TWI659181B - Exhaust treatment device - Google Patents
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Abstract
提供一種可對含有氫及氨之排氣以有效率之方式進行處理之排氣處理裝置。 Provided is an exhaust gas treatment device capable of treating an exhaust gas containing hydrogen and ammonia in an efficient manner.
排氣處理裝置係具備有：第1氫濃度測量手段13，其對含有氫及氨之排氣中之氫濃度進行測量；第2氫濃度測量手段16，其在該第1氫濃度測量手段之下游側，對排氣中之氫濃度進行測量；及燃燒式除害裝置12，其設置在第2氫濃度測量手段之下游側；並且在第1氫濃度測量手段與第2氫濃度測量手段之間，具備有氫添加手段，該氫添加手段係當利用第1氫濃度測量手段所測出之第1氫濃度成為第1氫濃度設定值以下時，開始對排氣添加氫，當利用第2氫濃度測量手段所測出之第2氫濃度成為第2氫濃度設定值以上時，結束對排氣添加氫。 The exhaust gas treatment device is provided with a first hydrogen concentration measuring means 13 that measures the hydrogen concentration in the exhaust gas containing hydrogen and ammonia, and a second hydrogen concentration measuring means 16 that is based on the first hydrogen concentration measuring means The downstream side measures the hydrogen concentration in the exhaust gas; and the combustion-type detoxification device 12 is provided downstream of the second hydrogen concentration measuring means; and on the downstream side of the first hydrogen concentration measuring means and the second hydrogen concentration measuring means There is also a means for adding hydrogen. When the first hydrogen concentration measured by the first hydrogen concentration measuring means becomes equal to or lower than the first hydrogen concentration setting value, hydrogen is added to the exhaust gas. When the second hydrogen concentration measured by the hydrogen concentration measuring means becomes equal to or higher than the second hydrogen concentration setting value, the addition of hydrogen to the exhaust gas is ended.
Description
本發明係關於排氣處理裝置，詳細而言，關於一種用以對自元件製造裝置中排出之含有氫及氨的排氣進行處理之裝置，該元件製造裝置係對半導體、液晶、太陽能發電板、LED等之電子元件進行成膜處理。 The present invention relates to an exhaust gas processing device, and in particular, to a device for processing exhaust gas containing hydrogen and ammonia discharged from a device manufacturing device, which is used for semiconductor, liquid crystal, and solar power generation panels. , LED and other electronic components for film formation.
用以製造半導體、液晶、太陽能發電板、LED等之電子元件之程序中，具有對含有像氫及氨那樣在寬濃度範圍具有可燃性之成份的排氣進行排放之情況。作為對含有氫及氨之排氣進行處理之方法，已知一種自外部導入空氣而與排氣混合，將可燃性成份之濃度稀釋至低於爆發下限後，以濕式洗滌塔(wet scrubber)對有毒成份即氨進行吸收處理之方法(例如，參照專利文獻1)。此外，還已知一種使用燃燒式除害裝置，一方面監視排氣之流量一方面對氫及氨進行燃燒處理之方法(例如，參照專利文獻2)。 In the process for manufacturing electronic components such as semiconductors, liquid crystals, solar power panels, LEDs, etc., there is a case where exhaust gas containing components that are flammable in a wide concentration range, such as hydrogen and ammonia, is emitted. As a method for treating an exhaust gas containing hydrogen and ammonia, a method is known in which air is introduced from the outside and mixed with the exhaust gas, and the concentration of the flammable component is diluted below the lower explosive limit, and then a wet scrubber is used. A method for absorbing ammonia, which is a toxic component (for example, refer to Patent Document 1). In addition, a method of using a combustion type detoxification device to monitor the flow rate of exhaust gas and perform combustion treatment of hydrogen and ammonia is also known (for example, refer to Patent Document 2).
專利文獻1：日本專利第3352476號公報 Patent Document 1: Japanese Patent No. 3352476
專利文獻2：日本專利第4690597號公報 Patent Document 2: Japanese Patent No. 4690597
然而，專利文獻1所記載之方法中，由於自外部導入大量之空氣，因而存在有濕式洗滌塔中之排氣的處理量增大，以致濕式洗滌塔變得大型化之問題，並且，由於大量產生含有氨之廢鹼水，因而還有廢液處理費用增高之問題。此外，專利文獻2所記載之方法中，雖有對排氣之流量進行監視，但由於是在無與排氣中之氨及濃度相關的資訊之狀態下進行運轉，因而需要對燃燒式除害裝置供給過剩之燃料量，從而有運轉成本增高之問題。 However, in the method described in Patent Document 1, since a large amount of air is introduced from the outside, there is a problem that the treatment amount of exhaust gas in the wet scrubbing tower increases, so that the wet scrubbing tower becomes large in size. Since a large amount of waste alkaline water containing ammonia is generated, there is also a problem that the waste liquid treatment cost increases. In addition, in the method described in Patent Document 2, although the flow rate of the exhaust gas is monitored, the operation is performed without the information about the ammonia and the concentration in the exhaust gas, so it is necessary to eliminate the combustion type. The device supplies an excessive amount of fuel, so that there is a problem that the operating cost increases.
因此，本發明之目的在於，提供一種可對含有氫及氨之排氣以有效率之方式進行處理之排氣處理裝置。 Therefore, an object of the present invention is to provide an exhaust gas treatment device capable of efficiently treating exhaust gas containing hydrogen and ammonia.
為了達成上述目的，本發明之排氣處理裝置，係為對含有氫及氨之排氣進行處理者，其特徵在於具備有：第1氫濃度測量手段，其對上述排氣中之氫濃度進行測量；第2氫濃度測量手段，其在該第1氫濃度測量手段之下游側，對上述排氣中之氫濃度進行測量；及燃燒式除害裝置，其設置在上述第2氫濃度測量手段之下游側；並且在上述第1氫濃度測量手段與上述第2氫濃度測量手段之間，具備有氫添加手段，該氫添加手段係當利用上述第1氫濃度測量手段所測出之第1氫濃度成為預先所設定之第1氫濃度設定值以下時，開始對上述排氣添加氫，當利用上述第2氫濃度測量手段所測出之第2氫濃度成為預先所設定之第2氫濃度設定值以上時，結束對上述排氣添加氫。 In order to achieve the above object, the exhaust gas treatment device of the present invention is a person treating an exhaust gas containing hydrogen and ammonia, and is characterized by including a first hydrogen concentration measuring means for measuring the hydrogen concentration in the exhaust gas. Measurement; a second hydrogen concentration measuring means for measuring the hydrogen concentration in the exhaust gas on the downstream side of the first hydrogen concentration measuring means; and a combustion type detoxification device provided in the second hydrogen concentration measuring means Downstream side; and between the first hydrogen concentration measuring means and the second hydrogen concentration measuring means, a hydrogen adding means is provided, and the hydrogen adding means is the first measured by the first hydrogen concentration measuring means. When the hydrogen concentration falls below a preset first hydrogen concentration setting value, hydrogen is added to the exhaust gas, and when the second hydrogen concentration measured by the second hydrogen concentration measuring means becomes the second hydrogen concentration set in advance When the value is greater than or equal to the set value, the addition of hydrogen to the exhaust gas ends.
又，本發明之排氣處理裝置，係在上述氫添加手段與上述第2氫濃度測量手段之間，設置有緩衝槽，此外，在設置有緩 衝槽之時，於該緩衝槽設置有上述氫添加手段，此外，在上述燃燒式除害裝置之下游側，設置有對自該燃燒式除害裝置所導出之燃燒除害處理氣體中之氨的濃度進行測量之氨濃度測量手段，並且上述氫添加手段係當利用上述氨濃度測量手段所測出之氨濃度成為預先所設定之氨濃度上限值以上時，開始對上述排氣添加氫。 Further, the exhaust gas treatment device of the present invention is provided with a buffer tank between the hydrogen adding means and the second hydrogen concentration measuring means. At the time of flushing, the buffer tank is provided with the above-mentioned hydrogen adding means. In addition, on the downstream side of the combustion-type detoxification device, ammonia in the combustion-detoxification treatment gas derived from the combustion-type detoxification device is provided. Means for measuring the ammonia concentration, and the hydrogen adding means starts to add hydrogen to the exhaust gas when the ammonia concentration measured by the ammonia concentration measuring means becomes equal to or higher than the preset ammonia concentration upper limit value.
根據本發明之排氣處理裝置，由於可將燃燒除害裝置維持於適合對氫及氨進行燃燒除害處理之燃燒狀態，因而可效率良好地對含有氫及氨之排氣進行處理。 According to the exhaust gas treatment device of the present invention, since the combustion detoxification device can be maintained in a combustion state suitable for the combustion and detoxification treatment of hydrogen and ammonia, the exhaust gas containing hydrogen and ammonia can be efficiently treated.
11‧‧‧CVD裝置 11‧‧‧CVD device
12‧‧‧燃燒式除害裝置 12‧‧‧ Combustion type detoxification device
13‧‧‧第1氫濃度測量手段 13‧‧‧The first measure of hydrogen concentration
14‧‧‧氫添加手段 14‧‧‧ Means of hydrogen addition
15‧‧‧緩衝槽 15‧‧‧ buffer tank
16‧‧‧第2氫濃度測量手段 16‧‧‧The second measure of hydrogen concentration
17‧‧‧氨濃度測量手段 17‧‧‧Measurement of ammonia concentration
18‧‧‧燃料供給部 18‧‧‧ Fuel Supply Department
19‧‧‧空氣供給部 19‧‧‧Air Supply Department
圖1為顯示本發明之排氣處理裝置之第1形態例之說明圖。 FIG. 1 is an explanatory diagram showing a first embodiment example of an exhaust gas treatment apparatus according to the present invention.
圖2為顯示本發明之排氣處理裝置之第2形態例之說明圖。 Fig. 2 is an explanatory view showing a second embodiment example of the exhaust gas treatment device of the present invention.
圖1為顯示本發明之排氣處理裝置之第1形態例者，此排氣處理裝置係利用燃燒式除害裝置12使自CVD裝置11排出之排氣內含有之氨及氫燃燒而將氨及氫自排氣中除去者，其中該CVD裝置11係使用氫氣(H2)、氨氣(NH3)、氮氣(N2)及其他之氣體作為原料氣體(處理氣體)及運載氣體，並且，於CVD裝置11與燃燒式除害裝置12之間，且自CVD裝置11側亦即排氣之流動方向上游側起依序設置有第1氫濃度測量手段13、氫添加手段14、緩衝槽15及第2氫濃度測量手段16，並於燃燒式除害裝置12之下游側設置有氨濃度測量手段17。 FIG. 1 shows a first embodiment of the exhaust gas treatment device of the present invention. This exhaust gas treatment device burns ammonia and hydrogen contained in the exhaust gas discharged from the CVD device 11 by a combustion type detoxification device 12 to combust ammonia. And hydrogen from the exhaust gas, in which the CVD device 11 uses hydrogen (H2), ammonia (NH3), nitrogen (N2) and other gases as the source gas (processing gas) and carrier gas, and in CVD A first hydrogen concentration measuring means 13, a hydrogen adding means 14, a buffer tank 15 and a first hydrogen concentration measuring means 13, a hydrogen adding means 14, a first 2 Hydrogen concentration measuring means 16, and an ammonia concentration measuring means 17 is provided on the downstream side of the combustion type detoxification device 12.
例如，於CVD裝置11中，所供給之氣體之種類及量 係隨著進行氣相成長之步驟的行進而發生變化，例如，於自步驟開始進行預熱等之步驟初期，不供給氨而供給氫及氮，於步驟中期開始供給氨，然後停止氫之供給。並且，於步驟之後半段，進行再次開始氫之供給的步驟。 For example, in the CVD apparatus 11, the type and amount of the supplied gas It changes with the progress of the step of vapor phase growth. For example, at the beginning of steps such as preheating from the beginning of the step, hydrogen and nitrogen are supplied without supplying ammonia, ammonia is supplied in the middle of the step, and then the supply of hydrogen is stopped. . Then, in the second half of the step, a step of restarting the supply of hydrogen is performed.
燃燒式除害裝置12係具備供給用以形成燃燒用火種之少量的燃料之燃料供給部18、以及供給燃燒用及燃燒氣體冷卻用之空氣之空氣供給部19者，其藉由使排氣中之氫及空氣中之氧反應並燃燒，維持預先設定之溫度以上之燃燒狀態，對氨進行燃燒及分解而自排氣中除去。 The combustion type detoxification device 12 includes a fuel supply unit 18 for supplying a small amount of fuel for forming a combustion flame, and an air supply unit 19 for supplying air for combustion and combustion gas cooling. The hydrogen and oxygen in the air react and burn, maintaining a combustion state above a preset temperature, burning and decomposing ammonia to remove it from the exhaust.
氫添加手段14係當以第1氫濃度測量手段13所測出之第1氫濃度減少為預先設定之第1氫濃度設定值以下時開始朝向排氣中添加氫，當以第2氫濃度測量手段16所測出之第2氫濃度增加至預先設定之第2氫濃度設定值以上時結束朝向排氣中添加氫。第1氫濃度設定值及第2氫濃度設定值，係可根據燃燒式除害裝置12之構成及排氣之流量等之條件而適宜地設定，惟藉由將第2氫濃度設定值設定為第1氫濃度設定值以上之濃度，可確實地使導入於燃燒式除害裝置12內之排氣中的氫濃度成為規定濃度以上。 The hydrogen adding means 14 starts to add hydrogen to the exhaust gas when the first hydrogen concentration measured by the first hydrogen concentration measuring means 13 decreases below a preset first hydrogen concentration setting value, and when the second hydrogen concentration is measured When the second hydrogen concentration measured by means 16 increases above a preset second hydrogen concentration setting value, the addition of hydrogen to the exhaust gas ends. The first hydrogen concentration setting value and the second hydrogen concentration setting value can be appropriately set according to conditions such as the configuration of the combustion type detoxification device 12 and the flow rate of the exhaust gas, but by setting the second hydrogen concentration setting value to The concentration above the first hydrogen concentration set value can reliably make the hydrogen concentration in the exhaust gas introduced into the combustion-type detoxification device 12 equal to or higher than a predetermined concentration.
自氫添加手段14添加於排氣中之氫氣的量，雖可任意設定，但可以以下方式設定，即、停止朝向CVD裝置11供給氫，當以第1氫濃度測量手段13所測出之排氣中的氫濃度減少時，自氫添加手段14添加用以燃燒式除害裝置12之燃燒尚不足之部分的一定量之氫，並且再次開始朝向CVD裝置11供給氫，而當以第2氫濃度測量手段16所測出之氫濃度超出了規定濃度時，結束氫之添加。 Although the amount of hydrogen added to the exhaust gas by the hydrogen adding means 14 can be arbitrarily set, it can be set in such a manner that the supply of hydrogen to the CVD apparatus 11 is stopped and the amount of hydrogen measured by the first hydrogen concentration measuring means 13 is stopped. When the hydrogen concentration in the gas decreases, a certain amount of hydrogen is added from the hydrogen addition means 14 to the part where the combustion of the combustion detoxification device 12 is still insufficient, and the hydrogen is supplied to the CVD device 11 again. When the hydrogen concentration measured by the concentration measuring means 16 exceeds a predetermined concentration, the addition of hydrogen is terminated.
藉此，可使導入於燃燒式除害裝置12內之排氣中的氫濃度，達到可獲得能以燃燒式除害裝置12除去氨之燃燒溫度的氫濃度以上，從而可以燃燒式除害裝置12確實地除去氨。此外，藉由於氫添加手段14之下游側設置緩衝槽15，當第1氫濃度測量手段13所測出之氫濃度降低時，即使迄至開始自氫添加手段14供給氫為止之回應略有延遲，仍可將自氫添加手段14添加之氫及排氣，在緩衝槽15內充分地混合後導入於燃燒式除害裝置12內，並可避免因氫濃度之變動而引起的第2氫濃度測量手段16之誤動作。 Thereby, the hydrogen concentration in the exhaust gas introduced into the combustion type detoxification device 12 can be made higher than the hydrogen concentration at which the combustion temperature at which the ammonia can be removed by the combustion type detoxification device 12 can be obtained, so that the combustion type detoxification device can be obtained. 12 Ammonia is reliably removed. In addition, since the buffer tank 15 is provided on the downstream side of the hydrogen adding means 14, when the hydrogen concentration measured by the first hydrogen concentration measuring means 13 decreases, the response until the start of supplying hydrogen from the hydrogen adding means 14 is slightly delayed. The hydrogen and exhaust gas added by the hydrogen adding means 14 can still be fully mixed in the buffer tank 15 and then introduced into the combustion type harm removal device 12, and the second hydrogen concentration caused by the fluctuation of the hydrogen concentration can be avoided. Misoperation of measuring means 16.
又，藉由於燃燒式除害裝置12之下游側設置氨濃度測量手段17，例如，即使於因第1氫濃度測量手段13之欠佳而無法正常地進行朝向氫濃度降低之排氣中之氫的添加，使得導入於燃燒式除害裝置12內之排氣中的氫濃度降低，造成燃燒溫度下降，而無法完全除去氨之情況，藉由利用氨濃度測量手段17對自燃燒式除害裝置12導出之燃燒除害處理氣體中之氨的濃度進行測量，且於超出了預先設定之氨濃度上限值時自氫添加手段14開始朝向排氣中添加氫，仍可將導入於燃燒式除害裝置12內之排氣中的氫濃度形成為規定濃度以上，可利用燃燒式除害裝置12確實地除去氨，從而可防止排出規定濃度以上之氨之情況。 Furthermore, since the ammonia concentration measuring means 17 is provided on the downstream side of the combustion-type detoxification device 12, for example, even in a case where the hydrogen concentration in the exhaust gas which is decreasing toward the hydrogen concentration cannot be normally performed due to the poor performance of the first hydrogen concentration measuring means 13, The addition of H2 reduces the hydrogen concentration in the exhaust gas introduced into the combustion-type detoxification device 12 and causes the combustion temperature to decrease. However, the ammonia cannot be completely removed. The ammonia concentration in the combustion and detoxification treatment gas derived from 12 is measured, and when the preset ammonia concentration upper limit is exceeded, the hydrogen addition means 14 starts to add hydrogen to the exhaust gas, and it can still be introduced into the combustion type removal. The hydrogen concentration in the exhaust gas in the harmful device 12 is formed to be higher than a predetermined concentration, and ammonia can be reliably removed by the combustion-type harmful device 12, so that the ammonia can be prevented from being discharged out of the predetermined concentration.
此外，藉由以使來自氫添加手段14之氫的添加量成為一定量，且藉由第1氫濃度測量手段13及第2氫濃度測量手段16對開始及結束進行控制的方式設定，不需使用複雜之控制裝置，可以簡單之構成且可高可靠度地進行控制。 In addition, it is set so that the amount of hydrogen added from the hydrogen adding means 14 becomes constant, and the start and end are controlled by the first hydrogen concentration measuring means 13 and the second hydrogen concentration measuring means 16, and it is not necessary Using a complex control device, a simple structure can be controlled with high reliability.
圖2為顯示本發明之排氣處理裝置之第2形態例者。又，以下之說明中，對與第1實施形態例所示之排氣處理裝置之構 成要素相同之構成要素，賦予相同之符號，並省略詳細之說明。 Fig. 2 is a diagram showing a second embodiment example of the exhaust gas treatment device of the present invention. In the following description, the configuration of the exhaust gas treatment device shown in the first embodiment is described. Components having the same components are given the same reference numerals, and detailed descriptions are omitted.
本形態例係以一個燃燒式除害裝置12對自複數個CVD裝置11排出之排氣進行處理者，自複數個CVD裝置11排出之排氣，係於集中在一個配管而被導入燃燒式除害裝置12時，與上述第1形態例同樣地，藉由流經配置有第1氫濃度測量手段13、氫添加手段14、緩衝槽15及第2氫濃度測量手段16之配管內，與上述同樣地可將氫濃度調節為燃燒式除害裝置12所需要之氫濃度以上。 In this embodiment, the exhaust gas discharged from the plurality of CVD devices 11 is treated by one combustion type detoxification device 12, and the exhaust gas discharged from the plurality of CVD devices 11 is introduced into the combustion type by being concentrated in one pipe. When the device 12 is damaged, in the same manner as the first embodiment described above, it flows through the pipe in which the first hydrogen concentration measuring means 13, the hydrogen adding means 14, the buffer tank 15, and the second hydrogen concentration measuring means 16 are arranged, as described above. Similarly, the hydrogen concentration can be adjusted to be higher than the hydrogen concentration required by the combustion type detoxification device 12.
如此，於對自複數個CVD裝置11排出之排氣進行除害處理時，藉由根據導入於燃燒式除害裝置12內之排氣中的氫濃度，自氫添加手段14添加氫，可確實地進行燃燒式除害裝置12中之氫及氨的除去。 In this way, when the exhaust gas discharged from the plurality of CVD apparatuses 11 is subjected to a detoxification treatment, it is possible to reliably add hydrogen from the hydrogen adding means 14 according to the hydrogen concentration in the exhaust gas introduced into the combustion type detoxification apparatus 12. The removal of hydrogen and ammonia in the combustion-type detoxification device 12 is performed in the following manner.
此外，根據自複數個CVD裝置11排出之排氣中的氫濃度之變動狀態，可藉由根據利用第1氫濃度測量手段13所測出之氫濃度之降低狀對來自氫添加手段14之氫添加量進行設定，一方面確實地進行燃燒式除害裝置12中之氫及氨的除去，一方面避免因添加過剩之氫而造成運轉成本之上昇。又，藉由設置緩衝槽15，可於規定濃度以上將因複數個CVD裝置11之運轉狀態而變動之排氣中的氫濃度平均化，可防止在燃燒式除害裝置12之燃燒溫度之異常上昇。 In addition, according to the fluctuation state of the hydrogen concentration in the exhaust gas discharged from the plurality of CVD apparatuses 11, the hydrogen from the hydrogen adding means 14 can be detected based on the decrease in the hydrogen concentration measured by the first hydrogen concentration measuring means 13. The amount to be added is set to reliably remove hydrogen and ammonia from the combustion-type detoxification device 12 while avoiding an increase in operating costs caused by adding excess hydrogen. In addition, by providing the buffer tank 15, the hydrogen concentration in the exhaust gas fluctuated due to the operating state of the plurality of CVD devices 11 can be averaged at a predetermined concentration or more, and the abnormality of the combustion temperature in the combustion type detoxification device 12 can be prevented. rise.
再者，於各形態例中，可省略燃燒式除害裝置12之下游側的氨濃度測量手段17，此外，只要能於配管內將自氫添加手段14供給之氫及排氣充分地混合，還可省略緩衝槽15。另一方面，於設置緩衝槽15之情況，亦可以自氫添加手段14朝向緩衝槽15 內供給氫之方式形成。 In addition, in each embodiment, the ammonia concentration measuring means 17 on the downstream side of the combustion type detoxification device 12 can be omitted, and as long as the hydrogen and exhaust gas supplied from the hydrogen adding means 14 can be sufficiently mixed in the piping, The buffer groove 15 may also be omitted. On the other hand, in the case where the buffer tank 15 is provided, the hydrogen addition means 14 may be directed toward the buffer tank 15 Formed by internal supply of hydrogen.
此外，當因以氨濃度測量手段17所測出之氨濃度之上昇而添加氫時，以顯示於第1氫濃度測量手段13等產生有欠缺為較佳。又，於即使根據來自氨濃度測量手段17之信號添加氫而氨濃度仍不下降之情況、測出之氨濃度超出了預先設定之異常溫度界限值時，也可構成為產生故障警報而使裝置緊急停止之構造。 In addition, when hydrogen is added due to an increase in the ammonia concentration measured by the ammonia concentration measuring means 17, it is preferable that a defect is displayed in the first hydrogen concentration measuring means 13 or the like. In addition, when the ammonia concentration does not decrease even if hydrogen is added according to the signal from the ammonia concentration measuring means 17, when the measured ammonia concentration exceeds a preset abnormal temperature limit value, it may be configured to generate a fault alarm and make the device Construction of emergency stop.
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