TWI663744B - Light emitting diode display - Google Patents
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- RQIPKMUHKBASFK-UHFFFAOYSA-N [O-2].[Zn+2].[Ge+2].[In+3] Chemical compound [O-2].[Zn+2].[Ge+2].[In+3] RQIPKMUHKBASFK-UHFFFAOYSA-N 0.000 description 1
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- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
- H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
- H01L27/156—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0207—Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
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Abstract
一種發光二極體顯示器,包括基板、積體電路、畫素定義層以及至少一發光二極體。積體電路設置於基板上。畫素定義層包覆積體電路且具有畫素開口區。至少一發光二極體設置於畫素定義層的畫素開口區中,且與積體電路電性連接。A light emitting diode display includes a substrate, an integrated circuit, a pixel definition layer, and at least one light emitting diode. The integrated circuit is disposed on a substrate. The pixel definition layer covers the integrated circuit and has a pixel open area. At least one light emitting diode is disposed in the pixel opening area of the pixel definition layer and is electrically connected to the integrated circuit.
Description
本發明是有關於一種顯示器,且特別是有關於一種發光二極體顯示器。The invention relates to a display, and in particular to a light emitting diode display.
發光二極體顯示器包括背板及設置於背板上的多個微型發光二極體。繼承發光二極體的特性,發光二極體顯示器具有省電、高效率、高亮度及反應時間快等優點。此外,相較於有機發光二極體顯示器,發光二極體顯示器還具有色彩易調校、發光壽命長、無影像烙印等優勢。因此,發光二極體顯示器被視為下一世代的顯示技術。The light emitting diode display includes a back plate and a plurality of micro light emitting diodes arranged on the back plate. Inheriting the characteristics of light-emitting diodes, light-emitting diode displays have the advantages of power saving, high efficiency, high brightness, and fast response time. In addition, compared with organic light-emitting diode displays, light-emitting diode displays also have the advantages of easy color adjustment, long light-emitting life, and no image burn-in. Therefore, light-emitting diode displays are considered as the display technology of the next generation.
本發明提供一種發光二極體顯示器,性能佳。The invention provides a light emitting diode display with excellent performance.
本發明的發光二極體顯示器,包括基板、積體電路、畫素定義層以及至少一發光二極體。積體電路設置於基板上。畫素定義層包覆積體電路且具有畫素開口區。在基板的一垂直方向上,畫素開口區未與積體電路重疊。至少一發光二極體設置於畫素定義層的畫素開口區中,且與積體電路電性連接。The light-emitting diode display of the present invention includes a substrate, an integrated circuit, a pixel definition layer, and at least one light-emitting diode. The integrated circuit is disposed on a substrate. The pixel definition layer covers the integrated circuit and has a pixel open area. In a vertical direction of the substrate, the pixel opening area does not overlap the integrated circuit. At least one light emitting diode is disposed in the pixel opening area of the pixel definition layer and is electrically connected to the integrated circuit.
在本發明的一實施例中,上述的積體電路具有靠近基板的底面、遠離基板的頂面以及連接於底面與頂面之間的側壁,而畫素定義層遮蔽積體電路的頂面及積體電路的側壁。In an embodiment of the present invention, the integrated circuit has a bottom surface close to the substrate, a top surface remote from the substrate, and a sidewall connected between the bottom surface and the top surface, and the pixel definition layer shields the top surface of the integrated circuit and Side wall of integrated circuit.
在本發明的一實施例中,上述的積體電路具有靠近基板的底面、遠離基板的頂面以及連接於底面與頂面之間的側壁,而畫素定義層與積體電路的頂面接觸。In an embodiment of the present invention, the integrated circuit has a bottom surface close to the substrate, a top surface remote from the substrate, and a sidewall connected between the bottom surface and the top surface, and the pixel definition layer is in contact with the top surface of the integrated circuit .
在本發明的一實施例中,上述的積體電路具有接墊,畫素定義層更具有第一開口,畫素定義層的第一開口與積體電路的接墊重疊,而發光二極體顯示器更包括第一連接圖案。部分的第一連接圖案位於畫素定義層的第一開口中,而至少一發光二極體透過第一連接圖案與積體電路的接墊電性連接。In an embodiment of the present invention, the integrated circuit has pads, the pixel definition layer further has a first opening, the first opening of the pixel definition layer overlaps with the pads of the integrated circuit, and the light emitting diode The display further includes a first connection pattern. Part of the first connection pattern is located in the first opening of the pixel definition layer, and at least one light emitting diode is electrically connected to the pad of the integrated circuit through the first connection pattern.
在本發明的一實施例中,上述的畫素定義層具有定義出畫素開口區的側壁,而發光二極體顯示器更包括至少一反射圖案及第一絕緣層。至少一反射圖案設置於畫素定義層的側壁上。第一絕緣層覆蓋至少一發光二極體、至少一反射圖案及畫素定義層,且具有與畫素定義層之第一開口重疊的第二開口。部分的第一連接圖案設置在第一絕緣層上,且位於畫素開口區與第二開口中。In an embodiment of the present invention, the pixel definition layer has a sidewall that defines a pixel opening area, and the light emitting diode display further includes at least one reflection pattern and a first insulation layer. At least one reflection pattern is disposed on a sidewall of the pixel definition layer. The first insulating layer covers at least one light-emitting diode, at least one reflection pattern, and a pixel definition layer, and has a second opening overlapping with the first opening of the pixel definition layer. A part of the first connection pattern is disposed on the first insulation layer and is located in the pixel opening area and the second opening.
在本發明的一實施例中,上述的至少一發光二極體具有發光層、第一電極及第二電極,發光層具有相對的第一側及第二側,基板位於發光層的第一側,第一電極及第二電極位於發光層的第二側,而至少一發光二極體的第一電極透過第一連接圖案與積體電路的接墊電性連接。In an embodiment of the present invention, the at least one light-emitting diode has a light-emitting layer, a first electrode, and a second electrode. The light-emitting layer has opposite first and second sides. The substrate is located on the first side of the light-emitting layer. The first electrode and the second electrode are located on the second side of the light-emitting layer, and the first electrode of at least one light-emitting diode is electrically connected to the pad of the integrated circuit through the first connection pattern.
在本發明的一實施例中,上述的第一絕緣層更具有第三開口,而發光二極體顯示器更包括第二連接圖案及共用導電圖案。第二連接圖案設置於第一絕緣層上,且透過第三開口與至少一發光二極體的第二電極電性連接。共用導電圖案電性連接至第二連接圖案,以與至少一發光二極體的第二電極電性連接。In an embodiment of the present invention, the first insulating layer further has a third opening, and the light emitting diode display further includes a second connection pattern and a common conductive pattern. The second connection pattern is disposed on the first insulating layer, and is electrically connected to the second electrode of the at least one light emitting diode through the third opening. The common conductive pattern is electrically connected to the second connection pattern to be electrically connected to the second electrode of the at least one light emitting diode.
在本發明的一實施例中,上述的發光二極體顯示器更包括第二絕緣層。第二絕緣層覆蓋第一連接圖案、第二連接圖案及第一絕緣層。第二絕緣層具有第四開口,而共用導電圖案透過第四開口與第二連接圖案電性連接。In an embodiment of the present invention, the light-emitting diode display further includes a second insulating layer. The second insulation layer covers the first connection pattern, the second connection pattern, and the first insulation layer. The second insulating layer has a fourth opening, and the common conductive pattern is electrically connected to the second connection pattern through the fourth opening.
在本發明的一實施例中,上述的畫素定義層具有定義出畫素開口區的側壁,而第一連接圖案直接覆蓋畫素定義層的部分側壁。In an embodiment of the present invention, the pixel definition layer has a sidewall that defines a pixel opening area, and the first connection pattern directly covers a part of the sidewall of the pixel definition layer.
在本發明的一實施例中,上述的至少一發光二極體具有發光層、第一電極及第二電極,發光層具有相對的第一側及第二側,基板及第一電極位於發光層的第一側,第二電極位於發光層的第二側,而發光二極體顯示器更包括保護層及共用導電圖案。保護層設置於畫素定義層、第一連接圖案及至少一發光二極體上,且具有與至少一發光二極體之第二電極重疊的第五開口。共用導電圖案設置於保護層上,其中共用導電圖案透過第五開口與至少一發光二極體的第二電極電性連接。In an embodiment of the present invention, the at least one light-emitting diode has a light-emitting layer, a first electrode, and a second electrode. The light-emitting layer has opposite first and second sides. The substrate and the first electrode are located on the light-emitting layer. On the first side, the second electrode is located on the second side of the light emitting layer, and the light emitting diode display further includes a protective layer and a common conductive pattern. The protective layer is disposed on the pixel definition layer, the first connection pattern, and the at least one light emitting diode, and has a fifth opening overlapping the second electrode of the at least one light emitting diode. The common conductive pattern is disposed on the protective layer, and the common conductive pattern is electrically connected to the second electrode of the at least one light emitting diode through the fifth opening.
在本發明的一實施例中,上述的至少一發光二極體具有發光層、第一電極及第二電極,發光層具有相對的第一側及第二側,基板、第一電極及第二電極位於發光層的第一側,而發光二極體顯示器更包括第二連接圖案、保護層及共用導電圖案。第二連接圖案覆蓋畫素定義層的另一部分的側壁,且與至少一發光二極體的第二電極電性連接,其中第一連接圖案與第二連接圖案在結構上分離。保護層覆蓋畫素定義層、第一連接圖案、至少一發光二極體及第二連接圖案,其中保護層具有第六開口。共用導電圖案設置於保護層上,其中共用導電圖案透過第六開口與第二連接圖案電性連接。In an embodiment of the present invention, the at least one light-emitting diode has a light-emitting layer, a first electrode, and a second electrode, the light-emitting layer has opposite first and second sides, a substrate, a first electrode, and a second electrode. The electrode is located on the first side of the light-emitting layer, and the light-emitting diode display further includes a second connection pattern, a protective layer, and a common conductive pattern. The second connection pattern covers the sidewall of another part of the pixel definition layer and is electrically connected to the second electrode of the at least one light-emitting diode, wherein the first connection pattern and the second connection pattern are structurally separated. The protective layer covers the pixel definition layer, the first connection pattern, at least one light-emitting diode, and the second connection pattern, wherein the protection layer has a sixth opening. The common conductive pattern is disposed on the protective layer, and the common conductive pattern is electrically connected to the second connection pattern through the sixth opening.
在本發明的一實施例中,上述的畫素定義層的光學密度值為OD,而3 ≤ OD ≤ 4。In an embodiment of the present invention, the optical density value of the pixel definition layer is OD, and 3 ≤ OD ≤ 4.
在本發明的一實施例中,上述的畫素定義層具有厚度H1,而600 μm ≤ H1 ≤700 μm。In an embodiment of the present invention, the pixel definition layer has a thickness H1, and 600 μm ≦ H1 ≦ 700 μm.
在本發明的一實施例中,上述的畫素定義層的材料包括深色絕緣材料。In an embodiment of the present invention, a material of the pixel definition layer includes a dark insulating material.
基於上述,本發明一實施例的發光二極體顯示器的畫素定義層包覆積體電路。也就是說,用以驅動發光二極體的積體電路係設置在畫素定義層下。藉此,積體電路不易被察覺,而有助於提升發光二極體顯示器的視覺效果。此外,由於積體電路設置在既有之畫素定義層下,因此,發光二極體顯示器不需挪出額外的基板區域(面積)供積體電路設置,而能讓出更多的基板區域(面積)供其它構件(例如:更多的發光二極體)使用,進而提升發光二極體顯示器的性能(例如:解析度、亮度等)。Based on the above, the pixel definition layer of the light-emitting diode display according to an embodiment of the present invention covers the integrated circuit. That is, the integrated circuit for driving the light emitting diode is disposed under the pixel definition layer. As a result, the integrated circuit is difficult to be detected, which helps to improve the visual effect of the light emitting diode display. In addition, since the integrated circuit is arranged under the existing pixel definition layer, the light emitting diode display does not need to move an extra substrate area (area) for the integrated circuit to be set, and can allow more substrate areas. (Area) is used by other components (for example, more light-emitting diodes), thereby improving the performance of the light-emitting diode display (for example, resolution, brightness, etc.).
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above features and advantages of the present invention more comprehensible, embodiments are hereinafter described in detail with reference to the accompanying drawings.
現將詳細地參考本發明的示範性實施例,示範性實施例的實例說明於圖式中。只要有可能,相同元件符號在圖式和描述中用來表示相同或相似部分。Reference will now be made in detail to the exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or like parts.
圖1A至圖1M為本發明一實施例之發光二極體顯示器的製造流程的剖面示意圖。圖2為本發明一實施例之發光二極體顯示器的上視示意圖。特別是,圖1M對應於圖2的剖線A-A’。此外,為清楚表達起見,圖2省略圖1M之黏著層120、反射圖案150及保護層196的繪示。1A to 1M are schematic cross-sectional views illustrating a manufacturing process of a light emitting diode display according to an embodiment of the present invention. FIG. 2 is a schematic top view of a light emitting diode display according to an embodiment of the present invention. In particular, Fig. 1M corresponds to the section line A-A 'of Fig. 2. In addition, for the sake of clarity, FIG. 2 omits the illustration of the adhesive layer 120, the reflective pattern 150, and the protective layer 196 of FIG. 1M.
請參照圖1A,首先,提供基板110。舉例而言,在本實施例中,基板110的材質可以是玻璃、石英、有機聚合物、不透光/反射材料(例如:導電材料、晶圓、陶瓷、或其它可適用的材料)、或是其它可適用的材料。Referring to FIG. 1A, first, a substrate 110 is provided. For example, in this embodiment, the material of the substrate 110 may be glass, quartz, organic polymers, opaque / reflective materials (for example, conductive materials, wafers, ceramics, or other applicable materials), or Are other applicable materials.
請參照圖1B 及圖1C,接著,將積體電路130設置於基板110上。舉例而言,在本實施例中,可先在基板110上形成黏著層120,再將積體電路130設置於黏著層120上,以使積體電路130透過黏著層120固定於基板110上。在本實施例中,黏著層120的材料例如是光阻。然而,本發明不限於此,根據其它實施例,黏著層120也可使用其它適當材料。此外,本發明也不限制積體電路130一定要利用黏著層120固定於基板110上,根據其它實施例,積體電路130也可利用其它方式固定於基板110上。Please refer to FIG. 1B and FIG. 1C. Next, the integrated circuit 130 is disposed on the substrate 110. For example, in this embodiment, the adhesive layer 120 may be formed on the substrate 110 first, and then the integrated circuit 130 is disposed on the adhesive layer 120 so that the integrated circuit 130 is fixed on the substrate 110 through the adhesive layer 120. In this embodiment, the material of the adhesive layer 120 is, for example, a photoresist. However, the present invention is not limited thereto, and other suitable materials may be used for the adhesive layer 120 according to other embodiments. In addition, the present invention does not limit the integrated circuit 130 to be fixed on the substrate 110 by using the adhesive layer 120. According to other embodiments, the integrated circuit 130 may be fixed on the substrate 110 by other methods.
請參照圖1C,在本實施例中,積體電路130具有靠近基板110的底面130a、遠離基板110的頂面130b以及連接於底面130a與頂面130b之間的側壁130c。積體電路130還具有多個接墊132,多個接墊132位於積體電路130的頂面130b。積體電路130用以驅動發光二極體160(繪於圖1M)。在本實施例中,積體電路130係指未經封裝的裸晶(die),但本發明不以此為限。1C, in this embodiment, the integrated circuit 130 has a bottom surface 130a close to the substrate 110, a top surface 130b remote from the substrate 110, and a side wall 130c connected between the bottom surface 130a and the top surface 130b. The integrated circuit 130 further includes a plurality of contact pads 132, and the multiple contact pads 132 are located on the top surface 130 b of the integrated circuit 130. The integrated circuit 130 is used to drive the light emitting diode 160 (illustrated in FIG. 1M). In this embodiment, the integrated circuit 130 refers to an unpackaged die, but the present invention is not limited thereto.
請參照圖1D及圖2,接著,形成預定畫素定義層140’。預定畫素定義層140’具有畫素開口區142。在基板110的一垂直方向z上,畫素開口區142未與積體電路130重疊。畫素開口區142位於積體電路130的面積外。畫素開口區142的邊界係由預定畫素定義層140’的側壁140a所定義。也就是說,積體電路130的側壁130c被預定畫素定義層140’所覆蓋。請參照圖1E,接著,形成反射圖案150,其中反射圖案150設置於預定畫素定義層140’的側壁140a上。反射圖案150用以反射發光二極體160發出的光束(未繪示),以使光束朝指定方向(例如:朝上的方向)出射,進而提升發光二極體顯示器10的亮度。在本實施例中,反射圖案150的材料例如為金屬、合金、其它反射材料或其組合,但本發明不以此為限。1D and FIG. 2, a predetermined pixel definition layer 140 'is formed. The predetermined pixel definition layer 140 'has a pixel opening area 142. In a vertical direction z of the substrate 110, the pixel opening region 142 does not overlap the integrated circuit 130. The pixel opening area 142 is located outside the area of the integrated circuit 130. The boundary of the pixel opening area 142 is defined by the side wall 140a of the predetermined pixel definition layer 140 '. That is, the side wall 130c of the integrated circuit 130 is covered by the predetermined pixel definition layer 140 '. Referring to FIG. 1E, a reflective pattern 150 is formed. The reflective pattern 150 is disposed on a sidewall 140a of a predetermined pixel definition layer 140 '. The reflection pattern 150 is used to reflect a light beam (not shown) emitted by the light emitting diode 160 so that the light beam is emitted in a specified direction (for example, an upward direction), thereby improving the brightness of the light emitting diode display 10. In this embodiment, the material of the reflective pattern 150 is, for example, a metal, an alloy, other reflective materials, or a combination thereof, but the present invention is not limited thereto.
請參照圖1F至圖1I及圖2,接著,將發光二極體160設置於畫素開口區142中,且令發光二極體160與積體電路130電性連接。Please refer to FIG. 1F to FIG. 1I and FIG. 2. Next, the light emitting diode 160 is disposed in the pixel opening area 142, and the light emitting diode 160 is electrically connected to the integrated circuit 130.
請參照圖1F,首先,可提供發光二極體160,發光二極體160包括第一型半導體層161、第二型半導體層162、設置於第一型半導體161與第二型半導體層162之間的發光層163、與第一型半導體層161電性連接的第一電極164以及與第二型半導體層162電性連接的第二電極165。在本實施例中,發光層163具有相對的第一側(例如:下側)及第二側(例如:上側),基板110位於發光層163的第一側(例如:下側),而第一電極164及第二電極165皆位於發光層163的第二側(例如:上側)。換言之,在本實施例中,發光二極體160可以是水平式發光二極體。然而,本發明不限於此,在其它實施例中,發光二極體也可以是其它類型的發光二極體,例如:垂直式發光二極體、覆晶式發光二極體等,以下將於後續段落配合其它圖式舉例說明之。Please refer to FIG. 1F. First, a light emitting diode 160 may be provided. The light emitting diode 160 includes a first type semiconductor layer 161, a second type semiconductor layer 162, and a first type semiconductor layer 161 and a second type semiconductor layer 162. The light emitting layer 163, the first electrode 164 electrically connected to the first type semiconductor layer 161, and the second electrode 165 electrically connected to the second type semiconductor layer 162. In this embodiment, the light emitting layer 163 has a first side (for example, a lower side) and a second side (for example, an upper side) opposite to each other. The substrate 110 is located on the first side (for example, a lower side) of the light emitting layer 163. An electrode 164 and a second electrode 165 are both located on the second side (eg, the upper side) of the light-emitting layer 163. In other words, in this embodiment, the light emitting diode 160 may be a horizontal light emitting diode. However, the present invention is not limited to this. In other embodiments, the light-emitting diode may be other types of light-emitting diodes, such as a vertical light-emitting diode, a flip-chip light-emitting diode, and the like. The subsequent paragraphs are illustrated with other drawings.
請參照圖1F,在本實施例中,接著,可將發光二極體160設置於與畫素開口區142重疊的部分黏著層120上,以使發光二極體160固定在畫素開口區142中。請參照圖1G,接著,形成第一絕緣材料層170’,以覆蓋發光二極體160、反射圖案150及預定畫素定義層140’。在本實施例中,第一絕緣材料層170’係透光。第一絕緣材料層170’的材料可為無機材料(例如:氧化矽、氮化矽、氮氧化矽、或上述至少二種材料的堆疊層)、有機材料或上述之組合。Referring to FIG. 1F, in this embodiment, the light-emitting diode 160 may be disposed on a part of the adhesive layer 120 overlapping the pixel opening region 142, so that the light-emitting diode 160 is fixed in the pixel opening region 142. in. Referring to FIG. 1G, a first insulating material layer 170 'is formed to cover the light emitting diode 160, the reflection pattern 150, and the predetermined pixel definition layer 140'. In this embodiment, the first insulating material layer 170 'is transparent. The material of the first insulating material layer 170 'may be an inorganic material (for example, silicon oxide, silicon nitride, silicon oxynitride, or a stacked layer of at least two materials), an organic material, or a combination thereof.
請參照圖1H,接著,圖案化第一絕緣材料層170’及預定畫素定義層140’,以形成畫素定義層140及第一絕緣層170。畫素定義層140具有第一開口144。第一絕緣層170具有第二開口174、接觸窗176和第三開口178。在基板110的一垂直方向z上,畫素定義層140的第一開口144與積體電路130的接墊132重疊設置,畫素定義層140的第一開口144未與發光二極體160重疊。第一絕緣層170的第二開口174與畫素定義層140的第一開口144重疊。第一絕緣層170的接觸窗176及第一絕緣層170的第三開口178位於畫素開口區142,且分別與發光二極體160的第一電極164及發光二極體160的第二電極165重疊。Referring to FIG. 1H, the first insulating material layer 170 'and the predetermined pixel defining layer 140' are patterned to form the pixel defining layer 140 and the first insulating layer 170. The pixel definition layer 140 has a first opening 144. The first insulating layer 170 has a second opening 174, a contact window 176, and a third opening 178. In a vertical direction z of the substrate 110, the first opening 144 of the pixel definition layer 140 is overlapped with the pad 132 of the integrated circuit 130, and the first opening 144 of the pixel definition layer 140 is not overlapped with the light emitting diode 160 . The second opening 174 of the first insulating layer 170 overlaps the first opening 144 of the pixel definition layer 140. The contact window 176 of the first insulating layer 170 and the third opening 178 of the first insulating layer 170 are located in the pixel opening area 142 and are respectively connected to the first electrode 164 of the light emitting diode 160 and the second electrode of the light emitting diode 160. 165 overlap.
值得注意的是,畫素定義層140包覆積體電路130。在本實施例中,畫素定義層140係完全地遮蔽積體電路130的頂面130b及側壁130c,且與積體電路130的頂面130b及側壁130c接觸。簡言之,在本實施例中,畫素定義層140除了用以定義畫素開口區142外,更可做為封裝積體電路130(例如:裸晶)的材料使用。It is worth noting that the pixel definition layer 140 covers the integrated circuit 130. In this embodiment, the pixel definition layer 140 completely shields the top surface 130 b and the side wall 130 c of the integrated circuit 130 and is in contact with the top surface 130 b and the side wall 130 c of the integrated circuit 130. In short, in this embodiment, in addition to defining the pixel opening area 142, the pixel definition layer 140 can also be used as a material for packaging the integrated circuit 130 (eg, a bare crystal).
畫素定義層140的材質是絕緣材料。舉例而言,在本實施例中,畫素定義層140的材質可以是遮光絕緣材料。遮光絕緣材料的光學密度值可落在3至4的範圍。遮光絕緣材料例如是包括深色絕緣材料,例如:黑色光阻、黑色樹脂或 其它適當材料。然而,本發明不以此為限,在其它實施例中,畫素定義層140的材質也可以是透光絕緣材料,例如:透光光阻、氧化矽、氮化矽、氮氧化矽或其它適當材料。The material of the pixel definition layer 140 is an insulating material. For example, in this embodiment, the material of the pixel definition layer 140 may be a light-shielding insulating material. The optical density value of the light-shielding insulating material may fall in a range of 3 to 4. The light-shielding insulating material includes, for example, a dark-colored insulating material such as black photoresist, black resin, or other suitable materials. However, the present invention is not limited to this. In other embodiments, the material of the pixel definition layer 140 may also be a light-transmitting insulating material, such as: light-transmitting photoresist, silicon oxide, silicon nitride, silicon oxynitride, or other materials. Appropriate materials.
畫素定義層140具有厚度H1,其中畫素定義層140的厚度H1大於積體電路130的高度H2。舉例而言,在本實施例中,畫素定義層140的厚度H1可落在600 μm至700 μm的範圍,但本發明不以此為限。The pixel definition layer 140 has a thickness H1, where the thickness H1 of the pixel definition layer 140 is greater than the height H2 of the integrated circuit 130. For example, in this embodiment, the thickness H1 of the pixel definition layer 140 may fall in the range of 600 μm to 700 μm, but the invention is not limited thereto.
請參照圖1I,接著,在第一絕緣層170上形成第一連接圖案182以及第二連接圖案184。部分的第一連接圖案182位於第一絕緣層170的接觸窗176、第一絕緣層170的第二開口174及畫素定義層140的第一開口144中,而發光二極體160的第一電極164透過第一連接圖案182與積體電路130的接墊132電性連接。部分的第二連接圖案184位於第一絕緣層170的第三開口178中,而與發光二極體160的第二電極165電性連接。在本實施例中,第一連接圖案182及第二連接圖案184例如為透光導電圖案。透光導電圖案的材質例如包括金屬氧化物,例如:銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、銦鍺鋅氧化物、其它合適的氧化物、或者是上述至少二者之堆疊層,但本發明不以此為限。Referring to FIG. 1I, a first connection pattern 182 and a second connection pattern 184 are formed on the first insulating layer 170. Part of the first connection pattern 182 is located in the contact window 176 of the first insulating layer 170, the second opening 174 of the first insulating layer 170, and the first opening 144 of the pixel definition layer 140, and the first of the light emitting diode 160 The electrode 164 is electrically connected to the pad 132 of the integrated circuit 130 through the first connection pattern 182. A portion of the second connection pattern 184 is located in the third opening 178 of the first insulating layer 170 and is electrically connected to the second electrode 165 of the light emitting diode 160. In this embodiment, the first connection pattern 182 and the second connection pattern 184 are, for example, light-transmitting conductive patterns. The material of the transparent conductive pattern includes, for example, metal oxides, such as: indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium germanium zinc oxide, other suitable oxides, or at least the foregoing. Stacked layers of the two, but the invention is not limited thereto.
請參照圖1J,接著,形成第二絕緣材料層190’,以覆蓋第一連接圖案182、第二連接圖案184以及第一絕緣層170。在本實施例中,第二絕緣材料層190’係透光。第二絕緣材料層190’的材料可為無機材料(例如:氧化矽、氮化矽、氮氧化矽、或上述至少二種材料的堆疊層)、有機材料或上述之組合。Referring to FIG. 1J, a second insulating material layer 190 'is formed to cover the first connection pattern 182, the second connection pattern 184, and the first insulation layer 170. In this embodiment, the second insulating material layer 190 'is transparent. The material of the second insulating material layer 190 'may be an inorganic material (for example, silicon oxide, silicon nitride, silicon oxynitride, or a stacked layer of at least two materials), an organic material, or a combination thereof.
請參照圖1J及圖1K,接著,圖案化第二絕緣材料層190’,以形成第二絕緣層190。第二絕緣層190具有第四開口192,其中第四開口192與第二連接圖案184重疊。在本實施例中,第四開口192位於畫素開口區142外,且位於畫素定義層140的上方,但本發明不以此為限。Referring to FIG. 1J and FIG. 1K, the second insulating material layer 190 'is patterned to form a second insulating layer 190. The second insulating layer 190 has a fourth opening 192, wherein the fourth opening 192 overlaps the second connection pattern 184. In this embodiment, the fourth opening 192 is located outside the pixel opening area 142 and is located above the pixel definition layer 140, but the present invention is not limited thereto.
請參照圖1L,接著,於第二絕緣層190上形成共用導電圖案194。共用導電圖案194透過第二絕緣層190的第四開口192與第二連接圖案184電性連接。共用導電圖案194透過第二連接圖案184與發光二極體160的第二電極165電性連接。在本實施例中,共用導電圖案194的材質以選用具有低電阻率的材料為佳,例如:金屬、合金、其它適當材料或其組合。Referring to FIG. 1L, a common conductive pattern 194 is formed on the second insulating layer 190. The common conductive pattern 194 is electrically connected to the second connection pattern 184 through the fourth opening 192 of the second insulating layer 190. The common conductive pattern 194 is electrically connected to the second electrode 165 of the light emitting diode 160 through the second connection pattern 184. In this embodiment, the material of the common conductive pattern 194 is preferably a material with a low resistivity, such as metal, alloy, other suitable materials, or a combination thereof.
在本實施例中,共用導電圖案194例如是遮光導電圖案,共用導電圖案194不與發光二極體160重疊,以免阻擋發光二極體160發出的光束、影響發光二極體顯示器10的亮度。請參照圖1I及圖2,舉例而言,在本實施例中,共用導電圖案194包括多個分支部194a及至少一匯流部194b。分支部194a及匯流部194b皆設置於畫素開口區142外。各分支部194a的延伸方向y與匯流部194b的延伸方向x交錯。各分支部194a配置於相鄰兩行的畫素開口區142之間,且與匯流部194b電性連接。然而,本發明不限於此,根據其它實施例,遮光的共用導電圖案194也可設計為其它適當圖形。此外,本發明也不限制共用導電圖案194一定要是遮光導電圖案,在其它實施例中,共用導電圖案194也可以是透光導電圖案。In this embodiment, the common conductive pattern 194 is, for example, a light-shielding conductive pattern, and the common conductive pattern 194 does not overlap the light-emitting diode 160, so as not to block the light beam emitted by the light-emitting diode 160 and affect the brightness of the light-emitting diode display 10. Please refer to FIGS. 1I and 2. For example, in this embodiment, the common conductive pattern 194 includes a plurality of branch portions 194 a and at least one busing portion 194 b. Both the branch portion 194a and the confluence portion 194b are disposed outside the pixel opening area 142. The extension direction y of each branch portion 194a and the extension direction x of the confluence portion 194b are staggered. Each branch portion 194a is disposed between the pixel opening regions 142 of two adjacent rows, and is electrically connected to the bus portion 194b. However, the present invention is not limited thereto, and according to other embodiments, the light-shielding common conductive pattern 194 may also be designed as other appropriate patterns. In addition, the present invention does not limit the common conductive pattern 194 to be a light-shielding conductive pattern. In other embodiments, the common conductive pattern 194 may be a light-transmitting conductive pattern.
請參照圖1M,接著,形成保護層196,以覆蓋共用導電圖案194及第二絕緣層190。於此,便完成了本實施例之發光二極體顯示器10。Referring to FIG. 1M, a protective layer 196 is formed to cover the common conductive pattern 194 and the second insulating layer 190. Here, the light-emitting diode display 10 of this embodiment is completed.
值得注意的是,發光二極體顯示器的畫素定義層140包覆積體電路130。也就是說,用以驅動發光二極體160的積體電路130係設置在畫素定義層140下。藉此,積體電路130不易被察覺,而有助於提升發光二極體顯示器10的視覺效果。此外,由於積體電路130係設置在既有之畫素定義層140下,因此,發光二極體顯示器10不需挪出額外的基板區域(面積)供積體電路130設置,而能讓出更多的基板區域(面積)供其它構件(例如:更多的發光二極體)使用,進而提升發光二極體顯示器10的性能(例如:解析度、亮度等)。再者,利用既有的畫素定義層140包覆(或者說,封裝)積體電路130,能省略積體電路130的封裝製程,且不增加發光二極體顯示器10的製程複雜度。It is worth noting that the pixel definition layer 140 of the light emitting diode display covers the integrated circuit 130. That is, the integrated circuit 130 for driving the light emitting diode 160 is disposed under the pixel definition layer 140. As a result, the integrated circuit 130 is difficult to be detected, which helps to improve the visual effect of the light emitting diode display 10. In addition, since the integrated circuit 130 is disposed under the existing pixel definition layer 140, the light-emitting diode display 10 does not need to move an extra substrate area (area) for the integrated circuit 130 to be installed, and allows the integrated circuit 130 to be provided. More substrate areas (areas) are used by other components (for example, more light-emitting diodes), thereby improving the performance (for example, resolution, brightness, etc.) of the light-emitting diode display 10. In addition, by using the existing pixel definition layer 140 to cover (or package) the integrated circuit 130, the packaging process of the integrated circuit 130 can be omitted, and the manufacturing complexity of the light emitting diode display 10 is not increased.
圖3為本發明另一實施例之發光二極體顯示器的上視示意圖。圖3的發光二極體顯示器10A與圖2的發光二極體顯示器10類似,兩者的差異在於:圖3之發光二極體顯示器10A的同一畫素開口142中可設置多個發光二極體160。請參照圖3,位於同一畫素開口142中的多個發光二極體160與積體電路130的同一接墊132電性連接。藉此,位於畫素開口區142的其中一個發光二極體160失效時,位於所述畫素開口142的另一發光二極體160仍可正常發光,而使發光二極體顯示器10A維持顯示功能。FIG. 3 is a schematic top view of a light emitting diode display according to another embodiment of the present invention. The light-emitting diode display 10A of FIG. 3 is similar to the light-emitting diode display 10 of FIG. 2. The difference between the two is that multiple light-emitting diodes can be disposed in the same pixel opening 142 of the light-emitting diode display 10A of FIG. 3.体 160。 Body 160. Referring to FIG. 3, a plurality of light emitting diodes 160 located in the same pixel opening 142 are electrically connected to a same pad 132 of the integrated circuit 130. Therefore, when one of the light emitting diodes 160 located in the pixel opening area 142 fails, the other light emitting diode 160 located in the pixel opening 142 can still emit light normally, so that the light emitting diode display 10A maintains the display. Features.
圖4A至圖4K為本發明又一實施例之發光二極體顯示器的製造流程的剖面示意圖。圖4A至圖4K的發光二極體顯示器10B的製造流程與圖1A至圖1M的發光二極體顯示器10的製造流程相似,兩者主要的差異在於:發光二極體顯示器10的發光二極體160為水平式發光二極體,而發光二極體顯示器10B的發光二極體160B為垂直式發光二極體。詳述本實施例之發光二極體顯示器10B的製造流程如下。4A to 4K are schematic cross-sectional views illustrating a manufacturing process of a light emitting diode display according to another embodiment of the present invention. The manufacturing process of the light-emitting diode display 10B of FIGS. 4A to 4K is similar to the manufacturing process of the light-emitting diode display 10 of FIGS. 1A to 1M. The main difference between the two is that the light-emitting diode of the light-emitting diode display 10 is different. The body 160 is a horizontal light-emitting diode, and the light-emitting diode 160B of the light-emitting diode display 10B is a vertical light-emitting diode. The manufacturing process of the light emitting diode display 10B of this embodiment is described in detail as follows.
請參照圖4A,首先,提供基板110。請參照圖4B 及圖4C,接著,將積體電路130設置於基板110上。在本實施例中,可先在基板110上形成黏著層120,再將積體電路130設置於黏著層120上,以使積體電路130固定於基板110上。Referring to FIG. 4A, first, a substrate 110 is provided. Please refer to FIGS. 4B and 4C. Next, the integrated circuit 130 is disposed on the substrate 110. In this embodiment, the adhesive layer 120 may be formed on the substrate 110 first, and then the integrated circuit 130 is disposed on the adhesive layer 120 to fix the integrated circuit 130 on the substrate 110.
請參照圖4D,接著,形成預定畫素定義層140’。預定畫素定義層140’具有發光二極體顯示器10B的畫素開口區142。在基板110的一垂直方向z上,畫素開口區142未與積體電路130重疊。畫素開口區142位於積體電路130的面積以外。請參照圖4D及圖4E,接著,圖案化預定畫素定義層140’,以形成畫素定義層140。畫素定義層140具有第一開口144。在基板110的一垂直方向z上,畫素定義層140的第一開口144與積體電路130的接墊132重疊,畫素定義層140的第一開口144未與發光二極體160B(繪於圖4G)重疊。Referring to FIG. 4D, a predetermined pixel definition layer 140 'is formed. The predetermined pixel definition layer 140 'has a pixel opening area 142 of the light emitting diode display 10B. In a vertical direction z of the substrate 110, the pixel opening region 142 does not overlap the integrated circuit 130. The pixel opening area 142 is located outside the area of the integrated circuit 130. Referring to FIG. 4D and FIG. 4E, the predetermined pixel definition layer 140 'is patterned to form the pixel definition layer 140. The pixel definition layer 140 has a first opening 144. In a vertical direction z of the substrate 110, the first opening 144 of the pixel definition layer 140 overlaps with the pad 132 of the integrated circuit 130, and the first opening 144 of the pixel definition layer 140 does not overlap with the light emitting diode 160B (drawing (Figure 4G) overlap.
請參照圖4F,接著,在畫素定義層140上形成第一連接圖案182B。第一連接圖案182B透過畫素定義層140的第一開口144與積體電路130的接墊132電性連接。在本實施例中,第一連接圖案182B可直接覆蓋畫素定義層140的部分側壁140a。第一連接圖案182B除了用以電性連接積體電路130的接墊132與發光二極體160B(繪於圖4G)的第一電極164外,第一連接圖案182B還能反射發光二極體160B發出的光束(未繪示),以使光束朝指定方向(例如:朝上的方向)出射。Referring to FIG. 4F, a first connection pattern 182B is formed on the pixel definition layer 140. The first connection pattern 182B is electrically connected to the pads 132 of the integrated circuit 130 through the first opening 144 of the pixel definition layer 140. In this embodiment, the first connection pattern 182B may directly cover a part of the sidewall 140 a of the pixel definition layer 140. In addition to the first connection pattern 182B used to electrically connect the pad 132 of the integrated circuit 130 and the first electrode 164 of the light emitting diode 160B (illustrated in FIG. 4G), the first connection pattern 182B can also reflect the light emitting diode. A light beam (not shown) emitted by 160B, so that the light beam is emitted in a specified direction (for example, an upward direction).
請參照圖4F,在本實施例中,於形成第一連接圖案182B時,還可同時於畫素定義層140之另一部分的側壁140a上形成反射圖案150B。在本實施例中,第一連接圖案182B與反射圖案150B可形成於同一膜層,且彼此電性隔離。在本實施例中,反射圖案150B可直接覆蓋畫素定義層140之另一部分的側壁140a。反射圖案150B能反射發光二極體160B發出的光束(未繪示),以使光束朝指定方向(例如:朝上的方向)出射。Please refer to FIG. 4F. In this embodiment, when the first connection pattern 182B is formed, a reflection pattern 150B may also be formed on the side wall 140a of another part of the pixel definition layer 140 at the same time. In this embodiment, the first connection pattern 182B and the reflection pattern 150B may be formed on the same film layer and electrically isolated from each other. In this embodiment, the reflection pattern 150B may directly cover the sidewall 140 a of another portion of the pixel definition layer 140. The reflection pattern 150B can reflect a light beam (not shown) emitted by the light emitting diode 160B, so that the light beam is emitted in a specified direction (for example, an upward direction).
請參照圖4G,接著,將發光二極體160B設置於畫素定義層140的畫素開口區142中,且令發光二極體160B與積體電路130電性連接。發光二極體160B包括第一型半導體層161、第二型半導體層162、設置於第一型半導體161與第二型半導體層162之間的發光層163、與第一型半導體層161電性連接的第一電極164以及與第二型半導體層162電性連接的第二電極165。在本實施例中,發光層163具有相對的第一側(例如:下側)及第二側(例如:上側),基板110位於發光層163的第一側(例如:下側),而第一電極164及第二電極165分別位於發光層163的第一側(例如:下側)及發光層163的第二側(例如:上側)。換言之,本實施例的發光二極體160B是垂直式發光二極體。Please refer to FIG. 4G. Next, the light emitting diode 160B is disposed in the pixel opening region 142 of the pixel definition layer 140, and the light emitting diode 160B and the integrated circuit 130 are electrically connected. The light emitting diode 160B includes a first type semiconductor layer 161, a second type semiconductor layer 162, a light emitting layer 163 disposed between the first type semiconductor 161 and the second type semiconductor layer 162, and the first type semiconductor layer 161 is electrically conductive. The connected first electrode 164 and the second electrode 165 electrically connected to the second-type semiconductor layer 162. In this embodiment, the light emitting layer 163 has a first side (for example, a lower side) and a second side (for example, an upper side) opposite to each other. The substrate 110 is located on the first side (for example, a lower side) of the light emitting layer 163. An electrode 164 and a second electrode 165 are respectively located on a first side (eg, a lower side) of the light emitting layer 163 and a second side (eg, an upper side) of the light emitting layer 163. In other words, the light emitting diode 160B of this embodiment is a vertical light emitting diode.
在本實施例中,可將發光二極體160B設置在位於畫素開口區142內的部分第一連接圖案182B上。發光二極體160B的第一電極164與第一連接圖案182B電性連接。發光二極體160B的第一電極164可透過第一連接圖案182B與積體電路130的接墊132電性連接。In this embodiment, the light emitting diode 160B may be disposed on a part of the first connection pattern 182B located in the pixel opening region 142. The first electrode 164 of the light emitting diode 160B is electrically connected to the first connection pattern 182B. The first electrode 164 of the light emitting diode 160B can be electrically connected to the pad 132 of the integrated circuit 130 through the first connection pattern 182B.
請參照圖4H,接著,形成保護材料層197’,以覆蓋畫素定義層140、第一連接圖案182B、反射圖案150B及發光二極體160B。請參照圖4H及圖4I,接著,圖案化保護材料層197’,以形成保護層197。保護層197具有第五開口197a。保護層197的第五開口197a與發光二極體160B之第二電極165重疊。Referring to FIG. 4H, a protective material layer 197 'is formed to cover the pixel definition layer 140, the first connection pattern 182B, the reflection pattern 150B, and the light emitting diode 160B. Referring to FIG. 4H and FIG. 4I, a protective material layer 197 'is patterned to form a protective layer 197. The protective layer 197 has a fifth opening 197a. The fifth opening 197a of the protective layer 197 overlaps the second electrode 165 of the light emitting diode 160B.
請參照圖4J,接著,在保護層197上形成共用導電圖案194B。共用導電圖案194B透過保護層197的第五開口197a與發光二極體160B的第二電極165電性連接。舉例而言,在本實施例中,共用導電圖案194B包括與發光二極體160B重疊的透明導電圖案,但本發明不以此為限。請參照圖4K,接著,形成保護層196,以覆蓋共用導電圖案194B及保護層197。於此,便完成了本實施例之發光二極體顯示器10B。發光二極體顯示器10B具有與前述之發光二極體顯示器10類似的功效及優點,於此便不再重述。Referring to FIG. 4J, a common conductive pattern 194B is formed on the protective layer 197. The common conductive pattern 194B is electrically connected to the second electrode 165 of the light emitting diode 160B through the fifth opening 197 a of the protective layer 197. For example, in this embodiment, the common conductive pattern 194B includes a transparent conductive pattern overlapping the light emitting diode 160B, but the present invention is not limited thereto. Referring to FIG. 4K, a protective layer 196 is formed to cover the common conductive pattern 194B and the protective layer 197. At this point, the light-emitting diode display 10B of this embodiment is completed. The light-emitting diode display 10B has similar effects and advantages as the aforementioned light-emitting diode display 10, and will not be repeated here.
圖5A至圖5L為本發明再一實施例之發光二極體顯示器的製造流程的剖面示意圖。圖5A至圖5L的發光二極體顯示器10C的製造流程與圖1A至圖1M的發光二極體顯示器10的製造流程相似,兩者主要的差異在於:發光二極體顯示器10的發光二極體160為水平式發光二極體,而發光二極體顯示器10C的發光二極體160C覆晶式發光二極體。詳述本實施例之發光二極體顯示器10C的製造流程如下。5A to 5L are schematic cross-sectional views illustrating a manufacturing process of a light emitting diode display according to another embodiment of the present invention. The manufacturing process of the light emitting diode display 10C of FIGS. 5A to 5L is similar to the manufacturing process of the light emitting diode display 10 of FIGS. 1A to 1M. The main difference between the two is that the light emitting diode of the light emitting diode display 10 The body 160 is a horizontal light-emitting diode, and the light-emitting diode 160C of the light-emitting diode display 10C is a flip-chip light-emitting diode. The manufacturing process of the light emitting diode display 10C of this embodiment is described in detail as follows.
請參照圖5A,首先,提供基板110。請參照圖5B 及圖5C,接著,將積體電路130設置於基板110上。在本實施例中,可先在基板110上形成黏著層120,再將積體電路130設置於黏著層120上,以使積體電路130固定於基板110上。Referring to FIG. 5A, first, a substrate 110 is provided. Please refer to FIGS. 5B and 5C. Next, the integrated circuit 130 is disposed on the substrate 110. In this embodiment, the adhesive layer 120 may be formed on the substrate 110 first, and then the integrated circuit 130 is disposed on the adhesive layer 120 to fix the integrated circuit 130 on the substrate 110.
請參照圖5D,接著,形成預定畫素定義層140’。預定畫素定義層140’具有發光二極體顯示器10C的畫素開口區142。在基板110的一垂直方向z上,畫素開口區142未與積體電路130重疊。畫素開口區142位於積體電路130的面積以外。請參照圖5D及圖5E,接著,圖案化預定畫素定義層140’,以形成畫素定義層140。畫素定義層140具有第一開口144。畫素定義層140的第一開口144位於發光二極體160C(繪於圖5H)的面積以外且與積體電路130的接墊132重疊。Referring to FIG. 5D, a predetermined pixel definition layer 140 'is formed. The predetermined pixel definition layer 140 'has a pixel opening area 142 of the light emitting diode display 10C. In a vertical direction z of the substrate 110, the pixel opening region 142 does not overlap the integrated circuit 130. The pixel opening area 142 is located outside the area of the integrated circuit 130. Referring to FIG. 5D and FIG. 5E, the predetermined pixel definition layer 140 'is patterned to form the pixel definition layer 140. The pixel definition layer 140 has a first opening 144. The first opening 144 of the pixel definition layer 140 is located outside the area of the light emitting diode 160C (illustrated in FIG. 5H) and overlaps the pad 132 of the integrated circuit 130.
請參照圖5F,接著,在畫素定義層140上形成第一連接圖案182C及第二連接圖案184C。第一連接圖案182C與第二連接圖案184C在結構上分離,且分別覆蓋畫素定義層140的相對兩側壁140a。第一連接圖案182C透過畫素定義層140的第一開口144與積體電路130的接墊132電性連接。Referring to FIG. 5F, a first connection pattern 182C and a second connection pattern 184C are formed on the pixel definition layer 140. The first connection pattern 182C and the second connection pattern 184C are structurally separated, and respectively cover two opposite sidewalls 140 a of the pixel definition layer 140. The first connection pattern 182C is electrically connected to the pads 132 of the integrated circuit 130 through the first opening 144 of the pixel definition layer 140.
請參照圖5G至圖5H,接著,將發光二極體160C設置於畫素定義層140的畫素開口區142中,且令發光二極體160C與積體電路130電性連接。舉例而言,如圖5G所示,在本實施例中,可在位於畫素開口區142內的部分第一連接圖案182C及位於畫素開口區142內的部分第二連接圖案184C上分別形成導電膠198a及導電膠198b;接著,將發光二極體160C設置在位於畫素開口區142內的第一連接圖案182C及第二連接圖案184C上,以使發光二極體160C的第一電極164與第二電極165透過導電膠198a及導電膠198b分別與第一連接圖案182C及第二連接圖案184C電性連接。Please refer to FIG. 5G to FIG. 5H. Next, the light emitting diode 160C is set in the pixel opening area 142 of the pixel definition layer 140, and the light emitting diode 160C is electrically connected to the integrated circuit 130. For example, as shown in FIG. 5G, in this embodiment, portions of the first connection pattern 182C located in the pixel opening region 142 and portions of the second connection pattern 184C located in the pixel opening region 142 may be formed respectively. Conductive paste 198a and conductive paste 198b; then, the light emitting diode 160C is disposed on the first connection pattern 182C and the second connection pattern 184C located in the pixel opening area 142, so that the first electrode of the light emitting diode 160C 164 and the second electrode 165 are electrically connected to the first connection pattern 182C and the second connection pattern 184C through the conductive adhesive 198a and the conductive adhesive 198b, respectively.
請參照圖5H,發光二極體160C包括第一型半導體層161、第二型半導體層162、設置於第一型半導體161與第二型半導體層162之間的發光層163、與第一型半導體層161電性連接的第一電極164以及與第二型半導體層162電性連接的第二電極165。在本實施例中,第二型半導體層162具有相對的第一側(例如:下側)及第二側(例如:上側),基板110、第一電極164及第二電極165位於第二型半導體層162的第一側(例如:下側)。換言之,在本實施例中,發光二極體160C為覆晶式發光二極體。5H, the light emitting diode 160C includes a first type semiconductor layer 161, a second type semiconductor layer 162, a light emitting layer 163 disposed between the first type semiconductor 161 and the second type semiconductor layer 162, and a first type The first electrode 164 electrically connected to the semiconductor layer 161 and the second electrode 165 electrically connected to the second-type semiconductor layer 162. In this embodiment, the second type semiconductor layer 162 has a first side (eg, a lower side) and a second side (eg, an upper side) opposite to each other, and the substrate 110, the first electrode 164, and the second electrode 165 are located on the second type. A first side (eg, a lower side) of the semiconductor layer 162. In other words, in this embodiment, the light emitting diode 160C is a flip-chip light emitting diode.
請參照圖5I,接著,形成保護材料層199’,以覆蓋畫素定義層140、第一連接圖案182C、第二連接圖案184C及發光二極體160C。請參照圖5I及圖5J,接著,圖案化保護材料層199’,以形成保護層199。保護層199具有第六開口199a。第六開口199a與第二連接圖案184C重疊。在本實施例中,第六開口199a可位於畫素開口區142外,但本發明不以此為限。Referring to FIG. 5I, a protective material layer 199 'is formed to cover the pixel definition layer 140, the first connection pattern 182C, the second connection pattern 184C, and the light emitting diode 160C. Referring to FIG. 5I and FIG. 5J, a protective material layer 199 'is patterned to form a protective layer 199. The protective layer 199 has a sixth opening 199a. The sixth opening 199a overlaps the second connection pattern 184C. In this embodiment, the sixth opening 199a may be located outside the pixel opening area 142, but the present invention is not limited thereto.
請參照圖5K,接著,在保護層199上形成共用導電圖案194C。共用導電圖案194C透過保護層199的第六開口199a與第二連接圖案184C電性連接。第二連接圖案184C電性連接於共用導電圖案194C與發光二極體160C的第二電極165之間。在本實施例中,第一連接圖案182C用以電性連接積體電路130與發光二極體160C的第一電極164,第二連接圖案184C用以電性發光二極體160C的第二電極165與共用導電圖案194C;除此之外,第一連接圖案182C及第二連接圖案184C還能反射發光二極體160C發出的光束,以使光束朝指定方向出射,進而提升發光二極體顯示器10C的亮度。Referring to FIG. 5K, a common conductive pattern 194C is formed on the protective layer 199. The common conductive pattern 194C is electrically connected to the second connection pattern 184C through the sixth opening 199a of the protective layer 199. The second connection pattern 184C is electrically connected between the common conductive pattern 194C and the second electrode 165 of the light emitting diode 160C. In this embodiment, the first connection pattern 182C is used to electrically connect the integrated circuit 130 and the first electrode 164 of the light emitting diode 160C, and the second connection pattern 184C is used to electrically connect the second electrode of the light emitting diode 160C. 165 and the common conductive pattern 194C; in addition, the first connection pattern 182C and the second connection pattern 184C can also reflect the light beam emitted by the light emitting diode 160C, so that the light beam is emitted in a specified direction, thereby improving the light emitting diode display. 10C brightness.
請參照圖5L,接著,形成保護層196,以覆蓋共用導電圖案194C及保護層199。於此,便完成了本實施例之發光二極體顯示器10C。發光二極體顯示器10C具有與前述之發光二極體顯示器10類似的功效及優點,於此便不再重述。Referring to FIG. 5L, a protective layer 196 is formed to cover the common conductive pattern 194C and the protective layer 199. At this point, the light-emitting diode display 10C of this embodiment is completed. The light-emitting diode display 10C has similar functions and advantages as the aforementioned light-emitting diode display 10, and will not be repeated here.
綜上所述,本發明一實施例的發光二極體顯示器的畫素定義層包覆積體電路。也就是說,用以驅動發光二極體的積體電路係設置在畫素定義層下。藉此,積體電路不易被察覺,而有助於提升發光二極體顯示器的視覺效果。此外,由於積體電路設置在既有之畫素定義層下,因此,發光二極體顯示器不需挪出額外的基板區域(面積)供積體電路設置,而能讓出更多的基板區域(面積)供其它構件(例如:更多的發光二極體)使用,進而提升發光二極體顯示器的性能(例如:解析度、亮度等)。再者,利用既有的畫素定義層包覆(或者說,封裝)積體電路,能省略一般之積體電路的封裝製程,且不增加發光二極體顯示器的製程複雜度。In summary, the pixel definition layer of the light-emitting diode display according to an embodiment of the present invention covers the integrated circuit. That is, the integrated circuit for driving the light emitting diode is disposed under the pixel definition layer. As a result, the integrated circuit is difficult to be detected, which helps to improve the visual effect of the light emitting diode display. In addition, since the integrated circuit is arranged under the existing pixel definition layer, the light emitting diode display does not need to move an extra substrate area (area) for the integrated circuit to be set, and can allow more substrate areas. (Area) is used by other components (for example, more light-emitting diodes), thereby improving the performance of the light-emitting diode display (for example, resolution, brightness, etc.). In addition, by using the existing pixel definition layer to cover (or package) the integrated circuit, the packaging process of the general integrated circuit can be omitted, and the manufacturing complexity of the light emitting diode display is not increased.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed as above with the examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some modifications and retouching without departing from the spirit and scope of the present invention. The protection scope of the present invention shall be determined by the scope of the attached patent application.
10、10A、10B、10C‧‧‧發光二極體顯示器10, 10A, 10B, 10C ‧‧‧ LED display
110‧‧‧基板 110‧‧‧ substrate
120‧‧‧黏著層 120‧‧‧ Adhesive layer
130‧‧‧積體電路 130‧‧‧Integrated Circuit
130a‧‧‧底面 130a‧‧‧ Underside
130b‧‧‧頂面 130b‧‧‧Top
130c、140a‧‧‧側壁 130c, 140a‧‧‧ sidewall
132‧‧‧接墊 132‧‧‧ pad
140’‧‧‧預定畫素定義層 140’‧‧‧ predetermined pixel definition layer
140‧‧‧畫素定義層 140‧‧‧ pixel definition layer
142‧‧‧畫素開口區 142‧‧‧Pixel open area
144‧‧‧第一開口 144‧‧‧First opening
150、150B‧‧‧反射圖案 150, 150B‧‧‧Reflection pattern
160、160B、160C‧‧‧發光二極體 160, 160B, 160C‧‧‧ Light-emitting diodes
161‧‧‧第一型半導體層 161‧‧‧The first type semiconductor layer
162‧‧‧第二型半導體層 162‧‧‧Second type semiconductor layer
163‧‧‧發光層 163‧‧‧Light-emitting layer
164‧‧‧第一電極 164‧‧‧First electrode
165‧‧‧第二電極 165‧‧‧Second electrode
170’‧‧‧第一絕緣材料層 170’‧‧‧first insulating material layer
170‧‧‧第一絕緣層 170‧‧‧The first insulation layer
174‧‧‧第二開口 174‧‧‧Second Opening
176‧‧‧接觸窗 176‧‧‧Contact window
178‧‧‧第三開口 178‧‧‧ third opening
182、182B、182C‧‧‧第一連接圖案 182, 182B, 182C‧‧‧First connection pattern
184、184B‧‧‧第二連接圖案 184, 184B‧‧‧Second connection pattern
190’‧‧‧第二絕緣材料層 190’‧‧‧second insulating material layer
190‧‧‧第二絕緣層 190‧‧‧Second insulation layer
192‧‧‧第四開口 192‧‧‧ Fourth opening
194、194B、194C‧‧‧共用導電圖案 194, 194B, 194C‧‧‧ Shared conductive pattern
194a‧‧‧分支部 194a‧‧‧ branch
194b‧‧‧匯流部 194b‧‧‧Confluence Department
196、197、199‧‧‧保護層 196, 197, 199‧‧‧ protective layer
199’‧‧‧保護材料層 199’‧‧‧ protective material layer
197a‧‧‧第五開口 197a‧‧‧Fifth opening
198a、198b‧‧‧導電膠 198a, 198b‧‧‧ conductive adhesive
199a‧‧‧第六開口 199a‧‧‧Sixth opening
A-A’‧‧‧剖線 A-A’‧‧‧ hatched
H1‧‧‧厚度 H1‧‧‧thickness
H2‧‧‧高度 H2‧‧‧ height
x、y、z‧‧‧方向 x, y, z‧‧‧ directions
圖1A至圖1M為本發明一實施例之發光二極體顯示器的製造流程的剖面示意圖。 圖2為本發明一實施例之發光二極體顯示器的上視示意圖。 圖3為本發明另一實施例之發光二極體顯示器的上視示意圖。 圖4A至圖4K為本發明又一實施例之發光二極體顯示器的製造流程的剖面示意圖。 圖5A至圖5L為本發明再一實施例之發光二極體顯示器的製造流程的剖面示意圖1A to 1M are schematic cross-sectional views illustrating a manufacturing process of a light emitting diode display according to an embodiment of the present invention. FIG. 2 is a schematic top view of a light emitting diode display according to an embodiment of the present invention. FIG. 3 is a schematic top view of a light emitting diode display according to another embodiment of the present invention. 4A to 4K are schematic cross-sectional views illustrating a manufacturing process of a light emitting diode display according to another embodiment of the present invention. 5A to 5L are schematic cross-sectional views illustrating a manufacturing process of a light emitting diode display according to another embodiment of the present invention.
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