - Google Patents

Three-dimensional curved touch structure and manufacturing method thereof Download PDF

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TWI665588B
TWI665588B TW107120795A TW107120795A TWI665588B TW I665588 B TWI665588 B TW I665588B TW 107120795 A TW107120795 A TW 107120795A TW 107120795 A TW107120795 A TW 107120795A TW I665588 B TWI665588 B TW I665588B
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layer
manufacturing
transferable film
dimensional curved
film
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TW107120795A
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TW202001512A (en
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林柏青
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大陸商業成科技(成都)有限公司
大陸商業成光電(深圳)有限公司
英特盛科技股份有限公司
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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Abstract

本發明提供了一種三維曲面觸控疊層結構製作方法,包括下列步驟:a. 提供一可轉印薄膜以及一曲面基板。b. 利用蝕刻方式於該可轉印薄膜上製作一感應電極。c. 於該可轉印薄膜上設置一熱塑性轉印材料。d. 透過該熱塑性轉印材料將該可轉印薄膜熱貼合至該曲面基板上,並於該可轉印薄膜上產生一互穿聚合物網絡結構。e. 利用紫外線固化該可轉印薄膜。透過上述方法,三維曲面觸控疊層結構在熱貼合轉寫的過程中,會產生約50至100奈米厚度的互穿聚合物網絡結構,使整體疊層結構更加穩固。The invention provides a method for manufacturing a three-dimensional curved touch stack structure, which includes the following steps: a. A transferable film and a curved substrate are provided. b. Making an induction electrode on the transferable film by etching. c. A thermoplastic transfer material is disposed on the transferable film. d. thermally bonding the transferable film to the curved substrate through the thermoplastic transfer material, and creating an interpenetrating polymer network structure on the transferable film. e. The transferable film is cured using ultraviolet light. Through the above-mentioned method, the three-dimensional curved touch stacking structure will produce an interpenetrating polymer network structure with a thickness of about 50 to 100 nanometers during the thermal bonding transfer process, making the overall stacking structure more stable.

Description

三維曲面觸控疊層結構及其製作方法Three-dimensional curved touch stack structure and manufacturing method thereof

本發明之技術涉及觸控結構領域,特別是指一種三維曲面觸控疊層結構及其製作方法。 The technology of the present invention relates to the field of touch control structures, and particularly to a three-dimensional curved touch stack structure and a manufacturing method thereof.

因應觸控裝置蓬勃發展,觸控疊層結構由單一平面造型一路延伸到多軸曲面造型的應用。然而,觸控疊層結構在貼合的過程中容易因為疊層結構中不同材料的脹縮拉扯造成應力累積,而產生皺摺的現象,最終導致觸控線路因拉扯撓曲導致微裂(micro crack)、局部的電阻值上升,觸控功能異常等缺陷。 In response to the rapid development of touch devices, the touch stack structure has been extended from a single flat shape to a multi-axis curved shape. However, during the bonding process of the touch stack structure, it is easy to cause stress accumulation due to the expansion and contraction of different materials in the stack structure, which results in wrinkling. Eventually, the touch circuit will cause micro-cracks due to pulling and deflection. crack), the local resistance value rises, and the touch function is abnormal.

再者,以熱塑方式進行導電膜的偏貼,容易因為基膜(base film)材料於不同溫度下的差異造成收縮,比容(specific volume)也可能因為拉伸率過高,造成材料產生銀紋或更嚴重導致斷裂,因此仍有待改良之空間。 In addition, the partial application of the conductive film in a thermoplastic manner is likely to cause shrinkage due to the difference in the base film material at different temperatures, and the specific volume may also be caused by the too high stretch rate, which may cause the material to be produced. Silver streaks or worse lead to fracture, so there is still room for improvement.

本發明之主要目的係改善習用技術在熱塑貼合時容易產生觸控功能異常之問題進行改良。為了達到上述目的,本發明係採取以下之技術手段予以達成,其中,本發明提供一種三維曲面觸控疊層結構及其製作方法,其包括下列步驟:a.提供一可轉印薄膜以及一曲面基板。b.利用蝕刻方式於該可轉印薄膜上製作一感應電極。c.於該可轉印薄膜上設置一熱塑性轉印材料。d.透過該熱塑性轉印材料將該可轉印薄膜熱貼合至該曲面基板上,並於該可轉印薄膜上產生一互穿聚合物網絡結構。e.利用紫外線固化該可轉印薄膜。 The main purpose of the present invention is to improve the problem that the conventional technology is prone to abnormal touch functions during thermoplastic bonding. In order to achieve the above object, the present invention adopts the following technical means to achieve it, wherein the present invention provides a three-dimensional curved touch stacking structure and a manufacturing method thereof, including the following steps: a. Providing a transferable film and a curved surface Substrate. b. Making an induction electrode on the transferable film by etching. c. A thermoplastic transfer material is disposed on the transferable film. d. thermally bonding the transferable film to the curved substrate through the thermoplastic transfer material, and creating an interpenetrating polymer network structure on the transferable film. e. UV-curing the transferable film.

在本發明一實施例中,該感應電極的製作方式包括:於該可轉印薄膜上設置一光罩,進行曝光,移除該光罩以及一基膜,進行曝光形成該感應電極。 In an embodiment of the present invention, the manufacturing method of the sensing electrode includes: setting a photomask on the transferable film to perform exposure, removing the photomask and a base film, and performing exposure to form the sensing electrode.

在本發明一實施例中,該步驟d.之後更包括一步驟d1.:利用三維噴印技術於該可轉印薄膜上製作一外部線路。 In an embodiment of the present invention, the step d. Further includes a step d1. A three-dimensional inkjet printing technique is used to make an external circuit on the transferable film.

在本發明一實施例中,該外部線路為一單層導電金屬線路。 In one embodiment of the present invention, the external circuit is a single-layer conductive metal circuit.

在本發明一實施例中,該互穿聚合物網絡結構的厚度介於50至100奈米之間。 In an embodiment of the present invention, the thickness of the interpenetrating polymer network structure is between 50 and 100 nanometers.

在本發明一實施例中,該步驟d.更包括:該可轉印薄膜包括一功能層以及一顯影層,該功能層為一裝飾功能油墨、一修正光學功能材料或一表面改質材料,該顯影層為一光感型材料或一熱固化型材料。 In an embodiment of the present invention, the step d. Further includes: the transferable film includes a functional layer and a developing layer, the functional layer is a decorative functional ink, a correction optical functional material or a surface modification material, The developing layer is a light-sensitive material or a heat-curable material.

在本發明一實施例中,該互穿聚合物網絡結構形成於該功能層與該顯影層的接觸面上。 In an embodiment of the present invention, the interpenetrating polymer network structure is formed on a contact surface between the functional layer and the developing layer.

1‧‧‧可轉印薄膜 1‧‧‧ transferable film

2‧‧‧曲面基板 2‧‧‧ curved substrate

11‧‧‧防護膜 11‧‧‧ protective film

12‧‧‧基膜 12‧‧‧ base film

13‧‧‧可轉印透明導電膜 13‧‧‧ transferable transparent conductive film

3‧‧‧光罩 3‧‧‧Mask

4‧‧‧感應電極 4‧‧‧ Induction electrode

5‧‧‧熱塑性轉印材料 5‧‧‧ thermoplastic transfer material

10,10a,10b‧‧‧曲面基板 10, 10a, 10b ‧‧‧ curved substrate

20,20a,20b‧‧‧功能層 20,20a, 20b‧‧‧Function layer

30,30a‧‧‧互穿聚合物網絡結構 30,30a‧‧‧Interpenetrating polymer network structure

40,40a‧‧‧顯影層 40,40a‧‧‧Developing layer

50,50a‧‧‧導電線路層 50,50a‧‧‧Conductive circuit layer

60b‧‧‧金屬導電層 60b‧‧‧metal conductive layer

100~150‧‧‧步驟 100 ~ 150‧‧‧ steps

圖1為本發明三維曲面觸控疊層結構及其製作方法一實施例方法流程圖。 FIG. 1 is a method flowchart of an embodiment of a three-dimensional curved touch stack structure and a manufacturing method thereof according to the present invention.

圖2A為本發明三維曲面觸控疊層結構及其製作方法一實施例製程示意圖一。 FIG. 2A is a schematic view of a manufacturing process of a three-dimensional curved touch stack structure and a manufacturing method thereof according to an embodiment of the present invention.

圖2B為本發明三維曲面觸控疊層結構及其製作方法一實施例製程示意圖二。 FIG. 2B is a schematic diagram of a manufacturing process of a three-dimensional curved touch stack structure and a manufacturing method thereof according to an embodiment of the present invention.

圖2C為本發明三維曲面觸控疊層結構及其製作方法一實施例製程示意圖三。 FIG. 2C is a schematic view of a manufacturing process of a three-dimensional curved touch stack structure and a manufacturing method thereof according to an embodiment of the present invention.

圖2D為本發明三維曲面觸控疊層結構及其製作方法一實施例製程示意圖四。 FIG. 2D is a schematic diagram 4 of a process of an embodiment of a three-dimensional curved touch stacking structure and a manufacturing method thereof according to the present invention.

圖3A為本發明三維曲面觸控疊層結構及其製作方法一實施例內部走線疊層結構示意圖。 FIG. 3A is a schematic diagram of an internal wiring stack structure of a three-dimensional curved touch stack structure and a manufacturing method thereof according to an embodiment of the present invention.

圖3B為本發明三維曲面觸控疊層結構及其製作方法一實施例內部走線疊層結構立體示意圖。 FIG. 3B is a three-dimensional schematic diagram of an internal wiring layered structure of a three-dimensional curved touch stacking structure and a manufacturing method thereof according to an embodiment of the present invention.

圖4A為本發明三維曲面觸控疊層結構及其製作方法一實施例外部走線疊層結構示意圖一。 FIG. 4A is a schematic diagram 1 of an external wiring stacking structure according to an embodiment of a three-dimensional curved touch stacking structure of the present invention and a manufacturing method thereof.

圖4B為本發明三維曲面觸控疊層結構及其製作方法一實施例外部走線疊層結構示意圖二。 FIG. 4B is a second schematic diagram of an external wiring stacking structure of a three-dimensional curved touch stacking structure and a manufacturing method thereof according to an embodiment of the present invention.

為達成上述目的及功效,本發明所採用之技術手段及構造,茲繪圖就本發明一實施例詳加說明其特徵與功能如下,俾利完全了解,但須注意的是,所述內容不構成本發明的限定。 In order to achieve the above-mentioned object and effect, the technical means and structure adopted by the present invention, the following is a detailed description of the features and functions of an embodiment of the present invention, which is fully understood, but it should be noted that the content does not constitute Limitations of the invention.

請參閱圖1所示,其為本發明三維曲面觸控疊層結構及其製作方法一實施例之方法流程圖。本發明之三維曲面觸控疊層結構製作方法包括以下步驟: Please refer to FIG. 1, which is a method flowchart of an embodiment of a three-dimensional curved touch stack structure and a manufacturing method thereof according to the present invention. The manufacturing method of the three-dimensional curved touch stack structure of the present invention includes the following steps:

步驟100:提供一可轉印薄膜1以及一曲面基板2。該可轉印薄膜1包括一可轉印透明導電膜(Transparent Conductive Transfer Film,TCTF)13、一防護膜(Cover Film)11以及一基膜(Base Film)12,該防護膜11以及基膜12分別位於該可轉印透明導電膜13的不同表面上。該曲面基板具有一三維曲面。 Step 100: Provide a transferable film 1 and a curved substrate 2. The transferable film 1 includes a transparent conductive transfer film (TCTF) 13, a protective film 11 and a base film 12. The protective film 11 and the base film 12 They are respectively located on different surfaces of the transferable transparent conductive film 13. The curved substrate has a three-dimensional curved surface.

步驟110:利用蝕刻方式於該可轉印薄膜上製作一感應電極4。請參閱圖2A、2B所示,其為本發明三維曲面觸控疊層結構及其製作方法一實施例之製程示意圖一及製程示意圖二,所述感應電極的製作方式包括:於該可轉印薄膜上設置一光罩3,該光罩3可鄰近於基膜12的一表面;利用紫外線照射該可轉印薄膜1以進行曝光;移除位於該可轉印透明導電膜薄膜13上的該光罩3以及基膜12;利用紫外線照射該可轉印透明導電膜13進行曝光;於該可轉印透明導電膜13上形成該感應電極4。 Step 110: An induction electrode 4 is formed on the transferable film by etching. Please refer to FIGS. 2A and 2B, which are a process schematic diagram 1 and a process schematic diagram 2 of an embodiment of a three-dimensional curved touch stack structure and a manufacturing method thereof according to the present invention. The manufacturing method of the sensing electrode includes: A photomask 3 is provided on the film, and the photomask 3 may be adjacent to a surface of the base film 12; the transferable film 1 is irradiated with ultraviolet rays for exposure; and the photomask 13 on the transferable transparent conductive film 13 is removed. Photomask 3 and base film 12; the transferable transparent conductive film 13 is irradiated with ultraviolet rays for exposure; and the sensing electrode 4 is formed on the transferable transparent conductive film 13.

步驟120:於該可轉印薄膜上設置一熱塑性轉印材料5。請參閱圖2C及圖2D所示,其為本發明三維曲面觸控疊層結構及其製作方法一實施例的製程示意圖三、製程示意圖四。該熱塑性轉印材料可以為熱塑性彈性體或熱塑性橡膠,其具有熱塑性塑料的加工性能,亦具有硫化橡膠的物理性能的雙重優點,適合做為熱塑性轉印材料使用。 Step 120: A thermoplastic transfer material 5 is disposed on the transferable film. Please refer to FIG. 2C and FIG. 2D, which are a process schematic diagram 3 and a process schematic diagram 4 of an embodiment of a three-dimensional curved touch stack structure and a manufacturing method thereof according to the present invention. The thermoplastic transfer material can be a thermoplastic elastomer or a thermoplastic rubber, which has the dual advantages of processing properties of a thermoplastic and physical properties of a vulcanized rubber, and is suitable for use as a thermoplastic transfer material.

步驟130:透過該熱塑性轉印材料將該可轉印薄膜熱貼合至該曲面基板上,並於該可轉印薄膜上產生一互穿聚合物網絡結構(Interpenetrating Polymer Network,IPN),該互穿聚合物網絡結構可為高分子線性聚合物(Linear polymer)或支鏈(branched chain)。利用熱轉寫技術,可以將透明該可轉印薄膜貼合到設計的曲面基板上,同時藉由加熱提高材料擴散流動性,使兩個介層材料的接觸面互穿糾結現象,在接觸面上形成互穿聚合物網絡結構,可增加可轉印薄膜與曲面基板之間的附著力,其中,控制熱轉寫時的溫度及壓力可以使互穿聚合物網絡結構的附著力更為明顯。在本發明一實施例中,該互穿聚合物網絡結構的厚度介於50至100奈米之間。於一實施例中,該可轉印薄膜包括一功能層以及一顯影層,該功能層為一疊層材料,用以增加可轉印薄膜之功能,其可為一裝飾功能油墨、一修正光學功能材料或一表面改質材料等,但不限於此。該顯影層為一疊層材料,其可為一光感型材料或一熱固化型材料,且該互穿聚合物網絡結構形成於該功能層與該顯影層的接觸面上。 Step 130: thermally attach the transferable film to the curved substrate through the thermoplastic transfer material, and create an interpenetrating polymer network (IPN) on the transferable film. The penetrating polymer network structure may be a linear polymer or a branched chain. Using thermal transfer technology, the transparent transferable film can be attached to the curved substrate of the design. At the same time, the diffusion and fluidity of the material can be improved by heating, so that the contact surfaces of the two interlayer materials intersect and intersect. The formation of an interpenetrating polymer network structure can increase the adhesion between the transferable film and the curved substrate. Among them, controlling the temperature and pressure during thermal transfer can make the adhesion of the interpenetrating polymer network structure more obvious. In an embodiment of the present invention, the thickness of the interpenetrating polymer network structure is between 50 and 100 nanometers. In one embodiment, the transferable film includes a functional layer and a developing layer. The functional layer is a laminated material to increase the function of the transferable film. The functional layer can be a decorative functional ink, a correction optical A functional material or a surface modification material, etc., but is not limited thereto. The developing layer is a laminated material, which may be a light-sensitive material or a thermosetting material, and the interpenetrating polymer network structure is formed on a contact surface between the functional layer and the developing layer.

步驟140:利用紫外線固化該可轉印薄膜。 Step 140: Use ultraviolet light to cure the transferable film.

在本發明一實施例中,所述步驟140之後可再包括一步驟150:利用三維噴印技術於該可轉印薄膜上製作一外部線路,其中該外部線路為單層導電金屬線路或多層導電金屬線路。所述三維噴印技術為電子列印技術應用,具有細微的噴印能力以及更廣泛的材料運用性,且其特殊的列印方式,特別適合應用於立體三維曲面。 In an embodiment of the present invention, after step 140, a step 150 may be further included: an external circuit is made on the transferable film by using a three-dimensional inkjet printing technique, wherein the external circuit is a single-layer conductive metal circuit or a multi-layer conductive Metal lines. The three-dimensional inkjet printing technology is an electronic printing technology application, which has a fine inkjet printing ability and wider material applicability, and its special printing method is particularly suitable for being applied to three-dimensional three-dimensional curved surfaces.

透過上述製作方式,可以製作出如圖3A、3B所示的面內走線疊層結構以及圖4A、4B所示的外部走線疊層結構。圖3A及3B分別為本發明一實施例內部走線疊層結構示意圖以及立體示意圖,內部走線疊層結構 包括曲面基板10、功能層20、互穿聚合物網絡結構30、顯影層40以及導電線路層50。該曲面基板10可為玻璃、單層或多層複合塑件材料,該功能層20的一表面與該基板10的一表面相貼合,使該功能層20貼附於該曲面基板10的下方。該功能層20可以為裝飾膜體(Decoration Film)或處理材料(Treatment Agent),例如裝飾功能油墨、修正光學功能材料或表面改質材料等。該顯影層40的一表面與該功能層20的另一表面相貼合,使該顯影層40貼附於該功能層20的下方,且該顯影層40以及該功能層20的接觸面上形成有互穿聚合物網絡結構30。該顯影層40可以為光感型材料或熱固化型材料,該導電線路層50的一表面與該顯影層40的另一表面相貼合,使該導電線路層50貼附於該顯影層40的下方,該導電線路層50可為氧化銦錫(ITO)、奈米銀線或奈米碳管等,但不限於此。 Through the above manufacturing method, an in-plane wiring stack structure as shown in FIGS. 3A and 3B and an outer wiring stack structure shown in FIGS. 4A and 4B can be manufactured. 3A and 3B are a schematic diagram and a three-dimensional schematic diagram of an internal wiring stacking structure and an internal wiring stacking structure according to an embodiment of the present invention, respectively. It includes a curved substrate 10, a functional layer 20, an interpenetrating polymer network structure 30, a developing layer 40, and a conductive circuit layer 50. The curved substrate 10 can be made of glass, single-layer or multi-layer composite plastic parts, and one surface of the functional layer 20 is adhered to one surface of the substrate 10 so that the functional layer 20 is attached below the curved substrate 10. The functional layer 20 may be a decoration film or a treatment agent, such as a decorative functional ink, a correction optical function material, or a surface modification material. One surface of the developing layer 40 is in contact with the other surface of the functional layer 20, so that the developing layer 40 is attached below the functional layer 20, and the contact surfaces of the developing layer 40 and the functional layer 20 are formed. There is an interpenetrating polymer network structure 30. The developing layer 40 may be a light-sensitive material or a thermosetting material. One surface of the conductive circuit layer 50 is adhered to the other surface of the developing layer 40, so that the conductive circuit layer 50 is attached to the developing layer 40. Below, the conductive circuit layer 50 may be indium tin oxide (ITO), nanometer silver wire or nanometer carbon tube, but is not limited thereto.

圖4A所示的外部走線疊層結構包括曲面基板10a、功能層20a、互穿聚合物網絡結構30a、顯影層40a以及導電線路層50a。該曲面基板10a可為玻璃、單層或多層複合塑件材料,該功能層20a的一表面與該基板10a的一表面相貼合,使該功能層20a貼附於該曲面基板10a的下方。該功能層20a可以為裝飾膜體(Decoration Film)或處理材料(Treatment Agent),例如裝飾功能油墨、修正光學功能材料或表面改質材料等。該顯影層40a的一表面與該功能層20a的另一表面相貼合,使該顯影層40a貼附於該功能層20a的下方,且該顯影層40a以及該功能層20a的接觸面上形成有互穿聚合物網絡結構30a。該顯影層40a可以為光感型材料或熱固化型材料,該導電線路層50a的一表面與該顯影層40a的另一表面相貼合,使該導電線路層50a貼附於該顯影層40a的下方,該導電線路層50a可為氧化銦錫(ITO)、奈米銀線或奈米碳管等,但不限於此。圖4B所示的外部走線疊層結構包括曲 面基板10b、功能層20b以及金屬導電層60b。該曲面基板10b可為玻璃、單層或多層複合塑件材料,該功能層20b的一表面與該基板10b的一表面相貼合,使該功能層20b貼附於該基板10b的下方,該功能層20b可以為裝飾膜體(Decoration Film)或處理材料(Treatment Agent),例如裝飾功能油墨、修正光學功能材料或表面改質材料等。該金屬導電層60b的一表面與該功能層20b的另一表面相貼合,使該金屬導電層60b貼附於該功能層20b的下方,該金屬導電層60b為單層或多層導電金屬。 The external wiring stack structure shown in FIG. 4A includes a curved substrate 10a, a functional layer 20a, an interpenetrating polymer network structure 30a, a developing layer 40a, and a conductive circuit layer 50a. The curved substrate 10a may be made of glass, single-layer or multi-layer composite plastic material, and one surface of the functional layer 20a is adhered to one surface of the substrate 10a, so that the functional layer 20a is attached below the curved substrate 10a. The functional layer 20a may be a decoration film or a treatment agent, such as a decorative ink, a correction optical function material, or a surface modification material. One surface of the developing layer 40a is in contact with the other surface of the functional layer 20a, so that the developing layer 40a is attached below the functional layer 20a, and the contact surfaces of the developing layer 40a and the functional layer 20a are formed. There is an interpenetrating polymer network structure 30a. The developing layer 40a may be a light-sensitive material or a thermosetting material. One surface of the conductive circuit layer 50a is bonded to the other surface of the developing layer 40a, so that the conductive circuit layer 50a is attached to the developing layer 40a. Below, the conductive circuit layer 50a may be indium tin oxide (ITO), nano-silver wire or nano-carbon tube, but is not limited thereto. The external trace stack structure shown in Figure 4B includes a curved The surface substrate 10b, the functional layer 20b, and the metal conductive layer 60b. The curved substrate 10b may be made of glass, single-layer or multilayer composite plastic material. One surface of the functional layer 20b is bonded to one surface of the substrate 10b, so that the functional layer 20b is attached below the substrate 10b. The functional layer 20b may be a decoration film or a treatment agent, such as a decorative functional ink, a correction optical function material, or a surface modification material. One surface of the metal conductive layer 60b is adhered to the other surface of the functional layer 20b, so that the metal conductive layer 60b is attached below the functional layer 20b. The metal conductive layer 60b is a single-layer or multi-layer conductive metal.

故,請參閱全部附圖所示,本發明提供的一種三維曲面觸控疊層結構及其製作方法,其提出一種三維曲面觸控疊層結構製作方法,採用先轉寫的方式減少基膜的厚度,可避免轉寫在曲面上因厚度導致偏離中性軸的位置,讓材料承受更大應力而斷裂之問題。此外,亦可以於功能層和顯影層間產生互穿聚合物網絡結構,只整體結構更加穩固。 Therefore, referring to all the drawings, the present invention provides a three-dimensional curved touch stack structure and a manufacturing method thereof, which proposes a method for manufacturing a three-dimensional curved touch stack structure. Thickness can avoid the problem of transcribing the surface from the position of the neutral axis due to the thickness and allowing the material to bear more stress and break. In addition, an interpenetrating polymer network structure can be generated between the functional layer and the developing layer, and only the overall structure is more stable.

透過上述之詳細說明,即可充分顯示本發明之目的及功效上均具有實施之進步性,極具產業之利用性價值,且為目前市面上前所未見之新發明,完全符合發明專利要件,爰依法提出申請。唯以上所述僅為本發明一的實施例,並非因此限制本發明的實施方式及保護範圍,對於本領域技術人員而言,應當能夠意識到凡運用本發明說明書及圖示內容所作出的等同替換和顯而易見的變化所得到的方案,均應當包含在本發明的保護範圍內。 Through the above detailed description, it can fully show that the purpose and efficacy of the present invention are progressive in implementation, have great industrial utility value, and are new inventions that have never been seen on the market today, and fully meet the requirements of invention patents , Apply according to law. The above description is only an embodiment of the present invention, and therefore does not limit the implementation and protection scope of the present invention. For those skilled in the art, it should be able to realize the equivalents made by using the description and illustrations of the present invention. The solutions obtained by substitution and obvious changes should all be included in the protection scope of the present invention.

Claims (9)

一種三維曲面觸控疊層結構製作方法,包括下列步驟:a.提供一可轉印薄膜以及一曲面基板;b.利用蝕刻方式於該可轉印薄膜上製作一感應電極,該感應電極的製作方式包括:於該可轉印薄膜上設置一光罩,進行曝光,移除該光罩以及一基膜,進行曝光形成該感應電極;c.於該可轉印薄膜上設置一熱塑性轉印材料;d.透過該熱塑性轉印材料將該可轉印薄膜熱貼合至該曲面基板上,並於該可轉印薄膜上產生一互穿聚合物網絡結構,該互穿聚合物網絡結構用以增加該可轉印薄膜與該曲面基板之間的附著力;e.利用紫外線固化該可轉印薄膜。A method for manufacturing a three-dimensional curved touch stack structure includes the following steps: a. Providing a transferable film and a curved substrate; b. Using an etching method to fabricate a sensing electrode on the transferable film, and manufacturing the sensing electrode The method includes: setting a photomask on the transferable film to perform exposure, removing the photomask and a base film, and performing exposure to form the sensing electrode; c. Setting up a thermoplastic transfer material on the transferable film D. Thermally attach the transferable film to the curved substrate through the thermoplastic transfer material, and create an interpenetrating polymer network structure on the transferable film, the interpenetrating polymer network structure used to Increasing the adhesion between the transferable film and the curved substrate; e. Curing the transferable film with ultraviolet light. 如申請專利範圍第1項所述的三維曲面觸控疊層結構製作方法,其中該步驟d.之後更包括一步驟d1.:利用三維噴印技術於該可轉印薄膜上製作一外部線路。According to the method for manufacturing a three-dimensional curved touch stack structure according to item 1 of the scope of patent application, the step d. Further includes a step d1 .: using a three-dimensional inkjet printing technology to make an external circuit on the transferable film. 如申請專利範圍第2項所述的三維曲面觸控疊層結構製作方法,其中該外部線路為一單層導電金屬線路。The method for manufacturing a three-dimensional curved touch stack structure according to item 2 of the scope of the patent application, wherein the external circuit is a single-layer conductive metal circuit. 如申請專利範圍第1項所述的三維曲面觸控疊層結構製作方法,其中該互穿聚合物網絡結構的厚度介於50至100奈米之間。According to the manufacturing method of the three-dimensional curved touch stack structure according to item 1 of the scope of the patent application, the thickness of the interpenetrating polymer network structure is between 50 and 100 nanometers. 如申請專利範圍第1項所述的三維曲面觸控疊層結構製作方法,其中該步驟d.更包括:該可轉印薄膜包括一功能層以及一顯影層,該功能層為一裝飾功能油墨、一修正光學功能材料或一表面改質材料,該顯影層為一光感型材料或一熱固化型材料。The method for manufacturing a three-dimensional curved touch stack structure according to item 1 of the scope of patent application, wherein step d. Further includes: the transferable film includes a functional layer and a developing layer, and the functional layer is a decorative functional ink A correction optical function material or a surface modification material, and the developing layer is a light-sensitive material or a thermosetting material. 如申請專利範圍第5項所述的三維曲面觸控疊層結構製作方法,其中該步驟d.更包括:該互穿聚合物網絡結構形成於該功能層與該顯影層的接觸面上。The method for manufacturing a three-dimensional curved touch stacking structure according to item 5 of the scope of the patent application, wherein step d. Further includes: forming the interpenetrating polymer network structure on a contact surface between the functional layer and the developing layer. 一種利用申請專利範圍第1項至第6項任一項所述方法製造的三維曲面觸控疊層結構,包括:一曲面基板、一功能層、一互穿聚合物網絡結構、一顯影層以及一導電線路層,該曲面基板具有一三維曲面;該功能層的一表面與該基板的一表面相貼合使該功能層貼附於該曲面基板的下方;該顯影層的一表面與該功能層的另一表面相貼合,使該顯影層貼附於該功能層的下方,且該顯影層以及該功能層的接觸面上形成有該互穿聚合物網絡結構。A three-dimensional curved touch stacking structure manufactured by using the method described in any one of claims 1 to 6 of a patent application scope, comprising: a curved substrate, a functional layer, an interpenetrating polymer network structure, a developing layer, and A conductive circuit layer, the curved substrate has a three-dimensional curved surface; a surface of the functional layer is adhered to a surface of the substrate so that the functional layer is attached below the curved substrate; a surface of the developing layer and the function The other surfaces of the layers are adhered, so that the developing layer is attached below the functional layer, and the interpenetrating polymer network structure is formed on the contact surface of the developing layer and the functional layer. 如申請專利範圍第7項所述的三維曲面觸控疊層結構,其中該功能層為裝飾功能油墨、修正光學功能材料層或表面改質材料層。The three-dimensional curved touch stack structure according to item 7 of the scope of the patent application, wherein the functional layer is a decorative functional ink, a correction optical functional material layer or a surface modified material layer. 如申請專利範圍第7項所述的三維曲面觸控疊層結構,其中該顯影層為光感型材料層或熱固化型材料層。The three-dimensional curved touch stack structure according to item 7 of the patent application scope, wherein the developing layer is a photosensitive material layer or a thermosetting material layer.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201308152A (en) * 2011-05-16 2013-02-16 Nissha Printing Curved touch panel, method for manufacturing the same and display device with a curved touch panel attached to
TW201507858A (en) * 2013-08-30 2015-03-01 Innolux Corp Element substrate, display apparatus and manufacturing method of element substrate
US20150060391A1 (en) * 2013-09-02 2015-03-05 Tianjin Funayuanchuang Technology Co.,Ltd. Method for making touch panel

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5400904B2 (en) * 2011-07-15 2014-01-29 アルプス電気株式会社 Manufacturing method of touch panel integrated display device
CN103971787B (en) * 2013-02-04 2016-06-22 深圳欧菲光科技股份有限公司 Transparent conductive body and preparation method thereof
CN103745783A (en) * 2014-01-02 2014-04-23 无锡力合光电传感技术有限公司 Dry film preparation method and method for manufacturing transparent conducting electrode of touch screen by applying dry film
KR102211774B1 (en) * 2015-02-02 2021-02-02 동우 화인켐 주식회사 Method of preparing a Touch screen panel and Touch screen panel prepared by using the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201308152A (en) * 2011-05-16 2013-02-16 Nissha Printing Curved touch panel, method for manufacturing the same and display device with a curved touch panel attached to
TW201507858A (en) * 2013-08-30 2015-03-01 Innolux Corp Element substrate, display apparatus and manufacturing method of element substrate
US20150060391A1 (en) * 2013-09-02 2015-03-05 Tianjin Funayuanchuang Technology Co.,Ltd. Method for making touch panel

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